Position control method, filter combination system, electronic equipment and storage medium

Abstract

The invention provides a position control method, a filter combination system, electronic equipment and a storage medium, and relates to the technical field of semiconductors. The target position information of the sample bearing platform is obtained by establishing a reference coordinate system with the vacuum transmission channel as the benchmark, and the three-dimensional position information of the sample bearing platform and the angle information of all joints of the mechanical arm are obtained in real time. Based on the information, the motion trail adjustment amount of the mechanical arm can be generated, the motion trail of the mechanical arm is adjusted accordingly, and it is ensured that the sample bearing platform accurately enters the corresponding process cavity. In the process cavity, the target attitude of the sample bearing platform in the process cavity can be further adjusted by acquiring the alignment mark information on the sample bearing platform, and the position and attitude control precision of the sample during transmission among a plurality of process cavities is remarkably improved, so that the consistency of the process is ensured, the stability of the device performance is improved, and the product quality is improved. And the yield of the product is finally improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor technology, in particular to a position control method, a filter combination system, an electronic device and a storage medium. BACKGROUND

[0002] In the process of manufacturing semiconductor devices, especially in the preparation of bulk acoustic wave resonator (BAW) filters, the sample substrate needs to be vacuum-transmitted between multiple process chambers with high cleanliness and high precision. The transmission process usually relies on a mechanical arm or a track system to send the sample carrying platform into different process chambers, and completes attitude adjustment and position calibration before entering the chamber, to ensure that the relative position between the sample carrying platform and the process equipment in the chamber meets the strict process window requirements. For example, in the thin film deposition process, the sample needs to maintain a specific distance and angle from the evaporation source to achieve uniform thin film deposition; in the etching process, the sample must be accurately aligned with the electrode to ensure high-precision pattern transfer.

[0003] In actual operation, the sample carrying platform is cyclically transmitted between multiple process chambers, and the positional deviation when entering the same chamber each time must be controlled within sub-microns. However, due to the repeated positioning errors of the mechanical arm and the possible slight deformation of the sample carrying platform during multiple transmission processes, the actual position of the sample in the target chamber often deviates from the expected position. This deviation not only affects the consistency of the process, but also can cause instability of the device performance, thereby affecting the yield and performance of the final product.

[0004] At present, there is no effective technical solution to the above problems. SUMMARY

[0005] The purpose of the present application is to provide a position control method, a filter combination system, an electronic device and a storage medium, which can compensate for errors in real time, greatly reduce positional deviation during transmission, improve the alignment accuracy of the sample carrying platform, and facilitate the preparation rate of high-performance filters.

[0006] The present application provides a position control method, comprising the steps of: S1. establishing a reference coordinate system with a vacuum transmission channel as a reference, and obtaining target position information of a sample carrying platform in the reference coordinate system; S2. obtaining three-dimensional position information of the sample carrying platform and joint angle information of a mechanical arm; S3. generating a motion trajectory adjustment amount of the mechanical arm according to the three-dimensional position information of the sample carrying platform, the joint angle information of the mechanical arm, and the target position information; S4. Adjusting a motion trajectory of the mechanical arm according to the motion trajectory adjustment amount, so that the sample carrying platform enters a corresponding process cavity; S5. In the process cavity, acquiring alignment mark information on the sample carrying platform, the alignment mark information including pixel coordinates, geometric shapes, sizes of multiple alignment marks in an image, and relative positions between the multiple alignment marks; S6. Adjusting a target posture of the sample carrying platform in the process cavity according to the alignment mark information.

[0007] By the technical solution, high-precision position and posture control of the sample carrying platform in the vacuum transmission channel and the process cavity can be realized, the position deviation problem caused by repeated positioning errors of the mechanical arm in the prior art is effectively solved, and process consistency and product yield are improved.

[0008] Optionally, step S2 includes: reading position sensor data on the sample carrying platform to obtain position data; reading angle sensor data of each joint of the mechanical arm to obtain angle data of each joint; performing data preprocessing on the position data to obtain the three-dimensional position information; performing data preprocessing on the angle data of each joint to obtain joint angle information of the mechanical arm.

[0009] By the technical solution, the accuracy and reliability of the acquired three-dimensional position information of the sample carrying platform and the joint angle information of the mechanical arm can be ensured.

[0010] Optionally, step S3 includes: acquiring a position deviation of the sample carrying platform according to the three-dimensional position information of the sample carrying platform and the target position information; determining adjustment angles of each joint of the mechanical arm by using a pre-constructed kinematic model of the mechanical arm according to the position deviation and the joint angle information of the mechanical arm; generating a motion trajectory adjustment amount of the mechanical arm according to the adjustment angles of the joints.

[0011] By the technical solution, the adjustment angles of each joint of the mechanical arm can be calculated based on the accurate position deviation and the kinematic model of the mechanical arm, so that the precise motion trajectory adjustment amount is generated, and the position deviation is effectively compensated.

[0012] Optionally, step S4 includes: determining each joint driving instruction of the mechanical arm according to the motion trajectory adjustment amount; According to the joint driving instruction of the mechanical arm, each joint of the mechanical arm is driven to move; During the movement of the mechanical arm, the latest position information of the sample carrying platform is acquired in real time; According to the latest position information, it is judged whether the sample carrying platform enters the process cavity or not; If the sample carrying platform does not enter the process cavity, according to the latest position information of the sample carrying platform, the movement trajectory adjustment amount of the mechanical arm is regenerated; The above steps are repeated until the sample carrying platform enters the process cavity.

[0013] Through the technical solution, real-time adjustment and closed-loop control of the movement trajectory of the mechanical arm can be realized, so as to ensure that the sample carrying platform can accurately and stably enter the target process cavity, and even if there is deviation during movement, it can be corrected in time.

[0014] Optionally, the step of if the sample carrying platform does not enter the process cavity, then according to the latest position information of the sample carrying platform, the movement trajectory adjustment amount of the mechanical arm is regenerated, comprises: If the sample carrying platform does not enter the process cavity; An adaptive PID control algorithm is adopted, and the PID parameters are adjusted in real time according to the latest position information of the sample carrying platform and the target position information, so as to regenerate the movement trajectory adjustment amount of the mechanical arm.

[0015] Through the technical solution, the adaptive PID control algorithm can be used to dynamically adjust the control parameters according to the real-time position information, so as to further improve the accuracy and response speed of the movement trajectory adjustment of the mechanical arm.

[0016] Optionally, step S5 comprises: In the process cavity, the images of a plurality of alignment marks on the sample carrying platform are acquired; The images are subjected to image enhancement processing; The geometric shapes, sizes and pixel coordinates of each alignment mark in the image of a plurality of alignment marks are identified from the images subjected to image enhancement processing; According to the pixel coordinates of each alignment mark in the image, the relative positions between the alignment marks are determined; The pixel coordinates, geometric shapes, sizes and relative positions between the alignment marks of a plurality of alignment marks in the image are combined to form the alignment mark information.

[0017] Optionally, step S6 comprises: According to the alignment mark information, the current attitude deviation of the sample carrying platform in the process cavity is determined; According to the current attitude deviation, an attitude adjustment amount required for the sample carrying platform to perform attitude adjustment in the process cavity is calculated; According to the attitude adjustment amount, the sample carrying platform is driven to perform attitude adjustment, so that the sample carrying platform is consistent with the target attitude in the process cavity.

[0018] In a second aspect, the application provides a filter combination system, comprising a controller, a plurality of process cavities connected to a vacuum transmission channel respectively, wherein the process cavities are provided with workbenches and cameras, the workbenches are used to place sample carrying platforms, and the vacuum transmission channel is provided with a mechanical arm and a sample carrying platform; The sample carrying platform is arranged on the mechanical arm, and the sample carrying platform is provided with a precision driving mechanism and a position sensor, wherein the position sensor is used to measure position data of the sample carrying platform and send the position data to the controller; Each joint of the mechanical arm is provided with an angle sensor, and the angle sensor is used to measure angle data of each joint and send the angle data to the controller; The controller is connected with the mechanical arm and the precision driving mechanism; The controller is used to receive the position data and the angle data; The controller is further used to generate a motion trajectory adjustment amount of the mechanical arm according to the position data and the angle data, and send the motion trajectory adjustment amount to the mechanical arm, so that the mechanical arm adjusts the motion trajectory according to the motion trajectory adjustment amount, so that the sample carrying platform enters the corresponding process cavity; In the process cavity, the camera is used to shoot an image of the sample carrying platform, the image contains alignment mark information, and the image is sent to the controller; The controller controls the precision driving mechanism to adjust the target attitude of the sample carrying platform in the process cavity according to the alignment mark information in the image.

[0019] In a third aspect, the application provides an electronic device, comprising a processor and a memory, wherein the memory stores computer readable instructions, and when the computer readable instructions are executed by the processor, the steps of the position control method in any one of the preceding aspects are executed.

[0020] In a fourth aspect, the application provides a computer readable storage medium, which stores a computer program, and when the computer program is executed by a processor, the steps of the position control method in any one of the preceding aspects are executed.

[0021] From the above, the position control method, filter combination system, electronic device and storage medium provided by the application establish a reference coordinate system with the vacuum transmission channel as the reference, obtain the target position information of the sample carrying platform, and obtain the three-dimensional position information of the sample carrying platform and the joint angle information of the mechanical arm in real time. Based on this information, the motion trajectory adjustment amount of the mechanical arm can be generated, and the motion trajectory of the mechanical arm can be adjusted accordingly to ensure that the sample carrying platform accurately enters the corresponding process cavity. In the process cavity, by obtaining the alignment mark information on the sample carrying platform, including pixel coordinates, geometric shapes, sizes and relative positions, the target attitude of the sample carrying platform in the process cavity can be further adjusted. This method effectively solves the position deviation problem caused by the repeated positioning error of the mechanical arm in the prior art, significantly improves the position and attitude control accuracy of the sample during transmission between multiple process chambers, thereby ensuring the consistency of the process, improving the stability of the device performance, and ultimately improving the yield of the product.

[0022] Other features and advantages of the present application will be set forth in the following description, and in part will become apparent from the description, or can be learned by practice of the present application. The objects and other advantages of the present application can be achieved and obtained by the structure particularly pointed out in the written description and drawings. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 A flowchart of the position control method provided by the embodiments of the present application.

[0024] Figure 2 A structural schematic diagram of the filter combination system provided by the embodiments of the present application.

[0025] Figure 3 A structural schematic diagram of the electronic device provided by the embodiments of the present application.

[0026] Label explanation: 10, process cavity; 20, vacuum transmission channel; 13, electronic device; 1301, processor; 1302, memory; 1303, communication bus. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. The components of the embodiments of the present application described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of the present application.

[0028] It should be noted that: similar reference numbers and letters represent similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. Meanwhile, in the description of the present application, the terms "first", "second", etc. are only used for differentiation, and cannot be understood as indicating or implying relative importance.

[0029] Please refer to Figures 1-3 The present application provides a position control method, a filter combined system, an electronic device and a storage medium, which can compensate errors in real time, greatly reduce the position deviation in the transmission process, improve the alignment accuracy of the sample carrying platform, and is beneficial to the preparation rate of high-performance filters.

[0030] The present application provides a position control method, which comprises the following steps: S1. establishing a reference coordinate system taking a vacuum transmission channel as a reference, and obtaining target position information of a sample carrying platform in the reference coordinate system; S2. obtaining three-dimensional position information of the sample carrying platform and joint angle information of a mechanical arm; S3. generating a motion trajectory adjustment amount of the mechanical arm according to the three-dimensional position information of the sample carrying platform (the three-dimensional position information of the sample carrying platform and the target position information are in the same coordinate system), the joint angle information of the mechanical arm, and the target position information; S4. adjusting the motion trajectory of the mechanical arm according to the motion trajectory adjustment amount, so that the sample carrying platform enters a corresponding process cavity; S5. obtaining alignment mark information on the sample carrying platform in the process cavity, the alignment mark information including pixel coordinates, geometric shapes, sizes of a plurality of alignment marks in an image, and relative positions between the plurality of alignment marks; S6. adjusting a target posture of the sample carrying platform in the process cavity according to the alignment mark information.

[0031] The filter system mentioned in the present application refers to a semiconductor manufacturing equipment integrating multiple process chambers and connected by vacuum transmission channels, which is mainly used for the preparation of bulk acoustic wave resonator (BAW) filters. The system aims to achieve efficient and high-purity transmission of sample substrates between different process steps. The "vacuum transmission channel" is a bridge connecting various process chambers, ensuring that the sample is transmitted in a vacuum environment to avoid contamination. The "sample carrying platform" is a carrier used to carry the sample substrate and move it within the system. The "mechanical arm" is an automated device responsible for grabbing, moving, and placing the sample carrying platform, and its movement accuracy directly affects the accuracy of sample transmission. The "process chamber" is an independent chamber for performing specific semiconductor manufacturing processes such as thin film deposition, etching, etc.

[0032] In step S1, a reference coordinate system based on the vacuum transmission channel is established, and the target position information of the sample carrying platform in the reference coordinate system is obtained. The establishment of the reference coordinate system can be achieved in various ways. For example, a plurality of high-precision reference points can be pre-set at specific positions of the vacuum transmission channel, and a global coordinate system can be defined by measuring the relative positions of these reference points. The target position information of the sample carrying platform can be set according to the pre-set process flow and the entrance positions of each process chamber. Specifically, the precise entrance coordinates of each process chamber can be pre-stored in the system as the target position of the sample carrying platform.

[0033] In step S2, the three-dimensional position information of the sample carrying platform and the joint angle information of the mechanical arm are obtained. The three-dimensional position information of the sample carrying platform can be measured in real time by the position sensor installed on the sample carrying platform. For example, a laser displacement sensor or a capacitive displacement sensor can be used, which can provide high-precision X, Y, Z axis coordinate data. The joint angle information of the mechanical arm can be obtained by the angle sensor (such as encoder or resolver) installed at each joint of the mechanical arm. These sensors can provide real-time feedback of the rotation angle of each joint, thereby providing basic data for kinematics calculation of the mechanical arm.

[0034] In step S3, a motion trajectory adjustment amount of the mechanical arm is generated according to the three-dimensional position information of the sample carrying platform, the joint angle information of the mechanical arm, and the target position information. The implementation of this step can include: first, comparing the obtained three-dimensional position information of the sample carrying platform with the preset target position information, and calculating the deviation between the current position of the sample carrying platform and the target position. Second, using the pre-established kinematic model of the mechanical arm, combining the joint angle information of the mechanical arm and the calculated position deviation, the adjustment angle required by each joint of the mechanical arm is reversely deduced. Finally, according to these adjustment angles, the motion trajectory adjustment amount of the mechanical arm is generated, which can be expressed as the incremental motion instructions of each joint.

[0035] In step S4, the motion trajectory of the mechanical arm is adjusted according to the motion trajectory adjustment amount, so that the sample carrying platform enters the corresponding process cavity. The implementation of this step can include: converting the motion trajectory adjustment amount generated in step S3 into driving instructions of each joint of the mechanical arm, such as pulse signals or voltage signals. Then, the joints of the mechanical arm move according to these instructions. During the movement of the mechanical arm, the latest position information of the sample carrying platform can be continuously obtained, and whether the sample carrying platform has entered the target process cavity can be judged according to these information. If it has not yet entered, the motion trajectory adjustment amount can be recalculated and generated according to the latest position information, and the above adjustment process is repeated until the sample carrying platform successfully enters the process cavity.

[0036] In step S5, in the process cavity, the alignment mark information on the sample carrying platform is obtained, which includes the pixel coordinates, geometric shapes, sizes of multiple alignment marks in the image, and the relative positions between the multiple alignment marks. The implementation of this step can include: setting a high-resolution camera inside the process cavity to shoot the alignment mark image on the sample carrying platform. These alignment marks can be geometric patterns such as cross-shaped, circular or rectangular marks made on the sample carrying platform in advance. Through image processing technology, the geometric shapes, sizes and pixel coordinates of these alignment marks in the image can be identified from the shot image. Further, according to these pixel coordinates, the relative positions between different alignment marks can be calculated to form complete alignment mark information.

[0037] In step S6, the target pose of the sample carrying platform in the process cavity is adjusted according to the alignment mark information. The implementation of this step can include the following steps. First, the current pose deviation (for example, the translation deviation in the X and Y directions and the rotation deviation in the Z axis) of the sample carrying platform in the process cavity is determined by comparing the alignment mark information obtained in step S5 with the preset ideal alignment mark information. Second, the pose adjustment amount required for the sample carrying platform is determined according to the calculated pose deviation. Finally, the sample carrying platform is fine-tuned according to the calculated pose adjustment amount by driving the precision driving mechanism (for example, a piezoelectric ceramic driver or a micro stepping motor) on the sample carrying platform, so that the sample carrying platform reaches a state of accurate alignment with the target pose in the process cavity.

[0038] The present application effectively solves the problems of insufficient sample transmission and positioning accuracy in the prior art by introducing a reference coordinate system based on a vacuum transmission channel, obtaining accurate position and pose information of the sample carrying platform and the mechanical arm in real time, generating and adjusting the motion trajectory of the mechanical arm, and performing fine pose adjustment in the process cavity using the alignment mark information. Therefore, the process accuracy and product yield in the semiconductor manufacturing process are significantly improved.

[0039] Compared with the prior art, the traditional method often only focuses on the repeated positioning of the mechanical arm, while ignoring the possible slight deviation in the actual transmission process and the fine alignment requirement after entering the process cavity. The present application greatly improves the transmission and positioning accuracy of the sample substrate in the semiconductor manufacturing process by performing preliminary position adjustment in the vacuum transmission channel and performing secondary pose fine adjustment based on visual recognition inside the process cavity. The present application not only effectively compensates for the repeated positioning error of the mechanical arm, but also ensures that the sample achieves sub-micron level alignment accuracy in the key process steps, thereby significantly improving the manufacturing yield and performance stability of semiconductor devices.

[0040] In some embodiments, step S2 includes: reading the position sensor data on the sample carrying platform to obtain position data; reading the angle sensor data of each joint of the mechanical arm to obtain the angle data of each joint; performing data preprocessing on the position data to obtain three-dimensional position information; performing data preprocessing on the angle data of each joint to obtain the joint angle information of the mechanical arm.

[0041] The position data is pre-processed to eliminate sensor noise, calibrate sensor bias, perform unit conversion or data smoothing, etc., to ensure that the obtained three-dimensional position information is accurate, reliable and meets the requirements of subsequent calculations. For example, Kalman filtering, moving average filtering and other algorithms can be used to process the original position data. Similarly, the angle data of each joint is pre-processed to denoise, calibrate and format the original angle data to provide accurate joint angle information of the robot arm.

[0042] The scheme of the present application directly obtains the original data from the position sensor of the sample carrier platform and the joint angle sensor of the robot arm, and pre-processes the original data as necessary, ensuring the accuracy and reliability of the obtained three-dimensional position information and joint angle information. This approach can effectively avoid positioning errors caused by poor sensor data quality or uncalibration, providing a solid data foundation for subsequent robot motion trajectory adjustment and sample carrier platform posture adjustment. By pre-processing the original data, environmental interference, sensor inherent noise and system errors can be filtered out, resulting in more accurate and stable position and angle data.

[0043] In some embodiments, step S3 comprises: According to the three-dimensional position information of the sample carrier platform and the target position information, the position deviation of the sample carrier platform is obtained; According to the position deviation and the joint angle information of the robot arm, the adjustment angle of each joint of the robot arm is determined using the pre-constructed kinematic model of the robot arm; According to the adjustment angle of each joint, the motion trajectory adjustment amount of the robot arm is generated.

[0044] Specifically, obtaining the position deviation of the sample carrier platform refers to quantifying the degree of deviation of the sample carrier platform in space by comparing the difference between the currently obtained three-dimensional position information of the sample carrier platform and the pre-set target position information. The position deviation can be a three-dimensional vector representing the offset in the X, Y and Z directions.

[0045] The kinematic model of the robot arm can be understood as a mathematical model describing the relationship between the position and posture of the end effector (i.e., the sample carrier platform) of the robot arm and the angles of the joints of the robot arm. The model includes forward kinematics and inverse kinematics. Forward kinematics is used to calculate the end effector position according to the joint angles, while inverse kinematics is used to calculate the corresponding joint angles according to the required position of the end effector. In this application, the pre-constructed kinematic model converts the position deviation of the sample carrier platform into the required adjustment angles of the joints of the robot arm, and the purpose is to accurately map the position deviation in space to the rotation or translation amount of each joint of the robot arm. For example, inverse kinematics can be used to calculate the small adjustment amount of each joint required to make the sample carrier platform reach the target position, in combination with the current joint angles of the robot arm and the position deviation of the sample carrier platform.

[0046] According to the adjustment angles of the joints, the movement trajectory adjustment amount of the robot arm is generated, specifically, the calculated joint adjustment angles are applied to the preset movement trajectory of the robot arm, thereby correcting the overall movement path of the robot arm, and ensuring that the sample carrier platform can accurately move to the target position along the corrected trajectory.

[0047] In some embodiments, step S4 includes: According to the movement trajectory adjustment amount, determine the joint driving instructions of the robot arm; According to the joint driving instructions of the robot arm, drive the joints of the robot arm to move; During the movement of the robot arm, the latest position information of the sample carrier platform is acquired in real time; According to the latest position information, determine whether the sample carrier platform enters the process chamber; If the sample carrier platform does not enter the process chamber, the movement trajectory adjustment amount of the robot arm is regenerated according to the latest position information of the sample carrier platform; Repeat the above steps until the sample carrier platform enters the process chamber.

[0048] In the process of mechanical arm movement, in order to ensure that the sample carrying platform can accurately and without error enter the target process cavity, the system will continuously and in real time obtain the latest position information of the sample carrying platform. Based on the latest position information obtained in real time, the system will continuously judge whether the sample carrying platform has successfully entered the target process cavity. If the judgment result shows that the sample carrying platform has not entered the target process cavity, it indicates that the current movement trajectory has deviation (when the system judges that "the sample carrying platform has not entered the target vacuum cavity", it usually means that the sample carrying platform has not completely reached or stabilized at the final safety area or alignment position preset at the process cavity entrance. In this process, the sample carrying platform may have been very close to the target, but has not yet met all the conditions for final entry, such as position, attitude, speed and other parameters still within the adjustment range. "Movement trajectory deviation" means that at the current moment of the sample carrying platform moving towards the target process cavity, there is a small difference between its actual position and the ideal movement trajectory planned by the system in advance. This difference may be caused by many factors, such as the repeatability error of the mechanical arm itself, the backlash of the transmission mechanism, the slight deformation of the components caused by the change of the environment temperature, the influence of load change on the stiffness of the mechanical arm, or even the slight noise in sensor measurement. In the process of mechanical arm movement, the system will continuously and in real time obtain the latest position information of the sample carrying platform. If it is detected that there is even a sub-micron level of small deviation (for example, at a distance of 5 mm from the process cavity entrance, it is detected that the deviation from the preset trajectory is 2 mm) between the current position and the ideal trajectory, the system will immediately identify this deviation as the "movement trajectory adjustment amount" that needs to be corrected. The detection and adjustment of this deviation are continuous, forming a dynamic closed-loop control process. At this time, the system will not stop the movement, but will immediately recalculate and generate a new mechanical arm movement trajectory adjustment amount according to the latest position information combined with the target position information. This process can be realized by using feedback control algorithms (such as proportional-integral-derivative (PID) control, fuzzy control or adaptive control) to dynamically correct the movement path of the mechanical arm. Until the sample carrying platform is accurately guided and successfully enters the target process cavity. Therefore, in the whole process of the sample carrying platform "not entering the target vacuum cavity", the system will continuously monitor and correct these "movement trajectory deviations" to ensure that the sample carrying platform can enter the target process cavity in the most accurate and smooth way along the optimized trajectory. This is an active and preventive control strategy, which aims to minimize the cumulative error and ensure that the final positioning accuracy meets the strict requirements of semiconductor manufacturing processes, rather than waiting for serious deviation to intervene.

[0049] The scheme of the present application effectively solves the problem of inaccurate positioning caused by external interference or internal error in the traditional single trajectory planning by introducing real-time position feedback and dynamic trajectory adjustment mechanism in the process of mechanical arm movement. It is because the actual position of the sample carrying platform is continuously monitored in the process of mechanical arm movement and compared with the target position that the system can timely discover and quantify the movement deviation. By taking these deviations as input, the movement trajectory adjustment amount is recalculated and generated, and the movement trajectory of the mechanical arm is dynamically corrected, which significantly improves the positioning accuracy and success rate of the sample carrying platform into the process cavity.

[0050] In some preferred embodiments, the following is described by a specific example. Assuming that in the filter combination system, the mechanical arm needs to move a sample carrying platform from the vacuum transmission channel to a certain specific process cavity. First, a movement trajectory adjustment amount is generated according to the initial planning, and the mechanical arm is driven to start moving. In the process of mechanical arm movement, the laser ranging sensor installed on the sample carrying platform measures the three-dimensional position information in real time at a frequency of 100 times per second, and compares the real-time three-dimensional position information with the target position preset at the entrance of the target process cavity. If the position of the sample carrying platform deviates from the preset trajectory by 2 mm when moving to 5 mm away from the entrance of the process cavity, and has not yet entered the process cavity, a new movement trajectory adjustment amount is generated according to the 2 mm deviation combined with the kinematic model of the mechanical arm, and the required small adjustment angle of each joint is recalculated. These new adjustment amounts are immediately sent to the joint drive of the mechanical arm, so that the movement trajectory of the mechanical arm is corrected in real time. This process will continue, for example, each time the position of the sample carrying platform deviates from the target position by more than 0.5 mm, the trajectory will be regenerated and adjusted, until the sample carrying platform completely enters the preset safe area of the process cavity.

[0051] In some embodiments, if the sample carrying platform has not entered the process cavity, the step of regenerating the movement trajectory adjustment amount of the mechanical arm according to the latest position information of the sample carrying platform comprises: If the sample carrying platform has not entered the process cavity; An adaptive PID control algorithm is adopted to real-time adjust the PID parameters according to the latest position information and the target position information of the sample carrying platform, and regenerate the movement trajectory adjustment amount of the mechanical arm.

[0052] Specifically, the adaptive PID control algorithm refers to a control method that can automatically adjust its proportional (P) parameters, integral (I) parameters, and derivative (D) parameters according to the system operating state or environmental changes. Among them, the real-time adjustment of PID parameters can be understood as, during the movement of the mechanical arm, the controller continuously monitors the position deviation of the sample carrying platform, and dynamically modifies the proportional (P) parameters, integral (I) parameters, and derivative (D) parameters of the PID controller according to the preset adaptive rules or algorithms (for example, based on fuzzy logic, neural network or model reference adaptive method, etc.), the purpose is to enable the adaptive PID control algorithm to always maintain the optimal control performance, so as to ensure that the sample carrying platform can quickly, smoothly and accurately reach the target position.

[0053] In some preferred embodiments, the following is described by a specific example. Assuming that during the movement of the sample carrying platform to a certain process chamber, due to the slight change of the mechanical arm load or the disturbance of the airflow in the vacuum transmission channel, there is a continuous but dynamically changing deviation between the latest position information and the target position information of the sample carrying platform. The traditional fixed parameter PID controller may need multiple iterations to converge, and even may appear oscillation. However, when using the adaptive PID control algorithm, the controller will monitor this deviation in real time. For example, if it is detected that the platform is too fast when approaching the target position, the adaptive algorithm will immediately adjust the PID parameters, such as reducing the proportional gain or increasing the derivative gain, to smoothly decelerate and avoid overshoot. Conversely, if the platform moves slowly, the parameters will be adjusted accordingly to speed up. This real-time and dynamic parameter adjustment ensures that the sample carrying platform can quickly enter the corresponding process chamber in the most stable and most accurate way, thereby significantly improving the positioning accuracy and efficiency.

[0054] In some embodiments, step S5 comprises: acquiring images of a plurality of alignment marks on the sample carrying platform in the process chamber; performing image enhancement processing on the images; identifying the geometric shapes, sizes, and pixel coordinates of each alignment mark in the images from the image-enhanced images; determining the relative positions between the alignment marks according to the pixel coordinates of each alignment mark in the images; composing the pixel coordinates, geometric shapes, sizes, and relative positions between the alignment marks in the images into alignment mark information.

[0055] The image of the plurality of alignment marks on the sample carrying platform in the process cavity is obtained, specifically, the image acquisition device (such as a camera) arranged in the process cavity is used to capture the alignment marks placed on the sample carrying platform to obtain the original image data containing the alignment marks. The image acquisition device is usually configured to be able to capture high-resolution images to ensure that the details of the alignment marks can be clearly recorded.

[0056] The scheme of the present application effectively improves the image quality by first obtaining the image of the alignment marks on the sample carrying platform in the process cavity and performing enhancement processing on the image, and reduces the influence of environmental noise on subsequent recognition. Subsequently, by recognizing the geometric shape, size and pixel coordinates of the alignment marks (for example, edge information in the image can be extracted by using an edge detection algorithm such as Canny operator, and then each alignment mark present in the image is recognized by shape matching, template matching or a target detection model based on machine learning / deep learning), and further determining the relative positions between the alignment marks, the key information of the alignment marks can be comprehensively and accurately obtained. Therefore, the alignment mark information composed not only contains the characteristics of a single mark, but also contains the spatial relationship between the marks (for example, the Euclidean distance between the center points of any two alignment marks can be calculated, or the pixel offset in the horizontal and vertical directions), which provides sufficient and reliable data basis for subsequent posture adjustment of the sample carrying platform in the process cavity.

[0057] In some embodiments, step S6 comprises: According to the alignment mark information, the current posture deviation of the sample carrying platform in the process cavity is determined; According to the current posture deviation, the posture adjustment amount required for the posture adjustment of the sample carrying platform in the process cavity is calculated; According to the posture adjustment amount, the sample carrying platform is driven to perform posture adjustment, so that the sample carrying platform is consistent with the target posture in the process cavity.

[0058] Specifically, first, the alignment mark information on the sample carrying platform is accurately acquired, the actual pose of the sample carrying platform parsed from the alignment mark information is compared with the preset target pose for subsequent process operations, so that the translation deviation in the X, Y and Z directions and the rotation deviation around the X, Y and Z axes are obtained, and then the current pose deviation of the sample carrying platform in the process cavity can be accurately determined. Based on this deviation, the pose deviation can be converted into the pose adjustment amount (i.e. specific motion instructions, which can include small linear displacement and angular rotation) required by the precision driving mechanism driving the sample carrying platform, by using a preset control algorithm (for example, a pre-constructed adaptive PID control algorithm or a kinematics inverse solution algorithm, the adaptive PID control algorithm adjusts the control amount by calculating the weighted sum of the proportional, integral and derivative three parts. The proportional term reflects the current error, the integral term eliminates the steady-state error, and the derivative term predicts the future error. The kinematics inverse solution algorithm is a core algorithm in existing robotics, which is used to calculate the angle or displacement value that each joint of the robot needs to reach according to the desired position and pose of the robot end effector (such as the sample carrying platform held by the mechanical arm)), and the precision driving mechanism is fine-tuned by driving the sample carrying platform. This process ensures that the sample carrying platform can be accurately aligned with the target pose in the process cavity, thereby meeting the strict requirements of subsequent processes on position and pose.

[0059] Through the above technical solution, the pose of the sample carrying platform can be accurately detected and adjusted after entering the process cavity. This significantly improves the positioning accuracy and alignment reliability of the sample in the process cavity, effectively avoids process defects or product quality problems caused by pose deviation, and ensures the smooth progress of subsequent processes and the consistency of products.

[0060] In a second aspect, with reference to Figure 2 The application provides a filter combination system, which comprises a controller, a plurality of process cavities 10 connected with a vacuum transmission channel 20 respectively, a workbench and a camera arranged in the process cavities 10, the workbench being used for placing a sample carrying platform, and a mechanical arm and the sample carrying platform arranged in the vacuum transmission channel 20; The sample carrying platform is arranged on the mechanical arm, the sample carrying platform is provided with a precision driving mechanism and a position sensor, the position sensor is used for measuring position data of the sample carrying platform and sending the position data to the controller; Each joint of the mechanical arm is provided with an angle sensor, the angle sensor is used for measuring angle data of each joint and sending the angle data to the controller; The controller is connected with the mechanical arm and the precision driving mechanism; The controller is used for receiving the position data and the angle data; The controller is also configured to generate a motion trajectory adjustment amount of the robot arm based on the position data and the angle data, and send the motion trajectory adjustment amount to the robot arm. The robot arm adjusts the motion trajectory based on the motion trajectory adjustment amount, so that the sample carrier platform enters the corresponding process chamber 10. In the process chamber 10, the camera is configured to capture an image of the sample carrier platform, the image containing alignment mark information, and send the image to the controller. The controller controls the precision drive mechanism to adjust the target pose of the sample carrier platform in the process chamber 10 based on the alignment mark information in the image.

[0061] The controller is the core processing unit of the system, which can be one or more industrial PCs, PLCs (Programmable Logic Controllers) or embedded systems. Its main function is to receive data from various sensors, execute complex control algorithms, and send control instructions to the robot arm and the precision drive mechanism. For example, the controller can be configured to include a high-performance processor for running a real-time operating system and motion control software to ensure the timeliness and accuracy of data processing and instruction sending.

[0062] The plurality of process chambers 10 are independent chambers for performing specific semiconductor manufacturing processes, such as thin film deposition chambers, etching chambers or cleaning chambers. These process chambers 10 are connected to each other through the vacuum transmission channel 20, ensuring that the sample is transmitted in a vacuum environment. Each process chamber 10 is provided with a workbench and a camera inside. The workbench is used to stably place the sample carrier platform and ensure that it remains stable during the process. The camera is used for visual detection of the sample carrier platform inside the process chamber 10, such as capturing images of the alignment marks. The camera can use high-resolution CCD or CMOS cameras and be equipped with appropriate lighting systems to obtain clear images.

[0063] The vacuum transmission channel 20 is a bridge connecting the various process chambers 10, maintaining a high vacuum environment inside. The robot arm and the sample carrier platform are both arranged in the vacuum transmission channel 20. The robot arm is a multi-joint robot responsible for grabbing, moving and placing the sample carrier platform in a vacuum environment. The robot arm can use SCARA-type robot arms, six-axis robot arms or linear robot arms, and its driving mode can be step motors or servo motors. The sample carrier platform is a carrier for carrying sample substrates and moving them within the system, usually made of low thermal expansion materials to reduce deformation.

[0064] The sample carrying platform is arranged on the mechanical arm and is fixed by mechanical connection or adsorption. The sample carrying platform is also provided with a precision driving mechanism and a position sensor. The precision driving mechanism is used for fine position and posture adjustment of the sample carrying platform at micron or even nanometer level. For example, the precision driving mechanism can be composed of a piezoelectric ceramic driver, a voice coil motor or a micro stepping motor, which can provide high resolution displacement and rotation. The position sensor is used for real-time measurement of three-dimensional position data of the sample carrying platform. For example, a laser displacement sensor, a capacitive displacement sensor or an optical encoder can be used, which can provide high-precision X, Y and Z axis coordinate data and send the measured position data to the controller.

[0065] The joints of the mechanical arm are provided with angle sensors for measuring the rotation angle data of the joints. For example, the angle sensor can be a high-precision photoelectric encoder or a magnetic encoder, which can provide accurate angle of each joint in real time and send the angle data to the controller.

[0066] The controller is connected with the mechanical arm and the precision driving mechanism through data line or wireless communication module to realize transmission of instructions and interaction of data.

[0067] Specifically, first, in the vacuum transmission channel 20, the system obtains accurate state of the sample carrying platform and the mechanical arm in real time through the position sensor (which can be a laser displacement sensor, a capacitive displacement sensor or an optical encoder) and the angle sensor (which can be a high-precision photoelectric encoder or a magnetic encoder), and generates motion trajectory adjustment amount by the controller to realize real-time correction of the mechanical arm motion, so as to ensure that the sample carrying platform can accurately enter the process cavity 10. Secondly, more importantly, after the sample carrying platform enters the process cavity 10, the system further obtains alignment mark information by the camera and accurately controls the precision driving mechanism (which can be composed of a piezoelectric ceramic driver, a voice coil motor or a micro stepping motor) to adjust the posture by the controller. By preliminary position calibration in the transmission channel and fine posture adjustment by secondary visual guidance in the process cavity 10, the transmission and positioning accuracy of the sample substrate in the semiconductor manufacturing process is greatly improved, the alignment error can be controlled at sub-micron level, and the manufacturing yield and performance stability of the semiconductor device are significantly improved.

[0068] Please refer to Figure 3 , Figure 3A structural schematic diagram of an electronic device provided by an embodiment of the present application, the present application provides an electronic device 13, comprising: a processor 1301 and a memory 1302, the processor 1301 and the memory 1302 are interconnected and communicate with each other through a communication bus 1303 and / or other forms of connection mechanism (not marked), the memory 1302 stores computer readable instructions executable by the processor 1301, when the electronic device runs, the processor 1301 executes the computer readable instructions to execute the method in any optional implementation of the above-mentioned embodiments, to realize the following functions: establishing a reference coordinate system taking a vacuum transmission channel as a reference, obtaining target position information of a sample carrying platform in the reference coordinate system; obtain the three-dimensional position information of the sample carrying platform and the joint angle information of the mechanical arm; according to the three-dimensional position information of the sample carrying platform, the joint angle information of the mechanical arm and the target position information, generate the motion trajectory adjustment amount of the mechanical arm; according to the motion trajectory adjustment amount, adjust the motion trajectory of the mechanical arm, so that the sample carrying platform enters the corresponding process cavity; in the process cavity, obtain alignment mark information on the sample carrying platform, the alignment mark information includes the pixel coordinates, geometric shape, size of multiple alignment marks in the image and the relative position between multiple alignment marks; according to the alignment mark information, adjust the target posture of the sample carrying platform in the process cavity.

[0069] The embodiment of the present application provides a computer readable storage medium, which stores a computer program, and the computer program is executed by a processor to perform the method in any optional implementation manner of the above embodiment, so as to realize the following functions: a reference coordinate system taking a vacuum transmission channel as a reference is established, target position information of a sample carrying platform in the reference coordinate system is acquired; three-dimensional position information of the sample carrying platform and joint angle information of a mechanical arm are acquired; a motion trajectory adjustment amount of the mechanical arm is generated according to the three-dimensional position information of the sample carrying platform, the joint angle information of the mechanical arm and the target position information; the motion trajectory of the mechanical arm is adjusted according to the motion trajectory adjustment amount, so that the sample carrying platform enters a corresponding process cavity; in the process cavity, alignment mark information on the sample carrying platform is acquired, the alignment mark information includes pixel coordinates, geometric shapes, sizes of a plurality of alignment marks in an image and relative positions between the plurality of alignment marks; and a target posture of the sample carrying platform in the process cavity is adjusted according to the alignment mark information. The computer readable storage medium can be realized by any type of volatile or non-volatile storage device or a combination thereof, such as a static random access memory (SRAM), an electrically erasable programmable read-only memory (EEPROM), an erasable programmable read-only memory (EPROM), a programmable read-only memory (PROM), a read-only memory (ROM), a magnetic memory, a flash memory, a magnetic disk or an optical disk.

[0070] In the embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. The device embodiments described above are only schematic. For example, the division of the units is only a logical function division, and other division manners can be used in actual implementation. For example, a plurality of units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the coupling or direct coupling or communication connection between the units shown or discussed can be indirect coupling or communication connection through some communication interfaces, devices or units, and can be electrical, mechanical or other forms.

[0071] In addition, the units described as separate components may or may not be physically separate, and the components displayed as units may or may not be physical units, that is, may be located in one place, or may be distributed to multiple network units. Part or all of the units can be selected according to actual needs to achieve the purpose of the embodiment scheme.

[0072] Furthermore, each functional module in each embodiment of the present application can be integrated together to form an independent part, or each module can exist independently, or two or more modules can be integrated to form an independent part.

[0073] In this paper, relationship terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between the entities or operations.

[0074] The above is only an embodiment of the present application and is not used to limit the protection scope of the present application. For those skilled in the art, the present application can have various changes and variations. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A position control method applied to a filter combination system, the filter combination system comprising a vacuum transfer channel in communication with a plurality of process chambers, characterized in that, The method comprises the steps of: S1. establishing a reference coordinate system based on a vacuum transmission channel, and obtaining target position information of a sample carrying platform in the reference coordinate system; S2. obtaining three-dimensional position information of the sample carrying platform and joint angle information of a mechanical arm; S3. generating a motion trajectory adjustment amount of the mechanical arm according to the three-dimensional position information of the sample carrying platform, the joint angle information of the mechanical arm, and the target position information; S4. adjusting the motion trajectory of the mechanical arm according to the motion trajectory adjustment amount, so that the sample carrying platform enters a corresponding process cavity; S5. In the process cavity, obtaining alignment mark information on the sample carrying platform, the alignment mark information comprising pixel coordinates, geometric shapes, sizes of multiple alignment marks in an image, and relative positions between the multiple alignment marks; S6. Adjusting a target posture of the sample carrying platform in the process cavity according to the alignment mark information.

2. The position control method according to claim 1, characterized by, Step S2 comprises: reading position sensor data on the sample carrying platform to obtain position data; reading angle sensor data of each joint of the mechanical arm to obtain angle data of each joint; performing data preprocessing on the position data to obtain the three-dimensional position information; performing data preprocessing on the angle data of each joint to obtain the joint angle information of the mechanical arm.

3. The position control method according to claim 1, characterized by, Step S3 comprises: obtaining a position deviation of the sample carrying platform according to the three-dimensional position information of the sample carrying platform and the target position information; determining adjustment angles of each joint of the mechanical arm by using a pre-constructed kinematic model of the mechanical arm according to the position deviation and the joint angle information of the mechanical arm; generating a motion trajectory adjustment amount of the mechanical arm according to the adjustment angles of each joint.

4. The position control method according to claim 1, characterized by, Step S4 comprises: determining joint driving instructions of the mechanical arm according to the motion trajectory adjustment amount; driving each joint of the mechanical arm to move according to the joint driving instructions of the mechanical arm; obtaining the latest position information of the sample carrying platform in real time during the movement of the mechanical arm; determining whether the sample carrying platform enters the process cavity according to the latest position information; if the sample carrying platform does not enter the process cavity, then regenerating a motion trajectory adjustment amount of the mechanical arm according to the latest position information of the sample carrying platform; repeating the above steps until the sample carrying platform enters the process cavity.

5. The position control method according to claim 4, characterized by, If the sample carrying platform does not enter the process cavity, then the step of regenerating a motion trajectory adjustment amount of the mechanical arm according to the latest position information of the sample carrying platform comprises: if the sample carrying platform does not enter the process cavity; using an adaptive PID control algorithm to adjust PID parameters in real time according to the latest position information of the sample carrying platform and the target position information, and to regenerate a motion trajectory adjustment amount of the mechanical arm.

6. The position control method according to claim 1, characterized by, Step S5 comprises: obtaining an image of multiple alignment marks on the sample carrying platform in the process cavity; performing image enhancement processing on the image; identifying a geometric shape, a size of each of the plurality of alignment marks, and a pixel coordinate of each of the plurality of alignment marks in the image from the image after the image enhancement processing; determining a relative position between the plurality of alignment marks according to the pixel coordinate of each of the plurality of alignment marks in the image; composing the alignment mark information by the pixel coordinate, the geometric shape, the size of each of the plurality of alignment marks, and the relative position between the plurality of alignment marks.

7. The position control method according to claim 1, characterized by, Step S6 comprises: determining a current attitude deviation of the sample carrying platform in the process cavity according to the alignment mark information; calculating an attitude adjustment amount of the sample carrying platform in the process cavity for attitude adjustment according to the current attitude deviation; driving the sample carrying platform to perform attitude adjustment according to the attitude adjustment amount, so that the sample carrying platform is consistent with a target attitude in the process cavity.

8. A filter combination system characterized by comprising: The controller, a plurality of process cavities connected to a vacuum transmission channel respectively, a workbench and a camera arranged in the process cavities, the workbench being used for placing a sample carrying platform, a mechanical arm and a sample carrying platform arranged in the vacuum transmission channel; The sample carrying platform is arranged on the mechanical arm, and the sample carrying platform is provided with a precision driving mechanism and a position sensor, the position sensor being used for measuring position data of the sample carrying platform and sending the position data to the controller; Each joint of the mechanical arm is provided with an angle sensor, and the angle sensor is used for measuring angle data of each joint and sending the angle data to the controller; The controller is connected with the mechanical arm and the precision driving mechanism; The controller is used for receiving the position data and the angle data; The controller is further used for generating a motion trajectory adjustment amount of the mechanical arm according to the position data and the angle data, and sending the motion trajectory adjustment amount to the mechanical arm, so that the mechanical arm adjusts a motion trajectory according to the motion trajectory adjustment amount, so that the sample carrying platform enters a corresponding process cavity; In the process cavity, the camera is used for shooting an image of the sample carrying platform, the image containing alignment mark information, and sending the image to the controller; The controller controls the precision driving mechanism to adjust a target attitude of the sample carrying platform in the process cavity according to the alignment mark information in the image.

9. An electronic device, comprising: The computer program is executed by the processor to run the steps in the position control method according to any one of claims 1-7.

10. A computer-readable storage medium having stored thereon a computer program, characterized in that, The computer program is executed by the processor to run the steps in the position control method according to any one of claims 1-7.

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