Multi-channel semiconductor diluent gradient mixing device
By using a multi-channel semiconductor diluent gradient mixing device, which utilizes a high-precision flow pump and a complex flow channel structure, the problems of low mixing accuracy and uneven mixing in existing devices are solved, achieving high-precision and uniform multi-gradient mixing to meet the needs of different photolithography processes.
Patent Information
- Application Number
- CN202511726373.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-23
- Publication Date
- 2026-01-23
AI Technical Summary
Existing mixing devices have low mixing accuracy and uneven mixing, making it difficult to meet the requirements for precise mixing of semiconductor photoresists at multiple gradients.
A multi-channel semiconductor diluent gradient mixing device is adopted, which controls the feed rate through a high-precision flow pump. Combined with structures such as spiral grooves, mixing grooves, jet components and shear tubes, it can achieve multi-gradient precise proportioning and deep mixing, and is suitable for different photolithography scenarios.
It achieves high mixing accuracy and uniformity, adapts to multi-gradient lithography requirements, has strong adaptability and stable operation, dynamically matches mixing systems of different viscosities, and ensures the stability and uniformity of the mixing process.
Smart Images
Figure CN121372086A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of semiconductor production equipment, in particular to a multi-channel semiconductor diluent gradient mixing device. BACKGROUND
[0002] In the photolithography process of semiconductor manufacturing, the mixing quality of photoresist and diluent directly determines the core indicators such as photolithography resolution and development effect. The requirements for "multi-gradient matching precision", "high uniformity" and "viscosity adaptability" of the mixed resist are strict. However, the existing mixing device has three key technical pain points, which is difficult to meet the needs of semiconductor process.
[0003] Firstly, the matching precision and gradient flexibility are insufficient. Traditional mixing devices mostly use single-channel fixed matching or manual adjustment method. The feed quantity control relies on ordinary valves, and it is difficult to realize precise gradient output of multiple diluent ratios. Moreover, the number of feed ports is fixed, and the matching method cannot be expanded according to the process requirements, so that the same equipment cannot be compatible with different scenarios such as high-precision thin resist (low dilution) and thick film photolithography (high dilution).
[0004] Secondly, the mixing uniformity is poor, and concentration dead angles are easy to occur. The existing device often uses simple stirring or single-stage flow channel mixing structure. When photoresist (high viscosity) and diluent (low viscosity) are mixed, high-viscosity fluid is easy to form agglomerates due to cohesion, and low-viscosity fluid is easy to flow quickly, causing stratification. Moreover, the mixing flow channel is mostly straight cylinder type, lacking forced convection and shear structure, and the fluid is easy to fall directly, making it difficult to achieve uniform mixing at the microscopic level. Finally, the local concentration deviation of the mixed resist is large, which causes photolithography pattern defects (such as line width abnormality and poor development). SUMMARY
[0005] In view of the above and / or existing problems in the multi-channel semiconductor diluent gradient mixing device, the present application is proposed.
[0006] Therefore, the problem to be solved by the present application is that the existing mixing device has low matching precision and poor mixing, which is difficult to meet the multi-gradient precise mixing needs of semiconductor photoresist.
[0007] To solve the above technical problems, the present application provides the following technical scheme: a multi-channel semiconductor diluent gradient mixing device, comprising a mixing assembly, a connecting seat is arranged in the mixing assembly, a feed port is arranged in the connecting seat, a mixing pipe is fixed at the bottom of the connecting seat, a spiral groove is arranged in the mixing pipe, a mixing groove is arranged on one side of the spiral groove, a guide column is fixed at the bottom of the connecting seat, a receiving groove is arranged on the surface of the guide column, an impact ring is fixed on the surface of the guide column, a guide cone is arranged at the bottom of the guide column, a collection groove is arranged in the mixing pipe, and a shunt groove is arranged at the bottom of the collection groove. A jet flow assembly is arranged at the bottom of the mixing tube, comprising a jet flow tube fixed to the bottom of the mixing tube, a delivery channel is arranged in the jet flow tube, the delivery channel is communicated with the flow distribution groove, a jet flow disc is fixed in the jet flow tube, a connecting groove is arranged in the jet flow disc, the connecting groove is communicated with the delivery channel, and a jet flow port is arranged on one side of the connecting groove.
[0008] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the jet flow assembly further comprises an adjusting member arranged in the jet flow disc, the adjusting member comprises a blocking strip sliding in the jet flow disc, a connecting block is fixed on one side of the blocking strip, and a rotating disc is fixed on the top of the connecting block.
[0009] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the jet flow assembly further comprises a rotating member arranged on the jet flow tube, the rotating member comprises a rotating shaft fixed on the top of the rotating disc, a driving rod is fixed on the surface of the rotating shaft, a moving groove is arranged on the surface of the jet flow tube, and the driving rod slides in the moving groove.
[0010] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the rotating member further comprises an adjusting ring fixed on the end of the driving rod, the adjusting ring is rotationally connected to the surface of the jet flow tube, a supporting ring is fixed on the surface of the jet flow tube, and the supporting ring is located at the bottom of the adjusting ring.
[0011] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the rotating member further comprises a scale fixed on the surface of the jet flow tube, a pointer is arranged on the surface of the supporting ring, and a driving block is fixed on the surface of the supporting ring.
[0012] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the jet flow assembly further comprises a positioning member arranged on the mixing tube, the positioning member comprises a sliding sleeve sliding in the mixing tube, a compression spring is arranged in the sliding sleeve, and the top of the sliding sleeve is located in the collection groove.
[0013] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the positioning member further comprises a pressing rod fixed on the surface of the sliding sleeve, a lifting groove is arranged in the mixing tube, and the pressing rod slides in the lifting groove.
[0014] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the positioning member further comprises an extrusion block fixed on the end of the pressing rod, the extrusion block is located at the top of the adjusting ring, and a friction sheet is arranged at the bottom of the extrusion block.
[0015] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the jet assembly further comprises a shearing pipe fixed in the jet pipe, a honeycomb plate is fixed in the shearing pipe, and a contraction flow channel is arranged in the shearing pipe, and a shearing rod is fixed to the inner wall of the contraction flow channel.
[0016] As a preferred scheme of the multi-channel semiconductor diluent gradient mixing device, the jet assembly further comprises a discharge nozzle fixed to the end of the jet pipe, and the discharge nozzle is in communication with the contraction flow channel.
[0017] The present application has the following advantages: 1. High mixing precision and uniformity, suitable for multi-gradient lithography requirements: high-precision flow pumps are used for precise proportioning of multi-gradient through the feed port, and the components of the output multi-gradient mixed glue liquid are uniform after pre-mixing through the spiral groove, mixing groove and impact ring of the mixing pipe, and high-speed collision and shearing pipe honeycomb plate, which is suitable for different lithography scenes; 2. Strong adaptability and stable operation: the size of the jet port can be adjusted by means of adjusting parts and rotating parts to dynamically match different viscosity mixing systems; the positioning parts can automatically lock the jet port parameters to prevent accidental rotation of the adjusting ring during equipment operation and ensure stable mixing. BRIEF DESCRIPTION OF DRAWINGS
[0018] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor. Among them: Figure 1 It is a structural diagram of the multi-channel semiconductor diluent gradient mixing device.
[0019] Figure 2 It is a structural diagram of the driving block of the multi-channel semiconductor diluent gradient mixing device.
[0020] Figure 3 It is a sectional view of the multi-channel semiconductor diluent gradient mixing device.
[0021] Figure 4 It is a sectional view of the multi-channel semiconductor diluent gradient mixing device. Figure 3 It is a local enlarged structural diagram of position A in the multi-channel semiconductor diluent gradient mixing device.
[0022] Figure 5 It is a local enlarged structural diagram of position B in the multi-channel semiconductor diluent gradient mixing device. Figure 3 It is a local enlarged structural diagram of position B in the multi-channel semiconductor diluent gradient mixing device.
[0023] Figure 6 It is a local enlarged structural diagram of position B in the multi-channel semiconductor diluent gradient mixing device.Figure 3 Local enlarged structural view at C.
[0024] Figure 7 Structural view of mixing groove of multi-channel semiconductor diluent gradient mixing device.
[0025] Figure 8 Structural view of guide column of multi-channel semiconductor diluent gradient mixing device.
[0026] Figure 9 Structural view of jet pipe of multi-channel semiconductor diluent gradient mixing device.
[0027] Figure 10 Structural view of shearing pipe of multi-channel semiconductor diluent gradient mixing device.
[0028] Figure 11 Structural view of baffle of multi-channel semiconductor diluent gradient mixing device.
[0029] Figure 12 Structural view of jet pipe of multi-channel semiconductor diluent gradient mixing device.
[0030] Figure 13 Structural view of baffle of multi-channel semiconductor diluent gradient mixing device. Figure 12 Local enlarged structural view at D.
[0031] Figure 14 Structural view of moving groove of multi-channel semiconductor diluent gradient mixing device.
[0032] In the figure: mixing assembly 1; connecting seat 11; feed inlet 11-1; mixing pipe 12; spiral groove 12-1; mixing groove 12-2; guide column 13; receiving groove 13-1; impact ring 14; guide cone 13-2; collecting groove 12-3; distribution groove 12-4; jet assembly 2; jet pipe 21; conveying channel 21-1; jet disc 22; connecting groove 22-1; jet port 22-2; adjusting piece 23; baffle 231; connecting block 232; rotating disc 233; rotating piece 24; rotating shaft 241; driving rod 242; moving groove 21-2; adjusting ring 243; supporting ring 244; scale bar 245; pointer 244-1; driving block 246; positioning piece 25; sliding sleeve 251; compression spring 252; pressing rod 253; lifting groove 12-5; extruding block 254; shearing pipe 26; honeycomb plate 27; converging flow channel 26-1; shearing rod 26-2; discharge nozzle 28. DETAILED DESCRIPTION
[0033] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application are described in detail below with reference to the accompanying drawings.
[0034] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, it will be recognized by one skilled in the art that the present application can be practiced without the specific details, or with an alternative combination of mechanisms. Thus, the present application is not intended to be limited by the embodiments described herein.
[0035] Secondly, the "one embodiment" or "an embodiment" referred to herein means a specific feature, structure, or characteristic under discussion. Each of such features can be included in some embodiments of the present application to produce the disclosures of the present application. The appearances of the "in one embodiment" or "in an embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are they necessarily all directed to the same embodiment, nor are they necessarily all mutually exclusive or independent in everything that they refer to. Embodiments
[0036] Referring to Figure 1 , Figures 3-5 and Figures 7-9 , the first embodiment of the present application provides a multi-channel semiconductor diluent gradient mixing device, which comprises a mixing assembly 1, including a connecting seat 11, wherein the connecting seat 11 is provided with four feed ports 11-1, and the shape of the feed port 11-1 is wide outside and narrow inside. The feed port 11-1 is used to connect with various diluent pipelines or photoresist pipelines, so as to obtain a plurality of mixed photoresists with different diluent proportions. The number of the feed port 11-1 is four, but the person skilled in the art can set the number of the feed port 11-1 according to the needs, so as to obtain more matching modes. The diluent pipeline or the photoresist pipeline connected with the feed port 11-1 is provided with a high-precision flow pump, which accurately controls the feeding amount of the photoresist and the diluent, and ensures that the actual value and the set value of each gradient matching are extremely small. The high-precision flow pump is prior art, and will not be described here. The inside of the diluent pipeline or the photoresist pipeline is provided with a pressure, which can press the photoresist and the diluent into the mixing device.
[0037] The bottom of the connecting seat 11 is fixed with a mixing pipe 12, the mixing pipe 12 is provided with a spiral groove 12-1, the number of the spiral groove 12-1 is four, which is uniformly distributed on the inner wall of the mixing pipe 12, the number of the spiral groove 12-1 is equivalent to that of the feed inlet 11-1, the spiral groove 12-1 can make the photoresist and the diluent rotate along the inner wall of the mixing pipe 12 when falling in the mixing pipe 12, thereby enhancing the mixing effect, the spiral groove 12-1 is provided with a mixing groove 12-2 on one side, the mixing groove 12-2 can communicate the adjacent spiral grooves 12-1, thereby increasing the mixing effect between the spiral grooves 12-1, and in the vertical direction, the two spiral grooves 12-1 between two adjacent mixing grooves 12-2 are not communicated, so that the mixed photoresist and diluent obtained through the mixing groove 12-2 can flow along the spiral groove 12-1 for mixing, instead of directly and quickly falling, thereby improving the mixing effect, and as the mixed fluid in the spiral groove 12-1 moves downward, when the flowing fan-shaped angle is 90 degrees, the mixed fluid can pass through a mixing groove 12-2 on the spiral groove 12-1, so that the mixed fluid is mixed with the mixed fluid in the adjacent spiral groove 12-1 again.
[0038] The bottom of the connecting seat 11 is fixed with a guiding column 13, the guiding column 13 and the spiral groove 12-1 have a distance of 2MM, the surface of the guiding column 13 is provided with a receiving groove 13-1, the number of the receiving groove 13-1 is equivalent to that of the feed inlet 11-1, which is used for receiving the photoresist or the diluent entering through the feed inlet 11-1, the surface of the guiding column 13 is fixed with an impact ring 14, the number of the impact ring 14 is multiple, which is equidistantly distributed on the surface of the guiding column 13, when the photoresist and the diluent fall in the mixing pipe 12, the photoresist and the diluent between the guiding column 13 and the spiral groove 12-1 can impact on the surface of the impact ring 14, through the guiding surface on the impact ring 14, the photoresist and the diluent can move into the spiral groove 12-1, thereby impacting the photoresist and the diluent in the spiral groove 12-1, so as to regulate the mixing effect of the photoresist and the diluent in each part, the bottom of the guiding column 13 is provided with a guiding cone 13-2, the mixing pipe 12 is provided with a collection groove 12-3, when the photoresist and the diluent fall in the mixing pipe 12 to the end below the spiral groove 12-1, through the setting of the guiding cone 13-2, the mixed photoresist and diluent can be collected in the collection groove 12-3, the bottom of the collection groove 12-3 is provided with a shunt groove 12-4, the number of the shunt groove 12-4 is three, and the included angle between the shunt grooves 12-4 is 120 degrees, the shunt groove 12-4 divides the mixed agent in the collection groove 12-3 into three parts.
[0039] The jet assembly 2 is arranged at the bottom of the mixing pipe 12, and comprises a jet pipe 21 fixed to the bottom of the mixing pipe 12, wherein a conveying channel 21-1 is arranged in the jet pipe 21, and the conveying channel 21-1 is arranged in three numbers and is arranged at an angle of 120 degrees with each other, and the conveying channel 21-1 is communicated with the flow distribution groove 12-4, and a jet disc 22 is fixed in the jet pipe 21, wherein a connecting groove 22-1 is arranged in the jet disc 22, and the connecting groove 22-1 is arranged in three numbers and is connected with the end of the three conveying channels 21-1 respectively, and the conveying channel 21-1 is communicated with the connecting groove 22-1, and a jet port 22-2 is arranged on one side of the connecting groove 22-1, and the jet port 22-2 is in a flat fan shape, and three jet ports 22-2 are arranged on the inner wall of the jet disc 22 in a circumferential uniform manner.
[0040] When the mixed agent is sprayed out of the jet port 22-2, the mixed agents sprayed out of the three jet ports 22-2 can collide with each other, and at this time, the three fluid streams with a flow rate greater than 2 m / s collide at high speed at the center of gravity of the cavity, and the local concentration uneven area is broken by the impact force.
[0041] The three high-speed jet beams collide and collide in the middle of the mixing cavity, tear and break the local high-concentration photoresist area or local high-concentration diluent area which originally “clusters” due to high viscosity, and break the agglomeration state of the components. Embodiment
[0042] Reference Figure 1 , Figure 2 , Figure 5 , Figure 6 , Figure 10 , Figure 11 , Figure 13 and Figure 14 , which is a second embodiment of the present application, and is based on the previous embodiment.
[0043] Specifically, the jet assembly 2 further comprises an adjusting piece 23 arranged in the jet disc 22, and the adjusting piece 23 comprises a blocking strip 231 sliding in the jet disc 22, and the blocking strip 231 can block the jet port 22-2, and in the current state shown in the figure, the blocking strip 231 does not block the jet port 22-2, and at this time, the jet port 22-2 has the largest opening, and by moving the blocking strip 231, part of the jet port 22-2 can be blocked, so that the jet port 22-2 is reduced, so as to increase the fluid pressure at the jet port 22-2, so that the fluid has a faster speed, and the blocking strip 231 is fixed with a connecting block 232 on one side, the connecting block 232 is fixed with a rotating disc 233 on the top, and the rotating disc 233 is circumferentially distributed with three connecting blocks 232 on the bottom.
[0044] When the proportion of photoresist increases, the viscosity of the mixed agent increases, and smaller jet port 22-2 is needed to generate sufficient jet impact force, so that the impact force breaks the local concentration uneven area of the mixed agent.
[0045] At this time, the rotating disc 233 can be rotated to drive the three connecting blocks 232 to move, thereby driving the three blocking strips 231 to move, so as to adjust the size of the jet port 22-2, thereby matching the mixed agent with different photoresin ratios, so that efficient and uniform mixing between the photoresin and the diluent is achieved, local concentration differences are completely eliminated, and finally a mixed photoresin with uniform components and stable performance is formed.
[0046] Conversely, if the photoresin ratio is low, that is, the viscosity of the mixed agent is low, a slightly larger jet port 22-2 can be selected, which can ensure that the jet impact force is sufficient to break the concentration uneven area, while avoiding the splashing of the photoresin and the generation of bubbles due to the high flow rate, wherein the bubbles can seriously affect the photoresin coating quality and the photoetching resolution.
[0047] By adjusting the size of the jet port 22-2 to adapt to different mixed systems with different photoresin ratios, the essence is to match the energy of the "jet counterattack" with the viscosity of the mixed system: 1. For a high-viscosity system, a high photoresin ratio, a strong counter-attack force caused by a small jet port can effectively overcome the high cohesion of the photoresin, avoiding "concentration dead angles" caused by insufficient mixing; 2. For a low-viscosity system, a low photoresin ratio, a jet port that is adapted can achieve rapid component diffusion through moderate counter-attack while avoiding bubbles.
[0048] Specifically, the jet assembly 2 further comprises a rotating member 24 arranged on the jet pipe 21, the rotating member 24 comprising a rotating shaft 241 fixed to the top of the rotating disc 233, the rotating shaft 241 being rotatably connected in the jet pipe 21, the surface of the rotating shaft 241 being fixed with a driving rod 242, the surface of the jet pipe 21 being provided with a moving groove 21-2, and the driving rod 242 sliding in the moving groove 21-2.
[0049] By moving the driving rod 242, the driving rod 242 can drive the rotating shaft 241 to rotate, thereby driving the rotating disc 233 to rotate, so as to adjust the size of the jet port 22-2.
[0050] Specifically, the rotating member 24 further comprises an adjusting ring 243 fixed to the end of the driving rod 242, the adjusting ring 243 being rotatably connected to the surface of the jet pipe 21, the surface of the jet pipe 21 being fixed with a supporting ring 244, the supporting ring 244 being located at the bottom of the adjusting ring 243, and the supporting ring 244 being used to support the adjusting ring 243, so that the adjusting ring 243 can be stably rotated.
[0051] By rotating the adjusting ring 243, the driving rod 242 can be driven to swing, thereby driving the rotating shaft 241 to rotate.
[0052] Specific, rotating member 24 further comprises a surface fixed scale bar 245, scale bar 245 marked with scale, support ring 244 surface is provided with a pointer 244-1, the pointer 244-1 is the scale of the jet port 22-2 opening angle, the support ring 244 surface is fixed with driving block 246, the number of driving block 246 is multiple, through the driving block 246, the support ring 244 is conveniently driven to rotate. Embodiment
[0053] Refer to Figures 1-14 For the third embodiment of the application, the embodiment is based on the first two embodiments.
[0054] Specific, jet assembly 2 further comprises a positioning member 25 arranged on the mixing pipe 12, the positioning member 25 comprises a sliding sleeve 251 sliding in the mixing pipe 12, the sliding sleeve 251 is provided with a compression spring 252, the compression spring 252 is currently in a compressed state, the top of the sliding sleeve 251 is located in the collection groove 12-3, when the collection groove 12-3 is pressed into the mixture of photoresist and diluent, the liquid pressure in the collection groove 12-3 increases, which can extrude the sliding sleeve 251, so that the sliding sleeve 251 moves downward, the connection between the sliding sleeve 251 and the mixing pipe 12 is sealed to prevent the mixture from entering.
[0055] Specific, the positioning member 25 further comprises a pressure rod 253 fixed to the surface of the sliding sleeve 251, the number of pressure rods 253 is two, the mixing pipe 12 is provided with a lifting groove 12-5, the pressure rod 253 slides in the lifting groove 12-5, when the sliding sleeve 251 moves downward, the two pressure rods 253 can be driven to move downward.
[0056] Specific, the positioning member 25 further comprises an extrusion block 254 fixed to the end of the pressure rod 253, the extrusion block 254 is located at the top of the adjusting ring 243, the bottom of the extrusion block 254 is provided with a friction plate, when the two pressure rods 253 move downward, the two extrusion blocks 254 can extrude the adjusting ring 243, so as to increase the friction between the friction plate and the adjusting ring 243, so that the adjusting ring 243 does not rotate at this time, preventing the adjusting ring 243 from rotating accidentally during the working process of the mixing device, so as to avoid the accidental change of the jet port 22-2.
[0057] Specific, the jet assembly 2 further comprises a shear pipe 26 fixed in the jet pipe 21, the shear pipe 26 is fixed with a honeycomb plate 27, the thickness of the honeycomb plate 27 is 5mm, the plate is uniformly distributed with 100 microchannels, the inner diameter of the channel is 500μm, arranged in a regular hexagon, the spacing is 1mm, the inner wall of each channel is processed with 3 groups of "interlaced ribs", wherein the rib height is 50μm, the spacing is 200μm, when the fluid passes, the "flow shear" is generated due to the rib blockage, which disperses the small agglomerates.
[0058] The shearing pipe 26 is provided with a contraction flow channel 26-1. The contraction flow channel 26-1 is from the honeycomb plate 27 to the outlet of the shearing pipe 26, and the inner diameter of the flow channel is gradually contracted, forming a "Venturi effect". The fluid is accelerated in the contraction process. The inner wall of the contraction flow channel 26-1 is fixed with a shearing rod 26-2. The number of the shearing rod 26-2 is multiple, and the shearing rod 26-2 is staggered to further enhance the shearing effect.
[0059] Specifically, the jet assembly 2 further comprises a discharge nozzle 28 fixed to the end of the jet pipe 21. The discharge nozzle 28 is in communication with the contraction flow channel 26-1, so that the uniformly mixed fluid is discharged through the discharge nozzle 28.
[0060] In summary, the present application has the following beneficial effects: 1. Multi-gradient precise proportioning: The four outer wide and inner narrow feed ports 11-1 of the connecting seat 11 can be connected with diluent / photoresist conveying pipelines, and the precise amount of feed is precisely controlled by cooperating with high-precision flow pumps in the pipelines, so that multi-gradient mixed photoresist with different diluent proportions is realized, and the deviation between the actual value and the set value of each gradient proportion is extremely small; 2. Multi-level efficient mixing: the spiral grooves 12-1 and the mixing grooves 12-2 on the inner wall of the mixing pipe 12 enable the fluid to rotate and fall while being cross-mixed, and the impact ring 14 of the guide column 13 guides the fluid to collide and strengthen the premixing; the jet disc 22 of the jet pipe 21 sprays three streams of fluid at a speed of >2m / s through the flat fan-shaped jet port 22-2, tears the fluid agglomerates, and further disperses the small agglomerates in the shearing pipe 26, and finally forms a mixed photoresist with uniform components, which meets the needs of all scenarios from high-precision thin photoresist to thick film photoetching.
[0061] 2. Strong adaptability and stable operation: 1. Dynamic adaptation to different viscosity systems: the adjusting member 23 of the jet assembly 2 cooperates with the rotating member 24, and the rotating adjusting ring 243 can be moved to change the size of the jet port 22-2 through the blocking strip 231. When the proportion of photoresist is high, the size of the jet port 22-2 is reduced to increase the impact force, and when the proportion of photoresist is low, the size of the jet port 22-2 is increased to avoid bubbles, so that different viscosity mixing systems can be adapted without replacing the module; 2. Stable and reliable operation parameters: the positioning member 25 of the mixing pipe 12 pushes the extrusion block 254 to press the adjusting ring 243 to lock the size of the jet port 22-2 when the pressure in the collection groove 12-3 increases during mixing, preventing the adjusting ring 243 from accidentally rotating to cause parameter drift of the jet port 22-2 during equipment operation, ensuring stable mixing process and meeting the requirements of semiconductor continuous production.
[0062] In use, when the photoresist needs to be diluted, the feed ports 11-1 and the pipelines for conveying various diluents or photoresist are connected, and different numbers of feed ports 11-1 are connected according to the proportioning requirements.
[0063] The diluent pipe and the photoresist pipe press the diluent and the photoresist into the connecting seat 11, and the photoresist and the diluent fall in the mixing pipe 12 through the feed port 11-1. The photoresist and the diluent rotate along the inner wall of the mixing pipe 12 when falling in the mixing pipe 12, and the mixing effect is enhanced by the arrangement of the spiral groove 12-1. The photoresist and the diluent in the adjacent two spiral grooves 12-1 are mixed by the mixing groove 12-2 during the rotation and falling of the photoresist and the diluent along the spiral groove 12-1. When the photoresist and the diluent fall to the end below the spiral groove 12-1 in the mixing pipe 12, the mixed photoresist and diluent are gathered in the collection groove 12-3 by the arrangement of the guide cone 13-2. The fluid in the collection groove 12-3 is divided into three by the distribution groove 12-4, and then sprayed from the three jet ports 22-2. When the mixed agent is sprayed from the jet ports 22-2, the mixed agents sprayed from the three jet ports 22-2 collide with each other. At this time, the three fluids with a flow rate greater than 2 m / s collide at high speed at the center of gravity of the cavity, and the local concentration uneven area is broken by the impact force.
[0064] After the collision, the fluid falls downward into the honeycomb plate 27 in the shearing pipe 26. The fluid is sheared by the honeycomb plate 27 and the "interlaced ribs" arranged in the honeycomb plate 27. When the fluid passes through the ribs, "flowing shear" is generated due to the obstruction of the ribs, which disperses the small agglomerates. The fluid continues to move and enters the converging flow channel 26-1 from the outlet of the honeycomb plate 27. The fluid is mixed again by multiple collisions through the arrangement of the shearing rod 26-2, so that the uniformly mixed fluid is discharged from the discharge nozzle 28.
[0065] If the photoresist accounts for a large proportion in the mixed agent, before adding the photoresist and the diluent into the mixing device, the adjustment ring 243 is rotated to make the pointer 244-1 at a suitable position of the scale bar 245. When the adjustment ring 243 is rotated, the driving rod 242 is swung to drive the rotating shaft 241 to rotate, which drives the rotating disc 233 to rotate, so that the rotating disc 233 drives the three connecting blocks 232 to move, thereby driving the three blocking bars 231 to move, so as to adjust the size of the jet port 22-2, thereby matching the mixed agent with different photoresist proportions, so that the photoresist and the diluent are efficiently and uniformly mixed, and the local concentration difference is completely eliminated, and finally the mixed photoresist solution with uniform components and stable performance is formed.
[0066] When the mixing device is working, the liquid pressure in the collecting groove 12-3 increases, which can press the sliding sleeve 251, so that the sliding sleeve 251 moves downward, the pressing rod 253 and the pressing block 254 are pressed downward, so that the friction between the adjusting ring 243 and the pressing block 254 increases, thereby positioning the adjusting ring 243, preventing the adjusting ring 243 from rotating accidentally during the working process of the mixing device, and avoiding the accidental change of the jet flow port 22-2.
[0067] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, not to limit the present application. Although the present application has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present application can be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present application, which should be covered in the scope of the claims of the present application.
Claims
1. A multi-channel semiconductor diluent gradient mixing device, characterized in that: include, The mixing component (1) includes a connecting seat (11), a feed inlet (11-1) is provided in the connecting seat (11), a mixing tube (12) is fixed at the bottom of the connecting seat (11), a spiral groove (12-1) is provided in the mixing tube (12), a mixing groove (12-2) is provided on one side of the spiral groove (12-1), a guide post (13) is fixed at the bottom of the connecting seat (11), a receiving groove (13-1) is provided on the surface of the guide post (13), an impact ring (14) is fixed on the surface of the guide post (13), a guide cone (13-2) is provided at the bottom of the guide post (13), a collection groove (12-3) is provided in the mixing tube (12), and a diversion groove (12-4) is provided at the bottom of the collection groove (12-3). The jet assembly (2) is disposed at the bottom of the mixing tube (12) and includes a jet tube (21) fixed at the bottom of the mixing tube (12). A conveying channel (21-1) is provided in the jet tube (21). The conveying channel (21-1) is connected to the diversion groove (12-4). A jet plate (22) is fixed in the jet tube (21). A connecting groove (22-1) is provided in the jet plate (22). The conveying channel (21-1) is connected to the connecting groove (22-1). A jet port (22-2) is provided on one side of the connecting groove (22-1).
2. The multi-channel semiconductor diluent gradient mixing device as described in claim 1, characterized in that: The jet assembly (2) further includes an adjusting member (23) disposed in the jet disk (22). The adjusting member (23) includes a baffle (231) that slides in the jet disk (22). A connecting block (232) is fixed on one side of the baffle (231), and a rotating disk (233) is fixed on the top of the connecting block (232).
3. The multi-channel semiconductor diluent gradient mixing device as described in claim 2, characterized in that: The jet assembly (2) further includes a rotating component (24) disposed on the jet tube (21). The rotating component (24) includes a rotating shaft (241) fixed to the top of the rotating disk (233). A driving rod (242) is fixed on the surface of the rotating shaft (241). A moving groove (21-2) is opened on the surface of the jet tube (21). The driving rod (242) slides in the moving groove (21-2).
4. The multi-channel semiconductor diluent gradient mixing device as described in claim 3, characterized in that: The rotating component (24) also includes an adjusting ring (243) fixed to the end of the drive rod (242). The adjusting ring (243) is rotatably connected to the surface of the jet tube (21). A support ring (244) is fixed to the surface of the jet tube (21). The support ring (244) is located at the bottom of the adjusting ring (243).
5. The multi-channel semiconductor diluent gradient mixing device as described in claim 4, characterized in that: The rotating component (24) also includes a scale bar (245) fixed on the surface of the jet tube (21), a pointer (244-1) is provided on the surface of the support ring (244), and a driving block (246) is fixed on the surface of the support ring (244).
6. The multi-channel semiconductor diluent gradient mixing apparatus as described in claim 5, characterized in that: The jet assembly (2) further includes a positioning element (25) disposed on the mixing tube (12). The positioning element (25) includes a sliding sleeve (251) that slides within the mixing tube (12). A compression spring (252) is disposed within the sliding sleeve (251). The top of the sliding sleeve (251) is located within the collecting groove (12-3).
7. The multi-channel semiconductor diluent gradient mixing apparatus as described in claim 6, characterized in that: The positioning component (25) also includes a pressure rod (253) fixed to the surface of the sliding sleeve (251). A lifting groove (12-5) is provided in the mixing tube (12), and the pressure rod (253) slides in the lifting groove (12-5).
8. The multi-channel semiconductor diluent gradient mixing apparatus as described in claim 7, characterized in that: The positioning component (25) also includes a pressing block (254) fixed to the end of the pressure rod (253). The pressing block (254) is located at the top of the adjusting ring (243), and a friction plate is provided at the bottom of the pressing block (254).
9. The multi-channel semiconductor diluent gradient mixing apparatus as described in claim 1 or 8, characterized in that: The jet assembly (2) also includes a shear tube (26) fixed inside the jet tube (21), a honeycomb plate (27) is fixed inside the shear tube (26), a contraction channel (26-1) is opened inside the shear tube (26), and a shear rod (26-2) is fixed on the inner wall of the contraction channel (26-1).
10. The multi-channel semiconductor diluent gradient mixing apparatus as described in claim 9, characterized in that: The jet assembly (2) also includes a discharge nozzle (28) fixed to the end of the jet tube (21), and the discharge nozzle (28) is connected to the contraction channel (26-1).