Optical communication optical filter coating system and coating method

Abstract

The invention relates to the technical field of optical filter coating, in particular to an optical communication optical filter coating system and a coating method. By arranging the double-light-path monitoring assembly and the monitoring system, film thickness dynamic monitoring can be conducted on spraying areas of two materials in the film coating process, the postures of the two correction baffles are adjusted and controlled in real time according to the film thickness monitoring result, the film coating thickness of the optical filter is corrected in real time, films in the two monitoring areas are distributed consistently, and the film coating quality is improved. The optical thickness difference of the two materials is reduced, the area of a spectrum qualified area of the optical filter is increased, and the central wavelength change rate of the optical filter is reduced. The two auxiliary ion sources are adopted to improve the uniformity of the ion bombardment density while improving the ion bombardment density, and the radio frequency ion source is adopted to select low ion bombardment energy, improve the isotropy of the thin film, reduce the defects of the thin film and reduce the stress of the thin film. The L material electron gun and the H material electron gun are symmetrical on the two sides of the connecting line of the double ion sources, and normal work of the ion sources is not affected.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of filter coating, in particular to a kind of optical communication filter coating system and coating method. BACKGROUND

[0002] For optical communication filter, current coating product shows that film surface is arched to air, and common coating equipment generally adopts ion-assisted coating process, usually equipped with two electron guns and an ion source, and two electron guns evaporate H material and L material respectively.

[0003] However, the optical thickness difference of the current coating product of two materials is often too large, which not only leads to uneven thickness of the filter as a whole, but also reduces the qualified area of the filter spectrum, reduces the quality of the coating product, increases the failure rate of the coating product, and further increases the coating cost.

[0004] Therefore, it is crucial to timely correct the coating thickness of two materials during the coating process. However, the prior art does not have a coating equipment that can correct the coating thickness of two materials in real time during the coating process of the filter. SUMMARY

[0005] The purpose of the present application is to provide a new type of optical communication filter coating system and coating method, which can dynamically monitor the film thickness of the spraying area of two materials during the coating process, and real-time adjust and correct the attitude of the baffle according to the film thickness monitoring result, realize real-time correction of the coating thickness of the filter, reduce the optical thickness difference of the coating product of two materials, improve the quality and consistency of the coating product, and solve the problems existing in the prior art.

[0006] To achieve the above purpose, the present application provides the following scheme: The present application provides an optical communication filter coating system, comprising a vacuum coating chamber, a coating umbrella rotatably arranged at the top of the vacuum coating chamber, a revolution motor for driving the coating umbrella to rotate in situ, two electron guns arranged in the vacuum coating chamber, and an ion source arranged in the vacuum coating chamber, wherein the two electron guns are used to evaporate H material and L material respectively, and further comprising: A first correction baffle is installed in the vacuum coating chamber by a first attitude adjusting mechanism and located between the H material electron gun and the coating umbrella, and the first attitude adjusting mechanism can adjust the attitude of the first correction baffle to control the distribution uniformity of H material on the coating umbrella. A second correction baffle is installed in the vacuum coating chamber by a second attitude adjusting mechanism and located between the L material electron gun and the coating umbrella, and the second attitude adjusting mechanism can adjust the attitude of the second correction baffle to control the distribution uniformity of L material on the coating umbrella. A third correction shield is arranged in the vacuum coating chamber and is located below the coating umbrella, and the third correction shield is located between the first correction shield and the second correction shield. The double optical path monitoring assembly includes two groups of monitoring light paths, each of which includes a light source and a collimating mirror, a monochromator and an amplifier box arranged in sequence along the light source exit path, and the light sources of the two groups of monitoring light paths are fixedly arranged on the top surface of the third correction shield and are arranged in a radial direction of the coating umbrella to respectively provide spectrum to two monitoring areas of the substrate on the coating umbrella; the collimating mirror is arranged at the top of the vacuum coating chamber and is used to receive light transmitted through the substrate from the corresponding light source and sequentially transmit the light to the monochromator and the amplifier box. The monitoring system includes a collection system and a control terminal, the collection system is in communication connection with the amplifier boxes of the two groups of monitoring light paths, the control terminal is in communication connection with the collection system, the first attitude adjusting mechanism and the second attitude adjusting mechanism, and the control terminal can adjust the attitude of the first correction shield and / or the second correction shield according to the difference in film transmittance of different monitoring areas collected by the two groups of monitoring light paths, so as to make the film thickness of the substrate on the coating umbrella uniform.

[0007] In some embodiments, the monitoring system further includes a revolution sensor arranged on the revolution motor for monitoring the output rotation speed of the revolution motor. The collection system is in communication connection with the revolution sensor, and the control terminal is in communication connection with the revolution motor, so as to adjust the output rotation speed of the revolution motor according to the difference in film transmittance of different monitoring areas collected by the two groups of monitoring light paths.

[0008] In some embodiments, the control terminal is a computer.

[0009] In some embodiments, the monochromator and the corresponding collimating mirror are electrically connected through an optical fiber, and the monochromator and the corresponding amplifier box are electrically connected through a signal line.

[0010] In some embodiments, the first attitude adjusting mechanism and the second attitude adjusting mechanism are respectively a first motor and a second motor, and the first motor and the second motor are respectively fixed to two inner side walls of the vacuum coating chamber.

[0011] In some embodiments, the output end axis of the first motor is horizontal, and the first correction shield is fixed to the output end of the first motor.

[0012] In some embodiments, the second motor is symmetrically arranged with the first motor, and an output end axis of the second motor is coaxial with an output end axis of the first motor, and the second correction baffle is fixed to the output end of the second motor.

[0013] In some embodiments, two ion sources are symmetrically arranged, the H-material electron gun and the L-material electron gun are symmetrically arranged on two sides of the two ion sources in line, and material exit ends of the H-material electron gun and the L-material electron gun are arranged opposite to each other.

[0014] In some embodiments, two ion sources are symmetrically arranged, the H-material electron gun and the L-material electron gun are symmetrically arranged on two sides of the two ion sources in line, and material exit ends of the H-material electron gun and the L-material electron gun are arranged opposite to each other.

[0015] In some embodiments, any one of the ion sources is a radio frequency ion source.

[0016] The application further provides an optical communication filter coating method implemented by using the optical communication filter coating system. During the coating process, the two groups of monitoring light paths are used to monitor the film transmittance of the two monitoring areas of the substrate on the coating umbrella in real time; The control terminal adjusts the posture of the first correction baffle and / or the second correction baffle according to the film transmittance difference of the different monitoring areas collected by the two groups of monitoring light paths, so as to make the coating thickness of the substrate on the coating umbrella uniform.

[0017] The application has the following technical effects compared with the prior art: The optical communication filter coating system has a novel and reasonable structure, and the double light path monitoring assembly and the monitoring system are arranged, so that the film thickness of the two material spraying areas can be dynamically monitored during the coating process, and the posture of the two correction baffles can be adjusted in real time according to the film thickness monitoring result, so that the filter coating thickness can be corrected in real time. The film thickness between the two monitoring areas of the substrate on the coating umbrella is monitored by the double light path monitoring assembly, so that the film distribution of the two monitoring areas is consistent, the optical thickness difference between the two materials is reduced, the area of the qualified region of the filter spectrum is increased, the central wavelength change rate of the filter is reduced, the coating output is improved, and the cost is reduced.

[0018] In some technical solutions of this invention, two auxiliary ion sources are used to increase the ion bombardment density and improve the uniformity of the ion bombardment density, especially increasing the bombardment intensity of the outer ring of the coating umbrella, thereby increasing the film layer filling density and improving long-term stability. At the same time, by using a radio frequency ion source, a lower ion bombardment energy can be selected, which can improve the isotropy of the film, reduce the appearance of crystallized particles in the film, thereby reducing the generation of film defects and reducing film stress.

[0019] In some technical solutions of this invention, the L-material electron gun and the H-material electron gun are symmetrical on both sides of the line connecting the two ion sources. When the electron gun is working, the interference to the ion source is minimized. The ion beam emitted by the electron gun is absorbed by the side wall of the coating chamber, which does not affect the normal operation of the ion source and can further ensure the coating quality. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the front cross-sectional structure of the optical communication filter coating system disclosed in an embodiment of the present invention; Figure 2 This is a top view of the H-material electron gun and L-material electron gun arranged back-to-back in the optical communication filter coating system disclosed in an embodiment of the present invention. Figure 3 This is a top view of the H-material electron gun and L-material electron gun arranged facing each other in the optical communication filter coating system disclosed in the embodiment of the present invention; Figure 4 for Figure 3 Left side view; Figure 5 This is a side view cross-sectional structural diagram of the optical communication filter coating system disclosed in an embodiment of the present invention.

[0022] In the figure, the reference numeral is: 100 - Optical communication filter coating system; 1-Vacuum coating chamber; 2-Coated umbrella; 3- Revolutionary motor; 4-H material electron gun; 5-L material electron gun; 6-First correction baffle; 7-First attitude adjustment mechanism; 8-Second correction baffle; 9-Second attitude adjustment mechanism; 10 - monitoring light path; 101 - light source; 102 - collimator; 103 - monochromator; 104 - amplifier box; 105 - optical fiber; 106 - signal line; 107 - photodiode box; 11 - acquisition system; 12 - control terminal; 13 - revolving inductor; 14 - first ion source; 15 - second ion source; 16 - third correction shield. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0024] The purpose of the present application is to provide a novel optical communication filter coating system and coating method, which can dynamically monitor the film thickness of the spraying area of two materials during the coating process, and real-time adjust the posture of the correction shield according to the film thickness monitoring result, realize real-time correction of the filter film thickness, reduce the optical thickness difference of the two materials of the coated product, improve the quality and consistency of the coated product, and solve the problems existing in the prior art.

[0025] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the present application will be further described in detail below with reference to the drawings and specific embodiments.

[0026] As shown in the drawings, Figure 1 The present embodiment provides an optical communication filter coating system 100, which comprises a vacuum coating chamber 1, a coating umbrella 2 rotatably arranged at the top of the vacuum coating chamber 1, a revolution motor 3 for driving the coating umbrella 2 to rotate in situ, two electron guns arranged in the vacuum coating chamber 1, and an ion source arranged in the vacuum coating chamber 1. The two electron guns are an H material electron gun 4 for evaporating H material and an L material electron gun 5 for evaporating L material. The vacuum coating chamber 1, the coating umbrella 2, the revolution motor 3, the H material electron gun 4 and the L material electron gun 5 are all well-known devices in the field of filter coating, and the specific structure and assembly method are all referred to the prior art, which will not be described here.

[0027] The optical communication filter coating system 100 further comprises a first correction baffle 6, a second correction baffle 8, a third correction baffle 16, a double optical path monitoring assembly and a monitoring system. The first correction baffle 6 is installed in the vacuum coating chamber 1 through a first attitude adjusting mechanism 7 and is located between the H material electron gun 4 and the coating umbrella 2, i.e. the first correction baffle 6 is located above the H material electron gun 4 and below the coating umbrella 2. The first attitude adjusting mechanism 7 is fixed to the side wall of the vacuum coating chamber 1 and can adjust the attitude of the first correction baffle 6 to control the uniformity of the distribution of H material on the coating umbrella 2. The second correction baffle 8 is installed in the vacuum coating chamber 1 through a second attitude adjusting mechanism 9 and is located between the L material electron gun 5 and the coating umbrella 2, i.e. the second correction baffle 8 is located above the L material electron gun 5 and below the coating umbrella 2. The second attitude adjusting mechanism 9 is fixed to the side wall of the vacuum coating chamber 1 and can adjust the attitude of the second correction baffle 8 to control the uniformity of the distribution of L material on the coating umbrella 2. The third correction baffle 16 is located below the coating umbrella 2 in the vacuum coating chamber 1, as shown in Figure 1 Fig. 2. The third correction baffle 16 is located between the first correction baffle 6 and the second correction baffle 8, and the radial middle line of the third correction baffle 16 is located in the central axial plane of the vacuum coating chamber 1 (the first correction baffle 6 and the second correction baffle 8 are symmetrically arranged about the central axial plane). The axis of the coating umbrella 2 is also located in the central axial plane. The double optical path monitoring assembly comprises two groups of monitoring optical paths 10 which are identical. Each group of monitoring optical paths 10 comprises a light source 101 and a collimating mirror 102, a monochromator 103 and an amplifier box 104 which are arranged in sequence along the light source exit path. The light sources 101 of the two groups of monitoring optical paths 10 are fixedly arranged on the top surface of the third correction baffle 16, and the light sources 101 are located in the central axial plane of the vacuum coating chamber 1. Figure 5As shown, the light sources 101 of the two sets of monitoring light paths 10 are arranged along the radial direction of the coated umbrella 2 to respectively provide spectrum to the two monitoring areas of the substrate on the coated umbrella 2; the light sources 101 can be bulb light sources or laser light sources; the collimating mirrors 102 of the two sets of monitoring light paths 10 are arranged at the top of the vacuum coating chamber 1 and are respectively aligned with the two light sources 101, the collimating mirror 102 is used to receive the light transmitted through the substrate by the corresponding light source 101 and sequentially transmit the light to the monochromator 103 and the amplifier box 104, wherein the incident end of the monochromator 103 is electrically connected to the corresponding collimating mirror 102 through the optical fiber 105, the exit end of the monochromator 103 is electrically connected to the corresponding amplifier box 104 through the signal line 106, and the collimating mirror 102 converges the light emitted by the light source into the optical fiber 105; the optical fiber 105 conducts the light to the entrance slit of the monochromator 103, and the exit end of the monochromator 103 is provided with a photodiode box 107, the monochromator 103 filters out monochromatic light of the required wavelength from the spectrum, the photodiode box 107 receives the monochromatic light to generate a photocurrent, and the amplifier box 104 amplifies the voltage signal output after the photocurrent. The monitoring system comprises a collection system 11 and a control terminal 12, the collection system 11 is in communication connection with the amplifier boxes 104 of the two sets of monitoring light paths 10, the communication connection can be wireless communication or wired communication through signal lines, and the collection system 11 is mainly used to receive the film transmittance monitoring values (i.e. the voltage signals) of the two monitoring areas monitored by the two sets of monitoring light paths 10, and the collection system 11 can convert the film transmittance monitoring values (i.e. the voltage signals) into digital signals that can be processed by a computer after analog-digital conversion; the control terminal 12 is in communication connection with the collection system 11, the first attitude adjusting mechanism 7 and the second attitude adjusting mechanism 9, and the control terminal 12 can adjust the attitude of at least one of the first correction baffle 6 and the second correction baffle 8 according to the film transmittance difference of the different monitoring areas collected by the two sets of monitoring light paths 10, so that the film thickness of the substrate on the coated umbrella 2 is uniform.

[0028] The revolution motor 3 is arranged at the top center of the vacuum coating chamber 1, the output end thereof faces downward and is connected with the coated umbrella 2 to drive the coated umbrella 2 to rotate. The coated umbrella 2 is a mature prior art, which can be a planar disc or an arc umbrella. Figure 1 As shown, it is a structural schematic view of the arc umbrella used for the coated umbrella 2.

[0029] In some feasible implementations, to improve the accuracy of coating thickness correction, a revolution sensor 13 is also installed in the monitoring system. The revolution sensor 13 is mounted on the revolution motor 3 and is used to monitor the output speed of the revolution motor 3 in real time. The acquisition system 11 is communicatively connected to the revolution sensor 13, and the control terminal 12 is communicatively connected to the revolution motor 3. The control terminal 12 can adjust the output speed of the revolution motor 3 according to the difference in film transmittance in different monitoring areas acquired by the two sets of monitoring optical paths 10. This coordinated control of the output speed of the revolution motor 3, the first attitude adjustment mechanism 7, and the second attitude adjustment mechanism 9 ensures the accuracy of coating thickness correction. The revolution sensor 13 may include, but is not limited to, existing mature components such as encoders, which will not be elaborated further.

[0030] In some feasible implementations, the control terminal 12 includes, but is not limited to, a computer configured with relevant software that can acquire and process the output value of the amplifier box 104. This is prior art and will not be described in detail here.

[0031] In some feasible implementations, the first attitude adjustment mechanism 7 and the second attitude adjustment mechanism 9 include, but are not limited to, two-dimensional slides, three-dimensional slides, robotic arms, or motors. Taking the preferred use of motors for both the first attitude adjustment mechanism 7 and the second attitude adjustment mechanism 9 as an example, the first attitude adjustment mechanism 7 and the second attitude adjustment mechanism 9 are respectively a first motor and a second motor, and the first motor and the second motor are respectively fixed to the two inner sidewalls of the vacuum coating chamber 1. Figure 1 As shown, the output shafts of the first and second motors are arranged coaxially opposite each other, and are fixed to the inner wall of the vacuum coating chamber 1 by bolts, motor mounts, etc. Figure 1 As shown, the output axis of the first motor is horizontal, and the first correction baffle 6 is fixed to the output end of the first motor and can rotate synchronously with the output shaft of the first motor. The connection and fixing methods between the first correction baffle 6 and the output shaft of the first motor include, but are not limited to, welding, bonding, and clamping. The output axis of the second motor is coaxial with the output axis of the first motor, and the second correction baffle 8 is fixed to the output end of the second motor and can rotate synchronously with the output shaft of the second motor. The connection and fixing methods between the second correction baffle 8 and the output shaft of the second motor include, but are not limited to, welding, bonding, and clamping.

[0032] In other embodiments, the first motor and the second motor may be respectively disposed on the two outer side walls of the vacuum coating chamber 1, and the output shafts of the first motor and the second motor respectively extend into the vacuum coating chamber 1 through the side walls of the vacuum coating chamber 1. It should be noted that sealing rings are provided at the positions where the output shafts of the first motor and the second motor penetrate the side walls of the vacuum coating chamber 1 to ensure the airtightness of the vacuum coating chamber 1.

[0033] In other embodiments, the output shafts of the first motor and the second motor, in addition to the following: Figure 1The coaxial arrangement shown can also be a parallel arrangement, in which case the first motor and the second motor respectively drive the first correction baffle 6 and the second correction baffle 8 to flip up and down.

[0034] The optical communication filter coating method implemented by the optical communication filter coating system 100 is as follows: During the coating process, the two groups of monitoring light paths 10 respectively monitor the film transmittance of the two monitoring areas of the substrate on the coating umbrella in real time; the control terminal 12 adjusts the posture of the first correction baffle 6 and / or the second correction baffle 8 and the linear velocity of the revolution of the coating umbrella 2 according to the film transmittance difference of different monitoring areas collected by the two groups of monitoring light paths 10, so that the film thickness of the substrate on the coating umbrella is uniform.

[0035] The first correction baffle 6 and the second correction baffle 8 are respectively arranged above the two electron guns, which can effectively correct the uniform distribution of the HL material on the coating umbrella.

[0036] Due to the different evaporation distribution of the HL material by the two electron guns and the different linear velocity of the revolution of the coating umbrella at different positions, the correction shape and the correction degree of the correction baffles on the coating are also different.

[0037] Suppose that the film thickness uniformity on the coating umbrella is corrected by the encoder position N of the first motor (or the second motor), and the film thickness uniformity from the inside to the outside is consistent, at this time the transmittance value and the change obtained on the double light path are consistent; but as long as the correction baffle is rotated and the encoder position of the first motor (or the second motor) is changed to N+k or N-k, the film thickness distribution on the coating umbrella will appear difference, and the transmittance value and the change rate monitored on the double light path will also appear difference.

[0038] Under the same evaporation conditions, the film thickness distribution of the two positions N+k and N-k can be made to have opposite distribution characteristics, so that the respective change values of the transmittance of the double light paths can be monitored, and the first motor (or the second motor) can be continuously adjusted to the size of the N value centered on the encoder N position, and the film thickness distribution of the two monitoring points can be dynamically adjusted and the thickness of the two points can be kept consistent.

[0039] Embodiment 2 The film stress has an adverse effect on the application of many optical films. The stress of the film mainly comes from thermal stress and defect type tensile stress caused by Si-O bond rupture due to excessive auxiliary ion bombardment energy during film forming process. For optical communication filters, the current coated film product is arched to the air, which is tensile stress. The thicker the film layer is, the greater the tensile stress is. For the application occasions where the filter coating and the prism surface are mutually attached, the smaller the tensile stress is, the higher the yield of attachment is. The current filter coating stress is generally large. Therefore, in addition to ensuring the uniformity of the coating thickness, how to reduce the tensile stress of the entire film system, reduce the arch degree of the film surface and improve the flatness of the film surface is also the key to ensure the coating quality.

[0040] Based on this, two ion sources, first ion source 14 and second ion source 15, are symmetrically arranged in the vacuum coating chamber 1 based on the embodiment 1.

[0041] The present application is an ion assisted coating process. The electron beam heats the coating material, evaporates into film gas, and the ion source bombards the film particles on the substrate on the coating umbrella to make the film material more dense. The traditional single ion source assisted deposition mainly has the defects of few ions, uneven ion bombardment density, but high ion bombardment energy. For example, in the OTFc-1300 equipment of Japan Guangchi, the energy of a single ion source is about 1200eV, and the beam current is about 900mA (corresponding to ion density per square centimeter: 90uA / cm 2 ). The high ion energy is the main defect, which makes the film layer dense, and the problem is that the film has many defects and high stress. The first ion source 14 and the second ion source 15 are symmetrically arranged in the present scheme, which can bombard together through the two ion sources, the ion bombardment is uniform, and the bombardment density can be doubled compared with the single ion source. At the same time, each ion source adopts a radio frequency ion source, and the ion energy of the radio frequency ion source can be adjusted in a wide range of 150eV-1200eV, which is convenient for matching the lower and optimal ion bombardment parameters to adapt to the bombardment mode of the double ion sources. For example, the bombardment energy of each ion source is set to 250eV-1000eV, which can reduce the ion bombardment energy, reduce the internal defects of the film and reduce the stress on the premise of ensuring the high filling density of the film.

[0042] The single ion source is insufficient for bombarding the outer circle of the substrate on the coating umbrella, resulting in a large difference in material refractive index and filling density between other parts of the umbrella. The double radio frequency ion source bombardment can make up for this difference, increase the uniformity of ion bombardment on the substrate on the coating umbrella, improve the uniformity of the coating, especially increase the bombardment intensity of the outer circle of the coating umbrella, improve the filling density of the film layer and improve the long-term stability. At the same time, the ion bombardment energy of each ion source can be reduced, the isotropy of the film can be improved, the crystallization particles in the film can be reduced, the generation of film defects can be reduced, and the film stress can be reduced.

[0043] The combination of the dual-radio frequency ion source can be used in a large-diameter vacuum coating machine, and helps to increase the number of substrates that can be coated at one time and improve the coating efficiency.

[0044] Embodiment 3 Based on the arrangement of the dual-radio frequency ion source in Embodiment 2, as shown in Figure 2 , the H-material electron gun 4 and the L-material electron gun 5 are symmetrically arranged on the two sides of the two ion source connecting lines, and the material exit ends of the H-material electron gun 4 and the L-material electron gun 5 are arranged opposite to each other.

[0045] This design minimizes the interference between the electron guns and the dual ion source, and can ensure the stable operation of the dual ion source. Compared with the prior art, the two electron guns are rotated by 90 degrees outward in the present application, and the arrangement of the dual-radio frequency ion source can effectively ensure the coating efficiency and coating quality of the deposited low-stress thin film.

[0046] When the H-material electron gun 4 and the L-material electron gun 5 are working, the interference with the ion source is minimized, and the ion beams emitted by the electron guns are absorbed by the side walls of the coating chamber, without affecting the normal operation of the ion source.

[0047] Embodiment 4 As shown in Figure 3 and Figure 4 , the difference between this embodiment and Embodiment 3 is that the material exit ends of the H-material electron gun 4 and the L-material electron gun 5 are arranged opposite to each other, and the material exit ends of the H-material electron gun 4 and the L-material electron gun 5 partially overlap in the height direction.

[0048] The arrangement of the dual electron guns and the dual ion source in this scheme is basically the same as that in Embodiment 3, and will not be described here.

[0049] In summary, the optical communication filter coating system 100 proposed in the present scheme mainly has the following beneficial effects: (1) The dual optical path monitoring assembly is used to monitor the film thickness between the two monitoring areas of the coated substrate, which can make the film distribution of the two monitoring areas consistent, reduce the optical thickness difference of the two materials, increase the area of the qualified region of the filter spectrum, reduce the center wavelength variation rate of the filter, improve the coating output, and reduce the cost.

[0050] (2) Two auxiliary ion sources are used to improve the ion bombardment density and uniformity, especially to increase the bombardment intensity of the outer circle of the coated umbrella, improve the film layer filling density, and improve the long-term stability. At the same time, the radio frequency ion source can be selected to have a lower ion bombardment energy, which can improve the isotropy of the thin film, reduce the occurrence of crystallized particles in the thin film, thereby reducing the generation of defects in the thin film, and reducing the stress of the thin film.

[0051] (3) L material electron gun and H material electron gun are symmetrical on both sides of the connection line of the double ion source, the interference of the electron gun to the ion source is minimum when the electron gun works, the ion beam emitted by the electron gun is absorbed by the side wall of the coating chamber, the normal work of the ion source is not affected, the coating quality can be further ensured.

[0052] It is to be understood that the structures, proportions, sizes and the like shown in the drawings of the present specification are merely used to cooperate with the content disclosed in the present specification, to be understood and read by those skilled in the art, and are not used to limit the conditions of the implementation of the present application, and therefore do not have substantial technical significance, any modification of the structure, change of the proportional relationship or adjustment of the size, without affecting the effects and purposes that can be achieved by the present application, should still fall within the scope of the technical content disclosed by the present application. Meanwhile, the terms such as "upper", "lower", "left", "right", "middle" and "one" and the like in the present specification are only used for clear description, and are not used to limit the scope of the implementation of the present application, the change or adjustment of the relative relationship, without substantial change of the technical content, is also regarded as the implementation range of the present application.

[0053] The principles and implementation modes of the present application are described by using specific examples in the present application, the above description of the examples is only used to help understand the method of the present application and its core idea; meanwhile, for those skilled in the art, according to the idea of the present application, the specific implementation mode and application range will also have changes. In summary, the content of the present specification should not be understood as a limitation of the present application.

Claims

1. An optical communication filter coating system, comprising a vacuum coating chamber, a coating umbrella rotatably arranged at the top of the vacuum coating chamber, a revolution motor for driving the coating umbrella to rotate in situ, two electron guns arranged in the vacuum coating chamber, and an ion source arranged in the vacuum coating chamber, the two electron guns being respectively used for evaporating H material and L material, characterized in that, Also include: The first correction baffle is installed in the vacuum coating chamber by a first attitude adjusting mechanism, and is located between the H material electron gun and the coating umbrella. The first attitude adjusting mechanism can adjust the attitude of the first correction baffle to control the uniformity of the distribution of H material on the coating umbrella. The second correction baffle is installed in the vacuum coating chamber by a second attitude adjusting mechanism, and is located between the L material electron gun and the coating umbrella. The second attitude adjusting mechanism can adjust the attitude of the second correction baffle to control the uniformity of the distribution of L material on the coating umbrella. The third correction baffle is arranged in the vacuum coating chamber and below the coating umbrella. The third correction baffle is located between the first correction baffle and the second correction baffle. The double optical path monitoring assembly includes two groups of monitoring light paths. Any one of the monitoring light paths includes a light source and a collimating mirror, a monochromator and an amplifier box arranged in sequence along the light source exit path. The light sources of the two groups of monitoring light paths are fixedly arranged on the top surface of the third correction baffle, and the light sources of the two groups of monitoring light paths are arranged in a radial direction of the coating umbrella to respectively provide spectrum to two monitoring areas of the substrate on the coating umbrella. The collimating mirror is arranged on the top of the vacuum coating chamber to receive light transmitted through the substrate from the corresponding light source, and sequentially transmit the light to the monochromator and the amplifier box. The monitoring system includes a collection system and a control terminal. The collection system is in communication connection with the amplifier boxes of the two groups of monitoring light paths. The control terminal is in communication connection with the collection system, the first attitude adjusting mechanism and the second attitude adjusting mechanism. The control terminal can adjust the attitude of the first correction baffle and / or the second correction baffle according to the difference in film transmittance of different monitoring areas collected by the two groups of monitoring light paths, so as to make the film thickness of the substrate on the coating umbrella uniform.

2. The optical communication filter coating system of claim 1, wherein, The monitoring system further includes a revolution sensor arranged on the revolution motor for monitoring the output speed of the revolution motor. The collection system is in communication connection with the revolution sensor, and the control terminal is in communication connection with the revolution motor, so as to adjust the output speed of the revolution motor according to the difference in film transmittance of different monitoring areas collected by the two groups of monitoring light paths.

3. The optical communication filter coating system of claim 2, wherein, The control terminal is a computer.

4. The optical communication filter coating system of claim 2, wherein, The monochromator is electrically connected to the corresponding collimating mirror through an optical fiber, and is electrically connected to the corresponding amplifier box through a signal line.

5. The optical communication filter coating system according to any one of claims 1 to 4, wherein The first attitude adjusting mechanism and the second attitude adjusting mechanism are respectively a first motor and a second motor. The first motor and the second motor are respectively fixed to the two inner side walls of the vacuum coating chamber.

6. The optical communication filter coating system of claim 5, wherein, The output end axis of the first motor is horizontal, and the first correction baffle is fixed to the output end of the first motor.

7. The optical communication filter coating system of claim 6, wherein, The second motor is symmetrically arranged with the first motor, and the output end axis of the second motor is coaxial with the output end axis of the first motor. The second correction baffle is fixed to the output end of the second motor.

8. The optical communication filter coating system of claim 2, wherein, The two ion sources are symmetrically arranged, the H-material electron gun and the L-material electron gun are symmetrically arranged on both sides of the connection line of the two ion sources, and the material exit ends of the H-material electron gun and the L-material electron gun are arranged oppositely or oppositely.

9. The optical communication filter coating system of claim 8, wherein, Any one of the ion sources is a radio frequency ion source.

10. The method for coating optical communication filter according to any one of claims 1-9, wherein, Comprise: During the coating process, the two groups of monitoring light paths are used to monitor the film transmittance of the two monitoring areas of the substrate on the coating umbrella in real time; The control terminal adjusts the posture of the first correction baffle and / or the second correction baffle according to the film transmittance difference of different monitoring areas collected by the two groups of monitoring light paths, so that the coating thickness of the substrate on the coating umbrella is uniform.

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