Substrate adjusting device and evaporation machine

Abstract

The application relates to the field of evaporation technology, and provides a substrate adjusting device and an evaporation machine.The substrate adjusting device comprises a supporting assembly, a fine adjustment platform, a lifting mechanism and a second lifting rod.The supporting assembly comprises a supporting frame and a supporting plate arranged on the supporting frame, the supporting plate is used for supporting a substrate, the fine adjustment platform is used for finely adjusting the position of the substrate, the lifting mechanism comprises a first lifting rod and a connecting rod mechanism, the first lifting rod is in transmission connection with the fine adjustment platform through the connecting rod mechanism, the connecting rod mechanism is in rotation connection with the supporting frame, and the second lifting rod is fixedly connected with the supporting frame, so that the supporting frame and the fine adjustment platform are relatively swung to adjust the relative position of the supporting plate and the fine adjustment platform by driving the first lifting rod and the second lifting rod to lift respectively.The stable switching of the supporting state and the fine adjustment state is realized through the cooperation of the connecting rod mechanism and the lifting rod, the motion control difficulty is reduced, the position adjusting stability is improved, and the alignment precision of the substrate and a mask plate is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of evaporation, in particular to a substrate adjusting device and an evaporation machine. BACKGROUND

[0002] A substrate and a mask plate are usually arranged in the vacuum chamber of an evaporation machine, and both need to meet specific alignment accuracy requirements, so the position of the substrate needs to be adjusted. CN119082665A discloses an evaporation machine alignment system, which uses multiple motors to drive a three-axis translation and rotation platform to complete displacement and rotation actions, thereby driving the base and the suction cup below to realize position adjustment of the glass substrate. However, heat is generated during motor operation, and the closed environment of the vacuum chamber cannot effectively dissipate heat, so the position adjustment device needs to be arranged outside the vacuum chamber as a whole, and the actuator in the vacuum chamber is driven by the motor to complete the position adjustment. In this way, not only will the movement accuracy of the position adjustment be reduced, but also the difficulty of motion control will be significantly increased under heavy load conditions. SUMMARY

[0003] The present application aims to improve at least one technical problem in the background art.

[0004] The present application provides a substrate adjusting device, which comprises a support assembly, a fine movement platform, a lifting mechanism and a second lifting rod;

[0005] The support assembly comprises a supporting frame and a supporting plate arranged on the supporting frame, and the supporting plate is used to support the substrate;

[0006] The fine movement platform is arranged on one side of the supporting plate and is used to finely adjust the position of the substrate;

[0007] The lifting mechanism comprises a first lifting rod and a connecting rod mechanism, the first lifting rod is drivingly connected with the fine movement platform through the connecting rod mechanism, and the connecting rod mechanism is rotationally connected with the supporting frame;

[0008] The second lifting rod is fixedly connected with the supporting frame, so that the relative position of the supporting plate and the fine movement platform is adjusted by driving the first lifting rod and the second lifting rod to lift respectively, so that the supporting plate and the fine movement platform swing relative to each other.

[0009] According to some technical solutions of the present application, the fine movement platform comprises a chassis and a plurality of fine movement tables, the chassis is drivingly connected with the first lifting rod through the connecting rod mechanism, and the plurality of fine movement tables are arranged on the chassis in a spaced manner, so that the fine movement tables finely adjust the position of the substrate.

[0010] According to some of the technical solutions of the present application, each micro-motion stage comprises a mounting base, an actuating stage, a flexible connecting piece, and a piezoelectric driver, the mounting base is provided with a mounting cavity, the actuating stage is arranged in the mounting cavity, the mounting base and the actuating stage are connected through the flexible connecting piece, and the piezoelectric driver is arranged between the flexible connecting piece and the mounting base.

[0011] According to some of the technical solutions of the present application, the piezoelectric driver is at least two, and the driving directions of the two piezoelectric drivers are arranged along the transverse direction and the longitudinal direction of the actuating stage respectively.

[0012] According to some of the technical solutions of the present application, the actuating stage is further provided with a thrust bearing.

[0013] According to some of the technical solutions of the present application, the side of the thrust bearing and the supporting plate for placing the substrate is provided with a polyether ether ketone layer.

[0014] According to some of the technical solutions of the present application, the supporting assembly further comprises a pressing structure, the pressing structure is arranged on the supporting frame and is arranged opposite to the supporting plate, and is used for pressing the substrate on the supporting plate.

[0015] According to some of the technical solutions of the present application, the pressing structure comprises a sliding seat, a connecting shaft, a spring and a pressing plate, the supporting frame is provided with a sliding rail, one side of the sliding seat is slidably connected with the sliding rail, the other side is drivingly connected with the lifting mechanism through a connecting rod, the sliding seat is provided with a connecting hole, the connecting shaft passes through the connecting hole and is fixed with the pressing plate, and the spring is arranged between the pressing plate and the sliding seat.

[0016] According to some of the technical solutions of the present application, the connecting shaft is further threadedly connected with an adjusting piece, the adjusting piece is located between the pressing plate and the sliding seat, the spring is arranged between the adjusting piece and the sliding seat, so that the pre-tightening force of the spring can be adjusted by screwing the adjusting piece.

[0017] The present application also provides a vapor deposition machine, which comprises a rack and a substrate adjusting device as described in the above technical solutions, the rack is provided with a vacuum cavity, the substrate adjusting device is arranged in the vacuum cavity, and one end of the first lifting rod and the second lifting rod respectively extends outward along the opening direction of the rack.

[0018] The substrate adjusting device provided by the application has at least the following beneficial effects: the substrate adjusting device comprises a supporting assembly, a fine movement platform, a lifting mechanism and a second lifting rod. The supporting assembly comprises a supporting frame and a supporting plate, and the lifting mechanism comprises a first lifting rod and a connecting rod mechanism. The first lifting rod is in transmission connection with the fine movement platform through the connecting rod mechanism, the connecting rod mechanism is in rotation connection with the supporting frame, and the second lifting rod is fixedly connected with the supporting frame. When the first lifting rod and the second lifting rod are driven to lift, the supporting frame and the fine movement platform can swing relative to each other, so that the relative position of the supporting plate and the fine movement platform is adjusted. The structure enables the substrate to be smoothly switched between the initial state of being supported by the supporting plate and the fine adjustment state of being supported by the fine movement platform. In the fine adjustment state, the substrate is directly supported and positioned by the fine movement platform, and since the fine movement platform has a small load and can be directly arranged to work in a vacuum environment, the difficulty of motion control is reduced, and high-precision positioning is facilitated. Further, the reliable conversion between the supporting state and the fine adjustment state is realized through the mechanical linkage of the first lifting rod, the connecting rod mechanism and the second lifting rod, and the structure is stable, which helps to improve the overall reliability of the alignment process.

[0019] In addition, in the fine adjustment stage, the fine movement platform supports the substrate, can form multi-point support for the substrate, reduces the sagging deformation of the substrate due to its own weight, and is beneficial to maintaining the parallelism between the substrate and the mask plate, thereby improving the evaporation quality.

[0020] The evaporation machine provided by the application comprises a rack and the above-mentioned substrate adjusting device. The rack is provided with a vacuum cavity, the substrate adjusting device is arranged in the vacuum cavity, and one end of the first lifting rod and the second lifting rod extends outward along the opening direction of the rack. This arrangement enables the substrate adjusting device to be located in the vacuum cavity as a whole, avoids the long-distance transmission required by placing the driving motor outside the vacuum cavity in the traditional scheme, thereby improving the overall rigidity of the system, reducing the shaking that may occur during transmission, and facilitating the guarantee of high-precision alignment requirements. At the same time, the driving end of the first lifting rod and the second lifting rod extends out of the vacuum cavity, which facilitates the arrangement of the driving components that may generate heat outside the vacuum cavity, solves the problem of difficult heat dissipation in the vacuum environment, prevents the driving components from causing pollution to the inside of the vacuum cavity, and is beneficial to maintaining the cleanliness and stability of the process environment. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 A perspective view of the substrate adjusting device provided by the embodiment of the application is shown in the figure;

[0022] Figure 2 A structural schematic of the substrate adjusting device provided by the embodiment of the application is shown in the figure Figure One ;

[0023] Figure 3 A structural schematic of the substrate adjusting device provided by the embodiment of the application is shown in the figureFigure Two ;

[0024] Figure 4 A schematic view of a compression structure of a substrate adjusting device according to an embodiment of the present application;

[0025] Figure 5 A schematic view of a compression structure of a substrate adjusting device according to an embodiment of the present application;

[0026] Figure 6 A schematic view of a compression structure of a substrate adjusting device according to an embodiment of the present application;

[0027] Figure 7 A partial enlarged view of a micro-motion platform according to an embodiment of the present application;

[0028] Figure 8 A schematic view of a structure of an evaporation machine according to an embodiment of the present application.

[0029] In the drawings: 100 - support assembly; 200 - micro-motion platform; 300 - lifting mechanism; 400 - second lifting rod; 500 - rack; 501 - vacuum cavity; 600 - substrate; 110 - support frame; 120 - support plate; 130 - compression structure; 131 - sliding seat; 132 - connecting shaft; 133 - spring; 134 - pressing plate; 135 - adjusting piece; 210 - base frame; 220 - micro-motion stage; 221 - mounting seat; 222 - actuating stage; 223 - flexible connecting piece; 224 - piezoelectric driver; 225 - thrust bearing; 226 - polyether ether ketone layer; 310 - first lifting rod; 320 - connecting rod mechanism. DETAILED DESCRIPTION

[0030] The embodiments of the present application are described in detail below with reference to the accompanying drawings. The embodiments described below are examples for explaining the present application and should not be understood as limiting the present application.

[0031] In the description of the present application, it should be understood that the orientation description, such as the orientation or position relationship indicated by up, down, front, back, left, right, etc. is based on the orientation or position relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation and be constructed, operated in a particular orientation, and therefore should not be understood as limiting the present application.

[0032] In the description of the present application, unless otherwise explicitly limited, the words such as arrangement, installation, connection, etc. should be understood broadly, and the person skilled in the art can reasonably determine the specific meaning of the above words in the present application in combination with the specific content of the technical solution.

[0033] The application will be described below in conjunction with Figures 1 to 8 The embodiments of the application are described.

[0034] Evaporation is a common technical means to realize material deposition. In the evaporation process, the device material to be deposited is heated to an evaporation temperature in a vacuum environment to form gaseous particles; these gaseous particles are then condensed and deposited on the substrate surface to ultimately prepare the target device.

[0035] In the evaporation process, in order to make the glass substrate and the mask plate meet the preset alignment accuracy requirements, the position of the glass substrate needs to be adjusted. In related technical solutions, the transmission mode of motor cooperating with screw is mostly used to realize the adjustment of the position of the substrate. However, due to the fact that a large amount of heat is generated when the motor is running, and effective heat dissipation cannot be achieved in the vacuum chamber, the position adjustment mechanism such as the motor has to be arranged as a whole outside the vacuum chamber, and the power and displacement are transmitted to the substrate support seat in the vacuum chamber through the connecting rod, so as to drive the substrate to complete the position adjustment.

[0036] In this way, the transmission mode of linear motor or rotary motor cooperating with screw usually has a movement accuracy of micrometer level, which is difficult to meet the process requirements of high-precision evaporation. Secondly, after the motor is externalized, a series of loads such as the glass substrate, the substrate clamping assembly and the supporting device in the vacuum chamber need to be driven, and the large load mass will significantly increase the difficulty of movement control. Thirdly, there is a long transmission distance between the driving mechanism and the glass substrate, and if the rigidity of the transmission structure is insufficient, it is easy to shake during the adjustment process, thereby affecting the final alignment accuracy.

[0037] Therefore, the application provides a substrate adjustment device, which comprises a supporting assembly 100, a micro-motion platform 200, a lifting mechanism 300 and a second lifting rod 400;

[0038] The supporting assembly 100 comprises a supporting frame 110 and a supporting plate 120 arranged on the supporting frame 110, and the supporting plate 120 is used for supporting the substrate;

[0039] The micro-motion platform 200 is arranged on one side of the supporting plate 120 and is used for fine-tuning the position of the substrate;

[0040] The lifting mechanism 300 comprises a first lifting rod 310 and a connecting rod mechanism 320, the first lifting rod 310 is in transmission connection with the micro-motion platform 200 through the connecting rod mechanism 320, and the connecting rod mechanism 320 is in rotation connection with the supporting frame 110;

[0041] The second lifting rod 400 is fixedly connected with the supporting frame 110, so as to adjust the relative position between the supporting plate 120 and the micro-motion platform 200 by driving the first lifting rod 310 and the second lifting rod 400 to lift respectively and make the supporting frame 110 and the micro-motion platform 200 swing relatively.

[0042] Reference Figures 4 to 6 In the initial supporting stage, the substrate is placed on the supporting plate 120 of the supporting assembly 100, at this time, the first lifting rod 310 and the second lifting rod 400 are both at the initial height, and the micro-motion platform 200 is below the supporting assembly 100 and has no contact with the substrate 600; when position fine adjustment is needed, the first lifting rod 310 and the second lifting rod 400 are driven to move up and down relatively, exemplarily, the first lifting rod 310 is lowered, the second lifting rod 400 is raised, and through the transmission structure of the first lifting rod 310 and the connecting rod mechanism 320, the relative swing between the supporting frame 110 and the micro-motion platform 200 is driven, so that the micro-motion platform 200 swings and gradually approaches the supporting plate 120, and then the micro-motion platform 200 contacts and supports the substrate, so that the supporting plate 120 is separated from the substrate, and then the position of the substrate can be adjusted by the micro-motion platform 200, and the fine adjustment stage is entered.

[0043] If the displacement of the substrate 600 exceeds the single stroke of the micro-motion platform 200, the original multiple reset adjustment is repeated, that is, the first lifting rod 310 and the second lifting rod 400 are driven to move reversely, so that the supporting frame 110 resets and supports the substrate 600, the micro-motion platform 200 is separated from the substrate 600 and returns to below the supporting plate 120, and then the first lifting rod 310 and the second lifting rod 400 are adjusted again to enter the fine adjustment stage for adjustment, until the displacement of the substrate reaches the standard; after the position of the substrate is adjusted to the position, the first lifting rod 310 and the second lifting rod 400 are driven to move, so that the supporting frame 110 resets, the substrate is placed on the supporting plate 120 again, the alignment adjustment is completed, and subsequent process operations are performed.

[0044] In some embodiments, the micro-motion platform 200 includes a chassis 210 and multiple micro-motion stages 220, the chassis 210 is in transmission connection with the first lifting rod 310 through the connecting rod mechanism 320, and the multiple micro-motion stages 220 are arranged on the chassis 210 in intervals, so that the multiple micro-motion stages 220 collectively fine adjust the position of the substrate.

[0045] In the initial state, the plurality of micro stages 220 are uniformly spaced on the chassis 210, the chassis 210 is drivingly connected to the first lifting rod 310 through the connecting rod mechanism 320, all the micro stages 220 are in the initial position and do not contact the substrate, the lifting mechanism 300 drives the chassis 210 to approach the substrate as a whole, the plurality of micro stages 220 synchronously support the substrate, then the plurality of two-dimensional micro stages 220 start to move respectively, the displacement output of each micro stage 220 is independently controlled to realize the position adjustment of the substrate, after the adjustment, the chassis 210 is reset with the lifting mechanism 300, and the plurality of micro stages 220 are synchronously returned to the initial position to wait for the next fine adjustment. In this way, the uniformly spaced micro stages 220 uniformly support the substrate, reduce the local stress concentration of the substrate, and reduce the risk of deformation of the substrate; the synchronous lifting of all the micro stages 220 is realized through the connecting rod mechanism 320 to ensure the stability of the substrate support; when the position adjustment is performed through the cooperation of the plurality of micro stages 220, the overall translation of the substrate can be realized. Therefore, compared with the existing scheme, only the glass substrate is used as the load when the substrate is fine adjusted by the micro stage platform 200, the load is smaller, and the motion control difficulty is reduced and the adjustment stability is improved.

[0046] In some embodiments, each micro stage 220 includes a mounting seat 221, an actuating stage 222, a flexible connecting piece 223, and a piezoelectric driver 224. The mounting seat 221 is provided with a mounting cavity, the actuating stage 222 is arranged in the mounting cavity, the mounting seat 221 and the actuating stage 222 are connected through the flexible connecting piece 223, and the piezoelectric driver 224 is arranged between the flexible connecting piece 223 and the mounting seat 221. The piezoelectric driver 224 can be a piezoelectric ceramic stack, so that the micro stage 220 formed by using the piezoelectric driver 224 and the flexible connecting piece 223 can generate nanoscale displacement adjustment.

[0047] Specifically, the actuating stage 222 is connected to the mounting seat 221 through the flexible connecting piece 223 and is located at the center of the mounting cavity, the piezoelectric driver 224 is not powered, and the actuating stage 222 is in the initial position. The input voltage of the piezoelectric ceramic is adjusted to drive the glass substrate to move. That is, the voltage is applied to the piezoelectric driver 224, the piezoelectric driver 224 generates expansion and contraction deformation, the force and displacement are transmitted through the flexible connecting piece 223, the actuating stage 222 is driven to move directionally in the mounting cavity, when the power supply of the piezoelectric driver 224 is cut off, the flexible connecting piece 223 restores the deformation by relying on the elasticity thereof, drives the actuating stage 222 to return to the initial position, facilitates the position adjustment in the next round, and through the high-precision characteristics of the flexible connecting piece 223 cooperating with the piezoelectric driver 224, nanoscale displacement output can be realized.

[0048] The piezoelectric ceramic has high resolution but short stroke (less than 5 um), and even if the stroke is amplified by the micro-motion platform 200, the single displacement of the micro-motion platform 200 can only be tens of microns. If a larger stroke is required, the micro-adjustment and reset can be alternately performed, the single micro-adjustment displacement is first completed by the micro-motion platform 220, and then the micro-motion platform 220 is reset to the initial state, and the above process is repeated to obtain a larger stroke, thereby meeting the high-precision and large-stroke position adjustment requirements.

[0049] Optionally, the piezoelectric driver 224 is at least two, and the driving directions of the two piezoelectric drivers 224 are arranged along the transverse and longitudinal directions of the actuating platform 222, respectively. The transverse piezoelectric driver 224 generates transverse expansion and contraction deformation of the actuating platform 222 after being powered on, and drives the actuating platform 222 to move transversely through the flexible connecting piece 223. The longitudinal piezoelectric driver 224 generates longitudinal expansion and contraction deformation of the actuating platform 222 after being powered on, and drives the actuating platform 222 to move longitudinally through the flexible connecting piece 223. By using two piezoelectric drivers 224 in different directions, the expansion and contraction amounts of the two piezoelectric drivers 224 are controlled according to a preset ratio, and the actuating platform 222 is driven to move to realize the position adjustment of the substrate by combining the decoupling performance of the flexible connecting piece 223. The flexible connecting piece 223 can be a flexible hinge, and the piezoelectric driver 224 can be a piezoelectric ceramic stack, so that the displacement amount in each direction can be accurately adjusted by independent control of the voltage signal, and the position fine adjustment of the substrate in different directions can be met.

[0050] When the glass substrate above the multiple micro-motion platforms 220 rotates, the angles of the glass substrate relative to the micro-motion platforms 220 will not be consistent. In some embodiments, the actuating platform 222 is further provided with a thrust bearing 225. Generally, the thrust bearing 225 is installed at the center of the actuating platform 222, and the upper end surface of the thrust bearing 225 is in contact with the substrate when the micro-motion platform 200 supports the substrate. The thrust bearing 225 is between the actuating platform 222 and the glass substrate and adaptively rotates with the adjustment of the angle of the substrate. During the adjustment of the substrate, the thrust bearing 225 replaces the sliding friction with rolling friction, thereby reducing the friction between the substrate and the micro-motion platform 200. That is, when the multiple micro-motion platforms 220 cooperatively adjust to change the angle of the substrate, the bearing can reduce the relative torsion between the substrate and the actuating platform 222 by rotating, thereby avoiding sliding friction and wear of the glass, and protecting the surface quality of the substrate.

[0051] Further, the thrust bearing 225 and the side of the supporting plate 120 for placing the substrate are provided with a poly-ether-ether-ketone layer 226. Specifically, poly-ether-ether-ketone (PEEK) is a new type of linear semi-crystalline aromatic plastic engineering plastic, which has excellent physical and mechanical properties, high strength, light weight, wear resistance, fatigue resistance, excellent self-lubricating property, can replace metal, ceramic and alloy materials, and has excellent heat resistance, glass transition temperature of 143°C, can be used for long time at 260°C, good radiation resistance and insulation, can also resist chemical reagents, almost insoluble in any solvent except concentrated sulfuric acid, and can be applied to various processing technologies.

[0052] Thus, by providing the PEEK layer on the end surface of the thrust bearing 225 and the supporting plate 120 for placing the substrate, when the substrate contacts the thrust bearing 225 on the supporting plate 120, the PEEK layer directly contacts the surface of the substrate, bears the supporting and buffering effect, thereby reducing the contact friction with the substrate by using its excellent wear resistance and self-lubricating property, high strength and rigidity, so that the glass is not scratched and can be applied in vacuum and high temperature environment, prolonging the service life of the device.

[0053] In some embodiments, the supporting assembly 100 further comprises a pressing structure 130 provided on the supporting frame 110 and arranged opposite to the supporting plate 120, for pressing the substrate on the supporting plate 120. After the substrate is adjusted to the position, the first lifting rod 310 and the second lifting rod 400 are driven to move cooperatively, so that the supporting frame 110 is reset, the substrate is placed on the supporting plate 120 again, and then the substrate is pressed by the pressing structure 130.

[0054] Optionally, the pressing structure 130 comprises a sliding seat 131, a connecting shaft 132, a spring 133 and a pressing plate 134, the supporting frame 110 is provided with a sliding rail, one side of the sliding seat 131 is connected with the sliding rail in sliding mode, the other side is connected with the first lifting rod 310 in transmission mode through a connecting rod mechanism, the sliding seat 131 is provided with a connecting hole, the connecting shaft 132 passes through the connecting hole and is fixed with the pressing plate 134, and the spring 133 is arranged between the pressing plate 134 and the sliding seat 131. Since the sliding seat 131 is connected with the first lifting rod 310 through the connecting rod mechanism after the substrate is adjusted to the position, when the first lifting rod 310 rises, the connecting rod mechanism 320 is driven to rotate, and then the sliding seat 131 is driven to move downward, the pressing plate 134 is driven to approach the substrate, the substrate is pressed on the supporting plate 120 by the elastic pressure of the spring 133 after the pressing plate 134 contacts the substrate, the fixing is completed, the sliding seat 131 is linked with the lifting mechanism 300, the structure of the device is simplified, the operation convenience and the automation degree are improved, and no additional independent driving component is needed.

[0055] In some embodiments, an adjusting piece 135 is also threadedly connected to the connecting shaft 132, and the adjusting piece 135 is located between the pressing plate 134 and the sliding seat 131. The spring 133 is arranged between the adjusting piece 135 and the sliding seat 131, so that the pre-tightening force of the spring 133 can be adjusted by screwing the adjusting piece 135. By screwing the adjusting piece 135 on the connecting shaft 132, the spring 133 is compressed or elongated, and the distance between the adjusting piece 135 and the sliding seat 131 is changed. In turn, the pre-tightening force of the spring 133 on the pressing plate 134 is adjusted until the appropriate pressing force is reached. In this way, the pre-tightening force can be flexibly adjusted to adapt to substrates of different thicknesses and materials, expand the application range of the device, ensure firm fixation of the substrate, and avoid deformation or damage of the substrate caused by excessive pressure.

[0056] The application also provides a vapor deposition machine, which comprises a rack 500 and a substrate adjusting device as disclosed in any one of the above embodiments. The rack 500 is provided with a vacuum cavity 501. Since the piezoelectric ceramic can work in a vacuum environment, the nanoscale position adjustment is realized by the micro-motion platform 200, which greatly improves the alignment accuracy of the substrate and the mask, and adapts to the high-precision requirements of the vapor deposition process. The linkage mechanism 320 and the lifting mechanism 300 are in strong motion coordination, and can realize smooth switching between the supporting state and the fine adjustment state. The overall structure is compact, which can adapt to the installation space requirement inside the vacuum cavity 501, so that the substrate adjusting device can be arranged in the vacuum cavity 501 as a whole. Since the micro-motion platform 200 is arranged in the vacuum cavity 501, the displacement does not need to be transmitted through a long distance linkage, which improves the system rigidity and avoids the shaking problem caused by the long distance of the traditional external motor. One end of the first lifting rod 310 and the second lifting rod 400 extends outward along the opening direction of the rack 500, which facilitates driving control outside the vacuum cavity 501, avoids heat generation or pollution of the driving components in the vacuum cavity 501, and further ensures the adjustment accuracy and the vapor deposition quality. Since the vapor deposition machine adopts the substrate adjusting device disclosed in the embodiments of the application, the vapor deposition machine also has other technical advantages of the substrate adjusting device disclosed in the embodiments of the application.

[0057] In addition, certain terms have been used in this specification to describe embodiments of the application. For example, "one embodiment", "an embodiment" and / or "some embodiments" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the application. The appearances of the phrase "in one or more embodiments" or "in at least one embodiment" in various places in the specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics can be combined in any suitable manner in one or more embodiments.

[0058] The preferred embodiments of the present application have been disclosed with specific reference to a preferred embodiment. A clear departure from the specific disclosure however is not to be inferred. Modifications and changes can be made in the arrangement without departing from the spirit and scope of the present application which is defined in the following claims.

Claims

1. A substrate adjustment device, characterized in that: include: A support assembly (100) includes a support frame (110) and a support plate (120) disposed on the support frame (110), the support plate (120) being used to support a substrate; A micro-adjustment platform (200) is provided on one side of the support plate (120) for fine-tuning the position of the substrate; The lifting mechanism (300) includes a first lifting rod (310) and a linkage mechanism (320). The first lifting rod (310) is connected to the micro-motion platform (200) through the linkage mechanism (320), and the linkage mechanism (320) is rotatably connected to the support frame (110). The second lifting rod (400), which is fixed to the support frame (110), is used to drive the first lifting rod (310) and the second lifting rod (400) to lift and lower respectively, so that the support frame (110) and the micro-motion platform (200) swing relative to each other to adjust the relative position of the support plate (120) and the micro-motion platform (200).

2. The substrate adjustment device according to claim 1, characterized in that: The micro-motion platform (200) includes a base frame (210) and multiple micro-motion stages (220). The base frame (210) is connected to the first lifting rod (310) via the linkage mechanism (320). The multiple micro-motion stages (220) are spaced apart on the base frame (210) to finely adjust the position of the substrate through the micro-motion stages (220).

3. The substrate adjustment device according to claim 2, characterized in that: Each of the micro-motion stages (220) includes a mounting base (221), an actuation stage (222), a flexible connector (223), and a piezoelectric actuator (224). The mounting base (221) has a mounting cavity, the actuation stage (222) is disposed in the mounting cavity, and the mounting base (221) and the actuation stage (222) are connected by the flexible connector (223). The piezoelectric actuator (224) is disposed between the flexible connector (223) and the mounting base (221).

4. The substrate adjustment device according to claim 3, characterized in that: There are at least two piezoelectric actuators (224), and the driving directions of the two piezoelectric actuators (224) are respectively arranged along the transverse and longitudinal directions of the actuation stage (222).

5. The substrate adjustment device according to claim 3, characterized in that: The actuation stage (222) is also equipped with a thrust bearing (225).

6. The substrate adjustment device according to claim 5, characterized in that: The thrust bearing (225) and the support plate (120) have a polyether ether ketone layer (226) on one side for placing the substrate.

7. The substrate adjustment device according to claim 1, characterized in that: The support assembly (100) further includes a pressing structure (130), which is disposed on the support frame (110) and is disposed opposite to the support plate (120) for pressing the substrate on the support plate (120).

8. The substrate adjustment device according to claim 7, characterized in that: The clamping structure (130) includes a sliding seat (131), a connecting shaft (132), a spring (133), and a pressure plate (134). The support frame (110) is provided with a sliding rail. One side of the sliding seat (131) is slidably connected to the sliding rail, and the other side is connected to the linkage mechanism (320) via a connecting rod. The sliding seat (131) is provided with a connecting hole. The connecting shaft (132) passes through the connecting hole and is fixed to the pressure plate (134). The spring (133) is located between the pressure plate (134) and the sliding seat (131).

9. The substrate adjustment device according to claim 8, characterized in that: An adjusting plate (135) is also threaded onto the connecting shaft (132). The adjusting plate (135) is located between the pressure plate (134) and the sliding seat (131). The spring (133) is disposed between the adjusting plate (135) and the sliding seat (131) so that the preload of the spring (133) can be adjusted by turning the adjusting plate (135).

10. A vapor deposition machine, characterized in that: The device includes a frame (500) and a substrate adjustment device as described in any one of claims 1-9. The frame (500) is provided with a vacuum chamber (501), the substrate adjustment device is disposed in the vacuum chamber (501), and one end of the first lifting rod (310) and the second lifting rod (400) both extend outward along the opening direction of the frame (500).

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