Arc flow field analysis device and method, computer equipment, readable storage medium and program product
By using an arc flow field analysis device and schlieren method, the influence of arc self-luminescence is eliminated, improving the accuracy of arc flow field testing and analysis, guiding the structural optimization of gas circuit breakers, and enhancing breaking capacity.
Patent Information
- Application Number
- CN202511561426.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-29
- Publication Date
- 2026-02-03
AI Technical Summary
In existing technologies, the accuracy of arc flow field testing and analysis is affected by the complexity of light propagation in inhomogeneous media, leading to inaccurate test results.
An electric arc flow field analysis device is used. Through the optical systems of the incident side module and the collection side module, the electric arc flow field is observed using the schlieren method. This eliminates the influence of electric arc self-luminescence, improves the signal-to-noise ratio, and enables accurate analysis of the electric arc flow field.
It improves the accuracy of arc flow field testing and analysis, effectively observes and analyzes the arc region within the arc flow field, guides the structural optimization of gas circuit breakers, and enhances breaking capacity.
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Figure CN121453330A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of computer, in particular to an arc flow field analysis device and method, computer equipment, computer readable storage medium and computer program product. BACKGROUND
[0002] With the development of high-voltage power supply technology, a technology of controlling circuit cut-off or turn-on in a power system through a gas circuit breaker has appeared. The gas circuit breaker is a high-voltage switch device using compressed gas as arc extinguishing and insulating medium, mainly used for cutting off or turning on the circuit in the power system, cutting off the current quickly when short circuit, overload and other faults occur, protecting the safe operation of power equipment and system. It is a very important part of high-voltage power system, and its breaking success or failure directly affects the stability of the power system and the power supply quality.
[0003] Existing researches show that the cooling process of arc plasma is closely related to the breaking process of the circuit breaker, and the flow field structure plays a crucial role in the cooling process of arc plasma. At present, the arc flow field can be analyzed by numerical simulation and geometric modeling, however, the propagation of light in inhomogeneous medium is a very complex physical phenomenon. In different positions of inhomogeneous medium, the density, refractive index or reflectivity of the medium are not the same. When light propagates in inhomogeneous medium, it will experience refraction, reflection, scattering and other physical phenomena, causing various changes of light, thereby affecting the accuracy of arc flow field test analysis. SUMMARY
[0004] Therefore, it is necessary to provide an arc flow field analysis device, method, computer equipment, computer readable storage medium and computer program product capable of improving the accuracy of arc flow field test analysis.
[0005] In a first aspect, the present application provides an arc flow field analysis device, comprising:
[0006] An arc flow field analysis device, characterized in that the device comprises an incident side module and a collection side module;
[0007] The incident side module comprises a light source generating unit, a first plane mirror and a first parabolic mirror, and the collection side module comprises a second parabolic mirror, a second plane mirror, a knife edge, an imaging lens and an image acquisition unit;
[0008] The light source generating unit is configured to generate incident light, the first plane mirror is configured to reflect the received incident light to the first parabolic mirror, the first parabolic mirror is configured to reflect the incident light after passing through an arc region of an arc flow field to be analyzed to the second parabolic mirror, the second parabolic mirror is configured to reflect the incident light passing through the arc region to the second plane mirror, the second plane mirror is configured to reflect the incident light to the knife edge, the knife edge is configured to cut the light source focal point of the incident light to convert the deflection information of the incident light passing through the arc region into light intensity distribution information on an imaging plane, the imaging lens is configured to collimate the incident light passing through the knife edge and image to the imaging plane of the image acquisition unit, and the image acquisition unit is configured to acquire the light intensity distribution information and convert the light intensity distribution information into corresponding gray value change information of the arc region.
[0009] In one of the embodiments, the incident side module further comprises a converging mirror configured to converge the incident light generated by the light source generating unit and to converge the incident light and then reflect the converged incident light to the first plane mirror, and the first plane mirror is configured to reflect the received converged incident light to the first parabolic mirror.
[0010] In one of the embodiments, the collection side module further comprises a filter configured to filter the incident light cut by the knife edge, and the imaging lens is configured to collimate the filtered incident light and image to the imaging plane of the image acquisition unit.
[0011] In one of the embodiments, the arc region of the arc flow field to be analyzed is arranged in an arc burning cavity plated with a high-transparency film, and the thickness of the high-transparency film corresponds to the wavelength of the incident light generated by the light source generating unit.
[0012] In one of the embodiments, the collection side module further comprises a closed box, and the image acquisition unit is arranged in the closed box.
[0013] The arc flow field analysis device generates incident light by the light source generation unit, reflects the received incident light to the first parabolic mirror by the first plane mirror, reflects the incident light passing through the arc region of the arc flow field to be analyzed to the second parabolic mirror by the first parabolic mirror, reflects the incident light passing through the arc region to the second plane mirror by the second parabolic mirror, and then the second plane mirror reflects the incident light to the knife edge, and the knife edge cuts the light source focal point of the incident light to convert the deflection information of the incident light passing through the arc region into light intensity distribution information on the imaging plane. Finally, the imaging lens arranged behind the knife edge can collimate the incident light passing through the knife edge and image to the imaging plane of the image acquisition unit. The image acquisition unit can acquire the light intensity distribution information and convert the light intensity distribution information into the corresponding gray value change information of the arc region. The arc flow field analysis device of the present application can observe the arc, a strong spontaneous light plasma, through the schlieren system, eliminate the influence of the arc spontaneous light, improve the signal-to-noise ratio, realize the schlieren observation of the arc, and effectively improve the test analysis accuracy of the arc region in the arc flow field to be measured.
[0014] In a second aspect, the present application also provides an arc flow field analysis method, which comprises:
[0015] When receiving a test analysis request for a target arc flow field, driving the light source generation unit to generate an incident light source;
[0016] Setting the arc region of the target arc flow field in the arc flow field analysis device;
[0017] Based on the incident side module of the arc flow field analysis device, the generated incident light source is incident to the arc region, and the light intensity distribution information corresponding to the test light source passing through the arc region is collected by the collection side module of the arc flow field analysis device;
[0018] Based on the light intensity distribution information, schlieren analysis processing is performed to obtain the arc flow field analysis result of the target arc flow field.
[0019] In one of the embodiments, the target arc flow field comprises the internal flow field of a gas circuit breaker;
[0020] The method further comprises:
[0021] Based on the arc flow field analysis result, the structure optimization information of the gas circuit breaker is determined;
[0022] According to the arc flow field analysis result and the structure optimization information, a structure optimization report of the gas circuit breaker is generated.
[0023] In a third aspect, the present application also provides a computer device comprising a memory and a processor, the memory storing a computer program, and the processor implementing the following steps when executing the computer program:
[0024] In the case of receiving a test analysis request for the target arc flow field, the light source generation unit generates an incident light source;
[0025] In the above-mentioned arc flow field analysis device, an arc region of the target arc flow field is set;
[0026] The incident side module of the arc flow field analysis device is used to incident the generated incident light source to the arc region, and the collection side module of the arc flow field analysis device is used to collect light intensity distribution information corresponding to the test light source passing through the arc region;
[0027] Based on the light intensity distribution information, a schlieren analysis process is performed to obtain an arc flow field analysis result of the target arc flow field.
[0028] In a fourth aspect, the present application also provides a computer readable storage medium, which stores a computer program, and the computer program is executed by a processor to implement the following steps:
[0029] In the case of receiving a test analysis request for the target arc flow field, the light source generation unit generates an incident light source;
[0030] In the above-mentioned arc flow field analysis device, an arc region of the target arc flow field is set;
[0031] The incident side module of the arc flow field analysis device is used to incident the generated incident light source to the arc region, and the collection side module of the arc flow field analysis device is used to collect light intensity distribution information corresponding to the test light source passing through the arc region;
[0032] Based on the light intensity distribution information, a schlieren analysis process is performed to obtain an arc flow field analysis result of the target arc flow field.
[0033] In a fifth aspect, the present application also provides a computer program product comprising a computer program, and the computer program is executed by a processor to implement the following steps:
[0034] In the case of receiving a test analysis request for the target arc flow field, the light source generation unit generates an incident light source;
[0035] In the above-mentioned arc flow field analysis device, an arc region of the target arc flow field is set;
[0036] The incident side module of the arc flow field analysis device is used to incident the generated incident light source to the arc region, and the collection side module of the arc flow field analysis device is used to collect light intensity distribution information corresponding to the test light source passing through the arc region;
[0037] Based on the light intensity distribution information, the schlieren analysis processing is performed to obtain the arc flow field analysis result of the target arc flow field.
[0038] The arc flow field analysis method, computer device, readable storage medium and program product, in the case of receiving the test analysis request for the target arc flow field, the light source generation unit is driven to generate the incident light source; and the arc region of the target arc flow field is set in the arc flow field analysis device; the generated incident light source is incident to the arc region based on the incident side module of the arc flow field analysis device, and the light intensity distribution information corresponding to the test light source passing through the arc region is collected through the collection side module of the arc flow field analysis device; finally, based on the light intensity distribution information, the schlieren analysis processing is performed to obtain the arc flow field analysis result of the target arc flow field. The arc flow field analysis device of the present application can observe the arc, a strong spontaneous light plasma, through the schlieren system, eliminate the influence of the arc spontaneous light, improve the signal-to-noise ratio, realize the schlieren observation of the arc, and effectively improve the test analysis accuracy of the arc region in the measured arc flow field. BRIEF DESCRIPTION OF DRAWINGS
[0039] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related art, the drawings needed to be used in the description of the embodiments of the present application or the related art will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other related drawings can be obtained by those skilled in the art without creative labor.
[0040] Figure 1 It is a structure block diagram of the arc flow field analysis device in an embodiment;
[0041] Figure 2 It is a schematic diagram of the schlieren method principle in an embodiment;
[0042] Figure 3 It is a schematic diagram of light refraction deflection of the schlieren method in an embodiment;
[0043] Figure 4 It is a schematic diagram of the optical path of the schlieren optical platform in an embodiment;
[0044] Figure 5 It is a flowchart of the arc flow field analysis method in an embodiment;
[0045] Figure 6 It is an internal structure diagram of the computer device in an embodiment. DETAILED DESCRIPTION
[0046] In order to make the purposes, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not used to limit the present application.
[0047] In one exemplary embodiment, as shown in Figure 1 An arc flow field analysis device is provided, the device comprising an incident side module 102 and a collection side module 104:
[0048] The incident side module comprises a light source generating unit 1021, a first plane mirror 1023 and a first parabolic mirror 1025, and the collection side module comprises a second parabolic mirror 1041, a second plane mirror 1043, a knife edge 1045, an imaging lens 1047 and an image acquisition unit 1049.
[0049] The light source generating unit 1021 is configured to generate incident light, the first plane mirror 1023 is configured to reflect the received incident light to the first parabolic mirror 1024, the first parabolic mirror 1024 is configured to reflect the incident light after passing through the arc region of the arc flow field to be analyzed to the second parabolic mirror 1041, the second parabolic mirror 1041 is configured to reflect the incident light passing through the arc region to the second plane mirror 1043, the second plane mirror 1043 is configured to reflect the incident light to the knife edge 1045, the knife edge 1045 is configured to cut the light source focal point of the incident light to convert the deflection information of the incident light passing through the arc region into light intensity distribution information on the imaging plane, the imaging lens 1047 is configured to collimate the incident light passing through the knife edge and image to the imaging plane of the image acquisition unit 1049, and the image acquisition unit 1049 is configured to acquire the light intensity distribution information and convert the light intensity distribution information into the corresponding gray value change information of the arc region.
[0050] Exemplarily, the scheme of the present application specifically adopts the way of schlieren method to realize the analysis and processing of the arc flow field. The schlieren method is an optical technique for visualizing fluid flow, and its core principle is to convert the density changes of fluid into images with light and dark contrast by using the refraction and interference of light. It captures the flow phenomena such as airflow, shock wave and thermal convection that cannot be seen by the naked eye through components such as light source, parabolic mirror, knife edge and imaging system, and is widely used in aerospace (such as observing the airflow around the aircraft), combustion science, fluid mechanics research and other fields, and is an important experimental means for revealing the law of fluid motion. As for the flow field structure of the arc flow field to be analyzed, the flow field structure is a core concept for describing the spatial distribution of fluid (gas, liquid) motion, covering the spatial distribution and time variation of parameters such as velocity, pressure, density and temperature. Its form is diverse, which can be divided into laminar flow (fluid layered and smooth flow) and turbulent flow (fluid violent and disordered mixing), and also includes vortex, jet, boundary layer and other typical structures. The arc flow field structure is a complex fluid dynamics system formed during arc discharge, which is mainly composed of high-temperature arc core area, peripheral plasma sheath and airflow disturbance area.
[0051] The present application specifically combines the above-mentioned arc flow field analysis device, and adopts optical technology to realize the analysis and test processing of the arc flow field. The propagation of light in inhomogeneous medium is a very complex physical phenomenon. In different positions of inhomogeneous medium, the density, refractive index or reflectivity of the medium are not the same. When light propagates in inhomogeneous medium, it will experience refraction, reflection, scattering and other physical phenomena, and the light will change in many ways. The schlieren method mainly considers the refraction phenomenon of light propagating in inhomogeneous medium.
[0052] The arc flow field analysis device of the present application specifically includes an incident side module 102 and a collection side module 104. The incident side module 102 is used to generate incident light and to incident the incident light into the arc region to be analyzed and tested. The collection side module 104 is used to collect the incident light passing through the arc region and to perform imaging analysis and processing.
[0053] For the incident side module 102, it includes a light source generating unit 1021, a first plane mirror 1023 and a first parabolic mirror 1025. The light source generating unit can be a LED light source with specific wavelength, which can generate LED light beam as incident light. The first plane mirror 1023 can reflect the received incident light to the first parabolic mirror 1025, so as to change the direction of the incident light, reduce the floor space of the arc flow field analysis device, and make the whole device system flexible to adjust in a smaller range. The first parabolic mirror 1025 can reflect the incident light into parallel light beam passing through the arc region of the arc flow field to be analyzed.
[0054] For the collection side module 104, it includes a second parabolic mirror 1041, a second plane mirror 1043, a knife edge 1045, an imaging lens 1047, and an image acquisition unit 1049. When the parallel light beam reflected by the first parabolic mirror 1025 passes through the arc region of the arc flow field to be analyzed, it is deflected in the arc region with a non-uniform medium, at this time the light beam contains the flow field information of the region to be measured, the longer the parallel light path, the more the light deflection distance, and the more sensitive the schlieren system. The function of the second parabolic mirror 1041 is mainly to focus the parallel light beam, in order to ensure the parallelism of the light path and the convenience of adjustment, its size should be the same as that of the first parabolic mirror 1025. The second parabolic mirror 1041 also reflects the incident light passing through the arc region to the second plane mirror 1043. The function of the second plane mirror 1043 is mainly to reflect the light beam focused by the second parabolic mirror 1041, so that the light beam can accurately fall in the center of the knife edge 1045, and at the same time, the floor area of the collection side light path is reduced. The knife edge 1045 can cut the light source focal point of the incident light to convert the deflection information of the incident light passing through the arc region into light intensity distribution information on the imaging plane. The imaging lens 1047 can collimate the incident light passing through the knife edge and image to the imaging plane of the image acquisition unit 1049. Finally, the image acquisition unit 1049 collects the light intensity distribution information and converts it into the corresponding gray value change information of the arc region.
[0055] As shown in Figure 2 When the light passes through the region with a non-uniform medium, the propagation direction will be deflected, and the degree of deflection is related to the refractive index of each part of the non-uniform medium. The schlieren method utilizes the deflection of light, cuts the light source focal point through the knife edge, converts the deflection information of the light into the light intensity distribution on the imaging plane, and captures it by using a high-speed camera to reflect the internal situation of the medium according to the gray value change of the image.
[0056] Because the refractive index inside the arc and its surrounding flow field region is different, the deflection of light inside is not a simple fold line propagation, but a deflection integral along the light propagation path. However, because the diameter of the arc and its surrounding flow field region is much smaller than the whole parallel light path, the deflection of light inside can be ignored compared with the deflection in the parallel light path, so as to facilitate the analysis of the relationship between the deflection angle of light and the gray value, it is approximately considered that the light propagates in a straight line in the arc and its surrounding flow field region, and the specific analysis formula is as follows.
[0057]
[0058]
[0059]
[0060]
[0061] In the above formula: represents the deflection angle of light after passing through the arc and its surrounding flow field area; represents the deflection angle of the deflected light after focusing through the lens compared to the original path; L1 represents the straight-line distance between the center of the arc region and the center of the main lens; L2 represents the straight-line distance between the center of the main lens and the imaging plane; represents the focal length of the main lens; represents the deflection distance of the light on the knife edge; represents the deflection distance of the knife edge on the lens.
[0062] The object distance, the distance and the focal length of the lens satisfy the Gaussian formula:
[0063]
[0064] The above formula can be obtained:
[0065]
[0066] From the above formula, the deflection angle of the light is proportional to the deflection distance of the light on the knife edge, in order to further obtain the relationship between the deflection angle of the light and the change of the light on the final imaging plane, combined with the formula of the relative light intensity of the plane and the deflection distance of the light on the knife edge , the formula can be obtained:
[0067]
[0068] In the formula: represents the deflection distance of the light on the knife edge; represents the background light intensity; represents the focal point radius of the parallel light beam after focusing through the rear main field lens.
[0069] Because the refractive index of the medium changes continuously, it is difficult to explain the refraction phenomenon of light in the medium with the traditional interface theory, in order to further analyze the change of light in the flow field, it is assumed that the light deviates by an angle of in a very short time when passing through the medium, and it is approximately considered that the light is deflected on the refractive index interface.
[0070] The relationship between the deflection angle of the light and the deflection distance of the light and the refractive index can be obtained by referring to the light refraction deflection diagram shown in Figure 3 .
[0071]
[0072] In the formula: , represents the propagation speed of light in different media; represents the propagation speed of light in represents the offset distance of light in the y direction in time; represents the offset distance of light in the x direction in time; represents the angle of the offset of light in time.
[0073] Combining the refractive index formula we can get:
[0074]
[0075] Since so in the refractive triangle, it is approximately considered that the long straight angle side is equal to the oblique side, which can be obtained:
[0076]
[0077] Based on the above two formulas, we can get:
[0078]
[0079] In the formula: , represents the refractive index of light in different media; represents the offset distance of light in the x direction in time. Let
[0080] , we can get:
[0081] Since
[0082] is very small, we can assume:
[0083]
[0084] Combining the above two formulas, we can get:
[0085]
[0086] As can be seen, after the refraction of light, its refraction curvature is associated with the refractive index gradient , and the integral of can get the relationship between the refractive index gradient and the deflection angle of light.
[0087]
[0088] The above formula shows that when is greater than zero, the light offset angle is positive, that is, the light will be bent and deflected towards the high refractive index area. Generally speaking, the area with high temperature has small refractive index, so the light will be deflected towards the area with low temperature.
[0089] Substitute the relationship between the light deflection angle and the light offset on the knife edge into the above equation, and combine the Gladstone-Dale quantification, to obtain the relationship between the density gradient of the medium region and the light offset
[0090]
[0091] In the formula, the light offset is represented by L, the Gladstone-Dale constant is represented by L, and the propagation distance of the light in the medium along the direction of the light path is represented by L. The focal length of the main lens is represented by f. The focal length of the main lens is represented by f.
[0092] Simplifying the above equation again, the relationship between the flow field density and the light deflection angle can be obtained.
[0093]
[0094] In the formula, the density of the medium to be measured is represented by ρ, the initial density is represented by ρ0, the temperature of the medium is represented by T, and the ambient temperature is represented by T0. The density of the medium to be measured is represented by ρ. The initial density is represented by ρ0.
[0095] Substitute the ideal gas state equation into the above equation, to obtain the relationship between the temperature in the medium and the deflection angle:
[0096]
[0097] In the formula, the temperature of the medium is represented by T, and the ambient temperature is represented by T0. The temperature of the medium is represented by T. The ambient temperature is represented by T0.
[0098] As can be seen from the above equation, the greater the change in the background relative light intensity, the greater the light deflection angle, indicating a greater refractive index gradient. Since the refractive index is closely related to the temperature, the refractive index is small in areas with high temperature. Therefore, when the light passes through the arc and its surrounding flow field region, it will be deflected towards the low temperature region. The greater the deflection angle, the faster the temperature drops, indicating that the temperature change in this region is also faster. Therefore, by converting the light intensity distribution information into the corresponding gray value change information of the arc region, the temperature change in the flow field can be qualitatively analyzed by the speed of the gray scale gradient change, thereby obtaining the arc flow field analysis result for the arc region. In an exemplary embodiment, the collection side module further includes an enclosed box body, and the image acquisition unit is arranged in the enclosed box body. The light intensity distribution information can be collected by the image acquisition unit of the enclosed box body, ensuring the information collection effect.
[0099] The arc flow field analysis device generates incident light by the light source generation unit, reflects the received incident light to the first parabolic mirror by the first plane mirror, reflects the incident light passing through the arc region of the arc flow field to be analyzed to the second parabolic mirror by the first parabolic mirror, reflects the incident light passing through the arc region to the second plane mirror by the second parabolic mirror, and reflects the incident light to the knife edge by the second plane mirror. The knife edge cuts the light source focal point of the incident light to convert the deflection information of the incident light passing through the arc region into light intensity distribution information on the imaging plane. Finally, the imaging lens arranged behind the knife edge can collimate the incident light passing through the knife edge and image to the imaging plane of the image acquisition unit. The image acquisition unit can acquire the light intensity distribution information and convert the light intensity distribution information into the corresponding gray value change information of the arc region. The arc flow field analysis device can observe the arc, a strong spontaneous light plasma, by the schlieren system, eliminate the influence of the arc spontaneous light, improve the signal-to-noise ratio, realize the schlieren observation of the arc, and effectively improve the test analysis accuracy of the arc region in the arc flow field to be measured.
[0100] In an exemplary embodiment, the incident side module further comprises a converging mirror, which is used to converge the incident light generated by the light source generation unit and make the incident light incident on the first plane mirror after converging processing. The first plane mirror is used to reflect the incident light after converging processing to the first parabolic mirror.
[0101] Exemplarily, a converging mirror can be arranged at the incident side module. The converging mirror is specifically arranged between the light source generation unit and the first plane mirror. The incident light propagates along the optical axis and enters the converging mirror to converge the incident light generated by the light source generation unit and make the incident light incident on the first plane mirror after converging processing. The converging mirror can convert the divergent light emitted by the point light source into parallel light (collimated light) to irradiate through the test region. Under the action of the converging mirror, the light spot is obviously reduced. Since the physical basis of the schlieren method is that the density gradient in the flow field will cause slight deflection of the light, in order to accurately detect the deflection, the incident light must be parallel light (collimated light). Therefore, the converging mirror can be used to converge the incident light generated by the light source generation unit. After converging, the first plane mirror reflects the incident light after converging processing to the first parabolic mirror. In this embodiment, the converging mirror is used to converge the incident light, so that the schlieren effect in the subsequent schlieren processing process can be effectively guaranteed.
[0102] In an exemplary embodiment, the collection side module further comprises a filter, which is used to filter the incident light cut by the knife edge. The imaging lens is used to collimate the incident light after filtering and image to the imaging plane of the image acquisition unit.
[0103] Exemplarily, a filter can be arranged on the collection side to perform filtering processing, and the filter is specifically arranged after the knife edge. The filter can perform filtering processing on the incident light after the knife edge cutting. The imaging lens is used to perform collimation processing on the filtered incident light and image the filtered incident light to the imaging plane of the image acquisition unit. The filter can eliminate the stray light and environmental light interference after the knife edge cutting, and reduce the light intensity entering the image acquisition unit. In this embodiment, the filtered incident light is filtered by the filter, thereby effectively preventing the interference in the imaging process and ensuring the imaging effect.
[0104] In an exemplary embodiment, the arc region of the arc flow field to be analyzed is arranged in an arc burning cavity coated with a high-transmission film, and the thickness of the high-transmission film corresponds to the wavelength of the incident light source generated by the light source generation unit.
[0105] Exemplarily, in the scheme, the arc region of the arc flow field to be analyzed is arranged in an arc burning cavity coated with a high-transmission film, and the thickness of the high-transmission film corresponds to the wavelength of the incident light source generated by the light source generation unit. For example, in the case of a 532 nm LED light source, the arc burning cavity contains a custom glass coated with a 532 nm high-transmission film. The custom glass coated with the high-transmission film on the arc burning cavity enables the parallel light generated after being reflected by the first parabolic mirror to pass through the glass to the measured region to the greatest extent, thereby reducing the reflection of the arc self-luminous light at the window glass inside the cavity and the reflection of the stray light generated when the parallel light beam passes through the glass. In this embodiment, the arc burning cavity coated with the high-transmission film can effectively eliminate the influence of the arc self-luminous light, improve the signal-to-noise ratio, realize the schlieren observation of the arc, and ensure the observation effect.
[0106] In a specific embodiment, the main light path of the schlieren optical platform of the arc flow field analysis device of the present application is shown in the following figure. The present application uses a double "Z" type reflection schlieren system, and the overall light path can be divided into two parts, namely the light source incident side in front of the arc burning cavity and the light source collection side behind the arc burning cavity. Figure 4 The figure is a schematic diagram of the light path of the overall schlieren optical platform, and the propagation direction of the light is from the light source to the camera. All optical elements in the figure need to be specially selected for a 532 nm wavelength light source.
[0107] The LED light source with a working wavelength of 532 nm, the condensing mirror T1, the mirror M1, the parabolic mirror L1, and the custom glass coated with a 532 nm high-transmission film on the arc burning cavity form the incident side system of the schlieren light path. As shown in the figure, the LED light source generates a light beam, and the light beam is reflected by the condensing mirror T1 and the mirror M1 to the parabolic mirror L1. The parabolic mirror L1 reflects the light beam to the custom glass coated with a 532 nm high-transmission film on the arc burning cavity. Figure 4The LED light path propagates along the optical axis. Under the action of the converging mirror T1, the light spot is significantly reduced and falls on the mirror M1. The mirror M1 changes the direction of the LED light beam and reduces the footprint of the schlieren system, so that the whole system can be flexibly adjusted in a smaller range. Meanwhile, the LED light source, the converging mirror T1 and the mirror M1 are located on the same optical axis. After three coaxial adjustments, the mirror M1 is moved forward and backward to change the distance between the mirror M1 and the converging mirror T1, so that the size of the light spot can be finely adjusted without moving the light source outlet and the parabolic mirror L1. The straight-line distance from the light source outlet to the center of the parabolic mirror L1 along the optical axis is 1m, which is equal to the focal length of the parabolic mirror L1. The purpose is to make the cone-shaped light emitted by the LED into a parallel light beam after being reflected by the parabolic mirror L1. The purpose of the custom glass coated with a 532nm high-transmission film on the arc cavity is to make the parallel light generated after being reflected by the parabolic mirror L1 pass through the glass to the maximum extent to reach the measured area, and to minimize the noise influence of the reflected light of the arc self-luminous light at the window glass inside the cavity and the reflected light of the parallel light beam passing through the glass.
[0108] The collection side light path of the schlieren optical platform is composed of the custom glass coated with a 532nm high-transmission film, the parabolic mirror L2, the mirror M2, the knife edge, the optical filter, the imaging lens T2, the closed box and the camera. After the 532nm parallel light beam passes through the measured area, the parallel light beam is deflected when passing through the medium inhomogeneous area. At this time, the light beam contains the flow field information of the measured area. The longer the parallel light path, the more the light beam is deflected, and the more sensitive the schlieren system is. Therefore, under the condition permitted by the site, the distance between the parabolic mirror L1 and the parabolic mirror L2 is increased as much as possible to maximize the sensitivity of the whole schlieren system. The parabolic mirror L2 is mainly used to focus the parallel light beam. In order to ensure the parallelism of the light path and the convenience of adjustment, the size of the parabolic mirror L2 should be the same as that of the parabolic mirror L1. The mirror M2 is mainly used to reflect the light beam focused by the parabolic mirror L2, so that the light beam can accurately fall on the center of the knife edge, and the footprint of the collection side light path is reduced. After the light beam passes through the knife edge, it is imaged and filtered, and finally captured by the high-speed camera to realize the conversion from light intensity to gray value.
[0109] The above-mentioned modules in the arc flow field analysis device can be realized by software, hardware and combinations thereof in whole or in part. The above-mentioned modules can be embedded in or independent of the processor in the computer device in hardware form, or stored in the memory in the computer device in software form, so as to be called and executed by the processor to perform the operations corresponding to the above-mentioned modules.
[0110] Based on the same inventive concept, the application also provides an arc flow field analysis method based on the arc flow field analysis device.
[0111] In one exemplary embodiment, as shown in Figure 5 An arc flow field analysis method is provided, comprising:
[0112] Step 502, in the case of receiving a test analysis request for a target arc flow field, driving the light source generation unit to generate an incident light source.
[0113] Step 504, setting the arc region of the target arc flow field in the arc flow field analysis device.
[0114] Step 506, based on the incident side module of the arc flow field analysis device, the generated incident light source is incident to the arc region, and the light intensity distribution information corresponding to the test light source passing through the arc region is collected through the collection side module of the arc flow field analysis device.
[0115] Step 508, based on the light intensity distribution information, the schlieren analysis processing is carried out to obtain the arc flow field analysis result of the target arc flow field.
[0116] Exemplarily, the application also includes an arc flow field analysis method based on the above-mentioned arc flow field analysis. When a user wants to perform arc flow field analysis, a request can be submitted to a server equipped with the arc flow field analysis method of the application, and the server starts the arc flow field analysis test process. The server, in the case of receiving a test analysis request for a target arc flow field, drives the light source generation unit to generate an incident light source, and sets the arc region of the target arc flow field in the arc flow field analysis device. After starting the analysis, the generated incident light source can be incident to the arc region based on the incident side module of the arc flow field analysis device, and then the light intensity distribution information corresponding to the test light source passing through the arc region is collected through the collection side module of the arc flow field analysis device. After obtaining the light intensity distribution information, the schlieren analysis processing can be further carried out based on the light intensity distribution information to obtain the arc flow field analysis result of the target arc flow field.
[0117] In one of the embodiments, the present application is applicable to the arc flow field analysis of a gas circuit breaker. In the gas circuit breaker, although the cooling process of the arc is closely related to the breaking process of the circuit breaker, the arc flow field structure plays an important role in the arc cooling, but the experimental research on the gas arc flow field structure is relatively insufficient. Therefore, based on the basic principle of the schlieren method, a schlieren optical platform is built to test the arc flow field structure. After obtaining the arc flow field analysis result, the structure optimization information of the gas circuit breaker can be determined based on the arc flow field analysis result; and a structure optimization report of the gas circuit breaker is generated according to the arc flow field analysis result and the structure optimization information. Thus, the arc flow field structure of the gas circuit breaker is qualitatively and quantitatively analyzed, and the internal structure optimization design of the circuit breaker is guided according to the analysis result to improve the cooling efficiency and the breaking capacity.
[0118] The above-mentioned arc flow field analysis method, in the case of receiving a test analysis request for a target arc flow field, drives the light source generation unit to generate an incident light source; and sets an arc region of the target arc flow field in the above-mentioned arc flow field analysis device; based on the incident side module of the arc flow field analysis device, the generated incident light source is incident to the arc region, and the light intensity distribution information corresponding to the test light source passing through the arc region is collected through the collection side module of the arc flow field analysis device; finally, based on the light intensity distribution information, schlieren analysis processing is performed to obtain the arc flow field analysis result of the target arc flow field. The arc flow field analysis device of the present application scheme can observe the arc, a strong spontaneous light plasma, through the schlieren system, eliminate the influence of the arc spontaneous light, improve the signal-to-noise ratio, realize the schlieren observation of the arc, and effectively improve the test analysis accuracy of the arc region in the measured arc flow field.
[0119] It should be understood that, although each step in the flowchart involved in each of the above-mentioned embodiments is displayed in sequence according to the arrow, these steps are not necessarily executed in sequence according to the arrow. Unless otherwise specified herein, the execution of these steps is not strictly limited in sequence, and these steps can be executed in other sequences. Moreover, at least part of the steps in the flowchart involved in each of the above-mentioned embodiments can include multiple steps or stages, which are not necessarily executed at the same time, but can be executed at different times, and the execution sequence of these steps or stages is not necessarily sequential, but can be executed alternately or alternately with at least part of other steps or steps or stages in other steps.
[0120] In one exemplary embodiment, a computer device, which can be a server, is provided, and an internal structure diagram of the computer device can be as shown in FIG. 1. Figure 6As shown in the figure. The computer device includes a processor, a memory, an input / output interface (I / O for short) and a communication interface. Among them, the processor, the memory and the input / output interface are connected through the system bus, and the communication interface is connected to the system bus through the input / output interface. Among them, the processor of the computer device is used to provide computing and control capability. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, a computer program and a database. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The database of the computer device is used to store data related to arc flow field analysis. The input / output interface of the computer device is used to exchange information between the processor and external devices. The communication interface of the computer device is used to communicate with the terminal outside through network connection. The computer program is executed by the processor to realize an arc flow field analysis method.
[0121] Those skilled in the art can understand that, Figure 6 The structure shown in the figure is only a block diagram of part of the structure related to the scheme of the present application, and does not constitute a limitation on the computer device to which the scheme of the present application is applied. The specific computer device can include more or fewer components than those shown in the figure, or combine certain components, or have a different component arrangement.
[0122] In one embodiment, a computer device is also provided, including a memory and a processor, the memory storing a computer program, and the processor executing the computer program to realize the steps in each of the above method embodiments.
[0123] In one embodiment, a computer readable storage medium is provided, storing a computer program, which is executed by a processor to realize the steps in each of the above method embodiments.
[0124] In one embodiment, a computer program product or computer program is provided, which includes computer instructions stored in a computer readable storage medium. The processor of the computer device reads the computer instructions from the computer readable storage medium, and the processor executes the computer instructions, so that the computer device executes the steps in each of the above method embodiments.
[0125] It should be noted that the user information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data for analysis, stored data, displayed data, etc.) involved in the present application are all information and data authorized by the user or authorized by all parties, and the collection, use and processing of related data need to comply with relevant regulations.
[0126] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiment methods can be completed by instructing the relevant hardware through a computer program. The computer program can be stored in a non-volatile computer readable storage medium, and when executed, can include the processes of the above-mentioned embodiment methods. Any reference to memory, database or other medium used in the embodiments provided in the present application can include at least one of non-volatile memory and volatile memory. The non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical storage, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetoresistive random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. The volatile memory can include random access memory (RAM) or external cache memory, etc. As an illustration but not limitation, the RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM), etc. The database involved in the embodiments provided in the present application can include at least one of a relational database and a non-relational database. The non-relational database can include a distributed database based on a block chain, etc., without being limited thereto. The processor involved in the embodiments provided in the present application can be a general-purpose processor, a central processing unit, a graphics processing unit, a digital signal processor, a programmable logic device, an artificial intelligence (AI) processor, etc., without being limited thereto.
[0127] The technical features of the above embodiments can be combined in any manner. To make the description concise, not all possible combinations of the technical features in the above embodiments are described, but as long as the combinations of the technical features do not exist contradictions, they should be considered as the scope of the present application.
[0128] The above-described embodiments are merely illustrative of several embodiments of the present application, and the description is relatively specific and detailed, but should not be understood as a limitation on the scope of the patent. It should be noted that for those skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the scope of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.
Claims
1. An electric arc flow field analysis device, characterized in that, The device includes an incident-side module and a collection-side module; The incident-side module includes a light source generating unit, a first planar reflector and a first parabolic reflector, and the collection-side module includes a second parabolic reflector, a second planar reflector, a blade, an imaging lens and an image acquisition unit. The light source generation unit generates incident light rays. The first planar reflector reflects the received incident light rays to the first parabolic reflector. The first parabolic reflector reflects the incident light rays through the arc region of the arc flow field to be analyzed to the second parabolic reflector. The second parabolic reflector reflects the incident light rays through the arc region to the second planar reflector. The second planar reflector reflects the incident light rays to the cutting edge. The cutting edge cuts the light source focal point of the incident light rays to convert the deflection information of the incident light rays through the arc region into light intensity distribution information on the imaging plane. The imaging lens straightens the incident light rays passing through the cutting edge and images them onto the imaging plane of the image acquisition unit. The image acquisition unit acquires the light intensity distribution information and converts the light intensity distribution information into grayscale value change information corresponding to the arc region.
2. The apparatus according to claim 1, characterized in that, The incident side module also includes a beam-receiving mirror, which is used to gather the incident light generated by the light source generating unit and then train the incident light into the first planar reflector. The first planar reflector is used to reflect the incident light rays, after receiving the convergence treatment, back to the first parabolic reflector.
3. The apparatus according to claim 2, characterized in that, The collection-side module also includes a filter, which is used to filter the incident light after it has been cut by the blade. The imaging lens is used to straighten the incident light after it has been filtered and image it onto the imaging plane of the image acquisition unit.
4. The apparatus according to claim 1, characterized in that, The arc region of the arc flow field to be analyzed is set in an arc cavity coated with a high-transparency film, the thickness of which corresponds to the wavelength of the incident light source generated by the light source generation unit.
5. The apparatus according to any one of claims 1 to 4, characterized in that, The collection-side module also includes a closed enclosure, and the image acquisition unit is disposed in the closed enclosure.
6. A method for analyzing electric arc flow fields, characterized in that, The method includes: Upon receiving a test and analysis request for the target electric arc flow field, the drive light source generation unit generates an incident light source; An arc region of the target arc flow field is set in an arc flow field analysis device, wherein the arc flow field analysis device includes the arc flow field analysis device of any one of claims 1 to 5; The incident light source generated by the incident side module of the electric arc flow field analysis device is incident onto the electric arc region, and the light intensity distribution information corresponding to the test light source passing through the electric arc region is collected by the collection side module of the electric arc flow field analysis device. Based on the light intensity distribution information, schlieren analysis is performed to obtain the arc flow field analysis results of the target arc flow field.
7. The method according to claim 6, characterized in that, The target electric arc flow field includes the internal flow field of the gas circuit breaker; The method further includes: Based on the results of the electric arc flow field analysis, the structural optimization information of the gas circuit breaker is determined; Based on the results of the arc flow field analysis and the structural optimization information, a structural optimization report for the gas circuit breaker is generated.
8. A computer device comprising a memory and a processor, wherein the memory stores a computer program, characterized in that, When the processor executes the computer program, it implements the steps of the method according to any one of claims 6 to 7.
9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 6 to 7.
10. A computer program product, comprising a computer program, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 6 to 7.