Gas path system of process chamber and semiconductor process equipment

Abstract

The invention discloses a gas path system of a process chamber and semiconductor process equipment, and belongs to the technical field of semiconductors. The gas path system of the process chamber comprises at least two gas conveying pipelines, each gas conveying pipeline is provided with at least one control valve, and each control valve controls the corresponding gas conveying pipeline to be connected and disconnected. The at least two control valves are wrapped by heating assemblies to be integrated into valve sets, so that the heating assemblies heat the control valves in the corresponding valve sets at the same time. The semiconductor process equipment comprises a process chamber and the gas path system, and the outlet end of at least one of the at least two gas conveying pipelines is communicated with the process chamber. According to the arrangement, when the gas flows through the control valve, the temperature of the control valve is high, cold points are avoided, the gas is prevented from being liquefied when cooled in the circulation process, the gas can be continuously in a steam state and smoothly conveyed into the process chamber, the amount of the gas conveyed into the process chamber is guaranteed, and the process effect is improved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of semiconductor, and particularly relates to a gas path system of a process chamber and a semiconductor process equipment. BACKGROUND

[0002] In the semiconductor process equipment, a gas path system is usually used to provide the process chamber with substances required for processing wafers, and the states of the substances include gas and liquid. The gaseous substances are directly delivered into the process chamber, while the liquid substances need to be converted into gas before being delivered into the process chamber.

[0003] However, whether the gaseous substances or the gas after vaporization of the liquid substances, there is a risk of liquefaction before entering the process chamber, which results in insufficient amount of the substances delivered into the process chamber and affects the process effect. SUMMARY

[0004] The purpose of the embodiments of the present application is to provide a gas path system of a process chamber and a semiconductor process equipment, which solves the problem of insufficient amount of the substances delivered into the process chamber due to the risk of liquefaction of the gas delivered by the related art gas path system, and affects the process effect.

[0005] In a first aspect, the embodiments of the present application provide a gas path system of a process chamber, which comprises at least two gas delivery pipelines, each of which is provided with at least one control valve, and each of the control valves controls the on-off of the corresponding gas delivery pipeline. The at least two control valves are wrapped by a heating assembly and integrated into a valve group, so that the heating assembly simultaneously heats each of the control valves in the valve group.

[0006] In a second aspect, the embodiments of the present application further provide a semiconductor process equipment, which comprises a process chamber and the above-mentioned gas path system, and the outlet end of at least one of the at least two gas delivery pipelines is in communication with the process chamber.

[0007] In the embodiments of the present application, the gas path system of the process chamber can deliver gaseous substances or gas after vaporization of liquid substances by using the gas delivery pipelines, and each of the control valves controls the on-off of the corresponding gas delivery pipeline. The at least two control valves are wrapped by a heating assembly and integrated into a valve group, so that the at least two control valves form an integral module together, which facilitates the heating assembly to simultaneously heat the multiple control valves and is also conducive to uniformly heating the multiple control valves. When the gas flows through the control valve, the temperature of the control valve is relatively high, which avoids the cold spot and prevents the gas from being liquefied due to cold in the flow process, and is conducive to the gas to continuously be in the vapor state and be smoothly delivered into the process chamber, so as to ensure the amount of the gas delivered into the process chamber and improve the process effect. BRIEF DESCRIPTION OF DRAWINGS

[0008] Figure 1is a structural schematic diagram of a semiconductor process equipment disclosed by an embodiment of the present application; Figure 2 is a structural schematic diagram of a heating device disclosed by an embodiment of the present application; Figure 3 is an exploded view of a heating device disclosed by an embodiment of the present application; Figure 4 is a top view of a heating device disclosed by an embodiment of the present application; Figure 5 is a structural schematic diagram of a control valve disclosed by an embodiment of the present application; Figure 6 is a structural schematic diagram of a heating device disclosed by another embodiment of the present application; Figure 7 is an exploded view of a heating device disclosed by another embodiment of the present application; Figure 8 is a schematic diagram of a process chamber and a gas path system disclosed by an embodiment of the present application; Figure 9 is a partial structural schematic diagram of a semiconductor process equipment disclosed by an embodiment of the present application; Figure 10 is a double-cavity schematic diagram of a semiconductor process equipment disclosed by an embodiment of the present application.

[0009] Legend of reference signs: 10 - gas path system, 100 - first gas delivery pipeline, 111 - first gas delivery pipe section, 112 - second gas delivery pipe section, 200 - second gas delivery pipeline, 210 - first purge pipeline, 220 - second purge pipeline, 230 - detection communication pipeline, 231 - first detection communication pipeline, 232 - second detection communication pipeline, 300 - valve group, 310 - control valve, 3101 - valve head, 310a - leak detection hole, 301 - first valve group, 3011 - first liquid source control valve, 3012 - first purge control valve, 3013 - detection control valve, 3013a - first detection control valve, 3013b - second detection control valve, 302 - second valve group, 3021 - second liquid source control valve, 3022 - second purge control valve, 3023 - gas source control valve, 320 - heating assembly, 321 - heating element, 3211 - side heating part, 3211a - avoiding groove, 3212 - top heating part, 3212a - opening, 3213 - bottom heating part, 322 - heat conduction part, 3221 - side heat conduction block, 3221a - groove, 3222 - bottom heat conduction plate, 3223 - bottom heat conduction block, 3223a - fastener, 322a - slotted, 330 - thermal insulation, 340 - base, 350 - temperature sensing element, 360 - flow block, 400 - vaporization device, 500 - gas storage device, 510 - gas storage heating element, 600 - detection element, 610 - first detection element, 620 - second detection element, 710 - first detection chamber, 720 - second detection chamber, 730 - third detection chamber, 740 - exhaust pipe, 741 - gas detector, 800 - liquid supplement device, 900 - third gas delivery pipeline, 910 - protective gas pipeline, 920 - process gas pipeline, 20 - process chamber, 30 - vacuum pump, 40 - exhaust pipeline, 41 - pressure control element, 42 - third detection element, 50 - auxiliary pressure regulating pipeline, 51 - gas flow quality controller, S1 - first chamber, S2 - second chamber. DETAILED DESCRIPTION

[0010] The technical solutions in the embodiments of the present application will be described clearly below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art belong to the scope of protection of the present application.

[0011] The terms "first", "second", and the like in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than those illustrated or described herein, and the objects distinguished by "first", "second", etc. are usually a class, not limited to the number of objects, for example, the first object can be one or more. In addition, "and / or" in the specification and claims indicates at least one of the connected objects, and the character " / ", generally indicates that the front and rear associated objects are in an "or" relationship.

[0012] The gas path system of the process chamber and the semiconductor process equipment provided by the embodiments of the present application will be described in detail below in conjunction with the drawings, specific embodiments and application scenarios.

[0013] Reference is made to Figures 1-10The embodiments of the present application disclose a gas path system 10 of a process chamber 20, the gas path system 10 comprises at least two gas delivery pipes for delivering gas to the process chamber 20, and different gas delivery pipes are respectively used for delivering different kinds of gas to the process chamber 20. Of course, the gas path system 10 can also comprise an exhaust pipe 40 for exhausting gas in the process chamber 20.

[0014] Reference Figure 1 As shown in the figure, at least one control valve 310 is arranged in each gas delivery pipe respectively, and each control valve 310 controls the on-off of the corresponding gas delivery pipe. When the control valve 310 is opened, the corresponding gas delivery pipe is in a conducting state; when the control valve 310 is closed, the corresponding gas delivery pipe is in a cut-off state. Optionally, one control valve 310 is arranged in each gas delivery pipe, or at least two control valves 310 are arranged in each gas delivery pipe, and different control valves 310 arranged in the same gas delivery pipe control the on-off of different positions of the gas delivery pipe.

[0015] Optionally, the control valve 310 can be, but is not limited to, a hand valve, a pneumatic valve, etc. The embodiments of the present application do not limit the specific type of the control valve 310, and the structures of the control valves 310 can be the same or different.

[0016] The at least two control valves 310 are wrapped by the heating assembly 320 to be integrated into the valve group 300, so that the heating assembly 320 simultaneously heats the control valves 310 in the corresponding valve group 300. That is, the valve group 300 is integrated by the at least two control valves 310 and the heating assembly 320, and the control valves 310 arranged in each gas delivery pipe can be used to integrate the valve group 300, or the control valves 310 arranged in part of the gas delivery pipes can be used to integrate the valve group 300; the at least two control valves 310 used to integrate the same valve group 300 can be different control valves 310 of the same gas delivery pipe, or can be control valves 310 arranged in different gas delivery pipes, and the embodiments of the present application do not limit this.

[0017] Optionally, the heating assembly 320 can be a heating belt, a heating sheet or the like structure, and the embodiments of the present application do not limit the specific structure of the heating assembly 320. In summary, the heating assembly 320 wraps the at least two control valves 310, so that the wrapped at least two control valves 310 form an integral structure, and are integrated into the valve group 300, thereby facilitating the heating assembly 320 to simultaneously heat the at least two control valves 310.

[0018] In the embodiment of the present application, the gas path system 10 of the process chamber 20 can use the gas delivery pipeline to deliver the gas of the gaseous substance or the gas after the vaporization of the liquid substance, and each control valve 310 controls the opening and closing of the corresponding gas delivery pipeline. At least two control valves 310 are integrated into the valve group 300 by being wrapped by the heating assembly 320, so that the at least two control valves 310 form an integral module together, facilitating the heating assembly 320 to heat the plurality of control valves 310 simultaneously, and also facilitating the uniform heating of the plurality of control valves 310. When the gas flows through the control valve 310, the temperature of the control valve 310 is relatively high, so as to avoid the cold spot and prevent the gas from being liquefied due to the cold in the flow process, which is beneficial to the gas to be continuously in the vapor state and smoothly delivered into the process chamber 20, ensuring the amount of gas delivered into the process chamber 20, and improving the process effect.

[0019] In the optional solution of the present application, referring to FIG. 2, the heating assembly 320 includes a heating element 321 and a heat conduction member 322. The heat conduction member 322 wraps at least part of each control valve 310, and here the control valves 310 are at least two control valves 310 integrated into the same valve group 300. The heating element 321 wraps at least part of the heat conduction member 322, and the heating element 321 is in heat conduction connection with the control valves 310 through the heat conduction member 322. Figure 2

[0020] The heating element 321 can be a heating rod, a heating belt, a heating sheet, etc., and the heating element 321 generates heat when electrified. The heat conduction member 322 can be a heat conduction block, a heat conduction sheet, a heat conduction plate, etc., and the heat conduction member 322 is made of aluminum or other materials with excellent heat conduction effect.

[0021] By using the embodiment, the heating assembly 320 is additionally provided with the heat conduction member 322, which is beneficial to improving the heat conduction efficiency between the heating element 321 and the control valve 310, and facilitating the rapid heat transfer of the heating element 321 to different areas of the control valve 310. Moreover, the heat conduction member 322 transmits heat to each control valve 310, so that the heating element 321 does not need to wrap each control valve 310, the distribution area of the heating element 321 can be reduced, and the volume of the heating element 321 can be reduced. That is, the integration of the control valves 310 into the valve group 300 mainly relies on the wrapping effect of the heat conduction member 322.

[0022] ​Of course, in other embodiments, the heating assembly 320 can not include the heat-conducting member 322, and the heating assembly 320 is only provided with the heating element 321, and the heating element 321 is wrapped around at least part of each control valve 310 and is directly in heat-conducting connection with each control valve 310.

[0023] In optional embodiments, referring to Figure 2 and Figure 3 , the heat-conducting member 322 includes a side heat-conducting block 3221 for transferring heat of the heating element 321 to the side of each control valve 310 and a bottom heat-conducting plate 3222 for transferring heat of the heating element 321 to the bottom of each control valve 310. The side heat-conducting block 3221 wraps around the side of each control valve 310, and the heating element 321 is in heat-conducting connection with the control valve 310 through the side heat-conducting block 3221. The bottom heat-conducting plate 3222 is arranged at the bottom of the control valve 310, and the heating element 321 is in heat-conducting connection with each control valve 310 through the bottom heat-conducting plate 3222.

[0024] Optionally, the bottom heat-conducting plate 3222 can be an aluminum plate, and the side heat-conducting block 3221 can be an aluminum block having a length capable of extending along the arrangement direction of the control valves 310. The bottom heat-conducting plate 3222 supports each control valve 310, the side heat-conducting block 3221, and the heating element 321. The bottom heat-conducting plate 3222 can be in direct contact with each control valve 310, and the side heat-conducting block 3221 is in direct contact with each control valve 310.

[0025] Optionally, referring to Figure 3 and Figure 4 , the plurality of control valves 310 of the same valve group 300 are arranged in a line, and the number of the side heat-conducting blocks 3221 is two. Each of the two side heat-conducting blocks 3221 is provided with a plurality of grooves 3221a for the different control valves 310 to extend into. The grooves 3221a correspond to the control valves 310 one by one. In this way, the two side heat-conducting blocks 3221 clamp each control valve 310 from two sides thereof, respectively. Meanwhile, each control valve 310 extends into the grooves 3221a of the two side heat-conducting blocks 3221, respectively, and the two side heat-conducting blocks 3221 are in contact with each other, thereby wrapping around the side of each control valve 310. Alternatively, referring to Figure 7 , the plurality of control valves 310 of the same valve group 300 are arranged in a square array, and the number of the control valves 310 of the same valve group 300 is four. The number of the side heat-conducting blocks 3221 is also four. Each of the side heat-conducting blocks 3221 is provided with two grooves 3221a. Two of the side heat-conducting blocks 3221 clamp two control valves 310 together, and the other two of the side heat-conducting blocks 3221 clamp the other two control valves 310 together, thereby wrapping around the side of each control valve 310.

[0026] Of course, the multiple control valves 310 in the same valve group 300 can also be arranged in other ways, and the side heat conduction blocks 3221 can also be of other quantities. In short, the side heat conduction blocks 3221 can cover the side of each control valve 310.

[0027] In this embodiment, the heat-conducting component 322 includes a side heat-conducting block 3221 and a bottom heat-conducting plate 3222. The heat-conducting component 322 increases the area of ​​the control valve 310 it covers. The heat-conducting component 322 can conduct heat to the sides of each control valve 310 and to the bottom of each control valve 310, which is beneficial to further improve the heat conduction efficiency and enable each control valve 310 of the same valve group 300 to be heated quickly.

[0028] Of course, in other embodiments, the heat-conducting element 322 may only have a side heat-conducting block 3221 or only a bottom heat-conducting plate 3222.

[0029] In a further embodiment, reference is made to... Figure 2 and Figure 3 As shown, the heat-conducting component 322 also includes a bottom heat-conducting block 3223, which is disposed on the surface of the bottom heat-conducting plate 3222 facing the control valve 310. At least one of the bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222 has a slot 322a. A portion of the gas supply pipeline connected to the control valve 310 extends into the slot 322a, so that the bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222 together enclose a portion of the gas supply pipeline. Specifically, only the bottom heat-conducting block 3223 may have a slot 322a, or only the bottom heat-conducting plate 3222 may have a slot 322a, or both the bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222 may have slots 322a.

[0030] The bottom heat-conducting block 3223 is made of the same material as the bottom heat-conducting plate 3222. The bottom heat-conducting block 3223 can be made of aluminum. The bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222 can be fixedly connected by welding, bolts or other methods.

[0031] Optionally, there can be multiple bottom heat-conducting blocks 3223, each of which cooperates with the bottom heat-conducting plate 3222 to wrap different gas transmission pipelines. The control valve 310 can achieve a thermally conductive connection with the bottom heat-conducting block 3223 through contact or other means, thereby establishing a thermally conductive connection between the bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222. Further optionally, the bottom heat-conducting block 3223 and the bottom heat-conducting plate 3222 can be fixedly connected using fasteners 3223a such as screws and bolts, thereby stably wrapping the gas transmission pipeline.

[0032] With the embodiment, the heat conduction member 322 is additionally provided with the bottom heat conduction block 3223, so that the heat conduction member 322 not only wraps at least part of each control valve 310, but also wraps part of the gas delivery pipeline. Then, the heat of the heating element 321 is not only transferred to the control valve 310, but also to the part of the gas delivery pipeline connected with the control valve 310, so that the gas delivery pipeline is also heated, which is more conducive to preventing the gas from being liquefied due to cold during the flow process, ensuring the amount of gas delivered to the process chamber 20, and being conducive to further improving the process effect.

[0033] Of course, in other embodiments, the heat conduction member 322 can not be provided with the bottom heat conduction block 3223, that is, the part of the gas delivery pipeline connected with the control valve 310 is not wrapped by the heat conduction member 322.

[0034] In optional embodiments, as shown in Figure 3 The valve group 300 can further include a flow channel block 360, that is, the control valve 310, the heating assembly 320, and the flow channel block 360 are collectively integrated into the valve group 300. The flow channel block 360 is arranged on the surface of the bottom heat conduction plate 3222 facing the control valve 310. Each control valve 310 is arranged on the bottom heat conduction plate 3222 through the flow channel block 360, and each control valve 310 of the same valve group 300 is in communication with the corresponding gas delivery pipeline through the flow channel block 360. Optionally, the bottom heat conduction block 3223 can be connected with the flow channel block 360, so that the gas delivery pipeline wrapped by the bottom heat conduction block 3223 and the bottom heat conduction plate 3222 is further communicated with the control valve 310 through the flow channel block 360.

[0035] Further optionally, the flow channel block 360 can be a metal heat conduction structure, which can further transfer the heat transferred by the bottom heat conduction plate 3222 to each control valve 310 and to the gas flowing through the internal flow channel, so as to avoid affecting the heat conduction process between the bottom heat conduction plate 3222 and the control valve 310.

[0036] In further embodiments, as shown in Figure 2 and Figure 6As shown, the heating element 321 comprises a top heating piece 3212, a side heating piece 3211 and a bottom heating piece 3213 connected in sequence, the side heating piece 3211 wraps the side heat conduction block 3221, the top heating piece 3212 is located at the top of the side heating piece 3211, and the top heating piece 3212 is provided with an opening 3212a for the valve head 3101 of the control valve 310 to penetrate, and the bottom heating piece 3213 is located at the bottom of the side heating piece 3211 and is arranged on the bottom heat conduction plate 3222. That is, the heat conduction piece 322 wraps the valve body part of each control valve 310, the top heating piece 3212, the side heating piece 3211 and the bottom heat conduction plate 3222 together form a heating space, and the valve body part of the control valve 310 is located in the heating space. Among them, the top heating piece 3212 can be in direct contact with the control valve 310 or not in contact.

[0037] Optionally, the bottom heat conduction plate 3222 simultaneously supports the side heating piece 3211 and the side heat conduction block 3221, the side heating piece 3211 is in contact with the bottom heat conduction plate 3222 to realize the heat conduction connection between the side heating piece 3211 and the bottom heat conduction plate 3222; and the side heating piece 3211 supports the top heating piece 3212, the side heating piece 3211 is in contact with the top heating piece 3212 to realize the heat conduction connection between the side heating piece 3211 and the top heating piece 3212. Further optionally, the side heating piece 3211 and the bottom heat conduction plate 3222, and the side heating piece 3211 and the top heating piece 3212 can be connected by welding or the like.

[0038] Among them, the side heating piece 3211 is an annular heating band, the annular heating band wraps each side heat conduction block 3221, and the inner wall surface of the annular heating band is in contact with each side heat conduction block 3221 at the same time; the bottom heating piece 3213 is a heating rod arranged in the inside of the bottom heat conduction plate 3222. Optionally, referring to Figure 3 As shown, the side heating piece 3211 can be provided with an avoidance groove 3211a for avoiding the bottom heat conduction block 3223 to avoid interference between the side heating piece 3211 and the bottom heat conduction block 3223.

[0039] By adopting the embodiment, the heating element 321 simultaneously comprises the top heating piece 3212, the side heating piece 3211 and the bottom heating piece 3213 to heat the top, the side and the bottom of the control valve 310 respectively, which is conducive to increasing the distribution area and the heating area of the heating element 321, and further conducive to shortening the heat conduction path of the heat conduction piece 322 and further improving the heat conduction efficiency, and more conducive to rapidly heating the control valve 310.

[0040] Moreover, the top heating member 3212, the side heating member 3211 and the bottom heat-conducting plate 3222 form a heating space, the heating space is a relatively closed space, the side heat-conducting block 3221 and the valve body part of the control valve 310 are located in the heating space, which is beneficial to avoid heat loss, and is more beneficial to heat transfer from the bottom, side and top of the control valve 310, and is beneficial to fully heat the control valve 310.

[0041] Of course, in other embodiments, the heating element 321 can not be provided with the top heating member 3212 or the bottom heating member 3213.

[0042] In optional embodiments, as shown in Figure 2 and Figure 3 The valve group 300 further includes a base 340 and a heat insulation member 330, the base 340 serves as a support, the heat insulation member 330 is arranged on the base 340, and the heat-conducting member 322, the control valves 310 and the heating element 321 are arranged on the base 340 through the heat insulation member 330. That is, the bottom heat-conducting plate 3222 is in direct contact with the heat insulation member 330, and the heat insulation member 330 is in direct contact with the base 340.

[0043] Optionally, the base 340 can be made of metal such as steel, which has excellent support performance; the heat insulation member 330 can be a heat insulation plate, and the heat insulation member 330 can be made of non-metal material such as plastic, the heat insulation member 330 does not have heat conduction effect, and the base 340 and the heat insulation member 330 can be connected through threaded fasteners such as screws and bolts.

[0044] By using the base 340 to support the heating assembly 320 and the control valves 310, and adding the heat insulation member 330 to isolate the base 340 and the heat-conducting member 322, heat of the heating element 321 is prevented from being transferred to the base 340 through the heat-conducting member 322 and the heat insulation member 330, and heat of the heating element 321 is ensured to be fully transferred to the control valves 310.

[0045] Of course, in other embodiments, the valve group 300 can not be provided with the heat insulation member 330, that is, the heat-conducting member 322, the control valves 310 and the heating element 321 are directly arranged on the base 340, and the bottom heat-conducting plate 3222 is in direct contact with the base 340.

[0046] In optional embodiments, as shown in Figure 5As shown, the valve group 300 further comprises a temperature sensing member 350, which can be but is not limited to a temperature sensor, and which is arranged on the control valve 310 to sense the heating temperature of the control valve 310, and the heating state of the heating element 321 is adjusted according to the temperature detection information of the temperature sensing member 350. Specifically, when the temperature sensed by the temperature sensing member 350 is high, it indicates that the temperature of the control valve 310 is high, and the gas in the control valve 310 is in a vapor state, at which time the heating element 321 stops heating or reduces the heating degree; when the temperature sensed by the temperature sensing member 350 is low, it indicates that the temperature of the control valve 310 is low, and the gas in the control valve 310 is prone to liquefaction, so the heating degree of the control element 321 is increased at this time.

[0047] Optionally, the heating element 321 is an electric heating element, and the heating element 321 can be in communication connection with the temperature sensing member 350, and further optionally, the gas path system 10 further comprises a control element, which can be a programmable logic controller, and the control element is in communication connection with the heating element 321 and the temperature sensing member 350, and the control element adjusts the heating temperature of the heating element 321 according to the temperature sensed by the temperature sensing member 350.

[0048] Optionally, referring to Figure 5 As shown, the control valve 310 is provided with a leak detection hole 310a, through which the control valve 310 is monitored for leakage problems, and the temperature sensing member 350 is directly installed through the leak detection hole 310a, and the temperature sensing member 350 is inserted into the leak detection hole 310a, and the detection end of the temperature sensing member 350 is close to the flow channel of the control valve 310, which is conducive to accurately detecting the temperature of the flow channel, and further adjusting the heating state of the heating element 321 according to the temperature of the flow channel.

[0049] By using the embodiment, the valve group 300 is additionally provided with the temperature sensing member 350, the heating state of the heating element 321 is controlled in real time according to the temperature sensed by the temperature sensing member 350, the temperature of the control valve 310 is in real time to meet the process needs, the gas in the flow channel is maintained in a vapor state, and cold spots are avoided in the control valve 310 or vapor liquefaction is caused.

[0050] Optionally, referring to Figure 5 As shown, at least two leak detection holes 310a can be arranged at intervals on the same control valve 310, and different temperature sensing members 350 are respectively arranged in the leak detection holes 310a, that is, at least two temperature sensing members 350 are arranged at intervals on the control valve 310, and different temperature sensing members 350 sense the temperatures at different positions of the control valve 310, which is conducive to accurately sensing the temperature of the control valve 310 and avoiding inaccurate local detection.

[0051] Of course, in other embodiments, the valve group 300 can not be provided with the temperature sensor 350, and the heating state of the heating element 321 can be controlled in real time to ensure that the gas in the control valve 310 is in a vapor state.

[0052] In an optional solution of the present application, the plurality of control valves 310 of the same valve group 300 are arranged in an array.

[0053] Optionally, as shown in Figures 2-4 , the plurality of control valves 310 of the same valve group 300 can be arranged in a linear array, or, as shown in Figure 6 and Figure 7 , the plurality of control valves 310 of the same valve group 300 can be arranged in a square array. Of course, the plurality of control valves 310 of the same valve group 300 can also be arranged in other array manners, which are not limited in the embodiments of the present application.

[0054] With the plurality of control valves 310 arranged in an array, it is beneficial for the heating assembly 320 to successfully wrap the plurality of control valves 310 at the same time, and it is beneficial for each control valve 310 to be heated uniformly. In the embodiments in which the heating assembly 320 includes the heat-conducting element 322 and the heating element 321, the array arrangement of the control valves 310 is beneficial for the heat-conducting element 322 to successfully wrap each control valve 310, and the heat-conducting element 322 adopts a relatively regular structure, which is further beneficial for the heating element 321 to successfully wrap the heat-conducting element 322 with a regular structure, thereby being beneficial for each control valve 310 to be heated more uniformly.

[0055] Of course, in other embodiments, the plurality of control valves 310 of the same valve group 300 can not be arranged in an array.

[0056] In an optional solution of the present application, as shown in Figure 1 , the at least two gas conveying pipelines include a first gas conveying pipeline 100 and a second gas conveying pipeline 200, the first gas conveying pipeline 100 is used to convey the gaseous substance converted from the liquid substance, and the second gas conveying pipeline 200 is used to communicate the first gas conveying pipeline 100.

[0057] The first gas conveying pipeline 100 comprises a first gas conveying pipeline section 111 and a second gas conveying pipeline section 112. The inlet end of the first gas conveying pipeline section 111 is configured to be connected to the gaseous substance converted from the liquid substance. The outlet end of the first gas conveying pipeline section 111 is connected to the inlet end of the second gas conveying pipeline section 112. The outlet end of the second gas conveying pipeline section 112 is configured to be connected to the process chamber 20. The number of the second gas conveying pipelines 200 is at least two. The first gas conveying pipeline section 111 and the second gas conveying pipeline section 112 are both connected to the second gas conveying pipelines 200. The second gas conveying pipelines 200 are not limited to purge pipelines. The first gas conveying pipeline section 111, the second gas conveying pipeline section 112, and the second gas conveying pipelines 200 are all provided with control valves 310. The control valve 310 provided on the first gas conveying pipeline section 111 is a first liquid source control valve 3011. The control valve 310 provided on the second gas conveying pipeline section 112 is a second liquid source control valve 3021.

[0058] The control valve 310 provided on the first gas conveying pipeline section 111 and the control valve 310 provided on the second gas conveying pipeline 200 connected to the first gas conveying pipeline section 111 are integrated into a first valve group 301. The control valve 310 provided on the second gas conveying pipeline section 112 and the control valve 310 provided on the second gas conveying pipeline 200 connected to the second gas conveying pipeline section 112 are integrated into a second valve group 302.

[0059] Optionally, the first gas conveying pipeline section 111 is connected to three second gas conveying pipelines 200. The functions of the second gas conveying pipelines 200 are different. The control valve 310 provided on the first gas conveying pipeline section 111 and the control valves 310 provided on the three second gas conveying pipelines 200 connected to the first gas conveying pipeline section 111 are collectively integrated into the first valve group 301. The second gas conveying pipeline section 112 is connected to one second gas conveying pipeline 200. The control valve 310 provided on the second gas conveying pipeline section 112 and the control valve 310 provided on the one second gas conveying pipeline 200 connected to the second gas conveying pipeline section 112 are collectively integrated into the second valve group 302.

[0060] Further optionally, in addition to the control valve 310 provided on the second gas conveying pipeline section 112 and the control valve 310 provided on the second gas conveying pipeline 200, the control valves 310 of other pipelines can also be collectively integrated into the second valve group 302. That is, the number of valve groups 300 is increased. The first valve group 301 and the second valve group 302 are included in the plurality of valve groups 300.

[0061] With the embodiment, the number of valve groups 300 is increased. Therefore, the control valves 310 provided on more gas conveying pipelines are integrated into valve groups 300. It is indicated that the control valves 310 of more gas conveying pipelines are heated by the heating assembly 320. When the gas flows through the control valves 310 of different gas conveying pipelines, the temperature of each control valve 310 is relatively high. The cold spot is effectively avoided. It is beneficial for the gas conveyed by each gas conveying pipeline to continuously be in a vapor state. Therefore, the gas is stably conveyed.

[0062] Furthermore, since the second gas supply line 200 is connected to the first gas supply line 100, gas inevitably enters the second gas supply line 200 during the gas supply process of the first gas supply line 100, and then comes into contact with the control valve 310 of the second gas supply line 200. Therefore, the control valve 310 of the second gas supply line 200 is also heated by the heating component 320, which prevents the gas supplied by the first gas supply line 100 from liquefying, and is more conducive to the gas supplied by the first gas supply line 100 remaining in a vapor state, thereby ensuring stable gas supply.

[0063] Of course, in other embodiments, the number of valve groups 300 can be one, with only the control valve 310 provided in the first gas supply pipe section 111 and the control valve 310 provided in the second gas supply pipe 200 connected to the first gas supply pipe section 111 integrated into the first valve group 301; or, only the control valve 310 of the second gas supply pipe section 112 and the control valve 310 provided in the second gas supply pipe 200 connected to the second gas supply pipe section 112 integrated into the second valve group 302.

[0064] In an optional embodiment, refer to Figure 1 As shown, at least two gas supply lines also include a third gas supply line 900. The control valve 310 of the third gas supply line 900 is a gas source control valve 3023, which controls the on / off state of the third gas supply line 900. The third gas supply line 900 is arranged side by side with the first gas supply line 100 and is used to connect to the process chamber 20. The third gas supply line 900 is equipped with a control valve 310. The control valve 310 located in the second gas supply line section 112, the control valve 310 located in the second gas supply line 200 connected to the second gas supply line 200, and the control valve 310 located in the third gas supply line 900 are integrated into a second valve group 302.

[0065] Optionally, the third gas supply line 900 can be used to supply protective gas or process gas, and the third gas supply line 900 supplies the gas to the process chamber 20.

[0066] In this embodiment, not only do the control valves 310 of the second gas supply pipeline section 112 and the second gas supply pipeline 200 participate in the integration of the second valve group 302, but the control valve 310 of the third gas supply pipeline 900 also participates in the integration of the second valve group 302. That is to say, the control valve 310 of the third gas supply pipeline 900 is also wrapped and heated by the heating component 320. Therefore, the temperature of the control valve 310 of the third gas supply pipeline 900 is higher, which effectively avoids the occurrence of cold spots and is conducive to the gas transported by the third gas supply pipeline 900 being in a vapor state, thereby ensuring that the gas is stably transported into the process chamber 20.

[0067] Of course, in other embodiments, the gas delivery pipeline can not include the third gas delivery pipeline 900 described above, and only the control valve 310 arranged at the second gas delivery pipeline segment 112 and the control valve 310 arranged at the second gas delivery pipeline 200 connected to the second gas delivery pipeline 200 are integrated into the second valve group 302.

[0068] In an alternative embodiment, the number of third gas delivery pipelines 900 can be one.

[0069] In another embodiment, as shown in Figure 1 , the number of third gas delivery pipelines 900 can be at least two, and each third gas delivery pipeline 900 is parallel. Alternatively, the number of third gas delivery pipelines 900 is two, and they are a protective gas pipeline 910 and a process gas pipeline 920, respectively. The process gas pipeline 920 is used to deliver process gas, and the protective gas pipeline 910 is used to deliver protective gas, wherein the protective gas can be nitrogen.

[0070] In this way, the number of third gas delivery pipelines 900 is increased, and the control valves 310 of the plurality of third gas delivery pipelines 900 are integrated into the second valve group 302, so the control valves 310 of the plurality of third gas delivery pipelines 900 are heated, and the temperature of the control valves 310 of the plurality of third gas delivery pipelines 900 is higher. This is conducive to the gas delivered by the plurality of third gas delivery pipelines 900 being stably in a vapor state, and is conducive to the gas delivered by each third gas delivery pipeline 900 being stably delivered into the process chamber 20.

[0071] In the scheme of the present application, as shown in Figure 1 , the gas path system 10 further comprises a vaporization device 400 and a gas storage device 500. The vaporization device 400 can be a vaporizer for vaporizing liquid into gas, and the gas storage device 500 can be a gas storage tank, which can be a steel cylinder. The gas storage device 500 is used to store the gas vaporized by the vaporization device 400. The outlet end of the vaporization device 400 is in communication with the inlet end of the first gas delivery pipeline segment 111, the outlet end of the first gas delivery pipeline segment 111 is in communication with the inlet end of the gas storage device 500, and the inlet end of the second gas delivery pipeline segment 112 is in communication with the outlet end of the gas storage device 500. Alternatively, the outlet end of the vaporization device 400 and the inlet end of the first gas delivery pipeline segment 111 can be connected by a flange plate or the like to realize communication between them. Similarly, the outlet end of the first gas delivery pipeline segment 111 and the inlet end of the gas storage device 500 can be connected by a flange plate or the like to realize communication between them.

[0072] The second gas delivery pipeline segment 112 is used to supply gas to the process chamber 20 when the gas storage amount of the gas storage device 500 reaches a preset gas storage amount. It should be noted that the preset gas storage amount meets the gas amount required for one process of the process chamber 20.

[0073] In this embodiment, the gas path system 10 is equipped with a vaporization device 400 and a gas storage device 500. The gas vaporized by the vaporization device 400 is first stored in the gas storage device 500. When the gas storage volume reaches the amount of gas required for a process in the process chamber 20, the second gas supply pipe section 112 supplies gas to the process chamber 20, ensuring that the process chamber 20 can smoothly carry out the complete process and guarantee the process effect.

[0074] Of course, in other embodiments, the gas supply system may not have a gas storage device 500, and the gas vaporized by the vaporization device 400 may be directly and continuously transported to the process chamber 20 through the first gas supply pipeline 100.

[0075] In an optional embodiment, the gas path system 10 further includes a liquid replenishment device 800, which stores a liquid source. The outlet of the liquid replenishment device 800 is connected to the inlet of the vaporization device 400. Liquid is replenished to the inlet of the vaporization device 400 through the liquid replenishment device 800. Moreover, the outlet of the liquid replenishment device 800 and the inlet of the vaporization device 400 are connected through a connecting pipe. The connecting pipe can be equipped with a switch valve, which controls the opening and closing of the connecting pipe, thereby controlling whether the liquid replenishment device 800 replenishes liquid to the vaporization device 400.

[0076] With this configuration, the liquid replenishment device 800 can store the liquid source and smoothly replenish the liquid source to the vaporization device 400, ensuring that the amount of liquid source supplied to the vaporization device 400 meets the consumption required for a process. Therefore, if a failure occurs at the liquid supply end of the plant, the liquid replenishment device 800 can replenish the liquid so that the process chamber 20 can still carry out the process smoothly, avoiding process loss.

[0077] In an optional embodiment, refer to Figure 1 As shown, the second gas supply pipeline 200, connected to the first gas supply pipeline section 111, includes a first purge pipeline 210. The inlet end of the first purge pipeline 210 is used to introduce purge gas, which can be nitrogen. The control valve 310 provided in the first purge pipeline 210 is a first purge control valve 3012, which controls the opening and closing of the first purge pipeline 210. Moreover, the connection between the first purge pipeline 210 and the first gas supply pipeline section 111 is located between the control valve 310 and the gas storage device 500 provided in the first gas supply pipeline section 111. That is, along the gas supply direction of the first gas supply pipeline section 111, the connection between the first purge pipeline 210 and the first gas supply pipeline section 111 is located downstream of the control valve 310 provided in the first gas supply pipeline section 111.

[0078] When the first purge line 210 is purged with purge gas, the purge gas enters the first gas supply line 111 through the first purge line 210 and is not affected by the control valve 310 installed in the first gas supply line 111. The purge gas flows within the first gas supply line 111.

[0079] With this configuration, the first purge line 210 serves as the second gas supply line 200. The control valve 310 in the first purge line 210 is enclosed and heated by the heating assembly 320. The higher temperature of the control valve 310 in the first purge line 210 helps maintain the purge gas in a vapor state, ensuring a stable delivery of the purge gas to the first gas supply line section 111. Furthermore, this prevents the gas in the first gas supply line section 111 from contacting the control valve 310 of the first purge line 210 and becoming liquefied, thus facilitating a stable gas delivery from the first gas supply line section 111.

[0080] In a further embodiment, reference is made to... Figure 1 As shown, the second gas supply pipeline 200, which is connected to the first gas supply pipeline section 111, includes a second purge pipeline 220. The outlet end of the second purge pipeline 220 is used to discharge purge gas. The control valve 310 provided in the second purge pipeline 220 is a second purge control valve 3022, which controls the opening and closing of the second purge pipeline 220. Moreover, the connection between the second purge pipeline 220 and the second gas supply pipeline section 112 is located between the gas storage device 500 and the control valve 310 provided in the second gas supply pipeline section 112. That is, along the gas supply direction of the second gas supply pipeline section 112, the connection between the second purge pipeline 220 and the second gas supply pipeline section 112 is located upstream of the control valve 310 provided in the second gas supply pipeline section 112.

[0081] So, after the purging gas flows through the first gas supply section 111, it flows into the second gas supply section 112 through the gas storage device 500, and is not disturbed by the control valve 310 installed in the second gas supply section 112. The purging gas flows into the second purging pipeline 220 and is discharged.

[0082] In this embodiment, the second purge line 220 serves as the second gas supply line 200. The control valve 310 in the second purge line 220 is enclosed and heated by the heating assembly 320. The higher temperature of the control valve 310 in the second purge line 220 helps maintain the purge gas in a vapor state, ensuring its smooth discharge. Furthermore, it prevents the gas in the second gas supply line section 112 from contacting the control valve 310 of the second purge line 220 and becoming liquefied, thus facilitating stable gas delivery in the second gas supply line section 112.

[0083] In this embodiment, the airflow system is provided with a first purge pipe 210 and a second purge pipe 220. Of course, the second air supply pipe 200 can also be provided as an air supply pipe other than the purge pipe.

[0084] In an optional embodiment, refer to Figure 1As shown, the second gas conveying pipeline 200 in communication with the first gas conveying pipeline section 111 comprises a detection communication pipeline 230, the control valve 310 arranged at the detection communication pipeline 230 is a detection control valve 3013, and the detection control valve 3013 controls the opening and closing of the detection communication pipeline 230. The detection communication pipeline 230 is used to connect the first gas conveying pipeline section 111 and the detection element 600, so that the detection element 600 can perform corresponding detection performance through the first gas conveying pipeline section 111. Specifically, the gas path system 10 further comprises the detection element 600, the first end of the detection communication pipeline 230 is connected with the detection element 600, and the second end of the detection communication pipeline 230 is in communication with the first gas conveying pipeline section 111. The detection element 600 is used for detection under the condition that the control valve 310 arranged at the detection communication pipeline 230 is in an open state.

[0085] Further, the second end of the detection communication pipeline 230 is located between the control valve 310 of the first gas conveying pipeline section 111 and the gas storage device 500, and further optionally, the second end of the detection communication pipeline 230 is located between the outlet end of the first purging pipeline 210 and the gas storage device 500.

[0086] Optionally, the detection communication pipeline 230 comprises a first detection communication pipeline 231, the detection element 600 comprises a first detection element 610, the first end of the first detection communication pipeline 231 is connected with the first detection element 610, the second end of the first detection communication pipeline 231 is in communication with the first gas conveying pipeline section 111, the control valve 310 arranged at the first detection communication pipeline 231 is a first detection control valve 3013a, the first detection control valve 3013a controls the opening and closing of the first detection communication pipeline 231, and the first detection element 610 is used for detecting the gas pressure of the first gas conveying pipeline section 111 under the condition that the first detection control valve 3013a is in an open state and the first gas conveying pipeline section 111 is in a gas extraction state.

[0087] Optionally, the detection communication pipeline 230 comprises a second detection communication pipeline 232, the detection element 600 comprises a second detection element 620, the first end of the second detection communication pipeline 232 is connected with the second detection element 620, and the second end of the second detection communication pipeline 232 is in communication with the first gas conveying pipeline section 111. The control valve 310 arranged at the second detection communication pipeline 232 is a second detection control valve 3013b, and the second detection control valve 3013b controls the opening and closing of the second detection communication pipeline 232. The second detection element 620 is used for detecting the gas pressure of the gas storage device 500 under the condition that the second detection control valve 3013b is in an open state and the gasification device 400 supplies gas to the first gas conveying pipeline section 111.

[0088] In this embodiment, there are two detection connecting pipes 230, namely the first detection connecting pipe 231 and the second detection connecting pipe 232 mentioned above. Both the first detection element 610 and the second detection element 620 can be vacuum gauges. The first detection element 610 has a smaller range and uses the gas pressure of the first gas supply pipe section 111 to provide feedback on whether there is a leak in the first gas supply pipe section 100. The second detection element 620 has a larger range. Since the second end of the second detection connecting pipe 232 is connected to the inlet end of the gas storage device 500 through the first gas supply pipe section 111, the second detection element 620 can be used to detect the gas pressure of the gas storage device 500.

[0089] In this embodiment, the detection connection pipe 230 serves as the second gas supply pipe 200. When the detection element 600 performs its detection function, i.e., when the detection connection pipe 230 is open, the gas in the first gas supply pipe section 111 inevitably enters the detection connection pipe 230 and contacts the control valve 310. The control valve 310 in the detection connection pipe 230 is heated by being wrapped by the heating component 320. Therefore, the temperature of the control valve 310 in the detection connection pipe 230 is relatively high, which prevents the gas in the first gas supply pipe section 111 from contacting the control valve 310 and being liquefied, and is more conducive to the stable gas supply of the first gas supply pipe section 111.

[0090] In the alternative solutions of this application, refer to Figure 1 As shown, the gas system 10 also includes at least one of a first detection chamber 710, a second detection chamber 720, and a third detection chamber 730. The vaporization device 400, the first valve group 301, the first gas supply section 111, a portion of the second gas supply line 200 connected to the first gas supply section 111, and the gas storage device 500 are all located within the first detection chamber 710; the inlet end of the second gas supply line 200 connected to the first gas supply section 111 is located within the second detection chamber 720; the second valve group 302, at least a portion of the second gas supply section 112, and a portion of the second gas supply line 200 connected to the second gas supply section 112 are all located within the third detection chamber 730. Optionally, a portion of the second gas supply pipe section 112 is located within the third detection chamber 730, another portion of the second gas supply pipe section 112 (the portion near the gas storage device 500) is located within the first detection chamber 710, or the entire second gas supply pipe section 112 is located within the third detection chamber 730.

[0091] Optionally, the second gas supply pipeline 200 in communication with the first gas supply pipe section 111 comprises a first purge pipeline 210 and a detection communication pipeline 230, the gas inlet end of the first purge pipeline 210 is located in the second detection chamber 720, the remaining part of the first purge pipeline 210, the detection communication pipeline 230 and the detection element 600 are all located in the first detection chamber 710; the second gas supply pipeline 200 in communication with the second gas supply pipe section 112 comprises a second purge pipeline 220, a part of the control valve 310 of the second purge pipeline 220 is located in the third detection chamber 730, and the gas outlet end of the second purge pipeline 220 is located outside the third detection chamber 730.

[0092] The first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 are all closed box structures, and only one of the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 can be provided, or two of the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 can be provided, or all of the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 can be provided.

[0093] Optionally, the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 are respectively connected to exhaust pipes 740, and the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 are respectively connected to a plant end through the exhaust pipes 740. The plant end is provided with a pump body, and the pump body is used to perform gas extraction on the corresponding detection chamber, so that the detection chamber is in a negative pressure state. Moreover, the exhaust pipe 740 is provided with a gas detector 741, which is used to detect the exhaust condition of the exhaust pipe 740, so as to feedback whether there is a gas leakage problem in the detection chamber. The gas detector 741 can alarm in time when the corresponding detection chamber is detected to have a gas leakage.

[0094] By adopting the embodiment, the gas path system 10 is provided with at least one of the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730, the detection chamber forms a relatively closed detection space, at least part of the gas supply pipeline can be arranged in the detection space, so as to detect whether there is a gas leakage problem in the gas supply pipeline, so as to be detected in time and processed when there is a gas leakage.

[0095] Of course, in other embodiments, the gas path system 10 can not be provided with the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730.

[0096] In further embodiments, with reference to Figure 1As shown, the at least two gas supply pipes further include a third gas supply pipe 900, which is arranged side by side with the first gas supply pipe 100, and is used to communicate with the process chamber 20. Optionally, the third gas supply pipe 900 is parallel to the second gas supply pipe segment 112. The gas inlet end of the third gas supply pipe 900 is located in the second detection chamber 720, a portion of the third gas supply pipe 900 is located in the third detection chamber 730, and the gas outlet end of the third gas supply pipe 900 extends out of the third detection chamber 730 to communicate with the process chamber 20.

[0097] Optionally, the number of the third gas supply pipes 900 is one, or the number of the third gas supply pipes 900 is at least two, including the above-mentioned protective gas pipe 910 and the process gas pipe 920.

[0098] In this embodiment, the gas inlet end of the third gas supply pipe 900 is arranged in the second detection chamber 720, so that the second detection chamber 720 can detect whether the gas source connected to the gas inlet end of the third gas supply pipe 900 has a leakage problem, so that the leakage of the gas source can be detected in time and handled.

[0099] Of course, in other embodiments, the gas inlet end of the third gas supply pipe 900 can not be located in the second detection chamber 720.

[0100] In this embodiment, the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 are arranged at the same time, the gas inlet end of the first purge pipe 210, the gas inlet end of the protective gas pipe 910 and the gas inlet end of the process gas pipe 920 are all located in the second detection chamber 720, and the purge gas and the protective gas will not have any impact whether they leak or not, so the second detection chamber 720 is mainly used to detect whether the process gas has a leakage problem; the first valve group 301 and the main body of the first gas supply pipe 100 are all located in the first detection chamber 710, so the first detection chamber 710 is mainly used to detect whether the liquid source has a leakage problem. Then, only the liquid source exists in the first detection chamber 710, and only the process gas (i.e. the gas source) exists in the second detection chamber 720, so whether the first detection chamber 710 and the second detection chamber 720 have a leakage problem can accurately determine whether the liquid source leaks or the gas source leaks.

[0101] In the scheme of the present application, along the gas supply direction of the first gas supply pipe 100, the temperature of the first gas supply pipe 100 gradually increases.

[0102] Optionally, the heating components can be arranged at different positions of the first gas delivery pipeline 100, and the heating degree of the different heating components increases along the gas delivery direction of the first gas delivery pipeline 100, so that the temperature of the first gas delivery pipeline 100 presents an increasing trend. Of course, the valve group 300 and other components arranged on the first gas delivery pipeline 100 can also be heated to make the temperature of the first gas delivery pipeline 100 present an increasing trend.

[0103] In the embodiment, the temperature of the first gas delivery pipeline 100 increases during the delivery of the gas, and the delivered gas is heated and gradually increases in temperature, which is beneficial to form a stable vapor flow and make the vaporization process stable and controllable, thereby providing a guarantee for the stability of the subsequent process. The gas is effectively prevented from being liquefied due to cooling during the flow process, and the delivered gas is maintained in a vapor state and smoothly delivered into the process chamber 20, which is beneficial to improve the process effect. At the same time, the gas is gradually heated, which avoids the gas being heated by high temperature too early, thereby avoiding the problem that the vapor is decomposed too early due to the early heating, and the vapor concentration delivered into the process chamber 20 is insufficient, thereby avoiding affecting the process effect.

[0104] Of course, in other embodiments, the temperature of the first gas delivery pipeline 100 can be constant along the gas delivery direction of the first gas delivery pipeline 100.

[0105] In further embodiments, the temperature of the outlet end of the vaporization device 400 is a first temperature, the heating assembly 320 of the first valve group 301 heats the corresponding control valve 310 to a second temperature, and optionally, the heating temperature of the heating element 321 of the first valve group 301 is the second temperature. The heating assembly 320 of the second valve group 302 heats the corresponding control valve 310 to a third temperature, and optionally, the heating temperature of the heating element 321 of the second valve group 302 is the third temperature.

[0106] The first temperature is less than the second temperature, and the second temperature is less than the third temperature. That is, the temperature of the outlet end of the vaporization device 400 is low, the heating temperature of the first valve group 301 is high, and the heating temperature of the second valve group 302 is higher. Under the heating action of the first valve group 301, the pipeline between the outlet end of the vaporization device 400 and the first valve group 301, the pipeline between the first valve group 301 and the gas storage device 500, the gas storage device 500, and the pipeline between the gas storage device 500 and the second valve group 302 are all at the second temperature; under the heating action of the second valve group 302, the pipeline between the second valve group 302 and the process chamber 20 is at the third temperature.

[0107] It should be noted that the first temperature, the second temperature and the third temperature are all temperature values set by the user according to needs.

[0108] By using the first valve group 301 and the second valve group 302 to gradually increase the temperature of the gas delivery pipeline between the vaporization device 400 and the process chamber 20 in the gas delivery direction, the gas delivered by the gas delivery pipeline is also gradually increased in temperature, which avoids the situation that the temperature of the upstream temperature zone of the gas delivery pipeline is greater than the temperature of the downstream temperature zone, causing the state of the gas to be unstable, and is conducive to the gas being in a stable vapor state and the stability of the gas transmission.

[0109] In addition, to further ensure the gradual temperature increase, the pipeline between the outlet end of the vaporization device 400 and the first valve group 301, the pipeline between the first valve group 301 and the gas storage device 500, and the pipeline between the gas storage device 500 and the second valve group 302 can be separately provided with a first heating belt for heating to the second temperature. Figure 1 As shown, the gas storage device 500 can also be provided with a gas storage heating member 510 for heating the gas storage device 500 to the second temperature, and cooperating with the first valve group 301 to maintain the temperature between the outlet end of the vaporization device 400 and the second valve group 302 at the second temperature.

[0110] Optionally, the gas storage heating member 510 can be a heating sheet, a heating belt, etc., and the type of the gas storage heating member 510 is not limited in the embodiments of the present application. The gas storage heating member 510 is arranged on the outer surface of the gas storage device 500, and can wrap the gas storage device 500 to heat the gas in the gas storage device 500.

[0111] Similarly, the pipeline between the second valve group 302 and the process chamber 20 can be separately provided with a second heating belt for heating to the third temperature, and cooperating with the second valve group 302 to maintain the temperature between the second valve group 302 and the process chamber 20 at the third temperature.

[0112] Of course, in other embodiments, the part of the gas delivery pipeline between the vaporization device 400 and the process chamber 20 in the gas delivery direction of the gas delivery pipeline can not use the gradual temperature increase mode.

[0113] In an optional embodiment, the control valve 310 arranged in the second gas delivery pipeline section 112 is used to be in an open state when the pressure difference between the gas pressure of the process chamber 20 and the gas pressure of the gas storage device 500 is within a preset pressure difference range.

[0114] Optionally, referring to Figure 1As shown, the gas path system 10 further comprises an exhaust pipeline 40, an intake end of the exhaust pipeline 40 is used for communicating with the process chamber 20, the exhaust pipeline 40 is used for exhausting gas in the process chamber 20, and the exhaust pipeline 40 is provided with a third detection element 42, which can be a vacuum gauge, and the third detection element 42 can detect the air pressure in the process chamber 20; the inlet end of the gas storage device 500 is communicated with the first detection element 610 through the first gas conveying pipe segment 111 and the first detection communication pipeline 231, and the first detection element 610 can detect the air pressure of the inlet end of the gas storage device 500 when the first detection control valve 3013a is opened, therefore, the pressure difference between the air pressure of the process chamber 20 and the air pressure of the gas storage device 500 is fed back through the difference between the detection values of the first detection element 610 and the third detection element 42.

[0115] The preset pressure difference range is a pressure difference range set by a user according to needs.

[0116] Specifically, the control valve 310 arranged in the second gas conveying pipe segment 112 is a second liquid source control valve 3021, when the pressure difference between the air pressure of the process chamber 20 and the air pressure of the gas storage device 500 is not in the preset pressure difference range, it means that the process requirement is not met, at this time, the second liquid source control valve 3021 is in a closed state; when the pressure difference between the air pressure of the process chamber 20 and the air pressure of the gas storage device 500 is in the preset pressure difference range, it means that the process requirement is met, at this time, the second liquid source control valve 3021 is in an open state.

[0117] Further optionally, the second liquid source control valve 3021 can be communicatively connected with the first detection element 610 and the third detection element 42, so that the second liquid source control valve 3021 is automatically opened or closed according to the difference between the detection values of the first detection element 610 and the third detection element 42.

[0118] By adopting the embodiment, the control valve 310 arranged in the second gas conveying pipe segment 112 acts according to the difference between the air pressure of the process chamber 20 and the air pressure of the gas storage device 500, so that the gas is introduced into the process chamber 20 when the pressure difference meets the process requirement, which is beneficial to improving the process effect.

[0119] In the optional scheme of the present application, referring to Figure 1 and Figure 9 As shown, the gas path system 10 further comprises a vacuum pump 30, an exhaust pipeline 40 and a pressure control element 41, an intake end of the exhaust pipeline 40 is used for communicating with the process chamber 20, and an exhaust end of the exhaust pipeline 40 is communicated with an inlet end of the vacuum pump 30. The pressure control element 41 is arranged in the exhaust pipeline 40 to control the pressure of the process chamber 20. Optionally, the intake end of the exhaust pipeline 40 and the exhaust port of the process chamber 20, and the exhaust end of the exhaust pipeline 40 and the inlet end of the vacuum pump 30 can be connected through welding, flange connection or the like, so as to realize communication.

[0120] Thus, under the suction of the vacuum pump 30, the gas in the process chamber 20 is discharged through the exhaust pipeline 40, but the suction force of the vacuum pump 30 is large, and the pressure control needs to be assisted by the control element.

[0121] In a further embodiment, the gas path system 10 further comprises an auxiliary pressure regulating pipeline 50, the inlet end of the auxiliary pressure regulating pipeline 50 is used to introduce the protective gas, the outlet end of the auxiliary pressure regulating pipeline 50 is communicated with the exhaust pipeline 40, and the auxiliary pressure regulating pipeline 50 is used to introduce the protective gas into the exhaust pipeline 40 when the difference between the gas pressure at the inlet end of the gas supply pipeline connected with the process chamber 20 and the gas pressure of the process chamber 20 exceeds the preset pressure difference range, and the protective gas can be but not limited to nitrogen. Optionally, the connection between the auxiliary pressure regulating pipeline 50 and the exhaust pipeline 40 is located between the pressure control element 41 and the vacuum pump 30.

[0122] Wherein, the second gas supply pipeline segment 112 of the first gas supply pipeline 100 connected with the process chamber 20, the gas pressure at the inlet end of the second gas supply pipeline segment 112, i.e. the gas pressure of the gas storage device 500, can be detected by the first detection element 610; and the gas pressure of the process chamber 20 is detected by the third detection element 42.

[0123] Optionally, the gas path system 10 further comprises a gas flow quality controller 51, the gas flow quality controller 51 is arranged in the auxiliary pressure regulating pipeline 50, and the gas flow quality controller 51 is used to control the flow of the protective gas through the auxiliary pressure regulating pipeline 50. Further optionally, the inlet end of the auxiliary pressure regulating pipeline 50 is connected with a gas supply device, the gas supply device is communicatively connected with the first detection element 610 and the third detection element 42, and the gas supply device provides the protective gas to the auxiliary pressure regulating pipeline 50 when the difference between the gas pressure at the inlet end of the gas supply pipeline connected with the process chamber 20 and the gas pressure of the process chamber 20 exceeds the preset pressure difference range.

[0124] When the negative pressure value of the process chamber 20 is small, it is difficult to accurately control the pressure by the pressure control element 41, so the auxiliary pressure regulating pipeline 50 is added, the protective gas is introduced into the exhaust pipeline 40 through the auxiliary pressure regulating pipeline 50, and then the vacuum pump 30 will suck the protective gas to share the suction force of the vacuum pump 30 on the process chamber 20, which is beneficial to accurately adjust the pressure difference between the inlet end of the gas supply pipeline connected with the process chamber 20 and the process chamber 20.

[0125] Of course, in other embodiments, the gas path system 10 can not be provided with the auxiliary pressure regulating pipeline 50, and the gas path system 10 can assist the pressure control in other ways.

[0126] Based on the gas path system 10 of the process chamber 20 disclosed in the present application, the present application further discloses a semiconductor process equipment, which comprises the process chamber 20 and the above-mentioned gas path system 10, and the outlet end of at least one of the at least two gas supply pipes is in communication with the process chamber 20.

[0127] Optionally, the gas path system 10 comprises the first gas supply pipe 100, the second gas supply pipe 200 and the third gas supply pipe 900 as mentioned above, and the outlet end of the first gas supply pipe 100 and the outlet end of the third gas supply pipe 900 are in communication with the process chamber 20.

[0128] By using the present embodiment, the at least two control valves 310 in the gas path system 10 of the semiconductor process equipment are integrated into the valve group 300 by being wrapped by the heating assembly 320, and the heating assembly 320 simultaneously uniformly heats the plurality of control valves 310, so that the temperature of the control valve 310 is relatively high when the gas flows through the control valve 310, thereby avoiding the occurrence of cold spots and preventing the gas from being liquefied when flowing through, which is beneficial to keeping the gas in a vapor state and being smoothly delivered into the process chamber 20, ensuring the amount of gas delivered into the process chamber 20, and being beneficial to improving the process effect of the semiconductor process equipment.

[0129] In an optional embodiment, the number of the gas path system 10 and the number of the process chamber 20 are both one.

[0130] In another embodiment, as shown in Figure 10 , the number of the gas path system 10 and the number of the process chamber 20 are both at least two, and the gas path system 10 and the process chamber 20 are in one-to-one correspondence and in communication. The structures of the gas path systems 10 can be the same or different, and the structures of the process chambers 20 can also be the same or different.

[0131] Optionally, the number of the process chamber 20 and the number of the gas path system 10 are both two, and the two process chambers 20 are a first chamber S1 and a second chamber S2. Further optionally, each gas path system 10 comprises the first gas supply pipe 100, the second gas supply pipe 200, the third gas supply pipe 900, the first valve group 301, the second valve group 302, the first detection chamber 710, the second detection chamber 720 and the third detection chamber 730 as mentioned above.

[0132] Further optionally, the semiconductor process equipment further comprises a machine table, which simultaneously controls the gas path systems 10 and the process chambers 20.

[0133] By using the present embodiment, the number of the gas path system 10 and the number of the process chamber 20 are increased, and the plurality of gas path systems 10 simultaneously supply and exhaust gas to different process chambers 20, so that the plurality of process chambers 20 simultaneously perform the process, which is beneficial to improving the process efficiency, improving the process yield and shortening the process cycle.

[0134] In actual use, the hardware of the two process chambers 20 cannot be consistent after the machine is assembled, such as material processing errors, assembly errors, etc., which makes the process of the process chambers 20 unable to remain consistent. In addition, during the heating process, it is difficult to heat the inside of the control valve 310 and the corresponding gas conveying pipeline, because the valve body of the control valve 310 is a relatively thick metal block, and it is difficult for heat to be conducted to the inside of the valve body. Due to space problems, it is also difficult to heat the flow channel of the integrated valve group and the gas conveying pipeline, which makes it difficult to implement step-by-step heating. In view of these problems, the present application designs the heating structure of the gas path system and the corresponding control valve.

[0135] To achieve consistency of the process of the two process chambers 20, it is necessary to achieve consistency of step-by-step heating, and consistency of the pressure difference between the vapor pressure of the gas storage device 500 and the pressure in the process chamber 20. The consistency of the heating makes the temperature of the vapor entering the two process chambers 20 tend to be consistent, and the consistency of the pressure difference makes the speed of the vapor entering the two process chambers 20 tend to be consistent.

[0136] Specifically, the part of the gas conveying pipeline between the vaporization device 400 and the process chamber 20 can be divided into multiple temperature zones. Optionally, the outlet end of the vaporization device 400 is a temperature zone a (i.e. the first temperature in the foregoing), the part of the gas conveying pipeline between the vaporization device 400 and the first valve group 301, the part of the gas conveying pipeline between the first valve group 301 and the gas storage device 500, the gas storage device 500, and the part of the gas conveying pipeline between the gas storage device 500 and the second valve group 302 are temperature zone b (i.e. the second temperature in the foregoing), and the second valve group 302 and the part of the gas conveying pipeline between the second valve group 302 and the process chamber 20 are temperature zone c (i.e. the third temperature in the foregoing). Temperature zone a≤temperature zone b≤temperature zone c, realizing step-by-step heating.

[0137] The integrated design of at least two control valves 310, rather than the use of multiple separate control valves 310 connected by a gas conveying pipeline, can be beneficial for centralized heating of the control valves 310, avoiding assembly errors caused by wrapping multiple heating bands around multiple separate control valves 310 and gas conveying pipelines, which can cause cold spots. For the integrated valve group, a heating structure is designed for the flow channel, and heating is performed in all directions, so that the temperature range of each temperature zone is within the process range, the temperature between the vaporization device 400 and the process chamber 20 as a whole presents a step-by-step heating state, avoiding the instability of the vapor caused by the temperature of the upstream temperature zone of the gas conveying pipeline being greater than the temperature of the downstream temperature zone, which is beneficial for the stability of the vapor transmission. The temperature difference between the temperature zones at the same position of the corresponding gas path systems of the two process chambers 20 is small, which improves the temperature consistency of the two process chambers 20.

[0138] In addition, for the pressure difference between the vapor pressure of the gas storage device 500 and the pressure in the process chamber 20, the consistency of the pressure difference is achieved by designing the adjustability of the exhaust pipeline 40, thereby improving the consistency of the vapor entering speed of the two process chambers 20, and finally realizing the process consistency of the two process chambers 20.

[0139] The embodiments of the present application are described above with reference to the drawings; however, the present application is not limited to the specific embodiments described above, but the specific embodiments described above are merely illustrative rather than restrictive, and a person of ordinary skill in the art can make many forms under the inspiration of the present application without departing from the scope of the present application and the scope protected by the claims.

Claims

1. A gas path system for a process chamber, characterized in that, It includes at least two gas transmission lines, each of which is provided with at least one control valve (310), and each control valve (310) controls the opening and closing of the corresponding gas transmission line; At least two of the control valves (310) are enclosed by a heating assembly (320) and integrated into a valve group (300) so that the heating assembly (320) simultaneously heats each of the control valves (310) in the corresponding valve group (300).

2. The gas path system according to claim 1, characterized in that, The heating assembly (320) includes a heating element (321) and a heat conductor (322), the heat conductor (322) covering at least a portion of each of the control valves (310), the heating element (321) covering at least a portion of the heat conductor (322), and the heating element (321) being thermally connected to each of the control valves (310) through the heat conductor (322).

3. The gas path system according to claim 2, characterized in that, The heat-conducting component (322) includes a side heat-conducting block (3221) and a bottom heat-conducting plate (3222). The side heat-conducting block (3221) wraps around the side of each of the control valves (310). The heating element (321) is thermally connected to the control valve (310) through the side heat-conducting block (3221). The bottom heat-conducting plate (3222) is disposed at the bottom of the control valve (310). The heating element (321) is thermally connected to each of the control valves (310) through the bottom heat-conducting plate (3222).

4. The gas path system according to claim 3, characterized in that, The heat-conducting component (322) further includes a bottom heat-conducting block (3223), which is disposed on the surface of the bottom heat-conducting plate (3222) facing the control valve (310). At least one of the bottom heat-conducting block (3223) and the bottom heat-conducting plate (3222) is provided with a slot (322a). A portion of the gas pipeline connected to the control valve (310) extends into the slot (322a) so that the bottom heat-conducting block (3223) and the bottom heat-conducting plate (3222) together enclose a portion of the gas pipeline.

5. The gas path system according to claim 3, characterized in that, The heating element (321) includes a top heating element (3212), a side heating element (3211), and a bottom heating element (3213) connected in sequence. The side heating element (3211) wraps around the side heat-conducting block (3221). The top heating element (3212) is located at the top of the side heating element (3211) and has an opening (3212a) through which the valve head (3101) of the control valve (310) passes. The bottom heating element (3213) is located at the bottom of the side heating element (3211) and is disposed on the bottom heat-conducting plate (3222).

6. The gas path system according to claim 2, characterized in that, The valve assembly (300) also includes a base (340) and a heat insulation element (330), the heat insulation element (330) being disposed on the base (340), the heat conducting element (322), each of the control valves (310) and the heating element (321) being disposed on the base (340) through the heat insulation element (330).

7. The gas path system according to claim 2, characterized in that, The valve assembly (300) also includes a temperature sensing element (350), which is disposed on the control valve (310) to detect the heating temperature of the control valve (310). The heating state of the heating element (321) is adjusted according to the temperature detection information of the temperature sensing element (350).

8. The gas path system according to claim 1, characterized in that, The multiple control valves (310) of the same valve group (300) are arranged in an array.

9. The gas path system according to claim 1, characterized in that, At least two of the gas transmission lines include a first gas transmission line (100) and a second gas transmission line (200), wherein the first gas transmission line (100) is used to transport gaseous substances converted from liquid substances; The first gas supply line (100) includes a first gas supply line section (111) and a second gas supply line section (112). The outlet end of the second gas supply line section (112) is used to connect to the process chamber (20). The number of second gas supply lines (200) is at least two. The first gas supply line section (111) and the second gas supply line section (112) are both connected to the second gas supply line (200). The first gas supply line section (111), the second gas supply line section (112) and each of the second gas supply lines (200) are provided with the control valve (310). The control valve (310) located in the first gas transmission pipeline section (111) and the control valve (310) located in the second gas transmission pipeline (200) connected to the first gas transmission pipeline section (111) are integrated into a first valve group (301). The control valve (310) located in the second gas transmission pipeline section (112) and the control valve (310) located in the second gas transmission pipeline (200) connected to the second gas transmission pipeline section (112) are integrated into a second valve group (302).

10. The gas path system according to claim 9, characterized in that, At least two of the gas supply lines also include a third gas supply line (900), which is arranged side by side with the first gas supply line (100) and is used to connect the process chamber (20). The third gas pipeline (900) is provided with the control valve (310). The control valve (310) provided in the second gas pipeline section (112), the control valve (310) provided in the second gas pipeline (200) connected to the second gas pipeline section (112), and the control valve (310) provided in the third gas pipeline (900) are integrated into the second valve group (302).

11. The gas path system according to claim 9, characterized in that, The gas system (10) further includes a vaporization device (400) and a gas storage device (500). The outlet end of the vaporization device (400) is connected to the inlet end of the first gas transmission pipe section (111), the outlet end of the first gas transmission pipe section (111) is connected to the inlet end of the gas storage device (500), and the inlet end of the second gas transmission pipe section (112) is connected to the outlet end of the gas storage device (500).

12. The gas path system according to claim 11, characterized in that, The second gas transmission line (200) connected to the first gas transmission line section (111) includes a first purge line (210), the inlet end of the first purge line (210) is used to introduce purge gas, and the connection between the first purge line (210) and the first gas transmission line section (111) is located between the control valve (310) and the gas storage device (500) provided in the first gas transmission line section (111); And / or, the second gas supply line (200) connected to the first gas supply line section (111) includes a second purge line (220), the outlet end of the second purge line (220) is used to discharge purge gas, and the connection between the second purge line (220) and the second gas supply line section (112) is located between the gas storage device (500) and the control valve (310) provided in the second gas supply line section (112).

13. The gas path system according to claim 11, characterized in that, The second gas transmission pipeline (200) connected to the first gas transmission pipeline section (111) includes a detection connection pipeline (230). The gas system (10) also includes a detection element (600). The first end of the detection connection pipeline (230) is connected to the detection element (600), and the second end of the detection connection pipeline (230) is connected to the first gas transmission pipeline section (111). The detection element (600) is used to perform detection when the control valve (310) provided in the detection connection pipeline (230) is in the open state.

14. The gas path system according to claim 11, characterized in that, The gas path system (10) further includes at least one of a first detection chamber (710), a second detection chamber (720), and a third detection chamber (730); The vaporization device (400), the first valve group (301), the first gas transmission pipe section (111), a part of the second gas transmission pipe (200) connected to the first gas transmission pipe section (111), and the gas storage device (500) are all located in the first detection chamber (710); The air inlet of the second gas supply line (200), which is connected to the first gas supply line section (111), is located inside the second detection chamber (720); At least a portion of the second valve assembly (302), the second gas supply section (112), and a portion of the second gas supply line (200) connected to the second gas supply section (112) are located within the third detection chamber (730).

15. The gas path system according to claim 14, characterized in that, At least two of the gas supply lines also include a third gas supply line (900), which is arranged side by side with the first gas supply line (100). The third gas supply line (900) is used to connect the process chamber (20), and the inlet end of the third gas supply line (900) is located in the second detection chamber (720).

16. The gas path system according to claim 11, characterized in that, Along the gas delivery direction of the first gas delivery pipeline (100), the temperature of the first gas delivery pipeline (100) gradually increases.

17. The gas path system according to claim 16, characterized in that, The outlet temperature of the vaporization device (400) is a first temperature, the heating component (320) of the first valve group (301) heats each of the corresponding control valves (310) to a second temperature, and the heating component (320) of the second valve group (302) heats each of the corresponding control valves (310) to a third temperature. Wherein, the first temperature is less than the second temperature, and the second temperature is less than the third temperature.

18. The gas path system according to claim 11, characterized in that, The control valve (310) located in the second gas pipeline section (112) is in the open state when the pressure difference between the gas pressure in the process chamber (20) and the gas pressure in the gas storage device (500) is within a preset pressure difference range.

19. The gas path system according to claim 1, characterized in that, The gas path system (10) also includes a vacuum pump (30), an exhaust pipe (40), an auxiliary pressure regulating pipe (50), and a pressure control element (41). The inlet end of the exhaust pipe (40) is used to connect to the process chamber (20), and the exhaust end of the exhaust pipe (40) is connected to the inlet end of the vacuum pump (30). The pressure control element (41) is disposed in the exhaust pipe (40) to control the pressure of the process chamber (20). The inlet end of the auxiliary pressure regulating pipeline (50) is used to introduce protective gas, and the outlet end of the auxiliary pressure regulating pipeline (50) is connected to the exhaust pipeline (40). The auxiliary pressure regulating pipeline (50) is used to introduce protective gas into the exhaust pipeline (40) when the difference between the gas pressure at the inlet end of the gas supply pipeline connected to the process chamber (20) and the gas pressure in the process chamber (20) exceeds a preset pressure difference range.

20. A semiconductor process apparatus, characterized in that, Includes a process chamber (20) and a gas path system (10) as described in any one of claims 1-19, wherein the outlet end of at least one of the at least two gas delivery lines is connected to the process chamber (20).

21. The semiconductor process equipment according to claim 20, characterized in that, The number of the gas path system (10) and the process chamber (20) are both at least two, and the gas path system (10) and the process chamber (20) are connected in a one-to-one correspondence.

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