Image stitching method, device and medium for microscopic topography three-dimensional reconstruction

By arranging and leveling planar flat crystals on the stage, and acquiring and calibrating image data, the problem of insufficient stitching accuracy caused by insufficient overlapping area in the prior art is solved, and high-precision image stitching is achieved.

CN121481838BActive Publication Date: 2026-06-23CHOTEST TECH INC

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
CHOTEST TECH INC
Filing Date
2026-01-09
Publication Date
2026-06-23

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Abstract

The application relates to an image splicing method, device and medium for micro-morphology three-dimensional reconstruction. The method comprises the following steps: arranging a plane flat crystal on a stage, leveling the stage to obtain a leveled stage; obtaining multiple local plane flat crystal images of the plane flat crystal in a calibration region according to the leveled stage; performing plane fitting calibration according to height data of the multiple local plane flat crystal images to obtain calibration data in the calibration region; obtaining multiple to-be-spliced images of a workpiece on the plane flat crystal; performing height compensation on the multiple to-be-spliced images according to the calibration data and splicing image coordinates of the multiple to-be-spliced images to obtain multiple candidate splicing images; and performing superimposed splicing according to the multiple candidate splicing images to obtain a workpiece splicing image. The method can calibrate the height of each image data, and high-precision splicing between images can be realized based on the position coordinates of the image data after calibration.
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