Ultrapure water filtering equipment for semiconductor production

Abstract

The invention belongs to the technical field of water treatment, and discloses ultrapure water filtering equipment for semiconductor production, which comprises a water tank, a mounting mechanism arranged in the water tank, two multi-stage filter plates symmetrically arranged on the mounting mechanism, and a back flushing mechanism which moves up and down on the mounting mechanism and is used for flushing the multi-stage filter plates. Through the cooperative design of the water tank, the mounting mechanism, the back-flushing mechanism, the multi-stage filter plate, the sealing mechanism and the driving mechanism, the back-flushing and impurity-discharging effects are good, the efficiency is high, the impurity discharging is thorough, the equipment practicability is high, the situation that effective back-flushing can be carried out from the interior of a cartridge filter element only by stopping the filtration of an ultrapure water source is avoided, and the service life is prolonged. And impurities need to be discharged through a blow-off pipe after washing is completed, so that the problems of long time consumption of back washing and impurity discharging, low back washing efficiency, reduction of semiconductor production efficiency and low equipment practicability are solved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of water treatment, and specifically relates to a super-pure water filtering equipment for semiconductor production. BACKGROUND

[0002] The semiconductor needs to use super-pure water in the production process, and the super-pure water is filtered by methods such as pretreatment, reverse osmosis technology, super-purification treatment and post-treatment to remove impurities, colloids and harmful ions in the water source.

[0003] In the prior art, a super-pure water filtering system water filtering mechanism (publication number: CN216946484U) is disclosed in a Chinese patent, which mainly relies on a rotating side pipe frame and high-pressure water flow to realize omnidirectional reverse flushing of the inner wall of the cartridge filter element, can flush out the impurities embedded in the inner wall of the cartridge filter element in the reverse direction, and is more convenient for the maintenance of the cartridge filter element, saves the operation of disassembling the equipment to maintain the filter element, and improves the cleaning effect of the cartridge filter element.

[0004] However, there are still some disadvantages in actual use: the above-mentioned patent needs to stop filtering the super-pure water source in actual use to effectively perform reverse flushing from the inside of the cartridge filter element, and after the flushing is completed, the impurities need to be discharged through the blowdown pipe, the reverse flushing and impurity discharge are time-consuming, the reverse flushing efficiency is low, the efficiency of semiconductor production is reduced, and the practicability of the equipment is low. SUMMARY

[0005] Technical problems solved To solve the problems in the background art, the application provides a super-pure water filtering equipment for semiconductor production, which has the advantages of convenient operation, good reverse flushing and impurity discharge effect, high efficiency, and high practicability of the equipment. Technical scheme

[0006] To achieve the above-mentioned purpose, the application provides the following technical scheme: a super-pure water filtering equipment for semiconductor production, comprising a water tank, a mounting mechanism arranged in the water tank, two multi-stage filter plates symmetrically arranged on the mounting mechanism, a reverse flushing mechanism arranged on the mounting mechanism and moving up and down for flushing the multi-stage filter plates, a sealing mechanism arranged on the mounting mechanism and the reverse flushing mechanism, and a driving mechanism arranged at the bottom of the mounting mechanism for driving the reverse flushing mechanism to move up and down and spray water to flush the multi-stage filter plates. The driving mechanism is detachably connected with the bottom surface of the water tank, one side of the bottom surface of the water tank is communicated with a water inlet pipe, and the top surface of the water tank is communicated with a water outlet pipe between the two multi-stage filter plates.

[0007] In the above technical solution, preferably, the installation mechanism includes an annular seat disposed in the lower part of the inner cavity of the water tank, two vertical shells symmetrically and vertically fixed on the left and right sides of the upper surface of the annular seat, and an annular pressure block detachably installed on the top surface of the two vertical shells; Two multi-stage filter plates are respectively disposed on the front and rear sides of the vertical shell. The sidewalls of the multi-stage filter plates are engaged with the sidewalls of the vertical shell. The upper surface of the multi-stage filter plates is in contact with the bottom surface of the annular pressure block. The bottom surface of the multi-stage filter plates is in contact with the upper surface of the annular seat. The sealing mechanism is disposed in the inner cavity of the vertical shell. The two multi-stage filter plates, the annular seat, the annular pressure block, the two vertical shells, and the sealing mechanism cooperate to form a closed cylindrical space. The upper surface of the annular pressure block is in contact with the top surface of the inner cavity of the water tank, and the inner cavity of the water outlet pipe is connected to the cylindrical space.

[0008] In the above technical solution, preferably, the backwashing mechanism includes an annular mounting shell disposed on the outside of the two vertical shells, an annular flushing block disposed between the two vertical shells, a connecting block that moves up and down inside the vertical shell to connect the annular mounting shell and the annular flushing block, a partition ring fixedly sleeved on the outer ring of the annular mounting shell and movably connected to the inner cavity of the water tank, an annular groove opened along the inner ring of the annular mounting shell, a filter plate assembly rotating in the annular groove, two water permeable channels symmetrically opened on the front and rear sides of the upper surface of the annular mounting shell, feed chambers symmetrically opened on the left and right sides of the annular mounting shell and communicating with the inner cavity of the annular groove, a set of inclined guide plates circumferentially equidistantly disposed in the opening of the annular groove, and a flushing groove circumferentially opened in the middle of the outer surface of the annular flushing block; The inner ring of the annular mounting shell is fitted to the outer side of the vertical shell and the multi-stage filter plate, the outer ring of the annular flushing block is fitted to the inner side of the vertical shell and the multi-stage filter plate, the left and right side walls of the connecting block are fixedly connected to the inner cavity of the annular groove and the inner cavity of the flushing groove, respectively, and two nozzles for spraying water into the flushing groove are symmetrically opened on one side of the connecting block, and a drain port communicating with the lower part of the inner cavity of the annular groove is opened on the other side of the connecting block. When the driving mechanism operates, it transports the filtered water in the cylindrical space to the nozzles for spraying.

[0009] In the above technical solution, preferably, the filter plate assembly includes a circular filter plate rotating in the annular groove, a set of blades circumferentially equidistantly mounted on the inner ring of the circular filter plate via a rotating shaft, a sludge collection groove circumferentially opened at the lower part of the circular filter plate, a connecting channel symmetrically opened in the inner cavity of the sludge collection groove, a spiral rod rotating in the connecting channel, and a detection mechanism set on the upper surface of the circular filter plate for detecting the water flow rate of the filter element. The circular filter plate penetrates the water permeable channel and the inner cavity of the feed chamber, and a set of pusher plates are fixed circumferentially at equal intervals near the edge of the bottom surface of the circular filter plate. One end of the spiral rod penetrates to the outside of the inner cavity of the sludge collection tank, and a transmission wheel is fixedly sleeved on one end of the spiral rod. The bottom of the outer ring of the transmission wheel is movably connected to the inner cavity wall of the annular groove.

[0010] In the above technical solution, preferably, the detection mechanism includes an annular sealing shell fixed to the top surface of the circular filter plate, an annular resistor fixed to the top surface of the inner cavity of the annular sealing shell, a sliding resistor that moves up and down on the outer ring of the annular resistor, a set of two-section spring compression rods symmetrically and vertically fixed to the top surface of the inner cavity of the annular sealing shell, a sensor fixed to the bottom surface of the inner cavity of the annular sealing shell, guide grooves circumferentially and equidistantly formed on the bottom surface of the sliding resistor, a guide rod fixed to the top of the blade shaft and cooperating with the inner cavity of the guide groove for driving the sliding resistor to move upward, and a set of speed limiters circumferentially and equidistantly arranged on the outer ring of the annular sealing shell for limiting the rotation speed of the circular filter plate; The speed limiter is movably connected to the top surface of the inner cavity of the annular groove, the bottom end of the two-section spring compression rod is fixedly connected to the upper surface of the sliding resistor, the inner ring of the sliding resistor is movably connected to the outer ring of the annular resistor, and the sensor is connected to the annular resistor and the sliding resistor respectively through wires.

[0011] In the above technical solution, preferably, the sealing mechanism includes sealing plates symmetrically arranged on the upper and lower surfaces of the connecting block, and rollers rotatably mounted on the upper and lower surfaces of the connecting block via a bracket; The vertical shell has symmetrical vertical sealing grooves at the openings on the left and right sides of its inner cavity. The sealing plate is located in the inner cavity of the sealing groove, and one end of the sealing plate is fixedly connected to the surface of the connecting block. The other end of the sealing plate is wrapped around the roller.

[0012] In the above technical solution, preferably, four guide rails are symmetrically and vertically fixedly installed in the inner cavity of the vertical shell, and rollers are fixedly sleeved at the front and rear ends of the roller, with the outer ring of the rollers being movably connected to the side wall of the guide rails.

[0013] In the above technical solution, preferably, the driving mechanism includes an assembly shell fixed to the bottom surface of the annular seat, a pump disposed in the upper part of the inner cavity of the assembly shell, a water pumping pipe fixedly sleeved on the water inlet port of the pump for connecting the cylindrical space, a water delivery hose fixedly connected to the water outlet port of the pump for delivering filtered water to the nozzle, and two electrically controlled telescopic rods symmetrically and vertically fixed on the left and right sides of the bottom surface of the inner cavity of the assembly shell. The bottom of the assembly shell penetrates to the bottom surface of the water tank, and the assembly shell and the bottom surface of the water tank are detachably connected by bolts. The output shaft end of the electrically controlled telescopic rod is fixedly connected to the middle of the bottom surface of the connecting block, and the inner cavity of the assembly shell communicates with the inner cavity of the vertical shell.

[0014] In the above technical solution, preferably, a filter box is fixedly installed in the middle of the bottom surface of the inner cavity of the assembly shell, the bottom surface of the pump is fixedly connected to the upper surface of the filter box, and a drain pipe for connecting the drain outlet to the filter box is fixedly installed on the bottom surface of the connecting block. Beneficial effects

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. This invention utilizes a coordinated design of a water tank, installation mechanism, backwashing mechanism, multi-stage filter plates, sealing mechanism, and drive mechanism. The installation mechanism fixes two multi-stage filter plates, and in conjunction with the sealing mechanism, forms a closed cylindrical space that separates the filtered water from the unfiltered water in the tank. Initially, the backwashing mechanism is located at the top of the multi-stage filter plates. An external control system drives the backwashing mechanism to move it down a set distance and then stop. The drive mechanism then backwashes the multi-stage filter plates with the filtered water, removing impurities from the filter pores and adhering to their outer surfaces. Simultaneously, the water flow from inside the multi-stage filter plates during backwashing removes impurities from the outer surfaces of the filter plates. The system collects and discharges impurities, preventing detached impurities from falling into the water tank and being difficult to remove in a timely manner. During backwashing, the water flow from the multi-stage filter plates drives the backwash mechanism, filtering and cleaning impurities floating in the water below the mechanism. This prevents floating impurities from accumulating and re-attaching to the cleaned areas on the outer surface of the multi-stage filter plates. The backwashing and impurity removal are effective, efficient, and thorough, making the equipment highly practical. It solves the problems of existing technologies that require stopping the filtration of ultrapure water before effective backwashing from the inside of the filter cartridge, and the need to discharge impurities through a drain pipe after rinsing. These backwashing and impurity removal processes are time-consuming and inefficient, reducing semiconductor production efficiency and overall equipment practicality.

[0016] 2. This invention, through the coordinated design of filter plate assemblies, detection mechanisms, and other structures, utilizes the principle that when backwash water flows through multi-stage filter plates and is sprayed into the annular groove, the blades are impacted by the water flow, driving the circular filter plate to rotate. The rotation of the circular filter plate is limited by a speed limiter. When the circular filter plate reaches its maximum speed, the blades rotate under the continuous impact of the water flow, causing the guide rod to rotate circumferentially. The rotation of the guide rod interacts with the inner cavity of the guide groove, driving the sliding resistor to move upwards. After the sliding resistor moves upwards and contacts the annular resistor, it forms a complete circuit with the sensor. The sensor can detect the resistance value after the sliding resistor contacts the annular resistor and send the resistance value to the external control system. By detecting and analyzing each change in resistance value, the backwashing effect on the multi-stage filter plates can be reflected, making it easier for operators to estimate the service life and replacement time of the multi-stage filter plates. This solves the problem of existing technologies that use flow sensors to detect the water flow rate after filtration, which can only detect the overall water flow of the filter element, reducing the accuracy of operators' estimates of filter element service life and replacement time. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the present invention; Figure 2 This is a front sectional view of the water tank of the present invention. Figure 3 This is a schematic diagram of the installation mechanism, backflush mechanism, sealing mechanism, and drive mechanism of the present invention; Figure 4 This is a partial exploded view of the installation mechanism and the recoil mechanism of the present invention; Figure 5 This is a front sectional view of the mounting mechanism, backflush mechanism, sealing mechanism, driving mechanism, and detection mechanism of the present invention. Figure 6 This is a top cross-sectional view of the annular mounting shell of the present invention; Figure 7 This is a schematic diagram of the filter plate assembly of the present invention; Figure 8 This is a schematic diagram of the drive mechanism of the present invention; Figure 9 This is a schematic diagram of the connecting block and sealing mechanism of the present invention; Figure 10 This is a partial front sectional view of the vertical shell and sealing groove of the present invention; Figure 11 This is a front sectional view of the detection mechanism of the present invention. Figure 12 This is a partial bottom cross-sectional view of the sliding resistor, guide groove, and guide rod of the present invention.

[0018] In the diagram: 1. Water tank; 2. Mounting mechanism; 21. Annular seat; 22. Vertical shell; 23. Annular pressure block; 3. Multi-stage filter plate; 4. Backwashing mechanism; 41. Annular mounting shell; 42. Annular flushing block; 43. Connecting block; 44. Annular groove; 45. Water permeable channel; 46. Feed chamber; 47. Inclined guide plate; 48. Flushing tank; 49. Nozzle; 410. Drain outlet; 411. Separator ring; 5. Sealing mechanism; 51. Sealing plate; 52. Roller; 53. Guide rail; 54. Roller; 6. Drive mechanism 61. Assembly shell; 62. Pump; 63. Pumping pipe; 64. Water delivery hose; 65. Electrically controlled telescopic rod; 7. Filter plate assembly; 71. Circular filter plate; 72. Blade; 73. Sludge collection tank; 74. Connecting channel; 75. Helical rod; 76. Drive wheel; 8. Detection mechanism; 81. Annular sealing shell; 82. Annular resistor; 83. Sliding resistor; 84. Two-stage spring compression rod; 85. Sensor; 86. Guide groove; 87. Guide rod; 88. Speed ​​limiter; 9. Filter box; 10. Sludge discharge pipe. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0020] like Figures 1 to 12 As shown, the present invention provides an ultrapure water filtration device for semiconductor production, including a water tank 1, an installation mechanism 2 disposed in the water tank 1, two multi-stage filter plates 3 symmetrically disposed on the installation mechanism 2, the multi-stage filter plates 3 being made of a hard material that does not react with pure water and having regularly distributed filter holes, a backwashing mechanism 4 that moves up and down on the installation mechanism 2 to rinse the multi-stage filter plates 3, a sealing mechanism 5 disposed on the installation mechanism 2 and the backwashing mechanism 4, and a driving mechanism 6 disposed at the bottom of the installation mechanism 2 to drive the backwashing mechanism 4 to move up and down and spray water to rinse the multi-stage filter plates 3; The drive mechanism 6 is detachably connected to the bottom of the water tank 1. A water inlet pipe is connected to one side of the bottom of the water tank 1, and a water outlet pipe is connected to the middle of the top surface of the water tank 1 between two multi-stage filter plates 3.

[0021] In use, the two multi-stage filter plates 3 are fixed by the mounting mechanism 2, and together with the sealing mechanism 5, the water filtered by the two multi-stage filter plates 3 is separated from the unfiltered water in the water tank 1. In the initial state, the backwash mechanism 4 is located at the top of the multi-stage filter plates 3. Using an external control system, the backwash mechanism 4 can be driven down to a set distance and then stop moving through the drive mechanism 6. After that, the water filtered by the two multi-stage filter plates 3 can be backwashed by the backwash mechanism 4 through the drive mechanism 6, which can wash away the impurities in the filter holes of the multi-stage filter plates 3 and the impurities attached to their outer surface. Simultaneously, the water flow through the multi-stage filter plate 3 during backwashing can collect and discharge impurities that have detached from the outer surface of the multi-stage filter plate 3, preventing the detached impurities from falling into the water tank 1 and being difficult to discharge in a timely manner. Furthermore, the water flow through the multi-stage filter plate 3 during backwashing can drive the backwash mechanism 4 to operate, filtering and cleaning the impurities floating in the water tank 1 below the backwash mechanism 4, preventing the floating impurities in the water from accumulating and floating back to the cleaned position on the outer surface of the multi-stage filter plate 3. The backwashing and impurity removal effect is good, the efficiency is high, the impurity removal is relatively thorough, and the equipment is highly practical.

[0022] like Figure 3 , Figure 4 As shown, the installation mechanism 2 includes an annular seat 21 located in the lower part of the inner cavity of the water tank 1, two vertical shells 22 symmetrically and vertically fixed on the left and right sides of the upper surface of the annular seat 21, and an annular pressure block 23 detachably installed on the top surface of the two vertical shells 22. Two multi-stage filter plates 3 are respectively set on the front and rear sides of the vertical shell 22. The sidewalls of the multi-stage filter plates 3 are engaged with the sidewalls of the vertical shell 22. The upper surface of the multi-stage filter plates 3 is in contact with the bottom surface of the annular pressure block 23. The bottom surface of the multi-stage filter plates 3 is in contact with the upper surface of the annular seat 21. The sealing mechanism 5 is set in the inner cavity of the vertical shell 22. The two multi-stage filter plates 3, the annular seat 21, the annular pressure block 23, the two vertical shells 22 and the sealing mechanism 5 cooperate to form a closed cylindrical space. The upper surface of the annular pressure block 23 is in contact with the top surface of the inner cavity of the water tank 1, and the inner cavity of the water outlet pipe is connected to the cylindrical space.

[0023] In use, place the two multi-stage filter plates 3 on the front and rear sides of the two vertical shells 22, so that the bottom of the multi-stage filter plates 3 is inserted into the groove on the upper surface of the annular seat 21. The top of the multi-stage filter plates 3 is pressed by the annular pressing block 23 cooperating with the top surface of the inner cavity of the water tank 1, which facilitates the fixing of the multi-stage filter plates 3 and allows for quick disassembly and replacement of the multi-stage filter plates 3.

[0024] like Figure 4 , Figure 5 , Figure 6 , Figure 7As shown, the backwash mechanism 4 includes an annular mounting shell 41 disposed on the outside of the two vertical shells 22, an annular flushing block 42 disposed between the two vertical shells 22, a connecting block 43 that moves up and down inside the vertical shell 22 to connect the annular mounting shell 41 and the annular flushing block 42, a partition ring 411 fixedly sleeved on the outer ring of the annular mounting shell 41 and movably connected to the inner cavity of the water tank 1, an annular groove 44 opened along the inner ring of the annular mounting shell 41, a filter plate assembly 7 that rotates in the annular groove 44, two water permeable channels 45 symmetrically opened on the front and rear sides of the upper surface of the annular mounting shell 41, feed chambers 46 symmetrically opened on the left and right sides of the annular mounting shell 41 and communicating with the inner cavity of the annular groove 44, a set of inclined guide plates 47 circumferentially equidistantly disposed in the opening of the annular groove 44, and a flushing groove 48 circumferentially opened in the middle of the outer surface of the annular flushing block 42. The inner ring of the annular mounting shell 41 is fitted with the outer side of the vertical shell 22 and the multi-stage filter plate 3. The outer ring of the annular flushing block 42 is fitted with the inner side of the vertical shell 22 and the multi-stage filter plate 3. The left and right side walls of the connecting block 43 are fixedly connected to the inner cavity of the annular groove 44 and the inner cavity of the flushing groove 48, respectively. Two nozzles 49 for spraying water into the flushing groove 48 are symmetrically opened on one side of the connecting block 43. A drain port 410 communicating with the lower part of the inner cavity of the annular groove 44 is opened on the other side of the connecting block 43. When the drive mechanism 6 is operating, the filtered water in the cylindrical space is transported to the nozzles 49 and sprayed out.

[0025] During use, the operator uses the external control system to drive the connecting block 43 via the drive mechanism 6 to move the annular mounting shell 41 and the annular flushing block 42 downwards intermittently at equal distances. Whenever the downward movement stops, the drive mechanism 6 can spray the filtered water in the cylindrical space into the flushing tank 48 through the nozzle 49. The water in the flushing tank 48 is sprayed outwards from the filter holes of the multi-stage filter plate 3 under pressure, realizing the backwashing of the multi-stage filter plate 3. The sprayed water and impurities enter the annular groove 44. At the same time, the impact force of the water flow can drive the filter plate assembly 7 to operate. The filter plate assembly 7 can filter and clean the impurities that accumulate and float in the water below the partition ring 411 in the water tank 1.

[0026] like Figure 7 As shown, the filter plate assembly 7 includes a circular filter plate 71 that rotates within an annular groove 44, a set of blades 72 that are circumferentially equidistantly mounted on the inner ring of the circular filter plate 71 via a rotating shaft, a sludge collection groove 73 that is circumferentially opened at the lower part of the circular filter plate 71, a connecting channel 74 that is symmetrically opened in the inner cavity of the sludge collection groove 73, a spiral rod 75 that rotates within the connecting channel 74, the edge of the spiral blade of the spiral rod 75 being in contact with the inner cavity of the connecting channel 74, and a filter plate assembly 8 that is provided on the upper surface of the circular filter plate 71 for detecting the water flow rate of the filter element. Among them, the circular filter plate 71 penetrates the water permeable channel 45 and the inner cavity of the feed chamber 46, and a set of pusher plates are fixed circumferentially at equal intervals near the edge of the bottom surface of the circular filter plate 71. One end of the spiral rod 75 penetrates to the outside of the inner cavity of the sludge collection tank 73, and a transmission wheel 76 is fixedly sleeved on one end of the spiral rod 75. The bottom of the outer ring of the transmission wheel 76 is movably connected to the inner cavity wall of the annular groove 44. A filter box 9 is fixedly installed in the middle of the bottom surface of the inner cavity of the assembly shell 61, and a drain pipe 10 for connecting the drain outlet 410 and the filter box 9 is fixedly installed on the bottom surface of the connecting block 43.

[0027] During use, floating impurities in the water tank 1 through the permeable channel 45 are filtered by the circular filter plate 71. When the backwash water flows through the multi-stage filter plate 3 and enters the annular groove 44 along with the impurities, the impact force of the water flow can act on the blades 72 to drive the circular filter plate 71 to rotate. When the circular filter plate 71 rotates, it drives the pusher plate to move circumferentially, which can clean the filtered impurities into the feed chamber 46 and fall into the collection tank 73. When the circular filter plate 71 rotates, through the interaction between the transmission wheel 76 and the inner cavity of the annular groove 44, it can drive the screw rod 75 to rotate and transport the filtered impurities through the connecting channel 74 into the annular groove 44. The filtered impurities and the impurities that have been detached from the backwash can be discharged outside the equipment through the drain port 410, the drain pipe 10, and the filter box 9. At the same time, the filtered water in the filter box 9 can be transported back to the water tank 1 by using external water supply equipment to avoid resource waste.

[0028] like Figure 11 , Figure 12 As shown, the detection mechanism 8 includes an annular sealing shell 81 fixed to the top surface of the circular filter plate 71, an annular resistor 82 fixed to the top surface of the inner cavity of the annular sealing shell 81, a sliding resistor 83 that moves up and down around the outer ring of the annular resistor 82, a set of two-section spring compression rods 84 symmetrically and vertically fixed to the top surface of the inner cavity of the annular sealing shell 81, a sensor 85 fixed to the bottom surface of the inner cavity of the annular sealing shell 81, the sensor 85 having a built-in power supply, capable of detecting resistance value, and having a wireless signal transmitter, guide grooves 86 circumferentially equidistantly opened on the bottom surface of the sliding resistor 83, a guide rod 87 fixed to the top of the rotating shaft of the blade 72 and cooperating with the inner cavity of the guide groove 86 for driving the sliding resistor 83 to move upward, and a set of speed limiters 88 circumferentially equidistantly arranged on the outer ring of the annular sealing shell 81 for limiting the rotation speed of the circular filter plate 71. The speed limiters 88 are existing technology, and their structure and principle will not be described in detail here. Among them, the speed limiter 88 is movably connected to the top surface of the inner cavity of the annular groove 44, the bottom end of the two-section spring compression rod 84 is fixedly connected to the upper surface of the sliding resistor 83, the inner ring of the sliding resistor 83 is movably connected to the outer ring of the annular resistor 82, and the sensor 85 is connected to the annular resistor 82 and the sliding resistor 83 respectively through wires.

[0029] During use, when the backwash water flows through the multi-stage filter plate 3 and into the annular groove 44, the blades 72 are impacted by the water flow, which drives the circular filter plate 71 to rotate. When the circular filter plate 71 rotates, the speed limiter 88 restricts the maximum rotation speed. When the circular filter plate 71 reaches the maximum speed limit, the blades 72 rotate under the continuous impact of the water flow, causing the guide rod 87 to rotate circumferentially. When the guide rod 87 rotates, it interacts with the inner cavity of the guide groove 86, driving the sliding resistor 83 to move upward. After the sliding resistor 83 moves upward and contacts the annular resistor 82, it forms a complete circuit with the sensor 85. The sensor 85 can detect the resistance value after the sliding resistor 83 contacts the annular resistor 82 and send the resistance value to the external control system. By detecting and analyzing the changes in resistance value each time, the backwashing effect on the multi-stage filter plate 3 can be reflected, which makes it easier for operators to estimate the service life and replacement time of the multi-stage filter plate 3.

[0030] like Figure 5 , Figure 9 , Figure 10 As shown, the sealing mechanism 5 includes sealing plates 51 symmetrically arranged on the upper and lower surfaces of the connecting block 43. The sealing plates 51 are made of a flexible material that does not react with pure water. Rollers 52 are rotatably mounted on the upper and lower surfaces of the connecting block 43 via a bracket. The vertical shell 22 has symmetrical vertically opening sealing grooves on the left and right sides of its inner cavity. The sealing plate 51 is located in the inner cavity of the sealing groove, and one end of the sealing plate 51 is fixedly connected to the surface of the connecting block 43. The other end of the sealing plate 51 is wrapped around the roller 52. Four guide rails 53 are symmetrically and vertically fixedly installed in the inner cavity of the vertical shell 22. Rollers 54 are fixedly sleeved at the front and rear ends of the roller 52, and the outer ring of the roller 54 is movably connected to the side wall of the guide rail 53.

[0031] In use, when the drive mechanism 6 drives the connecting block 43 to move down, the connecting block 43 drives the sealing plate 51 to move under the action of the roller 52 and the sealing groove, and can be wound up and unwound through the cooperation of the roller 54 and the guide rail 53. The sealing effect can be achieved by the sealing plate 51 covering the inner cavity of the vertical shell 22.

[0032] like Figure 5 , Figure 8 As shown, the drive mechanism 6 includes an assembly shell 61 fixed to the bottom surface of the annular seat 21, a pump 62 disposed in the upper part of the inner cavity of the assembly shell 61, a water pumping pipe 63 fixedly sleeved on the water inlet port of the pump 62 for connecting the cylindrical space, a water delivery hose 64 fixedly connected to the water outlet port of the pump 62 for delivering filtered water to the nozzle 49, and two electrically controlled telescopic rods 65 symmetrically and vertically fixed on the left and right sides of the bottom surface of the inner cavity of the assembly shell 61. The bottom of the assembly shell 61 penetrates to the bottom surface of the water tank 1, and the assembly shell 61 and the bottom surface of the water tank 1 are detachably connected by bolts. The output shaft end of the electric telescopic rod 65 is fixedly connected to the middle of the bottom surface of the connecting block 43. The inner cavity of the assembly shell 61 is connected to the inner cavity of the vertical shell 22. The bottom surface of the pump 62 is fixedly connected to the upper surface of the filter box 9.

[0033] In use, the electric telescopic rod 65 is controlled by an external control system to drive the connecting block 43 to move intermittently according to the set value. Whenever the movement stops, the pump 62 and the water pipe 63 can spray the filtered water in the cylindrical space into the rinsing tank 48 through the nozzle 49.

[0034] Working principle and usage process of this invention: In use, initially, the annular mounting shell 41 and the annular flushing block 42 are positioned above the multi-stage filter plate 3. The operator controls the electric telescopic rod 65 via an external control system, enabling the connecting block 43 to intermittently move downwards according to a set value. When the connecting block 43 moves downwards, it drives the sealing plate 51 to move under the action of the roller 52 and the sealing groove. The roller 54 and the guide rail 53 work together to wind up and unwind the plate. The sealing plate 51 seals the inner cavity of the vertical shell 22, achieving a sealing effect. During each downward movement, the pump 62 and the water pipe 63 pump the filtered water from the cylindrical space through a spray nozzle. Water is sprayed from nozzle 49 into the rinsing tank 48. Under pressure, the water in the rinsing tank 48 is sprayed outward from the filter holes of the multi-stage filter plate 3, achieving backwashing of the multi-stage filter plate 3. The sprayed water and impurities enter the annular groove 44. The floating impurities in the water tank 1 through the water permeable channel 45 are filtered by the circular filter plate 71. When the backwash water flows through the multi-stage filter plate 3 and enters the annular groove 44 along with the impurities, the impact force of the water flow can act on the blades 72 to drive the circular filter plate 71 to rotate. When the circular filter plate 71 rotates, it drives the pusher plate to move circumferentially, which can clean the filtered impurities into the feed chamber 46 and fall into the collection tank 73. When the circular filter plate 71 rotates, it drives the pusher plate to move circumferentially through the drive wheel 76 and the annular groove 44. The interaction within the inner cavity of the trough 44 drives the spiral rod 75 to rotate, transporting the filtered impurities through the connecting channel 74 into the annular trough 44. The filtered impurities, along with those removed during backwashing, can be discharged outside the equipment via the drain port 410, drain pipe 10, and filter box 9. Simultaneously, the filtered water in the filter box 9 can be re-transported to the water tank 1 using external water supply equipment, avoiding resource waste. When the backwash water flows through the multi-stage filter plates 3 and is sprayed into the annular trough 44, the blades 72 are impacted by the water flow, driving the circular filter plate 71 to rotate. The rotation speed of the circular filter plate 71 is limited by the speed limiter 88. When the circular filter plate 71 reaches its maximum rotation speed... Once the maximum speed is reached, the blade 72 rotates under the continuous impact of the water flow, causing the guide rod 87 to rotate circumferentially. When the guide rod 87 rotates, it interacts with the inner cavity of the guide groove 86, driving the sliding resistor 83 to move upward. After the sliding resistor 83 moves upward and contacts the annular resistor 82, it forms a complete circuit with the sensor 85. The sensor 85 can detect the resistance value after the sliding resistor 83 contacts the annular resistor 82 and send the resistance value to the external control system. By detecting and analyzing the changes in resistance value each time, the backwashing effect on the multi-stage filter plate 3 can be reflected, which makes it easier for operators to estimate the service life and replacement time of the multi-stage filter plate 3.

[0035] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0036] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. An ultrapure water filtration device for semiconductor manufacturing, characterized in that, Includes a water tank (1), an installation mechanism (2) disposed in the water tank (1), two multi-stage filter plates (3) symmetrically disposed on the installation mechanism (2), a backwash mechanism (4) that moves up and down on the installation mechanism (2) to rinse the multi-stage filter plates (3), a sealing mechanism (5) disposed on the installation mechanism (2) and the backwash mechanism (4), and a driving mechanism (6) disposed at the bottom of the installation mechanism (2) to drive the backwash mechanism (4) to move up and down and spray water to rinse the multi-stage filter plates (3); The driving mechanism (6) is detachably connected to the bottom surface of the water tank (1), and an inlet pipe is connected to one side of the bottom surface of the water tank (1). An outlet pipe is connected to the middle of the top surface of the water tank (1) between the two multi-stage filter plates (3).

2. The ultrapure water filtration equipment for semiconductor production according to claim 1, characterized in that: The installation mechanism (2) includes an annular seat (21) located in the lower part of the inner cavity of the water tank (1), two vertical shells (22) symmetrically and vertically fixed on the left and right sides of the upper surface of the annular seat (21), and an annular pressure block (23) detachably installed on the top surface of the two vertical shells (22). Two multi-stage filter plates (3) are respectively disposed on the front and rear sides of the vertical shell (22). The sidewalls of the multi-stage filter plates (3) are engaged with the sidewalls of the vertical shell (22). The upper surface of the multi-stage filter plates (3) is attached to the bottom surface of the annular pressure block (23). The bottom surface of the multi-stage filter plates (3) is attached to the upper surface of the annular seat (21). The sealing mechanism (5) is disposed in the inner cavity of the vertical shell (22). The two multi-stage filter plates (3), the annular seat (21), the annular pressure block (23), the two vertical shells (22) and the sealing mechanism (5) cooperate to form a closed cylindrical space. The upper surface of the annular pressure block (23) is attached to the top surface of the inner cavity of the water tank (1), and the inner cavity of the water outlet pipe is connected to the cylindrical space.

3. The ultrapure water filtration equipment for semiconductor production according to claim 2, characterized in that: The backwash mechanism (4) includes an annular mounting shell (41) disposed on the outside of the two vertical shells (22), an annular flushing block (42) disposed between the two vertical shells (22), a connecting block (43) that moves up and down inside the vertical shell (22) to connect the annular mounting shell (41) and the annular flushing block (42), a partition ring (411) fixedly sleeved on the outer ring of the annular mounting shell (41) and movably connected to the inner cavity of the water tank (1), an annular groove (44) opened along the inner ring of the annular mounting shell (41), a filter plate assembly (7) rotating in the annular groove (44), two water permeable channels (45) symmetrically opened on the front and rear sides of the upper surface of the annular mounting shell (41), a feed chamber (46) symmetrically opened on the left and right sides of the annular mounting shell (41) and communicating with the inner cavity of the annular groove (44), a set of inclined guide plates (47) circumferentially equidistantly disposed in the opening of the annular groove (44), and a flushing groove (48) circumferentially opened in the middle of the outer surface of the annular flushing block (42). The inner ring of the annular mounting shell (41) is attached to the outer side of the vertical shell (22) and the multi-stage filter plate (3), the outer ring of the annular flushing block (42) is attached to the inner side of the vertical shell (22) and the multi-stage filter plate (3), the left and right side walls of the connecting block (43) are fixedly connected to the inner cavity of the annular groove (44) and the inner cavity of the flushing groove (48) respectively, and two nozzles (49) for spraying water into the flushing groove (48) are symmetrically opened on one side of the connecting block (43), and a drain port (410) communicating with the lower part of the inner cavity of the annular groove (44) is opened on the other side of the connecting block (43). When the driving mechanism (6) operates, it transports the filtered water in the cylindrical space to the nozzles (49) for spraying.

4. The ultrapure water filtration equipment for semiconductor production according to claim 3, characterized in that: The filter plate assembly (7) includes a circular filter plate (71) that rotates within the annular groove (44), a set of blades (72) that are circumferentially equidistantly mounted on the inner ring of the circular filter plate (71) via a rotating shaft, a sludge collection groove (73) that is circumferentially opened at the lower part of the circular filter plate (71), a connecting channel (74) that is symmetrically opened in the inner cavity of the sludge collection groove (73), a spiral rod (75) that rotates within the connecting channel (74), and a detection mechanism (8) provided on the upper surface of the circular filter plate (71) for detecting the water flow rate of the filter element. The circular filter plate (71) penetrates the water permeable channel (45) and the inner cavity of the feed chamber (46). A set of pusher plates are fixed circumferentially at equal intervals near the edge of the bottom surface of the circular filter plate (71). One end of the spiral rod (75) penetrates to the outside of the inner cavity of the sludge collection tank (73). A transmission wheel (76) is fixedly sleeved on one end of the spiral rod (75). The bottom of the outer ring of the transmission wheel (76) is movably connected to the inner cavity wall of the annular groove (44).

5. The ultrapure water filtration equipment for semiconductor production according to claim 4, characterized in that: The detection mechanism (8) includes an annular sealing shell (81) fixed on the top surface of the circular filter plate (71), an annular resistor (82) fixed on the top surface of the inner cavity of the annular sealing shell (81), a sliding resistor (83) that moves up and down on the outer ring of the annular resistor (82), a set of two-section spring compression rods (84) symmetrically and vertically fixed on the top surface of the inner cavity of the annular sealing shell (81), a sensor (85) fixed on the bottom surface of the inner cavity of the annular sealing shell (81), guide grooves (86) circumferentially and equidistantly opened on the bottom surface of the sliding resistor (83), a guide rod (87) fixed on the top of the blade (72) shaft and cooperating with the inner cavity of the guide groove (86) for driving the sliding resistor (83) to move upward, and a set of speed limiters (88) circumferentially and equidistantly arranged on the outer ring of the annular sealing shell (81) for limiting the rotation speed of the circular filter plate (71). The speed limiter (88) is movably connected to the top surface of the inner cavity of the annular groove (44), the bottom end of the two-section spring compression rod (84) is fixedly connected to the upper surface of the sliding resistor (83), the inner ring of the sliding resistor (83) is movably connected to the outer ring of the annular resistor (82), and the sensor (85) is connected to the annular resistor (82) and the sliding resistor (83) respectively through wires.

6. The ultrapure water filtration equipment for semiconductor production according to claim 5, characterized in that: The sealing mechanism (5) includes sealing plates (51) symmetrically arranged on the upper and lower surfaces of the connecting block (43) and rollers (52) rotatably mounted on the upper and lower surfaces of the connecting block (43) via a bracket. The vertical shell (22) has symmetrical vertically opened sealing grooves on the left and right sides of the inner cavity. The sealing plate (51) is located in the inner cavity of the sealing groove. One end of the sealing plate (51) is fixedly connected to the surface of the connecting block (43), and the other end of the sealing plate (51) is wrapped around the roller (52).

7. The ultrapure water filtration equipment for semiconductor production according to claim 6, characterized in that: The inner cavity of the vertical shell (22) is symmetrically and vertically fixedly equipped with four guide rails (53). Rollers (54) are fixedly sleeved at the front and rear ends of the roller (52). The outer ring of the roller (54) is movably connected to the side wall of the guide rail (53).

8. The ultrapure water filtration equipment for semiconductor production according to claim 7, characterized in that: The drive mechanism (6) includes an assembly shell (61) fixed to the bottom surface of the annular seat (21), a pump (62) disposed in the upper part of the inner cavity of the assembly shell (61), a water pumping pipe (63) fixedly sleeved on the water inlet port of the pump (62) for connecting the cylindrical space, a water delivery hose (64) fixedly connected to the water outlet port of the pump (62) for delivering filtered water to the nozzle (49), and two electrically controlled telescopic rods (65) symmetrically and vertically fixed on the left and right sides of the bottom surface of the inner cavity of the assembly shell (61). The bottom of the assembly shell (61) penetrates to the bottom surface of the water tank (1), and the assembly shell (61) and the bottom surface of the water tank (1) are detachably connected by bolts. The output shaft end of the electric telescopic rod (65) is fixedly connected to the middle of the bottom surface of the connecting block (43). The inner cavity of the assembly shell (61) is connected to the inner cavity of the vertical shell (22).

9. The ultrapure water filtration equipment for semiconductor production according to claim 8, characterized in that: A filter box (9) is fixedly installed in the middle of the bottom surface of the inner cavity of the assembly shell (61). The bottom surface of the pump (62) is fixedly connected to the upper surface of the filter box (9). A drain pipe (10) for connecting the drain outlet (410) to the filter box (9) is fixedly installed on the bottom surface of the connecting block (43).

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