Extreme UV device for inactivating pathogens in air

Abstract

An apparatus for inactivating pathogens in the air. The apparatus has a gas flow housing integrated with a far UV radiation source. The airflow housing includes a mechanical filter, a scrubber, or both, and the fan system provides airflow through the airflow housing. A far UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or the air outlet, and the far UV radiation source is positioned to direct radiation away from the airflow housing. Systems and methods for inactivating pathogens in air are also described.

Description

Cross-reference to related applications

[0001] This application claims the benefit of priority to U.S. Provisional Patent Application No. 63 / 468,255, filed May 22, 2023, the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0002] This document relates generally, but not by way of limitation, to devices, systems, and methods for inactivating airborne pathogens. More specifically, but not by way of limitation, this application relates to the use of far-UV light, including 222 nm light, to inactivate airborne pathogens. Background Technology

[0003] The general use of ultraviolet (UV) light has long been recognized as a mechanism for disinfecting surfaces and indoor air. In the early 1940s, Wells et al. published pioneering work on the use of germicidal lamps to study air disinfection in schools (Wells et al., Am J Hyg. 1942; 35: 97-121). More recent innovations utilize filtered quasi-monochromatic short-wavelength germicidal ultraviolet (GUV) radiation, particularly 222 nm light, which can be provided by KrCl excimer lamps. Filtered GUV devices that eliminate harmful wavelengths have been reported as safe, but continued innovation is needed to improve the safety and increase the effectiveness of GUV devices. Summary of the Invention

[0004] This disclosure provides an apparatus for inactivating airborne pathogens, the apparatus comprising: an airflow housing defining an airflow chamber, an air inlet, and an air outlet; a filtration system including a mechanical filter, a scrubber, or both, disposed within the airflow chamber; a fan system configured to provide airflow through the air inlet, the airflow chamber, and the air outlet; and a far-UV radiation source emitting radiation of one or more wavelengths from about 210 nm to about 230 nm, wherein the far-UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned to direct radiation away from the airflow housing, the filter, and the scrubber—if present. This disclosure also provides a portable kit for inactivating airborne pathogens, the portable kit including such an apparatus.

[0005] This disclosure also provides a system for inactivating pathogens in the air, the system comprising: a far-UV radiation source configured to irradiate air in a human-use space, wherein the far-UV radiation source emits radiation comprising one or more wavelengths from about 210 nm to about 230 nm; an airflow housing defining an airflow chamber, an air inlet, and an air outlet; a fan system configured to displace irradiated air near the radiation source and provide airflow through the air inlet, the airflow chamber, and the air outlet; optionally, a filter disposed in the airflow chamber, the filter being configured to remove particles from the air; and optionally, a scrubber disposed in the airflow chamber, the scrubber being configured to remove reactive reagents from the air; wherein the far-UV radiation source is integrated with an airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned such that substantially all radiation is directed away from the airflow housing.

[0006] This disclosure also provides a method for inactivating airborne pathogens, the method comprising: irradiating air in a human-use space with radiation from a far-UV radiation source, wherein the radiation is configured to inactivate airborne pathogens and includes one or more wavelengths from about 210 nm to about 230 nm; generating an airflow through an airflow housing using a fan system and displacing the irradiated air near the far-UV radiation source, wherein the airflow housing defines an airflow chamber, an air inlet, and an air outlet; optionally, removing particles from the airflow in the airflow housing; and optionally, removing reactive reagents from the airflow in the airflow housing; wherein the far-UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned such that substantially all radiation is directed away from the airflow housing. Attached Figure Description

[0007] Figure 1 This is a schematic diagram of a far-UV device with a radiation source integrated with an airflow device.

[0008] Figure 2 is a schematic diagram of various examples of far-UV devices with a radiation source integrated with an airflow device. Figure 2A The illustration shows two configurations with forward and backward airflow and one configuration with forward and lateral airflow. Figure 2B The diagrams illustrate configurations with forward apical airflow and configurations with forward-forward airflow.

[0009] Figure 3These are schematic diagrams of various other examples of far-UV devices with radiation sources integrated with airflow devices. The various illustrated examples utilize one or more far-UV radiation sources externally integrated with one or more airflow units.

[0010] Figure 4 is a schematic diagram of some further examples of far-UV devices with a radiation source integrated with an airflow device. The airflow is configured to follow the edge of the broadcast pattern of the far-UV radiation source. Figure 4A Two configurations are illustrated, in which the airflow unit is positioned below the far-UV radiation source and can be attached via fasteners, hinges, reversible connectors, or other connectors that allow for degrees of freedom of movement, removability, or articulation. Figure 4B The illustration shows configurations in which airflow units are located above and below a far-UV radiation source, and configurations in which the far-UV radiation source is guided at an angle through the region that generates airflow.

[0011] Figure 5 is a front view of various examples of far-UV devices with a radiation source integrated with an airflow device. Figure 5A The illustration shows a configuration on the front surface of a device with one or more air inlets (or air outlets) located below a far-UV radiation source, which can supply air to one or more airflow units. Figure 5B The illustration shows a configuration in which two air inlets (or air exhaust ports) are located on the front surface of the device, and these two air inlets can supply air to one or more airflow units.

[0012] Figure 6 This is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 6 The cross-sectional view and front view are shown.

[0013] Figure 7 is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 7A Cross-sectional views and front views are shown. 7B shows top and side views of the integrated device mounted on a telescopic support.

[0014] Figure 8 This is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 8 The diagram shows a cross-sectional view of the device not installed, a cross-sectional view of it installed on the telescopic support, and a front view.

[0015] Figure 9 This is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 9 The cross-sectional view, front view, and top view are shown.

[0016] Figure 10This is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 10 The cross-sectional view, front view, and top view are shown.

[0017] Figure 11 This is a schematic diagram of an example of a far-UV device with a radiation source integrated with an airflow device. Figure 11 The cross-sectional view, front view, and top view are shown.

[0018] Figure 12 The diagram illustrates the advantages of an externally integrated far-UV radiation source relative to an airflow unit oriented to displace irradiated air near the radiation source.

[0019] Figure 13 A flux rate contour map is provided illustrating a region with a high flux rate provided by an example far-UV radiation source.

[0020] Figure 14 Contour maps of air velocity generated by a hydrodynamic simulation model are provided, illustrating air velocity in space treated only with far-UV radiation sources.

[0021] Figure 15 Air velocity contour maps generated via a fluid dynamics simulation model are provided, illustrating air velocity in human-use spaces processed by a device with a far-UV radiation source and an airflow unit with a HEPA filter, which provides airflow in irradiated air regions in a pull configuration that captures irradiated air.

[0022] Figure 16 Air velocity contour maps generated via a hydrodynamic simulation model are provided, illustrating air velocities in human-use spaces processed by a device with a far-UV radiation source and an airflow unit with a MERV13 filter, which provides airflow in irradiated air regions in a pull configuration that captures irradiated air.

[0023] Figure 17 Air velocity contour maps generated via a fluid dynamics simulation model are provided, illustrating the air velocity in a human-use space processed by a device with a far-UV radiation source and an airflow unit with a MERV11 filter, which provides airflow in the irradiated air region in a pull configuration that captures irradiated air.

[0024] Figure 18 Air velocity contour maps generated via a fluid dynamics simulation model are provided, illustrating the air velocity in a human-use space processed by a device with a far-UV radiation source and an airflow unit with a HEPA filter, which provides airflow in the irradiated air region in a push configuration that exhausts purified air into the irradiated region.

[0025] Figure 19 Air velocity contour maps generated via a fluid dynamics simulation model are provided, illustrating the air velocity in a human-use space processed by a device with a far-UV radiation source and an airflow unit with a MERV13 filter, which provides airflow in the irradiated air region in a push configuration that exhausts purified air into the irradiated region.

[0026] Figure 20 Air velocity contour maps generated via a fluid dynamics simulation model are provided, illustrating the air velocity in a human-use space processed by a device with a far-UV radiation source and an airflow unit with a MERV11 filter, which provides airflow in the irradiated air region in a push configuration that exhausts purified air into the irradiated region.

[0027] Figure 21 Air velocity contour maps generated by a hydrodynamic simulation model are provided, illustrating air velocity in human-use space processed by a far-UV radiation source and a separately modeled airflow source located on the other side of the space.

[0028] Figure 22 Concentration contour maps generated via a fluid dynamics simulation model are provided, illustrating the concentration of VOCs in human-use spaces treated by a device with a far-UV radiation source and an airflow unit that provides airflow in the irradiated air region with a push configuration that exhausts purified air into the irradiated region.

[0029] Figure 23 Concentration contour maps generated via a fluid dynamics simulation model are provided, illustrating the concentration of VOCs in human-use spaces treated by a device with a far-UV radiation source and an airflow unit that provides airflow in regions of irradiated air in a pull configuration that captures irradiated air.

[0030] Figure 24 The illustration shows how a far-UV radiation source can be integrated with an airflow unit to locate local airflow in a region of high radiation intensity. Detailed Implementation

[0031] This disclosure particularly provides apparatus, systems, and methods for inactivating airborne pathogens. The apparatus, systems, and methods involve using a far-UV radiation source integrated with a housing that provides and directs airflow relative to the radiation source. The airflow is generated by one or more fans integrated with the housing, which orient the airflow and provide airflow in the irradiated air near the radiation source. The far-UV radiation source is located outside the housing and configured to direct radiation away from the housing and irradiate outside air located outside the housing. The apparatus, systems, and methods are useful for safely inactivating airborne pathogens in occupied spaces.

[0032] The generated airflow can displace air from the irradiated area near the radiation source. Based on the inverse square relationship between radiation intensity and distance from the source, irradiated air closer to the source experiences higher intensity radiation (e.g., more protons, higher flux, or higher irradiance). The positioning of the airflow housing relative to the far-UV radiation source can be configured to process the irradiated air near the source. Filters and scrubbers can be used within the housing to treat the air, for example, by removing particulate matter or reactive components. The airflow housing can also supply filtered and / or scrubbed air to the irradiated area. The airflow housing can be used to mix and displace air within the irradiated area.

[0033] The devices, systems, and methods described herein can provide solutions to several neglected problems in the art. For example, compared to methods of irradiation in air ducts, HVAC, or filtration systems, the various aspects described herein advantageously inactivate pathogens by separating the residence time of airborne pathogens in the air subjected to far-UV radiation from the removal of non-pathogenic airborne contaminants from the airflow through filtration and / or scrubbing. Surprisingly, the devices, systems, and methods described herein can benefit from filters and scrubbers with higher rather than lower penetration due to the increased airflow provided near the radiation source and through the housing. Rapid passage through high-penetration filters and / or scrubbers, followed by recirculation through the irradiated space, provides the advantage of multi-pass filtration and / or scrubbing, but also increases the total irradiation time for pathogens in the irradiated space in the case of multiple passes. The devices can treat spaces without relying on ventilation, ductwork, or HVAC systems. The devices also offer advantages over ventilation or HVAC systems due to portability, multi-pass filtration and / or scrubbing, and continuous irradiation of the treated space.

[0034] Furthermore, the various devices, systems, and methods described herein can provide solutions for addressing potentially harmful airborne agents, including those generated by far-UV radiation with wavelengths of 222 nm or longer, that may be generated by far-UV radiation. Additionally, the various devices, systems, and methods described herein can provide solutions for providing sterilization without producing harmful byproducts; for example, providing localized airflow in areas of high UV radiation can reduce the amount of radiation delivered to certain airborne particles while still achieving sufficient sterilization conditions for pathogens. Strong localized airflows can also have the advantage of providing further cleaning by facilitating multiple passes through the system. Furthermore, the various devices, systems, and methods described herein can provide solutions for addressing airborne pathogens present around the head level, for example, 4 to 6 feet above the ground, due to breathing, talking, coughing, sneezing, etc., which are associated with short-range person-to-person transmission. The provided airflow can advantageously circulate air at and around the device by moving air exposed to higher intensity far-UV radiation near the far-UV radiation source. Airflow can also have the beneficial effect of moving the air closest to the occupant, particularly to mix the air around the head level with the rest of the air in the irradiated space. Airflow can be provided diffusely to move air without dividing the room into separate airflows, without creating air walls that would reduce the mixing of pathogen-containing air with already cleaned air, and without causing discomfort or inconvenience to the occupant. Increased airflow without dividing the processing area into separate air spaces promotes air exchange, filtration, and / or scrubbing throughout the processing space.

[0035] definition

[0036] In this document, as is common in patent documents, the terms “a,” “an,” or “the” are used to include one or more, independent of any other instance or use of “at least one” or “one or more.” In this document, unless otherwise indicated, the term “or” is used to refer to a non-exclusive “or,” such that “A or B” includes “A but not B,” “B but not A,” and “A and B.” In this document, the terms “including” and “in” are used as concise English equivalents to the corresponding terms “comprising” and “wherein.” Furthermore, in the appended claims, the terms “comprising” and “including” are open-ended, meaning that a system, apparatus, article, composition, formulation, or process that includes elements other than those listed after such terms in a claim is still considered to fall within the scope of that claim. Additionally, in the appended claims, the terms “first,” “second,” and “third,” etc., are used merely as labels and are not intended to impose numerical requirements on their objects.

[0037] The term “about” as used herein may allow for a degree of variability in the value or range, for example, within 10%, 5%, or 1% of the limit of the value or range, and includes the exact value or range.

[0038] Depending on the context, the term “substantially” as used herein may mean most or the majority, such as at least about 50%, 60%, 70%, 80%, 90%, 95%, 96%, 97%, 98%, 99%, 99.5%, 99.9%, 99.99%, or at least about 99.999% or greater, or 100%.

[0039] In the methods described herein, actions can be performed in any order except where a specific chronological or operational sequence is explicitly stated, without departing from the principles of the invention. Furthermore, unless explicitly stated in the claims language that the specified actions are performed separately, the specified actions can be performed simultaneously. For example, the claimed action of performing X and the claimed action of performing Y can be performed simultaneously within a single operation, and the resulting process will fall within the literal scope of the claimed process.

[0040] As used herein, the term "pathogen" includes viruses, bacteria, infectious microorganisms, fungi, protozoa, parasites, and other pathogenic agents or components thereof capable of causing disease or infection in humans or animals. Pathogens include pathogens in droplets, pathogens in aerosols, and airborne pathogens.

[0041] As used herein, the term "inactivation" refers to a partial or complete reduction in the ability of a pathogen to cause disease or infection. Without intending to limit any particular mechanistic theory, inactivation can be achieved by damaging or destroying the genetic material, membrane, or other structures of a pathogen through exposure to far-UV radiation. In some contexts, inactivation can refer to the inactivation of a pathogen's ability to reproduce, replicate, enter cells, or evade the immune system. Pathogen inactivation may be useful for disinfection or purification purposes.

[0042] As used herein, “human-use space” or “occupiable space” is an area designed or intended for human use. Examples include, but are not limited to, rooms, restaurants, schools, workplaces, offices, hospitals, cafeterias, event spaces, bars, theaters, gyms, retail spaces, public transportation, public transportation stations, airports, and aircraft. Human-use space or occupiable space can include indoor and outdoor spaces. Human-use space or occupiable space can be empty, or it can be, for example, a space occupied by one or more occupants. Indoor spaces can include open, ventilated, or non-ventilated indoor spaces. In various examples, indoor spaces can have windows or mechanical ventilation, such as an HVAC system including air supply and air return devices. Occupable space or occupied space can also refer to animal-use space or plant-use space. The term “processing space” refers to an occupiable space in which air is irradiated to inactivate airborne pathogens. Therefore, the volume of a processing space refers to the entire volume of a human-use space, such as a room, while the volume of irradiated air refers only to the irradiated portion of the processing space. Occupable space can have certain areas that are intended to be occupied. In various aspects, areas that can be expected to be occupied by humans can include seating, desks, tables, bars, waiting areas, hospital beds, reception areas, checkout areas, cubicles, stairs, aisles, and elevators. Typically, areas expected to be occupied by humans are less than 7 feet from the floor.

[0043] As used herein, the term "portable" refers to a device that can be easily carried or transported from one location to another. For example, portable equipment may have a size and weight that allows it to be easily moved by a single person or trolley. Portable equipment may include handles, wheels, or other features that facilitate transport. Portable equipment can be constructed to be easy to install and disassemble into easily transportable components. In various examples, portable equipment may be disassembled into several components that can be assembled from individual units without requiring specialized tools, training, or having a disruptive interaction with the space. Portable equipment offers advantages over installed fixtures and HVAC systems, for example, because one or more portable devices can be deployed as needed or adjusted based on the needs of the specific space being treated, variations in space use (e.g., activities), and the expected number of occupants and their location within the space. In various respects, portable devices have the advantage of being user-installable or servicable without requiring specialized technicians. Another advantage is that a suitably designed portable unit can be battery-powered.

[0044] As used herein, the term "integrated" refers to combining two or more components into a single, unified device. Integrated components can be physically integrated such that the components are physically connected together, or designed to be assembled in a specific manner to form an integrated device. Components can be integrated together in many ways, such as via mechanical fasteners, adhesives, welding, or molding. Integrated components can also be electrically integrated such that the components are electrically wired together or share the same power source. Integrated components can also be functionally integrated, as the various components are configured to operate interoperably to achieve a specific purpose. In various aspects, integrated devices can have the advantages of being compact, convenient, and easy to use, and allow for control over the orientation of the integrated components. For example, the integration of a far-UV source and an airflow unit can advantageously control the relative direction of the airflow and the relative position of the components with respect to the emitted radiation. As another example, the integration of a far-UV source and an airflow unit can be achieved via shared mounting hardware, shared brackets, shared bases, or shared housings.

[0045] As used herein, “non-pathogenic pollutants” may include, among other pollutants, one or more of the following: ozone, oxygen-containing particles, oxygen-containing small organic molecules, oxygen-containing large organic molecules and materials, oxygen-containing dust particles, non-pathogenic degradation products of pathogens, and aggregated particles containing the above.

[0046] As used herein, the term "ultraviolet radiation" or "UV radiation" refers to electromagnetic radiation having one or more wavelengths from about 100 nm to about 400 nm. UV radiation can also be classified into several categories based on wavelength: UVA (about 315 nm to about 400 nm), UVB (about 280 nm to about 315 nm), UVC (about 200 nm to about 280 nm), far UV (about 200 nm to about 230 nm), vacuum UV (about 100 nm to about 200 nm), and extreme UV (about 10 nm to about 100 nm). In various aspects and contexts, UV radiation can refer to various subranges of UV radiation, such as 180 nm to 400 nm, 200 nm to 400 nm, 210 nm to 400 nm, 200 nm to 350 nm, 200 nm to 300 nm, or 210 nm to 280 nm. Radiation sources suitable for the apparatus, systems, and methods described herein will generally not emit vacuum UV or extreme UV. Therefore, in various aspects, a UV radiation source can be a UV radiation source that does not emit one or more types of UV light, such as a radiation source that does not emit vacuum UV or extreme UV. For example, a UV radiation source can emit radiation including one or more wavelengths between 200 nm and 400 nm. In various aspects, a UV radiation source is configured such that it does not emit vacuum UV. A given radiation source can emit a spectrum having wavelengths according to multiple light categories. For example, a far-UV radiation source can emit radiation having wavelengths corresponding to UVA, UVB, or UVC.

[0047] As used herein, “irradiance” is a measure of the power delivered to a surface per unit area, typically expressed in “W / m²” (watts per square meter), mW / m², or μW / cm². A surface can be, for example, an actual surface of an object or a given imaginary surface. Irradiance is a method of describing the intensity of light. When a surface of a fixed area is moved away from a light source, the power delivered to that surface decreases with the square of the distance. Irradiance values ​​depend on the orientation of the surface relative to the light source and decrease with the difference between the surface’s orientation and the orientation that orthogonals the incident light rays from the light source. In some contexts, when irradiance is described based on a given distance from a radiation source, a surface can be understood as an imaginary planar region located at a distance from the radiation source and oriented towards the light source so as to be orthogonal to the incident light rays from the light source. In other contexts, when irradiance is described relative to an object, the relevant surface can be understood as a surface orientation corresponding to such an object, which may include a wall, floor, ceiling, object, or person. Irradiance can be obtained from a radiance value by specifying the distance and orientation for the irradiance value. Irradiance can also be obtained from the total optical power given the distance from the source, the orientation of the surface, and the surface's relative position in the source's radiation mode. Under a fixed spectrum, irradiance can be equated to the photon arrival rate of a given surface, expressed in photons / (second·cm²). Irradiance as used herein is used in the context of "radiation" integrated over the entire relevant UV range; typically, for far-UV radiation, integration over 180 nm to 400 nm is sufficient. As also used herein, "total irradiance" refers to this irradiance over the wavelength range of 180 nm to 400 nm, typically expressed in W / cm² at a given distance from the source. 2 The unit is irradiance. Occasionally, in specific situations, it may be useful to refer to the irradiance of a specific wavelength or spectral series, such as 222 nm or narrowband 222 nm light. In various aspects, irradiance, total irradiance, etc., can be used to determine the instantaneous amount of radiation supplied to a surface or to determine the average amount of radiation supplied to a surface over a given time period. Irradiance, total irradiance, etc., can also be used to measure or determine the disinfection efficacy of far-UV lamps, which may include filters, and the contribution of far-UV lamps to the effective air exchange per hour (eACH) in a given space, wherein such determination may optionally be based on a weighted average of the spectral distribution of light. In various aspects, irradiance, total irradiance, etc., may be useful for controlling the disinfection power of far-UV lamps, for example, by maintaining operation within a given bactericidal efficacy spectrum and maintaining operation within a given safety spectrum.

[0048] As used herein, “total optical power,” “total luminous flux,” or “total optical power flux” refers to the photon generation rate of a UV radiation source in the wavelength range of 180 nm to 400 nm, expressed in mW. “Total optical power,” “total luminous flux,” or “total optical power flux” can be used to describe the disinfection power of a lamp. This can be used as a measurement of the total power output of a UV radiation source or other device. This differs from the “wall power” consumption of a lamp, which is not meaningfully related to the term except for defining its upper limit.

[0049] As used herein, “flux rate” is a measure of the power delivered to the surface area of ​​a sphere, typically expressed in “W / m²” (watts per square meter), mW / m², or μW / cm². This metric can be similar to “irradiance” and can share the same units. However, while irradiance measures the rate at which energy is delivered to an oriented surface, flux rate measures the rate at which energy is delivered to the surface of a sphere and is therefore independent of the orientation of the measurement in space. When irradiance is measured on a surface directly pointing at a radiation source (i.e., such that the surface is orthogonal to the incident light) and in the absence of reflection, the irradiance and flux rate measurements at that point will match. Another way to think about this is that irradiance measures only photons passing through a surface from one direction, while flux rate measures photons passing through the surface of a spherical volume from any direction. Flux rate, as used herein, is used in the context of “radiation”, integrated over the relevant UV spectral range, for example, conveniently integrated over 180 nm to 400 nm. In various respects, flux rate is useful for determining the instantaneous amount of radiation supplied to a given volume or for determining the average amount of radiation supplied to a given volume over a given time period. In various respects, flux rate is useful for determining the instantaneous virus inactivation power of a UV light source and is related to the eACH used to measure the volume.

[0050] As used in this article, "flux" is a measurement of the energy delivered to the surface area of ​​a sphere, expressed in J / m². 2Flux is measured in joules per square meter (J / m²). Flux measures the energy delivered to the surface of a sphere and therefore is independent of the measurement orientation in space. Flux is used here in a context of "radiation" where it is integrated over a relevant UV spectral range, typically conveniently between 180 nm and 400 nm. Flux can be used to correlate with the inactivation fraction of a given volume of particles. In some respects, it may be useful to determine flux based on an assumed 222 nm narrowband source or based on a weighted integration of multiple spectral sources. Spectral weighting factors can be chosen to suit a given use case: for example, contributing to exposure limits, bactericidal efficacy, or ozone generation. For example, when determining exposure in the context of pathogen inactivation functions, a narrowband 222 nm source can be approximated as 222 nm light compared to the inactivation function of 222 nm light. A wider spectrum of UV light can be integrated over the broadband spectrum and weighted at each wavelength according to how each wavelength contributes to exposure relative to 222 nm light.

[0051] As used herein, hourly air exchange, or “ACH,” refers to the number of times the entire air volume of a given space, such as a room, is replaced by filtered air per hour. Therefore, ACH can be determined based on CFM × 60 / space volume. In various contexts, ACH can be better understood by referring to ASHREA Standard 62 and ANSI Standard 136, each of which is incorporated herein by reference.

[0052] As used herein, effective air exchange per hour, or “eACH,” corresponds to the rate at which purified air is supplied to the air after taking into account both air exchange and the inactivation of pathogens by sterilizing irradiation. In the context of infectious diseases, eACH can be used to equate the effects of pathogen inactivation and pathogen removal. The resulting value is the ACH equivalent, determined by combining the ACH of a given space with an irradiation-derived ACH equivalent value. In the context of pathogen inactivation, eACH refers to the number of ACH equivalents that would need to be replaced by filtered air in a given space, such as a room, to achieve an equivalent result in the elimination of live pathogens within one hour.

[0053] As used herein, “effective irradiance” refers to the contribution of a given device to an exposure limit, which can specify the number of lamps applicable to a given space or the permissible exposure time for light to be used in an occupied space. As described herein, effective irradiance “E_ff” or “E_s” can be calculated by measuring point-by-point irradiance between 180 nm and 400 nm, weighted by factors corresponding to potential eye damage. The weighting factors can be derived from ACGIH exposure limit curves or IES exposure limit curves for the eye.

[0054] Far UV radiation source

[0055] The apparatus disclosed herein includes a far-UV radiation source that is useful for inactivating airborne pathogens. The far-UV radiation source may utilize various technologies, including one or more light bulbs, light-emitting diodes (LEDs), or other sources configured to emit UV radiation in an amount that effectively inactivates airborne pathogens.

[0056] The far-UV radiation source comprises one or more excimer lamps. The excimer lamps comprise a combination of rare gases and halogens that, when electrically excited, emit far-UV light of one or more wavelengths. Excimer lamp excitation can be triggered in various ways, including, for example, glow discharge, pulsed discharge, dielectric barrier discharge, short arc, or combinations thereof. In various examples, the far-UV radiation source comprises a KrCl excimer lamp or a KrBr excimer lamp. The far-UV radiation source produces and emits radiation of one or more wavelengths including about 210 nm to about 230 nm, but may also emit other wavelengths. In various examples, the far-UV radiation source may emit UV wavelengths other than far-UV. In some examples, the far-UV radiation source may emit visible light. In other examples, the excimer lamp produces and emits 222 nm light. Various shapes of the lamps are possible. The lamps are typically substantially tubular, but may be rod-shaped, elliptical, toroidal, or flattened forms of the foregoing. The far-UV radiation source may include a bulb having an annular body having an outer surface and defining an internal discharge cavity, wherein the annular body has a primary axial dimension and a secondary radial dimension, and includes an electrode in the internal discharge cavity that traverses the primary axial dimension of the annular body.

[0057] Far-UV radiation sources may include a housing, the form of which is not particularly limited. Typically, a far-UV radiation source includes a housing that houses one or more bulbs. In various aspects, the housing partially encloses one or more bulbs and provides at least one opening through which radiation can be emitted. For example, the housing may be a box-like piece with an opening on one side, the opening being covered by a UV-transparent material that serves as a protective window.

[0058] Far-UV radiation sources can include any number of optical components. Windows may include filters that can be useful for blocking potentially harmful wavelengths. The interior of the housing may be decorated with reflectors to guide light out of the housing and maximize the emitted radiation. Far-UV radiation sources may include one or more components for adjusting the direction, intensity, or focus of the emitted light. For example, a far-UV radiation source may include a diffuser or a lens.

[0059] A radiation pattern refers to the shape of radiation emitted from a far-UV radiation source, which can be defined by the radiation angle (diffusion range) from each source. The radiation boundary corresponds to the edge of the radiation pattern. Window materials and any filters can limit the radiation angle by reducing the transmittance of off-axis light in many materials. In some respects, the shape of the housing or optical components can limit the radiation angle. For example, the radiation angle can be changed by configuring the housing and reflectors to control the angle of incidence on the window. Unless otherwise stated, the radiation pattern and radiation angle are determined based on the substantial emission of 222 nm light. For irradiating airborne pathogens, a wide radiation pattern may be advantageous for irradiating large air spaces. In various cases, the radiation pattern, or radiation mode, of a UV source can reflect the relative intensity of the total light power per unit solid angle. Radiation pattern measurements can also describe the overall direction of illumination from the source. A radiation pattern can be described and measured as the irradiance value inside a sphere in which the source is positioned at its center. Complete radiation pattern measurements allow for the calculation of irradiance and flux relative to any point of the source, not just a point directly in front of the source. See document ANSI / IES LM-75-19, a copy of which is incorporated herein by reference.

[0060] One or more far-UV radiation sources can be positioned at a distance of 1 meter, 2 meters, 3 meters, 4 meters, 5 meters, 6 meters, 7 meters, 8 meters, 9 meters, or 10 meters from the far-UV radiation source at a concentration of approximately 0.5 μW / cm². 2 Approximately 60 μW / cm 2 The maximum irradiance value is used to irradiate the occupiable space. For example, at a distance of 1 meter from the far UV radiation source or at the closest distance between the far UV radiation source and the intended occupant's location, the maximum irradiance can be approximately or less than 0.5 µW / cm². 2 1.0 µW / cm 2 1.5 µW / cm 2 2.0 µW / cm 2 2.5 µW / cm 2 3.0 µW / cm 2 3.5 µW / cm 2 4.0 µW / cm 2 4.5 µW / cm 2 5.0 µW / cm 2 5.5 µW / cm 2 6.0 µW / cm 2 6.5 µW / cm 2 7.0 µW / cm 2 7.5 µW / cm 2 8.0 µW / cm2 、8.5 µW / cm 2 、9.5 µW / cm 2 、10 µW / cm 2 、11 µW / cm 2 、12 µW / cm 2 、13 µW / cm 2 、14 µW / cm 2 、15 µW / cm 2 、16 µW / cm 2 、17 µW / cm 2 、18 µW / cm 2 、19 µW / cm 2 、20 µW / cm 2 、21 µW / cm 2 、22 µW / cm 2 、23 µW / cm 2 、24 µW / cm 2 、25 µW / cm 2 、26 µW / cm 2 、27 µW / cm 2 、28 µW / cm 2 、29 µW / cm 2 、30 µW / cm 2 、31 µW / cm 2 、32 µW / cm 2 、33 µW / cm 2 、34 µW / cm 2 、35 µW / cm 2 、36 µW / cm 2 、37 µW / cm 2 、38 µW / cm 2 、39 µW / cm 2 、40 µW / cm 2 、41 µW / cm 2 、42 µW / cm 2 、43 µW / cm 2 、44 µW / cm 2 、45 µW / cm 2 、46 µW / cm 2 、47 µW / cm 2 、48 µW / cm 2 、49 µW / cm 2 、50 µW / cm 2 、51 µW / cm 2 、52 µW / cm 253 µW / cm 2 54 µW / cm 2 55 µW / cm 2 56 µW / cm 2 57 µW / cm 2 58 µW / cm 2 59 µW / cm 2 Or 60 µW / cm 2 Or any range of the values ​​mentioned above. In some respects, one or more far-UV radiation sources may be located at a distance of 1 meter from the far-UV radiation source or at the closest distance between the far-UV radiation source and the intended occupant's location, at a rate of 10 μW / cm². 2 11 μW / cm 2 12 μW / cm 2 13 μW / cm 2 14 μW / cm 2 Or 15 μW / cm 2 Irradiate the available space.

[0061] One or more far-UV radiation sources can be positioned at a distance of 1 meter, 2 meters, 3 meters, 4 meters, 5 meters, 6 meters, 7 meters, 8 meters, 9 meters, or 10 meters from the far-UV radiation source, at a rate of approximately 0.5 μW / cm². 2 Approximately 60 μW / cm 2 The flux rate is used to irradiate the available space. For example, at a distance of 1 meter from the far-UV radiation source or at the closest distance between the far-UV radiation source and the intended occupant's location, the flux rate can be approximately or less than 0.5 µW / cm², 1.0 µW / cm², etc. 2 1.5 µW / cm 2 2.0 µW / cm 2 2.5 µW / cm 2 3.0 µW / cm 2 3.5 µW / cm 2 4.0 µW / cm 2 4.5 µW / cm 2 5.0 µW / cm 2 5.5 µW / cm 2 6.0 µW / cm 2 6.5 µW / cm 2 7.0 µW / cm 2 7.5µW / cm 2 8.0 µW / cm 2 8.5µW / cm 2 9.0 µW / cm 2 9.5 µW / cm2 、10 µW / cm 2 、11 µW / cm 2 、12 µW / cm 2 、13 µW / cm 2 、14 µW / cm 2 、15 µW / cm 2 、16 µW / cm 2 、17 µW / cm 2 、18 µW / cm 2 、19 µW / cm 2 、20 µW / cm 2 、21 µW / cm 2 、22 µW / cm 2 、23 µW / cm 2 、24 µW / cm 2 、25 µW / cm 2 、26 µW / cm 2 、27 µW / cm 2 、28 µW / cm 2 、29 µW / cm 2 、30 µW / cm 2 、31 µW / cm 2 、32 µW / cm 2 、33 µW / cm 2 、34 µW / cm 2 、35 µW / cm 2 、36 µW / cm 2 、37 µW / cm 2 、38 µW / cm 2 、39 µW / cm 2 、40 µW / cm 2 、41 µW / cm 2 、42 µW / cm 2 、43 µW / cm 2 、44 µW / cm 2 、45 µW / cm 2 、46 µW / cm 2 、47 µW / cm 2 、48 µW / cm 2 、49 µW / cm 2 、50 µW / cm 2 、51 µW / cm 2 、52 µW / cm 2 、53 µW / cm 2 、54 µW / cm 255 µW / cm 2 56 µW / cm 2 57 µW / cm 2 58 µW / cm 2 59 µW / cm 2 Or 60 µW / cm 2 Or any range of the values ​​mentioned above. In some respects, one or more far-UV radiation sources may be located at a distance of 1 meter from the far-UV radiation source or at the closest distance between the far-UV radiation source and the intended occupant's location, at a rate of 10 μW / cm². 2 11 μW / cm 2 12 μW / cm 2 13 μW / cm 2 14 μW / cm 2 Or 15 μW / cm 2 The flux rate is used to irradiate the available space.

[0062] 4 mW、5 mW、6 mW、7 mW、8 mW、9 mW、10 mW、15 mW、20 mW、25 mW、30 mW、35 mW、40 mW、45 mW、50 mW、55 mW、60 mW、65 mW、70mW、75 mW、80 mW、85 mW、90 mW、95 mW、100 mW、105 mW、110mW、115 mW、120 mW、125 mW、130 mW、135 mW、140 mW、145 mW、150 mW、155 mW、160 mW、165 mW、170 mW、175 mW、180 mW、185 mW、190 mW、195 mW、200 mW、205 mW、210 mW、215 mW、220 mW、225 mW、230 mW、235 mW、240 mW、245 mW、250 mW、255 mW、260 mW、265 mW、270 mW、275 mW、280 mW、285 mW、290 mW、295 mW、300 mW、305 mW、310 mW、315 mW、320 mW、325 mW、330 mW、335 mW、340 mW、345 mW、350 mW、355 mW、360 mW、15 mW、20 mW、25 mW、30 mW、35 mW、40 mW、45 mW、50 mW、55 mW、60mW、65 mW、70mW、75 mW、80 mW、85 mW、90 mW、95 mW、100 mW、101 mW、102 mW、103 mW、104mW、105 mW、106 mW、107 mW、108 mW、109 mW、110 mW、111 mW、112 mW、113 mW、114 mW、115mW、116 mW、117 mW、118 mW、119 mW、120 mW、121 mW、122 mW、123 mW、124 mW、125 mW、126mW、127 mW、128 mW、129 mW、130 mW、131 mW、132 mW、133 mW、134 mW、135 mW、136 mW、137mW、138 mW、139 mW、140 mW、145 mW、150 mW、155 mW、160 mW、165 mW、170 mW、175 mW、180mW、185 mW、190 mW、195 mW、200 mW、205An occupiable space can be irradiated with a total optical power of 210 mW, 215 mW, 220 mW, 225 mW, 230 mW, 235 mW, 240 mW, 245 mW, 250 mW, 255 mW, 260 mW, 265 mW, 270 mW, 275 mW, 280 mW, 285 mW, 290 mW, 295 mW, 300 mW, 305 mW, 310 mW, 315 mW, 320 mW, 325 mW, 330 mW, 335 mW, 340 mW, 345 mW, 350 mW, 355 mW, or 360 mW, or any range of the values ​​above. For example, one or more far-UV radiation sources can irradiate an occupiable space with a total optical power of 120 mW.

[0063] Far-UV radiation sources may include filters. In various examples, the filters can substantially prevent the transmission of one or more wavelengths outside the range of about 200 nm to about 230 nm. Far-UV radiation sources include filters that substantially transmit one or more wavelengths outside the range of about 200 nm to about 230 nm. In more specific embodiments, far-UV radiation sources include filters that substantially prevent the transmission of one or more wavelengths outside the range of about 200 nm to about 230 nm, but also substantially transmit one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0064] Far-UV radiation sources are commercially available, for example, the B1, B1.5, B2, C1, and C2 far-UV KrCl emitters from Ushio Inc. (Tokyo, Japan), the micro-plasma KrCl emitters from Eden Park Illumination (Champaign, Illinois), the Lumenizer KrCl emitters from Lumen Labs (Round Rock, Texas), or the EL-09 KrCl UVC emitter module from Excelitas (Waltham, Massachusetts).

[0065] airflow unit

[0066] The device disclosed herein may include an airflow unit. The airflow unit includes one or more air inlets, one or more air outlets, one or more airflow chambers, and one or more fans. The airflow unit may also include one or more mechanical filters, one or more scrubbers, or both. An airflow housing provides for protective and functional purposes. For example, the airflow housing may protect internal components and may also be designed to control airflow. The airflow housing may be made of plastic, metal, resin, or composite material. In all respects, the housing is rigid. The airflow housing may have one or more air inlets and one or more air outlets. The air inlets and air outlets are openings in the airflow housing that allow air to flow between the external space and the space inside the airflow unit.

[0067] The airflow unit can be integrated with the far-UV radiation source via fasteners, adhesives, interlocking components, welding, or molding to the outer surface of the airflow housing. The airflow unit can be integrated with the far-UV radiation source via a shared bracket or mounting hardware. The airflow unit can be integrated with the far-UV radiation source via a shared power supply. The airflow housing can be positioned close to the edge of the radiation pattern of the far-UV radiation source. In some examples, the dimensions of the airflow housing, air inlet, or air outlet are approximately equal to the dimensions of the far-UV radiation source or its bulb. In various examples, the air inlet or air outlet adjacent to the far-UV radiation source is substantially rectangular, having an edge substantially parallel to the edge of the far-UV radiation source or its reflector, bulb, or lens. In some examples, the air inlet or air outlet adjacent to the far-UV radiation source is annular and surrounds the far-UV radiation source. In still other examples, the airflow housing and the far-UV radiation source are integrated in a cuboid or cylindrical shape. In various other examples, the far-UV radiation source is located within 24 inches of the air inlet or air outlet. The equipment can be configured to attach an airflow housing to a return or supply unit of an HVAC system.

[0068] The airflow unit is configured to displace irradiated air near a far-UV radiation source. An air inlet may be adjacent to the far-UV radiation source, and the airflow housing may be configured to trap the irradiated air near the far-UV radiation source. In some aspects, the air exhaust may be directed away from the far-UV radiation source and may optionally be directed to a ceiling, wall, floor, or deflector to circulate the air within the available space. The air inlet may also be adjacent to the far-UV radiation source, and the airflow housing may be configured to exhaust the airflow away from the irradiated air near the far-UV radiation source. The air exhaust port may be adjacent to the far-UV radiation source, and the airflow housing may be configured to exhaust the airflow into the space irradiated by the far-UV radiation source. In other aspects, the airflow housing may be configured to displace the irradiated air in a direction substantially parallel to the direction of the emitted radiation. In still other aspects, the airflow housing is configured to trap the irradiated air and displace it in a direction substantially opposite to the direction of the emitted radiation. In yet another aspect, the airflow housing is configured to displace the irradiated air in a direction substantially perpendicular to the direction of the emitted radiation. In various examples, the air inlet and air outlet provide one or more rotating vortices in the room where the device is located.

[0069] In other examples, the airflow unit provides 60 ft at the air inlet and / or air outlet. 3 / min to 5000 ft 3 / min airflow. In various examples, the airflow at the air inlet and / or air outlet has at least or about 60 ft. 3 / min, 70 ft 3 / min, 80 ft 3 / min, 90 ft 3 / min, 100 ft 3 / min, 125 ft 3 / min, 150 ft 3 / min, 175 ft 3 / min, 200 ft 3 / min, 250 ft 3 / min, 300 ft 3 / min, 350 ft 3 / min, 400 ft 3 / min, 450ft 3 / min, 500 ft 3 / min, 550 ft 3 / min, 600 ft 3 / min, 650 ft 3 / min, 700 ft 3 / min, 800 ft 3 / min, 900 ft 3 / min, 1000 ft 3 / min, 2000 ft 3 / min, 3000 ft 3 / min, 4000 ft 3 / min or 5000 ft 3 / min volumetric flow rate. In some aspects, the airflow housing is configured to provide diffused exhaust. In other aspects, the airflow unit is configured such that the air exhaust port will not provide airflow walls, partitioned airflow in the occupied space, or other methods for minimizing air mixing, circulation, and movement in the processing space. In various aspects, the airflow housing is configured to facilitate the movement or scattering of droplets, aerosols, pathogens, and particles in the air.

[0070] In various examples, far-UV devices can provide approximately or at least 50 m 3 / hr, 100 m 3 / hr, 150 m 3 / hr、200m 3 / hr, 250 m 3 / hr, 300 m 3 / hr, 350 m 3 / hr, 400 m 3 / hr, 450 m 3 / hr, 500 m 3 / hr, 550 m 3 / hr、600m 3 / hr, 650 m 3 / hr、700 m 3 / hr、750 m 3 / hr, 800 m 3 / hr, 850 m 3 / hr、900 m 3 / hr、950 m 3 / hr or 1000 m 3 Clean air delivery rate (CADR) of approximately 50 m / hr. In various examples, far-UV devices can provide approximately 50 m... 3 / hr, 100m 3 / hr, 150 m 3 / hr, 200 m 3 / hr, 250 m 3 / hr, 300 m 3 / hr, 350 m 3 / hr, 400 m 3 / hr, 450 m 3 / hr, 500m 3 / hr, 550 m 3 / hr、600 m 3 / hr, 650 m 3 / hr、700 m 3 / hr、750 m 3 / hr, 800 m 3 / hr, 850 m 3 / hr、900m 3 / hr、950 m 3 / hr, 1000 m 3 / hr, 1100 m 3 / hr, 1200 m 3 / hr, 1300 m 3 / hr, 1400 m 3 / hr, 1500 m 3 / hr, 1600 m 3 / hr, 1650 m 3 / hr, 1700 m 3 / hr, 1750 m 3 / hr, 1800 m 3 / hr, 1850 m 3 / hr, 1900 m 3 / hr、1950 m 3 / hr、2000 m 3 / hr volumetric airflow rate.

[0071] The airflow unit can provide 1 ACH to 30 ACH of air exchange per hour (ACH) in a given space. In other respects, the entire device can provide 1 ACH to 30 ACH of air exchange per hour (ACH) in a given space.

[0072] Far-UV radiation sources can provide at least or approximately 4 eACH to 2000 eACH of effective air exchange per hour in a given space. For example, a far-UV radiation source can provide 90 eACH. In other respects, a complete device that modulates the effects of a combination of far-UV radiation sources and airflow units can provide 5 eACH to 35000 eACH of effective air exchange per hour in a given space. For example, a device can provide approximately 100 eACH. In some examples, a far-UV device can provide a greater eACH than would be achieved by using a separate far-UV radiation source and an air purifier, which are not integrated as currently described. In some examples, a far-UV device can provide a greater eACH than would be achieved by using a separate far-UV radiation source and a standalone air purifier with a HEPA filter.

[0073] The devices, systems, and methods described herein can be configured to provide airflow through an irradiated air space in various orientations relative to the primary direction of UV irradiation, including: a pull orientation (i.e., drawing air toward a far UV radiation source); a push orientation (i.e., blowing air away from a far UV radiation source); a vertical orientation (i.e., drawing or blowing air perpendicular to the direction of radiation from a far UV radiation source); a push-pull orientation (e.g., in which both an air inlet and an air outlet face the direction of UV radiation transmission to provide air circulation or vortex motion); orientations in which air exits from an air inlet, including exiting toward a wall or other boundary surface to provide circulating airflow in a room; orientations in which air exits toward an irradiated area; orientations in which air is drawn from an area having a wall or other boundary surface into an inlet to provide circulating airflow in a room; and other orientations. Pull configurations can move contaminants from lightly irradiated or non-irradiated areas to highly irradiated areas. This can provide movement that disrupts certain conditions leading to the formation of secondary byproducts, reduce the amount of time certain vulnerable particles are exposed to UV radiation, and direct secondary byproducts to filters or scrubbers, or any combination thereof. Push configurations can provide clean air that disrupts certain conditions leading to the formation of secondary byproducts. This can provide movement that disrupts certain conditions leading to the formation of secondary byproducts, reduce the amount of time certain vulnerable particles are exposed to UV radiation, and provide indoor airflow that removes contaminants from stagnant areas. Purified air can be exhausted in a direction that provides air circulation through the space, removes contaminants from stagnant or non-irradiated areas, and the exhausted air can be treated or measured to represent known values ​​that can be directed to desired locations. For example, in some aspects, air is exhausted from the rear of a far-UV device to move unirradiated air and promote air circulation through the room. As another example: in some aspects, purified air is exhausted toward areas of irradiated air to break down local concentrations of unwanted or UV-induced harmful byproducts. A sufficiently strong airflow can lead to a recirculation loop in which purified air is exhausted and recirculated through the device without complete mixing throughout the space. For example, a device configured to exhaust purified air in the irradiation direction can decompose pathogens, VOCs, ozone, precursors of secondary pollutants, and local concentrations of secondary pollutants, and can effectively guide pathogens, VOCs, ozone, precursors of secondary pollutants, and secondary pollutants to the inlet even when the inlet is located at the rear or side of the device or when the device is configured for placement close to a wall.

[0074] Filtration system

[0075] The apparatus disclosed herein may include a filtration system. As used herein, a "filtration system" or "purification system" refers to one or more mechanical filters and one or more scrubbers, depending on the components present. A filtration system may include multiple mechanical filters, multiple scrubbers, one filter and one scrubber, multiple mechanical filters and one scrubber, or one scrubber and multiple mechanical filters. The components of the filtration system are disposed within an airflow housing, located in or around an air inlet, air outlet, or airflow chamber.

[0076] The apparatus disclosed herein may include a mechanical filter. A mechanical filter is designed to physically capture and remove airborne particles. Mechanical filters may be made of any kind of material such as glass fiber, natural fibers such as cotton, synthetic fibers such as polyester, borosilicate glass microfibers, electrostatically charged polypropylene fibers, spun polymer nanofibers, or metal mesh. In some examples, the mechanical filter is not borosilicate microfibers.

[0077] Mechanical filters can have specific particle size ratings, such as MERV or HEPA ratings. MERV and HEPA ratings indicate the size of particles that can be captured with a certain efficiency. MERV refers to the minimum reported efficiency value, which is typically based on the filter's ability to capture particles between 0.3 and 10 micrometers. Unless otherwise specified, MERV values ​​correspond to ANSI / ASHRAE standard 52.2-2017. In some cases, MERV values ​​can be specifically described relative to 0.3-micrometer particles. In various examples, filters can be MERV 6, MERV 7, MERV 8, MERV 9, MERV 10, MERV 11, MERV 12, MERV 13, MERV 14, MERV 15, or MERV 16 filters. In other examples, filters can have MERV ratings smaller than 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, or 17. HEPA filters refer to High Efficiency Particulate Air filters, and include H10, H11, H12, H13, and H14 grades. Unless otherwise specified, HEPA names and values ​​correspond to ISO 294363-1 2017. In some contexts, specifically, HEPA names or values ​​may be described relative to 0.3-micron particles. In some respects, a filter may be a HEPA filter. In other respects, a filter is not a HEPA filter. In various examples, the device does not include any HEPA filter. In still other examples, the device does not include any filter rated MERV14 or higher according to MERV standard 52.2.

[0078] In various examples, the filtration system includes two MERV13 filters and optionally one or more scrubbers.

[0079] In fact, in various examples, the device has the advantage of effectively utilizing either lower-cost filters or higher-penetration filters.

[0080] One or more mechanical filters or the entire filtration system can have a penetration rate of 5% or greater at 0.3 microns. Typically, the penetration rate value can be determined by 1 – filter efficiency, where the filter efficiency is based on the most penetrating particle size or 0.3 microns. The penetration rate value may correspond to ISO 29463-1 2017. In other examples, one or more mechanical filters or the entire filtration system can have a penetration rate of 5%, 6%, 7%, 8%, 9%, 10%, 11%, 12%, 13%, 14%, 15%, 16%, 17%, 18%, 19%, 20%, 25%, 30%, 35%, or 40% or greater at 0.3 microns. In still other examples, one or more mechanical filters or the entire filtration system can have a penetration rate as high as 30%, 40%, 50%, or 60%. In various cases, referring to E1 filtration tested according to ASHRAE 52.2, which deals with particles from 0.3 microns to 1.0 microns, may be useful, but can approximate the penetration rate at 0.3 microns. An additional advantage of filter media with higher penetration is that it involves a lower pressure drop for the target result, thus enabling the required lower motor power and lower noise.

[0081] Conventionally, lower penetration is considered to represent a better filter. However, in various aspects of the present invention, mechanical filters or filtration systems with higher penetration may be advantageous. Surprisingly, the devices, systems, and methods described herein can benefit from filtration systems, filters, and scrubbers with higher rather than lower penetration due to the separation of pathogenic contaminant removal from non-pathogenic contaminant removal. The sterilizing UV treatment zone is located in the external space of the device, while the filter and / or scrubber zone is located within the airflow unit inside the device. A fast-moving airflow can be generated, which is positioned within the device and close to the air of higher UV intensity. Higher penetration allows for increased airflow near the radiation source and through the housing. Higher penetration also facilitates air circulation for multi-pass processing.

[0082] One or more mechanical filters or the entire filtration system may have a single-pass efficiency of about 40% to about 95%. For example, the single-pass efficiency may be about 40%, 45%, 50%, 55%, 60%, 65%, 70%, 75%, 80%, 85%, 90%, or 95%, or any range of the above values. In various examples, the single-pass efficiency is 70%. In other examples, one or more mechanical filters or the entire filtration system may have a single-pass efficiency of about or less than 40%, 45%, 50%, 55%, 60%, 65%, 70%, 75%, 80%, 85%, 90%, or 95% and a pressure drop profile from 0.4 mm H2O at 100 CFR to 2.0 mm H2O at 500 CFM.

[0083] One or more mechanical filters can have a surface area of ​​approximately 4 m² 2 Up to 210 m 2 The filter media. For example, the surface area could be approximately 4 m². 2 5 m 2 6 m 2 7 m 2 8 m 2 9 m 2 10 m 2 11 m 2 12 m 2 13 m 2 14 m 2 15 m 2 16m 2 17 m 2 18 m 2 19 m 2 20 m 2 21 m 2 22 m 2 23 m 2 24 m 2 25 m 2 26 m 2 27 m 2 28 m 2 29 m 2 30 m 2 31 m 2 32 m 2 33 m 2 34 m 2 35 m 2 36 m 2 37 m 2 38 m 2 39 m 2, 40 m 2 , 41 m 2 , 42 m 2 , 43 m 2 , 44 m 2 , 45 m 2 , 46 m 2 , 47 m 2 , 48 m 2 , 49 m 2 , 50 m 2 , 51 m 2 , 52 m 2 , 53 m 2 , 54 m 2 , 55 m 2 , 56 m 2 , 57 m 2 , 58 m 2 , 59 m 2 , 60 m[[ID=4l]] 2 , 61 m 2 , 62 m 2 , 63 m 2 , 64 m 2 , 65 m 2 , 66 m 2 , 67 m<000030l>, 68 m 2 , 69 m 2 , 70 m 2 , 71 m 2 , 72 m 2 , 73 m 2 , 74 m 2 , 75 m 2 , 76 m 2 , 77 m 2 , 78 m 2 , 79 m 2 , 80 m 2 , 90 m 2 , 100 m 2 , 110 m 2 , 120 m 2 , 130 m 2 , 140 m 2 , 150 m 2 , 160 m 2 , 170 m 2 , 180 m 2 , 190 m 2 , 04]], 2(X) m 2 or 210 m 2For example, one or more mechanical filters can together have a surface area of ​​42 m². 2 The filter media. In various aspects, mechanical filters utilize pleating to pack a larger surface area of ​​filter media into a smaller filter cartridge. In some cases, the filter is pleated to accommodate a 0.03 m... 2 up to 8 m 2 The filter cartridge contains material corresponding to the surface area of ​​the cylinder. In some cases, the filter cartridge is 0.2 m in size. 2 In various aspects, the filter media can have a thickness of 0.05 mm to 2.5 mm, for example, 0.3 mm. The filter cartridge can have a depth of 7 mm to 125 mm, for example, 25 mm. In yet another example, the filter cartridge can be 0.2 m × 0.2 m × 0.025 m.

[0084] One or more mechanical filters may have a face velocity of 0.05 m / sec to 15 m / sec. That is, one or more mechanical filters can withstand the face velocity, but are also rated, configured or selected to receive such a face velocity. For example, mechanical filters can have surface velocities of 0.05 m / sec, 0.10 m / sec, 0.15 m / sec, 0.20 m / sec, 0.25 m / sec, 0.30 m / sec, 0.35 m / sec, 0.40 m / sec, 0.45 m / sec, 0.50 m / sec, 0.55 m / sec, 0.60 m / sec, 0.65 m / sec, 0.70 m / sec, 0.75 m / sec, 0.80 m / sec, 0.85 m / sec, 0.90 m / sec, 0.95 m / sec, 1 m / sec, 2 m / sec, 3 m / sec, 4 m / sec, 5 m / sec, 6 m / sec, 7 m / sec, 8 m / sec, 9 m / sec, 10 m / sec, 11 m / sec, 12 m / sec, 13 m / sec, 14 m / sec, or 15 m / sec.

[0085] In various aspects, one or more mechanical filters can be rated to have approximately or at least 1000 ft. 3 / min, 2000 ft 3 / min, 3000 ft 3 / min, 4000 ft 3 / min or 5000 ft 3Maximum flow rate / min. One or more mechanical filters can be rated with a pressure drop of 0.25 mm H2O to 25 mm H2O. For example, the pressure drop could be 0.25 mm H2O, 0.30 mm H2O, 0.35 mm H2O, 0.40 mm H2O, 0.45 mm H2O, 0.50 mm H2O, 0.55 mm H2O, 0.60 mm H2O, 0.65 mm H2O, 0.70 mm H2O, 0.75 mm H2O, 0.80 mm H2O, 0.85 mm H2O, 0.90 mmH2O, 0.95 mm H2O, 1 mm H2O, 2 mm H2O, 2 mm H2O, 4 mm H2O, 5 mm H2O, 6 mm H2O, 7 mm H2O, 8mm H2O, 9 mm H2O, 10 mm H2O, 11 mm H2O, 12 mm H2O, 13 mm H2O, 14 mm H2O, 15mm H2O, 16mm H2O, 17mm H2O, 18 mm H2O, 19 mm H2O, 20 mm H2O, 21 mm H2O, 22 mm H2O, 23 mm H2O, 24 mm H2O, or 25 mm H2O, or a range of the above values. In each respect, one or more mechanical filters may have a pressure drop of 1.00 mm H2O or less.At flow rates of at least 50 CFM, 100 CFM, 150 CFM, 200 CFM, 250 CFM, 300 CFM, 350 CFM, 400 CFM, 450 CFM, 500 CFM, 550 CFM, 600 CFM, 650 CFM, 700 CFM, 750 CFM, 800 CFM, 850 CFM, 900 CFM, 950 CFM, or 100 CFM, the pressure drop can be 0.25 mm H2O, 0.30 mm H2O, 0.35 mm H2O, 0.40 mm H2O, 0.45 mm H2O, 0.50 mm H2O, 0.55 mm H2O, 0.60 mm H2O, 0.65 mm H2O, 0.70 mm H2O, 0.75 mm H2O, 0.80 mm H2O, or 0.85 mm H2O. H2O, 0.90 mm H2O, 0.95 mm H2O, 1 mm H2O, 2 mm H2O, 2 mm H2O, 4 mm H2O, 5 mm H2O, 6 mm H2O, 7 mm H2O, 8 mm H2O, 9 mm H2O, 10 mm H2O, 11 mm H2O, 12 mm H2O, 13 mm H2O, 14 mm H2O, 15 mm H2O, 16 mm H2O, 17 mm H2O, 18 mm H2O, 19 mm H2O, 20 mm H2O, 21 mm H2O, 22 mm H2O, 23 mm H2O, 24 mm H2O, or 25 mm H2O, or a range of the above values. One or more mechanical filters can have a flow rate of at least 50 CFM at a pressure drop of 0.25 mm H2O or less.

[0086] The apparatus disclosed herein may include a scrubber. The scrubber is designed to remove contaminants from the air using chemical or physicochemical processes, such as adsorption. The scrubber may be made of a variety of materials, including but not limited to activated carbon, manganese dioxide, graphene, carbon nanoparticles, homogeneous metal-doped catalysts, heterogeneous metal-doped catalysts, zeolites, or other absorbent microporous materials. Catalytic metals may include platinum, palladium, rhodium, and manganese. The scrubber may be a passive or active scrubber. For example, the scrubber may be an active scrubber powered by a power source shared with a far-UV radiation source and a fan system. The scrubber may be configured to remove ozone from the air. The scrubber may be configured to remove ozone derivatives or products generated by reactions with ozone. The scrubber may be configured to remove highly oxygenated organic molecules (HOMs) from the air. The scrubber may be configured to remove particles generated by clusters of highly oxygenated organic molecules. The scrubber may be located in an airflow unit, such as at an air inlet, air outlet, or airflow chamber.

[0087] The scrubbers and scrubber materials are commercially available: for example, granular activated carbon such as HS-AC, granular zeolite HS-600, and mixtures of granular activated carbon and zeolite such as XB-17 are each available from Hydrosil International Ltd (East Dundee, Illinois). Other available materials include ozone decomposition catalysts on aluminum honeycomb, such as XT-CAT-07 available from Hunan Xintan New Material Co., Ltd. In each respect, for apparent velocities from 25 ft / min to 100 ft / min, one or more scrubbers may have a pressure drop of approximately or less than 0.25 inch-of-water column / foot to 10 inch-of-water column / foot. In each respect, one or more scrubbers may have a pressure drop corresponding to one or more filters described herein, or the scrubbers and filters together may have a pressure drop corresponding to one or more filters described herein. In each respect, the scrubber or scrubber material is manganese dioxide.

[0088] This filtration system can be specifically configured to remove non-pathogenic pollutants from the air, including ozone, oxygen-containing particles, oxygen-containing small organic molecules, oxygen-containing large organic molecules and materials, oxygen-containing dust particles, non-pathogenic degradation products of pathogens, and aggregated particles containing all of the above.

[0089] This filtration system can be configured for multiple passes. In some examples, one or more mechanical filters or the entire filtration system is not suitable as a single-pass filter for use with ISO 29463-1 2017 to achieve ISO 20E or better.

[0090] Fan system

[0091] The apparatus disclosed herein may include a fan system. The fan system generates airflow and moves air through an airflow unit. The fan system includes one or more fans. The fans may be axial fans or rotary impellers.

[0092] One or more fans can have various sizes. In each aspect, the fan has a diameter of about 30 mm to about 600 mm, including the fan housing. For example, the fan can have a diameter of about 40 mm, 60 mm, 80 mm, 92 mm, 120 mm, 140 mm, or 200 mm. In another aspect, the fan can be about 500 mm to 600 mm in diameter, including the fan housing. The fan can have a depth of about 10 mm to about 90 mm. The fan can be configured for speeds of about 500 rpm to about 5000 rpm. One or more fans can have a noise distribution of about 6 dB to about 30 dB.

[0093] One or more fans can be configured for approximately 8 m 3 / h to approximately 500 m 3 / h airflow. For example, a fan can be configured for approximately or at least 10 m 3 / h、20 m 3 / h、30 m 3 / h, 40 m 3 / h, 50 m 3 / h、60 m 3 / h、70 m 3 / h、80 m 3 / h、90 m 3 / h, 100 m 3 / h、110 m 3 / h, 120 m 3 / h, 130 m 3 / h, 140 m 3 / h, 150 m 3 / h, 160 m 3 / h, 170 m 3 / h, 180 m 3 / h、190 m 3 / h, 200 m 3 / h、210 m 3 / h、220 m 3 / h、230 m 3 / h、240 m 3 / h, 250 m 3 / h、260 m 3 / h、270 m 3 / h、280 m 3 / h、290 m 3 / h, 300 m 3 / h、310 m 3 / h、320 m 3 / h、330 m3 / h、340m 3 / h, 350 m 3 / h、360 m 3 / h、370 m 3 / h, 380 m 3 / h、390 m 3 / h or 400 m 3 / h or any range of integers above for airflow. The fan system may provide at least or about 50 m³ of airflow together at the air inlet, air outlet, or both the air inlet and air outlet. 3 / h、60 m 3 / h、70 m 3 / h、80 m 3 / h、90 m 3 / h, 100 m 3 / h、110 m 3 / h, 120m 3 / h, 130 m 3 / h, 140 m 3 / h, 150 m 3 / h, 160 m 3 / h, 170 m 3 / h, 180 m 3 / h、190 m 3 / h, 200 m 3 / h、210m 3 / h、220 m 3 / h、230 m 3 / h、240 m 3 / h, 250 m 3 / h、260 m 3 / h、270 m 3 / h、280 m 3 / h、290 m 3 / h, 300m 3 / h、310 m 3 / h、320 m 3 / h、330 m 3 / h、340 m 3 / h, 350 m 3 / h、360 m 3 / h、370 m 3 / h, 380 m 3 / h、390m 3 / h or 400 m 3 / h airflow.

[0094] One or more fans can be configured to provide static pressure from about 0.40 mm H2O to about 8.00 mm H2O. For example, the fan may be configured for use with approximately 0.40 mm H2O, 0.50 mm H2O, 0.60 mm H2O, 0.70 mm H2O, 0.80 mm H2O, 0.90 mm H2O, 1.00 mm H2O, 1.10 mm H2O, 1.20 mm H2O, 1.30 mm H2O, 1.40 mm H2O, 1.50 mm H2O, 1.60 mm H2O, 1.70 mm H2O, 1.80 mm H2O, 1.90 mm H2O, 2.00 mm H2O, 2.10 mmH2O, 2.20 mm H2O, 2.30 mm H2O, 2.40 mm H2O, 2.50 mm H2O, 3.00 mm H2O, 3.50 mm H2O, 4.00 mm H2O, 4.50 mm H2O, 5.00 Static pressure of mm H2O, 5.50 mm H2O, 6.00 mm H2O, 6.50 mm H2O, or 7.00 mm H2O, or any range of the above values.

[0095] Fan systems can be configured for a total fan power of approximately or less than 5 W, 6 W, 7 W, 8 W, 9 W, 10 W, 11 W, 12 W, 13 W, 14 W, 15 W, 20 W, 25 W, 30 W, 35 W, 40 W, 45 W, 50 W, 55 W, 60 W, 65 W, 70 W, 75 W, 80 W, 85 W, 90 W, 95 W, 100 W, 110 W, 120 W, 130 W, 140 W, 150 W, 160 W, 170 W, 180 W, 190 W, or 200 W. One or more fans can be configured to operate at approximately 5 V to approximately 24 V. In various aspects, one or more fans can be configured to consume approximately 0.2 W to approximately 10 W. For example, one or more fans can consume approximately 0.6 W to approximately 6 W.

[0096] The fan system may include one or more brushless DC motors, brushed DC motors, or AC motors.

[0097] power supply

[0098] The apparatus disclosed herein may include a power supply. The power supply may be any device or system that provides electrical power to components of the apparatus, such as far-UV radiation sources and fan systems. The power supply may also power any active filter or active scrubber. The power supply is typically located internally, but it may also be located externally. The power supply may include an AC / DC adapter. The power supply may also include circuitry for regulating voltage, current, power, operating timing, or operating duration to ensure safe operation. In some aspects, the power supply may include a battery.

[0099] In various aspects, the device may include additional electrical components for data collection, system maintenance, and reporting. For example, the device may have sensors that collect spectrophotometric data, irradiance data, or spectral data from one or more far-UV radiation sources, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data, or any combination thereof. In another example, the device may have a control system that receives sensor data and adjusts the device's performance parameters. In still other examples, the device may have a reporting system that collects sensor data and notifies the user of recommended maintenance or changes to performance parameters.

[0100] In various aspects, the device may include a sensor for detecting ozone. The ozone sensor may be located near the air inlet, exhaust outlet, far-UV radiation source, or within the air chamber. In various aspects, the ozone sensor may be located within 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, or 12 inches of the housing. In various aspects, the ozone sensor may be located within 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, or 12 inches of the device's air inlet. In various aspects, the ozone sensor may be located within 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, or 12 inches of the device's exhaust outlet. In various aspects, the ozone sensor may be located within 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, or 12 inches of the far-UV radiation source. For example, an ozone sensor can be located within 2 inches of the device's exhaust port.

[0101] In some cases, airflow may be allowed to pass through the power source or through a heat sink used for the power source in order to promote cooling. However, in other cases, the power source and airflow are separated.

[0102] integrated

[0103] The device described herein includes a far-UV radiation source integrated with an airflow unit. The far-UV radiation source can be physically integrated with the airflow unit, for example, via fasteners, adhesives, interlocking components, welding, or molding. As another example, the airflow housing and the housing of the far-UV radiation source are attached, share a wall, or share an edge. The far-UV radiation source can be located near the air inlet or air outlet of the airflow housing. As yet another example, the far-UV radiation source and the airflow unit can be physically integrated by sharing a support, such as a bracket or mounting bracket. The far-UV radiation source and the airflow unit can be configured such that the airflow unit provides an airflow oriented relative to the radiation pattern emitted by the far-UV radiation. The far-UV radiation source can also be integrated with the airflow housing by sharing a power source.

[0104] The far-UV radiation source can be functionally integrated with the airflow housing by configuring various components for interoperability. In each respect, the far-UV radiation source and the airflow unit are configured to interoperate such that no single component would be sufficient to inactivate airborne pathogens while avoiding hazardous levels of ozone or ozone-derived pollutants.

[0105] deploy

[0106] The device disclosed herein may have a support member, which may be fixed or adjustable. A fixed or adjustable support member can be used to position the device at a certain height and angle to more effectively irradiate the space and also to allow air movement near areas with high pathogen transmission, particularly air approximately four to seven feet above the ground and closest to the occupant. The support may also allow the device to be placed near the ceiling, near the junction of a wall and ceiling, or near the upper corner of a room, and thus can be advantageously positioned to deflect air to increase air circulation through the room. The support member may be a bracket configured for use on a floor, tabletop, or countertop. An adjustable support member may be an extendable rod or arm to which a far-UV device can be mounted. The adjustable support member may also include retractable, adjustable, telescopic, or foldable legs. For example, the adjustable support member may be retractable or foldable to allow for easy transport. The adjustable support member may also include one or more mechanisms for locking the adjustable support member in a specific position. The adjustable support member may also have a counterweight base.

[0107] One or more devices can be deployed to inactivate airborne pathogens by irradiating a space with far-UV light. Pathogen inactivation is related to the intensity of the radiation and the amount of time the pathogen is irradiated. Users can utilize multiple devices to provide a predetermined intensity of radiation, depending on the size of the processing space.

[0108] Far-UV devices can utilize supports, for example by allowing the far-UV radiation source to be positioned away from the occupant, to provide approximately 0.5 μW / cm² at one or more occupants or areas intended for occupancy. 2 Approximately 60 μW / cm 2 For example, the support can facilitate raising the far-UV radiation source or attaching the far-UV radiation source to the ceiling or wall of the space.

[0109] Far-UV devices are configured such that, when deployed in an occupied space, the emitted radiation lacks the intensity, power, irradiance, flux rate, flux, effective irradiance, or total irradiance required to inactivate pathogens on the skin or other surfaces of the occupant.

[0110] Far-UV devices are configured such that, when deployed in an occupied space, the emitted radiation lacks the intensity, power, irradiance, flux rate, flux, effective irradiance, or total irradiance required to inactivate pathogens on objects or surfaces in the treatment space.

[0111] Far-UV devices may be configured or include instructions for deployment such that the far-UV device provides sufficient irradiance to inactivate pathogens in the air, but does not provide the intensity, power, irradiance, flux rate, flux, effective irradiance, or total irradiance required to effectively inactivate pathogens on an occupant, occupant skin or other surfaces, objects or surfaces in the processing space, or multiple objects or surfaces in the processing space.

[0112] In all respects, far-UV devices advantageously include supports, mounts, or instructions such that, when deployed, the device will be sufficiently far from the intended location of the occupant to allow for attenuation of intensity, power, irradiance, flux rate, flux, effective irradiance, or total irradiance to avoid effective sterilization of the occupant, the occupant's skin or other surfaces, or objects or surfaces in the treatment space.

[0113] In various aspects, far-UV devices are equipped with optical components to fully diffuse or broaden the radiation distribution pattern of the emitted light, thereby attenuating the intensity, power, irradiance, flux rate, effective irradiance, or total irradiance to avoid effective sterilization of the occupant, the occupant's skin or other surfaces, or objects or surfaces in the treatment space. In various aspects, far-UV devices are equipped with optical components to transmit far-UV radiation of one or more wavelengths and reflect visible light of one or more wavelengths. In various aspects, far-UV devices are equipped with optical components to transmit most of the radiation below 222 nm and reflect most of the radiation below one or more wavelengths of visible light. In various aspects, far-UV devices are equipped with optical components to transmit most of the radiation below 222 nm from the far-UV radiation source to the irradiated space and to reflect most of the visible light below 500 nm, 550 nm, 600 nm, 650 nm, 700 nm, or combinations thereof from the irradiated space back to the irradiated space. In all aspects, far-UV devices are equipped with optical components to transmit most of the radiation below 222 nm and to reflect most of the light from the irradiated space to the irradiated space back to the irradiated space. In all aspects, far-UV devices are equipped with optical components to transmit far-UV radiation and to reflect blue, green, yellow, orange, or red light, or combinations thereof, from the irradiated space to the irradiated space.

[0114] In every respect, far-UV devices are designed to draw air toward the device, thus avoiding the creation of reverse-rotating vortices, air walls, or other forms of airflow that separate air spaces. The devices can avoid reverse-rotating vortices due to the configuration of the device's air inlets and outlets or based on the device's deployment within a room. In every respect, the devices offer the advantage of allowing viruses to move within the available space.

[0115] The device disclosed herein can be configured as a portable unit. For example, the device may be configured with one or more handles. The disclosure also provides kits that include the device as part of a portable system. The device or kit may include a stand, wall mount, or ceiling mount, such as a floor stand or desktop stand. The stand may be telescopic or retractable. In various examples, the stand can be configured to a height of at least 4 feet. In some examples, the device may be configured for attaching an airflow housing to a return or supply unit of a pre-existing HVAC system. In various examples, the device or kit weighs 60 pounds or less and has a volume of 20 cubic feet or less. For example, the device or kit may be approximately or less than 10 pounds, 20 pounds, 30 pounds, 40 pounds, 50 pounds, or 60 pounds. When deployed, the device or kit may be approximately 1 cubic foot or less, 2 cubic feet or less, 3 cubic feet or less, 4 cubic feet or less, 5 cubic feet, 10 cubic feet, 15 cubic feet, or 20 cubic feet. In various examples, the device has a footprint of less than 1% to 5% of the space it is configured to process. In some examples, the device has a footprint of less than 1 square foot, 2 square feet, 3 square feet, 4 square feet, or 5 square feet. The device or kit may have a height, width, or length of 10 inches or less, 20 inches or less, 30 inches or less, or 40 inches or less—if present—when deployed or disassembled for transport. In various examples, each of the height, width, or length—if present—is 20 inches or less, 30 inches or less, or 40 inches or less. In some aspects, the device includes a cover or hinged cover. In still other aspects, the device may include an external reflector or diffuser. Alternatively, the device may be configured as a permanent or semi-permanent fixture.

[0116] Example

[0117] Referring now to certain embodiments of the disclosed subject matter, examples of which are partially illustrated in the accompanying drawings. While the disclosed subject matter will be described in conjunction with the enumerated claims, it will be understood that the illustrated subject matter is not intended to limit the claims to the disclosed subject matter. Aspects of this disclosure can be implemented by various examples, some of which are provided in the accompanying drawings; however, it will be readily understood by those skilled in the art that the specific examples provided herein are not limiting or exhaustive, and any number of additional variations can be readily contemplated as falling within the spirit of the invention.

[0118] In fact, the various examples and figures illustrated herein may include elements other than those shown or described. However, the inventors also contemplate examples in which only those elements shown or described are provided. Furthermore, the inventors contemplate examples using combinations of those elements shown or described relative to a given example or relative to other examples shown or described herein. The use of headings in this document is not intended to limit the subject matter in any way, and it is also contemplated that various aspects discussed with respect to a particular illustrated example can be imagined relative to each other.

[0119] Figure 1 A schematic diagram of an example far-UV device 100 is provided, which has a far-UV radiation source 101 externally integrated with an airflow unit 110. Figure 1 An example of a far-UV radiation source 101 is illustrated. The far-UV radiation source 101 includes a bulb 102, a reflector 103, and a lens 104, all housed within a lamp housing 105. The lamp housing 105 provides a cavity in which the bulb 102 is fixed and protected. The reflector 103 is used to reflect light through the lens 104 from the interior of the lamp housing. In various aspects, the lens 104 may include a filter. Therefore, the lens 104 can function to filter various wavelengths from the emitted radiation. The lens 104 may, but does not necessarily, magnify, focus, or scatter the light. The far-UV radiation source 101 emits light in a radiation distribution pattern that... Figure 1 The diagram shows a lamp with a radiation angle of 106 and a radiation boundary of 107. The lamp housing 105 can be configured to protect the lamp or to recess the lamp while substantially avoiding obstruction of the transmission of any emitted light. Alternatively, the lamp can be flush with the housing.

[0120] Figure 1 An example of an airflow unit 110 is illustrated. The airflow unit 110 includes an airflow housing 111 that provides a path for airflow and a means for generating airflow via a fan system having one or more fans 115. The airflow housing 111 defines an airflow chamber 112, an air inlet 113, and an air outlet 114. The area between the air inlet 113 and the air outlet 114 defines the airflow chamber 112, which provides space for one or more fans 115, one or more mechanical filters 116, or one or more scrubbers 117 of the fan system. The fans 115, mechanical filters 116, or scrubbers 117 can be installed throughout the airflow chamber 112, including near the air inlet 113 or air outlet 114. Figure 1As illustrated in the specific example, fan 115 is positioned at air inlet 113 and air outlet 114 and is fixed to airflow housing 111, and mechanical filter 116 is arranged in series in the cavity of airflow chamber 112 before scrubber 117. Fan 115 is configured to provide airflow from air inlet 113 through airflow chamber 112 to air outlet 114. In various aspects, the positions of air inlet 113 and air outlet 114 can be reversed to provide airflow in opposite directions.

[0121] The airflow unit is integrated with the far-UV radiation source 101, such that the far-UV source 101 is mounted on the outer surface of the airflow unit 110 and thus outside the airflow chamber 112. Figure 1 As illustrated in the specific example, the far-UV radiation source 101 and the airflow unit 110 may share a surface. A power source 120 provides power to the components of the far-UV radiation source 101 and the airflow unit 110. The far-UV radiation source 101 is positioned adjacent to the air inlet 113 and oriented to emit radiation away from the components of the far-UV device 100. Figure 1 As illustrated in a particular example, the airflow unit 110 is configured to capture irradiated air from in front of the far UV light source and guide the irradiated air through the airflow housing 111 and out of the air exhaust port 114.

[0122] The far-UV device 100 may include an adjustable support 130, which is fixed to the integrated far-UV radiation source 101 and airflow unit 110. The adjustable support 130 may include a telescopic rod 132, an adjustment knob, a vise 133, and a rod retainer 134. The adjustable support 130 may be a retractable telescopic tripod. The airflow unit 110 and the far-UV radiation source 101 may be configured to share approximately the same dimensions, such as width, and the air inlet may be configured to share approximately the same dimensions as the reflector 103. In various aspects, the airflow unit 110, the far-UV radiation source, or both the airflow unit 110 and the far-UV radiation source may be cuboid.

[0123] Airflow unit 110 is configured to capture irradiated air in front of the far-UV light source and guide the irradiated air through airflow housing 111 and exit through air exhaust port 114. Alternatively, airflow unit 110 may be configured to exhaust air into the irradiated area in front of the far-UV light source. When mounted on a bracket, far-UV device 100 can conveniently provide airflow through an irradiated air space at, slightly above, or slightly below, human height. In other aspects, far-UV device 100 includes a bracket that provides airflow at approximately 2 feet, 3 feet, 4 feet, 5 feet, 6 feet, 7 feet, 8 feet, 9 feet, 10 feet, 11 feet, 12 feet, 13 feet, 14 feet, 15 feet, 16 feet, 17 feet, 18 feet, 19 feet, or 20 feet above the ground.

[0124] include Figure 2A and Figure 2B Figure 2 provides schematic diagrams of various examples of far-UV devices with radiation sources integrated with airflow devices. In each example, the far-UV device 100 has a far-UV radiation source 101 externally integrated with an airflow unit 110. The far-UV radiation source 101 includes a bulb 102, a reflector 103, and a lens 104, which are housed within a lamp housing 105. The airflow unit 110 includes an airflow housing 111 that provides a path for airflow and a means for generating airflow via a fan system having one or more fans 115. The airflow housing 111 defines an airflow chamber 112, an air inlet 113, and an air outlet 114, and one or more fans 115 provide airflow through the airflow chamber 112, the air inlet 113, and the air outlet 114. The airflow chamber 112 provides space for one or more fans 115, one or more mechanical filters 116, or one or more scrubbers 117 of the fan system. Fan 115, mechanical filter 116 or scrubber 117 may be installed throughout the airflow chamber 112, including near the air inlet 113 or air outlet 114.

[0125] As illustrated in Figure 2, the far-UV device 100 can have many different configurations regarding the positions of the air inlet 113, air outlet, far-UV radiation source 101, and airflow housing 111. For example, the far-UV radiation source 101 can be located above, below, or to the side of the airflow housing 111, where these orientations correspond to how the device 100 will be positioned on the surface, bracket, or mounting 131. As another example, the air inlet 113, air outlet 114, or far-UV device 100 can be located above, below, or to the side of the far-UV radiation source 101, or any combination thereof. In some respects, the air inlet 113 and the air outlet 114 are configured to allow air to flow from the front to the rear, from the rear to the front, from the front to the top, from the front to one or more sides, from the rear to the top, from the rear to one or more sides, from one or more sides to the front, from one or more sides to the rear, from one or more sides to the top, or any combination thereof. The far-UV device 100 may also be configured to allow air to flow in and out from the same side. For example, the far-UV device 100 may be configured to allow air to flow in through the air inlet 113 on the front of the far-UV device 100 and out through the air outlet 114, which is also located on the front. As another example, the far-UV device 100 may be configured to: draw in air through an air inlet 113 below the far-UV radiation source 101 and exhaust air above the far-UV radiation source 101; draw in air through an air inlet 113 above the far-UV radiation source 101 and exhaust air below the far-UV radiation source 101; draw in air through an air inlet on either side of the front of the far-UV device 100 and exhaust air above and / or below the far-UV radiation source 101; or draw in air through an air inlet 113 located above and / or below the far-UV radiation source 101 on the front of the device and exhaust air on either side of the front of the far-UV radiation source 101. In still some examples, the device may include a plurality of air inlets 113, a plurality of air outlets 114, or both a plurality of air inlets 113 and a plurality of air outlets 114. In some examples, the far-UV device 100 includes two or more air inlets 113 or two or more air outlets 114 located on either side of the far-UV radiation source. In other examples, the device includes two or more air inlets 113 or air exhaust outlets 114 located on either side of the far UV device 100.

[0126] Figure 3These are schematic diagrams of various other examples of an external far-UV device 100. The various illustrated examples utilize one or more far-UV radiation sources 101 externally integrated with one or more airflow housings 111, all integrated together into a single far-UV device 100. The various components can be integrated by becoming physically connected along one or more surfaces, by sharing a single power source, by mounting to a shared support, or by otherwise physically co-positioning and securing them together. For example, the far-UV device 100 may include two or more airflow housings 111 integrated with a single far-UV radiation source 101. The device may include one airflow housing 111 integrated with two or more far-UV radiation sources 101. Various sub-components of each far-UV radiation source 101 and airflow housing 111 may be the same or different. For example, the device may include a first airflow housing 111 and a second airflow housing 111. In another example, the first airflow housing may include a mechanical filter 116, while the second airflow housing may include a washer 117. Two or more airflow housings 111 can provide two or more airflows, allowing the airflows to be directed in the same direction, opposite directions, or otherwise to capture irradiated air or exhaust purified air to a target space. The first airflow housing 111 and the second airflow housing 111 can be integrated by becoming physically connected along one or more surfaces, by sharing a single power source, by mounting to a shared support, or by otherwise physically co-positioning and securing them together. As another example, the far-UV device 100 may include a first far-UV radiation source 101 and a second far-UV radiation source 101. As yet another example, the device may include a first far-UV radiation source 101 and a second radiation source other than far-UV radiation, such as visible light.

[0127] include Figure 4A and Figure 4BFigure 4 provides a schematic diagram of further examples of the far-UV device 100. The far-UV device 100 may include a far-UV radiation source 101 physically connected to an airflow unit 110. A lamp housing 105 and a mechanical filter airflow housing 111 may be attached together via an attachment point 125. The attachment point 125 may be a fastener, a hinge, or a reversible connection. At least a portion of the airflow unit 110 and the airflow housing 111 are configured to be positioned close to the radiation distribution pattern and near the radiation boundary 107 of the radiation distribution pattern of the far-UV radiation source. At least one of an air inlet 113 and / or an air outlet 114 may be configured to be positioned close to the radiation distribution pattern and near the radiation boundary 107 of the radiation distribution pattern of the far-UV radiation source. For example, at least a portion of the airflow unit 110, airflow housing 111, air inlet 113 and / or air outlet 114 may be configured to be located within 0.5 cm, 1 cm, 2 cm, 3 cm, 4 cm, 5 cm, 6 cm, 7 cm, 8 cm, 9 cm or 10 cm of the radiation boundary 107, or approximately 0.5 cm, 1 cm, 2 cm, 3 cm, 4 cm, 5 cm, 6 cm, 7 cm, 8 cm, 9 cm or 10 cm. As another example, at least a portion of the airflow unit 110, airflow housing 111, air inlet 113, and / or air outlet 114 may be configured to have a surface at an angle to the radiation boundary 107, the angle being less than 0°, 5°, 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, or 50°, or approximately 0°, 5°, 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, or 50°.

[0128] The far-UV device 100 may also be configured to have a first airflow unit 110 positioned along the radiation boundary 107, and to also accommodate one or more auxiliary components positioned further away, having one or more airflow units 110, an airflow chamber 112, and an air inlet 113. In various respects, a portion of the airflow unit 110 and / or the airflow housing 111 may be connected to a portion of the adjustable support 130 via a lower attachment point 127 and a connector 128. The far-UV device 100 may also be configured such that two or more airflow units 110 are positioned along different radiation boundaries 107 on opposite sides of the far-UV radiation source 101.

[0129] include Figure 5A and Figure 5BFigure 5 illustrates a far-UV device having an air inlet 113 on the same surface on which the far-UV radiation source 101 emits radiation. In other aspects, one or more air inlets 113 are replaced by air exhaust ports 114. In various aspects, the far-UV device 100 may have a far-UV radiation source 101 and an airflow unit 110 that substantially share at least one size. In still other aspects, the far-UV device 100 may have an air inlet 113 and / or an air exhaust port 114 that share at least one size with the bulb 102, reflector 103, or lens 104. In other aspects, the far-UV device 100 may have an air inlet 113 and / or an air exhaust port 114 that share at least one size with the combined width or height of the components of the bulb 102.

[0130] Figure 6 This is an example of a far-UV device 100 having multiple airflow chambers 112 physically attached to a far-UV radiation source 101 via attachment points 125. Attachment points 125 can control the angle at which the nearest air inlet 113 approaches the radiation boundary 107 of the emitted radiation. This configuration allows the airflow unit 110 to be close to the area of ​​irradiated air with the highest radiation intensity, while avoiding absorption or blocking of radiation to the rest of the treated space. An adjustable support 130 provides a means for raising and positioning the far-UV radiation source 101 and the airflow unit 110. For example, the adjustable support 130 can be positioned to provide irradiation and / or airflow at approximately head height. The adjustable support 130 also facilitates positioning the far-UV radiation source 101 above and out of reach of the occupant to prevent tampering or to provide a minimum distance between the occupant and the far-UV radiation source 101. The adjustable support 130 also provides a simple way to control the direction of radiation and the direction of airflow. In addition, the adjustable support 130 provides additional support for one or more airflow units 110 or a larger airflow unit 110. In some aspects, one or more far-UV radiation sources 101, airflow units 110, and adjustable support 130 are provided to the user as separate components in a modular manner according to instructions for combining them as described herein. Multiple airflow chambers 112 and air inlets 113 may be configured as a single airflow housing 111 defining multiple airflow chambers 112, or multiple airflow chambers 112 and air inlets 113 may be configured as multiple airflow housings 111 physically attached together, for example, by sharing one or more walls of the respective individual airflow housings 111.

[0131] include Figure 7A and Figure 7BFigure 7 provides an example of a far-UV device 100 that provides airflow around a far-UV radiation source 101. The far-UV device 100 can be configured to have a cylindrical shape via a cylindrical airflow housing 111. The far-UV device 100 can be configured to exhaust air around the far-UV radiation source 101, or it can be configured to allow air to enter around the far-UV radiation source 101. The far-UV radiation source 101 has a lamp housing 105 that houses at least one bulb 102, a reflector 103, and a lens 104. The bulb 102 emits far-UV radiation away from the far-UV device 100 via the lens 104. The far-UV radiation source 101 is surrounded by the airflow housing 111. The airflow housing 111 provides an airflow chamber 112, an air inlet 113, and an air outlet 114. One or more fans 115 provide airflow traveling through the air inlet 113, the airflow chamber 112, and the air outlet 114. The provided airflow is used to move the irradiated air.

[0132] As illustrated in Figure 7, a circumferential or partially circumferential air inlet 113 receives air into an airflow chamber 112. The airflow chamber 112 is equipped with one or more fans 115, which draw the captured air through one or more mechanical filters 116 and / or scrubbers 117. The airflow housing 111 may be configured to receive a cylindrical mechanical filter 116, a cylindrical scrubber 117, or both. The airflow housing 111 may also be configured to guide airflow from side to top, from top to side, from top through bottom, or from bottom through top. The base of the airflow housing 111 may be closed. A power supply 120 may be centrally located within the airflow housing 111, for example, centrally located within the airflow housing 111 along an axis below the far-UV radiation source 101 and above one or more fans 115. The power supply 120 powers at least the far-UV radiation source 101 and one or more fans 115. A support structure (not shown) can provide support for one or more fans 115, power supply 120, and far-UV radiation source 101. In some aspects, the far-UV radiation source 101 can be configured such that airflow provides cooling for the power supply 120 and the far-UV radiation source 101.

[0133] like Figure 8As illustrated, the far-UV radiation source 101 is directed away from the far-UV device 100 and the rest of its components. A circular air vent 114 discharges air from the airflow. In some aspects, the airflow provided by the air vent 114 can be configured to flow over the surfaces of the far-UV radiation source 101 and the lens 104, and through the irradiated air space. In some aspects, the airflow provided by the air vent 114 can be configured to provide clean, filtered air to the nearby irradiated air space. In some aspects, the airflow provided by the air vent 114 can be configured to discharge irradiated air away from the irradiated air space or to provide vortices to the side away from the far-UV radiation source 101. The integrated airflow housing 111 can be configured to have an adjustable support 130. When the far-UV device 100 is raised and mounted on the adjustable support 130, it can be used to move air at head level around and between occupants.

[0134] In terms of alternatives, Figure 8 The far-UV device 100 depicted can be configured such that the positions of the air inlet 113 and the air outlet 114 are switched. In this configuration, one or more fans 115 are configured to guide airflow in opposite directions. For example, the far-UV device 100 can be configured such that it captures irradiated air in front of the far-UV radiation source 101, and the airflow is exhausted through the side. In such a configuration, the far-UV device 100 filters the irradiated air.

[0135] Figure 8 This is another example of a far-UV device 100 that provides airflow around a far-UV radiation source 101. Figure 9 The far-UV device 100 has a cylindrical form with an open base and closed walls. This configuration can be mounted on the cylindrical sidewall of the airflow housing 111 via a mounting member 131, which can be adjustable to control the spacing. Furthermore, because the cylindrical base is open, the far-UV device 100 can be oriented to guide airflow as needed or as indicated by the processing space. For example, in various aspects, the far-UV device 100 can be raised and mounted on an adjustable support 130 and set at a spacing that provides airflow through irradiation and occupancy.

[0136] like Figure 8 As illustrated, the far-UV radiation source 101 is directed away from the far-UV device 100 and the rest of its components. A circular air exhaust vent 114 captures the irradiated air and provides airflow. Therefore, in some aspects, the airflow provided by the air inlet 113 can be configured to move and filter the irradiated air. The air exhaust vent 114 can be configured to direct the exhausted air in a manner that increases the movement of air through the room, particularly the air at head level around the occupant in the processing space.

[0137] In terms of alternatives, Figure 8 The far-UV device 100 depicted can be configured such that the positions of the air inlet 113 and the air outlet 114 can be switched. In this configuration, one or more fans 115 are configured to guide airflow in opposite directions. For example, the far-UV device 100 can be configured to provide filtered and / or scrubbed air to the space in front of the far-UV radiation source 101. In this configuration, the air subjected to the highest intensity radiation is filtered and / or scrubbed air.

[0138] Figure 9 Another integrated far-UV airflow device 100 may have a portable handle 140.

[0139] like Figure 9 As illustrated, the far-UV device 100 may include a plurality of far-UV radiation sources 101. The far-UV radiation sources 101 may be arranged circumferentially on the outer surface of the far-UV device 100 to provide a cylindrical shape. Each far-UV radiation source 101 has a lamp housing 105 that holds a plurality of bulbs 102, reflectors 103, and one or more lenses 104. The far-UV radiation sources 101 are positioned outside an airflow unit 110, which occupies the bottom and interior of the far-UV device 100. The airflow unit 110 includes an airflow housing 111 that defines an airflow chamber 112, an air inlet 113, and an air outlet 114. One or more fans 115 provide airflow traveling through the air inlet 113, the airflow chamber 112, and the air outlet 114. The provided airflow is used to move the irradiated air.

[0140] The airflow housing 111 can also be configured to guide airflow from the side to the top, or from the top to the side. The base of the airflow housing 111 can be closed. The power supply 120 can be centrally located within the airflow housing 111, for example, between multiple far-UV radiation sources 101 and above one or more fans 115. The power supply 120 supplies power to at least the far-UV radiation sources 101 and one or more fans 115. A support structure (not shown) can provide support for both the one or more fans 115 and the power supply 120. In some aspects, the far-UV radiation sources 101 can be configured such that the airflow provides cooling for the power supply 120 and the far-UV radiation sources 101.

[0141] The airflow housing 111 and air inlet 113 can be configured to capture irradiated air near the far-UV radiation source 101. The captured irradiated air can pass through one or more mechanical filters 116, one or more scrubbers 117, or both one or more mechanical filters 116 and one or more scrubbers 117.

[0142] The airflow housing 111 and the air exhaust port 114 can be configured to discharge the airflow upwards, toward the irradiated air, or both upwards and toward the irradiated air. For example, the airflow housing 111 can be configured to deflect the discharged purified air toward the irradiated air region near the far UV radiation source 101 and subjected to high-intensity irradiation.

[0143] The remote UV device 100 with a handle can be useful for both portability and positioning. The remote UV device 100 can be positioned in crowds, such as on tables, workbenches, audience seating areas, retail checkout counters, and other crowded spaces where the air around people is difficult to disturb. The air movement provided by the operation of the device can be used to disturb and move the air near, around, and between people, thus allowing greater exposure to the provided radiation and hindering short-range transmission.

[0144] In some respects, the handle reflects the emitted radiation on the portion of the handle surface facing the far-UV radiation source 101.

[0145] In terms of alternatives, Figure 9 The far-UV device 100 depicted can be configured such that the positions of the air inlet 113 and the air outlet 114 can be switched. In this configuration, one or more fans 115 are configured to guide airflow in opposite directions.

[0146] Figure 10 It is another integrated far-UV airflow device 100 that can have an external reflector 141.

[0147] External reflector 141 can redirect radiation emitted from far-UV radiation source 101 to widen the irradiated air space. External reflector 141 can be configured to reflect radiation away from far-UV device 100 and its components.

[0148] The external reflector 141 may include a far-UV reflective surface 142, one or more support members 144, and a cover 143. The bottom of the cover 143 may provide the far-UV reflective surface 142. The cover 143 may also be used outdoors to prevent rain or debris from contaminating the equipment. In some respects, the cover 143 may be used to protect occupants from direct radiation from the far-UV radiation source 101. The external reflector 141 may be made of a far-UV reflective material, such as TEFLON® or other PTFE materials.

[0149] like Figure 10As illustrated, the far-UV radiation source 101 can be oriented to emit radiation upwards, and the external reflector 141 can be positioned above the far-UV radiation source 101. This configuration can be useful when positioning the far-UV device 100 above the air intended to be irradiated, such as when the adjustable support 130 is raised and positioned above the room.

[0150] The external reflector 141 can also be used to shape the motion of air supplied by the airflow unit 110. For example, as Figure 10 As illustrated, the airflow unit 110 can emit filtered and / or scrubbed air through the air exhaust port 114. The filtered, exhaust air is redirected outward, so a larger amount of irradiated air near the far-UV radiation source 101 is filtered irradiated air. In this configuration, the cover 143 may also be useful when deployed in a space without a ceiling, such as outdoors, because the cover 143 can facilitate air movement through the processing space. The cover 143 can also be used to disperse the exhaust air, particularly in a 360-degree pattern.

[0151] External reflector 141 is configured to reflect at least a portion of the radiation emitted from far-UV radiation source 101, but in various aspects, external reflector 141 may be configured to allow a certain amount of radiation to be emitted upwards. Airflow unit 110 includes airflow housing 111 defining an airflow chamber 112, an air inlet 113, and an air outlet 114. One or more fans 115 provide airflow traveling through the air inlet 113, airflow chamber 112, and air outlet 114 and deflected by external reflector 141. The provided airflow is used to move irradiated air away from the area of ​​maximum radiation intensity and downwards for eventual recapture by the air inlet 113 powered by one or more fans 115 and power supply 120.

[0152] In terms of alternatives, Figure 10 The far-UV device 100 depicted can be configured such that the positions of the air inlet 113 and the air outlet 114 can be switched. In this configuration, one or more fans 115 are configured to direct airflow in opposite directions. In one example, the far-UV device 100 is configured such that irradiated air is drawn into the airflow unit 110 and emitted from the side. Thus, this configuration filters and / or scrubs the irradiated air.

[0153] Figure 11 Another example is an integrated far-UV airflow device 100, which includes two or more air inlets 113 and has a far-UV radiation source 101 positioned between the two or more air inlets 113.

[0154] like Figure 11 As illustrated, the far-UV device 100 may have a generally cylindrical shape, with a circumferential far-UV radiation source 101 surrounding an airflow unit 110 that provides air inlets 113 both above and below the far-UV radiation source 101. The airflow unit 110 has an airflow housing 111 that defines an airflow chamber 112, an air inlet 113, and an air outlet 114. One or more fans 115 provide airflow that captures irradiated air through the air inlets 113, conveys the captured irradiated air through the airflow chamber 112, and exits through the air outlet 114. The provided airflow is used to move the irradiated air. The air inlets 113 can capture irradiated air both above and below the far-UV radiation source 101. The base of the cylindrical airflow housing 111 may be closed to provide a surface for supporting the far-UV device 100. A single air outlet 114 can provide guided air circulation. For example, the air vent 114 can direct the exhausted air toward the ceiling of the room, where the exhausted air is deflected and promotes air circulation.

[0155] In terms of alternatives, Figure 12 The far-UV device 100 depicted can be configured such that the air inlet 113 and the air outlet 114 can be switched. In this configuration, one or more fans 115 are configured to direct airflow in opposite directions. For example, the far-UV device 100 can be configured to provide filtered and / or washed air to an irradiated space near the far-UV radiation source 101 that is subjected to high-intensity radiation.

[0156] Figure 12 A chart comparing the far-UV device 100 with other far-UV disinfection methods is provided.

[0157] While a standalone far-UV lamp can inactivate airborne pathogens, its effects on oxygen, small organic molecules, and airborne particulate matter may produce some harmful active substances. Furthermore, some airborne pathogens may avoid far-UV inactivation by remaining behind obstacles, people, or simply outside the radiation pattern of the far-UV lamp.

[0158] Standalone air filters, such as those in HVAC systems, can filter harmful substances from the air, but this is typically achieved by using low-permeability filters and high-powered fans to move air through such filters. Such systems, especially when constructed for filtration, may not provide sufficient airflow to facilitate far-UV-based inactivation of pathogens in the occupied space.

[0159] Duct-based solutions and UV sterilization chambers may be unsuitable for both inactivating airborne pathogens and removing hazardous active substances from the air within the occupant space. UV ducts and sterilization chambers rely on a relatively long residence time of pathogens within the far-UV treatment space of the duct or sterilization chamber. Longer residence times require slower airflow through such an internal treatment space, which in turn results in less air exchange and poorer air movement within the occupant space. This solution presents problems when seeking to address both airborne pathogens and hazardous active substances.

[0160] The far-UV devices described herein offer advantages arising from separating far-UV treatment from filtration and / or scrubbing processes. The integration of the far-UV radiation source and the airflow unit provides a proximity effect: the position and orientation of the airflow unit relative to the far-UV radiation source provides air movement within the irradiated space, particularly in areas near the far-UV radiation source that are subjected to higher intensity radiation. Following an inverse square law, harmful reactive substances form closer to the far-UV radiation source, and these substances are considered to be generated by non-pathogenic pollutants in the air, such as ozone and ozone derivatives. In the various aspects described herein, the far-UV device can reduce harmful reactive substances by: removing non-pathogenic polluted air from the highly irradiated space near the radiation source; providing filtered and / or scrubbed air to the highly irradiated space near the radiation source; or removing non-pathogenic polluted air from the highly irradiated space near the radiation source and providing filtered and / or scrubbed air to the highly irradiated space near the radiation source. The treatment space can be subjected to long periods of irradiation, and due to the extended treatment time, airborne pathogens remaining in the treatment space can be inactivated with lower levels of far-UV radiation. Simultaneously, internal filtration and / or scrubbing mechanisms can operate at high flow rates to rapidly target processing areas most prone to generating hazardous reactive substances. Airflow allows for multi-stage filtration and / or scrubbing of hazardous reactive substances and their precursors, while airborne pathogens in human-occupied spaces continue to be exposed to far-UV radiation. The higher airflow provided by the airflow unit also offers the further advantage of providing air circulation throughout the entire processing space, including the airspace immediately adjacent to the occupants.

[0161] Computational fluid dynamics simulation

[0162] Computational fluid dynamics (CFD) simulations of particle and gas motion were used to model the effects of various configurations of a germicidal UV device with a far-UV radiation source integrated with an airflow unit. A CFD model of the occupied space with doors was created, in which two occupants are located near a modeled example far-UV device or other far-UV source used for comparison examples. The model was generated using SOLIDWORKS computer-aided design software available from SolidWorks (Villezzi-Villacoulbre, France), a subsidiary of Dassault Systèmes. Meshing and CFD simulations were performed using Ansys CFX, available from Ansys (Cannonsburg, Pennsylvania, USA). The space was modeled with dimensions of 4.6 m × 4.6 m × 3.0 m—a fairly representative typical room, such as an office, meeting space, living space, kitchen, dining room, bedroom, children's space, study area, and workspace—where the far-UV device was positioned 609 mm from the wall in the x-direction and centered in the room in the y-direction. The example far-UV device modeled is constructed with a height of 1869 mm from the floor to the center of the filter and lamp. Boundary conditions for the model include non-slip velocity conditions for all internal surfaces and occupants. Occupants are each positioned 1080 mm from the lamp and spaced 1535 mm apart. The door is modeled as an opening with an average hydrostatic pressure of 0 Pa. The first occupant in the model is represented as a particle-generating source of infectious particles (infected individual model) with a constant output of 30 lpm, and the second occupant is represented as an uninfected susceptible individual with an inhalation rate of 30 lpm. A concentration of 2.0 particles / cm³ is used. 3 Unit-density particles with a diameter of 1.0 μm were used to simulate particle emission from a particle source of infectious particles. The model assumes isothermal conditions and therefore does not include the effects of thermal buoyancy and temperature. The model mesh primarily consists of tetrahedral elements with 159,147 nodes and 862,256 tetrahedral elements. The far-UV radiation source for each example is configured to provide 0.2 μW / cm². 2 To facilitate comparison between simulations, and 0.2 μW / cm 2 Appropriate flux rates for various germicidal UV applications. Figure 13 A flux rate contour map is provided illustrating the inverse square relationship between flux rate and distance from the distant UV radiation source, and exemplary regions with higher flux rates provided by example distant UV radiation sources are identified.

[0163] The example far-UV device modeled was designed to provide airflow through filters within the device. The filters were constructed with a diameter of approximately 500 mm. Several types of filters were tested as representative examples of the modeled high-efficiency (lower penetration) to low-efficiency (higher penetration) filters or filter combinations. These filters or filter combinations included a HEPA filter with 99.97% filtration efficiency, a MERV13 filter with 60% filtration efficiency, and a MERV11 filter with 36% filtration efficiency; all filters were configured to provide 375 m... 3 Use the same CADR per hr for comparison. Select 375 m. 3 The CADR value of / hr is a fairly representative value for CADR levels that can be sought in portable air handling units. For HEPA, MERV13, and MERV11 filters, the filtration efficiency and CADR value correspond to 375 m³ / hr, respectively. 3 / hr、625 m 3 / hr、1041m 3 / hr volumetric flow rate. Such a value can represent a single filter or a series of filters working together to achieve this performance. The example far-UV device is also modeled under two operating conditions: a "push" configuration, which provides airflow in an orientation such that the airflow flows from the unirradiated outer area of ​​the space near the wall boundary, through the device, and toward the irradiated inner area of ​​the space near the occupant; and a "pull" configuration, which provides airflow in an orientation such that the airflow flows from the irradiated inner area of ​​the space where the occupant is located, through the device, and toward the unirradiated outer area of ​​the space near the wall boundary. In each case, a door is modeled on the wall on the far side of the room away from the device, toward which the radiation is directed.

[0164] As a comparative example, a model is configured in which the far-UV radiator does not provide an airflow source in the room. As another comparative example, a model is configured where the far-UV radiator does not provide flow, and the space also includes a separate, discrete unit that provides airflow across the occupied space, away from the far-UV radiator, located in a corner away from both the door and the radiator source, 150 mm from each wall surface at the corner. This separate airflow generating unit is configured to provide 375 m³ / s airflow. 3 CADR of / hr and 375 m 3 The volumetric flow rate is / hr, and therefore corresponds to HEPA.

[0165] This model is used to model the trajectory of particles from infectious particulate sources. CADR and volumetric flow rate are derived from filtration efficiency as defined by industry standards. Particle trajectories are tracked to determine the room mean air velocity, mean travel distance time, mean travel time, the fraction of infectious particles surviving UV treatment before first passing through the filter, and the fraction of infectious particles surviving after the first UV treatment and filtration. See Table 1. Table 1

[0166] As shown in Table 1, the HEPA filter has a filtration efficiency of 99.97%, which is higher than that of MERV13, which has only 60% filtration efficiency, and significantly higher than that of MERV11, which has only 36% filtration efficiency. At a given CADR value, higher filtration efficiency corresponds to lower particle penetration and lower volumetric flow rate through the filter; lower filtration efficiency corresponds to higher particle penetration and higher volumetric flow rate through the filter. CFD simulations were used to determine the average room air velocity. Among the filters listed in Table 1, MERV11 represents the filter configuration that allows the maximum amount of particles and the highest volumetric flow rate to pass through the filter.

[0167] Computational fluid dynamics models are also used to model airflow to understand local variations in velocity. See Table 2. Table 2

[0168] Figure 14Air velocity contour maps are provided for a comparative example of modeling a space using only a far-UV radiation source without airflow or filters. Table 1 provides data based on particle motion as determined by computational fluid dynamics, and Table 2 provides data based on airflow velocity. In the presence of a UV source but without airflow or filters, the model calculates the minimum airflow in the room that results in slow but turbulent movement of particles throughout the space. While the modeling shows variations in airflow in the space, particularly around objects and due to airflow generated by breathing, the results, after normalization of the visualization scale, show a effectively static environment. The travel distance and travel time of emitted infectious particles are both high. This dynamic has several effects: particles emitted outside the irradiation pattern can remain outside the irradiation pattern for a relatively long time, particles within the irradiation area can remain within the irradiation area for a relatively long time, and the direction of particle movement is more unpredictable. Velocity measurements show a low average velocity in the room and a low average velocity in the highest irradiance region adjacent to the far-UV radiation source. A slightly higher, but still minimal, velocity was observed near the breathing area of ​​an uninfected second occupant.

[0169] Figure 15Air velocity contour plots are provided as an example of modeling an apparatus with an integrated far-UV radiation source and an airflow unit with HEPA filter performance, configured to provide airflow in the irradiated air region in a pull configuration that captures irradiated air. With the HEPA filter configured in a pull orientation, particle modeling shows some helical motion or stagnation of particles as they move through the irradiated air space and bend relatively slowly toward the apparatus's air inlet. In this arrangement, particles are heavily irradiated as they pass through the UV radiation distribution pattern; and particles mostly move toward the apparatus without entering the adjacent air space of a second uninfected modeled occupant positioned across the irradiated area toward the infected occupant. In this example model, the velocity and path of the infectious particles allow for extensive inactivation by far-UV radiation before their first encounter with the filter. Far-UV radiation is highly effective in this configuration, and the model calculates a survival fraction of 0.0001, equivalent to 9 log_e level disinfection. Furthermore, after a small number of surviving particles pass through the HEPA filter, the remaining survival fraction after a single pass was calculated to be further reduced to 3E-08, which is equivalent to 17 log_e level disinfection. Systems configured with airflow units exhibited less chaotic particle movement compared to systems lacking airflow units, reflecting a more predictable response configuration in various environments or where the location of the particle source (e.g., an infected occupant) is unknown beforehand. Velocity measurements show relatively low average velocities in the room, lower average velocities in the highest irradiance areas adjacent to far-UV radiation sources, and lower airflow in the breathing area of ​​uninfected secondary occupants.

[0170] Figure 16Air velocity contour plots are provided for a modeling example of an apparatus with an integrated far-UV radiation source and an airflow unit with MERV13 filter performance, configured to provide airflow in the irradiated air region in a pull configuration that captures irradiated air. With the MERV13 filter configured in a pull orientation, particle modeling shows less helical motion of particles compared to the HEPA example, as particles move more directly through the irradiated air space and toward the apparatus's air inlet, and are also less likely to enter the adjacent air space of a second uninfected modeled occupant. In this arrangement, particles are less severely irradiated as they pass through the UV radiation distribution pattern toward the apparatus more quickly and directly; however, the particles are still significantly inactivated. The model calculates a survival fraction of 0.01 for infectious particles before their first encounter with the filter, representing a 4.5 log_e level of disinfection. After subsequent passage through the MERV13 filter, the remaining survival fraction is calculated to further decrease to 0.004 after a single pass, representing a 5.5 log_e level of disinfection. Velocity measurements showed that the average velocity in the room was moderate, the velocity was moderate in the area of ​​highest irradiance adjacent to the far UV radiation source, and the air movement was low in the breathing area of ​​the uninfected second occupant.

[0171] Figure 17 Air velocity contour plots are provided as a modeling example for an apparatus with an integrated far-UV radiation source and an airflow unit with MERV11 filter performance, configured to provide airflow in the irradiated air region in a pull configuration that captures irradiated air. Compared to the MERV13 and HEPA examples, particle modeling with the MERV11 filter configured in a pull orientation shows particles moving through the irradiated air space along an even more direct path toward the apparatus's air inlet, and significantly avoiding the adjacent air space of a second occupant. In this arrangement, particles are least irradiated as they pass through the UV radiation distribution pattern most quickly and directly toward the apparatus; however, many particles remain inactivated. The model calculates a survival fraction of 0.22 for infectious particles before their first encounter with the filter, representing a 1.5 log_e level of disinfection. After subsequent passage through the MERV11 filter, the remaining survival fraction is calculated to further decrease to 0.1408 after a single pass, representing a 2 log_e level of disinfection. The particles exhibited higher velocities in the higher irradiance areas near the far UV device, and this effect extended further into the irradiated space compared to the MERV13 and HEPA test examples. Velocity measurements showed relatively high average velocities in the room, relatively high average velocities in the highest irradiance areas adjacent to the far UV radiation source, and relatively high average velocities in the breathing area of ​​the uninfected secondary occupant.

[0172] Figure 18Air velocity contour plots are provided as a modeling example for an apparatus with an integrated far-UV radiation source and an airflow unit with HEPA filter performance. This apparatus is configured in a push configuration to provide airflow in the irradiated air zone by exhausting purified air into the irradiated area. In this configuration, particle modeling shows that infectious particles are slowly pushed away from the area of ​​highest irradiance, as if propelled away by purified air, before returning to the air intake in the corner space through room circulation by tracing along the walls, ceiling, and floor, eventually reaching the boundary of the space, primarily the wall on the side opposite the far-UV radiation source. A higher level of chaotic motion is observed in this example. Velocity measurements show that particles exhibit higher velocities in the higher irradiance zone near the far-UV device. The higher velocity zone extends further into the irradiated space compared to the pull configuration. Velocity measurements show that the push configuration has a higher average room velocity compared to the pull configuration HEPA performance values ​​in the model space, a higher average velocity in the highest irradiance zone adjacent to the far-UV radiation source, and a higher average velocity in the breathing zone of the uninfected secondary occupant.

[0173] Figure 19 Air velocity contour plots are provided for an example of a device modeled with an integrated far-UV radiation source and an airflow unit with MERV13 filter performance. This device is configured to provide airflow in the irradiated air region in a push configuration that exhausts purified air into the irradiated area. In this configuration, particle modeling shows that infectious particles are pushed further away from the higher-intensity irradiation region before returning through room circulation, as if pushed away by the purified air, eventually reaching the boundary of the space, primarily the wall on the side of the space opposite the far-UV radiation source. Compared to the HEPA example, the particle path is more direct through the room space to the air inlet with less stagnation, and more particle paths return through the higher-intensity far-UV irradiation region on their way to the air inlet. This example configuration also shows a chaotic particle motion path as particles circulate around the room to the air inlet, but this is relatively weaker compared to the example with HEPA performance. Velocity measurements show that particles exhibit higher velocities in the higher irradiance region near the far-UV device. Compared to the HEPA-push type example, the higher-velocity region extends further into the irradiated space, and the local velocities are even higher. The velocity measurements show that, relative to the HEPA-driven configuration example in the model space, the MERV13-driven configuration example has a higher average velocity in the room, a higher average velocity in the highest irradiance region adjacent to the far UV radiation source, and a higher average velocity in the respiratory region of the uninfected second occupant.

[0174] Figure 20Air velocity contour plots are provided as a modeling example of an apparatus with an integrated far-UV radiation source and an airflow unit with MERV11 filter performance, configured to provide airflow in the irradiated air region in a push configuration that exhausts purified air to the irradiated area. In this configuration, particle modeling shows that infectious particles are pushed away from the area of ​​highest intensity irradiation, as if propelled away by the purified air, before they typically loop back to the apparatus's air inlet quickly and more directly by tracing along walls or other surfaces. Particle movement largely avoids secondary uninfected occupants. Compared to HEPA and MERV13 examples, the particle path is more predictable and uniform, and the movement of emitted infectious particles shows an effective path to the apparatus's air inlet, although particle emission is directed into the exhaust airflow. Therefore, this "push" configuration can exhibit an airflow that advantageously removes particles from the far-UV irradiated area and moves them to the apparatus's air inlet. This airflow can also have secondary advantages regarding avoiding short-range transport and facilitating multi-pass purification of contaminants. This example configuration also demonstrates less chaotic particle motion compared to the push-type example with HEPA and MERV13 performance. This can reflect a configuration that responds more predictably in various environments or in environments where the location of the particle source (e.g., an infected occupant) is unknown beforehand. Velocity measurements show that particles exhibit higher velocities in higher irradiance regions near the far UV device. The higher velocity region extends further into the irradiated space compared to the HEPA push-type example, and the local velocities are even higher. Velocity measurements show that the MERV13 push-type example has higher room-average velocities, higher average velocities in the highest irradiance regions adjacent to the far UV radiation source, and higher average velocities in the respiratory region of the uninfected second occupant compared to the MERV11 and HEPA push-type examples in model space.

[0175] Figure 21 Air velocity contour maps are provided for modeling a comparative example where the far-UV radiation source is separated from a discrete airflow source with HEPA filter performance. The separate airflow source is positioned on the floor near a corner rather than at head height, close to the location of the airflow to be generated by the portable air purifier. In this configuration, particles move from the particle emitter toward the airflow source positioned away from the far-UV radiation source. Particle movement is relatively slow, and the particle path is concentrated in a large loop along the adjacent surface of the airflow source, thus largely omitting high-flux areas. In this arrangement, the velocity contour maps also show particles moving faster near the periphery of the space. The velocity measurements do not indicate higher velocities in areas of higher irradiance near the far-UV device or occupant.

[0176] Figure 22Concentration contour maps are provided, illustrating the concentration of VOCs in a human-use space treated by a device with a far-UV radiation source and an airflow unit with a scrubber, which provides airflow in the irradiated air region in a push configuration that discharges purified air into the irradiated area. A model is configured such that the example far-UV device is constructed with an airflow with a scrubber that removes VOCs and ozone with a 99% capture rate. To simulate an indoor cleaning event, floor and wall surfaces are modeled with a limonene concentration of 10,000 ppm to simulate a space that has been cleaned. The model is run until the residue reaches less than 1E-4 and then terminated. In this example, limonene is used as a representative VOC or non-pathogenic pollutant. The contour maps show the distribution of VOCs throughout the space, with areas of lower limonene concentration located in the highest flux region in front of the far-UV radiation source. In this case, it can be seen that the purified air displaces limonene from the high flux irradiated area and circulates it through the room, eventually reaching the device's air inlet for purification. Regions of lower VOC concentrations are evident in the higher flux regions of far-UV radiation, but also extend to some extent to the relative walls. Here, the airflow provides purified air that pushes VOCs and other pollutants away from the high flux regions in front of the far-UV radiation source, ultimately promoting particle movement through the space for final capture and purification. This behavior is beneficial because it can lead to a reduction in the formation of secondary products. The amount of time pollutants remain in the high flux regions corresponds to the amount of secondary product formation. Pollutants can include “non-pathogenic pollutants,” such as ozone, oxygen-containing particles, oxygen-containing small organic molecules, oxygen-containing large organic molecules and materials, oxygen-containing dust particles, non-pathogenic degradation products of pathogens, aggregates containing the above, or combinations thereof. For example, VOCs and ozone remaining in the high flux regions can produce aggregates of oxygen-containing small organic molecules and oxygen-containing particles. Reducing the amount of time such pollutants occupy the high flux regions can significantly reduce the formation of secondary pollutants. When modeled similarly, results similar to the limonene concentration map can be observed in the case of other VOCs, ozone, and other pollutants.

[0177] Figure 23Concentration contour maps are provided, illustrating the concentration of VOCs in a human-use space treated using a device with a far-UV radiation source and an airflow unit, which provides airflow in a pull configuration to capture irradiated air in the irradiated air region. The same conditions are used in this example as in the push-type example for assessing VOC concentration. The contour maps show the distribution of VOCs throughout the space, with the area of ​​lowest limonene concentration located at the device's air exhaust port. A high-flux region in front of the far-UV radiation source shows moderate concentrations of VOCs. Here, the airflow pulls VOCs and other pollutants toward the high-flux region in front of the far-UV radiation source, capturing pollutants and allowing them to pass through the device, and then exhausting them as purified air circulates around the room. In this configuration, the higher relative concentration of VOCs in the higher irradiance region can benefit from the faster velocity of particles in the same region. Reducing the time VOCs spend in the irradiated region can lead to a reduction in the formation of harmful secondary products. Furthermore, the pull configuration can capture generated secondary pollutants, which can form locally in the high-flux region, and capturing such pollutants is advantageous.

[0178] In both pull and push configurations, the resulting secondary products can remain low, or even below, detectable or quantifiable limits, due to disruption of their formation followed by capture, or both disruption of their formation followed by capture.

[0179] Figure 24An air velocity contour map with superimposed flux rate contour maps is provided, illustrating how a far-UV radiation source can be integrated with an airflow unit to localize airflow in areas of high radiation intensity. Region 1010 illustrates a high flux rate region in front of a modeled far-UV device 1020. Region 1010 shows that the flux rate closest to the far-UV device 1020 increases in an inverse square relationship. Device 1020 generates an airflow with a high-velocity region aligned with the higher flux rate in region 1010. In the illustrated example, the airflow is provided in a pull configuration. Device 1020 captures contaminants, including pathogenic contaminants, pollutants, non-pathogenic contaminants, and / or non-polluting contaminants as precursors to undesirable contaminants. Contaminants in the airflow are removed via a scrubber, a filter, or both, and purified air 1030 is discharged from the device. In the illustrated configuration, purified air 1030 is discharged as rapidly moving clean air toward the outer boundary of the space, which facilitates the return of purified air 1030 1030 1040 to the interior portion of the space where one or more occupants 1050 may be located. Occupants may be direct or indirect sources of contaminants, but they may also be susceptible to contaminants. Higher UV flux areas are highly sterilizable; however, under higher UV flux conditions, the same areas are prone to higher ozone production, higher ozone concentrations, higher secondary contaminant production, and higher secondary contaminant concentrations. Oxygen in the air can produce ozone under UV light, and ozone with VOCs can generate secondary oxygen-containing aerosols—representing a source of secondary contaminants that may be problematic for far-UV applications. The illustrated configuration advantageously provides a solution by providing localized airflows with higher velocities in one or more high-flux areas to disrupt contaminant production, capture contaminants for purification, or both disrupt contaminant production and capture contaminants for purification. The discharged purified air 1030 provides clean air and airflow for continuous dilution, removal, and purification of the air in the space. It is also beneficial to provide alternative airflow configurations aligned with the high-flux region. For example, the airflow can be configured in a push configuration, in which purified air 1030 can be alternatively pushed into the higher-flux region 1010, thereby diluting ozone and VOCs and disrupting the formation of secondary organic aerosols.

[0180] Fluid dynamics mixing and localized flow events can be highly complex, and their interaction with germicidal UV treatments is not yet fully understood. Certain system configurations may exhibit unpredictable fluid dynamic behavior, where particle paths can vary significantly depending on system state, as described in examples using far-UV radiation sources without airflow units or in examples utilizing separate airflow units located at corners. When such systems are intended for human use environments, the wide variety of possible human environments can lead to undesirable results or performance. For example, a given human-use space may have undesirable particle sources due to cooking, cleaning, manufacturing, agricultural activities, painting, construction, combustion, smoking, odor-generating activities, or food activities, and such spaces may lack control over the location or timing of particle generation. Positioning a given device in a location where particles are generated is not always possible—the case of unwittingly infected occupants is a prime example. Using far-UV radiation devices that provide strong airflow can provide both localized and / or generalized airflows, each of which, in various examples, can have the advantage of improving general performance or minimizing undesirable effects that may occur in various system states, such as byproduct formation. To date, the dynamics of mixing, localized flow effects, and their various variables are not fully understood in terms of how they affect the desired performance of far-UV systems, and the field has not yet determined which localized mixing parameters are influential, effective, or desirable for designing or constructing devices that inactivate pathogens without generating harmful secondary products. Filtration efficiency is one example: HEPA filters can achieve particle removal efficiencies greater than 99.97% for airborne particles with a diameter of 0.3 micrometers or larger, and this is widely considered a desirable aspect of air purification. However, the reduced airflow resulting from using HEPA-type filters can lead to a greater impact on certain localized effects—HEPA filters ideally positioned near local sources of unwanted particles may be very effective at eliminating such particles, but may be significantly less effective at other locations. In cases of unwanted byproduct formation, unwanted particles may be generated by localized UV radiation intensity regions within the radiation distribution pattern of the far-UV radiation source. Surprisingly, even within the irradiated space, the use of HEPA filters alone cannot adequately address the problem of byproduct formation due to low air velocities and particle retention. The desired solution can be achieved by properly orienting the airflow unit to be close to the far UV source but outside the UV radiation distribution pattern, so as to provide a strong local airflow through the adjacent region with the highest UV intensity.Inconspicuously, particularly in cases where the size, power, or number of fans may be limited, electricity may be restricted, or fan noise may affect the occupant's use and enjoyment of the processing space in portable or other units, airflow units can also benefit from the use of filtration systems with lower filtration efficiency (i.e., higher penetration). As another example, airborne pathogens, non-pathogenic airborne contaminants, non-polluting contaminants that are precursors to undesirable contaminants, and secondary contaminant byproducts do not always mix well in the processing space, and each of these can generate and be distributed throughout the human-use space in a localized, poorly mixed manner.

[0181] Irradiation provided by a far-UV radiation source can be described according to a given radiation distribution pattern, in which the strongest light is closest to the device based on an inverse square law. Intensity decreases with distance from the source. Undesirable airborne byproducts can be generated due to the effects of UV light on various precursors, including oxygen, ozone, VOCs, and particulate matter, such as ozone, oxygen-containing particles, oxygen-containing small organic molecules, oxygen-containing large organic molecules and materials, oxygen-containing dust particles, non-pathogenic degradation products of pathogens, aggregated particles containing the above, or combinations thereof. However, the effect of UV light is also what gives UV light its bactericidal disinfection effect. Various currently described devices, systems, and methods provide solutions to the problem of undesirable airborne byproducts by configuring themselves to provide increased particle and gas velocities in the vicinity of high UV radiation, thereby reducing the irradiation time during the first pass before facilitating the transfer of contaminants to a filter or scrubber system for elimination or subsequent recirculation for additional UV radiation. The generation of harmful byproducts based on UV radiation poses potential safety concerns for far-UV technologies. The various far-UV devices, systems, and methods described in this article provide solutions by utilizing localized airflow in regions of high UV radiation intensity.

[0182] The above description is intended to be illustrative and not restrictive. For example, each of the foregoing aspects and features should be understood as being optionally used in any combination with other aspects and features. For example, other embodiments may be used by those skilled in the art after consulting the above description. Furthermore, it should be understood that the wording or terminology used herein without further definition is for descriptive purposes only and not for limitation. The use of any section headings is intended to aid reading the document and is not to be construed as restrictive; information relating to a section heading may appear within or outside that particular section. An abstract is provided to comply with 37 CFR § 1.72(b) to allow the reader to quickly determine the nature of the technical disclosure. The abstract is submitted based on the understanding that it will not be used to interpret or limit the scope or meaning of the claims. Moreover, in the above detailed description, various features may be combined to simplify this disclosure. This should not be construed as implying that any unclaimed disclosed feature is necessary for any claim. Rather, the subject matter of the invention may lie in fewer than all features of a particular disclosed embodiment. Therefore, the appended claims are incorporated herein as examples or embodiments in the detailed description, wherein each claim exists independently as a separate embodiment, and such embodiments are contemplated to be combined with each other in various combinations or arrangements. The scope of this invention should be determined by reference to the appended claims and the full scope of their equivalents.

[0183] Exemplary aspects

[0184] The following aspects are provided as examples of various public topics:

[0185] Aspect 1 provides a device for inactivating airborne pathogens, the device comprising:

[0186] An airflow unit, the airflow unit including an airflow housing defining an airflow chamber, an air inlet and an air outlet;

[0187] A filtration system comprising a mechanical filter, a scrubber, or both a mechanical filter and a scrubber disposed in an airflow chamber;

[0188] A fan system configured to provide airflow through an air inlet, an airflow chamber, and an air exhaust outlet; and

[0189] A far-UV radiation source that emits radiation of one or more wavelengths including about 210 nm to about 230 nm, wherein the far-UV radiation source is integrated with an airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned to direct radiation away from the airflow unit, airflow housing, filter—if present, scrubber—if present, or a combination thereof.

[0190] Aspect 2 provides the device according to aspect 1, wherein the airflow housing and filtration system are substantially unaffected by direct radiation from a far-UV radiation source.

[0191] Aspect 3 provides an apparatus according to aspect 1 or 2, wherein the airflow housing is configured to displace irradiated air near a far UV radiation source.

[0192] Aspect 4 provides an apparatus according to any one of aspects 1 to 3, wherein an air inlet is adjacent to a far-UV radiation source, and an airflow housing is configured to capture irradiated air near the far-UV radiation source.

[0193] Aspect 5 provides an apparatus according to any one of aspects 1 to 4, wherein air exhaust is directed away from a far-UV radiation source and optionally directed to a ceiling, wall, floor or deflector to circulate air within the available space.

[0194] Aspect 6 provides an apparatus according to any one of aspects 1 to 5, wherein an air inlet is adjacent to a far-UV radiation source, and an airflow housing is configured to exhaust airflow away from irradiated air near the far-UV radiation source.

[0195] Aspect 7 provides an apparatus according to any one of aspects 1 to 6, wherein an air exhaust port is adjacent to a far-UV radiation source, and an airflow housing is configured to exhaust airflow into a space irradiated by the far-UV radiation source.

[0196] Aspect 8 provides an apparatus according to any one of aspects 1 to 7, wherein the airflow housing is configured to displace the irradiated air in a direction substantially parallel to the direction of the emitted radiation.

[0197] Aspect 9 provides an apparatus according to any one of aspects 1 to 8, wherein the airflow housing is configured to capture irradiated air and displace the irradiated air in a direction substantially opposite to the direction of the emitted radiation.

[0198] Aspect 10 provides an apparatus according to any one of aspects 1 to 9, wherein the airflow housing is configured to displace the irradiated air in a direction substantially perpendicular to the direction of the emitted radiation.

[0199] Aspect 11 provides an apparatus according to any one of aspects 1 to 10, wherein the airflow housing includes a mechanical filter.

[0200] Aspect 12 provides an apparatus according to any one of aspects 1 to 11, wherein one or more mechanical filters have a penetration rate of 5% or greater at 0.3 micrometers.

[0201] Aspect 13 provides an apparatus according to any one of aspects 1 to 12, wherein one or more mechanical filters have a mechanical filter having a penetration rate of 40% or greater at 0.3 micrometers.

[0202] Aspect 14 provides an apparatus according to any one of aspects 1 to 13, wherein the mechanical filter is not a HEPA filter, does not conform to the HEPA standard, does not have a filtration efficiency greater than 99%, or any combination thereof.

[0203] Aspect 15 provides an apparatus according to any one of aspects 1 to 14, wherein the mechanical filter is not a MERV16 or higher filter according to MERV standard 52.2.

[0204] Aspect 16 provides an apparatus according to any one of aspects 1 to 15, wherein the mechanical filter is not suitable as a single-pass filter for use in achieving ISO 20E or better using ISO 29463-1 2017.

[0205] Aspect 17 provides an apparatus according to any one of aspects 1 to 16, wherein the mechanical filter has a single-pass efficiency of less than 80%.

[0206] Aspect 18 provides an apparatus according to any one of aspects 1 to 17, wherein the mechanical filter has a flow rate of at least 50 CFM through the filter at a pressure drop of 0.25 or less.

[0207] Aspect 19 provides a device according to any one of aspects 1 to 18, wherein the mechanical filter is not borosilicate microfibers.

[0208] Aspect 20 provides an apparatus according to any one of aspects 1 to 19, wherein the mechanical filter has a 20m... 2 up to 80 m 2 A pleated filter with a large surface area.

[0209] Aspect 21 provides an apparatus according to any one of aspects 1 to 20, wherein the mechanical filter has a single-pass efficiency of ISO 15E or lower and a fan drop profile of up to 0.1 at 100 CFM to up to 0.5 at 500 CFM.

[0210] Aspect 22 provides an apparatus according to any one of aspects 1 to 21, wherein the filtration system comprises two MERV13 filters.

[0211] Aspect 23 provides an apparatus according to any one of aspects 1 to 22, wherein the airflow chamber includes a scrubber.

[0212] Aspect 24 provides an apparatus according to any one of aspects 1 to 23, wherein the washer is an active washer.

[0213] Aspect 25 provides an apparatus according to any one of aspects 1 to 24, wherein the washer is an active washer powered by a power source shared with a far-UV radiation source and a fan system.

[0214] Aspect 26 provides an apparatus according to any one of aspects 1 to 25, wherein the washer is a passive washer.

[0215] Aspect 27 provides an apparatus according to any one of aspects 1 to 26, wherein the scrubber is zeolite.

[0216] Aspect 28 provides an apparatus according to any one of aspects 1 to 27, wherein the scrubber is activated carbon.

[0217] Aspect 29 provides an apparatus according to any one of aspects 1 to 28, wherein the fan system is one or more axial flow fans.

[0218] Aspect 30 provides an apparatus according to any one of aspects 1 to 29, wherein the fan system comprises one or more fans, each having a diameter of 500 mm or less.

[0219] Aspect 31 provides an apparatus according to any one of aspects 1 to 30, wherein the fan system is one or more fans, each of the one or more fans being about 6W or less, and the fan system together being 200W or less.

[0220] Aspect 32 provides an apparatus according to any one of aspects 1 to 31, wherein the fan system is one or more axial flow fans, each of the one or more axial flow fans providing a static pressure of about 0.5 inches of water column or less, and the fan system together providing a static pressure of about 0.5 inches of water column or less.

[0221] Aspect 33 provides an apparatus according to any one of aspects 1 to 32, wherein the fan system provides a static pressure to the filter of about 0.1 inches of water column or less at at least 100 CFM and up to about 0.5 inches of water column or less at at least 500 CFM.

[0222] Aspect 34 provides an apparatus according to any one of aspects 1 to 33, wherein the fan system is two to six tube axial fans having a diameter of 150 mm or less.

[0223] Aspect 35 provides an apparatus according to any one of aspects 1 to 34, wherein the far-UV radiation source is a barrier discharge lamp.

[0224] Aspect 36 provides an apparatus according to any one of aspects 1 to 35, wherein the far-UV radiation source is a KrCl excimer lamp.

[0225] Aspect 37 provides an apparatus according to any one of aspects 1 to 36, wherein the far-UV radiation source includes a bulb having an annular body having an outer surface and defining an internal discharge cavity, wherein the annular body has a primary axial dimension and a secondary radial dimension, and includes an electrode in the internal discharge cavity that traverses along the primary axial dimension of the annular body.

[0226] Aspect 38 provides an apparatus according to any one of aspects 1 to 37, wherein the far-UV radiation source includes a lamp housing, a bulb, a reflector, and a window.

[0227] Aspect 39 provides an apparatus according to any one of aspects 1 to 38, wherein the far-UV radiation source includes a filter.

[0228] Aspect 40 provides an apparatus according to any one of aspects 1 to 39, wherein the far-UV radiation source includes a filter that substantially prevents transmission of one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0229] Aspect 41 provides an apparatus according to any one of aspects 1 to 40, wherein the far-UV radiation source includes a filter that transmits substantially one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0230] Aspect 42 provides an apparatus according to any one of aspects 1 to 41, wherein the far-UV radiation source is integrated with the airflow housing via fasteners, adhesives, interlocking components, welding, or molding to the outer surface of the airflow housing.

[0231] Aspect 43 provides an apparatus according to any one of aspects 1 to 42, wherein the far-UV radiation source is integrated with the airflow housing by means of an air inlet or air outlet disposed on the airflow housing.

[0232] Aspect 44 provides an apparatus according to any one of aspects 1 to 43, wherein the far-UV radiation source is integrated with the airflow housing via a shared bracket or mounting.

[0233] Aspect 45 provides a device according to any one of aspects 1 to 44, the device being configured as a portable system.

[0234] Aspect 46 provides an apparatus according to any one of aspects 1 to 45, the apparatus further comprising a floor stand, a desktop stand, a wall mount, or a ceiling mount.

[0235] Aspect 47 provides an apparatus according to any one of aspects 1 to 46, the apparatus further comprising a telescopic support or a retractable support.

[0236] Aspect 48 provides the device described in any one of aspects 1 to 47, wherein the device is 60 pounds or less.

[0237] Aspect 49 provides a device according to any one of aspects 1 to 48, the device having a volume of 20 square feet or less.

[0238] Aspect 50 provides a device according to any one of aspects 1 to 49, the device having a height, width, and length of 40 inches or less—if present.

[0239] Aspect 51 provides a device according to any one of aspects 1 to 50, the device having a base of 4 square feet or less.

[0240] Aspect 52 provides an apparatus according to any one of aspects 1 to 51, the apparatus having a base that is less than 1% to 5% of the space in which it is configured for processing.

[0241] Aspect 53 provides the device according to any one of aspects 1 to 52, which includes a device capable of being configured into a support at a height of at least 4 feet.

[0242] Aspect 54 provides a device according to any one of aspects 1 to 53, which provides a device including one or more handles.

[0243] Aspect 55 provides an apparatus according to any one of aspects 1 to 54, the apparatus being configured for use as a permanent fixing device.

[0244] Aspect 56 provides an apparatus according to any one of aspects 1 to 55, the apparatus being configured for attaching an airflow housing to a return or supply device of an HVAC system.

[0245] Aspect 57 provides an apparatus according to any one of aspects 1 to 56, wherein the far-UV radiation source is integrated with the airflow housing via a shared power source.

[0246] Aspect 58 provides a device according to any one of aspects 1 to 57, wherein the far-UV radiation source is located within 24 inches of an air inlet or air outlet.

[0247] Aspect 59 provides an apparatus according to any one of aspects 1 to 58, wherein an air inlet and an air outlet provide one or more rotating vortices in the room in which the apparatus is located.

[0248] Aspect 60 provides an apparatus according to any one of aspects 1 to 59, wherein the dimensions of the airflow housing, air inlet, or air outlet are approximately equal to the dimensions of the far-UV radiation source or the bulb of the far-UV radiation source.

[0249] Aspect 61 provides an apparatus according to any one of aspects 1 to 60, wherein the airflow housing is positioned close to the edge of the radiation distribution pattern of the far-UV radiation source.

[0250] Aspect 62 provides an apparatus according to any one of aspects 1 to 61, wherein the airflow housing, fan system, filter, and scrubber—if present—provide at least 100 ft at the air inlet and air outlet. 3 Airflow rate of / min.

[0251] Aspect 63 provides an apparatus according to any one of aspects 1 to 62, the apparatus further comprising an external reflector or diffuser.

[0252] Aspect 64 provides a device according to any one of aspects 1 to 63, the device further comprising a handle, a cover or a hinged cover.

[0253] Aspect 65 provides an apparatus according to any one of aspects 1 to 64, the apparatus further comprising a sensor that collects spectrophotometric data, irradiance data or spectral data, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data, or any combination thereof from one or more far-UV radiation sources.

[0254] Aspect 66 provides an apparatus according to any one of aspects 1 to 65, the apparatus further comprising a control system for receiving sensor data and adjusting performance parameters of the apparatus.

[0255] Aspect 67 provides an apparatus according to any one of aspects 1 to 66, the apparatus further comprising a control system that receives sensor data and adjusts one or more performance parameters of one or more of an airflow unit, a filtration system, a mechanical filter, a scrubber, a fan, and a far-UV radiation source.

[0256] Aspect 68 provides an apparatus according to any one of aspects 1 to 67, the apparatus further comprising a reporting system that collects sensor data and notifies the user of recommended maintenance or changes to performance parameters.

[0257] Aspect 69 provides an apparatus according to any one of aspects 1 to 68, wherein a far-UV radiation source is integrated with an airflow housing to provide a cuboid or cylindrical shape.

[0258] Aspect 70 provides an apparatus according to any one of aspects 1 to 69, wherein an air inlet or air outlet adjacent to the far-UV radiation source has a shape that shares at least one dimension with the far-UV radiation source or the dimensions of its reflector, bulb, or lens.

[0259] Aspect 71 provides an apparatus according to any one of aspects 1 to 70, wherein the air inlet or air outlet adjacent to the far-UV radiation source is substantially rectangular, the rectangle having an edge substantially parallel to the edge of the far-UV radiation source or the edge of the far-UV radiation source's reflector, bulb, or lens.

[0260] Aspect 72 provides an apparatus according to any one of aspects 1 to 71, wherein an air inlet or air outlet adjacent to the far-UV radiation source is annular and surrounds the far-UV radiation source.

[0261] Aspect 73 provides an apparatus according to any one of aspects 1 to 72, wherein the airflow housing is configured to provide diffused exhaust.

[0262] Aspect 74 provides an apparatus according to any one of aspects 1 to 73, wherein the air exhaust port is not adapted to provide an airflow wall.

[0263] Aspect 75 provides an apparatus according to any one of aspects 1 to 74, wherein an air exhaust port promotes the scattering of droplets, aerosols and particles in the air.

[0264] Aspect 76 provides an apparatus according to any one of aspects 1 to 75, wherein the far-UV radiation source does not include a light guide.

[0265] Aspect 77 provides an apparatus according to any one of aspects 1 to 76, wherein the airflow unit is configured for at least 500 m 3 With a volumetric airflow of / hr, the ratio of total fan power to total optical power is approximately 500 to 1000.

[0266] Aspect 78 provides a device according to any one of aspects 1 to 77, wherein, with a total fan power of 100W or less and a total device power of 150W or less, the ratio of total optical power to volumetric airflow is approximately 0.05 mW / (m³). 3 / hr) to approximately 1.00 mW / (m 3 / hr).

[0267] Aspect 79 provides an apparatus according to any one of aspects 1 to 78, wherein the airflow unit is configured for at least 850 m 3With a volumetric airflow rate of / hr and a total fan power of 100W or less, the ratio of total optical power to total filter surface area is approximately 0.5 mW / m. 2 Approximately 10 mW / m 2 .

[0268] Aspect 80 provides an apparatus according to any one of aspects 1 to 79, the apparatus providing at least 300 m 3 Clean air delivery rate (CADR) per hour.

[0269] Aspect 81 provides an apparatus according to any one of aspects 1 to 80, the apparatus providing 350 m 3 / h volumetric air flow rate.

[0270] Aspect 82 provides an apparatus according to any one of aspects 1 to 81, which provides an air velocity of at least 0.6 m / sec at a distance of 0.25 m from the air exhaust port.

[0271] Aspect 83 provides a portable kit for inactivating airborne pathogens, the portable kit including the device described in any one of aspects 1 to 82.

[0272] Aspect 84 provides a system for inactivating airborne pathogens, the system comprising:

[0273] A far-UV radiation source, configured to irradiate the air in a human-use space, wherein the far-UV radiation source emits radiation of one or more wavelengths including about 210 nm to about 230 nm.

[0274] An airflow unit, the airflow unit including an airflow housing defining an airflow chamber, an air inlet and an air outlet;

[0275] A fan system configured to displace irradiated air near a radiation source and provide airflow through an air inlet, an airflow chamber, and an air outlet; optionally, a filter disposed in the airflow chamber and configured to remove non-pathogenic particles from the air; and

[0276] Optionally, a scrubber is disposed in an airflow chamber and is configured to remove reactive reagents from the air;

[0277] The far-UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned such that substantially all radiation is directed away from the airflow housing.

[0278] Aspect 85 provides a system according to aspect 84, which relates to or utilizes the device or its components or features according to any one of aspects 1 to 83.

[0279] Aspect 86 provides a system according to aspect 84 or 85, wherein the airflow housing and filtration system are substantially unaffected by direct radiation from a far-UV radiation source.

[0280] Aspect 87 provides a system according to any one of aspects 84 to 86, wherein the airflow housing is configured to displace irradiated air near a far UV radiation source.

[0281] Aspect 88 provides a system according to any one of aspects 84 to 87, wherein an air inlet is adjacent to a far-UV radiation source, and an airflow housing is configured to capture irradiated air near the far-UV radiation source.

[0282] Aspect 89 provides a system according to any one of aspects 84 to 88, wherein air exhaust is directed away from a far-UV radiation source and optionally directed to a ceiling, wall, floor or deflector to circulate air within the available space.

[0283] Aspect 90 provides a system according to any one of aspects 84 to 89, wherein an air inlet is adjacent to a far-UV radiation source, and an airflow housing is configured to discharge the airflow away from the irradiated air near the far-UV radiation source.

[0284] Aspect 91 provides a system according to any one of aspects 84 to 90, wherein an air exhaust port is adjacent to a far-UV radiation source, and an airflow housing is configured to exhaust airflow into a space irradiated by the far-UV radiation source.

[0285] Aspect 92 provides a system according to any one of aspects 84 to 91, wherein the airflow housing is configured to displace the irradiated air in a direction substantially parallel to the direction of the emitted radiation.

[0286] Aspect 93 provides a system according to any one of aspects 84 to 92, wherein the airflow housing is configured to capture irradiated air and displace the irradiated air in a direction substantially opposite to the direction of the emitted radiation.

[0287] Aspect 94 provides a system according to any one of aspects 84 to 93, wherein the airflow housing is configured to displace the irradiated air in a direction substantially perpendicular to the direction of the emitted radiation.

[0288] Aspect 95 provides a system according to any one of aspects 84 to 94, wherein the airflow housing includes a mechanical filter.

[0289] Aspect 96 provides a system according to any one of aspects 84 to 95, wherein the airflow housing includes one or more mechanical filters, which, whether considered individually, together, or both, have a penetration rate of 5% or greater at 0.3 micrometers.

[0290] Aspect 97 provides a system according to any one of aspects 84 to 96, wherein the airflow housing includes one or more mechanical filters, which, whether considered individually, together, or both, have a penetration rate of 40% or greater at 0.3 micrometers.

[0291] Aspect 98 provides a system according to any one of aspects 84 to 97, wherein the airflow housing includes one or more mechanical filters that are not HEPA filters, do not meet HEPA standards, and do not have a filtration efficiency greater than 99%, whether considered alone, together, or both.

[0292] Aspect 99 provides a system according to any one of aspects 84 to 98, wherein the airflow housing includes one or more mechanical filters, which, whether considered individually, together, or both, are not MERV16 or larger filters according to MERV standard 52.2.

[0293] Aspect 100 provides a system according to any one of aspects 84 to 99, wherein the airflow housing includes one or more mechanical filters, which are not suitable as single-pass filters for achieving ISO 20E or better using ISO 29463-1 2017, whether considered individually, together or both.

[0294] Aspect 101 provides a system according to any one of aspects 84 to 100, wherein the airflow housing includes one or more mechanical filters, which have a single-pass efficiency of less than 80%, whether considered individually, together, or both.

[0295] Aspect 102 provides a system according to any one of aspects 84 to 101, wherein the airflow housing includes one or more mechanical filters, which, whether considered individually, together, or both, have a flow rate of at least 50 CFM through the filters at a pressure drop of 0.25 or less.

[0296] Aspect 103 provides a system according to any one of aspects 84 to 102, wherein the airflow housing includes one or more mechanical filters that are not borosilicate microfibers.

[0297] Aspect 104 provides a system according to any one of aspects 84 to 103, wherein the airflow housing includes one or more mechanical filters, each of which, whether considered individually, together, or both, has a surface area of ​​20 m². 2 up to 80 m 2 A pleated filter.

[0298] Aspect 105 provides a system according to any one of aspects 84 to 104, wherein the airflow housing includes one or more mechanical filters, which, whether considered individually, together, or both, have a single-pass efficiency of ISO 15E or lower and a fan pressure drop profile of up to 0.1 at 100 CFM to up to 0.5 at 500 CFM.

[0299] Aspect 106 provides a system according to any one of aspects 84 to 105, wherein the airflow housing has a filtration system including two MERV13 filters.

[0300] Aspect 107 provides a system according to any one of aspects 84 to 106, wherein the airflow chamber includes a scrubber.

[0301] Aspect 108 provides a system according to any one of aspects 84 to 107, wherein the airflow chamber includes an active scrubber.

[0302] Aspect 109 provides a system according to any one of aspects 84 to 108, wherein the airflow chamber includes an active scrubber powered by a power source shared with the far-UV radiation source and the fan system.

[0303] Aspect 110 provides a system according to any one of aspects 84 to 109, wherein the airflow chamber includes a passive scrubber.

[0304] Aspect 111 provides a system according to any one of aspects 84 to 110, wherein the air flow chamber comprises zeolite.

[0305] Aspect 112 provides a system according to any one of aspects 84 to 111, wherein the air flow chamber comprises activated carbon.

[0306] Aspect 113 provides a system according to any one of aspects 84 to 112, wherein the fan system is one or more axial flow fans.

[0307] Aspect 114 provides a system according to any one of aspects 84 to 113, wherein the fan system comprises one or more fans, each having a diameter of 500 mm or less.

[0308] Aspect 115 provides a system according to any one of aspects 84 to 114, wherein the fan system is one or more fans, each of the one or more fans being about 6W or less, and the fan system together being 200W or less.

[0309] Aspect 116 provides a system according to any one of aspects 84 to 115, wherein the fan system is one or more axial fans, each of which provides a static pressure of about 0.5 inches of water column or less, and the fan system together provides a static pressure of about 0.5 inches of water column or less.

[0310] Aspect 117 provides a system according to any one of aspects 84 to 116, wherein the fan system provides a static pressure to the filter of about 0.1 inches of water column or less at at least 100 CFM to about 0.5 inches of water column or less at at least 500 CFM.

[0311] Aspect 118 provides a system according to any one of aspects 84 to 117, wherein the fan system is two to six tube axial fans having a diameter of 150 mm or less.

[0312] Aspect 119 provides a system according to any one of aspects 84 to 118, wherein the far-UV radiation source is a barrier discharge lamp.

[0313] Aspect 120 provides a system according to any one of aspects 84 to 119, wherein the far-UV radiation source is a KrCl excimer lamp.

[0314] Aspect 121 provides a system according to any one of aspects 84 to 120, wherein the far-UV radiation source includes a bulb having an annular body having an outer surface and defining an internal discharge cavity, wherein the annular body has a primary axial dimension and a secondary radial dimension, and includes an electrode in the internal discharge cavity that traverses along the primary axial dimension of the annular body.

[0315] Aspect 122 provides a system according to any one of aspects 84 to 121, wherein the far-UV radiation source includes a lamp housing, a bulb, a reflector, and a window.

[0316] Aspect 123 provides a system according to any one of aspects 84 to 122, wherein the far-UV radiation source includes a filter.

[0317] Aspect 124 provides a system according to any one of aspects 84 to 123, wherein the far-UV radiation source includes a filter that substantially prevents transmission of one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0318] Aspect 125 provides a system according to any one of aspects 84 to 124, wherein the far-UV radiation source includes a filter that transmits substantially one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0319] Aspect 126 provides a system according to any one of aspects 84 to 125, wherein the far-UV radiation source is integrated with the airflow housing via fasteners, adhesives, interlocking components, welding, or molding to the outer surface of the airflow housing.

[0320] Aspect 127 provides a system according to any one of aspects 84 to 126, wherein the far-UV radiation source is integrated with the airflow housing by means of an air inlet or air outlet disposed on the airflow housing.

[0321] Aspect 128 provides a system according to any one of aspects 84 to 127, wherein a far-UV radiation source is integrated with an airflow housing via a shared bracket or mounting.

[0322] Aspect 129 provides a system according to any one of aspects 84 to 128, the system being configured as a portable system.

[0323] Aspect 130 provides a system according to any one of aspects 84 to 129, the system further comprising a floor stand, a desktop stand, a wall mount, or a ceiling mount.

[0324] Aspect 131 provides a system according to any one of aspects 84 to 130, the system further comprising a telescopic support or a retractable support.

[0325] Aspect 132 provides a system according to any one of aspects 84 to 131, wherein the airflow housing is attached to a return or supply device of the HVAC system.

[0326] Aspect 133 provides a system according to any one of aspects 84 to 132, wherein a far-UV radiation source is integrated with an airflow housing via a shared power source.

[0327] Aspect 134 provides a system according to any one of aspects 84 to 133, wherein the far-UV radiation source is located within 24 inches of an air inlet or air outlet.

[0328] Aspect 135 provides a system according to any one of aspects 84 to 134, wherein the air inlet and the air outlet provide one or more rotating vortices in the air.

[0329] Aspect 136 provides a system according to any one of aspects 84 to 135, wherein the airflow housing, fan system, filter, and scrubber—if present—provide at least 100 ft at the air inlet and air outlet. 3 Airflow rate of / min.

[0330] Aspect 137 provides a system according to any one of aspects 84 to 136, the system further comprising an external reflector or diffuser.

[0331] Aspect 138 provides a system according to any one of aspects 84 to 137, the system further comprising a handle, cover or hinged cover configured for transporting the far-UV radiation source and the airflow unit together.

[0332] Aspect 139 provides a system according to any one of aspects 84 to 138, the system further comprising a sensor that collects spectrophotometric data, irradiance data or spectral data, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data, or any combination thereof from one or more far-UV radiation sources.

[0333] Aspect 140 provides a system according to any one of aspects 84 to 139, the system further comprising a control system for receiving sensor data and adjusting performance parameters of the system.

[0334] Aspect 141 provides a system according to any one of aspects 84 to 140, the system further comprising a control system that receives sensor data and adjusts one or more performance parameters of one or more of an airflow unit, a filtration system, a mechanical filter, a scrubber, a fan, and a far-UV radiation source.

[0335] Aspect 142 provides a system according to any one of aspects 84 to 141, the system further comprising a reporting system that collects sensor data and notifies the user of recommended maintenance or changes to performance parameters.

[0336] Aspect 143 provides a system according to any one of aspects 84 to 142, wherein an air inlet or air outlet adjacent to a far-UV radiation source has a shape that shares at least one dimension with the far-UV radiation source or the dimensions of a reflector, bulb, or lens of the far-UV radiation source.

[0337] Aspect 144 provides a system according to any one of aspects 84 to 143, wherein the air inlet or air outlet adjacent to the far-UV radiation source is substantially rectangular, the rectangle having an edge substantially parallel to the edge of the far-UV radiation source or the edge of the far-UV radiation source's reflector, bulb, or lens.

[0338] Aspect 145 provides a system according to any one of aspects 84 to 144, wherein an air inlet or air outlet adjacent to the far-UV radiation source is annular and surrounds the far-UV radiation source.

[0339] Aspect 146 provides a system according to any one of aspects 84 to 145, wherein the airflow housing is configured to provide diffused exhaust.

[0340] Aspect 147 provides a system according to any one of aspects 84 to 146, wherein the air exhaust port is not adapted to provide an airflow wall.

[0341] Aspect 148 provides a system according to any one of aspects 84 to 147, wherein an air exhaust port promotes the scattering of droplets, aerosols and particles in the air.

[0342] Aspect 149 provides a system according to any one of aspects 84 to 148, wherein the far-UV radiation source does not include a light guide.

[0343] Aspect 150 provides a system according to any one of aspects 84 to 149, wherein the airflow unit is configured for at least 500 m 3 With a volumetric airflow of / hr, the ratio of total fan power to total optical power is approximately 500 to 1000.

[0344] Aspect 151 provides a system according to any one of aspects 84 to 150, wherein, with a total fan power of 100W or less and a total system power of 150W or less, the ratio of total optical power to volumetric airflow is approximately 0.05 mW / (m²). 3 / hr) to approximately 1.00 mW / (m 3 / hr).

[0345] Aspect 152 provides a system according to any one of aspects 84 to 151, wherein the airflow unit is configured for at least 850 m 3 With a volumetric airflow rate of / hr and a total fan power of 100W or less, the ratio of total optical power to total filter surface area is approximately 0.5 mW / m. 2 Approximately 10 mW / m 2 .

[0346] Aspect 153 provides a system according to any one of aspects 84 to 152, the system providing at least 300m 3 Clean air delivery rate (CADR) per hour.

[0347] Aspect 154 provides a system according to any one of aspects 84 to 153, the system providing 350 m 3 / h volumetric air flow rate.

[0348] Aspect 155 provides a system according to any one of aspects 84 to 154, which provides an air velocity of at least 0.6 m / sec at a distance of 0.25 m from the air exhaust port.

[0349] Aspect 156 provides a method for inactivating airborne pathogens, the method comprising:

[0350] Irradiating the air in human-use spaces with radiation from far-UV radiation sources, wherein the radiation is configured to inactivate pathogens in the air and includes one or more wavelengths from about 210 nm to about 230 nm.

[0351] A fan system is used to generate airflow through the airflow unit and to displace irradiated air near the far UV radiation source, wherein the airflow unit includes an airflow housing that defines an airflow chamber, an air inlet, and an air outlet.

[0352] Optionally, non-pathogenic particles are removed from the airflow within the airflow housing; and

[0353] Optionally, the reactive reagent is removed from the gas flow in the gas flow housing;

[0354] The far-UV radiation source is located outside the airflow chamber and is integrated with the airflow unit adjacent to at least one of the air inlet or air outlet, and the far-UV radiation source is positioned such that substantially all of the radiation is directed away from the airflow housing.

[0355] Aspect 157 provides a method according to aspect 156, which relates to or utilizes an apparatus or system or a component or feature thereof according to any one of aspects 1 to 155.

[0356] Aspect 158 ​​provides the method according to aspect 156 or 157, wherein the airflow housing and filtration system are substantially unaffected by direct radiation from a far-UV radiation source.

[0357] Aspect 159 provides a method according to any one of aspects 156 to 158, wherein the airflow is directed to displace irradiated air near a far UV radiation source.

[0358] Aspect 160 provides a method according to any one of aspects 156 to 159, wherein the airflow captures irradiated air near a far UV radiation source.

[0359] Aspect 161 provides a method according to any one of aspects 156 to 160, wherein the exhaust air is directed away from the far-UV radiation source and optionally directed to a ceiling, wall, floor or deflector to circulate the air in the available space.

[0360] Aspect 162 provides a method according to any one of aspects 156 to 161, wherein the air inlet is adjacent to the far-UV radiation source, and the airflow displaces the airflow from the irradiated air near the far-UV radiation source.

[0361] Aspect 163 provides a method according to any one of aspects 156 to 162, wherein an air exhaust port is adjacent to a far-UV radiation source and an airflow discharges the airflow into a space irradiated by the far-UV radiation source.

[0362] Aspect 164 provides a method according to any one of aspects 156 to 163, wherein the airflow displaces the irradiated air in a direction substantially parallel to the direction of the emitted radiation.

[0363] Aspect 165 provides a method according to any one of aspects 156 to 164, wherein the airflow captures irradiated air and displaces the irradiated air in a direction substantially opposite to the direction of the emitted radiation.

[0364] Aspect 166 provides a method according to any one of aspects 156 to 165, wherein the airflow causes the irradiated air to shift in a direction substantially perpendicular to the direction of the emitted radiation.

[0365] Aspect 167 provides a method according to any one of aspects 156 to 166, wherein the airflow housing includes a mechanical filter.

[0366] Aspect 168 provides a method according to any one of aspects 156 to 167, wherein the airflow housing includes one or more mechanical filters, which, whether individually, together, or both, have a penetration rate of 5% or greater at 0.3 micrometers.

[0367] Aspect 169 provides a method according to any one of aspects 156 to 168, wherein the airflow housing includes one or more mechanical filters, which, whether individually, together, or both, have a penetration rate of 40% or greater at 0.3 micrometers.

[0368] Aspect 170 provides a method according to any one of Aspects 156 to 169, wherein the airflow housing includes one or more mechanical filters that are not HEPA filters, do not meet HEPA standards, and do not have a filtration efficiency greater than 99%, whether considered alone, together, or both.

[0369] Aspect 171 provides a method according to any one of aspects 156 to 170, wherein the airflow housing includes one or more mechanical filters, which are not MERV16 or larger filters according to MERV standard 52.2, whether considered individually, together or both.

[0370] Aspect 172 provides a method according to any one of aspects 156 to 171, wherein the airflow housing includes one or more mechanical filters, which are not suitable as single-pass filters for achieving ISO 20E or better using ISO 2946-1 2017, whether considered individually, together or both.

[0371] Aspect 173 provides a method according to any one of aspects 156 to 172, wherein the airflow housing includes one or more mechanical filters, which have a single-pass efficiency of less than 80%, whether considered individually, together, or both.

[0372] Aspect 174 provides a method according to any one of aspects 156 to 173, wherein the airflow housing includes one or more mechanical filters, which, whether individually, together, or both, have a flow rate of at least 50 CFM through the one or more filters at a pressure drop of 0.25 or less.

[0373] Aspect 175 provides a method according to any one of aspects 156 to 174, wherein the airflow housing comprises one or more mechanical filters that are not borosilicate microfibers.

[0374] Aspect 176 provides a method according to any one of aspects 156 to 175, wherein the airflow housing includes one or more mechanical filters, the one or more mechanical filters having a 20 m² depth, whether considered individually, together, or both. 2 up to 80 m 2 A pleated filter with a large surface area.

[0375] Aspect 177 provides a method according to any one of aspects 156 to 176, wherein the airflow housing includes one or more mechanical filters, which, whether individually, together, or both, have a single-pass efficiency of ISO 15E or lower and a fan pressure drop profile of up to 0.1 at 100 CFM to up to 0.5 at 500 CFM.

[0376] Aspect 178 provides a method according to any one of aspects 156 to 177, wherein the airflow housing includes a filtration system comprising two MERV13 filters.

[0377] Aspect 179 provides a method according to any one of aspects 156 to 178, wherein the airflow housing includes a scrubber.

[0378] Aspect 180 provides a method according to any one of aspects 156 to 179, wherein the airflow housing includes an active scrubber.

[0379] Aspect 181 provides a method according to any one of aspects 156 to 180, wherein the airflow housing includes an active scrubber powered by a power source shared with the far-UV radiation source and the fan system.

[0380] Aspect 182 provides a method according to any one of aspects 156 to 181, wherein the airflow housing includes a passive scrubber.

[0381] Aspect 183 provides a method according to any one of aspects 156 to 182, wherein the gas flow shell comprises zeolite, activated carbon, manganese dioxide, or a combination thereof.

[0382] Aspect 184 provides a method according to any one of aspects 156 to 183, wherein the airflow housing includes a scrubber comprising activated carbon, manganese dioxide, or both activated carbon and manganese dioxide.

[0383] Aspect 185 provides a method according to any one of aspects 156 to 184, wherein the fan system is one or more axial flow fans.

[0384] Aspect 186 provides a method according to any one of aspects 156 to 185, wherein the fan system is one or more fans, each of which has a diameter of 500 mm or less.

[0385] Aspect 187 provides a method according to any one of aspects 156 to 186, wherein the fan system is one or more fans, each of the one or more fans is about 6 W or less, and the fan system together is 200 W or less.

[0386] Aspect 188 provides a method according to any one of aspects 156 to 187, wherein the fan system is one or more axial fans, each of the one or more axial fans providing a static pressure of about 0.5 inches of water column or less, and the fan system together provides a static pressure of about 0.5 inches of water column or less.

[0387] Aspect 189 provides a method according to any one of aspects 156 to 188, wherein the fan system provides a static pressure to the filter of about 0.1 inches of water column or less at at least 100 CFM to about 0.5 inches of water column or less at at least 500 CFM.

[0388] Aspect 190 provides a method according to any one of aspects 156 to 189, wherein the fan system is two to six tube axial fans having a diameter of 150 mm or less.

[0389] Aspect 191 provides a method according to any one of aspects 156 to 190, wherein the far-UV radiation source is a barrier discharge lamp.

[0390] Aspect 192 provides a method according to any one of aspects 156 to 191, wherein the far-UV radiation source is a KrCl excimer lamp.

[0391] Aspect 193 provides a method according to any one of aspects 156 to 192, wherein the far-UV radiation source includes a bulb having an annular body having an outer surface and defining an internal discharge cavity, wherein the annular body has a primary axial dimension and a secondary radial dimension, and includes an electrode in the internal discharge cavity that traverses along the primary axial dimension of the annular body.

[0392] Aspect 194 provides a method according to any one of aspects 156 to 193, wherein the far-UV radiation source includes a lamp housing, a bulb, a reflector, and a window.

[0393] Aspect 195 provides a method according to any one of aspects 156 to 194, wherein the far-UV radiation source includes a filter.

[0394] Aspect 196 provides a method according to any one of aspects 156 to 195, wherein the far-UV radiation source includes a filter that substantially prevents transmission of one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0395] Aspect 197 provides a method according to any one of aspects 156 to 196, wherein the far-UV radiation source includes a filter that transmits substantially one or more wavelengths outside the range of about 200 nm to about 230 nm.

[0396] Aspect 198 provides a method according to any one of aspects 156 to 197, wherein the far-UV radiation source is integrated with the airflow housing via fasteners, adhesives, interlocking components, welding, or molding to the outer surface of the airflow housing.

[0397] Aspect 199 provides a method according to any one of aspects 156 to 198, wherein the far-UV radiation source is integrated with the airflow housing by means of being disposed at an air inlet or air outlet of the airflow housing.

[0398] Aspect 200 provides a method according to any one of aspects 156 to 199, wherein the far-UV radiation source is integrated with the airflow housing via a shared bracket or mounting component.

[0399] Aspect 201 provides a method according to any one of aspects 156 to 200, wherein the far-UV radiation source and the airflow unit are integrated together as a single portable system.

[0400] Aspect 202 provides a method according to any one of aspects 156 to 201, wherein the airflow housing is attached to a return device or supply device of the HVAC system.

[0401] Aspect 203 provides a method according to any one of aspects 156 to 202, wherein the far-UV radiation source is integrated with the airflow housing via a shared power source.

[0402] Aspect 204 provides the method according to any one of aspects 156 to 203, wherein the far-UV radiation source is located within 24 inches of an air inlet or air outlet.

[0403] Aspect 205 provides a method according to any one of aspects 156 to 204, wherein the air inlet and air outlet provide one or more rotating vortices in the human use space.

[0404] Aspect 206 provides the method according to any one of aspects 156 to 205, wherein the airflow at the air inlet and air outlet is at least 100 ft. 3 / min.

[0405] Aspect 207 provides a method according to any one of aspects 156 to 206, the method further comprising collecting spectrophotometric data, irradiance data or spectral data of one or more far-UV radiation sources, one or more far-UV radiation sources, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data or any combination thereof.

[0406] Aspect 208 provides a method according to any one of aspects 156 to 207, the method further comprising: collecting spectrophotometric data, irradiance data or spectral data, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data or any combination thereof from one or more far-UV radiation sources; and adjusting the performance parameters of the far-UV radiation sources or airflow units based on the collected data.

[0407] Aspect 209 provides a method according to any one of aspects 156 to 208, the method further comprising: collecting spectrophotometric data, irradiance data or spectral data, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data or any combination thereof from one or more far-UV radiation sources; and adjusting one or more performance parameters of one or more of a filtration system, mechanical filter or scrubber.

[0408] Aspect 210 provides a method according to any one of aspects 156 to 209, which collects spectrophotometric data, irradiance data or spectral data, air quality data, gas content data, sound data, light data, usage data, system status, maintenance-related data, room environment data, room occupancy data or any combination thereof from one or more far-UV radiation sources, and notifies the user of recommended maintenance or changes to performance parameters.

[0409] Aspect 211 provides a method according to any one of aspects 156 to 210, wherein the airflow housing is configured to provide diffused exhaust.

[0410] Aspect 212 provides a method according to any one of aspects 156 to 211, wherein the air exhaust port is not adapted to provide an airflow wall.

[0411] Aspect 213 provides a method according to any one of aspects 156 to 212, wherein the air exhaust port promotes the scattering of droplets, aerosols and particles in the air.

[0412] Aspect 214 provides a method according to any one of aspects 156 to 213, wherein the far-UV radiation source does not include a light guide.

[0413] Aspect 215 provides the method according to any one of aspects 156 to 214, wherein the airflow unit is configured for at least 500 m 3 With a volumetric airflow of / hr, the ratio of total fan power to total optical power is approximately 500 to 1000.

[0414] Aspect 216 provides the method according to any one of aspects 156 to 215, wherein, when the total fan power is 100 W or less and the total power of the far-UV radiation source and airflow unit is 150 W or less, the ratio of total optical power to volumetric airflow is approximately 0.05 mW / (m²). 3 / hr) to approximately 1.00 mW / (m 3 / hr).

[0415] Aspect 217 provides the method according to any one of aspects 156 to 216, wherein the airflow unit is configured for at least 850 m 3 With a volumetric airflow rate of / hr and a total fan power of 100 W or less, the ratio of total optical power to total filter surface area is approximately 0.5 mW / m. 2 Approximately 10 mW / m 2 .

[0416] Aspect 218 provides a method according to any one of aspects 156 to 217, the method providing at least 300m 3 Clean air delivery rate (CADR) per hour.

[0417] Aspect 219 provides a method according to any one of aspects 156 to 218, the method providing 350 m 3 / h volumetric air flow rate.

[0418] Aspect 220 provides a method according to any one of aspects 156 to 219, which provides an air velocity of at least 0.6 m / sec at a distance of 0.25 m from the air exhaust port.

[0419] Aspect 221 provides an apparatus, method, or system according to any one of aspects 1 to 220, the apparatus, method, or system providing or being configured to provide a local air movement region in an irradiated air region.

[0420] Aspect 222 provides an apparatus, method, or system according to any one of aspects 1 to 221, the apparatus, method, or system providing a local relatively high-speed air region in a relatively high-throughput region or configured to provide a local relatively high-speed air region in a relatively high-throughput region.

[0421] Aspect 223 provides an apparatus, method, or system according to any one of aspects 1 to 221, wherein the apparatus, method, or system provides a local air region having a velocity higher than the average indoor air velocity in an irradiated air region or is configured to provide a local air region having a velocity higher than the average indoor air velocity in an irradiated air region.

[0422] Aspect 224 provides an apparatus, method, or system according to any one of aspects 1 to 221, which provides or is configured to provide a local air region with peak air velocity in an irradiated air region.

[0423] Aspect 225 provides an apparatus, method, or system according to any one of aspects 1 to 221, wherein the apparatus, method, or system provides a local air region having a velocity higher than the average indoor air velocity at an irradiated air region, the flux of which is about or at least 50%, 60%, 70%, 80%, 85%, 90%, 95%, 99%, 99.5%, or 99.9% of the peak flux provided by a far-UV radiation source.

[0424] Aspect 226 provides an apparatus, method, or system according to any one of aspects 1 to 221, wherein the apparatus, method, or system provides a local air region with a peak air velocity at an irradiated air region, the flux of which is about or at least 50%, 60%, 70%, 80%, 85%, 90%, 95%, 99%, 99.5%, or 99.9% of the peak flux provided by a far-UV radiation source.

[0425] Aspect 227 provides an apparatus, method, or system according to any one of aspects 1 to 221, wherein the apparatus, method, or system provides a local air region having a velocity higher than the average indoor air velocity at an irradiated air region, the irradiated air region being located within about or at least 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, 12 inches, 14 inches, 16 inches, 18 inches, 20 inches, 22 inches, 24 inches, 36 inches, 48 ​​inches, or 60 inches of a far-UV radiation source.

[0426] Aspect 228 provides an apparatus, method, or system according to any one of aspects 1 to 221, the apparatus, method, or system providing a local air region with a peak air velocity at an irradiated air region located within about or at least 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 7 inches, 8 inches, 9 inches, 10 inches, 11 inches, 12 inches, 14 inches, 16 inches, 18 inches, 20 inches, 22 inches, 24 inches, 36 inches, 48 ​​inches, or 60 inches of a far-UV radiation source.

[0427] Aspect 229 provides an apparatus, method, or system that combines one or more of the foregoing features in Examples 1 to 228, except that it does not include a filter or scrubber, such that the airflow system is used only to provide airflow in a localized area of ​​irradiated air.

[0428] Aspect 230 provides an apparatus, method, or system that incorporates any combination or arrangement of one or more of the aforementioned features of Examples 1 to 229.

[0429] Various modifications and additions can be made to the exemplary embodiments discussed without departing from the scope of the invention. For example, while the embodiments described above relate to specific features, the scope of the invention also includes embodiments with different combinations of features and embodiments that do not include all of the features described. Therefore, the scope of the invention is intended to cover all alternatives, modifications, variations, and all equivalents thereof that fall within the scope of the claims.

Claims

1. A device for inactivating airborne pathogens, the device comprising: An airflow unit, the airflow unit including an airflow housing defining an airflow chamber, an air inlet and an air outlet; A filtration system, the filtration system comprising a mechanical filter, a scrubber, or both a mechanical filter and a scrubber disposed in the airflow chamber; A fan system configured to provide airflow through the air inlet, the air flow chamber, and the air exhaust outlet; as well as A far-UV radiation source that emits radiation of one or more wavelengths from about 210 nm to about 230 nm, wherein the far-UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or the air outlet, and the far-UV radiation source is positioned to direct radiation away from the airflow housing, the filter, and the scrubber—if present.

2. The device according to claim 1, wherein, The airflow housing and the filtration system are essentially unaffected by direct radiation from the far-UV radiation source.

3. The device according to claim 1, wherein, The airflow shell is configured to displace the irradiated air near the far-UV radiation source.

4. The device according to claim 1, wherein, The air inlet is adjacent to the far-UV radiation source, and the airflow housing is configured to capture irradiated air near the far-UV radiation source.

5. The device according to claim 1, wherein, The airflow housing is configured to capture irradiated air and displace it in a direction substantially opposite to the direction of the emitted radiation.

6. The device according to claim 1, wherein, The air exhaust port is adjacent to the far-UV radiation source, and the airflow housing is configured to discharge the airflow into the space irradiated by the far-UV radiation source.

7. The device of claim 1, wherein the device comprises one or more mechanical filters, and the one or more mechanical filters, whether considered individually, together, or both, have a transmittance of 5% or greater at 0.3 micrometers.

8. The device of claim 1, wherein the device comprises one or more mechanical filters, and the one or more mechanical filters, whether considered individually, together, or both, have a transmittance of 40% or greater at 0.3 micrometers.

9. The device of claim 1, wherein the device comprises one or more mechanical filters, and the one or more mechanical filters, whether considered individually, together, or both, are not HEPA filters and do not meet the HEPA standard ASME AG-1.

10. The device of claim 1, wherein the device comprises one or more mechanical filters, and the one or more mechanical filters, whether considered individually, together, or both, have a flow rate of at least 50 CFM at a pressure drop of 0.25 or less.

11. The device according to claim 1, wherein, The fan system is one or more axial flow fans, each of which provides a static pressure of about 0.5 inches of water column or less, and the fan system together provides a static pressure of about 0.5 inches of water column or less.

12. The device according to claim 1, wherein, The fan system consists of two to six tube axial fans with a diameter of 150 mm or less.

13. The device according to claim 1, wherein, The far-UV radiation source is a KrCl excimer lamp.

14. The device according to claim 1, wherein, The far-UV radiation source is integrated with the airflow housing via fasteners, adhesives, interlocking components, welding, or molding to the outer surface of the airflow housing.

15. The device of claim 1, wherein the device is configured to attach the airflow housing to a return or supply device of an HVAC system.

16. The device according to claim 1, wherein, The far-UV radiation source is located within 24 inches of the air inlet or the air outlet.

17. The device of claim 1, wherein the device is configured to provide a localized relatively high-speed air region in a relatively high UV flux region.

18. The device of claim 1, wherein the device is configured to provide a localized air zone with a velocity higher than the average indoor air velocity at an irradiated air zone located within 24 inches of the far-UV radiation source.

19. The device of claim 1, wherein the device is configured to provide a local air region having a velocity higher than the average indoor air velocity at the irradiated air region, the flux of the irradiated air region being at least 90% of the maximum flux provided by the far-UV radiation source.

20. A system for inactivating airborne pathogens, the system comprising: A far-UV radiation source configured to irradiate the air in a human-use space, wherein the far-UV radiation source emits radiation comprising one or more wavelengths from about 210 nm to about 230 nm. An airflow unit, the airflow unit including an airflow housing defining an airflow chamber, an air inlet and an air outlet; A fan system configured to displace irradiated air near the radiation source and provide airflow through the air inlet, the airflow chamber, and the air outlet; and A filter disposed in the airflow chamber and configured to remove particles from the airflow; a scrubber disposed in the airflow chamber and configured to remove reactive reagents from the airflow; or both a filter and a scrubber. The far-UV radiation source is integrated with the airflow unit outside the airflow chamber and adjacent to at least one of the air inlet or the air outlet, and the far-UV radiation source is positioned such that substantially all radiation is directed away from the airflow housing.

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