Regulating fluid delivery system

Abstract

A fluid processing system includes a fluid processing structure configured to at least partially confine a liquid within an immersion space between a final element and a substrate, where the fluid processing structure includes: a plurality of air knife compartments and a plurality of gas supply compartments, where the plurality of air knife compartments and the plurality of gas supply compartments are configured to supply gas to the final element; gas flow to each of the air knife compartment and the gas supply compartment may be individually controlled by a corresponding variable flow valve.

Description

[0001] Cross-references to related applications

[0002] This application claims priority to European application 23186992.6, filed on 21 July 2023, and European application 24165075.3, filed on 21 March 2024, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This invention relates to a fluid handling system. Background Technology

[0004] A lithography apparatus is a machine configured to apply a desired pattern onto a substrate. Lithography apparatuses can be used, for example, in the manufacture of integrated circuits (ICs). A lithography apparatus can project a pattern (often referred to as a “design layout” or “design”) from a patterning apparatus (e.g., a mask) onto a layer of radiation-sensitive material (resist) disposed on a substrate (e.g., a wafer). Known lithography apparatuses include: a so-called stepper, in which each target portion is irradiated by exposing the entire pattern onto the target portion in a single pass; and a so-called scanner, in which each target portion is irradiated by scanning the pattern with a radiation beam in a given direction (“scanning” direction) simultaneously, parallel or antiparallel to such direction, across the substrate.

[0005] As semiconductor manufacturing processes have continued to advance, the size of circuit elements has shrunk steadily over the past few decades, while the number of functional elements, such as transistors, per device has steadily increased, following a trend commonly known as "Mohr's Law." To follow Mohr's Law, the semiconductor industry is pursuing technologies that enable the production of increasingly smaller features. To project patterns onto a substrate, photolithography equipment uses electromagnetic radiation. The wavelength of this radiation determines the minimum size of the features patterned on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm, and 13.5 nm.

[0006] Further improvements in resolution for smaller features can be achieved by providing an immersion fluid with a relatively high refractive index, such as water, onto the substrate during exposure. The effect of the immersion fluid is that smaller features can be imaged because the exposure radiation will have a shorter wavelength in a fluid compared to a gas. The effect of the immersion fluid can also be viewed as increasing the effective numerical aperture (NA) of the system and also increasing the depth of focus.

[0007] The immersion fluid can be confined by a fluid handling system to a localized region between the liquid confinement structure of the lithography apparatus and the substrate; this localized region is referred to as the immersion space. The fluid handling system can be a component comprising multiple parts, some of which have complex and intricate structures. Specifically, the fluid handling system provides an intricate flow channel system for the fluid to be supplied to the immersion space.

[0008] US2017363948 A1 discloses an immersion system comprising: a fluid processing structure configured to contain an immersion fluid within a region, the fluid processing structure having at the boundary of the space: at least one air knife opening in a radially outward direction from the space; and at least one gas supply opening relative to the space in a radially outward direction from the at least one air knife opening; and a gas supply system configured to supply substantially pure CO2 gas through the at least one air knife opening and the at least one gas supply opening to provide an atmosphere of substantially pure CO2 gas adjacent to and radially outward from the space. The system may be configured such that the gas exits the at least one air knife opening at a first gas velocity and the gas exits the at least one gas supply opening at a second gas velocity.

[0009] US20210096471 A1 discloses an immersion fluid confinement structure including gas outlets and openings divided into two groups, the groups being connected to two corresponding flow control valves. Summary of the Invention

[0010] In the photolithography patterning process, a fluid handling system confines liquid within an immersion space between the final optical element and the substrate. A fluid handling structure including an air knife and a gas supply unit is provided to reduce or prevent problems such as immersion fluid loss at the immersion fluid / air boundary and bubble formation in the immersion fluid.

[0011] During photolithographic patterning, the substrate moves relative to the fluid processing system. During substrate movement, the problem of immersion fluid loss is exacerbated on the receding side of the fluid processing structure, and the problem of bubble formation is exacerbated on the advancing side. However, increasing the flow rate through the air knife may cause droplets to be swept up on the advancing side. Therefore, the selected flow rates through the air knife and gas supply are always a trade-off between conflicting gas flow rate requirements, rather than providing optimal gas flow rates on different sides of the substrate.

[0012] The required gas flow rates for the air knife and the gas supply differ on the retracting and advancing sides. These problems can be reduced or prevented by increasing the gas flow rate through the air knife and the gas supply; however, the different gas flow rate requirements on the advancing and retracting sides result in uneconomical gas usage.

[0013] The objective of this invention is to provide a fluid handling system that reduces immersion fluid loss and bubble formation while ensuring efficient use of gas.

[0014] According to the present invention, a fluid processing system is provided, comprising: a fluid processing structure configured to confine liquid at least partially within an immersion space between a final element and a substrate, wherein the fluid processing structure includes: a plurality of air knife chambers, the plurality of air knife chambers including at least a first air knife chamber and a second air knife chamber, wherein the first air knife chamber includes at least one opening positioned radially outward from space and the second air knife chamber includes at least one opening positioned radially outward from space, the second air knife chamber being fluidly separated from the first air knife chamber, wherein each of the air knife chambers is in fluid communication with an air knife chamber via an air knife variable flow valve, such that the first air knife chamber is in fluid communication with the air knife chamber via the first air knife variable flow valve and the second air knife chamber is in fluid communication with the air knife chamber via the second air knife variable flow valve; a plurality of gas supply chambers, the plurality of... The gas supply compartment includes at least a first gas supply compartment and a second gas supply compartment, wherein the first gas supply compartment includes at least one opening radially outwardly positioned relative to the first gas knife compartment, such that the first gas knife compartment is disposed between the first gas supply compartment and the immersion space; and the second gas supply compartment includes at least one opening radially outwardly positioned relative to the second gas knife compartment, such that the second gas knife compartment is disposed between the second gas supply compartment and the immersion space, the second gas supply compartment being fluidly separated from the first gas supply compartment, wherein each of the gas supply compartments is in fluid communication with a gas supply chamber via a gas supply variable flow valve, such that the first gas supply compartment is in fluid communication with the gas supply chamber via the first gas supply variable flow valve and the second gas supply compartment is in fluid communication with the gas supply chamber via the second gas supply variable flow valve.

[0015] According to the present invention, a fluid processing system is provided, comprising a fluid processing structure configured to at least partially confine liquid within an immersion space between a final element and a substrate, wherein the fluid processing structure comprises: a first air knife chamber including at least one opening positioned radially outward from the space; a second air knife chamber including at least one opening positioned radially outward from the space, the second air knife chamber being fluidly separated from the first air knife chamber; a first air knife chamber fluidly connected to both the first and second air knife chambers and configured to supply a first gas to both the first and second air knife chambers; a second air knife chamber fluidly connected to both the first and second air knife chambers and configured to supply a second gas to both the first and second air knife chambers; and a switching valve configured to variably direct a flow of the first gas from the first air knife chamber to either only the first air knife chamber, or only the second air knife chamber, or both the first and second air knife chambers.

[0016] According to the present invention, a fluid processing structure is provided, the fluid processing structure being configured to at least partially confine liquid within an immersion space between a final element and a substrate, wherein the fluid processing structure comprises: a liquid supply member including a first liquid supply opening and a second liquid supply opening, the liquid supply member being configured to supply liquid to the immersion space through the first liquid supply opening and the second liquid supply opening; and a fluid extraction member including a set of extraction openings, the fluid extraction member being configured to extract immersion fluid from the immersion space through the extraction openings, wherein each fluid in the extraction opening is connected to an underpressure, wherein the liquid supply member is disposed radially inward from the fluid extraction member, wherein the first liquid supply opening and the second liquid supply opening are disposed radially inward from the air knife and are radially opposite each other relative to the immersion space, and the first liquid supply opening and the second liquid supply opening are connected to a liquid supply chamber.

[0017] According to the present invention, a computer program is provided having instructions that, when executed on a computer, cause a fluid processing system to control the gas flow rate through a first air knife compartment and a second air knife compartment based on at least one of a plurality of parameters, wherein the fluid processing structure includes an air knife, and wherein the parameters include: the position of a substrate relative to the fluid processing structure, a predicted volume of immersion liquid on the surface of the substrate outside the immersion space, a predicted size of droplets of immersion liquid on the surface of the substrate outside the immersion space, a predicted position of liquid on the surface of the substrate outside the immersion space, a distance between the bottom surface of the fluid processing structure and the surface of the substrate, a gas flow rate being supplied to the surface of the substrate, a substrate velocity, a substrate acceleration, a position of the resist on the substrate surface, and a contact angle between the resist and the substrate surface. Attached Figure Description

[0018] Embodiments of the invention will now be described by way of example only with reference to the accompanying schematic diagrams, in which corresponding reference numerals indicate corresponding parts, and in the schematic diagrams:

[0019] Figure 1 A schematic schematic diagram depicting a photolithography apparatus;

[0020] Figure 2a , Figure 2b , Figure 2c and Figure 2d Two different versions of a fluid handling system are depicted in cross-section, each having different features shown on the left and right sides of each version, which, according to the prior art, can extend around the entire circumference;

[0021] Figure 3 This is a schematic schematic diagram of a fluid processing system according to an embodiment of the present invention;

[0022] Figure 4 This is a schematic schematic diagram of a fluid processing system according to an embodiment of the present invention;

[0023] Figure 5 This is a schematic schematic cross-sectional view of a fluid processing system according to an embodiment of the present invention;

[0024] Figure 6 This is a schematic schematic diagram of a fluid processing system according to an embodiment of the present invention;

[0025] Figure 7 This is a schematic schematic diagram of the cross-section of an air knife according to an embodiment of the present invention;

[0026] Figure 8a A schematic schematic diagram of a fluid handling system according to an embodiment of the present invention is shown, and Figure 8b A schematic schematic diagram of a fluid handling system according to an embodiment of the present invention is shown, the fluid handling system including a liquid supply unit having a plurality of liquid supply compartments.

[0027] Figure 9 This is a schematic schematic diagram of a fluid processing system according to an embodiment of the present invention.

[0028] Figure 10a and Figure 10b This is a schematic schematic diagram of a fluid processing system according to an embodiment of the present invention.

[0029] Figure 11a and Figure 11b This is a schematic schematic diagram of a fluid handling system according to another embodiment of the present invention.

[0030] Figure 12 It is a schematic diagram of a fluid handling structure including a liquid supply opening and a liquid extraction opening.

[0031] Figure 13 A plan view of the fluid handling structure is shown.

[0032] Figure 14 The invention relates to a regulating liquid supply and a regulating liquid extraction supply.

[0033] Figure 15 This is an example of a slanted opening.

[0034] Figure 16 An example of a circular substrate that can be modeled as multiple separate regions is shown.

[0035] Figure 17a , Figure 17b , Figure 17c and Figure 17d Different examples of gas flow rate regulation are shown in different regions of the substrate. Figure 17e This is a schematic diagram of gas flow states A, B, and C.

[0036] Figure 18 An example of a fluid processing structure according to an embodiment of the present invention is shown.

[0037] Figure 19 An example of a fluid processing structure according to an embodiment of the present invention is shown.

[0038] Figure 20 An example of a fluid processing structure according to an embodiment of the present invention is shown.

[0039] Figure 21 An example of a fluid processing structure according to an embodiment of the present invention is shown.

[0040] The features shown in the figures are not necessarily to scale, and the sizes and / or arrangements depicted are not limiting. It should be understood that the figures include optional features that may not be essential to the invention. Furthermore, not all features of the device are depicted in each of the figures, and each figure may only show some parts relevant to describing a particular feature. Detailed Implementation

[0041] In this document, the terms “radiation” and “beam” are used to cover all types of electromagnetic radiation, including ultraviolet radiation (e.g., wavelengths of 365 nm, 248 nm, 193 nm, 157 nm, or 126 nm).

[0042] As used herein, the terms “mask,” “mask,” or “patterning apparatus” can be broadly interpreted to refer to a general patterning apparatus that can be used to impart a patterned cross-section to an incident radiation beam, the patterned cross-section corresponding to a pattern to be generated in a target portion of a substrate. In such contexts, the term “optical valve” may also be used. Examples of other such patterning apparatuses besides classical masks (transmission or reflection, binary, phase-shifting, hybrid, etc.) include programmable mirror arrays and programmable LCD arrays.

[0043] Figure 1 A lithography apparatus is schematically depicted. The lithography apparatus includes: an irradiation system (also referred to as an irradiator) IL configured to modulate a radiation beam B (e.g., UV radiation or DUV radiation); a mask support (e.g., a mask stage) MT configured to support a patterning apparatus (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning apparatus MA according to certain parameters; a substrate support (e.g., a substrate stage) WT configured to hold a substrate (e.g., a wafer coated with resist) W and connected to a second positioner PW configured to accurately position the substrate support WT according to certain parameters; and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted by the radiation beam B by the patterning apparatus MA onto a target portion C (e.g., comprising one or more dies) of the substrate W. A controller 500 controls the overall operation of the apparatus. The controller 500 may be a centralized control system or a system of multiple individual sub-controllers within various subsystems of the lithography apparatus.

[0044] In operation, the irradiation system IL receives a radiation beam B from a radiation source SO, for example, via a beam delivery system BD. The irradiation system IL may include various types of optical components for guiding, shaping, and / or controlling the radiation, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and / or other types of optical components, or any combination thereof. The irradiator IL can be used to adjust the radiation beam B to have a desired spatial and angular intensity distribution in its cross-section at the plane of the pattern forming apparatus MA.

[0045] The term “projection system” PS as used herein should be broadly interpreted to encompass various types of projection systems suitable for the exposure radiation used and / or for other factors such as immersion in liquids or vacuum, including refractive, reflective, reflective-refractive, distorting, magnetic, electromagnetic, and / or electrostatic optical systems, or any combination thereof. Any use of the term “projection lens” herein may be considered synonymous with the more general term “projection system” PS.

[0046] Photolithography equipment belongs to the type in which at least a portion of the substrate W can be covered by an immersion liquid (e.g., water) with a relatively high refractive index, therefore Figure 2a A fluid handling system is shown, comprising a fluid handling structure 12 surrounding the bottom surface of a final element 100. The final element 100 may have an inverted truncated conical shape. While a truncated conical shape is described here, other suitable shapes may also be used. The truncated conical shape has a flat bottom surface and a conical surface. The truncated conical shape protrudes from the flat surface and has a flat bottom surface. The flat bottom surface is an optically active portion of the bottom surface of the final element 100 through which a radiation beam B can pass. The final element 100 may have a coating 30. The fluid handling structure 12 surrounds at least a portion of the truncated conical shape. The fluid handling structure 12 has an inner surface facing the conical surface of the truncated conical shape. The inner surface and the conical surface may have complementary shapes. The top surface of the fluid handling structure 12 is substantially flat. The fluid handling structure 12 may be assembled around the truncated conical shape of the final element 100. The bottom surface of the fluid processing structure 12 can be substantially flat, and in use, the bottom surface can be parallel to the facing surface of the substrate support WT and / or the substrate W. Therefore, the bottom surface of the fluid processing structure 12 can be referred to as the surface facing the substrate W. The distance between the bottom surface and the facing surface can range from 20 micrometers to 500 micrometers, and preferably from 70 micrometers to 200 micrometers.

[0047] Compared to the final element 100, the fluid processing structure 12 extends closer to the facing surface of the substrate W and the substrate support WT. Therefore, an immersion space 11 is defined between the inner surface of the fluid processing structure 12, the flat surface of the truncated conical portion, and the facing surface. During use, the immersion space 11 is filled with an immersion liquid. The immersion liquid fills at least a portion of the buffer space between the complementary surfaces of the final element 100 and the fluid processing structure 12, and in an embodiment, fills at least a portion of the space between the complementary inner surface and the conical surface. The fluid processing structure 12 defines at least one slit 400 (which may be more generally referred to as an opening) through which the radiation beam B can pass. The slit 400 may define at least a portion of the immersion space 11.

[0048] Immersion liquid is supplied to the immersion space 11 via openings formed in the surface of the fluid processing structure 12. Immersion liquid can be supplied from supply openings 20 in the inner surface of the fluid processing structure 12. Alternatively or additionally, immersion liquid is supplied from a lower supply opening 23 formed in the bottom surface of the fluid processing structure 12. The lower supply opening 23 can surround the path of the radiation beam B and can be formed by an array of openings or a single slit. Supplying immersion liquid to fill the immersion space 11 ensures that the flow through the immersion space 11 below the projection system PS is laminar. Furthermore, supplying immersion liquid from the lower supply opening 23 reduces the entry of air bubbles into the immersion space 11. This supply of immersion liquid can serve as a liquid seal.

[0049] Submerged liquid can be recovered from the recovery opening 21 formed in the inner surface. Recovery of submerged liquid through recovery opening 21 can be achieved by applying negative pressure; recovery through recovery opening 21 is due to the velocity of the submerged liquid flowing through the immersion space 11; or the recovery may be due to both. When viewed in a plan view, recovery opening 21 may be located on the opposite side of supply opening 20. Alternatively, submerged liquid can be recovered through overflow recovery member 24 located on the top surface of fluid processing structure 12. Supply opening 20 and recovery opening 21 can be interchanged (i.e., the flow direction of the liquid can be reversed). This allows the flow direction to be changed depending on the relative movement of fluid processing structure 12 and substrate W.

[0050] Alternatively, the submerged liquid can be recovered from below the fluid processing structure via a recovery opening 25 formed in the bottom surface of the fluid processing structure 12. The recovery opening 25 can be used to retain the meniscus 33 of the submerged liquid to the fluid processing structure 12. The meniscus 33 is formed between the fluid processing structure 12 and the facing surface, and it serves as a boundary between the liquid space and the gaseous external environment. The recovery opening 25 can be a porous plate capable of recovering the submerged liquid in a substantially single-phase flow. The recovery opening in the bottom surface can be a series of pin openings 32 through which the submerged liquid is recovered. The pin openings 32 can recover the submerged liquid in a two-phase flow.

[0051] Optionally, the air knife opening 26 is radially outward relative to the inner surface of the fluid handling structure 12. High-velocity gas supply through the air knife opening 26 can assist in confining the immersion liquid within the immersion space 11. The supplied gas may be humid and may substantially comprise carbon dioxide. A gas recovery opening 28 for recovering the gas supplied through the air knife opening 26 extends radially outward from the air knife opening 26.

[0052] For example, other openings leading to the atmosphere, a gas source, or a vacuum may exist in the bottom surface of the fluid processing structure 12, i.e., in the surface of the fluid processing structure 12 facing the substrate W. Figure 2aExamples of such optional additional openings 50 are shown in dashed lines on the right. As shown, the additional openings 50 can be supplied or extracted by a supply or extraction member indicated by a double-headed arrow. For example, if configured as a supply member, the additional opening 50 can be connected to a liquid supply or gas supply member as any of the supply members. Alternatively, if configured as an extraction member, the additional opening 50 can be used to extract fluid and can be connected, for example, to the atmosphere or a gas source or a vacuum. For example, at least one additional opening 50 can exist between the air knife opening 26 and the gas recovery opening 28 and / or between the restraint opening 32 and the air knife opening 26.

[0053] Figure 2a Two different versions of the fluid handling structure 12 on the left and right sides restrain the constricted fluid surface 33. Due to the fixed position of the restraining opening 32, Figure 2a Version of the fluid handling structure 12 on the right can restrain the curved surface 33 at a position that is substantially fixed relative to the final element 100. Figure 2a The version of the fluid processing structure 12 on the left can restrain the meniscus 33 below the recovery opening 25, and thus the meniscus 33 can move along the length and / or width of the recovery opening 25. For the radiation beam B to be guided to the entire side of the substrate W under exposure, the substrate support WT supporting the substrate W is moved relative to the projection system PS. To maximize the output of the substrate W exposed by the lithography equipment, the substrate support WT (and therefore the substrate W) is moved as quickly as possible. However, there is a critical relative velocity (often referred to as the critical scan velocity) beyond which the meniscus 33 between the fluid processing structure 12 and the substrate W becomes unstable. An unstable meniscus 33 has a significant risk of the immersion liquid being lost, for example, in the form of one or more droplets. Furthermore, an unstable meniscus 33 has a significant risk of causing the immersion liquid to include air bubbles, especially when the immersion liquid is restricted to the edges of the substrate W.

[0054] Droplets present on the surface of substrate W can impose thermal loads and can be sources of defects. Droplets can evaporate, leaving dry spots; droplets can move, transporting contaminants such as particles; droplets can collide with larger bodies immersed in liquid, introducing bubbles into the larger bodies; and droplets can evaporate, thus imposing thermal loads on the surface they reside on. If this surface is associated with the positioning of components of the lithography apparatus relative to the substrate W being imaged, such thermal loads can be a cause of deformation and / or a source of positioning errors. Droplet formation on the surface is therefore undesirable. To avoid such droplet formation, the speed of the substrate support WT is thus limited to a critical scan speed at which the meniscus 33 remains stable. This situation limits the throughput of the lithography apparatus.

[0055] Figure 2aThe left side of the fluid processing system may include a spring 60. The spring 60 may be an adjustable passive spring configured to apply a bias force to the fluid processing structure 12 in the direction of the substrate W. Therefore, the spring 60 can be used to control the height of the fluid processing structure 12 above the substrate W. Such an adjustable passive spring is described in US 7,199,874, which is incorporated herein by reference in its entirety. Other biasing devices using electromagnetic force, for example, may also be suitable. Although the spring 60 is... Figure 2a The left side is shown, but it is optional and does not need to be combined with the left side. Figure 2a Other features on the left side are included together. Spring 60 is not shown in any of the other figures, but may also be included with respect to... Figure 2a , Figure 2b , Figure 2c or Figure 2d Other variations of the fluid handling system described are also included.

[0056] Figure 2b Two different versions of the fluid handling structure 12 are shown on its left and right sides, which allow the meniscus 33 to move relative to the final element 100. The meniscus 33 can move in the direction of the moving substrate W. This reduces the relative velocity between the meniscus 33 and the moving substrate W, which may result in improved stability and a reduced risk of the meniscus 33 breaking. Increasing the velocity of the substrate W from the meniscus 33 breaking allows the substrate W to move faster below the projection system PS. Therefore, production capacity is increased.

[0057] Figure 2b The one shown is Figure 2a All common features share the same component symbols. The fluid handling structure 12 has an inner surface that complements the conical surface of the truncated conical shape. The bottom surface of the fluid handling structure 12 is closer to the facing surface than the flat bottom surface of the truncated conical shape.

[0058] Immersion liquid is supplied to the immersion space 11 through supply openings 34 formed in the inner surface of the fluid handling structure 12. The supply openings 34 are positioned toward the bottom of the inner surface, possibly below the bottom surface of the truncated conical shape. The supply openings 34 are positioned around the inner surface and spaced apart around the path of the radiation beam B.

[0059] Submerged liquid is recovered from the immersion space 11 through a recovery opening 25 in the bottom surface of the fluid processing structure 12. As the facing surface moves below the fluid processing structure 12, the meniscus 33 can migrate above the surface of the recovery opening 25 in the same direction as the moving facing surface. The recovery opening 25 can be formed of a porous component. Submerged liquid can be recovered in a single-phase flow. Submerged liquid can also be recovered in a two-phase flow. The two-phase flow is received in a chamber 35 within the fluid processing structure 12, where the two-phase flow is separated into liquid and gas. Liquid and gas are recovered from chamber 35 through separate channels 36, 38.

[0060] The inner periphery 39 of the bottom surface of the fluid handling structure 12 extends away from the inner surface into the immersion space 11 to form a plate 40. The inner periphery 39 forms a small aperture that can be sized to match the shape and size of the radiation beam B. The inner periphery 39 can define a slit 400 through which the radiation beam B can pass. The plate 40 can be used to isolate the immersion liquid on both sides therefrom. The supplied immersion liquid flows inward toward the aperture, flows through the internal aperture, and then flows radially outward toward the surrounding recovery opening 25 below the plate 40.

[0061] The fluid handling structure 12 can be divided into two parts, such as Figure 2b As shown on the right: an inner portion 12a and an outer portion 12b. The inner portion 12a and the outer portion 12b can move relative to each other primarily in a plane parallel to the facing surface. The inner portion 12a may have a supply opening 34 and an overflow recovery member 24. The outer portion 12b may have a plate 40 and a recovery opening 25. The inner portion 12a may have an intermediate recovery member 42 for recovering submerged liquid flowing between the inner portion 12a and the outer portion 12b.

[0062] Figure 2b The two different versions of the fluid handling structure thus allow the meniscus 33 to move in the same direction as the substrate W, thereby enabling faster scanning speeds and increased throughput for lithography equipment. However, the meniscus 33 in Figure 2b The migration velocity above the surface of the recovery opening 25 in the fluid processing structure 12 on the left can be slow. This is achieved by moving the outer portion 12b relative to the inner portion 12a and the final element 100. Figure 2b The fluid handling structure 12 on the right side allows the meniscus 33 to move relatively quickly. However, it may be difficult to control the intermediate recovery element 42 to ensure that sufficient immersion fluid is provided between the inner part 12a and the outer part 12b to prevent contact between the parts.

[0063] Figure 2cTwo different versions of the fluid handling structure 12 are shown on its left and right sides, which can be used to restrain the meniscus 33 of the immersed liquid to the fluid handling structure 12, as described above. Figure 2a and / or Figure 2b As described. Figure 2c The one shown is Figure 2a and / or Figure 2b All shared features share the same component symbols.

[0064] The fluid handling structure 12 has an inner surface complementary to the conical surface of the truncated conical shape. The bottom surface of the fluid handling structure 12 is closer to the facing surface than the flat bottom surface of the truncated conical shape. Immersion liquid is supplied to the immersion space 11 through openings formed in the surface of the fluid handling structure 12. Immersion liquid can be supplied through supply opening 34 in the inner surface of the fluid structure 12. Alternatively or additionally, immersion liquid can be supplied through supply opening 20 in the inner surface of the fluid structure 12. Alternatively or additionally, immersion liquid can be supplied through the lower supply opening 23. Immersion liquid can be recovered by extraction members, for example via recovery opening 21 and / or overflow recovery member 24 formed in the inner surface and / or one or more openings in the surface of the fluid handling structure 12 described below.

[0065] Figure 2c Two different versions of the fluid handling structure 12 on the left and right sides restrain the meniscus 33. Since the position of the recovery opening 32a is fixed, Figure 2c Version of the fluid handling structure 12 on the right can restrain the curved surface 33 at a position that is substantially fixed relative to the final element 100. Figure 2c The version of the fluid handling structure 12 on the left can restrain the meniscus 33 below the recovery opening 25, and thus the meniscus 33 can move along the length and / or width of the recovery opening 25.

[0066] As mentioned above Figure 2b As described, the inner periphery of the bottom surface of the fluid handling structure 12 can extend away from the inner surface into the immersion space 11 to form a plate 40, as shown on the left. As described above, this can form a small hole and isolate the immersion liquid on both sides and / or allow the immersion liquid to flow inward toward the hole, flow through the internal hole, and then radially outward toward the surrounding recovery opening 25 below the plate 40. Although in Figure 2cThis feature is shown on the left side, but its combination with other features shown is optional. Preferably, as shown on the left, the immersion liquid is supplied to the immersion space 11 through a supply opening 34 formed in the inner surface of the fluid handling structure 12. The supply opening 34 is positioned toward the bottom of the inner surface, possibly below the bottom surface of the truncated conical shape. The supply openings 34 are positioned around the inner surface and spaced apart around the path of the radiation beam B. Alternatively or additionally, the immersion liquid can be supplied through a supply opening 20 in the inner surface of the fluid structure 12. Alternatively or additionally, the immersion liquid is supplied through a lower supply opening 23. While the supply opening 34 is the preferred liquid supply element, any combination of supply opening 34, supply opening 20, and / or lower supply opening 23 can be provided.

[0067] like Figure 2c As shown on the left, the fluid handling system may include the fluid handling structure 12 described above and another device 3000. The fluid handling structure 12 may have extraction components, such as a recovery opening 25, and liquid supply openings, such as a lower supply opening 23. It should be understood that the fluid handling structure 12 may include, regarding Figure 2a left side Figure 2a The right side Figure 2b left side Figure 2b The right side or (as described below) Figure 2c The right side describes any configuration that can be combined with another device 3000.

[0068] Another device 3000 may also be referred to as a droplet trap. The other device 3000 is provided to reduce the presence of liquid on the surface of the substrate W after the fluid handling structure 12 has moved above the surface. The other device 3000 may include a liquid supply member 3010 and at least one extraction member 3020. The at least one extraction member 3020 may be formed in a plane surrounding the at least one supply member 3010. The at least one liquid supply member 3010 may be configured to supply another liquid to a space 3110 between at least a portion of the other device 3000 and the surface of the substrate W. The other device 3000 may be configured to recover at least some of the liquid via the at least one extraction member 3020. The other device 3000 may be used to combine any liquid remaining on the surface of the substrate W with the liquid in the space 3110, and then use the other device 3000 to extract the liquid, thereby reducing the amount of liquid remaining on the surface of the substrate W.

[0069] Another device 3000 in Figure 2c The device shown is separate from the fluid processing structure 12. Another device 3000 may be located adjacent to the fluid processing structure 12. Alternatively, the other device 3000 may be part of the fluid processing structure 12, i.e., integral with the fluid processing structure.

[0070] Another device 3000 can be configured to supply liquid to space 3110, the liquid being separated from the liquid supplied by fluid handling structure 12.

[0071] Alternatively or concurrently, the fluid handling structure 12 may have the following characteristics: Figure 2c The components shown on the right. More specifically, the fluid processing structure 12 may include at least one liquid supply member, two extraction members (e.g., recovery openings 32a and 32b), and two gas supply members (e.g., gas supply openings 27a and 27b) formed on the surface of the fluid processing structure 12. Gas supply opening 27a may be omitted; that is, it is optional. At least one liquid supply member may be connected to or formed with the lower supply opening 23 or supply opening 20 in the bottom surface of the fluid processing structure 12 described above, or in relation to... Figure 2b The liquid supply opening 34 on the inner surface of the fluid processing structure 12 described on the left is the same. Liquid supply components, extraction components, and gas supply components can be formed on the surface of the fluid processing structure 12. Specifically, these components can be formed on the surface of the fluid processing structure 12 facing the substrate W, i.e., on the bottom surface of the fluid processing structure 12.

[0072] At least one of the two extraction components may include a porous material 37. The porous material 37 may be disposed within an opening, such as a recovery opening 32a, through which the fluid processing structure 12 extracts fluid from below and can recover the submerged liquid in a single-phase flow. The other of the two extraction components, such as a recovery opening 32b, may act as a two-phase extractor to recover the submerged fluid. The porous material 37 does not need to be flush with the bottom surface of the fluid processing structure 12.

[0073] Specifically, the fluid processing structure 12 may include a liquid supply member (e.g., a lower supply opening 23), a first extraction member (e.g., a recovery opening 32a) radially outward from the liquid supply member, a first gas supply member (e.g., a gas supply opening 27a) radially outward from the first extraction member, a second extraction member (e.g., a recovery opening 32b) radially outward from the first gas supply member, and a second gas supply member (e.g., a gas supply opening 27b) radially outward from the second extraction member. Similar to... Figure 2a Other openings, such as those leading to the atmosphere, a gas source, or a vacuum, may be present in the bottom surface of the fluid handling structure 12, as previously described (regarding the fluid handling structure 12).

[0074] For example, at least one other opening (not shown) may be provided in the bottom surface of the fluid handling structure 12. This other opening is optional. The other opening may be arranged between the first extraction member (e.g., recovery opening 32a) and the first gas supply member (e.g., gas supply opening 27a), as described in the above arrangement. Alternatively or additionally, the other opening may be arranged between the second extraction member (e.g., recovery opening 32b) and the second gas supply member (e.g., gas supply opening 27b), as described in the above arrangement. This other opening may be the same as the other opening 50 described above.

[0075] Optionally, the fluid processing structure 12 includes a recess 29. The recess 29 may be disposed between the recovery opening 32a and the recovery opening 32b, or between the gas supply opening 27a and the recovery opening 32b. The shape of the recess 29 around the fluid processing structure 12 may be uniform and may optionally include an inclined surface. When the recess 29 is disposed between the recovery opening 32a and the recovery opening 32b, the gas supply opening 27b may be disposed on the inclined surface, such as... Figure 2c As shown in the diagram. With the groove 29 positioned between the supply opening 27a and the recovery opening 32b, the gas supply opening 27b can be positioned on an inclined surface or on a portion of the bottom surface of the fluid processing structure 12 parallel to the surface of the substrate W. Alternatively, the shape of the groove 29 can vary around the circumference of the fluid processing structure 12. The shape of the groove 29 can be varied to alter the effect of the gas supplied from the gas supply member on the fluid below the fluid processing structure 12.

[0076] Figure 2d Two different versions of the fluid handling structure 12 are shown in its left and right halves. Figure 2d The left half of the fluid handling structure 12 includes: a liquid injection buffer 41a that holds a buffered amount of immersion liquid; and a liquid injection port 41 that supplies immersion liquid from the liquid injection buffer 41a to the immersion space 11. An internal liquid recovery port 43, located outside the liquid injection port 41, is provided with an internal recovery buffer 43a containing a porous component for guiding liquid. Similar to the description of... Figure 2c The groove 29 described is located outside the internal liquid recovery port 43. Outside the groove 29, a gas guiding groove 44 is located in the lower surface of the fluid handling structure 12, and an external recovery port 44a leads to the gas guiding groove. The external recovery port 44a guides the two-phase recovery flow to an external recovery buffer 44b, which is also provided with a porous component. The outermost part is a gas sealing port 45, which connects the gas sealing buffer volume 45a to the space below the fluid handling structure 12 to provide an airflow to include the submerged liquid.

[0077] Figure 2d The right half of the fluid processing structure 12 has a liquid supply opening 20 in its internal inclined surface. On the lower side of the fluid processing structure 12, there are (from inside to outside) extraction openings 25, a first air knife opening 26a, a second air knife opening 26b, and a third air knife opening 26c, each with a porous member 37. Each of these openings leads to a groove providing a buffer volume in the lower side of the fluid processing structure 12. The outermost part of the fluid processing structure 12 is stepped to provide a larger spacing between the fluid processing structure 12 and the substrate W.

[0078] Figures 2a to 2d Examples of different configurations that can be used as parts of a fluid handling system are shown. It should be understood that the examples provided above refer to specific extraction and recovery components, but not necessarily to exact types of extraction and / or recovery components. In some cases, different terms are used to indicate the location of components, but can provide the same functional characteristics. Examples of extraction components mentioned above include recovery opening 21, overflow recovery element 24, recovery opening 25 (which may include a perforated plate and / or chamber 35), gas recovery opening 28, restraint opening 32, recovery opening 32a, recovery opening 32b, and / or intermediate recovery element 42. Examples of supply components mentioned above include supply opening 20, lower supply opening 23, air knife opening 26, gas supply opening 27a, gas supply opening 27b, and / or supply opening 34. Generally, extraction components used for extracting / recovering fluids, liquids, or gases can be interchanged with at least any of other examples of fluid, liquid, or gas extraction / recovery components used respectively. Similarly, the supply member for supplying fluid, liquid, or gas can be interchanged with at least one of other examples used for supplying fluid, liquid, or gas respectively. The extraction member can extract / recover fluid, liquid, or gas from space by being connected to a negative pressure that draws the fluid, liquid, or gas into the extraction member. The supply member can supply fluid, liquid, or gas to space by being connected to a relevant supply unit.

[0079] According to the present invention, a fluid handling system is provided, comprising a fluid handling structure configured to confine liquid at least partially within an immersion space between a final optical element and a substrate.

[0080] For reference Figures 2a to 2d The fluid processing system mentioned includes a fluid processing structure that confines immersion fluid within an immersion space 11 between the final element 100 and the substrate W. During the photolithography process, the substrate W moves relative to the fluid processing structure 12.

[0081] As the substrate W moves relative to the fluid handling system, the loss of immersion fluid from the immersion space 11 and the formation of bubbles in the immersion fluid can become exacerbated. To prevent the loss of immersion fluid from the immersion space 11, an air knife is typically provided surrounding the immersion space 11. To prevent the formation of bubbles in the immersion fluid, a gas supply is typically provided surrounding the air knife.

[0082] Fluid handling structures typically include an air knife surrounding the immersion space 11. Typically, the air knife is configured to pass through multiple openings, such as those previously described in... Figure 2a and Figure 2d The air knife openings 26, 26a, 26b, and 26c described herein blow gas onto the substrate W. This is done primarily to prevent or minimize fluid loss onto the substrate W, and secondly to prevent or minimize the formation of air bubbles in the immersion fluid by isolating the immersion fluid from the surrounding atmosphere. The surrounding atmosphere can be air, i.e., it can include nitrogen and oxygen. Sometimes, a gas supply is provided surrounding the air knife. The gas supply is configured to pass through multiple openings, such as those previously described in... Figure 2c The gas supply opening 27b described herein blows gas onto the substrate W to further isolate the immersion fluid from the atmosphere surrounding the fluid handling structure 12.

[0083] When the substrate W moves relative to the fluid processing structure 12, the substrate W has a regressive side and a forward side. The regressive side of the substrate W is the portion of the substrate W that moves away from the center of the immersion space 11, and the forward side of the substrate W is the portion of the substrate that moves towards the center of the immersion space 11. This also means that when the fluid processing structure 12 moves relative to the substrate W, the fluid processing structure 12 has a regressive side and a forward side. In this case, the regressive side of the fluid processing structure is the portion of the fluid processing structure that moves towards the center of the immersion space 11, and the forward side is the portion of the fluid processing structure that moves away from the center of the immersion space 11.

[0084] It is necessary to isolate the submerged fluid from the surrounding atmosphere. The gas flow requirements on the forward and backward sides of the fluid handling structure may differ (e.g., the gas flow rate on one side may need to be higher than that on the other).

[0085] For example, bubble formation in the immersion fluid may be more pronounced on the advancing side of the fluid processing structure than on the retreating side. By providing airflow to the periphery of the immersion space 11, the immersion space 11 is isolated from the surrounding atmosphere, and the likelihood of gas forming bubbles in the surrounding atmosphere is reduced. It is anticipated that increasing the gas flow rate through the air knife will further reduce bubble formation. However, increasing the gas flow rate on the advancing side of the air knife does not result in a significant reduction in bubble formation and leads to an unnecessary increase in gas usage. Furthermore, increasing the gas flow rate on the advancing side of the air knife may cause droplets of the immersion fluid to be swept up and pushed forward along the leading edge of the fluid processing structure 12, which is undesirable. Therefore, it is preferable to reduce the flow rate of the air knife through the advancing side of the fluid processing structure. Therefore, instead, it has been proposed to provide a gas supply separate from the air knife to provide further isolation from the atmosphere.

[0086] Immersion fluid loss during substrate W movement may be exacerbated on the retreating side of the fluid processing structure relative to the advancing side. Increasing the gas flow rate through the air knife is expected to further reduce immersion fluid loss on the retreating side. However, without separately controlling the gas flow rates through the air knife on the retreating and advancing sides, increasing the gas flow rate through the air knife on the retreating side also results in a simultaneous increase in the gas flow rate on the advancing side of the air knife. This does not lead to a significant reduction in immersion fluid loss and results in an unnecessary increase in gas usage. Furthermore, as described above, reducing the flow rate through the air knife on the advancing side further reduces droplet buildup. However, if the flow rate through the air knife is reduced, the air knife may not be able to provide sufficient isolation of the immersion space 11 from the surrounding atmosphere on the retreating side. Therefore, if the flow rate through the air knife is reduced in view of the problems identified above, the flow rate through the gas supply should be increased to provide sufficient isolation of the immersion space 11 from the outside air.

[0087] The mention of increasing / decreasing the gas flow rate on the forward / reverse side of the air knife / gas supply means increasing / decreasing the gas flow rate through the forward / reverse side of the fluid processing structure relative to the reverse / forward side of the fluid processing structure.

[0088] Therefore, there are challenging issues in managing gas flow through the air knife and gas supply unit.

[0089] For reference Figure 3 and Figure 4 It schematically depicts a fluid handling system including a fluid handling structure. Figure 3 and Figure 4The fluid processing structure shown includes multiple air knife chambers 501, 502. For simplicity, in the detailed description, air knife chambers 501, 502 may be referred to as "air knives". Air knife chambers 501, 502 include at least: a first air knife chamber 501, which includes at least one opening 508 radially outward from the immersion space 11; and a second air knife chamber 502, which includes at least one opening 518 radially outward from the immersion space 11. The second air knife chamber 502 is fluid-separated from the first air knife chamber 501, such that the airflow exiting from the opening 508 of the first air knife chamber 501 may be different from the airflow exiting from the opening 518 of the second air knife chamber 502. In an alternative embodiment, different airflows toward the advancing and retreating sides of the air knife can be achieved by a single air knife compartment extending around the immersion space 11, the air knife compartment having multiple gas lines connected to different locations around the air knife compartment, the gas lines being configured to supply gas to the air knife compartment (not shown). For example, a first gas line may be connected to a first location and a second gas line may be connected to a second location. The multiple gas lines (e.g., the first gas line and the second gas line) may be configured to deliver the same gas or may be configured to deliver different gases. The locations may be arranged equidistantly from each other around the circumference of the immersion space 11. In an example, the first gas line may be positioned opposite the second gas line relative to the center of the immersion space 11. The multiple gas lines may include other gas lines, such as a third gas line, a fourth gas line, etc. When at least two of the multiple gas lines supply different gases (e.g., air and carbon dioxide, respectively), the partial pressures of the various gases will vary around the air knife compartment. When all the multiple gas lines supply the same gas, the pressure of the gas around the air knife compartment can vary. Therefore, airflow control around the circumference of the immersion space 11 can be achieved.

[0090] According to this disclosure, a plurality of air knife chambers extend around the circumference of the immersion space 11. A first air knife chamber 501 may extend around half of the circumference of the immersion space 11, and a second air knife chamber 502 may extend around the other half of the circumference of the immersion space 11. In embodiments, gaps or intervals may exist between the first air knife chamber 501 and the second air knife chamber 502. The fluid processing structure may include a slit 400 that allows a radiation beam B to pass through to reach the surface of the substrate W, wherein the air knife chambers are configured to provide gas over a portion defining the slit 400 of the fluid processing structure.

[0091] Each of the air knife compartments 501 and 502 is in fluid communication with an air knife chamber (not shown) via an air knife variable flow valve. The first air knife compartment 501 is in fluid communication with the air knife chamber via a first air knife variable flow valve 503, and the second air knife compartment 502 is in fluid communication with the air knife chamber via a second air knife variable flow valve 504. The air knife chamber is configured to supply gas to the air knife compartments 501 and 502. The gas flow rate through each compartment 501 and 502 may differ due to the gas being supplied to each air knife compartment 501 and 502 via variable flow valves 503 and 504. Although Figure 3 The gaps between the first air knife compartment 501 and the second air knife compartment 502 and between the first gas supply compartment 601 and the second gas supply compartment 602 are shown, but gaps may not be provided. The air knife compartments 501 and 502 are fluidly isolated from each other, and the gas supply compartments 601 and 602 are fluidly isolated from each other, but gaps need not be provided (the compartments may be fluidly isolated by means of, for example, walls).

[0092] The fluid handling system also includes multiple gas supply compartments 601, 602. For the sake of brevity, in the detailed description, gas supply compartments 601, 602 may be referred to as "gas supply components". Gas supply compartments 601, 602 include at least a first gas supply compartment 601 and a second gas supply compartment 602.

[0093] The first gas supply compartment 601 includes at least one opening 608 radially outwardly positioned relative to the first air knife compartment 501. The first air knife compartment 501 is disposed between the first gas supply compartment 601 and the immersion space 11.

[0094] The second gas supply compartment 602 includes at least one opening 618 radially outwardly positioned relative to the second gas knife compartment 502. The second gas knife compartment 502 is disposed between the second gas supply compartment 602 and the immersion space 11. The second gas supply compartment 602 is fluidly separated from the first gas supply compartment 601.

[0095] Each of the gas supply compartments 601 and 602 is in fluid communication with a gas supply chamber (not shown) via gas supply variable flow valves 603 and 604. The first gas supply compartment 601 is in fluid communication with the gas supply chamber via the first gas supply variable flow valve 603, and the second gas supply compartment 602 is in fluid communication with the gas supply chamber via the second gas supply variable flow valve 604. By supplying gas to each gas supply compartment 601 and 602 via the variable flow valves 603 and 604, the gas flow rate through each compartment 601 and 602 may be different.

[0096] The gas flow rate through each of the variable flow valves 503, 504, 603, and 604 can be set by a variable flow valve controller (not shown). Therefore, the gas flow rate from the gas knife chambers 501 and 502 and the gas supply chambers 601 and 602 can be controlled by controlling the variable flow valves 503, 504, 603, and 604.

[0097] When the first air knife chamber 501 and the first gas supply chamber 601 are on the rearward side of the fluid handling structure, the variable flow valve controller is configured to set the gas flow rate through the first air knife chamber 501 to be higher than the flow rate through the second air knife chamber 502, and the variable flow valve controller is also configured to set the flow rate through the first gas supply chamber 601 to be lower than the flow rate through the second air knife chamber 602. Therefore, the gas flow rate through each of the air knife chambers 501, 502 and the gas supply chambers 601, 602 can be controlled independently of each other. Thus, the problems described above are reduced or eliminated.

[0098] When the substrate W moves in the reverse direction and the second air knife chamber 502 and the second gas supply chamber 602 are on the retracted side of the fluid processing structure, the variable flow valve controller can change the gas flow rate through each of the air knife chambers 501, 502 and the gas supply chambers 601, 602, such that the air knife flow rate on the retracted side of the fluid processing structure is higher than the flow rate on the forward side and the gas supply flow rate on the retracted side is lower than the flow rate on the forward side. The variable flow valve controller can change the flow rate through each chamber 501, 502, 601, 602 according to the movement of the substrate W, for example, according to the direction and / or rate of movement of the substrate W.

[0099] One end of the first air knife channel 505 is connected to the air knife chamber and the other end is divided into a second air knife channel 507 and a third air knife channel 506, such that the second air knife channel 507 is connected to the first air knife compartment 501, wherein the first air knife variable flow valve 503 is disposed between the two ends of the second air knife channel, and the third air knife channel 506 is connected to the second air knife compartment 502, wherein the second air knife variable flow valve 504 is disposed between the two ends of the third air knife channel.

[0100] One end of the first gas supply channel 605 is connected to a gas supply chamber (not shown), and the other end splits into a second gas supply channel 607 and a third gas supply channel 606. The second gas supply channel 607 is connected to the first gas supply compartment 601, wherein a first gas supply variable flow valve 603 is disposed between the two ends of the second gas supply channel 607. The third gas supply channel 606 is connected to the second gas supply compartment 602, wherein a second gas supply variable flow valve 604 is disposed between the two ends of the third gas supply channel 606.

[0101] Therefore, gas is supplied from the air knife chamber to all air knife compartments 501, 502, and the flow rate through each of the air knife compartments 501, 502 is regulated by air knife variable flow valves 503, 504. Gas is supplied from the gas supply chamber to all gas supply compartments 601, 602, and the flow rate through each of the gas supply compartments 601, 602 is regulated by gas supply variable flow valves 603, 604. The air knife chamber is configured to output gas flow at a maximum flow rate of 200 Nl / min (standard liters per minute). The gas supply chamber is configured to output gas flow at a maximum flow rate of 200 Nl / min (standard liters per minute). The gas flow provided by the air knife chamber is supplied to the air knife compartments. The gas flow provided by the gas supply chamber is supplied to the gas supply compartments. For example, in an embodiment having two air knife compartments (a first air knife compartment 501 and a second air knife compartment 502), the flow rate through each of the air knife compartments can be up to 100 Nl / min. For example, in an embodiment having two gas supply compartments (a first gas supply compartment 501 and a second gas supply compartment 502), the flow rate through each of the gas supply compartments can be up to 100 Nl / min.

[0102] Figure 3 The diagram shows air knife compartments 501 and 502 forming a circular shape, and gas supply compartments 601 and 602 forming a circular shape. (See diagram for reference.) Figure 4 As shown in the plan view of the fluid processing structure, the shape formed by compartments 501, 502, 601, and 602 can be substantially square. However, the shape is not limited to this and can be any shape.

[0103] Figure 5 A cross-section of a portion of the fluid handling system according to the invention is shown. A first air knife compartment 501 is disposed between a first gas supply compartment 601 and an immersion space 11. Figure 5 The relative positions of the first air knife compartment 501 and the first gas supply compartment 601 are shown. In an embodiment having two air knife compartments and two gas supply compartments, Figure 5 The same arrangement also applies to the second air knife compartment 502 and the second gas supply compartment 602 at different cross-sections of the fluid handling system, which are omitted for simplicity. The air knife compartments 501 and 502 are configured to supply gas supplied by the air knife chamber (not shown) to the periphery of the immersion space 11. The gas supply compartments 602 and 602 are configured to supply gas supplied by the gas supply chamber (not shown) to the periphery of the gas supplied by the air knife chamber. (See from...) Figure 5As can be seen, gas is supplied from the first gas knife chamber 501 and gas is supplied from the first gas supply chamber 601, toward the substrate W. This disclosure provides several embodiments having multiple gas knife chambers (e.g., first gas knife chamber 501, second gas knife chamber 502, third gas knife chamber 509, fourth gas knife chamber 510, etc.). Any of the possible arrangements of the gas knife chambers disclosed herein can be incorporated into... Figure 5 The fluid handling system shown in the figure.

[0104] The fluid treatment system, including the fluid treatment structure, may further include a third air knife compartment 509 and a fourth air knife compartment 510, the compartments having features corresponding to the first air knife compartment 501 and the second air knife compartment 502, such as, for example Figure 7 As shown in the figure. The fluid handling structure may also include a third gas supply compartment 609 and a fourth gas supply member 610, which have features corresponding to the first gas knife compartment 601 and the second gas knife compartment 609, such as, for example Figure 8a and Figure 8b As shown in the diagram. The fluid handling structure may also include additional air knife compartments and gas supply compartments.

[0105] Figure 7 , Figure 8a and Figure 8b The embodiment of the fluid processing structure shown illustrates a fluid processing structure having four vertices separated by four sides. Figure 7 , Figure 8a and Figure 8b The air knife compartments 501, 502, 509, 510 and / or the gas supply compartments 601, 602, 609, 610 are configured such that each air knife compartment 501, 502, 509, 510 and / or each gas supply compartment 601, 602, 609, 610 covers one side of the fluid processing structure. In an embodiment, the spacing of the fluid separation air knife compartments 501, 502, 509, 510 and / or the gas supply compartments 601, 602, 609, 610 is exposed at the apex of the fluid processing structure. Other arrangements of the air knife compartments 501, 502, 509, 510 and / or the gas supply compartments 601, 602, 609, 610 are possible without departing from the scope of the invention. Reference Figures 18 to 21 Other possible arrangements of air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 in the fluid handling structure are described. Each of the plurality of air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 may be connected to a corresponding gas supply unit, optionally via a variable flow valve (not shown).

[0106] Figure 6An alternative embodiment of a fluid handling system including a fluid handling structure is shown, the fluid handling structure comprising four air knife chambers 501, 502, 509, and 510. Air knife variable flow valves 511, 512, 513, and 514 each control the gas flow rate supplied to two adjacent air knife chambers; for example, the gas flow rate through the first air knife chamber 501 is controlled by setting the flow rate through air knife variable flow valves 511 and 512. Figure 6 The embodiment shown also includes one-way flow valves 511a to 511b, 512a to 512b, 513a to 513b, and 514a to 514b fluidly disposed between the air knife variable flow valves 511, 512, 513, 514 and the air knife compartments 501, 502, 509, 510, which allow gas to flow in only one direction and prevent gas from flowing in the opposite direction.

[0107] In other words, gas is allowed to flow from the air knife variable flow valve 511 toward the third air knife compartment 509 and the first air knife compartment 501, and not in the opposite direction. Gas is allowed to flow from the air knife variable flow valve 512 toward the first air knife compartment 501 and the second air knife compartment 502, and not in the opposite direction. Gas is allowed to flow from the air knife variable flow valve 513 toward the second air knife compartment 502 and the fourth air knife compartment 510, and not in the opposite direction. Gas is allowed to flow from the air knife variable flow valve 514 toward the fourth air knife compartment 510 and the third air knife compartment 509, and not in the opposite direction.

[0108] For example, one-way flow valves 511a and 511b are respectively disposed between variable flow valve 511 and the first air knife chamber 509 and the third air knife chamber 501; one-way flow valves 512a and 512b are respectively disposed between variable flow valve 512 and the first air knife chamber 501 and the second air knife chamber 502; one-way flow valves 513a and 513b are respectively disposed between variable flow valve 513 and the second air knife chamber 502 and the fourth air knife chamber 510; one-way flow valves 514a and 514b are respectively disposed between variable flow valve 514 and the fourth air knife chamber 510 and the third air knife chamber 509. According to this example, when variable flow valve 512 is actuated, airflow is provided to the first air knife chamber 501 and the second air knife chamber 502 via one-way flow valves 512a and 512b, respectively. The one-way flow valve 512a prevents gas from flowing from the first air knife chamber 501 toward the variable flow valve 512, and also prevents gas from flowing from the first air knife chamber 501 toward the adjacent second air knife chamber 502. However, other components may be provided that allow the airflows provided by the two variable flow valves 511, 512, 513, 514 to be combined.

[0109] According to this embodiment, the gas flow rate through the gas knife chambers 501, 502, 509, and 510 can be dynamically controlled during the movement of the substrate W. In the example, two variable flow valves (e.g., variable flow valves 512 and 514) relative to the gas knife chambers are controlled during substrate movement (e.g., based on...). Figure 7 The variable flow valves 511 and 513 remain active during substrate movement (i.e., in the +y or -y direction) and control the remaining variable flow valves 511 and 513 based on the substrate W's direction of movement (e.g., in the +y or -y direction). Alternatively, for substrate movement in the x direction, the variable flow valves 511 and 513 remain active during substrate movement in the x direction and set the flow rate through the variable flow valves 512 and 514 depending on whether the substrate W moves in the +x or -x direction. Thus, improved gas flow management can be provided for substrate W moving in two dimensions (i.e., in the x and y directions) during photolithography. The gas flow rate through the gas knife chambers 501, 502, 509, and 510 can be dynamically controlled based on other parameters, such as the position of the substrate W and / or the fluid handling system.

[0110] Although Figure 6 The examples in the text refer to air knife compartments 501, 502, 509, and 510, but this configuration can be implemented with a gas supply compartment.

[0111] Figure 7 An alternative embodiment is shown, wherein each of the four air knife chambers 501, 502, 509, 510 is respectively connected to an air knife variable flow valve. According to this embodiment, the gas flow rate through each air knife chamber 501, 502, 509, 510 can be individually controlled by each air knife-carryable flow valve. The flow rate can be controlled based on the movement of the substrate W to prevent the problems mentioned above.

[0112] Figure 8a It is a schematic diagram of a fluid handling structure including air knife compartments 501, 502, 509, 510 and gas supply compartments 601, 602, 609, 610.

[0113] Figure 8b This is a schematic illustration of a fluid handling structure that also includes liquid supply compartments 701, 702, 709, and 710. The liquid supply compartments 701, 702, 709, and 710 are configured to provide an additional liquid flow to the immersion space 11. The liquid may be water. For improved clarity of the figures, [the following is a continuation of the previous paragraph]. Figure 8a and Figure 8bThe variable flow control valves are omitted; however, the airflow to each of the air knife supply chambers 501, 502, 510, and 511, the airflow to each of the gas supply chambers 601, 602, 610, and 611, and the liquid flow to each of the gas-liquid supply chambers 701, 702, 710, and 711 are supplied by corresponding variable flow valves. The flow rate can be controlled based on the movement of the substrate W to prevent the problems mentioned above.

[0114] The fluid processing structure includes air knife chambers 501, 502, 509, 510 and / or gas supply chambers 601, 602, 609, 610 configured to supply gas to the periphery of the immersion space 11. The fluid processing structure includes at least one slit 400 (more generally, it may be referred to as an opening) for a path of a radiation beam B, the slit allowing the radiation beam B to pass through and reach the surface of the substrate W, and the air knife chambers 501, 502, 509, 510 and / or the gas supply chambers 601, 602, 609, 610 are configured to supply gas over a portion of the fluid processing structure defining at least one opening for the radiation beam B. Any of the fluid processing structures described herein may be provided with a slit 400. Although the slit 400 is not shown in... Figures 3 to 4 , Figures 6 to 1 1. Figures 13 to 14 In the fluid processing structures illustrated in Figure 17, however, these fluid processing structures may have a slit 400 incorporated therein. The slit 400 allows the radiation beam B to pass through and reach the surface of the substrate W, and multiple gas knife chambers 501, 502, 509, 510 and / or gas supply chambers 601, 602, 609, 610 can be configured to supply gas over a portion of the fluid processing structure defining the slit 400. Alternatively, another gas may be supplied over a portion of the fluid processing structure not defining the slit 400 (e.g., as shown in the reference). Figures 18 to 21 (as described in the embodiments).

[0115] According to some embodiments, another gas, such as air, may be provided above a portion of the fluid processing structure that is not defined by the slit 400. This other gas may have a lower carbon footprint than, for example, carbon dioxide, but is suitable for confining the immersion liquid within the immersion space 11. The size of each of a plurality of air knife chambers may be selected based on the size of the slit 400. It is preferable to provide a gas such as carbon dioxide only in a portion of the defined slit 400 of the immersion space 11 (and optionally, above a portion of the immersion space 11 located near the slit 400). For example, the size of the air knife chamber and / or gas supply chamber used to provide carbon dioxide above the defined slit 400 of the fluid processing structure may be selected so that carbon dioxide is adequately supplied to the slit 400 without supplying it to other portions of the fluid processing structure. For example, in Figure 18 , Figure 19 , Figure 20 and Figure 21 In the middle, the first air knife compartment 521 and the second air knife compartment 522 (and Figure 19 The sizes of the seventh air knife compartment 527 and the eighth air knife compartment 528 are such that a gas (such as carbon dioxide) is supplied to the region of the immersion space 11 in which the radiation beam B is incident on the substrate W. In other words, the first air knife compartment 521 and the second air knife compartment 522 can extend around the immersion space 11 such that they supply gas to the area of ​​the immersion space 11 covering the slit 400. The third air knife compartment 523 and the fourth air knife compartment 524 (and Figure 19 The fifth air knife compartment 525 and the sixth air knife compartment 526 in the immersion space 11 may extend around the portion of the immersion space 11 not covered by the first air knife compartment 521 and the second air knife compartment 522, such that they may provide another gas to the area of ​​the immersion space 11 not defined by the slit 400.

[0116] Multiple air knife chambers may extend around the circumference of the immersion space 11, defining a shape comprising four vertices separated by four sides, each of the air knife chambers being disposed along at least one of the four sides and optionally along one or more vertices. In embodiments, the shape defined by the air knife chambers may differ. The shape defined by the air knife chambers can be any suitable shape and is not limited to those shapes shown in the figures; for example, the shape may have more than four sides and / or the sides may be curved.

[0117] Embodiments of the present invention having a fluid processing structure may include rounded corners (not shown) at the vertices, the fluid processing structure defining a shape comprising four vertices separated by four sides. Alternatively, the shape defined by the fluid processing structure may have a greater number of sides and / or the sides may be curved (not shown). In embodiments, the shape defined by a plurality of air knives of the fluid processing structure may be substantially circular or circular (not shown).

[0118] In such Figure 3 and Figure 4 In the example embodiment shown, the first air knife chamber 501 extends around half of the circumference of the immersion space 11, and the second air knife chamber 502 extends around the other half of the circumference of the immersion space. Similarly, the first gas supply chamber 601 extends around half of the circumference of the immersion space 11, and the second gas supply chamber 602 extends around the other half of the circumference of the immersion space 11.

[0119] In such Figures 18 to 21In the example embodiment shown, the first air knife chamber 521 and the second air knife chamber 522 are disposed opposite each other relative to the center of the immersion space 11, and the first air knife chamber 521 and the second air knife chamber 522 extend around a portion of the immersion space 11. In this embodiment, the fluid processing structure further includes a third air knife chamber 523 and a fourth air knife chamber 524 disposed between the first air knife chamber 521 and the second air knife chamber 522, the third air knife chamber 523 and the fourth air knife chamber 524 being connected to another gas chamber configured to supply another gas; optionally, the gas includes carbon dioxide and the other gas includes air; optionally, the air knife includes an additional air knife chamber configured to supply a gas or another gas.

[0120] Figures 2a to 2d The fluid handling system shown can be implemented with multiple air knife chambers 501, 502, 509, 510 and gas supply chambers 601, 602, 609, 610, such that the gas flow rate from each chamber 501, 502, 509, 510, 601, 602, 609, 610 can be individually adjusted based on the movement of the substrate W. Figures 2a to 2d The fluid handling system shown can be implemented with another arrangement (such as, Figures 18 to 21 Multiple air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 (as shown in the configuration).

[0121] The air knife chamber can be configured to supply substantially pure carbon dioxide (CO2) through at least one opening 508, 518 of each of the corresponding air knife compartments 501, 502, 509, 510. The gas supply chamber can be configured to supply substantially pure CO2 through at least one opening 608, 618 of each of the corresponding gas supply compartments 601, 602, 609, 610. Alternative gases are supplied by either the air knife chamber or the gas supply chamber. The gases supplied by the air knife chamber and the gas supply chamber can be different. When the immersion fluid is water, CO2 can be selected as the gas supplied by the air knife compartments 501, 502, 509, 510 and the gas supply compartments 601, 602, 609, 610. CO2 has a higher solubility in water than oxygen or nitrogen (which can be abundant in the atmosphere surrounding the immersion space 11). By providing isolation of the immersion space 11 from atmospheric CO2, the likelihood of bubble formation is further reduced. This is because if CO2 bubbles form in the submerged fluid, the bubbles may dissolve in the submerged fluid. When the submerged fluid is a fluid other than water, CO2 can be selected as the supply gas.

[0122] exist Figure 7 , Figure 8a and Figure 8bIn this embodiment, the air knife includes air knife chambers 501, 502, 509, and 510, and / or the gas supply unit includes gas supply chambers 601, 602, 609, and 610. These chambers are configured to surround the immersion space 11 in a quadrilateral (square) shape, with each of the air knife chambers 501, 502, 509, and 510 and / or each of the gas supply chambers 601, 602, 609, and 610 arranged along one side of the shape. In other words, the illustrated air knife and / or gas supply unit is square, with the spacing between each air knife chamber 501, 502, 509, and 510 and / or each gas supply chamber 601, 602, 609, and 610 positioned at the vertices of the square.

[0123] However, other configurations of the air knife and / or gas supply unit are possible. Other locations of the intervals between the different air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 are possible. For example, the intervals can be positioned at the center of each side of the air knife and / or gas supply unit, such that each air knife compartment 501, 502, 509, 510 and / or each gas supply compartment 601, 602, 609, 610 has an L-shape (not shown). In other words, each compartment can be configured to cover the apex and the portion of each side adjacent to the apex. However, the intervals do not necessarily need to be positioned at the center of the side of the fluid processing structure (e.g., they can be provided off-center). In another embodiment, more than four air knife compartments and / or four gas supply compartments may exist. Possible arrangements of the air knife and / or gas supply unit include four L-shaped air knife compartments and / or gas supply compartments disposed at the apex of the air knife and / or gas supply unit, wherein straight air knife compartments and / or gas supply compartments are respectively disposed between the L-shaped air knife compartments and / or gas supply compartments. The air knife compartments and / or gas supply compartments need not be straight and are flexible. Although the "apex" of the air knife and / or gas supply unit is mentioned, the air knife and / or gas supply unit need not include sharp corners and instead has rounded edges. In other words, the air knife and / or gas supply unit can have any suitable shape extending around at least a portion of the immersion space 11, and the air knife and / or gas supply unit can be divided into multiple compartments of any suitable shape.

[0124] Figure 9An additional embodiment is shown, including a pressure reservoir 550 fluidly connected to each air knife compartment and configured to provide additional airflow pulses to the corresponding air knife compartment. The additional airflow pulses are provided by actuating the additional airflow via pulse valves 503a, 504a. In an embodiment with two air knife compartments, a control unit (not shown) is configured to, in response to a determination that the edges of the substrate W intersect with the pressure reservoir 550, respectively, the first air knife compartment 501 and the second air knife compartment 502 connected to the pressure reservoir 550, cause at least one of the pressure reservoirs 550 to provide additional airflow pulses to the respectively connected first air knife compartment 501 and second air knife compartment 502. At least one pressure reservoir 550 may also be connected to an additional air knife compartment. The pressure reservoir 550 may be connected to one or more of a plurality of air knife compartments, including a first air knife compartment 501, a second air knife compartment 502, a third air knife compartment 509, and a fourth air knife compartment 510 (the third air knife compartment 509 and the fourth air knife compartment 510 are in...). Figure 9 (not shown in the image) and any other air knife compartments present.

[0125] According to this disclosure, improved management of gas flow helps mitigate the problems outlined above, such as droplet buildup, bubble formation in the immersion fluid (also referred to as the immersion liquid), and other issues. Furthermore, improved management of gas flow can lead to more efficient resource utilization, which can reduce any negative environmental impacts of the fluid handling system. This improved management can be particularly advantageous if the gas used to at least partially confine the immersion liquid within the immersion space 11 between the final element 100 and the substrate W has a relatively high carbon footprint compared to other abundant gases. A carbon footprint is an indicator that can be used to compare the total amount of greenhouse gases generated by an activity or product. While a fluid handling system that at least partially confines the immersion liquid within the immersion space 11 between the final element 100 and the substrate W and / or the substrate support WT is mentioned, the fluid handling system may also completely confine the immersion liquid within the immersion space 11 between the final element 100 and the substrate W and / or the substrate support WT.

[0126] For example, the gas used to confine the submerged liquid at least partially within the submerged space 11 may include carbon dioxide, which can have a higher carbon footprint than air. Therefore, more efficient gas management could lead to a reduction in the carbon footprint of the fluid handling system.

[0127] refer to Figure 10a , Figure 10b , Figure 11a and Figure 11b Alternative embodiments of fluid handling systems are described to mitigate or prevent some of the problems discussed above.

[0128] As previously discussed, managing gas flow presents challenges due to the opposing gas flow requirements on the forward and backward sides of a fluid handling structure. According to an alternative embodiment of the invention, a fluid handling system is provided that can mitigate the problem of immersion fluid loss on the backward side of a fluid handling structure and prevent droplet accumulation on the forward side of the fluid handling structure.

[0129] A schematic plan view of this embodiment is shown in Figure 10a and Figure 10b superior.

[0130] According to this embodiment, the fluid processing system includes a fluid processing structure configured to at least partially confine liquid within an immersion space between a final element 100 and a substrate W and / or a substrate support WT. The fluid processing structure includes: a first air knife chamber 501, the first air knife chamber including at least one opening (not shown) radially outward from the immersion space; and a second air knife chamber 502, the second air knife chamber including at least one opening radially outward from the immersion space. The openings of the corresponding air knife chambers are not shown in... Figure 10a , Figure 10b , Figure 11a and Figure 11b middle.

[0131] The second air knife compartment 502 is fluidly separated from the first air knife compartment 501, allowing the airflow from the first air knife compartment 501 and the second air knife compartment 502 to be independent of each other. The first air knife passage 800 is fluidly connected to the first air knife compartment 501 and fluidly connected to the second air knife compartment 502, and is configured to supply a first gas (labeled as gas 1) to the first air knife compartment 501 and / or the second air knife compartment 502.

[0132] The first air knife channel 800 may be fluidly connected to a first gas source, such as a tank containing a pressurized first gas or a main supply unit for the first gas. The first gas may be, for example, air, such as very clean dry air (XCDA), very clean humidified air (XCHA), or nitrogen.

[0133] The second air knife passage 900 is fluidly connected to both the first air knife compartment 501 and the second air knife compartment 502, and is configured to supply a second gas (labeled as gas 2) to the first air knife compartment 501 and / or the second air knife compartment 502. The second air knife passage 900 may be fluidly connected to a second gas source, such as a tank containing pressurized gas or a main supply unit for the second gas. The second gas may be, for example, carbon dioxide or other gases readily soluble in the immersion liquid.

[0134] The switching valve 801 is configured to variably direct the flow of the first gas from the first air knife passage 800 to the first air knife chamber 501 only, or to the second air knife chamber 502 only, or to both the first air knife chamber 501 and the second air knife chamber 502. The switching valve 801 in... Figure 10a , Figure 10b , Figure 11a and Figure 11b The symbol marked O / C indicates that the valve is open or closed. Figure 11a and Figure 11b The second switching valve 901 may include any features described in conjunction with the switching valve 801.

[0135] Therefore, the switching valve 801 can guide the flow of the first gas from the first air knife passage 800 to the first air knife compartment 501 via the first conduit 800a, or via the second conduit 800b to the second air knife compartment 502, or both. For example, the switching valve 801 can be configured to proportionally divert the flow of the first gas from the air knife passage 800 to the first conduit 800a and the second conduit 800b. For example, the switching valve 801 can guide any proportion of the first gas between 0% and 100% to the first conduit 800a, with the remaining gas being guided to the second conduit 800b. For example, when 100% of the first gas is guided to the first conduit 800a, 0% is guided to the second conduit 800b; when 70% of the gas is guided to the first conduit 800a, 30% of the gas is guided to the second conduit 800b. When the switching valve 801 changes the proportion of gas guided to the first conduit 800a and the second conduit 800b (e.g., in…), Figure 10a neutralization Figure 10b When switching between the states shown, it can be advantageous to change the flow rate gradually rather than abruptly. This prevents shock waves from propagating through the first gas.

[0136] The first conduit 800a and the third conduit 900a are fluidly connected to form the first connector conduit 1000a. The first connector conduit 1000a is fluidly connected to the first air knife chamber 501. Therefore, the gas flow rate supplied to the first air knife chamber 501 is the sum of the first gas flow rate through the first conduit 800a and the second gas flow rate through the third conduit 900a. As a result, the mixed gas supplied to the first air knife chamber 501 is a mixture of the first gas and the second gas.

[0137] The second gas passage 900 is configured to supply gas to the first air knife chamber 501 via the third conduit 900a and to the second air knife chamber 502 via the fourth conduit 900b.

[0138] The second pipe 800b and the fourth pipe 900b are fluidly connected to form the second connector pipe 1000b. The second connector pipe 1000b is fluidly connected to the second air knife chamber 502.

[0139] When the switching valve 801 is configured to prevent gas flow to the second pipe 800b, the gas flow rate supplied to the first air knife chamber 501 corresponds to the flow rate of the second gas in the third pipe 900a and the flow rate of the first gas in the first pipe 800a. When the switching valve 801 is configured to prevent gas flow to the second pipe 800b, the gas flow rate supplied to the second air knife chamber 502 corresponds to the flow rate of the second gas in the fourth pipe 900b. This schematically illustrates... Figure 10a middle.

[0140] When the switching valve 801 is configured to prevent gas flow to the first pipe 800a, the gas flow rate supplied to the first air knife chamber 501 corresponds to the flow rate of the second gas in the third pipe 900a. When the switching valve 801 is configured to prevent gas flow to the first pipe 800a, the gas flow rate supplied to the second air knife chamber 502 corresponds to the flow rate of the first gas in the second pipe 800b and the flow rate of the second gas in the fourth pipe 900b.

[0141] During the movement of the substrate W relative to the fluid handling system, the first gas knife chamber 501 can be positioned on the retreating side of the fluid handling structure. In this case, the switching valve 801 can be configured to direct the flow of the first gas only to the first gas knife chamber 501. This may result in a higher gas flow rate from the first gas knife chamber 501 than from the second gas knife chamber 502, because both the first and second gases are supplied to the first gas knife chamber 501 and only the second gas is supplied to the second gas knife chamber 502. Therefore, a higher gas flow rate can be provided on the retreating side to reduce immersion fluid loss. The gas flow rate on the advancing side can be kept relatively low to prevent droplet accumulation.

[0142] The first air knife compartment 501 and the second air knife compartment 502 are fluidly isolated from each other, such that when the switching valve 801 is configured to restrict the flow of the first gas to the first air knife compartment 501, the first gas cannot enter the second air knife compartment 502 via the third pipe 900a, the fourth pipe 900b, and the second connector pipe 1000b. This can be achieved by means of one-way flow valves (not shown) disposed in the first pipe 800a, the second pipe 80b, the third pipe 90a, the fourth pipe 90b, the first connector pipe 1000a, and the second connector pipe 1000b, such that airflow is allowed only from the first air knife passage 800 and the second air knife passage 900 to the air knife compartments 501 and 502, and not in the opposite direction.

[0143] Figure 10aAn embodiment is shown with the first air knife chamber 501 on the retracted side of the fluid processing structure and the second air knife chamber 502 on the advancing side of the fluid processing structure. In this case, the fluid processing structure is considered stationary and the substrate W moves relative to the fluid processing structure in the positive y-direction, that is, the substrate W is in Figure 10a The fluid processing structure moves upward relative to the substrate W. In other words, the fluid processing structure can be considered to move in the negative y-direction relative to the substrate W. In this case, the switching valve 801 directs the flow of the first gas only to the first gas knife chamber 501 and provides a higher gas flow rate on the rearward side of the fluid processing structure. Figure 10a and Figure 10b In the image, airflow is indicated by a thick line including an arrow. Figure 10a In the example above, there is no airflow through the second conduit 800b. The switching valve 801 can allow some airflow through the second conduit 800b. For example, the switching valve 801 can allow a low flow rate of gas to flow into the conduit, which supplies gas to the air knife compartment located on the forward side of the fluid handling structure (e.g., it would be...). Figure 10a (Air knife compartment 502 in the middle).

[0144] Figure 10b An embodiment is shown with the second air knife chamber 502 on the retracted side of the fluid processing structure and the first air knife chamber 501 on the advancing side of the fluid processing structure. In this case, the fluid processing structure is considered stationary and the substrate W moves relative to the fluid processing structure in the negative y-direction, i.e., the substrate W moves in... Figure 10b The fluid processing structure moves downwards relative to the substrate W. In other words, the fluid processing structure can be considered to move in the positive y-direction relative to the substrate W. In this case, the switching valve 801 directs the flow of the first gas only to the second gas knife chamber 502, and provides a higher gas flow rate on the rearward side of the fluid processing structure. Figure 10b In the example above, there is no airflow through the first conduit 800a. The switching valve 801 can allow some airflow through the second conduit 800b. For example, the switching valve 801 can allow a low flow rate of gas to flow into the conduit, which supplies gas to the air knife compartment located on the forward side of the fluid handling structure (e.g., it would be...). Figure 10b (Air knife compartment 501 in the middle).

[0145] In one embodiment, a first air knife chamber 501 extends around a first portion of the circumference of the immersion space, and a second air knife chamber 502 extends around a second portion of the circumference of the immersion space. Figure 10a , Figure 10b , Figure 11a and Figure 11bThis means that the immersion space is located within the space defined by the first air knife chamber 501 and the second air knife chamber 502. In an embodiment, the first air knife chamber 501 and the second air knife chamber 502 are not concentric. In an embodiment, the first air knife chamber 501 and the second air knife chamber 502 do not overlap.

[0146] In an embodiment, the switching valve 801 is configured to direct a flow of the first gas from the first gas knife channel 800 to either the first gas knife chamber 501 or the second gas knife chamber 502, or both, based on the direction of movement of the substrate W. Therefore, as described above, a higher gas flow rate can be provided to the rearward side of the fluid processing structure at any time during its movement.

[0147] Alternatively, the switching valve 801 can direct a proportional flow of the first gas to the first air knife chamber 501 and the second air knife chamber 502, such that the airflow from each chamber is identical. Alternatively, the switching valve 801 can direct the airflow to the air knife chamber located on the forward side of the fluid processing structure, so that a higher gas flow rate can be provided to the forward side of the fluid processing structure if needed.

[0148] In an embodiment, during substrate W movement, the switching valve 801 is configured to direct the flow of the first gas from the first gas knife channel 800 to the first gas knife compartment 501 only when the first gas knife compartment 501 is on the retracted side of the fluid processing structure, and the switching valve 801 is configured to direct the flow of the first gas from the first gas knife channel 800 to the second gas knife compartment 502 only when the second gas knife compartment 502 is on the retracted side of the fluid processing structure. The switching valve 801 may be configured such that it does not allow gas to flow from the first gas knife channel 800 to the plurality of gas knife compartments. For example, the switching valve 801 may switch only between two states, wherein a first state allows gas flow only through the first gas knife compartment 501 and a second state allows gas flow only through the second gas knife compartment 502. In an alternative embodiment that allows gas flow through both gas knife compartments 501, 502, the switching valve 801 may have other intermediate states.

[0149] The switching valve 801 can be set and controlled by a control unit (or controller).

[0150] According to another embodiment of the present invention, Figure 11a and Figure 11b Illustration.

[0151] according to Figure 11a and Figure 11b In the embodiment shown above, the switching valve 801 is a first switching valve 801, and the fluid handling system further includes a second switching valve 901, the second switching valve being configured to control the flow of the second gas (in... Figure 11a and Figure 11b The gas 2) is guided from the second air knife channel 900 to the first air knife compartment 501 or the second air knife compartment 502, or the first air knife compartment 501 and the second air knife compartment 502.

[0152] Therefore, the gas flow control of the second gas can be similar to that of the reference. Figure 10a and Figure 10b The method of controlling the gas flow of the first gas described is implemented.

[0153] The second switching valve 901 may include some or all of the features described in the reference switching valve 801 or the first switching valve 801.

[0154] Therefore, the second switching valve 901 can guide the flow of the second gas from the second air knife passage 900 to the first air knife compartment 501 via the third pipe 900a, or via the second pipe 900b to the second air knife compartment 502, or both.

[0155] During the movement of the substrate W relative to the fluid processing system, the second switching valve 901 can be configured to direct the flow of the second gas from the second air knife channel 900 to the first air knife chamber 501 only when the first air knife chamber 501 is on the forward side of the fluid processing structure, and the second switching valve 901 is configured to direct the flow of the second gas from the second air knife channel 900 to the second air knife chamber 502 only when the second air knife chamber 502 is on the forward side of the fluid processing structure.

[0156] exist Figure 11a In the diagram, airflow is indicated by thick lines and thick arrows. Figure 11a In the example, the first switching valve 801 is in a state that only allows the first gas to flow into the first gas knife compartment 501. Figure 11a An embodiment is shown with the first air knife chamber 501 on the retracted side of the fluid processing structure and the second air knife chamber 502 on the advancing side of the fluid processing structure. In this case, if the fluid processing structure is considered stationary and the substrate W moves relative to the fluid processing structure in the positive y direction, that is, the substrate W is... Figure 11a The fluid processing structure moves upward relative to the substrate W. In other words, the fluid processing structure can be considered as moving in the negative y-direction relative to the substrate W.

[0157] exist Figure 11a In the example, the second switching valve 901 is in a state that only allows the second gas to flow into the second air knife chamber 502. This operating mode can be used when the first air knife chamber 501 is on the retracted side of the fluid processing structure and the second air knife chamber 502 is on the forward side of the fluid processing structure. Figure 11bAn embodiment is shown with the first air knife chamber 501 on the retracted side of the fluid processing structure and the second air knife chamber 502 on the advancing side of the fluid processing structure. In both cases, if the fluid processing structure is considered stationary and the substrate W moves relative to the fluid processing structure in the positive y-direction, i.e., the substrate W is... Figure 11a and Figure 11b The fluid processing structure moves upward relative to the substrate W. In other words, the fluid processing structure can be considered as moving in the negative y-direction relative to the substrate W.

[0158] The direction of movement of the substrate W can be changed during the photolithography process, which means that the gas flow requirements of the fluid processing structure on the advancing and retreating sides of the fluid processing structure can be opposite.

[0159] The first switching valve 801 can switch the direction of the permissible flow of the first gas, allowing the first gas to flow into the second air knife chamber 502 but preventing it from flowing into the first air knife chamber 501. The second switching valve 901 can switch the direction of the permissible flow of the second gas, allowing the second gas to flow into the first air knife chamber 501 but preventing it from flowing into the second air knife chamber 502. Figure 11b The first switching valve 801 and the second switching valve 901 can be switched simultaneously. For example, when the first air knife chamber 501 is in the retracted position, in Figure 11a The flow of the first and second gases is schematically illustrated with thick arrows, and the fluid handling system can be switched to [specific direction] when the substrate W direction is changed. Figure 11b The configuration on the substrate W can be determined in response to the switching orientation of the substrate W. The state of each valve 801, 901 can be set and controlled by the control unit (or controller).

[0160] The first gas knife channel 800 can be configured to output a flow of the first gas at a maximum flow rate of 200 Nl / min (standard liters per minute) or preferably in the range of 50 to 150 Nl / min (standard liters per minute). The second gas knife channel 900 can be configured to output a flow of the first gas at a maximum flow rate of 200 Nl / min (standard liters per minute) or preferably in the range of 100 to 150 Nl / min (standard liters per minute). The flow rate of each chamber can be varied to facilitate different gas flows from each of the gas knife chambers. It may be necessary to adjust the flow rate from the gas knife chambers based on the settings of the lithography process (such as substrate velocity). For example, the system can be configured such that the gas knife chamber on the retreating side of the fluid processing structure outputs a mixed gas through its opening at a rate of 90 standard liters per minute, and the gas knife chamber on the advancing side of the fluid processing structure outputs a second gas or mixed gas through its opening at a rate of 60 standard liters per minute.

[0161] The solubility of the first gas in the immersion fluid can be lower than that of the second gas. Therefore, the second gas may lead to a reduction in bubble formation in the immersion fluid. This is because any bubbles of the second gas can dissolve faster than bubbles of the first gas. Providing a flow of the second gas on the side of the substrate W where bubble formation can be intensified can be advantageous. The immersion fluid can be water.

[0162] The first gas may include gases that do not have negative environmental impacts; for example, it may be a gas with a low carbon footprint. The first gas may include air.

[0163] The second gas can include carbon dioxide. Carbon dioxide can have a higher carbon footprint than air. Therefore, it can be advantageous to avoid the unnecessary use of a second gas to reduce the carbon footprint of the photolithography process.

[0164] Therefore, providing a high flow rate of first gas on the rear side of the fluid handling structure can provide effective isolation to prevent immersion liquid loss while maintaining a low carbon footprint.

[0165] The second gas can be a gas that provides insulation to prevent the formation of bubbles in the submerged fluid. In some embodiments, the second gas may have a higher carbon footprint than the first gas. This advanced gas flow management allows sufficient insulation to prevent fluid loss while maintaining a low carbon footprint because the additional gas insulation required to prevent submerged fluid loss is provided by the first gas, which has a lower carbon footprint.

[0166] The bubble formation rate on the advancing side of the fluid processing structure can be higher than that on the retreating side. The size of the bubbles formed on the advancing side of the fluid processing structure can also be larger than that formed on the retreating side. Therefore, isolating the immersion fluid on the advancing side of the fluid processing structure with a second gas is most advantageous.

[0167] On the retreating side of the fluid handling structure, the rate of submerged fluid loss can be greater than on the advancing side. The solubility of the gas in the submerged fluid does not necessarily affect the prevention of submerged fluid loss. Submerged fluid loss can be effectively prevented by providing a sufficient gas flow rate.

[0168] In view of the above-mentioned problems, the second gas can confine the immersion liquid to the advancing side of the fluid processing structure during movement, while the first gas can be used on the retreating side of the fluid processing structure. Therefore, the second gas is provided only around a portion of the circumference of the immersion space, while the first gas can be provided to the remaining portion of the circumference of the immersion space. When compared to known fluid processing systems that provide the second gas around the entire circumference of the immersion space, the total carbon footprint of the photolithography process can be reduced.

[0169] Other gases can be selected as the first gas and / or the second gas. The first gas and the second gas can be switched such that the first gas includes carbon dioxide and the second gas includes air.

[0170] For reference Figure 7 , Figure 8a and Figure 8b As discussed herein, the arrangement of the plurality of air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 around the immersion space 11 may vary without departing from the scope of the invention. Various arrangements of the air knife compartments 501, 502, 509, 510 and / or gas supply compartments 601, 602, 609, 610 may be incorporated into the references. Figures 3 to 15 The fluid handling system described. In other words, refer to... Figures 3 to 15 The air knife compartments 501, 502, 509, 510 and the gas supply compartments 601, 602, 609, 610 of the described embodiments may surround the immersion space 11 in various configurations disclosed herein.

[0171] Figure 18 An alternative arrangement of four air knife compartments surrounding the immersion space 11 is shown. This embodiment may include a first air knife channel 800 configured to supply a first gas and a second air knife channel 900 configured to supply a second gas. Figure 18 (Not shown in the image).

[0172] According to an embodiment, the fluid processing system including the fluid processing structure includes a first air knife chamber 521, a second air knife chamber 522, a third air knife chamber 523, and a fourth air knife chamber 524.

[0173] The first air knife compartment 521 and the second air knife compartment 522 can be connected to the second air knife channel 900 (which can be configured to supply carbon dioxide), and optionally connected to the second air knife channel 900 via a corresponding variable flow valve.

[0174] The third air knife compartment 523 and the fourth air knife compartment 524 can be connected to the first air knife channel 800 (which can be configured to supply air), and optionally connected to the first air knife channel 800 via corresponding variable flow valves.

[0175] The first air knife compartment 521 and the second air knife compartment 522 can be arranged opposite each other with respect to the center of the immersion space 11. The third air knife compartment 523 and the fourth air knife compartment 524 can be arranged between the first air knife compartment 521 and the second air knife compartment 522.

[0176] The fluid handling structure may include a slit 400 that allows the radiation beam B to pass from the projection system PS through to the substrate surface. Bubbles formed at the edge of the immersion space 11 may enter the central portion of the immersion space 11, including the portion of the immersion space 11 below the slit 400. The presence of bubbles below the slit 400 can be particularly detrimental to the lithography process because the bubbles may interfere with the radiation beam B. Regions where bubbles are prevented from entering the immersion space 11 and traveling the radiation beam B may be particularly preferred. It is preferable to reduce the use of gases with high carbon footprints to reduce the carbon footprint of the lithography process.

[0177] The air knife compartment can be arranged such that a second gas (such as carbon dioxide) is provided to a portion of the defined slit 400 of the fluid processing structure, and optionally, a first gas (such as air) is provided over a portion of the fluid processing structure that is not defined by the slit 400.

[0178] The size of the air knife compartment can be selected based on the size of the slit 400. For example, the first air knife compartment 521 and the second air knife compartment 522 can have a width equal to or greater than the width of the slit 400 (along...). Figures 18 to 21 Width (measured along the x-direction) Figures 18 to 21 (Measured in the x-direction). This is advantageous when the substrate W moves relative to the fluid processing structure in an orthogonal direction (i.e., in the y-direction) because the gas supplied by the first air knife chamber 521 and / or the second air knife chamber 522 is supplied across the width of the slit 400. In some embodiments, the substrate W can move in a direction parallel to the width of the slit 400, for example, in the x-direction. In such a case, the x-direction can be used. Figure 19 The fluid processing structure shown has a seventh air knife compartment 527 and an eighth air knife compartment 528. The seventh air knife compartment 527 and the eighth air knife compartment 528 may have a height equal to or greater than the slit 400 (along...). Figure 19 The height (measured along the y-direction) in the middle Figure 19 (Measured in the y-direction). This is advantageous when the substrate W moves relative to the fluid processing structure in a parallel direction (i.e., in the x-direction) because the gas supplied by the seventh gas knife chamber 527 and / or the eighth gas knife chamber 528 is supplied across the height of the slit 400. In all these embodiments, the dimensions of the third gas knife chamber 523 and the fourth gas knife chamber 524 (and the fifth gas knife chamber 525 and the sixth gas knife chamber 526 (if relevant)) can be selected such that a first gas (e.g., air) is provided over a portion of the fluid processing structure that does not define the slit 400. Thus, a second gas (such as carbon dioxide) can be provided to cover a portion of the defined slit 400 of the fluid processing section 12. The dimensions of the slit 400 referred to in this invention are the width and height of the slit 400 in a plan view of the fluid processing structure 12.

[0179] According to an embodiment of the present invention, the first air knife compartment 521, the second air knife compartment 522, the third air knife compartment 523 and the fourth air knife compartment 524 are configured to cover the corresponding apex of the air knife and at least a portion of the side surface adjacent to the corresponding apex.

[0180] The vertex of an air knife is the corner formed by the two sides of the air knife. For example, when the air knife is shaped like a square, rectangle, rhombus, or kite in a plan view, the corners of the shape correspond to the four vertices of the air knife. When the two sides of the air knife meet to form a circular portion, the vertex is defined as the point of the circular portion furthest from the center of the air knife.

[0181] The vertices covered by the first air knife chamber 521 and the second air knife chamber 522 can define lines. During the photolithography process, the substrate W can move substantially parallel to the lines defined by the vertices.

[0182] A second gas (such as carbon dioxide) can be provided to the portion of the fluid processing structure defined by the first air knife chamber 521 and the second air knife chamber 522. A second gas (such as air) can be provided to the portion of the fluid processing structure defined by the third air knife chamber 523 and the fourth air knife chamber 524. Therefore, the second gas can be provided to the area of ​​the immersion space 11 where bubble prevention is most desired, i.e., the area located below the slit 400. The third air knife chamber 523 and the fourth air knife chamber 524, configured to provide the first gas (such as air), provide an airflow that confines the immersion liquid within the immersion space 11 while reducing the carbon footprint of the fluid processing structure.

[0183] The first gas may be air or another gas suitable for confining the immersion liquid within the immersion space 11 and having a relatively low carbon footprint. The second gas may be carbon dioxide or another gas with high solubility in the immersion liquid.

[0184] The second gas knife channel 900 can provide a flow of the second gas to the first gas knife chamber 521 and the second gas knife chamber 522, and optionally, the first gas knife channel 800 is configured to supply air and / or the second gas knife channel 900 is configured to supply carbon dioxide. In an embodiment, during the photolithography process, only the second gas (e.g., carbon dioxide) can be provided to the advance side of the substrate W, where bubble prevention can be most critical. Therefore, the second gas can be provided to the first gas knife chamber 521 and the first gas can be provided to the second gas knife chamber 522, the third gas knife chamber 523, and the fourth gas knife chamber 524 (when the first gas knife chamber 521 is on the advance side). This schematic illustration is shown in Figure 20 Arrow A indicates the possible movement of the substrate W relative to the fluid processing structure. The gas supplied to the compartment can vary depending on the direction of movement.

[0185] In one embodiment, each of the third gas knife chamber 523 and the fourth gas knife chamber 524 may be connected by a variable flow valve (not shown). This enables variable gas flow, which can be advantageous during the movement of the substrate W.

[0186] The airflow can be adjusted as described with reference to Figures 10 and 11. That is, the first air knife chamber 521 and the second air knife chamber 522 can be configured such that the second gas is provided only on the backward side of the substrate W during substrate movement.

[0187] According to an embodiment, the plurality of air knife chambers may include other air knife chambers, such as Figure 19 The example shown above. These air knife compartments can be arranged such that a second gas (such as carbon dioxide) is provided to the area of ​​the defined slit 400 of the fluid processing structure, and optionally, a first gas (such as air) is provided above a portion of the fluid processing structure that is not defined by the slit 400.

[0188] In one embodiment, the fluid handling system further includes a fifth air knife chamber 525 and a sixth air knife chamber 526, each optionally connected to the first air knife passage 800 via a corresponding variable flow valve (not shown). In the embodiment (such as...), Figure 19 As shown in the figure, the air knife compartment connected to the first gas supply channel 800 is disposed along the side of the fluid processing structure. The embodiment also includes a seventh air knife compartment 527 and an eighth air knife compartment 528, each optionally connected to the second air knife channel 900 via corresponding variable flow valves (not shown).

[0189] Each of the first air knife compartment 521, the second air knife compartment 522, the seventh air knife compartment 527, and the eighth air knife compartment 528 can be configured to cover the corresponding vertex of the air knife and at least a portion of the adjacent side adjacent to said vertex, and each of the third air knife compartment 523, the fourth air knife compartment 524, the fifth air knife compartment 525, and the sixth air knife compartment 526 can be configured to cover the corresponding side of the air knife between the vertices.

[0190] The dimensions of each of the first air knife chamber 521, second air knife chamber 522, third air knife chamber 523, fourth air knife chamber 524, fifth air knife chamber 525, sixth air knife chamber 526, seventh air knife chamber 527, and eighth air knife chamber 528 can be selected such that a second gas is provided above a portion defining the slit 400 of the fluid processing structure 12. For example, the dimensions can be selected such that a second gas (e.g., carbon dioxide) is provided above a portion of the fluid processing structure that does not define the slit 400 (and is not aligned with the slit 400 during relative movement of the substrate W with the fluid processing structure 12), and a first gas (e.g., air) is provided above a portion of the fluid processing structure 12 that does not define the slit 400 (and is not aligned with the slit 400 during relative movement of the substrate W with the fluid processing structure 12). Selecting the dimensions of each of the plurality of air knife chambers in this way can reduce the carbon footprint of the fluid processing structure 12 because it is preferable to provide the second gas to the portion of the fluid processing structure 12 where the importance of preventing bubble formation is relatively high (i.e., the portion defined by the slit 400). For example, refer to Figures 18 to 21 The size of the air knife chamber is selected such that the substrate W and the fluid processing structure 12 are aligned in the y-direction (and for... Figure 19 During the relative movement (also in the x direction), a second gas is provided above the area defined by slit 400 and to the periphery of said area.

[0191] The airflow through each of the air knife chambers can be based on the direction of movement of the substrate W. If the fluid processing structure moves relative to the substrate W in a forward or backward direction at any of its vertices, a second gas (such as carbon dioxide) can be supplied above the slit 400 for the radiation beam B. For example, if the substrate W is in Figure 19 If the center moves to the left or right, the seventh air knife chamber 527 and / or the eighth air knife chamber 528 can supply gas above the slit 400.

[0192] The gas flow rate can be controlled so that the total gas flow rate on the backward side of substrate W can be higher than that on the forward side of substrate W.

[0193] According to an embodiment, other air knife compartments can be provided concentrically with the air knife compartment arranged to surround the immersion space 11. These concentric air knife compartments can be connected to gas supplies different from those of the concentric air knife compartments, allowing for additional control over the composition and flow rate of the gas supplied above portions of the fluid handling structure.

[0194] For example, Figure 21 Showing something similar Figure 19The fluid processing structure shown is an example of a fluid processing structure, except that it provides two concentric air knife chambers 522a and 522b instead of a second air knife chamber 522. The inner second air knife chamber 522a is connected to a second gas supply channel 900, and the outer second air knife chamber 522b is connected to a first gas supply channel 800. The gas flow rate through each of these channels can be adjusted to provide optimal gas flow velocity and composition. The dimensions of the concentric chambers can be varied such that a flow of second gas is provided above a portion of the slit 400 defining the fluid processing structure. For example, the dimensions of the two concentric air knife chambers 522a and 522b can be selected such that a second gas can be provided above the area defined by the slit 400, for example, based on the above description for... Figures 18 to 21 The slit width described is 400.

[0195] Any one of the multiple air knife compartments can be equipped with another concentric air knife compartment.

[0196] In an alternative embodiment, different airflows to different areas of the immersion space 11 can be achieved by a single air knife compartment extending around the immersion space 11, the air knife compartment having multiple gas lines connected to different parts around the air knife compartment.

[0197] For example, instead of multiple air knife chambers providing fluid separation, a reference can be achieved with a single air knife chamber. Figures 18 to 21 The described possible airflow patterns include a single air knife compartment comprising multiple gas lines connected thereto. During relative movement, controlling the type and pressure of the gas supplied by each of the gas lines can provide an airflow, such as carbon dioxide, above a defined slit 400 portion of the fluid processing structure 12, and air above a portion of the fluid processing structure not defined by the slit 400 / not aligned with the slit.

[0198] Those skilled in the art will understand that the first air knife channel 800 and the second air knife channel 900 may include a thermal control unit (not shown). The thermal control unit may be arranged to control the temperature of the gas supplied by channels 800, 900 before reaching the air knife compartments 501, 502. The thermal control unit may be arranged upstream or downstream of valves 801, 901.

[0199] As previously referenced Figure 2a As described, the fluid handling structure 12 may include a lower supply opening 23 configured to supply immersion liquid to the immersion space 11. The fluid handling structure 12 may include other openings configured to supply immersion liquid to the immersion space 11 (such as...). Figure 2a The supply opening 20 shown in the figure Figure 2b The supply opening 34 is shown in the figure. The fluid handling structure 12 may also include an extraction component (such as, for example, Figure 2cThe recycling openings 32a and / or 32b shown in the diagram, and / or for example... Figure 2a The gas recovery opening 28 and / or restraint opening 32 shown herein, or other openings configured to extract submerged liquids and / or gases. The extraction member can recover submerged liquids and gases in a two-phase flow.

[0200] During the movement of the substrate W relative to the fluid handling structure 12, the immersion liquid may move in the same direction as the substrate W. This may be due to a no-slip boundary condition between the substrate W and the immersion liquid. A no-slip boundary condition is a boundary condition that forces the fluid (such as an immersion liquid) to reach zero velocity relative to the solid at the solid boundary. This means that a portion of the immersion liquid may adhere to the substrate surface during scanning, which means that the immersion liquid may not be effectively extracted / recovered by the extraction member.

[0201] An example of a fluid handling structure 12, including a liquid supply opening 2000 and a fluid extraction opening 2001, is schematically shown. Figure 12 Above. In Figure 12 In the figure, the substrate W moves relative to the fluid handling structure 12; for example, the substrate W moves to the right. Immersion liquid can be supplied to the immersion space 11 through the liquid supply opening 2000. The immersion liquid can be extracted through the fluid extraction opening 2001. The direction of immersion liquid flow is... Figure 12 The arrows in the middle indicate the direction towards and away from the liquid supply opening 2000 and the fluid extraction opening 2001.

[0202] Fluid extraction opening 2001 is an example of an extraction component. Fluid extraction opening 2001 can be configured to extract and recover submerged liquid and gas via a two-phase flow. The gas extracted by fluid extraction opening 2001 can be extracted by an air knife configured to confine the submerged liquid within the submerged space 11. Figure 12 (Not shown in the image) The supplied gas. An air knife may include gas similar to... Figure 2a The air knife opening is 26.

[0203] The portion of the immersion liquid that can remain on the substrate surface on the retreating side of the fluid processing structure is schematically illustrated. Figure 12 Above. The portion of the submerged liquid that remains is schematically shown as a liquid film with a thickness d1. This portion of the submerged liquid may remain on the surface of the substrate W because it has not been successfully extracted by the fluid extraction opening 2001. The thickness d1 may affect the volume of liquid remaining on the substrate surface. For example, a larger thickness d1 may result in a larger volume of liquid remaining on the substrate surface and / or larger droplets of the submerged liquid remaining on the substrate surface. Avoiding the formation of submerged liquid droplets can be advantageous.

[0204] Figure 13A plan view of the fluid processing structure 12 is shown. The fluid processing structure 12 may include components disposed within the fluid processing structure 12. Figure 13 Two liquid supply openings are marked at angular positions of 90° and 270°, such as liquid supply opening 2000 (liquid supply opening at...). Figure 13 (Not shown). These liquid supply openings can be connected to a liquid supply chamber (not shown), and the liquid supply openings can be configured to supply liquid to the immersion space 11 at equal flow rates. When the substrate W is stationary, this can result in a substantially uniform supply of immersion liquid around the circumference of the immersion space 11, because the immersion liquid is supplied at an equal rate through each of the liquid supply openings. However, during substrate movement, this equal supply of liquid from each of the liquid supply openings can be disadvantageous, as described below.

[0205] The fluid processing structure 12 may further include a fluid extraction member, said fluid extraction member including at least one fluid extraction opening, such as fluid extraction opening 2001. Preferably, the fluid processing structure 12 includes a plurality of fluid extraction openings. Preferably, the fluid processing structure 12 includes, for example, a fluid extraction opening provided in the fluid processing structure 12. Figure 13 At least four fluid extraction openings at angular positions of 45°, 135°, 225°, and 315° (the liquid extraction openings are located at...) Figure 13 (Not shown in the diagram). Fluid extraction openings may be equidistant from the center of the immersion space 11, and may be positioned further away from the center of the immersion space 11 than each of the liquid supply openings. These fluid extraction openings may be connected to a negative pressure and may be configured to extract both immersion liquid and gas. For example, the fluid extraction openings may extract / recover immersion liquid as well as gas supplied to the substrate surface by an air knife (for simplicity, this may be referred to as fluid extraction). Since each liquid extraction opening can be connected to the same negative pressure source, the rate at which fluid is extracted through each opening can be the same. When the substrate W is stationary, this may result in substantially uniform fluid extraction around the circumference of the immersion space 11, because the immersion liquid is extracted at an equal rate through each of the fluid extraction openings. However, this can be disadvantageous during substrate movement, as described below.

[0206] Figure 13 A plan view of the fluid handling structure 12 is shown. During the movement of the substrate W, the unrecovered immersion liquid 300 can form a substantially triangular shape, such as... Figure 13 As shown in the diagram. When the substrate velocity exceeds a predetermined critical velocity, the immersion liquid may escape from the tip of the substantially triangular unrecovered immersion liquid 300 (i.e., at the...). Figure 13 Loss at the lowest point of the y-axis (in the image). Figure 13In this process, the substrate W moves relative to the fluid processing structure 12 in the negative y-direction (i.e., opposite to the y-axis direction), and the unrecovered immersion liquid 300 forms a substantially triangular shape in the negative y-direction. This may cause the immersion liquid to accumulate on the retreating side of the fluid processing structure (e.g., in...). Figure 13 Loss in the negative y-direction. Alternatively, this may result in the formation of submerged liquid droplets on the substrate surface, which are defect sources. This situation can preferably be avoided.

[0207] During subsequent substrate movement, any lost immersion fluid droplets on substrate W may (subsequently) collide with the advancing bend. This can lead to the formation of bubbles within the immersion fluid. Due to the shear force exerted by substrate W on the immersion fluid, these bubbles can move in a direction toward the retreating side of the fluid handling structure. If the bubbles are too large (e.g., greater than 70 µm), they may not dissolve in the immersion fluid by the time they reach the center of immersion space 11. This means that these bubbles may interfere with the radiation beam B incident on substrate W, potentially causing defects on substrate W due to changes in the refractive index along the path of radiation beam B. It should be noted that the 70 µm bubble being problematic is merely an example, and depending on system settings, other bubble sizes, such as greater than 50 µm, may also be problematic.

[0208] Unrecovered immersion liquid 300 may undesirably lead to the formation of immersion liquid waves traveling along the outer edge of the immersion space 11 toward the retreating side of the fluid handling structure. This can disrupt the stability of the substantially triangular unrecovered immersion liquid 300, potentially leading to further loss of immersion liquid, even when the substrate velocity does not exceed a predetermined critical velocity. Therefore, this can also increase immersion liquid loss, even when the substrate W moves relatively slowly.

[0209] The problems identified above can be addressed by providing an adjustable immersion liquid supply unit that supplies immersion liquid at different rates on the forward and reverse sides. Alternatively, an adjustable fluid extraction unit can be provided that extracts immersion fluid at different rates on the forward and reverse sides. By adjusting the liquid supply rate and / or fluid extraction rate on the forward and reverse sides of the fluid handling structure, the problems identified above can be mitigated or prevented.

[0210] Fluid handling systems including regulating liquid immersion supplies and / or regulating fluid extraction units can be used in combination with regulating air knives and / or regulating gas supplies (such as those described in this disclosure). Alternatively, regulating liquid immersion supplies and / or regulating fluid extraction units can be implemented in fluid handling systems that do not include regulating air knives or regulating gas supplies. The term regulating air knife can be used to refer to an air knife comprising multiple air knife compartments, wherein gas can be supplied through each compartment at a different rate. The term regulating gas supply can be used to refer to a gas supply comprising multiple gas supply compartments, wherein gas can be supplied through each compartment at a different rate.

[0211] Figure 14 The regulated liquid supply component 700 and the regulated fluid extraction component 700a according to the present invention are shown. A fluid handling structure 12 including at least one of the regulated liquid supply component 700 and the regulated fluid extraction component 700a can alleviate or prevent the problems identified above.

[0212] According to this embodiment, a fluid handling system can be provided, including a fluid handling structure 12 configured to at least partially confine liquid within an immersion space 11 between a final element 100 and a substrate W and / or a substrate support WT. The fluid handling system may further include a fluid extraction member 700a, which includes a set of extraction openings. The fluid extraction member 700a is configured to extract immersion liquid from the immersion space 11 through the extraction openings. Each fluid in the extraction opening is connected to a negative pressure. The fluid handling structure 12 may include a liquid supply member 700, which includes a first liquid supply opening 2000a and a second liquid supply opening 2000b, configured to supply liquid to the immersion space 11 through the first liquid supply opening 2000a and the second liquid supply opening 2000b. The first liquid supply opening 2000a and the second liquid supply opening 2000b are disposed radially inward from the air knife and are radially opposite each other relative to the immersion space 11. The first liquid supply opening 2000a and the second liquid supply opening 2000b are connected to a liquid supply chamber (not shown). The liquid supply component 700 is disposed radially inward from the fluid extraction component 700a. The liquid supply chamber may be an immersion liquid source.

[0213] The fluid processing structure 12 may include an air knife (not shown) configured to supply gas to the surface of the substrate W via at least one air knife opening (not shown). The at least one air knife opening may be similar to... Figure 2a The air knife opening 26. The air knife (not shown) can be an adjustable air knife, such as an adjustable air knife according to this disclosure that includes at least a first air knife compartment 501 and a second air knife compartment 502, for example, schematically illustrated in... Figure 4 middle.

[0214] exist Figure 14 In the immersion space 11, the first liquid supply opening 2000a and the second liquid supply opening 2000b are radially opposite each other, that is, they are located at angular positions of 90° and 270°. Optionally, other liquid supply openings may be arranged in the liquid supply member 700 around the center of the immersion space 11. These other liquid supply openings may be configured to supply immersion liquid to the immersion liquid supply member 700. Figure 14 The number of openings in the liquid supply unit 700 shown is illustrative, not prescriptive.

[0215] The fluid extraction element 700a can also extract gas via a two-phase flow through extraction openings. The set of extraction openings is arranged radially outward from the liquid supply element 700 and radially inward from the air knife (not shown), and the extraction openings are arranged around the periphery (e.g., around a circumference or periphery) of the immersion space 11, wherein each fluid in the extraction opening is connected to a negative pressure. The spacing and / or size of the orifices of the extraction openings can vary. In an embodiment, the extraction openings are arranged equidistantly from each other around the periphery.

[0216] The set of extraction openings may include a first extraction opening 2001a, a second extraction opening 2001b, a third extraction opening 2001c, and a fourth extraction opening 2001d. The first extraction opening 2001a, the second extraction opening 2001b, the third extraction opening 2001c, and the fourth extraction opening 2001d may be located at angular positions of 45°, 135°, 225°, and 315° in the fluid extraction component 700a.

[0217] The fluid extraction component 700a may include at least another set of extraction openings. For example, two additional sets of extraction openings may be provided. One set of extraction openings is concentric with at least another set of extraction openings. Each set of extraction openings may be concentric with the other set.

[0218] In embodiments, the fluid handling system may further include a fluid extraction variable flow valve (not shown) between the negative pressure and at least one of the extraction openings, i.e., for biphase extraction. Alternatively, the fluid extraction variable flow valve may be positioned between the negative pressure and each of the extraction openings. In embodiments including multiple sets of extraction openings, one or more of these sets may include an extraction opening connected to the negative pressure via a corresponding fluid extraction variable flow valve. This can provide improved control over the fluid extraction rate on both the forward and reverse sides of the fluid handling structure.

[0219] In an embodiment, the fluid handling system may further include a first fluid extraction variable flow valve disposed between the negative pressure and the first extraction opening 2001a, and / or a second fluid extraction variable flow valve disposed between the negative pressure and the second extraction opening 2001b, and / or a third fluid extraction variable flow valve disposed between the negative pressure and the third extraction opening 2001c, and / or a fourth fluid extraction variable flow valve disposed between the negative pressure and the fourth extraction opening 2001d. These fluid extraction variable flow valves are not shown in the figures. These fluid extraction variable flow valves are disposed downstream of the corresponding extraction opening. For example, the fluid extraction variable flow valves may be located in... Figure 12 The fluid extraction component is positioned downstream of the fluid extraction component 2001, allowing for adjustment of the fluid extraction rate.

[0220] Therefore, the fluid extraction rate can be controlled at each point in the extraction opening.

[0221] For example, at least one of the first, second, third, and fourth fluid extraction variable flow valves can be configured to extract fluid through one of the extraction openings at a higher rate than the other. For example, at least two of the first, second, third, and fourth fluid extraction variable flow valves can be configured to extract fluid through both of the extraction openings at a higher rate than at least the other. Alternatively, all fluid extraction variable flow valves can be individually adjusted to set different fluid extraction rates (i.e., extraction rates of the immersion liquid and gas) via their respective extraction openings.

[0222] For example, in a variable flow valve, the actuated fluid draws from one of the valves to achieve a larger negative pressure; at least one draw-out opening on the back side may result in an increased rate of submerged liquid and gas draw-out. Due to the higher shear force of the gas flowing above the unrecovered submerged liquid 300, the thickness d1 can be reduced, meaning less submerged liquid is lost. Additionally, any droplets formed can be smaller.

[0223] Furthermore, on the forward side of the fluid handling structure, the variable flow rate of fluid extraction can be adjusted to achieve a smaller effective negative pressure. As a result, more liquid and gas are extracted on the backward side than on the forward side. This can help maintain overall flow balance.

[0224] In an embodiment, a variable flow valve (not shown) for liquid supply may be disposed between one or more liquid supply components and liquid supply openings. For example, in Figure 12 In this system, a liquid supply variable flow valve (not shown) may be installed upstream of the liquid supply unit 2000. The liquid supply variable flow valve can regulate the flow rate of liquid supplied to the immersion space 11 via the liquid supply opening.

[0225] In one embodiment, a first liquid supply variable flow valve (not shown) is disposed between a liquid supply chamber (not shown) and a first liquid supply opening 2000a. The first liquid supply variable flow valve is configured to control the liquid flow rate from the first liquid supply opening 2000a.

[0226] In one embodiment, a second liquid supply variable flow valve (not shown) is disposed between the liquid supply chamber and the second liquid supply opening 2000b. The second liquid supply variable flow valve is configured to control the liquid flow rate from the second liquid supply opening 2000b.

[0227] The liquid flow rate from the first liquid supply opening 2000a can be greater than the liquid flow rate from the second liquid supply opening 2000b, or the liquid flow rate from the first liquid supply opening 2000a can be the same as the liquid flow rate from the second liquid supply opening 2000b, or the liquid flow rate from the first liquid supply opening 2000a can be less than the liquid flow rate from the second liquid supply opening 2000b. This can be selected based on the movement of the substrate W relative to the fluid handling system.

[0228] Non-uniform distribution of liquid supply can be achieved by controlling the rate at which liquid is supplied through the first liquid supply opening 2000a and the second liquid supply opening 2000b. By adjusting the variable flow rate valve for liquid supply, less liquid can be supplied to the retracting side of the fluid processing structure, and / or more liquid can be supplied to the advancing side of the fluid processing structure. A system that allows switching the flow rate on each side of the substrate W can be particularly advantageous because the substrate W can switch its direction of movement.

[0229] If less immersion liquid is supplied on the back side, the volume of immersion liquid in the unrecovered immersion liquid 300 is also smaller, resulting in a reduction in thickness d1, that is, a reduction in the thickness of the membrane height of the unrecovered immersion liquid 300.

[0230] Providing immersion liquid at a higher rate on the forward side of the fluid handling structure can reduce the likelihood of any of the liquid supply openings on the forward side drying out, which could cause the meniscus 33 to move away from the substrate surface.

[0231] In this embodiment, the control of the submerged liquid supply and recovery of the fluid processing structure is regulated by providing at least one of a first liquid supply variable flow valve, a second liquid supply variable flow valve, a first fluid extraction variable flow valve, a second fluid extraction variable flow valve, a third fluid extraction variable flow valve, and a fourth fluid extraction variable flow valve. Therefore, improved regulation of the submerged liquid supply and submerged fluid extraction can be achieved.

[0232] The loss of submerged liquid on the retreating side can be further improved by reducing the rate at which submerged liquid is supplied to the retreating side of the fluid handling structure and by increasing the fluid extraction rate (i.e., submerged liquid and gas extraction) on the retreating side. On the advancing side, the submerged liquid supply rate can be increased and the fluid extraction rate can be decreased.

[0233] The regulation of the supply and / or extraction of submerged fluid via a variable flow valve can be applied to any component configured to supply or extract submerged fluid. For example, the supply variable flow rate can be regulated by... Figure 2a , Figure 2c and Figure 2d Supply opening 20 or Figure 2b The liquid flow rate at the supply opening 34. For example, the recovery variable flow rate can be adjusted through... Figure 2a , Figure 2c and Figure 2d The liquid recovery flow rate of the recovery opening 21 in the middle.

[0234] According to this disclosure, any one of the openings for supplying or extracting submerged liquids and / or gases may be tilted. Figure 15 An example of an inclined opening is shown. As shown, passage 70a may have a first major axis FMA. The first major axis FMA may pass through the center of the cross-sectional region of the first inlet 65a and the center of the cross-sectional region of the first outlet 60a. The angle θ of the wall 74a of passage 70a may be determined relative to the first major axis FMA passing through passage 70a. The wall 74a may have the same angle θ relative to FMA, such as... Figure 15 As shown in the figure. The angle θ can preferably be between about 0° and 30°, preferably between about 0° and 20°, preferably between about 0° and 15°, preferably between about 1° and 10°, and preferably between about 5° and 7°. Alternatively, any of the openings for supplying or extracting the submerged liquid and / or gas can be straight. Alternatively, the corresponding openings have walls 74a parallel to each other on opposite sides and at the same angle θ to the first major axis FMA. The opening can have a circular or non-circular cross-section. For example, the cross-section of the opening can be elliptical. The cross-section of the opening does not have to be symmetrical.

[0235] Some extraction or supply components mentioned herein may include inclined openings, i.e., may have the inclined walls described above. For example, the following extraction or supply components may have inclined openings: overflow recovery component 24, recovery opening 25, air knife opening 26, first air knife opening 26a, second air knife opening 26b, third air knife opening 26c, gas supply openings 27a and 27b, gas recovery opening 28, recovery opening 32a, recovery opening 32b, supply opening 34, liquid injection port 41, liquid recovery port 43, external recovery port 44a, gas sealing port 45, other openings 50, first liquid supply opening 2000a, second liquid supply opening 2000b, first fluid extraction opening 2001a, second fluid extraction opening 2001b, third fluid extraction opening 2001c and / or fourth fluid extraction opening 2001d.

[0236] Reducing the immersion fluid supply on the rear side of the fluid handling structure can increase the uniformity of the immersion fluid on that side. This can also reduce problems such as immersion fluid loss.

[0237] Problems arising from the opposing fluid supply requirements on the advancing and retreating sides of a fluid handling structure, such as liquid loss, droplet formation, and other issues, can be mitigated by providing an adjustable air knife and optionally an adjustable gas supply. To reduce problems such as submerged liquid loss and bubble formation, while ensuring efficient gas utilization, it may be desirable to provide a fluid handling structure that allows control of gas flow rate based on multiple parameters that may affect the behavior of the submerged liquid on the retreating and advancing sides of the fluid handling structure by adjusting the air knife and / or the adjustable gas supply.

[0238] By considering multiple parameters that affect the behavior of the immersion liquid during substrate movement, the gas flow rates through the first gas knife chamber 501 and the second gas knife chamber 502 can be selected to ensure efficient gas use while preventing problems associated with immersion liquid loss. Alternatively, the gas flow rates through the first gas supply chamber 501 and the second gas supply chamber 502 can also be controlled based on multiple parameters that affect the behavior of the immersion liquid during substrate movement.

[0239] In some embodiments, the fluid handling structure 12 may include more than two air knife compartments and / or gas supply compartments (such as, Figure 6 (Examples in the embodiments). In these embodiments, the gas flow rate from each of the multiple air knife compartments and / or gas supply compartments can be adjusted based on multiple parameters that may affect the behavior of the immersion liquid on the backward and forward sides of the fluid processing structure. The values ​​of the parameters affecting the behavior of the immersion liquid, or combinations of such parameters, discussed below, may affect the air knife and gas supply regulation.

[0240] It may also be desirable to provide a computer program having instructions that, when executed on a computer, enable the fluid processing system to control the gas flow rate through each of the gas knife compartments and optionally through each of the gas supply compartments based on the direction of movement of the substrate relative to the fluid processing system. Alternatively, the gas flow rate can be controlled without using a computer program, for example, by using a trigger signal.

[0241] According to this disclosure, a fluid handling system including a first air knife chamber 501 and a second air knife chamber 502 can set the gas flow rate through each of the air knife chambers based on at least one of a plurality of parameters. The gas flow rate through the first air knife chamber 501 can be set to be greater than, equal to, or less than the gas flow rate through the second air knife chamber 502.

[0242] According to this disclosure, a fluid handling system (such as, but not limited to, a first gas supply compartment 601 and a second gas supply compartment 602) is also included. Figure 8a and Figure 8b The system shown can be configured to set the gas flow rate through each of the gas supply compartments based on one of a number of parameters. The gas flow rate through the first gas supply compartment 601 can be set to be greater than, equal to, or less than the gas flow rate through the second gas supply compartment 602.

[0243] The flow rate of gas passing through the air knife compartment and optionally through the gas supply compartment can be adjusted based on one of the following parameters.

[0244] The parameters may include the position of the substrate W relative to the fluid processing structure 12.

[0245] The parameters may include the predicted volume and / or size of the immersion liquid droplets on the surface of the substrate W outside the immersion space 11. The parameters may also include the predicted position of the liquid on the surface of the substrate W outside the immersion space 11. The predicted volume and / or size and / or position of the immersion droplets can be predicted based on a water loss model. The water loss model can predict the amount and volume of droplets remaining on the substrate W based on the velocity of the substrate W, the direction of substrate movement, a model of the behavior of the immersion liquid exhibited when the edge of the substrate W intersects with the confined immersion liquid, and / or other factors. By taking into account the position and / or size of any droplets that may exist on the substrate surface and potentially interfere with the meniscus 33, the gas flow rate can be adjusted to reduce the likelihood of these droplets causing problems such as bubble formation. If the position and size of any droplets are not considered, the provided gas flow rate may be too low or too high, which may result in reduced efficiency and effectiveness of gas use.

[0246] The parameters may include the configuration of the fluid processing structure 12, such as the distance between the bottom surface of the fluid processing structure 12 and the facing surface of the substrate W, the total flow rate of gas from the air knife, the gas flow rate from the first air knife chamber 501, the gas flow rate from the second air knife chamber 502, the total flow rate of gas from the gas supply unit, the gas flow rate from the first gas supply chamber 601, and / or the gas flow rate from the second gas supply chamber 602. By taking into account the distance between the bottom surface of the fluid processing structure 12 and the facing surface of the substrate W, the accuracy of modeling the meniscus profile can be improved, and the gas flow rates through the air knife and the gas supply unit can be adjusted to reduce interference from any droplets on the meniscus 33. By taking into account the provided gas flow rates, the loss of immersion liquid can be predicted with improved accuracy.

[0247] The parameters may include substrate motion parameters, such as information about motion and / or velocity in the x and y directions. Information about the direction and velocity of motion may be referred to as substrate velocity. Substrate motion parameters may include substrate acceleration. This may lead to the identification of critical locations on the substrate W, where adjusting the gas flow rate (i.e., increasing or decreasing the gas flow rate) may be of paramount importance for minimizing immersion liquid loss.

[0248] The parameters may also include process settings, such as information regarding the location of the resist on the substrate W and the contact angle between the resist area and the substrate W. The area of ​​the substrate W containing the resist may have different gas flow requirements than other areas of the substrate W with resist arranged in a different pattern or other areas without resist.

[0249] A computer program can model a substrate W as having multiple regions. These regions can have the same size. Figure 16 An example of a circular substrate W that can be modeled as multiple individual zones is shown. Based on the parameters described above, each of these zones can have different gas flow requirements. The fluid handling system can be configured to switch between different gas flow settings between different zones based on the gas flow requirements of each zone. By providing a fluid handling system that can adapt to the individual gas flow requirements of each zone, problems such as immersion liquid loss and bubble formation can be mitigated.

[0250] exist Figure 16 In the example shown above, the two leftmost bottom zones can have different gas flow rate requirements. Figure 16In a specific example above, the lower leftmost region has requirement "A," namely, a low gas flow rate through the gas compartment (air knife compartment or gas supply compartment) located at the top of the region and a high gas flow rate through the gas compartment located at the bottom of the region. The adjacent lower leftmost region has requirement "B," namely, a high gas flow rate through the gas compartment (air knife compartment or gas supply compartment) located at the top of the region and a low gas flow rate through the gas compartment located at the bottom of the region. The computer program has instructions that, when executed on a computer, cause the fluid handling system to provide the desired gas flow to each region of the substrate W.

[0251] A fluid handling system comprising a first air knife chamber 501, a second air knife chamber 502, a first gas supply chamber 601, and a second gas supply chamber 602 can be configured with flow rates through each chamber according to Table 1. In Table 1, GK Y+ refers to the flow rate of the air knife chamber located on one side of the substrate W in the y-direction, and GK Y- refers to the flow rate of the air knife chamber located on the opposite side of the substrate W in the y-direction. GS Y+ refers to the flow rate of the gas supply chamber located on one side of the substrate W in the y-direction, and GK Y- refers to the flow rate of the gas supply chamber located on the opposite side of the substrate W in the y-direction.

[0252]

[0253] According to this disclosure, the gas flow rate requirement for each region of substrate W can be met by selecting an appropriate gas flow rate setting from Table 1 for each region.

[0254] Figure 17a , Figure 17b , Figure 17c and Figure 17d The diagram illustrates some exemplary cases of gas flow rate regulation in different regions of substrate W.

[0255] Figure 17e This is a schematic diagram illustrating gas flow states A, B, and C. Note that medium flow rates (as shown in Table 1 above) are... Figure 17e The middle label is marked as "Mid flow". Although Figure 17e An embodiment of an air knife including two variable flow valves is shown, each configured to regulate the gas flow rate through a corresponding air knife compartment. However, the gas flow rate regulation based on the parameters identified above can be performed by another regulating air knife, such as... Figure 10a , Figure 10b , Figure 11a and Figure 11b The gas supply unit is shown in the image. Figures 17a to 17dIn the diagram, the region of substrate W with gas flow requirement A is labeled "A", the region of substrate W with gas flow requirement B is labeled "B", and the region of substrate W with gas flow requirement C is labeled "=" (meaning that moderate and equal flow rates are provided on both sides of the gas knife). Gas flow rate adjustment can be based, for example, on substrate location.

[0256] Figure 17a An example of gas flow rate regulation is shown, where the gas flow rate requirement for each region of substrate W is switched based on the scan direction of substrate W. This can reduce droplet buildup on the substrate surface. This can also reduce the length and thickness of the unrecovered immersion liquid portion 300.

[0257] Figure 17b This illustrates another example of gas flow regulation. This can also reduce the length and thickness of the unrecovered submerged liquid portion 300.

[0258] Figure 17c and Figure 17d An example of adjusting the gas flow rate for a specific region of substrate W is shown. This mode can be implemented when the defect model predicts the location of the region most susceptible to bubble formation, liquid loss, and / or other problems.

[0259] By providing intelligent models that can accurately predict the potentially beneficial areas for switching gas regulation, unnecessary adjustments to gas flow can be avoided. This can improve equipment lifespan.

[0260] Those skilled in the art will understand that the fluid supply components and / or extraction channels or openings may be coated. The coating may be a hydrophobic or hydrophilic coating. A suitable coating may be selected depending on the functionality of the fluid channel (or opening).

[0261] Each fluid channel (or opening) may be chamfered. Chamfering at the outlet or inlet of a channel can be advantageous for fluid flow behavior.

[0262] This invention provides a photolithography apparatus. The photolithography apparatus may have any one or all of the other features or components of the photolithography apparatus described above. For example, the photolithography apparatus may optionally include at least one or more of a source SO, an irradiation system IL, a projection system PS, etc.

[0263] Specifically, the photolithography apparatus may include a projection system PS configured to project a radiation beam B toward the surface of a substrate W.

[0264] While specific references can be made to the use of lithography equipment in IC manufacturing herein, it should be understood that the lithography equipment described herein may have other applications. Possible other applications include manufacturing integrated optical systems, guiding and detecting patterns for magnetic domain memory, flat panel displays, liquid crystal displays (LCDs), thin-film magnetic heads, etc.

[0265] Where circumstances permit, embodiments of the present invention may be implemented in hardware, firmware, software, or any combination thereof. Embodiments of the present invention may also be implemented by instructions stored on a machine-readable medium, which may be read and executed by one or more processors. A machine-readable medium may include any means for storing or transmitting information in a form readable by a machine (e.g., a computing device). For example, a machine-readable medium may include read-only memory (ROM); random access memory (RAM); magnetic storage media; optical storage media; flash memory devices; electrical, optical, acoustic, or other forms of propagation signals (e.g., carrier waves, infrared signals, digital signals, etc.); etc. Furthermore, firmware, software, routines, and instructions may be described herein as performing certain actions. However, it should be understood that such descriptions are for convenience only, and these actions are actually caused by a computing device, processor, controller, or other means that execute firmware, software, routines, instructions, etc., and, when executed, may cause actuators or other devices to interact with the physical world.

[0266] While specific reference can be made herein to embodiments of the invention within the context of a photolithography apparatus, embodiments of the invention can be used in other apparatuses. Embodiments of the invention can form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes objects such as wafers (or other substrates W) or masks (or other patterning apparatuses). These apparatuses can generally be referred to as photolithography tools. Such photolithography tools can utilize ambient (non-vacuum) conditions.

[0267] While the foregoing may have specifically referenced the use of embodiments of the invention in the context of optical lithography, it should be understood that the invention is not limited to optical lithography where circumstances permit.

[0268] The embodiments include the following numbered aspects:

[0269] 1. A fluid handling system comprising a fluid handling structure configured to at least partially confine liquid within an immersion space between a final element and a substrate, wherein the fluid handling structure includes:

[0270] Multiple air knife chambers, wherein the multiple air knife chambers include at least a first air knife chamber and a second air knife chamber, wherein

[0271] The first air knife compartment includes at least one opening radially outward from the space, and

[0272] The second air knife compartment includes at least one opening radially outward from the space, and the second air knife compartment is fluidly separated from the first air knife compartment, wherein

[0273] Each of the air knife compartments is in fluid communication with the air knife chamber via an air knife variable flow valve, such that the first air knife compartment is in fluid communication with the air knife chamber via a first air knife variable flow valve, and the second air knife compartment is in fluid communication with the air knife chamber via a second air knife variable flow valve;

[0274] Multiple gas supply compartments, wherein the multiple gas supply compartments include at least a first gas supply compartment and a second gas supply compartment, wherein

[0275] The first gas supply compartment includes at least one opening radially outwardly positioned relative to the first air knife compartment, such that the first air knife compartment is disposed between the first gas supply compartment and the immersion space; and

[0276] The second gas supply compartment includes at least one opening radially outwardly positioned relative to the second gas knife compartment, such that the second gas knife compartment is disposed between the second gas supply compartment and the immersion space, wherein the second gas supply compartment is fluidly separated from the first gas supply compartment, wherein

[0277] Each of the gas supply compartments is in fluid communication with the gas supply chamber via a gas supply variable flow valve, such that the first gas supply compartment is in fluid communication with the gas supply chamber via a first gas supply variable flow valve, and the second gas supply compartment is in fluid communication with the gas supply chamber via a second gas supply variable flow valve.

[0278] 2. The fluid processing system according to aspect 1, wherein the air knife chamber is configured to supply gas to the periphery of the immersion space, and / or wherein the fluid processing structure further includes a slit allowing a beam to pass through to reach the surface of the substrate, wherein the air knife chamber is configured to provide the gas over a portion of the fluid processing structure defining the slit, and optionally, to provide another gas over a portion of the fluid processing structure not defining the slit, and / or the plurality of air knife chambers extend around the circumference of the immersion space, the plurality of air knife chambers defining a shape including four vertices separated by four sides, each of the air knife chambers being disposed along at least one of the four sides, and optionally along one or more vertices, and wherein optionally:

[0279] (i) The first air knife chamber extends around half of the circumference of the immersion space, and the second air knife chamber extends around the other half of the circumference of the immersion space, or

[0280] (ii) The first and second air knife compartments are disposed opposite each other with respect to the center of the immersion space, and the first and second air knife compartments extend around a portion of the immersion space. The fluid treatment structure further includes a third and a fourth air knife compartment disposed between the first and second air knife compartments, the third and fourth air knife compartments being connected to another gas chamber configured to supply another gas. Optionally, the gas includes carbon dioxide and the other gas includes air. Optionally, the air knife includes an additional air knife compartment configured to supply the gas or the other gas.

[0281] 3. The fluid handling system according to aspect 1 or 2, wherein the gas supply compartment is configured to supply gas to the periphery of the gas supplied by the air knife compartment.

[0282] 4. The fluid handling system according to any of the foregoing aspects further includes a variable flow valve controller, wherein the variable flow valve controller is configured to individually control the flow rate through each of the first air knife compartment, the second air knife compartment, the first gas supply compartment, and the second gas supply compartment.

[0283] 5. The fluid handling system according to any of the foregoing aspects, wherein the variable flow valve controller is configured to set the gas flow rate through the first air knife compartment to be higher than the flow rate through the second air knife compartment, and the variable flow valve controller is further configured to set the flow rate through the first gas supply compartment to be lower than the flow rate through the second air knife compartment.

[0284] 6. The fluid handling system according to any of the foregoing aspects, wherein the variable flow valve controller is configured to set the gas flow rate through each of the air knife compartment and the gas supply compartment based on the direction of movement of the substrate.

[0285] 7. The fluid handling system according to any of the foregoing aspects, wherein the air knife chamber is configured to output airflow at a maximum flow rate of 200 Nl / min.

[0286] 8. The fluid handling system according to any of the foregoing aspects, wherein the gas supply chamber is configured to output gas flow at a maximum flow rate of 200 Nl / min.

[0287] 9. The fluid handling system according to any one of the foregoing aspects further includes:

[0288] A first air knife channel, having one end connected to the air knife chamber, and a second and a third air knife channel extending from the other end of the first air knife channel.

[0289] The second air knife channel has one end connected to the other end of the first air knife compartment, and has the first air knife variable flow valve disposed between its two ends.

[0290] The third air knife channel has one end connected to the other end of the second air knife compartment, and has a second air knife variable flow valve disposed between its two ends.

[0291] 10. The fluid handling system according to any one of the foregoing aspects further includes:

[0292] A first gas supply channel, the first gas supply channel having one end connected to a gas supply chamber and having a second gas supply channel and a third gas supply channel extending from the other end of the first gas supply channel;

[0293] A second gas supply passage, the second gas supply passage having one end connected to the other end of the first gas supply compartment, having the first gas supply variable flow valve disposed between its two ends, and

[0294] A third gas supply channel has one end connected to the other end of the second gas supply compartment and a second gas supply variable flow valve disposed between its two ends.

[0295] 11. The fluid handling system according to any of the foregoing aspects, wherein the first air knife compartment and the second air knife compartment are fluidly separated from each other.

[0296] 12. The fluid handling system according to any of the foregoing aspects, wherein the first gas supply compartment and the second gas supply compartment are fluidly separated from each other.

[0297] 13. The fluid handling system according to any one of the foregoing aspects, wherein the fluid handling structure further comprises:

[0298] A third air knife compartment, the third air knife compartment including at least one opening radially outward from the space;

[0299] A fourth air knife compartment, the fourth air knife compartment including at least one opening radially outward from the space, wherein

[0300] The third air knife compartment is in fluid communication with the air knife chamber via a third air knife variable flow valve, and the fourth air knife compartment is in fluid communication with the air knife chamber via a fourth air knife variable flow valve. The third and fourth air knife compartments are disposed in the space between the gas supply compartment and the immersion space.

[0301] 14. The fluid handling system according to any one of the foregoing aspects, wherein the fluid handling structure further comprises:

[0302] A third gas supply compartment, the third gas supply compartment including at least one opening radially outward from at least one opening in each of the air knife compartments relative to the immersion space;

[0303] A fourth gas supply compartment, the fourth gas supply compartment including at least one opening radially outward from at least one opening in each of the air knife compartments relative to the immersion space, wherein

[0304] The third gas supply compartment is in fluid communication with the gas supply chamber via a third gas supply variable flow valve, and the fourth gas supply compartment is in fluid communication with the gas supply chamber via a fourth gas supply variable flow valve. The third and fourth gas supply compartments are configured such that the air knife compartment is located in the space between the gas supply compartment and the immersion space.

[0305] 15. The fluid handling system according to aspect 14, comprising the variable flow valve controller according to aspect 4, wherein the variable flow valve controller is further configured to individually control the flow rate through the third air knife compartment and the third gas supply compartment.

[0306] 16. The fluid handling system according to aspect 15, wherein the variable flow valve controller is configured to individually control the flow rate through the fourth air knife compartment and the fourth gas supply compartment.

[0307] 17. The fluid handling system according to aspect 15 or 16, wherein the variable flow valve controller is configured to individually control the flow rate through each of the air knife compartment and the airflow compartment based on the movement of the substrate relative to the fluid handling structure.

[0308] 18. The fluid handling system according to any of the foregoing aspects, wherein the first air knife compartment, the second air knife compartment, the third air knife compartment and the fourth air knife compartment are fluidly separated from each other.

[0309] 19. The fluid handling system according to any one of the foregoing aspects, wherein the fluid handling structure further comprises:

[0310] A first liquid supply compartment, the first liquid supply compartment including at least one opening radially outward from the immersion space and radially inward from the first air knife compartment and the first gas supply compartment;

[0311] The second liquid supply compartment includes at least one opening that extends radially outward from the immersion space and radially inward from the second air knife compartment and the second gas supply compartment;

[0312] The first liquid supply compartment is in fluid communication with the liquid supply chamber via a first liquid supply variable flow valve, and the second liquid supply compartment is in fluid communication with the liquid supply chamber via a second liquid supply variable flow valve.

[0313] 20. The fluid handling system according to aspect 19, wherein the variable flow valve controller is configured to individually control the flow rate through the first liquid supply compartment and the second liquid supply compartment.

[0314] 21. The fluid handling system according to any one of the foregoing aspects further includes:

[0315] A pressure reservoir, fluidly connected to each air knife compartment, is configured to provide additional airflow pulses to the respective air knife compartment.

[0316] 22. The fluid handling system according to any one of the foregoing aspects further includes:

[0317] A control unit configured to provide an additional airflow pulse to at least one of the pressure reservoirs in response to a determination that, in a plan view of the substrate, the edge of the substrate intersects with the air knife compartment to which at least one of the pressure reservoirs is connected.

[0318] 23. The fluid handling system according to any of the foregoing aspects, wherein the air knife chamber is configured to be supplied with substantially pure CO2 through at least one opening in each of the respective air knife compartments.

[0319] 24. The fluid handling system according to any of the foregoing aspects, wherein the gas supply chamber is configured to supply substantially pure CO2 through at least one opening in each of the respective gas supply compartments.

[0320] 25. A fluid handling system comprising a fluid handling structure configured to at least partially confine liquid within an immersion space between a final element and a substrate, wherein the fluid handling structure includes:

[0321] A first air knife compartment, the first air knife compartment including at least one opening radially outward from the immersion space, and

[0322] A second air knife compartment, comprising at least one opening radially outwardly positioned from the immersion space, is fluidly separated from the first air knife compartment.

[0323] A first air knife channel, fluidly connected to both the first and second air knife chambers, is configured to supply a first gas to both the first and second air knife chambers.

[0324] A second air knife channel, fluidly connected to both the first and second air knife chambers, is configured to supply a second gas to both the first and second air knife chambers.

[0325] A switching valve configured to variably direct a flow of first gas from the first air knife passage to the first air knife compartment only, or to the second air knife compartment only, or to both the first and second air knife compartments.

[0326] 26. The fluid handling system according to aspect 25, wherein the first air knife chamber extends around a first portion of the circumference of the immersion space, and the second air knife chamber extends around a second portion of the circumference of the immersion space.

[0327] 27. The fluid handling system according to aspect 25 or 26, wherein the switching valve is configured to guide a flow of a first gas from the first air knife channel to the first air knife compartment, or to the second air knife compartment, or to both the first and second air knife compartments, based on the direction of movement of the substrate.

[0328] 28. A fluid processing system according to any one of aspects 25 to 27, wherein, during the movement of the substrate, the switching valve is configured to direct the flow of the first gas from the first gas knife channel to the first gas knife compartment only when the first gas knife compartment is on the retracted side of the fluid processing structure, and

[0329] The switching valve is configured to direct the flow of the first gas from the first air knife passage to the second air knife compartment only when the second air knife compartment is on the retracted side of the fluid processing structure.

[0330] 29. The fluid handling system according to any one of aspects 25 to 28, wherein the switching valve is a first switching valve, and the fluid handling system further comprises:

[0331] A second switching valve is configured to direct a flow of second gas from the second air knife passage to the first air knife compartment, or the second air knife compartment, or both the first air knife compartment and the second air knife compartment.

[0332] 30. The fluid processing system according to aspect 29, wherein, during the movement of the substrate, the second switching valve is configured to direct a flow of the second gas from the second gas knife channel to the first gas knife chamber only when the first gas knife chamber is on the forward side of the fluid processing structure, and

[0333] The second switching valve is configured to direct the flow of the second gas from the second air knife passage to the second air knife compartment only when the second air knife compartment is on the forward side of the fluid processing structure.

[0334] 31. The fluid handling system according to any one of aspects 25 to 30, wherein the first air knife channel and the second air knife channel are each configured to output airflow at a maximum flow rate of 200 Nl / min.

[0335] 32. The fluid handling system according to any one of aspects 25 to 31, wherein the first gas comprises air and the second gas comprises carbon dioxide.

[0336] 33. The fluid handling system according to any one of aspects 25 to 32, wherein the air knife chamber extends around the circumference of the immersion space, the air knife chamber defining a shape comprising four vertices separated by four sides.

[0337] 34. The fluid handling system according to aspect 33, wherein a first air knife chamber extends around half of the circumference of the immersion space, and a second air knife chamber extends around the other half of the circumference of the immersion space.

[0338] 35. The fluid handling system according to aspects 25 to 33, wherein the air knife further comprises:

[0339] A third and a fourth air knife compartment are connected to the first air knife channel. Optionally, each of the third and fourth air knife compartments is connected via a variable flow valve. Optionally, the second air knife channel provides a flow of a second gas to the first and second air knife compartments, or the second air knife channel provides a flow of a second gas to the first air knife compartment, and the first air knife channel provides a flow of a first gas to the second, third, and fourth air knife compartments. Optionally, the first air knife channel is configured to supply air and / or the second air knife channel is configured to supply carbon dioxide.

[0340] 36. The fluid handling system according to aspect 35, wherein each of the first air knife compartment, the second air knife compartment, the third air knife compartment, and the fourth air knife compartment is configured to cover at least a portion of a corresponding apex of the air knife and a side adjacent to the corresponding apex, optionally wherein the first air knife compartment and the second air knife compartment are disposed opposite each other with respect to the center of the immersion space, and / or the third air knife compartment and the fourth air knife compartment are disposed opposite each other with respect to the center of the immersion space.

[0341] 37. The fluid handling system according to aspect 35, wherein the air knife further comprises:

[0342] The fifth and sixth air knife compartments, each optionally connected to the first air knife channel via a corresponding variable flow valve, are also described.

[0343] The seventh and eighth air knife compartments are each optionally connected to the second air knife channel via a corresponding variable flow valve.

[0344] Each of the first, second, seventh, and eighth air knife compartments is configured to cover the corresponding apex of the air knife and at least a portion of the adjacent side adjacent to the apex.

[0345] Each of the third, fourth, fifth, and sixth air knife compartments is configured to cover the corresponding side of the air knife between its apex.

[0346] 38. The fluid handling system according to aspects 33 to 37, wherein the gas flow rate through each of the air knife chambers is based on the direction of movement of the substrate, and / or the total gas flow rate is higher on the regressive side of the substrate than on the advancing side of the substrate.

[0347] 39. The fluid processing structure according to any one of aspects 25 to 38, wherein at least one other air knife compartment is provided concentric with any one of the air knife compartments, the at least one other air knife compartment being connected to the first air knife supply and / or the second air knife supply.

[0348] 40. A fluid processing system according to aspects 25 to 39, wherein the fluid processing structure further includes a slit that allows a beam to pass through to reach the surface of the substrate, wherein the gas knife chamber is configured to provide the gas over a portion of the fluid processing structure defining the slit, and optionally, to provide another gas over a portion of the fluid processing structure not defining the slit.

[0349] 41. A fluid handling system comprising a fluid handling structure configured to at least partially confine liquid within an immersion space between a final element and a substrate, wherein the fluid handling structure includes:

[0350] A liquid supply device, the liquid supply device including a first liquid supply opening and a second liquid supply opening, the liquid supply device being configured to supply liquid to the immersion space through the first liquid supply opening and the second liquid supply opening;

[0351] A fluid extraction device includes a set of extraction openings configured to extract submerged fluid from the immersion space through the extraction openings, wherein each of the extraction openings is fluidly connected to a negative pressure.

[0352] The liquid supply component is disposed radially inside the fluid extraction component.

[0353] The first liquid supply opening and the second liquid supply opening are arranged radially inward from the air knife and are arranged opposite each other in the diametrical direction relative to the immersion space, and the first liquid supply opening and the second liquid supply opening are connected to the liquid supply chamber.

[0354] 42. The fluid handling system according to aspect 41, comprising an air knife configured to supply gas to the surface of the substrate via at least one air knife opening of the air knife.

[0355] 43. A fluid handling system comprising a fluid handling structure according to any one of aspects 1 to 40, wherein a first air knife compartment and a second air knife compartment define an air knife, and the fluid handling structure further comprising:

[0356] A liquid supply unit, comprising a first liquid supply opening and a second liquid supply opening, configured to supply liquid to the immersion space through the first liquid supply opening and the second liquid supply opening.

[0357] The first liquid supply opening and the second liquid supply opening are arranged radially inward from the air knife and are arranged opposite each other in the diametrical direction relative to the immersion space, and the first liquid supply opening and the second liquid supply opening are connected to the liquid supply chamber.

[0358] 44. The fluid handling system according to aspect 43, comprising a fluid extraction member including a set of extraction openings, the fluid extraction member being configured to extract submerged fluid from the submerged space through the extraction openings, wherein each of the extraction openings is fluidly connected to a negative pressure.

[0359] The liquid supply component is disposed on the radial inner side of the fluid extraction component.

[0360] 45. The fluid handling system according to any one of aspects 41, 42 and claim 44, wherein the set of extraction openings is arranged radially inward from the air knife, and the extraction openings are arranged around the periphery of the immersion space.

[0361] 46. ​​The fluid handling system according to aspect 45 further includes a fluid extraction variable flow valve disposed between the negative pressure and each corresponding extraction port.

[0362] 47. The fluid handling system according to aspect 45, wherein the set of extraction openings includes a first extraction opening, a second extraction opening, a third extraction opening, and a fourth extraction opening, and the fluid extraction member further includes:

[0363] A first fluid extraction variable flow valve is disposed between the negative pressure and the first fluid extraction opening, and / or

[0364] A second fluid extraction variable flow valve is disposed between the negative pressure and the second fluid extraction opening, and / or

[0365] A third fluid extraction variable flow valve is disposed between the negative pressure and the third fluid extraction opening, and / or

[0366] A fourth fluid extraction variable flow valve is provided, wherein the fourth fluid extraction variable flow valve is disposed between the negative pressure and the fourth fluid extraction opening.

[0367] 48. The fluid handling system according to aspect 47, wherein at least one of the first fluid extraction variable flow valve, the second fluid extraction variable flow valve, the third fluid extraction variable flow valve, and the fourth fluid extraction variable flow valve is configured to extract fluid through one of the extraction openings at a higher rate than the other of the extraction openings.

[0368] 49. The fluid handling system according to any one of aspects 44 to 46, wherein the fluid extraction member includes at least another set of extraction openings, wherein the set of extraction openings is concentric with the at least another set of extraction openings.

[0369] 50. The fluid handling system according to any one of aspects 41 to 49 further includes a first liquid supply variable flow valve disposed between the liquid supply chamber and the first liquid supply opening, wherein the first liquid supply variable flow valve is configured to control the liquid flow rate from the first liquid supply opening.

[0370] 51. The fluid handling system according to any one of aspects 41 to 50, further comprising a second liquid supply variable flow valve disposed between the liquid supply chamber and the second liquid supply opening, wherein the second liquid supply variable flow valve is configured to control the liquid flow rate from the second liquid supply opening.

[0371] 52. The fluid handling system according to any one of aspects 41 to 51, wherein the liquid flow rate from the first liquid supply opening is greater than the liquid flow rate from the second liquid supply opening, or the liquid flow rate from the first liquid supply opening is the same as the liquid flow rate from the second liquid supply opening, or the liquid flow rate from the first liquid supply opening is less than the liquid flow rate from the second liquid supply opening.

[0372] 53. The fluid handling system according to any of the foregoing aspects, wherein the fluid handling structure includes a supply opening on its inner surface and a supply variable flow valve, wherein liquid is supplied to the immersion space through the supply opening, and the supply variable flow valve regulates the flow rate of liquid through the supply opening.

[0373] 54. The fluid handling system according to any of the foregoing aspects, wherein the fluid handling structure includes a recovery opening on its inner surface and a recovery variable flow valve, wherein submerged liquid is recovered from the submerged space through the recovery opening and the recovery variable flow valve regulates the recovery flow rate of the liquid through the recovery opening.

[0374] 55. A fluid handling system according to any one of the foregoing aspects, wherein the fluid handling structure includes an air knife, wherein the fluid handling system is configured to adjust the gas flow rate through the first air knife compartment and the second air knife compartment based on at least one of a plurality of parameters, wherein the parameters include:

[0375] The position of the substrate relative to the fluid processing structure.

[0376] The predicted volume of the immersion liquid on the surface of the substrate, outside the immersion space.

[0377] The predicted size of droplets of immersion liquid on the surface of the substrate, outside the immersion space.

[0378] The predicted location of the liquid on the surface of the substrate, outside the immersion space.

[0379] The distance between the bottom surface of the fluid processing structure and the surface of the substrate facing the fluid processing structure.

[0380] The gas flow rate supplied to the surface of the substrate,

[0381] Substrate velocity,

[0382] Substrate acceleration,

[0383] The location of the resist on the substrate surface, and

[0384] The contact angle between the resist and the substrate surface.

[0385] 56. A fluid handling system according to any one of aspects 1 to 24, wherein the fluid handling system is configured to regulate the gas flow rate through the first air knife compartment, the second air knife compartment, the first gas supply compartment, and the second gas supply compartment based on at least one of a plurality of parameters, wherein the parameters include:

[0386] The position of the substrate relative to the fluid processing structure.

[0387] The predicted volume of the immersion liquid on the surface of the substrate, outside the immersion space.

[0388] The predicted size of droplets of immersion liquid on the surface of the substrate, outside the immersion space.

[0389] The predicted location of the liquid on the surface of the substrate, outside the immersion space.

[0390] The distance between the bottom surface of the fluid processing structure and the surface of the substrate facing the fluid processing structure.

[0391] The gas flow rate provided to the surface of the substrate,

[0392] Substrate velocity,

[0393] Substrate acceleration,

[0394] The location of the photoresist on the substrate surface.

[0395] The contact angle between the resist and the substrate surface.

[0396] 57. A photolithography apparatus comprising a fluid handling system according to any of the foregoing aspects.

[0397] 58. A computer program having instructions that, when executed on a computer, cause a fluid processing system according to any of the preceding aspects to control the gas flow rate through a first air knife compartment and a second air knife compartment based on at least one of a plurality of parameters, wherein the fluid processing structure includes an air knife, and wherein the parameters include:

[0398] The position of the substrate relative to the fluid processing structure.

[0399] The predicted volume of the immersion liquid on the surface of the substrate, outside the immersion space.

[0400] The predicted size of droplets of immersion liquid on the surface of the substrate, outside the immersion space.

[0401] The predicted location of the liquid on the surface of the substrate outside the immersion space, and the distance between the bottom surface of the fluid processing structure and the surface of the substrate.

[0402] The gas flow rate supplied to the surface of the substrate,

[0403] Substrate velocity,

[0404] Substrate acceleration,

[0405] The location of the photoresist on the substrate surface.

[0406] The contact angle between the resist and the substrate surface.

[0407] 59. A computer program having instructions that, when executed on a computer, cause a fluid processing system according to any one of aspects 1 to 24 to control the gas flow rate through a first air knife compartment, a second air knife compartment, a first gas supply compartment, and a second gas supply compartment based on at least one of a plurality of parameters, wherein the parameters include:

[0408] The position of the substrate relative to the fluid processing structure.

[0409] The predicted volume of the immersion liquid on the surface of the substrate, outside the immersion space.

[0410] The predicted size of droplets of immersion liquid on the surface of the substrate outside the immersion space.

[0411] The predicted location of the liquid on the surface of the substrate outside the immersion space, and the distance between the bottom surface of the fluid processing structure and the surface of the substrate.

[0412] The gas flow rate supplied to the surface of the substrate,

[0413] Substrate velocity,

[0414] Substrate acceleration,

[0415] The location of the photoresist on the substrate surface.

[0416] The contact angle between the resist and the substrate surface.

Claims

1. A fluid handling system comprising a fluid handling structure configured to at least partially confine an immersion liquid to an immersion space between a final element and a substrate, wherein the fluid handling structure comprises: a plurality of gas-knife compartments comprising at least a first gas-knife compartment and a second gas-knife compartment, wherein the first gas-knife compartment comprises at least one opening positioned radially outward from the space, and the second gas-knife compartment comprises at least one opening positioned radially outward from the space, the second gas-knife compartment being fluidically separated from the first gas-knife compartment, wherein each of the gas-knife compartments is in fluid communication with a gas-knife chamber via a gas-knife variable flow valve, such that the first gas-knife compartment is in fluid communication with a gas-knife chamber via a first gas-knife variable flow valve, and the second gas-knife compartment is in fluid communication with the gas-knife chamber via a second gas-knife variable flow valve; a plurality of gas supply compartments comprising at least a first gas supply compartment and a second gas supply compartment, wherein the first gas supply compartment comprises at least one opening positioned radially outward relative to the first gas-knife compartment, such that the first gas-knife compartment is disposed between the first gas supply compartment and the immersion space; and the second gas supply compartment comprises at least one opening positioned radially outward relative to the second gas-knife compartment, such that the second gas-knife compartment is disposed between the second gas supply compartment and the immersion space, the second gas supply compartment being fluidically separated from the first gas supply compartment, wherein each of the gas supply compartments is in fluid communication with a gas supply chamber via a gas supply variable flow valve, such that the first gas supply compartment is in fluid communication with a gas supply chamber via a first gas supply variable flow valve, and the second gas supply compartment is in fluid communication with the gas supply chamber via a second gas supply variable flow valve.

2. The fluid treatment system of claim 1 wherein, the gas-knife compartments are configured to supply gas to a periphery of the immersion space, and / or wherein the gas supply compartments are configured to supply gas to a periphery of the gas supplied by the gas-knife compartments, and / or wherein the fluid handling structure further comprises a slit enabling a beam to pass through to reach a surface of the substrate, wherein the gas-knife compartments are configured to provide the gas over a portion of the fluid handling structure defining the slit, and optionally another gas over the portion of the fluid handling structure not defining the slit, and / or the plurality of gas-knife compartments extend around a circumference of the immersion space, the plurality of gas-knife compartments defining a shape comprising four vertices separated by four sides, each of the gas-knife compartments being disposed along at least one of the four sides, and optionally along one or more vertices, and wherein optionally: (i) the first gas-knife compartment extends around one half of the circumference of the immersion space, and the second gas-knife compartment extends around the other half of the circumference of the immersion space, or (ii) the first gas-knife compartment extends around one of the four sides of the shape, and the second gas-knife compartment extends around another of the four sides of the shape. (ii) the first and second gas-knife compartments are disposed opposite each other relative to a center of the immersion space, the first and second gas-knife compartments extending around a portion of the immersion space, the fluid handling structure further comprising a third and fourth gas-knife compartments disposed between the first and second gas-knife compartments, the third and fourth gas-knife compartments being connected to another gas chamber configured to supply another gas; optionally, the gas comprises carbon dioxide and the another gas comprises air; optionally, the gas-knife comprises further gas-knife compartments configured to supply the gas or the another gas.

3. The fluid treatment system of any of the preceding claims, further comprising a variable flow valve controller, wherein the variable flow valve controller is configured to individually control the flow through each of the first gas knife compartment, second gas knife compartment, first gas supply compartment, and second gas supply compartment, desirably wherein, The variable flow valve controller is configured to set a gas flow through the first gas-knife compartment higher than a flow through the second gas-knife compartment, and the variable flow valve controller is further configured to set a flow through the first gas supply compartment lower than a flow through the second gas-knife compartment, and / or desirably wherein the variable flow valve controller is configured to set a gas flow through each of the gas-knife compartments and gas supply compartments based on a direction of movement of the substrate.

4. The fluid treatment system of any of the preceding claims, wherein, The gas-knife chamber is configured to output a gas flow at a flow rate of up to 200 Nl / min, and / or wherein the gas supply chamber is configured to output a gas flow at a flow rate of up to 200 Nl / min.

5. The fluid handling system according to any of the preceding claims, the fluid handling system further comprising: a first gas-knife channel having one end connected to the gas-knife chamber and having a second gas-knife channel and a third gas-knife channel extending from another end of the first gas-knife channel, the second gas-knife channel having another end connected to the first gas-knife compartment, having the first gas-knife variable flow valve disposed therebetween, and the third gas-knife channel having another end connected to the second gas-knife compartment, having the second gas-knife variable flow valve disposed therebetween, and / or the fluid handling system further comprising: a first gas supply channel having one end connected to a gas supply chamber and having a second gas supply channel and a third gas supply channel extending from another end of the first gas supply channel; the second gas supply channel having another end connected to the first gas supply compartment, having the first gas supply variable flow valve disposed therebetween, and the third gas supply channel having another end connected to the second gas supply compartment, having the second gas supply variable flow valve disposed therebetween.

6. The fluid treatment system of any of the preceding claims, wherein, the first and second gas-knife compartments are fluidically separated from each other, and / or wherein the first and second gas supply compartments are fluidically separated from each other.

7. The fluid treatment system of any of the preceding claims, wherein, the fluid handling structure further comprising: a third gas knife compartment comprising at least one opening radially outward from the space; a fourth gas knife compartment comprising at least one opening radially outward from the space, wherein the third gas knife compartment is in fluid communication with a gas knife chamber via a third gas knife variable flow valve, and the fourth gas knife compartment is in fluid communication with the gas knife chamber via a fourth gas knife variable flow valve, and the third and fourth gas knife compartments are disposed in a space between the gas supply compartments and the immersion space, and / or wherein the fluid handling structure further comprises: a third gas supply compartment comprising at least one opening radially outward from the immersion space from at least one opening of each of the gas knife compartments; a fourth gas supply compartment comprising at least one opening radially outward from the immersion space from at least one opening of each of the gas knife compartments, wherein the third gas supply compartment is in fluid communication with a gas supply chamber via a third gas supply variable flow valve, and the fourth gas supply compartment is in fluid communication with the gas supply chamber via a fourth gas supply variable flow valve, and the third and fourth gas supply compartments are disposed such that the gas knife compartments are disposed in a space between the gas supply compartments and the immersion space.

8. The fluid treatment system of claim 7, comprising the variable flow valve controller of claim 3, wherein the variable flow valve controller is further configured to separately control the flow through the third gas knife compartment and third gas supply compartment, desirably wherein, the variable flow valve controller is configured to control the flow through each of the fourth gas knife compartment and the fourth gas supply compartment individually, and / or desirably wherein the variable flow valve controller is configured to control the flow through each of the gas knife compartments and gas flow compartments individually based on movement of the substrate relative to the fluid handling structure.

9. The fluid treatment system of any of the preceding claims, wherein, the first, second, third, and fourth gas knife compartments are fluidically separated from one another, and / or wherein the fluid handling structure further comprises: a first liquid supply compartment comprising at least one opening radially outward from the immersion space and radially inward from the first gas knife compartment and the first gas supply compartment; a second liquid supply compartment comprising at least one opening radially outward from the immersion space and radially inward from the second gas knife compartment and the second gas supply compartment; wherein the first liquid supply compartment is in fluid communication with a liquid supply chamber via a first liquid supply variable flow valve, and the second liquid supply compartment is in fluid communication with the liquid supply chamber via a second liquid supply variable flow valve, desirably wherein the variable flow valve controller is configured to control the flow through the first and second liquid supply compartments individually.

10. The fluid handling system of any of the preceding claims, further comprising: a pressure reservoir fluidically connected to each gas knife compartment configured to provide an additional pulse of gas flow to the respective gas knife compartment, and / or the fluid handling system further comprises: a control unit configured to cause at least one of the pressure reservoirs to provide an additional gas flow pulse to the gas knife compartment to which it is connected in response to a determination that an edge of the substrate intersects a gas knife compartment to which at least one of the pressure reservoirs is connected in a plan view of the substrate, and / or wherein the gas knife chambers are configured to supply substantially pure CO2 through at least one opening of each of the respective gas knife compartments, and / or wherein the gas supply chambers are configured to supply substantially pure CO2 through at least one opening of each of the respective gas supply compartments, and / or wherein the fluid handling system is configured to adjust a gas flow through the first gas knife compartment, the second gas knife compartment, the first gas supply compartment, and the second gas supply compartment based on at least one of a plurality of parameters, wherein the parameters include: a position of the substrate relative to the fluid handling structure, a predicted volume of immersion liquid outside of the immersion space on a surface of the substrate, a predicted size of a droplet of immersion liquid outside of the immersion space on a surface of the substrate, a predicted position of liquid outside of the immersion space on the surface of the substrate, a distance between a bottom surface of the fluid handling structure and a surface of the substrate facing the fluid handling structure, a gas flow provided to the surface of the substrate, a substrate velocity, a substrate acceleration, a position of resist on a substrate surface, a contact angle of the resist with the substrate surface.

11. A fluid handling system comprising a fluid handling structure according to any one of the preceding claims, wherein, the first gas knife compartment and the second gas knife compartment define a gas knife, and the fluid handling structure further comprises: a liquid supply comprising a first liquid supply opening and a second liquid supply opening, the liquid supply configured to supply liquid to the immersion space through the first liquid supply opening and the second liquid supply opening; wherein the first liquid supply opening and the second liquid supply opening are disposed radially inward from the gas knife and diametrically opposite each other relative to the immersion space, and the first liquid supply opening and the second liquid supply opening are connected to a liquid supply chamber, desirably the fluid handling structure comprises a fluid extraction comprising a set of extraction openings, the fluid extraction configured to extract immersion fluid from the immersion space through the extraction openings, wherein each of the extraction openings is fluidically connected to a negative pressure, wherein the liquid supply is disposed radially inward of the fluid extraction.

12. The fluid treatment system of claim 11 wherein, the set of extraction openings are disposed radially inward from the gas knife and the extraction openings are disposed around a perimeter of the immersion space, desirably the fluid handling system further comprises a fluid extraction variable flow valve disposed between the negative pressure and each respective extraction opening, or desirably wherein the set of extraction openings comprises a first extraction opening, a second extraction opening, a third extraction opening, and a fourth extraction opening, and the fluid extraction further comprises: a first fluid extraction variable flow valve disposed between a negative pressure and the first fluid extraction opening, and / or a second fluid extraction variable flow valve disposed between a negative pressure and the second fluid extraction opening, and / or a third fluid extraction variable flow valve disposed between a negative pressure and the third fluid extraction opening, and / or a fourth fluid extraction variable flow valve disposed between a negative pressure and the fourth fluid extraction opening, Desirably, at least one of the first fluid extraction variable flow valve, the second fluid extraction variable flow valve, the third fluid extraction variable flow valve, and the fourth fluid extraction variable flow valve is configured to extract fluid through one of the extraction openings at a higher rate than through another of the extraction openings.

13. The fluid treatment system of claim 11 or 12, wherein, the fluid extraction comprises at least another set of extraction openings, wherein the set of extraction openings is concentric with the at least another set of extraction openings, and / or the fluid handling system further comprises a first liquid supply variable flow valve disposed between the liquid supply chamber and the first liquid supply opening, wherein the first liquid supply variable flow valve is configured to control liquid flow from the first liquid supply opening, and / or the fluid handling system further comprises a second liquid supply variable flow valve disposed between the liquid supply chamber and the second liquid supply opening, wherein the second liquid supply variable flow valve is configured to control liquid flow from the second liquid supply opening, and / or wherein liquid flow from the first liquid supply opening is greater than liquid flow from the second liquid supply opening, or liquid flow from the first liquid supply opening is the same as liquid flow from the second liquid supply opening, or liquid flow from the first liquid supply opening is less than liquid flow from the second liquid supply opening.

14. The fluid treatment system of any of the preceding claims, wherein, the fluid handling structure comprises a supply opening on an inner surface thereof and comprises a supply variable flow valve, wherein liquid is supplied to the immersion space through the supply opening and the supply variable flow valve regulates flow of liquid through the supply opening, and / or wherein the fluid handling structure comprises a recovery opening on an inner surface thereof and comprises a recovery variable flow valve, wherein immersion liquid is recovered from the immersion space through the recovery opening and the recovery variable flow valve regulates recovery flow of liquid through the recovery opening, and / or wherein the fluid handling system is configured to regulate gas flow through the first gas knife compartment and the second gas knife compartment based on at least one of a plurality of parameters, wherein the parameters include: a position of the substrate relative to the fluid handling structure, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of immersion liquid on a surface of the substrate outside of the immersion space, a predicted size of a droplet of immersion liquid on a surface of the substrate outside of the immersion space, a predicted position of liquid on a surface of the substrate outside of the immersion space, a predicted volume of a distance between a bottom surface of the fluid handling structure and a surface of the substrate facing the fluid handling structure, a gas flow provided to the surface of the substrate, a substrate speed, a substrate acceleration, a position of a resist on the surface of the substrate, and a contact angle of the resist with the surface of the substrate.

15. A lithographic apparatus comprising a fluid handling system according to any of the preceding claims.

Images