A valve core polishing device for hydrogen energy ball valve processing

By introducing a dust cover for contaminants, a polishing slurry spraying system, and optical sensing technology into the hydrogen-powered ball valve core polishing equipment, the problems of dust pollution and uneven application of polishing slurry during the polishing process have been solved, achieving efficient and stable polishing results and resource recycling.

CN121552235BActive Publication Date: 2026-03-31YANGQUAN VALVE CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2026-01-21
Publication Date
2026-03-31

AI Technical Summary

Technical Problem

Existing hydrogen-powered ball valve core polishing equipment lacks effective dust prevention measures, the polishing slurry is applied unevenly, and there is a lack of cleaning and collection components, resulting in unstable polishing quality and waste of resources.

Method used

A dust cover for contaminants, a polishing slurry spraying system, and a cleaning scraper were designed. By combining optical sensing and spectral analysis technology, the polishing slurry can be sprayed evenly, quantitatively monitored, and automatically cleaned. The polishing slurry collection and reuse are also integrated.

Benefits of technology

It improves the consistency and efficiency of polishing quality, reduces resource waste, ensures the cleanliness of equipment and the environment, and enables the recycling of polishing media.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The application provides a valve core polishing device for hydrogen energy ball valve processing, and relates to the technical field of valve processing.The device comprises a polishing workbench, a contaminant dust cover is installed on the polishing workbench, a valve core clamping mechanism and a valve core polishing execution mechanism are arranged on the polishing workbench, and a polishing liquid coating and recycling mechanism is arranged below the table top of the polishing workbench.The polishing liquid coating and recycling mechanism comprises a polishing liquid collecting box, a polishing liquid cleaning scraper, at least one polishing liquid nozzle and a valve core cleaning assembly are arranged on the polishing liquid collecting box.The polishing liquid cleaning scraper can scrape off the originally contaminated or failed polishing liquid on the surface of the valve core when the polishing liquid needs to be scraped off, effectively avoiding the polishing efficiency reduction caused by the failed abrasive and the random microscopic scratches caused by the metal micro-chips on the polishing interface, guaranteeing the integrity and smoothness of the final polishing surface, and the originally contaminated or failed polishing liquid is scraped off and cleaned into the polishing liquid collecting box for collection, thereby realizing the centralized collection and treatment of the waste polishing liquid.
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Description

Technical Field

[0001] This invention belongs to the field of valve processing technology, specifically relating to a valve core polishing device for processing hydrogen energy ball valves. Background Technology

[0002] Hydrogen energy, as a clean and efficient secondary energy source, relies heavily on the reliability of its core component—the hydrogen ball valve—in its storage, transportation, and application systems. The valve core, a crucial sealing element that directly cuts off or allows high-pressure hydrogen flow, has its surface quality directly determining the valve's sealing performance, service life, and resistance to high-pressure hydrogen permeation and embrittlement. Current hydrogen ball valve core polishing equipment commonly suffers from the following problems:

[0003] (1) The lack of an effective integrated dust cover or closed working unit means that environmental dust is very likely to fall onto the valve core being polished during the polishing process, mix into the polishing liquid, and randomly roll between the polishing disc and the workpiece surface, scratching the surface of the valve core.

[0004] (2) Ideal polishing should be in a two-body wear state, that is, fresh abrasive particles perform controllable grinding on the valve core surface. However, existing polishing devices lack polishing fluid application components during the polishing process, and manual application of polishing fluid is required based on experience. Manual application results in uneven application, which affects the concentration of abrasive in each area of ​​the polishing fluid and the final polishing accuracy. At the same time, existing polishing devices lack cleaning components for the previously contaminated or ineffective polishing fluid on the valve core. These contaminated polishing fluids themselves contain valve core metal chips ground off during the polishing process. These metal chips will randomly roll on the valve core, generating uncontrollable micro-grooves and scratches, which seriously affect the final polishing quality. In addition, as the polishing time increases, the abrasive in the polishing fluid will break or become passivated, causing the polishing fluid to fail. If the ineffective polishing fluid is not cleaned and replaced in time, it will seriously affect the polishing efficiency and polishing accuracy.

[0005] (3) The lack of polishing fluid collection components means that during the polishing process, the old polishing fluid carrying a large amount of metal shavings and abrasive waste drips down the valve core, simply dripping onto the workbench or being directly discharged. This not only makes the working environment dirty and the equipment difficult to clean, but more importantly, it makes it impossible to recycle and reuse the high-cost polishing media. Summary of the Invention

[0006] This invention provides a valve core polishing device for processing hydrogen-powered ball valves, in order to solve at least one of the technical problems mentioned above.

[0007] To solve the above-mentioned technical problems, the present invention discloses a valve core polishing equipment for processing hydrogen energy ball valves, including a polishing worktable, a dust cover for contaminants installed on the polishing worktable, a valve core clamping mechanism and a valve core polishing execution mechanism provided on the polishing worktable, the valve core clamping mechanism including a left clamping component and a right clamping component, the left clamping component being installed on the polishing worktable, a spindle box mounting bracket being slidably connected in the feed groove of the polishing worktable, the right clamping component being installed on the spindle box mounting bracket, both the left and right clamping components being used to clamp the valve core and drive the valve core to rotate, the valve core polishing execution mechanism being used to polish the valve core, a polishing liquid recovery port being provided on the polishing worktable, and a polishing liquid application and recovery mechanism being provided below the table surface of the polishing worktable;

[0008] The polishing slurry application and recovery mechanism includes a polishing slurry collection tank, which is equipped with a polishing slurry cleaning scraper, at least one polishing slurry nozzle, and a valve core cleaning assembly. The polishing slurry cleaning scraper is used to scrape off and clean the polishing slurry that was previously contaminated or expired on the valve core. The polishing slurry nozzle is used to spray polishing slurry onto the valve core. The valve core cleaning assembly is used to clean the surface of the valve core.

[0009] Preferably, the left clamping assembly includes an adjusting slide, which is fixedly connected to the polishing worktable. An electric lifting tail box is slidably connected to the adjusting slide. The working end of the electric lifting tail box is used to install the chuck or the valve core inner wall polishing head. The electric lifting tail box is used to drive the chuck or the valve core inner wall polishing head to rotate and control the height of the chuck or the valve core inner wall polishing head.

[0010] The right clamping assembly includes a feed drive assembly, to which a spindle box mounting bracket is bolted. The feed drive assembly drives the spindle box mounting bracket to move left and right. Two symmetrically arranged height adjustment slide rails are fixedly connected to the spindle box mounting bracket. A height adjustment slider is slidably connected to the height adjustment slide rails and is fixedly connected to the spindle box. A height adjustment hydraulic cylinder is provided on the spindle box mounting bracket. The end of the height adjustment hydraulic cylinder away from the spindle box mounting bracket is fixedly connected to the spindle box. The working end of the spindle box is used to install chuck two. The spindle box drives chuck two to rotate. Chuck one and chuck two are used to clamp the inner wall of the valve core.

[0011] Preferably, the valve core polishing actuator includes a guide column, which is fixedly connected to the spindle box mounting bracket. A polishing height adjustment motor is fixedly connected to the top of the guide column, and a polishing height adjustment screw is fixedly connected to the output end of the polishing height adjustment motor. A lifting arm is slidably connected to the guide column, and a polishing height adjustment nut is threaded onto the polishing height adjustment screw. The polishing height adjustment nut is fixedly connected to the lifting arm.

[0012] A polishing drive motor is fixedly connected to the lifting arm. The output end of the polishing drive motor is connected to a polishing shaft through a coupling. A U-shaped component is fixedly connected to the end of the polishing shaft away from the polishing drive motor. A cross shaft universal joint is fixedly connected to the U-shaped component. A polishing disc is fixedly connected to the other end of the cross shaft universal joint.

[0013] Preferably, the polishing slurry application and recovery mechanism further includes a collection box position adjustment component, which is used to adjust the position of the polishing slurry collection box. The polishing slurry collection box includes a solidification supply chamber and a cleaning and settling chamber. The solidification supply chamber and the cleaning and settling chamber are respectively equipped with a polishing paste supply component and a valve core cleaning component. The valve core cleaning component is used to clean the valve core. A guide plate is fixedly connected in the cleaning and settling chamber. The tail of the guide plate is curled to form a collection groove. An electric discharge auger is rotatably connected in the collection groove. A discharge pipe is provided at the output end of the collection groove. A scraper mounting groove is provided in the guide plate. A polishing slurry cleaning scraper is slidably connected to the scraper mounting groove. A scraper adjusting hydraulic cylinder is fixedly connected to the bottom of the scraper mounting groove. The end of the scraper adjusting hydraulic cylinder away from the scraper mounting groove is fixedly connected to the bottom of the polishing slurry cleaning scraper. A solid-liquid conversion mechanism is provided in the polishing slurry collection box. The polishing paste supply component is used to supply polishing paste to the solid-liquid conversion mechanism. The solid-liquid conversion mechanism is used to melt the polishing paste into polishing slurry and input it into the polishing slurry nozzle.

[0014] Preferably, the solid-liquid conversion mechanism includes a baffle plate, which is fixedly connected to the output end of the solidification supply chamber. At least one polishing paste outlet is provided on the baffle plate. A fixed shaft is fixedly connected inside the polishing liquid collection tank. At least one control cylinder is fixedly connected to the mounting platform of the polishing liquid collection tank via a V-shaped support. At least one pitch actuator is rotatably connected to the fixed shaft. The working end of the control cylinder is hinged to the pitch actuator via a connecting rod. A polishing paste inlet is provided on the arc-shaped mating surface of the pitch actuator. A polishing scraper is provided below the polishing paste inlet on the arc-shaped mating surface. The arc-shaped mating surface matches the shape of the baffle plate.

[0015] The pitch actuator box is equipped with a heating chamber, and the inner wall of the heating chamber is equipped with a heating layer composed of PTC heating elements. A miniature ring gear pump is fixed on the pitch actuator box. The input end of the miniature ring gear pump is connected to a pumping hose. The end of the pumping hose away from the miniature ring gear pump is located in the heating chamber. The output end of the miniature ring gear pump is connected to a pumping hose. The end of the pumping hose away from the miniature ring gear pump is connected to the corresponding polishing liquid nozzle. The number of polishing paste outlet, polishing paste inlet, pitch actuator box, polishing liquid nozzle, and control cylinder are equal and correspond one-to-one.

[0016] Preferably, the polishing paste supply assembly includes an auger drive motor, which is fixedly connected to the outer wall of the polishing liquid collection tank. A material equalization auger is fixedly connected to the output end of the auger drive motor. The material equalization auger is rotatably connected to the upper cavity of the curing supply chamber. A feeding port is opened on the side wall of the upper cavity. A compression piston is slidably connected to the lower cavity of the curing supply chamber. The compression piston is controlled to slide up and down by the compression drive assembly.

[0017] Both the upper and lower cavities are equipped with cooling systems, which are used to solidify the polishing slurry.

[0018] Preferably, the valve core cleaning assembly includes a sedimentation filter screen installed inside a cleaning sedimentation chamber. A transducer is installed inside the cleaning sedimentation chamber, and an ultrasonic generator is installed outside the polishing fluid collection tank. The ultrasonic generator is electrically connected to the transducer. The ultrasonic generator is used to output electrical energy with a preset frequency and power, and the transducer is used to convert the electrical energy into mechanical ultrasonic kinetic energy of the same frequency, thereby driving the cleaning fluid in the cleaning sedimentation chamber to perform ultrasonic cleaning on the valve core.

[0019] Preferably, it also includes a polishing slurry condition monitoring module, which includes:

[0020] The optical sensing submodule includes a coaxial reflective fiber optic probe mounted on a contaminant dust cover. The coaxial reflective fiber optic probe is used to emit probe light toward the valve core polishing area and receive the reflected light signal reflected back from the valve core polishing area.

[0021] The spectral analysis and processing submodule includes a spectrometer and a microprocessor. The spectrometer is used to receive the reflected light signal reflected from the valve core polishing area, and the microprocessor is used to analyze the state of the polishing fluid in the current polishing area based on the reflected light signal reflected from the valve core polishing area. The analysis results include insufficient abrasive concentration, abrasive failure, and metal impurity contamination.

[0022] An integrated control submodule is used to control the polishing slurry cleaning scraper, at least one polishing slurry nozzle, and valve core cleaning assembly of the polishing slurry application and recovery mechanism to perform scraping, spraying, and cleaning actions based on the analysis results of the polishing slurry status in the current polishing area.

[0023] Preferably, the spectral analysis processing submodule includes:

[0024] The signal processing unit is used to preprocess the reflected light signal reflected back from the polished area of ​​the valve core and output a calibration spectrum curve with the wavelength of the reflected light as the abscissa and the reflectance corresponding to each wavelength as the ordinate.

[0025] The feature extraction unit is used to extract features from the calibration spectral curve to obtain the quantitative evaluation value of abrasive concentration, the evaluation value of abrasive passivation and fragmentation degree, and the evaluation value of metal micro-chip enrichment in the current polishing area.

[0026] The analysis and decision unit is used to generate the polishing fluid state analysis results for the current polishing area based on the quantitative evaluation values ​​of abrasive concentration, abrasive passivation and fragmentation degree, and metal micro-chip enrichment degree of the current polishing area and the corresponding evaluation value thresholds.

[0027] Compared with the prior art, the present invention has the following beneficial effects:

[0028] (1) The design of the dust cover of the present invention avoids environmental dust from falling onto the valve core being polished. The polishing liquid is sprayed through the polishing liquid nozzle instead of manually applying the polishing liquid based on experience. This saves manpower and achieves uniform, quantitative and directional spraying of the polishing liquid. This not only significantly improves the work efficiency, but also ensures the consistency of abrasive concentration in different areas of the valve core surface. The design of the polishing liquid cleaning scraper can scrape off the polishing liquid that was previously contaminated or failed on the surface of the valve core when polishing liquid needs to be scraped off, so that new polishing liquid can be sprayed later. This effectively avoids the decrease in polishing efficiency caused by failed abrasive and the random micro-scratches caused by metal chips on the polishing interface. This greatly ensures the integrity and smoothness of the final polished surface. The previously contaminated or failed polishing liquid is scraped off and cleaned into the polishing liquid collection box for collection. This realizes the centralized collection and treatment of waste polishing liquid, which not only keeps the equipment and working environment clean, but also creates conditions for the recycling of polishing media, saving costs and resources.

[0029] (2) This invention completely changes the extensive mode of traditional polishing process that relies on the experience of operators and manages the state of polishing fluid by visual observation or timed forced fluid replacement. It solves the problems of polishing quality fluctuation, material waste and low efficiency caused by delayed or inaccurate state judgment. Through optical sensing and spectral analysis technology, it realizes real-time, quantitative and online monitoring of the core performance parameters of polishing fluid, and autonomously judges and updates, replenishes or deeply cleans the polishing medium at the best time. It ensures that the polishing interface is always in the optimal "two-body wear" working state. It can not only significantly stabilize and improve the consistency of polishing quality and reduce the scrap rate, but also maximize the utilization efficiency of polishing fluid and reduce consumption through on-demand supply and precise maintenance. Attached Figure Description

[0030] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used in conjunction with embodiments of the invention to explain the invention and do not constitute a limitation thereof. In the drawings:

[0031] Figure 1 This is a schematic diagram of the overall structure of the polishing equipment of the present invention;

[0032] Figure 2 This is a schematic diagram of the polishing workbench structure of the present invention;

[0033] Figure 3This is a schematic diagram of the left clamping component structure of the present invention;

[0034] Figure 4 This is a schematic diagram of the polishing liquid coating and recovery mechanism of the present invention;

[0035] Figure 5 This is a three-dimensional schematic diagram of the valve core polishing actuator of the present invention;

[0036] Figure 6 This is a cross-sectional view of the polishing worktable of the present invention;

[0037] Figure 7 This is a schematic diagram of the valve core polishing actuator of the present invention;

[0038] Figure 8 This is a schematic diagram of the cross-shaped universal joint structure of the present invention;

[0039] Figure 9 This is a schematic diagram of the polishing fluid collection box structure of the present invention;

[0040] Figure 10 This is a cross-sectional view of the polishing fluid collection tank of the present invention;

[0041] Figure 11 For the present invention Figure 10 Enlarged view of a portion at point A;

[0042] Figure 12 This is a cross-sectional view of the pitch execution box of the present invention;

[0043] Figure 13 This is a schematic diagram of the extrusion piston structure of the present invention;

[0044] Figure 14 This is a schematic diagram of the solid-liquid conversion mechanism of the present invention;

[0045] Figure 15 This is a schematic diagram of the installation of the pitch actuator box and the baffle of the present invention;

[0046] Figure 16 This is a schematic diagram of the pitch actuator box structure of the present invention.

[0047] In the diagram: 1. Polishing worktable; 10. Polishing fluid recovery port; 2. Contaminant dust cover; 3. Valve core clamping mechanism; 30. Left clamping assembly; 300. Adjustable slide; 301. Electric lifting tail box; 302. Chuck one; 310. Spindle box mounting bracket; 311. Height adjustment slide rail; 312. Height adjustment slider; 313. Spindle box; 314. Height adjustment hydraulic cylinder; 315. Chuck two; 316. Feed slide; 317. Feed drive assembly; 3170. Feed drive assembly mounting plate; 3171. Feed slide rail base; 3172. Feed slide rail; 3173. Feed motor; 3174. 3175. Feed screw; 31. Mounting bracket slide; 31. Right clamping assembly; 4. Valve core polishing actuator; 40. Guide column; 41. Polishing height adjustment motor; 42. Polishing height adjustment screw; 43. Lifting arm; 44. Polishing height adjustment nut; 45. Polishing drive motor; 46. Polishing shaft; 47. U-shaped part; 48. Cross shaft universal joint; 49. Polishing disc; 5. Polishing liquid application and recovery mechanism; 50. Polishing liquid collection tank; 500. Curing supply chamber; 5000. Upper chamber; 5001. Lower chamber; 5002. Feed port; 5003. Material distribution auger; 5004. Auger drive motor; 50 5. Extrusion piston; 5006. Extrusion screw mounting slot; 5007. Electric extrusion screw; 5008. Extrusion nut; 5009. Miniature slider one; 501. Cleaning sedimentation chamber; 51. Polishing fluid cleaning scraper; 52. Miniature slider two; 53. Baffle; 530. Polishing paste outlet; 54. Guide plate; 540. Scraper mounting slot; 541. Scraper adjusting hydraulic cylinder; 542. Gathering tank; 543. Electric discharge auger; 544. Discharge pipe; 55. Polishing fluid nozzle; 56. Installation platform; 560. Rotary shaft support; 561. Rotary shaft support; 562. Fixed shaft; 563. V-shaped support; 5 64. Control cylinder; 565. Pitch actuator box; 5650. Arc-shaped mating surface; 5651. Polishing paste inlet; 566. Polishing scraper; 567. Connecting rod; 568. Heating chamber; 569. Heating layer; 5690. Miniature ring gear pump; 5691. Pump in hose; 5692. Pump out hose; 57. Sedimentation filter screen; 570. Transducer; 571. Ultrasonic generator; 58. Front and rear moving slide rail base; 580. Front and rear moving slide rail; 581. Box support base; 582. Position adjustment drive motor; 583. Front and rear position adjustment screw; 584. Scissor lift assembly; 6. Valve core. Detailed Implementation

[0048] The preferred embodiments of the present invention will be described below with reference to the accompanying drawings. It should be understood that the preferred embodiments described herein are for illustration and explanation only and are not intended to limit the present invention.

[0049] Furthermore, in this invention, the use of terms such as "first" and "second" is for descriptive purposes only and does not specifically refer to any order or sequence, nor is it intended to limit the invention. They are merely used to distinguish components or operations described using the same technical terms and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the technical solutions and features of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. If a combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this invention.

[0050] The present invention provides the following embodiments:

[0051] Example 1

[0052] This invention provides a valve core polishing device for processing hydrogen-powered ball valves, such as... Figure 1-16 As shown, the device includes a polishing worktable 1, a dust cover 2 for contaminants installed on the polishing worktable 1, a valve core clamping mechanism 3 and a valve core polishing actuator 4 on the polishing worktable 1, the valve core clamping mechanism 3 including a left clamping component 30 and a right clamping component 31, the left clamping component 30 is installed on the polishing worktable 1, a spindle box mounting bracket 310 is slidably connected in the feed groove 316 of the polishing worktable 1, the right clamping component 31 is installed on the spindle box mounting bracket 310, both the left clamping component 30 and the right clamping component 31 are used to clamp the valve core 6 and drive the valve core 6 to rotate, the valve core polishing actuator 4 is used to polish the valve core 6, a polishing liquid recovery port 10 is opened on the polishing worktable 1, and a polishing liquid application and recovery mechanism 5 is provided under the table surface of the polishing worktable 1.

[0053] The polishing slurry application and recovery mechanism 5 includes a polishing slurry collection tank 50. The polishing slurry collection tank 50 is equipped with a polishing slurry cleaning scraper 51, at least one polishing slurry nozzle 55, and a valve core cleaning assembly. The polishing slurry cleaning scraper 51 is used to scrape and clean the polishing slurry that was previously contaminated or expired on the valve core 6. The polishing slurry nozzle 55 is used to spray polishing slurry onto the valve core 6. The valve core cleaning assembly is used to clean the surface of the valve core 6.

[0054] The working principle and beneficial effects of the above technical solution are as follows: During operation, a six-axis robotic arm is used for loading, clamping the valve core 6 between the left clamping assembly 30 and the right clamping assembly 31. The position of the valve core 6 is adjusted to be directly above the polishing liquid recovery port 10 by sliding the spindle box mounting bracket 310 along the feed slide 316. Then, the left clamping assembly 30 and the right clamping assembly 31 drive the valve core 6 to rotate. During the rotation of the valve core 6, the polishing liquid nozzle 55 is responsible for spraying polishing liquid onto the surface of the valve core 6. At the same time, the valve core polishing actuator 4 polishes the valve core 6. During the polishing process, the old polishing liquid that is contaminated or expired drips down the valve core 6 into the polishing liquid collection tank 50. When polishing liquid needs to be scraped off, the polishing liquid cleaning scraper 51 rises to contact the surface of the valve core 6. As the valve core 6 rotates, the polishing liquid that was previously contaminated or expired on the surface of the valve core 6 is scraped off and cleaned into the polishing liquid collection tank 50. The valve core cleaning assembly can clean the metal shavings attached to the inside of the valve core 6.

[0055] The dust cover 2 of this invention fundamentally prevents environmental dust from falling onto the valve core 6 being polished. Polishing liquid is sprayed through the polishing liquid nozzle 55, replacing manual application based on experience. This saves manpower while achieving uniform, quantitative, and directional spraying of the polishing liquid, significantly improving work efficiency and ensuring consistent abrasive concentration across the valve core 6 surface. The polishing liquid cleaning scraper 51 removes previously contaminated or expired polishing liquid from the valve core 6 surface when necessary, allowing for the subsequent spraying of new polishing liquid. This effectively avoids reduced polishing efficiency due to expired abrasive and random micro-scratches caused by metal chips at the polishing interface, greatly ensuring the integrity and smoothness of the final polished surface. Previously contaminated or expired polishing liquid is scraped and collected in the polishing liquid collection tank 50, achieving centralized collection and treatment of waste polishing liquid. This maintains the cleanliness of the equipment and working environment, creates conditions for the recycling of polishing media, and saves costs and resources.

[0056] Example 2

[0057] Based on Embodiment 1, the left clamping assembly 30 includes an adjusting slide 300, which is fixedly connected to the polishing worktable 1. An electric lifting tail box 301 is slidably connected to the adjusting slide 300. The working end of the electric lifting tail box 301 is used to install the chuck 302 or the valve core inner wall polishing head. The electric lifting tail box 301 is used to drive the chuck 302 or the valve core inner wall polishing head to rotate and control the height of the chuck 302 or the valve core inner wall polishing head.

[0058] The right clamping assembly 31 includes a feed drive assembly 317, on which a spindle box mounting bracket 310 is bolted. The feed drive assembly 317 is used to drive the spindle box mounting bracket 310 to move left and right. Two symmetrically arranged height adjustment slide rails 311 are fixedly connected to the spindle box mounting bracket 310. A height adjustment slider 312 is slidably connected to the height adjustment slide rails 311. The height adjustment slider 312 is fixedly connected to the spindle box 313. A height adjustment hydraulic cylinder 314 is provided on the spindle box mounting bracket 310. The end of the height adjustment hydraulic cylinder 314 away from the spindle box mounting bracket 310 is fixedly connected to the spindle box 313. The working end of the spindle box 313 is used to install a second chuck 315. The spindle box 313 is used to drive the second chuck 315 to rotate. The first chuck 302 and the second chuck 315 are used to clamp the inner wall of the valve core 6.

[0059] In this embodiment, the feed drive assembly 317 includes a feed slide rail base 3171, which is fixedly connected to the feed drive assembly mounting plate 3170 below the surface of the polishing worktable 1. A feed slide rail 3172 is fixedly connected to the feed slide rail base 3171, and a mounting bracket slide 3175 is slidably connected to the feed slide rail 3172. A spindle box mounting bracket 310 is bolted to the mounting bracket slide 3175. A feed motor 3173 is fixedly connected to the feed slide rail base 3171, and a feed screw 3174 is fixedly connected to the output end of the feed motor 3173. A feed nut is threaded onto the feed screw 3174, with the upper end of the feed nut fixedly connected to the mounting bracket slide 3175 and the lower end of the feed nut slidably connected to the feed guide groove of the feed slide rail base 3171.

[0060] In this embodiment, the electric lifting tailstock 301 is a tailstock on a conventional general-purpose machine tool, including a liftable tailstock body. A sleeve is provided on the liftable tailstock body, and a rotary drive motor is installed on the sleeve. A hydraulic cylinder assembly is installed inside the sleeve. The input end of the hydraulic cylinder assembly is connected to the rotary drive motor, and the output end of the hydraulic cylinder assembly is connected to the chuck 302. During operation, the rotary drive motor starts and drives the hydraulic cylinder assembly to rotate, and the hydraulic cylinder assembly drives the chuck 302 to rotate. The lifting of the tailstock body and the extension and retraction of the hydraulic cylinder assembly can adjust the position of the chuck 302. The lifting of the tailstock body can be achieved by any one of the existing technologies, such as a lead screw nut, a hydraulic assembly, a pneumatic assembly, or a linear motor.

[0061] In this embodiment, chuck 1 302 and chuck 2 315 are internal support chucks, which use radial outward expansion force to position and clamp the inner hole of valve core 6.

[0062] In this embodiment, the polishing head on the inner wall of the valve core can be any one of a polishing tool or a polishing wheel.

[0063] In this embodiment, the spindle box 313 is a spindle box on an existing general-purpose machine tool, including a spindle drive motor, a speed transmission mechanism installed at the output end of the spindle drive motor, a spindle installed at the output end of the speed transmission mechanism, and a chuck 315 installed at the output end of the spindle. The spindle drive motor drives the speed transmission mechanism to drive the spindle to rotate, thereby realizing the rotation control of the chuck 315.

[0064] The working principle and beneficial effects of the above technical solution are as follows: During operation, the electric lifting tail box 301 is pre-adjusted to the position of the adjusting slide 300 and positioned. Then, the six-axis robotic arm clamps the valve core 6 onto the chuck 2 315. After that, the height of the electric lifting tail box 301 is adjusted so that the chuck 1 302 is coaxial with the valve core 6 at this time. Then, the spindle box mounting bracket 310 moves towards the chuck 1 302 until the chuck 1 302 enters the inner hole of the valve core 6. Then, the chuck 1 302 clamps the valve core. Then, the left clamping component 30 and the right clamping component 31 move synchronously to adjust the position of the valve core 6 to be directly above the polishing liquid recovery port 10, thereby completing the clamping.

[0065] When adjusting the position of the spindle box mounting bracket 310, the feed drive assembly 317 drives the spindle box mounting bracket 310 to move left and right. Specifically, the feed motor 3173 drives the feed screw 3174 to rotate, the feed screw 3174 drives the feed nut to slide along the feed guide groove, thereby driving the mounting bracket slide 3175 to slide along the feed slide rail 3172, thereby driving the spindle box mounting bracket 310 to slide along the feed slide groove 316, thus realizing the left and right movement of the spindle box mounting bracket 310.

[0066] When adjusting the height of the valve core 6, the electric lifting tail box 301 adjusts its height, and at the same time the main spindle box 313 adjusts its height. Specifically, the height adjusting hydraulic cylinder 314 extends and retracts to adjust the height of the main spindle box 313. During this process, the height adjusting slider 312 slides along the height adjusting slide rail 311.

[0067] When polishing the outer wall of the valve core 6, the spindle box 313 drives the chuck 315 to rotate, thereby causing the valve core 6 to make a circular motion. During the circular motion of the valve core 6, the electric lifting tail box 301 drives the chuck 302 to rotate synchronously. During this process, the valve core polishing actuator 4 polishes the outer wall of the valve core 6. When polishing the inner wall of the valve core 6, the chuck 302 is replaced with the valve core inner wall polishing head. At this time, the chuck 315 clamps the valve core 6 and drives the valve core 6 to make a reciprocating feed motion in the left and right direction. At the same time, the electric lifting tail box 301 drives the valve core inner wall polishing head to rotate. The inner wall of the valve core 6 is polished by friction between the valve core inner wall polishing head and the inner wall of the valve core 6.

[0068] Example 3

[0069] Based on Embodiment 1, the valve core polishing actuator 4 includes a guide column 40, which is fixedly connected to the spindle box mounting bracket 310. A polishing height adjustment motor 41 is fixedly connected to the top of the guide column 40, and a polishing height adjustment screw 42 is fixedly connected to the output end of the polishing height adjustment motor 41. A lifting arm 43 is slidably connected to the guide column 40. A polishing height adjustment nut 44 is threaded onto the polishing height adjustment screw 42, and the polishing height adjustment nut 44 is fixedly connected to the lifting arm 43.

[0070] A polishing drive motor 45 is fixedly connected to the lifting arm 43. The output end of the polishing drive motor 45 is connected to a polishing shaft 46 via a coupling. A U-shaped part 47 is fixedly connected to one end of the polishing shaft 46 away from the polishing drive motor 45. A cross shaft universal joint 48 is fixedly connected to the U-shaped part 47. A polishing disc 49 is fixedly connected to the other end of the cross shaft universal joint 48.

[0071] The working principle and beneficial effects of the above technical solution are as follows: When the valve core polishing actuator 4 is working, the polishing height adjusting motor 41 drives the polishing height adjusting screw 42 to rotate, the polishing height adjusting screw 42 drives the polishing height adjusting nut 44 to move, thereby driving the lifting arm 43 to slide up and down along the guide column 40, thereby adjusting the height of the polishing disc 49 to contact the surface of the valve core 6. Then, the polishing drive motor 45 starts and drives the polishing shaft 46 to rotate, the polishing shaft 46 drives the U-shaped part 47 to rotate, the U-shaped part 47 drives the universal joint 48 near the shaft of the U-shaped part 47 to rotate, and then drives the universal joint 48 away from the shaft of the U-shaped part 47 to rotate, thereby transmitting power to the polishing disc 49 to drive the polishing disc 49 to rotate.

[0072] The design of the universal joint 48 in this invention not only changes the transmission direction, but also provides additional degree of freedom compensation capability. When the polishing disc 49 contacts the spherical surface of the valve core 6, the design of the universal joint 48 allows the polishing disc 49 to adaptively adjust its posture within a certain angle range, ensuring that the working surface of the polishing disc 49 and the polished area of ​​the valve core 6 always maintain surface contact or optimal line contact, rather than rigid point contact or edge contact. This effectively overcomes the technical bottlenecks that traditional rigid connection polishing heads are prone to in curved surface polishing, such as uneven pressure, over-polishing of edges, or under-polishing of the center. This makes the grinding force distribution more uniform, thereby obtaining higher surface accuracy and consistent surface roughness, and is particularly suitable for machining high-precision sealing curved surfaces such as the valve core 6 of hydrogen energy ball valves.

[0073] Example 4

[0074] Based on Embodiment 1, the polishing slurry application and recovery mechanism 5 further includes a collection box position adjustment component. This component adjusts the position of the polishing slurry collection box 50. The polishing slurry collection box 50 is divided into a curing supply chamber 500 and a cleaning and settling chamber 501. A polishing paste supply component and a valve core cleaning component are respectively installed in the curing supply chamber 500 and the cleaning and settling chamber 501. The valve core cleaning component cleans the valve core 6. A guide plate 54 is fixedly connected inside the cleaning and settling chamber 501. The tail of the guide plate 54 is curled to form a collection groove 542. An electric discharge auger 543 is rotatably connected inside the collection groove 542. The output end of the collection tank 542 is provided with a discharge pipe 544, and the guide plate 54 is provided with a scraper mounting groove 540. The polishing liquid cleaning scraper 51 is slidably connected to the scraper mounting groove 540. The bottom of the scraper mounting groove 540 is fixedly connected with a scraper adjusting hydraulic cylinder 541. The end of the scraper adjusting hydraulic cylinder 541 away from the bottom of the scraper mounting groove 540 is fixedly connected to the bottom of the polishing liquid cleaning scraper 51. The polishing liquid collection tank 50 is provided with a solid-liquid conversion mechanism. The polishing paste supply component is used to supply polishing paste to the solid-liquid conversion mechanism. The solid-liquid conversion mechanism is used to melt the polishing paste into polishing liquid and input it into the polishing liquid nozzle 55.

[0075] In this embodiment, the collection box position adjustment component includes a scissor lift assembly 584 and a front-back movement assembly. The scissor lift assembly 584 is fixedly connected inside the polishing worktable 1. The front-back movement assembly is fixedly connected to the scissor lift assembly 584. The front-back movement assembly includes a front-back movement slide rail base 58, which is fixedly connected to the scissor lift assembly 584. A front-back movement slide rail 580 is fixedly connected to the front-back movement slide rail base 58. A box support base 581 is slidably connected to the front-back movement slide rail base 58. A position adjustment drive motor 582 is fixedly connected to the front-back movement slide rail base 58. A front-back position adjustment screw 583 is fixedly connected to the output end of the position adjustment drive motor 582. A front-back position adjustment nut is threaded onto the front-back position adjustment screw 583. The upper end of the front-back position adjustment nut is fixedly connected to the box support base 581, and the lower end of the front-back position adjustment nut is slidably connected to the front-back movement guide groove of the front-back movement slide rail base 58.

[0076] The working principle and beneficial effects of the above technical solution are as follows: During operation, the collection box position adjustment component can adjust the height and front-back spatial position of the polishing liquid collection box 50 according to actual usage requirements. The scissor lift component 584 can control the lifting of the polishing liquid collection box 50, and the front-back movement component can control the front-back movement of the polishing liquid collection box 50. Specifically, the position adjustment drive motor 582 drives the front-back position adjustment screw 583 to rotate, and the front-back position adjustment screw 583 drives the front-back position adjustment nut to slide along the front-back movement guide groove, thereby driving the box support 581 and the polishing liquid collection box 50 to move back and forth.

[0077] When the polishing liquid is sprayed, the polishing paste supply component supplies polishing paste to the solid-liquid conversion mechanism. The solid-liquid conversion mechanism melts the polishing paste into polishing liquid and inputs it into the polishing liquid nozzle 55, which sprays it onto the surface of the valve core 6.

[0078] When scraping off the previously contaminated or expired polishing liquid from the surface of the valve core 6, the position adjustment component of the collection tank adjusts the position of the polishing liquid collection tank 50, while simultaneously coordinating with the extension and retraction of the hydraulic cylinder 541 for scraping. This ultimately causes the polishing liquid cleaning scraper 51 to adhere to the surface of the valve core 6. Subsequently, as the valve core 6 rotates, the previously contaminated or expired polishing liquid adhering to the valve core 6 is scraped off and flows along the guide plate 54 into the collection tank 542. Finally, under the action of the electric discharge auger 543, it is discharged through the discharge pipe 544 into the polishing waste liquid collection tank, awaiting filtration and reuse.

[0079] After scraping off the previously contaminated or expired polishing fluid, the valve core 6 can be immersed in the cleaning fluid in the cleaning sedimentation chamber 501 by adjusting the position of the polishing fluid collection tank 50. The debris and impurities that are difficult to scrape off on the surface of the valve core are cleaned by ultrasonic cleaning. After that, it is scraped off again by the polishing fluid cleaning scraper 51 before entering the next polishing cycle.

[0080] Example 5

[0081] Based on Example 4, the solid-liquid conversion mechanism includes a baffle 53, which is fixedly connected to the output end of the curing supply chamber 500. The baffle 53 has at least one polishing paste outlet 530. A fixed shaft 562 is fixedly connected inside the polishing liquid collection tank 50. At least one control cylinder 564 is fixedly connected to the mounting platform 56 of the polishing liquid collection tank 50 via a V-shaped support 563. At least one pitch actuator box 565 is rotatably connected to the fixed shaft 562. The working end of the control cylinder 564 is hinged to the pitch actuator box 565 via a connecting rod 567. A polishing paste inlet 5651 is provided on the arc-shaped mating surface 5650 of the pitch actuator box 565. A polishing scraper 566 is provided below the polishing paste inlet 5651 on the arc-shaped mating surface 5650. The arc-shaped mating surface 5650 is in sync with the shape of the baffle 53.

[0082] The pitch actuator box 565 is equipped with a heating chamber 568. The inner wall of the heating chamber 568 is equipped with a heating layer 569 composed of PTC heating elements. A miniature ring gear pump 5690 is fixed on the pitch actuator box 565. The input end of the miniature ring gear pump 5690 is connected to a pumping hose 5691. The end of the pumping hose 5691 away from the miniature ring gear pump 5690 is located in the heating chamber 568. The output end of the miniature ring gear pump 5690 is connected to a pumping hose 5692. The end of the pumping hose 5692 away from the miniature ring gear pump 5690 is connected to the corresponding polishing liquid nozzle 55. The number of polishing paste outlet 530, polishing paste inlet 5651, pitch actuator box 565, polishing liquid nozzle 55 and control cylinder 564 are equal and correspond one-to-one.

[0083] Optionally, a rotating shaft support cylinder 560 is fixedly connected to the mounting platform 56 of the polishing liquid collection tank 50, and a rotating shaft support 561 is fixedly connected to the rotating shaft support cylinder 560, with a fixed shaft 562 passing through the rotating shaft support 561.

[0084] The working principle and beneficial effects of the above technical solution are as follows: When the solid-liquid conversion mechanism is working, the polishing paste enters the pitch actuator box 565 through the polishing paste outlet 530 and the polishing paste inlet 5651. Then, the control cylinder 564 extends and drives the pitch actuator box 565 to rotate around the fixed shaft 562. During the rotation, the polishing paste inlet 5651 gradually shifts away from the polishing paste outlet 530. At the same time, the polishing scraper 566 scrapes the polishing paste remaining in the polishing paste outlet 530 clean. Meanwhile, the heating layer 569 is activated to heat the polishing paste entering the pitch actuator box 565, thereby causing the polishing paste to change from solid to liquid to form polishing liquid. Then, the polishing liquid is pumped into the polishing liquid nozzle 55 through the pump inlet hose 5691 and the pump outlet hose 5692 by the micro ring gear pump 5690, and sprayed onto the surface of the valve core 6 through the polishing liquid nozzle 55, thereby achieving uniform spraying of polishing liquid.

[0085] Polishing slurry typically consists of abrasives, liquid media, and pH adjusters. Normally, the slurry is applied manually to the valve core surface using a brush. During long-term settling, the abrasives in the slurry tend to settle at the bottom of the cup. When workers dip their brushes into the slurry, they often end up picking up either the top or bottom layer, resulting in inconsistent abrasive content each time. To address this sedimentation issue, workers usually stir the slurry before application or add a stirring mechanism to the bottom of the cup. However, regardless of whether the stirring is done manually or by a mechanism, the abrasives will inevitably disperse unevenly again under centrifugal force, albeit changing from an axial distribution to a radial distribution. This still results in uneven abrasive pickup, severely impacting the final polishing quality. This invention utilizes the property that abrasives do not settle in the solid state of polishing paste. While the polishing liquid is in paste form, the polishing paste is evenly measured and added to the pitch actuator box 565, ensuring that the abrasive content in the polishing paste added to the pitch actuator box 565 is essentially consistent each time. The polishing paste is then melted. During the melting process, the pitching motion of the pitch actuator box 565 ensures that the polishing liquid within the box is evenly agitated, preventing abrasive sedimentation. Finally, the polishing liquid is sprayed onto the surface of the valve core 6 through the polishing liquid nozzle 55. This ensures that the abrasive content in the polishing liquid sprayed from each nozzle 55 is essentially consistent, achieving uniform application of the polishing liquid and guaranteeing the final polishing quality.

[0086] Example 6

[0087] Based on Example 4, the polishing paste supply assembly includes a screw conveyor motor 5004, which is fixedly connected to the outer wall of the polishing liquid collection tank 50. A material leveling screw conveyor 5003 is fixedly connected to the output end of the screw conveyor motor 5004, and the material leveling screw conveyor 5003 is rotatably connected to the upper cavity 5000 of the curing supply chamber 500.

[0088] The upper cavity 5000 has a feeding port 5002 on its side wall. The lower cavity 5001 of the curing supply cavity 500 is slidably connected to the extrusion piston 5005, which is controlled to slide up and down by the extrusion drive assembly.

[0089] Both the upper cavity 5000 and the lower cavity 5001 are equipped with cooling systems, which are used to solidify the polishing slurry.

[0090] In this embodiment, the extrusion drive assembly includes an electric extrusion screw 5007, which is rotatably connected to an extrusion screw mounting groove 5006 opened in the side wall of the polishing liquid collection tank 50. An extrusion nut 5008 is threaded onto the electric extrusion screw 5007. One end of the extrusion nut 5008 is slidably connected to the extrusion screw mounting groove 5006 via a micro slider 5009, and the other end of the extrusion nut 5008 is fixedly connected to the extrusion piston 5005 via a micro slider 52. A sealing strip is provided on the inner wall of the extrusion screw mounting groove 5006 near the inner wall of the lower cavity 5001, and the micro slider 52 is slidably connected to the sealing strip.

[0091] In this embodiment, the cooling system includes a cooling chip. The cold end of the cooling chip is attached to the inner wall of the curing supply chamber 500, and the hot end of the cooling chip is connected to a heat sink. A cooling fan is installed on the heat sink. During operation, the temperature controller dynamically adjusts the current of the cooling chip according to the detection value of the temperature sensor to maintain the temperature of the curing supply chamber 500 below the curing point of the polishing paste and ensure that the polishing liquid can be cured in a short time.

[0092] The working principle and beneficial effects of the above technical solution are as follows: Before the polishing paste supply component is working, polishing liquid is pumped into the curing supply chamber 500 through the feeding port 5002. During the pumping process, the polishing liquid is transformed into polishing paste in a short time under the action of the cooling system. When the polishing paste supply component is working, the extrusion drive component controls the extrusion piston 5005 to move upward, pressing the polishing paste in the lower chamber 5001 into the upper chamber 5000. Then, the auger drive motor 5004 starts and drives the uniform material auger 5003 to rotate, ensuring that the polishing paste is evenly distributed in the axial direction of the uniform material auger 5003, ensuring the consistency of the amount of polishing paste squeezed into each pitch execution box 565. With the extrusion of the extrusion piston 5005, the polishing paste is evenly squeezed out of the polishing paste outlet 530 and enters the pitch execution box 565.

[0093] Specifically, the electric extrusion screw 5007 rotates to drive the extrusion nut 5008 to slide up and down along the extrusion screw mounting groove 5006, thereby controlling the extrusion piston 5005 to slide up and down.

[0094] The design of the cooling system, extrusion piston 5005, and material feeding auger 5003 in this invention ensures the uniformity of material feeding, laying the foundation for the uniform spraying of polishing liquid.

[0095] Example 7

[0096] Based on Example 4, the valve core cleaning assembly includes a sedimentation filter 57, which is installed in the cleaning sedimentation chamber 501. A transducer 570 is provided in the cleaning sedimentation chamber 501, and an ultrasonic generator 571 is provided outside the polishing liquid collection tank 50. The ultrasonic generator 571 is electrically connected to the transducer 570. The ultrasonic generator 571 is used to output electrical energy with a preset frequency and power, and the transducer 570 is used to convert the electrical energy into mechanical ultrasonic kinetic energy of the same frequency, and drive the cleaning liquid in the cleaning sedimentation chamber 501 to perform ultrasonic cleaning on the valve core 6.

[0097] The working principle and beneficial effects of the above technical solution are as follows: When the valve core cleaning assembly is working, the valve core 6 is partially immersed in the cleaning sedimentation chamber 501. Then, the ultrasonic generator 571 and transducer 570 are activated, so that the metal chips and contaminated abrasives attached to the valve core 6 are cleaned out into the cleaning fluid and finally deposited on the sedimentation filter screen 57.

[0098] This invention uses ultrasonic technology to remove metal chips and failed abrasive particles remaining in the micro-pits or textures on the surface of the valve core 6 after polishing. By cleaning the surface of the valve core 6, scratches caused by metal chips are further avoided, while ensuring the uniformity of the polishing liquid adhering to the surface of the valve core 6 in the next polishing cycle.

[0099] Example 8

[0100] Based on Example 1, a polishing slurry status monitoring module is also included. The polishing slurry status monitoring module includes:

[0101] The optical sensing submodule includes a coaxial reflective fiber optic probe mounted on the contaminant dust cover 2. The coaxial reflective fiber optic probe is used to emit probe light into the polished area of ​​the valve core 6 and receive the reflected light signal reflected back from the polished area of ​​the valve core 6.

[0102] The spectral analysis and processing submodule includes a spectrometer and a microprocessor. The spectrometer is used to receive the reflected light signal reflected from the polishing area of ​​valve core 6, and the microprocessor is used to analyze the state of the polishing fluid in the current polishing area based on the reflected light signal reflected from the polishing area of ​​valve core 6. The analysis results include insufficient abrasive concentration, abrasive failure, and metal impurity contamination.

[0103] An integrated control submodule is used to control the polishing liquid cleaning scraper 51, at least one polishing liquid nozzle 55, and valve core cleaning assembly of the polishing liquid application and recovery mechanism 5 to perform scraping, spraying, and cleaning actions based on the analysis results of the polishing liquid status in the current polishing area.

[0104] In this embodiment, the polishing area of ​​valve core 6 is the upper half of the surface area of ​​valve core 6 in each polishing cycle.

[0105] In this embodiment, the internal optical fibers of the coaxial reflective fiber optic probe are arranged in concentric circles: the central single optical fiber is used to transmit the probe light emitted by the broadband light source transmitter to the polished area of ​​the valve core 6, and the outer ring of optical fibers is used to receive the reflected light reflected back from the polished area of ​​the valve core 6.

[0106] In this embodiment, the reflected light signal reflected from the polished area of ​​the valve core 6 is the original spectral curve with the wavelength of the reflected light as the abscissa and the relative intensity value that is proportional to the light intensity of the reflected light corresponding to each wavelength as the ordinate.

[0107] In this embodiment, based on the analysis results of the polishing fluid state in the current polishing area, the polishing fluid cleaning scraper 51, several polishing fluid nozzles 55, and valve core cleaning assembly of the polishing fluid application and recovery mechanism 5 are controlled to perform scraping, spraying, and cleaning actions respectively, specifically including:

[0108] When the analysis results show that the abrasive concentration is insufficient, the polishing liquid nozzle 55 of the polishing liquid coating and recovery mechanism 5 is controlled to spray polishing liquid onto the current polishing area.

[0109] When the analysis result indicates abrasive failure, the polishing slurry cleaning scraper 51 of the polishing slurry application and recovery mechanism 5 is first controlled to scrape off the failed polishing slurry on the surface of the current polishing area. Then, new and effective polishing slurry is sprayed into the current polishing area through the polishing slurry nozzle 55.

[0110] When the analysis result indicates metal impurity contamination, the polishing liquid cleaning scraper 51 of the polishing liquid application and recovery mechanism 5 is first used to scrape off the contaminated polishing liquid on the surface of the current polishing area. Then, the surface of the current polishing area is cleaned by the valve core cleaning assembly. After that, the cleaned current polishing area is scraped off a second time by the polishing liquid cleaning scraper 51. Finally, new polishing liquid is sprayed onto the current polishing area through the polishing liquid nozzle 55.

[0111] The working principle and beneficial effects of the above technical solution are as follows: The coaxial reflective fiber optic probe installed on the dust cover 2 of the contaminant vertically projects broadband detection light onto the current polishing area of ​​the valve core 6. The polishing liquid film layer (containing abrasive, metal chips, media, etc.) on the surface of the polishing area will absorb, scatter, and reflect the incident light. The reflected light signal is received by the probe and transmitted to the spectrometer to form the original reflection spectrum curve. Then, the microprocessor analyzes the state of the polishing liquid in the current polishing area. The analysis results include insufficient abrasive concentration, abrasive failure, and metal impurity contamination. Subsequently, the polishing liquid coating and recovery mechanism 5 is automatically triggered to perform corresponding compensation operations: if the concentration is insufficient, the polishing liquid nozzle 55 is controlled to spray again; if the abrasive fails, the polishing liquid cleaning scraper 51 is first controlled to scrape off the old liquid, and then new liquid is sprayed again; if there is metal contamination, an enhanced cleaning and renewal process of "scraping, ultrasonic cleaning, secondary scraping, and respraying" is performed.

[0112] This invention completely changes the traditional polishing process, which relies on the operator's experience and manages the polishing slurry's state through visual observation or timed forced slurry changes. It solves the problems of polishing quality fluctuations, material waste, and low efficiency caused by delayed or inaccurate state judgment. Through optical sensing and spectral analysis technology, it achieves real-time, quantitative, and online monitoring of the core performance parameters of the polishing slurry. It autonomously judges and updates, replenishes, or deeply cleans the polishing medium at the optimal time, ensuring that the polishing interface is always in the optimal "two-body wear" working state. This not only improves the consistency of polishing quality and reduces the scrap rate, but also maximizes the utilization efficiency of the polishing slurry and reduces consumption through on-demand supply and precise maintenance.

[0113] Example 9

[0114] Based on Example 8, the spectral analysis processing submodule includes:

[0115] The signal processing unit is used to preprocess the reflected light signal reflected from the polished area of ​​valve core 6 and output a calibration spectrum curve with the wavelength of the reflected light as the abscissa and the reflectivity corresponding to each wavelength as the ordinate.

[0116] The feature extraction unit is used to extract features from the calibration spectral curve to obtain the quantitative evaluation value of abrasive concentration, the evaluation value of abrasive passivation and fragmentation degree, and the evaluation value of metal micro-chip enrichment in the current polishing area.

[0117] The analysis and decision unit is used to generate the polishing fluid state analysis results for the current polishing area based on the quantitative evaluation values ​​of abrasive concentration, abrasive passivation and fragmentation degree, and metal micro-chip enrichment degree of the current polishing area and the corresponding evaluation value thresholds.

[0118] In this embodiment, the reflected light signal reflected from the polished area of ​​valve core 6 is preprocessed, specifically including:

[0119] The reference spectral curve, which was collected from a standard whiteboard under the same optical path conditions, is called up. The ordinate value of the original spectral curve is divided by the ordinate value of the corresponding wavelength of the reference spectral curve to obtain the reflectance of the corresponding wavelength. The calibrated spectral curve is obtained by calibrating with the wavelength of the reflected light as the abscissa and the reflectance corresponding to each wavelength as the ordinate.

[0120] In this embodiment, the quantitative evaluation value of the abrasive concentration in the current polishing area is the difference between the reference reflectance and the average reflectance of the calibration spectrum curve within a predetermined abrasive scattering characteristic band. The reference reflectance is obtained by measuring the average reflectance of the clean valve core metal surface in the same band. The larger the difference, the more light is scattered in all directions, the weaker the reflected light signal that can be accurately reflected back to the spectrometer from the polishing area of ​​valve core 6, and the smaller the average reflectance of the calibration spectrum curve. At this time, the overall concentration of abrasive particles in the polishing fluid is greater.

[0121] In this embodiment, the abrasive passivation and breakage degree assessment value of the current polishing area is the ratio of the average reflectance of a specific short-wavelength sub-band to a long-wavelength sub-band in the abrasive scattering characteristic band of the calibration spectral curve. This ratio is used to characterize the particle size distribution characteristics of the abrasive particle group. The larger the average reflectance ratio of the specific short-wavelength sub-band to the long-wavelength sub-band in the abrasive scattering characteristic band, the smaller the abrasive particle size is. At this time, the abrasive breakage and passivation degree is intensified, thereby quantifying the degree of breakage and passivation of abrasive particles in the polishing fluid.

[0122] In this embodiment, the evaluation value of the enrichment of metal micro-shavings in the current polishing area is the difference between the average reflectance of the adjacent bands of the predetermined characteristic absorption band of the valve core metal element (representing the background reflection level when there is no valve core metal) and the reflectance at the bottom of the calibration spectrum curve, i.e., the minimum reflectance, within the predetermined characteristic absorption band of the valve core metal element. This difference is used to quantify the enrichment concentration of metal impurity particles. The larger the difference, the stronger the absorption of the characteristic wavelength of the valve core metal element by the polished valve core metal element. The more valve core metal elements are polished off, the smaller the reflectance at the bottom of the calibration spectrum curve becomes, and the higher the enrichment concentration of metal impurity particles.

[0123] In this embodiment, the analysis and decision-making unit generates the polishing fluid state analysis results for the current polishing area based on the quantitative evaluation values ​​of abrasive concentration, abrasive passivation and fragmentation degree, and metal micro-chip enrichment in the current polishing area, along with the corresponding evaluation value thresholds. Specifically, this includes:

[0124] The quantitative evaluation value of abrasive concentration in the current polishing area is compared with the preset abrasive concentration evaluation value threshold. If it is consistently lower than the preset abrasive concentration evaluation value threshold, an analysis result of "insufficient abrasive concentration" is generated.

[0125] The abrasive passivation and breakage degree assessment value of the current polishing area is compared with the preset abrasive passivation and breakage degree assessment value threshold. If it is consistently higher than the preset abrasive passivation and breakage degree assessment value threshold, an analysis result of "abrasive breakage and passivation" is generated.

[0126] The current metal chip enrichment assessment value of the polished area is compared with the preset metal chip enrichment assessment value threshold. If it continues to be higher than the preset metal chip enrichment assessment value threshold, the analysis result of "metal impurity contamination" is generated.

[0127] The working principle and beneficial effects of the above technical solution are as follows: The present invention preprocesses and calibrates the signal to eliminate ambient light path interference and obtains a calibration spectrum curve reflecting the optical properties of the polishing liquid film layer itself. By quantifying and extracting the characteristics of the curve in specific characteristic bands (such as abrasive scattering band and metal element characteristic absorption band), the "abrasive concentration quantification evaluation value", "abrasive passivation and breakage degree evaluation value" and "metal micro-chip enrichment degree evaluation value" of the current polishing area are determined. The integrated control submodule compares these evaluation values ​​with preset process thresholds and automatically diagnoses specific states such as "insufficient abrasive concentration", "abrasive failure (passivation / breakage)" or "metal impurity contamination".

[0128] Obviously, those skilled in the art can make various modifications and variations to this invention without departing from its spirit and scope. Therefore, if these modifications and variations fall within the scope of the claims of this invention and their equivalents, this invention also intends to include these modifications and variations.

Claims

1. A valve core polishing apparatus for hydrogen energy ball valve processing, characterized by: The polishing workbench (1) is provided with a dust cover (2), a valve core clamping mechanism (3) and a valve core polishing execution mechanism (4), the valve core clamping mechanism (3) comprises a left clamping assembly (30) and a right clamping assembly (31), the left clamping assembly (30) is installed on the polishing workbench (1), The polishing workbench (1) is provided with a dust cover (2), a valve core clamping mechanism (3) and a valve core polishing execution mechanism (4), the valve core clamping mechanism (3) comprises a left clamping assembly (30) and a right clamping assembly (31), the left clamping assembly (30) is installed on the polishing workbench (1), The polishing workbench (1) is provided with a dust cover (2), a valve core clamping mechanism (3) and a valve core polishing execution mechanism (4), the valve core clamping mechanism (3) comprises a left clamping assembly (30) and a right clamping assembly (31), the left clamping assembly (30) is installed on the polishing workbench (1), The polishing workbench (1) is provided with a dust cover (2), a valve core clamping mechanism (3) and a valve core polishing execution mechanism (4), the valve core clamping mechanism (3) comprises a left clamping assembly (30) and a right clamping assembly (31), the left clamping assembly (30) is installed on the polishing workbench (1), 2. The hydrogen energy ball valve machining valve core polishing equipment according to claim 1, characterized in that: The left clamping assembly (30) comprises an adjusting slide (300) fixedly connected to the polishing workbench (1), an electric lifting tail box (301) slidably connected to the adjusting slide (300), and a work end of the electric lifting tail box (301) used for mounting a chuck one (302) or a valve core inner wall polishing head; the electric lifting tail box (301) is used for driving the chuck one (302) or the valve core inner wall polishing head to rotate and controlling the height of the chuck one (302) or the valve core inner wall polishing head; The right clamping assembly (31) comprises a feeding driving assembly (317), a main shaft box mounting frame (310) boltedly connected to the feeding driving assembly (317), and the feeding driving assembly (317) used for driving the main shaft box mounting frame (310) to move leftward and rightward; the main shaft box mounting frame (310) is fixedly connected with two symmetrical height adjusting slides (311), the height adjusting slides (311) are slidably connected with height adjusting sliding blocks (312), the height adjusting sliding blocks (312) are fixedly connected to a main shaft box (313), the main shaft box mounting frame (310) is provided with a height adjusting hydraulic cylinder (314), one end of the height adjusting hydraulic cylinder (314) away from the main shaft box mounting frame (310) is fixedly connected to the main shaft box (313), a work end of the main shaft box (313) is used for mounting a chuck two (315), and the main shaft box (313) is used for driving the chuck two (315) to rotate; the chuck one (302) and the chuck two (315) are used for clamping the inner wall of the valve core (6).

3. The valve core polishing device for hydrogen energy ball valve processing according to claim 1, characterized in that: The valve core polishing actuator (4) comprises a guide column (40) fixedly connected to the main shaft box mounting frame (310), a polishing height adjusting motor (41) fixedly connected to the top of the guide column (40), a polishing height adjusting screw (42) fixedly connected to the output end of the polishing height adjusting motor (41), a lifting arm (43) slidably connected to the guide column (40), and a polishing height adjusting nut (44) threadedly connected to the polishing height adjusting screw (42) and fixedly connected to the lifting arm (43); The lifting arm (43) is fixedly connected with a polishing driving motor (45), the polishing driving motor (45) is connected with a polishing rotating shaft (46) through a shaft coupling, one end of the polishing rotating shaft (46) away from the polishing driving motor (45) is fixedly connected with a U-shaped piece (47), the U-shaped piece (47) is fixedly connected with a cross axle universal joint (48), and the other end of the cross axle universal joint (48) is fixedly connected with a polishing disc (49).

4. The valve core polishing device for hydrogen energy ball valve processing according to claim 1, characterized in that: The solid-liquid conversion mechanism comprises a baffle (53) fixedly connected at the output end of the solidification feeding cavity (500), at least one polishing paste discharge port (530) is formed in the baffle (53), a fixed shaft (562) is fixedly connected in the polishing liquid collecting box (50), at least one control cylinder (564) is fixedly connected on the mounting platform (56) of the polishing liquid collecting box (50) through a V-shaped support (563), at least one pitch executing box (565) is rotatably connected on the fixed shaft (562), the working end of the control cylinder (564) is hingedly connected with the pitch executing box (565) through a connecting rod (567), a polishing paste feeding port (5651) is formed in the arc-shaped matching surface (5650) of the pitch executing box (565), a polishing scraping strip (566) is arranged below the polishing paste feeding port (5651) on the arc-shaped matching surface (5650), and the arc-shaped matching surface (5650) is matched with the baffle (53) in shape; The heating cavity (568) is provided with a heating layer (569) composed of PTC heating sheets on the inner wall, a micro annular gear pump (5690) is fixed on the pitch executing box (565), a pump-in hose (5691) is connected to the input end of the micro annular gear pump (5690), one end of the pump-in hose (5691) away from the micro annular gear pump (5690) is located in the heating cavity (568), a pump-out hose (5692) is connected to the output end of the micro annular gear pump (5690), one end of the pump-out hose (5692) away from the micro annular gear pump (5690) is in communication with the corresponding polishing liquid nozzle (55), and the number of the polishing paste discharge port (530), the polishing paste feeding port (5651), the pitch executing box (565), the polishing liquid nozzle (55) and the control cylinder (564) is equal and one-to-one corresponding.

5. The valve core polishing device for hydrogen energy ball valve processing according to claim 1, characterized in that: The polishing paste feeding assembly comprises an auger driving motor (5004) fixedly connected to the outer wall of the polishing liquid collecting box (50), a material uniformizing auger (5003) fixedly connected to the output end of the auger driving motor (5004), the material uniformizing auger (5003) is rotatably connected to the upper cavity (5000) of the solidification feeding cavity (500), A feeding port (5002) is formed in the side wall of the upper cavity (5000), an extrusion piston (5005) is slidably connected in the lower cavity (5001) of the solidification feeding cavity (500) in an up-down manner, and the extrusion piston (5005) is controlled to slide up and down through an extrusion driving assembly; Cooling systems are arranged in the upper cavity (5000) and the lower cavity (5001), and the cooling systems are used for solidifying the polishing liquid.

6. The valve core polishing equipment for hydrogen energy ball valve processing according to claim 1, characterized in that: The valve core cleaning assembly comprises a sediment filter screen (57) installed in a cleaning sediment cavity (501), the cleaning sediment cavity (501) is provided with a transducer (570), the polishing liquid collecting tank (50) is provided with an ultrasonic generator (571), the ultrasonic generator (571) is electrically connected with the transducer (570), the ultrasonic generator (571) is used for outputting electric energy with a preset frequency and power, the transducer (570) is used for converting the electric energy into mechanical ultrasonic wave energy with the same frequency, and the cleaning liquid in the cleaning sediment cavity (501) is used for ultrasonic cleaning of the valve core (6).

7. The valve core polishing device for hydrogen energy ball valve processing according to claim 1, characterized in that: The polishing liquid state monitoring module comprises: An optical sensing sub-module comprises a coaxial reflective optical fiber probe installed on the dust cover (2), the coaxial reflective optical fiber probe is used for emitting a detection light to the polishing area of the valve core (6) and receiving a reflected light signal reflected from the polishing area of the valve core (6); A spectrum analysis processing sub-module comprises a spectrometer and a microprocessor, the spectrometer is used for receiving the reflected light signal reflected from the polishing area of the valve core (6), and the microprocessor is used for analyzing a current polishing liquid state of the polishing area based on the reflected light signal, the analysis result comprises insufficient abrasive concentration, abrasive failure and metal impurity pollution; An integrated control sub-module is used for controlling the polishing liquid cleaning scraper (51), the at least one polishing liquid nozzle (55) and the valve core cleaning assembly of the polishing liquid coating and recycling mechanism (5) to perform scraping, spraying and cleaning actions respectively based on the analysis result of the current polishing liquid state of the polishing area.

8. The valve core polishing device for hydrogen energy ball valve processing according to claim 7, characterized in that: The spectrum analysis processing sub-module comprises: A signal processing unit is used for pre-processing the reflected light signal reflected from the polishing area of the valve core (6) and outputting a calibration spectrum curve with a light wave wavelength of the reflected light as an abscissa and a reflectivity corresponding to each light wave wavelength as an ordinate; A feature extraction unit is used for extracting features of the calibration spectrum curve to obtain an abrasive concentration quantitative evaluation value, an abrasive passivation and crushing degree evaluation value and a metal micro-particle enrichment degree evaluation value of the current polishing area; An analysis and decision unit is used for generating the analysis result of the current polishing liquid state of the polishing area based on the abrasive concentration quantitative evaluation value, the abrasive passivation and crushing degree evaluation value and the metal micro-particle enrichment degree evaluation value of the current polishing area and corresponding evaluation value thresholds.

Citation Information

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