Double-rotation magnetron sputtering cathode

Abstract

The invention discloses a double-rotation magnetron sputtering cathode which comprises a target tube used for loading a target material; the first driving assembly is used for driving the target tube to rotate around the central axis; the target tube is characterized by further comprising a magnetic assembly which is coaxially arranged in the target tube; the second driving assembly is used for driving the magnetic assembly to rotate around the central axis; and the first driving assembly and the second driving assembly are independently controlled, so that the target tube and the magnetic assembly can generate relative rotation motion. By independently controlling the relative rotation motion of the target tube and the internal magnetic assembly, the dynamic scanning of the magnetic field relative to the surface of the target material is realized, so that the etching area is uniformly distributed in the axial direction and the circumferential direction. By means of the design, the problem of local deep groove etching caused by a traditional fixed magnetic field is effectively avoided, the utilization rate of the target material is remarkably improved, and material waste is reduced.

Description

Technical Field

[0001] This application relates to the technical field of magnetron sputtering, and in particular to a dual-spin magnetron sputtering cathode. Background Technology

[0002] Traditional magnetron-controlled rotating cathodes typically consist of a cylindrical target tube (serving as both the cathode and target material), an internal fixed magnetic assembly, and a cooling system. During operation, the target tube rotates at a constant speed driven by a motor, while the internal magnetic rod remains stationary. The closed magnetic field generated by the rod confines the plasma near the target surface, thereby increasing the ionization rate. Compared to planar cathodes, rotating cathodes have become the preferred choice for large-scale industrial production due to their higher target material utilization (up to 80% or more), better film thickness uniformity, and ability to withstand higher power.

[0003] However, in existing magnetron-controlled rotating cathode technologies, the magnetic field distribution is fixed, limiting etching uniformity. Since the magnetic components are fixedly mounted inside the cathode, the resulting magnetic field distribution pattern cannot be changed once set. During long-term sputtering, the target material develops fixed localized etching grooves (i.e., "racetracks"), and this uneven etching cannot be completely avoided even with continuous target rotation. This leaves room for improvement in the overall utilization rate of the target material, and the premature formation of etching grooves may trigger arc discharge, affecting film quality and shortening target life. Summary of the Invention

[0004] The purpose of this application is to provide a dual-spin magnetron sputtering cathode to solve the problems of uneven target etching and limited utilization caused by magnetic field fixation in the prior art.

[0005] This application provides a dual-spin magnetron sputtering cathode with the following technical solution: including... A target tube for loading a target material; a first driving assembly for driving the target tube to rotate about its central axis; characterized in that: it further includes a magnetic assembly coaxially disposed inside the target tube; and a second driving assembly for driving the magnetic assembly to rotate about its central axis. The first driving component and the second driving component are controlled independently so that the target tube and the magnetic component can generate relative rotational motion.

[0006] By employing the aforementioned technology and independently controlling the rotation of the target tube and its internal magnetic components, the "racetrack" of the magnetic field relative to the target surface is no longer fixed but dynamically changing. This disperses the etching area along the axial and circumferential directions of the target, effectively avoiding deep trenches at fixed locations, thereby significantly improving target utilization, reducing arc discharge, and enhancing film quality and target lifespan.

[0007] Preferably, the magnetic component includes a support tube and a magnetic block, the magnetic block being arranged along the axial direction of the support tube and located between the outer surface of the support tube and the inner wall of the target tube.

[0008] By employing the above-mentioned technology, the magnetic block is securely mounted on the support tube and can rotate synchronously with it, thereby reliably changing the position of the magnetic field relative to the target material.

[0009] Preferably, the target tube has end caps at both ends, the support tube is rotatably connected to the end caps, the outer surface of the support tube is fixedly connected to a support block, the target tube is sleeved on the support block, and the inside of the target tube is in communication with the inner wall of the support tube.

[0010] By employing the aforementioned technologies, the end cap achieves sealing of the target tube's working area, while the bearing connection between the support tube and the end cap ensures that they can rotate independently and smoothly relative to each other. The support block not only fixes the magnetic block but also acts as a centering element, ensuring the coaxiality between the magnetic components and the target tube and preventing collisions during rotation. The interconnected internal chamber provides a complete flow channel for coolant circulation, ensuring cooling efficiency.

[0011] Preferably, the target tube has a mounting shell at at least one end, the first drive assembly and the second drive assembly are disposed on the mounting shell, the end cap is fixedly connected to a first support shaft that is rotatably connected to the mounting shell, the end of the support tube is provided with a second support shaft, the second support shaft passes through the end cap, and the rotation axes of the first support shaft and the second support shaft are on the same straight line.

[0012] By employing the aforementioned technology, the drive components are integrated into the mounting housing, resulting in a compact structure that facilitates installation and maintenance. Torque is transmitted independently via the first and second support shafts, enabling independent power transfer to the target tube and magnetic components. Strict coaxiality design ensures dynamic stability during high-speed relative rotation, reducing vibration and wear, and improving the reliability and lifespan of the equipment.

[0013] Preferably, the mounting shell has a first area and a second area, the second support shaft has a second channel connecting the second area and the inside of the support tube, the first support shaft has a first channel connecting the first area and the inside of the target tube, and the shell has a first interface connecting the first area and a second interface connecting the second area respectively. The first interface and the second interface are connected to the water cooling system.

[0014] By employing the aforementioned technology, the inlet and outlet cooling water paths are completely separated spatially and transported through internal channels of different support shafts, forming a highly efficient and orderly "U-shaped" cooling flow channel. This design significantly reduces thermal short-circuiting between the inlet and outlet water, ensuring that the coolant can effectively remove the heat generated by the target tube and magnetic components with minimal temperature rise, resulting in high cooling efficiency.

[0015] Preferably, the mounting shell has a first area, a second area, a first interface connecting the first area and a second interface connecting the second area, a second channel connecting the second area and the inside of the support tube is provided inside the second support shaft, and a spiral groove is provided on the outer surface of the second support part. The spiral groove and the inner wall of the first support shaft form a first channel, and the first channel connects the first area and the inside of the target tube.

[0016] By employing the aforementioned technology, the flow channel is formed by the grooves in the sheath and the outer wall of the shaft, replacing the complex process of drilling deep holes inside the solid shaft, thus reducing processing difficulty and manufacturing costs. This structure also achieves physical isolation between the inlet and outlet water channels, and the annular flow channel has a large flow cross-section and low flow resistance, which is beneficial for increasing the coolant flow rate.

[0017] Preferably, the spiral direction of the spiral groove is opposite to the rotation direction of the target tube.

[0018] By employing the aforementioned technology, when the coolant flows within the spiral channel and the target tube rotates, the relative motion between the channel wall and the fluid generates a hydrodynamic pressure effect opposite to the direction of rotation. This hydrodynamic pressure effect produces an upward buoyancy force on the first support shaft, effectively offsetting part of the target tube assembly's own weight and other external loads, thereby significantly reducing the radial load transmitted to the second support shaft and related bearings. This not only reduces bearing wear and operating resistance but also improves the dynamic stability and service life of the entire rotating system.

[0019] Preferably, the first drive assembly includes a first power source fixedly connected to the mounting housing, and the output end of the first power source is drively connected to the first support shaft; The second drive assembly includes a second power source fixedly connected to the mounting housing. The output end of the second power source is connected to a second support shaft. The second support shaft is coupled with a rotation angle sensor, which is used to detect the rotation angle and / or rotation speed of the first support shaft.

[0020] By employing the aforementioned technology, the rotation angle sensor enables the system to monitor the rotational speed and phase of the target tube and magnetic components in real time and to perform precise closed-loop control.

[0021] Preferably, the first channel is provided with an annular block, the annular block is connected to the first support shaft by a key, the center of the annular block is rotatably connected to the second support shaft, and the annular block is provided with a plurality of water passage holes distributed around the center.

[0022] By employing the aforementioned technology, the annular block functions as a "rotating water-sealing baffle." It rotates synchronously with the target tube via a keyed connection, while its center rotates relative to the support shaft of the magnetic assembly, cleverly solving the problem of dynamic sealing between the two rotating components. The water passage ensures the smooth flow of coolant, and this structure also contributes to the uniform distribution of water flow.

[0023] Preferably, the axis of the water passage is a spiral axis spiraling outward along the axis of the annular block, with the spiral axes closer to the support pipe being denser, and the diameter of the water passage monotonically changing along the spiral axis, with the diameter of the water passage closer to the support pipe being larger.

[0024] By employing the aforementioned technology, the denser and larger-diameter water passages create a low-pressure suction zone near the inlet of the support tube, efficiently drawing in coolant from the first channel. As the spiral unfolds, the orifice diameter gradually decreases, and the cross-sectional area of ​​the flow channel contracts, thus creating a continuous pressurization zone in the flow direction. This pressurization effect generates a fluid reaction force opposite to the coolant flow direction. This force acts on the annular block rotating with the target tube and can be decomposed into an upward lifting force on the first support shaft. This "hydrodynamic lift" is superimposed on the dynamic pressure effect generated by the spiral grooves of the first channel, more effectively offsetting the self-weight of the target tube assembly, thereby significantly alleviating the radial load on the second support shaft and its bearings, further improving the system's operational stability and mechanical life.

[0025] In summary, this application includes at least one of the following beneficial technical effects: 1. By independently controlling the relative rotational motion of the target tube and the internal magnetic components, dynamic scanning of the magnetic field relative to the target surface is achieved, resulting in a uniform distribution of the etching area in both the axial and circumferential directions. This design effectively avoids the localized deep trench etching problem caused by traditional fixed magnetic fields, significantly improves the utilization rate of the target material, and reduces material waste. 2. The coaxial dual-drive and separate cooling channels not only ensure the stability and dynamic balance of the rotating system, but also improve cooling efficiency through optimized spiral channels and pressurized water passage design. The dynamic pressure effect and reaction lift generated by the fluid during flow effectively reduce the radial load on the support shaft and bearings, thereby reducing wear and extending the service life of the equipment. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the overall structure of Embodiment 1 of this application; Figure 2 This application Figure 1 A cross-sectional schematic diagram; Figure 3 This is a schematic diagram of the overall structure of the support block in Embodiment 1 of this application; Figure 4 This application Figure 2 A magnified view of a portion of point a; Figure 5 This is a schematic diagram of the installation of the end cap, the first support shaft, and the second support shaft in Embodiment 2 of this application; Figure 6 This application Figure 5A cross-sectional schematic diagram; Figure 7 This is a schematic diagram of the overall structure of the first support shaft in Embodiment 2 of this application; Figure 8 This is a schematic diagram of the overall structure of the second support shaft in Embodiment 2 of this application; Figure 9 This application Figure 8 Sectional view along the AA direction; Figure 10 This is a schematic diagram of the overall structure of the annular block in Embodiment 2 of this application; Figure 11 This is a schematic diagram of the overall structure of Embodiment 3 of this application.

[0027] Explanation of reference numerals in the attached drawings: 1. Target tube; 11. End cap; 12. First support shaft; 121. Mounting groove; 13. Support block; 131. Notch; 14. First channel; 2. Mounting shell; 21. Second area; 22. First area; 23. First mounting component; 24. Second mounting component; 241. First interface; 242. Partition; 25. Third mounting component; 251. Second interface; 26. First shell; 27. Second shell; 3. First drive assembly; 31. First power source; 4. Second drive assembly; 41. Second power source; 5. Magnetic assembly; 51. Magnetic block; 52. Support tube; 521. Second support shaft; 5211. Second channel; 5212. Spiral groove; 5213. First inclined surface; 5214. Second inclined surface; 6. Annular block; 61. Water passage hole; 7. Rotation angle sensor. Detailed Implementation

[0028] The following is in conjunction with the appendix Figure 1 - Appendix Figure 11 This application will be described in further detail.

[0029] This application discloses a dual-spin magnetron sputtering cathode.

[0030] Example 1, referring to Figure 1 and Figure 2 A dual-spin magnetron sputtering cathode includes a target tube 1, a magnetic assembly 5, a mounting shell 2, a first driving assembly 3, and a second driving assembly 4. In embodiment 1, the target tube 1 is a cylindrical hollow structure made of metal (such as stainless steel, titanium, etc.), serving as the cathode and loading the target material. The target tube 1 is driven by the first driving assembly 3 to rotate around its central axis XX; end caps 11 are fixedly connected to both ends of the target tube 1, and the end caps 11 are sealed to the target tube 1. refer to Figure 2 and Figure 3The magnetic component 5 is coaxially disposed inside the target tube 1. The magnetic component 5 includes a support tube 52, a support block 13, and multiple magnetic blocks 51. The two ends of the support tube 52 are rotatably connected to the end cap 11. The support block 13 has a notch 131, and the support tube 52 is fixedly connected to the notch 131 by bolts. The magnetic blocks 51 are fixedly connected to the support tube 52 and are close to the inner wall of the target tube 1. The surface of the magnetic block 51 and the surface of the support block 13 form a near-circular shape. During the rotation of the support tube 52, the support block 13 plays a supporting role. There is a gap between the magnetic block 51 and the inner wall of the target tube 1. The magnetic component 5 is driven by the second drive component 4 and rotates around the same central axis XX. The support tube 52 and the target tube 1 are connected through a through hole.

[0031] refer to Figure 2 and Figure 4 The mounting shell 2 is located at one end of the target tube 1. The mounting shell 2 has two independent first areas 22 and second areas 21. The first drive assembly 3 and the second drive assembly 4 are both mounted on the mounting shell 2. One end cap 11 is fixedly connected to a first support shaft 12. The first support shaft 12 is mounted in the mounting shell 2 through a bearing. The first support shaft 12 has an axial through hole. The second support shaft 521 is rotatably connected to the through hole. The inner wall of the through hole and the outer surface of the second support shaft 521 form a first channel 14. The first channel 14 connects the first area 22 and the inside of the target tube 1. The support tube 52 has a second support shaft 521 at one end. The second support shaft 521 extends through the first channel 14 and the first area 22 into the second area 21. The first support shaft 12 has a second channel 5211 connecting the inside of the support tube 52 and the second area 21.

[0032] refer to Figure 4 In this embodiment 1, the mounting shell 2 is composed of three shells joined together by bolts. For convenience, they are named the first mounting component 23, the second mounting component 24, and the third mounting component 25, respectively. The second mounting component 24 and the third mounting component 25 have openings on one side. The first mounting component 23 and the second mounting component 24 enclose a cavity. The first support shaft 12 passes through the first mounting component 23 and extends into the cavity. A bearing is provided between the first mounting component 23 and the first support shaft 12. The second support shaft 521 passes through the first mounting component 23 and the second mounting component 24 in sequence and is rotatably connected to the third mounting component 25. A partition 242 is provided in the cavity, which divides the cavity into a first area 22 and a second area 21. The brush is installed on the partition 242. The first mounting component 23, the second mounting component 24, and the third mounting component 25 are made of insulating material.

[0033] refer to Figure 3A gap exists between the first support shaft 12 and the second support shaft 521 for cooling water flow. The first support shaft 12 is bolted to the end cover 11. An installation groove 121 is provided at the end of the first support shaft 12. An annular block 6 is provided between the first support shaft 12 and the second support shaft 521, and is positioned within the installation groove 121. The annular block 6 has several annularly distributed water passage holes 61, which function as a "rotating water seal baffle 242." It rotates synchronously with the target tube 1 via a key connection, while its center rotates relative to the support shaft of the magnetic assembly, cleverly solving the problem of dynamic sealing between the two rotating components. The water passage holes 61 ensure smooth passage of coolant, and this structure also has a certain effect on the uniform distribution of water flow.

[0034] refer to Figure 4 The first drive assembly 3 includes a first power source 31 fixedly connected to the mounting shell 2, and the output end of the first power source 31 is connected to the first support shaft 12 by belt drive; the second drive assembly 4 includes a second power source 41 fixedly connected to the mounting shell 2, and the output end of the second power source 41 is connected to the second support shaft 521 by coupling; in embodiment 1, the first power source 31 and the second power source 41 are motors.

[0035] refer to Figure 4 The mounting shell 2 is provided with a first interface 241 connecting the first zone 22 and a second interface 251 connecting the second zone 21. In this embodiment 1, the second interface 251 is connected to the water inlet of the water cooling system, and the first interface 241 is connected to the water outlet. In this embodiment 1, the water cooling channel is: second zone 21 → second channel 5211 → inside the support tube 52 → inside the target tube 1 → first channel 14 → first zone 22.

[0036] refer to Figure 1 The other end of the support tube 52 is equipped with a rotation angle sensor 7. The rotation angle sensor 7 enables the system to monitor the rotation speed and phase of the target tube 1 and the magnetic component 5 in real time and perform precise closed-loop control. In embodiment 1, the rotation angle sensor 7 is a magnetic induction encoder as an example.

[0037] A dual-spin magnetron sputtering cathode operates on the principle that, during cathode operation, the target tube 1 (serving as the cathode and loading the target material) is driven by a first driving component 3 to rotate around its central axis; simultaneously, a magnetic component 5 (composed of permanent magnets) placed inside the target tube 1 is driven by a second driving component 4 and can rotate independently of the target tube 1. This "dual-spin" design allows the position of the magnetic field relative to the inner surface of the target material to continuously and dynamically change, dispersing the originally fixed annular etching "track" across the entire circumference and axial direction of the target material. This effectively avoids the formation of localized deep trenches at fixed locations, ensuring uniform etching of the target material, significantly improving target utilization, and reducing arc discharge caused by localized overheating and pitting, thereby enhancing the quality and stability of thin film deposition.

[0038] To address the high heat generated during the sputtering process, an independent cooling channel was designed that runs through the target tube 1 and the magnetic assembly 5. Coolant (such as water) flows in from the second interface 251 of the mounting housing 2, enters the support tube 52 through the second channel 5211 within the second support shaft 521, then flows into the target tube 1, carrying away most of the heat. It then returns through the first channel 14 formed by the inner wall of the first support shaft 12 and the outer wall of the second support shaft 521, and finally flows out from the first interface 241. The annular block 6 and its water passage 61 located within the first channel 14 are key components. They rotate with the target tube 1 but rotate relative to the internal second support shaft 521, solving the dynamic sealing problem between the two rotating components and ensuring reliable sealing and smooth water flow during relative rotation of the cooling system.

[0039] The mounting housing 2 is made of insulating material and is internally divided into a first zone 22 and a second zone 21 by a partition 242, achieving electrical isolation. Power is supplied via components such as brushes mounted on the partition 242 to stably apply a negative high voltage to the target tube 1, which serves as the cathode. Simultaneously, a rotation angle sensor 7 (such as a magnetic encoder) located at the end of the support tube 52 monitors the rotational speed and phase of the target tube 1 and / or the magnetic component 5 in real time and feeds the signal back to the control system. This allows the system to perform independent and precise closed-loop control of the rotational speeds of both components, and even programmatically control specific relative motion modes to achieve optimal etching uniformity and ensure the dynamic stability of the equipment during long-term operation.

[0040] Example 2, Reference Figures 5-8 The difference between this embodiment and embodiment 1 is that: a number of spiral grooves 5212 are machined on the outer surface of the second support shaft 521. The spiral direction of the spiral grooves 5212 is opposite to the normal rotation direction of the target tube 1. The spiral grooves 5212 and the inner wall of the through hole form the first channel 14.

[0041] "Normal rotation direction" refers to the target tube 1 rotation direction preset and recommended by the equipment manufacturer under standard process conditions. This direction setting typically takes into account factors such as system cable management, mechanical lifespan, and process stability. Those skilled in the art should first follow this preset direction to obtain optimal performance when operating the equipment.

[0042] refer to Figure 8 and Figure 9 The inclination of the inner wall on one side of the spiral groove 5212 is greater than that on the other side. If the spiral direction of the spiral groove 5212 is left-handed, the inclination of the inner wall on the left side of the spiral groove 5212 is greater than that on the right side; if the spiral direction of the spiral groove 5212 is right-handed, the inclination of the inner wall on the right side of the spiral groove 5212 is greater than that on the left side.

[0043] In Example 1, taking the direction shown in the figure as an example, the normal rotation direction of the target tube 1 is clockwise. The right side of the spiral groove 5212 is the first inclined surface 5213, and the left side is the second inclined surface 5214. The angle between the first inclined surface 5213 and the normal plane of the bottom surface of the spiral groove 5212 is greater than the angle between the second inclined surface 5214 and the normal plane of the bottom surface of the spiral groove 5212.

[0044] refer to Figure 10 The annular block 6 is keyed to the target tube 1. The axis of the water passage 61 is a spiral axis that spirals outward along the axis of the annular block 6. The spiral axes are denser on the side near the support tube 52. The diameter of the water passage 61 changes monotonically along the spiral axis. The diameter of the water passage 61 on the side near the support tube 52 is larger.

[0045] The main problem addressed in Example 2 is that, since the shape of the support tube 52 and the magnetic block 51 after assembly is non-cylindrical, when the target tube 1 rotates, the coolant inside it will generate periodic and uneven fluid impacts on the non-circular magnetic component 5, resulting in an increase in the radial load of the second support shaft 521 and aggravating the wear of its bearing.

[0046] In this embodiment, a number of spiral grooves 5212 with a spiral direction opposite to the normal rotation direction of the target tube 1 and with asymmetrical sidewalls are machined on the outer surface of the second support shaft 521 to form the first channel 14. At the same time, an annular block 6 with a tapered spiral water passage 61 is configured. This structure utilizes the flow of coolant to generate pressurization and drainage at the annular block 6, and forms directional net pressure on the steep sidewalls of the asymmetrical spiral grooves 5212, thereby actively generating a counteracting force opposite to the direction of fluid impact caused by the non-circular magnetic component 5, and ultimately significantly reducing the radial direction of the second support shaft 521.

[0047] Example 3, Reference Figure 11 The difference from Embodiment 1 is that: the mounting shell 2 includes a first shell 26 and a second shell 27, which are distributed on both sides of the target tube 1. The first power source 31 is fixed to the first shell 26 by bolts, and the output end of the first power source 31 is connected to the first support shaft 12 by belt drive. The second support shaft 521 and the first support shaft 12 are located at both ends of the target tube 1, respectively. The second power source 41 is set to the second shell 27 by bolts, and the output end of the second power source 41 is connected to the second support shaft 521 by belt drive. Other structures are the same as in Embodiment 1.

[0048] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A dual-spin magnetron sputtering cathode, comprising: Target tube (1), used to load target material; The first driving component (3) is used to drive the target tube (1) to rotate about its central axis; Its features are: Also includes A magnetic component (5) is coaxially disposed inside the target tube (1); The second driving component (4) is used to drive the magnetic component (5) to rotate about its central axis; The first driving component (3) and the second driving component (4) are independently controlled so that the target tube (1) and the magnetic component (5) can generate relative rotational motion.

2. The dual-spin magnetron sputtering cathode according to claim 1, characterized in that: The magnetic component (5) includes a support tube (52) and a magnetic block (51). The magnetic block (51) is arranged along the axis of the support tube (52) and is located between the outer surface of the support tube (52) and the inner wall of the target tube (1).

3. The dual-spin magnetron sputtering cathode according to claim 2, characterized in that: The target tube (1) has end caps (11) at both ends. The support tube (52) is rotatably connected to the end caps (11). The support block (13) is fixedly connected to the outer surface of the support tube (52). The target tube (1) is sleeved on the support block (13). The inside of the target tube (1) is connected to the inner wall of the support tube (52).

4. The dual-spin magnetron sputtering cathode according to claim 3, characterized in that: The target tube (1) has a mounting shell (2) at at least one end. The first drive assembly (3) and the second drive assembly (4) are disposed on the mounting shell (2). The end cap (11) is fixedly connected to a first support shaft (12) that is rotatably connected to the mounting shell (2). The end of the support tube (52) is provided with a second support shaft (521). The second support shaft (521) passes through the end cap (11). The rotation axes of the first support shaft (12) and the second support shaft (521) are on the same straight line.

5. The dual-spin magnetron sputtering cathode according to claim 4, characterized in that: The mounting shell (2) is provided with a first zone (22) and a second zone (21). The second support shaft (521) is provided with a second channel (5211) connecting the second zone (21) and the inside of the support tube (52). The first support shaft (12) is provided with a first channel (14) connecting the first zone (22) and the inside of the target tube (1). The shell is provided with a first interface (241) connecting the first zone (22) and a second interface (251) connecting the second zone (21). The first interface (241) and the second interface (251) are connected to the water cooling system.

6. The dual-spin magnetron sputtering cathode according to claim 4, characterized in that: The mounting shell (2) is provided with a first area (22), a second area (21), a first interface (241) connecting the first area (22) and a second interface (251) connecting the second area (21). The second support shaft (521) is provided with a second channel (5211) connecting the second area (21) and the inside of the support tube (52). The outer surface of the second support part is provided with a spiral groove (5212). The spiral groove (5212) and the inner wall of the first support shaft (12) form a first channel (14). The first channel (14) connects the first area (22) and the inside of the target tube (1).

7. The dual-spin magnetron sputtering cathode according to claim 6, characterized in that: The spiral direction of the spiral groove (5212) is opposite to the normal rotation direction of the target tube (1).

8. The dual-spin magnetron sputtering cathode according to any one of claims 4-7, characterized in that: The first drive assembly (3) includes a first power source (31) fixedly connected to the mounting shell (2), and the output end of the first power source (31) is connected to the first support shaft (12) in a transmission connection. The second drive assembly (4) includes a second power source (41) fixedly connected to the mounting housing (2). The output end of the second power source (41) is connected to the second support shaft (521) for transmission. The second support shaft (521) is coupled with a rotation angle sensor (7). The rotation angle sensor (7) is used to detect the rotation angle and / or rotation speed of the first support shaft (12).

9. The dual-spin magnetron sputtering cathode according to claim 8, characterized in that: The first channel (14) is provided with an annular block (6), which is connected to the first support shaft (12) by a key. The center of the annular block (6) is rotatably connected to the second support shaft (521). The annular block (6) is provided with a number of water passage holes (61) distributed around the center.

10. The dual-spin magnetron sputtering cathode according to claim 9, characterized in that: The axis of the water passage (61) is a spiral axis that spirals outward along the axis of the annular block (6). The spiral axes are denser on the side closer to the support pipe (52). The diameter of the water passage (61) changes monotonically along the spiral axis. The diameter of the water passage (61) on the side closer to the support pipe (52) is larger.

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