Cleaning equipment

Abstract

The invention provides cleaning equipment which comprises a treating fluid collecting device, a cleaning device and a cleaning device. The liquid discharging groove is formed in the treating fluid collecting device, the liquid discharging groove and the treating fluid collecting device are integrally formed, a liquid discharging hole is formed in the liquid discharging groove, and the liquid discharging groove and the liquid discharging hole are used for discharging the cleaning fluid out of the cleaning space; and the liquid discharging pipeline is connected with the treating fluid collecting device and / or the liquid discharging groove through a connecting assembly and is communicated with the liquid discharging hole. According to the structure, connection between the liquid discharging groove and the treating fluid collecting device and connection between the liquid discharging groove and the liquid discharging pipeline are achieved no longer in a welding mode, the treating fluid collecting device does not bear temperature changes or welding pressure any more, deformation of the treating fluid collecting device is prevented, a gap between an opening of the treating fluid collecting device and a chuck is more uniform, and the working efficiency is improved. The chuck cannot be scratched with the opening of the treating fluid collecting device, so that the smooth cleaning operation is ensured, the recovery effect of the liquid medicine and the uniformity of air exhaust can be improved, and the cleaning quality of wafers is further improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and more specifically to a cleaning device. Background Technology

[0002] In semiconductor manufacturing, a cleaning machine is used to clean the wafers. During cleaning, the chuck of the cleaning machine feeds the wafer into the cleaning chamber, where cleaning fluid sprays and rinses the wafer. The cleaned fluid is then collected by a processing fluid collection device located within the cleaning chamber. This processing fluid collection device is equipped with a drain trough, and a drain pipe is connected to the drain trough to discharge the cleaning fluid from the wafers into the processing fluid collection device.

[0003] Currently, the connection between the drain tank and the processing fluid collection device, as well as the connection between the drain pipe and the drain tank, are all welded. However, the inventors discovered that the processing fluid collection device is deformed during the welding process due to temperature changes and welding pressure. This causes the circumferential gap between the opening of the processing fluid collection device and the chuck to become uneven. Consequently, the chuck may scrape against the processing fluid collection device when entering and exiting the cleaning chamber, affecting the normal entry and exit of the wafer. Furthermore, the uneven circumferential gap between the processing fluid collection device and the chuck also affects the recovery effect of the cleaning fluid and the uniformity of the exhaust of the processing fluid collection device, thus affecting the cleaning quality of the wafer. Summary of the Invention

[0004] In view of this, this application provides a cleaning device that can improve the cleaning quality while ensuring the smooth progress of the cleaning operation.

[0005] To achieve the above objectives, this application provides the following technical solution: A cleaning device, comprising: The treatment fluid collection device has a cleaning space that allows the cleaning fluid to enter; A drain tank is installed on the treatment liquid collection device and integrally formed with the treatment liquid collection device, and a drain hole is provided on the drain tank, through which the liquid flowing into the drain tank is discharged from the cleaning space. The drain pipe is connected to the treatment liquid collection device and / or the drain tank via a connecting component, and communicates with the drain hole.

[0006] Optionally, in the above-mentioned cleaning equipment, the drain tank protrudes outward on the side wall of the treatment liquid collection device, and the drain hole is opened on the bottom wall of the drain tank; Wherein, the side wall of the drain trough that connects to the bottom wall and faces the cleaning space is a guide side wall that guides the liquid to the drain hole, and the inner wall surface of the guide side wall facing the cleaning space is an arc-shaped wall surface that is concave in the direction away from the cleaning space.

[0007] Optionally, in the above-mentioned cleaning equipment, the radius of the arc-shaped wall surface perpendicular to the axis of the drain hole is a reference radius. The arc-shaped wall surface includes a first arc-shaped portion located on the side of the reference radius closer to the drain hole, and a second arc-shaped portion located on the side of the reference radius away from the drain hole. The central angle corresponding to the first arc-shaped portion is 90°, and the central angle corresponding to the second arc-shaped portion is 0°~42°.

[0008] Optionally, in the above-described cleaning device, one edge of the opening of the drain hole extends to the intersection of the reference radius and the arc-shaped wall surface, so that the projection of the second arc-shaped surface on the axial direction of the drain hole is located in the opening of the drain hole.

[0009] Optionally, in the above-mentioned cleaning device, the opening of the drain hole has a radially protruding edge, the distance between the radially protruding edge and the axis of the drain hole is greater than the distance between the other edges of the opening and the axis of the drain hole, and the radially protruding edge extends to the intersection of the reference radius and the arc-shaped wall surface.

[0010] Optionally, in the above-mentioned cleaning equipment, the drain tank includes a top wall, which is connected to the second arcuate surface and located on the side of the second arcuate surface away from the drain hole, and the end of the top wall connected to the treatment liquid collection device is higher than the end connected to the second arcuate surface.

[0011] Optionally, in the above-mentioned cleaning equipment, the drain tank includes enclosing sidewalls located on both sides of the guide sidewall, and the enclosing sidewalls are connected to the bottom wall of the drain tank and to the bottom wall of the treatment liquid collection device through a rounded corner structure.

[0012] Optionally, in the above-mentioned cleaning equipment, a knife-removal groove is provided on the side wall of the treatment liquid collection device, and the knife-removal groove is located at the connection between the side wall of the treatment liquid collection device and the enclosing side wall.

[0013] Optionally, in the above-mentioned cleaning equipment, the bottom wall of the drain tank is provided with a liquid collection tank at the connection between the drain tank and the treatment liquid collection device for guiding the liquid to the drain hole, and the connection between the liquid collection tank and the treatment liquid collection device is provided with a rounded corner structure.

[0014] Optionally, in the above-mentioned cleaning equipment, the bottom wall of the liquid collection tank is lower than the bottom wall of the treatment liquid collection device, and: the bottom wall of the liquid collection tank is an inclined bottom wall, and the side of the inclined bottom wall connected to the rounded corner structure is higher than the side of the bottom wall connected to the drain tank; or, the bottom wall of the liquid collection tank is a horizontal bottom wall, and the horizontal bottom wall is at the same height as the bottom wall of the drain tank; And / or, The width of the liquid collection tank is greater than the width of the liquid discharge tank.

[0015] Optionally, in the above-mentioned cleaning equipment, the treatment liquid collection device includes a lower collection device and one or more upper collection devices stacked together, and each of the lower collection device and one or more upper collection devices is provided with a drain tank, wherein: The upper collection device includes a load-bearing flange integrally formed on the side wall. The drain trough protrudes outward from the side wall of the upper collection device. A portion of the load-bearing flange forms the bottom wall of the drain trough and is penetrated by the drain hole. The drain pipe is connected to the load-bearing flange through the connecting assembly to form a drain path for the cleaning liquid and a support structure for the upper collection device. The drain trough protrudes outward from the side wall of the lower collection device, and the drain hole is formed on the bottom wall of the drain trough; the drain pipe is connected to the bottom wall of the drain trough through the connecting assembly to form a drain path for the liquid.

[0016] Optionally, in the above-mentioned cleaning equipment, the drain pipe includes a main body and an enlarged diameter section located at one end of the main body. The outer diameter of the enlarged diameter section is larger than the outer diameter of the main body, and the inner diameter of the enlarged diameter section is greater than or equal to the inner diameter of the drain hole. The connection component includes: The clamping plate can be inserted into the main body and blocked by the enlarged diameter part, and the clamping plate is provided with a connecting hole; The connector can pass through the load-bearing flange and connect to the connecting hole to cooperate with the clamping plate to clamp the enlarged diameter portion and the load-bearing flange.

[0017] Optionally, in the above-mentioned cleaning equipment, the load-bearing flange is provided with a receiving groove that allows the enlarged diameter portion to extend into it, and the drain hole is provided on the bottom wall of the receiving groove.

[0018] Optionally, in the above-mentioned cleaning device, the bottom wall of the receiving groove is provided with a protruding tube portion protruding towards the opening direction of the receiving groove, the drain hole is the tube hole of the protruding tube portion, and the outer diameter of the protruding tube portion is smaller than the inner diameter of the enlarged diameter portion, so that the protruding tube portion can be inserted into the enlarged diameter portion when the enlarged diameter portion extends into the receiving groove.

[0019] Optionally, in the above-mentioned cleaning equipment, in one or more of the stacked upper collection devices, the drain pipe for discharging liquid from the upper collection device located above passes through a through hole on the bearing flange of the lower collection device and is inserted into the through hole to realize the connection and support of the upper collection device on the lower collection device. Both the cover plate of the lower collection device and the cover plate of the upper collection device located below it are provided with slots, and each cover plate is provided with multiple slots along the circumference, so that the different drainage pipes for discharging liquids from the different upper collection devices located above can be connected to the slots at different positions along the circumference.

[0020] The cleaning equipment provided in this application no longer uses welding to connect the drain tank and the processing fluid collection device, as well as the drain tank and the drain pipe. Instead, the drain tank and the processing fluid collection device are integrally machined, and the drain pipe and the drain tank are connected by connecting components. This avoids the processing fluid collection device being affected by welding, and the processing fluid collection device is no longer subjected to temperature changes and welding pressure, thus preventing deformation of the processing fluid collection device. The gap width between the opening of the processing fluid collection device and the chuck is the same in all directions of the circumference, resulting in better alignment between the processing fluid collection device and the chuck. The chuck can smoothly enter and exit the processing fluid collection device without scraping against the opening of the processing fluid collection device, ensuring smooth cleaning operations. At the same time, the more uniform circumferential gap can better prevent cleaning liquid from accidentally flowing out of the processing fluid collection device from the circumferential gap, and also ensures that the exhaust air passes through the gap more evenly, improving the recovery effect of the cleaning liquid and the uniformity of the exhaust air, thereby improving the cleaning quality of the wafer. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the cleaning equipment provided in an embodiment of this application.

[0023] Figure 2 This is a schematic diagram of the main cavity.

[0024] Figure 3 An exploded view of the top cover, multiple treatment fluid collection devices, and the main chamber.

[0025] Figure 4 A schematic diagram of a structure in which multiple treatment liquid collection devices are stacked.

[0026] Figure 5 This is a schematic diagram of the structure of the upper collection device and the drainage pipe.

[0027] Figure 6 This is a schematic diagram of the structure of the lower collection device and the drainage pipe.

[0028] Figure 7 This is an exploded view of the connecting components.

[0029] Figure 8 This is a top view of the upper collection device.

[0030] Figure 9 This is a schematic diagram of the drainage pipeline.

[0031] Figure 10 A schematic diagram of the structure for accommodating the groove and the convex tube.

[0032] Figure 11 This is a schematic diagram of the connection between the drain hole and the drain pipe.

[0033] Figure 12 This is a cross-sectional view of the drainage tank.

[0034] Figure 13 This is a schematic diagram illustrating the design principle of a curved wall surface.

[0035] Figure 14 This is a schematic diagram of the structure of the drainage tank and the treatment liquid collection device.

[0036] Figure 15 This is a schematic diagram of the structure of a drainage hole.

[0037] Figure 16 This is a schematic diagram of a drainage hole with another structure.

[0038] Figure 17 This is a schematic diagram illustrating the design principle of the curved wall surface fitting with the top wall.

[0039] exist Figures 1-17 middle: 1-Processing liquid collection device, 2-Drainage tank, 3-Drainage hole, 4-Drainage pipe, 5-Connecting assembly, 6-Cavity fixing frame, 7-Main cavity, 8-Top cover, 9-Chuck, 10-Gas swing arm, 11-Medicine swing arm, 12-Water swing arm, 13-Exhaust component, 14-Rounded corner structure, 15-Retracting knife groove, 16-Liquid collection tank, 17-Through hole, 18-Cover plate, 19-Bayonet; 101-Lower collection device, 102-Upper collection device, 103-Bearing flange, 104-Accommodation groove, 105-Protruding tube section; 201-Guiding sidewall, 202-Arc-shaped wall, 203-Top wall, 204-Enclosing sidewall 301 - Radial protruding edge; 401 - Body section, 402 - Expanded diameter section; 501-Pressure plate, 502-Connector, 503-First through hole, 504-Connecting hole, 505-Second through hole; 2021 - First arc face, 2022 - Second arc face. Detailed Implementation

[0040] The technical solutions of the embodiments of this application will be described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0041] In related technologies, during semiconductor manufacturing, cleaning equipment such as wafer cleaners is used to clean wafers. The specific cleaning process involves feeding the wafer into a cleaning chamber and placing it on a chuck of the cleaning equipment (the cleaning chamber can also be called a process chamber or cleaning tank). The chuck lowers the wafer to the appropriate workstation position, where a cleaning liquid (such as chemical solution or water) is sprayed and rinsed onto the wafer. The cleaning liquid is then collected by a processing liquid collection device surrounding the chuck. This collection device is equipped with a drain tank and a drain pipe connected to the drain tank. The drain pipe is used to discharge the cleaned liquid from the cleaning chamber, thus achieving the recovery or discharge of the chemical solution or water. The treatment fluid collection device of the cleaning equipment is made of PTFE (Polytetrafluoroethylene), a material with a very high melting point (approximately 327°C). Above the melting temperature, PTFE does not become a truly low-viscosity melt but enters a highly viscoelastic state. In this state, PTFE has very high viscosity and elasticity and extremely poor flowability. To promote the fusion of the molten PTFE interface, considerable pressure must be applied to PTFE. This pressure makes PTFE, in its softened state, highly susceptible to plastic deformation (e.g., flow, flattening, extrusion). In addition, PTFE has a relatively high coefficient of thermal expansion. During welding heating, PTFE expands significantly. If PTFE is heated unevenly (which is common in welding), different areas of PTFE will expand differently, leading to internal stress. During cooling, PTFE shrinks, and uneven cooling rates will cause inconsistent shrinkage in different areas, resulting in warping, twisting, or dimensional changes in the treatment fluid collection device. Even with uniform cooling, the overall shrinkage rate of PTFE from high temperature to room temperature is relatively high. Therefore, welding the PTFE material processing fluid collection device inevitably causes a certain degree of deformation. This deformation mainly occurs in the direction perpendicular to the welding pressure (the component is flattened) and in the torsional direction caused by thermal stress. This results in localized changes in the diameter of the processing fluid collection device, causing deformation of its opening, for example, from a circular shape to an elliptical or irregular shape. This leads to the chuck rubbing against the processing fluid collection device during entry and exit, affecting not only the normal entry and exit of the wafer but also the uneven circumferential gap between the device and the chuck. This also affects the recovery of the cleaning fluid and the uniformity of the exhaust from the processing fluid collection device, ultimately impacting the wafer cleaning quality.

[0042] Furthermore, the drain tank is surrounded by multiple flat sidewalls, which do not effectively guide the cleaning liquid. When the cleaning liquid is thrown into the drain tank by the rotating wafer, the flat sidewalls often cause the cleaning liquid to splash back over a large area, which is not conducive to the cleaning liquid entering the drain hole and thus affects the drain efficiency. Moreover, there is a certain distance between the drain hole on the bottom wall and the flat sidewall, which creates dead corners in the drain tank, causing the cleaning liquid to remain in the drain tank. This not only affects the drain effect, but may also reduce the cleaning quality of the wafer due to the residue of cleaning liquid containing impurities in the processing liquid collection device, resulting in an increase in wafer particle size, which leads to a lower etching rate and poor etching uniformity in the subsequent etching process.

[0043] In response to the above situation, such as Figures 1-17As shown, this application provides a cleaning device, such as a single-wafer cleaning machine for cleaning wafers. It mainly includes a chamber mounting frame 6, a main chamber 7, a top cover 8, a chuck 9, a gas swing arm 10, multiple chemical solution swing arms 11, a water swing arm 12, and an exhaust component 13. The main chamber 7 is mounted on the chamber mounting frame 6. Multiple processing liquid collection devices 1 are stacked inside the main chamber 7. These processing liquid collection devices 1 are connected to the top cover 8 and confined within the main chamber 7. The inner cavity of each processing liquid collection device 1 serves as a cleaning space for cleaning the wafers. The wafers held by the chuck 9 can be transported by the lifting and lowering of the chuck 9. Different cleaning operations (e.g., cleaning with different chemicals, cleaning with water, etc.) are performed in different processing liquid collection devices 1. After the wafer is transported to the processing liquid collection device 1, components such as the gas swing arm 10, multiple chemical swing arms 11, and water swing arm 12 can swing to the opening of the processing liquid collection device 1 respectively to spray gas, chemical solution, or water (chemical solution and water are the cleaning liquid) into the processing liquid collection device 1 according to the process flow to achieve cleaning of the wafer. The exhaust component 13 is used to discharge the gas in the cleaning chamber in time. When the wafer is cleaned in the processing liquid collection device 1, the chuck 9 can drive the wafer to rotate to achieve thorough cleaning of the wafer. Meanwhile, each processing liquid collection device 1 is equipped with a drain tank 2 that communicates with the inner cavity of the processing liquid collection device 1. This drain tank 2 is used to collect the liquid used to clean the wafer in the processing liquid collection device 1. This liquid is either a chemical solution containing impurities or water. A drain hole 3 is provided on the bottom wall of the drain tank 2. This drain hole 3 is used to discharge the liquid collected in the drain tank 2 to the outside of the cleaning space. The drain tank 2 is integrally formed on the processing liquid collection device 1, that is, the processing liquid collection device 1 and the drain tank 2 are manufactured together using the same raw material (for example, the drain tank 2 is machined together with the same blank during the manufacturing process of the processing liquid collection device 1). The liquid tank 2 makes the treatment liquid collection device 1 and the drain tank 2 an inseparable integrated structure, avoiding the assembly operation of separate structures; in order to ensure that the discharged liquid can reach the designated container or position as required, a drain pipe 4 connected to the drain hole 3 is also provided. This drain pipe 4 can be assembled and connected to the drain hole 3 by connecting it to the treatment liquid collection device 1 and / or the drain tank 2. The connection between the drain pipe 4 and the treatment liquid collection device 1 and / or the drain tank 2 is achieved by using the connecting component 5. That is, the drain pipe 4 and the treatment liquid collection device 1 and / or the drain tank 2 are connected by the connecting component 5, thus avoiding the use of welding.

[0044] The above structure integrates the processing liquid collection device 1 and the drain tank 2, and connects the drain tank 2 and the drain pipe 4 using the connecting component 5. This avoids the use of welding, preventing the processing liquid collection device 1 from deforming due to temperature changes and welding pressure during welding. It also ensures that the roundness of the opening edge of the processing liquid collection device 1 is consistent, making the gap between the chuck 9 and the processing liquid collection device 1 more uniform. The chuck 9 can enter and exit the processing liquid collection device 1 without bumping, ensuring the smooth progress of wafer cleaning. Furthermore, the more uniform gap also improves the uniformity of exhaust, liquid recovery, and anti-splashing effect of the processing liquid collection device 1, thereby improving the quality of wafer cleaning.

[0045] like Figure 4 , Figure 5 , Figure 7 and Figure 8 As shown, the aforementioned stacked processing liquid collection devices 1 include a lower collection device 101 and one or more upper collection devices 102 located above the lower collection device 101 (e.g., Figure 3 and Figure 4The diagram shows a lower collection device 101 and two upper collection devices 102. Each of the lower collection device 101 and each upper collection device 102 is provided with a drain trough 2. The upper collection device 102 includes a load-bearing flange 103 integrally formed on the side wall. Based on the load-bearing flange 103 of the upper collection device 102, the drain trough 2 is provided to protrude outward on the side wall of the upper collection device 102. A portion of the load-bearing flange 103 forms the bottom wall of the drain trough 2 and is penetrated by a drain hole 3. In this structure, the upper collection device 102 is positioned above the lower collection device 101. In order to suspend the upper collection device 102 above the lower collection device 101, a structure supporting the upper collection device 102 needs to be provided on the upper collection device 102. The load-bearing flange 103 is a component of the support structure. It is connected to the side wall of the upper collection device 102 and protrudes radially relative to the side wall. Thus, the upper collection device 102 can be supported by supporting the load-bearing flange 103. Furthermore, in order to avoid using a welding connection method, the load-bearing flange 103 is also integrally formed with the treatment liquid collection device 1 and the drain tank 2. Because the wafer rotates under the drive of the chuck 9 during the cleaning process, the liquid after cleaning the wafer will splash onto the side wall of the liquid collection device 1 under the action of centrifugal force. Therefore, in order to collect the liquid more fully and efficiently, the drain trough 2 is set on the side wall of the liquid collection device 1, and the drain trough 2 protrudes radially outward from the liquid collection device 1. Since the side wall of the liquid collection device 1 is also provided with a load-bearing flange 103 that protrudes radially outward from the liquid collection device 1, in order to simplify the structure and reduce the number of parts, a part of the load-bearing flange 103 can be made to form the bottom wall of the drain trough 2. That is, during the integral molding process, the side wall of the drain trough 2 is directly connected to the load-bearing flange 103 so that a part of the load-bearing flange 103 is used as the bottom wall of the drain trough 2. Specifically, the load-bearing flange 103 can be configured as an annular structure surrounding the treatment liquid collection device 1, and a portion of its arc segment can be configured as the bottom wall of the drain trough 2. The other arc segments of the drain trough 2 can be used to connect with other components of the support structure to form support for the upper collection device 102. In addition, multiple drain troughs 2 can be provided around the treatment liquid collection device 1, and multiple spaced arc segments of the annular load-bearing flange 103 form the bottom walls of multiple drain troughs 2.

[0046] To more fully drain the liquid in the drain tank 2, the drain hole 3 can be opened on the bottom wall of the drain tank 2. On the basis of forming the bottom wall of the drain tank 2 in a part of the load-bearing flange 103, the drain hole 3 is opened on the load-bearing flange 103. That is, the drain hole 3 passes through the load-bearing flange 103 in the axial direction of the treatment liquid collection device 1. In order to realize the connection between the drain pipe 4 and the drain hole 3, the drain pipe 4 can be connected to the load-bearing flange 103 through the aforementioned connecting component 5, thus forming a complete drain path for the cleaning liquid. Meanwhile, since the drain pipe 4 has a certain structural strength and is connected to the load-bearing flange 103, it can be used as a component of the support structure of the upper collection device 102. That is, the drain pipe 4 can be used as a support arm to support the upper collection device 102. In this way, the drain pipe 4 and the load-bearing flange 103 cooperate to form the support structure of the upper collection device 102. The drain pipe 4 and the load-bearing flange 103 can play the role of draining liquid and also play the role of support, realizing multiple uses of one piece. There is no need to set up a special structure for supporting the upper collection device 102, thereby simplifying the structure of the cleaning equipment.

[0047] For example, such as Figure 4 and Figure 8 As shown, the drain pipe 4 can support and connect to the upper collection device 102 in the following manner: In one or more stacked upper collection devices 102, the drain pipe for discharging liquid from the upper collection device passes through the through hole 17 on the bearing flange 103 of the lower collection device and is inserted into the through hole 17. For example... Figure 4 As shown, when there are two upper collection devices 102, for easy distinction, the one located above is called the first upper collection device, and the one located below is called the second upper collection device. The drain pipe 4, which is connected to the first upper collection device and is used to discharge the internal cleaning liquid, is connected to the bearing flange 103 of the first upper collection device. Therefore, when the drain pipe 4 extends downward, it will pass through the bearing flange 103 of the second upper collection device. Correspondingly, the bearing flange 103 of the second upper collection device has a through hole 17 for the drain pipe 4 to pass through. When the drain pipe 4 passes through the through hole 17, the drain pipe 4 is connected to the through hole 17. This connection can be achieved, for example, by insertion through friction. In this way, the first upper collection device can be connected and supported on the second upper collection device.

[0048] Since the lower collection device 101 is located at the bottom of one or more processing liquid collection devices 1, it can be directly installed on the main cavity 7. Therefore, as Figure 6As shown, the lower collection device 101 does not need to be provided with a load-bearing flange 103 on its side wall. Since there is no load-bearing flange 103, the drain trough 2, which protrudes outward and is provided on the side wall of the lower collection device 101, has a bottom wall and the drain hole 3 is opened on the bottom wall. The drain pipe 4 is connected to the bottom wall of the drain trough 2 through the connecting component 5 to form a drain path for the cleaning liquid.

[0049] For example, since the lower collection device 101 does not have a load-bearing flange 103, the connection method between the lower collection device 101 and the upper collection device 102 can be as follows: Figure 4 and Figure 5 As shown, each of the cover plates 18 of the lower collection device 101 (the cover plate 18 is an annular plate covering the opening of the treatment liquid collection device 1, used to prevent cleaning liquid from splashing out of the treatment liquid collection device 1 during the cleaning process, and also used to improve the uniformity of exhaust) has a slot 19, and each cover plate 18 has multiple slots 19 arranged circumferentially, for different drainage pipes 4 of the liquid in the different upper collection devices 102 located above (i.e., the first upper collection device and the second upper collection device) to be engaged with the slots 19 at different positions circumferentially, i.e., the first upper collection device 102 ... As the drainage pipe 4 of the layer collection device extends downwards, it first inserts into the through hole 17 on the second upper layer collection device, then passes through the bayonet 19 on the lower layer collection device 101 and engages with it. Simultaneously, the drainage pipe 4 of the second upper layer collection device also extends downwards into the bayonet 19 on the lower layer collection device 101 and engages with it. This allows the lower layer collection device 101 to be connected to all the upper layer collection devices 102 via the bayonet 19 and the drainage pipe 4, achieving the stacked assembly of all the upper layer collection devices 102 on the lower layer collection device 101. Alternatively, the lower layer collection device 101 can be engaged only with the drainage pipe 4 of the second upper layer collection device via the bayonet 19, while the drainage pipe 4 of the first upper layer collection device is only inserted into the through hole 17 on the second upper layer collection device and not engaged with the bayonet 19 on the lower layer collection device 101. To avoid interference when the drain pipes 4 of the first and second upper-level collecting devices are engaged with the lower-level collecting device 101, multiple slots 19 are provided in the circumferential direction of the cover plate 18, and the drain pipes 4 of the first and second upper-level collecting devices are staggered in the circumferential direction so that they can engage with the slots 19 distributed at different positions in the circumferential direction on the lower-level collecting device 101.

[0050] In addition, a cover plate 18 is also provided on the upper collection device 102, so a slot 19 can be opened on the cover plate 18 of the second upper collection device. This allows the drain pipe 4 of the first upper collection device to pass through the slot 19 on the cover plate 18 of the second upper collection device when it extends downward, and then be inserted into the through hole on the bearing flange 103 of the second upper collection device. In this way, the first upper collection device and the second upper collection device can be both snapped and inserted, which improves the connection firmness and support stability of the first upper collection device.

[0051] Furthermore, such as Figure 9 As shown, the drain pipe 4 may include a main body 401 and an enlarged diameter portion 402 located at one end of the main body 401 (this one end refers to the end of the drain pipe 4 used to communicate with the drain hole 3). The outer diameter of the enlarged diameter portion 402 is larger than the outer diameter of the main body 401, and the inner diameter of the enlarged diameter portion 402 is greater than or equal to the inner diameter of the drain hole 3. In this way, when connecting the drain pipe 4 and the drain hole 3, the enlarged diameter portion 402 can be arranged on the radially outer side of the drain hole 3, thereby improving the sealing effect of the connection between the drain pipe 4 and the drain hole 3 and reducing the probability of liquid leakage at the connection point.

[0052] Based on the fact that the drain pipe 4 is provided with an enlarged diameter section 402, in an optional embodiment, such as Figure 7As shown, the connecting assembly 5 may include a clamping plate 501 and a connector 502. The clamping plate 501 has a first through hole 503. The diameter of the first through hole 503 is larger than the outer diameter of the body part 401 and smaller than the outer diameter of the expanded diameter part 402, so that the body part 401 can be inserted into the first through hole 503, that is, the clamping plate 501 can be sleeved on the body part 401. However, the clamping plate 501 is blocked by the expanded diameter part 402 and cannot be removed from the drain pipe 4. In addition, the clamping plate 501 also has a connecting hole 504 for connecting with the connector 502. When connecting the drain pipe 4 and the drain hole 3, the drain pipe 4 is first moved from the lower part of the load-bearing flange 103 towards the load-bearing flange 103. The expansion section 402 is brought close to the load-bearing flange 103 and abuts against it. During abutment, the expansion section 402 is aligned with the drain hole 3 and the connecting hole 504 is aligned with the second through hole 505 opened on the load-bearing flange 103. Then, the connector 502 is inserted into the second through hole 505 from above the load-bearing flange 103, and the insertion end of the connector 502 enters the connecting hole 504 after passing through the load-bearing flange 103 and connects with the connecting hole 504. In this way, the connector 502 and the clamping plate 501 can cooperate to clamp the expansion section 402 and the load-bearing flange 103 through the connection of the connector 502 and the connecting hole 504, thereby realizing the connection between the drain pipe 4 and the load-bearing flange 103 and the connection with the drain hole 3. Specifically, the connector 502 can be a screw and the connecting hole 504 can be a threaded hole that can be threaded to the screw, or the connector 502 can be a rivet and the connecting hole 504 can be a through hole with a smooth inner wall; in order to improve the firmness of the connection and the sealing of the connection, connecting holes 504 can be provided on both sides of the first through hole 503 on the pressure plate 501, and second through holes 505 can be provided on both sides of the drain hole 3 on the load-bearing flange 103. Multiple connectors 502 are inserted into the second through holes 505 on both sides of the drain hole 3 to connect with the connecting holes 504 on both sides of the first through hole 503.

[0053] In addition, the connecting component 5 can also be other structures, such as a clamp for clamping the enlarged diameter portion 402 and the load-bearing flange 103, or a connector for threaded connection between the enlarged diameter portion 402 and the drain hole 3.

[0054] Optional, such as Figure 10 and Figure 12As shown, a receiving groove 104 can also be provided on the load-bearing flange 103 to allow the enlarged diameter portion 402 to extend into it, and the drain hole 3 is provided on the bottom wall of the receiving groove 104. By providing this receiving groove 104, the enlarged diameter portion 402 can be inserted into the interior of the load-bearing flange when connecting the drain pipe 4 and the load-bearing flange 103. This allows the clamping plate 501, which is blocked by the enlarged diameter portion 402, to fit against the load-bearing flange 103. Thus, by connecting the two fitted plate-like structures with the connector 502, the firmness of the connection between the drain pipe 4 and the load-bearing flange 103 and the reliability of the sealing connection between the drain pipe 4 and the drain hole 3 can be further improved.

[0055] Furthermore, such as Figure 10 and Figure 12 As shown, a protruding tube portion 105 protruding towards the opening of the receiving groove 104 can also be provided on the bottom wall of the receiving groove 104. The drain hole 3 is the tube hole of the protruding tube portion 105, and the outer diameter of the protruding tube portion 105 is less than or equal to the inner diameter of the enlarged diameter portion 402, so that the protruding tube portion 105 can be inserted into the enlarged diameter portion 402 when the enlarged diameter portion 402 extends into the receiving groove 104. By setting this structure, when connecting the drain pipe 4 and the load-bearing flange 103, the drain pipe 4 entering the receiving groove 104 can achieve a nested fit (or a plug-in fit) with the protruding tube portion 105. This makes the drain hole 3 and the drain pipe 4 have an axially overlapping part. Compared with the butt-fitting method without overlapping part, it can not only avoid the deviation during alignment, but also improve the firmness and sealing of the connection, and significantly improve the convenience and reliability of the connection. Specifically, by making the outer diameter of the convex tube 105 smaller than or equal to the inner diameter of the enlarged diameter section 402, the enlarged diameter section 402 can be nested around the convex tube 105. This allows the liquid in the drain hole 3 to flow into the drain pipe 4 under the action of gravity, completely eliminating the risk of liquid leakage.

[0056] Based on the existing configuration where the drain trough 2 protrudes outward from the side wall of the treatment liquid collection device 1 and the drain hole 3 is formed in the bottom wall of the drain trough 2, the structure of the drain trough 2 can be further optimized. For example, in an optional embodiment, such as... Figures 12-14 as well as Figure 17As shown, among the multiple sidewalls of the drain tank 2, the sidewall of the drain tank 2 connected to its bottom wall and facing the cleaning space is configured as a guide sidewall 201 that can guide the cleaning liquid to the drain hole 3. The inner wall surface of this guide sidewall 201 facing the cleaning space is configured as an arc-shaped wall surface 202 that is concave in the direction away from the cleaning space. Compared with the flat sidewall of the drain tank in the related art, this structure can, on the one hand, make the liquid flow along the sidewall better through the curvature of the arc-shaped wall surface 202, reducing the possibility of liquid on the sidewall falling directly onto the bottom wall of the drain tank 2 and causing back splashing, thus improving the liquid discharge efficiency. On the other hand, the curvature of the arc-shaped wall surface 202 can achieve a smooth connection between the sidewall and the bottom wall, avoiding the occurrence of dead corners, eliminating the risk of liquid residue, and improving the drainage effect and the cleaning quality of the wafer.

[0057] Optionally, the axis of the arc-shaped wall 202 perpendicular to the drain hole 3 is set (this axis is...). Figure 12 The radius of the vertical dashed line in the figure is the reference radius (this reference radius is...). Figure 12 The horizontal dashed line shown is also... Figure 13 The line segment L3 + line segment L1 shown is... (The line connecting the time and the center of the circle), the aforementioned arc-shaped wall surface 202 includes a first arc-shaped portion 2021 located on the side near the drain hole 3 at the reference radius (this first arc-shaped portion 2021 is the... Figure 12 The arc-shaped section above the horizontal dashed line is also... Figure 13 The arc-shaped portion below point A shown), and the second arc-shaped portion 2022 located on the side away from the drain hole 3 at the reference radius (this second arc-shaped portion 2022 is...). Figure 13 (The arc-shaped portion above point A shown) has a central angle of 90° corresponding to the first arc portion 2021 and a central angle of 0°~42° corresponding to the second arc portion 2022.

[0058] When designing the curved wall 202, such as Figure 13 As shown, the basic cross-sectional shape of the arc-shaped wall 202 is first selected as a semi-circle, that is, the central angle corresponding to the entire arc-shaped wall 202 is 180°. Based on this, when the liquid flows to the 1 / 4 arc below the reference radius (i.e., the first arc surface 2021), this part of the arc surface has a supporting force on the liquid, and the liquid will not drip directly from this part of the arc surface. Therefore, it is only necessary to consider the flow of liquid on the 1 / 4 arc above the reference radius (i.e., the second arc surface 2022), and its influencing factors include: 1. Driven by gravity: The liquid flows downward from the top of the arc, and the gravitational potential energy is converted into kinetic energy, and the speed increases downward along the arc. II. Centrifugal force effect (unique to concave curved surfaces): (1) The center of the concave arc is below the liquid, and the centrifugal force , R refers to the velocity of the liquid, and R refers to the radius of the arc. This force is directed towards the wall (rather than away from it), helping the liquid adhere. (2) The radial component of gravity in the circular arc is ( Starting from the bottom of the 1 / 4 arc, the bottom... That is, at the location of line L1, at the top ); (3) Conditions for detachment: When the gravitational component exceeds the centrifugal force, the liquid may detach: (4) Assume the fluid flows along a circular arc of radius R under the action of gravity, with an angle of... It is measured starting from the highest point of the arc, derived using the law of conservation of energy, assuming the fluid is at the highest point of the arc ( The speed of ) is At any angle The velocity at that point is The potential energy and kinetic energy are: at the highest point ( The potential energy of the fluid is ,in At any angle The potential energy of the fluid is ,in The kinetic energy at the highest point is At any angle for .

[0059] According to the law of conservation of energy, the total energy at the highest point is equal to the energy at any angle. The total energy at that location is Substitute kinetic energy and potential energy Eliminate quality Rearrange and simplify (the fluid velocity at the highest point is...) )for The solution is From this, the ideal fluid velocity can be derived; (5) Substitute the detachment condition: Solving for the critical angle (Liquid tends to drip near the top of the arc), meaning that when the liquid is at an angle of the arc... It is easy to drip.

[0060] Therefore, in order to reduce the chance of liquid splashing due to dripping, the central angle corresponding to the second arc surface 2022 is set to 0°~42°, which can better improve the liquid discharge efficiency.

[0061] like Figure 13 and Figure 14 As shown, when a drain hole 3 is provided in the drain tank 2, one edge of the opening of the drain hole 3 can be extended to the intersection of the reference radius and the arc-shaped wall 202 (this intersection is the...). Figure 13 Point A (which is also the tangent point of the curved wall 202) is shown, so that the projection of the second curved surface 2022 onto the axial direction of the drain hole 3 is located in the opening of the drain hole 3. This allows liquid dripping from the curved wall 202 to fall directly into the drain hole 3, thus avoiding backsplashing. Specifically, when designing the size of the drain hole 3, its diameter needs to be greater than... That is, the range where line segment L3 is located. At the same time, it is also necessary to avoid the diameter of the drain hole 3 being too large, which would damage the rounded corner structure 14 around the guide sidewall 201 (described later). Therefore, the point of the drain hole 3 closest to the guide sidewall 201 (i.e. Figure 13 Point A in the diagram is located on line segment L2, and L2 lies on... The projection on the line is line segment L1, such as Figure 13 As shown. The selection of point A, the closest point to the liquid guiding sidewall in drain hole 3, needs to be determined based on the radius R of the semi-circular arc, and point A should be positioned such that... The projection on the line falls within the range of line segment L1.

[0062] Based on the above optimizations to the curved wall 202, and to facilitate cooperation with the curved wall 202, in optional embodiments, such as... Figures 14-16 As shown, the opening of the drain hole 3 can also have a radially protruding edge 301. The distance between this radially protruding edge 301 and the axis of the drain hole 3 is greater than the distance between the other edges of the opening and the axis of the drain hole 3, and the radially protruding edge 301 extends to point A, the intersection of the reference radius and the arc-shaped wall 202. With this arrangement, the protruding edge (or the apex of the opening shape) of the drain hole 3 can coincide with the farthest point A from which the liquid drips from the arc-shaped wall 202. This better ensures that the liquid dripping from the arc-shaped wall 202 can fall directly into the drain hole 3. Furthermore, the opening area of ​​the protruding edge of this type of drain hole 3 is small, and its proportion on the arc-shaped wall 202 is small when it extends to point A, thus not affecting the guiding effect of the arc-shaped wall 202. Specifically, the opening shape of the drain hole 3 can be... Figure 14 The teardrop shape shown, or... Figure 15 The shape shown is an ellipse, or it is... Figure 16 The triangle shown.

[0063] like Figure 12 and Figure 17As shown, the drainage tank 2 includes a top wall 203, which is connected to the second arcuate surface 2022 and located on the side of the second arcuate surface 2022 away from the drainage hole 3. The end of the top wall 203 connected to the treatment liquid collection device 1 is higher than the end connected to the second arcuate surface 2022; that is, the top wall 203 is an inclined wall. When designing the top wall 203, it is necessary to minimize the probability of liquid dripping from the arcuate wall surface 202. To prevent liquid from dripping from the top of the 1 / 4 arc above the reference radius (i.e., the second arcuate surface 2022), the following conditions must be met: The aforementioned curved wall 202 needs to ensure that the liquid does not drip when it enters the top of the second curved surface 2022 when it has a certain initial velocity. Based on this, the part of the top wall 203 that connects to the second curved surface 2022 is set as the central angle corresponding to the second curved surface 2022. The angle is 42°, which minimizes the chance of liquid splashing back into the drain tank 2 and improves the draining efficiency of the drain tank 2.

[0064] Furthermore, such as Figure 14 As shown, the drainage tank 2 includes enclosing sidewalls 204 located on both sides of the guide sidewall 201. These enclosing sidewalls 204 are connected to the bottom wall of the drainage tank 2 and to the bottom wall of the treatment liquid collection device 1 via rounded corner structures 14. By providing rounded corner structures 14 at the connection points between the enclosing sidewalls 204 and the bottom wall of the drainage tank 2, and at the connection points between the enclosing sidewalls 204 and the bottom wall of the treatment liquid collection device 1, dead corners within the drainage tank 2 can be avoided, allowing the liquid to flow more smoothly and fully to the drainage holes 3 within the drainage tank 2, thus improving the liquid discharge effect.

[0065] Since the draining tank 2 and the processing liquid collection device 1 provided in this application embodiment are an integral structure formed by machining, in order to ensure the smooth processing of the draining tank 2 and avoid damage to the side wall of the processing liquid collection device 1, a tool retraction groove 15 is provided on the side wall of the processing liquid collection device 1. This tool retraction groove 15 is located at the connection between the side wall of the processing liquid collection device 1 and the surrounding side wall 204, so that the hobbing cutter used to process the draining tank 2 can be smoothly retracted through this tool retraction groove 15.

[0066] Optional, such as Figure 14As shown, a liquid-gathering tank 16 can also be provided at the connection between the bottom wall of the drain tank 2 and the treatment liquid collection device 1 to guide the cleaning liquid to the drain hole 3, and the connection between the liquid-gathering tank 16 and the treatment liquid collection device 1 is also provided with a rounded corner structure 14. By providing a liquid-gathering tank 16 at the connection between the bottom wall of the drain tank 2 and the bottom wall of the treatment liquid collection device 1, the liquid on the bottom wall of the treatment liquid collection device 1 can flow more quickly and fully into the liquid-gathering tank 16, and then be guided to the drain hole 3 through the liquid-gathering tank 16, so as to achieve more efficient collection and discharge of liquid and improve drainage efficiency.

[0067] Specifically, as described above, the bottom wall of the liquid collection tank 16 is lower than the bottom wall of the treatment liquid collection device 1, allowing the liquid in the treatment liquid collection device 1 to accumulate by flowing into the lower liquid collection tank 16, thus enabling the liquid to flow more fully into the drainage tank 2. Based on this, the structure of the liquid collection tank 16 can be chosen in different ways. For example, while the bottom wall of the liquid collection tank 16 is generally lower than the bottom wall of the treatment liquid collection device 1, the bottom wall of the liquid collection tank 16 can be set as an inclined bottom wall, that is, the two opposite sides of the bottom wall of the liquid collection tank 16 have a height difference. The higher side is connected to the bottom wall of the treatment liquid collection device 1 through a rounded corner structure 14 (this higher side is still lower than the bottom wall of the treatment liquid collection device 1), while the lower side is connected to the bottom wall of the drainage tank 2 (this lower side can be at the same height as or higher than the bottom wall of the drainage tank 2). Thus, the inclined angle allows the liquid to flow more fully and smoothly into the drainage tank 2; or, as... Figure 12 As shown, the bottom wall of the liquid collection tank 16 can also be set as a horizontal bottom wall (that is, the bottom wall of the liquid collection tank 16 is at the same height everywhere, and there is no height difference between the side connected to the treatment liquid collection device 1 and the other side connected to the drain tank 2). This horizontal bottom wall is at the same height as the bottom wall of the drain tank 2, which is equivalent to expanding the bottom wall area of ​​the drain tank 2, and can also more fully guide the liquid into the drain tank 2.

[0068] And / or, such as Figure 14 As shown, the width of the liquid collection tank 16 can also be greater than the width of the drain tank 2, as shown in the figure. Figure 14 As shown, the dimensions of the two tanks in the circumferential direction of the liquid collection device 1 are as follows. By making the width of the liquid collection tank 16 greater than the width of the drain tank 2, the liquid can be more fully collected in the circumferential direction of the liquid collection device 1, so that the liquid in the liquid collection device 1 can be more fully drained into the drain tank 2, and then fully discharged from the liquid collection device 1 through the drain hole 3.

[0069] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0070] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0071] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0072] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0073] It should be understood that the qualifiers “first,” “second,” “third,” “fourth,” “fifth,” and “sixth” used in the description of the embodiments of this application are only used to more clearly illustrate the technical solutions and are not intended to limit the scope of protection of this application.

[0074] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A cleaning device, characterized in that, include: The treatment fluid collection device has a cleaning space that allows the cleaning fluid to enter; A drain tank is installed on the treatment liquid collection device and integrally formed with the treatment liquid collection device. The drain tank is provided with a drain hole, and the cleaning liquid flowing into the drain tank is discharged from the cleaning space through the drain hole. The drain pipe is connected to the treatment liquid collection device and / or the drain tank via a connecting component, and communicates with the drain hole.

2. The cleaning equipment according to claim 1, characterized in that, The drain trough protrudes outward on the side wall of the treatment liquid collection device, and the drain hole is opened on the bottom wall of the drain trough. Wherein, the side wall of the drain trough that connects to the bottom wall and faces the cleaning space is a guide side wall that guides the cleaning liquid to the drain hole, and the inner wall surface of the guide side wall facing the cleaning space is an arc-shaped wall surface that is concave in the direction away from the cleaning space.

3. The cleaning equipment according to claim 2, characterized in that, The radius of the arc-shaped wall surface perpendicular to the axis of the drain hole is the reference radius. The arc-shaped wall surface includes a first arc-shaped portion located on the side of the reference radius closer to the drain hole, and a second arc-shaped portion located on the side of the reference radius away from the drain hole. The central angle corresponding to the first arc-shaped portion is 90°, and the central angle corresponding to the second arc-shaped portion is 0°~42°.

4. The cleaning equipment according to claim 3, characterized in that, One edge of the opening of the drain hole extends to the intersection of the reference radius and the arc-shaped wall surface, so that the projection of the second arc-shaped surface in the axial direction of the drain hole is located in the opening of the drain hole.

5. The cleaning equipment according to claim 4, characterized in that, The opening of the drain hole has a radially protruding edge, the distance between the radially protruding edge and the axis of the drain hole is greater than the distance between the other edges of the opening and the axis of the drain hole, and the radially protruding edge extends to the intersection of the reference radius and the arc-shaped wall surface.

6. The cleaning equipment according to claim 3, characterized in that, The drain tank includes a top wall, which is connected to the second arcuate section and located on the side of the second arcuate section away from the drain hole, and the end of the top wall connected to the treatment liquid collection device is higher than the end connected to the second arcuate section.

7. The cleaning equipment according to claim 2, characterized in that, The drainage trough includes enclosing sidewalls located on both sides of the flow guide sidewall. The enclosing sidewalls are connected to the bottom wall of the drainage trough and to the bottom wall of the treatment liquid collection device through rounded corner structures.

8. The cleaning equipment according to claim 7, characterized in that, A knife-retraction groove is provided on the side wall of the treatment liquid collection device, and the knife-retraction groove is located at the connection between the side wall of the treatment liquid collection device and the enclosing side wall.

9. The cleaning equipment according to claim 2, characterized in that, The bottom wall of the drain tank is provided with a liquid collection tank at the connection between the drain tank and the treatment liquid collection device to guide the liquid to the drain hole, and the connection between the liquid collection tank and the treatment liquid collection device is provided with a rounded corner structure.

10. The cleaning equipment according to claim 9, characterized in that, The bottom wall of the liquid collection tank is lower than the bottom wall of the treatment liquid collection device, and: the bottom wall of the liquid collection tank is an inclined bottom wall, and the side of the inclined bottom wall connected to the rounded corner structure is higher than the side of the bottom wall connected to the drain tank; or, the bottom wall of the liquid collection tank is a horizontal bottom wall, and the horizontal bottom wall is at the same height as the bottom wall of the drain tank. And / or, The width of the liquid collection tank is greater than the width of the liquid discharge tank.

11. The cleaning equipment according to any one of claims 1-10, characterized in that, The treatment fluid collection device includes a lower collection device and one or more upper collection devices stacked together. Each of the lower collection device and one or more of the upper collection devices is equipped with a drainage trough. The upper collection device includes a load-bearing flange integrally formed on the side wall. The drain trough protrudes outward from the side wall of the upper collection device. A portion of the load-bearing flange forms the bottom wall of the drain trough and is penetrated by the drain hole. The drain pipe is connected to the load-bearing flange through the connecting assembly to form a drain path for the cleaning liquid. The drain trough protrudes outward from the side wall of the lower collection device, and the drain hole is formed on the bottom wall of the drain trough; the drain pipe is connected to the bottom wall of the drain trough through the connecting assembly to form a drain path for the liquid.

12. The cleaning equipment according to claim 11, characterized in that, The drain pipe includes a main body and an enlarged diameter section located at one end of the main body. The outer diameter of the enlarged diameter section is larger than the outer diameter of the main body, and the inner diameter of the enlarged diameter section is greater than or equal to the inner diameter of the drain hole. The connection component includes: A clamping plate is inserted into the main body and blocked by the enlarged diameter portion, and a connecting hole is provided on the clamping plate; A connector passes through the load-bearing flange and connects to the connecting hole to cooperate with the clamping plate to clamp the enlarged diameter portion and the load-bearing flange.

13. The cleaning equipment according to claim 12, characterized in that, The load-bearing flange is provided with a receiving groove that allows the enlarged diameter portion to extend into it, and the drain hole is provided on the bottom wall of the receiving groove.

14. The cleaning equipment according to claim 13, characterized in that, The bottom wall of the receiving groove is provided with a protruding tube portion that protrudes towards the opening of the receiving groove. The drain hole is the tube hole of the protruding tube portion, and the outer diameter of the protruding tube portion is less than or equal to the inner diameter of the enlarged diameter portion, so that the protruding tube portion can be inserted into the enlarged diameter portion when the enlarged diameter portion extends into the receiving groove.

15. The cleaning equipment according to claim 11, characterized in that, In one or more stacked upper collection devices, the drain pipe for discharging liquid from the upper upper collection device passes through a through hole on the bearing flange of the lower upper collection device and is inserted into the through hole to achieve connection and support of the upper upper collection device on the lower upper collection device. Both the cover plate of the lower collection device and the cover plate of the upper collection device located below it are provided with slots, and each cover plate is provided with multiple slots along the circumference, so that the different drainage pipes for discharging liquids from the different upper collection devices located above can be connected to the slots at different positions along the circumference.

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