Rotation offset compensation method and equipment based on regular circle-like trajectory, and medium

Abstract

The invention discloses a rotation offset compensation method and device based on a regular quasi-circular trajectory and a medium, and relates to the technical field of packaging device welding head rotation offset compensation, and the method comprises the steps: obtaining a pre-fitted elliptical trajectory corresponding to a current welding head; the welding head suction nozzle identifies the chip position of the chip in real time through a bottom camera in the real-time chip mounting process; performing zooming processing on the elliptical orbit based on the chip position to obtain a target elliptical orbit, and converting the chip position to a standard elliptical orbit on the target elliptical orbit; and performing formula derivation on the chip position based on the standard elliptical trajectory to obtain a target chip position, and finally performing inverse transformation to a target ellipse to obtain a final chip target position. The method is used for solving the problems that in the prior art, when welding head rotation offset compensation is conducted based on a circular track, the compensation precision is poor, and the chip mounting position precision is low, the precision of welding head rotation offset compensation is improved, and the welding head mounting precision is improved.

Description

Technical Field

[0001] This application relates to the field of welding head rotation offset compensation technology for packaging equipment, and in particular to a rotation offset compensation method, equipment and medium based on a regular circular trajectory. Background Technology

[0002] During semiconductor chip mounting, when the soldering head picks up the chip and performs bottom positioning correction and offset compensation, it is assumed that the trajectory of the soldering head's rotation center can be fitted with a circular model for subsequent rotation offset compensation. However, in reality, due to the assembly and manufacturing technology of the soldering head module, the soldering head rod and nozzle rod cannot be perfectly perpendicular to the mounting plane, and the soldering head's rotation trajectory is not necessarily a circular model.

[0003] Therefore, the compensation accuracy of rotation offset compensation based on the circular model is poor, which ultimately leads to low welding head mounting accuracy. Summary of the Invention

[0004] To address the aforementioned problems and technical requirements, this applicant proposes a rotation offset compensation method, device, and medium based on a regular circular trajectory. This method solves the problems in existing technologies where the rotation trajectory of the solder head is not necessarily a circular trajectory due to assembly and processing reasons, as well as the impossibility of perfectly parallel mounting on the lower plane of the solder head. However, when performing rotation offset compensation based on a circular trajectory, the compensation accuracy is poor and the chip mounting position is low. This method improves the accuracy of solder head rotation offset compensation by projecting the solder head rotation trajectory from a circle to a regular circle due to the above reasons and using an elliptical trajectory for accuracy compensation, thereby improving the solder head mounting accuracy.

[0005] This application provides a rotation offset compensation method based on a regular circular trajectory, the method comprising: Obtain a pre-fitted elliptical trajectory corresponding to the current welding head, wherein the elliptical trajectory includes: the center position of the ellipse, the semi-major axis length of the elliptical trajectory, the semi-minor axis length of the elliptical trajectory, and a first rotation angle; During real-time placement, the nozzle picks up the chip and identifies the chip's position using a bottom camera. The chip position includes: the chip's center position and a second rotation angle. The elliptical trajectory is scaled based on the chip position to obtain a target elliptical trajectory, and the target elliptical trajectory is transformed onto a standard ellipse. The target elliptical trajectory is the elliptical trajectory corresponding to the chip position being located on the scaled elliptical trajectory. The chip position is transformed based on the chip position on the standard ellipse and the second rotation angle to obtain the target chip position, so as to obtain the target compensation value corresponding to the rotation offset compensation.

[0006] According to the rotation offset compensation method based on a regular circular trajectory provided in the embodiments of this application, the elliptical trajectory is scaled based on the chip position to obtain a target elliptical trajectory, including: The chip center position is input into a preset scaling value calculation formula to obtain the scaling value output by the scaling value calculation formula. The elliptical trajectory is then scaled based on the scaling value to obtain the scaled target elliptical trajectory. The scaling value calculation formula includes: ; in, Indicates the scaling value. Represents the coordinates of the center of the ellipse. The center position of the chip is indicated by 'a', the semi-major axis length of the ellipse is indicated by 'b', and the first rotation angle is indicated by 'θ'.

[0007] According to the rotation offset compensation method based on a regular circular trajectory provided in the embodiments of this application, the target elliptical trajectory is transformed onto a standard ellipse, including: The target elliptical trajectory is rotated and / or translated to obtain a standard ellipse, and the corresponding mapped chip position on the standard ellipse is obtained. The locations of the mapped chips include: ; in, Indicates the location of the mapped chip. Indicates the center position of the chip. Let θ represent the coordinates of the ellipse center and θ represent the first rotation angle.

[0008] According to the rotation offset compensation method based on a regular circular trajectory provided in this application, the target chip position is obtained by transforming the chip position on the standard ellipse and the second rotation angle, including: The mapping chip position is first rotated and / or translated to obtain the intermediate chip position, and then the intermediate chip position is transformed inversely to obtain the target chip position. The intermediate chip locations include: ; in, Indicates the location of the intermediate chip. This represents the length of the semi-major axis of the standard ellipse. This represents the length of the minor semi-axis of the standard ellipse. Obtained based on the second rotation angle; The target chip location includes: ; in, Indicates the location of the target chip. Indicates the first rotation angle. This represents the coordinates of the ellipse's center.

[0009] The rotation offset compensation method based on a regular circular trajectory provided in the embodiments of this application It is obtained by summing the second rotation angle and the initial geometric angle; The initial geometric angles include: ; in, This represents the initial geometric angle.

[0010] According to the rotation offset compensation method based on a regular circular trajectory provided in the embodiments of this application, after obtaining the scaling value, it further includes: Determine whether the scaling value is zero; If the scaling value is determined to be zero, the identified chip location is determined as the target chip location; If the scaling value is determined to be non-zero, the step of scaling the elliptical trajectory based on the scaling value to obtain the scaled target elliptical trajectory is performed.

[0011] According to the rotation offset compensation method based on a regular circular trajectory provided in the embodiments of this application, before obtaining the pre-fitted elliptical trajectory corresponding to the current welding head, the method further includes: In offline mode, the nozzle picks up the chip and obtains multiple chip positions to be fitted by the bottom camera. The multiple chip positions to be fitted are obtained based on the welding head rotating at least one revolution. The elliptical trajectory is obtained by fitting multiple chip positions.

[0012] According to the rotation offset compensation method based on regular circular trajectory provided in the embodiments of this application, when a=b, the elliptical trajectory is a circular trajectory.

[0013] This application also provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the program, it implements the steps of the rotation offset compensation method based on a regular circular trajectory as described above.

[0014] This application also provides a non-transitory computer-readable storage medium storing a computer program thereon, which, when executed by a processor, implements the steps of the rotation offset compensation method based on a regular circular trajectory as described above.

[0015] The rotation offset compensation method, device, and medium based on regular circular trajectories provided in this application obtain a pre-fitted elliptical trajectory corresponding to the current soldering head. This application analyzes the soldering head rotation trajectory and fits an elliptical trajectory that conforms to the soldering head rotation estimate, providing an effective data foundation for subsequent accurate compensation of rotation offset. During real-time placement, the chip position is identified in real-time by the bottom camera as the nozzle picks up the chip. Based on the chip position, the elliptical trajectory is scaled to obtain a target elliptical trajectory, which is then transformed onto a standard ellipse. The target elliptical trajectory is the elliptical trajectory corresponding to the chip position being located on the scaled elliptical trajectory. Based on the chip position on the standard ellipse and a second rotation angle, the chip position is transformed to obtain the target chip position, thus obtaining the target compensation value corresponding to the rotation offset compensation. This application scales the fitted elliptical trajectory based on the identified actual chip position so that the actual chip position is located on the elliptical trajectory. Furthermore, to reduce computational load, the scaled ellipse estimate is mapped onto a standard ellipse, and then transformed again to obtain the final chip position. This accurately compensates for the offset during the soldering head rotation process, improving the final placement accuracy of the soldering head. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is one of the flowcharts illustrating the rotation offset compensation method based on a regular circular trajectory provided in this application embodiment; Figure 2 This is the second flowchart illustrating the rotation offset compensation method based on a regular circular trajectory provided in this application embodiment; Figure 3 This is a schematic diagram of the structure of the electronic device provided in the embodiments of this application. Detailed Implementation

[0018] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0019] This application provides a rotation offset compensation method based on a regular circular trajectory. This method can be applied to smart terminals and servers. This application uses the application of this method in a server as an example for illustration, and some other descriptions in the embodiments are for illustrative purposes only and are not intended to limit the scope of protection of this application, and will not be described in detail thereafter. The specific implementation of the method is as follows... Figure 1 As shown: Step 101: Obtain the pre-fitted elliptical trajectory corresponding to the current welding head.

[0020] The elliptical trajectory includes: the center position of the ellipse, the length of the semi-major axis, the length of the semi-minor axis, and the first rotation angle.

[0021] Step 102: During the real-time placement process, the nozzle picks up the chip and identifies the chip position using the bottom camera.

[0022] The chip position includes: the chip center position and the second rotation angle.

[0023] Step 103: Scaling the elliptical trajectory based on the chip position to obtain the target elliptical trajectory, and transforming the target elliptical trajectory onto a standard ellipse.

[0024] The target elliptical trajectory is the elliptical trajectory corresponding to the chip position when it is located on the scaled elliptical trajectory.

[0025] This involves scaling both the semi-major axis length and the semi-minor axis length.

[0026] Step 104: Based on the chip position on the standard ellipse and the second rotation angle, transform the chip position to obtain the target chip position, so as to obtain the target compensation value corresponding to the rotation offset compensation.

[0027] The rotation offset compensation method based on regular circular trajectories provided in this application obtains a pre-fitted elliptical trajectory corresponding to the current soldering head. This application analyzes the soldering head rotation trajectory and fits an elliptical trajectory that conforms to the soldering head rotation estimate, providing an effective data foundation for subsequent accurate compensation of rotation offset. During real-time placement, the chip position is identified in real time by the nozzle picking up the chip through the bottom camera. The elliptical trajectory is scaled based on the chip position to obtain a target elliptical trajectory, which is then transformed onto a standard ellipse. The target elliptical trajectory is the elliptical trajectory corresponding to the chip position when it is located on the scaled elliptical trajectory. The chip position is transformed based on the chip position and a second rotation angle on the standard ellipse pair to obtain the target chip position, thus obtaining the target compensation value corresponding to the rotation offset compensation. This application scales the fitted elliptical trajectory based on the identified actual chip position so that the actual chip position is located on the elliptical trajectory. To reduce computation, the scaled ellipse estimate is mapped onto a standard ellipse, and then transformed again to obtain the final chip position. This accurately compensates for the offset during the soldering head rotation process, improving the final placement accuracy of the soldering head.

[0028] In one specific embodiment, before obtaining the pre-fitted elliptical trajectory corresponding to the current welding head, the elliptical trajectory is fitted, specifically including: In offline mode, during the real-time placement process, the nozzle picks up the chip and identifies multiple chip positions to be fitted by the bottom camera; an elliptical trajectory is obtained by fitting multiple chip positions.

[0029] The positions of multiple chips to be fitted are obtained based on the welding head rotating at least one revolution.

[0030] Specifically, by determining the coordinates of the center point of the ellipse The ellipse is fitted using the semi-major axis length a, the semi-minor axis length b, and the ellipse rotation angle (first rotation angle) θ.

[0031] In this case, a≥b>0, and θ represents the angle between the major axis and the positive direction of the X-axis, with counterclockwise being positive.

[0032] Based on the above parameters, the ellipse can be represented by equation (1): ………(1) The process of ellipse fitting is essentially the process of obtaining the five parameters mentioned above.

[0033] According to the standard equation of an ellipse with its center at the origin, the best fitting model for a regular circle is an ellipse. Furthermore, when the semi-major axis a of an ellipse is equal to the semi-minor axis b, it is a circular model.

[0034] The standard ellipse equation can be represented in matrix form, as shown in equation (2): ...(2) Rotate the standard ellipse by an arbitrary angle and translate it. The equation of the ellipse is shown in equation (3): …………(3) Define A = B= C= Then, equation (4) can be obtained from equation (3): …………………………(4) Will Substituting into equation (4), we obtain equation (5):

[0035] …(5) Below, let

[0036] ... (6) In equation (5) Move the term to the right side of the equation and substitute equation (6) into the moved equation (5) to obtain equation (7):

[0037] ………(7) In this context, × represents the multiplication sign.

[0038] Assuming that n measurement points (the positions of the chip to be fitted) are obtained on the edge of the ellipse, equation (8) is obtained based on the n measurement points: …………………………………………(8) in, , , .

[0039] Matrix equation DP= The least squares solution yields equation (8).

[0040] In summary, five parameters can be obtained ( Thus, all coefficients a, b, and c of the ellipse are obtained. , and θ.

[0041] In one specific embodiment, when a=b, the elliptical trajectory is a circular trajectory.

[0042] In one specific embodiment, the specific implementation of scaling the elliptical trajectory based on the chip position to obtain the target elliptical trajectory includes: Input the chip center position into the preset scaling value calculation formula to obtain the scaling value output by the scaling value calculation formula, and scale the elliptical trajectory based on the scaling value to obtain the scaled target elliptical trajectory.

[0043] The formula for calculating the scaling value is shown in equation (9): …(9) in, Indicates the scaling value. Represents the coordinates of the center of the ellipse. The center position of the chip is indicated by 'a', the semi-major axis length of the ellipse is indicated by 'b', and the first rotation angle is indicated by 'θ'.

[0044] In actual real-time chip placement, the chip position may not be on the elliptical trajectory, but a unique value s can be found to make the chip position on the target elliptical trajectory.

[0045] Specifically, the ellipse equation (target elliptical trajectory) obtained by uniformly scaling equation (1) by a factor of s is shown in equation (10): ………(10) Input the chip center position into the scaling value calculation formula (9) to obtain the scaling value s.

[0046] To reduce computational complexity, this application transforms the target elliptical trajectory into a standard elliptical equation through rotation and translation. Then, the rotated chip position is calculated on the standard elliptical trajectory. Finally, the calculated rotated chip position is obtained by inverse rotation and translation transformation. The specific implementation is as follows: In one specific embodiment, the specific implementation of transforming the target elliptical trajectory onto a standard ellipse includes: The target elliptical trajectory is rotated and / or translated to obtain a standard ellipse, and the corresponding mapped chip position on the standard ellipse is obtained.

[0047] The location of the mapping chip is shown in equation (11): ……………………(11) in, Indicates the location of the mapped chip. Indicates the center position of the chip. This represents the coordinates of the ellipse's center.

[0048] Specifically, based on equation (11), the coordinates of the identified chip position mapped onto the standard ellipse are used as the mapping center coordinates.

[0049] In one specific embodiment, the coordinates of the chip after rotating it under a standard ellipse are calculated.

[0050] The standard equation of an ellipse is given in equation (12): ………………………………………………(12) Where E=sa and F=sb.

[0051] The polar equation corresponding to equation (12) is shown in equation (13): ……………………………………(13) Then, the relationship between the geometric angle (the angle W between the line connecting the point to the center of the ellipse and the X-axis) and the parameter angle corresponding to the coordinates of the mapping center is obtained, as shown in equation (14): ………………………………(14) The formula for calculating the initial geometric angle is then obtained as shown in equation (15). ………………………………………………(15) in, This represents the initial geometric angle.

[0052] In one specific embodiment, It is obtained by summing the second rotation angle and the initial geometric angle. Specifically, the second rotation angle recognized by the chip is... The chip needs to be rotated counterclockwise by a second rotation angle to become horizontal. At this point, the final angle the chip has rotated is... ,in, = +W.

[0053] In one specific embodiment, the specific implementation of transforming the chip position based on a standard ellipse to obtain the target chip position includes: The mapping chip position is first rotated and / or translated to obtain the intermediate chip position, and then the intermediate chip position is transformed inversely to obtain the target chip position.

[0054] The location of the intermediate chip is shown in equation (16): ………………………………(16) in, Indicates the location of the intermediate chip. This represents the length of the semi-major axis of the standard ellipse. This represents the length of the minor semi-axis of the standard ellipse. It is obtained based on the second rotation angle.

[0055] The location of the target chip is shown in equation (17): ………………………………(17) in, Indicates the location of the target chip. Indicates the first rotation angle. This represents the coordinates of the ellipse's center.

[0056] Specifically, ray θ = The equation is shown in equation (18): ………………………………………………(18) By combining equations (12) and (18) into a system of equations, that is, by substituting equation (12) into equation (18), we can obtain the formula for calculating the position of the intermediate chip after the chip rotates around the center of the ellipse along the ellipse, as shown in equation (16). The coordinates of the intermediate center obtained under the standard ellipse are then transformed to the target ellipse trajectory through inverse transformation to obtain the final chip position, as shown in equation (17).

[0057] In one specific embodiment, after obtaining the scaling value, it is determined whether the scaling value is zero; if the scaling value is zero, the identified chip position is determined as the target chip position; if the scaling value is non-zero, the step of scaling the elliptical trajectory based on the scaling value is performed to obtain the scaled target elliptical trajectory.

[0058] Specifically, in , At this point, s=0. That is, the chip position coincides exactly with the center of the ellipse. At this point, no matter how many degrees it rotates, the rotated chip position will still be the current chip position. Therefore, the chip position at this time can be used as the target chip position.

[0059] Below, through Figure 2 Specific examples will be provided to illustrate this application: Step 201: In offline mode, the chip-holding nozzle is rotated by the soldering head to take pictures and locate the chips under the bottom vision camera, thereby obtaining the positions of multiple chips.

[0060] For example, the chip is picked up by the welding head nozzle, and the chip position is identified by taking pictures with the bottom camera every 10 degrees. After rotating one circle, 36 chip position coordinates are obtained.

[0061] Step 202: Use the positions of multiple chips as input to fit an elliptical trajectory.

[0062] Step 203: Identify the chip position at the location in real time, scale the elliptical trajectory proportionally according to the chip position, and calculate the scaling value that allows the chip to fall exactly on the elliptical trajectory.

[0063] Step 204: Transform the scaled ellipse and the chip positions on the ellipse onto the standard ellipse through translation and rotation.

[0064] Step 205: Rotate the chip using the standard ellipse equation until the chip angle is horizontal, and determine the chip position at this point.

[0065] Step 206: Perform a translation and rotation inverse transformation operation on the chip position obtained in the previous step to obtain the final chip position.

[0066] For the welding head itself, the trajectory of a point on the welding head after rotating around the center of rotation of the welding head is ideally a circle. However, in most cases, due to the assembly and processing precision of the welding head itself, its trajectory is a regular shape similar to a circle, and is closer to an ellipse.

[0067] This application mainly addresses rotational offset compensation based on an ellipse trajectory, thereby improving the final mounting accuracy of the soldering head. Using an ellipse as the rotational model, when the major axis and minor axis of the ellipse are equal, the model is a circle. In other words, using an ellipse as the rotational trajectory already includes a circular model.

[0068] This application uses an elliptical trajectory for rotational offset compensation, which is not only compatible with the case where the trajectory is circular, but also achieves accurate compensation when the trajectory is elliptical.

[0069] Figure 3 An example is a schematic diagram of the physical structure of an electronic device, such as... Figure 3 As shown, the electronic device may include a processor 301, a communication interface 302, a memory 303, and a communication bus 304. The processor 301, communication interface 302, and memory 303 communicate with each other via the communication bus 304. The processor 301 can call logical instructions from the memory 303 to execute a rotational offset compensation method based on a regular circular trajectory.

[0070] Furthermore, the logical instructions in the aforementioned memory 303 can be implemented as software functional units and, when sold or used as independent products, can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, essentially, or the part that contributes to the prior art, or a part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0071] On the other hand, the present invention also provides a computer program product, the computer program product including a computer program stored on a non-transitory computer-readable storage medium, the computer program including program instructions, and when the program instructions are executed by a computer, the computer is able to execute the rotation offset compensation method based on the regular circular trajectory provided by the above methods.

[0072] In another aspect, the present invention also provides a non-transitory computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, is implemented to perform the rotation offset compensation method based on regular circular trajectories provided in the above embodiments.

[0073] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs. Those skilled in the art can understand and implement this without any creative effort.

[0074] Through the above description of the embodiments, those skilled in the art can clearly understand that each embodiment can be implemented by means of software plus necessary general-purpose hardware platforms, and of course, it can also be implemented by hardware. Based on this understanding, the above technical solutions, in essence or the part that contributes to the prior art, can be embodied in the form of a software product. This computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, magnetic disk, optical disk, etc., and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute the methods described in the various embodiments or some parts of the embodiments.

[0075] Finally, it should be noted that the above descriptions are merely preferred embodiments of this application, and this application is not limited to the above embodiments. It is understood that other improvements and variations directly derived or conceived by those skilled in the art without departing from the spirit and concept of this application should be considered to be included within the protection scope of this application.

Claims

1. A rotation offset compensation method based on a regular circular trajectory, characterized in that, The method comprises: obtaining an ellipse trajectory corresponding to a current welding head, wherein the ellipse trajectory comprises an ellipse center position, a semi-major axis length of the ellipse trajectory, a semi-minor axis length of the ellipse trajectory, and a first rotation angle; in a real-time mounting process, a chip position of a chip sucked by a suction nozzle is recognized by a bottom camera, wherein the chip position comprises a chip center position and a second rotation angle; scaling the ellipse trajectory based on the chip position to obtain a target ellipse trajectory, and transforming the target ellipse trajectory to a standard ellipse, wherein the target ellipse trajectory is an ellipse trajectory corresponding to the chip position on the scaled ellipse trajectory; transforming the chip position based on the chip position on the standard ellipse and the second rotation angle to obtain a target chip position to obtain a target compensation value corresponding to rotation offset compensation.

2. The method of claim 1, wherein, scaling the ellipse trajectory based on the chip position to obtain a target ellipse trajectory, comprising: inputting the chip center position into a preset scaling value calculation formula to obtain a scaling value output by the scaling value calculation formula, and scaling the ellipse trajectory based on the scaling value to obtain a target ellipse trajectory after scaling processing; wherein the scaling value calculation formula comprises: ； wherein, denotes a scaling value, denotes an ellipse center coordinate, denotes a chip center position, a denotes an ellipse semi-major axis length, b denotes an ellipse semi-minor axis length, and θ denotes a first rotation angle.

3. The rule-based circular trajectory dependent rotation offset compensation method according to claim 1 or 2, characterized in that, transforming the target ellipse trajectory to a standard ellipse, comprising: rotating and / or translating the target ellipse trajectory to obtain a standard ellipse and obtain a corresponding mapped chip position on the standard ellipse; wherein the mapped chip position comprises: ； wherein, represents a mapping chip position, represents a chip center position, represents an ellipse center coordinate, and θ represents a first rotation angle.

4. The method of claim 3, wherein, transforming the chip position based on the chip position on the standard ellipse and the second rotation angle to obtain a target chip position, comprising: rotating and / or translating the mapped chip position to obtain an intermediate chip position, and inversely transforming the intermediate chip position to obtain a target chip position; wherein the intermediate chip position comprises: ； wherein, represents a position of the intermediate chip, represents a length of a long semi-axis corresponding to a standard ellipse, represents a length of a short semi-axis corresponding to a standard ellipse, is obtained based on the second rotation angle; wherein the target chip position comprises: ； wherein, represents a target chip position, represents a first rotation angle, represents an ellipse center coordinate.

5. The method of claim 4, wherein, is obtained by summing the second rotation angle and the initial geometric angle; wherein the initial geometric angle comprises: ； wherein denotes the initial geometric angle.

6. The method of claim 2, wherein, after obtaining the scaling value, further comprising: determining whether the scaling value is zero; in a case where it is determined that the scaling value is zero, determining the recognized chip position as the target chip position; in a case where it is determined that the scaling value is not zero, performing scaling processing on the ellipse trajectory based on the scaling value to obtain a target ellipse trajectory after scaling processing.

7. The rule-based circular trajectory-based rotation offset compensation method according to claim 1 or 2, characterized in that, before obtaining the ellipse trajectory corresponding to the current welding head, further comprising: in an offline state, obtaining a plurality of to-be-fitted chip positions recognized by a bottom camera when a chip is sucked by a suction nozzle, wherein the plurality of to-be-fitted chip positions are obtained based on at least one rotation of a welding head; fitting the ellipse trajectory based on the plurality of to-be-fitted chip positions.

8. The method of claim 2, wherein, in a case where a=b, the ellipse trajectory is a circular trajectory.

9. An electronic device comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, characterized in that, The processor executes the program to implement the steps of the rotation offset compensation method based on the rule-based circular trajectory according to any one of claims 1 to 8.

10. A non-transitory computer-readable storage medium having stored thereon a computer program, characterized in that, The computer program is executed by the processor to implement the steps of the rotation offset compensation method based on the rule-based circular trajectory according to any one of claims 1 to 8.

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