High-hardness wear-resistant full-polished glaze, polished glaze brick and preparation method thereof

Abstract

The application belongs to the technical field of building ceramics, and discloses a high-hardness wear-resistant full-polishing glaze, a polishing glaze brick and a preparation method of the polishing glaze brick. The chemical composition of the full-polishing glaze comprises, in percentage by weight, SiO2 60-68%, Al2O3 15-25%, CaO 4-6%, MgO 1-2%, K2O 2.5-5%, Na2O 1-3%, B2O3 1-2%, ZnO 0.5-1%, BaO 1-3%, and a loss on ignition of 4-6%. The raw material components of the full-polishing glaze contain high-silicon high-boron frit, and the chemical composition of the high-silicon high-boron frit contains SiO2 with a content of ≥65wt% and B2O3 with a content of ≥8wt%. The full-polishing glaze of the application adopts a high-silicon high-aluminum glaze material system and introduces high-silicon high-boron frit. In combination with a swing-type glaze spraying and a specific firing system, the polishing glaze brick with excellent hardness, wear resistance and stain resistance and with good glaze quality is prepared.

Description

Technical Field

[0001] This invention belongs to the field of building ceramics technology, specifically relating to a high-hardness, wear-resistant, fully polished glazed tile, and its preparation method. Background Technology

[0002] Fully polished glazed ceramic tiles (i.e., polished glazed tiles) are currently the mainstream product in the ceramic tile market. They are characterized by their excellent decorative properties and rich patterns, making them popular among consumers. When polished glazed tiles are used as floor tiles, especially in public places where there is heavy foot traffic and various heavy objects are dragged back and forth, the polished glaze surface of the tile must have good hardness and wear resistance. Otherwise, the polished glaze surface is easily scratched or worn down, affecting its appearance.

[0003] Currently, the main technical solutions for improving the hardness and wear resistance of fully polished glazed ceramics include changing the glaze formula and glazing method. First, by adding quartz or corundum to increase the SiO2 or Al2O3 content in the glaze, the high Mohs hardness of quartz (Mohs hardness 7) and corundum (Mohs hardness 9) can be utilized to improve the hardness of the fully polished glaze. Second, the glaze layer can be thinned, and the glazing method can be changed, replacing the traditional pouring method with screen printing. After the glaze layer is thinned, the intermediate layer between the body and the glaze is also correspondingly thinned, which helps to improve the hardness and wear resistance of the fully polished glaze. For example, Chinese invention patent CN115304408A discloses a high-temperature wear-resistant transparent glaze, which designs the formula structure of the high-temperature wear-resistant transparent glaze layer as a high-silicon system, giving the glaze better wear resistance. A color-protecting glaze ink is used to promote the color development of the color ink, achieving a color-enhancing effect. Chinese invention patent CN111470884A discloses a high-hardness, wear-resistant, fully polished glazed ceramic tile and its preparation method. By changing the fully polished glaze formula and using screen printing instead of traditional glazing, the wear resistance of the fully polished glaze is improved.

[0004] While the aforementioned technical solutions offer some help in improving the hardness and wear resistance of fully polished glazed bricks, certain shortcomings remain. For instance, increasing the SiO2 or Al2O3 content in the glaze leads to excessive silicon and aluminum content, causing the glaze firing temperature to rise and resulting in excessively high viscosity at high temperatures. This makes it difficult to achieve a smooth, even surface, and prevents bubbles generated during the high-temperature firing process from escaping in time. This is especially problematic with the industry-standard rapid firing process, easily leading to uneven glaze surfaces, poor gloss, and poor post-polishing stain resistance. It's impossible to simultaneously achieve both glaze performance and surface quality. When screen printing replaces glazing, it's not feasible for large-sized slabs. Furthermore, due to the thin glaze layer from screen printing, it's difficult to achieve a smooth, even finish after firing, easily resulting in incomplete or excessive polishing defects.

[0005] Therefore, there is an urgent need to develop a new type of fully polished glaze that can improve the hardness and wear resistance of the glaze while ensuring the gloss, anti-fouling properties and quality of the glaze surface. Summary of the Invention

[0006] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention proposes a high-hardness (level 7 or above) and high-wear-resistant (level 4 or above) fully polished glazed tile, a method for preparing the same, wherein the fully polished glazed tile simultaneously possesses good anti-fouling, hardness and wear resistance properties, and has good glaze gloss and glaze quality.

[0007] To solve the above-mentioned technical problems, the first aspect of the present invention provides a fully polished glaze, wherein the chemical composition of the fully polished glaze, by weight percentage, comprises: SiO2 60-68%, Al2O3 15-25%, CaO 4-6%, MgO 1-2%, K2O 2.5-5%, Na2O 1-3%, B2O3 1-2%, ZnO 0.5-1%, BaO 1-3%, and a loss on ignition of 4-6%; the raw material components of the fully polished glaze contain a high-silicon, high-boron frit, wherein the chemical composition of the high-silicon, high-boron frit contains SiO2 ≥ 65wt% and B2O3 ≥ 8wt%.

[0008] Specifically, the fully polished glaze of this invention adopts a high-silicon, high-alumina glaze system. By controlling the total content of SiO2 and Al2O3 in its chemical composition to be above 75wt%, the silicon and aluminum content in the glaze is increased. Furthermore, the chemical composition is optimized so that more mullite microcrystals precipitate in the glaze melt during firing, thereby improving the hardness and wear resistance of the glaze surface. However, with the increase of silicon and aluminum content in the chemical composition, the firing temperature and high-temperature viscosity of the glaze also increase. To address this, this invention introduces a high-silicon, high-boron frit into the glaze. Boron is not only a strong flux, but it can also form a glass network in the high-silicon frit. At high temperatures, boron-oxygen (BO) bonds together with silicon-oxygen (Si-O) bonds form an amorphous glass network structure. Ceramic glaze is essentially a type of glass, and the hardness and strength of glass mainly depend on the connection strength and density of its internal three-dimensional network structure. Boron in the glaze typically exists in two coordination states: one is tricoordinate [BO3] (trigonal); the other is tetracoordinate [BO4] (tetrahedral). When sufficient silica and an appropriate amount of alkali metal are present in the glaze, boron will transform from a [BO3]trigonal to a [BO4] tetrahedron. The [BO4] tetrahedrons can be directly and firmly connected to the [SiO4] tetrahedrons via covalent bonds. The BO bonds formed by boron and oxygen atoms are very strong, and each [BO4] tetrahedron can provide four connection points to combine with the surrounding silicon-oxygen network. This greatly increases the three-dimensional cross-linking density of the glass network, thereby improving the density of the network structure. Therefore, this invention introduces a high-silicon, high-boron frit into the fully polished glaze to form a three-dimensional network structure in the glaze, thereby improving the density of the glaze and enhancing the continuity strength of the [BO4] and [SiO4] tetrahedrons. Macroscopically, this manifests as a significantly enhanced ability of the glaze surface to resist scratching and indentation by harder objects (i.e., hardness).

[0009] In some embodiments of the present invention, the chemical composition of the high-silicon and high-boron frit, by weight percentage, includes: SiO2 65-70%, Al2O3 5-8%, CaO 1-3%, MgO 0-1%, K2O 4-6%, Na2O 4-6%, and B2O3 8-10%.

[0010] In some embodiments of the present invention, the raw material components of the fully polished glaze include, by weight: 10-20 parts of high-silicon and high-boron frit, 12-18 parts of fully polished glaze frit, 5-20 parts of industrial waste, 15-25 parts of potassium feldspar, 20-40 parts of quartz, 5-15 parts of dolomite, 2-10 parts of corundum, and 5-10 parts of kaolin; the industrial waste contains 52-55 wt% SiO2 and 42-46 wt% Al2O3.

[0011] In some embodiments of the present invention, the chemical composition of the fully polished glaze frit, by weight percentage, includes: SiO2 50-53%, Al2O3 16-20%, CaO 8-10%, MgO 1-2%, K2O 1-3%, Na2O 1-3%, and BaO 10-12%. The fully polished glaze frit primarily serves as a high-temperature flux to improve the melting performance of the glaze at high temperatures, thereby further promoting the formation of mullite crystals from SiO2 and Al2O3. Simultaneously, it promotes high-temperature venting of the glaze, improving its anti-fouling properties and surface quality.

[0012] In some embodiments of the present invention, the chemical composition of the industrial waste material further includes at least one of CaO, MgO, K2O, and Na2O.

[0013] In some embodiments of the present invention, the chemical composition of the industrial waste material, by weight percentage, includes: SiO2 52-55%, Al2O3 42-46%, CaO 0.2-0.8%, MgO 0-0.2%, K2O 0.5-1%, and Na2O 0.5-1%. The chemical composition of this industrial waste material is mainly SiO2 and Al2O3, which easily forms mullite crystals during the firing process. Simultaneously, the chemical composition of this industrial waste material also contains certain amounts of low-temperature fluxes K2O and Na2O, as well as high-temperature fluxes CaO and MgO. Therefore, the firing temperature is lower than that of calcined kaolin (chemical formula Al2O3•2SiO2).

[0014] A second aspect of the present invention provides a method for preparing the above-mentioned fully polished glaze, comprising the following steps:

[0015] The raw materials for preparing the fully polished glaze are wet-ground to obtain the fully polished glaze.

[0016] In some embodiments of the present invention, the fineness of the fully polished glaze is such that the residue on a 325-mesh sieve is 0.4-0.6 wt%.

[0017] In some embodiments of the present invention, the specific gravity of the fully polished glaze is 1.45-1.48 g / cm³. 3 .

[0018] A third aspect of the present invention provides a polished glazed tile, which, from bottom to top, comprises a body, a surface glaze layer, a pattern layer and a polished glaze layer, wherein the polished glaze layer is formed by firing the aforementioned fully polished glaze.

[0019] A fourth aspect of the present invention provides a method for preparing the above-mentioned glazed bricks, comprising the following steps:

[0020] The surface glaze, inkjet-printed pattern, and fully polished glaze are applied sequentially to the upper surface of the body to form a surface glaze layer, a pattern layer, and a polished glaze layer. After drying, the body is fired in a kiln to obtain the polished glazed brick.

[0021] In some embodiments of the present invention, the glazing method of the fully polished glaze is oscillating spraying, and the spraying amount is 460-480g / m². 2 .

[0022] Specifically, the oscillating spray glaze is applied to the surface of the pattern layer by spraying the glaze onto the surface of the pattern layer. Compared with the traditional bell jar glazing, the amount of glaze applied can be reduced, and the intermediate layer between the body and glaze can be reduced, which is beneficial to improving the hardness and wear resistance of the glaze. Compared with screen printing, the thickness of the oscillating spray glaze is thicker and can be adapted to the preparation of larger and thinner slabs (such as large-size slabs with a thickness of 3-5mm and a length × width of 900×2700mm or 1600×3200mm). At the same time, it is also more beneficial to the subsequent polishing process, avoiding the risk of polishing through the glaze layer.

[0023] In some embodiments of the present invention, the firing temperature regime is as follows: first, the temperature is increased to 1150-1160℃ at a rate of 10-15℃ / min and held for 15-20 min; then, the temperature is increased to 1180-1220℃ at a rate of 5-8℃ / min and held for 5-10 min; finally, the surface is removed from the kiln and cooled. This high-temperature firing process is beneficial for the precipitation of mullite crystals and the formation of a three-dimensional network in the fully polished glaze, thereby further promoting the improvement of the glaze's hardness and wear resistance.

[0024] This invention does not have special requirements for the body and glaze; the body and glaze of traditional polished glazed tiles can be used.

[0025] Compared with the prior art, the above-described technical solution of the present invention has at least the following technical effects or advantages:

[0026] (1) The fully polished glaze of the present invention adopts a high-silicon and high-alumina glaze system. By controlling the total content of SiO2 and Al2O3 in its chemical composition to be above 75wt%, the silicon and aluminum content in the glaze is increased; and the chemical composition is optimized so that more mullite microcrystals are precipitated in the glaze melt during the firing process, thereby improving the hardness and wear resistance of the glaze surface.

[0027] (2) By introducing high-silicon and high-boron frit into the glaze, the present invention utilizes the strong flux of boron to reduce the viscosity of the glaze melt and improve the glaze quality; on the other hand, it utilizes boron to form a three-dimensional network structure in the glaze, thereby increasing the density of the glaze and improving the continuity strength of [BO4] tetrahedron and [SiO4] tetrahedron, thereby improving the hardness and anti-fouling performance of the glaze.

[0028] (3) The fully polished glaze of the present invention adopts oscillating spraying, which is more conducive to improving the hardness and wear resistance of the glaze compared with the traditional bell jar glazing and screen printing. It can also be used to prepare large-size ultra-thin rock slabs, avoiding the risk of the glaze surface being polished through.

[0029] (4) The polished glazed tile of the present invention has good hardness, wear resistance and stain resistance. It achieves wear resistance of 4 levels at 12,000 revolutions, hardness of 7-7.5 levels, and stain resistance of 5 levels. The gloss of the fully polished glazed surface before and after polishing is 16-20° and the sintering performance is good. Detailed Implementation

[0030] The present invention will now be described in detail with reference to embodiments to facilitate understanding of the invention by those skilled in the art. It is particularly important to note that the embodiments are merely illustrative of the invention and should not be construed as limiting the scope of protection of the invention. Non-essential improvements and adjustments made to the invention by those skilled in the art based on the above description should still fall within the scope of protection of the invention. Furthermore, all raw materials mentioned below, unless otherwise specified, are commercially available products; all process steps or preparation methods not mentioned in detail are process steps or preparation methods known to those skilled in the art.

[0031] The raw material composition of the blanks used in the embodiments and comparative examples of the present invention includes, by weight, 30 parts of potassium sodium sand, 20 parts of stone powder, 8 parts of aluminum sand, 15 parts of high-temperature sand, 2 parts of talc, 8 parts of black mud, 15 parts of ball clay, and 2 parts of bentonite.

[0032] The raw material components of the glaze, by weight, include: 50 parts potassium feldspar, 10 parts kaolin, 8 parts calcined kaolin, 15 parts quartz, and 17 parts calcined alumina.

[0033] Example 1

[0034] A fully polished glaze, the chemical composition of which by weight percentage includes: 62% SiO2, 19.5% Al2O3, 4.5% CaO, 1.3% MgO, 3.2% K2O, 1.7% Na2O, 1.5% B2O3, 0.5% ZnO, 1.6% BaO, and a loss on ignition of 4.2%.

[0035] The raw material components of the fully polished glaze, by weight, include: 18 parts high-silicon and high-boron frit, 15 parts fully polished glaze frit, 14 parts industrial waste, 18 parts potassium feldspar, 25 parts quartz, 7 parts dolomite, 5 parts corundum, and 8 parts kaolin.

[0036] The chemical composition of the high-silicon and high-boron ingot, by weight percentage, includes: SiO2 69%, Al2O3 7.5%, CaO 2.8%, MgO 0.8%, K2O 5.4%, Na2O 5.5%, and B2O 39%.

[0037] The chemical composition of the fully polished glazed ingot, by weight percentage, includes: SiO2 52%, Al2O3 19%, CaO 10%, MgO 2%, K2O 2%, Na2O 3%, BaO 12%.

[0038] The chemical composition of industrial waste materials, by weight percentage, includes: SiO2 53%, Al2O3 44%, CaO 0.8%, MgO 0.2%, K2O 1%, Na2O 1%.

[0039] A type of glazed tile, from bottom to top, comprises a body, a glaze layer, a pattern layer, and a polished glaze layer, wherein the polished glaze layer is formed by firing the aforementioned fully polished glaze; its preparation method includes the following steps:

[0040] (1) After mixing the raw materials for preparing the glaze according to the specified ratio, water, sodium carboxymethyl cellulose and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a glaze with a fineness of 0.5wt% residue on a 325-mesh sieve and a specific gravity of 1.98 g / cm³. 3 .

[0041] (2) After mixing the raw materials for preparing the fully polished glaze according to the specified ratio, water, sodium carboxymethyl cellulose, and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose, and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a fully polished glaze with a fineness of 0.5 wt% residue on a 325-mesh sieve and a specific gravity of 1.95 g / cm³. 3 Add water to adjust the specific gravity to 1.46 g / cm³. 3 .

[0042] (3) Apply the glaze obtained in step (1) to the body in sequence (glaze application amount is 550g / m). 2 ), forming a surface glaze layer; then inkjet printing a pattern on the surface of the surface glaze layer to form a pattern layer; then using a swing-type spray glaze booth to spray the fully polished glaze obtained in step (2) onto the surface of the pattern layer, with a spray glaze amount of 480g / m 2 This forms a polished glaze layer.

[0043] (4) After drying the ceramic bricks obtained in step (3), they are fired in a kiln to obtain the glazed bricks of this embodiment. The firing temperature regime is as follows: first, the temperature is raised to 1150℃ at a rate of 12℃ / min and held for 20min; then, the temperature is raised to 1180℃ at a rate of 8℃ / min and held for 10min; finally, the bricks are removed from the kiln and cooled.

[0044] Example 2

[0045] A fully polished glaze, the chemical composition of which by weight percentage includes: SiO2 62.5%, Al2O3 18%, CaO 5%, MgO 1.8%, K2O 3.2%, Na2O 1.6%, B2O3 1.3%, ZnO 0.6%, BaO 1.7%, and loss on ignition of 4.3%.

[0046] The raw material components of the fully polished glaze, by weight, include: 15 parts high-silicon and high-boron frit, 15 parts fully polished glaze frit, 7 parts industrial waste, 28 parts potassium feldspar, 25 parts quartz, 7 parts dolomite, 5 parts corundum, and 8 parts kaolin.

[0047] The chemical composition of the high-silicon and high-boron ingot, by weight percentage, includes: SiO2 69%, Al2O3 7.5%, CaO 2.8%, MgO 0.8%, K2O 5.4%, Na2O 5.5%, and B2O 39%.

[0048] The chemical composition of the fully polished glazed ingot, by weight percentage, includes: SiO2 53%, Al2O3 19%, CaO 10%, MgO 2%, K2O 2%, Na2O 3%, BaO 11%.

[0049] The chemical composition of industrial waste materials, by weight percentage, includes: SiO2 53%, Al2O3 44%, CaO 0.8%, MgO 0.2%, K2O 1%, Na2O 1%.

[0050] A type of glazed tile, from bottom to top, comprises a body, a glaze layer, a pattern layer, and a polished glaze layer, wherein the polished glaze layer is formed by firing the aforementioned fully polished glaze; its preparation method includes the following steps:

[0051] (1) After mixing the raw materials for preparing the glaze according to the specified ratio, water, sodium carboxymethyl cellulose and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a glaze with a fineness of 0.5wt% residue on a 325-mesh sieve and a specific gravity of 1.98 g / cm³. 3 .

[0052] (2) After mixing the raw materials for preparing the fully polished glaze according to the specified ratio, water, sodium carboxymethyl cellulose, and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose, and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a fully polished glaze with a fineness of 0.5 wt% residue on a 325-mesh sieve and a specific gravity of 1.95 g / cm³. 3 Add water to adjust the specific gravity to 1.46 g / cm³. 3 .

[0053] (3) Apply the glaze obtained in step (1) to the body in sequence (glaze application amount is 560g / m). 2 ), forming a surface glaze layer; then inkjet printing a pattern on the surface of the surface glaze layer to form a pattern layer; then using a swing-type spray glaze booth to spray the fully polished glaze obtained in step (2) onto the surface of the pattern layer, with a spray glaze amount of 480g / m 2 This forms a polished glaze layer.

[0054] (4) After drying the ceramic bricks obtained in step (3), they are fired in a kiln to obtain the glazed bricks of this embodiment. The firing temperature regime is as follows: first, the temperature is raised to 1160℃ at a rate of 10℃ / min and held for 15min; then, the temperature is raised to 1200℃ at a rate of 6℃ / min and held for 10min; finally, the bricks are removed from the kiln and cooled.

[0055] Example 3

[0056] A fully polished glaze, the chemical composition of which by weight percentage includes: 60% SiO2, 22% Al2O3, 4% CaO, 1.6% MgO, 3.5% K2O, 1.6% Na2O, 1.2% B2O3, 0.5% ZnO, 1.5% BaO, and a loss on ignition of 4.1%.

[0057] The raw material components of the fully polished glaze, by weight, include: 15 parts high-silicon and high-boron frit, 15 parts fully polished glaze frit, 7 parts industrial waste, 24 parts potassium feldspar, 24 parts quartz, 7 parts dolomite, 10 parts corundum, and 8 parts kaolin.

[0058] The chemical composition of the high-silicon and high-boron ingot, by weight percentage, includes: SiO2 69%, Al2O3 7.5%, CaO 2.8%, MgO 0.8%, K2O 5.4%, Na2O 5.5%, and B2O 39%.

[0059] The chemical composition of the fully polished glazed ingot, by weight percentage, includes: SiO2 52%, Al2O3 20%, CaO 10%, MgO 2%, K2O 2%, Na2O 3%, BaO 11%.

[0060] The chemical composition of industrial waste materials, by weight percentage, includes: SiO2 53%, Al2O3 44%, CaO 0.8%, MgO 0.2%, K2O 1%, Na2O 1%.

[0061] A type of glazed tile, from bottom to top, comprises a body, a glaze layer, a pattern layer, and a polished glaze layer, wherein the polished glaze layer is formed by firing the aforementioned fully polished glaze; its preparation method includes the following steps:

[0062] (1) After mixing the raw materials for preparing the glaze according to the specified ratio, water, sodium carboxymethyl cellulose and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a glaze with a fineness of 0.5wt% residue on a 325-mesh sieve and a specific gravity of 1.98 g / cm³. 3 .

[0063] (2) After mixing the raw materials for preparing the fully polished glaze according to the specified ratio, water, sodium carboxymethyl cellulose, and sodium tripolyphosphate were added and ball-milled (the mass ratio of material to water, sodium carboxymethyl cellulose, and sodium tripolyphosphate was 100:37:0.11:0.35) to obtain a fully polished glaze with a fineness of 0.5 wt% residue on a 325-mesh sieve and a specific gravity of 1.95 g / cm³. 3 Add water to adjust the specific gravity to 1.46 g / cm³. 3 .

[0064] (3) Apply the glaze obtained in step (1) to the body in sequence (glaze application amount is 520g / m). 2 ), forming a surface glaze layer; then inkjet printing a pattern on the surface of the surface glaze layer to form a pattern layer; then using a swing-type spray glaze booth to spray the fully polished glaze obtained in step (2) onto the surface of the pattern layer, with a spray glaze amount of 480g / m 2 This forms a polished glaze layer.

[0065] (4) After drying the ceramic bricks obtained in step (3), they are fired in a kiln to obtain the glazed bricks of this embodiment. The firing temperature regime is as follows: first, the temperature is raised to 1160℃ at a rate of 15℃ / min and held for 15min; then, the temperature is raised to 1220℃ at a rate of 5℃ / min and held for 8min; finally, the bricks are removed from the kiln and cooled.

[0066] Comparative Example 1

[0067] The difference between Comparative Example 1 and Example 1 lies in the different chemical composition and raw material components of the fully polished glaze. The chemical composition of the fully polished glaze in Comparative Example 1 is a high-silicon, low-aluminum system.

[0068] The fully polished glaze of Comparative Example 1 has the following chemical composition by weight percentage: SiO2 69.5%, Al2O3 12.5%, CaO 4%, MgO 1.6%, K2O 3.5%, Na2O 1.6%, B2O3 1.2%, ZnO 0.5%, BaO 1.5%, and loss on ignition 4.1%.

[0069] The raw material components of the fully polished glaze in Comparative Example 1, by weight, include: 15 parts of high-silicon and high-boron frit, 15 parts of fully polished glaze frit, 7 parts of industrial waste, 24 parts of potassium feldspar, 34 parts of quartz, 7 parts of dolomite, and 8 parts of kaolin.

[0070] Comparative Example 2

[0071] The difference between Comparative Example 2 and Example 1 lies in the different chemical composition and raw material components of the fully polished glaze. The raw material components of the fully polished glaze in Comparative Example 2 do not contain high-silicon and high-boron frit.

[0072] The chemical composition of the fully polished glaze of Comparative Example 2, by weight percentage, includes: SiO2 59.2%, Al2O3 22%, CaO 4.4%, MgO 1.9%, K2O 3.1%, Na2O 1.5%, ZnO 0.9%, BaO 2.7%, and loss on ignition of 4.3%.

[0073] The raw material components of the fully polished glaze in Comparative Example 2, by weight, include: 25 parts of fully polished glaze frit, 14 parts of industrial waste, 18 parts of potassium feldspar, 25 parts of quartz, 7 parts of dolomite, 5 parts of corundum, and 8 parts of kaolin.

[0074] Comparative Example 3

[0075] The difference between Comparative Example 3 and Example 1 lies in the different chemical composition and raw material components of the fully polished glaze. Comparative Example 3 uses a traditional low-temperature transparent frit instead of the high-silicon and high-boron frit of Example 1.

[0076] The chemical composition of the low-temperature transparent ingot, by weight percentage, includes: SiO2 62.5%, Al2O3 8.5%, CaO 14.5%, MgO 4%, K2O 3.5%, Na2O 1.5%, ZnO 1%, BaO 4.5%.

[0077] The fully polished glaze of Comparative Example 3 has the following chemical composition by weight percentage: 60% SiO2, 20% Al2O3, 6.8% CaO, 2.0% MgO, 3.0% K2O, 1.1% Na2O, 0.7% ZnO, 2.4% BaO, and a loss on ignition of 4.0%.

[0078] The raw material components of the fully polished glaze in Comparative Example 3, by weight, include: 18 parts of low-temperature transparent frit, 15 parts of fully polished glaze frit, 14 parts of industrial waste, 18 parts of potassium feldspar, 25 parts of quartz, 7 parts of dolomite, 5 parts of corundum, and 8 parts of kaolin.

[0079] Comparative Example 4

[0080] The difference between Comparative Example 4 and Example 1 lies in the different chemical composition and raw material components of the fully polished glaze. Comparative Example 4 uses calcined kaolin instead of industrial waste material from Example 1.

[0081] The chemical composition of the fully polished glaze of Comparative Example 4, by weight percentage, includes: SiO2 61.3%, Al2O3 20%, CaO 4.6%, MgO 1.4%, K2O 3.3%, Na2O 1.8%, B2O3 1.5%, ZnO 0.5%, BaO 1.6%, and loss on ignition of 4.0%.

[0082] The raw material components of the fully polished glaze in Comparative Example 4, by weight, include: 18 parts of high-silicon and high-boron frit, 15 parts of fully polished glaze frit, 14 parts of calcined kaolin, 18 parts of potassium feldspar, 25 parts of quartz, 7 parts of dolomite, 5 parts of corundum, and 8 parts of kaolin.

[0083] Comparative Example 5

[0084] The difference between Comparative Example 5 and Example 1 lies in the different preparation methods of the fully polished glaze. Comparative Example 5 adopts a one-step heating and firing process. The firing temperature regime is as follows: the temperature is increased to 1180°C at a rate of 12°C / min, held for 30 minutes, and then removed from the kiln for cooling.

[0085] Performance testing

[0086] The glazed tile samples prepared in Examples 1-3 and Comparative Examples 1-5 were tested for Mohs hardness, abrasion resistance, gloss before polishing, and stain resistance, and the glaze quality of the samples was observed. Specifically: gloss was tested using a gloss meter before and after polishing; abrasion resistance was tested according to GB / T3810.7-2016 "Determination of Abrasion Resistance of Glazed Ceramic Tiles," with the highest grade being 5 (15,000 revolutions), followed by 4 (12,000 revolutions), 4 (6,000 revolutions), 4 (2,100 revolutions), 3 (1,500 revolutions), and so on; stain resistance was tested according to GB / T3810.14-2016 "Test Methods for Ceramic Tiles Part 14: Determination of Stain Resistance," with stain resistance divided into grades 1-5, where grade 1 indicates the worst stain resistance and grade 5 indicates the best stain resistance; Mohs hardness was tested according to Appendix A of JC / T908-2013 "Mohs Hardness Test Method."

[0087] The test results are shown in Table 1.

[0088] Table 1:

[0089]

[0090] As shown in Table 1, the polished glazed tile samples prepared in Examples 1-3 all have high hardness, wear resistance and stain resistance, achieving a hardness of 7-7.5, a wear resistance of 4 at 12,000 revolutions, and a stain resistance of 5. Moreover, the gloss of the glaze before polishing is 16-20°, and the sintering performance of the fully polished glaze is good.

[0091] Compared to Example 1, Comparative Example 1, due to the use of a high-silicon, low-alumina chemical composition in the fully polished glaze, resulted in fewer mullite microcrystals precipitated in the glaze layer, thus leading to a certain degree of decrease in both hardness and wear resistance.

[0092] Compared to Example 1, Comparative Examples 2 and 4, respectively, did not contain high-silicon and high-boron frit in their raw material composition and used calcined kaolin instead of industrial waste material in Example 1. As a result, the sintering temperature of the glaze was higher, which meant that under the same firing temperature regime, the glaze could not be completely sintered. Consequently, the anti-fouling performance of the glaze surface was greatly reduced, and the hardness and wear resistance also decreased.

[0093] Compared to Example 1, Comparative Example 3 uses a traditional low-temperature transparent frit instead of the high-silicon and high-boron frit in Example 1 in the raw material composition of the fully polished glaze. As a result, a three-dimensional network structure cannot be formed in the glaze layer, leading to a significant decrease in the hardness and wear resistance of the glaze surface.

[0094] Compared to Example 1, Comparative Example 5, due to the use of a one-step firing process, resulted in incomplete precipitation of mullite crystals in the glaze layer, leading to a decrease in the hardness and wear resistance of the glaze surface.

[0095] For those skilled in the art, several simple deductions or substitutions can be made without departing from the inventive concept, without requiring creative effort. Therefore, any simple improvements made to this invention by those skilled in the art based on the disclosure of this invention should be within the scope of protection of this invention. The above embodiments are preferred embodiments of this invention, and all processes similar to this invention and equivalent changes should fall within the scope of protection of this invention.

Claims

1. A fully polished glazed porcelain, characterized in that, The chemical composition of the fully polished glaze, by weight percentage, includes: SiO2 60-68%, Al2O3 15-25%, CaO 4-6%, MgO 1-2%, K2O 2.5-5%, Na2O 1-3%, B2O3 1-2%, ZnO 0.5-1%, BaO 1-3%, and loss on ignition 4-6%. The raw material components of the fully polished glaze, by weight, include: 10-20 parts of high-silicon and high-boron frit, 12-18 parts of fully polished glaze frit, 5-20 parts of industrial tailings, 15-25 parts of potassium feldspar, 20-40 parts of quartz, 5-15 parts of dolomite, 2-10 parts of corundum, and 5-10 parts of kaolin. The chemical composition of the industrial waste material contains 52-55 wt% SiO2 and 42-46 wt% Al2O3. The chemical composition of the high-silicon, high-boron ingot, by weight percentage, includes: SiO2 65-70%, Al2O3 5-8%, CaO 1-3%, MgO 0-1%, K2O 4-6%, Na2O 4-6%, B2O3 8-10%; The chemical composition of the fully polished glazed frit, by weight percentage, includes: SiO2 50-53%, Al2O3 16-20%, CaO 8-10%, MgO 1-2%, K2O 1-3%, Na2O 1-3%, BaO 10-12%.

2. The fully polished glazed porcelain according to claim 1, characterized in that, The chemical composition of the industrial waste also contains at least one of CaO, MgO, K2O, and Na2O.

3. A method for preparing a fully polished glazed porcelain as described in any one of claims 1-2, characterized in that, Includes the following steps: The raw materials for preparing the fully polished glaze are wet-ground to obtain the fully polished glaze.

4. The method for preparing fully polished glazed porcelain according to claim 3, characterized in that, The grinding fineness of the fully polished glaze is such that the residue on a 325-mesh sieve is 0.4-0.6 wt%; and / or, the specific gravity of the fully polished glaze is 1.45-1.48 g / cm³. 3 .

5. A type of glazed tile, characterized in that, From bottom to top, it includes a body, a surface glaze layer, a pattern layer, and a polished glaze layer, wherein the polished glaze layer is formed by firing a fully polished glaze as described in any one of claims 1-2.

6. A method for preparing glazed tiles as described in claim 5, characterized in that, Includes the following steps: The surface glaze, inkjet-printed pattern, and fully polished glaze are applied sequentially to the upper surface of the body to form a surface glaze layer, a pattern layer, and a polished glaze layer. After drying, the body is fired in a kiln to obtain the polished glazed brick.

7. The method for preparing glazed tiles according to claim 6, characterized in that, The glazing method for the fully polished glaze is oscillating spraying, and the spraying amount is 460-480g / m². 2 ; And / or, the firing temperature regime is as follows: first, the temperature is raised to 1150-1160℃ at a rate of 10-15℃ / min and held for 15-20min; then, the temperature is raised to 1180-1220℃ at a rate of 5-8℃ / min and held for 5-10min; finally, the material is removed from the kiln and cooled.

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