Reaction chamber and plasma processing equipment

Abstract

The invention relates to the technical field of wafer processing, in particular to a reaction chamber and plasma processing equipment, which comprises a quartz tube, an induction coil, a Faraday shield cage, a state monitoring device, a rotation driving device and a control unit, and is characterized in that the quartz tube is arranged at the top of a processing chamber; the induction coil is arranged around the outer side of the quartz tube; the Faraday shielding cage is provided with a slit, and the orthographic projection of the slit on the circumferential wall of the quartz tube forms an erosion area; the state monitoring device is used for monitoring the erosion area; the driving end of the rotary driving device is connected with the quartz tube or the Faraday shielding cage; the control unit is in communication connection with the state monitoring device and the rotary driving device; according to the invention, through real-time monitoring and an active regulation and control mechanism, the problem of concentrated erosion of plasma to the quartz tube in a high-hydrogen process is effectively solved.

Description

Technical Field

[0001] This invention relates to the field of wafer processing technology, and more particularly to a reaction chamber and plasma processing equipment. Background Technology

[0002] In ICP-type plasma resist stripping or etching equipment used in high-hydrogen processes, although the high-frequency electromagnetic field generated by the coil can effectively excite the plasma, the unavoidable capacitive coupling between the coil and the gas in the reaction chamber causes the plasma (especially hydrogen plasma) to bombard the inner wall of the quartz dielectric window, i.e., the quartz tube, resulting in erosion. Although setting a Faraday shield between the coil and the quartz tube can alleviate this problem to some extent, the open area corresponding to the slit of the quartz tube inner wall and the Faraday shield, as well as the intersection of this open area and the coil, will still be subject to concentrated bombardment by hydrogen ions. After long-term use, this will still lead to erosion of the quartz tube and the shedding of particulate matter, which will then contaminate the wafer, affecting the lifespan of the equipment and the process yield. Summary of the Invention

[0003] This invention relates to a reaction chamber and plasma processing equipment, with the aim of extending the service life of quartz tubes and improving the stability and wafer yield of plasma processes.

[0004] To achieve the above objectives, the present invention provides a reaction chamber, comprising: Quartz tubes are located at the top of the processing chamber; An induction coil is arranged around the outside of the quartz tube and connected to an external radio frequency power supply. It is used to generate an alternating magnetic field that can enter the quartz tube and induce an eddy current electric field through the alternating magnetic field to accelerate the collision of free electrons with the process gas to generate plasma. A Faraday shielding cage is arranged in a ring between the quartz tube and the induction coil. The Faraday shielding cage has several slits that penetrate its sidewalls and extend axially to allow the alternating magnetic field to enter the quartz tube through the slits. The orthogonal projection of the slits on the circumferential wall of the quartz tube forms an erosion zone. A condition monitoring device is used to monitor the erosion zone in order to obtain monitoring signals characterizing the erosion state of the quartz tube; A rotary drive device is located at the top of the processing chamber, and its drive end is connected to the quartz tube or the Faraday shielding cage to drive the quartz tube and the Faraday shielding cage to generate relative rotational motion. The control unit is communicatively connected to the status monitoring device and the rotation drive device. The control unit determines the erosion status of the quartz tube based on the monitoring signal, and when the erosion reaches a preset threshold, it controls the rotation drive device to drive the quartz tube or the Faraday shielding cage to rotate, so as to adjust the circumferential position of the eroded area on the quartz tube.

[0005] Optionally, the status monitoring device includes a signal transmitter and a signal receiver both disposed outside the Faraday shield cage, and the signal receiver is located on the emission optical path after the detection beam emitted by the signal transmitter passes through the slit and the quartz tube; The rotary drive device is connected to the quartz tube. When the control unit determines that the erosion has reached a preset threshold, it controls the rotary drive device to drive the quartz tube to rotate, so as to adjust the circumferential position of the eroded area on the quartz tube.

[0006] Optionally, the rotary drive device includes a magnetohydrodynamic (MHD) sealed drive shaft and a first motor. The MHD sealed drive shaft is located between the quartz tube and the processing chamber and is used to connect the quartz tube and the processing chamber. The drive end of the first motor is connected to the quartz tube.

[0007] Optionally, the status monitoring device includes a signal transmitter and a signal receiver both located outside the Faraday shield cage, and the signal receiver is located on the reflected light path of the detection beam emitted by the signal transmitter passing through the slit, being reflected by the quartz tube, and exiting the slit. The rotary drive device is connected to the Faraday shield cage. When the control unit determines that the erosion has reached a preset threshold, it controls the rotary drive device to drive the Faraday shield cage to rotate, so as to adjust the circumferential position of the erosion zone on the quartz tube.

[0008] Optionally, the rotary drive device includes a bearing, a first gear, a second gear, and a second motor. The bearing is located between the Faraday shield cage and the processing chamber and is used to connect the Faraday shield cage and the processing chamber. The first gear is fixedly sleeved outside the Faraday shield cage. The second motor is located at the top of the processing chamber. The second gear is connected to the drive end of the second motor and meshes with the first gear.

[0009] Optionally, the Faraday shielding cage is provided with a connector, which is connected to the signal transmitter and the signal receiver so as to rotate the signal transmitter and the signal receiver synchronously when the Faraday shielding cage rotates.

[0010] Optionally, the connector is further provided with a first rotating member and a second rotating member, which are respectively connected to the signal transmitter and the signal receiver to drive the signal transmitter and the signal receiver to rotate, thereby adjusting the emission angle of the beam emitted by the signal transmitter and the reception angle of the beam received by the signal receiver.

[0011] Optionally, the reaction chamber further includes a drive unit located on the top of the processing chamber, with its drive end connected to the induction coil. The control unit is connected to the drive unit. When the control unit determines that the erosion has reached a preset threshold, it controls the drive unit to drive the induction coil to move axially, thereby adjusting the axial position of the eroded area on the quartz tube.

[0012] Optionally, the status monitoring device includes a plurality of signal transmitters and signal receivers, wherein the signal transmitters include a first group and a second group; The first group is equipped with multiple signal transmitters evenly distributed along the circumference and whose detection beams are aligned with different slits, so as to simultaneously monitor the erosion areas corresponding to multiple slits located at different circumferential positions; The second group is provided with multiple signal transmitters distributed along the axial direction and whose detection beams are aligned with different axial segments of the same slit, for simultaneously monitoring erosion zones corresponding to different axial positions within the same slit. The signal receivers are provided with multiple receivers and are located on the emission optical path after the detection beam emitted by the signal transmitter passes through the slit and the quartz tube, or on the reflection optical path after the detection beam emitted by the signal transmitter enters the slit and exits the slit after being reflected by the quartz tube.

[0013] To achieve the above objectives, the present invention also provides a plasma processing apparatus, comprising: The aforementioned reaction chamber; A process gas supply system, connected to a quartz tube, supplies process gas, including hydrogen-containing gas, into the quartz tube. A vacuum system, connected to the quartz tube, is used to extract gas from the quartz tube and maintain the required vacuum level in the quartz tube; The radio frequency power supply is electrically connected to the first coil.

[0014] The beneficial effects of this invention are as follows: This invention effectively solves the problem of concentrated plasma erosion of quartz tubes in high-hydrogen processes through a real-time monitoring and active control mechanism. Specifically, the condition monitoring device monitors the erosion zone formed on the quartz tube by the Faraday cage slits in real time, acquiring signals characterizing the degree of erosion. When the control unit determines that the erosion has reached a preset threshold, it drives a rotating device to rotate the quartz tube relative to the Faraday cage, changing the circumferential position of the erosion zone and thus dispersing the locally accumulated erosion to different areas, preventing premature perforation or particulate contamination of the quartz tube. This significantly extends the lifespan of the quartz tube, improves the stability of the plasma process and wafer yield, and is particularly suitable for harsh process environments such as those containing hydrogen gas. Attached Figure Description

[0015] Figure 1This is a schematic diagram of the structure of the plasma processing device according to an embodiment of the present invention; Figure 2 This is a schematic diagram of the structure of the quartz tube, Faraday shielding cage, signal transmitter, and signal receiver in the reaction chamber of an embodiment of the present invention. Figure 1 ; Figure 3 This is a schematic diagram of the structure of the quartz tube, Faraday shielding cage, signal transmitter, and signal receiver in the reaction chamber of an embodiment of the present invention. Figure 2 .

[0016] Explanation of reference numerals in the attached figures: 1. Quartz tube; 2. Processing chamber; 3. Induction coil; 4. Faraday shield; 5. Slit; 6. Signal transmitter; 7. Signal receiver; 8. Rotary drive unit; 9. Drive unit. Detailed Implementation

[0017] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but do not exclude other elements or objects.

[0018] To address the problems existing in the prior art, embodiments of the present invention provide a reaction chamber, such as... Figure 1 As shown, the reaction chamber includes a quartz tube 1, an induction coil 3, a Faraday shield 4, a status monitoring device, and a control unit.

[0019] In one embodiment, such as Figure 1 As shown, the quartz tube 1 is located at the top of the processing chamber 2.

[0020] In one embodiment, such as Figure 1 As shown, the induction coil 3 is arranged around the outside of the quartz tube 1 and connected to an external radio frequency power supply. It is used to generate an alternating magnetic field that can enter the quartz tube 1 and induce an eddy current electric field through the alternating magnetic field to accelerate the free electron collision with the process gas to generate plasma.

[0021] In one embodiment, such as Figure 1 and Figure 2As shown, the Faraday shielding cage 4 is arranged in a ring between the quartz tube 1 and the induction coil 3. The Faraday shielding cage 4 has a plurality of slits 41 that penetrate its sidewalls and extend axially to allow the alternating magnetic field to enter the quartz tube 1 through the slits 41. The orthographic projection of the slits 41 on the circumferential wall of the quartz tube 1 forms an erosion zone.

[0022] In one embodiment, the status monitoring device is used to monitor the erosion zone to obtain a monitoring signal characterizing the erosion state of the quartz tube 1; the rotation drive device 7 is located at the top of the processing chamber 2, and its drive end is connected to the quartz tube 1 or the Faraday shielding cage 4 to generate relative rotational motion between the quartz tube 1 and the Faraday shielding cage 4; the control unit is communicatively connected to the status monitoring device and the rotation drive device 7, and the control unit determines the erosion state of the quartz tube 1 based on the monitoring signal, and when the erosion reaches a preset threshold, controls the rotation drive device 7 to drive the quartz tube 1 or the Faraday shielding cage 4 to rotate, so as to adjust the circumferential position of the erosion zone on the quartz tube 1.

[0023] This embodiment constructs a closed-loop active control system that can monitor the corrosion status of the quartz tube 1 in real time and dynamically adjust the position of the corrosion zone, thereby significantly extending the service life of the quartz tube 1 and improving process stability. Specifically, the status monitoring device monitors the corrosion zone formed on the quartz tube 1 by the slit 41 of the Faraday shield 4 in real time, acquiring signals characterizing the degree of corrosion. When the control unit determines that the corrosion has reached a preset threshold, it immediately drives the rotation drive device 7 to rotate the quartz tube 1 relative to the Faraday shield 4, changing the projection position of the slit 41 on the circumference of the quartz tube 1, thus changing the position of the corrosion zone and dispersing the locally accumulated corrosion risk to different areas. This "monitoring, judgment, and adjustment" mechanism avoids excessive corrosion or perforation of a single area due to continuous plasma bombardment, reducing the risk of particulate contamination and lowering the replacement frequency of the quartz tube 1, making it particularly suitable for harsh process environments such as high-hydrogen processes.

[0024] In one embodiment, the control unit can be an embedded system integrating a microprocessor and signal conditioning circuit. It acquires the analog monitoring signal output by the status monitoring device in real time via an ADC module and determines whether the local erosion of the quartz tube 1 has reached a preset threshold based on a preset erosion algorithm. When the erosion exceeds the threshold, the control unit sends a pulse command to the rotation drive device 7 via a communication interface, driving the quartz tube 1 or the Faraday shielding cage 4 to rotate by a specific angle (e.g., 15° to 30°), thereby dynamically shifting the position of the eroded area. Of course, in other embodiments, the rotation angle of the quartz tube 1 or the Faraday shielding cage 4 can be adjusted according to actual needs, which will not be elaborated here.

[0025] In one embodiment, such as Figure 2 As shown, the status monitoring device includes a signal transmitter 5 and a signal receiver 6, both located outside the Faraday shield 4. The signal receiver 6 is located on the emission optical path after the detection beam emitted by the signal transmitter 5 passes through the slit 41 and the quartz tube 1. The rotation drive device 7 is connected to the quartz tube 1. When the control unit determines that the erosion has reached a preset threshold, it controls the rotation drive device 7 to drive the quartz tube 1 to rotate, so as to adjust the circumferential position of the eroded area on the quartz tube 1.

[0026] This embodiment constructs a non-contact real-time monitoring and active control mechanism based on the principle of transmission. By placing the signal transmitter 5 and the signal receiver 6 outside the Faraday shield 4, and allowing the detection beam (forming the transmission light path) to pass directly through the slit 41, one side wall of the quartz tube 1, the inner cavity of the quartz tube 1, the other side wall of the quartz tube 1, and another slit 41 in sequence before being detected by the signal receiver 6, the signal intensity attenuation signal caused by local erosion of the quartz tube 1 is accurately captured, achieving quantitative perception of the erosion state. When the control unit determines that the erosion has reached the threshold, it drives the quartz tube 1 to rotate (without disabling the Faraday shield 4), changing the position of the erosion area formed by the orthogonal projection of the slit 41 on the circumference of the quartz tube 1, so that the subsequent plasma bombardment is transferred to the uneroded area on the quartz tube 1. Choosing to drive the quartz tube 1 to rotate can avoid the misalignment of the transmission light path due to the relative movement of components, and can significantly extend the life of the quartz tube 1 by dispersing the risk of erosion, which is especially suitable for harsh environments such as high-hydrogen processes.

[0027] In one embodiment, the signal transmitter 5 and the signal receiver 6 are respectively an infrared laser diode and a matched photodetector. The signal transmitter 5 uses a stable light source with a wavelength in the near-infrared band (e.g., 1550nm), and its beam, after collimation, penetrates the slit 41 of the Faraday shield 4 and the wall of the quartz tube 1. The signal receiver 6 is a high-sensitivity InGaAs photodetector used to accurately detect the attenuation of the transmitted light intensity. This attenuation is negatively correlated with the wall thickness reduction of the quartz tube 1 caused by plasma bombardment. This configuration, based on the transmission method monitoring principle, can non-contactly and with high precision quantify the degree of local erosion in real time, providing a reliable basis for judgment for the control unit, thereby triggering the rotation mechanism before erosion intensifies.

[0028] Of course, in other embodiments, the structure of the signal transmitter 5 and the signal receiver 6 is not limited to infrared laser diode and matched photodetector, respectively.

[0029] In one embodiment, the rotary drive device 7 includes a magnetohydrodynamic (MHD) sealed drive shaft and a first motor. The MHD sealed drive shaft is located between the quartz tube 1 and the processing chamber 2 and is used to connect the quartz tube 1 and the processing chamber 2. The drive end of the first motor is connected to the quartz tube 1. This embodiment achieves reliable isolation between the rotary drive of the quartz tube 1 and the ultra-high vacuum environment of the processing chamber 2 through the MHD sealed drive shaft. While transmitting the torque of the first motor to drive the quartz tube 1 to rotate, the MHD sealed structure can effectively maintain the vacuum seal of the processing chamber 2, avoiding the wear and particle contamination risks of traditional mechanical seals. The first motor (such as a stepper motor or servo motor) can systematically transfer the circumferential projection position of the slit 41 of the Faraday shield 4 on the quartz tube 1 by precisely controlling the rotation angle of the quartz tube 1 (such as 15°-30°), so that the plasma erosion area is evenly distributed on the quartz tube 1, thereby significantly extending the service life of the quartz tube 1 and ensuring process stability.

[0030] In one embodiment, such as Figure 3 As shown, the status monitoring device includes a signal transmitter 5 and a signal receiver 6 located outside the Faraday shield cage 4. Specifically, the signal transmitter 5 and the signal receiver 6 are located on the same side outside the Faraday shield cage 4, and the signal receiver 6 is located on the path of the detection beam emitted by the signal transmitter 5 passing through the slit 41 and being reflected by the quartz tube 1 before exiting the reflected light path of the slit 41. The rotation drive device 7 is connected to the Faraday shield cage 4. When the control unit determines that the erosion has reached a preset threshold, it controls the rotation drive device 7 to drive the Faraday shield cage 4 to rotate, so as to adjust the circumferential position of the eroded area on the quartz tube 1.

[0031] This embodiment constructs a compact monitoring and control scheme based on the principle of reflection. By arranging the signal transmitter 5 and the signal receiver 6 on the same side outside the Faraday shield 4, and utilizing the reflection path of the detection beam through the inner wall of the quartz tube 1 (reflection method), changes in surface morphology or reflectivity caused by erosion can be effectively detected, resulting in a more compact structural layout. When using the reflection method, if the quartz tube 1 is rotated, the optical path will become inaccurate due to the change in the position of the reflecting surface. However, rotating the Faraday shield 4 keeps the relative position of the slit 41 and the monitoring beam fixed, ensuring the stability of the reflected optical path. At the same time, by changing the circumferential relative position of the slit 41 and the quartz tube 1, the erosion zone can be transferred, which not only ensures the reliability of monitoring but also extends the life of the quartz tube 1 by dispersing the erosion effect.

[0032] In one embodiment, the rotary drive device 7 includes a bearing, a first gear, a second gear, and a second motor. The bearing is located between the Faraday shield cage 4 and the processing chamber 2 and serves to connect the two. The first gear is fixedly sleeved on the outside of the Faraday shield cage 4. The second motor is located on the top of the processing chamber 2, and the second gear is connected to the drive end of the second motor and meshes with the first gear. This embodiment achieves precise and controllable rotation of the Faraday shield cage 4 through gear transmission and bearing support structure. The bearing supports the Faraday shield cage 4 while ensuring its smooth rotation relative to the processing chamber 2. The second motor transmits torque to the Faraday shield cage 4 through the meshing first gear (driven gear) and second gear (driving gear), driving it to rotate by a specific angle (e.g., 15°-30°), thereby changing the relative circumferential position of the slit 41 and the quartz tube 1. The gear transmission scheme has a stable structure and high control precision. Furthermore, by driving the Faraday shield cage 4 to rotate (instead of the quartz tube 1), it can avoid the signal inaccuracy problem caused by changes in the optical path in the reflection method monitoring, thus ensuring the reliability of the transfer of the erosion zone.

[0033] In one embodiment, the Faraday shield 4 is equipped with a connector that connects to the signal transmitter 5 and the signal receiver 6, so that the signal transmitter 5 and the signal receiver 6 rotate synchronously when the Faraday shield 4 rotates. The connector secures the signal transmitter 5, the signal receiver 6, and the Faraday shield 4 as a whole, ensuring that the detection optical path and the slit 41 remain precisely aligned during synchronous rotation. When the control unit drives the Faraday shield 4 to rotate to transfer the erosion zone, this structure avoids optical path offset or signal interruption caused by relative movement of components in reflection-based monitoring, ensuring the continuity and reliability of real-time erosion status monitoring. This integrated design simplifies the complexity of optical path calibration and, by dynamically maintaining the correspondence between the slit 41 and the monitoring point, ensures that erosion judgment always targets the currently active plasma bombardment area, thereby improving control accuracy and system stability.

[0034] In one embodiment, the connector can be a ring-shaped bracket or connecting rod, made of a high-temperature resistant, low-outgassing material (such as anodized aluminum or specific ceramics). One end is fixed to the outer wall or top of the Faraday shielding cage 4 by screws or clips, and the other end is fixed to the signal transmitter 5 and the signal receiver 6 by an insulating mounting base, ensuring that the optical path axes of the two maintain a preset angle (such as 15°-30° required by the reflection method) with the center line of the slit 41. This design achieves mechanical connection of the three components while avoiding interference with plasma uniformity through material and structural optimization, and ensures that the relative geometric relationship between the detection optical path and the slit 41 remains constant during rotation.

[0035] In one embodiment, the connector is further provided with a first rotating component and a second rotating component. The first rotating component and the second rotating component are respectively connected to the signal transmitter 5 and the signal receiver 6 to drive the signal transmitter 5 and the signal receiver 6 to rotate, thereby adjusting the emission angle of the beam emitted by the signal transmitter 5 and the reception angle of the beam received by the signal receiver 6. This embodiment achieves independent adjustment of the emission and reception angles of the beam by the signal transmitter 5 and the signal receiver 6 through the first rotating component and the second rotating component. In the reflection method monitoring, by adjusting the rotation of the two components by a certain angle, the incident point and reflected light path of the beam in the erosion area of ​​the quartz tube 1 can be accurately calibrated, ensuring that the signal receiver 6 can capture the strongest reflected signal, significantly improving the monitoring sensitivity and signal-to-noise ratio. This design not only facilitates initial installation and debugging, but also compensates for minor optical path offsets caused by mechanical vibration or thermal deformation during long-term operation, ensuring the accuracy and reliability of erosion status monitoring, thereby providing a stable data basis for the threshold judgment of the control unit.

[0036] In one embodiment, the first and second rotating components can be universal joints or precision rotating brackets with locking functions. They can achieve angular adjustment of the signal transmitter 5 and the signal receiver 6 in at least two degrees of freedom through threaded sleeves or hinge mechanisms, and can be fixed in their final positions by locking screws. This structure allows for independent fine-tuning of the incident angle and reflection angle of the beam during assembly or maintenance, ensuring that the light spot accurately covers the erosion area and the reflected light is efficiently captured by the receiver in the reflection method monitoring, thereby optimizing the signal strength and reducing stray light interference.

[0037] In other embodiments, the connector includes a support base, a first support rod, a second support rod, and a push-pull part. The support base is fixedly connected to the Faraday cage. The first and second support rods are hinged to the support base. The free ends of the first and second support rods are connected to the signal transmitter and the signal receiver respectively through the first and second rotating parts. The push-pull part is located on the support base. The push-pull part moves closer to or further away from the support base to push the first and second support rods to rotate around the support base, thereby causing the signal transmitter and the signal receiver to rotate synchronously in opposite directions or towards each other, thereby adjusting the emission angle of the beam emitted by the signal transmitter 5 and the reception angle of the beam received by the signal receiver 6.

[0038] In one embodiment, the push-pull part includes a push-pull plate, an adjusting screw, and two push-pull rods. The adjusting screw is rotatably mounted on the push-pull plate and threaded into the support base. Both push-pull rods are hinged to the push-pull plate, and their free ends are respectively hinged to the first support rod and the second support rod. By turning the adjusting screw, the push-pull plate is moved closer to or away from the support base. This causes the first support rod and the second support rod to rotate around the support base, moving away from or closer to it. Consequently, the signal transmitter and the signal receiver rotate synchronously in opposite directions.

[0039] In one embodiment, such as Figure 1 As shown, the reaction chamber also includes a drive unit 8, which is located on the top of the processing chamber 2 and its drive end is connected to the induction coil 3. The control unit is connected to the drive unit 8. When the control unit determines that the erosion has reached a preset threshold, it controls the drive unit 8 to drive the induction coil 3 to move axially, thereby adjusting the axial position of the eroded area on the quartz tube 1. This embodiment achieves active control of the axial position of the eroded area on the quartz tube 1 through the drive unit 8, forming a two-dimensional erosion management strategy that coordinates circumferential and axial directions. When the control unit determines that local erosion has reached a threshold based on monitoring signals, it can either drive the quartz tube 1 or the Faraday cage 4 to rotate to disperse circumferential erosion, or control the drive unit 8 to drive the induction coil 3 to move axially along the quartz tube 1. This changes the relative axial position of the plasma-dense area and the quartz tube 1, thereby transferring the erosion risk to the axially uneroded area of ​​the quartz tube 1. This two-dimensional control mechanism can make fuller use of the surface area of ​​the quartz tube 1, delay the risk of local perforation to the maximum extent, significantly improve component life and process stability, and is especially suitable for harsh process environments with high power and long-term operation.

[0040] In one embodiment, the drive unit 8 can be a servo electric cylinder or a linear motor. Its cylinder body or stator is fixed to the top of the processing chamber 2 or the rotary drive device 7 via a bracket, and the piston rod or mover is rigidly connected to the support frame of the induction coil 3. The control unit precisely controls the stroke and speed of the drive unit 8 via pulse signals, driving the induction coil 3 to move axially along the quartz tube 1 (e.g., within ±10mm), thereby changing the axial relative position of the plasma energy concentration area and the quartz tube 1. The servo electric cylinder or linear motor offers higher positioning accuracy (up to the micrometer level) and controllability, enabling precise adjustment of the axial position of the erosion zone, avoiding stability issues caused by air pressure fluctuations, and ensuring the reliability of two-dimensional erosion management.

[0041] In one embodiment, the status monitoring device includes a plurality of signal transmitters 5 and signal receivers 6. The signal transmitters 5 are divided into a first group and a second group. The first group has a plurality of signal transmitters 5 evenly distributed circumferentially with their detection beams aligned with different slits 41, for simultaneously monitoring multiple erosion zones corresponding to the slits 41 located at different circumferential positions. The second group has a plurality of signal transmitters 5 distributed axially with their detection beams aligned with different axial segments of the same slit 41, for simultaneously monitoring erosion zones corresponding to different axial positions within the same slit 41. The signal receivers 6 are provided in multiple locations on the emission optical path after the detection beam emitted by the signal transmitters 5 passes through the slit and the quartz tube, or on the reflection optical path after the detection beam emitted by the signal transmitters enters the slit and exits the slit after being reflected by the quartz tube. This embodiment achieves high-resolution, multi-dimensional real-time monitoring of the erosion status of the quartz tube 1 through the spatial distribution of multiple groups of signal transmitters 5 and signal receivers 6. The first set of signal transmitters 5 is evenly distributed circumferentially, enabling simultaneous monitoring of the erosion degree of multiple erosion zones corresponding to the slits 41 at different circumferential positions, thus identifying circumferential non-uniformity. The second set of signal transmitters 5 is distributed axially along the slits 41 to simultaneously monitor erosion zones corresponding to different axial positions within the same slit 41. This arrangement not only comprehensively covers the key erosion areas of the quartz tube 1, avoiding monitoring blind spots, but also provides the control unit with abundant spatial erosion data, enabling it to more accurately determine the erosion state and formulate optimal rotation or axial movement strategies. This achieves refined management of the erosion area and maximizes the lifespan of the quartz tube 1.

[0042] To address the problems existing in the prior art, embodiments of the present invention also provide a plasma processing apparatus, including the aforementioned reaction chamber, process gas supply system, vacuum system, and radio frequency power supply. The process gas supply system is connected to a quartz tube 1 to supply process gas, including hydrogen-containing gas, into the quartz tube 1; the vacuum system is connected to the quartz tube 1 to extract gas from the quartz tube 1 and maintain the required vacuum level in the quartz tube 1; the radio frequency power supply is electrically connected to a first coil. This embodiment integrates the reaction chamber of the present invention with a complete plasma processing system, constructing a complete equipment solution optimized for demanding processes such as high-hydrogen processes. The process gas supply system provides hydrogen-containing gas to the quartz tube 1, which interacts with the inductively coupled plasma excited by the radio frequency power supply. The unique erosion monitoring and control mechanism of this invention can effectively cope with the stronger erosion effect of hydrogen-containing plasma on the quartz tube 1. By monitoring in real time and actively adjusting the position of the erosion zone, the service life of the core consumable (quartz tube 1) is significantly extended, and the process interruption and particulate contamination caused by the failure of quartz tube 1 are reduced. Thus, while ensuring process performance (such as etching or deposition rate), the overall operational reliability and production economic benefits of the equipment are greatly improved.

[0043] In one embodiment, the plasma processing equipment can be a chemical vapor deposition equipment, a plasma etching equipment, or a plasma resist removal equipment. By configuring the appropriate process gas and using a radio frequency power supply to excite inductively coupled plasma, combined with the real-time monitoring and active control function of the present invention for the erosion of the quartz tube 1, the erosion of the quartz tube 1 by hydrogen-containing / high-energy plasma can be effectively mitigated during deposition, etching, or resist removal, significantly improving process stability and equipment uptime. It is especially suitable for applications in semiconductor manufacturing that have stringent requirements for cleanliness and long-term continuous operation.

[0044] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the present invention. Furthermore, the present invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A reaction chamber, characterized by, The application relates to a quartz tube, an induction coil, a Faraday shield cage, a state monitoring device, a rotary driving device and a control unit. The quartz tube is arranged at the top of a processing chamber. The induction coil is arranged outside the quartz tube and is connected with an external radio frequency power source, and is used for generating an alternating magnetic field which can enter the quartz tube and inducing an eddy current field through the alternating magnetic field to accelerate free electrons to hit process gas to generate plasma. The Faraday shield cage is arranged between the quartz tube and the induction coil, and a plurality of slits are arranged on the Faraday shield cage and extend along the axial direction to allow the alternating magnetic field to enter the quartz tube through the slits. The state monitoring device is used for monitoring the erosion area to obtain a monitoring signal representing the erosion state of the quartz tube. The rotary driving device is arranged at the top of the processing chamber, and a driving end of the rotary driving device is connected with the quartz tube or the Faraday shield cage to drive the quartz tube and the Faraday shield cage to generate relative rotary motion. The control unit is in communication connection with the state monitoring device and the rotary driving device.

2. The reaction chamber of claim 1, wherein, When the erosion reaches a preset threshold, the control unit controls the rotary driving device to drive the quartz tube or the Faraday shield cage to rotate to adjust the circumferential position of the erosion area on the quartz tube. The state monitoring device comprises a signal transmitter and a signal receiver which are both arranged outside the Faraday shield cage, and the signal receiver is located on a light path of a detection light beam emitted by the signal transmitter and passing through the slits and the quartz tube.

3. The reaction chamber of claim 2, wherein, The rotary driving device is connected with the quartz tube.

4. The reaction chamber of claim 1, wherein, When the erosion reaches a preset threshold, the control unit controls the rotary driving device to drive the quartz tube to rotate to adjust the circumferential position of the erosion area on the quartz tube. The rotary driving device comprises a magnetic fluid sealing transmission shaft and a first motor.

5. The reaction chamber of claim 4, wherein, The state monitoring device comprises a signal transmitter and a signal receiver which are both arranged outside the Faraday shield cage, and the signal receiver is located on a light path of a detection light beam emitted by the signal transmitter, passing through the slits and being reflected by the quartz tube and then passing out of the slits. The rotary driving device is connected with the Faraday shield cage. When the erosion reaches a preset threshold, the control unit controls the rotary driving device to drive the Faraday shield cage to rotate to adjust the circumferential position of the erosion area on the quartz tube. The rotary driving device comprises a bearing, a first gear, a second gear and a second motor. The bearing is arranged between the Faraday shield cage and the processing chamber and is used for connecting the Faraday shield cage and the processing chamber. The first gear is fixedly sleeved outside the Faraday shield cage. The second motor is arranged at the top of the processing chamber. The second gear is connected with a driving end of the second motor and is in meshing connection with the first gear.

6. The reaction chamber of claim 4, wherein, The Faraday shield cage is provided with a connecting piece, which is connected with the signal transmitter and the signal receiver to rotate synchronously with the signal transmitter and the signal receiver when the Faraday shield cage rotates.

7. The reaction chamber of claim 6, wherein, The connecting piece is further provided with a first rotating piece and a second rotating piece, which are respectively connected with the signal transmitter and the signal receiver to drive the signal transmitter and the signal receiver to rotate respectively, so as to adjust the emission angle of the light beam emitted by the signal transmitter and the receiving angle of the light beam received by the signal receiver.

8. The reaction chamber of claim 1, wherein, The reaction chamber further comprises a driving part provided on the top of the processing chamber, and the driving end of the driving part is connected with the induction coil, and the control unit is connected with the driving part, and when it is determined that the erosion reaches the preset threshold, the control unit controls the driving part to drive the induction coil to move along the axial direction, so as to adjust the axial position of the erosion area on the quartz tube.

9. The reaction chamber of claim 1, wherein, The state monitoring device comprises a plurality of signal transmitters and signal receivers, the signal transmitters comprise a first group and a second group; The first group is provided with a plurality of signal transmitters which are uniformly distributed along the circumference and detect light beams aligned with different slits, so as to simultaneously monitor a plurality of erosion areas corresponding to the slits located at different circumferential positions; The second group is provided with a plurality of signal transmitters which are distributed along the axis and detect light beams aligned with different axial segments of the same slit, so as to simultaneously monitor a plurality of erosion areas corresponding to different axial positions in the same slit, and the signal receivers are provided with a plurality of signal receivers located on the transmission light path of the detection light beams emitted by the signal transmitters after passing through the slit and the quartz tube, or located on the reflection light path of the detection light beams emitted by the signal transmitters after penetrating into the slit and being reflected by the quartz tube.

10. A plasma processing apparatus, characterized by, Comprise: The reaction chamber of any one of claims 1 to 9; A process gas supply system in communication with the quartz tube for providing process gas into the quartz tube, the process gas comprising hydrogen-containing gas; A vacuum system in communication with the quartz tube for extracting gas in the quartz tube and maintaining the required vacuum degree of the quartz tube; An RF power supply electrically connected with the first coil.

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