Multi-structure makeup nanoimprint mold and manufacturing method thereof

Abstract

The invention provides a multi-structure makeup nanoimprint mold and a manufacturing method thereof, and the mold comprises a bearing substrate which is provided with positioning grooves arranged according to a preset array; the imprinting template is arranged in the positioning groove, and a preset micro-nano structure is formed on the imprinting template; the fixing system is arranged on the bearing substrate and is used for fixing the imprinting templates in the corresponding positioning grooves one by one; and the film layer covers each imprint template. According to the invention, rapid and accurate integration of various different grating structures can be realized, thermal mismatch stress caused by temperature change is reduced, the dimensional stability of a micro-nano structure in an ultraviolet curing or hot stamping process is ensured, meanwhile, the condition that the whole mold is scrapped due to small damage is avoided, and the cost of the whole life cycle of the mold is greatly reduced.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to a multi-structure panelized nanoimprint mold and its manufacturing method. Background Technology

[0002] Nanoimprint lithography, a key technology in the field of micro / nano fabrication, has demonstrated enormous application potential in cutting-edge areas such as AR / VR diffractive waveguides, microlens arrays, and metasurface optical components due to its advantages of high resolution, high throughput, and low cost. In particular, these applications often require the integration of multiple micro / nano structures with different functions or parameters, such as input gratings, transition gratings, and output gratings, onto a limited substrate area (e.g., a 10mm × 10mm optical waveguide chip). This high degree of integration demands extremely high levels of innovation in the fabrication process of micro / nano structures, requiring not only precise control over the morphology of various micro / nano structures but also seamless splicing and collaborative operation of different functional structures at the micrometer scale.

[0003] Currently, to achieve the above-mentioned multi-structure integration, the main approach is to use multiple independent imprinting and alignment techniques. This involves using multiple independent master molds and performing multiple nanoimprinting processes on the same substrate in stages. Each imprinting process requires high-precision pattern alignment using precision equipment.

[0004] However, the multi-stage independent imprinting process is cumbersome, requiring extremely high alignment precision for each imprint. This not only significantly lengthens the production cycle but also results in low cumulative yield due to the multiple processes, making it difficult to meet the efficiency and cost requirements of large-scale production. Furthermore, while the integrated master plate solution can achieve one-time imprinting, its manufacturing cost is extremely high and the cycle is lengthy (often several months). Once the master plate is manufactured, its structure is permanently fixed. Any minor design change or testing of different structural combinations means that the entire master plate needs to be remade, leading to huge upfront R&D costs and extremely high iteration risks, severely hindering technological innovation. In addition, both the integrated master plate and the working molds it replicates suffer from system fragility and a significant "weakest link" effect. That is, during use, if any part of the mold is damaged, contaminated, or worn, even if most other areas remain intact, the entire high-value mold must be scrapped, resulting in enormous resource waste and economic losses. Summary of the Invention

[0005] This invention provides a multi-structured nanoimprinting mold and its manufacturing method, which solves the defects of existing technologies that require multiple independent imprinting and alignment, resulting in high cost of integral master molds and fragile and easily scrapped mold systems. It enables rapid and precise integration of various different grating structures, reduces thermal mismatch stress caused by temperature changes, ensures the dimensional stability of micro-nano structures during UV curing or hot imprinting, and avoids the scrapping of the entire mold due to minor damage, thus significantly reducing the mold's total life cycle cost.

[0006] This invention provides a multi-structured nanoimprinting mold, comprising: a carrier substrate having positioning grooves arranged in a preset array on the carrier substrate; an imprinting template disposed in the positioning grooves, on which a preset micro / nano structure is formed; a fixing system disposed on the carrier substrate for fixing each imprinting template into its corresponding positioning groove; and a thin film layer covering each imprinting template.

[0007] According to the present invention, a multi-structured nanoimprinting mold is provided, the fixing system including a vacuum adsorption system, the vacuum adsorption system including: gas microchannels, which are opened at the bottom of each positioning groove and are connected to the cavity inside the corresponding positioning groove; a main gas path, which connects the gas microchannels connecting each positioning groove; a vacuum interface, which is opened on the side of the supporting substrate and connected to the main gas path; and a vacuum pump, which is connected to the vacuum interface, for generating negative pressure at the bottom of each positioning groove through the main gas path and the gas microchannels to adsorb and fix the imprinting template in each positioning groove.

[0008] According to the present invention, the thickness of the imprinting template is equal to the depth of the corresponding positioning groove, so that when the imprinting template is embedded in the positioning groove, the surface of the imprinting template is flush with the surface of the supporting substrate.

[0009] According to the present invention, a multi-structure imprinting nano-imprinting mold is provided, wherein the fixing system includes a micromechanical spring clip, which is disposed on the inner sidewall of the positioning groove so that after the imprinting template is embedded in the positioning groove, it undergoes elastic deformation and applies a lateral clamping force to the imprinting template to fix the imprinting template in the corresponding positioning groove.

[0010] According to the present invention, a multi-structured nanoimprinting mold is provided, wherein the thickness of the imprinting template is less than the depth of the corresponding positioning groove; a vacuum pump adsorbs and fixes the imprinting template in each positioning groove to control the surface of each imprinting template to be flush with the surface of the supporting substrate.

[0011] According to the present invention, a multi-structured nanoimprinting mold is provided, wherein the imprinting template is made of at least one of quartz glass, monocrystalline silicon, optical resin, and stainless steel; the material of the supporting substrate is matched with the coefficient of thermal expansion of the imprinting template, and the material of the supporting substrate is at least one of quartz glass, Invar, monocrystalline silicon, and optical resin; the material of the thin film layer is a thin film solution material diluted with UV-curable adhesive and diluent at a predetermined mass fraction, and the diluent is at least one of propylene glycol methyl ether acetate (PGMEA), tripropylene glycol diacrylate (TPGDA), and dipentaerythritol hexaacrylate (DPHA).

[0012] This invention also provides a method for manufacturing a multi-structure panelized nanoimprint mold, applicable to any of the multi-structure panelized nanoimprint molds described above. The method includes: providing a support substrate, on which positioning grooves are formed in a preset array; providing multiple imprint templates and embedding each imprint template into a corresponding positioning groove; using a fixing system to fix each imprint template into a corresponding positioning groove; using a coating process to coat the surface of each fixed imprint template with a liquid thin film material, and curing the liquid thin film material coated on the surface of each imprint template to form a thin film layer covering each imprint template.

[0013] According to a method for manufacturing a multi-structured nanoimprinting mold provided by the present invention, a liquid thin film material is coated onto the surface of each imprinting template after it has been fixed using a coating process, and the liquid thin film material coated on the surface of each imprinting template is cured to form a thin film layer covering each imprinting template. The method includes: delivering a preset thin film solution to a nozzle using a dispensing pump; driving a piezoelectric transducer in the nozzle to generate high-frequency vibration, using the high-frequency vibration to tear the preset thin film solution delivered to the nozzle into uniform droplets at the micron level; introducing inert gas into the nozzle through a side air inlet, using the airflow formed by the inert gas to guide the droplets vertically downward to the surface of the imprinting template to form an atomized deposition layer on the surface of the imprinting template; and curing the atomized deposition layer to form a thin film layer covering each imprinting template.

[0014] According to the present invention, a method for manufacturing a multi-structured nanoimprint mold is provided, which utilizes a coating process to coat the surface of each fixed imprint template with a liquid thin film material, and then cures the liquid thin film material coated on the surface of each imprint template to form a thin film layer covering each imprint template. The method further includes: controlling the movement path of the nozzle so that the nozzle performs scanning spraying in the area directly above each imprint template; when the nozzle moves to the interval area between each imprint template or the edge area of ​​the supporting substrate, controlling the dispensing pump to stop delivering liquid UV-curable adhesive and turning off atomization to stop spraying; the spraying flow rate of the nozzle is 100-200 μl / min, the nozzle moving speed is 15-25 mm / s, and the spraying spacing is 0.5-2 mm.

[0015] According to a method for manufacturing a multi-structured nanoimprinting mold provided by the present invention, after forming a thin film layer covering each imprinting template, the method includes: providing an imprinting film to cover the thin film layer on all imprinting templates; controlling the application of a target pressure to make the imprinting mold contact the thin film layer and fill the preset micro / nano structures on the corresponding imprinting template; irradiating the imprinting film with ultraviolet light to cure the thin film layer; and peeling off an imprinting soft film to transfer the cured thin film layer from each imprinting template to the imprinting soft film, so as to form a complete panel structure containing the micro / nano structures of all imprinting templates on the imprinting soft film.

[0016] The multi-structure nanoimprint dies and their manufacturing method provided by this invention achieve modular assembly of multiple imprint dies with different micro / nano structures by creating positioning grooves arranged in a preset array on a carrier substrate. This overcomes the bottlenecks of difficult overall manufacturing of a single large-size die and the difficulty in integrating different functional structures. It enables the simultaneous replication of multiple micro / nano structures in a single imprinting process, greatly improving the manufacturing efficiency of complex optoelectronic devices. Furthermore, a fixing system is used to fix the imprint dies one by one into the corresponding positioning grooves, achieving rapid and precise integration of multiple different grating structures. This ensures that the upper surfaces of all imprint dies are on the same horizontal plane, guaranteeing uniform stress in each area during subsequent imprinting and avoiding inconsistent imprinting depth or pattern defects caused by splicing errors. Moreover, the imprint dies... The detachable connection to the substrate reduces thermal mismatch stress caused by temperature changes, ensuring the dimensional stability of micro / nano structures during UV curing or hot embossing. Furthermore, when a localized area of ​​the micro / nano structure is damaged or requires a design change, it eliminates the need to scrap the entire expensive large-scale mold; only the corresponding embossing template needs to be replaced. This avoids the situation where the entire mold is scrapped due to minor damage, significantly reducing the mold's lifecycle cost. The thin film layer covers each embossing template, effectively filling the tiny gaps between them, eliminating the step effect at the joints, and making the embossing surface a continuous plane. This protects the delicate micro / nano structures from physical damage and prevents the risk of embossing adhesive seeping into the back of the template, ensuring the integrity and surface smoothness of the transferred pattern. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in this invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0018] Figure 1 This is one of the structural schematic diagrams of the multi-structure panelized nanoimprint mold provided by the present invention; Figure 2This is the second structural schematic diagram of the multi-structure panelized nanoimprint mold provided by the present invention; Figure 3 This is one of the flowcharts illustrating the manufacturing method of the multi-structure panelized nanoimprint mold provided by the present invention; Figure 4 This is the second flowchart illustrating the manufacturing method of the multi-structure panelized nanoimprint mold provided by the present invention.

[0019] Figure label: 1: Supporting substrate; 2: Positioning groove; 3: Imprint template; 4: Fixing system; 41: Gas microchannel; 42: Main gas path; 43: Vacuum interface; 5: Thin film layer. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0021] Figures 1-2 This is a schematic diagram of the structure of the multi-structure panelized nanoimprinting mold provided by the present invention, as shown below. Figures 1-2 As shown, the mold includes the following: The carrier substrate 1 has positioning grooves 2 arranged in a preset array on it; An imprinting template 3 is set in the positioning groove 2, and a preset micro-nano structure is formed on the imprinting template 3; The fixing system 4 is set on the carrier substrate 1 and is used to fix each imprinting template 3 into the corresponding positioning groove 2. Thin film layer 5 covers each imprinting template 3.

[0022] It should be added that the imprinting template can be prepared by dividing and combining the imprinting patterns of different chips. For example, if the preset array of the positioning slot is determined to be two rows and three columns, the corresponding imprinting template is prepared for the imprinting pattern corresponding to each row and column. This way, when the mold is actually assembled, the corresponding imprinting template can be selected and embedded into the corresponding positioning slot according to the actual imprinting pattern required. The preset array can be designed according to the actual chip layout requirements, and no further limitations are made here.

[0023] Furthermore, the material selection for the imprinting template can be based on thermal stability, mechanical strength, and optical properties, choosing materials that can withstand pressure and temperature changes during the nanoimprinting process. Specifically, the selection can be made according to actual design requirements.

[0024] In one alternative embodiment, the material of the imprinting template includes at least one of quartz glass, monocrystalline silicon, optical resin, and stainless steel.

[0025] In addition, the pre-set micro-nano structures on the imprint template are used to select and prepare gratings with specific periods, duty cycles and depths according to the optical performance required by the design, and then etch them onto the imprint template corresponding to the imprint pattern.

[0026] In addition, after preparing multiple imprinting templates corresponding to the imprinting patterns of each chip, the prepared imprinting templates carrying different structures are classified, numbered and stored so that the corresponding imprinting templates can be selected for assembly according to the actual imprinting requirements.

[0027] It is worth noting that the thickness of the imprinting template is less than or equal to the thickness of the carrier substrate. The thickness of the imprinting template and the carrier substrate can be selected according to actual design requirements. For example, the thickness of the carrier substrate can be 5mm, and the thickness of the imprinting template can be 0.5mm or 1mm, etc. No further limitation is made here.

[0028] Specifically, refer to Figure 2 The fixing system includes a vacuum adsorption system, which includes: a gas microchannel 41, which is opened at the bottom of each positioning groove 2 and communicates with the cavity inside the corresponding positioning groove 2; a main gas path 42, which connects the gas microchannels 41 that communicate with each positioning groove 2; a vacuum interface 43, which is opened on the side of the support substrate 1 and communicates with the main gas path 42; and a vacuum pump, which is communicated with the vacuum interface, and is used to generate negative pressure at the bottom of each positioning groove through the main gas path and the gas microchannels to adsorb and fix the imprint template in each positioning groove. This provides uniform force through vacuum adsorption, avoids mechanical stress, and helps to ensure the flatness of the overall plane of the support substrate and the imprint template.

[0029] It should be noted that the entire mold is bounded by a support substrate, and within it, identical positioning slots are arranged in a preset array. Each positioning slot is separated by a clear, unstructured interval area. Thus, during actual assembly, the corresponding imprinting template is embedded by the positioning slots arranged in the preset array. The mold can be quickly assembled using reconfigurable imprinting templates, achieving high-density, multi-heterogeneous structure spatial layout capability, reducing costs, and improving mold flexibility.

[0030] Furthermore, the thickness of the imprinting template is equal to the depth of the corresponding positioning groove, so that when the imprinting template is embedded in the positioning groove, the imprinting template is fixed at the bottom of the positioning groove by a vacuum pump, so that the surface of the imprinting template is flush with the surface of the substrate.

[0031] In one alternative embodiment, the material of the carrier substrate matches the coefficient of thermal expansion of the imprinting template. That is, when the carrier substrate material is hot-pressed or the temperature changes, the rate and magnitude of its thermal expansion and contraction are basically consistent with the imprinting template material, so as to ensure that the overall deformation is consistent during hot pressing or temperature fluctuations.

[0032] Furthermore, the material of the substrate includes at least one of quartz glass, Invar, monocrystalline silicon wafer, and optical resin.

[0033] In other alternative embodiments, the fixing system includes a micromechanical spring clip disposed on the inner sidewall of the positioning groove, so as to undergo elastic deformation after the imprinting template is embedded in the positioning groove, thereby applying a lateral clamping force to the imprinting template to fix the imprinting template in the corresponding positioning groove.

[0034] It should be added that, when using micromechanical spring clips to fix the imprinting template in the positioning groove, the thickness of the imprinting template can be less than or equal to the groove depth of the corresponding positioning groove. When the thickness of the imprinting template is equal to the groove depth of the corresponding positioning groove, the surface of the imprinting template can be flush with the surface of the carrier substrate. When the thickness of the imprinting template is less than the groove depth of the corresponding positioning groove, in order to ensure that the surface of the imprinting template is flush with the surface of the carrier substrate, the above-mentioned vacuum adsorption system can also be used to adsorb and fix the imprinting template in each positioning groove by vacuum pump, so as to control the surface of each imprinting template to be flush with the surface of the carrier substrate. The specific vacuum adsorption system can be referred to above, and will not be repeated here.

[0035] In one optional embodiment, the material of the film layer includes a film solution material diluted with a UV-curable adhesive and a diluent at a predetermined mass fraction. The diluent includes at least one of propylene glycol methyl ether acetate (PGMEA), tripropylene glycol diacrylate (TPGDA), and dipentaerythritol hexaacrylate (DPHA).

[0036] In summary, this invention overcomes the bottlenecks of difficult overall manufacturing of a single large-size mold and the inability to integrate different functional structures by creating positioning grooves arranged in a preset array on the carrier substrate. This allows for the modular assembly of multiple imprinting templates with different micro / nano structures, enabling simultaneous replication of multiple micro / nano structures in a single imprinting process. This significantly improves the manufacturing efficiency of complex optoelectronic devices. Furthermore, the fixing system secures each imprinting template to its corresponding positioning groove, achieving rapid and precise integration of various grating structures. This ensures that the upper surfaces of all imprinting templates are on the same horizontal plane, guaranteeing uniform stress distribution in subsequent imprinting processes and avoiding inconsistent imprinting depths or pattern defects caused by splicing errors. Additionally, the imprinting templates and the carrier substrate... Detachable connections reduce thermal mismatch stress caused by temperature changes, ensuring the dimensional stability of micro / nano structures during UV curing or hot embossing. Furthermore, when a localized area of ​​the micro / nano structure is damaged or requires a design change, it eliminates the need to scrap the entire expensive large-size mold; only the corresponding embossing template needs to be replaced. This avoids the situation where the entire mold is scrapped due to minor damage, significantly reducing the mold's lifecycle cost. A thin film layer covers each embossing template, effectively filling the tiny gaps between them, eliminating the step effect at the joints, and making the embossing surface a continuous plane. This protects the delicate micro / nano structures from physical damage and prevents the risk of embossing adhesive seeping into the back of the template, ensuring the integrity and surface smoothness of the transferred pattern.

[0037] The following describes the manufacturing method of the multi-structure imprinting nano-imprinting mold provided by the present invention. The manufacturing method of the multi-structure imprinting nano-imprinting mold described below can be referred to in correspondence with the multi-structure imprinting nano-imprinting mold described above.

[0038] Figure 3 This is a flowchart illustrating the manufacturing method of the multi-structure imprinting nano-imprinting mold provided by the present invention. Applied to any of the multi-structure imprinting nano-imprinting molds described above, the method includes the following: S31, a carrier substrate is provided, on which positioning grooves are formed in a preset array; S32 provides multiple imprinting templates and embeds each imprinting template into its corresponding positioning slot; S33, using a fixing system, each imprint template is fixed in its corresponding positioning groove; S34. Using a coating process, a liquid film material is coated on the surface of each fixed imprinting template, and the liquid film material coated on the surface of each imprinting template is cured to form a film layer covering each imprinting template.

[0039] It should be noted that the step number "S3N" in this instruction manual does not represent the order of the fabrication methods for the multi-structure imprinting nano-imprinting mold. The following details will explain further. Figure 4This invention describes a method for manufacturing a multi-structured nanoimprinting mold.

[0040] Step S31: Provide a carrier substrate, on which positioning grooves are formed in a preset array.

[0041] In this embodiment, a carrier substrate is provided, including: providing a carrier substrate; forming positioning grooves arranged in a preset array on the carrier substrate. It should be noted that the positioning grooves can be obtained by fine grinding and polishing, or by etching processes, etc., and are not further limited here.

[0042] Step S32: Provide multiple imprint templates and embed each imprint template into its corresponding positioning groove.

[0043] Specifically, before providing multiple imprinting templates, the process includes: providing a template substrate; forming micro / nano structures on the template substrate; cutting or dicing the template substrate with the micro / nano structures to obtain multiple imprinting templates; or, providing a template substrate; cutting or dicing the template substrate to obtain multiple templates; forming micro / nano structures on each template to obtain a corresponding imprinting template.

[0044] It should be added that when cutting or dicing the template substrate, a high-precision dicing machine or laser cutter can be used to cut the template substrate into multiple templates of preset sizes, and the dimensional tolerance should be controlled within ±5μm to ensure the flatness of subsequent assembly and to achieve standardized mass production of imprinting templates, thereby reducing costs. The size of each template can be set according to actual design requirements or prior experience, and no further limitations are made here. In addition, the thickness of the template substrate is less than or equal to that of the supporting substrate.

[0045] Furthermore, forming micro-nano structures on the template substrate, or forming micro-nano structures on each template, includes: etching the preset micro-nano structures onto the template substrate or template by electron beam lithography (EBL) combined with reactive ion etching (RIE) process.

[0046] It should be added that the preset micro-nano structure is used to select and prepare gratings with specific periods, duty cycles and depths according to the optical performance required by the design, and then etch them onto the imprinting template of the corresponding imprinting pattern.

[0047] Furthermore, after obtaining the embossing template, the process includes: classifying, numbering, and storing the prepared embossing templates that carry different structures, so that the corresponding embossing template can be selected for imposition according to the actual embossing requirements.

[0048] In one optional embodiment, before providing multiple imprinting templates and embedding each imprinting template into its corresponding positioning groove, the process includes: cleaning the positioning grooves of the carrier substrate and the selected small templates to remove organic matter and particulate contamination, so as to facilitate the subsequent embedding of the corresponding imprinting templates into their corresponding positioning grooves according to a pre-designed grating layout, achieving preliminary positioning of the imprinting templates; and after embedding the imprinting templates into their corresponding positioning grooves, fixing the imprinting templates in the positioning grooves using a fixing system. It should be noted that the cleaning process can be achieved using lint-free cloths and plasma cleaners, and is not further limited here.

[0049] Step S33: Using the fixing system, each imprint template is fixed into its corresponding positioning groove.

[0050] Specifically, the fixing system includes a vacuum adsorption system, which comprises a gas microchannel, a main gas path, a vacuum interface, and a vacuum pump. Accordingly, the fixing system is used to fix each imprinting template individually into its corresponding positioning slot. This includes activating the vacuum pump to generate negative pressure at the bottom of each positioning slot through the vacuum interface, main gas path, and gas microchannel, thereby adsorbing and fixing the imprinting template within each slot. This vacuum adsorption provides uniform force, avoids mechanical stress, and helps ensure the flatness of the overall plane of the supporting substrate and the imprinting template.

[0051] In addition, the fixing system includes micromechanical spring clips. Accordingly, the fixing system is used to fix each imprinting template into its corresponding positioning groove. It also includes: after the imprinting template is embedded in the positioning groove, the micromechanical spring clips undergo elastic deformation to apply a lateral clamping force to the imprinting template, thereby fixing the imprinting template in the corresponding positioning groove.

[0052] In an optional embodiment, after fixing each imprinting template into its corresponding positioning groove using a fixing system, the process includes: using a dial indicator or a laser flatness measuring instrument to inspect the assembly area to ensure that the height difference along the thickness z-direction is less than a preset height threshold; wherein the assembly area is used to characterize the positioning groove area that bears the imprinting template and is essentially used for embedding the imprinting template.

[0053] It should be added that the preset height threshold can be set according to actual design requirements and prior experience, such as 1μm, etc., without further limitation here. In addition, after inspecting the assembly area, including: when it is determined that the height difference along the thickness z-direction is less than the preset height threshold, the structure and position of each template are quickly checked by a microscopic system to see if they are correct. Based on the correctness, a multi-structure panelization nanoimprint mold customized for a specific application is obtained, so that the template can be quickly assembled in a short time. The whole process can be completed within 10 minutes.

[0054] Step S34: Using a coating process, a liquid film material is coated on the surface of each fixed imprinting template, and the liquid film material coated on the surface of each imprinting template is cured to form a film layer covering each imprinting template.

[0055] In this embodiment, a coating process is used to coat the surface of each fixed imprinting template with a liquid film material, and the liquid film material coated on the surface of each imprinting template is cured to form a film layer covering each imprinting template. The process includes: delivering a preset film solution to the nozzle through a dispensing pump; driving a piezoelectric transducer in the nozzle to generate high-frequency vibration, using the high-frequency vibration to tear the preset film solution delivered to the nozzle into micron-sized uniform droplets; introducing inert gas into the nozzle through a side air inlet, using the airflow formed by the inert gas to guide the droplets vertically downward to the surface of the imprinting template to form an atomized deposition layer on the surface of the imprinting template; and curing the atomized deposition layer to form a film layer covering each imprinting template.

[0056] It should be noted that the preset film solution can be a liquid UV-curable adhesive, which can be obtained by diluting the UV-curable adhesive with a preset diluent at a preset mass fraction. Through the above-mentioned non-contact atomization deposition, an ultra-thin and uniform coating of the adhesive layer can be achieved without damaging the prefabricated microstructure.

[0057] In a preferred embodiment, the adhesive is pre-diluted with propylene glycol methyl ether acetate (PGMEA) thinner at a 20% mass fraction to achieve better leveling and suitable viscosity. This, combined with innovative ultrasonic spraying for localized adhesive application and modular mold flatness control, effectively eliminates the adhesive overflow problem that is difficult to avoid in small-unit panelization using traditional application methods, ensuring the structural integrity and transfer consistency of each independent functional unit. Furthermore, the inert gas can be selected based on actual design requirements and prior experience; for example, nitrogen can be used, and no further limitations are made here.

[0058] In addition, a liquid film material is coated onto the surface of each imprinting template after it is fixed using a coating process, and the liquid film material coated on the surface of each imprinting template is cured to form a film layer covering each imprinting template. The process also includes: controlling the movement path of the nozzle so that the nozzle scans and sprays in the area directly above each imprinting template; when the nozzle moves to the interval area between each imprinting template or the edge area of ​​the substrate, the dispensing pump is controlled to stop delivering liquid UV curing adhesive and the atomization is turned off to stop the spraying.

[0059] In one optional embodiment, the spray flow rate of the nozzle is 100-200 μl / min, the moving speed of the nozzle is 15-25 mm / s, and the spray spacing is 0.5-2 mm.

[0060] Furthermore, the spray flow rate of the nozzle is 150 μl / min, the moving speed of the nozzle is 20 mm / s, and the spray spacing is 1.5 mm.

[0061] It should be added that the atomized deposition layer is cured to form a thin film layer covering each imprint template, including: placing the coated substrate on a hot plate at a target temperature and heating for a preset time, so that the atomized deposition layer is leveled to form a thin film layer with a thickness of 1μm and a uniformity error within ±5%, and allowing the diluent in the thin film layer to fully evaporate.

[0062] Furthermore, the target temperature and preset duration can be set according to the actual required film thickness. For example, in order to make the atomized deposition layer level and form a film layer with a thickness of 1μm and a uniformity error within ±5%, the target temperature can be 80℃ and the preset duration can be 1 minute. At the same time, it can also allow the PGMEA diluent to fully evaporate and avoid the generation of bubbles in the subsequent imprinting. No further limitations are made here.

[0063] In one optional embodiment, after forming the thin film layer covering each imprinting template, the method includes: providing an imprinting film to cover the thin film layer on all imprinting templates; controlling the application of a target pressure to make the imprinting template contact the thin film layer and fill the preset micro / nano structure on the corresponding imprinting template; irradiating the imprinting film with ultraviolet light to cure the thin film layer; and peeling off the imprinting film to transfer the cured thin film layer from each imprinting template to the imprinting film, so as to form a complete panel structure containing the micro / nano structure of all imprinting templates on the imprinting film.

[0064] It should be added that the target pressure can be configured according to the actual imprinting requirements and prior experience, such as 0.1-0.5 MPa, so that the imprinting film and the adhesive layer can fully contact and fill all the micro-nano structures. By irradiating the imprinting film with ultraviolet light, the adhesive can be cured, thereby completely and oncely replicating the pattern structure on the mold on the imprinting film after peeling.

[0065] Furthermore, refer to Figure 4This invention provides an imprinting film that covers the thin film layers on all imprinting templates. The process includes: providing an imprinting film and an imprinting platform; the imprinting film being stretched taut on a film frame; the imprinting platform having vacuum adsorption holes; placing a carrier substrate on the imprinting platform and fixing the carrier substrate and each imprinting template with negative pressure generated by the vacuum adsorption holes; controlling the imprinting platform to rise or the film frame to fall, so that the imprinting film covers and adheres to the surface of each imprinting template with the formed thin film layers; and then applying a target pressure. This facilitates the replication of the micro-nano structures of all imprinting templates on the mold onto a large-area imprinting film through a single imprinting action, enabling efficient mass production. The imprinting mold becomes a fully functional, modular working film. When loaded into a mass-production nanoimprinting device, it can efficiently transfer these complex multi-structure patterns onto a large number of product substrates (such as PMMA or glass waveguide sheets) repeatedly, like stamping, achieving large-scale production.

[0066] In summary, the embodiments of the present invention provide a carrier substrate with positioning grooves arranged in a preset array to achieve modular assembly of multiple imprinting templates with different micro / nano structures. This overcomes the bottlenecks of difficult overall manufacturing of a single large-size mold and the difficulty in integrating different functional structures. It can simultaneously replicate multiple micro / nano structures in a single imprinting process, greatly improving the manufacturing efficiency of complex optoelectronic devices. Furthermore, by using a fixing system to fix the imprinting templates one by one into the corresponding positioning grooves, it achieves rapid and precise integration of multiple different grating structures, ensuring that the upper surfaces of all imprinting templates are on the same horizontal plane. This guarantees uniform stress in each area during subsequent imprinting, avoiding inconsistent imprinting depth or pattern defects caused by splicing errors. Moreover, the imprinting templates and the carrier substrate... The detachable connection reduces thermal mismatch stress caused by temperature changes, ensuring the dimensional stability of micro-nano structures during UV curing or hot embossing. It also eliminates the need to scrap the entire expensive large-size mold when a localized area of ​​the micro-nano structure is damaged or requires a design change; only the corresponding embossing template needs to be replaced. This avoids the situation where the entire mold is scrapped due to minor damage, significantly reducing the mold's lifecycle cost. Furthermore, the thin film layer covers each embossing template, effectively filling the tiny gaps between them, eliminating the step effect at the joints, and making the embossing surface a continuous plane. This protects the delicate micro-nano structures from physical damage and prevents the risk of embossing adhesive seeping into the back of the template, ensuring the integrity and surface smoothness of the transferred pattern.

[0067] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A multi-structured nanoimprinting mold, characterized in that, include: A carrier substrate, wherein positioning grooves are arranged in a preset array on the carrier substrate; An imprinting template is disposed within the positioning groove, and a preset micro / nano structure is formed on the imprinting template; A fixing system is provided on the carrier substrate and is used to fix each of the imprinting templates into the corresponding positioning grooves; A thin film layer covers each of the imprinting templates.

2. The multi-structure panel nanoimprinting mold according to claim 1, characterized in that, The fixation system includes a vacuum adsorption system, which comprises: Gas microchannels are formed at the bottom of each of the positioning slots and are connected to the cavity inside the corresponding positioning slot. The main gas path connects the gas microchannels that link each of the positioning slots; A vacuum interface is provided on the side of the substrate and is connected to the main air passage; A vacuum pump, connected to the vacuum interface, is used to generate negative pressure at the bottom of each positioning groove through the main gas path and the gas microchannel, so as to adsorb and fix the imprint template in each positioning groove.

3. The multi-structure panel nanoimprinting mold according to claim 2, characterized in that, The thickness of the embossing template is equal to the depth of the corresponding positioning groove, so that when the embossing template is embedded in the positioning groove, the surface of the embossing template is flush with the surface of the supporting substrate.

4. The multi-structure panel nanoimprinting mold according to claim 2, characterized in that, The fixing system includes a micromechanical spring clip, which is disposed on the inner sidewall of the positioning groove so that it undergoes elastic deformation after the imprinting template is embedded in the positioning groove, thereby applying a lateral clamping force to the imprinting template to fix the imprinting template in the corresponding positioning groove.

5. The multi-structure panel nanoimprinting mold according to claim 4, characterized in that, The thickness of the embossing template is less than the depth of the corresponding positioning groove; The vacuum pump adsorbs and fixes the embossing templates in each of the positioning grooves to control the embossing templates to be flush with the surface of the supporting base.

6. The multi-structure panel nanoimprinting mold according to claim 1, characterized in that, The material of the imprinting template includes at least one of quartz glass, monocrystalline silicon wafer, optical resin, and stainless steel. The material of the carrier substrate is matched with the coefficient of thermal expansion of the imprint template, and the material of the carrier substrate includes at least one of quartz glass, Invar, monocrystalline silicon wafer and optical resin; The material of the film layer includes a film solution material diluted with a UV-curable adhesive and a diluent at a predetermined mass fraction. The diluent includes at least one of propylene glycol methyl ether acetate (PGMEA), tripropylene glycol diacrylate (TPGDA), and dipentaerythritol hexaacrylate (DPHA).

7. A method for manufacturing a multi-structure imprinting nano-imprinting mold, applied in any one of claims 1-6, characterized in that, include: A carrier substrate is provided, on which positioning grooves are formed in a preset array; Multiple embossing templates are provided, and each embossing template is embedded into a corresponding positioning groove; Using a fixing system, each of the imprinting templates is fixed into its corresponding positioning groove; A liquid film material is coated onto the surface of each of the fixed embossing templates using a coating process, and the liquid film material coated onto the surface of each of the embossing templates is cured to form a film layer covering each of the embossing templates.

8. The method for manufacturing a multi-structured nanoimprinting mold according to claim 7, characterized in that, A liquid film material is coated onto the surface of each of the fixed imprinting templates using a coating process, and the liquid film material coated onto the surface of each of the imprinting templates is cured to form a film layer covering each of the imprinting templates, including: A pre-set thin film solution is delivered to the nozzle via a dispensing pump; The piezoelectric transducer inside the nozzle is driven to generate high-frequency vibration, which is used to tear the preset thin film solution delivered to the nozzle into uniform droplets of micron size. Inert gas is introduced into the nozzle through the side air inlet, and the airflow formed by the inert gas guides the droplets vertically downward to the surface of the embossing template to form an atomized deposition layer on the surface of the embossing template. The atomized deposition layer is cured to form a thin film layer covering each of the imprinting templates.

9. The method for manufacturing a multi-structured nanoimprinting mold according to claim 8, characterized in that, A liquid film material is coated onto the surface of each of the fixed imprinting templates using a coating process, and the liquid film material coated onto the surface of each of the imprinting templates is cured to form a film layer covering each of the imprinting templates. The method further includes: Control the movement path of the nozzle so that the nozzle scans and sprays in the area directly above each of the imprint templates; When the nozzle moves to the interval area between the imprinting templates or the edge area of ​​the carrier substrate, the dispensing pump is controlled to stop delivering the liquid UV-curable adhesive and the atomization is turned off to stop spraying. The spray flow rate of the nozzle is 100-200 μl / min, the moving speed of the nozzle is 15-25 mm / s, and the spray spacing is 0.5-2 mm.

10. The method for manufacturing a multi-structured nanoimprinting mold according to claim 7, characterized in that, After forming the thin film layer covering each of the imprinting templates, the process includes: Provides an impression film that covers the thin film layer on all impression stencils; The target pressure is controlled to make the imprinting mold contact the thin film layer and fill the preset micro-nano structure on the corresponding imprinting template; Ultraviolet light is irradiated through the imprinted film to cure the thin film layer; Peel off the imprinting film to transfer the cured film layer from each of the imprinting templates to the imprinting film, so as to form a complete panel structure containing the micro-nano structures of all the imprinting templates on the imprinting film.

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