Glass ceramic polishing solution and preparation method thereof

Abstract

The invention discloses a glass ceramic polishing solution and a preparation method thereof, and belongs to the technical field of glass surface treatment. The glass ceramic polishing solution comprises the following components in percentage by weight: 40%-55% of lanthanum cerium oxide powder, 0.3%-0.8% of an anti-settling agent, 0.1%-0.5% of a dispersing agent, 1%-3% of a pH regulator, 0.3%-1% of a wetting agent, 1%-4% of a chelating agent and the balance of water. In addition, the invention also provides a preparation method of the microcrystalline glass polishing solution, which comprises the following steps: adding the anti-settling agent into water, stirring and reacting to obtain a viscous liquid, continuously stirring, sequentially adding the dispersing agent and the wetting agent, stirring until the dispersing agent and the wetting agent are fully dissolved, continuously stirring, and adding the lanthanum cerium oxide powder until the lanthanum cerium oxide powder is completely dispersed, thereby obtaining the microcrystalline glass polishing solution. And continuously stirring and adding a pH buffer agent to obtain the glass ceramic polishing solution. According to the microcrystalline glass polishing solution provided by the invention, the polishing efficiency is remarkably improved under the cooperation of all the components.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass surface treatment, and particularly relates to a microcrystalline glass polishing liquid and a preparation method thereof. BACKGROUND

[0002] With the rapid development of consumer electronics, the demand for touch screens continues to rise. In the field of personal consumer electronics, especially smartphones, tablets, and wearable devices, the demand for touch screens is particularly significant. Multi-touch technology has become a standard configuration for touch screen design, and with the improvement of display panel and processor performance, this technology will further popularize. The high-definition touch screen market is expected to experience explosive growth, providing better visual experience and higher resolution.

[0003] Since the touch screen substrate of consumer electronics products is mainly made of glass, in order to improve the performance and service life of the touch screen, the hardness of the glass material is improved, such as Ceramic Shield (super-ceramic), which is a glass-ceramic material jointly developed by Corning and Apple, used as the screen cover of high-end iPhone models. Its structural feature is to uniformly embed nanoscale ceramic crystals (such as alumina) in the glass matrix. This collaborative design of glass and crystals makes the material have both the transparency of glass and the high strength of ceramic. Compared with traditional alumino-silicate glass, Ceramic Shield 2 has higher hardness and fracture toughness, providing industry-leading drop resistance. According to Apple, the latest generation of Ceramic Shield has twice the drop resistance of other flagship phone cover glasses. Its outstanding drop resistance has been gradually improved through multiple generations of products.

[0004] In addition, this material also has good chemical stability and scratch resistance, and can maintain performance in harsh environments. The high hardness of Ceramic Shield 2 means that its Mohs hardness is close to that of sapphire (about Mohs 9), which is significantly higher than that of traditional soda-lime glass or ordinary alumino-silicate glass, making it more resistant to scratches in daily use, but also posing a huge challenge to processing.

[0005] In summary, there is an urgent need for a polishing liquid and a preparation method to solve the problems of high surface roughness Ra value, low polishing efficiency, and high processing cost of existing polishing technology for polishing microcrystalline glass products. SUMMARY

[0006] The present application aims to overcome the above technical deficiencies and provide a microcrystalline glass polishing liquid and a preparation method thereof to solve the technical problem of low polishing efficiency in the prior art.

[0007] To achieve the above-mentioned technical objectives, the present invention provides a microcrystalline glass polishing liquid, which, by weight percentage, comprises the following components: 40%-55% lanthanum cerium oxide powder, 0.3%-0.8% anti-settling agent, 0.1%-0.5% dispersant, 1%-3% pH adjuster, 0.3%-1% wetting agent, 1%-4% chelating agent, and the balance being water.

[0008] In any embodiment, the anti-settling agent is one or more of sodium methylcellulose, sodium carboxyethylcellulose, sodium carboxymethylcellulose, and sodium carboxypropylcellulose.

[0009] In any embodiment, the dispersant is one or both of sodium hexametaphosphate and sodium polyacrylate.

[0010] In any embodiment, the pH buffer is one or more of sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate.

[0011] In any embodiment, the wetting agent is one or more of polyethylene glycol 400, polyethylene glycol 200, glycerol, and propylene glycol.

[0012] In any embodiment, the chelating agent is one or both of ethylenediaminetetraacetic acid tetrasodium and trisodium hypotriacetate.

[0013] In any embodiment, the particle size D50 of the lanthanum oxide cerium powder is 1.2~1.4 μm.

[0014] In any embodiment, the pH value of the microcrystalline glass polishing solution is 8-10.

[0015] In any embodiment, the product comprises the following components: 40%-55% lanthanum cerium oxide powder, 0.7%-0.8% anti-settling agent, 0.5% dispersant, 2%-3% pH adjuster, 1% wetting agent, 4% chelating agent, and the balance being water.

[0016] Furthermore, the present invention also proposes a method for preparing the above-mentioned microcrystalline glass polishing liquid, comprising the following steps: adding an anti-settling agent to water and stirring until a viscous liquid is formed; continuing to stir and sequentially adding a dispersant and a wetting agent and stirring until fully dissolved; continuing to stir and adding lanthanum oxide cerium powder until completely dispersed; continuing to stir and adding a pH buffer to obtain the microcrystalline glass polishing liquid.

[0017] Compared with the prior art, the beneficial effects of the present invention include: the anti-settling agent of the present invention allows the polishing liquid to stand for a long time without settling, thereby making full use of the polishing powder during the polishing process and increasing the grinding efficiency; the dispersant disperses the material to avoid agglomeration and the formation of large particles that cause scratches on the product surface and increase roughness; the addition of a wetting agent increases the hydrophilicity of the polishing powder, making the polishing powder more evenly distributed and improving the stability of the product; the chelating agent, as the main component of chemical polishing, is not prone to settling in the present invention, and does not settle or separate after standing for more than 24 hours. The microcrystalline glass polishing liquid proposed in the present invention has mechanical and chemical polishing functions, and the polishing efficiency is significantly improved by the combination of various components. Attached Figure Description

[0018] Figure 1 These are photographs of the microcrystalline glass before and after treatment with the microcrystalline glass polishing liquid in Embodiment 4 of the present invention. Detailed Implementation

[0019] The "range" disclosed in this application is defined by a lower limit and an upper limit. A given range is defined by selecting a lower limit and an upper limit, which define the boundaries of a particular range. Ranges defined in this way can include or exclude endpoints and can be arbitrarily combined; that is, any lower limit can be combined with any upper limit to form a range. For example, if ranges of 60~120 and 80~110 are listed for a specific parameter, it is also expected that ranges of 60~110 and 80~120 are also included. Furthermore, if minimum range values ​​of 1 and 2 are listed, and if maximum range values ​​of 3, 4, and 5 are listed, then the following ranges are all expected: 1~3, 1~4, 1~5, 2~3, 2~4, and 2~5. In this application, unless otherwise stated, the numerical range "a~b" represents a shortened representation of any combination of real numbers between a and b, where a and b are real numbers. For example, the numerical range "0~5" indicates that all real numbers between "0~5" have been listed in this article; "0~5" is simply a shortened representation of these numerical combinations. Furthermore, when a parameter is stated as an integer ≥2, it is equivalent to disclosing that the parameter is, for example, an integer such as 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, etc.

[0020] Unless otherwise specified, the terms "comprising" and "including" as used in this application can be open-ended or closed-ended. For example, "comprising" and "including" can mean that other components not listed may also be included, or that only the listed components may be included.

[0021] Unless otherwise specified, the term "or" is inclusive in this application. For example, the phrase "A or B" means "A, B, or both A and B". More specifically, the condition "A or B" is satisfied by any of the following conditions: A is true (or exists) and B is false (or does not exist); A is false (or does not exist) and B is true (or exists); or both A and B are true (or exist).

[0022] The characteristics of microcrystalline glass: Nanoscale ceramic crystals (such as alumina) are uniformly embedded within a glass matrix. This synergistic design of glass and crystals gives the material both the transparency of glass and the high strength of ceramics. Compared to traditional aluminosilicate glass, it has higher hardness and fracture toughness, making it difficult or inefficient to process with ordinary polishing slurries. This invention is a microcrystalline glass polishing slurry that improves anti-settling and enhances chemical action based on the above-mentioned characteristics of microcrystalline glass. Mechanical polishing, utilizing the hardness and particle size properties of the polishing powder itself, combined with the addition of chemically effective reagents such as chelating agents and pH buffers, improves the polishing effect and efficiency.

[0023] This specific embodiment provides a microcrystalline glass polishing fluid, which, by weight percentage, comprises the following components: 40%-55% lanthanum cerium oxide powder, 0.3%-0.8% anti-settling agent, 0.1%-0.5% dispersant, 1%-3% pH adjuster, 0.3%-1% wetting agent, 1%-4% chelating agent, and the balance being water; the anti-settling agent is one or more of sodium methylcellulose, sodium carboxyethylcellulose, sodium carboxymethylcellulose, and sodium carboxypropylcellulose; the dispersant is hexametamethrin. The slurry contains one or both sodium phosphate and sodium polyacrylate; the pH buffer is one or more of sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate; the wetting agent is one or more of polyethylene glycol 400, polyethylene glycol 200, glycerol, and propylene glycol; the chelating agent is one or two of tetrasodium ethylenediaminetetraacetate and trisodium hypotriacetate; the particle size D50 of the lanthanum oxide cerium powder is 1.2~1.4μm; and the pH value of the microcrystalline glass polishing solution is 8-10.

[0024] In some embodiments, the microcrystalline polishing slurry, by weight percentage, comprises 40%-55% lanthanum cerium oxide powder, 0.7%-0.8% anti-settling agent, 0.5% dispersant, 2%-3% pH adjuster, 1% wetting agent, 4% chelating agent, and the balance being water.

[0025] In some embodiments, the microcrystalline polishing slurry comprises, by weight percentage, the following components: 55% lanthanum cerium oxide powder, 0.7% sodium carboxypropyl cellulose, 0.5% sodium hexametaphosphate, 1% glycerol, 4% tetrasodium ethylenediaminetetraacetate, 3% sodium carbonate, and the balance being water.

[0026] In some embodiments, the microcrystalline polishing slurry, by weight percentage, comprises the following components: 55% lanthanum cerium oxide powder, 0.3% sodium methyl cellulose, 0.1% sodium carboxymethyl cellulose, 0.4% sodium carboxypropyl cellulose, 0.5% sodium hexametaphosphate, 1% propylene glycol, 2% tetrasodium ethylenediaminetetraacetate, 2% trisodium hypotriacetate, 1% sodium carbonate, 1.2% potassium carbonate, 0.6% sodium bicarbonate, 0.2% potassium bicarbonate, and the balance being water.

[0027] Furthermore, this specific embodiment also proposes a method for preparing the above-mentioned microcrystalline glass polishing fluid, comprising the following steps: adding an anti-settling agent to water and stirring until a viscous liquid is formed; continuing stirring and sequentially adding a dispersant and a wetting agent while stirring until fully dissolved; continuing stirring and adding lanthanum cerium oxide powder until completely dispersed; continuing stirring and adding a pH buffer to obtain the microcrystalline glass polishing fluid. To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

[0028] In this invention, the terms "some embodiments," "this embodiment," and examples are used to describe a subset of all possible embodiments. However, it is understood that "some embodiments" can be the same subset or different subsets of all possible embodiments and can be combined with each other without conflict.

[0029] If the application documents contain similar descriptions such as "first / second", the following explanation shall be added: In the following description, the terms "first / second / third" are used only to distinguish similar objects and do not represent a specific ordering of objects. It is understood that "first / second / third" may be interchanged in a specific order or sequence where permitted, so that the embodiments described herein can be implemented in an order other than that illustrated or described herein.

[0030] In this embodiment, the term "and / or" is merely a description of the relationship between related objects, indicating that there can be three relationships. For example, object A and / or object B can represent three situations: object A exists alone, object A and object B exist simultaneously, and object B exists alone.

[0031] The following describes embodiments of this application. The embodiments described below are exemplary and are only used to explain this application, and should not be construed as limiting this application. Where specific techniques or conditions are not specified in the embodiments, they are performed according to the techniques or conditions described in the literature in this field or according to the product instructions. Reagents or instruments used, unless otherwise specified, are all conventional products that can be obtained commercially.

[0032] The microcrystalline glass polishing solution proposed in the following embodiments comprises, by weight percentage: 40%-55% lanthanum cerium oxide powder, 0.3%-0.8% anti-settling agent, 0.1%-0.5% dispersant, 1%-3% pH adjuster, 0.3%-1% wetting agent, 1%-4% chelating agent, and the balance being water; the anti-settling agent is one or more of sodium methylcellulose, sodium carboxyethylcellulose, sodium carboxymethylcellulose, and sodium carboxypropylcellulose; the dispersant is hexametaphosphate. The liquid contains one or both sodium and sodium polyacrylate; the pH buffer is one or more of sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate; the wetting agent is one or more of polyethylene glycol 400, polyethylene glycol 200, glycerol, and propylene glycol; the chelating agent is one or two of tetrasodium ethylenediaminetetraacetate and trisodium hypotriacetate; the particle size D50 of the lanthanum oxide cerium powder is 1.2~1.4μm; and the pH value of the microcrystalline glass polishing solution is 8-10.

[0033] The following embodiments also provide a method for preparing the above-mentioned microcrystalline glass polishing fluid, comprising the following steps: adding an anti-settling agent to water and stirring until a viscous liquid is formed; continuing to stir and sequentially adding a dispersant and a wetting agent and stirring until fully dissolved; continuing to stir and adding lanthanum oxide and cerium oxide powder until completely dispersed; continuing to stir and adding a pH buffer to obtain the microcrystalline glass polishing fluid.

[0034] The specific components and dosages of each embodiment are shown in Table 1.

[0035] Table 1

[0036] The polishing slurry prepared in the above embodiments was subjected to performance testing. The method is as follows: pH value detection: Data is detected using a digital pH meter.

[0037] Polishing solution polishing procedure: Using a laboratory double-sided grinding machine (13B-7L), time: 30 min, pressure: 210 KG, rotation speed: upper plate 24 rpm / lower plate 35 rpm, grinding slurry diluted with water at a ratio of 1:4 (density 1.1~1.2 g / cm³). 3 ).

[0038] Roughness test: Roughness measuring instrument (TR200) ​​to confirm the surface quality of the product.

[0039] Particle size test: Baxter particle size analyzer (BT-9300) to confirm the dispersion effect of polishing slurry.

[0040] Removal amount test: Use a thousand-level thickness gauge to test the thickness difference before and after grinding to confirm the removal efficiency.

[0041] Appearance: Visually inspect (using three-wave lamps) to confirm the surface quality of the product.

[0042] Sedimentation test: 100ml test tube, to confirm the suspension effect of the polishing solution.

[0043] Tested product: Huawei Mate 70 series (Xinjing Kunlun Microcrystalline Glass) The product was processed using the microcrystalline polishing slurry of Example 1, and 10 pieces of the product were randomly selected from the 25 pieces of the product processed in Example 1. The thickness of the product before and after processing was measured and recorded using a thickness gauge to determine the amount and rate of material removed. The data results are shown in Table 2. Two points were randomly selected on each piece of the product and the roughness of the product after processing was tested using a roughness tester. The data results are shown in Table 3.

[0044] Table 2

[0045] Table 3

[0046] Using the above processing method, the products processed by the microcrystalline polishing liquid in Examples 1-10 were obtained respectively. The average removal rate and average Ra value of the products were obtained. The suspension effect was tested using test tubes (stood for 24 hours), the particle size was tested using a particle size analyzer, and the visual inspection results of the inspectors are shown in Table 4.

[0047] Table 4

[0048] Results Analysis: Analysis of the data in Table 4 shows that the microcrystalline glass polishing slurry used in this invention achieves good polishing results, excellent suspension, uniform particle size distribution, and meets the removal rate requirements. The resulting polished surface has a high gloss rate and low roughness. According to Examples 1-10, the anti-settling agent ranges from 0.3% to 0.8%. Examples 4 (0.7%) and 5 (0.8%) show similar suspension effects. Considering cost, Example 4 is the optimal choice. The pH buffer includes one or more of sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate. Examples 1 (2.2%), 2.4%, 3.6%, 4 (3%), and 5 (3.2%) show the optimal ratio. Based on the data, Examples 4 and 5 increase the proportion to enhance the chemical polishing effect, resulting in a higher removal rate compared to other examples. Considering cost, Example 4 is the optimal choice. Photos of the microcrystalline glass before and after treatment in Example 4 are shown below. Figure 1 As shown, the treated microcrystalline glass exhibits good polishing performance. In Example 10, the polishing effect was most outstanding under the combined action of four pH buffers and other components, achieving a 100% appearance yield.

[0049] Other beneficial effects: 1. This invention uses readily biodegradable raw materials, which are gentle on the environment and do not cause environmental pollution.

[0050] 2. This invention can achieve good polishing effect on relatively hard microcrystalline glass under normal processing technology, and all performance indicators meet industry requirements.

[0051] 3. This invention is simple and convenient to use.

[0052] 4. The present invention has a better dispersion effect and does not agglomerate.

[0053] The specific embodiments of the present invention described above do not constitute a limitation on the scope of protection of the present invention. Any other corresponding changes and modifications made in accordance with the technical concept of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. A microcrystalline glass polishing slurry, characterized in that, The product comprises the following components by weight percentage: 40%-55% lanthanum oxide cerium powder, 0.3%-0.8% anti-settling agent, 0.1%-0.5% dispersant, 1%-3% pH adjuster, 0.3%-1% wetting agent, 1%-4% chelating agent, and the balance being water.

2. The microcrystalline glass polishing slurry according to claim 1, characterized in that, The anti-settling agent is one or more of sodium methylcellulose, sodium carboxyethylcellulose, sodium carboxymethylcellulose, and sodium carboxypropylcellulose.

3. The microcrystalline glass polishing slurry according to claim 1, characterized in that, The dispersant is one or both of sodium hexametaphosphate and sodium polyacrylate.

4. The microcrystalline glass polishing slurry according to claim 1, characterized in that, The pH buffer is one or more of sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate.

5. The microcrystalline polishing slurry according to claim 1, characterized in that, The wetting agent is one or more of polyethylene glycol 400, polyethylene glycol 200, glycerol, and propylene glycol.

6. The microcrystalline polishing slurry according to claim 1, characterized in that, The chelating agent is one or both of ethylenediaminetetraacetic acid tetrasodium and trisodium hypotriacetate.

7. The microcrystalline polishing slurry according to claim 1, characterized in that, The particle size D50 of the lanthanum oxide cerium powder is 1.2~1.4 μm.

8. The microcrystalline polishing slurry according to claim 1, characterized in that, The pH value of the microcrystalline glass polishing solution is 8-10.

9. The microcrystalline polishing fluid according to claim 1, by weight percentage, comprises the following components: 40%-55% lanthanum cerium oxide powder, 0.7%-0.8% anti-settling agent, 0.5% dispersant, 2%-3% pH adjuster, 1% wetting agent, 4% chelating agent, and the balance being water.

10. A method for preparing the microcrystalline glass polishing slurry according to any one of claims 1-9, characterized in that, The process includes the following steps: adding an anti-settling agent to water and stirring until a viscous liquid is formed; continuing to stir and adding a dispersant and a wetting agent in sequence until fully dissolved; continuing to stir and adding lanthanum oxide and cerium oxide powder until completely dispersed; and continuing to stir and adding a pH buffer to obtain the microcrystalline glass polishing liquid.

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