A self-cleaning nano-coating for photovoltaic glass and a method for processing the same
By forming a self-cleaning nano-coating with a water contact angle of less than 0.3° on the surface of photovoltaic glass, the problem of reduced photoelectric conversion efficiency caused by contaminant coverage in photovoltaic panels is solved, achieving efficient removal of contaminants and improvement of photoelectric efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- JIEKERAN (XIAMEN) NEW MATERIAL CO LTD
- Filing Date
- 2024-01-31
- Publication Date
- 2026-06-26
AI Technical Summary
The existing super-hydrophilic self-cleaning coating layer of photovoltaic panels is difficult to effectively prevent the decrease in photoelectric conversion efficiency caused by dust and other pollutants.
A self-cleaning nano-coating with a water contact angle of less than 0.3° is formed on the surface of photovoltaic glass using mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, crosslinking agent, initiator and silane coupling agent. This coating separates and drives the removal of pollutants by spreading a water film on the surface of the photovoltaic glass.
It significantly improves the hydrophilicity and heat resistance of photovoltaic glass, and removes pollutants by driving the water film through gravity and wind, effectively avoiding the decline in photoelectric conversion efficiency.
Abstract
Description
Technical Field
[0001] This application relates to the field of photovoltaic maintenance technology, and in particular to a self-cleaning nano-coating for photovoltaic glass and its processing method. Background Technology
[0002] The main principle of photovoltaic power generation is the photoelectric effect of semiconductors, but it is greatly affected by the natural environment, especially dust or snow accumulation, which can significantly reduce the power generation efficiency of photovoltaic modules. Without manual dust removal, long-term dust accumulation can reduce the photoelectric conversion rate by approximately 20% to 40%.
[0003] Chinese Patent CN108105838B discloses a graphene heating glass assembly based on photoelectric function, including glass and an outer frame fitted around the circumference of the glass. A photovoltaic wafer is disposed on the outer surface of the glass, and several graphene conductive heating films are disposed at intervals on the inner surface of the glass. Wires are connected to the photovoltaic wafers, and the wires are electrically connected to the parallel or series-connected graphene conductive heating films. A wiring groove is provided inside the outer frame. A super-hydrophilic self-cleaning coating layer is provided on the side of the photovoltaic wafer away from the glass. A rubber ring fitted around the circumference of the glass is provided on the inner wall of the outer frame. A convex annular portion is provided on the outer wall of the rubber ring, and an annular positioning groove is provided on the inner wall of the outer frame for the convex annular portion to engage. The convex annular portion has an arc-shaped positioning concave surface. Several annular sealing lips inclined in the same direction and spaced apart are provided on the inner wall of the rubber ring. When the rubber ring is fitted around the circumference of the glass, the annular sealing lips abut against each other. Two spaced-apart retaining edges are also provided on the inner wall of the rubber ring, and the annular sealing lips are located between the two retaining edges.
[0004] However, the superhydrophilic self-cleaning coating layer of the graphene heating glass module based on photoelectric function generally uses the existing superhydrophilic SiO2 nano-coated glass with a water droplet contact angle of less than 10°. However, for large-area photovoltaic panels, it is still difficult to ignore the decrease in photoelectric conversion efficiency caused by dust and other pollutants covering the photovoltaic panel, which needs to be improved. Summary of the Invention
[0005] In view of this, the first objective of this application is to provide a self-cleaning nano-coating for photovoltaic glass, so as to effectively prevent a decrease in photoelectric conversion efficiency by controlling the water droplet contact angle to less than 1°. The specific solution is as follows:
[0006] A self-cleaning nano-coating for photovoltaic glass is used for cross-linking grafting onto the surface of photovoltaic glass to control the water contact angle to be less than 0.3°. The self-cleaning nano-coating for photovoltaic glass includes mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, cross-linking agent, initiator, and silane coupling agent.
[0007] Preferably, the crosslinking agent is an ethylene / methacrylate copolymer, polyethylene glycol diacrylate, acrylamide, or ethylene glycol dimethacrylate.
[0008] Preferably, the initiator is a thermal initiator or a photoinitiator; the thermal initiator is Trigonox B or dilauroyl peroxide; the photoinitiator is 2-hydroxy-2-propylphenylacetone.
[0009] Preferably, the silane coupling agent is KH570 or KH550.
[0010] Preferably, the silane coupling agent is used to graft onto the surface of photovoltaic glass to form a glass surface grafted with carbon-carbon double bonds.
[0011] Preferably, it further includes tetrabutylammonium heptadecafluorooctanoate or tetrabutylammonium nonafluorobutyrate; wherein the tetrabutylammonium heptadecafluorooctanoate or tetrabutylammonium nonafluorobutyrate is 0.6-3.2% by mass.
[0012] Preferably, the epoxy polyether, dimethyl diallyl ammonium chloride, enamine, and ethyl chloroacetate are in a molar ratio of 1:1.2-1.5:0.2-1:2.2-2.5; the crosslinking agent is 0.1-1.2% by mass; the initiator is 1.5-4.8% by mass; and the mesoporous silica is 50-80% by mass.
[0013] Preferably, the enamine is an acrylic acid amide.
[0014] A method for processing a self-cleaning nano-coating for photovoltaic glass includes the following steps:
[0015] Step 1: Glass surface treatment;
[0016] Step 2, Oligomer material generation section;
[0017] Step 3, Surface coating formation;
[0018] in:
[0019] The oligomer material generation section includes mixing and reacting enamine with dimethyl diallyl ammonium chloride to obtain an oligomer copolymer of enamine and dimethyl diallyl ammonium chloride, and then mixing and reacting the oligomer copolymer with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomer material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto amino groups, where Rx is a polyether molecular chain;
[0020] The surface coating forming part includes mixing and stirring oligomers, mesoporous silica, crosslinking agents and initiators, covering the glass surface, and obtaining the surface coating after ultraviolet light or high temperature curing treatment.
[0021] Preferably, the glass surface treatment includes hydroxylating the glass surface and then treating it with a silane coupling agent to obtain a glass surface grafted with carbon-carbon double bonds.
[0022] As can be seen from the above scheme, this application provides a self-cleaning nano-coating for photovoltaic glass and its processing method. This self-cleaning nano-coating is formed on the surface of photovoltaic glass using mesoporous silica, epoxy-based polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent, resulting in a water contact angle of less than 0.3°. This allows a water film spread on the photovoltaic glass surface to separate contaminants from the self-cleaning nano-coating. Gravity and / or wind power then drive the water film to move and remove contaminants. Specifically, the epoxy-based polyether reacts with the amino groups of the enamine, significantly enhancing the hydrophilicity of the self-cleaning nano-coating by forming hydrogen bonds between the polyether chains and water. Furthermore, the ethyl acetate groups in the ethyl chloroacetate, while reacting with the amino groups, significantly improve the heat resistance, thus preventing the hydrogen bonds between the polyether chains and water from weakening or breaking due to high-temperature exposure of the photovoltaic glass. The processing method of the self-cleaning nano-coating for photovoltaic glass improves the stability and strength of the connection structure of the self-cleaning nano-coating by grafting carbon-carbon double bonds onto the glass surface with a silane coupling agent. It also optimizes the processing method of oligomeric materials to form a surface coating on the glass surface that can control the water droplet contact angle to less than 1°. Detailed Implementation
[0023] The technical solutions described below in conjunction with the embodiments of this application will be clearly and completely described. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0024] The following will provide a detailed description of the self-cleaning nano-coating for photovoltaic glass and its processing method as described in this application.
[0025] A self-cleaning nano-coating for photovoltaic glass is used for cross-linking grafting onto the surface of photovoltaic glass to control the water contact angle to be less than 0.3°. The water contact angle is measured using a contact angle meter, which will not be described in detail here.
[0026] The self-cleaning nano-coating for photovoltaic glass comprises mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent. The crosslinking agent is ethylene / methacrylate copolymer, polyethylene glycol diacrylate, acrylamide, or ethylene glycol dimethacrylate. The initiator is either a thermal initiator or a photoinitiator. Specifically, when a thermal initiator is used, it is Trigonox B or dilauryl peroxide; and when a photoinitiator is used, it is 2-hydroxy-2-propylphenylacetone. The silane coupling agent is KH570 or KH550, and is used to graft onto the photovoltaic glass surface to form a glass surface grafted with carbon-carbon double bonds.
[0027] It should be noted that the molar ratio of epoxy polyether, dimethyl diallyl ammonium chloride, enamine, and ethyl chloroacetate is 1:1.2-1.5:0.2-1:2.2-2.5. Furthermore, the crosslinking agent comprises 0.1-1.2% by mass, the initiator comprises 1.5-4.8% by mass, and the mesoporous silica comprises 50-80% by mass.
[0028] In the embodiments of this application, the enamine used is acrylic acid amide. Of course, other enamines can also be used, which will not be elaborated here.
[0029] A method for processing a self-cleaning nano-coating for photovoltaic glass includes the following steps:
[0030] Step 1, Glass Surface Treatment: The glass surface is hydroxylated and then treated with a silane coupling agent to obtain a glass surface grafted with carbon-carbon double bonds.
[0031] Step 2, Oligomer Material Generation: Enamine and dimethyl diallyl ammonium chloride are mixed and reacted to obtain an oligomeric copolymer of enamine and dimethyl diallyl ammonium chloride. The oligomeric copolymer is then mixed and reacted with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomeric material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto the amino group, where Rx is a polyether molecular chain.
[0032] Step 3, Surface coating formation: After mixing and stirring the oligomer, mesoporous silica, crosslinking agent and initiator, the mixture is applied to the glass surface and cured by ultraviolet light or high temperature to obtain the surface coating.
[0033] The hydroxylation treatment of the glass surface is carried out using existing technologies such as Pirahan solution, which will not be elaborated here.
[0034] Example 1
[0035] A self-cleaning nano-coating for photovoltaic glass is used for cross-linking grafting onto the surface of photovoltaic glass to control the water contact angle to be less than 0.3°. The water contact angle of the self-cleaning nano-coating for photovoltaic glass in this embodiment was measured to be 0.25 ± 0.05° using a contact angle meter.
[0036] The self-cleaning nano-coating for photovoltaic glass comprises mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent. The crosslinking agent is an ethylene / methacrylate copolymer. The initiator is Trigonox B. The silane coupling agent is KH570, which is used to graft onto the photovoltaic glass surface to form a glass surface grafted with carbon-carbon double bonds.
[0037] It should be noted that the molar ratio of epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, and ethyl chloroacetate is 1:1.2:0.2:2.2. Furthermore, the ethylene / methacrylate copolymer accounts for 0.1% by mass, Trigonox B accounts for 1.5% by mass, and mesoporous silica accounts for 63% by mass.
[0038] A method for processing a self-cleaning nano-coating for photovoltaic glass includes the following steps:
[0039] Step 1, Glass Surface Treatment: The glass surface is hydroxylated and then treated with KH570 to obtain a glass surface grafted with carbon-carbon double bonds.
[0040] Step 2, Oligomerization material generation: Acrylamide and dimethyl diallyl ammonium chloride are mixed and reacted to obtain an oligomeric copolymer of acrylamide and dimethyl diallyl ammonium chloride. The oligomeric copolymer is then mixed and reacted with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomeric material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto amino groups, where Rx is a polyether molecular chain.
[0041] Step 3, Surface Coating Formation: After mixing and stirring the oligomer, mesoporous silica, ethylene / methacrylate copolymer and Trigonox B, the mixture is applied to the glass surface and cured at high temperature to obtain the surface coating.
[0042] Example 2
[0043] A self-cleaning nano-coating for photovoltaic glass is used for cross-linking grafting onto the surface of photovoltaic glass to control the water contact angle to be less than 0.3°. The water contact angle of the self-cleaning nano-coating for photovoltaic glass in this second embodiment was measured to be 0.25 ± 0.05° using a contact angle meter.
[0044] The self-cleaning nano-coating for photovoltaic glass comprises mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent. The crosslinking agent is polyethylene glycol diacrylate. The initiator is dilauroyl peroxide. The silane coupling agent is KH550, which is used to graft onto the photovoltaic glass surface to form a glass surface grafted with carbon-carbon double bonds.
[0045] It should be noted that the molar ratio of epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, and ethyl chloroacetate is 1:1.3:0.6:2.4. Furthermore, the content of polyethylene glycol diacrylate is 0.7% by mass, dilauroyl peroxide is 3.1% by mass, and mesoporous silica is 73% by mass.
[0046] A method for processing a self-cleaning nano-coating for photovoltaic glass includes the following steps:
[0047] Step 1, Glass Surface Treatment: The glass surface is hydroxylated and then treated with KH550 to obtain a glass surface grafted with carbon-carbon double bonds.
[0048] Step 2, Oligomerization material generation: Acrylamide and dimethyl diallyl ammonium chloride are mixed and reacted to obtain an oligomeric copolymer of acrylamide and dimethyl diallyl ammonium chloride. The oligomeric copolymer is then mixed and reacted with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomeric material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto amino groups, where Rx is a polyether molecular chain.
[0049] Step 3, Surface coating formation: After mixing and stirring the oligomer material, mesoporous silica, polyethylene glycol diacrylate and dilauryl peroxide, the mixture is applied to the glass surface and cured at high temperature to obtain the surface coating.
[0050] Example 3
[0051] A self-cleaning nano-coating for photovoltaic glass is used for cross-linking grafting onto the surface of photovoltaic glass to control the water contact angle to be less than 0.3°. The water contact angle of the self-cleaning nano-coating for photovoltaic glass in this third embodiment was measured to be 0.25 ± 0.05° using a contact angle meter.
[0052] The self-cleaning nano-coating for photovoltaic glass comprises mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent. The crosslinking agent is ethylene glycol dimethacrylate. The initiator is 2-hydroxy-2-propylphenylacetone. The silane coupling agent is KH570, which is used to graft onto the photovoltaic glass surface to form a glass surface grafted with carbon-carbon double bonds.
[0053] It should be noted that the molar ratio of epoxy polyether, dimethyl diallyl ammonium chloride, acrylamide, and ethyl chloroacetate is 1:1.5:1:2.5. Furthermore, ethylene glycol dimethacrylate accounts for 1.2% by mass, 2-hydroxy-2-propylphenylacetone accounts for 4.8% by mass, and mesoporous silica accounts for 80% by mass.
[0054] A method for processing a self-cleaning nano-coating for photovoltaic glass includes the following steps:
[0055] Step 1, Glass Surface Treatment: The glass surface is hydroxylated and then treated with KH570 to obtain a glass surface grafted with carbon-carbon double bonds.
[0056] Step 2, Oligomerization material generation: Acrylamide and dimethyl diallyl ammonium chloride are mixed and reacted to obtain an oligomeric copolymer of acrylamide and dimethyl diallyl ammonium chloride. The oligomeric copolymer is then mixed and reacted with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomeric material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto amino groups, where Rx is a polyether molecular chain.
[0057] Step 3, Surface Coating Formation: After mixing and stirring the oligomer material, mesoporous silica, ethylene glycol dimethacrylate and 2-hydroxy-2-propylphenylacetone, the mixture is applied to the glass surface and cured with ultraviolet light to obtain the surface coating.
[0058] Example 4
[0059] The difference between Example 4 and Example 1 is that Example 4 also includes tetrabutylammonium heptadecafluorooctanoate. The tetrabutylammonium heptadecafluorooctanoate comprises 0.6% by mass.
[0060] Meanwhile, in Example 4, the surface coating is formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium heptadecanoate, ethylene / methacrylate copolymer and Trigonox B, then covering the glass surface and curing it at high temperature to obtain the surface coating.
[0061] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 4 was measured to be 0.15 ± 0.05° using a contact angle meter.
[0062] Example 5
[0063] The difference between Example 5 and Example 4 is that Example 5 also includes tetrabutylammonium heptadecafluorooctanoate. The tetrabutylammonium heptadecafluorooctanoate comprises 2.2% by mass.
[0064] Meanwhile, in Example 5, the surface coating is formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium heptadecanoate, ethylene / methacrylate copolymer and dilauryl peroxide, then covering the glass surface and curing it at high temperature to obtain the surface coating.
[0065] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 5 was measured to be 0.10 ± 0.05° using a contact angle meter.
[0066] Example 6
[0067] The difference between Example 6 and Example 4 is that Example 5 also includes tetrabutylammonium heptadecafluorooctanoate. The tetrabutylammonium heptadecafluorooctanoate comprises 3.2% by mass.
[0068] Meanwhile, in Example 6, the surface coating is formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium heptadecanooctanoate, ethylene / methacrylate copolymer and 2-hydroxy-2-propylphenylacetone, then covering the glass surface, and finally curing it with ultraviolet light to obtain the surface coating.
[0069] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 6 was measured to be 0.10 ± 0.05° using a contact angle meter.
[0070] Example 7
[0071] The difference between Example 7 and Example 1 is that Example 7 also includes tetrabutylammonium nonafluorobutyrate. The tetrabutylammonium nonafluorobutyrate comprises 0.6% by mass.
[0072] Meanwhile, in Example 7, the surface coating was formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium nonafluorobutanesulfonate, ethylene / methacrylate copolymer and Trigonox B, then covering the glass surface and curing it at high temperature to obtain the surface coating.
[0073] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 7 was measured to be 0.15 ± 0.05° using a contact angle meter.
[0074] Example 8
[0075] The difference between Example 8 and Example 7 is that Example 8 also includes tetrabutylammonium nonafluorobutyrate. Tetrabutylammonium nonafluorobutyrate comprises 2.1% by mass.
[0076] Meanwhile, in Example 8, the surface coating is formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium nonafluorobutanesulfonate, ethylene / methacrylate copolymer and dilauryl peroxide, then covering the glass surface and curing it at high temperature to obtain the surface coating.
[0077] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 8 was measured to be 0.10 ± 0.05° using a contact angle meter.
[0078] Example 9
[0079] The difference between Example 9 and Example 7 is that Example 9 also includes tetrabutylammonium nonafluorobutyrate. Tetrabutylammonium nonafluorobutyrate comprises 3.2% by mass.
[0080] Meanwhile, in Example 9, the surface coating is formed by mixing and stirring oligomers, mesoporous silica, tetrabutylammonium nonafluorobutanesulfonate, ethylene / methacrylate copolymer and 2-hydroxy-2-propylphenylacetone, then covering the glass surface, and obtaining the surface coating after ultraviolet curing treatment.
[0081] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Example 9 was measured to be 0.10 ± 0.05° using a contact angle meter.
[0082] Comparative Example 1
[0083] The difference between Comparative Example 1 and Example 1 is that the self-cleaning nano-coating of photovoltaic glass in Comparative Example 1 includes mesoporous silica, polydimethyldiallylammonium chloride, crosslinking agent, initiator, and silane coupling agent.
[0084] Furthermore, the processing method of the self-cleaning nano-coating for photovoltaic glass includes step 1, glass surface treatment: the glass surface is hydroxylated and then treated with KH570 to obtain a glass surface grafted with carbon-carbon double bonds; step 3, surface coating formation: polydimethyldiallyl ammonium chloride, mesoporous silica, ethylene glycol dimethacrylate and 2-hydroxy-2-propylphenylacetone are mixed and stirred, then covered on the glass surface, and the surface coating is obtained after high-temperature curing.
[0085] The water contact angle of the self-cleaning nano-coating of the photovoltaic glass in Comparative Example 1 was measured to be 4.6 ± 0.05° using a contact angle meter.
[0086] In summary, this application provides a self-cleaning nano-coating for photovoltaic glass and its processing method. This self-cleaning nano-coating is formed on the surface of photovoltaic glass using mesoporous silica, epoxy-based polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, a crosslinking agent, an initiator, and a silane coupling agent, resulting in a water contact angle of less than 0.3°. This allows a water film spread across the photovoltaic glass surface to separate contaminants from the self-cleaning nano-coating. Gravity and / or wind power then drive the water film to move and remove contaminants. Specifically, the epoxy-based polyether reacts with the amino groups of the enamine, significantly enhancing the hydrophilicity of the self-cleaning nano-coating by forming hydrogen bonds between the polyether chains and water. Furthermore, the ethyl acetate groups in the ethyl chloroacetate, while reacting with the amino groups, significantly improve the heat resistance, thus preventing the hydrogen bonds between the polyether chains and water from weakening or breaking due to high-temperature exposure of the photovoltaic glass. The tetrabutylammonium heptadecafluorooctanoate and tetrabutylammonium nonafluorobutanesulfonate contain quaternary amino, fluorine, and sulfonic acid groups, which increase the surface roughness of the self-cleaning nanocoating of the photovoltaic glass. When water contacts the self-cleaning nanocoating, the fluorine groups, under the influence of the quaternary amino and sulfonic acid groups, synergistically enhance the surface roughness with mesoporous silica, thereby significantly improving the superhydrophilic properties of the self-cleaning nanocoating. This allows the self-cleaning nanocoating to control the water droplet contact angle to less than 1°, effectively preventing a decrease in photoelectric conversion efficiency. Simultaneously, the processing method of the self-cleaning nanocoating utilizes a silane coupling agent to graft carbon-carbon double bonds onto the glass surface, thereby improving the stability and strength of the bonding structure of the self-cleaning nanocoating. Furthermore, the processing method of the oligomer material is optimized to combine the surface coating forming part with the surface coating formed on the glass surface, achieving a surface coating with a water droplet contact angle of less than 1°.
[0087] The terms “first,” “second,” “third,” “fourth,” etc., used in this application (if applicable) are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in orders other than those described herein. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, or apparatus that includes a series of steps or units is not necessarily limited to those explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, or apparatus.
[0088] It should be noted that the use of terms such as "first" and "second" in this application is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of those features. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. If the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed in this application.
[0089] This document uses specific examples to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the methods and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.
Claims
1. A self-cleaning nano-coating for photovoltaic glass, characterized in that, The self-cleaning nano-coating for photovoltaic glass, used for cross-linking grafting onto the surface to control the water contact angle to less than 0.3°, comprises mesoporous silica, epoxy polyether, dimethyl diallyl ammonium chloride, enamine, ethyl chloroacetate, cross-linking agent, initiator, and silane coupling agent; the processing method of the self-cleaning nano-coating for photovoltaic glass includes the following steps: Step 1: Glass surface treatment; Step 2, Oligomer material generation section; Step 3, Surface coating formation; in: The glass surface treatment includes hydroxylating the glass surface and then treating it with a silane coupling agent to obtain a glass surface grafted with carbon-carbon double bonds. The oligomer material generation section includes mixing and reacting enamine with dimethyl diallyl ammonium chloride to obtain an oligomer copolymer of enamine and dimethyl diallyl ammonium chloride, and then mixing and reacting the oligomer copolymer with epoxy polyether and ethyl chloroacetate in sequence to obtain an oligomer material consisting of -CH2-CH(OH)-Rx and ethyl acetate groups grafted onto amino groups, where Rx is a polyether molecular chain; The surface coating forming part includes mixing and stirring oligomers, mesoporous silica, crosslinking agents and initiators, covering the glass surface, and obtaining the surface coating after ultraviolet light or high temperature curing treatment.
2. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: The crosslinking agent is an ethylene / methacrylate copolymer, polyethylene glycol diacrylate, acrylamide, or ethylene glycol dimethacrylate.
3. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: The initiator is a thermal initiator or a photoinitiator; the thermal initiator is Trigonox B or dilauroyl peroxide; the photoinitiator is 2-hydroxy-2-propylphenylacetone.
4. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: The silane coupling agent is KH570 or KH550.
5. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: The silane coupling agent is used to graft onto the surface of photovoltaic glass to form a glass surface grafted with carbon-carbon double bonds.
6. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: It also includes tetrabutylammonium heptadecanoate or tetrabutylammonium nonafluorobutyrate; wherein the tetrabutylammonium heptadecanoate or tetrabutylammonium nonafluorobutyrate is 0.6-3.2% by mass.
7. The self-cleaning nano-coating for photovoltaic glass according to claim 1, characterized in that: The epoxy polyether, dimethyl diallyl ammonium chloride, enamine, and ethyl chloroacetate are in a molar ratio of 1:1.2-1.5:0.2-1:2.2-2.5; the crosslinking agent is 0.1-1.2% by mass, the initiator is 1.5-4.8% by mass, and the mesoporous silica is 50-80% by mass.
8. The self-cleaning nano-coating for photovoltaic glass according to claim 7, characterized in that: The enamine is an acrylic acid amide.