Intelligent bias voltage adjusting system for anode of argon thruster
By real-time monitoring and optimization of the anode bias adjustment system of the argon thruster, the problems of response lag and unstable adjustment of the argon thruster under complex working conditions were solved, achieving rapid response and efficient control.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-17
- Publication Date
- 2026-04-10
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
In the existing technology, the anode bias control of argon thrusters has problems such as response lag and difficulty in achieving stable adjustment under complex operating conditions, resulting in thrust fluctuations and reduced efficiency.
The system employs a data acquisition module to monitor thruster status parameters in real time, a feature analysis module to perform feature analysis, generates anode bias adjustment commands, and optimizes the bias value through an intelligent decision-making module and a control module. In conjunction with the performance analysis module, it performs real-time adjustments to response time and bias difference, actively calibrates and calculates coefficients, and adjusts sensor frequencies to achieve precise adjustment.
It improves the adjustment response speed and control stability of the argon thruster under complex operating conditions, ensures the dynamic stability of the system under different power modes, enhances the targeting and accuracy of adjustment, and improves the system's adaptability and robustness.
Smart Images

Figure CN121828133A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of intelligent adjustment technology for thruster anodes, and more particularly to an intelligent bias adjustment system for the anode of an argon thruster. Background Technology
[0002] Electric propulsion technology is a core direction of advanced space propulsion. Hall effect thrusters and ion thrusters, due to their high specific impulse characteristics, have become key equipment for long-life satellite orbit control and deep space exploration missions. Regarding the choice of propellant, argon is considered an important alternative for large-scale commercial applications of electric propulsion due to its significantly lower cost compared to traditional xenon and its excellent ionization properties. In argon thrusters, the anode, as the key electrode for propellant injection and discharge maintenance, directly determines the plasma ionization efficiency, thrust output stability, and the overall lifespan of the thruster through precise and stable bias control.
[0003] However, argon as the working medium also presents new challenges: its plasma characteristics are more sensitive, and it is prone to discharge current oscillations and mode jumps under complex operating conditions. These instabilities can directly lead to thrust fluctuations, reduced efficiency, and in severe cases, even thruster shutdown. Therefore, achieving intelligent adjustment of the anode bias voltage is a key technology for ensuring the stable and efficient operation of argon thrusters.
[0004] In existing technologies, thruster control primarily focuses on regulating the cathode heater or keeper circuit, indirectly influencing discharge by stabilizing the electron source. Additionally, some schemes exist for open-loop or simple closed-loop control of the anode power supply, such as fixing the anode voltage based on a set power or using simple PID regulation based on discharge current feedback. However, these traditional methods have significant limitations: First, they are mostly "passive response" controls, meaning they only adjust after performance degradation or oscillations are detected, resulting in a certain degree of lag; second, the control objective is singular, often focusing only on a specific parameter of the thruster itself (such as current stability), making it difficult to achieve coordinated optimization of multiple objectives such as stability and efficiency in complex and variable space environments.
[0005] Therefore, there is an urgent need for a real-time monitoring and control system to dynamically optimize the control process by intelligently adjusting the thruster anode bias, thereby improving the rapid response and reliability of the entire propulsion system. Summary of the Invention
[0006] To address this issue, the present invention provides an intelligent bias voltage regulation system for the anode of an argon thruster, which solves the problems of open-loop or simple closed-loop control of the anode power supply in the thruster in the prior art, resulting in response lag and difficulty in achieving stable regulation under complex operating conditions.
[0007] To achieve the above objectives, the present invention provides an intelligent bias voltage regulation system for the anode of an argon thruster, comprising: The data acquisition module is used to collect the thruster's operating status parameters in real time through a sensor group arranged at the corresponding position in the thruster discharge chamber. The operating status parameters include discharge current and plasma oscillation signal. The feature analysis module is used to preprocess the operating state parameters and perform feature analysis based on the processed parameters to obtain the discharge current stability and plasma oscillation amplitude. The intelligent decision-making module is used to generate an anode bias adjustment command based on the discharge current stability, the plasma oscillation amplitude, and the anode operating mode, so as to adjust the target anode to the corresponding bias value. The performance analysis module is used to statistically analyze the adjustment response time and determine whether the anode bias adjustment process meets the standard based on the adjustment response time. The adjustment response time is the time taken from collecting the working state parameters to completing the adjustment of the target anode according to the anode bias adjustment command. The control module is used to optimize the bias value in the anode bias adjustment command based on the discharge current stability and the plasma oscillation amplitude when the anode bias adjustment process is determined to be non-compliant with the standard. It also controls the performance analysis module to obtain the optimized response time after the anode bias adjustment command is optimized, and determines the calculation coefficient of the discharge current stability in the feature analysis module for active calibration based on the optimized response time, or adjusts the sampling frequency of the sensor group.
[0008] Furthermore, the performance analysis module is used to determine whether the anode bias adjustment process meets the standard based on the comparison result of the adjustment response time and the response time threshold. If the adjustment response time is greater than the response time threshold, the anode bias adjustment process is determined to be non-compliant with the standard, and the control module is used to optimize the bias value in the anode bias adjustment command.
[0009] Furthermore, the performance analysis module includes: A state assessment unit is used to determine the deviation level of the target anode in its current operating state based on the comparison results of the discharge current stability and the stability threshold, and based on the comparison results of the plasma oscillation amplitude and the oscillation amplitude threshold. The target bias query unit is used to determine the required bias value of the target anode from a preset bias-deviation level mapping table based on the deviation level and record it as the target bias value. The bias-deviation level mapping table contains the target bias values corresponding to different anode operating modes. The instruction analysis unit is used to determine the bias value in the optimized anode bias adjustment instruction based on the comparison result between the measured bias value and the target bias value, including increasing the bias value or decreasing the bias value. The measured bias value is obtained by the data acquisition module when it collects the working status parameters in real time to obtain the anode voltage feedback value.
[0010] Furthermore, when the measured bias voltage value is less than or equal to the target bias voltage value, the control module is also used to determine to increase the bias voltage value based on the comparison result between the bias voltage difference value and the preset bias voltage difference value, and the increase in the bias voltage value is positively correlated with the bias voltage difference value; Wherein, the bias voltage difference is the difference between the target bias voltage value and the measured bias voltage value.
[0011] Furthermore, if the measured bias value is greater than the target bias value, the control module is also used to determine to reduce the bias value based on the comparison result between the bias offset value and the preset bias offset value, and the reduction of the bias value is positively correlated with the measured bias value. Wherein, the bias offset value is the difference between the measured bias value and the target bias value.
[0012] Furthermore, if the anode bias adjustment process still does not meet the standard based on the comparison result between the optimized response time and the response time threshold, If there is an anomaly in the process of determining the stability of the discharge current based on the comparison result of the discharge current offset ratio and the preset discharge current offset ratio, the control module actively calibrates the calculation coefficient of the discharge current stability in the feature analysis module. If, based on the comparison between the proportion of abnormal plasma oscillations and the preset proportion of abnormal plasma oscillations, it is determined that there is an abnormality in the process of the data acquisition module acquiring the plasma oscillation signal, the control module adjusts the sampling frequency of the sensor group. Wherein, the plasma oscillation anomaly ratio is the ratio of the number of plasma oscillation signals with an amplitude greater than the oscillation amplitude threshold within a preset acquisition period to the total number of plasma oscillation signals; the discharge current offset ratio is the ratio of the number of times the discharge current stability is less than or equal to the stability threshold within a preset acquisition period to the total number of discharge current stability values.
[0013] Furthermore, when it is determined that the calculated coefficients are to be actively calibrated, the control module controls the target anode to switch to a preset calibration condition; Under the calibration conditions, the performance analysis module is also used to determine the measured value of current stability based on the calculation process of the discharge current stability, and to determine the correction amount based on the calculation results of the measured value of current stability and the calibration current stability reference value. The control module calibrates the calculated coefficients based on the correction amount.
[0014] Furthermore, when the sampling frequency is adjusted, the feature analysis module is also used to obtain the oscillation signal-to-noise ratio corresponding to the acquisition of the plasma oscillation signal; The performance analysis module is further used to determine the adjustment of the sampling frequency based on the comparison result between the oscillation signal-to-noise ratio and a preset oscillation signal-to-noise ratio range value, wherein... If the oscillation signal-to-noise ratio is less than the minimum value in the preset oscillation signal-to-noise ratio range, the control module controls the sensor group to increase the sampling frequency; If the oscillation signal-to-noise ratio is greater than the maximum value in the preset oscillation signal-to-noise ratio range, the control module controls the sensor group to reduce the sampling frequency.
[0015] Furthermore, the control module is also used to increase the sampling frequency based on the comparison result between the signal-to-noise ratio difference and the preset signal-to-noise ratio difference, and the increase in sampling frequency is positively correlated with the signal-to-noise ratio difference; Wherein, the signal-to-noise ratio difference is the difference between the minimum value of the preset oscillation signal-to-noise ratio range and the oscillation signal-to-noise ratio.
[0016] Furthermore, the control module is also used to reduce the sampling frequency based on the comparison result between the signal-to-noise ratio deviation value and the preset signal-to-noise ratio deviation value, and the reduction in sampling frequency is positively correlated with the signal-to-noise ratio deviation value; The signal-to-noise ratio deviation value is the difference between the oscillation signal-to-noise ratio and the maximum value among the preset oscillation signal-to-noise ratio range values.
[0017] Compared with existing technologies, the intelligent bias voltage regulation system for the anode of an argon thruster of the present invention has the following advantages: It collects the operating state parameters of the thruster during operation and obtains the discharge current stability and plasma oscillation signals. Then, it combines these with the anode operating mode to generate an anode bias voltage regulation command and adjust the target anode bias voltage value. Furthermore, by statistically analyzing the regulation response time and comparing it with a preset threshold, if the anode bias voltage regulation process does not meet the standard, the system optimizes the anode bias voltage regulation command based on the discharge current stability and plasma oscillation amplitude to improve response efficiency. After optimizing the anode bias voltage regulation command, it re-obtains the regulation response time and re-determines if the regulation process does not meet the standard, updating the calculated coefficients of the discharge current stability or adjusting the sampling frequency of the sensor group. This setup enables deep optimization from the data source and algorithm level, significantly improving the regulation response speed and control stability of the thruster under complex operating conditions.
[0018] Furthermore, the present invention also rapidly diagnoses the deviation level of the current working state of the target anode based on the comparison of discharge current stability and stability threshold, and based on the comparison of plasma oscillation amplitude and oscillation amplitude threshold, so as to realize the quantitative assessment and graded identification of the instability of the thruster, and provide a basis for subsequent precise adjustment.
[0019] Furthermore, through the bias-deviation level mapping table built into the target bias query unit, the present invention can automatically match and output the corresponding target bias value according to different anode working modes and the identified deviation level, ensuring that the adjustment command is highly adapted to the actual working conditions and instability of the thruster, and significantly enhancing the targeting and accuracy of the adjustment. Furthermore, this invention compares the measured bias voltage value with the target bias voltage value in real time, thereby dynamically sensing the adjustment deviation. Based on the preset bias voltage difference value or bias voltage offset value, it compares the corresponding preset value to generate bias voltage adjustment commands with different amplitudes and algorithms, realizing fine and segmented adjustment of the anode bias voltage, effectively avoiding over-adjustment or under-adjustment, improving the response speed, and ensuring that the system can maintain dynamic stability under different power modes and deviation states.
[0020] Furthermore, based on the comparison between the discharge current offset ratio and the preset discharge current offset ratio, this invention can accurately determine whether there is a systematic deviation in the current stability analysis process, and automatically trigger the calibration of the calculated coefficients in the feature analysis module when an anomaly is detected, thereby performing active calibration at the algorithm level to improve the accuracy of the identification algorithm and thus improve the adjustment accuracy of the target anode; and based on the comparison between the plasma oscillation anomaly ratio and the preset plasma oscillation anomaly ratio, it can accurately determine whether there is excessively frequent signal oscillation in the data acquisition process, and adjust the sampling frequency of the sensor group when an anomaly is detected, optimizing the acquisition quality from the data source, thereby ensuring that the adjustment process of the target anode can be more realistically reflected, greatly improving the system's adaptability and overall robustness in long-term operation. Attached Figure Description
[0021] Figure 1 This is a schematic diagram of a module for an intelligent bias voltage adjustment system for the anode of an argon thruster according to an embodiment of the present invention; Figure 2 This is a schematic flowchart of an intelligent bias voltage regulation method for the anode of an argon thruster according to an embodiment of the present invention. Figure 3 This is a logic diagram for determining whether the anode bias adjustment process conforms to the standard based on the comparison result between the adjustment response time and the response time threshold in an embodiment of the present invention. Figure 4 This is a logic diagram for adjusting the sampling frequency based on the comparison result between the oscillation signal-to-noise ratio and the preset oscillation signal-to-noise ratio range value in an embodiment of the present invention. Detailed Implementation
[0022] To make the objectives and advantages of the present invention clearer, the present invention will be further described below with reference to embodiments; it should be understood that the specific embodiments described herein are merely for explaining the present invention and are not intended to limit the present invention.
[0023] Preferred embodiments of the present invention will now be described with reference to the accompanying drawings. Those skilled in the art should understand that these embodiments are merely illustrative of the technical principles of the present invention and are not intended to limit the scope of protection of the present invention.
[0024] It should be noted that, in the description of this invention, unless otherwise explicitly specified and limited, the term "connection" should be interpreted broadly. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.
[0025] Please see Figure 1 The diagram shown is a schematic representation of the intelligent bias voltage regulation system for the anode of an argon thruster according to an embodiment of the present invention. The system includes a data acquisition module, a feature analysis module, an intelligent decision-making module, a performance analysis module, and a control module.
[0026] The system comprises the following modules: a data acquisition module, used to acquire real-time operating status parameters of the thruster via sensor arrays located at corresponding positions in the thruster discharge chamber, including discharge current and plasma oscillation signals; a feature analysis module, connected to the data acquisition module, used to preprocess the operating status parameters and perform feature analysis based on the processed parameters to obtain discharge current stability and plasma oscillation amplitude; an intelligent decision-making module, connected to the feature analysis module, used to generate anode bias adjustment commands based on discharge current stability and plasma oscillation amplitude, combined with the anode operating mode, to adjust the target anode to the corresponding bias value; and a performance analysis module, connected to the intelligent decision-making module, used to statistically analyze the adjustment response time and, based on the adjustment response... The system determines whether the anode bias adjustment process conforms to the standard based on the required response time. The response time is the time taken from acquiring the operating status parameters to completing the adjustment of the target anode according to the anode bias adjustment command. A control module, connected to the performance analysis module, intelligent decision-making module, data acquisition module, and feature analysis module, optimizes the bias value in the anode bias adjustment command based on discharge current stability and plasma oscillation amplitude when the anode bias adjustment process is determined to be non-compliant. Furthermore, after optimizing the anode bias adjustment command, the control module also controls the performance analysis module to obtain the optimized response time and determines the calculation coefficients for discharge current stability in the active calibration feature analysis module based on the optimized response time, or adjusts the sampling frequency of the sensor group. The optimized response time is the adjustment response time re-acquired after optimizing the anode bias adjustment command.
[0027] In this embodiment, the sensor group includes, but is not limited to: a Hall current sensor for measuring discharge current, a voltage detection circuit for measuring anode voltage, and a magnetic probe or Langmuir probe for detecting plasma oscillations. These sensor technologies are conventional technologies used in plasma physics diagnostics. By embedding or installing them in corresponding positions in the thruster discharge chamber, they enable real-time or near-real-time acquisition of operating status parameters, providing a data foundation for subsequent data analysis.
[0028] The preprocessing process includes filtering and amplification of various operating parameters. The preset anode operating modes include low power mode, medium power mode, and high power mode. For example, the power ranges for low power mode, medium power mode, and high power mode can be set to 0.5-2kW, 2-5kW, and above 5kW, respectively. It should be noted that the power range can be set according to the design and verification results of the specific thruster.
[0029] The bias voltage refers to the DC voltage applied to the target anode. When switching from a high-power mode to a low-power mode, different operating parameters such as discharge current and plasma oscillation signal will be generated. At this time, it is necessary to determine and optimize the anode bias voltage adjustment process based on the changing operating parameters such as discharge current and plasma oscillation signal. The adjustment process is optimized by increasing or decreasing the bias voltage of the target anode through the bias voltage adjustment actuator to ensure the efficiency and accuracy of command generation.
[0030] Please see Figure 2 The diagram shown is a flowchart illustrating the intelligent bias voltage regulation method for the anode of an argon thruster according to an embodiment of the present invention. The process includes at least the following steps: S1: Arrange sensor groups at corresponding positions in the thruster discharge chamber and collect working status parameters in real time, including discharge current and plasma oscillation signal. S2: Preprocess the working state parameters and perform feature analysis on the processed parameters to obtain the corresponding discharge current stability and plasma oscillation amplitude; S3: Generates an anode bias adjustment command based on discharge current stability, plasma oscillation amplitude, and anode operating mode to adjust the target anode bias value; S4: Statistical adjustment response time, where the adjustment response time is the time taken from collecting the working status parameters to completing the adjustment of the target anode according to the anode bias adjustment command; S5: Determine whether the anode bias adjustment process meets the standard based on the adjustment response time; S6: When the anode bias adjustment process is determined to be non-compliant with the standard, optimize the bias value in the anode bias adjustment command based on the discharge current stability and plasma oscillation amplitude. S7: After optimizing the anode bias adjustment command, obtain the optimized response time and re-determine whether the anode bias adjustment process meets the standard; S8: If the anode bias adjustment process still does not meet the standard, actively calibrate the calculation coefficient of the discharge current stability or adjust the sampling frequency of the sensor group.
[0031] Please see Figure 3The diagram illustrates the logic for determining whether the anode bias adjustment process conforms to a standard based on a comparison between the adjustment response time and a response time threshold, according to an embodiment of the present invention. Specifically, in determining whether the anode bias adjustment process conforms to a standard based on the adjustment response time, the performance analysis module pre-sets a response time threshold E0 and compares it with the adjustment response time E. The comparison result determines whether the anode bias adjustment process conforms to the standard. The system's response speed must be faster than the rate of instability development of the controlled object (plasma). Therefore, the response time threshold E0 = 1ms is pre-determined in this embodiment based on plasma oscillation characteristics, system sampling, and control theory. The response time threshold E0 can be dynamically adjusted based on the thruster's operating power range and the preset anode operating mode. The comparison process between E and E0 is as follows: If E is less than or equal to E0, it indicates that the current regulation process is timely, and the regulation system has a sufficiently fast speed to cope with possible plasma oscillations and instability problems in the thruster. Therefore, the anode bias regulation process is deemed to meet the standard. If E is greater than E0, it indicates that the current regulation process is sluggish, and there is an excessively delayed component in the regulation system. Therefore, the anode bias regulation process is deemed to not meet the standard. In this case, the control module needs to control the intelligent decision-making module to optimize the anode bias regulation command generation process to optimize the bias value.
[0032] Specifically, the performance analysis module includes a state assessment unit, a target bias voltage query unit, and a command analysis unit. The state assessment unit acquires the discharge current stability L and plasma oscillation amplitude Y. A stability threshold L0 and an oscillation amplitude threshold Y0 are pre-set in the state assessment unit, and are compared with the discharge current stability L and plasma oscillation amplitude Y, respectively. Based on the comparison results, the deviation level of the target anode's current operating state is determined. The deviation level is based on the comparison results of the discharge current stability and plasma oscillation amplitude with the thresholds. Three deviation levels are exemplarily set: Level 0 (Normal): Both discharge current stability and plasma oscillation amplitude are within the threshold range, indicating that the bias voltage adjustment process for the target anode is stable and requires no significant adjustment; Level 1 (Slight Deviation): One of the discharge current stability or plasma oscillation amplitude exceeds the threshold, but the other parameter is within the threshold, indicating that the anode adjustment process for the target anode is slightly unstable and requires minor adjustment; Level 2 (Severe Deviation): Both discharge current stability and plasma oscillation amplitude exceed the threshold, indicating that the bias voltage adjustment process for the target anode is severely unstable and requires significant adjustment. The larger the value of the discharge current stability L, the more stable the system is.
[0033] In one specific embodiment, a stability threshold L0 = 95% and an oscillation amplitude threshold Y0 = 50mV are exemplarily set. The process of comparing the discharge current stability L with the stability threshold L0, and the plasma oscillation amplitude Y with the oscillation amplitude threshold Y0, is as follows: If L is greater than L0 and Y is less than or equal to Y0, the bias voltage adjustment process for the target anode is considered stable. A larger value for the discharge current stability L indicates more severe current fluctuations and greater system instability, corresponding to a deviation level of 0. If L is less than or equal to L0, or Y is greater than Y0, the bias voltage adjustment process for the target anode is considered slightly unstable, corresponding to a deviation level of 1. If L is greater than L0 and Y is greater than Y0, the bias voltage adjustment process for the target anode is considered severely unstable, corresponding to a deviation level of 2.
[0034] The target bias query unit can determine the required bias value for the target anode based on the deviation level and record it as the target bias value K0. The process of determining the target bias value K0 is as follows: a bias-deviation level mapping table is preset, which defines the target bias value K0 for each deviation level under different anode operating modes. An example is given of the target bias values K0 required under different anode operating modes and different deviation levels: In low power mode: when the deviation level is level 0 (normal), set the target bias voltage K to 300V; when the deviation level is level 1 (slight deviation), set the target bias voltage K to 310V; when the deviation level is level 2 (severe deviation), set the target bias voltage K to 320V.
[0035] In medium power mode: when the deviation level is level 0 (normal), set the target bias voltage K to 400V; when the deviation level is level 1 (slight deviation), set the target bias voltage K to 410V; when the deviation level is level 2 (severe deviation), set the target bias voltage K to 420V.
[0036] In high power mode: when the deviation level is level 0 (normal), set the target bias voltage K to 500V; when the deviation level is level 1 (slight deviation), set the target bias voltage K to 510V; when the deviation level is level 2 (severe deviation), set the target bias voltage K to 520V.
[0037] The target bias values K (300V, 400V, 500V, etc.) mentioned above are set based on the anode voltage range (200V~500V) of a typical Hall effect thruster and can be dynamically adjusted according to the equipment or needs.
[0038] The instruction analysis unit can obtain the anode voltage feedback value during the real-time acquisition of working status parameters by the data acquisition module and record it as the measured bias value K. The instruction analysis unit compares the measured bias value K with the target bias value K0 and determines whether the bias value in the anode bias adjustment instruction needs to be optimized based on the comparison result. The adjustment method includes increasing or decreasing the bias value.
[0039] After determining that the anode bias adjustment command needs to be optimized, the control module can control the intelligent decision-making module to optimize the generation process of the anode bias adjustment command.
[0040] Specifically, when the measured bias value K is less than or equal to the target bias value K0, the bias value needs to be increased so that the measured bias value K is close to the target bias value K0. A preset bias difference value F0 is set in the control module. The control module compares the bias difference value F with the preset bias difference value F0 and determines the bias value in the anode bias adjustment command based on the comparison result.
[0041] Wherein, the bias voltage difference F is the difference between the target bias voltage K0 and the measured bias voltage K. The larger the bias voltage difference F, the smaller the corresponding measured bias voltage K, indicating that the measured bias voltage K is further away from the target bias voltage K0. In this case, a larger increase in the bias voltage is needed to ensure that the difference between the measured bias voltage K and the target bias voltage K0 is smaller. Therefore, the increase in the bias voltage is positively correlated with the bias voltage difference F. To more accurately determine the increase in the bias voltage, the preset bias voltage difference F0 can be divided into a first preset bias voltage difference F1 and a second preset bias voltage difference F2. For example, F1 = 10V and F2 = 20V are set. The process of comparing F with F1 and F2 is as follows: If F is less than or equal to F1, the control module generates a first bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to increase the bias voltage by 0.8 × F. If F is greater than F1 and less than or equal to F2, the control module generates a second bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to increase the bias voltage by 10 + 0.5 × (F - 10). If F is greater than F2, the control module generates a third bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to increase the bias voltage by 15 + 0.3 × (F - 20). For example, if the target bias voltage K0 = 400V and the measured bias voltage K = 370V, then the bias voltage difference F = 30V. The third bias voltage adjustment command is used to adjust this, increasing the bias voltage by 18V, resulting in a new bias voltage of 388V.
[0042] Specifically, when the measured bias value K is greater than the target bias value K0, the bias value needs to be reduced so that the measured bias value K is close to the target bias value K0. A preset bias offset value G0 is set in the control module. The control module compares the bias offset value G with the preset bias offset value G0 and determines the bias value in the anode bias adjustment command based on the comparison result.
[0043] Wherein, the bias offset value G is the difference between the measured bias value K and the target bias value K0. The larger the bias offset value G, the larger the corresponding measured bias value K, indicating that the measured bias value K is further away from the target bias value K0. In this case, a greater reduction in the bias value is needed to ensure that the difference between the measured bias value K and the target bias value K0 is smaller. Therefore, the reduction in the bias value is positively correlated with the bias offset value G. To more accurately determine the reduction in the bias value, the preset bias offset value G0 can be divided into a first preset bias offset value G1 and a second preset bias offset value G2. For example, G1 = 15V and G2 = 25V are set. The process of comparing G with G1 and G2 is as follows: If G is less than or equal to G1, the control module generates a fourth bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to reduce the bias voltage by 0.8 × G from the original value. If G is greater than G1 and less than or equal to G2, the control module generates a fifth bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to reduce the bias voltage by 12 + 0.6 × (G - 15) from the original value. If G is greater than G2, the control module generates a sixth bias voltage adjustment command and, based on this command, controls the intelligent decision-making module to reduce the bias voltage by 18 + 0.8 × (G - 25) from the original value. For example, if the target bias voltage K0 = 400V and the measured bias voltage K = 430V, then the bias voltage difference F = 30V. The sixth bias voltage adjustment command is used to adjust the voltage, reducing it by 22V, resulting in a new bias voltage of 408V.
[0044] It is understandable that the increase or decrease in the bias voltage value can be set to other acceptable values. For example, when F is greater than F2, the bias voltage value can be increased by 15 + 0.4 × (F - 20); when G is greater than G2, the bias voltage value can be decreased by 18 + 0.7 × (G - 25). It should be noted that adjusting the bias voltage value will not negatively affect the bias voltage adjustment process of the target anode. In this embodiment, the optimization adjustment of the bias voltage value of the target anode needs to ensure a balance between response speed and stability. Therefore, the new bias voltage value after a single adjustment will not be exactly equal to the target bias voltage value.
[0045] In this embodiment, the performance analysis module is also connected to the data acquisition module and the feature analysis module respectively, to count the number of times the discharge current stability L is less than or equal to the stability threshold L0 within the preset acquisition period, and record it as the discharge current offset ratio W; and to count the number of plasma oscillation signals with plasma oscillation amplitude Y greater than the oscillation amplitude threshold Y0, and record it as the plasma oscillation abnormality ratio H.
[0046] After adjusting the bias voltage, the performance analysis module re-obtains the adjustment response time and records it as the optimized response time J, comparing it with the response time threshold E0 to re-determine the anode bias voltage adjustment process. If the anode bias voltage adjustment process still does not meet the standard, the performance analysis module also pre-sets a preset discharge current offset ratio W0 and compares it with the discharge current offset ratio W, and also pre-sets a preset plasma oscillation anomaly ratio H0 and compares it with the plasma oscillation anomaly ratio W. Based on the comparison results, it determines whether there are any abnormalities in the process of the characteristic analysis module calculating the discharge current stability L, and whether there are any abnormalities in the process of the data acquisition module acquiring the plasma oscillation signal.
[0047] In one specific embodiment, based on historical operating data and performance testing, W0 can be set to 12% for example. The process of comparing W with W0 is as follows: If W is less than or equal to W0, it indicates that the instantaneous fluctuations generated by the regulating system are within the allowable stability tolerance range. Therefore, it can be determined that the process by which the current characteristic analysis module analyzes and obtains the discharge current stability L is normal. If W is greater than W0, it indicates that the instantaneous fluctuations generated by the regulating system exceed the allowable stability tolerance range, meaning that the instability is not random but systematic. This indicates that the characteristic analysis module has deviated or made an error in calculating the discharge current stability L. In this case, the control module needs to actively calibrate the characteristic analysis module to update the calculation coefficients of the discharge current stability in the characteristic analysis module.
[0048] Based on historical operating data and performance testing, we can also exemplarily set H0=8%, and the process of comparing H with H0 is as follows: If H is less than or equal to H0, it indicates that the oscillation amplitude of the plasma oscillation signal generated by the regulating system is within the allowable range at certain moments. Therefore, it can be determined that the process of the data acquisition module acquiring the plasma oscillation signal is normal. If H is greater than H0, it indicates that the oscillation amplitude of the plasma oscillation signal generated by the regulating system exceeds the operating range at certain moments, meaning that the oscillation is too frequent. Therefore, it can be determined that there is an abnormality in the process of the data acquisition module acquiring the plasma oscillation signal; at this time, the control module needs to control the sensor group to adjust the sampling frequency.
[0049] Specifically, when active calibration is deemed necessary, the control module switches the target anode to a preset calibration condition to calibrate the feature analysis module. This calibration condition refers to a known, highly stable, and repeatable anode operating state. Under this condition: the anode voltage is set to a verified and very stable value; the anode working fluid flow rate is set to a precisely controlled value; the magnetic field strength is fixed or kept constant; and the thruster operates in a stable thermal equilibrium state. An example calibration condition is set as follows: after the thruster reaches thermal equilibrium, a steady-state operation is maintained with an anode voltage of 300V, an argon flow rate of 5.0 sccm, and a magnetic field current of 2.0A. It is understood that different calibration conditions can be set according to different anode operating modes to calibrate the feature analysis module in different ranges.
[0050] In this embodiment, under calibration conditions, the performance analysis module determines the measured value of current stability based on the calculation process of discharge current stability L, and calculates the correction amount P with the calibration current stability reference value. The calibration current stability reference value is directly determined by the preset corresponding calibration conditions.
[0051] The control module generates instructions based on the comparison result between the correction amount P and the preset correction amount P0 to update the calculation coefficients when calculating the discharge current stability L. The preset correction amount P0 can be divided into a first preset correction amount P1 and a second preset correction amount P2. For example, P1=5% and P2=10%. The process of comparing P with P1 and P2 is as follows: If P is less than or equal to P1, it is determined that the initial anomaly stems from external disturbances or object instability, causing an anomaly in the process of obtaining the discharge current stability L from the characteristic analysis module. In this case, the regulation system is considered normal, and no update of the calculated coefficients is required, avoiding over-calibration or miscalibration of the system. If P is greater than P1 and less than or equal to P2, it indicates a significant deviation in the regulation system, indicating a calibrable drift in the characteristic analysis module. Therefore, a gradual update method is needed to calibrate the calculated coefficients, calculate theoretically accurate new coefficients, and perform a weighted average with the old coefficients to generate the final updated coefficients. If P is greater than P2, it indicates a serious anomaly in the regulation system, indicating a serious malfunction or failure of the characteristic analysis module. Therefore, a forced update or reset method is needed to calibrate the calculated coefficients. This can be achieved by directly using the newly calculated coefficients for rapid correction, or by resetting the old calculated coefficients to a preset, verified, safe default value. The calculated coefficients include the stable evaluation time window used to calculate the statistical characteristics of current fluctuations (such as standard deviation), and the current steady-state band width used to determine whether the instantaneous current falls within the steady-state band.
[0052] Please see Figure 4 The diagram illustrates the logic decision for adjusting the sampling frequency based on a comparison between the oscillation signal-to-noise ratio (SNR) and a preset SNR range value, according to an embodiment of the present invention. Specifically, when determining the sampling frequency of the sensor group, before the feature analysis module acquires the plasma oscillation signal and performs preprocessing, the corresponding oscillation SNR Q is first determined. A preset SNR range value Q0 is pre-set in the performance analysis module. The performance analysis module compares the oscillation SNR Q with the preset SNR range value Q0 and adjusts the sampling frequency based on the comparison result.
[0053] In one specific embodiment, in order to determine the adjustment direction of the sampling frequency, the minimum value Q1 and the maximum value Q2 in the preset oscillation signal-to-noise ratio range Q0 can be determined. For example, Q1=12dB and Q2=25dB are set. The process of comparing Q with Q1 and Q2 is as follows: If Q is less than Q1, it indicates that the plasma oscillation signal is contaminated by noise. Increasing the sampling frequency to capture more high-frequency signal components allows for better separation of signal and noise through subsequent preprocessing. Increasing the sampling frequency provides richer raw data for subsequent filtering, which helps improve the signal-to-noise ratio and makes the adjustment command generation process more accurate.
[0054] If Q is greater than Q2, it indicates that the signal quality is relatively good. Reducing the sampling frequency can reduce the amount of data, alleviate the system processing burden, and thus shorten the adjustment response time. At the same time, because the signal quality is high, reducing the sampling frequency will not result in the loss of effective signals.
[0055] If Q is greater than or equal to Q1 and less than or equal to Q2, the sampling frequency of the current sensor group is deemed to meet the requirements. If the anode bias adjustment process still does not meet the standard based on the comparison between the optimized response time J and the response time threshold E0, the sensor group needs to be replaced, the target anode needs to be replaced, or the control module needs to perform active calibration on the feature analysis module again.
[0056] Specifically, when it is determined that the sampling frequency needs to be increased, a preset signal-to-noise ratio (SNR) difference value M0 is pre-set in the control module. The control module compares the SNR difference value M with the preset SNR difference value M0 and determines the increase in sampling frequency based on the comparison result. The SNR difference value M is the difference between the minimum value Q1 in the preset oscillation SNR range value Q0 and the oscillation SNR Q. When the SNR difference value M is larger, the corresponding oscillation SNR Q is smaller, which indicates that the plasma oscillation signal is more contaminated. At this time, more high-frequency signal components need to be captured to provide richer raw data. Therefore, the increase in sampling frequency is positively correlated with the SNR difference value M.
[0057] In one specific embodiment, in order to more accurately determine the magnitude of the increase in sampling frequency, the preset signal-to-noise ratio difference M0 can be divided into a first preset signal-to-noise ratio difference M1 and a second preset signal-to-noise ratio difference M2. For example, M1=3dB and M2=9dB are set. The process of comparing M with M1 and M2 is as follows: If M is less than or equal to M1, it indicates that the plasma oscillation signal is relatively lightly contaminated. In this case, the control module generates a first sampling frequency adjustment command and controls the sensor group to increase the current sampling frequency to 1.2 times the original frequency based on this command. If the initial sampling frequency is set to 1MHz, the increased sampling frequency is 1.2MHz. If M is greater than M1 and less than or equal to M2, it indicates that the plasma oscillation signal is relatively moderately contaminated. In this case, the control module generates a second sampling frequency adjustment command and controls the sensor group to increase the current sampling frequency to 1.5 times the original frequency based on this command. If M is greater than M2, it indicates that the plasma oscillation signal is relatively heavily contaminated. In this case, the control module generates a third sampling frequency adjustment command and controls the sensor group to increase the current sampling frequency to 2.0 times the original frequency based on this command.
[0058] Specifically, when it is determined that the sampling frequency needs to be reduced, a preset signal-to-noise ratio (SNR) deviation value N0 is pre-set in the control module. The control module compares the SNR deviation value N with the preset SNR deviation value N0 and determines the reduction range of the sampling frequency based on the comparison result. The SNR deviation value N is the difference between the oscillation SNR Q and the maximum value Q2 in the preset oscillation SNR range Q0. The larger the SNR deviation value N is, the larger the corresponding oscillation SNR Q is, which indicates that the quality of the plasma oscillation signal is better. At this time, the amount of data that needs to be collected is less. Therefore, the reduction range of the sampling frequency is positively correlated with the SNR deviation value N.
[0059] In one specific embodiment, to more accurately determine the reduction in sampling frequency, the preset signal-to-noise ratio (SNR) deviation value N0 can be divided into a first preset SNR deviation value N1 and a second preset SNR deviation value N2. For example, N1 = 3dB and N2 = 6dB are set. The process of comparing N with N1 and N2 is as follows: If N is less than or equal to N1, it indicates that the plasma oscillation signal quality is relatively good. In this case, the control module generates a fourth sampling frequency adjustment command and controls the sensor group to reduce the current sampling frequency to 0.8 times the original frequency. If the initial sampling frequency is set to 1MHz, the reduced sampling frequency is 800kHz. If N is greater than N1 and less than or equal to N2, it indicates that the plasma oscillation signal quality is relatively good. In this case, the control module generates a fifth sampling frequency adjustment command and controls the sensor group to reduce the current sampling frequency to 0.6 times the original frequency. If N is greater than N2, it indicates that the plasma oscillation signal quality is relatively excellent. In this case, the control module generates a sixth sampling frequency adjustment command and controls the sensor group to reduce the current sampling frequency to 0.5 times the original frequency.
[0060] Understandably, the sampling frequency can be increased or decreased by other values that meet the requirements. For example, when M is greater than M2, the current sampling frequency can be increased to 2.5 times the original frequency; when N is less than or equal to N1, the current sampling frequency can be decreased to 0.7 times the original frequency. It should be noted that the adjusted sampling frequency is still higher than twice the highest frequency of the signal.
[0061] All technologies not mentioned in the above embodiments are existing technologies.
[0062] It is understood that no specific limitation is made to any preset parameter or critical parameter in the embodiments of the present invention, and the above values are not limited thereto. Those skilled in the art can make corresponding adjustments to the preset parameters or critical parameters according to actual needs, analysis of historical data, or equipment usage.
[0063] The technical solution of the present invention has been described above with reference to the preferred embodiments shown in the accompanying drawings. However, it will be readily understood by those skilled in the art that the scope of protection of the present invention is obviously not limited to these specific embodiments. Without departing from the principles of the present invention, those skilled in the art can make equivalent changes or substitutions to the relevant technical features, and the technical solutions after these changes or substitutions will all fall within the scope of protection of the present invention.
Claims
1. An intelligent bias adjustment system for argon thruster anodes, characterized by, The method comprises the following steps: a data acquisition module is configured to acquire real-time working state parameters of the thruster through a sensor group arranged at a corresponding position of a discharge chamber of the thruster, wherein the working state parameters include a discharge current and a plasma oscillation signal; a feature analysis module is configured to pre-process the working state parameters and perform feature analysis based on the pre-processed parameters to obtain a discharge current stability and a plasma oscillation amplitude; an intelligent decision module is configured to generate an anode bias voltage adjustment instruction based on the discharge current stability, the plasma oscillation amplitude, and an anode working mode, so as to adjust a target anode to a corresponding bias voltage value; a performance analysis module is configured to count an adjustment response time length, and determine whether the anode bias voltage adjustment process meets a standard based on the adjustment response time length, wherein the adjustment response time length is a time length used from acquiring the working state parameters to completing the adjustment of the target anode according to the anode bias voltage adjustment instruction; a control module is configured to, in a case where it is determined that the anode bias voltage adjustment process does not meet the standard, optimize a bias voltage value in the anode bias voltage adjustment instruction based on the discharge current stability and the plasma oscillation amplitude, and control the performance analysis module to obtain an optimized response time length based on the completion of the optimization of the anode bias voltage adjustment instruction, and determine, based on the optimized response time length, whether to actively calibrate a calculation coefficient of the discharge current stability in the feature analysis module or adjust a sampling frequency of the sensor group.
2. The intelligent bias adjustment system for argon thruster anodes of claim 1, wherein, The performance analysis module is configured to determine whether the anode bias voltage adjustment process meets the standard based on a comparison result of the adjustment response time length and a response time length threshold; wherein, if the adjustment response time length is greater than the response time length threshold, it is determined that the anode bias voltage adjustment process does not meet the standard, and the control module is configured to optimize the bias voltage value in the anode bias voltage adjustment instruction.
3. The intelligent bias adjustment system for argon thruster anodes of claim 2, wherein, The performance analysis module comprises: a state evaluation unit configured to determine a deviation level of the target anode in a current working state based on a comparison result of the discharge current stability and a stability threshold, and based on a comparison result of the plasma oscillation amplitude and an oscillation amplitude threshold; a target bias voltage query unit configured to determine a bias voltage value required by the target anode from a preset bias voltage-deviation level mapping table based on the deviation level and record the bias voltage value as a target bias voltage value, wherein the bias voltage-deviation level mapping table contains corresponding target bias voltage values in different anode working modes; an instruction analysis unit configured to determine whether to optimize the bias voltage value in the anode bias voltage adjustment instruction based on a comparison result of the measured bias voltage value and the target bias voltage value, including increasing the bias voltage value or decreasing the bias voltage value; wherein the measured bias voltage value is obtained from an anode voltage feedback value obtained by the data acquisition module when acquiring the working state parameters in real time.
4. The intelligent bias adjustment system for argon thruster anodes of claim 3, wherein, In a case where the measured bias voltage value is less than or equal to the target bias voltage value, the control module is further configured to determine whether to increase the bias voltage value based on a comparison result of a bias voltage difference value and a preset bias voltage difference value, wherein an increase amplitude of the bias voltage value is in a positive correlation with the bias voltage difference value; wherein the bias voltage difference value is a difference between the target bias voltage value and the measured bias voltage value.
5. The intelligent bias adjustment system for argon thruster anode of claim 3, wherein, In a case where the measured bias value is greater than the target bias value, the control module is further configured to determine to reduce the bias value based on a comparison result of a bias offset value and a preset bias offset value, and a reduction amplitude of the bias value is positively correlated with the measured bias value. The bias offset value is a difference between the measured bias value and the target bias value.
6. The intelligent bias adjustment system for argon thruster anode of claim 3, wherein, In a case where the comparison result of the optimized response duration and the response duration threshold indicates that the anode bias adjustment process still does not meet the standard, If the comparison result of the discharge current offset proportion and the preset discharge current offset proportion indicates that the process of the discharge current stability is abnormal, the control module actively calibrates a calculation coefficient of the discharge current stability in the feature analysis module; If the comparison result of the plasma oscillation abnormality proportion and the preset plasma oscillation abnormality proportion indicates that the process of the data acquisition module collecting the plasma oscillation signal is abnormal, the control module adjusts a sampling frequency of the sensor group; The plasma oscillation abnormality proportion is a ratio of a number of the plasma oscillation signals whose oscillation amplitudes are greater than an oscillation amplitude threshold in a preset acquisition period to a total number of the plasma oscillation signals; and the discharge current offset proportion is a ratio of a number of times that the discharge current stability is less than or equal to the stability threshold in the preset acquisition period to a total number of times of the discharge current stability.
7. The intelligent bias adjustment system for argon thruster anodes of claim 6, wherein, In a case where it is determined to actively calibrate the calculation coefficient, the control module controls the target anode to switch to a preset calibration working condition; In the calibration working condition, the performance analysis module is further configured to determine a measured current stability value based on a calculation process of the discharge current stability, and determine a correction amount based on a calculation result of the measured current stability value and a calibration current stability reference value; The control module calibrates the calculation coefficient based on the correction amount.
8. The intelligent bias adjustment system for argon thruster anode of claim 6, wherein, In a case where it is determined to adjust the sampling frequency, the feature analysis module is further configured to acquire an oscillation signal-to-noise ratio corresponding to the acquisition of the plasma oscillation signal; The performance analysis module is further configured to determine to adjust the sampling frequency based on a comparison result of the oscillation signal-to-noise ratio and a preset oscillation signal-to-noise ratio range value, wherein, If the oscillation signal-to-noise ratio is less than a minimum value in the preset oscillation signal-to-noise ratio range value, the control module is configured to control the sensor group to increase the sampling frequency; If the oscillation signal-to-noise ratio is greater than a maximum value in the preset oscillation signal-to-noise ratio range value, the control module is configured to control the sensor group to decrease the sampling frequency.
9. The intelligent bias adjustment system for argon thruster anodes of claim 8, wherein, The control module is further configured to increase the sampling frequency based on a comparison result of a signal-to-noise ratio difference value and a preset signal-to-noise ratio difference value, and an increase amplitude of the sampling frequency is positively correlated with the signal-to-noise ratio difference value; The signal-to-noise ratio difference value is a difference between the minimum value in the preset oscillation signal-to-noise ratio range value and the oscillation signal-to-noise ratio.
10. The intelligent bias adjustment system for argon thruster anodes of claim 8, wherein, The control module is further configured to decrease the sampling frequency based on a comparison result of a signal-to-noise ratio deviation value and a preset signal-to-noise ratio deviation value, and a decrease amplitude of the sampling frequency is positively correlated with the signal-to-noise ratio deviation value; The signal-to-noise ratio deviation value is a difference between the oscillation signal-to-noise ratio and the maximum value in the preset oscillation signal-to-noise ratio range value.