Panel-free multi-plenum nozzle

Abstract

A showerhead includes a plate and a baffle. The plate includes a first surface and an opening at the center of the first surface. A baffle is placed in the opening of the plate. The baffle extends into the plate through the opening. The baffle includes a second surface located in a plane parallel to the first surface of the plate, and includes a first set of apertures and a second set of apertures in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other. The baffle comprises a connecting plate for connecting the baffle to the spray head; a rod extending from the connecting plate; and a gas delivery plate extending from the rod and including a first set of apertures and a second set of apertures to deliver one or more gases.

Description

[0001] Cross-reference to related applications This application claims priority to U.S. Provisional Patent Application No. 63 / 543,203, filed October 9, 2023. The entire contents of the above application are incorporated herein by reference. Technical Field

[0002] This disclosure generally relates to substrate processing systems, and more specifically, to panelless multi-chamber nozzles designed for substrate processing systems. Background Technology

[0003] The background description provided herein is for the purpose of presenting the general context of this disclosure. The work of the currently designated inventors within the scope described in this background section, as well as aspects of the specification that could not be identified as prior art at the time of filing, are neither express nor implied admissions of prior art to this disclosure.

[0004] A substrate processing system (also called a tool) is used to process substrates such as semiconductor wafers. A substrate processing system contains a processing chamber. The processing chamber contains multiple processing modules (also called stations). Each processing module can process a substrate. For example, the processing may include deposition, etching, cleaning, and / or other substrate treatments. During processing, the substrate is placed on a substrate support within the processing module. A gas delivery system introduces one or more gases and / or vaporized precursors into the processing module via a gas delivery device. For example, the gas delivery device may be a nozzle, injector, etc. In some processes, plasma can be used to initiate chemical reactions. Examples of processes include chemical vapor deposition (CVD), atomic layer deposition (ALD), plasma-enhanced (PE) CVD (PECVD), and PEALD. Summary of the Invention

[0005] A nozzle includes a plate and a baffle. The plate includes a first surface and an opening at the center of the first surface. The baffle is placed in the opening of the plate. The baffle extends into the plate through the opening. The baffle includes a second surface located in a plane parallel to the first surface of the plate, and includes a first set of holes and a second set of holes in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

[0006] In the additional feature, the second surface of the baffle is coplanar with the first surface of the plate.

[0007] In an additional feature, nine holes in the first group form a first square around the center of the second surface of the baffle. One or more holes in the first group are located within the first square. None of the holes in the second group are located within the first square.

[0008] In an additional feature, four holes in the second set of holes form a second square that is larger than the first square. The second square has a center that coincides with the center of both the first square and the second surface of the baffle. Each of the four holes is located radially outside the corresponding hole at one of the four corners of the first square.

[0009] In an additional feature, the second surface of the baffle further includes a third set of holes having a diameter less than or equal to the diameters of the first and second sets of holes. At least four of the third set of holes are located inside the second square and outside the first square.

[0010] In the additional feature, at least one hole in the third group of holes and two holes in the first group of holes form a triangle, and there are no other holes within the triangle.

[0011] In an additional feature, the third set of holes is located on a circle concentric with the centers of the first and second squares and the center of the second surface of the baffle. The corners of the first square are located on the circle.

[0012] In the additional feature, the third set of orifices is in fluid communication with the second set of orifices, but not with the first set of orifices.

[0013] In an additional feature, two diameters perpendicular to each other and intersecting at the center of the second surface of the baffle form four quadrants on the second surface of the baffle. These two diameters contain only the first set of holes. Each quadrant contains one or more holes from the third set of holes.

[0014] In the additional features, each diameter contains nine holes from the first set of holes.

[0015] In an additional feature, the nozzle is configured to supply one or more gases directly to the treatment chamber via a baffle.

[0016] In an additional feature, the nozzle is configured to supply one or more gases to a substrate facing the plate via a baffle. The nozzle does not include a panel with holes facing the substrate.

[0017] In an additional feature, the nozzle is configured to supply a first gas through a first set of orifices and a second gas through a second set of orifices to a substrate facing the plate.

[0018] In the additional feature, the first group of holes and the second group of holes have the same diameter.

[0019] In the additional feature, the first set of holes and the second set of holes are arranged along concentric circles. The hole on at least one circle has a different diameter than the hole on at least one other circle.

[0020] In the additional features, the first set of holes and the second set of holes are arranged in rows and columns.

[0021] In the additional feature, the baffle is coupled to the plate by one or more fasteners.

[0022] In the additional features, the plate and the baffle are integrated.

[0023] In an additional feature, the baffle includes a ring surrounding a second surface of the baffle. The nozzle is further included in the gap between the outer diameter of the ring and the inner diameter of the opening in the baffle.

[0024] In an additional feature, the baffle includes a ring surrounding a second surface of the baffle. The outer diameter of this ring is smaller than the inner diameter of the opening in the baffle.

[0025] In the additional feature, the edge of the first surface of the plate is rounded along the inner diameter of the opening in the plate.

[0026] In an additional feature, the baffle includes a ring surrounding a second surface of the baffle. The nozzle further includes a gap between the outer diameter of the ring and the inner diameter of the opening in the baffle. A first set of orifices in the baffle is configured to supply a first gas. A second set of orifices in the baffle is separated from the first set of orifices and is configured to supply a second gas. The gap is configured to allow the second gas to pass through.

[0027] In the additional feature, the first set of holes and the second set of holes are arranged in an alternating pattern.

[0028] In the additional feature, each hole in the first group of holes and the second group of holes is separated from the adjacent hole in the first group of holes and the second group of holes by a predetermined distance.

[0029] In the additional feature, the diameter of the second surface of the baffle is 75-99% of the diameter of the opening.

[0030] In the additional feature, the diameter of the second surface of the baffle is 0.5-50% of the diameter of the first surface of the plate.

[0031] In the additional features, the diameter of the opening is 0.5-50% of the diameter of the plate.

[0032] In an additional feature, the nozzle further includes a rod connected to a second surface of the plate. The second surface is opposite to the first surface. The rod includes a base coupled to a central region of the second surface of the plate, and includes a vertical portion extending vertically upward from the base.

[0033] In the additional features, the second surface of the plate (i) extends vertically upward from the outer diameter of the first surface by a first distance, (ii) after the first distance, extends radially inward at an angle relative to the first surface of the plate by a second distance, and (iii) after the second distance, extends radially inward parallel to the first surface of the plate by a third distance to the base of the rod.

[0034] Among other features, a baffle for a nozzle includes a connecting plate, a rod, and a gas delivery plate. The connecting plate is configured to connect the baffle to the nozzle. The rod extends from the connecting plate. The gas delivery plate extends from the rod and includes a first set of holes and a second set of holes for delivering one or more gases. The first set of holes and the second set of holes are not in fluid communication with each other.

[0035] In the additional features, the connecting plate, rod, and gas conveying plate are cylindrical and have different diameters.

[0036] In the additional feature, at least one of the connecting plate, rod, and gas conveying plate has a different shape from the others of the connecting plate, rod, and gas conveying plate.

[0037] In the additional feature, at least one of the connecting plate, rod, and gas conveying plate has a different dimension than the others.

[0038] In the additional features, the connecting plate and the gas delivery plate have the same dimensions.

[0039] In the additional features, the connecting plate, rod, and gas delivery plate are integrated into one unit.

[0040] In the additional features, the connecting plate, rod, and gas delivery plate are coupled to each other using one or more fasteners.

[0041] In the additional features, the gas delivery plate has a larger diameter than the rod. The connecting plate has a larger diameter than the gas delivery plate.

[0042] In an additional feature, the baffle further includes an opening extending through the center of the connecting plate and the rod, and extends partially into the gas delivery plate through the center of the gas delivery plate.

[0043] In an additional feature, the connecting plate includes a plurality of arcuate slits extending through the connecting plate. These arcuate slits are located radially outward of the rod.

[0044] In an additional feature, the gas delivery plate includes a first set of holes and a second set of holes arranged in an alternating pattern. The first set of holes is configured to deliver a first gas, and the second set of holes is configured to deliver a second gas different from the first gas.

[0045] In the additional feature, the first group of holes and the second group of holes have the same diameter.

[0046] In the additional feature, the first set of holes and the second set of holes are arranged along concentric circles. The hole on at least one circle has a different diameter than the hole on at least one other circle.

[0047] In the additional features, the first set of holes and the second set of holes are arranged in rows and columns.

[0048] In the additional feature, one hole in the first group of holes is located at the center of the gas delivery plate. The nine holes in the first group form a first square at the center of the gas delivery plate. One or more holes in the first group are located within the first square. None of the holes in the second group are located within the first square.

[0049] In an additional feature, four holes in the second set of holes form a second square, the center of which coincides with the center of both the first square and the gas delivery plate. Each of the four holes is located radially outside the corresponding hole at one of the four corners of the first square.

[0050] In an additional feature, the gas delivery plate further includes a third set of holes having a diameter less than or equal to the diameter of each of the first and second sets of holes. At least four of the third set of holes are located inside the second square and outside the first square.

[0051] In the additional feature, at least one hole in the third group of holes and two holes in the first group of holes form a triangle, and there are no other holes within the triangle.

[0052] In an additional feature, a third set of holes is located on a circle concentric with the centers of the first and second squares and the center of the gas delivery plate. The corners of the first square are located on the circle.

[0053] In the additional feature, the third set of orifices is in fluid communication with the second set of orifices, but not with the first set of orifices.

[0054] In the additional feature, two diameters of the gas delivery plate, perpendicular to each other and intersecting at the center of the gas delivery plate, form four quadrants. Each of the two diameters contains only the first set of holes. Each quadrant contains two holes from the third set of holes.

[0055] In the additional features, each diameter contains nine holes from the first set of holes.

[0056] In an additional feature, the rod includes a fourth set of holes along its edge and a plurality of channels extending radially inward at an angle relative to the vertical axis passing through the rod and the gas delivery plate between the third and fourth sets of holes. The third and fourth sets of holes are in fluid communication with each other and with the second set of holes, a plurality of arcuate slits, and an annular volume surrounding the rod and between the connecting plate and the gas delivery plate.

[0057] In the additional features, the second group of holes, the third group of holes, the fourth group of holes, the multiple arc-shaped slits, and the annular volume are not in fluid communication with the first group of holes.

[0058] In an additional feature, the gas delivery plate includes a plate, a truncated cone portion, and a ring attached to the plate. The ring surrounds the truncated cone portion and defines a gap between the two.

[0059] In the additional feature, the smaller end of the truncated conical portion is attached to the plate. As the ring extends toward the plate, the inner radial portion of the ring gradually tapers inward.

[0060] In the additional feature, the larger end of the truncated conical portion is attached to the plate. As the ring extends toward the plate, the inner radial diameter of the ring gradually tapers outward.

[0061] In an additional feature, the truncated conical portion includes a fifth set of holes positioned laterally through the truncated conical portion. The first set of holes passes through the truncated conical portion and is vertically connected to the fifth set of holes.

[0062] In an additional feature, the baffle further includes an opening extending through the center of the connecting plate and the rod, and partially extending into the gas delivery plate through the center of the gas delivery plate. The opening is in fluid communication with the first set of holes and the fifth set of holes, as well as the gap between the truncated cone and the ring.

[0063] In the additional features, the opening, the first group of holes and the fifth group of holes, and the gap are not in communication with the second, third and fourth groups of holes, multiple arcuate slits, and the annular volume fluid communication around the rod and between the connecting plate and the gas delivery plate.

[0064] In the additional feature, the diameter of each hole in the third and fourth groups of holes, as well as the diameter of each channel in the plurality of channels, are the same. The angle is 45-85 degrees.

[0065] In the additional features, the diameter of the first and second groups of holes is 1-25% of the diameter of the fifth group of holes. The diameter of the third and fourth groups of holes, as well as the plurality of channels, is 10-100% of the diameter of the first and second groups of holes.

[0066] In the additional features, the thickness of the rod is less than the thickness of the connecting plate. The thickness of the gas conveying plate is less than the thickness of the rod.

[0067] Among other features, the nozzle includes a base plate and a baffle. The base plate includes a first surface and an opening located at the center of the first surface. The baffle is disposed within the opening of the base plate. The baffle extends into the base plate through the opening. The baffle includes a second surface located in a plane parallel to the first surface of the base plate, and includes a first set of holes and a second set of holes in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

[0068] In an additional feature, the nozzle is configured to supply one or more gases directly to the treatment chamber via a baffle.

[0069] In an additional feature, the nozzle is configured to supply one or more gases to a substrate facing the base plate via a baffle. The nozzle does not include a panel with holes facing the substrate.

[0070] In the additional feature, the second surface of the baffle is coplanar with the first surface of the base plate.

[0071] In the additional feature, the baffle is connected to the base plate by one or more fasteners.

[0072] In the additional features, the base plate and the baffle are integrated.

[0073] In the additional features, the diameter of the opening is 0.5-50% of the diameter of the base plate.

[0074] In the additional feature, the diameter of the second surface of the baffle is 0.5-50% of the diameter of the first surface of the base plate.

[0075] In the additional feature, the diameter of the second surface of the baffle is 75-95% of the diameter of the opening.

[0076] In an additional feature, the nozzle is configured to supply a first gas to a substrate facing the base plate through a first set of orifices and to supply a second gas to the substrate facing the base plate through a second set of orifices.

[0077] In an additional feature, the base plate includes a first slit located in a second surface of the base plate. The second surface is opposite to the first surface. The nozzle further includes a first component and a second component. The first component includes a first base disposed in the first slit and a first vertical portion extending from the first base. The first vertical portion includes a conduit. The second component includes a second base disposed in the first slit on the first base and a second vertical portion extending from the second base. The second vertical portion includes an inlet. The first base and the second base have the same diameter as the first slit. The diameter of the second vertical portion is larger than the diameter of the first vertical portion. The second vertical portion surrounds the first vertical portion and defines a first annular volume therebetween. The first annular volume is in fluid communication with the inlet but not with the conduit.

[0078] In the additional features, the opening has a first diameter. The first slit has a second diameter. The first base includes a second slit facing the opening and has a third diameter that is larger than the first diameter and smaller than the second diameter. A baffle is disposed within the second slit.

[0079] In an additional feature, the baffle includes a connecting plate disposed in the second slit, a rod extending from the connecting plate, and a gas delivery plate extending from the rod. The connecting plate, rod, and gas delivery plate have different diameters.

[0080] In the additional features, the connecting plate, rod, and gas delivery plate are integrated.

[0081] In the additional features, the connecting plate, rod, and gas delivery plate are connected to each other using one or more fasteners.

[0082] In the additional features, the diameter of the gas conveying plate is larger than the diameter of the rod. The diameter of the connecting plate is larger than the diameter of the gas conveying plate.

[0083] In the additional features, the thickness of the rod is less than the thickness of the connecting plate. The thickness of the gas conveying plate is less than the thickness of the rod.

[0084] In an additional feature, the connecting plate includes a plurality of arcuate slits arranged on a circle having a diameter larger than that of the rod. The first vertical portion includes a plurality of corner holes that extend radially inward and downward through the first base to the second slit. The corner holes are in fluid communication with the first annular volume and coincide with the arcuate slits.

[0085] In an additional feature, the gas delivery plate includes a plate, a truncated cone having a smaller end attached to the plate, and a ring surrounding the truncated cone and attached to the plate. The interior of the ring tapers parallel to the truncated cone, thereby defining a gap between the ring and the truncated cone.

[0086] In the additional features, the baffle includes a third set of holes and a fifth set of holes. The third set of holes extends radially outward at a certain angle through the truncated cone and into the rod, thereby forming a fourth set of holes on the edge of the rod. The fifth set of holes is positioned laterally through the truncated cone. The first set of holes passes through the truncated cone and connects vertically to the fifth set of holes.

[0087] In the additional feature, the conduit extends through the center of the connecting plate, rod, and plate into the truncated cone and is in fluid communication with the first set of holes and the fifth set of holes, as well as with the gap between the truncated cone and the ring.

[0088] In the additional feature, a connecting plate and a gas delivery plate define a second annular volume between them and around the rod. A second set of holes extends through the plate and the truncated cone. The second set of holes, the third set of holes, and the fourth set of holes are in fluid communication with the second annular volume.

[0089] In the additional features, the conduit, the first set of holes and the fifth set of holes, and the gap (296) between the truncated cone and the ring are in fluid communication with each other and define a first inflation chamber for the nozzle. The inlet, the first and second annular volumes, the corner orifice, the arcuate slit, the second, third and fourth sets of holes, and the second gap between the gas delivery plate and the opening are in fluid communication with each other and define a second inflation chamber for the nozzle.

[0090] In the additional features, a portion of the conduit extends through the center of the connecting plate, rod, and plate into the truncated cone; first and fifth sets of orifices; the gap between the truncated cone and the ring is in fluid communication with each other and defines a first air chamber of the baffle; a second annular volume, an arcuate slit, and second, third, and fourth sets of orifices are in fluid communication with each other and define a second air chamber of the baffle.

[0091] In the additional feature, the first group of holes and the second group of holes have the same diameter.

[0092] In the additional feature, the first set of holes and the second set of holes are arranged along concentric circles. At least one hole on a circle has a different diameter than the holes on at least one other circle.

[0093] In the additional feature, the edge of the first surface of the base plate is rounded along the inner diameter of the opening in the base plate.

[0094] In the additional feature, the first set of holes and the second set of holes are arranged in an alternating pattern.

[0095] In the additional feature, each hole in the first group of holes and the second group of holes is spaced at a predetermined distance from the adjacent hole in the first group of holes and the second group of holes.

[0096] In the additional features, the first and second groups of holes have smaller diameters than the fifth group of holes. The diameters of the third and fourth groups of holes are less than or equal to the diameters of the first and second groups of holes.

[0097] The further scope of the applicability of this disclosure will become apparent from the detailed description, claims, and drawings. The detailed description and specific examples are for illustrative purposes only and are not intended to limit the scope of this disclosure. Attached Figure Description

[0098] This disclosure will be more fully understood in light of the detailed description and accompanying drawings, in which: Figure 1 An example of a substrate processing system that uses a nozzle without a panel and including a baffle to process a substrate, according to this disclosure, is shown.

[0099] Figure 2 An example of a perspective view of a nozzle according to this disclosure is shown; and Figure 3 An example side view of a nozzle according to this disclosure is shown.

[0100] Figure 4 An example of a bottom view of a nozzle according to this disclosure is shown.

[0101] Figure 5 An example of a cross-sectional view of a nozzle according to this disclosure is shown.

[0102] Figure 6 An example of the base plate of a nozzle according to this disclosure is shown.

[0103] Figures 7A-7E , Figure 8 and Figure 9 Examples of the various components of the nozzle according to this disclosure are shown.

[0104] Figures 10A-10C Examples of various perspective views of the nozzle baffle according to this disclosure are shown.

[0105] Figure 11A and Figure 11B An example side view of the baffle of a nozzle according to this disclosure is shown.

[0106] Figure 12 An example top view of the baffle of a nozzle according to this disclosure is shown.

[0107] Figure 13 A first example of a cross-sectional view of a nozzle baffle according to this disclosure is shown.

[0108] Figure 14 A second example of a partial cross-sectional view of a nozzle baffle according to this disclosure is shown.

[0109] Figure 15 An example bottom view of the nozzle baffle according to this disclosure is shown.

[0110] Figure 16 A third example of a cross-sectional view of the nozzle baffle according to this disclosure is shown.

[0111] Figure 17 A perspective view of a nozzle with a baffle for use in a substrate processing system according to this disclosure is shown.

[0112] Figure 18 for Figure 17 The side view of the nozzle shown.

[0113] Figure 19 for Figure 17 The top view of the nozzle shown.

[0114] Figure 20 for Figure 17 The nozzle shown is a bottom view.

[0115] Figure 21 for Figure 17 The diagram shows a perspective view of the nozzle baffle, where the baffle is upright.

[0116] Figure 22 for Figure 17 The diagram shows a perspective view of the nozzle baffle, in which the baffle is inverted.

[0117] Figure 23 for Figure 22 The side view of the baffle shown.

[0118] Figure 24 for Figure 22 The top view of the baffle shown; and Figure 25 for Figure 22 The bottom view of the baffle shown.

[0119] In the accompanying drawings, reference numerals may be used repeatedly to identify similar and / or identical elements. Detailed Implementation

[0120] In deposition processes, nozzles are typically used to deliver process gases into a vacuum-controlled processing chamber in a controlled and uniform manner. A nozzle typically comprises a backplate and a front panel attached to the backplate. The diameter of the front panel is typically equal to or larger than the substrate and equal to or smaller than the backplate. The front panel contains thousands of vias distributed throughout the panel, through which the process gases are introduced into the processing chamber.

[0121] Many factors influence nozzle design, including but not limited to gas characteristics, deposition chemistry and uniformity, temperature, pressure, and throughput. Single-chamber and dual-chamber nozzles with different overall dimensions and orifice patterns are commonly used on panels to deliver process gases to the processing chamber. These designs are often complex and require advanced manufacturing techniques, making nozzles expensive components of gas delivery systems. For example, in dual-chamber nozzles, the through-holes are cross-drilled, involving orthogonal drilling through the nozzle's base plate, an expensive process. Nozzle design has a direct impact on throughput, which in turn directly affects semiconductor manufacturing costs.

[0122] This disclosure provides a simple and cost-effective design for a multi-chamber nozzle that eliminates the need for a panel and allows the delivery of up to three different gases to a processing chamber. More specifically, the prior art includes single-chamber and dual-chamber nozzles with various panel aperture patterns and sizes. In some designs, the nozzle is mounted (or suspended) above a base within the processing chamber, with a gap between the bottom surface of the nozzle (i.e., the panel) and the substrate disposed on the base. In other designs, the nozzle and base are reversed, allowing process gases to flow from the bottom of the processing chamber through a substrate support to the top of the processing chamber. The nozzle can also be used to generate and deliver plasma. In these applications, in addition to delivering gases to the processing chamber, the nozzle also serves as an electrode (a ground or active electrode for an RF generation system).

[0123] In a single-chamber nozzle, all gases flow individually or together through a shared path, while in a dual-chamber nozzle, two separate paths allow two independent gas flows. In either design, the nozzle comprises a panel with numerous (e.g., thousands) orifices distributed across the entire panel, through which process gases are delivered to the processing chamber. The nozzle can be actively heated using various technologies (e.g., heating elements) or passively heated by radiation, convection, and conduction from components in the processing chamber that are hotter than the nozzle.

[0124] Printheads can be a source of failure, partly due to their complex and customized design. When using single-chamber printheads, the shared gas delivery path can lead to particle formation due to residual gas left behind (stagnant) by chemicals previously supplied in multi-chemical processes. Furthermore, uneven deposition and low yields are directly related to printhead design. Printhead failures (such as via blockage in panels) increase non-productive time (downtime) in the processing chamber. For example, blocked vias in panels require periodic cleaning, increasing downtime. Additionally, the cleaning process changes the orifice size over time, necessitating printhead replacement. Frequent printhead replacements increase the overall cost of semiconductor manufacturing due to their high cost.

[0125] The panelless multi-chamber nozzle of this disclosure solves the aforementioned problems as described below. Unlike conventional nozzles that include a panel with thousands of through-holes distributed throughout the panel, the multi-chamber nozzle of this disclosure does not contain a panel. The panelless multi-chamber nozzle of this disclosure does not have a panel and is therefore called a panelless multi-chamber nozzle (or simply panelless nozzle), where panelless means without a panel or no panel at all. In the panelless nozzle, a baffle is used instead of a panel. The baffle provides one or more air chambers and corresponding through-holes. The baffle is disposed within the back plate of the nozzle.

[0126] A panelless nozzle consists only of a backplate and baffles, without a front panel. The diameter of the baffles is smaller than the diameters of the backplate, substrate, and front panel; the front panel is not used in panelless nozzles but in conventional nozzles. For example, the diameter of the baffles is less than 50% of the diameters of the backplate, substrate, and front panel. Multiple (e.g., two or more) separate gas chambers in the baffles allow for the simultaneous or sequential delivery of multiple (e.g., two or more) separate process gas flows. The number of through-holes in the baffles (e.g., approximately one hundred) is also much smaller than the number of through-holes in the front panel. Therefore, compared to conventional nozzles with front panels, panelless nozzles deliver process gas from their bottom through a significantly smaller area (e.g., from an area occupying 0.5%–50% of the bottom of the panelless nozzle).

[0127] Compared to traditional printhead designs, panelless printheads reduce or eliminate particle generation and increase output by reducing the time required for gas delivery and scavenging through multiple air chambers. Panelless printheads are also easier to clean than traditional panel printheads. For example, panelless printheads can be cleaned by mechanically processing the bottom surface, which is easier than cleaning the clogged orifices on the panel of a traditional printhead.

[0128] Furthermore, unlike panels, baffles are easier to manufacture and cheaper to replace. For example, baffles can be manufactured using additive manufacturing techniques such as 3D printing, which eliminates the need for expensive cross-drilling processes for through-holes and reduces manufacturing and replacement costs compared to panels. Therefore, panelless printheads are a simpler and more cost-effective design compared to traditional printhead designs.

[0129] More specifically, panelless nozzles use a baffle design instead of a typical panel with a perforated pattern to achieve uniform gas flow from each filling chamber. The panelless nozzle design minimizes gas stagnation in the processing chamber, resulting in shorter purge times compared to conventional nozzles. Panelless nozzle designs can be used in both active and passive heating applications, as well as RF and non-RF applications. Panelless nozzles can be actively or passively heated and cooled. Therefore, compared to conventional nozzles, panelless nozzle designs increase processing speed by delivering multiple individual gases, reduce costs by eliminating complex manufacturing processes, and reduce non-productive time (downtime) in the processing chamber due to increased reliability. These and other features of this disclosure are described in more detail below.

[0130] This disclosure is divided into the following two parts. The first part contains... Figure 1-16 Part Two contains Figure 17-25 The first part shows and describes in detail the internal and external features of the nozzle and baffle. The second part shows and briefly describes only the external features of the nozzle and baffle. In the first part, firstly, refer to... Figure 1 Examples of panelless nozzle-less substrate processing systems that can utilize the content of this disclosure are shown and described. References Figure 2-9 The nozzle and its components, including the baffle, are shown and described. Reference Figure 10A-16 The nozzle baffle is described in detail. In Part II, several views of the nozzle and baffle are shown. Some of these views are also shown and described in Part I. However, because the figures in Part I contain reference numerals, some of the views from Part I that are shown again in Part II to show the external features of the nozzle and baffle, as well as other views of the nozzle and baffle, are not shown with reference numerals.

[0131] Part 1: Internal and External Features of the Sprayer In the following description, such as Figure 2-16As shown, the axis parallel to the plane containing the nozzle backplate (also called the base plate) and baffle is called the horizontal axis, x-axis, or first axis; the axis perpendicular to the plane containing the nozzle backplate and baffle is called the vertical axis, z-axis, nozzle axis, or second axis. When the substrate is placed on a substrate support for processing, the x-axis is also parallel to the plane containing the substrate. The x-axis is also parallel to the diameter of the backplate and nozzle baffle. The x-axis also extends radially along the backplate and nozzle baffle. Furthermore, examples of the various dimensions of the different components of the nozzle and baffle, along with their technical advantages, are described at the end.

[0132] Furthermore, throughout this disclosure, a nozzle containing a baffle is generally described as comprising multiple components. These components can be attached to each other using suitable fasteners as described below. Alternatively, these components can be diffusely combined together. In some examples, the nozzle containing the baffle can be manufactured as a single, integrated component using various manufacturing techniques, such as 3D printing. Additionally, throughout this disclosure, a baffle is also generally described as comprising multiple components. These components can be attached to each other using suitable fasteners as described below. Alternatively, these components can be diffusely combined together. In some examples, the baffle can also be manufactured as a single, integrated component using various manufacturing techniques, such as 3D printing. The baffle can then be attached to the rest of the nozzle using suitable fasteners or a diffused combination.

[0133] Furthermore, all or some components of the nozzle and / or baffle may contain the same or different materials. Examples of materials include metallic materials (e.g., metals and alloys) and ceramic materials. For example, ceramic materials have the advantage of not corroding for certain chemicals used to process substrates, while metallic materials can be used for high-temperature applications.

[0134] Example of a substrate processing system Figure 1 An example of a substrate processing system 100 is shown, in which a panelless nozzle with a baffle as described above can be used, which will be referenced below. Figure 2-16 Further description. The substrate processing system 100 includes a station (also referred to as a processing module or processing chamber) 112 in which a substrate is processed. Although only one station 112 is shown as an example, the substrate processing system 100 may include multiple stations 112. Each station 112 may use a baffled panelless nozzle of the present disclosure. For example, the substrate may be processed sequentially in station 112. Different processes such as atomic layer deposition (ALD), chemical vapor deposition (CVD), plasma-enhanced ALD (PEALD), plasma-enhanced CVD (PECVD), thermal ALD (T-ALD), etc., may be performed on the substrate in different stations using the baffled panelless nozzle of the present disclosure.

[0135] Station 112 includes a base (also called a substrate support) 114 and a nozzle 116. Base 114 includes a base (also called a base plate) 118 and a rod 120. Rod 120 extends from the base 118 and is coupled to the bottom of station 112. During processing, substrate 124 is placed on the top surface of the base 118 of base 114.

[0136] The substrate 124 can be held to the top surface of the base 118 of the base 114 using a clamping mechanism such as vacuum clamping. Alternatively, although not shown, the base 114 can use another type of clamping mechanism. For example, the base 114 may include an electrostatic chuck (ESC). The ESC may be disposed in the base 118 of the base 114. The ESC includes clamping electrodes placed near the top surface of the base 118 of the base 114. The clamping electrodes electrostatically clamp the substrate 124 to the top surface of the base 118 of the base 114. Examples of other clamping mechanisms include mechanical clamping, bosses (small contact areas or MCAs) placed on the top surface of the base 118 of the base 114, etc. In some processes (e.g., ALD), regardless of the clamping scheme used, the base 114 with the substrate 124 can be moved to the bottom near the nozzle 116 by actuator 121.

[0137] The following is for reference Figure 2-16 The nozzle 116 is described in detail. In short, the nozzle 116 comprises a base (also called a base plate) 126 and a rod (or bar) 128. The base plate 126 of the nozzle 116 is typically cylindrical. The diameter of the base plate 126 of the nozzle 116 is greater than or equal to the diameter of the substrate 124. The rod 128 of the nozzle 116 is also typically cylindrical. The diameter of the rod 128 of the nozzle 116 is smaller than the diameter of the base plate 126 of the nozzle 116. The rod 128 of the nozzle 116 extends from the base plate 126 of the nozzle 116. The rod 128 of the nozzle 116 is attached to the top plate of the station 112. Although the nozzle 116 is shown as a chandelier-type nozzle, which includes the rod 128 attached to the top plate of the station 112, the nozzle 116 can be any other type (e.g., flush-mounted to the top plate of the station 112).

[0138] The nozzle 116 receives various gases (e.g., process gases, vaporization precursors, purge gases, cleaning gases, etc.) from the gas delivery system 150 via a manifold 152 via a rod 128. The base plate 126 of the nozzle 116 does not include a panel (not shown) with through-holes or slits through which gas is introduced into the station 112. Instead, the base plate 126 of the nozzle 116 includes a baffle 127 whose diameter is much smaller than the diameter of the base plate 126 (see dimensions below). Therefore, the diameter of the baffle 127 is also much smaller than the diameter of the substrate 124 (see dimensions below). The baffle 127 includes two separate filling chambers and multiple holes through which gas is introduced into the station 112. References will follow below. Figure 2-16The nozzle 116 and the baffle 127 are described in detail.

[0139] The substrate processing system 100 includes a gas delivery system 150. The gas delivery system 150 includes a gas source 154, a valve 156, and a mass flow controller (MFC) 158. The gas source 154 provides various gases, such as process gases, inert gases (also known as purge gases, edge gases, or carrier gases), and cleaning gases. The valve 156 is connected to the gas source 154 and the MFC 158. The valve 156 can be controlled to deliver gas from the gas source 154 to the MFC 158. The MFC 158 regulates the gas flow rate to the manifold 152. Gas is supplied through the manifold 152 to the nozzle 116 and the baffle 127, as described below. Figure 2-16 As described in further detail.

[0140] Additionally, in some applications, the substrate processing system 100 includes another delivery system configured to deliver vaporization precursors via corresponding valves, collectively referred to as vaporization precursor and valve 151. Vaporization precursor and valve 151 delivers the vaporization precursor into manifold 152. Manifold 152 then supplies gas or gas mixtures from gas delivery system 150 and / or vaporization precursors from vaporization precursor and valve 151 to nozzle 116. Thus, gas delivery system 150 and vaporization precursor and valve 151 can supply different chemicals to nozzle 116 and baffle 127, as described below. Figure 2-16 As described in further detail.

[0141] The substrate processing system 100 also includes a radio frequency (RF) power supply 160. In some processes, when plasma is used, the RF power supply 160 provides RF power to the nozzle 116 during substrate processing 124 and during cleaning station 112 where the base 114 is grounded or floated. Although not shown, in some applications, the RF power supply 160 provides RF power to the base 114 during substrate processing 124 and during cleaning station 112 where the nozzle 116 is grounded or floated. The RF power supply excites a gas (e.g., process gas, vaporization precursor, cleaning gas, etc.) introduced into station 112 via nozzle 116 and baffle 127 to generate plasma between nozzle 116 and base 114. The plasma can be used to process various components within substrate 124 and cleaning station 112 (e.g., base 114, sidewalls of station 112, etc.).

[0142] The base 118 of the base 114 includes a heater 162. The heater 162 heats the base 118 of the base 114, and consequently heats the substrate 124. The base 118 of the base 114 includes a temperature sensor 164 for sensing the temperature of the base 114. Although not shown, the base plate 126 of the nozzle 116 may also include a heater for heating the gas, gas mixture, and / or vaporization precursor introduced into the station 112 through the nozzle 116. Furthermore, the base plate 126 of the nozzle 116 may also include a temperature sensor 168 for sensing the temperature of the nozzle 116.

[0143] The substrate processing system 100 also includes a vacuum pump 172 and a valve 170. When the substrate 124 is clamped to the base 114 using a vacuum clamp, the vacuum pump 172 generates a vacuum on the top surface of the base 114. The vacuum pump 172 also vents gases and reactants from the station 112. The vacuum pump 172 also maintains pressure (e.g., vacuum) within the station 112 during substrate processing.

[0144] The substrate processing system 100 further includes a controller 180. The controller 180 controls valves 156 and 170, MFC 158, heaters in the base 114 and nozzle 116, actuator 121, RF power supply 160, and vacuum pump 172. The controller 180 uses temperature sensors 164 and 168 in the base 114 and nozzle 116 to monitor the temperature of the base 114 and nozzle 116. The controller 180 controls the temperature of the base 114 and nozzle 116 by controlling the heaters in the base 114 and nozzle 116. Additionally, although not shown, the substrate processing system 100 may also include a cooling system that supplies coolant to cooling channels in the base 114 and nozzle 116. The controller 180 controls the supply of coolant to the cooling channels in the base 114 and nozzle 116 to control the temperature of the base 114 and nozzle 116.

[0145] Example of a nozzle Figure 2-5 Several views of an example of a nozzle 116 according to this disclosure are shown. Figure 6-9 Multiple views showing examples of different parts (components) of the nozzle 116. Figure 10A-16 A more detailed example of the baffle 127 of the nozzle 116 is shown. Now refer to... Figure 2-16 The nozzle 116 and the baffle 127 are described in more detail.

[0146] refer to Figure 2-4 , Figure 2 A perspective view of nozzle 116 is shown. Figure 3 Showing a side view of nozzle 116. Figure 4 Showing a bottom view of nozzle 116. Figure 2 and Figure 3In this nozzle 116, a base plate 126 and a rod 128 extending vertically upward (along the z-axis) from the base plate 126 are included. The base plate 126 and the rod 128 are generally cylindrical. The diameter of the rod 128 is smaller than the diameter of the base plate 126. The base plate 126 and the rod 128 will... Figure 5 and Figure 6 Further details are provided below. Rod 128 comprises a housing 190 and a tube 192, both of which will be referenced... Figure 7A-9 Further detailed description.

[0147] exist Figure 2 and Figure 3 In a broad sense, rod 128 is connected to the upper surface of base plate 126. Rod 128 includes a base 200 and a vertical portion 202, which forms (defines) housing 190. Rod 128 further includes tube 192. Base 200 is coupled to a central region of the upper surface of base plate 126. Vertical portion 202 of rod 128 extends vertically upward from base 200 (along the z-axis). Gas is supplied to nozzle 116 through tube 192 and inlet 194. Gas received through tube 192 and inlet 194 passes through different filling chambers in baffle 127 (see...). Figure 5 The supply to station 112 is described in detail below.

[0148] exist Figure 3 The image shows a side view of the nozzle 116. For example, the upper surface of the base plate 126 has the following shape. The upper surface of the base plate 126 extends vertically upwards (along the z-axis) from the outer diameter (OD) of the lower surface of the base plate 126 by a first distance. After the first distance, the upper surface of the base plate 126 extends radially inwards (along the x-axis) at a certain angle relative to the lower surface of the base plate 126 (i.e., relative to the x-axis) by a second distance. After the second distance, the upper surface of the base plate 126 extends radially inwards towards the rod 128 parallel to the lower surface of the base plate 126 (along the x-axis) by a third distance.

[0149] Figure 4 A bottom view of the nozzle 116 is shown. The lower surface of the base plate 126 includes an opening 204 at its center. A baffle 127 is arranged within the opening 204 of the base plate 126. See below for reference. Figure 5 and Figure 6 In further detail, the baffle 127 extends into the base plate 126 through the opening 204 (along the z-axis). The diameters of both the opening 204 and the lower surface of the baffle 127, visible in the bottom view of the nozzle 116, are much smaller than (e.g., less than or equal to half the diameter of the base plate 126) the diameter of the base plate 126. There are no holes in the base plate 126 between the outer diameter of the opening 204 and the outer diameter (OD) of the base plate 126 that could supply gas to the station 112.

[0150] The lower surface of the baffle 127 lies in a plane parallel to the lower surface of the base plate 126. For example, the lower surface of the baffle 127 may be coplanar with the lower surface of the base plate 126. In some examples, the lower surface of the baffle 127 may be recessed or offset upward along the z-axis from the opening 204. The lower surface of the baffle 127 includes at least a first set of holes and a second set of holes. The at least first set of holes are generally shown in... Figure 4 Holes 212 and 210 are located on the lower surface of baffle 127. The layout and geometric arrangement of the first and second groups of holes 212 and 210 are shown in the following text. Figure 15 Detailed description.

[0151] The first set of holes 212 and the second set of holes 210 are in fluid communication with the inner and outer air chambers of the nozzle 116, respectively, as will be described in the following reference. Figure 5-16 A more detailed display and description follows. The first set of holes 212 and the second set of holes 210 are not in fluid communication with each other. The baffle 127 includes a variety of additional holes, which are respectively located in... Figure 10A-16 Holes 262, 264, and 260 are shown as the third, fourth, and fifth groups, respectively. These holes in baffle 127 will be referenced below. Figure 10A-16 To display and describe in more detail.

[0152] Figure 5 A cross-sectional view of nozzle 116 is shown. Nozzle 116 includes a base plate 126, a baffle 127, and a rod 128. See also baffle 127. Figure 10A-16 To describe in detail. Therefore, when describing some components (features) of the baffle 127, reference will also be made as needed. Figure 10A-16 .

[0153] Rod 128 includes housing 190 and tube 192. See base plate 126, housing 190, and tube 192. Figure 6-9 The description is shown and detailed. Therefore, when describing some components (features) of the base plate 126, housing 190, and tube 192, reference is also made as needed. Figure 6-9 .

[0154] Generally, as described in detail below, the housing 190 and the tube 192 are cylindrical components concentric with respect to the axis surrounding the nozzle 116, with the housing 190 surrounding the tube 192. Therefore, the tube 192 may also be commonly referred to as the rod 128 or the first component or inner component of the nozzle 116, and the housing 190 may also be commonly referred to as the rod 128 or the second component or outer component 190 of the nozzle 116.

[0155] The outer casing 190 includes a base 200 and a vertical portion 202. The vertical portion 202 of the outer casing 190 extends vertically upward from the central region (along the z-axis) of the base 200 of the outer casing 190. Both the base 200 and the vertical portion 202 of the outer casing 190 are cylindrical. The diameter of the vertical portion 202 of the outer casing 190 is smaller than the diameter of the base 200 of the outer casing 190.

[0156] The tube 192 also includes a base 220 and a vertical portion 222. The vertical portion 222 of the tube 192 extends vertically upward from the central region of the base 220 (along the z-axis). Both the base 220 and the vertical portion 222 of the tube 192 are cylindrical. The diameter of the vertical portion 222 of the tube 192 is smaller than the diameter of the base 220 of the tube 192.

[0157] The housing 190 is a single, integrated, one-piece component. The tube 192 is also a single, integrated, one-piece component. The base plate 126, housing 190, and tube 192 can be different components that can be connected to each other using fasteners or can be diffusely combined with each other. Alternatively, the base plate 126, housing 190, and tube 192 can be manufactured as a single, integrated, one-piece component.

[0158] The base plate 126 includes a cylindrical slit 230 formed through its upper surface. The slit 230 extends vertically (along the z-axis) through approximately half of the base plate 126. The slit 230 does not extend completely through the lower surface of the base plate 126. The base 220 of the tube 192 is disposed within the slit 230. The diameter of the base 220 of the tube 192 is the same as the diameter of the slit 230. The height (thickness) of the base 220 of the tube 192 (measured along the z-axis) is less than the depth of the slit 230 (also measured along the z-axis).

[0159] The base 200 of the outer casing 190 is disposed in a slit 230 at the top of the base 220 of the tube 192. The diameter of the base 200 of the outer casing 190 is the same as the diameter of the base 220 of the tube 192. The diameter of the base 200 of the outer casing 190 is the same as the diameter of the slit 230.

[0160] The height (thickness) of the base 200 of the outer casing 190 (measured along the z-axis) is less than the depth of the slit 230. The height of the base 200 of the outer casing 190 is less than the height of the base 220 of the tube 192. The height of the base 220 of the tube 192 is greater than the height of the base 200 of the outer casing 190 so as to accommodate the connecting plate 240 of the baffle 127 within the base 220 of the tube 192, as described in detail below. The sum of the heights of the base 200 of the outer casing 190 and the base 220 of the tube 192 is equal to the depth of the slit 230.

[0161] The upper surface of the base 200 of the outer casing 190 forms (defines) the upper surface of the base plate 126. The diameters of the slit 230, the base 220 of the tube 192, and the base 200 of the outer casing 190 are equal and larger than the diameter of the opening 204, larger than the diameter of the connecting plate 240 of the baffle 127, and smaller than the diameter of the base plate 126.

[0162] The height (measured along the z-axis) of the vertical portion 222 of tube 192 from its base 220 is less than the height (measured along the z-axis) of the vertical portion 202 of outer casing 190 from its base 200. The outer diameter (OD) of the vertical portion 202 of outer casing 190 is greater than the outer diameter (OD) of the vertical portion 222 of tube 192. The vertical portion 222 of tube 192 is hollow at its center, which begins at the top of the vertical portion 222 of tube 192, passes through the top of the vertical portion 222 of tube 192, and passes through the bottom of the base 220 of tube 192. The hollow portion of tube 192 is cylindrical.

[0163] The vertical portion 202 of the outer casing 190 is partially hollow at its center. This hollow portion of the outer casing 190 is also cylindrical. The hollow portion of the outer casing 190 extends through the bottom end of the base 200 of the outer casing 190. The hollow portion of the outer casing 190 does not extend through the top end of the vertical portion 202 of the outer casing 190.

[0164] The height (measured along the z-axis) of the hollow portion of the vertical section 202 of the outer casing 190 is equal to the height of the vertical section 222 of the tube 192. The hollow portion of the outer casing 190 surrounds and encloses the vertical section 222 of the tube 192. Therefore, the vertical section 202 of the outer casing 190 surrounds and encloses the vertical section 222 of the tube 192. Generally, the outer casing 190 partially surrounds and encloses the tube 192. In other words, generally, the outer casing 190 surrounds and encloses the vertical section 222 of the tube 192.

[0165] The inner diameter (ID) of the hollow portion of the vertical section 202 of the outer casing 190 is greater than the OD of the vertical section 222 of the tube 192. The ID of the hollow portion of the vertical section 202 of the outer casing 190 and the OD of the vertical section 222 of the tube 192 define the annular volume 232. The inlet 194 is located via a channel (in... Figure 7C The channel 237 (shown as 237) connects to the annular volume 232 through the opening 236 in the vertical portion 202 of the outer casing 190. Figure 5 It is not visible in the middle, but... Figures 7A-7E As shown in the diagram. Opening 236 is positioned along the ID of a portion of the hollow section of the vertical portion 202 of the housing 190 and near the upper end of the portion of the hollow section 202 of the vertical portion 190. Channel 237 extends from inlet 194 to opening 236 in the vertical portion 202 of the housing 190. Channel 237 and opening 236 will be referred to below. Figures 7A-7E Detailed description.

[0166] The vertical portion 222 of tube 192 includes a groove 238 surrounding the vertical portion 222 of tube 192 near its upper end. For example, the groove 238 is located on the same horizontal plane (along the x-axis) as the opening 236. The groove 238 is circular around the entire tube 192. The opening 236 may surround the entire housing 190 or be located in a portion of the housing 190. The groove 238 is in fluid communication with the annular volume 232.

[0167] The vertical portion 202 of the housing 190 also includes a groove 239 near the lower end of the vertical portion 202 of the housing 190, surrounding a portion of the hollow part of the vertical portion 202. The groove 239 is also in fluid communication with the annular volume 232. For example, the annular volume 232 can be adjusted for different applications by changing the inner diameter of the vertical portion 202 of the housing 190 and the outer diameter of the vertical portion 222 of the tube 192. Gas from the inlet 194 flows into the annular volume 232 through the channel 237 and the opening 236. The groove 239 can be larger than the groove 238, and it contributes to airflow uniformity as the gas flows downward through the annular volume 232 towards the baffle 127. The grooves 238 and 239 are configured to regulate the direction and velocity of the gas.

[0168] The height of the vertical portion 222 of tube 192 is less than the height of the vertical portion 202 of housing 190 (along the z-axis). The upper end of the vertical portion 222 of tube 192 is located inside and below the upper end of the vertical portion 202 of housing 190 (along the z-axis). The upper end of the vertical portion 222 of tube 192 extends radially inward (along the x-axis), narrows in diameter, and extends vertically upward (along the z-axis) to form a conduit 224. The vertical portion 202 of housing 190 includes an opening 225 at the center of the vertical portion 202 of housing 190 (e.g., ...). Figure 7B (As shown). The conduit 224 extends through the opening 225.

[0169] The ID of conduit 224 is equal to the ID of the hollow portion of the vertical section 222 of tube 192. Conduit 224 passes through the top end of the vertical section 202 of base 200. Conduit 224 is in fluid communication with the hollow portion of tube 192. Conduit 224 is not in fluid communication with the annular volume 232 between tube 192 and outer casing 190. Gas supplied via conduit 224 flows into the hollow portion of tube 192 and enters baffle 127, as described in detail below. Gas supplied via conduit 224 does not flow through annular volume 232. Gas supplied via annular volume 232 does not flow through conduit 224. Annular volume 232 is separate from both conduit 224 and the hollow portion of tube 192.

[0170] The following is for reference Figure 10A-16The baffle 127 is described in detail. In short, the baffle 127 includes a connecting plate 240, a rod 242, and a gas delivery plate 244. The connecting plate 240 connects the baffle 127 to the nozzle 116, as described below. The connecting plate 240 is connected to the rod 242. The rod 242 is then connected to the gas delivery plate 244. The connecting plate 240, rod 242, and gas delivery plate 244 can be different components, connected together using fasteners, or diffusely combined. Alternatively, the connecting plate 240, rod 242, and gas delivery plate 244 can be made into a single, integrated, one-piece component.

[0171] In some embodiments, baffle 127 is connected to nozzle 116 as described below. The base 220 of tube 192 includes a cylindrical slit 246 formed through the lower surface of the base 220 of tube 192. The slit 246 extends approximately half or one-third of the base 220 of tube 192 in the vertical direction (along the Z-axis). The slit 246 does not extend completely through to the upper surface of the base 220 of tube 192. The base 220 of tube 192 includes an alignment pin 285 that engages with a corresponding hole 286 in the top surface of the connecting plate 240 of baffle 127. The alignment pin 285 and the hole 286 orient the baffle 127 as described in detail below.

[0172] The lower surface of the base plate 126 includes an opening 204 located at the center of the base plate 126. The diameter of the slit 246 is larger than the diameter of the opening 204. The slit 230 in the base plate 126 and the slit 246 in the base 220 of the tube 192 are concentric with the opening 204. Therefore, when the base 220 of the tube 192 is arranged in the slit 230, an annular step 207 is formed in the base plate 126 above the opening 204. In some examples, the diameter of the connecting plate 240 of the baffle 127 is larger than the diameter of the opening 204. The diameter of the connecting plate 240 of the baffle 127 is equal to the diameter of the slit 246. The height of the connecting plate 240 of the baffle 127 (measured along the z-axis) is equal to the depth of the slit 246 (measured along the z-axis). Therefore, when the connecting plate 240 of the baffle 127 is arranged into the base plate 126 of the nozzle 116 via the opening 204, the outer lower edge of the connecting plate 240 of the baffle 127 is located on the annular step 207. The rod 242 of the baffle 127 and the gas delivery plate 244 extend downward (along the z-axis) through the opening 204.

[0173] A gap 250 is maintained between the opening 204 in the base plate 126 and the bottom of the baffle 127. The size of the gap 250 (i.e., the width along the x-axis) can be adjusted according to application requirements by changing the ID of the opening 204 and / or the OD of the ring 294 of the baffle 127 (see below). Figure 10A-16(As shown and described) can be modified. For example, the ratio of the OD of the ring 294 of baffle 127 to the ID of the opening 204 can be 75-99%. Gap 250 provides radial outward flow to the edge of substrate 124 to improve the process uniformity of the entire substrate 124. If an application does not require uniform deposition / etching across the entire substrate 124 and only needs to process the central region of substrate 124, gap 250 can be completely removed. Furthermore, the diameter of the bottom surface of baffle 127 can be 0.5-50% of the diameter of the bottom surface of substrate 126. The diameter of the bottom surface of baffle 127 is selected based on the diameter of substrate 124 and the focal area of ​​uniformity on substrate 124. The size of the bottom surface of baffle 127 is configured to be within 50% of the bottom surface of substrate 126 so that the gas delivery rate at the edge of baffle 127 is more uniform than the gas delivery rate around the center of baffle 127. The edge of the lower surface of substrate 126 at opening 204 can be as follows Figure 5 205 in the diagram is circular. The circular edge of the lower surface of the base plate 126 at the opening 204 facilitates the radial outward flow of gas through the gap 250 to the outer diameter (OD) of the lower surface of the base plate 126.

[0174] The diameter of the gas delivery plate 244 is larger than the diameter of the rod 242. The diameter of the connecting plate 240 is larger than the diameter of the gas delivery plate 244. The diameter of the gas delivery plate 244 is smaller than the diameter of the opening 204. Therefore, a gap 250 exists between the gas delivery plate 244 and the opening 204. The annular volume 252 is defined by the connecting plate 240 and the gas delivery plate 244 around the rod 242. The annular volume 252 is in fluid communication with the gap 250.

[0175] The lower surface of the gas delivery plate 244 is in the same plane as the lower surface of the base plate 126. In some examples, the lower surface of the gas delivery plate 244 is coplanar and flush with the lower surface of the base plate 126. In other examples, the lower surface of the gas delivery plate 244 is slightly concave or offset vertically upward (along the z-axis) relative to the lower surface of the base plate 126.

[0176] In some examples, the shape of at least one of the connecting plate 240, rod 242, and gas delivery plate 244 may differ from the shapes of the others. For example, any one of the connecting plate 240, rod 242, and gas delivery plate 244 may be square, rectangular, hexagonal, octagonal, circular, cylindrical, or any other polygonal shape. In some examples, the dimensions (e.g., dimensions measured along the x-axis and / or z-axis) of at least one of the connecting plate 240, rod 242, and gas delivery plate 244 may differ from the dimensions of the others. For example, dimensions may include any dimensions defining area and volume. The shape and dimensions of the slit 246 in the base 220 of tube 192 may correspond to the shape and dimensions of the connecting plate 240. Any combination of shapes and dimensions can be used to implement the connecting plate 240, rod 242, and gas delivery plate 244.

[0177] The baffle 127 can be attached to the nozzle 116 using fasteners, or it can be diffusely bonded to each other. For example, the connecting plate 240 can be fixed or diffusely bonded to the base plate 126 and to the slit 246 at the annular step 207. Alternatively, the baffle 127 and the nozzle 116 can be made as a single, integrated component.

[0178] Baffle 127 includes several different holes, described herein as a first to a fifth group of holes. The first to fifth groups of holes are respectively located in... Figure 5 And shown in Figures 10-16 as 212, 210, 262, 264, and 260. Although in Figure 5 Some holes are not visible, but they are in Figure 10A-16 The details are shown and described in the text; the following is a brief description of these holes for reference. Figure 5 The flow path of the gas through nozzle 116 and baffle 127 is described. Furthermore, although the orifices in each group of orifices are shown as circular throughout this disclosure, the orifices in each group of orifices do not need to be circular and can have other polygonal shapes. Additionally, the ends of these orifices from which the gas flows can be flared. For example, the ends of circular orifices can be conical, wherein, for each orifice, the radius of the conical end is larger than the radius of the orifice. The flared ends of the orifices facilitate proper distribution of the gas discharged from the orifices, prevent clogging, and aid in cleaning.

[0179] The following will refer to Figure 10A-16 Show and describe in detail the gas delivery plate 244. In short, the gas delivery plate 244 includes at least... Figure 4 The first and second sets of holes 212, 210 are generally shown on the lower surface of the middle baffle 127. In the first and second sets of holes 212, 210, at... Figure 5The view shown only shows the first group of holes 212. The second group of holes 210 is... Figure 5 It is not visible in the middle, but... Figure 10A-16 As can be seen in the image. The second set of holes 210 extends through the gas delivery plate 244 (see...). Figure 10A-16 The second set of holes 210 is in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and with the gap 250 between the gas delivery plate 244 and the opening 204 in the base plate 126 (see...). Figure 10A-16 In addition, the gas delivery plate 244 includes a third set of holes, which are located in... Figure 5 It is not visible in the middle, but... Figure 10A-16 The number of holes in the third group (262) is less than that in the first and second groups (212 and 210), as shown below. Figure 10A-16 Detailed description. In some embodiments, when measured from the bottom side of the baffle 127, the first group 212 and the second group of holes 210 have the same diameter, but the third group of holes 262 has a smaller diameter.

[0180] The rod 242 of the baffle 127 further includes a fourth set of holes, which are in Figure 5 It is not visible in the view either, but Figure 10A-16 The value is displayed as 264, and refer to... Figure 10A-16 A detailed description is provided below. As described, the fourth set of holes 264 extends radially inward and downward from the rod 242 at a certain angle, passing through the lower surface of the gas conveying plate 244 to reach the third set of holes 262 on the lower surface of the gas conveying plate 244. As shown and described below, each hole in the third and fourth sets of holes 262, 264 is a single, angled (inclined), continuous hole. The third and fourth sets of holes 262, 264 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas conveying plate 244, and with the gap 250 between the gas conveying plate 244 and the opening 204 in the base plate 126.

[0181] The gas delivery plate 244 includes a fifth set of holes 260. See below for reference. Figure 14 As described in detail, the fifth set of holes 260 is positioned to pass laterally along the x-axis. Figure 10A-16 The truncated conical portion 292 of the gas delivery plate 244 is shown. The first set of holes 212 extends from the lower surface of the gas delivery plate 244 to the fifth set of holes 260, as shown. Figure 5 and Figure 10A-16As shown. According to some embodiments, the first and fifth groups of holes 212, 260 are in fluid communication with each other. The first and fifth groups of holes 212, 260 are not in fluid communication with the second, third, and fourth groups of holes 210, 262, 264, the annular volume 252 between the connecting plate 240 and the gas conveying plate 244, or the gap 250 between the gas conveying plate 244 and the opening 204 in the base plate 126.

[0182] The connecting plate 240 and rod 242 of the baffle 127 are hollow at their center. In some examples, the hollow portions of the connecting plate 240 and rod 242 have the same diameter as the hollow portion of the vertical portion 222 of the tube 192. In some examples, the diameter of the hollow portion of the connecting plate 240 is larger or smaller than the diameter of the hollow portion of the vertical portion 222. The hollow portions of the connecting plate 240 and rod 242 of the baffle 127 are concentric with the hollow portion of the vertical portion 222 of the tube 192.

[0183] The connecting plate 240 of the baffle 127 has an opening 245 at the center of its top surface (see...). Figure 10A-16 The opening connects to the rod 242 of the baffle 127. The opening 245 at the center of the top surface of the connecting plate 240 is concentric with the hollow portions of the connecting plate 240 and the rod 242 of the baffle 127. The opening 245 at the center of the top surface of the connecting plate 240 is also concentric with the hollow portion of the vertical portion 222 of the tube 192. In some examples, the diameter of the opening 245 in the top surface of the connecting plate 240 is the same as the diameter of the hollow portions of the connecting plate 240 and the rod 242 of the baffle 127. The diameter of the opening 245 in the top surface of the connecting plate 240 is also equal to the diameter of the hollow portion of the vertical portion 222 of the tube 192. In some examples, the aforementioned portions have different diameters.

[0184] The opening 245 at the center of the top surface of the connecting plate 240 and the hollow portions of the connecting plate 240 and the rod 242 extend partially (below the midpoint) into the gas delivery plate 244. The hollow portions of the connecting plate 240 and the rod 242, as well as the hollow portion of the vertical portion 222 of the tube 192, are in fluid communication with the fifth set of holes 260. Therefore, the conduit 224 of the tube 192 of the nozzle 116 is in fluid communication with the fifth set of holes 260 in the baffle 127.

[0185] Therefore, the conduit 224 of pipe 192, the hollow portion of the vertical section 222 of pipe 192, the connecting plate 240, the rod 242 and the hollow portion of the gas conveying plate 244, the fifth set of holes 260 and the first set of holes 212 are in fluid communication with each other. The conduit 224 of pipe 192, the hollow portion of the vertical section 222 of pipe 192, the connecting plate 240, the rod 242 and the hollow portion of the gas conveying plate 244, the fifth set of holes 260 and the first set of holes 212 form (define) an internal flow path for supplying gas to the nozzle 116 through the conduit 224. The internal flow path can also be referred to as the internal air chamber of the nozzle 116.

[0186] The hollow portion of the gas delivery plate 244, the fifth group of holes 260, and the first group of holes 212 form (define) the inner air chamber of the baffle 127. The internal flow path of the nozzle 116 is in fluid communication with the inner air chamber of the baffle 127. The internal flow path is separated from and not in fluid communication with the second, third, and fourth groups of holes 210, 262, and 264, separated from and not in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and separated from and not in fluid communication with the gap 250 between the gas delivery plate 244 and the opening 204 in the base plate 126.

[0187] Near the lower end of the vertical portion 222 of tube 192, there are multiple angular holes 270. The angular holes 270 are located radially along the x-axis opposite a recess 239 in the housing 190. The angular holes 270 are in fluid communication with an annular volume 232 between the vertical portion 202 of housing 190 and the vertical portion 222 of tube 192. The angular holes 270 extend radially inward and downward from the lower edge of the vertical portion 222 of tube 192 at an angle relative to the z-axis. The angular holes 270 extend through the base 220 of tube 192 to a slit 246 within the base 220 of tube 192.

[0188] The connecting plate 240 of the baffle 127 includes multiple arc-shaped slits, in Figures 10A-10B In section 12, these are shown as 272-1, 272-2, and 272-3 (collectively referred to as arc-shaped slit 272). The arc-shaped slit 272 is described below. Figure 12 Detailed description. In Figure 5 In the view shown, only two arcuate slits, 272-1 and 272-2, are visible. Arcuate slit 272 extends along the z-axis through the connecting plate 240 of the baffle 127. Arcuate slits 272 are arranged around the hollow portion at the center of the connecting plate 240 of the baffle 127. Arcuate slits 272 lie on a circle with a diameter larger than that of the rod 242 of the baffle 127. Therefore, arcuate slits 272 are in fluid communication with the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas delivery plate 244. Arcuate slits 272 are also in fluid communication with the second, third, and fourth sets of holes 210, 262, and 264 in the gas delivery plate 244 of the baffle 127.

[0189] The arc length and radial width of the arcuate slit 272 are configured to guide gas flow at an appropriate velocity into the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. The shape of the arcuate slit 272 generally conforms to the overall shape of the baffle 127, which is cylindrical in the example shown. Conversely, if the baffle 127 is square or rectangular, it can be manufactured using additive manufacturing techniques (e.g., 3D printing), and the slit 272 can also be square or rectangular, thus conforming to the corresponding overall shape of the baffle 127. The shape of the slit 272 needs to conform to the overall shape of the baffle 127 to provide a consistent and uniform gas flow through the baffle 127.

[0190] The corner holes 270 are arranged in groups around the lower edge of the vertical portion 222 of the tube 192 according to the position of the arcuate slits 272 in the connecting plate 240 of the baffle 127. The corner holes 270 are in fluid communication with the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas conveying plate 244. Therefore, the opening 236 in the vertical portion 202 of the inlet 194, the channel 237, and the housing 190, the groove 238 in the vertical portion 222 of the pipe 192, the annular volume 232 between the vertical portion 222 of the pipe 192 and the vertical portion 202 of the housing 190, the groove 239 in the vertical portion 202 of the housing 190, the corner hole 270, the arcuate slit 272, the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas conveying plate 244, the second, third, and fourth sets of holes 210, 262, and 264 in the gas conveying plate 244 of the baffle 127, and the gap 250 between the gas conveying plate 244 and the opening 204 in the base plate 126 form (defining) an external flow path for supplying gas to the nozzle 116 through the inlet 194. This external flow path can also be referred to as the external air chamber of the nozzle 116. The external flow path is separate from and does not communicate with the internal flow path. That is, the outer air chamber of the nozzle 116 and the inner air chamber of the nozzle 116 are not in fluid communication.

[0191] The arcuate slit 272 in the connecting plate 240 of the baffle 127 and the second, third, and fourth sets of holes 210, 262, and 264 in the gas delivery plate 244 of the baffle 127 form (define) the outer inflation chamber of the baffle 127. The external flow path of the nozzle 116 is in fluid communication with the outer inflation chamber of the baffle 127. The outer inflation chamber of the baffle 127 is separate from and not in fluid communication with the inner inflation chamber of the baffle 127. Therefore, the internal and external flow paths (i.e., the internal and external inflation chambers) of the nozzle 116 and the baffle 127 are separated from each other (i.e., not in fluid communication). Therefore, the gas flowing through the internal and external flow paths (i.e., the internal and external inflation chambers) of the nozzle 116 and the baffle 127 will not mix in the nozzle 116 and the baffle 127.

[0192] For convenience, the internal flow path and internal air chamber of nozzle 116 and baffle 127 can be referred to as the first flow path and first air chamber of nozzle 116 and baffle 127, respectively. The external flow path and external air chamber of nozzle 116 and baffle 127 can be referred to as the second flow path and second air chamber of nozzle 116 and baffle 127, respectively. The first gas supplied to nozzle 116 through conduit 224 flows through the first flow path and first air chamber of nozzle 116 and baffle 127. The second gas supplied to nozzle 116 through inlet 194 flows through the second flow path and second air chamber of nozzle 116 and baffle 127. The first gas does not mix with the second gas in nozzle 116 and baffle 127. In some examples, the first gas and the second gas can be the same. For example, the same gas can be supplied simultaneously, sequentially, or otherwise via the first and second air chambers.

[0193] Example of nozzle components Figure 6-9 Examples and multiple views of the base plate 126, housing 190, and tube 192 of the nozzle 116 are shown. Figure 6 The base plate 126 is shown. Figures 7A-7E The casing 190 is shown. Figure 8 and Figure 9 The tube 192 is shown. See also the baffle 127 of the nozzle 116. Figure 10A-16 Show and describe in detail.

[0194] Figure 6 A top perspective view of the base plate 126 is shown. The lower surface of the base plate 126 includes an opening 204 through which a baffle 127 is arranged in the nozzle 116, as described above. The upper surface of the base plate 126 includes a slit 230. The bases 220 and 200 of the tube 192 and the housing 190 are arranged in the slit 230, as described above. When the base plate 126, the housing 190, and the tube 192 are manufactured as separate components, the base plate 126 includes a circular recess 280 in the slit 230. The circular recess 280 surrounds the opening 204. A sealing element (e.g., an O-ring) is arranged in the circular recess 280 to seal the bottom of the base 220 of the tube 192 to the slit 230. When the nozzle 116 (e.g., base plate 126, housing 190, and tube 192) is manufactured as a single, integrated, one-piece component (e.g., using additive manufacturing techniques such as 3D printing), the circular groove 280 is not necessary and can be eliminated.

[0195] Figures 7A-7E Multiple views of the casing 190 are displayed. Figure 7A A side view of the housing 190 is shown, revealing the base 200 and the vertical portion 202 of the housing 190. The side view also shows the arcuate member 284 (e.g., covering the opening 236 in the vertical portion 202 of the housing 190) that covers the opening. Figure 7E(As shown). The cross-sectional view along line AA is shown. Figure 7C The following will describe it.

[0196] Figure 7B A top view of the casing 190 is shown, which reveals the inlet 194 and opening 225. A cross-sectional view along line BB is also shown. Figure 7D The following will describe it. Figure 7C The inlet 194, opening 236, and groove 239 in the vertical portion 202 of the housing 190 are shown. Figure 7C It also shows a channel 237 in the vertical portion 202 of the housing 190 that connects the inlet 194 to the opening 236.

[0197] Figure 7D The opening 225, inlet 194, and channel 237 in the vertical portion 202 of the housing 190 are shown. Figure 7D An opening 282 in the side wall of the vertical portion 202 of the housing 190 is also shown. The opening 282 provides an inlet to form a channel 237 in the vertical portion 202 of the housing 190. After the channel 237 is formed, the opening 282... Figure 7E The arcuate member 284 shown is closed. When the nozzle 116 (e.g., base plate 126, housing 190, and tube 192) is made into a single, integrated, one-piece component (e.g., using 3D printing), the opening 282 and the arcuate member 284 are not necessary and can be eliminated.

[0198] Figure 8 and Figure 9 Multiple views of tube 192 are displayed. Figure 8 A side view of tube 192 is shown, which shows conduit 224, base 220 with slit 246, and corner hole 270 of vertical portion 222 surrounding the edge of vertical portion 222. Figure 8 Alignment pins 285, which engage with holes 286 in the top surface of the connecting plate 240 of the baffle 127 in slit 246, are also shown. These pins are used to orient the baffle 127 such that the other ends of the corner holes 270 at slit 246 are aligned with the arcuate slits 272 in the connecting plate 240 of the baffle 127.

[0199] In some examples, alignment pins 285 may be provided on the top surface of the connecting plate 240 of the baffle 127, and holes 286 may be provided in the slits 246 in the base 220 of the tube 192. Alternatively, alignment pins 285 and holes 286 may be omitted when the nozzle 116 and the baffle 127 are manufactured as a single, integrated, one-piece structure (e.g., using 3D printing).

[0200] Figure 9A bottom view of the tube 192 is shown, showing a slit 246 in the base 220 of the tube 192, wherein the other end of a corner hole 270 is located at the slit 246, and the corner hole 270 is arranged around the edge of the vertical portion 222 of the tube 192. Figure 9 Grouped corner holes 270 are also shown so that the other end of the corner hole 270 in the slit 246 is aligned with the arcuate slit 272 in the connecting plate 240 of the baffle 127. The other end of the corner hole 270 at the slit 246 in the base 220 of the tube 192 mates with the arcuate slit 272 in the connecting plate 240 of the baffle 127.

[0201] baffle example Figure 10A-16 The baffle 127 is shown in detail. Figures 10A-10C Different perspective views of baffle 127 are shown. Figure 11A and Figure 11B A side view of baffle 127 is shown. Figure 12 and Figure 15 The top and bottom views of the baffle 127 are shown respectively. Figure 13 , Figure 14 and Figure 16 Different cross-sectional views of baffle 127 are shown.

[0202] Figure 10A The top perspective view of baffle 127 is shown. Figure 10B A side perspective view of baffle 127 is shown. Figure 10C The bottom perspective view of baffle 127 is shown. For the sake of brevity, the elements (features) of baffle 127 are labeled with the same reference numerals and will not be repeated as described above.

[0203] exist Figure 10A and Figure 10B In the middle, the baffle 127 includes a connecting plate 240, a rod 242, and a gas conveying plate 244, as mentioned above. Figure 5 The following description is provided. The connecting plate 240, rod 242, and gas conveying plate 244 are all cylindrical and have different diameters. For example, the diameter of rod 242 is smaller than the diameter of gas conveying plate 244, and the diameter of gas conveying plate 244 is smaller than the diameter of connecting plate 240. Rod 242... Figures 10A-10C Invisible in the middle, but visible in Figure 11A , 11B In 13 and 16. Gas conveying plate 244 includes plate 290 and truncated conical portion 292 (in Figure 10C (See image) and ring 294. Plate 290 and ring 294 have the same outer diameter. The thickness (height) of connecting plate 240, rod 242 and gas conveying plate 244 also differs when measured along the z-axis. For example, the thickness of rod 242 is less than the thickness of connecting plate 240, and the thickness of gas conveying plate 244 is less than the thickness of rod 242.

[0204] Although plate 290, truncated cone 292, and ring 294 are shown and described as different components of gas delivery plate 244, gas delivery plate 244 is a single, integrated, and monolithic component. Furthermore, although baffle 127 is described as comprising connecting plate 240, rod 242, and gas delivery plate 244, baffle 127 can be manufactured as a single, integrated, and monolithic component (e.g., using additive manufacturing techniques such as 3D printing).

[0205] The upper surface of the connecting plate 240 includes an opening 245, an arcuate slit 272, a hole 286 that mates with the alignment pin 285, and a second set of holes 210, which have been described above. Figure 5 The description is as follows. The upper surface of the connecting plate 240 includes an annular slit 247 surrounding the opening 245, and the annular slit 247 is surrounded by an arcuate slit 272. A sealing element (e.g., an O-ring) is provided in the annular slit 247 for sealing the top surface of the connecting plate 240 to the bottom of the base 220 of the tube 192. The annular slit 247 is not necessary and can be omitted when the baffle 127 is diffusely bonded to the bottom of the base 220 of the tube 192, or when the nozzle 116 (e.g., base plate 126, housing 190, and tube 192) and the baffle 127 are made into a single, integrated, one-piece component (e.g., using 3D printing).

[0206] exist Figure 10C Another perspective view of the baffle 127 is shown, with the baffle 127 in a reversed (inverted) position. The truncated cone 292 and ring 294 of the gas delivery plate 244 are shown in detail. The diameter of the first end of the truncated cone 292 (i.e., the upper end when the baffle 127 is installed in the nozzle 116) is smaller than the diameter of the second end of the truncated cone 292 (i.e., the lower end when the baffle 127 is installed in the nozzle 116). The upper end of the truncated cone 292 is connected to the bottom of the plate 290. Figure 11A , 13 As can be seen more clearly in Figure 16, the lower end of the truncated conical portion 292 defines the bottom of the baffle 127. The lower end of the truncated conical portion 292 includes the details mentioned above. Figure 5 The first, second, and third groups of holes 212, 210, and 262 are described. The fifth group of holes 260, visible around the edge of the truncated conical portion 292, is shown below. Figure 14 It is generally formed in the truncated conical portion 292.

[0207] When the baffle 127 is installed in the nozzle 116, the ring 294 extends vertically downward from the outer diameter (OD) of the plate 290. The OD of the ring 294 is the same as the OD of the plate 290. The ring 294 surrounds the truncated cone portion 292, as shown in... Figure 11A and 11BThis can be seen more clearly in the image. The inner portion of ring 294 tapers radially outward, parallel to the outer or peripheral edge of the truncated conical portion 292, which also tapers radially outward (see image). Figure 11A , 13 And 16). The outer periphery of the truncated cone 292 and the inner portion of the ring 294 define a gap 296 between the truncated cone 292 and the ring 294. Gas flowing through the fifth set of holes 260 flows through the gap 296 and is guided downward ( Figure 10C (Display baffle 127 is in a reversed or inverted position) facing substrate 124 ( Figure 1 (As shown) flow. For example, the size of gap 296 (i.e., the width along the x-axis) can be changed by altering the ID of ring 294 and / or the OD of the bottom of truncated cone 292. Depending on the application, gap 296 can be reduced or increased to restrict or increase airflow from the fifth set of holes 260 and gap 296 toward substrate 124. Thus, the fifth set of holes 260 forms the inner gas chamber of baffle 127, and the fifth set of holes 260, gap 296, and the gradually tapering portions of truncated cone 292 and ring 294 guide the gas flowing through the inner gas chamber of baffle 127 downward toward substrate 124.

[0208] exist Figure 10A-16 In the example of baffle 127 shown, the truncated conical portion 292 is shown with its first end, having a smaller diameter, connected to the connecting plate 290. However, in other examples, the second end of the truncated conical portion 292, having a larger diameter, can be connected to the connecting plate 290. In such a design, the inner portion of the ring 294 tapers radially inward, parallel to the outer portion or periphery of the truncated conical portion 292. In other examples, the element 292 may be cylindrical instead of truncated conical, in which case the ring 294 is also cylindrical or annular, and the inner portion of the ring 294 is vertical (i.e., parallel to the z-axis and parallel to the outer or periphery of the cylindrical component 292).

[0209] Figure 11A and Figure 11B A side view of baffle 127 is shown. Figure 11A The ring 294 is partially shown to illustrate the fifth set of holes 260 around the edge of the truncated conical portion 292. Figure 11A The inner portion of the ring 294, which tapers gradually parallel to the outer periphery of the truncated conical portion 292, is also shown. Figure 11B A ring 294 is shown that covers the fifth set of holes 260 around the edge of the truncated conical portion 292. Figure 11A and Figure 11B The side view also shows the annular volume 252 between the rod 242 and the connecting plate 240 and the gas conveying plate 244, as described above. Figure 5These side views also show the fourth set of holes 264 on the edge of rod 242, which will be described in detail below.

[0210] Figure 12 A top view of baffle 127 is shown. The arcuate slit 272 and the hole 286 that mates with the alignment pin 285 are visible, as previously mentioned. Figure 5 As described above. Some of the holes 210 in the second set of holes 210 in the plate 290 of the baffle 127 are visible through the arcuate slit 272. See above. Figure 5 The opening 245 in the connecting plate 240 extends through the connecting plate 240 and the rod 242, and partially extends through the gas conveying plate 244. The opening 245 extends through the plate 290 into the upper end of the truncated cone portion 292. Therefore, the upper end of the truncated cone portion 292 is visible through the opening 245 in the top view of the baffle 127. Furthermore, at least one of the first set of holes 212 at the bottom center of the baffle 127 (i.e., the center of the lower end of the truncated cone portion 292) is also visible through the opening 245 in the top view of the baffle 127. In some examples, multiple holes in the first set of holes 212 may be located near the hole at the bottom center of the baffle 127 (i.e., at the center of the lower end of the truncated cone portion 292). A cross-section of the baffle 127 taken along line CC is shown below. Figure 13 As shown.

[0211] Figure 13 Showing along Figure 12 The cross-sectional view of baffle 127 taken along line CC is shown. The arcuate slit 272-1 extending along the z-axis through connecting plate 240 is visible. The opening 245 extending along the z-axis through connecting plate 240 and rod 242, through plate 290, and partially extending to the truncated conical portion 292 is visible. The ring 294, which gradually tapers parallel to and surrounds the truncated conical portion 292, is visible. The first set of holes 212 extending from the lower end of the truncated conical portion 292 to the fifth set of holes 260 is visible. The cross-section of the truncated conical portion 292 taken along line DD is shown below. Figure 14 As shown.

[0212] Figure 14 Display along Figure 13 The diagram shows a cross-sectional view of the truncated conical portion 292 taken by line DD. The fifth set of holes 260 is positioned laterally (along the x-axis) within the truncated conical portion 292. For example, the fifth set of holes 260 is defined by forming two sets of orthogonal channels laterally (along the x-axis) within the truncated conical portion 292. In some examples, the two sets of orthogonal channels can be formed by cross-drilling the fifth set of holes 260 radially through the truncated conical portion 292. However, the cumbersome cross-drilling process can be eliminated by using additive manufacturing techniques (such as 3D printing) to fabricate the baffle 127 or at least the gas delivery plate 244. Additive manufacturing also allows for the formation of more complex channels (e.g., spiral channels), which is not feasible in CNC processes typically used to form orthogonal channels.

[0213] The first set of holes 212 is formed from the lower end of the truncated conical portion 292 to connect the first set of holes 212 to the fifth set of holes 260. The second set of holes 210 extends through the plate 290 and the truncated conical portion 292. The third set of holes 262 extends radially outward from the lower end of the truncated conical portion 292 at an angle to the edge of the rod 242 of the baffle 127, as described below. Figure 16 Further detailed description. The third group of holes 262 is along a circle (also shown in...). Figure 15 The 304) arrangement is shown below. Figure 15 Further detailed description. When using 3D printing to manufacture baffle 127, the first, second, and third sets of holes 212, 210, and 262 can also be formed together with the other parts of baffle 127.

[0214] Figure 15 A bottom view of the baffle 127 is shown. The first, second, and third groups of holes 212, 210, and 262 are visible. The layout and geometric arrangement of the first, second, and third groups of holes 212, 210, and 262 will now be described in further detail. The layout and geometric arrangement of these holes will be described below from two perspectives: first, from the perspective of the nozzle 116, which integrates the nozzle and baffle 127; and second, from the perspective of the baffle 127 alone. Therefore, the description from the perspective of the nozzle 116 and the description from the perspective of the baffle 127 will have some overlap (i.e., repetition).

[0215] From the angle of nozzle 116, nine holes in the first set of holes 212 form a first square 300 (also referred to as a first square region) around the center of the lower surface of baffle 127. The lower surface of baffle 127 is the lower surface of the gas delivery plate 244 of baffle 127 or the lower surface of the truncated cone portion 292. One or more holes in the first set of holes 212 are located within the first square 300. In one example, according to the process formulation, the hole 212 is located at the center of the first square 300, as shown. In another example, although not shown, the hole 212 at the center of the first square 300 may be optional and may be omitted according to the process formulation. None of the second set of holes 210 are located within the first square 300. Four holes in the second set of holes 210 form a second square 302 (also referred to as a second square region) larger than the first square 300, and it surrounds the first square 300. The center of the second square 302 coincides with the center of the first square 300 and the center of the lower surface of baffle 127. Each of the four holes in the second group of holes 210 is located radially outside the corresponding hole at the four corners of the first square 300 in the nine holes of the first group of holes 212.

[0216] The lower surface of the baffle 127 further includes a third set of holes 262, the diameter of which is less than or equal to the diameter of the first and second sets of holes 212, 210. At least four of the third set of holes 262 are located within the second square 302 and outside the first square 300. In some examples, eight of the third set of holes 262 are located within the second square 302 and outside the first square 300. At least one of the third set of holes 262 and two of the first set of holes 212 form a triangular pattern, and no other holes are located within the triangle within the second square 302.

[0217] The third set of holes 262 is located on circle 304, which is concentric with the center of the lower surface of the first square 300, the second square 302, and the baffle 127. The corners of the first square 300 are located on circle 304. The second square 302 surrounds circle 304 and the first square 300 on its outer side. The third set of holes 262 is in fluid communication with the second set of holes 210, but not with the first set of holes 212.

[0218] The hole pattern described above provides uniform gas flow and distribution from baffle 127 to substrate 124. Specifically, if gas is supplied simultaneously via these holes (e.g., in a CVD process), the hole pattern allows gas mixing between baffle 127 and substrate 124 without the need for a panel with holes distributed throughout the entire panel. Furthermore, the hole pattern relationships between the first, second, and third groups of holes (including spaces designated as having no holes) improve the gas delivery uniformity of at least two separate delivery channels. For example, the hole pattern relationships will allow some process formulations to mix one or more gases more uniformly outside the lower surface of baffle 127 to provide approximately equal concentrations of different gases in any particular region of substrate 124. Alternatively, if gas is supplied sequentially via these holes (e.g., in an ALD process), the hole pattern provides uniform gas flow and distribution from baffle 127 to substrate 124, thereby improving process uniformity in the central region of substrate 124 without the need for a panel with holes distributed throughout the entire panel. The number of holes in the hole pattern described above is for illustrative purposes. Different numbers of holes can be selected according to process requirements and the diameter of substrate 124 to provide uniform gas flow and distribution from baffle 127 to substrate 124.

[0219] Two diameters 306-1 and 306-2 (collectively referred to as diameters 306) on the lower surface of baffle 127 are perpendicular to each other and intersect at the center of the lower surface of baffle 127, forming four quadrants on the lower surface of baffle 127. The two diameters 306 contain only the first set of holes 212. Each quadrant contains one or more of the third set of holes 262. Each diameter contains nine of the first set of holes 212.

[0220] The first and second groups of holes 212, 210 are arranged in an alternating pattern. Each hole in the first and second groups of holes 212, 210 is spaced a predetermined distance from its adjacent hole in the first and second groups of holes. In some examples, the first and second groups of holes 212, 210 have the same diameter. The first and second groups of holes 212, 210 are arranged in rows and columns, as shown below. Figure 15 As shown. In some examples, although not shown, the diameter of the first set of holes 212 may differ from that of the second set of holes 210. Furthermore, in some examples, although not shown, the first and second sets of holes 212, 210 may be arranged along concentric circles with increasing radii, wherein the diameter of a hole on at least one circle differs from the diameter of a hole on at least one other circle. In other examples, the first and second sets of holes 212, 210 may be arranged in various patterns. For example, the first and second sets of holes 212, 210 may be arranged in a radially expanding shape, which may be any polygonal shape.

[0221] From the perspective of the baffle 127, the gas delivery plate 244 (i.e., the lower surface of the truncated conical portion 292 of the baffle 127) includes a first set of holes 212 and a second set of holes 210 arranged in an alternating pattern. The first and second sets of holes 212, 210 have the same diameter. In some examples, although not shown, the diameter of the first set of holes 212 may be different from that of the second set of holes 210. Furthermore, in some examples, although not shown, the first and second sets of holes 212, 210 may be arranged along concentric circles with increasing radii, wherein the diameter of the hole on at least one circle is different from the diameter of the hole on at least one other circle.

[0222] One hole in the first group of holes 212 is located at the center of the gas conveying plate 244. Eight holes in the first group of holes 212 form a first square 300 at the center of the gas conveying plate 244. One or more holes in the first group of holes 212 are located within the first square 300. None of the holes in the second group of holes 210 are located within the first square 300. Four holes in the second group of holes 210 form a second square 302, the center of which coincides with the center of both the first square 300 and the center of the gas conveying plate 244. Each of the four holes in the second group of holes 210 is located radially outside the corresponding hole at one of the four corners of the first square 300 from among the eight holes in the first group of holes 212.

[0223] The gas delivery plate 244 also includes a third set of holes 262, the diameter of which is less than or equal to the diameter of each of the first and second sets of holes 212, 210. At least four of the third set of holes 262 are located within a second square 302 and outside a first square 300. At least one of the third set of holes 262 and two of the first set of holes 212 form a triangle, within which no other holes are located. The third set of holes 262 are arranged along a circle 304 concentric with the centers of the first and second squares 300 and the center of the gas delivery plate 244. The corners of the first square 300 lie on the circle 304. The second square 302 surrounds the circle 304 and the first square 300 on the outside. The third set of holes 262 are in fluid communication with the second set of holes 210 but not with the first set of holes 212. Two diameters 306 of the gas delivery plate 244 are perpendicular to each other and intersect at the center of the gas delivery plate 244, forming four quadrants. These two diameters 306 contain only the first set of holes 212. Each of the four quadrants contains two holes from the third group of holes 262. Each diameter contains nine holes from the first group of holes 212.

[0224] Figure 16 Showing along Figure 15 The diagram shows a cross-sectional view of baffle 127 taken by line EE. Baffle 127 is shown inverted. A fourth set of holes 264 extends radially inward and downward at an angle from the edge of rod 242, passing through plate 290 and truncated cone 292 of gas delivery plate 244, reaching a third set of holes 262 on the lower surface of gas delivery plate 244. A channel 266 connects each of the third and fourth sets of holes 262, 264. Channel 266 and the third and fourth sets of holes 262, 264 have the same diameter. Each of the third and fourth sets of holes 262, 264 is a single, angled (inclined), continuous hole.

[0225] The annular volume 252 between the third and fourth sets of holes 262, 264 and channel 266 fluid communication connecting plate 240 and gas conveying plate 244, the arc-shaped slit 272, the second set of holes 210 and the opening 204 in the bottom plate 126 (see...) Figure 5 The gap 250 between the third and fourth groups of holes 262, 264 and channel 266 is not in fluid communication with the following: opening 245 in connecting plate 240, hollow portion of connecting plate 240 and rod 242, partially hollow portion of gas conveying plate 244, fifth group of holes 260, first group of holes 212 connected to fifth group of holes 260 (not visible in the view shown), and gap 296 between ring 294 and truncated conical portion 292 of gas conveying plate 244.

[0226] The first gas flowing through the opening 245 in the connecting plate 240 flows through the hollow portion of the connecting plate 240 and the rod 242, the partially hollow portion of the gas conveying plate 244, the fifth set of holes 260, the first set of holes 212 connected to the fifth set of holes 260 (not visible in the shown view), and the gap 296 between the ring 294 and the truncated conical portion 292 of the gas conveying plate 244. The second gas system flowing through the arcuate slit 272 flows through the annular volume 252 between the connecting plate 240 and the gas conveying plate 244, the third and fourth sets of holes 262, 264, the second set of holes 210, and the gap 250 between the gas conveying plate 244 and the opening 204 in the base plate 126 (see...). Figure 5 Therefore, the first gas and the second gas do not mix in the baffle 127.

[0227] Example of size The dimensions of the various components and features of nozzle 116 and baffle 127 depend on, and are therefore functions of, the dimensions of substrate 124. These dimensions can vary depending on the dimensions of substrate 124. For example, the diameter of base plate 126 is greater than or equal to the diameter of substrate 124 to ensure proper flow and control of the precursor over substrate 124. The diameters of the opening 204 in base plate 126 and the diameters of baffle 127 (i.e., the diameters of connecting plate 240, rod 242, and gas delivery plate 244) vary with the diameter of base plate 126, which in turn varies with the diameter of substrate. Therefore, examples of the dimensions of the various components and features of nozzle 116 and baffle 127 are provided below in relative terms. That is, the dimensions of two components or features are expressed as a ratio or percentage of each other's dimensions. However, regardless of the variations, the above descriptions of the dimensions of the various components and features of nozzle 116 and baffle 127, including "greater than," "less than," "equal to," "same as," "greater than or equal to," and "less than or equal to," remain constant.

[0228] For example, the diameter of the lower surface of baffle 127 (i.e., gas delivery plate 244) is 0.5-50% of the diameter of the lower surface of the base plate 126 of nozzle 116. This dimensional relationship is not merely a design choice, but also defines the area or radius on substrate 124 from its center that can receive the gas supplied by baffle 127. For example, if the diameter of baffle 127 is less than 5%, the airflow from baffle 127 may cause undesirable jetting in the central portion of substrate 124 (concentrated gas delivery leads to non-uniformity).

[0229] In some processes, having a small baffle 127 offers advantages in terms of deposition rate. However, there are practical limitations to the fabrication of the baffle 127 as a separable component. For example, when the baffle 127 is fabricated by welding separately manufactured elements 240, 242, 244, its size cannot be reduced beyond certain limits. In other applications, the baffle 127 can be larger to aid in airflow uniformity.

[0230] Although the gas from baffle 127 is primarily directed toward the central region of substrate 124, the base plate 126 of nozzle 116 requires a larger bottom surface area for various reasons and technical effects. For example, the bottom surface of base plate 126 of nozzle 116 has several applications: First, the bottom surface of base plate 126 performs thermal management because it absorbs heat from base 114. Second, the bottom surface of base plate 126 provides a surface above substrate 124 to hold and guide the precursor to the region of interest on substrate 124, rather than allowing the precursor to extend throughout the entire processing chamber 112. To achieve these objectives, the bottom surface of base plate 126 can have various dimensions depending on the dimensions of substrate 124 and process parameters.

[0231] Furthermore, nozzles with panels typically have gas delivery orifices across the entire panel, covering the dimensions of substrate 124. However, as mentioned above, these nozzles suffer from the problem of orifices on the panel becoming clogged over time, requiring maintenance (cleaning) and eventually nozzle replacement, which increases not only costs but also tooling downtime and throughput. In contrast, with the nozzle 116 including baffle 127, the problems of nozzle clogging and cleaning are solved by having orifices only in the central region of nozzle 116. Moreover, baffle 127 can be replaced or cleaned more easily and at a lower cost without replacing the entire nozzle. Furthermore, using nozzle 116 with baffle 127 increases wafer yield because baffle 127 can supply precursors at a faster flow rate, allowing for faster deposition on substrate 124, compared to a typical nozzle with a panel having hundreds (or thousands) of orifices, which requires cleaning thousands of orifices between different precursor feeds, resulting in lengthy purging times.

[0232] Similar to baffle 127, the diameter of the opening 204 in the base plate of nozzle 116 is also 0.5-50% of the diameter of nozzle base plate 126. This dimensional relationship is not merely a design choice, but rather to ensure consistency with the dimensions of baffle 127 and the gap 250 between baffle 127 and base plate 126, which is important for guiding airflow through gap 250 toward substrate 124. Therefore, the dimensions of opening 204 not only accommodate the installation of baffle 127 into nozzle 116 but also provide a suitable gap 250.

[0233] The diameter of the lower surface of baffle 127 (i.e., gas delivery plate 244) is 75-95% of the diameter of the opening 204 in the base plate 126 of nozzle 116. This dimensional relationship is not merely a design choice, but defines the gap 250 between baffle 127 and base plate 126, which is important for guiding airflow through gap 250 toward substrate 124. In some embodiments, the lower surface of baffle 127 is not flat. For example, the bottom surface may include one or more recessed or protruding areas.

[0234] In baffle 127, the diameters of the first and second sets of holes 212, 210 are 1-25% of the diameter of the fifth set of holes 260, and the diameters of the third and fourth sets of holes 262, 264 and channel 266 are 10-100% of the diameters of the first and second sets of holes 212, 210. The diameters of these holes are not merely a design choice, but determine the flow rate and pressure at which gas flows from these holes to the substrate 124, which is important for preventing undesirable jetting (non-uniformity caused by concentrated gas delivery) in the central portion of the substrate 124. Although the third set of holes 262 appears smaller than the first and second sets of holes 212, 210, the third set of holes 262 can be as close as possible to the dimensions of the first and second sets of holes 212, 210. However, the size of the third set of holes 262 cannot be too large, and the angle of the channel 266 associated with the third set of holes 262 cannot allow the third set of holes 262 to penetrate the outer gas chamber of baffle 127. Furthermore, the angle of the channel 266 connecting the third and fourth sets of holes 262, 264 (e.g., 45-85 degrees relative to the z-axis) is also configured to guide gas from the annular volume 252 through the third set of holes 262 to the central portion of the substrate 124 to ensure process uniformity of the central portion of the substrate 124.

[0235] The number of holes in each of the aforementioned groups also serves a specific purpose. For example, although only one hole 212 of the first group of holes 212 is displayed at the center of the lower surface of baffle 127, more holes 212 may be provided near the central hole 212 (e.g., within the first square 300), depending on the application. However, in some applications, providing more holes 212 in the central region of the lower surface of baffle 127 may lead to a jetting effect, which can adversely affect the deposition uniformity of substrate 124. Whether there are one or more holes 212 in the central region of the lower surface of baffle 127 also depends on the size of the first and second group holes 212, 210. If the diameters of the first and second group holes 212, 210 are large, fewer holes 212 can be placed in the central region of the lower surface of baffle 127. Since baffle 127 can be a removable component of nozzle 116, baffle 127 can have different hole sizes and patterns to suit different process applications (e.g., thermal ALD vs. CVD, or larger holes for more viscous precursor molecules, etc.).

[0236] In the baffle 127, the fifth set of holes 260 is larger than the first set of holes 212 for the following reason. As described above, the fifth set of holes 260 is arranged laterally in the truncated conical portion 292 of the gas delivery plate 244 of the baffle 127. Therefore, the fifth set of holes 260 provides a passage for gas to pass through the inner inflation chamber of the baffle 127, while the first set of holes 212 are separate holes. Therefore, the fifth set of holes 260 must be larger than the first set of holes 212 to deliver fluid to the smaller first set of holes 212 and the gap 250 between the baffle 127 and the opening 204 in the lower surface of the base plate 126 of the nozzle 116.

[0237] The grooves 238 and 239 in the tube 192 and the housing 190 are configured to reduce the velocity of gas flowing through the annular volume 232 between the tube 192 and the housing 190 and to enhance flow uniformity. The angle of the corner hole 270 and the arc length and radial width of the arcuate slit 272 are also configured to guide the gas flow at an appropriate velocity to the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas delivery plate 244. Furthermore, the angle of the channel 266 connecting the third and fourth sets of holes 262 and 264 (e.g., 45-85 degrees relative to the z-axis) is also configured to guide gas from the annular volume 252 through the third set of holes 262 to the central portion of the substrate 124. Furthermore, the inner portion of the ring 294 and the outer periphery of the truncated cone 292 gradually taper at a certain angle (e.g., 15-45 degrees), which is also configured to guide gas from the fifth set of holes 260 through the gap 296 between the ring 294 and the truncated cone 292 and radially outward to the substrate 124.

[0238] Part Two: External Features of the Nozzle and Baffle Figure 17-25 Examples of views of nozzle 116 and baffle 127 are shown. Figure 17-25 Some of the views shown in the text have been referred to above. Figure 1-16 To display and describe. Nevertheless, due to... Figure 1-16 The accompanying figures already contain reference numerals, some of which are in... Figure 1-16 Some views are displayed and in Figure 17-25 Other views of the nozzle 116 and baffle 127 shown again in the figure no longer use reference numerals.

[0239] Figure 17 An example perspective view of a nozzle 116 with a baffle 127 is shown. Figure 17 Similar to Figure 2 The image shows the base plate 126 and rod 128 of the nozzle 116, as detailed above. Figure 1-16 It was described. Figure 18 Showing Figure 17 An example of a side view of the nozzle 116 shown. Figure 18 Similar to Figure 3 Therefore, for the sake of brevity, it will not be described further. Figure 19 Showing Figure 17 An example of a top view of the nozzle 116 is shown. Figure 19 The image shows an example of an optional fastener for connecting the housing 190 and the tube 192 together and to the base plate 126 of the nozzle 116. Figure 20 Showing Figure 17 Example of a bottom view of nozzle 116 shown. Figure 20 Similar to Figure 4 Therefore, for the sake of brevity, it will not be described further.

[0240] Figure 21 Showing Figure 17 An example of a perspective view of the baffle 127 of the nozzle 116 shown, wherein the baffle 127 is upright. Figure 21 Similar to Figure 10B Therefore, for the sake of brevity, it will not be described further. Figure 22 Showing Figure 17 An example of a perspective view of the baffle 127 of the nozzle 116 shown, wherein the baffle 127 is inverted. Figure 22 Similar to Figure 10C Therefore, for the sake of brevity, it will not be described further. Figure 23 Showing Figure 22 Example of a side view of the baffle 127 shown. Figure 23 Similar to Figure 11B Therefore, for the sake of brevity, it will not be described further. Figure 24 Showing Figure 22 Example of a top view of the baffle 127 shown. Figure 24 Similar to Figure 12 Therefore, for the sake of brevity, it will not be described further. Figure 25 Showing Figure 22 Example of a bottom view of the baffle 127 shown. Figure 25 Similar to Figure 15 Therefore, for the sake of brevity, it will not be described further.

[0241] The foregoing description is merely illustrative in nature and is in no way intended to limit this disclosure, its application, or its use. The broad teachings of this disclosure can be implemented in various forms. Therefore, while this disclosure includes specific examples, its true scope should not be so limited, as other modifications will become apparent upon examination of the drawings, specification, and appended claims.

[0242] It should be understood that one or more steps in the method may be performed in different orders (or simultaneously) without altering the principles of this disclosure. Furthermore, while each embodiment is described above as having certain features, any one or more of those features described relative to any example of this disclosure may be implemented in the features of any example and / or combined with features of any other example, even if such combination is not explicitly described. In other words, the described examples are not mutually exclusive, and the substitution of one or more examples with each other remains within the scope of this disclosure.

[0243] Various terms are used to describe spatial and functional relationships between elements (e.g., between modules, between circuit elements, between semiconductor layers, etc.), including “connection,” “joint,” “coupled,” “adjacent,” “next to,” “on top of,” “above,” “below,” and “set.” Unless the relationship between the first and second elements is explicitly described as “direct,” the relationship described in the above disclosure can be a direct relationship, where no other intermediate element exists between the first and second elements, but it can also be an indirect relationship, where one or more intermediate elements exist between the first and second elements (spatially or functionally). As used herein, the phrase “at least one of A, B, and C” should be interpreted as meaning the use of a non-exclusive logical OR (A or B or C) logic and should not be interpreted as meaning “at least one of A, at least one of B, and at least one of C.”

[0244] In some implementations, the controller is part of a system, which may be part of the examples described above. Such a system may include semiconductor processing equipment, which includes one or more processing tools, one or more chambers, one or more platforms for processing, and / or specific processing components (wafer pedestals, gas flow systems, etc.). These systems may be integrated with electronics for controlling the operation of semiconductor wafers or substrates before, during, and after processing.

[0245] An electronic device may be referred to as a “controller”, which controls various components or sub-components of one or more systems. Depending on the processing requirements and / or system type, the controller may be programmed to control any process disclosed herein, including the delivery of process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, position and operation settings, wafer transfer tools and other transfer tools, and / or loading locks that are connected to or docked with a specific system.

[0246] In a broad sense, a controller can be defined as an electronic device that has various integrated circuits, logic, memory, and / or software for receiving instructions, issuing instructions, controlling operations, enabling cleaning operations, enabling endpoint measurements, etc. Integrated circuits can include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application-specific integrated circuits (ASICs), and / or one or more microprocessors or microcontrollers that execute program instructions (e.g., software).

[0247] Program instructions can be sent to the controller in the form of various individual settings (or program files), which define the operating parameters for performing a specific process on or for a semiconductor wafer or system. In some examples, the operating parameters may be part of a recipe defined by a process engineer to complete one or more processing steps during the fabrication of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or the bare die of the wafer.

[0248] In some implementations, the controller may be part of or coupled to a computer that is integrated with, coupled to, or otherwise networked to the system. For example, the controller may be in the "cloud" or be a whole or part of a fab host system, allowing remote access to wafer processing. The computer can then remotely access the system to monitor the current progress of manufacturing operations, examine the history of past manufacturing operations, check trends or performance standards of multiple manufacturing operations, change parameters of the current process, set processing steps to follow the current process, or initiate a new process.

[0249] In some examples, a remote computer (e.g., a server) can provide process recipes to the system via a network (which may include a local network or the Internet). The remote computer may include a user interface that enables the input or programming of parameters and / or settings, which are then transmitted from the remote computer to the system. In some examples, the controller receives instructions in the form of data specifying parameters for each processing step to be performed during one or more operations. It should be understood that the parameters may be specific to the type of process to be performed and the type of tool to which the controller is configured to interface with or control the tool.

[0250] Therefore, as described above, a controller can be distributed, for example, by comprising one or more discrete controllers networked together and operating toward a common purpose (such as the process and control described herein). An example of a distributed controller for such a purpose is one or more integrated circuits on-site communicating with one or more integrated circuits remotely (e.g., at the platform level or as part of a remote computer), which together control the process on-site.

[0251] Exemplary systems may include, but are not limited to, plasma etching chambers or modules, deposition chambers or modules, rotary rinsing chambers or modules, metal plating chambers or modules, cleaning chambers or modules, chamfering edge etching chambers or modules, physical vapor deposition (PVD) chambers or modules, chemical vapor deposition (CVD) chambers or modules, atomic layer deposition (ALD) chambers or modules, atomic layer etching (ALE) chambers or modules, ion implantation chambers or modules, track chambers or modules, and any other semiconductor processing systems that may be associated with or used for the manufacture and / or preparation of semiconductor wafers.

[0252] As described above, depending on one or more processing steps to be performed by the tool, the controller may communicate with one or more other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, neighboring tools, tools located throughout the plant, a host computer, another controller, or tools used in the transport of materials to and from the tool location and / or loading port in the semiconductor manufacturing plant.

Claims

1. A nozzle comprising: A plate comprising a first surface and an opening at the center of the first surface; and A baffle placed in the opening of the plate, the baffle extending through the opening into the plate, the baffle including a second surface located in a plane parallel to the first surface of the plate, and including a first set of holes and a second set of holes in the second surface, the first set of holes and the second set of holes not in fluid communication with each other.

2. The nozzle according to claim 1, wherein the second surface of the baffle is coplanar with the first surface of the plate.

3. The nozzle according to claim 1, wherein: The nine holes in the first group of holes form a first square around the center of the second surface of the baffle; One or more holes in the first group of holes are located within the first square; and None of the holes in the second group are located within the first square.

4. The nozzle according to claim 3, wherein: The four holes in the second set of holes form a second square larger than the first square, the second square having a center that coincides with the center of both the first square and the second surface of the baffle; and Each of the four holes is located radially outside the corresponding hole at one of the four corners of the first square among the nine holes.

5. The nozzle according to claim 4, wherein the second surface of the baffle further includes a third set of holes, the third set of holes having a diameter less than or equal to the diameter of the first set of holes and the second set of holes, and wherein at least four of the third set of holes are located inside the second square and outside the first square.

6. The nozzle according to claim 5, wherein at least one hole in the third group of holes and two holes in the first group of holes form a triangle, and there are no other holes within the triangle.

7. The nozzle of claim 5, wherein the third set of holes is located on a circle concentric with the center of the first square and the second square and the center of the second surface of the baffle, and wherein the corner of the first square is located on the circle.

8. The nozzle according to claim 5, wherein the third set of holes is in fluid communication with the second set of holes, but not with the first set of holes.

9. The nozzle according to claim 5, wherein: Two diameters that are perpendicular to each other and intersect at the center of the second surface of the baffle form four quadrants on the second surface of the baffle. The two diameters only include the first set of holes; and Each quadrant contains one or more holes from the third group of holes.

10. The nozzle of claim 9, wherein each diameter comprises nine holes from the first set of holes.

11. The nozzle of claim 1, wherein the nozzle is configured to directly supply one or more gases to the treatment chamber via the baffle.

12. The nozzle of claim 1, wherein the nozzle is configured to supply one or more gases to a substrate facing the plate via the baffle, and wherein the nozzle does not include a panel having an aperture facing the substrate.

13. The nozzle of claim 1, wherein the nozzle is configured to supply a first gas to a substrate facing the plate through the first set of orifices and to supply a second gas to the substrate facing the plate through the second set of orifices.

14. The nozzle according to claim 1, wherein the first set of holes and the second set of holes have the same diameter.

15. The nozzle of claim 1, wherein the first set of holes and the second set of holes are arranged along concentric circles, and wherein the holes on at least one circle have a different diameter than the holes on at least one other circle.

16. The nozzle of claim 1, wherein the first group of holes and the second group of holes are arranged in rows and columns.

17. The nozzle of claim 1, wherein the baffle is coupled to the plate by one or more fasteners.

18. The nozzle according to claim 1, wherein the plate and the baffle are integral.

19. The nozzle of claim 1, wherein the baffle includes a ring surrounding the second surface of the baffle, and the nozzle further includes a gap between the outer diameter of the ring and the inner diameter of the opening of the baffle.

20. The nozzle of claim 1, wherein the baffle includes a ring surrounding the second surface of the baffle, and wherein the outer diameter of the ring is smaller than the inner diameter of the opening of the baffle.

21. The nozzle of claim 1, wherein the edge of the first surface of the plate is rounded along the inner diameter of the opening of the plate.

22. The nozzle of claim 1, wherein the baffle includes a ring surrounding the second surface of the baffle, and the nozzle further comprises: The gap between the outer diameter of the ring and the inner diameter of the opening of the plate; The first set of holes in the baffle is configured to supply a first gas; The second set of holes in the baffle is separate from the first set of holes and is configured to supply a second gas; and The gap is configured to allow the second gas to pass through.

23. The nozzle of claim 1, wherein the first set of holes and the second set of holes are arranged in an alternating pattern.

24. The nozzle of claim 1, wherein each of the first group of holes and the second group of holes is spaced apart from an adjacent hole in the first group of holes and the second group of holes by a predetermined distance.

25. The nozzle according to claim 1, wherein the diameter of the second surface of the baffle is 75-99% of the diameter of the opening.

26. The nozzle according to claim 1, wherein the diameter of the second surface of the baffle is 0.5-50% of the diameter of the first surface of the baffle.

27. The nozzle according to claim 1, wherein the diameter of the opening is 0.5-50% of the diameter of the plate.

28. The nozzle according to claim 1, further comprising: A rod connected to a second surface of the plate, the second surface being opposite to the first surface. The rod includes a base coupled to a central region of the second surface of the plate, and includes a vertical portion extending vertically upward from the base.

29. The nozzle of claim 28, wherein the second surface of the plate (i) extends vertically upward from the outer diameter of the first surface by a first distance, (ii) after the first distance, extends radially inward at an angle relative to the first surface of the plate by a second distance, and (iii) after the second distance, extends radially inward parallel to the first surface of the plate by a third distance to the base of the rod.

30. A baffle for a nozzle, the baffle comprising: A connecting plate configured to connect the baffle to the nozzle; A rod extending from the connecting plate; and A gas delivery plate extending from the rod and including a first set of holes and a second set of holes for delivering one or more gases, wherein the first set of holes and the second set of holes are not in fluid communication with each other.

31. The baffle according to claim 30, wherein the connecting plate, the rod and the gas conveying plate are cylindrical and have different diameters.

32. The baffle of claim 30, wherein at least one of the connecting plate, the rod, and the gas delivery plate has a different shape than the other of the connecting plate, the rod, and the gas delivery plate.

33. The baffle of claim 30, wherein at least one of the connecting plate, the rod, and the gas delivery plate has a different size than the others of the connecting plate, the rod, and the gas delivery plate.

34. The baffle according to claim 30, wherein the connecting plate and the gas conveying plate have the same dimensions.

35. The baffle according to claim 30, wherein the connecting plate, the rod, and the gas conveying plate are integral.

36. The baffle of claim 30, wherein the connecting plate, the rod, and the gas delivery plate are coupled to each other using one or more fasteners.

37. The baffle of claim 31, wherein the gas delivery plate has a larger diameter than the rod, and wherein the connecting plate has a larger diameter than the gas delivery plate.

38. The baffle of claim 31, further comprising an opening extending through the center of the connecting plate and the rod and partially extending into the gas delivery plate through the center of the gas delivery plate.

39. The baffle of claim 31, wherein the connecting plate includes a plurality of arcuate slits extending through the connecting plate, the plurality of arcuate slits being located radially outward of the rod.

40. The baffle of claim 31, wherein the gas delivery plate includes a first set of holes and a second set of holes arranged in an alternating pattern, wherein the first set of holes is configured to deliver a first gas and the second set of holes is configured to deliver a second gas different from the first gas.

41. The baffle according to claim 40, wherein the first set of holes and the second set of holes have the same diameter.

42. The baffle of claim 40, wherein the first set of holes and the second set of holes are arranged along concentric circles, and wherein the holes on at least one circle have a different diameter than the holes on at least one other circle.

43. The baffle according to claim 40, wherein the first set of holes and the second set of holes are arranged in rows and columns.

44. The baffle according to claim 40, wherein: One of the holes in the first group is located at the center of the gas delivery plate; Nine holes in the first group of holes form a first square at the center of the gas delivery plate; One or more holes in the first group of holes are located within the first square; and None of the holes in the second group are located within the first square.

45. The baffle according to claim 44, wherein: The four holes in the second set of holes form a second square, the second square having a center that coincides with the center of both the first square and the gas delivery plate; and Each of the four holes is located radially outside the corresponding hole at one of the four corners of the first square among the nine holes.

46. ​​The baffle of claim 45, wherein the gas delivery plate further comprises a third set of holes having a diameter less than or equal to the diameter of each of the first set of holes and the second set of holes, and wherein at least four of the third set of holes are located inside the second square and outside the first square.

47. The baffle according to claim 46, wherein at least one hole in the third group of holes and two holes in the first group of holes form a triangle, and there are no other holes within the triangle.

48. The baffle of claim 46, wherein the third set of holes is located on a circle concentric with the centers of the first square and the second square and the center of the gas delivery plate, and wherein the corners of the first square are located on the circle.

49. The baffle according to claim 46, wherein the third set of holes is in fluid communication with the second set of holes, but not with the first set of holes.

50. The baffle according to claim 46, wherein: The two diameters of the gas delivery plate, which are perpendicular to each other and intersect at the center of the gas delivery plate, form four quadrants. The two diameters only include the first set of holes; and Each quadrant contains two holes from the third group of holes.

51. The baffle of claim 50, wherein each diameter comprises nine holes from the first set of holes.

52. The baffle according to claim 46, wherein: The rod includes a fourth set of holes along the edge of the rod and a plurality of channels extending radially inward at an angle relative to the vertical axis of the gas delivery plate passing through the rod and between the third set of holes and the fourth set of holes; as well as The third and fourth sets of holes are in fluid communication with each other and with the second set of holes, the plurality of arcuate slits, and the annular volume surrounding the rod and between the connecting plate and the gas delivery plate.

53. The baffle according to claim 52, wherein the second group of holes, the third group of holes, the fourth group of holes, the plurality of arc-shaped slits, and the annular volume are not in fluid communication with the first group of holes.

54. The baffle of claim 52, wherein the gas delivery plate comprises: board; and The truncated conical portion and the ring attached to the plate. The ring surrounds the truncated cone portion, thereby defining a gap between the ring and the truncated cone portion.

55. The baffle according to claim 54, wherein: The smaller end of the truncated conical portion is attached to the plate; and The interior of the ring gradually tapers radially inward as it extends toward the plate.

56. The baffle according to claim 54, wherein: The larger end of the truncated conical portion is attached to the plate; and The interior of the ring gradually tapers radially outward as it extends toward the plate.

57. The baffle of claim 54, wherein the truncated conical portion comprises: The fifth set of holes is positioned laterally through the truncated cone. The first set of holes passes through the truncated conical portion and is vertically connected to the fifth set of holes.

58. The baffle according to claim 57, further comprising: An opening extends through the center of the connecting plate and the rod, and partially into the gas delivery plate through the center of the gas delivery plate. The opening is in fluid communication with the first set of holes and the fifth set of holes, as well as the gap between the truncated cone and the ring.

59. The baffle of claim 58, wherein the opening, the first set of holes and the fifth set of holes, and the gap are not in fluid communication with the second set of holes, the third set of holes and the fourth set of holes, the plurality of arcuate slits, the annular volume surrounding the rod and between the connecting plate and the gas delivery plate.

60. The baffle according to claim 52, wherein: The diameters of each of the third and fourth groups of holes and each of the plurality of channels are the same; and The angle is 45-85 degrees.

61. The baffle according to claim 57, wherein: The diameters of the first and second groups of holes are 1-25% of the diameter of the fifth group of holes; and The diameters of the third group of holes, the fourth group of holes, and the plurality of channels are 10-100% of the diameters of the first group of holes and the second group of holes.

62. The baffle according to claim 30, wherein: The thickness of the rod is less than the thickness of the connecting plate; and The thickness of the gas delivery plate is less than the thickness of the rod.

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