Glass material for high-transmittance photovoltaic module as well as preparation method and application of glass material

Abstract

The invention provides a glass material for a high-transmittance photovoltaic module as well as a preparation method and application of the glass material, and relates to the technical field of photovoltaic materials. Specifically, the glass material provided by the invention comprises a glass substrate and a nano-scale antireflection film loaded on the surface of the glass substrate, wherein the glass matrix comprises quartz sand, limestone, boric acid, sodium carbonate, cerium oxide, zinc oxide and rare earth oxide according to a specific mass ratio; the nano-scale antireflection film comprises nano titanium dioxide and nano silicon dioxide. The glass material provided by the invention is mainly used for solar cell front panel glass, has high light transmittance, low reflectivity and high impact strength, also has good weather resistance and self-cleaning performance, and has good application prospects.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic materials technology, and more specifically, to a high-transmittance glass material for photovoltaic modules, its preparation method, and its application. Background Technology

[0002] As the cover material for solar cell modules, photovoltaic glass's optical performance and mechanical reliability directly determine the power generation efficiency and long lifespan of the entire photovoltaic system. However, currently commercially available photovoltaic glass, especially soda-lime silica glass produced using the traditional float glass process, generally faces core technological bottlenecks. On the one hand, due to the unavoidable presence of iron and other impurity ions in the raw materials and the approximately 4% to 8% Fresnel reflection loss on its surface, its actual light transmittance is typically below 90%, meaning that nearly 10% of the incident sunlight is lost before even entering the cell. On the other hand, to meet the long-term service requirements of modules in complex outdoor environments, the glass must possess sufficient mechanical strength and weather resistance. Traditional processes often increase strength by increasing glass thickness or adjusting the composition, but this further sacrifices light transmittance, creating a difficult-to-balance contradiction between transmittance and strength. Simultaneously, conventional glass has limited resistance to UV aging, acid rain corrosion, and wind and sand abrasion, and after long-term outdoor use, it is prone to problems such as transmittance decay and surface damage, further exacerbating light energy loss.

[0003] To overcome these limitations, next-generation high-efficiency photovoltaic modules place near-stringent dual requirements on cover glass: visible light transmittance must consistently exceed 92%, and surface reflectance must be below 4%. This objective necessitates a systematic overhaul of the glass's fundamental components, microstructure, and surface properties. The adjustment space for traditional float glass processes is nearing saturation; simply relying on process optimization or single-function coatings is insufficient to achieve a synergistic improvement in optical and mechanical properties. Therefore, material-level innovation becomes crucial. This involves developing novel high-transmittance glass material systems that incorporate functional components during the molecular network design phase. This allows for the integration of multiple functions, including enhanced light transmission, reflection suppression, and surface self-maintenance, while maintaining high strength and weather resistance. This is not only a direct way to improve the conversion efficiency of photovoltaic modules but also a vital technological foundation for reducing costs and increasing efficiency in the photovoltaic industry, and extending the lifespan of power plants.

[0004] In view of this, the present invention is hereby proposed. Summary of the Invention

[0005] The primary objective of this invention is to provide a high-transmittance glass material for photovoltaic modules, which addresses the inability of high-specification photovoltaic modules to simultaneously meet the dual requirements of high transmittance and low reflectance, and balances the contradiction between glass transmittance and impact resistance.

[0006] The second objective of this invention is to provide a method for preparing the high-transmittance photovoltaic module glass material described above.

[0007] A third objective of this invention is to provide the use of the aforementioned high-transmittance photovoltaic module glass material in the field of solar cells.

[0008] In order to achieve the above-mentioned objectives of the present invention, the following technical solution is adopted: A high-transmittance photovoltaic module glass material includes a glass substrate and a nanoscale antireflective film loaded on the surface of the glass substrate; The glass matrix is ​​prepared by the following components in parts by weight: 35-45 parts quartz sand, 20-30 parts limestone, 15-20 parts boric acid, 8-13 parts sodium carbonate, 2-5 parts cerium oxide, 0.5-2 parts zinc oxide, and 0.5-3 parts rare earth oxides. The nanoscale antireflective film comprises nano-titanium dioxide and nano-silicon dioxide.

[0009] In one embodiment, the glass matrix is ​​prepared by comprising the following components in parts by weight: 37-43 parts quartz sand, 23-27 parts limestone, 16-18 parts boric acid, 9-11 parts sodium carbonate, 3-4 parts cerium oxide, 1-1.5 parts zinc oxide, 1-2 parts rare earth oxides, and 0.5-1 parts nano titanium dioxide.

[0010] In one embodiment, the rare earth oxide includes at least one of yttrium oxide, lanthanum oxide, and neodymium oxide; preferably, the rare earth oxide further includes at least one of praseodymium oxide and scandium oxide.

[0011] In one embodiment, the thickness ratio of the nanoscale antireflective film to the glass substrate is 1:(15000~20000).

[0012] In one embodiment, in the nanoscale antireflective film, the mass ratio of the nano-titanium dioxide to the nano-silica is (1.27~2.56):1.

[0013] In one embodiment, the nano-titanium dioxide has a particle size of 5nm to 20nm, and the nano-silica has a particle size of 10nm to 30nm.

[0014] In one embodiment, the glass material has a light transmittance of 94% to 95% and a reflectance of 3% to 3.5%.

[0015] A method for preparing the high-transmittance photovoltaic module glass material includes the following steps: The raw material components are mixed, a clarifying agent is added, and the mixture is ground until the particle size is ≤50μm before melting to obtain a homogeneous glass melt. The homogeneous glass melt is sequentially magnetized and annealed to obtain a glass matrix; A nanoscale antireflective film is prepared on the surface of the glass substrate by chemical vapor deposition to obtain a high-transmittance glass material for photovoltaic modules.

[0016] In one embodiment, the melting temperature is 1500℃~1600℃ and the melting time is 4.5h~6h.

[0017] In one embodiment, the annealing temperature is 950℃~1050℃, and the annealing holding time is 3.5h~4.5h.

[0018] In one embodiment, the magnetization process includes: placing the homogeneous molten glass in a magnetic field; the strength of the magnetic field is 400 Gs to 500 Gs, and the duration of the magnetization process is 8 min to 10 min.

[0019] The application of the high-transmittance photovoltaic module glass material in solar cell methods.

[0020] Compared with the prior art, the beneficial effects of the present invention are as follows: The present invention provides a photovoltaic glass with high light transmittance and low reflectance and a method for preparing the same, which is suitable for the encapsulation of solar cell modules; the glass material of the present invention mainly possesses the following significant performance and process advantages: (1) The light transmittance is as high as 94%~95%, which is 4~5 percentage points higher than that of traditional glass; (2) The surface reflectivity is significantly reduced to 3%~3.5%, and the light energy utilization rate is greatly improved; (3) The impact resistance is increased by 50%, and it has passed the 500-hour accelerated aging test, showing excellent weather resistance; (4) The surface antireflective film has a self-cleaning function, which can effectively reduce dust adhesion; (5) The preparation process is environmentally friendly and reduces energy consumption by 15% to 20%. Detailed Implementation

[0021] The technical solution of the present invention will be clearly and completely described below with reference to specific embodiments. However, those skilled in the art will understand that the embodiments described below are some embodiments of the present invention, but not all embodiments, and are only used to illustrate the present invention, and should not be regarded as limiting the scope of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Where specific conditions are not specified in the embodiments, conventional conditions or conditions recommended by the manufacturer shall be followed. Where the manufacturers of reagents or instruments are not specified, they are all conventional products that can be purchased commercially. In addition, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0022] A first aspect of the present invention is to provide a high-transmittance glass material for photovoltaic modules, wherein the glass material comprises a glass substrate and a nanoscale antireflective film loaded on the surface of the glass substrate; The glass substrate is prepared by the following components in parts by weight: 35-45 parts quartz sand, 20-30 parts limestone, 15-20 parts boric acid, 8-13 parts sodium carbonate, 2-5 parts cerium oxide, 0.5-2 parts zinc oxide, and 0.5-3 parts rare earth oxides; the nanoscale antireflective film includes nano-titanium dioxide and nano-silica.

[0023] As an optional implementation, the weight percentages of the raw material components in the glass material include, but are not limited to, the point values ​​listed below, or any range of values ​​formed by any two point values: quartz sand 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45; limestone 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30; boric acid 15, 15.5, 16, 16.5, 17, 17.5, 18, 18.5, 19, 19. 5, 20; Sodium carbonate 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13; Cerium oxide 2, 2.5, 3, 3.5, 4, 4.5, 5; Zinc oxide 0.5, 0.6, 0.7, 0.8, 0.9, 1, 1.1, 1.2, 1.4, 1.5, 1.6, 1.8, 1.9, 2; Rare earth oxides 0.5, 0.6, 0.8, 1, 1.2, 1.5, 1.8, 2, 2.2, 2.5, 2.8, 3.

[0024] In a more preferred embodiment, the glass matrix is ​​prepared by comprising the following components in parts by weight: 37-43 parts of quartz sand, 23-27 parts of limestone, 16-18 parts of boric acid, 9-11 parts of sodium carbonate, 3-4 parts of cerium oxide, 1-1.5 parts of zinc oxide, 1-2 parts of rare earth oxides, and 0.5-1 parts of nano-titanium dioxide.

[0025] In a preferred embodiment, the rare earth oxide includes at least one of yttrium oxide (Y₂O₃), lanthanum oxide (La₂O₃), and neodymium oxide (Nd₂O₃). In some optional embodiments, in addition to the above-mentioned component selection, the rare earth oxide also includes at least one of praseodymium oxide (Pr₆O) and scandium oxide (Sc₂O₃), and the amount of praseodymium oxide and scandium oxide added is not higher than 0.05% of the total mass of the glass matrix. If both praseodymium oxide and scandium oxide are present, the total added mass of the two is used.

[0026] In this invention, a glass network is provided using quartz sand to construct the glass framework, thereby imparting high strength, high chemical stability, and heat resistance to the glass. As a preferred embodiment, the iron content in the quartz sand is ≤50ppm to avoid Fe... 2 + / Fe 3+ This causes light absorption, ensuring high light transmittance.

[0027] In this invention, the calcium oxide component in limestone reduces the high-temperature viscosity of glass, improving melting and forming performance; it also enhances the mechanical strength and weather resistance of the glass. However, excessive limestone may increase the brittleness of the glass. Therefore, in this invention, the weight ratios of limestone, quartz sand, and boric acid must be controlled within the aforementioned range to coordinate and balance the overall performance of the glass.

[0028] In this invention, boric acid is used as a flux during the preparation process and to reduce the coefficient of thermal expansion in the glass material, thereby improving the glass's resistance to thermal shock and adapting to changes in outdoor temperature differences in photovoltaic modules. It can also enhance the light transmittance of the glass by reducing internal scattering of the glass through boric acid, thereby improving the transmittance of short-wavelength light.

[0029] In this invention, cerium oxide is used as both an ultraviolet absorber and a clarifying agent. On the one hand, cerium oxide can effectively absorb ultraviolet rays, reduce damage to photovoltaic cell encapsulation materials, and extend module life. On the other hand, cerium oxide releases oxygen during the melting process, promotes the removal of bubbles, improves glass purity, and can also inhibit the yellowing of glass materials during long-term use.

[0030] In this invention, zinc oxide can improve the chemical stability and mechanical strength of glass materials, while reducing the coefficient of thermal expansion and enhancing thermal shock resistance; in addition, zinc oxide can slightly increase the refractive index and optimize the light transmission interface matching.

[0031] In this invention, rare earth oxides are used to adjust the refractive index of the glass material, filling the gaps in the glass network to reduce light scattering, especially improving transmittance in the near-infrared region. Simultaneously, rare earth elements can convert ultraviolet light into visible light through the down-conversion effect, improving the photovoltaic cell's utilization efficiency of the solar spectrum. Furthermore, there is a synergistic anti-reflection effect between cerium oxide and rare earth oxides in this invention. Specifically, cerium oxide is the dominant element, and through Ce... 4+ / Ce 3+ Redox reaction, removing the yellowing Fe from the glass 2+ Completely converted into Fe with low light absorption 3+ Eliminating the intrinsic light absorption loss of iron impurities at the source, while Ce 3 + No visible light characteristic absorption, and does not introduce new light transmission attenuation; with rare earth oxides as an auxiliary agent: La 3+ / Y 3+ / Nd 3+ By embedding the SiO2 network into the glass, structural voids are filled, increasing glass density and suppressing internal diffuse light scattering. Simultaneously, the refractive index of the glass substrate is modulated to create a gradient match with the surface TiO2 / SiO2 antireflection film, reducing light reflection loss at the glass-film interface. Furthermore, the synergistic effect of these two methods amplifies the effect: rare earth ions stabilize Ce through charge compensation. 4+ / Ce 3+ Valence states prevent the cerium oxide's decolorizing effect from diminishing; simultaneously, La2O3 / Y2O3 broadens the near-infrared light transmission window, and Nd2O3 precisely filters out ineffective spectra, complementing cerium oxide's high visible light transmittance and covering the full effective spectrum of photovoltaic cells; furthermore, rare earth ions allow Ce to... 4+ / Ce 3+ It is evenly distributed in the glass matrix, avoiding the problem of uneven local refractive index caused by adding cerium oxide alone, and further reducing light loss.

[0032] In a preferred embodiment, the thickness of the nanoscale antireflective film is 50 nm to 80 nm, including but not limited to any one or any two of 50, 55, 60, 65, 70, 75, and 80 (nm). In one embodiment, the thickness ratio of the nanoscale antireflective film to the glass substrate is 1:(15000~20000).

[0033] In a preferred embodiment, the mass ratio of nano-titanium dioxide to nano-silica in the nanoscale antireflective film is (1.27~2.56):1.

[0034] In this invention, nano-titanium dioxide is used to achieve self-cleaning of the glass surface. Titanium dioxide exhibits strong oxidizing properties under ultraviolet light excitation, decomposing organic contaminants (such as dust and grease) on the glass surface and reducing the impact of dust accumulation on light transmittance. Simultaneously, it inhibits the growth of microorganisms on the glass surface, making it suitable for humid and hot environments. Furthermore, nano-titanium dioxide can form an anti-reflection layer, reducing reflection loss through interfacial light interference and achieving surface anti-reflection.

[0035] In a preferred embodiment, the particle size of the nano-titanium dioxide is 5nm to 20nm, including but not limited to any one or any two of the following values: 5, 6, 8, 10, 12, 14, 15, 16, 18, and 20 (nm); the particle size of the nano-silica is 10nm to 30nm, including but not limited to any one or any two of the following values: 10, 12, 15, 18, 20, 22, 25, 28, and 30 (nm).

[0036] A second aspect of the present invention is to provide a method for preparing a high-transmittance photovoltaic module glass material as described in the first aspect, which mainly includes the following steps: S1. Mix the raw material components, add a clarifying agent, grind until the particle size is ≤50μm, and then melt to obtain a homogeneous glass melt; S2. The homogeneous glass melt is sequentially magnetized and annealed to obtain a glass matrix; S3. A nanoscale antireflective film is prepared on the surface of the glass substrate by chemical vapor deposition to obtain a high-transmittance glass material for photovoltaic modules.

[0037] In one preferred embodiment, the raw material components are the raw material components of the glass matrix: quartz sand, limestone, boric acid, sodium carbonate, cerium oxide, zinc oxide, and rare earth oxides; in some embodiments, the mixing includes, but is not limited to, one or more of mechanical stirring or airflow mixing.

[0038] In a preferred embodiment, the clarifying agent includes at least one of arsenic oxide, antimony oxide, sodium sulfate, calcium fluoride, and sodium nitrate; in some embodiments, the amount of the clarifying agent added is measured by the total mass of the raw material components, and the mass ratio of the clarifying agent to the raw material components is 0.1% to 0.3%.

[0039] As a preferred embodiment, the grinding method includes, but is not limited to, dry grinding such as air jet mill, ball mill, and mechanical impact mill, as well as wet grinding such as sand mill, ball mill, and stirred mill. In more preferred cases, dry grinding is selected.

[0040] In one preferred embodiment, the melting temperature is 1500℃~1600℃ and the melting time is 4.5h~6h; in some embodiments, the melting temperature includes, but is not limited to, any one or any two of the following: 1500, 1510, 1520, 1530, 1540, 1550, 1560, 1570, 1580, 1590, 1600 (℃), and the melting time includes, but is not limited to, any one or any two of the following: 4.5, 4.6, 4.8, 5, 5.2, 5.5, 5.8, 6 (h).

[0041] As a preferred embodiment, the process further includes a shaping treatment of the homogeneous glass melt after step S1 and before step S2. In some embodiments, the homogeneous glass melt can be injected into a mold to form a shape, and the magnetization treatment can be performed while maintaining the mold. In some embodiments, the glass melt is cooled to 1300°C to 1350°C before the shaping treatment is performed.

[0042] In a preferred embodiment, the magnetization treatment includes: placing the homogeneous molten glass in a magnetic field with a strength of 400 Gs to 500 Gs, and the magnetization treatment duration being 8 min to 10 min; in some embodiments, the strength of the magnetic field includes, but is not limited to, any one or any two of the following values: 400, 410, 420, 430, 440, 450, 460, 470, 480, 490, and 500 (Gs), and the duration of the magnetization treatment includes, but is not limited to, any one or any two of the following values: 8, 8.2, 8.5, 8.8, 9, 9.2, 9.5, 9.8, and 10 (min).

[0043] In a preferred embodiment, the annealing temperature is 950℃~1050℃, and the annealing holding time is 3.5h~4.5h. In some embodiments, after the holding time is completed, the temperature is cooled to room temperature at a rate of 0.5℃ / min~2℃ / min. In some embodiments, the annealing temperature includes, but is not limited to, any one or any two of the following values: 950, 960, 970, 980, 990, 1000, 1010, 1020, 1030, 1040, 1050 (℃). The annealing holding time includes, but is not limited to, any one or any two of the following values: 3.5, 3.6, 3.7, 3.8, 3.9, 4, 4.1, 4.2, 4.3, 4.4, 4.5 (h).

[0044] As a preferred embodiment, the chemical vapor deposition method includes the following steps: placing the cleaned glass substrate in a deposition chamber, heating it to 450℃~600℃, and using an atmospheric pressure CVD system to input silicon and titanium sources through a carrier gas to perform reactive deposition. By controlling parameters such as deposition time, gas flow rate, and substrate moving speed, the thickness of the deposited film is precisely controlled. After deposition is completed, annealing is performed, and then the film is slowly cooled to room temperature to obtain a nanoscale antireflection film.

[0045] In a more preferred embodiment, the silicon source includes tetraethyl orthosilicate (TEOS) or hexamethyldisiloxane (HMDSO), the titanium source includes tetraisopropyl titanate (TTIP) or titanium tetrachloride (TiCl4), and the carrier gas includes high-purity nitrogen or argon. In some embodiments, the characteristic parameters involved can be obtained through conventional adjustments in the art and are not strictly limited in this invention.

[0046] A third aspect of the present invention is to provide the use of the high-transmittance photovoltaic module glass material as described in the first aspect in a solar cell method. It is understood that the solar cell includes essential core cell units and an encapsulation structure, and the high-transmittance photovoltaic module glass material is used as the front panel glass in the encapsulation structure; other components involved in the solar cell (back electrode, silicon substrate, emitter region, anti-reflective film, electrodes, encapsulant film, backsheet, junction box, frame, etc.) can all be of any conventional or unconventional type in the art, as long as they can achieve the basic functions of the solar cell. It is worth noting that, provided the high-transmittance photovoltaic module glass material is included, any solar cell product, solar cell manufacturing process, or derivative products containing solar cells can be considered as an embodiment of this aspect.

[0047] Example 1 S1. Raw material mixing: Mix the raw materials according to the proportions shown in Table 1, add 0.2 wt.% clarifying agent (sodium sulfate and antimony oxide, with a mass ratio of 5:2), and ball mill for 3 hours until the material particle size is ≤50μm; S2. Melting: Melt at 1560℃ for 5 hours to form a homogeneous glass melt; S3. Magnetization treatment: After cooling the molten glass to 1320℃, pour it into a mold and apply a magnetic field of 450Gs for 9 minutes to optimize the glass molecular structure. S4. Annealing: Hold at 1000℃ for 4 hours, then cool to room temperature at a rate of 1℃ / min to obtain a glass substrate with a thickness of 2mm. S5. Surface Treatment: Using high-purity nitrogen and oxygen as carrier and reaction gases (oxygen percentage 2 wt.%), the precursor tetraethyl orthosilicate and tetraisopropyl titanate were vaporized in evaporators at 70°C and 80°C respectively, and then mixed in proportion and transported to a deposition reaction zone at a constant temperature of 520°C for deposition on the surface of the glass substrate prepared in S4. The total flow rate of the mixed gas was precisely controlled at 3.5 L / min and the residence time in the deposition zone was 85 seconds. The film growth rate was monitored in real time using an online laser ellipsometer, and deposition was terminated immediately when the optical thickness reached 60 nm. After deposition, the glass material of this embodiment was obtained after in-situ annealing at 550°C for 10 minutes.

[0048] Example 2: It is basically the same as Example 1, except that in step S1, each raw material is stirred and mixed in the proportion shown in Table 1.

[0049] Example 3: It is basically the same as Example 1, except that in step S1, each raw material is stirred and mixed in the proportion shown in Table 1.

[0050] Example 4: Basically the same as Example 1, except that: S3, magnetization treatment: after cooling the glass liquid to 1300°C, it is poured into the mold and treated with a magnetic field of 400Gs for 10 minutes.

[0051] Example 5: Basically the same as Example 1, except that: S4, Annealing: Hold at 950°C for 4.5 hours, and then cool to room temperature at a rate of 1°C / min.

[0052] Example 6: Basically the same as Example 1, except that: S5, the deposition is terminated immediately when the optical thickness reaches 50nm during the surface treatment.

[0053] Comparative Example 1: Basically the same as Example 1, except that cerium oxide was not added in step S1.

[0054] Comparative Example 2: Basically the same as Example 1, except that rare earth oxides were not added in step S1.

[0055] Comparative Example 3: Basically the same as Example 1, except that step S5 is omitted.

[0056] Table 1

[0057] Experimental Example: The optical properties of the glass materials prepared in each embodiment and comparative example were tested, and the results are shown in Table 2. Further testing of the impact resistance in mechanical properties was also conducted, and the results are shown in Table 2.

[0058] Table 2

[0059] Although the present invention has been illustrated and described with specific embodiments, it should be understood that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; those skilled in the art should understand that modifications can be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein, without departing from the spirit and scope of the present invention; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention; therefore, this means that all such substitutions and modifications that fall within the scope of the present invention are included in the appended claims.

Claims

1. A high-transmittance glass material for photovoltaic modules, characterized in that, The glass material includes a glass substrate and a nanoscale antireflective film loaded on the surface of the glass substrate; The glass matrix is ​​prepared by the following components in parts by weight: 35-45 parts quartz sand, 20-30 parts limestone, 15-20 parts boric acid, 8-13 parts sodium carbonate, 2-5 parts cerium oxide, 0.5-2 parts zinc oxide, and 0.5-3 parts rare earth oxides. The nanoscale antireflective film comprises nano-titanium dioxide and nano-silicon dioxide.

2. The high-transmittance photovoltaic module glass material according to claim 1, characterized in that, The glass matrix is ​​prepared by comprising the following components in parts by weight: 37-43 parts quartz sand, 23-27 parts limestone, 16-18 parts boric acid, 9-11 parts sodium carbonate, 3-4 parts cerium oxide, 1-1.5 parts zinc oxide, 1-2 parts rare earth oxides, and 0.5-1 parts nano titanium dioxide.

3. The high-transmittance photovoltaic module glass material according to claim 1, characterized in that, The rare earth oxides include at least one of yttrium oxide, lanthanum oxide, and neodymium oxide; Preferably, the rare earth oxide further includes at least one of praseodymium oxide and scandium oxide.

4. The high-transmittance photovoltaic module glass material according to claim 1, characterized in that, The thickness ratio of the nanoscale antireflective film to the glass substrate is 1:(15000~20000).

5. The high-transmittance photovoltaic module glass material according to claim 1, characterized in that, In the nanoscale antireflective film: the mass ratio of the nano-titanium dioxide to the nano-silica is (1.27~2.56):1; And / or, the particle size of the nano-titanium dioxide is 5nm~20nm, and the particle size of the nano-silica is 10nm~30nm.

6. The high-transmittance photovoltaic module glass material according to claim 1, characterized in that, The light transmittance of the glass material is 94%~95%, and the reflectance is 3%~3.5%.

7. A method for preparing a high-transmittance photovoltaic module glass material as described in any one of claims 1 to 6, characterized in that, Includes the following steps: The raw material components are mixed, a clarifying agent is added, and the mixture is ground until the particle size is ≤50μm before melting to obtain a homogeneous glass melt. The homogeneous glass melt is sequentially magnetized and annealed to obtain a glass matrix; A nanoscale antireflective film is prepared on the surface of the glass substrate by chemical vapor deposition to obtain a high-transmittance glass material for photovoltaic modules.

8. The preparation method according to claim 7, characterized in that, The melting temperature is 1500℃~1600℃, and the duration is 4.5h~6h; And / or, the annealing temperature is 950℃~1050℃, and the annealing holding time is 3.5h~4.5h.

9. The preparation method according to claim 7, characterized in that, The magnetization process includes: placing the homogeneous molten glass in a magnetic field; The strength of the magnetic field is 400 Gs to 500 Gs, and the magnetization treatment lasts for 8 min to 10 min.

10. Use of the high-transmittance photovoltaic module glass material as described in any one of claims 1 to 6 in a solar cell method.

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