Conscope assembly adjusting method and system

Abstract

The invention discloses a conscope assembly adjusting method and system, and belongs to the technical field of optical assembly and adjustment. The method comprises the following steps: acquiring a geometrical optical model and initial system wavefront aberration distribution data based on a conscope group interference detection light path; fitting the initial data to obtain a characteristic wavefront aberration coefficient; according to the coefficient and a preset quantitative mapping relation, obtaining an adjustment amount; and adjusting the light path based on the adjustment amount, and carrying out iterative adjustment on the conscope group until the wavefront aberration distribution meets the requirement. The system comprises a data acquisition unit, a fitting unit, a calculation unit and an adjustment unit which are respectively used for realizing the corresponding steps. According to the method, efficient and high-precision installation and adjustment of the conscope set are achieved through the quantitative mapping relation and iterative installation and adjustment, complex pre-calibration is not needed, and the method is suitable for batch installation and adjustment scenes and has remarkable engineering application value.

Description

Technical Field

[0001] This invention relates to the field of optical assembly and adjustment technology, specifically to a method and system for assembling and adjusting a conical mirror. Background Technology

[0002] Hollow beams, with their barrel-shaped intensity distribution, have wide applications in Bose-Einstein condensation, light trapping, optical tweezers, and holography. Researchers have proposed numerous methods for generating hollow beams, including transverse mode converters, geometric optics, holography, computational holography, hollow fibers, spatial filtering, and nonlinear interactions. Among these, geometric optics methods based on conical mirror arrays are more efficient and effective at generating high-quality hollow beams. However, eccentricity or tilt misalignment in the conical mirror array often produces indistinguishable wavefront aberration distributions, leading to time-consuming traditional assembly methods and heavy reliance on human experience. Furthermore, unavoidable spatial pose deviations exist between the assembly and adjustment coordinate systems, further reducing the efficiency of manual assembly.

[0003] To address the challenges of manual assembly methods, researchers have proposed various computer-aided assembly methods. These methods achieve high-precision assembly by constructing specific mapping relationships between wavefront aberration distributions and six-dimensional misalignment quantities. These methods primarily include the sensitivity matrix method, inverse optimization method, differential wavefront method, artificial neural network method, and vector aberration method. However, these methods are typically based on theoretical optical models and require high wavefront measurement and assembly accuracy, limiting their efficiency in practical engineering applications. Although pre-measuring and calibrating the assembly coordinate system and adjusting the coordinate transformation matrix between them can improve assembly accuracy, unavoidable measurement errors, optical element surface shape errors, and assembly errors still exist, making it impossible to complete the conical mirror assembly and assembly in a single adjustment. Furthermore, differences in surface shape and installation errors exist between different batches of optical elements, further complicating the efficiency of measurement and calibration methods.

[0004] Currently, there is limited research on the assembly and adjustment of conical mirrors. Traditional manual assembly and adjustment relies on human experience, which is inefficient. Existing computer-aided assembly and adjustment methods have high requirements for wavefront measurement accuracy and assembly and adjustment accuracy, resulting in low actual assembly and adjustment efficiency.

[0005] Therefore, existing technologies need to be improved. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and provide a method and system for assembling and adjusting a conic mirror, solving the technical problems of high precision requirements and low efficiency in assembling and adjusting a conic mirror, and realizing efficient and high-precision iterative assembly and adjustment of the conic mirror assembly.

[0007] This invention is achieved through the following technical solution:

[0008] In a first aspect, the present invention provides a method for assembling and adjusting a conical mirror, comprising the following steps:

[0009] S1. Obtain the geometric optical model and initial system wavefront aberration distribution data based on the interferometric detection optical path of the conical mirror group;

[0010] S2. Fit the initial system wavefront aberration distribution data to obtain the characteristic wavefront aberration coefficients;

[0011] S3. Obtain the adjustment amount based on the characteristic wavefront aberration coefficients and the preset quantitative mapping relationship;

[0012] S4. Adjust the interferometric detection optical path of the conical mirror group based on the aforementioned adjustment amount;

[0013] S5. Iteratively adjust the conical mirror assembly, repeating steps S2 to S4 until the wavefront aberration distribution of the system meets the preset usage requirements.

[0014] Furthermore, in this invention, the aforementioned conical mirror assembly consists of two conical mirrors placed at intervals. The combination of the conical mirrors can be two convex conical mirrors, two concave conical mirrors, or a combination of one concave conical mirror and one convex conical mirror.

[0015] The conical surfaces of the two conical mirrors are arranged opposite or facing each other.

[0016] Furthermore, in this invention, the method for obtaining the geometric optical model in step S1 above includes:

[0017] S1-1. Obtain the actual data of the interference detection optical path, the actual data including the material refractive index, base angle, thickness, relative pose and aperture of the two conical mirrors;

[0018] S1-2. Based on the actual data, construct a geometric optical model that matches the actual interferometric detection optical path.

[0019] Furthermore, in this invention, the expressions for the conical surface elevation of the two conical mirrors described above are both:

[0020] ,

[0021] in, For the arrow height, Radial coordinates, The base angle of a conical mirror is positive for a concave conical mirror and negative for a convex conical mirror.

[0022] Furthermore, in this invention, the aforementioned adjustment amount is the spatial pose adjustment amount of the conical mirror, which includes any one or more of the following: translation of the conical mirror in a single dimension, tilting of the conical mirror in a single dimension, a combination of translations of the conical mirror in multiple dimensions, and a combination of tilts of the conical mirror in multiple dimensions.

[0023] Furthermore, in this invention, in the aforementioned preset quantitative mapping relationship, the adjustment amount and the characteristic wavefront aberration coefficient have a one-to-one correspondence, and a specific adjustment amount only affects the corresponding characteristic wavefront aberration coefficient.

[0024] Furthermore, in this invention, the expression for the method of obtaining the preset quantitative mapping relationship is as follows:

[0025] ,

[0026] Among them, a i denoted as characteristic wavefront aberration coefficient, j is a positive integer, N is the order, k is the dimension of the adjustment amount, b is the coefficient solved by the geometric optics model, and x is the adjustment amount.

[0027] Furthermore, in this invention, the aforementioned characteristic wavefront aberration coefficients are obtained by fitting orthogonal Zernike polynomials within a circular aperture, and the fitting expression is:

[0028] ,

[0029] in, The wavefront aberration distribution within a circular aperture. Radial coordinates, Angular coordinates, The number of Zernike polynomials, For the first Characteristic wavefront aberration coefficients, For the first Zernike polynomial.

[0030] Furthermore, in this invention, the aforementioned conical mirror group interferometric detection optical path is constructed based on the aberration-free method, including an interferometer host, an interferometer transmission standard mirror, a first conical mirror, an adjustment mechanism, a second conical mirror, and a reflecting mirror. The measurement beam emitted by the interferometer is reflected by the reflecting mirror through the conical mirror group and returns along the original path, forming interference fringes with the reference beam, and wavefront aberration distribution data is calculated.

[0031] Secondly, the present invention also provides a conic lens assembly and adjustment system, which includes the aforementioned conic lens assembly and adjustment method, the system comprising:

[0032] The data acquisition unit is used to acquire geometric optical model and initial system wavefront aberration distribution data based on the interferometric detection optical path of the conical mirror group;

[0033] The fitting unit is electrically connected to the data acquisition unit and is used to fit the initial system wavefront aberration distribution data to obtain characteristic wavefront aberration coefficients.

[0034] The calculation unit, electrically connected to the fitting unit, is used to solve and obtain the assembly adjustment amount based on the characteristic wavefront aberration coefficients and the preset quantitative mapping relationship.

[0035] An adjustment unit, electrically connected to the calculation unit, is used to adjust the interferometric detection optical path of the conical mirror group based on the adjustment amount, and to perform iterative adjustment operations on the conical mirror group until the wavefront aberration distribution of the system meets the preset usage requirements.

[0036] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0037] The conical mirror assembly and adjustment method of this invention is based on the aberration-free method to construct a geometrical optical model corresponding to the interferometric detection optical path. A quantitative mapping relationship between specific assembly and adjustment amounts and characteristic wavefront aberration coefficients is established using ray tracing. Based on this, the characteristic wavefront aberration coefficients are obtained by fitting the actual measured wavefront aberration distribution. The assembly and adjustment amounts are solved according to the quantitative mapping relationship and then performed. The wavefront aberration distribution after assembly and adjustment is then measured. Simultaneously, the conical mirror assembly is iteratively assembled and adjusted through repeated fitting, solution, assembly, and measurement steps, ultimately ensuring that the system's wavefront aberration distribution meets the requirements. This method achieves efficient assembly and adjustment of the conical mirror assembly through a simple quantitative mapping relationship and iterative steps, making it suitable for batch assembly and adjustment applications of conical mirror assemblies. It solves the technical problems of high assembly and adjustment accuracy requirements and low actual assembly and adjustment efficiency in related technologies, and has broad application prospects and engineering value. Attached Figure Description

[0038] The accompanying drawings, which are included to provide a further understanding of embodiments of the invention and form part of this application, do not constitute a limitation thereof. In the drawings:

[0039] Figure 1 This is a schematic diagram of the interferometric detection optical path structure of the conical mirror group used in an embodiment of the present invention;

[0040] Figure 2 This is a schematic diagram of the wavefront aberration distribution of the conical mirror group after different iterations of assembly and adjustment in the embodiments of the present invention;

[0041] in, Figure 2 (a) shows the initial wavefront aberration distribution. Figure 2 (b) shows the wavefront aberration distribution after the first setup. Figure 2(c) shows the wavefront aberration distribution after the second adjustment. Figure 2 (d) shows the wavefront aberration distribution after the third adjustment;

[0042] Figure 3 This is a flowchart of the conical mirror assembly and adjustment method used in an embodiment of the present invention;

[0043] Figure 4 This is a schematic diagram of the conical mirror assembly and adjustment system used in an embodiment of the present invention.

[0044] The following components are labeled and their corresponding names in the attached diagram: 1. Interferometer main unit; 2. Interferometer transmission standard mirror; 3. First conical mirror; 4. Adjustment mechanism; 5. Second conical mirror; 6. Reflector; 7. Computer processing module. Detailed Implementation

[0045] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to embodiments and accompanying drawings. The illustrative embodiments and descriptions of this invention are for explanation only and are not intended to limit the invention. The following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention.

[0046] It should be noted that similar reference numerals and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. In the description of the embodiments of the present invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0047] Example 1

[0048] This embodiment 1 provides a method for assembling and adjusting a conical mirror, such as... Figures 1-4 As shown,

[0049] S1. Based on the interferometric detection optical path, obtain the geometric optical model and the initial system wavefront aberration distribution data;

[0050] Specifically, such as Figure 1As shown, the interferometric detection optical path is constructed using the aberration-free optical path method; the interferometric detection optical path includes an interferometer host 1, an interferometer transmission standard mirror 2, a first conical mirror 3, an adjustment mechanism 4, a second conical mirror 5, and a reflecting mirror 6.

[0051] The actual data for the interferometric detection optical path include the material refractive index, base angle, thickness, relative orientation, and aperture of the two conical mirrors.

[0052] In practice, methods for obtaining geometric optics models include:

[0053] Obtain the actual data of the interferometric detection optical path, including the material refractive index, base angle, thickness, relative pose, and aperture of the two conical mirrors;

[0054] It should be noted that the interferometric detection optical path is constructed based on the aberration-free method. This path mainly consists of an interferometer, a conical mirror group, and a reference mirror. During wavefront measurement, the measurement beam emitted by the interferometer passes through the conical mirror group, is reflected by the reference mirror, and then passes back through the conical mirror group before returning to the interferometer to form interference fringes. These fringes are then calculated using the wavefront measurement algorithm attached to the interferometer to obtain the wavefront aberration distribution data (i.e., the actual data of the interferometric detection optical path).

[0055] A geometric optics model was built based on actual data.

[0056] Specifically, the actual data is obtained from wavefront measurements.

[0057] The conical mirror assembly in this embodiment consists of two conical mirrors, which are arranged at intervals. The two conical mirrors are two convex conical mirrors; and / or

[0058] The two conical mirrors are two concave conical mirrors; and / or

[0059] The two conical mirrors consist of one concave conical mirror and one convex conical mirror.

[0060] It should be noted that a conical mirror assembly consists of two convex conical mirrors, two concave conical mirrors, or one concave and one convex conical mirror at a specific interval. The conical surfaces of the two conical mirrors are arranged opposite to each other or facing each other. The conical mirror assembly transmits or reflects the light beam.

[0061] In practice, the conical surface shape of a conical mirror is specifically as follows:

[0062] , where z is the sagittal height, r is the radial coordinate, and θ is the base angle of the conical mirror.

[0063] It should be noted that the base angle of a concave conical mirror is positive, while the base angle of a convex conical mirror is negative. The edge sagitta of a concave conical mirror is greater than the center sagitta, while the edge sagitta of a convex conical mirror is less than the center sagitta.

[0064] S2. Fit the initial system wavefront aberration distribution data to obtain the characteristic wavefront aberration coefficients;

[0065] Among them, the fitting of characteristic wavefront aberration coefficients can be achieved through the software attached to the interferometer.

[0066] Specifically, the characteristic wavefront aberration coefficients are obtained by fitting orthogonal Zernike polynomials within the circular aperture, and the calculation method is as follows:

[0067] ,

[0068] Where W represents the wavefront aberration distribution within the circular aperture, ρ is the radial coordinate, θ is the angular coordinate, M is the number of Zernike polynomials, and a i Z represents the characteristic wavefront aberration coefficient of the i-th term. i Let be the i-th Zernike polynomial.

[0069] S3. Obtain the adjustment amount based on the characteristic wavefront aberration coefficients and the preset quantitative mapping relationship;

[0070] Specifically, the adjustment amount refers to the spatial pose adjustment amount of the conical mirror, which can be a single-dimensional translation or tilt, or a multi-dimensional translation and tilt.

[0071] It should be noted that in the preset quantitative mapping relationship, the adjustment amount corresponds one-to-one with the characteristic wavefront aberration coefficient.

[0072] Specifically, the specific adjustment values ​​corresponding to the characteristic wavefront aberration coefficients are independent of each other; that is, a specific adjustment value only affects the corresponding characteristic wavefront aberration coefficient.

[0073] In practice, the quantitative mapping relationship between specific adjustment amounts and characteristic wavefront aberration coefficients is obtained based on the ray tracing method.

[0074] In this embodiment, the adjustment amount is specifically the spatial pose adjustment amount of the conical mirror. The spatial pose adjustment amount includes translation of the conical mirror in a single dimension, tilting of the conical mirror in a single dimension, translation of the conical mirror in multiple dimensions, and tilting of the conical mirror in multiple dimensions.

[0075] Specifically, the methods for obtaining the preset quantitative mapping relationship include:

[0076] ;

[0077] Among them, a i denoted as characteristic wavefront aberration coefficient, j is a positive integer, N is the order, k is the dimension of the adjustment amount, b is the coefficient solved by the geometric optics model, and x is the adjustment amount.

[0078] In practice, after fitting the characteristic wavefront aberration coefficients based on the measured wavefront aberration distribution, the assembly adjustment amount is solved based on the quantitative mapping relationship.

[0079] It should be noted that the root mean square value of the residual is minimized when calculating the assembly and adjustment amount. The mathematical expression for the residual is:

[0080] ;

[0081] in, Let be the i-th characteristic wavefront aberration coefficient corresponding to the adjustment amount, and Δ be the residual between the wavefront aberration corresponding to the solved adjustment amount and the measured system wavefront aberration.

[0082] S4. Adjust the interferometric detection optical path based on the adjustment amount.

[0083] Specifically, the system is assembled and adjusted according to the adjustment amount obtained in the above steps, and the wavefront aberration distribution of the assembled and adjusted system is measured. The assembly and adjustment can be achieved by adjusting mechanism 4 or by changing the geometric dimensions of the existing structure.

[0084] S5. Repeat the fitting, solving, assembly, and measurement steps of S2-S4 above for iterative assembly and adjustment until the wavefront aberration distribution of the system meets the requirements.

[0085] Specifically, the iterative assembly and adjustment method for the conic mirror assembly ensures that the wavefront aberration of the system converges monotonically in each assembly and adjustment through a simple quantitative mapping relationship. Combined with iterative repetition steps, it achieves efficient assembly and adjustment of the conic mirror assembly, solving the technical problems of high assembly and adjustment accuracy requirements and low actual assembly and adjustment efficiency in related technologies.

[0086] Example 2

[0087] In this embodiment, refer to Figure 1 The optical path for interferometric detection of conical mirror group based on the aberration-free method includes an interferometer module, a conical mirror group module, a reference mirror module, and a computer processing module 7.

[0088] The interferometer module includes an interferometer host 1 and an interferometer transmission standard mirror 2;

[0089] The conical mirror module consists of a concave conical mirror (first conical mirror 3) and a convex conical mirror (second conical mirror 5). The concave conical mirror is held by a four-dimensional adjustment frame, which can adjust the vertical and horizontal translation, as well as the pitch and yaw angles.

[0090] The reference mirror module is a reference mirror held in place by a two-dimensional adjustment frame;

[0091] The computer processing module 7 includes an assembly and adjustment mechanism control unit and a data analysis and processing unit. The assembly and adjustment mechanism control unit is used to control the spatial pose of the concave conical mirror, and the data analysis and processing unit processes the data results measured by the interferometer to solve for the assembly and adjustment amount.

[0092] In practice, the interferometer host 1 generates a parallel beam of light. Part of it is reflected by the interferometer transmission standard mirror 2 to form a reference beam; the other part passes through the interferometer transmission standard mirror 2 to form a test beam, which passes through the first conical mirror 3 and the second conical mirror 5 fixed by the adjustment mechanism 4 in sequence, and is incident on the reflecting mirror 6.

[0093] Subsequently, the light is reflected and returns to the interferometer along its original path, where it encounters and interferes with the reference beam inside the interferometer, generating an interference pattern. The wavefront aberration distribution is then calculated by the interferometer. Data processing (i.e., solving for the adjustment parameters) is completed by computer processing module 7 to obtain the adjustment parameters to be executed.

[0094] In this embodiment, combined with Figure 3 As shown, the iterative assembly and adjustment method for the conical mirror assembly mainly includes:

[0095] S1. Construction as follows Figure 1 The conical mirror interferometric detection system shown is used to adjust the positions and orientations of the transmission standard mirror 2, the concave conical mirror (first conical mirror 3), the convex conical mirror (second conical mirror 5), and the reference mirror, and to measure the initial wavefront aberration distribution of the system.

[0096] S2. According to Figure 1 A geometric optical model of the conical mirror group is established, and the quantitative mapping relationship f between a specific adjustment amount X={x1, x2, x3, x4} (corresponding to translation and tilt in the x and y directions respectively) and the characteristic wavefront aberration coefficients A={a5, a6, a7, a8} (corresponding to the 5th to 8th Zernike polynomial coefficients respectively) is obtained by ray tracing.

[0097] S3. Input the characteristic wavefront aberration coefficients of the interferometer output into the computer processing module 7, and use the above mapping relationship f to solve for the adjustment amount.

[0098] S4. After adjusting the configuration of structure 4, measure the wavefront aberration distribution of the system.

[0099] S5. Repeat the fitting solution, assembly and adjustment, and measurement steps of S2-S4 until the wavefront aberration of the system meets the requirements.

[0100] Example 3

[0101] This embodiment uses a conical mirror assembly and adjustment method to conduct experimental measurements on a conical mirror assembly, as shown in the example. Figure 1The diagram shows the interferometric detection optical path of a conical mirror group based on the aberration-free method. The concave and convex conical mirrors used are made of fused silica glass, with a cone angle of 10° and thicknesses of 10mm and 20mm respectively. The conical mirror group composed of these concave and convex conical mirrors shapes a flat-top beam with a diameter of 40mm into a hollow beam with an inner diameter of 20mm and an outer diameter of 60mm.

[0102] See Figure 2 In this embodiment, the peak-to-valley value of the initial wavefront aberration distribution within a 40mm diameter aperture is approximately 14λ, the root mean square value is 1.678λ, and λ is 632.8nm. Based on the above data, a geometric optical model of the conical mirror assembly is constructed in the optical simulation software ZEMAX. The quantitative mapping relationship f between specific adjustment values ​​X={x1, x2, x3, x4, x5, x6} and characteristic wavefront aberration coefficients A={a5, a6, a7, a8} is obtained using ray tracing. The corresponding mathematical expression is:

[0103] ,

[0104] Wherein, coefficient b1-b 10 Using the values ​​0.1, 0.1, 0.09, 0.09, 0.09, 0.09, 20, 20, 20, and 20 respectively, the adjustment amounts, i.e., the translation and tilt in the x and y directions, can be solved using the characteristic wavefront aberration coefficients and the quantitative mapping relationship expression. After the first adjustment according to the solved adjustment amounts, the peak and valley values ​​of the system's wavefront aberrations are approximately 4.6λ, and the root mean square value is 0.525λ.

[0105] Furthermore, a second assembly and adjustment was performed according to the solved assembly and adjustment values. The peak and valley values ​​of the system wavefront aberration were approximately 1.6λ, and the root mean square value was 0.091λ.

[0106] Furthermore, a third adjustment is performed according to the solved adjustment values. The peak and valley values ​​of the system wavefront aberration are approximately 1.6λ, and the root mean square value is 0.054λ.

[0107] Understandably, the wavefront distribution of the system after three adjustments shows no significant low-order aberrations, which meets the usage requirements.

[0108] The conical mirror assembly and adjustment method of this embodiment does not require complex computer-aided assembly and adjustment models and pre-measurement calibration, thus achieving high-efficiency assembly and adjustment of the conical mirror assembly and solving the technical problems of high accuracy requirements and low actual assembly and adjustment efficiency in the prior art.

[0109] Example 4

[0110] This embodiment also provides a conical mirror assembly and adjustment system for implementing the conical mirror assembly and adjustment method of Embodiment 1, such as... Figure 4 As shown.

[0111] The conical mirror assembly and adjustment system includes:

[0112] The data acquisition unit is electrically connected to the interferometer host 1 and is used to acquire the actual data of the geometric optical model and the initial system wavefront aberration distribution data based on the interferometric detection optical path of the conical mirror group, and transmit the data to the fitting unit; at the same time, it can acquire the wavefront aberration distribution data in real time during the iterative assembly and adjustment process to realize real-time data transmission.

[0113] The fitting unit is electrically connected to the data acquisition unit and has a built-in Zernike polynomial fitting algorithm. It is used to fit the wavefront aberration distribution data transmitted by the data acquisition unit, obtain the characteristic wavefront aberration coefficients, and transmit the coefficients to the calculation unit.

[0114] The calculation unit is electrically connected to the fitting unit and has a pre-stored quantitative mapping relationship based on the ray tracing method. It is used to substitute the characteristic wavefront aberration coefficients transmitted by the fitting unit into the quantitative mapping relationship, and solve the assembly adjustment amount with the goal of minimizing the root mean square value of the residual. The assembly adjustment amount is then converted into a control signal and transmitted to the adjustment unit.

[0115] The adjustment unit, electrically connected to the calculation unit and the adjustment mechanism 4, is used to receive control signals from the calculation unit and drive the adjustment mechanism 4 to precisely adjust the spatial pose of the conic mirror, thereby automating the assembly and adjustment operation. At the same time, it can transmit the feedback signal of the adjustment completion to the data acquisition unit to trigger the next wavefront aberration data acquisition, thereby realizing the closed-loop control of iterative assembly and adjustment.

[0116] Using the above setup, a geometrical optical model corresponding to the interferometric detection optical path is constructed based on the aberration-free method. A quantitative mapping relationship between specific adjustment amounts and characteristic wavefront aberration coefficients is established using ray tracing. Based on this, the characteristic wavefront aberration coefficients are obtained by fitting the actual measured wavefront aberration distribution. The adjustment amount is then solved according to the quantitative mapping relationship, and adjustment is performed. Finally, the wavefront aberration distribution after adjustment is measured. Simultaneously, the conical mirror assembly is iteratively adjusted through repeated fitting, solution, adjustment, and measurement steps until the system's wavefront aberration distribution meets the requirements. This method achieves efficient adjustment of the conical mirror assembly through a simple quantitative mapping relationship and iterative steps, making it suitable for batch adjustment applications of conical mirror assemblies. It solves the technical problems of high adjustment accuracy requirements and low actual adjustment efficiency in related technologies, demonstrating broad application prospects and engineering value.

[0117] Example 5

[0118] This embodiment also provides a computer-readable storage medium storing computer-readable instructions, which, when executed by a processor, implement the various steps of the conic mirror assembly and adjustment method or the conic mirror assembly and adjustment system described above.

[0119] This invention can take the form of a computer program product implemented on one or more storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing program code. Computer-readable storage media include permanent and non-permanent, removable and non-removable media, and information storage can be implemented by any method or technology. Information can be computer-readable instructions, data structures, program modules, or other data. Examples of computer-readable storage media include, but are not limited to: novel memories such as phase-change memory / resistive random access memory / magnetic memory / ferroelectric memory (PRAM / RRAM / MRAM / FeRAM), static random access memory (SRAM), dynamic random access memory (DRAM), other types of random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), flash memory or other memory technologies, read-only optical disc read-only memory (CD-ROM), digital versatile optical disc (DVD) or other optical storage, magnetic tape, magnetic magnetic disk storage or other magnetic storage devices, or any other non-transfer medium that can be used to store information accessible by a computing device.

[0120] The above specific embodiments further illustrate the purpose, technical solution, and beneficial effects of the present invention. It should be understood that the above are merely specific embodiments of the present invention and are not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A method for assembling and adjusting a conical mirror, characterized in that, Includes the following steps: S1. Obtain the geometric optical model and initial system wavefront aberration distribution data based on the interferometric detection optical path of the conical mirror group; S2. Fit the initial system wavefront aberration distribution data to obtain the characteristic wavefront aberration coefficients; S3. Obtain the adjustment amount based on the characteristic wavefront aberration coefficients and the preset quantitative mapping relationship; S4. Adjust the interferometric detection optical path of the conical mirror group based on the aforementioned adjustment amount; S5. Iteratively adjust the conical mirror assembly, repeating steps S2 to S4 until the wavefront aberration distribution of the system meets the preset usage requirements.

2. The method for assembling and adjusting a conical mirror according to claim 1, characterized in that, The conical mirror assembly consists of two conical mirrors placed at intervals. The combination of the conical mirrors can be two convex conical mirrors, two concave conical mirrors, or a combination of one concave conical mirror and one convex conical mirror. The conical surfaces of the two conical mirrors are arranged opposite or facing each other.

3. The method for assembling and adjusting a conical mirror according to claim 2, characterized in that, The method for obtaining the geometric optics model in step S1 includes: S1-1. Obtain the actual data of the interference detection optical path, the actual data including the material refractive index, base angle, thickness, relative pose and aperture of the two conical mirrors; S1-2. Based on the actual data, construct a geometric optical model that matches the actual interferometric detection optical path.

4. The method for assembling and adjusting a conical mirror according to claim 2, characterized in that, The expressions for the conical surface elevation of both conical mirrors are: ， in, For the arrow height, Radial coordinates, The base angle of a conical mirror is positive for a concave conical mirror and negative for a convex conical mirror.

5. The method for assembling and adjusting a conical mirror according to claim 2, characterized in that, The adjustment amount is the spatial pose adjustment amount of the conic mirror, which includes any one or more of the following: single-dimensional translation of the conic mirror, single-dimensional tilt of the conic mirror, combination of translations of the conic mirror in multiple dimensions, and combination of tilts of the conic mirror in multiple dimensions.

6. The method for assembling and adjusting a conical mirror according to claim 5, characterized in that, In the preset quantitative mapping relationship, the adjustment amount and the characteristic wavefront aberration coefficient are in one-to-one correspondence, and a specific adjustment amount only affects the corresponding characteristic wavefront aberration coefficient.

7. The method for assembling and adjusting a conical mirror according to claim 6, characterized in that, The expression for the method of obtaining the preset quantitative mapping relationship is: ， Among them, a i denoted as characteristic wavefront aberration coefficient, j is a positive integer, N is the order, k is the dimension of the adjustment amount, b is the coefficient solved by the geometric optics model, and x is the adjustment amount.

8. The method for assembling and adjusting a conical mirror according to claim 1, characterized in that, The characteristic wavefront aberration coefficients are obtained by fitting orthogonal Zernike polynomials within a circular aperture, and the fitting expression is: ， in, The wavefront aberration distribution within a circular aperture. Radial coordinates, Angular coordinates, The number of Zernike polynomials, For the first Characteristic wavefront aberration coefficients, For the first Zernike polynomial.

9. The method for assembling and adjusting a conical mirror according to claim 1, characterized in that, The interferometric detection optical path of the conical mirror group is built based on the aberration-free method, including an interferometer host, an interferometer transmission standard mirror, a first conical mirror, an adjustment mechanism, a second conical mirror, and a reflecting mirror. The measurement beam emitted by the interferometer is reflected by the reflecting mirror through the conical mirror group and returns along the original path, forming interference fringes with the reference beam, and the wavefront aberration distribution data is calculated.

10. A conical mirror assembly and adjustment system, characterized in that, The system includes the conical mirror assembly and adjustment method as described in any one of claims 1-9, wherein the system comprises: The data acquisition unit is used to acquire geometric optical model and initial system wavefront aberration distribution data based on the interferometric detection optical path of the conical mirror group; The fitting unit is electrically connected to the data acquisition unit and is used to fit the initial system wavefront aberration distribution data to obtain characteristic wavefront aberration coefficients. The calculation unit, electrically connected to the fitting unit, is used to solve and obtain the assembly adjustment amount based on the characteristic wavefront aberration coefficients and the preset quantitative mapping relationship. An adjustment unit, electrically connected to the calculation unit, is used to adjust the interferometric detection optical path of the conical mirror group based on the adjustment amount, and to perform iterative adjustment operations on the conical mirror group until the wavefront aberration distribution of the system meets the preset usage requirements.

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