Processing jig of Mask mask

Abstract

The invention belongs to the technical field of mask plate processing, and provides a Mask mask plate processing jig which comprises a bottom plate, a through groove is formed in the bottom plate, one side of the through groove communicates with a feeding groove, first mounting grooves are formed in the four corners of the through groove correspondingly, and three sets of first Teflon limiting blocks and a set of second Teflon limiting blocks are arranged in the first mounting grooves; a supporting groove is formed in the first Teflon limiting block, and the upper surface of the second Teflon limiting block is flush with the supporting face of the supporting groove. Compared with the prior art, the device has the following beneficial effects that rapid positioning and clamping of the mask plate are achieved through the first Teflon limiting blocks and the Teflon positioning blocks, the mask plate positioning contact part and corners are subjected to all-directional anti-static through the first Teflon limiting blocks and the Teflon positioning blocks, the risk that impurities are adsorbed by static electricity is reduced, and the anti-static effect is achieved. And the surface precision of the mask is protected.

Description

Technical Field

[0001] This invention belongs to the field of mask processing technology, and particularly relates to a processing fixture for mask dies. Background Technology

[0002] In fields such as semiconductor manufacturing, the mask is a core component of the photolithography process. During its processing and inspection, it is necessary to use fixtures to achieve precise positioning and clamping.

[0003] Existing fixtures are prone to attracting tiny particles and dust due to static electricity during use, which affects the accuracy of the mask. Traditional fixtures do not fully consider anti-static design, or the layout and material selection of anti-static components are unreasonable, making it difficult to effectively avoid the hazards of static electricity. Summary of the Invention

[0004] The purpose of this invention is to provide a processing fixture for mask dies, which aims to solve the technical problem in the prior art where the mask precision decreases due to the electrostatic adsorption of impurities.

[0005] The present invention is implemented as follows: a processing fixture for a mask includes a base plate, a through groove is formed on the base plate, a feeding groove is connected to one side of the through groove, and a first mounting groove is formed at each of the four corners of the through groove. Three sets of first Teflon limiting blocks and one set of second Teflon limiting blocks are arranged in the first mounting groove. The first Teflon limiting blocks are provided with support grooves, and the upper surface of the second Teflon limiting blocks is flush with the support surface of the support groove. A second mounting groove is provided on the base plate in the area corresponding to the location of the second Teflon limiting block. The second mounting groove is connected to the through groove. A cylinder is fixedly installed in the second mounting groove. The cylinder points to the connection between the second mounting groove and the through groove. A Teflon positioning block is fixedly installed at the output end of the cylinder. A right-angle groove is provided at the end of the Teflon positioning block. There is a gap between the upper surface of the Teflon positioning block and the second Teflon limiting block.

[0006] Further technical solution: Both the first Teflon limiting block and the second Teflon limiting block are provided with countersunk holes, and fixing screws are provided in the countersunk holes. The fixing screws are used in conjunction with the threaded holes provided in the first mounting groove.

[0007] A further technical solution: A first air hole is provided on the bottom surface of the first mounting groove, and a second air hole is provided on the first Teflon limiting block and the second Teflon limiting block at the position corresponding to the first mounting groove. After the first Teflon limiting block and the second Teflon limiting block are installed, the second air hole is connected to the first air hole, and the first air hole is connected to the first ion fan fixedly installed on the base plate.

[0008] A further technical solution: The first ion fan is connected to a connecting ring fixedly installed on the base plate. Multiple sets of connecting pipes are connected to the connecting ring, and the end of the connecting pipe away from the connecting ring is connected to the corresponding first air hole.

[0009] A further technical solution: multiple sets of mounting shafts are rotatably mounted on the base plate, the multiple sets of mounting shafts are rotatably connected, and a motor that drives one set of mounting shafts to rotate is fixedly mounted on the base plate. The mounting shafts correspond to the positions of the first Teflon limiting block, the mounting shafts penetrate the base plate, and a shielding box is provided on the mounting shafts.

[0010] A further technical solution: The projection of the shielding box onto the base plate is L-shaped and corresponds to one corner of the mask. The cross-section of the shielding box is a right triangle, and the side with the hypotenuse is close to the mounting axis. The projection of the bottom of the shielding box onto the base plate is located on the mask.

[0011] A further technical solution: A vertical plate is fixedly installed at one end of the mounting shaft, a support plate is slidably installed on the vertical plate, a shielding box is fixedly installed at the end of the support plate, an electric telescopic rod is fixedly installed on the base plate, an L-shaped lifting plate is fixedly installed at the end of the electric telescopic rod, and multiple sets of connecting rings corresponding to the position of the mounting shaft are fixedly installed on the lifting plate. The connecting rings are coaxially arranged with the mounting shaft and the support plate is slidably connected to the connecting rings.

[0012] A further technical solution: A second gear is fixedly installed at the output end of the motor. The second gear meshes with a first gear fixedly installed on the mounting shaft. Synchronous pulleys are fixedly installed on each mounting shaft. Two sets of synchronous pulleys are provided on the middle set of mounting shafts. The two adjacent sets of mounting shafts are connected by a synchronous belt through the synchronous pulleys to rotate together.

[0013] A further technical solution: an air blowing channel is provided on the inclined surface of the shielding box, the air blowing channel is located at the lower end of the shielding box, and the shielding box is connected to a second ion fan fixedly installed on the base plate through a pipe.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. The photomask is supported by multiple sets of first and second Teflon limiting blocks. A cylinder drives the Teflon positioning blocks to move, which in turn moves the photomask until all four sides of the photomask contact the first and second Teflon limiting blocks. The first and second Teflon limiting blocks enable rapid positioning and clamping of the photomask. The first and second Teflon limiting blocks and the second Teflon positioning blocks provide all-around anti-static protection for the positioning contact points and corners of the photomask, reducing the risk of electrostatic adsorption of impurities and protecting the surface precision of the photomask. Furthermore, the buffering and stabilizing properties of the first Teflon limiting block material, combined with the controllable pressure of the cylinder, ensures stable clamping of the photomask, avoids rigid damage, enhances resistance to external interference, and ensures stable processing and testing.

[0015] 2. After the photomask is placed on the first Teflon limiting block for support, air is discharged along the connecting pipe, the first air hole, and the second air hole. After the ionized air is discharged, it pushes the photomask upward to create a gap between it and the first Teflon limiting block. At this time, the pressure of the photomask on the first Teflon limiting block decreases, and the friction decreases. Then, when the Teflon positioning block pushes the photomask to move, it can move more smoothly. During the movement of the photomask, the particles generated by friction are blown away from the contact surface between the photomask and the first and second Teflon limiting blocks by the air. At the same time, the ionized air can further reduce the static electricity generated on the photomask, further reducing the probability of impurities adsorbing on the photomask, ensuring that the photomask is placed in a horizontal state, and ensuring the accuracy of subsequent processing.

[0016] 3. When ionized air is blown toward the first Teflon limiting block, due to the shielding of the first Teflon limiting block, some air will move upward along the surface of the first Teflon limiting block. The air cleans the surface of the first Teflon limiting block in contact with the photomask. At the same time, the air can form a buffer wall on this surface, reducing the impact when the photomask contacts the first Teflon limiting block, and further improving the stability of the photomask during clamping.

[0017] 4. When ionized air flows upward along the surface of the first Teflon limiting block and the side of the through groove, the air flows away from the shielding box after contacting the inclined surface of the shielding box. As a result, the particles carried in the air will also move away. At the same time, the second ion fan delivers air into the shielding box. The air is blown through the air duct to the upper surface of the corner of the mask, thereby reducing the probability of particles moving onto the mask, improving the cleanliness of the upper surface of the mask, and further improving the quality of subsequent processing.

[0018] 5. During the mask feeding process, the air flowing upward along the surface of the first Teflon limiting block and the side of the through groove blows away the particles generated by friction during feeding. The shielding box moves the air and particles away from the mask, reducing the number of impurities on the mask. At the same time, the air can clean the surface of the first Teflon limiting block, ensuring the accuracy of subsequent mask placement and clamping. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the substrate structure in this invention.

[0020] Figure 2 This is a schematic diagram of the overall first-view structure of the present invention.

[0021] Figure 3 This is a schematic diagram of the overall second-view structure of the present invention.

[0022] Figure 4 This is a schematic diagram of the structure for removing the mask in this invention.

[0023] Figure 5 This is a schematic diagram of the exploded structure of the first Teflon limiting block and the substrate in this invention.

[0024] Figure 6 This is a schematic diagram of the structure for mounting the shaft in this invention.

[0025] Figure 7 for Figure 4 A magnified view of region A1 in the middle.

[0026] Figure 8 for Figure 5 A magnified view of region A2 in the middle.

[0027] In the attached diagram: 1. Base plate; 2. Through groove; 3. Feeding groove; 4. First mounting groove; 5. Threaded hole; 6. First air hole; 7. Connecting pipe; 8. Connecting ring; 9. First ion fan; 10. First Teflon limiting block; 11. Second air hole; 12. Support groove; 13. Countersunk hole; 14. Fixing screw; 15. Mounting shaft; 16. Vertical plate; 17. Support plate; 18. Shielding box; 19. Synchronous pulley; 20. Synchronous belt; 21. First gear; 22. Motor; 23. Second gear; 24. Electric telescopic rod; 25. Lifting plate; 26. Connecting ring; 27. Blowing groove; 28. Cylinder; 29. ​​Teflon positioning block; 30. Second mounting groove; 31. Second ion fan; 32. Second Teflon limiting block. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0029] The specific implementation of the present invention will be described in detail below with reference to specific embodiments.

[0030] like Figures 1-8 As shown, a processing fixture for a mask plate provided by the present invention includes a base plate 1, a through groove 2 on the base plate 1, a feeding groove 3 connected to one side of the through groove 2, and a first mounting groove 4 at each of the four corners of the through groove 2. Three sets of first Teflon limiting blocks 10 and one set of second Teflon limiting blocks 32 are disposed within the first mounting groove 4. A support groove 12 is provided on the first Teflon limiting block 10, and the upper surface of the second Teflon limiting block 32 is flush with the support surface of the support groove 12. A Teflon positioning block 29 is spaced from the upper surface of the second Teflon limiting block 32. Countersunk holes 13 are provided on both the first Teflon limiting block 10 and the second Teflon limiting block 32, and fixing screws 14 are disposed within the countersunk holes 13. The fixing screws 14 are used in conjunction with threaded holes 5 opened in the first mounting groove 4. A second mounting groove 30 is provided on the base plate 1 in the area corresponding to the location of the second Teflon limiting block 32. The second mounting groove 30 is connected to the through groove 2. A cylinder 28 is fixedly installed in the second mounting groove 30. The cylinder 28 points to the connection between the second mounting groove 30 and the through groove 2. A Teflon positioning block 29 is fixedly installed at the output end of the cylinder 28. A right-angle groove is provided at the end of the Teflon positioning block 29.

[0031] In practical application, in the initial state, the Teflon positioning block 29 is located in the second mounting groove 30. The mask is placed from the loading groove 3 into the through groove 2 by a loading robot or manually. At this time, the mask is supported by multiple sets of first Teflon limiting blocks 10 and second Teflon limiting blocks 32. Then, the cylinder 28 drives the Teflon positioning block 29 to move, and the Teflon positioning block 29 enters the through groove 2 and contacts one corner of the mask. As the Teflon positioning block 29 moves, it pushes the mask to move until the first Teflon limiting block 10 diagonally opposite the second Teflon limiting block 32 contacts the side of the other corner of the mask. At this time, the four sides of the mask are in contact with the first Teflon limiting block 10 and the Teflon positioning block 29 respectively. The fluoropolymer limiting block 10 and the Teflon positioning block 29 enable rapid positioning and clamping of the photomask. The Teflon limiting block 10 and the Teflon positioning block 29 provide all-around anti-static protection for the photomask's positioning contact points and corners, reducing the risk of electrostatic adsorption of impurities and protecting the surface precision of the photomask. Furthermore, utilizing the buffering and stabilizing properties of the Teflon limiting block 10 material, combined with the controllable pressure of the cylinder 28, ensures stable clamping of the photomask, preventing rigid damage, enhancing resistance to external interference, and guaranteeing stability during processing and inspection. After clamping, subsequent processes can proceed. By replacing different models of the Teflon limiting block 10, different sizes of photomasks can be clamped. After the photomask processing is completed, the Teflon positioning block 29 resets, and the processed photomask can then be removed.

[0032] like Figure 5 , Figure 8 As shown, this invention provides a processing fixture for a mask plate. The bottom surface of the first mounting groove 4 is provided with a first air hole 6. The first Teflon limiting block 10 and the second Teflon limiting block 32 are provided with second air holes 11 at positions corresponding to the first mounting groove 4. After the first Teflon limiting block 10 and the second Teflon limiting block 32 are installed, the second air holes 11 are connected to the first air holes 6. The first air holes 6 are connected to the first ion fan 9 fixedly installed on the base plate 1.

[0033] Specifically, the first ion fan 9 is connected to a connecting ring 8 fixedly installed on the base plate 1. Multiple sets of connecting pipes 7 are connected to the connecting ring 8. The end of the connecting pipe 7 away from the connecting ring 8 is connected to the corresponding first air hole 6.

[0034] In practical application, after the mask is supported on the first Teflon limiting block 10, the first ion fan 9 delivers air into the connecting ring 8. The air then exits along the connecting pipe 7, the first air hole 6, and the second air hole 11. The ionized air pushes the mask upwards, creating a gap between it and the first Teflon limiting block 10. At this point, the pressure of the mask on the first Teflon limiting block 10 decreases, reducing friction. This allows the Teflon positioning block 29 to move the mask more smoothly. When the mask contacts the first Teflon limiting block 10 at the set position, the blowing stops. The Teflon positioning block 29 then moves a set distance in the opposite direction and contacts the mask again to complete the clamping. During the movement of the mask, friction-generated particles are blown out from between the mask and the first Teflon limiting block 10 and the second Teflon limiting block 3 by the airflow. The contact surfaces of the two Teflon blocks separate, and the ionized air further reduces the static electricity generated on the mask, further reducing the probability of impurities adsorbing on the mask, ensuring that the mask is placed in a horizontal state, and ensuring the accuracy of subsequent processing. When the ionized air blows towards the first Teflon limiting block 10, due to the shielding of the first Teflon limiting block 10, some air will move upward along the surface of the first Teflon limiting block 10, cleaning the surface of the first Teflon limiting block 10 in contact with the mask. At the same time, the air can form a buffer wall on this surface, reducing the impact when the mask contacts the first Teflon limiting block 10, and further improving the stability of the mask during clamping. The air at the location of the second Teflon limiting block 32 flows out from the gap between the Teflon positioning block 29 and the second Teflon limiting block 32 and will not flow upward.

[0035] like Figures 2-6 As shown, this invention provides a processing fixture for a mask plate. Multiple sets of mounting shafts 15 are rotatably mounted on a base plate 1. The multiple sets of mounting shafts 15 are rotatably connected, and a motor 22 that drives one set of mounting shafts 15 to rotate is fixedly mounted on the base plate 1. The mounting shafts 15 correspond to the positions of the first Teflon limiting block 10. The mounting shafts 15 penetrate the base plate 1, and a shielding box 18 is provided on the mounting shafts 15.

[0036] Specifically, the projection of the masking box 18 onto the base plate 1 is L-shaped and corresponds to one corner of the mask. The cross-section of the masking box 18 is a right triangle, and the side with the hypotenuse is close to the mounting axis 15. The projection of the bottom of the masking box 18 onto the base plate 1 is located on the mask.

[0037] Specifically, a vertical plate 16 is fixedly installed at one end of the mounting shaft 15, a support plate 17 is slidably installed on the vertical plate 16, a shielding box 18 is fixedly installed at the end of the support plate 17, an electric telescopic rod 24 is fixedly installed on the base plate 1, an L-shaped lifting plate 25 is fixedly installed at the end of the electric telescopic rod 24, and multiple sets of connecting rings 26 corresponding to the positions of the mounting shaft 15 are fixedly installed on the lifting plate 25. The connecting rings 26 are coaxially arranged with the mounting shaft 15 and the support plate 17 is slidably connected to the connecting rings 26.

[0038] Specifically, a second gear 23 is fixedly installed at the output end of the motor 22. The second gear 23 meshes with a first gear 21 fixedly installed on the mounting shaft 15. Synchronous pulleys 19 are fixedly installed on each mounting shaft 15. Two sets of synchronous pulleys 19 are provided on the middle set of mounting shafts 15. The two adjacent sets of mounting shafts 15 are connected by a synchronous belt 20 through the synchronous pulleys 19 to rotate together.

[0039] Specifically, a blowing groove 27 is provided on the inclined surface of the shielding box 18. The blowing groove 27 is located at the lower end of the shielding box 18. The shielding box 18 is connected to the second ion fan 31, which is fixedly installed on the base plate 1, through a pipe.

[0040] In practical application, after the mask is placed on the first Teflon limiting block 10 for support, the motor 22 drives the middle set of mounting shafts 15 to rotate through the meshing first gear 21 and second gear 23. Under the action of the synchronous pulley 19 and the synchronous belt 20, multiple sets of mounting shafts 15 rotate synchronously. The rotation of the mounting shafts 15 causes the shielding box 18 to move above the through groove 2 and the right angle side of the shielding box 18 is parallel to the corresponding side of the through groove 2. At this time, the lower end of the shielding box 18 is located in the projection area of ​​the mask. The inclined surface of the shielding box 18 shields the gap between the corner side of the mask and the side of the through groove 2. When ionized air flows upward along the surface of the first Teflon limiting block 10 and the side of the through groove 2, the air flows away from the shielding box 18 after contacting the inclined surface of the shielding box 18. As a result, the particles carried in the air will also move away. At the same time, the second ion fan 31 delivers air into the shielding box 18. The air is blown towards the upper surface of the corner of the mask through the blowing groove 27, thereby reducing the probability of particles moving onto the mask, improving the cleanliness of the upper surface of the mask, and further improving the quality of subsequent processing. After the mask is clamped, the shielding box 18 is reset and no longer shields the mask. When the photomask is removed after processing, the shielding box 18 moves again to above the corner of the photomask. As the photomask moves upward, the first ion blower 9 and the second ion blower 31 deliver air again. At the same time, the electric telescopic rod 24 drives the lifting plate 25 to move upward synchronously with the photomask until the photomask no longer contacts the first Teflon limiting block 10. Then, the first ion blower 9 and the second ion blower 31 stop blowing air, and the shielding box 18 resets. During the photomask unloading process, the air flowing upward along the surface of the first Teflon limiting block 10 and the side of the through groove 2 blows away the particles generated by friction during unloading. The shielding box 18 moves the air and particles away from the photomask, reducing the number of impurities on the photomask. At the same time, the air can clean the surface of the first Teflon limiting block 10, ensuring the accuracy of subsequent photomask placement and clamping.

[0041] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

[0042] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A processing fixture for a mask plate, comprising a base plate (1), wherein a through groove (2) is formed on the base plate (1), and a feeding groove (3) is connected to one side of the through groove (2), characterized in that, The four corners of the through groove (2) are provided with first mounting grooves (4). Three sets of first Teflon limiting blocks (10) and one set of second Teflon limiting blocks (32) are provided in the first mounting grooves (4). The first Teflon limiting blocks (10) are provided with support grooves (12), and the upper surface of the second Teflon limiting blocks (32) is flush with the support surface of the support grooves (12). A second mounting groove (30) is provided on the base plate (1) in the area corresponding to the location of the second Teflon limiting block (32). The second mounting groove (30) is connected to the through groove (2). A cylinder (28) is fixedly installed in the second mounting groove (30). The cylinder (28) points to the connection between the second mounting groove (30) and the through groove (2). A Teflon positioning block (29) is fixedly installed at the output end of the cylinder (28). A right-angle groove is provided at the end of the Teflon positioning block (29). A gap is provided between the upper surface of the Teflon positioning block (29) and the second Teflon limiting block (32).

2. The processing fixture for a mask dies according to claim 1, characterized in that, The first Teflon limiting block (10) and the second Teflon limiting block (32) are both provided with countersunk holes (13), and a fixing screw (14) is provided in the countersunk hole (13). The fixing screw (14) is used in conjunction with the threaded hole (5) opened in the first mounting groove (4).

3. The processing fixture for a mask dies according to claim 1, characterized in that, The bottom surface of the first mounting groove (4) is provided with a first air hole (6). The first Teflon limiting block (10) and the second Teflon limiting block (32) are provided with second air holes (11) at positions corresponding to the first mounting groove (4). After the first Teflon limiting block (10) and the second Teflon limiting block (32) are installed, the second air hole (11) is connected to the first air hole (6). The first air hole (6) is connected to the first ion fan (9) fixedly installed on the base plate (1).

4. The processing fixture for a mask dies according to claim 3, characterized in that, The first ion fan (9) is connected to a connecting ring (8) fixedly installed on the base plate (1). Multiple sets of connecting pipes (7) are connected to the connecting ring (8). The end of the connecting pipe (7) away from the connecting ring (8) is connected to the corresponding first air hole (6).

5. The processing fixture for a mask dies according to claim 1, characterized in that, Multiple sets of mounting shafts (15) are rotatably mounted on the base plate (1). The multiple sets of mounting shafts (15) are rotatably connected, and a motor (22) that drives one set of mounting shafts (15) to rotate is fixedly mounted on the base plate (1). The mounting shaft (15) corresponds to the position of the first Teflon limiting block (10). The mounting shaft (15) passes through the base plate (1), and a shielding box (18) is provided on the mounting shaft (15).

6. A processing fixture for a mask dies according to claim 5, characterized in that, The projection of the shielding box (18) onto the base plate (1) is L-shaped and corresponds to one corner of the mask. The cross section of the shielding box (18) is a right triangle, and the side with the hypotenuse is close to the mounting axis (15). The projection of the bottom of the shielding box (18) onto the base plate (1) is on the mask.

7. A processing fixture for a mask dies according to claim 6, characterized in that, A vertical plate (16) is fixedly installed at one end of the mounting shaft (15), a support plate (17) is slidably installed on the vertical plate (16), a shielding box (18) is fixedly installed at the end of the support plate (17), an electric telescopic rod (24) is fixedly installed on the base plate (1), an L-shaped lifting plate (25) is fixedly installed at the end of the electric telescopic rod (24), and multiple sets of connecting rings (26) corresponding to the position of the mounting shaft (15) are fixedly installed on the lifting plate (25). The connecting rings (26) are coaxially arranged with the mounting shaft (15) and the support plate (17) is slidably connected to the connecting rings (26).

8. A processing fixture for a mask dies according to claim 7, characterized in that, The output end of the motor (22) is fixedly equipped with a second gear (23), which meshes with a first gear (21) fixedly installed on the mounting shaft (15). Synchronous pulleys (19) are fixedly installed on each mounting shaft (15). Two sets of synchronous pulleys (19) are provided on the middle set of mounting shafts (15). The two adjacent sets of mounting shafts (15) are connected by a synchronous belt (20) through the synchronous pulleys (19) to rotate together.

9. A processing fixture for a mask dies according to claim 8, characterized in that, The shielding box (18) has a blowing groove (27) on its inclined surface. The blowing groove (27) is located at the lower end of the shielding box (18). The shielding box (18) is connected to the second ion fan (31) fixedly installed on the base plate (1) through a pipe.

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