Manufacturing method of mixed plasma fog type optical filter and mixed plasma fog type optical filter

Abstract

The invention discloses a mixed plasma fog type optical filter manufacturing method and a mixed plasma fog type optical filter, and the method comprises the steps: carrying out the first preprocessing of a to-be-processed glass substrate, and obtaining a first glass substrate; placing the first glass substrate in a vacuum cavity, and carrying out second pretreatment: carrying out bombardment pretreatment on the first glass substrate by adopting mixed gas plasma of argon and oxygen, and stopping bombardment after the haze value of the first glass substrate is 0.1-0.4, the visible light transmittance is greater than or equal to 93% and the surface roughness Ra is less than or equal to 1nm, so as to obtain a second glass substrate, the volume ratio of the argon in the mixed gas is 70%-90%, and the volume ratio of the oxygen is 10%-30%; and keeping the second glass substrate in a vacuum cavity environment, and depositing a filter film layer on the second glass substrate by adopting an ion-assisted process. The defects such as scratches and pits on the surface of the substrate are effectively removed, the visible light transmittance is guaranteed, and both the appearance quality and the optical performance are considered.

Description

Technical Field

[0001] This invention relates to the field of fog filter technology, and particularly to a method for manufacturing a hybrid plasma fog filter and a hybrid plasma fog filter. Background Technology

[0002] BG series blue glass, with its excellent infrared cutoff performance, high transmittance, and stable physicochemical properties, is a core substrate for manufacturing high-precision optical infrared filters. These filters are optical filters that allow visible light to pass through while blocking or reflecting infrared light. They are mainly used in digital cameras, mobile phones, computer webcams, monitors, and videophones. A film layer on the surface filters out high-frequency light waves passing through the camera lens, allowing only low-frequency light waves within a certain range to pass through. Manufacturing these filters typically requires depositing multiple layers of functional films with alternating high and low refractive indices on the substrate surface to achieve specific optical properties. The coating process is affected by various factors such as vacuum level, deposition rate, and ambient temperature and humidity, which can easily lead to abnormal film formation problems such as film thickness deviations, substandard transmittance, film peeling, pinholes, and other defects. Summary of the Invention

[0003] In existing technologies, when manufacturing infrared cut-off filters, abnormal film formation problems such as film thickness deviation, substandard light transmittance, film peeling, and pinholes are prone to occur.

[0004] To address the aforementioned issues, a method for fabricating a hybrid plasma haze filter and the hybrid plasma haze filter are proposed. The method involves bombarding a first glass substrate with a mixed gas plasma of argon and oxygen. Once the haze value of the first glass substrate is between 0.1 and 0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1 nm, the bombardment is stopped, resulting in a second glass substrate. The volume percentage of argon in the mixed gas is 70%–90%, and the volume percentage of oxygen is 10%–30%. This method effectively removes scratches, pits, and other defects from the substrate surface while ensuring visible light transmittance, thus balancing appearance quality and optical performance.

[0005] In a first aspect, a method for fabricating a hybrid plasma haze filter includes: Step 100: Perform a first pretreatment on the glass substrate to be processed to obtain a first glass substrate; Step 200: Place the first glass substrate inside the vacuum chamber for the second pretreatment. The first glass substrate is pretreated by bombarding it with a mixed gas plasma of argon and oxygen. After the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1nm, the bombardment is stopped to obtain the second glass substrate. The volume ratio of argon in the mixed gas is 70%~90%, and the volume ratio of oxygen is 10%~30%. Step 300: Hold the second glass substrate in a vacuum chamber environment and deposit a filter film layer on the second glass substrate using an ion-assisted process.

[0006] In conjunction with the method for fabricating a hybrid plasma haze filter described in the first aspect of the present invention, in a first possible embodiment, step 100 includes: Step 110: Perform ultrasonic cleaning and deionized water cleaning on the glass substrate to be processed. Step 120: After cleaning, the glass substrate to be processed is dried to obtain the first glass substrate.

[0007] In conjunction with the first possible embodiment of the first aspect of the present invention, in the second possible embodiment, step 200 includes: Step 210: Place the first glass substrate obtained after cleaning into the vacuum chamber with coating, evacuate the vacuum chamber, and introduce a mixture of argon and oxygen in a preset ratio. The temperature of the first glass substrate is controlled at 80~200℃. Step 220: Start the plasma generator to bombard the first glass substrate.

[0008] In conjunction with the second possible implementation of the first aspect of the present invention, in the third possible implementation, step 220 includes: Step 221: Control the power of the plasma generator between 500 and 1500W; Step 222: Continuously bombard the first glass substrate for 30~120s.

[0009] In conjunction with the method for fabricating a hybrid plasma haze filter described in the first aspect of the present invention, in a fourth possible embodiment, step 300 includes: Step 310: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 320: Deposit a single-layer dielectric film on the second glass substrate.

[0010] In conjunction with the method for fabricating a hybrid plasma haze filter described in the first aspect of the present invention, in a fifth possible embodiment, step 300 includes: Step 330: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 340: Deposit a multilayer alternating dielectric film on the second glass substrate, wherein the multilayer alternating dielectric film is formed by alternating stacking of high refractive index dielectric film and low refractive index dielectric film.

[0011] In conjunction with the method for fabricating a hybrid plasma haze filter described in the first aspect of the present invention, in a sixth possible embodiment, step 300 includes: Step 350: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 360: Deposit a multilayer alternating dielectric film on the second glass substrate. The multilayer alternating dielectric film is composed of alternating stacks of high refractive index dielectric film and low refractive index dielectric film. The film thickness is 500~5000nm. The high refractive index dielectric film is made of titanium pentoxide and the low refractive index dielectric film is made of silicon dioxide.

[0012] In a second aspect, a hybrid plasma haze filter, using the hybrid plasma haze filter manufacturing method described in the first aspect, includes: Glass substrate; Dielectric film layer; The glass substrate is obtained through: The glass substrate to be processed undergoes a first pretreatment to obtain a first glass substrate. The first glass substrate is then placed in a vacuum chamber for a second pretreatment. The first glass substrate was pretreated by bombarding it with a mixed gas plasma of argon and oxygen. The bombardment was stopped when the haze value of the first glass substrate was between 0.1 and 0.4, the visible light transmittance was ≥93%, and the surface roughness Ra was ≤1 nm, thus obtaining the second glass substrate. The volume percentage of argon in the mixed gas was 70% to 90%, and the volume percentage of oxygen was 10% to 30%. Made from; The dielectric film layer passes through: The second glass substrate is held in a vacuum chamber environment, and a filter film is deposited on the second glass substrate using an ion-assisted process. Made from.

[0013] In conjunction with the hybrid plasma fog filter described in the second aspect of the present invention, in a first possible embodiment, the dielectric film layer is multilayered; Multilayer dielectric films are composed of alternating stacks of high-refractive-index dielectric films and low-refractive-index dielectric films.

[0014] In conjunction with the first possible embodiment of the second aspect of the present invention, in the second possible embodiment, the high refractive index dielectric film is made of titanium pentoxide, and the low refractive index dielectric film is made of silicon dioxide.

[0015] The method for manufacturing a hybrid plasma haze filter and the hybrid plasma haze filter described in this invention involve bombarding a first glass substrate with a mixed gas plasma of argon and oxygen. When the haze value of the first glass substrate is between 0.1 and 0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1 nm, the bombardment is stopped to obtain a second glass substrate. The volume percentage of argon in the mixed gas is 70% to 90%, and the volume percentage of oxygen is 10% to 30%. This method can effectively remove defects such as scratches and pits on the substrate surface, while also ensuring visible light transmittance, thus balancing appearance quality and optical performance. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of an embodiment of the method for manufacturing a hybrid plasma fog filter according to the present invention; Figure 2 yes Figure 1 A schematic diagram of a specific embodiment of step 100; Figure 3 yes Figure 1 A schematic diagram of a specific embodiment of step 200; Figure 4 yes Figure 3 A schematic diagram of a specific embodiment of step 220; Figure 5 yes Figure 1 A schematic diagram of a specific embodiment of step 300; Figure 6 yes Figure 1 A schematic diagram of another specific embodiment of step 300; Figure 7 yes Figure 1 A schematic diagram of another specific embodiment of step 300. Detailed Implementation

[0018] The technical solutions of this invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this invention, and not all of them. Other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are all within the scope of protection of this invention.

[0019] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the specification of this invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0020] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0021] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0022] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0023] In existing technologies, when manufacturing infrared cut-off filters, abnormal film formation problems such as film thickness deviation, substandard light transmittance, film peeling, and pinholes are prone to occur.

[0024] To address the above problems, a method for manufacturing a hybrid plasma fog filter and a hybrid plasma fog filter are proposed.

[0025] Firstly, a method for fabricating a hybrid plasma haze filter, such as... Figure 1 , Figure 1 This is a schematic diagram of an embodiment of the method for manufacturing a hybrid plasma fog filter of the present invention; it includes step 100, performing a first pretreatment on the glass substrate to be processed to obtain a first glass substrate.

[0026] In one possible implementation, such as Figure 2 , Figure 2 yes Figure 1 A schematic diagram of a specific embodiment of step 100; step 100 includes: step 110, ultrasonic cleaning and deionized water cleaning of the glass substrate to be processed; step 120, after cleaning, drying the glass substrate to be processed to obtain a first glass substrate.

[0027] In this embodiment, the glass substrate is cleaned to remove surface contaminants such as dust particles, metal ions, and organic oil stains. However, it is difficult to remove defects such as scratches and pits by cleaning, so a second pretreatment is required.

[0028] Step 200: Place the first glass substrate in a vacuum chamber and perform a second pretreatment. Use a mixed gas plasma of argon and oxygen to bombard the first glass substrate. After the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1nm, stop bombarding to obtain the second glass substrate. The volume ratio of argon in the mixed gas is 70%~90%, and the volume ratio of oxygen is 10%~30%.

[0029] In one possible implementation, such as Figure 3 , Figure 3 yes Figure 1 A schematic diagram of a specific embodiment of step 200; step 200 includes: Step 210: Place the first glass substrate obtained after cleaning into the vacuum chamber of the coating, evacuate the vacuum chamber, and introduce a mixture of argon and oxygen in a preset ratio. The temperature of the first glass substrate is controlled at 80~200℃. Step 220: Start the plasma generator to bombard the first glass substrate.

[0030] In one possible implementation, such as Figure 4 , Figure 4 yes Figure 3 A schematic diagram of a specific embodiment of step 220; step 220 includes: step 221, controlling the power of the plasma generator to 500~1500W; step 222, continuously bombarding the first glass substrate for 30~120s.

[0031] It is worth noting that in this embodiment, a mixture of argon and oxygen is used, and a plasma generator is used to generate plasma of the mixture to bombard the substrate surface. This bombardment process is performed before coating to ensure the light transmittance and surface roughness of the substrate.

[0032] Step 300: Keep the second glass substrate in a vacuum chamber environment and deposit a filter film layer on the second glass substrate using an ion-assisted process.

[0033] In this embodiment, a mixed gas plasma is used to bombard the first glass substrate for pretreatment to remove surface defects such as scratches and pits. When the haze value is controlled at 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra≤1nm, the coating process is then carried out.

[0034] In one possible implementation, such as Figure 5 , Figure 5 yes Figure 1 A schematic diagram of a specific embodiment of step 300; step 300 includes: Step 310: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 320: Deposit a single-layer dielectric film on the second glass substrate.

[0035] In one possible implementation, such as Figure 6 , Figure 6 yes Figure 1 Another specific embodiment of step 300 is illustrated in the diagram; step 300 includes: Step 330: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 340: Deposit a multilayer alternating dielectric film on the second glass substrate. The multilayer alternating dielectric film is composed of alternating stacks of high refractive index dielectric film and low refractive index dielectric film.

[0036] In one possible implementation, such as Figure 7 , Figure 7 yes Figure 1 A schematic diagram of another specific embodiment of step 300. Step 300 includes: Step 350: According to the preset sputtering power, control the deposition rate at 0.1-0.5 nm / s. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 360: Deposit a multilayer alternating dielectric film on the second glass substrate. The multilayer alternating dielectric film is composed of alternating stacks of high refractive index dielectric film and low refractive index dielectric film. The film thickness is 500~5000nm. The high refractive index dielectric film is made of titanium pentoxide and the low refractive index dielectric film is made of silicon dioxide.

[0037] In this embodiment, the sputtering power is adjusted according to the target material, and the ion beam energy is 80-150eV within the tolerance range of the blue glass. If it is too high, it will damage the substrate. To balance the uniformity of the coating, the included angle is preferably 30°-60°.

[0038] In this embodiment, a first glass substrate is pretreated by bombarding it with a mixed gas plasma of argon and oxygen. When the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1nm, the bombardment is stopped to obtain a second glass substrate. The volume ratio of argon in the mixed gas is 70%~90%, and the volume ratio of oxygen is 10%~30%. This effectively removes defects such as scratches and pits on the substrate surface, while ensuring visible light transmittance, thus balancing appearance quality and optical performance.

[0039] In a second aspect, a hybrid plasma fog filter is provided, which adopts the hybrid plasma fog filter manufacturing method of the first aspect, including a glass substrate and a dielectric film layer. The glass substrate is prepared by: performing a first pretreatment on the glass substrate to be processed to obtain a first glass substrate; placing the first glass substrate in a vacuum chamber for a second pretreatment: bombarding the first glass substrate with a mixed gas plasma of argon and oxygen until the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra≤1nm; then stopping the bombardment to obtain a second glass substrate. The second glass substrate is prepared by the mixture of argon and oxygen with a volume ratio of 70%~90% and an oxygen volume ratio of 10%~30%. The dielectric film layer is fabricated by depositing a filter film layer on the second glass substrate using an ion-assisted process while the second glass substrate is kept in a vacuum chamber environment.

[0040] In one possible implementation, the dielectric film layer is multilayered; the multilayer dielectric film layer is composed of alternating stacks of high refractive index dielectric film layers and low refractive index dielectric film layers.

[0041] In one possible implementation, the high-refractive-index dielectric film is made of titanium pentoxide, and the low-refractive-index dielectric film is made of silicon dioxide.

[0042] The method for manufacturing a hybrid plasma haze filter and the hybrid plasma haze filter described in this invention involve bombarding a first glass substrate with a mixed gas plasma of argon and oxygen. When the haze value of the first glass substrate is between 0.1 and 0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1 nm, the bombardment is stopped to obtain a second glass substrate. The volume percentage of argon in the mixed gas is 70% to 90%, and the volume percentage of oxygen is 10% to 30%. This method can effectively remove defects such as scratches and pits on the substrate surface, while also ensuring visible light transmittance, thus balancing appearance quality and optical performance.

[0043] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method for manufacturing a hybrid plasma haze filter, characterized in that, include: Step 100: Perform a first pretreatment on the glass substrate to be processed to obtain a first glass substrate; Step 200: Place the first glass substrate inside the vacuum chamber for the second pretreatment. The first glass substrate is pretreated by bombarding it with a mixed gas plasma of argon and oxygen. After the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra is ≤1nm, the bombardment is stopped to obtain the second glass substrate. The volume ratio of argon in the mixed gas is 70%~90%, and the volume ratio of oxygen is 10%~30%. Step 300: Hold the second glass substrate in a vacuum chamber environment and deposit a filter film layer on the second glass substrate using an ion-assisted process.

2. The method for manufacturing a hybrid plasma haze filter according to claim 1, characterized in that, Step 100 includes: Step 110: Perform ultrasonic cleaning and deionized water cleaning on the glass substrate to be processed. Step 120: After cleaning, the glass substrate to be processed is dried to obtain the first glass substrate.

3. The method for manufacturing a hybrid plasma haze filter according to claim 1, characterized in that, Step 200 includes: Step 210: Place the first glass substrate obtained after cleaning into the vacuum chamber with coating, evacuate the vacuum chamber, and introduce a mixture of argon and oxygen in a preset ratio. The temperature of the first glass substrate is controlled at 80~200℃. Step 220: Start the plasma generator to bombard the first glass substrate.

4. The method for manufacturing a hybrid plasma haze filter according to claim 3, characterized in that, Step 220 includes: Step 221: Control the power of the plasma generator between 500 and 1500W; Step 222: Continuously bombard the first glass substrate for 30~120s.

5. The method for manufacturing a hybrid plasma haze filter according to claim 1, characterized in that, Step 300 includes: Step 310: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 320: Deposit a single-layer dielectric film on the second glass substrate.

6. The method for manufacturing a hybrid plasma haze filter according to claim 1, characterized in that, Step 300 includes: Step 330: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 340: Deposit a multilayer alternating dielectric film on the second glass substrate, wherein the multilayer alternating dielectric film is formed by alternating stacking of high refractive index dielectric film and low refractive index dielectric film.

7. The method for manufacturing a hybrid plasma haze filter according to claim 1, characterized in that, Step 300 includes: Step 350: Control the deposition rate at 0.1-0.5 nm / s according to the preset sputtering power. During the deposition process, control the ion beam energy at 80-150 eV and the angle between the ion beam and the surface of the second glass substrate at 30°-60°. Step 360: Deposit a multilayer alternating dielectric film on the second glass substrate. The multilayer alternating dielectric film is composed of alternating stacks of high refractive index dielectric film and low refractive index dielectric film. The film thickness is 500~5000nm. The high refractive index dielectric film is made of titanium pentoxide and the low refractive index dielectric film is made of silicon dioxide.

8. A hybrid plasma haze filter, manufactured using the hybrid plasma haze filter manufacturing method according to any one of claims 1-7, characterized in that, include: Glass substrate; Dielectric film layer; The glass substrate is obtained through: The glass substrate to be processed undergoes a first pretreatment to obtain a first glass substrate. The first glass substrate is then placed in a vacuum chamber for a second pretreatment. The first glass substrate is pretreated by bombarding it with a mixed gas plasma of argon and oxygen. After the haze value of the first glass substrate is 0.1~0.4, the visible light transmittance is ≥93%, and the surface roughness Ra≤1nm, the bombardment is stopped to obtain the second glass substrate. The second glass substrate is made by the volume ratio of argon in the mixed gas being 70%~90% and the volume ratio of oxygen being 10%~30%. The dielectric film layer passes through: The second glass substrate is held in a vacuum chamber environment, and a filter film is deposited on the second glass substrate using an ion-assisted process. Made from.

9. The hybrid plasma haze filter according to claim 1, characterized in that, The dielectric film layer is multilayered; Multilayer dielectric films are composed of alternating stacks of high-refractive-index dielectric films and low-refractive-index dielectric films.

10. The hybrid plasma haze filter according to claim 9, characterized in that, The high refractive index dielectric film is made of titanium pentoxide, and the low refractive index dielectric film is made of silicon dioxide.

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