Material mixing and crystallization tank and flammable and explosive material preparation and synthesis equipment

Abstract

The application discloses a kind of material mixing crystallization tank and flammable and explosive material preparation synthesis equipment, it is related to material mixing preparation technical field, material mixing crystallization tank includes tank body, cover, liquid flushing mechanism and gas purging mechanism, the upper portion of tank body is provided with slurry feed inlet and dilute feed inlet, dilute feed inlet is used to realize dilute into tank body, cover is used to close or open slurry feed inlet, slurry feed inlet is used to place slurry barrel and realize the slurry in slurry barrel into tank body, liquid flushing mechanism one end is located outside tank body and is used to pass into dilute, the other end extends to slurry feed inlet and slurry barrel and is used to flush slurry barrel, gas purging mechanism one end is located outside tank body and is used to pass into gas, the other end extends to slurry feed inlet and slurry barrel and is used to blow residual droplet on the inner wall of slurry barrel, to make material raw material in material mixing crystallization tank mix according to set proportion, improve product pass rate.

Description

Technical Field

[0001] This invention relates to the field of material mixing and preparation technology, and in particular to a material mixing crystallization tank and a synthesis equipment for preparing flammable and explosive materials. Background Technology

[0002] The core requirements for the preparation of flammable and explosive materials are: full-process source control, airtight isolation, inerting protection, ignition elimination, interlocking temperature control, and compliant management, preventing fire and explosion risks across the entire chain from process, equipment, operation, environment, and emergency response. Therefore, the preparation and synthesis of flammable and explosive materials is an operation with high safety requirements. The main equipment for the preparation and synthesis of flammable and explosive materials is located in a sealed isolation chamber, with robots assisting in feeding and discharging operations. Specifically, the equipment includes a thinner tank, a material mixing and crystallization tank, and a filter. The preparation and synthesis of flammable and explosive materials involves the following three main process steps: mixing, where the thinner and slurry are thoroughly mixed in the material mixing and crystallization tank; crystallization, where the mixed material crystallizes in the material mixing and crystallization tank; and filtration, where the crystallized material enters the filter for filtration.

[0003] Before mixing, the thinner and slurry need to be added to the material mixing and crystallization tank in proportion. The thinner is directly introduced into the material mixing and crystallization tank from the thinner tank through the pipeline, while the slurry is placed in the slurry tank. The slurry in the slurry tank is put into the tank through the slurry inlet of the material mixing and crystallization tank by manual labor or a robotic arm.

[0004] When slurry is added to the material mixing and crystallization tank using a slurry bucket, the high viscosity of the slurry tends to adhere to the bucket wall, leaving some slurry residue inside the bucket. This reduces the proportion of slurry added from the bucket to the material mixing and crystallization tank, causing a deviation in the raw material mixing ratio and resulting in a lower product qualification rate. Summary of the Invention

[0005] To solve the above technical problems, the present invention provides a material mixing crystallization tank and a flammable and explosive material preparation and synthesis device, which enables the raw materials in the material mixing crystallization tank to be mixed in a set proportion, thereby improving the product qualification rate.

[0006] To achieve the above objectives, the present invention provides the following solution: This invention provides a material mixing and crystallization tank, comprising a tank body, a cover, a liquid flushing mechanism, and a gas purging mechanism. The upper part of the tank body is provided with a slurry inlet and a thinner inlet. The thinner inlet is used to allow thinner to enter the tank body. The cover is used to close or open the slurry inlet. The slurry inlet is used to place a slurry tank and allow the slurry in the tank to enter the tank body. One end of the liquid flushing mechanism is located outside the tank body and is used to introduce thinner; the other end extends into the slurry inlet and the slurry tank and is used to flush the slurry tank. One end of the gas purging mechanism is located outside the tank body and is used to introduce gas; the other end extends into the slurry inlet and the slurry tank and is used to purge residual liquid droplets on the inner wall of the slurry tank.

[0007] Preferably, the liquid flushing mechanism includes a liquid supply pipe and a flushing nozzle. One end of the liquid supply pipe is located outside the tank and is used to introduce thinner, while the other end extends into the slurry inlet and is equipped with the flushing nozzle.

[0008] Preferably, the gas purging mechanism includes a gas supply pipe and a purging end. One end of the gas supply pipe is located outside the tank and is used to introduce gas, while the other end extends into the slurry inlet and is equipped with the purging end.

[0009] Preferably, the gas supply pipe is coaxially sleeved outside the liquid supply pipe, forming a gas channel between the gas supply pipe and the liquid supply pipe. The gas supply pipe is fixed to the slurry inlet, and the liquid supply pipe extends upward relative to the gas supply pipe at one end of the tank. The air blowing end is fixedly sleeved on the liquid supply pipe and the gas supply pipe.

[0010] Preferably, the liquid supply pipe includes a horizontal liquid supply pipe and a vertical liquid supply pipe fixedly connected to one end of the horizontal liquid supply pipe. The other end of the horizontal liquid supply pipe is used to introduce thinner. The flushing nozzle is fixedly installed on the top of the vertical liquid supply pipe, and the vertical liquid supply pipe extends into the slurry tank. The air supply pipe includes a horizontal air supply pipe and a vertical air supply pipe fixedly connected to one end of the horizontal air supply pipe. The horizontal air supply pipe and the horizontal liquid supply pipe are coaxially arranged. The vertical air supply pipe and the vertical liquid supply pipe are coaxially arranged. The vertical air supply pipe extends into the slurry tank. The vertical liquid supply pipe extends upward relative to the vertical air supply pipe. The horizontal air supply pipe is fixed to the slurry inlet and is used to introduce gas. The blowing head is fixedly installed on the top of the vertical air supply pipe and is fixedly sleeved on the outside of the vertical liquid supply pipe.

[0011] Preferably, the liquid supply vertical pipe is coaxially arranged with the slurry inlet, and the length of the liquid supply vertical pipe is not less than the depth of the slurry tank.

[0012] Preferably, the air blowing end includes an upper annular plate, a lower annular plate, and a hollow connecting assembly. The lower annular plate is fixedly sleeved on the outside of the top end of the air supply vertical pipe, and the upper annular plate is fixedly sleeved on the outside of the upper end of the liquid supply vertical pipe and located above the lower annular plate. The upper and lower ends of the hollow connecting assembly are fixedly connected to the upper annular plate and the lower annular plate, respectively. An annular purge port is formed between the upper annular plate and the lower annular plate, and the annular purge port communicates with the gas channel.

[0013] Preferably, the hollow connection assembly includes multiple connecting posts, and the upper and lower ends of each connecting post are respectively fixedly connected to the upper annular plate and the lower annular plate; the upper annular plate is an upper conical annular plate, and the lower annular plate is a lower conical annular plate.

[0014] Preferably, the flushing nozzle includes a plurality of spray nozzles, which are evenly arranged on the top and periphery of the flushing nozzle.

[0015] This embodiment also provides a flammable and explosive material preparation and synthesis device, including a thinner supply mechanism, a gas supply component, a slurry tank, a filter, a controller, and a material mixing and crystallization tank. The thinner inlet is connected to the thinner supply mechanism via a feed pipe, and a feed valve is provided on the feed pipe. One end of the liquid flushing mechanism located outside the tank is connected to the thinner supply mechanism via a first pipeline, and a first control valve is provided on the first pipeline. One end of the gas purging mechanism located outside the tank is connected to the gas supply component via a second pipeline, and a second control valve is provided on the second pipeline. The slurry tank can extend into the slurry inlet. A discharge port is provided at the bottom of the tank, and the discharge port is connected to the filter via a discharge pipe. A discharge valve is provided at the bottom of the discharge port, and a discharge pump is provided on the discharge pipe. The feed valve, the first control valve, the second control valve, the discharge valve, and the discharge pump are all connected to the controller.

[0016] The present invention achieves the following technical effects compared to the prior art: The material mixing and crystallization tank of the present invention includes a tank body, a cover body, a liquid flushing mechanism, and a gas purging mechanism. The slurry inlet is used to place the slurry tank and allow the slurry in the slurry tank to enter the tank body. One end of the liquid flushing mechanism is located outside the tank body and is used to introduce thinner, while the other end extends into the slurry inlet and the slurry tank and is used to flush the slurry tank. One end of the gas purging mechanism is located outside the tank body and is used to introduce gas, while the other end extends into the slurry inlet and the slurry tank and is used to purge residual liquid droplets on the inner wall of the slurry tank. During operation, the slurry tank is inverted and extended into the slurry inlet. The liquid flushing mechanism washes away the residual slurry in the tank, flushing the residual slurry adhering to the inner wall of the tank into the material mixing and crystallization tank. The gas purging mechanism then blows down the residual droplets hanging on the inner wall of the tank after flushing, causing all the residual droplets to fall into the material mixing and crystallization tank. This not only avoids potential liquid leakage from the slurry tank after flushing but also ensures that all the material in the slurry tank enters the material mixing and crystallization tank, allowing the raw materials in the material mixing and crystallization tank to be mixed in the set proportion, thus improving the product qualification rate. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the structure of the material mixing and crystallization tank provided by the present invention; Figure 2 for Figure 1 A schematic diagram of the structure in direction A; Figure 3 for Figure 2 Sectional view along the BB direction; Figure 4 This is a cross-sectional view of the material mixing and crystallization tank and the slurry tank provided by the present invention after being assembled. Figure 5 A schematic diagram of the liquid flushing mechanism and gas purging mechanism in the material mixing crystallization tank provided by the present invention; Figure 6 This is a schematic diagram of the structure of the equipment for preparing and synthesizing flammable and explosive materials provided by the present invention.

[0019] Explanation of reference numerals in the attached drawings: 100, material mixing and crystallization tank; 1, tank body; 2, top cover; 3, slurry inlet; 4, cover; 5, liquid supply pipe; 51, horizontal liquid supply pipe; 52, vertical liquid supply pipe; 6, flushing nozzle; 7, air supply pipe; 71, horizontal air supply pipe; 72, vertical air supply pipe; 8, blowing end; 81, upper annular plate; 82, lower annular plate; 83, annular purge port; 9, gas passage; 200, thinner tank; 300, first pipeline; 400, high-pressure gas cylinder; 500, second pipeline; 600, filter; 700, slurry tank. Detailed Implementation

[0020] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0021] The purpose of this invention is to provide a material mixing crystallization tank and a flammable and explosive material preparation and synthesis device, which enables the raw materials in the material mixing crystallization tank to be mixed in a set proportion, thereby improving the product qualification rate.

[0022] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0023] like Figures 1-5 As shown, this embodiment provides a material mixing and crystallization tank 100, including a tank body 1, a cover 4, a liquid flushing mechanism, and a gas purging mechanism. The upper part of the tank body 1 is provided with a slurry inlet 3 and a thinner inlet. The slurry inlet 3 has a cylindrical structure and is used to allow the thinner to enter the tank body 1. The cover 4 is used to close or open the slurry inlet 3. The slurry inlet 3 is used to place the slurry tank 700 and allow the slurry in the slurry tank 700 to enter the tank body 1. One end of the liquid flushing mechanism is located outside the tank body 1 and is used to introduce the thinner. The other end extends into the slurry inlet 3 and the slurry tank 700 and is used to flush the slurry tank 700. One end of the gas purging mechanism is located outside the tank body 1 and is used to introduce gas. The other end extends into the slurry inlet 3 and the slurry tank 700 and is used to purge residual liquid droplets on the inner wall of the slurry tank 700. In this embodiment, the liquid medium used for rinsing is a thinner, which can prevent other rinsing media from entering the material mixing and crystallization tank 100 and affecting the preparation of flammable and explosive materials.

[0024] like Figure 4As shown, during operation, the slurry tank 700 is inverted and extended into the slurry inlet 3. In this embodiment, the residual slurry in the slurry tank 700 is rinsed by a liquid rinsing mechanism, and the residual slurry adhering to the inner wall of the slurry tank 700 is rinsed into the material mixing and crystallization tank 100. The residual droplets hanging on the inner wall of the slurry tank 700 after rinsing are blown downward by a gas blowing mechanism, so that all the residual droplets fall into the material mixing and crystallization tank 100. This not only avoids the liquid leakage problem that may exist in the slurry tank 700 after rinsing, but also ensures that all the material in the slurry tank 700 enters the material mixing and crystallization tank 100, so that the raw materials in the material mixing and crystallization tank 100 are mixed in a set ratio, thereby improving the product qualification rate.

[0025] Specifically, the upper part of the tank body 1 has an upper cover 2, and the slurry inlet 3 and the thinner inlet are both located on the upper cover 2. The slurry inlet 3 is a cylindrical structure that extends upward at an incline relative to the upper cover 2.

[0026] The liquid flushing mechanism in this embodiment includes a liquid supply pipe 5 and a flushing nozzle 6. One end of the liquid supply pipe 5 is located outside the tank body 1 and is used to introduce thinner, while the other end extends into the slurry inlet 3 and is equipped with a flushing nozzle 6.

[0027] After the slurry tank 700 is rinsed with thinner using a liquid rinsing mechanism, some thinner may remain on the inner wall of the slurry tank 700. When the slurry tank 700 is removed from the slurry inlet 3, the remaining thinner can easily drip onto the outer wall of the tank 1 or into the external operating space, increasing operational risk. To avoid this risk, this embodiment further includes a gas purging mechanism to purge residual droplets hanging on the inner wall of the slurry tank 700 after rinsing. This solves the problems of increased operational risk due to material leakage and the deviation of the thinner-to-slurry ratio from the set ratio caused by thinner residue.

[0028] The gas purging mechanism in this embodiment includes a gas supply pipe 7 and a gas blowing end 8. One end of the gas supply pipe 7 is located outside the tank body 1 and is used to introduce gas, while the other end extends into the slurry inlet 3 and is equipped with the gas blowing end 8.

[0029] Specifically, the gas supply pipe 7 is coaxially sleeved outside the liquid supply pipe 5, forming a gas channel 9 between the gas supply pipe 7 and the liquid supply pipe 5. The gas supply pipe 7 is fixed on the slurry inlet 3. The liquid supply pipe 5 is located at one end of the tank body 1 and extends upward relative to the gas supply pipe 7. The air blowing end 8 is fixedly sleeved on the liquid supply pipe 5 and the gas supply pipe 7.

[0030] In this embodiment, the liquid supply pipe 5 includes a liquid supply horizontal pipe 51 and a liquid supply vertical pipe 52 fixedly connected to one end of the liquid supply horizontal pipe 51. The other end of the liquid supply horizontal pipe 51 is used to introduce thinner. The flushing nozzle 6 is fixedly installed on the top of the liquid supply vertical pipe 52. The liquid supply vertical pipe 52 is used to extend into the slurry tank 700.

[0031] In this embodiment, the air supply pipe 7 includes an air supply horizontal pipe 71 and an air supply vertical pipe 72 fixedly connected to one end of the air supply horizontal pipe 71. The air supply horizontal pipe 71 is coaxially arranged with the liquid supply horizontal pipe 51, and the air supply vertical pipe 72 is coaxially arranged with the liquid supply vertical pipe 52. The air supply vertical pipe 72 is used to extend into the slurry tank 700. The liquid supply vertical pipe 52 extends upward relative to the air supply vertical pipe 72. The air supply horizontal pipe 71 is fixed to the slurry inlet 3 and is used to introduce gas. The air blowing end 8 is fixedly installed on the top of the air supply vertical pipe 72 and is fixedly sleeved on the outside of the liquid supply vertical pipe 52.

[0032] The vertical supply pipe 52 is coaxially arranged with the slurry inlet 3. The flushing nozzle 6 is supported by the vertical supply pipe 52 and the horizontal supply pipe 51 and is located at the center of the slurry inlet 3, facing the feeding direction of the slurry inlet 3. The length of the vertical supply pipe 52 is not less than the depth of the slurry tank 700.

[0033] The air blowing end 8 includes an upper annular plate 81, a lower annular plate 82, and a hollow connecting assembly. The lower annular plate 82 is fixedly sleeved on the outside of the top end of the air supply vertical pipe 72, and the upper annular plate 81 is fixedly sleeved on the outside of the upper end of the liquid supply vertical pipe 52 and is located above the lower annular plate 82. The upper and lower ends of the hollow connecting assembly are fixedly connected to the upper annular plate 81 and the lower annular plate 82 respectively. An annular purge port 83 is formed between the upper annular plate 81 and the lower annular plate 82, and the annular purge port 83 is connected to the gas channel 9.

[0034] Since the residual liquid in the slurry tank 700 is generally located on the annular sidewall of the slurry tank 700, in order to blow all the liquid out of the slurry tank 700, the air blowing end 8 in this embodiment uses an annular blowing method to blow the inner wall of the slurry tank 700.

[0035] The hollow connection assembly includes multiple connecting posts, and the upper and lower ends of each connecting post are fixedly connected to the upper annular plate 81 and the lower annular plate 82 respectively, thereby ensuring that the upper annular plate 81 and the lower annular plate 82 are stably connected while ensuring that the annular purging port 83 can achieve gas purging.

[0036] To further ensure that the blowing end 8 can blow all the residual liquid droplets on the inner wall of the slurry tank 700 into the tank body 1, the upper annular plate 81 is an upper conical annular plate, the lower annular plate 82 is a lower conical annular plate, and the annular conical blowing port 83 is set downward from the side near the center of the liquid supply vertical pipe 52 to the side away from the center of the liquid supply vertical pipe 52. This blows the liquid on the inner wall of the slurry tank 700 downward, so that all the residual liquid droplets drip into the tank body 1. This not only avoids the liquid leakage problem that may exist in the slurry tank 700 after rinsing, but also ensures that all the material in the slurry tank 700 enters the tank body 1, further improving the product qualification rate.

[0037] The flushing nozzle 6 includes multiple spray ports, which are evenly arranged on the top and sides of the flushing nozzle 6. In other words, multiple spray ports are arranged in multiple directions on the flushing nozzle 6, thereby flushing the inner wall of the slurry tank 700 from all angles, ensuring that the residual slurry adhering to various positions on the inner wall of the slurry tank 700 can be flushed into the tank 1.

[0038] like Figure 6 As shown, this embodiment also provides a flammable and explosive material preparation and synthesis device, including a thinner supply mechanism, a gas supply component, a slurry tank 700, a filter 600, a controller, and a material mixing and crystallization tank 100. The thinner inlet is connected to the thinner supply mechanism through a feed pipe, and a feed valve is provided on the feed pipe. One end of the liquid flushing mechanism located outside the tank 1 is connected to the thinner supply mechanism through a first pipeline 300, and a first control valve is provided on the first pipeline 300. One end of the gas purging mechanism located outside the tank 1 is connected to the gas supply component through a second pipeline 500, and a second control valve is provided on the second pipeline 500. The slurry tank 700 can be inverted and extended into the slurry inlet 3. The bottom of the tank 1 is provided with a discharge port, which is connected to the filter 600 through a discharge pipe. A discharge valve is provided at the bottom of the discharge port, and a discharge pump is provided on the discharge pipe. The feed valve, the first control valve, the second control valve, the discharge valve, and the discharge pump are all connected to the controller.

[0039] Specifically, the thinner supply mechanism includes a thinner tank 200, a thinner pipe, a thinner pump, and a flow meter. One end of the thinner pipe is connected to the outlet of the thinner tank 200. The thinner pump and the flow meter are both installed on the thinner pipe. The two ends of the feed pipe are respectively connected to the end of the thinner pipe away from the thinner tank 200 and the thinner inlet. The two ends of the first pipeline 300 are respectively connected to the end of the thinner pipe away from the thinner tank 200 and the end of the liquid supply horizontal pipe 51 located outside the slurry inlet 3. The thinner pump and the flow meter are both connected to the controller.

[0040] Specifically, the gas supply component is a high-pressure gas cylinder 400, and the gas in the high-pressure gas cylinder 400 is an inert gas, specifically helium or nitrogen. The outlet valve of the high-pressure gas cylinder 400 is connected to a controller, which controls the opening and closing of the outlet valve.

[0041] In this embodiment, a plurality of positioning pins are uniformly fixed along the circumferential direction on the first flange at the lower end of the cover 4. The second flange at the upper end of the slurry inlet 3 of the tank 1 has a plurality of positioning holes uniformly arranged along the circumferential direction. The positioning holes and positioning pins are arranged in a one-to-one correspondence. The detachable connection between the cover 4 and the slurry inlet 3 of the tank 1 can be achieved by inserting and withdrawing the positioning pins of the cover 4 into the positioning holes. Specifically, when each positioning pin is inserted into a positioning hole, the cover 4 and the slurry inlet 3 of the tank 1 can be docked and installed.

[0042] The specific operating process is as follows: The robot gripper grasps the cover 4 and lifts it at a set angle to open the slurry inlet 3. Then, the robot gripper holds the slurry tank 700 upside down and inserts it into the slurry inlet 3 of the tank 1, feeding slurry into the tank 1. The thinner pump, feed valve, and first control valve are activated. Part of the thinner in the thinner tank 200 enters the tank 1 through the feed pipe and thinner inlet, while another part is sprayed out through the first pipeline 300 and the liquid supply pipeline 5 via the flushing nozzle 6 to flush the residual slurry in the slurry tank 700. During operation, the controller controls the thinner pump based on data from the flow meter, thereby achieving a quantitative output of thinner to the tank 1.

[0043] After the residual slurry in the slurry tank 700 has been rinsed, the controller opens the outlet valve of the high-pressure gas cylinder 400 and the second control valve to start the gas purging mechanism. The gas enters through the second pipeline 500 and the gas supply pipeline 7, and is sprayed out from the blowing end 8. It blows downward in a circular direction through the annular blowing port 83 to blow down all the residual droplets on the inner wall of the slurry tank 700, so that all the residual droplets drip into the tank body 1.

[0044] This specification uses specific examples to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. Furthermore, those skilled in the art will recognize that, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. A material mixing and crystallization tank, characterized in that, The device includes a tank, a cover, a liquid flushing mechanism, and a gas purging mechanism. The upper part of the tank is provided with a slurry inlet and a thinner inlet. The thinner inlet is used to allow thinner to enter the tank. The cover is used to close or open the slurry inlet. The slurry inlet is used to place a slurry tank and allow the slurry in the slurry tank to enter the tank. One end of the liquid flushing mechanism is located outside the tank and is used to introduce thinner, while the other end extends into the slurry inlet and the slurry tank to flush the slurry tank. One end of the gas purging mechanism is located outside the tank and is used to introduce gas, while the other end extends into the slurry inlet and the slurry tank to purge residual liquid droplets on the inner wall of the slurry tank.

2. The material mixing and crystallization tank according to claim 1, characterized in that, The liquid flushing mechanism includes a liquid supply pipe and a flushing nozzle. One end of the liquid supply pipe is located outside the tank and is used to introduce thinner, while the other end extends into the slurry inlet and is equipped with the flushing nozzle.

3. The material mixing and crystallization tank according to claim 2, characterized in that, The gas purging mechanism includes a gas supply pipe and a gas blowing end. One end of the gas supply pipe is located outside the tank and is used to introduce gas, while the other end extends into the slurry inlet and is equipped with the gas blowing end.

4. The material mixing and crystallization tank according to claim 3, characterized in that, The gas supply pipe is coaxially sleeved outside the liquid supply pipe, forming a gas channel between the gas supply pipe and the liquid supply pipe. The gas supply pipe is fixed to the slurry inlet. The liquid supply pipe extends upward relative to the gas supply pipe at one end of the tank body. The air blowing end is fixedly sleeved on the liquid supply pipe and the gas supply pipe.

5. The material mixing and crystallization tank according to claim 4, characterized in that, The liquid supply pipeline includes a horizontal liquid supply pipe and a vertical liquid supply pipe fixedly connected to one end of the horizontal liquid supply pipe. The other end of the horizontal liquid supply pipe is used to introduce thinner. The flushing nozzle is fixedly installed on the top of the vertical liquid supply pipe, and the vertical liquid supply pipe extends into the slurry tank. The air supply pipeline includes a horizontal air supply pipe and a vertical air supply pipe fixedly connected to one end of the horizontal air supply pipe. The horizontal air supply pipe and the horizontal liquid supply pipe are coaxially arranged. The vertical air supply pipe and the vertical liquid supply pipe are coaxially arranged. The vertical air supply pipe extends into the slurry tank. The vertical liquid supply pipe extends upward relative to the vertical air supply pipe. The horizontal air supply pipe is fixed to the slurry inlet and is used to introduce gas. The blowing head is fixedly installed on the top of the vertical air supply pipe and is fixedly sleeved on the outside of the vertical liquid supply pipe.

6. The material mixing and crystallization tank according to claim 5, characterized in that, The liquid supply vertical pipe is coaxially arranged with the slurry inlet, and the length of the liquid supply vertical pipe is not less than the depth of the slurry tank.

7. The material mixing and crystallization tank according to claim 5, characterized in that, The air blowing end includes an upper annular plate, a lower annular plate, and a hollow connecting assembly. The lower annular plate is fixedly sleeved on the outside of the top end of the air supply vertical pipe, and the upper annular plate is fixedly sleeved on the outside of the upper end of the liquid supply vertical pipe and located above the lower annular plate. The upper and lower ends of the hollow connecting assembly are fixedly connected to the upper annular plate and the lower annular plate, respectively. An annular purge port is formed between the upper annular plate and the lower annular plate, and the annular purge port communicates with the gas channel.

8. The material mixing and crystallization tank according to claim 7, characterized in that, The hollow connecting assembly includes multiple connecting posts, and the upper and lower ends of each connecting post are respectively fixedly connected to the upper annular plate and the lower annular plate; the upper annular plate is an upper conical annular plate, and the lower annular plate is a lower conical annular plate.

9. The material mixing and crystallization tank according to claim 2, characterized in that, The flushing nozzle includes multiple spray nozzles, which are evenly arranged on the top and periphery of the flushing nozzle.

10. A device for preparing and synthesizing flammable and explosive materials, characterized in that, The system includes a thinner supply mechanism, a gas supply component, a slurry tank, a filter, a controller, and a material mixing and crystallization tank as described in any one of claims 1-9. The thinner inlet is connected to the thinner supply mechanism via a feed pipe, and a feed valve is provided on the feed pipe. One end of the liquid flushing mechanism located outside the tank is connected to the thinner supply mechanism via a first pipeline, and a first control valve is provided on the first pipeline. One end of the gas purging mechanism located outside the tank is connected to the gas supply component via a second pipeline, and a second control valve is provided on the second pipeline. The slurry tank can extend into the slurry inlet. An outlet is provided at the bottom of the tank, and the outlet is connected to the filter via an outlet pipe. An outlet valve is provided at the bottom of the outlet, and an outlet pump is provided on the outlet pipe. The feed valve, the first control valve, the second control valve, the outlet valve, and the outlet pump are all connected to the controller.

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