Chemical material production tail gas treatment device

Abstract

The application belongs to the technical field of tail gas treatment, and relates to a chemical material production tail gas treatment device, which comprises a support and a box body installed on the support, the lower end of the box body is connected with an ash discharge hopper, a baffle is fixedly arranged at one end of the box body close to the ash discharge hopper, a sliding plate is arranged above the baffle, a plurality of first mounting holes are arranged on the baffle, a plurality of second mounting holes corresponding to the first mounting holes are arranged on the sliding plate, a filter structure is arranged at the first mounting hole and the second mounting hole corresponding thereto, the filter structure comprises a filter bag mounting frame, a filter bag mounted on the outer periphery of the filter bag mounting frame and a compression cylinder for fixing and compressing the filter bag, a sealing element is slidably connected to the lower end of the filter bag mounting frame, the sliding plate is connected with a driving device, and a linkage structure is arranged between the sliding plate and the sealing element. The chemical material production tail gas treatment device has good tail gas filtering and treating effect, the effective service life of the filter structure is long, and the frequency of disassembling the filter structure for cleaning can be greatly reduced.

Description

Technical Field

[0001] This invention belongs to the field of exhaust gas treatment technology and relates to an exhaust gas treatment device for chemical material production. Background Technology

[0002] In the production of chemical materials, such as polymer synthesis, preparation of fine chemical intermediates, and processing of inorganic powder materials, high-temperature reactions, material mixing and stirring, or pneumatic conveying operations are often involved, which easily generate a large amount of exhaust gas containing solid dust and trace amounts of harmful gases (such as acid mist and organic vapors). If this exhaust gas is directly emitted, it will not only cause air pollution, but may also pose a threat to the surrounding ecological environment and the health of operators. Therefore, it is necessary to purify it through professional exhaust gas treatment equipment.

[0003] Currently, baghouse dust collectors are widely used in the dust removal process of chemical material production exhaust gases. Among them, internal filter baghouse dust collectors have become the mainstream equipment due to their high filtration efficiency and strong adaptability for fine dust (such as nano-sized powders and reaction by-product particles commonly found in chemical material production). Their core filtration structure mainly consists of a filter frame and filter bags fitted around the outer perimeter. After the exhaust gas enters the filter bag, the dust is trapped on the inner wall of the filter bag, while the clean gas passes through the filter bag and is discharged.

[0004] However, the dust in the exhaust gas from chemical material production is often characterized by high viscosity, fine particles, or easy agglomeration, making it easier for the dust to adhere to the inner wall of the filter bag. Furthermore, some dust may accumulate at the bottom of the filter bag due to its chemical properties (such as hygroscopicity and electrostatic adsorption). Existing cleaning methods mostly rely on a power structure to drive the filter structure to vibrate periodically or use back-flushing for cleaning. While these methods can remove some dust adhering to the inner wall, the cleaned dust still accumulates at the bottom of the filter bag. As production time increases, the amount of dust accumulated inside the filter bag gradually increases, leading to increased filtration resistance and decreased processing efficiency. This necessitates frequent shutdowns to disassemble the equipment and remove the filter bags for thorough cleaning, which is not only cumbersome but also interrupts the chemical material production process, severely impacting production continuity and efficiency.

[0005] In addition, the existing installation method for filter bags and filter bag holders involves inserting the filter bag holder into the filter bag and then securing it with one or two cable ties. In this way, the filter bag is prone to slippage or movement when cleaning operations such as tapping and vibrating are performed. Summary of the Invention

[0006] The purpose of this invention is to solve the above-mentioned problems and provide a chemical material production tail gas treatment device.

[0007] To achieve the above objectives, the present invention provides a chemical material production tail gas treatment device, including a support and a box mounted on the support. A discharge hopper is connected to the lower end of the box. A baffle is fixedly installed inside the box near the discharge hopper. A sliding plate is provided above the baffle. The baffle has multiple first mounting holes. The sliding plate has second mounting holes corresponding to the first mounting holes. A filter structure is installed at the first mounting holes and the corresponding second mounting holes. The filter structure includes a filter bag mounting frame, a filter bag mounted on the outer periphery of the filter bag mounting frame, and a pressure cylinder for fixing and pressing the filter bag. A sealing element is slidably fitted at the lower end of the filter bag mounting frame. A driving device is connected to the sliding plate. A linkage structure is provided between the sliding plate and the sealing element. The linkage structure includes: The connecting rod is fixedly installed on the lower side of the slide plate; A transmission plate is located below the plurality of seals and is detachably and fixedly connected to the plurality of seals; The baffle is provided with a guide cylinder adapted to the connecting rod, and the connecting rod moves downward through the guide cylinder to drive the transmission plate to move; A rising limit platform is provided on the lower side of the baffle, and a rising baffle is connected to the transmission plate. The rising baffle is located on the lower side of the rising limit platform and is spaced apart from the rising limit platform.

[0008] Furthermore, the filter bag mounting bracket includes a bottom annular plate located in the first mounting hole and a top annular plate located in the second mounting hole, wherein the top annular plate and the bottom annular plate are fixedly connected by a connecting post.

[0009] Furthermore, the filter bag includes a bent portion that mates with the top annular plate and an outer portion connected to the bent portion, the outer portion being provided with a binding strap.

[0010] Furthermore, the pressure cylinder includes a cylinder body and a flange connected to the cylinder body. The cylinder body is located on the inner circumference of the bent portion and presses against and fixes the bent portion. The flange is located on the upper side of the bent portion and presses against the bent portion.

[0011] Furthermore, the bottom annular plate is provided with multiple mounting grooves, the sealing element is located on the lower side of the bottom annular plate, the sealing element is provided with a guide post that extends into the mounting groove and slides in cooperation with the mounting groove, the mounting groove is provided with a spring, one end of the spring is fixedly connected to the mounting groove, and the other end is fixedly connected to the guide post.

[0012] Furthermore, the seal is also provided with a tapered guide portion that extends into the bottom annular plate.

[0013] Furthermore, the inner wall of the box is provided with a sliding groove, and the slide plate is provided with a slider that slides in cooperation with the sliding groove. The driving device drives the slide plate to move along the sliding groove.

[0014] Furthermore, an air supply device is also installed on the housing, the air supply device is connected to a pipeline, the pipeline extends into the housing, and a nozzle is provided on the pipeline, the nozzle being located above the filter structure.

[0015] Furthermore, the housing is provided with an air inlet channel and an air outlet channel, the air inlet channel being located above the slide plate and the air outlet channel being located between the slide plate and the baffle.

[0016] The beneficial effects of this invention are as follows: The chemical material production exhaust gas treatment device of the present invention can clean the filter bag by driving the slide plate through the drive device. At the same time, it can effectively treat the dust at the bottom of the filter structure without causing a large amount of dust to accumulate inside the filter structure. This ensures the filtration performance of the filter structure and extends its effective working life, without the need to frequently open the equipment to disassemble the filter structure for treatment.

[0017] Furthermore, the chemical material production exhaust gas treatment device of the present invention, through the setting of the air supply device, can be used to supplement air during the cleaning of the filter structure, so as to improve the dust cleaning effect and cleaning efficiency. Attached Figure Description

[0018] Figure 1 A schematic perspective view of a chemical material production tail gas treatment apparatus according to an embodiment of the present invention; Figure 2 A schematic front view of a chemical material production tail gas treatment apparatus according to an embodiment of the present invention; Figure 3 A schematic cross-sectional view of a chemical material production tail gas treatment apparatus according to an embodiment of the present invention; Figure 4 Schematic representation Figure 3 Enlarged view of section A in the middle; Figure 5 Schematic representation Figure 3 Enlarged view of section B; Figure 6 Schematic representation Figure 3 Enlarged view of section C; Figure 7 A schematic perspective view of a filter bag mounting bracket according to an embodiment of the present invention; Figure 8 This diagram schematically illustrates the internal structure of a chemical material production exhaust gas treatment device according to one embodiment of the present invention.

[0019] The meanings of the numbers in the attached diagram are as follows: 1. Support; 2. Housing; 3. Ash hopper; 4. Baffle; 5. Slide plate; 41. First mounting hole; 51. Second mounting hole; 6. Filter structure; 61. Filter bag mounting bracket; 62. Filter bag; 63. Pressure cylinder; 7. Sealing element; 8. Drive device; 9. Linkage structure; 611. Bottom annular plate; 612. Top annular plate; 613. Connecting column; 621. Bending part; 622. Outer side part; 631. Cylinder; 632. Flange; 614. Mounting groove; 615. Spring; 71. Guide column; 72. Conical guide part; 91. Connecting rod; 92. Transmission plate; 921. Rising baffle; 42. Guide cylinder; 43. Rising limit platform; 21. Slide groove; 52. Sliding block; 22. Air supply device; 23. Pipeline; 24. Nozzle; 25. Air inlet channel; 26. Air outlet channel. Detailed Implementation

[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly described below. Obviously, the drawings described below are merely some embodiments of the present invention, and those skilled in the art can obtain other drawings based on these drawings without creative effort.

[0021] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. The embodiments cannot be described in detail here, but the embodiments of the present invention are not limited to the following embodiments.

[0022] Combination Figures 1-8 As shown, this invention provides a chemical material production tail gas treatment device, including a support 1 and a housing 2 mounted on the support 1. A hopper 3 is connected to the lower end of the housing 2. According to one embodiment of the invention, a baffle 4 is fixedly installed inside the housing 2 near the hopper 3. A sliding plate 5 is provided above the baffle 4. The baffle 4 has multiple first mounting holes 41, and the sliding plate 5 has second mounting holes 51 corresponding to the first mounting holes 41. A filter structure 6 is installed at each of the first mounting holes 41 and the corresponding second mounting holes 51. In this embodiment, the housing 2 is provided with an inlet channel 25 and an outlet channel 26. The inlet channel 25 is located above the sliding plate 5, and the outlet channel 26 is located between the sliding plate 5 and the baffle 4. Tail gas enters the housing 2 above the sliding plate 5 through the inlet channel 25, and then enters the filter structure 6. The filter structure 6 filters dust and other particles, and the clean gas enters the housing 2 between the sliding plate 5 and the baffle 4 through the filter structure 6, and is discharged through the outlet channel 26.

[0023] In this embodiment, the filter structure 6 includes a filter bag mounting bracket 61, filter bags 62 mounted on the outer periphery of the filter bag mounting bracket 61, and a pressure cylinder 63 for fixing and pressing the filter bags 62. A sealing element 7 is slidably fitted at the lower end of the filter bag mounting bracket 61. A drive device 8 is connected to the slide plate 5, and a linkage structure 9 is provided between the slide plate 5 and the sealing element 7. According to one embodiment of the present invention, the linkage structure 9 includes a connecting rod 91 and a transmission plate 92. The connecting rod 91 is fixedly mounted on the lower side of the slide plate 5, and the transmission plate 92 is located below the multiple sealing elements 7 and is detachably fixedly connected to the multiple sealing elements 7. In this embodiment, the transmission plate 92 and the sealing elements 7 are fixedly connected by screws. A guide cylinder 42 adapted to the connecting rod 91 is provided on the baffle 4. The connecting rod 91 passes through the guide cylinder 42 and moves downward, driving the transmission plate 92 to move. A rising limiting platform 43 is provided on the lower side of the baffle 4. A rising baffle 921 is connected to the transmission plate 92. The rising baffle 921 is located below the rising limiting platform 43 and is spaced apart from the rising limiting platform 43.

[0024] The chemical material production exhaust gas treatment device of the present invention, through the above-described structural arrangement, allows dust to accumulate on the inner wall and bottom of the filter structure 6 after a period of exhaust gas treatment. The drive device 8, by operating, can move the slide plate 5 and the filter structure 6 up and down, thereby causing the filter structure 6 to shake and allowing the dust on its inner wall to fall to its bottom, thus cleaning the filter structure 6. Due to the linkage structure 9 between the baffle 4 and the sealing element 7, when the drive device 8 drives the slide plate 5 upward, the baffle 921 can move upward to the upper limit platform 43 and be limited there. The filter structure 6 then continues to move upward, causing the sealing element 7 to open (creating a gap with the filter structure 6), allowing the dust to be discharged from inside the filter structure 6. This effectively improves the dust cleaning effect, ensuring filtration performance while significantly reducing the frequency of stopping the equipment to disassemble and clean the filter structure 6, thus improving its service life and work efficiency.

[0025] The following provides a detailed description of the filter structure 6, the seal 7, the drive device 8, and the linkage structure 9 of the present invention: According to one embodiment of the present invention, the filter bag mounting bracket 61 includes a bottom annular plate 611 located in a first mounting hole 41 and a top annular plate 612 located in a second mounting hole 51. The top annular plate 612 and the bottom annular plate 611 are fixedly connected by a connecting post 613. The filter bag 62 includes a bent portion 621 that mates with the top annular plate 612 and an outer portion 622 connected to the bent portion 621. A binding strap is provided on the outer portion 622. The pressure cylinder 63 includes a cylinder body 631 and a flange 632 connected to the cylinder body 631. The cylinder body 631 is located on the inner circumference side of the bent portion 621 and presses against and fixes the bent portion 621. The flange 632 is located on the upper side of the bent portion 621 and presses against the bent portion 621.

[0026] In this embodiment, a groove 21 is provided on the inner wall of the housing 2, and a slider 52 on the slide plate 5 slides in cooperation with the groove 21. The slide plate 5 is connected to a drive device 8, which can be configured as a drive cylinder or the like. The drive device 8 drives the slide plate 5 to move along the groove 21. With this configuration, when the drive device 8 moves the slide plate 5, the filter structure 6 moves accordingly. Therefore, after the filter structure 6 has been working for a period of time, the drive device 8 can be used to drive the slide plate 5 to move up and down multiple times, achieving periodic vibration of the filter structure 6, thereby cleaning the dust adhering to the inner wall of the filter bag 62.

[0027] Furthermore, in the chemical material production exhaust gas treatment device of the present invention, the filter structure 6 is configured as described above. This allows the filter structure 6 to be installed by first fitting and fixing the bent portion 621 of the filter bag 62 onto the top annular plate 612, then straightening the filter bag 62, further securing it with a binding strap on the underside, then installing the pressure cylinder 63 to compress and fix the filter bag 62, and finally installing the filter structure 6 into the second mounting hole 51 on the sliding plate 5. This configuration significantly improves the stability of the filter bag 62, preventing slippage or movement, especially when the filter structure 6 is subjected to vibration.

[0028] In this embodiment, the bottom annular plate 611 is provided with multiple mounting grooves 614, and the lower end face of the bottom annular plate 611 is flush with the lower end face of the baffle 4. The sealing member 7 is located on the lower side of the bottom annular plate 611. The sealing member 7 is provided with a guide post 71 that extends into the mounting groove 614 and slides into the mounting groove 614. A spring 615 is provided in the mounting groove 614. One end of the spring 615 is fixedly connected to the mounting groove 614, and the other end is fixedly connected to the guide post 71. The sealing member 7 is also provided with a tapered guide portion 72, which extends into the bottom annular plate 611. The diameter of the tapered guide portion 72 gradually increases in the direction away from the slide plate 5.

[0029] The chemical material production exhaust gas treatment device of the present invention, through the aforementioned arrangement of the sealing member 7, allows dust to fall onto the sealing member 7 during exhaust gas filtration and accumulate downwards along the conical guide portion 72. When the sealing member 7 separates from the filter structure 6, the spring 615 is in a stretched state, thereby gradually increasing the gap between the conical guide portion 72 and the bottom annular plate 611, allowing dust to fall into the ash discharge hopper 3 through this gap. Furthermore, since the sealing member 7 is located below the baffle 4, when the sealing member 7 is opened for dust cleaning, dust can be prevented from entering between the baffle 4 and the sliding plate 5, thus avoiding re-contamination of the clean gas.

[0030] According to a second embodiment of the present invention, based on the first embodiment described above, an air supply device 22 is installed on the housing 2, the air supply device 22 is connected to a pipe 23, the pipe 23 extends into the housing 2, and a nozzle 24 is provided on the pipe 23, the nozzle 24 being located above the filter structure 6.

[0031] With this configuration, when the drive device 8 drives the slide plate 5 to move down, the air supply device 22 works simultaneously to inflate the inside of the filter structure 6. This can enhance the cleaning effect on the filter bag 2 and accelerate the discharge of dust from the seal 7.

[0032] The assembly and workflow of the chemical material production tail gas treatment device of the present invention are as follows: First, install the filter bag 62 on the outer periphery of the filter bag mounting bracket 61, and then install the pressure cylinder 63. Through the combined action of the pressure cylinder 63 and the filter bag mounting bracket 61, the filter bag 2 is installed and fixed. Then, install the assembled filter structure 6 into the second mounting hole 51 and the first mounting hole 41, and fix the transmission plate 92 to the sealing element 7 from the bottom with screws to complete the installation of the filter structure 6.

[0033] During operation, exhaust gas enters through the intake channel 25 and is filtered inside the filter bag 62. Clean gas passes through the filter bag 62 and is discharged through the exhaust channel 26. As the working time increases, dust will accumulate on the inner wall of the filter bag 62 and on the seal 7 (conical guide 72). Cleaning can then be performed according to the set cleaning cycle. Specifically, in the initial state, the drive device 8 moves the slide plate 5 downwards and upwards, vibrating the filter bag 62 and causing dust to fall off. Simultaneously, the air supply device 22 inflates the filter bag 62, causing the dust to fall onto the conical guide 72. Then, the drive device 8 drives the slide plate 5 upwards until the rising baffle 921 contacts the rising limit platform 43. The slide plate 5 then continues to rise, causing the limited seal 7 to gradually disengage from the filter connection structure 6, allowing dust to escape along the conical guide 72 from the gap between the seal 7 and the bottom annular plate 611. The gas falls into the ash discharge hopper 3, thus cleaning the filter structure 6. After cleaning, the exhaust gas can continue to undergo high-quality filtration. It should be noted that in practical applications, the number of times the drive device 8 drives the sliding plate 5 to move up and down can be adjusted according to the actual situation (different materials, different particle sizes in the exhaust gas) to ensure the cleaning effect.

[0034] The above description is merely one embodiment of the present invention and is not intended to limit the invention. Those skilled in the art will recognize that the present invention can be modified and varied in various ways. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A chemical material production tail gas treatment device, comprising a support (1) and a housing (2) mounted on the support (1), wherein a ash discharge hopper (3) is connected to the lower end of the housing (2), characterized in that, A baffle (4) is fixedly provided at one end of the box (2) near the ash discharge hopper (3). A sliding plate (5) is provided above the baffle (4). The baffle (4) has a plurality of first mounting holes (41). The sliding plate (5) has a second mounting hole (51) corresponding to the first mounting hole (41). A filter structure (6) is installed at the first mounting hole (41) and the corresponding second mounting hole (51). The filter structure (6) includes a filter bag mounting frame (61), a filter bag (62) installed on the outer periphery of the filter bag mounting frame (61), and a pressure cylinder (63) for fixing and pressing the filter bag (62). A sealing element (7) is slidably fitted at the lower end of the filter bag mounting frame (61). A driving device (8) is connected to the sliding plate (5). A linkage structure (9) is provided between the sliding plate (5) and the sealing element (7). The linkage structure (9) includes: Linkage rod (91) is fixedly installed on the lower side of the slide plate (5); The transmission plate (92) is located below the plurality of seals (7) and is detachably fixedly connected to the plurality of seals (7); The baffle (4) is provided with a guide cylinder (42) that is compatible with the connecting rod (91). The connecting rod (91) passes through the guide cylinder (42) and moves downward to drive the transmission plate (92) to move. The baffle (4) is provided with a rising limit platform (43) on the lower side, and the transmission plate (92) is connected to a rising baffle (921). The rising baffle (921) is located on the lower side of the rising limit platform (43) and is spaced apart from the rising limit platform (43).

2. The chemical material production tail gas treatment device according to claim 1, characterized in that, The filter bag mounting bracket (61) includes a bottom annular plate (611) located in the first mounting hole (41) and a top annular plate (612) located in the second mounting hole (51), and the top annular plate (612) and the bottom annular plate (611) are fixedly connected by a connecting post (613).

3. The chemical material production tail gas treatment device according to claim 2, characterized in that, The filter bag (62) includes a bent portion (621) that cooperates with the top annular plate (612) and an outer portion (622) connected to the bent portion (621), the outer portion (622) being provided with a binding strap.

4. The chemical material production tail gas treatment device according to claim 3, characterized in that, The pressure cylinder (63) includes a cylinder body (631) and a flange (632) connected to the cylinder body (631). The cylinder body (631) is located on the inner circumference of the bent portion (621) and presses against and fixes the bent portion (621). The flange (632) is located on the upper side of the bent portion (621) and presses against the bent portion (621).

5. The chemical material production tail gas treatment device according to claim 2 or 4, characterized in that, The bottom annular plate (611) is provided with multiple mounting grooves (614). The sealing element (7) is located on the lower side of the bottom annular plate (611). The sealing element (7) is provided with a guide post (71) that extends into the mounting groove (614) and slides in cooperation with the mounting groove (614). The mounting groove (614) is provided with a spring (615). One end of the spring (615) is fixedly connected to the mounting groove (614), and the other end is fixedly connected to the guide post (71).

6. The chemical material production tail gas treatment device according to claim 5, characterized in that, The seal (7) is also provided with a tapered guide (72) that extends into the bottom annular plate (611).

7. The chemical material tail gas treatment device according to claim 1, characterized in that, The inner wall of the box (2) is provided with a sliding groove (21), and the slide plate (5) is provided with a slider (52) that slides in cooperation with the sliding groove (21). The driving device (8) drives the slide plate (5) to move along the sliding groove (21).

8. The chemical material production tail gas treatment device according to claim 1, characterized in that, An air supply device (22) is also installed on the housing (2). The air supply device (22) is connected to a pipe (23). The pipe (23) extends into the housing (2). A nozzle (24) is provided on the pipe (23). The nozzle (24) is located above the filter structure (6).

9. The chemical material production tail gas treatment device according to claim 1, characterized in that, The housing (2) is provided with an air inlet channel (25) and an air outlet channel (26). The air inlet channel (25) is located above the slide plate (5), and the air outlet channel (26) is located between the slide plate (5) and the baffle (4).

Images