Cleaning device
By designing a cleaning device with a spray cleaning component and a sponge brush to efficiently clean the grinding head assembly, the problem of difficult removal of crystalline particles from the grinding head assembly was solved, improving wafer yield and reducing scrap costs.
CN122142909APending Publication Date: 2026-06-05SHANGHAI INTEGRATED CIRCUIT RESEARCH & DEVELOPMENT CENTER CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI INTEGRATED CIRCUIT RESEARCH & DEVELOPMENT CENTER CO LTD
- Filing Date
- 2024-12-04
- Publication Date
- 2026-06-05
Smart Images
Figure CN122142909A_ABST
Abstract
The present application provides a kind of cleaning device, device includes cleaning tank, first spray cleaning assembly, second spray cleaning assembly and sponge brush are all arranged on the tank bottom of cleaning tank, first spray cleaning assembly is used to spray cleaning gap between retaining ring and diaphragm, second spray cleaning assembly is used to spray cleaning retaining ring and diaphragm, sponge brush is used to abut with diaphragm, and can generate rotary friction with diaphragm with the rotation of diaphragm, to brush wash the diaphragm described in.This way, the present application sets up first spray cleaning assembly and second spray cleaning assembly can spray cleaning retaining ring and diaphragm, and the setting of first spray cleaning assembly can spray cleaning crystalline particle in the gap between retaining ring and diaphragm, and the setting of sponge brush can brush wash the particle on diaphragm that is difficult to spray cleaning removal, and sponge brush is made of sponge material, will not cause damage to diaphragm in the process of brush washing.
Need to check novelty before this filing date? Find Prior Art