Compressor air injection device, injection mechanism and parallel ring injection structure

Abstract

The application discloses a compressor air supplement device, an injection mechanism and a parallel annular injection structure. The compressor air supplement device comprises a suction inlet flow channel, a first-stage impeller, a second-stage impeller, a reflux elbow flow channel and an air supplement flow channel structure. The first-stage impeller is communicated with the suction inlet flow channel. The reflux elbow flow channel is communicated between the first-stage impeller and the second-stage impeller, wherein the reflux elbow flow channel comprises an outlet flow channel and an injection flow channel, the outlet flow channel is communicated with the injection flow channel, and the injection flow channel is communicated with the second-stage impeller. The air supplement flow channel structure comprises an air supplement channel, the air supplement channel is communicated with the injection flow channel, wherein the flow direction of the air supplement channel is the same as the flow direction of the outlet flow channel, and the extension direction of the air supplement channel is parallel to the extension direction of the outlet flow channel.

Description

Technical Field

[0001] This invention relates to a compressor gas replenishment device, an injection mechanism, and a parallel annular injection structure, and particularly to a compressor gas replenishment device, an injection mechanism, and a parallel annular injection structure that solves the problem of the formation of a vortex structure downstream of the traditional injection hole. Background Technology

[0002] A two-stage centrifugal compressor is a refrigerant compression device mainly used for high-efficiency and wide-area cooling applications, such as large commercial and industrial cooling systems, high-efficiency refrigeration systems, and air conditioning systems in large buildings.

[0003] A two-stage compression refrigeration cycle is a technology used to enhance the efficiency of refrigeration systems. In the first stage, the refrigerant is compressed to a medium pressure in the first compressor. In the second stage, the refrigerant, cooled by an intercooler, enters the second compressor and is further compressed to a higher pressure. By dividing the refrigerant compression process into two stages, the two-stage compression system can maintain a high COP (coefficient of performance) over a wider range of operating conditions, improving the overall energy efficiency ratio of the system.

[0004] In the aforementioned refrigerant flow introduction process, centrifugal compression technology is used to draw in and accelerate the refrigerant using a high-speed rotating impeller, compressing it to the required pressure through centrifugal force. This type of compressor is suitable for handling large volumes of gas and can provide a stable refrigerant flow rate over a wide range. Some manufacturers inject or replenish gas at the outlet of the first-stage impeller or the bend at the inlet of the second-stage impeller, but this creates a vortex structure downstream of the injection port. This vortex structure is a ring-shaped motion formed by the fluid during rotation, creating rotational motion within the fluid and causing unnecessary fluid movement. In addition to disrupting fluid movement and increasing fluid resistance, it also causes kinetic energy loss, thereby reducing the overall efficiency of the system and negatively impacting the flow field drawn in by the second-stage impeller, resulting in energy efficiency loss.

[0005] Furthermore, due to its greater turbulence intensity and vortex structure, it increases the frictional loss of the fluid, requiring more energy for the fluid to flow in the pipe or equipment, thereby reducing the overall energy efficiency of the system. This results in a larger error between the design boundary conditions of the second-stage fluid dynamic element and the simulation analysis compared to the experiment, thus affecting performance efficiency.

[0006] Therefore, the problem of uneven flow mixing and flow loss caused by the vortex structure downstream of the traditional injection hole is not only that, but similar problems may also occur if the compressor operating range needs to be expanded or the injection mechanism is used during short gas circulation. Summary of the Invention

[0007] This invention provides a compressor gas supply device, an injection mechanism, and a parallel annular injection structure, which can solve the problems of uneven flow mixing and flow loss caused by the vortex structure downstream of the traditional injection hole, and improve the performance efficiency of the compressor.

[0008] One embodiment of the present invention provides a compressor air supply device, including an inlet flow channel, a first-stage impeller, a second-stage impeller, a return flow bend, and an air supply channel structure. The first-stage impeller is connected to the inlet flow channel. The return flow bend connects the first-stage and second-stage impellers, wherein the return flow bend includes an outlet flow channel and an injection flow channel, the outlet flow channel being connected to the injection flow channel, and the injection flow channel being connected to the second-stage impeller. The air supply channel structure includes an air supply passage connected to the injection flow channel, wherein a flow direction of the air supply passage is the same as a flow direction of the outlet flow channel, and an extension direction of the air supply passage is parallel to an extension direction of the outlet flow channel.

[0009] Another embodiment of the present invention provides an injection mechanism, including the aforementioned compressor gas replenishment device.

[0010] Another embodiment of the present invention proposes a parallel annular injection structure for a compressor gas supply device. The compressor gas supply device includes a first-stage impeller, a second-stage impeller, and a return flow bend channel. The return flow bend channel connects the first-stage impeller and the second-stage impeller. The return flow bend channel includes an outlet channel and an injection channel. The outlet channel connects to the injection channel, which in turn connects to the second-stage impeller. The parallel annular injection structure includes a return flow bend and a fluid width adjustment element. The return flow bend includes an annular injection structure. The fluid width adjustment element includes a width member. A gas supply channel is formed between the annular injection structure and the width member, and the gas supply channel has a gas supply channel spacing. The gas supply channel connects to the injection channel, wherein one flow direction of the gas supply channel is the same as one flow direction of the outlet channel, and one extension direction of the gas supply channel is parallel to one extension direction of the outlet channel.

[0011] Based on the above, in the compressor gas replenishment device, injection mechanism and parallel annular injection structure of the present invention, the extension direction of the gas replenishment channel is parallel to the extension direction of the outlet channel of the return bend channel, so that the gas replenishment flow direction of the gas replenishment refrigerant (or medium-pressure gas) injection jet has the same flow direction as the gas flow direction of the outlet channel. By applying the different fluid velocities, a mixing layer of boundaryless shear flow will be generated in the injection channel to obtain the vortex structure and vorticity of the fluid mixing interface.

[0012] Furthermore, in order to solve the problem of the vortex structure formed downstream of the traditional injection hole, the present invention can also apply the Coanda effect, which enables the fluid to adhere to the solid surface to eliminate the vortex structure. Therefore, it can improve the uniformity of injection mixing, reduce flow loss, and improve the performance efficiency of the compressor.

[0013] Furthermore, the recirculation curve structure of this invention replaces the existing structure, eliminating the need for four-axis machining, which reduces machining complexity and manufacturing costs.

[0014] To make the present invention more apparent and understandable, specific embodiments are described below, and detailed descriptions are provided in conjunction with the accompanying drawings. Attached Figure Description

[0015] Figure 1 This is a cross-sectional schematic diagram of an embodiment of the compressor gas supply device of the present invention;

[0016] Figure 2 for Figure 1 A partial cross-sectional enlarged schematic diagram of an embodiment of a compressor air supply device;

[0017] Figure 3 This is a three-dimensional schematic diagram of an embodiment of the parallel annular injection structure of the present invention;

[0018] Figure 4 This is a perspective view of an embodiment of the return flow bend of the present invention;

[0019] Figure 5A This is a partial perspective view of an embodiment of the fluid width adjustment element of the present invention;

[0020] Figure 5B This is a perspective view of an embodiment of the fluid width adjustment element of the present invention;

[0021] Figure 6 This is a schematic diagram of the injection and flow field of the supplementary airflow channel structure of the present invention;

[0022] Figure 7 for Figure 6 A magnified view of a portion of the image;

[0023] Figure 8 This is a cross-sectional schematic diagram of an application example of a tilted array injection hole in the prior art;

[0024] Figure 9 for Figure 8 A schematic diagram of the injection and flow field of the existing inclined array injection hole technology;

[0025] Figure 10 for Figure 9 A magnified view of a portion of the image;

[0026] Figure 11 A perspective view of an application example of a tilted array injection hole in the prior art;

[0027] Figure 12A for Figure 11 A partial 3D view;

[0028] Figure 12B for Figure 11 Cross-sectional view;

[0029] Figure 13 This is a cross-sectional schematic diagram of another embodiment of the compressor air supply device of the present invention;

[0030] Figure 14 This is a schematic diagram of an embodiment of the injection mechanism of the present invention, which includes a compressor gas supply device.

[0031] Symbol Explanation

[0032] 50: Air replenishment device

[0033] 52: First stage impeller

[0034] 54: Second-stage impeller

[0035] 56: Reflux guide vane

[0036] 58: Return Flow Bend

[0037] 582:Ontology

[0038] 584: Inclined section

[0039] 60: Machining tools

[0040] 70: Injection Mechanism

[0041] 100, 200: Compressor gas supply device

[0042] 110: Vortex shell

[0043] 112: Vortex front cover

[0044] 120: Axis

[0045] 130: Inhalation catheter

[0046] 140: First stage impeller

[0047] 142: Impeller

[0048] 150: Second-stage impeller

[0049] 152: Impeller

[0050] 160: Reflux guide vane

[0051] 170: Front cover for backflow bend

[0052] 180, 280: Return curve

[0053] 182: Circular injection structure

[0054] 182A: Airflow Guide

[0055] 182B: Through hole

[0056] 183: Connector

[0057] 184:Ontology

[0058] 190, 290: Fluid width adjustment element

[0059] 192: Width component

[0060] 194: Connector

[0061] 290: Third-stage impeller

[0062] AM: Angle of oblique injection

[0063] B1: Axial direction

[0064] B2: Radial direction

[0065] C1: Gas flow direction

[0066] C2: Flow direction

[0067] CF: Fluid

[0068] DH: Spacing between air supply channels

[0069] DL, DL1, DL2: Return flow bends

[0070] KA: Injection port

[0071] L1: Inflow channel

[0072] L2: Turning channel

[0073] L3, LM1: Outlet flow channels

[0074] L4, LM2: Injection channels

[0075] MD: Parallel Circular Injection Structure

[0076] ML: Vortex structure at the fluid mixing interface

[0077] P1: Inlet flow channel

[0078] P2, P3, P52: Airflow channel structure

[0079] PA: Injection Channel

[0080] PC, PC1, PC2: Air supply channels

[0081] SA: Arc structure

[0082] SAM: Downstream Location

[0083] VX: Vortex Structure

[0084] X: X-axis direction

[0085] Y: Y-axis direction

[0086] Z: Z-axis direction Detailed Implementation

[0087] The following description provides detailed examples and accompanying drawings, but these examples are not intended to limit the scope of the invention. Furthermore, the drawings are for illustrative purposes only and are not drawn to scale. For ease of understanding, the same elements will be designated with the same symbols in the following description.

[0088] The terms "including", "comprising", "having", etc., used in this invention are all open-ended terms, meaning "including but not limited to".

[0089] In the description of the various embodiments, when the terms "first," "second," "third," "fourth," etc. are used to describe elements, they are only used to distinguish these elements from each other and do not limit the order or importance of these elements.

[0090] In the description of the various embodiments, the term "coupled" or "connected" may refer to two or more elements making direct physical or electrical contact with each other, or making indirect physical or electrical contact with each other. "Coupled" or "connected" may also refer to two or more elements operating or moving with each other.

[0091] Figure 1 This is a cross-sectional schematic diagram of an embodiment of the compressor air supply device according to the present invention. Figure 2 In accordance with Figure 1 A partial cross-sectional enlarged schematic diagram of an embodiment of a compressor gas supply device.

[0092] This invention provides a compressor air supply device 100, which includes a volute 110, a shaft 120, a suction duct 130, a first-stage impeller 140, a first-stage and second-stage impellers 150, a return guide vane 160, a return bend front cover 170, a return bend 180, a fluid width adjustment element 190, a suction inlet channel P1, a return bend channel DL, and an air supply channel structure P2. The air supply channel structure P2 can be used as an energy saver (or an intercooler, economizer). The first-stage impeller 140 and the second-stage impeller 150 are, for example, a first-stage centrifugal impeller and a second-stage centrifugal impeller, and the impeller shape can be adjusted according to the equipment.

[0093] The vortex casing 110 is located outside the shaft 120, the first-stage impeller 140, the second-stage impeller 150, the return guide vane 160, the return bend front cover 170, the return bend 180, and the fluid width adjustment element 190, on an axial direction B1. The first-stage impeller 140, the return guide vane 160, and the second-stage impeller 150 are respectively arranged sequentially on the shaft 120, wherein the first-stage impeller 140 includes impeller 142 and the second-stage impeller 150 includes impeller 152.

[0094] One end of the suction duct 130 is located outside the volute 110, and a suction inlet channel P1 is provided inside the suction duct 130. The suction inlet channel P1 is connected to the first-stage impeller 140, and the return flow bend channel DL is connected between the first-stage impeller 140 and the second-stage impeller 150. By rotating the shaft 120, the impellers 142 and 152 are rotated, so that the refrigerant gas sucked in by the suction inlet channel P1 is sequentially transferred to the first-stage impeller 140, the return flow bend channel DL, and the second-stage impeller 150.

[0095] The inner side of the return flow bend front cover 170 is connected to the first-stage impeller 140, and the outer side of the return flow bend front cover 170 is connected to the volute housing 110. One end of the return flow bend front cover 170 is connected to the return flow bend 180, and the outer side of the return flow bend 180 is connected to the volute housing 110. One end of the return flow guide vane 160 is located between the return flow bend front cover 170 and the return flow bend 180, so that the return flow bend front cover 170, the return flow bend 180 and the return flow guide vane 160 constitute a return flow bend flow channel DL.

[0096] The return flow channel DL includes an inlet flow channel L1, a turning flow channel L2, an outlet flow channel L3, and an injection flow channel L4. The inlet of the return flow channel DL is located in the inlet flow channel L1, which is connected to the first-stage impeller 140. The outlet of the return flow channel DL is located in the injection flow channel L4, which is connected to the second-stage impeller 150. The inflow channel L1 is formed between the front cover 170 of the return bend and the return guide vane 160. The outlet channel L3 is formed between the return guide vane 160 and one side of the return bend 180. The turning channel L2 connects the inflow channel L1 and the outlet channel L3. The turning channel L2 is formed by the wall connecting the front cover 170 of the return bend and the return bend 180, and one end of the return guide vane 160. For example, the turning channel L2 has an arc-shaped channel, so that the flow direction of the inflow channel L1 is opposite to the flow direction of the outlet channel L3.

[0097] The outlet flow channel L3 of this invention connects to the injection flow channel L4, which serves as the outlet of the return flow bend channel DL and connects to the impeller 152 of the secondary impeller 150. Furthermore, one side of the injection flow channel L4 is also connected to the make-up flow channel structure P2. The make-up flow channel structure P2 provides medium-pressure gas (make-up refrigerant) to the injection flow channel L4, which mixes with the refrigerant gas flowing in from the outlet flow channel L3 of the return flow bend channel DL before being drawn in by the impeller 152 of the secondary impeller 150, achieving a two-stage compression function. Since the injection flow channel L4 connects to the inlet bend of the secondary impeller 150, the gas is further compressed to a higher pressure through the make-up flow channel structure P2.

[0098] In one embodiment, the supplementary airflow channel structure P2 includes an injection channel PA and a supplementary airflow channel PC. The injection channel PA is a fluid passage formed by a channel from the vortex housing 110, the vortex front cover 112 of the vortex housing 110, and the return bend 180. The return bend 180 and the fluid width adjustment element 190 form a supplementary airflow channel PC. The flow direction of the supplementary airflow channel PC is the same as the flow direction of the outlet flow channel L3, and along the radial direction B2 (or one direction on the cross section), the extension direction of the supplementary airflow channel PC is parallel to the extension direction of the outlet flow channel L3, so that the return bend 180 and the fluid width adjustment element 190 form a parallel annular injection structure MD. The parallel means that the two flow channels are parallel, so that the outlet flow channel L3 and the supplementary airflow channel PC have the same flow direction. The annular means that the supplementary airflow channel PC is not multiple holes but an annular channel.

[0099] In addition, the air supply channel PC is connected to the injection channel L4, which is the outlet of the return flow bend channel DL. That is, the air supply channel PC is connected to the outlet of the return flow bend channel DL, or the air supply channel PC is connected to the secondary impeller 150 through the injection channel L4.

[0100] Figure 3 This is a perspective view of an embodiment of the parallel annular injection structure according to the present invention. Figure 4 This is a perspective view of an embodiment of a return flow bend according to the present invention. Figure 5A This is a partial perspective view of an embodiment of the fluid width adjustment element according to the present invention. Figure 5B This is a perspective view of an embodiment of the fluid width adjustment element according to the present invention. Please refer to... Figures 1 to 5B The parallel annular injection structure MD includes a return bend 180 and a fluid width adjustment element 190. The return guide vane 160 and one side of the return bend 180 form an outlet flow channel L3. The other side of the return bend 180 includes an annular injection structure 182, a connector 183, and a body 184. The body 184 can be a circular structure. The annular injection structure 182 is located inside the body 184. The thickness of the annular injection structure 182 is less than the thickness of the body 184, forming an annular flow channel injection design to improve the uniformity of injection mixing.

[0101] In one embodiment, since the annular injection structure 182 and the body 184 have a stepped structure, a connector 183 can be connected between the body 184 and the annular injection structure 182. The connector 183 can be provided with a sloped structure, so that the fluid flows along the sloped structure of the connector 183.

[0102] In addition, the inner side of the annular injection structure 182 is provided with a through hole 182B, which is the central hole of the return bend 180. It serves as the air inlet of the air supply channel PC and is connected to the injection channel L4.

[0103] A fluid width adjustment element 190 is disposed on one side of the vortex channel front cover 112, which may be referred to as a vortex housing cover or a cover plate of a secondary diffuser. The fluid width adjustment element 190 includes a width member 192 and a connecting member 194. One side of the connecting member 194 is connected to the vortex channel front cover 112, and the other side of the connecting member 194 is connected to the width member 192. In one embodiment, as... Figure 2 As shown, the annular injection structure 182 and the width member 192 form a gas supply channel PC, and the gas supply channel PC has a gas supply channel spacing DH. The value of the gas supply channel spacing DH can be adjusted by adjusting the width of the width member 192 to accommodate different types of compressors or the required gas supply range. In addition, the outer surface of the width member 192 is an arc-shaped structure SA, which is located in the flow path of the gas supply channel PC. Due to the shape characteristics of the arc-shaped structure SA, it can be a smooth arc structure or a curved surface structure, allowing the fluid to flow along the configuration of the arc-shaped structure SA.

[0104] Figure 6 This is a schematic diagram of the injection and flow field of the supplementary airflow channel structure according to the present invention. Figure 7for Figure 6 A magnified view of a portion of the image. Please refer to [link / reference]. Figure 6 and Figure 7 The refrigerant gas is introduced through the inlet channel P1 and flows sequentially through the first-stage impeller 140, the return bend channel DL, and the second-stage impeller 150. Simultaneously, the make-up flow channel structure P2 provides make-up refrigerant (or medium-pressure gas) which is injected into the injection channel L4 through the make-up flow channel PC. Since both the outlet channel L3 and the make-up flow channel PC flow towards the injection channel L4 (i.e., the outlet of the return bend channel DL, the outlet of the return guide vane 160), and the extension direction of the make-up flow channel PC is parallel to the extension direction of the outlet channel L3 of the return bend channel DL, the make-up flow direction C2 of the make-up refrigerant (or medium-pressure gas) injected into the jet has the same flow direction as the gas flow direction C1 of the outlet channel L3. The different fluid velocities will generate a boundary-free shear flow mixing layer in the injection channel L4, resulting in a vortex structure ML and vorticity at the fluid mixing interface. It should be noted that the aforementioned mixing layer refers to the flow field generated when two parallel but different flow fields converge. It describes the region where two fluids with different velocities and properties interact and mix at the interface. The mixing layer appears in the contact region of fluids with different velocities, and within these regions, the fluids undergo turbulent expansion, shearing, and mutual mixing. Taking this invention as an example, the makeup gas flow direction C2 of the injector jet and the gas flow direction C1 of the outlet channel L3 are two flow directions with different velocities, and they converge at the outlet of the return bend channel DL, that is, at the injection channel L4. Figure 7 The vortex structure ML at the fluid mixing interface shown can improve the mixing uniformity.

[0105] Furthermore, a guide section 182A is provided at the front end of the annular injection structure 182. The thickness of the guide section 182A is less than the thickness of the annular injection structure 182, and the guide section 182A has a 30-degree inclined plane configuration. Because the thickness of the guide section 182A is smaller than the thickness of the annular injection structure 182, after the fluid flows from the annular injection structure 182 to the guide section 182A, a vortex structure ML of the fluid mixing interface is quickly formed.

[0106] Furthermore, the arc-shaped structure SA is located in the flow path of the gas supply channel PC. Due to the shape characteristics of the arc-shaped structure SA, the gas supply refrigerant (or medium-pressure gas) can flow along the arc-shaped structure SA. Figure 7As shown, the Coanda effect allows the fluid CF to adhere to the surface of the arc-shaped structure SA due to its viscosity. This prevents the fluid CF from forming a vortex structure by rotating on the surface of the arc-shaped structure SA, thus eliminating the vortex structure. At the same time, the fluid supplied by the outlet flow channel L3 in the main circulation pressurizes the aforementioned fluid CF, making the fluid CF adhere even more closely to the surface of the arc-shaped structure SA. Therefore, it can improve the uniformity of injection mixing, reduce flow loss, and improve the performance efficiency of the compressor. It should be noted that the aforementioned Coanda effect is also known as the wall adhesion effect. When a jet flows over a curved surface, there is surface friction between the fluid (water or air) and the surface it is flowing over. The fluid velocity near the surface slows down, and the fluid near the surface deviates from its original flow direction, instead tending to flow along the curved (or convex) surface, causing surrounding fluid to escape into the jet. Due to the slowdown in fluid velocity and the change in direction of movement (streamline curvature), the pressure outside the jet (atmospheric pressure) is greater than the pressure at the interface between the jet and the curved surface. Therefore, the jet adheres to the curved wall. The wall adhesion effect of the jet causes the pressure on the curved wall to be less than the atmospheric pressure outside the jet, generating a suction force towards the curved wall, called the wall adhesion force. Thus, the Coanda effect is a boundary flow phenomenon that occurs when fluid flows over a curved or object surface, causing the jet to adhere to a fixed surface.

[0107] To better highlight the advantages of this invention over the prior art or to address the problems arising from the prior art, the following examples illustrate this point.

[0108] like Figure 8 As shown, it is a cross-sectional schematic diagram of an application example of a tilted array injection hole in the prior art, compared to Figures 1 to 7 The existing air supply device 50 includes an outlet flow channel LM1 and an injection flow channel LM2. The outlet flow channel LM1 is formed between the return guide vane 56 and one side of the return bend 58. The injection flow channel LM2 connects the outlet flow channel LM1 and the secondary impeller 54. In addition, one side of the injection flow channel LM2 is also connected to the air supply channel structure P52.

[0109] In this structure, there is an oblique injection angle AM ​​between these injection holes KA and the wall of the return bend 58, so that the extension direction of these injection holes KA is not parallel to the extension direction of the outlet flow channel LM1, and the flow direction of these injection holes KA is more towards the outlet flow channel LM1.

[0110] Figure 9 In accordance with Figure 8 A schematic diagram of the injection and flow field of the existing inclined array injection hole technology. Figure 10 for Figure 9 A magnified view of a portion of the image. Please refer to [link / reference]. Figures 7 to 10 The existing makeup flow channel structure P52 provides medium-pressure gas (makeup refrigerant) and injects it into the injection channel LM2 through multiple injection holes KA. This injection or makeup gas is then injected at the outlet of the first-stage impeller 52 or at the bend at the inlet of the second-stage impeller 54. However, a vortex structure VX is formed at the downstream position SAM of the injection hole KA. This vortex structure VX is a ring-shaped motion formed by the fluid during rotation. It causes unnecessary fluid movement, which not only disturbs the fluid movement and increases fluid resistance, but also causes kinetic energy loss, thereby reducing the overall efficiency of the system. This is also detrimental to the flow field sucked in by the second-stage impeller 54, resulting in energy loss and reducing the overall energy efficiency of the system. Consequently, the design boundary conditions of the second-stage fluid dynamic element have a large error compared to the simulation analysis, which in turn affects the performance efficiency.

[0111] On the contrary, such as Figure 7 As shown, the parallel annular injection structure MD provided by the present invention has the structural feature of allowing fluid CF to adhere to the surface of the arc-shaped structure SA through the Coanda effect, thereby eliminating the vortex structure. Therefore, it can improve the uniformity of injection mixing, reduce flow loss, and improve the performance efficiency of the compressor.

[0112] In addition, regarding the structural characteristics of the injection method, such as Figure 11 , Figure 12A and Figure 12B The existing return flow curve 58 includes a body 582, an inclined portion 584, and multiple injection holes KA. The inclined portion 584 is inclinedly disposed inside the body 582, and the injection holes KA are respectively disposed at different positions of the inclined portion 584. Figure 12A As shown, the inclined portion 584 is an inclined protrusion ring on the body 582 along a Z-axis direction Z (or possibly an axial direction), and these injection holes KA have an inclined injection angle AM ​​with the body 582 along the Y-axis direction Y (or possibly a radial direction on the body 582). Therefore, it can be seen that the prior art uses an inclined array of injection holes KA, which is different from the present invention. Figure 3 The parallel annular injection structure MD is shown.

[0113] Under the existing structural features, the number of injection holes KA in the inclined array is equal to the number of blades in the return guide vane 56. In other words, the more blades in the return guide vane 56, the more injection holes KA are required in the inclined array, increasing the processing complexity. Conversely, in this case... Figure 3 The parallel annular injection structure MD shown is relatively simple. The annular injection structure 182 is not multiple injection holes, but a single injection structure. Therefore, there is no need to adjust the number of annular injection structures 182 according to the number of blades of the return guide vane 56. Thus, the invention can reduce the processing complexity.

[0114] Furthermore, in order to create an injection hole KA with an oblique injection angle AM, the existing return curve 58 requires the machining tool 60 to not only machine in three dimensions (X-axis, Y-axis, and Z-axis) but also to consider the rotation dimension to create a structural shape that conforms to the oblique injection angle AM. This means that four-axis machining is required, which not only increases the complexity of machining but also requires higher precision, leading to increased manufacturing time. In addition, machining machines with four-axis machining capabilities are expensive. Therefore, it is clear that the existing technology will increase both the manufacturing cost and manufacturing time when producing multiple injection holes KA with an oblique injection angle AM.

[0115] Furthermore, the smaller the angle of injection (AM), the higher the manufacturing precision, but also the greater the difficulty in processing.

[0116] In contrast, the present invention is as follows Figure 3 The parallel annular injection structure MD shown is relatively simple. The thickness of the annular injection structure 182 is smaller than that of the body 184. Only two-dimensional processing is required to form an annular flow channel injection design. This not only reduces processing complexity and manufacturing costs, but also reduces manufacturing time.

[0117] Furthermore, to verify the parallel annular injection structure MD of the present invention and the tilted array injection hole injection of the prior art, some experimental data simulations were performed, as shown in Table 1:

[0118]

[0119]

[0120] Table 1

[0121] In Table 1, Case 01 uses an inclined injection port (such as...). Figure 8 , Figure 11 , Figure 12A or Figure 12B The number of injection channels is the same as the number of injection holes KA mentioned above; Examples 02, 03 and 04 are examples of applications using the present invention. Figure 3 The parallel annular injection structure MD shown has the same number of injection channels as the aforementioned single annular injection structure 182. The difference between Case 02, Case 03, and Case 04 lies in the injection area (mm²) of the medium-pressure channel. 2 The dimensions of the injection area of ​​the medium-pressure flow channel can be determined according to, for example... Figure 2 The air supply channel spacing DH is shown. As can be seen from Table 1, in the comparison of the dual-stage pressure ratio and dual-stage isentropic efficiency (%), the values ​​of Case 02 to Case 04 are all better than the value of Case 01, which proves that the parallel annular injection structure MD of the present invention can indeed improve the performance of dual-stage pressure ratio and dual-stage isentropic efficiency (%).

[0122] Furthermore, the injection ratio can be adjusted to suit the compressor's operating range by using fluid width adjustment elements 190 of different sizes.

[0123] Furthermore, considering the different compressor loads, and the parallel annular injection structure MD compared to existing technologies... Figure 8 The inclined array injection orifice was used to simulate experimental data on pressure ratio, cooling capacity, and coefficient of performance (COP), as shown in Table 2:

[0124]

[0125] Table 2

[0126] Table 2 shows the performance coefficient tests of a compressor using R1234ze refrigerant with a rated cooling capacity of 633kW. The last row of the performance coefficients uses the difference between data from a parallel annular injection structure and data from a tilted array injection orifice to illustrate the performance differences compared to the tilted array injection orifice data. The results show that the parallel annular injection structure, compared to the tilted array injection orifice data, improves performance by a certain percentage regardless of the compressor's load conditions. Furthermore, IPLV (Integrated Part Load Value), one of the performance indicators of a chiller, is shown in Table 2 to improve the performance coefficient by 5.1% using the parallel annular injection structure data compared to the tilted array injection orifice data.

[0127] Furthermore, considering the different compressor loads, and the parallel annular injection structure MD compared to existing technologies... Figure 8 The inclined array of injection orifices was used to perform computational fluid dynamics simulations on pressure ratio, isentropic efficiency, and compression power, as shown in Table 3.

[0128]

[0129] Table 3

[0130] Table 3 shows that the refrigerant used is R1234ze, and the rated cooling capacity is 525kW. The injection ratio is the ratio of the average injection orifice velocity to the average injection orifice velocity. Under different compressor loads, in the comparison of pressure ratio, isentropic efficiency, and compression power, the parallel annular injection structure (injection ratio 70%) of this invention outperforms the others. Figure 8 The numerical values ​​of the tilted array injection holes sufficiently demonstrate that the parallel annular injection structure MD of the present invention can indeed improve the performance in terms of pressure ratio, isentropic efficiency, and compression power.

[0131] Furthermore, for different compressor loads, and for parallel annular injection structure MD compared with existing technology... Figure 8 The inclined array of injection orifices is used to perform computational fluid dynamics data simulation for mass flow rate errors, as shown in Table 4:

[0132]

[0133] Table 4

[0134] In Table 4, the refrigerant used is R1234ze, and the rated cooling capacity is 525kW. The injection ratio is the ratio of the average injection orifice velocity to the average injection orifice velocity. Under different compressor loads, the mass flow rate error of the parallel annular injection structure (injection ratio 70%) of this invention is consistently lower than [a certain value]. Figure 8 The mass flow rate error value of the tilted array injection orifice is sufficient proof that the parallel annular injection structure MD of the present invention can indeed improve the performance in terms of mass flow rate error value.

[0135] Figure 13 This is a cross-sectional schematic diagram of another embodiment of the compressor air supply device according to the present invention. Please refer to... Figure 13 The compressor gas supply device 200 of the present invention is similar to Figure 1 The compressor air supply device 100 differs from the compressor air supply device 200 of the present invention in that it can be used for multi-stage compression, such as three-stage compression in this embodiment. The compressor air supply device 200 also includes a three-stage impeller 250, a return flow bend 280, and a fluid width adjustment element 290, forming an air supply channel PC1 at the outlet of a return flow bend DL1 and an air supply channel PC2 at the outlet of another return flow bend DL2, and having two air supply fluid structures P2 and P3.

[0136] Figure 14 This is a schematic diagram of an embodiment of the injection mechanism according to the present invention, including a compressor gas supply device. Please refer to... Figure 14 The present invention provides an injection mechanism 70 including the aforementioned compressor gas supply device 100. In other embodiments, the injection mechanism 70 may include... Figure 13 Compressor gas supply device 200. The injection mechanism 70 may be a compressor, which includes two-stage or three-stage compression. In other embodiments, the aforementioned compressor gas supply device 100 or compressor gas supply device 200 may also be used when it is necessary to expand the operating range of the compressor or when the gas is in short circulation.

[0137] In summary, in the compressor gas replenishment device, injection mechanism, and parallel annular injection structure of the present invention, the extension direction of the gas replenishment channel is parallel to the extension direction of the outlet channel of the return bend channel, so that the gas replenishment flow direction of the gas replenishment refrigerant (or medium-pressure gas) injection jet has the same flow direction as the gas flow direction of the outlet channel. By utilizing the different fluid velocities, a mixing layer of boundaryless shear flow will be generated in the injection channel, thereby obtaining the vortex structure and vorticity of the fluid mixing interface.

[0138] Furthermore, in order to solve the problem of the vortex structure formed downstream of the traditional injection hole, the present invention can also apply the Coanda effect, which enables the fluid to adhere to the solid surface to eliminate the vortex structure. Therefore, it can improve the uniformity of injection mixing, reduce flow loss, and improve the performance efficiency of the compressor.

[0139] Furthermore, the recirculation curve structure of this invention replaces the existing structure, eliminating the need for four-axis machining, which reduces machining complexity and manufacturing costs.

[0140] In addition, different sizes of fluid width adjustment elements can be used to achieve injection ratios that correspond to the operating range of the compressor to meet different needs.

[0141] Although the present invention has been disclosed above by way of embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and refinements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be defined by the appended claims.

Claims

1. A compressor gas supply device, comprising: Inlet flow channel; The first-stage impeller is connected to the inlet flow channel; Second-stage impeller; A return flow bend is provided, connecting the first-stage impeller and the second-stage impeller. The return flow bend includes an outlet flow and an injection flow, the outlet flow connecting to the injection flow, and the injection flow connecting to the second-stage impeller. The replenishment flow channel structure includes a replenishment channel that connects to the injection flow channel, wherein the flow direction of the replenishment channel is the same as that of the outlet flow channel, and the extension direction of the replenishment channel is parallel to the extension direction of the outlet flow channel.

2. The compressor gas supply device as described in claim 1, further comprising: Reflux guide vanes; The return flow bend has one side forming the outlet flow channel with the return flow guide vane, and the other side of the return flow bend includes an annular injection structure. as well as A fluid width adjustment element includes a width member, the annular injection structure and the width member forming the air supply channel, and the air supply channel having an air supply channel spacing.

3. The compressor gas replenishment device as claimed in claim 2, wherein the return flow bend includes a body, the annular injection structure is disposed within the body, and the thickness of the annular injection structure is less than the thickness of the body.

4. The compressor gas supply device as described in claim 2, wherein a guide section is provided at the front end of the annular injection structure.

5. The compressor gas supply device as described in claim 2, wherein the outer side of the width member has an arc-shaped structure.

6. The compressor gas supply device as described in claim 2, further comprising: The vortex housing includes a vortex channel front cover, and the fluid width adjustment element is located on one side of the vortex channel front cover.

7. The compressor gas supply device as claimed in claim 1, wherein the return flow bend further includes an inflow flow channel and a turning flow channel, the inflow flow channel is connected to the first-stage impeller, the turning flow channel is connected between the inflow flow channel and the outlet flow channel, and the flow direction of the inflow flow channel is opposite to the flow direction of the outlet flow channel.

8. The compressor air supply device as described in claim 1, wherein the first-stage impeller and the second-stage impeller are respectively a first-stage centrifugal impeller and a second-stage centrifugal impeller.

9. An injection mechanism comprising the compressor gas supply device according to any one of claims 1 to 8.

10. The injection mechanism as claimed in claim 9, wherein the injection mechanism is a compressor, the compressor comprising two or more compression stages.

11. A parallel annular injection structure for a compressor gas supply device, the compressor gas supply device comprising a primary impeller, a secondary impeller, and a return flow bend channel, the return flow bend channel being connected between the primary impeller and the secondary impeller, wherein the return flow bend channel includes an outlet channel and an injection channel, the outlet channel being connected to the injection channel, and the injection channel being connected to the secondary impeller, the parallel annular injection structure comprising: Return channel, including annular injection structure; as well as A fluid width adjustment element includes a width member, an annular injection structure and the width member forming a gas replenishment channel, the gas replenishment channel having a gas replenishment channel spacing, the gas replenishment channel communicating with the injection channel, wherein the flow direction of the gas replenishment channel is the same as the flow direction of the outlet channel, and the extension direction of the gas replenishment channel is parallel to the extension direction of the outlet channel.

12. The parallel annular injection structure as claimed in claim 11, wherein the return channel includes a body, the annular injection structure is disposed within the body, and the thickness of the annular injection structure is less than the thickness of the body.

13. The parallel annular injection structure as described in claim 11, wherein a guide portion is provided at the front end of the annular injection structure, and the thickness of the guide portion is less than the thickness of the annular injection structure.

14. The parallel annular injection structure as claimed in claim 11, wherein the outer surface of the width member is an arc-shaped structure.

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