Substrate processing apparatus

Abstract

A substrate processing apparatus of the present application includes a cleaning tool that cleans a substrate, a load transmission member that has a first force transmission point and a second force transmission point, and a linear guide that supports the load transmission member so as to be movable in a downward direction (-Z direction) and an upward direction (+Z direction). In addition, the substrate processing apparatus further includes a cylinder device that applies a force in the downward direction to the first force transmission point of the load transmission member, and a load sensor that has a contact member that can contact the second force transmission point of the load transmission member, and detects a force acting on the contact member in the downward direction from the second force transmission point. The first force transmission point, the second force transmission point, and the linear guide of the load transmission member overlap with an imaginary straight line extending in a horizontal direction when viewed from above.

Description

Technical Field

[0001] This invention relates to a substrate processing apparatus that brings a cleaning tool into contact with a substrate for processing. Background Technology

[0002] A substrate processing apparatus is used to perform various processing on substrates such as flat panel display (FPD) substrates, optical disc substrates, magnetic disk substrates, optical disk substrates, photomask substrates, ceramic substrates, or solar cell substrates for semiconductor substrates, liquid crystal display devices, or organic electroluminescence (EL) display devices.

[0003] As an example of such a substrate processing apparatus, the substrate processing apparatus described in Japanese Patent Application Publication No. 2009-206139 includes a back-side cleaning processing unit for wiping and cleaning the back side (one side) of a substrate. The back-side cleaning processing unit includes a rotary chuck, a brush, a holding arm, and a brush moving mechanism.

[0004] A rotary chuck holds the substrate so that it can rotate in a horizontal position. A holding arm holds the brush. A brush moving mechanism is connected to the holding arm. The brush moving mechanism moves the holding arm to bring the brush into contact with one side of the substrate, which is held and rotated by the rotary chuck. Furthermore, the brush moving mechanism moves the holding arm further to move the brush across one side of the substrate. Thus, one side of the substrate is cleaned.

[0005] In the retaining arm, the brush is mounted at the lower end of a rotating shaft extending vertically. The rotating shaft is supported in the housing of the retaining arm by a helical spring. Therefore, when the brush is not in contact with the substrate, the weight of the structure including the rotating shaft and the brush is offset by the elastic force of the helical spring.

[0006] Furthermore, the retaining arm contains a bracket and a pressing actuator, which are used to press the rotating axis downwards while the brush is in contact with one side of the substrate, thereby pushing the brush against the substrate. The degree of cleaning force on one side of the substrate varies depending on the pushing force (pressing pressure) exerted by the brush on that side of the substrate. Therefore, when cleaning one side of the substrate, the pressing actuator pushes the rotating axis toward the substrate with a predetermined force in order to obtain a predetermined degree of cleaning force. Summary of the Invention

[0007] The retaining arm also houses a pressure sensor. The pressure sensor receives the driving force generated by the pressing actuator via a bracket and detects it as the pushing pressure based on the pressing actuator.

[0008] In the substrate processing apparatus, the pressure applied by the brush to the substrate is preset based on the detection value of a pressure sensor. Therefore, if the pressure detected by the pressure sensor is inaccurate, it is difficult to clean the substrate under the desired conditions.

[0009] The purpose of this invention is to provide a substrate processing apparatus that improves the cleaning accuracy of substrates using cleaning equipment.

[0010] According to one aspect of the present invention, a substrate processing apparatus includes: a cleaning tool for cleaning a substrate; a force transmitter having a first portion and a second portion; a linear guide supporting the force transmitter so as to be movable along a first direction and a second direction opposite to the first direction; a force application portion applying a force in the first direction or a force in the second direction to the first portion of the force transmitter; and a force detection portion having a contact portion capable of contacting the second portion, detecting a force acting on the contact portion from the second portion along the first direction, wherein the force transmitter is capable of transmitting the force applied from the force application portion to the first portion to the cleaning tool, and the first portion, the second portion, and the linear guide, when viewed in the first direction, overlap with an imaginary straight line intersecting the first direction and the second direction.

[0011] This invention improves the cleaning accuracy of substrates using cleaning tools. Attached Figure Description

[0012] Figure 1 This is a schematic plan view of a substrate cleaning apparatus according to an embodiment of the present invention.

[0013] Figure 2 It means in Figure 1 A flowchart of the basic processing flow performed by the control unit in the substrate cleaning apparatus.

[0014] Figure 3 It is used to explain by Figure 1 The figure shows an example of the operation of a substrate cleaning apparatus during substrate cleaning.

[0015] Figure 4 Observed in the -Z direction Figure 1 A schematic plan view of the brush arm.

[0016] Figure 5 Observed in the +X direction Figure 1 A schematic side view of the brush arm.

[0017] Figure 6 Observed in the -X direction Figure 1 A schematic view of another side of the brush arm.

[0018] Figure 7Observed in the +Y direction Figure 1 A schematic diagram of one end face of the brush arm.

[0019] Figure 8 This diagram illustrates the brush pressure adjustment process.

[0020] Figure 9 It is a diagram used to define the torques that may be generated in a linear guide.

[0021] Figure 10 It is built into Figure 1 A plan view of the linear guide of the brush arm.

[0022] Figure 11 Observed in the +Y direction Figure 10 A schematic view of one side of a linear guide.

[0023] Figure 12 yes Figure 11 A cross-sectional view of the QQ line.

[0024] Figure 13 This is a schematic plan view of the brush arm of the comparative example viewed in the -Z direction.

[0025] Figure 14 Observed in the +X direction Figure 13 A schematic side view of the brush arm.

[0026] Figure 15 This is a graph representing the results of a pressure test.

[0027] Figure 16 It means Figure 1 A block diagram of the control system structure of the substrate cleaning device.

[0028] Figure 17 This is a flowchart of the brush pressure adjustment process.

[0029] Figure 18 It means including Figure 1 A schematic plan view of an example of a substrate processing apparatus for a substrate cleaning device.

[0030] Figure 19 This is a diagram illustrating an example of a brush arm in another embodiment.

[0031] Figure 20 This is a diagram illustrating an example of a brush arm in yet another embodiment.

[0032] Explanation of icon numbers

[0033] 1: Substrate cleaning device

[0034] 10: Substrate holding device

[0035] 11: Rotating base

[0036] 12: Keep the sales

[0037] 13: Drive Unit

[0038] 14: Substrate rotation drive unit

[0039] 20: Cup body device

[0040] 21: Main body of the cup

[0041] 22: Cup body lifting drive unit

[0042] 30: Nozzle device

[0043] 31: Fluid Nozzle

[0044] 32: Fluid supply system

[0045] 40: Brush arm device

[0046] 41, 41X: Brush arm

[0047] 42: Brush the support section

[0048] 43: Guide rail

[0049] 44: Arm support section

[0050] 45: Arm horizontal drive unit

[0051] 46: Arm Lifting Drive Unit

[0052] 71: Standby box

[0053] 72: Brush cleaning device

[0054] 80: Brush device

[0055] 81: Brush support shaft

[0056] 101: Base components

[0057] 102: Cover component

[0058] 103, bp1, bp2: Through holes

[0059] 110: Cylinder assembly

[0060] 111: Cylinder body

[0061] 112: Cylinder rod

[0062] 113: Cylinder drive unit

[0063] 119: Cylinder base

[0064] 120, 140: Pressing mechanism

[0065] 121: Support Components

[0066] 122: Beam Components

[0067] 122a: First end

[0068] 122b: Second end

[0069] 123: Connecting shaft

[0070] 130, 600: Load transfer components

[0071] 131: Load-bearing part

[0072] 132: Lifting Support Unit

[0073] 133: Supported sheet

[0074] 134: Load Transfer Section

[0075] 200: Linear Guide

[0076] 210: Track

[0077] 211: First side

[0078] 212: Second side

[0079] 220: Slider

[0080] 230: Track overlap

[0081] 240: First Installation Department

[0082] 250: Second Installation Section

[0083] 260, 270: End caps

[0084] 310, 620: Load sensors

[0085] 311: Contact components

[0086] 320: Sensor stand

[0087] 410: Lower bearing section

[0088] 420: Upper bearing section

[0089] 490: Self-weight offsetting mechanism

[0090] 510, 615: Motors

[0091] 511: Motor mounting plate

[0092] 520: Motor drive unit

[0093] 521, 522: Pulleys

[0094] 523: with

[0095] 610: Brush the supporting components

[0096] 611: Main body

[0097] 612: Support section

[0098] 613: Connecting Part

[0099] 614: Bearing

[0100] 630: Buoyancy application component

[0101] 631: Sensor support unit

[0102] 632: Vertical section

[0103] 633: Horizontal section

[0104] 800: Substrate processing apparatus

[0105] 801: Indexer Block

[0106] 802: Processing Block

[0107] 810: Carrier placement platform

[0108] 820, 843: Transport Department

[0109] 831: Indexing Robot

[0110] 832: Control device

[0111] 841, 842: Cleaning Department

[0112] 844: The Main Robot

[0113] 900: Control Department

[0114] 901: CPU

[0115] 902: RAM

[0116] 903: ROM

[0117] 904: Storage device

[0118] 909: CD-ROM

[0119] 990: Operations Department

[0120] a1, a2: Arrows

[0121] BA: Ball bearing

[0122] C: Carrier

[0123] CH: Chamber

[0124] CHB: Bottom plate (bottom surface)

[0125] d1: Distance

[0126] gr1, gr3: Guide grooves

[0127] gr2, gr4: Guide slots (grooves)

[0128] H: Shell

[0129] L1, L11, L12, L13: Imaginary straight lines

[0130] M1: First Torque

[0131] M2: Second torque

[0132] M3: Third Torque

[0133] W: substrate

[0134] P1: Point of first force transmission

[0135] P2: Point of transmission of the second force

[0136] P3: Point of transmission of the third force

[0137] PASS: Substrate mounting section

[0138] S11, S12, S13, S14, S15, S16, S21, S22, S23, S24: Steps

[0139] SC: Center of Rotation

[0140] SP: Standby position

[0141] X, Y, Z: Direction Detailed Implementation

[0142] Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings. In the following description, the term "substrate" refers to substrates used in liquid crystal display devices or organic EL (Electro Luminescence) display devices, such as FPD (Flat Panel Display) substrates, semiconductor substrates, optical disc substrates, magnetic disk substrates, optical disk substrates, photomask substrates, ceramic substrates, or solar cell substrates.

[0143] In this embodiment, the substrate has a circular shape when viewed from above, except for the notch formation portion. Furthermore, the substrate has a surface that serves as the circuit formation surface and a back surface that is the surface opposite to the circuit formation surface. In the following description, regardless of the surface or back surface of the substrate, the upward-facing surface of the substrate will be referred to as the upper surface of the substrate, and the downward-facing surface of the substrate will be referred to as the lower surface of the substrate.

[0144] The substrate processing apparatus described below is a substrate cleaning apparatus that uses a brush to clean a substrate that is to be processed. During the cleaning process, a prescribed cleaning solution is supplied to the upper surface of the substrate while the brush is pushed against the upper surface of the substrate.

[0145] 1. Overall structure of the substrate cleaning device

[0146] Figure 1 This is a schematic plan view of a substrate cleaning apparatus according to an embodiment of the present invention. Figure 1 and Figure 2 In the following diagrams, arrows indicating the mutually orthogonal X, Y, and Z directions are used to clarify the positional relationships. The X and Y directions are orthogonal to each other in the horizontal plane. In this embodiment, the X direction corresponds to the left-right direction of the substrate cleaning apparatus 1, and the Y direction corresponds to the front-back direction of the substrate cleaning apparatus 1. Furthermore, the Z direction corresponds to the up-down direction (vertical direction) of the substrate cleaning apparatus 1.

[0147] Furthermore, in the X direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +X direction, and its opposite direction is called the -X direction. Similarly, in the Y direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +Y direction, and its opposite direction is called the -Y direction. Likewise, in the Z direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +Z direction, and its opposite direction is called the -Z direction.

[0148] like Figure 1 As shown, the substrate cleaning apparatus 1 has a structure that houses multiple components within the chamber CH, including: a substrate holding device 10, a cup device 20, a nozzle device 30, a brush arm device 40, a standby box 71, a brush cleaning device 72, a brush device 80, and a control unit 900.

[0149] The chamber CH has four sides, a top surface, and a bottom surface CHB. On one side of the chamber CH, a transfer opening (not shown) is formed for transferring a substrate between the interior and exterior of the chamber CH.

[0150] A substrate holding device 10 is provided approximately at the center of the bottom plate surface CHB of the chamber CH. The substrate holding device 10 includes: a rotating base 11, a plurality of holding pins 12, and a substrate holding drive unit 13. Figure 16 ) and substrate rotation drive unit 14 ( Figure 16 The substrate rotation drive unit 14 includes, for example, a motor, which is fixed to the bottom plate surface CHB of the chamber CH with the rotation axis of the motor facing upward. A circular plate-shaped rotating base 11 is mounted on the upper end of the rotation axis.

[0151] The rotating base 11 has an outer diameter larger than that of the substrate W to be processed. A plurality of retaining pins 12 are provided on the periphery of the upper surface of the rotating base 11. Each retaining pin 12 has an abutment portion. Each retaining pin 12 is configured to move between a holding state where the abutment portion abuts against the outer peripheral end of the substrate W, and a releasing state where the abutment portion and the substrate W are separated. The substrate retaining drive unit 13 includes, for example, a magnet, and uses the magnetic force of the magnet to switch each retaining pin 12 between the holding state and the releasing state. The substrate W is held on the rotating base 11 by the abutment portions of the plurality of retaining pins 12 in the holding state abutting against multiple portions of the outer peripheral end of the substrate W. Figure 1 In the diagram, the shape of the substrate W held in the substrate holding device 10 is represented by a dashed line.

[0152] The cup assembly 20 includes a cup body 21 and a cup lifting drive unit 22. The cup body 21 is configured to have a generally cylindrical shape and, when viewed from above, surrounds the rotating base 11 and extends along the Z direction. In addition, the cup body 21 is configured to be movable along the Z direction.

[0153] The cup lifting drive unit 22 includes an actuator such as a motor or cylinder, which moves the cup body 21 between a predetermined upper cup position and a lower cup position. The upper cup position is the height position (position in the Z direction) of the cup body 21 when the upper end of the cup body 21 is located above the substrate W held by the substrate holding device 10. The lower cup position is the height position of the cup body 21 when the upper end of the cup body 21 is located below the substrate W held by the substrate holding device 10.

[0154] The nozzle device 30 includes a fluid nozzle 31 and a fluid supply system 32. The fluid nozzle 31 is positioned at a predetermined position above the substrate holding device 10 and the cup device 20. The fluid nozzle 31 is fixed with its outlet facing the rotation center SC of the rotating base 11 of the substrate holding device 10. During the cleaning process of the substrate W, the fluid supply system 32 supplies cleaning fluid to the fluid nozzle 31. Thus, cleaning fluid is supplied to the upper surface of the substrate W held by the substrate holding device 10. The cleaning fluid is, for example, pure water (deionized water). Alternatively, carbonated water, ozone water, hydrogen water, electrolyzed ionized water, SCl (a mixed solution of ammonia and hydrogen peroxide), or tetramethylammonium hydroxide (TMAH) can be used instead of pure water. In addition, the nozzle device 30 may also be configured to spray an inert gas or other gas from the fluid nozzle 31. Furthermore, the nozzle device 30 may also have multiple fluid nozzles 31 capable of spraying or spraying different fluids.

[0155] The brush arm device 40 includes a brush arm 41, a guide rail 43, an arm support 44, an arm horizontal drive 45, and an arm lifting drive 46. The guide rail 43 is disposed within the chamber CH, adjacent to the substrate holding device 10 in the Y direction. The guide rail 43 extends along the X direction.

[0156] The arm support 44 is configured to move along the guide rail 43 in the X direction. In this example, the arm horizontal drive 45 includes a motor, which moves the arm support 44 in the X direction based on the control of the control unit 900 (described later). The brush arm 41 is supported by the arm support 44 and is capable of moving (lifting and lowering) in the Z direction. In this example, the arm lifting drive 46 includes a motor, which moves the brush arm 41 in the Z direction based on the control of the control unit 900 (described later).

[0157] The brush arm 41 has a generally cuboid shape and extends along the Y direction from the arm support 44 toward the substrate holding device 10. The front end of the brush arm 41 is configured as a brush support 42 to support the brush device 80 used in cleaning the substrate W. Figure 1 In the substrate cleaning apparatus 1, the brush support 42 is located on an imaginary straight line L1 that passes through the rotation center SC of the rotating base 11 and extends in the X direction when viewed from above.

[0158] The brush device 80 includes a brush having a cleaning surface capable of contacting the upper surface of the substrate W. The brush is, for example, formed of polyvinyl alcohol (PVA) sponge or PVA sponge with dispersed abrasive particles.

[0159] Viewed from above, a standby box 71 and a substrate holding device 10 are arranged along an imaginary straight line L1. The standby box 71 is configured to accommodate a brush device 80 supported by a brush support 42.

[0160] The brush cleaning device 72 is configured to spray cleaning fluid into the standby case 71. With the brush device 80 housed inside the standby case 71, cleaning fluid is sprayed into the standby case 71 from the brush cleaning device 72. As a result, the brush device 80 is cleaned.

[0161] like Figure 1 As shown in the thick dashed box, a standby position SP is provided in the substrate cleaning apparatus 1 at a position overlapping with the standby box 71 when viewed from above. The control unit 900 controls the operation of each part of the substrate cleaning apparatus 1. Details of the control unit 900 will be described later.

[0162] 2. Basic processing flow in substrate cleaning equipment

[0163] Figure 2 It means in Figure 1 The flowchart shows the basic processing flow performed by the control unit 900 in the substrate cleaning apparatus 1. In the initial state, the brush device 80 is housed in the standby box 71.

[0164] When the power to the substrate cleaning apparatus 1 is turned on and there is no substrate W in the chamber CH, such as Figure 2 As shown, the control unit 900 determines whether a substrate W has been brought in (step S11). Whether a substrate W has been brought in can be determined based on a robot outside the chamber CH (described later). Figure 18 The determination is based on the action status of the main robot (e.g., 844).

[0165] If no substrate W is being brought in, step S11 is repeated. On the other hand, when substrate W is being brought in, the control unit 900 controls... Figure 1 The substrate holding device 10 and the like are controlled to receive the substrate W which is moved into the chamber CH (step S12). As a result, the substrate W is placed and held on the substrate holding device 10.

[0166] During or after the processing in step S12, the control unit 900 controls... Figure 1 The brush cleaning device 72 is controlled to spray cleaning fluid into the brush device 80 housed in the standby box 71, thereby cleaning the brush device 80 (step S13).

[0167] After cleaning the brush device 80, the control unit 900 stops the spraying of cleaning fluid into the brush device 80 and performs brush pressure adjustment processing (step S14). Figure 1 The brush arm 41 can apply downward pressing pressure (load) to the brush device 80 supported by the brush support 42. Thus, during the cleaning process of the substrate W, the brush arm 41 can push the brush device 80 onto the substrate W while maintaining a predetermined height position (position in the Z direction).

[0168] The brush pressure adjustment process is as follows: During the subsequent cleaning process of the substrate W, the cylinder device 110 (described later) is adjusted. Figure 4 The operating conditions are adjusted so that the brush device 80 presses against the substrate W with a predetermined pressing pressure. Details of the brush pressing pressure adjustment process will be described later.

[0169] Next, the control unit 900, through... Figure 1 The nozzle device 30 and brush arm device 40 are controlled to perform cleaning of the substrate W (step S15). After the cleaning of the substrate W, the control unit 900 controls the nozzle device 30 and brush arm device 40 to perform cleaning of the substrate W. Figure 1 The substrate holding device 10 and other components are controlled to transfer the substrate W to a robot (described later) outside the chamber CH. Figure 18 (The main robot 844, etc.) (step S16). Therefore, the process returns to step S11. In this series of processes, the process of step S14 can be performed before the process of step S13, or simultaneously with the process of step S12.

[0170] Figure 3 It is used to explain by Figure 1 The figure shows an example of the operation of the substrate cleaning apparatus 1 during the cleaning process of substrate W. Figure 3 In the upper section, a schematic plan view of the substrate cleaning apparatus 1 is shown. Additionally, in the lower section, a schematic side view of the substrate cleaning apparatus 1 viewed in the -Y direction is shown.

[0171] As described above, before the cleaning process of the substrate W is to be performed, the brush pressure adjustment process is performed with the brush device 80 housed in the standby box 71. Therefore, even in the initial state of the cleaning process of the substrate W, the brush device 80 is housed in the standby box 71. In addition, in the initial state, the cup body 21 is located in the lower position of the cup body, and the spraying of cleaning fluid using the fluid nozzle 31 is stopped.

[0172] When the cleaning process of substrate W begins, substrate W, held by substrate holding device 10, rotates at a predetermined rotational speed. Meanwhile, cup body 21 remains in position on the cup. Then, cleaning fluid is sprayed from fluid nozzle 31 toward the rotating substrate W.

[0173] In the state described, by Figure 1 The horizontal drive unit 45 and the lifting drive unit 46 operate, causing the brush arm 41 to move along the Z and X directions. As a result, the brush assembly 80, supported by the brush support unit 42, is lifted from the standby box 71 and pushed against the upper surface of the rotating substrate W. In this state, as... Figure 3 As shown by arrows a1 and a2 (both with medium-thick double-dotted lines), the brush device 80 moves along an imaginary straight line L1 extending in the X direction when viewed from above. In this way, the upper surface of the substrate W is cleaned.

[0174] When the upper surface of the substrate W is cleaned, the brush device 80 returns to its initial position. Furthermore, the spraying of cleaning fluid using the fluid nozzle 31 stops, and the rotation of the substrate W based on the substrate holding device 10 stops. Then, the cup body 21 moves from the upper cup position to the lower cup position. Thus, the cleaning process of the substrate W is completed.

[0175] In addition, Figure 3 In this example, the brush device 80 reciprocates between the outer peripheral end of the substrate W and the rotation center SC of the rotating base 11, but it can also clean the substrate W by moving along an imaginary straight line L1 from one end of the substrate W to the other. Alternatively, the brush device 80 can clean the substrate W by moving only once between the outer peripheral end of the substrate W and the rotation center SC of the rotating base 11.

[0176] 3. Structure of brush arm 41

[0177] Figure 4 Observed in the -Z direction Figure 1 A schematic plan view of the brush arm 41. Figure 5 Observed in the +X direction Figure 1 A schematic side view of the brush arm 41. Figure 6 Observed in the -X direction Figure 1 A schematic view of another side of the brush arm 41. Figure 7 Observed in the +Y direction Figure 1 A schematic end view of the brush arm 41.

[0178] The brush arm 41 of this embodiment has a structure in which multiple components are housed within a housing H. The housing H includes a base component 101 and a cover component 102. The base component 101 includes a rectangular elongated plate component, one end of which is mounted on... Figure 1 The arm support portion 44. Thus, the base member 101 is supported by the arm support portion 44 while extending from it in the -Y direction. Figures 4-7 In the brush arm 41, the end of the base member 101 facing the +Y direction becomes the mounting part of the arm support 44.

[0179] The cover member 102 has a box-shaped design with an open lower end, configured to be mounted on the base member 101. By mounting the cover member 102 on the base member 101, a receiving space for multiple components is formed on the base member 101. Figures 4-7 In order to make it easier to understand the internal structure of the brush arm 41, the cover component 102 is represented by a double-dotted line. In addition, the illustration of some components inside the housing H is appropriately omitted.

[0180] The base component 101 has a flat upper surface in a rectangular shape. For example... Figure 4 As shown, on the upper surface of the base member 101, at a position offset from the central portion of the base member 101 in the +Y direction, the diaphragm cylinder base 119 is provided with a cylinder device 110. Figure 5 As shown, the cylinder assembly 110 includes a cylinder body 111 and a cylinder rod 112. The cylinder body 111 is fixed to the cylinder block 119 such that its axis extends along the Z direction.

[0181] A piston (not shown) is disposed inside the cylinder body 111. A cylinder rod 112 is connected to the piston and is arranged to extend from the piston toward the top of the cylinder body 111. A portion of the cylinder rod 112, including its upper end, protrudes and protrudes above the cylinder body 111.

[0182] A cylinder drive unit 113, disposed outside the brush arm 41, is connected to the cylinder body 111 via piping (not shown). The cylinder drive unit 113 includes, for example, one or more electro-pneumatic regulators. The cylinder drive unit 113 is based on... Figure 1 The cylinder body 111 is operated under the control of the control unit 900, supplying air to the cylinder body 111. In this case, the pressure inside the cylinder body 111 is adjusted, and a force corresponding to the adjusted pressure is generated on the cylinder rod 112.

[0183] A beam member 122, which forms part of the pressing mechanism 120, is provided above the cylinder assembly 110. The pressing mechanism 120 will be described below. The pressing mechanism 120 includes a support member 121, a beam member 122, and a connecting shaft 123.

[0184] The support member 121 is mounted approximately at the central portion of the upper surface of the base member 101, extending from the upper surface of the base member 101 along the +Z direction to a position near the upper end of the housing H. The beam member 122 comprises a rod-shaped member with high rigidity. The central portion of the beam member 122 is mounted at the upper end of the support member 121 via a connecting shaft 123 extending along the X direction. In this state, the beam member 122 is supported to be able to rotate in a plane orthogonal to the X direction (vertical plane). Thus, the pressing mechanism 120 has a seesaw structure that supports the beam member 122 with the connecting shaft 123 as a fulcrum.

[0185] In the pressing mechanism 120, the beam member 122 is supported in a state of inclination within a range of several tens of degrees (e.g., 30°) along the Y direction or relative to the Y direction. In the following description, the end of the beam member 122 facing the +Y direction is referred to as the first end 122a, and the end facing the -Y direction is referred to as the second end 122b.

[0186] When the cylinder assembly 110 is not in operation, the lower end of the first end 122a of the beam member 122 is in contact with or close to the upper end of the cylinder rod 112. In addition, when the cylinder assembly 110 is not in operation, the lower end of the second end 122b of the beam member 122 is in contact with or close to the upper end of the load transfer member 130 described later.

[0187] With this structure, when the cylinder assembly 110 operates and the cylinder rod 112 generates an upward (+Z direction) force, the first end 122a is pressed upward (+Z direction) by the cylinder rod 112. At this time, the beam member 122 rotates about the connecting shaft 123. As a result, the second end 122b presses the load-transferring member 130 downward (-Z direction).

[0188] The load-transferring member 130 is, for example, composed of a single member containing a material with high rigidity. Figure 7 As shown, the load transfer member 130 in this example is an inverted L-shaped member when viewed in the Y direction, having a portion extending in the X direction and a portion extending in the Z direction. In the following description, the portion extending in the X direction of the load transfer member 130 will be referred to as the load-bearing portion 131. The portion extending in the Z direction of the load transfer member 130 will be referred to as the lifting support portion 132.

[0189] Here, in the brush support portion 42 at the front end of the brush arm 41, a through hole 103 is formed in the base member 101, which communicates the internal space of the housing H with a space located lower than the housing H. The brush device 80 is supported by a brush support shaft 81 at a position lower than the base member 101. The brush support shaft 81 is arranged to extend in the Z direction through the through hole 103 of the base member 101. Thus, the upper part of the brush support shaft 81 is located inside the brush arm 41, and the lower part of the brush support shaft 81 is located below the base member 101.

[0190] The load-transferring member 130 is disposed above the through hole 103 in the Z direction, with a portion of the load-bearing portion 131 overlapping the through hole 103. An upper bearing portion 420 is provided on a portion of the load-bearing portion 131.

[0191] The upper bearing portion 420 is connected to the load transmission member 130 in such a way that one end (upper end) of the brush support shaft 81 can rotate about its axis and the brush support shaft 81 cannot move relative to the load transmission member 130 in the Z direction.

[0192] Inside the housing H, a weight-reducing mechanism 490 is mounted on the brush support shaft 81 in a manner that allows it to rotate together with the brush support shaft 81. The weight-reducing mechanism 490 includes a helical spring extending in the Z direction, with its upper end fixed to a portion of the brush support shaft 81. On the other hand, the lower end of the weight-reducing mechanism 490 is not fixed to the brush support shaft 81 in the Z direction.

[0193] Furthermore, the pulley 521 is mounted on the brush support shaft 81 in a manner that allows it to rotate together with the brush support shaft 81. Similarly, the pulley 521 is not fixed to the brush support shaft 81 in the Z direction, just like the lower end of the weight-reducing mechanism 490.

[0194] A lower bearing portion 410 is provided in the portion of the base member 101 where the through hole 103 is formed. The lower bearing portion 410 supports the pulley 521 on the base member 101 in a manner that allows it to rotate about the axis of the brush support shaft 81. In addition, the lower bearing portion 410 supports the pulley 521 on the base member 101 in a manner that allows the brush support shaft 81 to move in the Z direction while preventing the pulley 521 from moving relative to the base member 101 in the Z direction.

[0195] As described above, the upper end of the weight-reducing mechanism 490 is fixed to a portion of the brush support shaft 81. In this state, the lower end of the weight-reducing mechanism 490 is supported on the base member 101 in the Z direction via the pulley 521 and the lower bearing portion 410. Thus, the load corresponding to the total weight of the brush device 80, brush support shaft 81, and load transmission member 130, which are integrally connected in the Z direction, is acted upon by the helical spring of the weight-reducing mechanism 490. In the following description, the load corresponding to the total weight of the brush device 80, brush support shaft 81, and load transmission member 130 is referred to as the brush weight.

[0196] The helical spring of the weight-reducing mechanism 490 is selected to obtain an elastic force corresponding to the weight of the brush. Furthermore, the helical spring of the weight-reducing mechanism 490 is selected so that the reaction force corresponding to the extension and contraction of the helical spring does not affect the transmission accuracy of the load applied from the cylinder device 110 to the brush device 80. By appropriately selecting the helical spring, the structure in the brush arm 41, including the brush device 80, the brush support shaft 81, and the load transmission member 130, is supported on the base member 101 in a floating manner at a predetermined height.

[0197] On the upper surface of the base member 101, a support member 140 is provided at a position offset from the lower bearing portion 410 in the +X direction. The support member 140 extends upward (in the +Z direction) from the upper surface of the base member 101 by a certain length. The support member 140 is connected to the lifting support portion 132 of the load transmission member 130 via the linear guide 200.

[0198] The linear guide 200 includes a straight track 210 and a slider 220. The slider 220 is mounted on the track 210 in a manner that allows it to move in the direction in which the track 210 extends but not in any other direction.

[0199] In this embodiment, the track 210 is fixed to the support member 140 in a manner extending along the Z direction. On the other hand, the slider 220 is fixed to the lifting support portion 132 of the load transfer member 130. Thus, the linear guide 200 restricts the movement direction of the load transfer member 130 in the Z direction.

[0200] The pulley 521, mounted on the brush support shaft 81, is used to rotate the brush device 80 about an axis in the Z direction, i.e., the brush device 80 rotates. By rotating the brush device 80 during the cleaning process of the substrate W, the efficiency of the cleaning process of the substrate W is improved. In order to make the brush device 80 rotate, in addition to the pulley 521, a motor 510, a pulley 522, and a belt 523 are also provided inside the brush arm 41. In addition, a motor drive unit 520 for running the motor 510 is provided outside the brush arm 41.

[0201] Specifically, such as Figure 4 As shown, a motor 510 is provided between the load transfer member 130 in the Y direction and the support member 121 on the upper surface of the base member 101, and at a position offset towards the beam member 122 in the +X direction.

[0202] like Figure 6 As shown, the motor 510 is fixed to the upper surface of the base member 101 by a motor fixing plate 511 with its rotation axis protruding downwards. A pulley 522 is mounted at the front end of the rotation axis of the motor 510. The pulley 522 is fixed at the same height as the pulley 521. A belt 523 is mounted between the two pulleys 521 and 522.

[0203] A motor drive unit 520 is connected to the motor 510. The motor drive unit 520 supplies current to the motor 510 and causes the motor 510 to rotate based on the control of the control unit 900, which will be described later.

[0204] When the motor 510 is running, the rotational force generated in the motor 510 is transmitted from the rotational shaft of the motor 510 to the brush support shaft 81 via pulley 522, belt 523, and pulley 521. As described above, pulley 521 is not fixed to the brush support shaft 81 in the Z direction. Therefore, even if the brush support shaft 81 moves in the Z direction, the movement will not affect the transmission of rotational force from the motor 510 to the brush support shaft 81.

[0205] When the cylinder assembly 110 is in operation, the force generated by the cylinder rod 112 is converted into a pressing force that presses the load transmission member 130 downward (in the -Z direction) through the pressing mechanism 120. The pressing force in the Z direction acting on the load transmission member 130 is transmitted to the brush assembly 80 via the load transmission member 130, the upper bearing portion 420, and the brush support shaft 81.

[0206] The pressure applied by the brush device 80 to the substrate W varies depending on the type of substrate W being processed and the cleaning method. Therefore, the pressure applied by the brush device 80 to the substrate W is preset for each substrate W. In the following description, the pressure applied by the brush device 80 for each substrate W will be referred to as the preset pressure.

[0207] When cleaning a substrate W, if the pressing pressure applied to the substrate W by the brush device 80 deviates significantly from the set pressing pressure, the desired cleaning process cannot be performed. Therefore, a load sensor 310 is provided in the brush arm 41. Based on the detection result of the load sensor 310, the actual pressing pressure (load) transmitted to the brush device 80 during the operation of the cylinder device 110 is detected.

[0208] Specifically, in this embodiment, a Roberval-type load sensor is used as the load sensor 310, for example. Figure 5 As shown, the load sensor 310 is fixed to the base member 101 via the sensor mount 320 at a position offset from the motor 510 in the -X direction. A plate-shaped contact member 311 is mounted on a portion of the load sensor 310. The front end of the contact member 311 is located below the load-bearing portion 131 of the load transmission member 130.

[0209] like Figure 7 As shown, when the cylinder assembly 110 is not in operation, a relatively large gap is formed between the load-bearing portion 131 and the contact member 311. Therefore, when the pressing force from the cylinder assembly 110 is not acting on the load transmission member 130, the load sensor 310 does not detect the pressing force acting on the load transmission member 130. On the other hand, when the cylinder assembly 110 is in operation, the load transmission member 130 is pressed downwards, and the lower end of the load-bearing portion 131 contacts the contact member 311, thereby the load sensor 310 detects the pressing force acting on the load transmission member 130.

[0210] 4. Brush pressure adjustment and substrate W cleaning process.

[0211] Figure 8 This diagram illustrates the brush pressure adjustment process. Figure 8In the left portion, a schematic end view of the brush arm 41 in a stopped state before the brush pressure adjustment process is shown. Additionally, a schematic end view of the brush arm 41 during the brush pressure adjustment process is shown in the central portion. Furthermore, a schematic end view of the brush arm 41 during the cleaning process of the substrate W is shown in the right portion. In each schematic end view, [the text abruptly ends here, likely due to an incomplete sentence or missing information]. Figure 7 Similarly, in one of the schematic end view diagrams, the cover component 102 is represented by a double-dotted line.

[0212] Here, the portion of the load transfer member 130 facing the second end 122b of the beam member 122 in the Z direction is referred to as the first force transfer point P1. Furthermore, the portion of the load transfer member 130 facing the contact member 311 connected to the load sensor 310 in the Z direction is referred to as the second force transfer point P2. Finally, the portion of the load transfer member 130 connected to the brush support shaft 81 (the mounting portion of the upper bearing portion 420) is referred to as the third force transfer point P3.

[0213] Set to the stopped state, Figure 4 The cylinder assembly 110 is not operating. Therefore, the first force transmission point P1 of the load transmission member 130 is not subjected to downward pressing force from the second end 122b of the beam member 122. At this time, as... Figure 8 As shown in the left part, the interconnected brush device 80, brush support shaft 81, and load transmission member 130 are supported by the elastic force of the helical spring of the self-weight offset mechanism 490 when the second force transmission point P2 is separated from the contact member 311 by a distance d1. In this embodiment, the distance d1 is, for example, about 5 cm.

[0214] When the brush press pressure adjustment process begins, based on the set press pressure, the brush press pressure is adjusted under pre-defined operating conditions. Figure 4 The cylinder assembly 110 is driven. As a result, the first force transmission point P1 of the load transmission member 130 is pressed downwards, as... Figure 8 As shown in the central part, the brush device 80, brush support shaft 81, and load transmission member 130, which are interconnected, descend. Furthermore, the descent of the brush device 80, brush support shaft 81, and load transmission member 130 stops when they contact the contact member 311 via the second force transmission point P2 of the load transmission member 130. At this time, the brush device 80 is located at a distance d1 downwards from its height position when it is in the stopped state.

[0215] In this state, the pressing force acting from the second end 122b of the beam member 122 on the first force transmission point P1 of the load transmission member 130 is transmitted as the actual pressing force (load) to the brush device 80. Figure 4 The load sensor 310 is used for detection.

[0216] Figure 1The control unit 900 changes the operating conditions of the cylinder device 110 so that the detection result of the load sensor 310 is consistent with or approximately consistent with the set pressing force. That is, the control unit 900 performs... Figure 4 Feedback control of the cylinder drive unit 113. Subsequently, the brush pressure adjustment process ends when the detection result of the load sensor 310 is consistent with or approximately consistent with the set pressing pressure.

[0217] Subsequently, during the cleaning process of substrate W, with cylinder device 110 operating according to the adjusted operating conditions, brush arm 41 moves, and brush device 80 is pushed against the upper surface of substrate W. At this time, the set pressing pressure acting on the second force transmission point P2 of load transmission member 130 is applied to substrate W from the third force transmission point P3 of load transmission member 130 via brush support shaft 81 and brush device 80. Thus, brush device 80 is pressed against substrate W with the set pressing pressure. As a result, load transmission member 130 rises, deviates from contact member 311, and the pressing pressure acting on contact member 311 disappears. In addition, depending on the positional relationship between brush arm 41 and substrate W, such as Figure 8 As shown in the right part, the second force transmission point P2 of the load transmission member 130 is separated from the contact member 311.

[0218] 5. Torque acting on the linear guide 200

[0219] As described above, in the brush arm 41, a linear guide 200 is used to restrict the movement direction of the load-transmitting member 130 pressed by the beam member 122 in the Z direction. The linear guide 200 has a structure in which a slider 220 is mounted on the track 210.

[0220] Assume a downward pressing force is applied to the first force transmission point P1 of the load transmission member 130. In this case, a torque may be generated in the linear guide 200. Depending on the direction of the torque generated in the linear guide 200, the connection state between the track 210 and the slider 220 may change. Specifically, the positional relationship between the track 210 and the slider 220 may shift.

[0221] The change in the connection state between the track 210 and the slider 220 causes the pressing force applied from the beam member 122 to the load transfer member 130 to be dispersed in a direction other than the Z direction. If the pressing force applied to the load transfer member 130 is dispersed in a direction other than the Z direction, the pressing force acting on the load transfer member 130 cannot be accurately detected during the brush pressing force adjustment process.

[0222] Figure 9 This is a diagram used to define the torques that may be generated in the linear guide 200. Figure 9In the uppermost section, a perspective view of the support member 140 and the linear guide 200 is shown. Additionally, a schematic plan view of a portion of the brush arm 41 is shown in the second section from the top, a schematic side view of a portion of the brush arm 41 is shown in the third section from the top, and a schematic end view of the brush arm 41 is shown in the lowermost section. In the second, third, and fourth sections, the linear guide 200 is marked with dotted patterns for easy identification.

[0223] like Figure 9 As shown by the bold dashed arrows in the topmost and second-to-last paragraphs, a torque about the Z-axis may be generated in the linear guide 200. This torque is referred to as the first torque M1. Figure 9 As indicated by the thick solid arrows in the topmost segment and the third segment from the top, a torque about the axis in the X direction may be generated in the linear guide 200. This torque is referred to as the second torque M2. Figure 9 As indicated by the thick dashed arrows in the uppermost and lowermost sections, a torque about the Y-axis may be generated in the linear guide 200. This torque is referred to as the third torque M3.

[0224] The generation of the first torque M1 during the brush pressure adjustment process was investigated. During the brush pressure adjustment process, the brush device 80 does not contact the substrate W. Furthermore, no pressing force is applied to the load transfer member 130 in the X and Y directions. Therefore, the first torque M1 is not generated in the linear guide 200 during the brush pressure adjustment process.

[0225] Next, the generation of the second torque M2 during brush pressure adjustment is investigated. For example... Figure 4 As shown, the first force transmission point P1, the second force transmission point P2, and the linear guide 200 overlap with an imaginary straight line L11 extending along the X direction when viewed from above. Based on this positional relationship, even when the second force transmission point P2 of the load transmission member 130 contacts the contact member 311 of the load sensor 310 during brush pressure adjustment processing, no second torque M2 will be generated.

[0226] Next, the generation of the third torque M3 during brush pressure adjustment is investigated. For example... Figure 4 As shown, the first force transmission point P1 and the second force transmission point P2 are separated when viewed from above. Furthermore, a pressing force in the -Z direction is applied to the first force transmission point P1 of the load transmission member 130, and a force in the +Z direction is applied to the second force transmission point P2 of the load transmission member 130. Therefore, a third torque M3 is generated in the linear guide 200.

[0227] Thus, in the brush arm 41 of this embodiment, no first torque M1 and second torque M2 are generated during the brush pressure adjustment process. This prevents changes in the connection state between the track 210 and the slider 220 due to the generation of the first torque M1 and second torque M2 in the linear guide 200. Therefore, during the brush pressure adjustment process, the deviation between the pressing force applied to the load transmission member 130 by the cylinder device 110 and the pressing force detected by the load sensor 310 can be suppressed.

[0228] As a result, the reliability of the detection results of the load sensor 310 in the brush pressure adjustment process is improved, and the cleaning accuracy of the substrate W using the brush device 80 is improved.

[0229] In addition, such as Figure 4 As shown, in a top-down view, the distance between the first force transmission point P1 and the second force transmission point P2 is smaller than the distance between the first force transmission point P1 and the third force transmission point P3. Furthermore, in a top-down view, the distance between the first force transmission point P1 and the second force transmission point P2 is less than one-third of the length of the load transmission member 130 in the X direction. That is, in a top-down view, the distance between the first force transmission point P1 and the second force transmission point P2 is relatively small. Therefore, the increase of the third torque M3 generated in the linear guide 200 can be suppressed.

[0230] 6. Structure and installation direction of linear guide 200

[0231] Figure 10 It is built into Figure 1 Plan view of the linear guide 200 of the brush arm 41. Figure 11 Observed in the +Y direction Figure 10 A schematic side view of the linear guide 200. Figure 12 yes Figure 11 A cross-sectional view of the QQ line. (See diagram below.) Figures 10-12 As shown, the linear guide 200 of this embodiment includes not only the track 210 and slider 220, but also a plurality of ball bearings BA. Details of each component will be explained below.

[0232] like Figure 10 As shown, the track 210 is arranged in a straight line along the Z direction and has a first side 211 and a second side 212 facing opposite directions. Specifically, the first side 211 faces the -Y direction and the second side 212 faces the +Y direction. Guide grooves gr1 and gr2 extending along the Z direction are formed on the first side 211 and the second side 212, respectively.

[0233] The slider 220 includes a track overlap portion 230, a first mounting portion 240, a second mounting portion 250, and a pair of end caps 260 and 270. The track overlap portion 230, the first mounting portion 240, and the second mounting portion 250 are composed of a single integrally formed component.

[0234] In the following description, the single component including the track overlap portion 230, the first mounting portion 240, and the second mounting portion 250 is appropriately referred to as the slider body. End caps 260 and 270 are respectively mounted at one end and the other end of the slider body in the Z direction.

[0235] like Figure 12 As shown, the slider body has an inverted U-shaped cross-section orthogonal to the Z-direction to allow it to clamp a portion of the track 210. A first mounting portion 240 corresponds to a first side portion 211 of the track 210, and a second mounting portion 250 corresponds to a second side portion 212 of the track 210. Thus, when the slider 220 is mounted on the track 210, a portion of the first mounting portion 240 faces the first side portion 211. Additionally, a portion of the second mounting portion 250 faces the second side portion 212. The track overlap portion 230 overlaps with the track 210 in the X-direction.

[0236] A guide groove gr3 extending in the Z-direction is formed in the portion of the first mounting portion 240 facing the first side portion 211 of the track 210. This creates a space extending in the Z-direction between the guide groove gr1 of the first side portion 211 and the guide groove gr3 of the first mounting portion 240. Furthermore, a through hole bp1 extending through the first mounting portion 240 in the Z-direction is formed near the guide groove gr3 in the first mounting portion 240.

[0237] A guide groove gr4 extending in the Z-direction is formed in the portion of the second mounting portion 250 facing the second side portion 212 of the track 210. This creates a space extending in the Z-direction between the guide groove gr2 in the second side portion 212 and the guide groove gr4 in the second mounting portion 250. Furthermore, a through hole bp2 extending through the second mounting portion 250 in the Z-direction is formed near the guide groove gr4 in the second mounting portion 250.

[0238] like Figure 10As shown, a guide path is formed on end cap 260 to connect the internal space of the through hole bp1 formed in the first mounting portion 240 with the space formed by guide grooves gr1 and gr3. Additionally, a guide path is formed on end cap 260 to connect the internal space of the through hole bp2 formed in the second mounting portion 250 with the space formed by guide grooves gr2 and gr4. Similarly, on end cap 270, a guide path is also formed to connect the internal space of the through hole bp1 with the space formed by guide grooves gr1 and gr3. Furthermore, a guide path is formed on end cap 270 to connect the internal space of the through hole bp2 with the space formed by guide grooves gr2 and gr4.

[0239] A circulation path is formed through the guide groove gr1 of the track 210, the guide groove gr3 of the first mounting part 240, the through hole bp1 of the first mounting part 240, and the guide paths of the end caps 260 and 270, allowing multiple ball bearings BA to circulate. Additionally, other circulation paths are formed through the guide groove gr2 of the track 210, the guide groove gr4 of the second mounting part 250, the through hole bp2 of the second mounting part 250, and the guide paths of the end caps 260 and 270, allowing multiple ball bearings BA to circulate. Each circulation path is filled with multiple ball bearings BA.

[0240] In the linear guide 200 having the aforementioned structure, a plurality of balls BA roll and move within each circulation path, thereby allowing the slider 220 to move smoothly along the track 210.

[0241] Here, as Figure 12 As shown in the enlarged view within the prompt box, the ball bearing BA, located between the track 210 and the slider body, contacts the groove (gr2) of the track 210 at essentially two points. Furthermore, the ball bearing BA also contacts the groove (gr4) of the slider body at essentially two points. That is, as... Figure 12 As indicated by the four hollow arrows in the prompt box, the ball bearing BA is supported at four points relative to the track 210 and the slider body.

[0242] It is known that in a linear guide comprising multiple balls BA, the differential slip generated by each ball disposed between the track and the slider differs depending on whether it is in two-point contact with the track and the slider or in four-point contact. Specifically, it is known that the differential slip generated by the ball in two-point contact with the track and the slider is smaller than that generated by the ball in four-point contact with the track and the slider.

[0243] From this perspective, it can be considered that by applying a force in the Y direction between the track 210 and the slider body, and with some of the balls BA firmly clamped at four points, these balls BA will experience relatively large differential slippage. That is, it can be considered that the connection state between the track 210 and the slider 220 is prone to large changes.

[0244] On the other hand, suppose that a shear force is generated between the track 210 and the slider body, with a portion of the balls BA clamped in, due to a force applied in the X direction between the track 210 and the slider body. In this case, the portion of the balls BA is essentially supported at two points by the track 210 and the slider body, which are to move relative to each other in the X direction. Therefore, it can be considered that the differential slippage generated in each ball BA is smaller when a force is applied in the X direction between the track 210 and the slider body, compared to the case where a force is applied in the Y direction between the track 210 and the slider body. That is, it can be considered that the connection state between the track 210 and the slider 220 is less likely to change significantly.

[0245] Here, in the linear guide 200, in the generation Figure 9 Under the condition of the second torque M2, a force in the Y direction acts between the track 210 and the slider body. Additionally, in the linear guide 200, when generating... Figure 9 Under the conditions of the first torque M1 and the second torque M2, the force in the X direction acts between the track 210 and the slider body.

[0246] As described above, in the brush arm 41 of this embodiment, based on the positional relationship between the first force transmission point P1, the second force transmission point P2, and the linear guide 200, no first torque M1 and second torque M2 are generated during the brush pressure adjustment process. Therefore, no force in the Y direction is applied between the linear guide 200 and the slider body. Therefore, it can be considered that the connection state between the track 210 and the slider 220 is unlikely to change significantly during the brush pressure adjustment process. That is, it can be considered that the load applied to the load transmission member 130 can be detected with high precision during the brush pressure adjustment process.

[0247] To verify the accuracy of the aforementioned examination, the inventors conducted the pressure testing experiment described below. First, as an example of the brush arm 41, the inventors prepared... Figure 4 The brush arm 41. Furthermore, the inventors operated the cylinder device 110 intermittently multiple times under operating conditions corresponding to a set pressing force of 250 g. Then, the inventors recorded the pressing force (load) detected by the load sensor 310.

[0248] In addition, the inventors have prepared a number of comparative brush arms with different structures for the brush arm 41 of the embodiment. Figure 13This is a schematic plan view of the brush arm of the comparative example viewed in the -Z direction. Figure 14 Observed in the +X direction Figure 13 A schematic side view of the brush arm 41X.

[0249] In the comparative example brush arm 41X, the structure of the load transfer member 130 differs from that of the embodiment. For example... Figure 13 and Figure 14 As shown, in addition to the load-bearing portion 131 and the lifting support portion 132, the load-transferring member 130 in this example also has a supported piece 133. The supported piece 133 is formed to extend a certain distance along the +Y direction and bend from a portion of the lifting support portion 132, and to extend a certain distance along the +X direction. The contact member 311 of the load sensor 310 is arranged below the supported piece 133 in a manner that overlaps with the front end of the supported piece 133 when viewed from above.

[0250] With this structure, in the comparative example brush arm 41X, when the load transfer member 130 is pressed down, the supported piece 133 contacts and is supported by the contact member 311. Thus, the pressing force applied to the load transfer member 130 is detected by the load sensor 310. Therefore, in the brush arm 41X, the portion of the supported piece 133 in the load transfer member 130 facing the contact member 311 in the Z direction becomes the second force transmission point P2.

[0251] In this case, the second force transmission point P2 deviates from the imaginary straight line L11 when viewed from above (refer to...). Figure 13 Therefore, when the pressure applied to the load transfer member 130 is detected by the load sensor 310, a second torque M2 is generated about the imaginary straight line L11 (refer to...). Figure 9 ).

[0252] The inventors used the brush arm 41X of the comparative example to repeatedly and intermittently operate the cylinder device 110 under operating conditions corresponding to a set pressing force of 250 g. Furthermore, the inventors recorded the pressing force (load) detected by the load sensor 310.

[0253] Figure 15 This is a graph representing the results of a pressure test. In Figure 15 The upper section shows the pressure detection test results of the embodiment using graphs. The lower section shows the pressure detection test results of the comparative example using graphs. In each graph, the vertical axis represents the pressure (load) detected by the load sensor 310, and the horizontal axis represents time.

[0254] like Figure 15As shown in the previous paragraph, according to the pressure detection experiment results of the embodiment, approximately 250 g of pressure was detected each time the cylinder device 110 was running. Furthermore, almost no deviation was detected in the multiple pressure measurements taken over several times (23 times in this example).

[0255] On the other hand, according to the comparative example's pressing force detection experiment results, the detected pressing force value fluctuated significantly whenever the cylinder device 110 was running. Furthermore, even when the cylinder device 110 was running, sometimes no pressing force could be detected. As a result, among the multiple pressing forces detected over several trials (15 in this example), a range exceeding 10 g centered around 250 g was identified. Figure 15 The large deviation of the range of the hollow arrow in the lower section.

[0256] These results confirm that, according to Figure 4 The assessment that the brush arm 41 can accurately detect the load applied to the load transfer component 130 during brush pressure adjustment is correct.

[0257] 7. Control system of substrate cleaning apparatus 1

[0258] For the control system of substrate cleaning apparatus 1, and Figure 1 The structure of the control unit 900 will also be explained. Figure 16 It means Figure 1 A block diagram of the control system structure of the substrate cleaning apparatus 1. (See diagram below.) Figure 16 As shown, the control unit 900 includes: a central processing unit (CPU) 901, a random access memory (RAM) 902, a read-only memory (ROM) 903, and a storage device 904.

[0259] RAM 902 is used as the operating area of ​​CPU 901. ROM 903 stores the system program. Storage device 904 includes a storage medium such as a hard disk or semiconductor memory, storing a substrate cleaning program for cleaning substrate W and a load adjustment program for adjusting brush pressure. Furthermore, storage device 904 stores the set brush pressure and the operating conditions of the cylinder device 110 based on this setting.

[0260] Furthermore, the substrate cleaning program and load adjustment program are provided in a state stored on a recording medium such as a compact disc-only memory (CD-ROM) 909, and can also be installed in the ROM 903 or storage device 904. Alternatively, the substrate cleaning program and load adjustment program can be transmitted from an external server via a communication network to the substrate cleaning apparatus 1 and installed in the ROM 903 or storage device 904.

[0261] The CPU 901 executes the substrate cleaning procedure and the load adjustment procedure, thereby controlling the operation of each part of the substrate cleaning apparatus 1. Specifically, the control unit 900 controls the substrate holding drive unit 13. As a result, the control unit 900 holds the substrate W, which has been brought into the substrate cleaning apparatus 1, in the substrate holding device 10 by moving the states of the plurality of holding pins 12 from the open state to the holding state. Furthermore, in order to remove the substrate W from the substrate cleaning apparatus 1, the control unit 900 moves the states of the plurality of holding pins 12 from the holding state to the released state. Then, the control unit 900 controls the substrate rotation drive unit 14. As a result, during the cleaning process of the substrate W, the substrate W held by the substrate holding device 10 rotates.

[0262] In addition, the control unit 900 controls the cup lifting drive unit 22. Therefore, during the cleaning process of the substrate W, Figure 1 The cup body 21 moves between a position on the upper part of the cup and a position on the lower part of the cup. Additionally, the control unit 900 controls the fluid supply system 32. Therefore, during the cleaning process of the substrate W, from... Figure 1 The fluid nozzle 31 sprays cleaning fluid onto the substrate W.

[0263] In addition, the control unit 900 controls the arm horizontal drive unit 45 and the arm lifting drive unit 46. As a result, during the cleaning process of the substrate W, the brush arm 41 moves within the chamber CH.

[0264] In this embodiment, the arm horizontal drive unit 45 and the arm lifting drive unit 46 each include a motor with a built-in encoder as a power source. Therefore, the control unit 900 obtains the position of the brush arm 41 in the X and Z directions based on the output of the encoders of the arm horizontal drive unit 45 and the arm lifting drive unit 46. Thus, the control unit 900 knows the positional relationship between the brush arm 41 and the bottom plate surface CHB of the chamber CH, or the positional relationship between the brush arm 41 and the substrate W held by the substrate holding device 10.

[0265] In addition, the control unit 900 controls the motor drive unit 520. Thus, during the cleaning process of the substrate W, the control unit 900 causes the brush device 80 to rotate at a predetermined rotational speed by running the motor 510 built into the brush arm 41.

[0266] Furthermore, during the brush pressure adjustment process, the control unit 900 controls the cylinder drive unit 113 based on the preset brush pressure and the operating conditions of the cylinder device 110 stored in the storage device 904. Moreover, during the brush pressure adjustment process, the control unit 900 adjusts the operating conditions of the cylinder device 110 based on the detection results of the brush pressure from the load sensor 310. Thus, during the cleaning process of the substrate W, the brush device 80 is pushed onto various parts of the upper surface of the substrate W with a predetermined preset brush pressure.

[0267] like Figure 16 As shown, the substrate cleaning apparatus 1 also includes an operation unit 990. The operation unit 990 includes a keyboard and a pointing device, configured to be operated by a user. By operating the operation unit 990, the user can input various information such as the set pressing pressure and the corresponding operating conditions of the cylinder device 110. When various information is input, the control unit 900 stores the input information in the storage device 904.

[0268] 8. Brush pressure adjustment process

[0269] Figure 17 This is a flowchart for adjusting the brush pressure. For example... Figure 2 As shown in the example, the brush pressure adjustment process is performed after the substrate W is moved into the chamber CH of the substrate cleaning apparatus 1 and before the cleaning process of the substrate W begins.

[0270] Here, let's assume it's in Figure 16 The storage device 904 stores an allowable range corresponding to the set pressing force. The allowable range is a range of a specified width centered on the value of the set pressing force. For example, when the set pressing force is 250 g, the allowable range is set to a range of 10 g centered on 250 g (between 245 g and 255 g).

[0271] When the brushing pressure adjustment process begins, the control unit 900 controls the cylinder drive unit 113 to operate the cylinder device 110 according to the preset operating conditions (step S21).

[0272] Next, the control unit 900 detects the pressing force (load) applied to the load transfer member 130 based on the output signal of the load sensor 310 (step S22). Then, the control unit 900 determines whether the detection result is within the allowable range (step S23). If the detection result is within the allowable range, the control unit 900 terminates the process.

[0273] On the other hand, if the detection result is not within the allowable range, the control unit 900 adjusts the operating conditions so that the detection result is close to the set pressing pressure, and controls the cylinder drive unit 113, thereby adjusting the pressing pressure (step S24). Thereafter, the process proceeds to step S23.

[0274] 9. A substrate processing apparatus including a substrate cleaning apparatus 1

[0275] Figure 18 It means including Figure 1 A schematic plan view of an example of a substrate processing apparatus of substrate cleaning apparatus 1. (See attached diagram.) Figure 18 As shown, the substrate processing apparatus 800 in this example has a indexer block 801 and a processing block 802. The indexer block 801 and the processing block 802 are arranged adjacent to each other.

[0276] The indexer block 801 includes multiple (four in this example) carrier placement stages 810 and a conveying unit 820. The multiple carrier placement stages 810 are connected to the conveying unit 820 and arranged in a row at intervals. Each carrier placement stage 810 holds a carrier C that holds multiple substrates W.

[0277] The transfer section 820 is equipped with an indexing robot 831 and a control device 832. The indexing robot 831 includes multiple (e.g., four) arms configured to hold and transfer the substrate W. The control device 832 includes a CPU and memory or a microcomputer, which controls the various components within the substrate processing device 800.

[0278] like Figure 18 As shown, processing block 802 includes a cleaning unit 841, a cleaning unit 842, and a conveying unit 843. The cleaning units 841, 843, and 842 are adjacent to the conveying unit 820 and arranged in the aforementioned order. In each cleaning unit 841, 842, multiple (e.g., four) substrate cleaning devices 1 are stacked vertically. These substrate cleaning devices 1 are... Figure 1 The substrate cleaning apparatus 1. That is, in Figure 18 In the substrate processing apparatus 800, Figure 1 The substrate cleaning apparatus 1 is configured as a processing unit constituting the substrate processing apparatus 800.

[0279] A main robot 844 is provided in the conveying section 843. The main robot 844 includes multiple (e.g., four) hands configured to hold and convey the substrate W.

[0280] Between the indexer block 801 and the processing block 802, multiple substrate mounting sections PASS are stacked on top of each other for transferring substrate W between the indexer robot 831 and the main robot 844.

[0281] In the substrate processing apparatus 800, the indexing robot 831 removes an unprocessed substrate W from one of a plurality of carriers C placed on a plurality of carrier placement stages 810. The indexing robot 831 then places the unprocessed substrate W into one of a plurality of substrate placement sections PASS. Finally, the indexing robot 831 receives the processed substrate W placed in one of the plurality of substrate placement sections PASS and houses it in an empty carrier C.

[0282] The main robot 844 receives multiple unprocessed substrates W placed in multiple substrate placement sections PASS. Furthermore, the main robot 844 transfers the multiple unprocessed substrates W into multiple substrate cleaning devices 1 in cleaning sections 841 and 842. Then, the main robot 844 removes multiple processed substrates W from the multiple substrate cleaning devices 1. Finally, the main robot 844 places the processed substrates W into any one of the multiple substrate placement sections PASS.

[0283] The substrate cleaning apparatus 1 of cleaning unit 841 and cleaning unit 842 cleans the upper surface of the substrate W that has been brought in. In each substrate cleaning apparatus 1, the upper surface of the substrate W is cleaned with an appropriate set pressure. As a result, the occurrence of poor cleaning of the substrate W can be suppressed.

[0284] 10. Effects

[0285] (a) In the substrate cleaning apparatus 1, a pressing force is applied to the first force transmission point P1 of the load transmission member 130 by the cylinder device 110, and the load transmission member 130 moves in the -Z direction. At this time, the pressing force applied to the load transmission member 130 is transmitted to the brush device 80 via the load transmission member 130 and the brush support shaft 81. Therefore, during the cleaning process of the substrate W, the brush device 80 can be pushed onto the substrate W by the pressing force generated by the cylinder device 110.

[0286] The load sensor 310 contacts the contact member 311 through the second force transmission point P2 of the load transmission member 130 and applies a pressing force in the -Z direction to the contact member 311, detecting the pressing force. Therefore, based on the pressing force detection result obtained by the load sensor 310, the magnitude of the pressing force applied from the cylinder device 110 to the load transmission member 130 can be adjusted.

[0287] Here, the first force transmission point P1 of the load transfer member 130, the second force transmission point P2 of the load transfer member 130, and the linear guide 200 overlap with an imaginary straight line L11 extending along the X direction when viewed from above. Therefore, when a downward pressing force is applied to the first force transmission point P1 of the load transfer member 130 and the first force transmission point P1 of the load transfer member 130 is in contact with the contact member 311, the linear guide 200 does not generate a torque about the imaginary straight line L11.

[0288] In this case, large fluctuations in the connection state between the track 210 and the slider 220 of the linear guide 200 due to the torque generated in the linear guide 200 can be suppressed. Therefore, the pressing force applied from the cylinder device 110 to the load transmission member 130 at the first force transmission point P1 and the pressing force acting on the contact member 311 from the second force transmission point P2 of the load transmission member 130 can be suppressed. Consequently, the detection accuracy of the pressing force by the load sensor 310 is improved. Therefore, based on the detection results of the load sensor 310, the magnitude of the pressing force applied from the cylinder device 110 to the load transmission member 130 can be adjusted with good accuracy. As a result, the cleaning accuracy of the substrate W using the brush device 80 is improved.

[0289] (b) During the cleaning process of the substrate W, the reaction force acts from the substrate W through the brush device 80 and the brush support shaft 81 on the third force transmission point P3 of the load transmission member 130. Even in this case, the third force transmission point P3 overlaps with the imaginary straight line L11 when viewed from above. As a result, no torque is generated in the linear guide 200 about the imaginary straight line L11. Consequently, during the cleaning process of the substrate W, the force applied from the cylinder device 110 to the load transmission member 130 can be transmitted to the brush device 80 more accurately.

[0290] (c) The linear guide 200 has the following structure: the first mounting portion 240 and the second mounting portion 250 of the slider 220 are respectively mounted on the first side portion 211 and the second side portion 212 of the track 210 via a plurality of balls BA. Thus, in the linear guide 200 where the slider 220 moves relative to the track 210 by rolling the plurality of balls BA, pressure can be pre-applied to the plurality of rolling elements. This easily improves the movement accuracy of the slider 220 relative to the track 210.

[0291] Furthermore, the linear guide 200 is fixed to the support member 140 with the track 210 extending in the Z direction. In this state, the first side 211 and the second side 212 of the track 210 are arranged in the Y direction. In this case, if a force in the Y direction is applied between the track 210 and the slider body, there is a high probability that differential slippage will occur in a portion of the multiple balls BA.

[0292] However, in the brush arm 41, the linear guide 200 does not generate a torque about the imaginary straight line L11, that is, it does not generate a torque about the axis along the X direction. Therefore, it is not easy for a force in the Y direction to act between the track 210 and the slider body. As a result, the connection state between the track 210 and the slider 220 in the linear guide 200 is not easily changed.

[0293] 11. Other implementation methods

[0294] (a) In the substrate cleaning apparatus 1 of the above embodiment, the brush arm 41 may also have the following structure instead. Figures 4-7 The structure recorded in the text. Figure 19 This is a diagram illustrating one example of a brush arm 41 in another embodiment. Figure 19 The upper section shows a schematic plan view of the brush arm 41. The lower section shows a schematic side view of the brush arm 41. Figure 19 The plan and side views show only the components necessary to illustrate the features of this example among the multiple components within the brush arm 41.

[0295] like Figure 19 As shown, in the brush arm 41 of this example, a cylinder assembly 110 is provided inside and above the housing H via a bracket (not shown). In this state, the cylinder rod 112 of the cylinder assembly 110 extends downward from the lower end of the cylinder assembly 110.

[0296] A load transfer member 130 is disposed directly below the cylinder assembly 110. In this example, the load transfer member 130 is as follows: Figure 19 As shown in the lower section, it includes a load-bearing portion 131, a lifting support portion 132, and a load transfer portion 134. The load-bearing portion 131 has a plate-like shape and is arranged parallel to a horizontal plane (a plane parallel to the X and Y directions). Furthermore, the load-bearing portion 131 is connected to the front end (lower end) of the cylinder rod 112 of the cylinder assembly 110. The lifting support portion 132 extends downward from a portion of the load-bearing portion 131 by a predetermined distance. The lifting support portion 132 is connected to the housing H via a linear guide 200.

[0297] The load transfer portion 134 is formed by bending in the Y direction from the lower end of the lifting support portion 132. The load transfer portion 134 has a plate shape and faces the lower surface of the load bearing portion 131. The upper end of the brush support shaft 81 is connected to the load transfer portion 134. A weight-reducing mechanism (not shown) is provided inside the housing H to support the brush device 80, the brush support shaft 81, and the load transmission member 130.

[0298] A load sensor 310 is provided on the side of the load transfer member 130. The contact member 311 connected to the load sensor 310 is arranged such that the load-bearing part 131 and the load transfer part 134 in the Z direction are separated by a predetermined distance from the lower surface of the load-bearing part 131.

[0299] In the load transmission member 130, the portion of the load-bearing part 131 connected to the cylinder rod 112 is referred to as the first force transmission point P1. The portion of the load-bearing part 131 facing the contact member 311 connected to the load sensor 310 in the Z direction is referred to as the second force transmission point P2. The portion of the load transfer part 134 connected to the brush support shaft 81 is referred to as the third force transmission point P3.

[0300] The cylinder device 110 operates, and the force generated by the cylinder rod 112 is applied as a pressing force to the first force transmission point P1 of the load transmission member 130. In this case, the pressing force applied to the first force transmission point P1 is transmitted to the brush device 80 from the third force transmission point P3 via the brush support shaft 81 when the second force transmission point P2 of the load transmission member 130 is separated from the contact member 311. On the other hand, the pressing force applied to the first force transmission point P1 acts on the contact member 311 from the second force transmission point P2 when the second force transmission point P2 of the load transmission member 130 is in contact with the contact member 311. Thus, the pressing force applied to the load transmission member 130 is detected by the load sensor 310.

[0301] In this structure, specifically in this example, the first force transmission point P1, the second force transmission point P2, and the third force transmission point P3, which transmit the pressing pressure among multiple components, are located on an imaginary straight line L12 passing through the axis of the brush support shaft 81. Additionally, the linear guide 200 is also located on the imaginary straight line L12.

[0302] In this case, when pressing force is applied to the load transfer member 130 from the cylinder device 110, no torque is generated in the linear guide 200. Therefore, during the brush pressing pressure adjustment process, the pressing force applied to the load transfer member 130 by the cylinder device 110 does not deviate from the pressing force value detected by the load sensor 310. Furthermore, during the cleaning process of the substrate W, the pressing force applied to the load transfer member 130 by the cylinder device 110 does not deviate from the actual pressing force applied to the substrate W from the brush device 80.

[0303] In addition, such as Figure 19 As shown by the dashed line in the lower section, the linear guide 200 can also be positioned off-center from the imaginary straight line L12. Even in this case, almost no torque is generated in the linear guide 200. Therefore, the pressing pressure can be detected with high precision. In addition, the desired pressing pressure can be applied to the substrate W with high precision.

[0304] (b) In the brush arm 41 of the described embodiment, the force generated by the cylinder rod 112 of the cylinder device 110 is applied to the load transmission member 130 via the pressing mechanism 120, but the invention is not limited thereto. Figure 19 As illustrated in the example, the force generated by the cylinder rod 112 of the cylinder assembly 110 can also be directly applied to the load transmission member 130. In this case, the pressing mechanism 120 is not required, which enables miniaturization of the brush arm 41 and a reduction in the number of parts in the brush arm 41.

[0305] (c) In the brush arm 41 of the described embodiment, the linear guide 200 uses a bearing (so-called a rolling bearing) comprising a plurality of balls BA. Additionally, the linear guide 200 has a two-column structure with two guide grooves gr1, gr2 on the track 210. However, the invention is not limited thereto. The linear guide 200 may also use a four-column structure with four guide grooves on the track 210.

[0306] (d) In the brush arm 41 of the described embodiment, the linear guide 200 uses a rolling bearing, but the present invention is not limited thereto. The linear guide 200 may also use other bearings such as sliding bearings instead of rolling bearings.

[0307] (e) The load transfer member 130 in the described embodiment is composed of a single member, but the present invention is not limited thereto. The load transfer member 130 may also have a structure in which multiple members are interconnected. Furthermore, in the brush arm 41 of the described embodiment, the force generated in the cylinder device 110 acts by pressing the first force transfer point P1 of the load transfer member 130 downwards via the pressing mechanism 120, but the present invention is not limited thereto. The brush arm 41 may also be configured such that the force generated in the cylinder device 110 presses the first force transfer point P1 of the load transfer member 130 upwards.

[0308] Figure 20 This is a diagram illustrating an example of a brush arm 41 according to yet another embodiment. Figure 20 The upper section shows a schematic plan view of the brush arm 41. The lower section shows a schematic side view of the brush arm 41. Figure 20 The plan and side views show only the components necessary to illustrate the features of this example among the multiple components within the brush arm 41.

[0309] exist Figure 20 In the brush arm 41, similar to the example of the brush arm 41 in the above embodiment, a cylinder device 110 is provided via a cylinder base 119 at a position offset from the central portion of the base member 101 in the +Y direction.

[0310] A support member 140 is provided on the base member 101 at a position offset from the cylinder device 110 in the -Y direction. The support member 140 extends a certain length upward from the upper surface of the base member 101 in the +Z direction.

[0311] A buoyancy application member 630 is mounted on the support member 140 via a linear guide 200. Specifically, the linear guide 200 includes a track 210 and a slider 220. The track 210 is mounted on the support member 140, and the slider 220 is mounted on the buoyancy application member 630. Thus, the buoyancy application member 630 is supported on the support member 140 in a manner that allows it to move vertically. Furthermore, in this example, the track 210 is fixed to the support member 140 in a manner that extends along the Z direction. In this state, the first side 211 of the track 210 ( Figure 10 ) and the second side 212 ( Figure 10 Arranged along the X direction.

[0312] The buoyancy application member 630 is a single component comprising a sensor support 631, a vertical portion 632, and a horizontal portion 633. The vertical portion 632 is the part for mounting the slider 220 of the linear guide 200, and extends vertically when the buoyancy application member 630 is mounted on the support member 140. The sensor support 631 is formed such that it protrudes a certain length in the -Y direction from near the upper end of the vertical portion 632. The horizontal portion 633 is formed such that it extends a certain length in the +Y direction from the upper end of the vertical portion 632. The front end of the horizontal portion 633 (the end of the horizontal portion 633 facing the +Y direction) is located further in the +Y direction than the cylinder assembly 110.

[0313] A load sensor 310 is disposed below the front end of the horizontal section 633. The load sensor 310 is fixed to the base member 101 via a sensor mount 320. In this example, the load sensor 310 is a Robertwell type load sensor. The load sensor 310 contacts the load detection portion of the load sensor 310 through the front end of the horizontal section 633, and detects the load received from the horizontal section 633 (the load (the force generated by the cylinder device 110 is eliminated from the weight of the load transfer member 600, described later)).

[0314] A load sensor 620 is mounted on the front end of the sensor support 631 (the end of the sensor support 631 facing the -Y direction). In this example, the load sensor 620 is a Robertwell type load sensor. Furthermore, a brush support member 610 is mounted on the load detection portion of the load sensor 620. Thus, the load sensor 620 detects the load received from the brush support member 610.

[0315] As described above, the brush support member 610 is connected to the buoyancy application member 630 via the load sensor 620. In this state, the brush support member 610 is located at the brush support portion 42 of the brush arm 41.

[0316] The brush support member 610 is a single component comprising a main body 611, a support portion 612, and a connecting portion 613. The connecting portion 613 is mounted on the load detection section of the load sensor 620 and extends a certain length from the load sensor 620 along the -Y direction. The support portion 612 extends downward from the front end of the connecting portion 613. The main body 611 is connected to the lower end of the support portion 612. In this state, the main body 611 is separated from the upper surface of the base member 101.

[0317] In this example, the main body 611 has a block shape with a certain length in the X, Y, and Z directions. A bearing 614 and a motor 615 are housed inside the main body 611. A portion of the brush support shaft 81, which supports the brush device 80, passes through a through hole 103 formed in the base member 101 from below the housing H and is inserted into the bearing 614. Thus, the brush device 80 is rotatably supported on the brush support member 610 by the brush support shaft 81 and the bearing 614.

[0318] Part of the brush support shaft 81 (in) Figure 20 In the example, the upper end of the brush device 80 is connected to the rotating shaft of the motor 615, which is held in the main body 611 of the brush support member 610, via two pulleys and a belt. The motor 615 is operated by a control unit (not shown). When the motor 615 is running, the rotational force generated in the motor 615 is transmitted from the rotating shaft of the motor 615 to the brush support shaft 81 via the two pulleys and a belt, causing the brush device 80 to rotate.

[0319] Here, in Figure 20 In the brush arm 41, such as Figure 20 As shown in the thick dashed box in the lower section, the brush support member 610, load sensor 620, and buoyancy application member 630 can be processed as a single unit. Therefore, in Figure 20 In the brush arm 41, the structure including the brush support member 610, the load sensor 620 and the buoyancy application member 630 can be regarded as the load transfer member 600 corresponding to the load transfer member 130 of the above embodiment.

[0320] According to the structure described, the load transmitted from the load transfer member 600 to the brush device 80 is adjusted by pressing a portion of the load transfer member 600 upwards by the cylinder device 110. For example, when the cylinder device 110 presses the load transfer member 600 with a force equivalent to the weight of the load transfer member 600, the pressing force of the brush device 80 on the substrate W can be approximately zero. On the other hand, when the cylinder device 110 does not press the load transfer member 600, the pressing force of the brush device 80 on the substrate W is approximately equal to the weight of the load transfer member 600. To adjust this pressing force of the brush device 80, the load detection results obtained by the load sensor 310 and the load sensor 620 are used.

[0321] exist Figure 20 In the brush arm 41, the portion contacted by the cylinder rod 112 of the cylinder device 110 in the buoyancy application member 630 corresponds to the first force transmission point P1 in the embodiment. Furthermore, the portion contacted by the load sensor 310 in the buoyancy application member 630 corresponds to the second force transmission point P2 in the embodiment. Moreover, the portion of the brush support member 610 connected to the brush support shaft 81 via the bearing 614 corresponds to the third force transmission point P3 in the embodiment.

[0322] Therefore, in Figure 20 In the example, if a force is applied in the Z direction to any one of the first force transmission point P1, the second force transmission point P2, and the third force transmission point P3, a rotational torque may be generated in the linear guide 200 due to the force applied to any point.

[0323] Regarding this aspect, such as Figure 20 As shown in the upper section, in the brush arm 41 of this example, the first force transmission point P1, the second force transmission point P2 and the linear guide 200 are arranged to overlap with the imaginary straight line L13 extending along the Y direction when viewed from above.

[0324] Based on the aforementioned positional relationship, in either the case where the first force transmission point P1 of the load transmission member 130 is in contact with the cylinder rod 112 of the cylinder device 110, or in the case where the second force transmission point P2 of the load transmission member 130 is in contact with the contact member 311 of the load sensor 310, the linear guide 200 does not generate a rotational torque about an axis parallel to the imaginary straight line L13. Therefore, based on the detection results of the load sensor 310, the magnitude of the pressing force applied from the cylinder device 110 to the load transmission member 600 can be adjusted with good accuracy.

[0325] Furthermore, in this example, the third force transmission point P3 also overlaps with the imaginary straight line L13 extending along the Y direction when viewed from above. Based on this positional relationship, during the cleaning process of the substrate W, the linear guide 200 does not generate a rotational torque about an axis parallel to the imaginary straight line L13. As a result, during the cleaning process of the substrate W, the force applied from the cylinder device 110 to the load transmission member 130 can be transmitted to the brush device 80 more accurately.

[0326] (f) In the brush arm 41 of the described embodiment, the brush support shaft 81 is connected to the load transmission member 130 via the upper bearing portion 420, but the present invention is not limited thereto. The brush support shaft 81 and the load transmission member 130 may also be configured to be separable from each other. That is, the load transmission member 130 may only contact the upper end of the brush support shaft 81 when receiving a load from the cylinder device 110, and transmit pressing pressure to the brush support shaft 81.

[0327] (g) The brush device 80 of the described embodiment is supported on the brush support shaft 81 in a rotatable manner, but the present invention is not limited thereto. The brush device 80 may also be supported on the brush support shaft 81 in a non-rotatable manner. In this case, it is not necessary to install a motor 510 or the like inside the brush arm 41. Therefore, it is possible to miniaturize the brush arm 41 and reduce the number of parts in the brush arm 41.

[0328] (h) In the substrate cleaning apparatus 1 of the described embodiment, the substrate holding device 10 has a so-called mechanical chuck structure in which a plurality of holding pins 12 abut against the outer peripheral end of the substrate W to hold the substrate W, but the present invention is not limited thereto. The substrate holding device 10 may also have an adsorption structure in which the substrate W is adsorbed and held in the center of the lower surface.

[0329] 12. The correspondence between the constituent parts of the claims and the parts of the embodiments.

[0330] Hereinafter, examples of the correspondence between the constituent parts of the claims and the constituent parts of the embodiments will be described, but the present invention is not limited to the examples described below. Various other components having the structure or function described in the claims may also be used as constituent parts of the claims.

[0331] In the described embodiment, the brush device 80 is an example of a cleaning tool, the first force transmission point P1 of the load transmission member 130 is an example of a first part of a force transmission body, the second force transmission point P2 of the load transmission member 130 is an example of a second part of a force transmission body, the load transmission member 130 is an example of a force transmission body, the -Z direction is an example of a first direction, and the +Z direction is an example of a second direction.

[0332] In addition, the linear guide 200 is an example of a linear guide, the cylinder device 110 and the pressing mechanism 120 are examples of force application parts, the contact member 311 is an example of a contact part, the load sensor 310 is an example of a force detection part, the imaginary straight line L11 and the imaginary straight line L13 are examples of imaginary straight lines, and the substrate cleaning device 1 and the substrate processing device 800 are examples of substrate processing devices.

[0333] In addition, the lower end of the brush support shaft 81 is an example of the first end of the support shaft, the upper end of the brush support shaft 81 is an example of the second end of the support shaft, the brush support shaft 81 is an example of the support shaft, the third force transmission point P3 of the load transmission member 130 is an example of the third part of the force transmission body, the base member 101 is an example of the base member, the lower bearing part 410, the upper bearing part 420, the self-weight offsetting mechanism 490 and the pulley 521 are examples of the shaft support mechanism, and the helical spring of the self-weight offsetting mechanism 490 is an example of the self-weight offsetting member.

[0334] In addition, multiple balls BA are examples of multiple rolling elements, the first side 211 of track 210 is an example of the first side of track, the second side 212 of track 210 is an example of the second side of track, track 210 is an example of track, the first mounting part 240 of slider body is an example of the first mounting part of slider, and the second mounting part 250 of slider body is an example of the second mounting part of slider.

[0335] Furthermore, slider 220 is an example of a slider, and the two guide grooves gr1 and gr2 of track 210 are examples of guide grooves formed on the first and second sides of the track. Figures 4-7 The Y direction recorded in the text and Figure 20 The X direction described is an example of a third direction.

[0336] 13. Summary of Implementation Methods

[0337] (First item) The substrate processing apparatus of the first item includes:

[0338] Cleaning tools are used to clean the substrate;

[0339] A force transmission body, comprising a first part and a second part;

[0340] A linear guide supports the force transmission body so that it can move along a first direction and a second direction opposite to the first direction;

[0341] The force-applying part applies a force in the first direction or a force in the second direction to the first portion of the force-transmitting body; and

[0342] The force detection unit has a contact portion capable of contacting the second part, and detects the force exerted by the second part on the contact portion along the first direction.

[0343] The force transmitter is capable of transmitting the force applied from the force application part to the first part to the cleaning tool.

[0344] When viewed in the first direction, the first part, the second part, and the linear guide overlap with an imaginary straight line that intersects the first and second directions.

[0345] In the substrate processing apparatus, a force is applied to a first portion of a force transmitter by a force application unit, and the force transmitter moves along a first or second direction via a linear guide. Alternatively, the force transmitter remains stationary in the first or second direction. In this case, the force applied from the force application unit to the force transmitter is transmitted to a cleaning tool. Therefore, the substrate can be cleaned while the cleaning tool is pushed against the substrate with a force corresponding to the force generated from the force application unit.

[0346] The force detection unit detects the force acting on the contact portion in the first direction by having the second part of the force transmitter come into contact with the contact portion. Therefore, when the second part of the force transmitter comes into contact with the contact portion while a force is being applied to the force transmitter from the force application unit, the force detection unit detects the force corresponding to the force applied to the force transmitter from the force application unit. Based on the detection result of the force detection unit, the magnitude of the force applied to the force transmitter from the force application unit can be adjusted.

[0347] Here, when viewed in the first direction, the first part, the second part, and the linear guide overlap with an imaginary straight line intersecting the first and second directions. Therefore, when a force is applied to the first part of the force transmitter from the force application unit and the second part of the force transmitter is in contact with the contact part, no torque is generated around the imaginary straight line in the linear guide. Thus, the force applied to the first part from the force application unit and the force acting on the contact part from the second part due to the torque generated around the imaginary straight line in the linear guide can be suppressed. As a result, the force detection accuracy performed by the force detection unit is improved. Based on the detection results of the force detection unit, the magnitude of the force applied from the force application unit to the force transmitter can be adjusted with good accuracy. Consequently, the cleaning accuracy of the substrate using the cleaning tool is improved.

[0348] (Second item) The substrate processing apparatus according to the first item, wherein, may be,

[0349] The substrate processing apparatus also includes a support shaft.

[0350] The support shaft has a first end and a second end, and extends along the first direction and the second direction, supporting the cleaning tool at the first end.

[0351] The force transmission body also has a third portion connected to the second end of the support shaft.

[0352] The third part overlaps with the imaginary straight line when viewed in the first direction.

[0353] According to the structure, the third part of the force transmitter is connected to the cleaning tool via a support shaft. When the force application part applies a force to the first part of the force transmitter, the force applied to the first part acts on the cleaning tool from the third part via the support shaft. Therefore, the substrate can be cleaned while the cleaning tool is pushed against the substrate with a force corresponding to the force generated by the force application part.

[0354] During the cleaning of the substrate, a reaction force is applied from the substrate to the third part via the cleaning tool and the support shaft. Even in this case, the third part overlaps with an imaginary straight line when viewed in the first direction. As a result, no torque is generated around the imaginary straight line in the linear guide. Consequently, during the cleaning of the substrate, the force applied from the force application part to the force transmission body can be accurately transmitted to the cleaning tool.

[0355] (Third item) The substrate processing apparatus according to the second item, wherein, may be,

[0356] The substrate processing apparatus further includes:

[0357] The base component supports the linear guide; and

[0358] A shaft support mechanism supports the support shaft in a manner that allows it to move along the first direction and the second direction in the base member.

[0359] The force-applying part applies a force in the first direction to the first part of the force-transmitting body.

[0360] The first direction is from top to bottom.

[0361] The second direction is from bottom to top.

[0362] The shaft support mechanism includes a weight-counteracting member that applies an upward force to the support shaft.

[0363] In this situation, when the force-applying part does not apply force to the first part of the force-transmitting body, the force from the force-applying part will not be transmitted to the support shaft and the cleaning device. Therefore, the support shaft and the cleaning device are supported at a specific height on the base member by their own weight.

[0364] On the other hand, when the force application unit applies force to the first part of the force transmission body, the force from the force application unit is transmitted to the support shaft and the cleaning tool. As a result, the support shaft and the cleaning tool move in the vertical direction. At this time, the substrate is cleaned by contacting the cleaning tool with the substrate. When the cleaning tool is not in contact with the substrate, the force acting on the contact part is detected by contacting the second part of the force transmission body with the contact part of the force detection unit.

[0365] (Fourth item) The substrate processing apparatus according to any one of items one to three, wherein, may be,

[0366] The first part, the second part, and at least two of the linear guides overlap when viewed in the first direction.

[0367] In this case, the torque generated in the linear guide can be reduced within an imaginary plane containing an imaginary straight line extending along the first and second directions. Furthermore, the force applied from the force application portion to the first portion and the force acting on the contact portion from the second portion can be further suppressed from diverging.

[0368] (Fifth) The substrate processing apparatus according to any one of the first to fourth items, wherein, may be,

[0369] The linear guide includes:

[0370] Multiple rotating bodies;

[0371] The track has a first side and a second side facing opposite directions and extends in a straight line; and

[0372] The slider has a first mounting portion and a second mounting portion corresponding to the first side portion and the second side portion, respectively.

[0373] The first and second sides of the track each have guide grooves, which are configured to allow each of the plurality of rotating bodies to move along the direction in which the track extends.

[0374] The slider is configured such that it is mounted on a first side of the track via a first mounting portion through a portion of the plurality of rotating bodies, and on a second side of the track via a second mounting portion through another portion of the plurality of rotating bodies, enabling it to move along the track.

[0375] The force transmission element is mounted on the slider.

[0376] The track is fixed in a state where it extends along the first direction and the second direction and the first side and the second side are arranged in a third direction that intersects the first direction, the second direction and the imaginary straight line.

[0377] According to the structure described, no torque is applied between the first side, the multiple rolling elements, and the slider in other imaginary planes intersecting the imaginary straight line. Furthermore, no torque is applied between the second side, the multiple rolling elements, and the slider in other imaginary planes. Therefore, the connection state between the track and the slider in the linear guide is less prone to change.

[0378] Furthermore, according to the linear guide, the movement accuracy of the slider relative to the track can be easily improved by pre-applying pressure to multiple rolling elements.

Claims

1. A substrate processing apparatus, comprising: Cleaning tools are used to clean the substrate; A force transmission body, comprising a first part and a second part; A linear guide supports the force transmission body so that it can move along a first direction and a second direction opposite to the first direction; The force-applying part applies a force in the first direction or a force in the second direction to the first part of the force-transmitting body; as well as The force detection unit has a contact portion capable of contacting the second part, and detects the force exerted by the second part on the contact portion along the first direction. The force transmitter is capable of transmitting the force applied from the force application part to the first part to the cleaning tool. When viewed in the first direction, the first part, the second part, and the linear guide overlap with an imaginary straight line that intersects the first and second directions.

2. The substrate processing apparatus according to claim 1 further includes a support shaft having a first end and a second end, and extending along the first direction and the second direction, wherein the cleaning tool is supported at the first end. The force transmission body also has a third portion connected to the second end of the support shaft. The third part overlaps with the imaginary straight line when viewed in the first direction.

3. The substrate processing apparatus according to claim 2, further comprising: The base component supports the linear guide; as well as A shaft support mechanism supports the support shaft in a manner that allows it to move along the first direction and the second direction in the base member. The force-applying part applies a force in the first direction to the first part of the force-transmitting body. The first direction is from top to bottom. The second direction is from bottom to top. The shaft support mechanism includes a weight-counteracting member that applies an upward force to the support shaft.

4. The substrate processing apparatus according to any one of claims 1 to 3, wherein, The first part, the second part, and at least two of the linear guides overlap when viewed in the first direction.

5. The substrate processing apparatus according to any one of claims 1 to 4, wherein, The linear guide includes: Multiple rotating bodies; The track has a first side and a second side facing opposite directions and extends in a straight line; and The slider has a first mounting portion and a second mounting portion corresponding to the first side portion and the second side portion, respectively. The first and second sides of the track each have guide grooves, which are configured to allow each of the plurality of rotating bodies to move along the direction in which the track extends. The slider is configured such that it is mounted on a first side of the track via a first mounting portion through a portion of the plurality of rotating bodies, and on a second side of the track via a second mounting portion through another portion of the plurality of rotating bodies, enabling it to move along the track. The force transmission element is mounted on the slider. The track is fixed in a state where it extends along the first direction and the second direction and the first side and the second side are arranged in a third direction that intersects the first direction, the second direction and the imaginary straight line.

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