A large-size gallium nitride self-supporting substrate preparation device

Abstract

This invention discloses a large-size gallium nitride self-supporting substrate fabrication apparatus, comprising: a frame, a fixed frame fixedly mounted inside the frame, a fixed sleeve vertically mounted on the fixed frame, and a lifting sleeve movably mounted outside the fixed sleeve; a rotating column, a rotating column rotatably mounted coaxially inside the fixed sleeve, and a first transmission gear coaxially mounted at the upper end of the rotating column; a grinding table, a grinding table fixedly mounted coaxially on the body of the rotating column; a lifting housing, a lifting housing rotatably mounted coaxially on the outer side of the lifting sleeve; a lifting platform, a lifting platform fixedly mounted coaxially on the lifting housing, and a rotating ring gear coaxially mounted above the lifting platform; and planetary limiting plates, a plurality of planetary limiting plates capable of meshing with the first transmission gear and the rotating ring gear being arranged around the grinding platform.

Description

Technical Field

[0001] This invention relates to the field of third-generation semiconductor substrate processing equipment technology, specifically to a large-size gallium nitride self-supporting substrate fabrication equipment. Background Technology

[0002] Gallium nitride (GaN), a typical third-generation semiconductor material, possesses excellent properties such as a large bandgap, high electron saturation drift velocity, high temperature resistance, and radiation resistance, making it widely used in radio frequency devices, optoelectronic devices, and power semiconductors. The surface processing quality of large-size GaN self-supporting substrates directly determines the performance and yield of subsequent epitaxial growth and device fabrication.

[0003] Existing gallium nitride substrate polishing equipment mostly adopts a conventional planetary polishing structure. The reserved holes on the planetary limiting plates are mostly designed with rigid fit. To ensure that the substrate does not shift during polishing, the hole size is closely fitted to the substrate size. However, this design has obvious defects: after polishing, the substrate and the inner wall of the hole are easily too tightly attached due to residual polishing debris and surface adhesion, making it difficult to remove the substrate from the planetary limiting plate; forcibly removing the substrate can easily scratch the substrate surface, cause substrate chipping, or even damage the hole structure of the planetary limiting plate, seriously affecting the processing yield and equipment lifespan.

[0004] Therefore, providing a large-size gallium nitride self-supporting substrate fabrication device that can effectively solve the problem of substrate removal is an urgent problem to be solved by this invention. Summary of the Invention

[0005] To address the aforementioned technical problems, the purpose of this invention is to overcome the limitations of existing gallium nitride substrate polishing equipment, which mostly employs a conventional planetary polishing structure. The pre-reserved holes in these planetary limiting plates are typically designed with a rigid fit, ensuring a tight fit between the hole size and the substrate size to prevent substrate displacement during polishing. However, this design has significant drawbacks: after polishing, the substrate and the inner wall of the hole tend to adhere too tightly due to residual polishing debris and surface adhesion, making it difficult to remove the substrate from the planetary limiting plate. Forcibly removing the substrate can easily scratch the substrate surface, cause edge chipping, and even damage the hole structure of the planetary limiting plate, severely impacting processing yield and equipment lifespan. Therefore, this invention provides a large-size gallium nitride self-supporting substrate fabrication device that effectively solves the problem of difficult substrate removal.

[0006] To achieve the above objectives, the present invention provides a large-size gallium nitride self-supporting substrate fabrication apparatus, comprising: a frame, wherein a fixed frame is fixedly mounted inside the frame, a fixed sleeve is vertically mounted on the fixed frame, and a lifting sleeve is movably mounted outside the fixed sleeve; a rotating column, wherein a rotating column is rotatably mounted coaxially inside the fixed sleeve, and a first transmission gear is coaxially mounted on the upper end of the rotating column; a grinding table, wherein a grinding table is fixedly mounted coaxially on the body of the rotating column; a lifting housing, wherein a lifting housing is rotatably mounted coaxially on the outer side of the lifting sleeve; a lifting platform, wherein a lifting platform is fixedly mounted coaxially on the lifting housing, and a rotating ring gear is coaxially mounted on the upper part of the lifting platform; and planetary limiting plates, wherein a plurality of planetary limiting plates capable of meshing with the first transmission gear and the rotating ring gear are arranged around the grinding platform.

[0007] Preferably, the grinding table has a first hole coaxially arranged inside, which has a gap with the first transmission gear, and a first guide plate coaxially arranged below it. There is a gap between the outer edge of the grinding table and the rotating ring gear. A second guide plate is coaxially arranged below the lifting table. A collection plate is coaxially arranged below the first and second guide plates on the frame. A vacuum cleaner is connected to the lower end of the collection plate.

[0008] Preferably, a sweeping plate is also provided on one side of the lifting platform, which is attached to the inner wall of the material collection tray.

[0009] Preferably, the device further includes a lifting mechanism for raising and lowering the lifting housing; wherein the lifting mechanism includes: a lifting turntable and a first drive assembly, the bottom of the fixed sleeve is rotatably provided with the lifting turntable coaxially via the first drive assembly, and the lifting turntable is provided with a plurality of guide ramps around its periphery; and lifting wheels, the lifting sleeve is provided with lifting wheels corresponding to each guide ramp, the lifting wheels are provided with guide posts on their inner sides, and the fixed sleeve is provided with a plurality of guide grooves corresponding to each guide post around its periphery.

[0010] Preferably, the first driving component includes: a first linear driver, wherein the first linear driver is fixedly mounted on one side of the lifting turntable, a driving rod is provided at the output end of the first linear driver, a first strip groove is provided through the driving rod, and a locking post is provided in the middle of the first strip groove; and a fixed connecting rod, wherein a fixed connecting rod is fixedly mounted on one side of the lifting turntable, and a second strip groove adapted to the locking post is provided through the rod body of the fixed connecting rod.

[0011] Preferably, the device further includes a synchronous drive mechanism for driving the rotating ring gear and the first transmission gear to rotate synchronously at different speeds; wherein the synchronous drive mechanism includes: a first rotary drive motor and a first synchronous pulley, the first rotary drive motor being disposed at the bottom of the frame and having the first synchronous pulley coaxially disposed at its output end; a worm gear reducer and a second synchronous pulley, the second synchronous pulley being coaxially disposed at the input end of the worm gear reducer; a synchronous belt, the opposite ends of the synchronous belt being respectively sleeved on the first synchronous pulley and the second synchronous pulley; a second transmission gear and a third transmission gear, the output end of the worm gear reducer... A second transmission gear is coaxially arranged, and a third transmission gear is coaxially arranged on the second transmission gear; a fourth transmission gear is coaxially arranged at the bottom of the rotating column, meshing with the third transmission gear; a rotating roller is vertically rotatably arranged on one side of the second transmission gear, a fifth transmission gear is coaxially arranged at the lower end of the rotating roller, meshing with the second transmission gear, and a sixth transmission gear is coaxially arranged at the upper end; a seventh transmission gear is coaxially arranged on the periphery of the lifting housing, meshing with the sixth transmission gear, and the tooth width of the seventh transmission gear is narrower than that of the sixth transmission gear.

[0012] Preferably, the device further includes a pressure loading mechanism for applying pressure to the substrate: wherein the pressure loading mechanism includes: a first mounting frame, on which the frame is provided; lifting rods and a second drive assembly, wherein a plurality of lifting rods are provided on the first mounting frame in a way that can be raised and lowered by the second drive assembly; and a pressure equalization assembly, wherein a pressure equalization assembly is provided at the lower end of each lifting rod.

[0013] Preferably, the second drive assembly includes: a second rotary drive motor and a drive gear, wherein a second rotary drive motor is provided on the first mounting bracket corresponding to each lifting rod, and a drive gear is coaxially provided at the output end of each second rotary drive motor; and a rack, wherein a rack that meshes with the drive gear is provided on one side of each lifting rod along its length direction.

[0014] Preferably, the pressure equalization assembly includes: a second mounting frame, the lower end of which is rotatably connected; a pressure plate, which is disposed below the second mounting frame and has several guide rods vertically penetrating its periphery through the second mounting frame; an elastic element, which is sleeved on each guide rod, one end of which abuts or is fixed to the second mounting frame, and the other end of which abuts or is fixed to the pressure plate; and a pressure sensor, which is disposed at the connection between the lifting rod and the second mounting frame.

[0015] According to the above technical solution, the beneficial effects of this invention compared to the prior art are as follows: A large-size gallium nitride self-supporting substrate is embedded into the reserved hole of the planetary limiting plate, and then the planetary limiting plate is placed on the grinding table so that its inner side meshes with the first transmission gear at the upper end of the rotating column to complete the initial positioning. The lifting sleeve is driven to rise upward, and the lifting housing, the lifting table and the rotating ring tooth above it are moved upward simultaneously until the rotating ring tooth meshes with the outer side of the planetary limiting plate. At this time, the planetary limiting plate is limited by the bidirectional meshing of the inner first transmission gear and the outer rotating ring tooth, thus achieving fixation and providing a stable reference for grinding. The sleeve is then fixed. The rotating column inside rotates, causing the grinding table and the first transmission gear to rotate synchronously. At the same time, the lifting housing inside the lifting platform rotates, causing the rotating ring gear to rotate. Under the differential speed cooperation of the inner and outer gears, the planetary limiting plate simultaneously performs planetary motion of self-rotation and revolution around the center, so that the surface of the gallium nitride substrate forms a uniform and fully covered grinding trajectory with the grinding mechanism, completing the grinding process of the substrate surface. After the grinding is completed, the lifting sleeve is controlled to descend, causing the rotating ring gear to move down and disengage from the planetary limiting plate, releasing the limiting constraint on the planetary limiting plate, and the planetary limiting plate and the internally processed gallium nitride substrate can be directly removed.

[0016] Other features and advantages of the present invention will be described in detail in the following detailed description section; and all parts not covered in the present invention are the same as or can be implemented using the prior art. Attached Figure Description

[0017] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used together with the following detailed description to explain the invention, but do not constitute a limitation thereof. In the drawings: Figure 1 This is a perspective view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention; Figure 2 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 1 ; Figure 3 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 2 ; Figure 4 This is a partial cross-sectional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention; Figure 5 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 3 ; Figure 6This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 4 ; Figure 7 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 5 ; Figure 8 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 6 ; Figure 9 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 7 ; Figure 10 yes Figure 9 Enlarged view of point A in the middle; Figure 11 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 8 ; Figure 12 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 9 ; Figure 13 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 10 ; Figure 14 This is a partial three-dimensional view of a large-size gallium nitride self-supporting substrate fabrication apparatus provided in a preferred embodiment of the present invention. Figure 10 one.

[0018] Explanation of reference numerals in the attached drawings: 1. Frame; 11. Fixed frame; 12. Fixed sleeve; 121. Guide groove; 13. Lifting sleeve; 14. Collection tray; 15. Vacuum cleaner; 16. Cooling fan; 2. Rotating column; 21. First transmission gear; 3. Grinding table; 31. First hole; 32. First guide tray; 4. Lifting housing; 5. Lifting platform; 51. Rotating ring gear; 52. Second guide tray; 53. Sweeping plate; 6. Planetary limit plate; 61. Substrate; 62. Positioning hole; 7. Lifting mechanism; 71. Lifting turntable; 711. Guide ramp; 712. Fixed connecting rod; 7121. Second strip groove; 72. First drive assembly; 721. First linear actuator; 722. Drive rod; 7221. First strip groove; 723. Snap-fit ​​post; 73. Lifting wheel; 731. Guide post; 8. Synchronous drive mechanism; 81. First rotary drive motor; 82. First synchronous pulley; 83. Worm gear reducer; 84. Second synchronous pulley; 85. Synchronous belt; 86. Second transmission gear; 87. Third transmission gear; 88. Fourth transmission gear; 89. Rotating roller; 891. Fifth transmission gear; 892. Sixth transmission gear; 810. Seventh transmission gear; 9. Pressure loading mechanism; 91. First mounting bracket; 92. Lifting rod; 93. Second drive assembly; 931. Second rotary drive motor; 932. Drive gear; 933. Rack; 94. Pressure equalization assembly; 941. Second mounting bracket; 942. Pressure plate; 9421. Guide rod; 9422. Positioning post; 943. Elastic element; 944. Pressure sensor. Detailed Implementation

[0019] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the present invention.

[0020] In the description of the embodiments of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings, or the orientation or positional relationships commonly used when the product is in use. These are merely for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," and "third," etc., are only used for distinguishing descriptions and should not be construed as indicating or implying relative importance. Additionally, the terms "horizontal," "vertical," and "suspended," etc., do not indicate that the component is required to be absolutely horizontal or suspended, but can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0021] In the description of the embodiments of the present invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in the present invention according to the specific circumstances.

[0022] To further understand the features, technical means, and specific objectives and functions achieved by the present invention, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.

[0023] Reference Figures 1-4 A large-size gallium nitride self-supporting substrate fabrication apparatus includes: a frame 1, with a fixed frame 11 fixed inside the frame 1, a fixed sleeve 12 vertically mounted on the fixed frame 11, and a lifting sleeve 13 that can be raised and lowered outside the fixed sleeve 12; a rotating column 2, with a rotating column 2 rotatably mounted coaxially inside the fixed sleeve 12, and a first transmission gear 21 coaxially mounted on the upper end of the rotating column 2; a grinding table 3, with a grinding table 3 fixed coaxially on the body of the rotating column 2; a lifting housing 4, with a lifting housing 4 rotatably mounted coaxially on the outside of the lifting sleeve 13; a lifting platform 5, with a lifting platform 5 fixed coaxially on the lifting housing 4, and a rotating ring gear 51 coaxially mounted above the lifting platform 5; and planetary limiting plates 6, with a plurality of planetary limiting plates 6 arranged around the grinding platform 3 that can mesh with the first transmission gear 21 and the rotating ring gear 51.

[0024] A large-size gallium nitride self-supporting substrate 61 is embedded into the reserved hole of the planetary limiting plate 6. The planetary limiting plate 6 is then placed on the grinding table 3, so that its inner side meshes with the first transmission gear 21 at the upper end of the rotating column 2, completing the initial positioning. The lifting sleeve 13 is driven to lift upward, simultaneously driving the lifting housing 4, the lifting table 5, and the rotating ring tooth 51 above it to move upward until the rotating ring tooth 51 meshes with the outer side of the planetary limiting plate 6. At this time, the planetary limiting plate 6 is fixed by the bidirectional meshing of the inner first transmission gear 21 and the outer rotating ring tooth 51, providing a stable reference for grinding. The rotating column 2 inside the fixed sleeve 12 rotates, driving the grinding... The grinding table 3 and the first transmission gear 21 rotate synchronously. At the same time, the lifting housing 4 inside the lifting table 5 rotates, driving the rotating ring gear 51 to rotate. Under the differential speed cooperation of the inner and outer gears, the planetary limiting plate 6 performs planetary motion of self-rotation and revolution around the center, so that the surface of the gallium nitride substrate 61 forms a uniform and fully covered grinding trajectory with the grinding mechanism, completing the grinding process of the surface of the substrate 61. After the grinding is completed, the lifting sleeve 13 is controlled to descend, driving the rotating ring gear 51 to move down and disengage from the planetary limiting plate 6, releasing the limiting constraint on the planetary limiting plate 6, and the planetary limiting plate 6 and the gallium nitride substrate 61 that has been processed inside can be directly taken out.

[0025] Reference Figures 4-6 The grinding table 3 has a first hole 31 coaxially arranged inside, which has a gap with the first transmission gear 21, and a first guide plate 32 is coaxially arranged below it. There is a gap between the outer edge of the grinding table 3 and the rotating ring tooth 51. A second guide plate 52 is coaxially arranged below the lifting table 5. A collection plate 14 is coaxially arranged below the first guide plate 32 and the second guide plate 52 on the frame 1. A vacuum cleaner 15 is connected to the lower end of the collection plate 14.

[0026] Reference Figure 6 A sweeping plate 53 is also provided on one side of the lifting platform 5, which is attached to the inner wall of the material collection tray 14.

[0027] The hard waste generated during the grinding of the large-size gallium nitride substrate 61 is thrown outwards and towards the center of the equipment, respectively, by the centrifugal force of the grinding table 3 and the planetary limiting plate 6. The inner waste falls downwards through the gap between the first hole 31 in the center of the grinding table 3 and the first transmission gear 21, while the outer waste falls downwards through the gap between the outer edge of the grinding table 3 and the rotating ring gear 51. The fallen waste falls into the corresponding first guide plate 32 and second guide plate 52 below, respectively. Both guide plates are inclined. The sloping disc structure allows waste to slide down the slope under its own weight and the centrifugal force generated by rotation, eventually collecting in the bottom collection disc 14. When the lifting platform 5 rotates, it will simultaneously drive the side sweeping plate 53 to rotate against the inner wall of the collection disc 14, cleaning the waste accumulated in the collection disc 14 in real time, preventing the waste from adhering and accumulating. At the same time, the lower end of the collection disc 14 is connected to the vacuum cleaner 15 to generate negative pressure suction, continuously sucking away the waste swept by the sweeping plate 53, completing the real-time collection and discharge of waste.

[0028] Reference Figure 8 and Figure 9 The device further includes a lifting mechanism 7 for raising and lowering the lifting housing 4; wherein, the lifting mechanism 7 includes: a lifting turntable 71 and a first drive assembly 72, the bottom of the fixed sleeve 12 is rotatably provided with the lifting turntable 71 coaxially via the first drive assembly 72, and the lifting turntable 71 is surrounded by a plurality of guide ramps 711; lifting wheels 73, the lifting sleeve 13 is surrounded by lifting wheels 73 corresponding to each guide ramp 711, the inner side of the lifting wheel 73 is provided with guide posts 731, and the fixed sleeve 12 is surrounded by a plurality of guide grooves 121 corresponding to each guide post 731.

[0029] This application uses the first drive assembly 72 to provide rotational power, driving the lifting turntable 71 at the bottom of the fixed sleeve 12 to reciprocate at a set angle. Multiple guide ramps 711 on the circumference of the lifting turntable 71 rotate synchronously with the turntable. The inclined surfaces of the ramps continuously act on the corresponding lifting wheels 73 on the lifting sleeve 13. At the same time, the guide posts 731 on the lifting sleeve 13 are engaged in the guide grooves 121 of the fixed sleeve 12, and are restricted to vertical linear movement only, unable to rotate circumferentially. The rotational displacement of the guide ramps 711 is converted into the vertical displacement of the lifting wheels 73, thereby driving the lifting sleeve 13 to rise or fall smoothly. The lifting sleeve 13 synchronously links the outer lifting housing 4 and the lifting platform 5, ultimately driving the rotating ring gear 51 to move up and down, realizing engagement and fixation or disengagement with the planetary limit plate 6.

[0030] Reference Figure 10 and Figure 11The first drive assembly 72 includes: a first linear driver 721, which is fixedly mounted on one side of the lifting turntable 71, and a drive rod 722 is provided at the output end of the first linear driver 721. A first strip groove 7221 is provided through the drive rod 722, and a locking post 723 is provided in the middle of the first strip groove 7221; and a fixed connecting rod 712, which is fixedly mounted on one side of the lifting turntable 71, and a second strip groove 7121 adapted to the locking post 723 is provided through the rod body of the fixed connecting rod 712.

[0031] This application uses a first linear actuator 721 as a power source to perform reciprocating linear extension and retraction, driving the front drive rod 722 to move synchronously in a linear fashion. The drive rod 722 has a first strip groove 7221, and the locking pin 723 in the groove is simultaneously inserted into the second strip groove 7121 of the fixed connecting rod 712. When the first linear actuator 721 extends and retracts, the locking pin 723 slides relative to each other in the two strip grooves, converting the linear displacement of the linear actuator into the circumferential swing torque of the fixed connecting rod 712. The fixed connecting rod 712 is fixedly connected to the lifting turntable 71. Finally, under the reciprocating drive of the linear actuator, the lifting turntable 71 is driven to achieve a small-angle, controllable reciprocating rotation, providing power for the lifting action of the outer lifting sleeve 13.

[0032] Reference Figure 3 and Figure 7 The device is further provided with a synchronous drive mechanism 8 for driving the rotating ring gear 51 and the first transmission gear 21 to rotate synchronously at different speeds; wherein, the synchronous drive mechanism 8 includes: a first rotary drive motor 81 and a first synchronous pulley 82, the first rotary drive motor 81 is disposed at the bottom of the frame 1 and its output end is coaxially disposed with the first synchronous pulley 82; a worm gear reducer 83 and a second synchronous pulley 84, the input end of the worm gear reducer 83 is coaxially disposed with the second synchronous pulley 84; a synchronous belt 85, the opposite ends of the synchronous belt 85 are respectively sleeved on the first synchronous pulley 82 and the second synchronous pulley 84; a second transmission gear 86 and a third transmission gear 87, the output end of the worm gear reducer 83 is coaxially disposed with the second synchronous pulley 87. A second transmission gear 86, with a third transmission gear 87 coaxially mounted on the second transmission gear 86; a fourth transmission gear 88, with the bottom of the rotating column 2 coaxially mounted and meshing with the third transmission gear 87; a rotating roller 89, vertically rotatable on one side of the second transmission gear 86, with a fifth transmission gear 891 coaxially mounted at the lower end of the rotating roller 89 and a sixth transmission gear 892 coaxially mounted at the upper end; and a seventh transmission gear 810, with the periphery of the lifting housing 4 coaxially mounted and meshing with the sixth transmission gear 892, the tooth width of the seventh transmission gear 810 being narrower than that of the sixth transmission gear 892.

[0033] In this application, the first rotary drive motor 81 serves as the main power source. Its output power is transmitted via the first synchronous pulley 82, synchronous belt 85, and second synchronous pulley 84 to the worm gear reducer 83, achieving speed reduction and torque increase. This outputs low-speed, high-torque, and stable rotary power, avoiding high-speed impacts. The third transmission gear 87 at the reducer's output meshes with the fourth transmission gear 88 at the bottom of the rotating column 2, directly driving the rotating column 2 to rotate. This, in turn, drives the coaxial first transmission gear 21 to rotate synchronously. The second transmission gear 86 at the reducer's output meshes with the fifth transmission gear 891 at the lower end of the rotating roller 89, driving the rotating roller 89 and the upper sixth transmission gear 89. 2. Rotation: The sixth transmission gear 892 then meshes with the seventh transmission gear 810 on the lifting housing 4, ultimately driving the lifting platform 5 and the rotating ring gear 51 to rotate synchronously. Through the tooth ratio of each transmission gear, the first transmission gear 21 and the rotating ring gear 51 form a set speed difference to meet the planetary motion requirements of the planetary limit plate 6's revolution + rotation. Specifically, the speed of the rotating ring gear 51 is greater than the speed of the first transmission gear 21, and the tooth width of the seventh transmission gear 810 is narrower than that of the sixth transmission gear 892. During the lifting process of the lifting platform 5, the two always maintain a meshed state, and the transmission is uninterrupted and does not disengage, perfectly matching the lifting action of the lifting housing 4.

[0034] Reference Figure 12 and Figure 13 The device further includes a pressure loading mechanism 9 for applying pressure to the substrate 61. The pressure loading mechanism 9 includes: a first mounting frame 91, which is provided on the frame 1; lifting rods 92 and a second drive assembly 93, wherein a plurality of lifting rods 92 are provided on the first mounting frame 91 in a way that can be raised and lowered by the second drive assembly 93; and a pressure equalization assembly 94, wherein a pressure equalization assembly 94 is provided at the lower end of each lifting rod 92.

[0035] Reference Figure 14 The second drive assembly 93 includes: a second rotary drive motor 931 and a drive gear 932. The first mounting bracket 91 is provided with a second rotary drive motor 931 corresponding to each lifting rod 92. The output end of each second rotary drive motor 931 is coaxially provided with a drive gear 932; a rack 933 is provided on one side of each lifting rod 92 along its length direction, which meshes with the drive gear 932.

[0036] Reference Figure 13The pressure equalization assembly 94 includes: a second mounting frame 941, the lower end of the lifting rod 92 is rotatably connected to the second mounting frame 941; a pressure plate 942, the pressure plate 942 is disposed below the second mounting frame 941, and several guide rods 9421 are vertically arranged through the second mounting frame 941 on its periphery; an elastic element 943, each guide rod 9421 is respectively fitted with an elastic element 943, one end of the elastic element 943 abuts or is fixed to the second mounting frame 941, and the other end abuts or is fixed to the pressure plate 942; and a pressure sensor 944, a pressure sensor 944 is provided at the connection between the lifting rod 92 and the second mounting frame 941.

[0037] The pressure plate 942 of this application has a positioning post 9422 at its bottom, which integrates a vision sensor. The industrial control computer identifies the positioning hole 62 on the planetary limit plate 6 through the vision sensor, and drives the first rotary drive motor 81 to rotate the planetary limit plate 6 until the positioning post 9422 is coaxially aligned with the positioning hole 62, ensuring that the pressure plate 942 is aligned with the center of the substrate 61. After alignment, the second rotary drive motor 931 drives the drive gear 932 to rotate, which meshes with the rack 933 on the lifting rod 92, converting the rotational motion into the vertical linear motion of the lifting rod 92, which drives the pressure equalization component 94 to descend smoothly. After the pressure plate 942 descends and contacts the substrate 61, multiple circumferential guide rods 9421 constrain the pressure plate 942 to keep it horizontal, preventing... To prevent tilting and uneven loading, the elastic element 943 on the guide rod 9421 is compressed to form a flexible buffer pressure, avoiding rigid hard contact that could damage the substrate 61. The lifting rod 92 is rotatably connected to the second mounting bracket 941, allowing the pressure plate 942 to rotate synchronously with the planetary limit plate 6 without interfering with the grinding motion. The pressure sensor 944 collects the downward pressure in real time and feeds it back to the industrial control computer. The system dynamically adjusts the speed and torque of the second rotary drive motor 931 to keep the pressure constant throughout the grinding process. At the same time, the industrial control computer records the downward stroke of the lifting rod 92 in real time. When the stroke of the lifting rod 92 reaches the preset value corresponding to the processing thickness, the system determines that the substrate 61 has been ground and automatically controls the pressure loading mechanism 9 to rise, completing the entire processing process.

[0038] The specific workflow is as follows: 1. The lifting sleeve 13, lifting platform 5, and rotating ring gear 51 are in the lower position and are disengaged from the planetary limit plate 6; the pressure loading mechanism 9 is in the upper position and the pressure plate 942 is away from the grinding area; the vacuum cleaner 15 is in standby or low-speed operation.

[0039] 2. Embed the large-size gallium nitride self-supporting substrate 61 into the reserved hole of the planetary positioning plate 6, place the planetary positioning plate 6 with the substrate 61 installed on the grinding table 3, so that the inner teeth of the planetary positioning plate 6 mesh with the first transmission gear 21 at the upper end of the rotating column 2 to complete the initial positioning.

[0040] 3. The first linear actuator 721 extends and retracts, and through the cooperation of the drive rod 722, the first strip groove 7221, the snap-fit ​​post 723, the fixed connecting rod 712, and the second strip groove 7121, the linear motion is converted into a small-angle reciprocating rotation of the lifting turntable 71. The lifting turntable 71 rotates, and the guide ramp 711 on it pushes the lifting wheel 73 on the lifting sleeve 13 to move upward. Under the constraint of the guide post 731 and the guide groove 121, the lifting sleeve 13 only makes a vertical upward movement, which simultaneously drives the lifting housing 4, the lifting platform 5, and the rotating ring tooth 51 to move upward as a whole until the rotating ring tooth 51 is fully engaged with the outer teeth of the planetary limit plate 6. The planetary limit plate 6 is bidirectionally limited and fixed by the first transmission gear 21 and the rotating ring tooth 51, and the locking is completed.

[0041] 4. The industrial control computer starts the vision sensor inside the positioning post 9422 of the pressure plate 942 to identify the positioning hole 62 on the planetary limit plate 6. The industrial control computer controls the first rotary drive motor 81 to rotate at low speed. Through the synchronous drive mechanism 8, the grinding table 3 and the planetary limit plate 6 are driven to rotate slowly. When the vision sensor detects that the positioning hole 62 is coaxially aligned with the positioning post 9422, the motor stops rotating, and the pressure plate 942 and the substrate 61 are accurately aligned coaxially.

[0042] 5. After alignment, the second rotary drive motor 931 starts, driving the drive gear 932 to rotate. The gear meshes with the rack 933 on the lifting rod 92, converting the rotational motion into the vertical downward linear motion of the lifting rod 92. The lifting rod 92 drives the second mounting bracket 941 and the pressure plate 942 downward until the pressure plate 942 contacts the upper surface of the substrate 61. The downward movement compresses the elastic element 943. Under the constraint of the guide rod 9421, the pressure plate 942 remains horizontal, applying flexible and uniform pressure to the substrate 61. The pressure sensor 944 collects the pressure value in real time and feeds it back to the industrial control computer. The system automatically adjusts the motor speed and torque to stabilize the pressure at the set value, achieving constant pressure loading. The pressure plate 942 and the second mounting bracket 941 can rotate freely relative to the lifting rod 92, preparing for subsequent synchronous rotation with the planetary limit plate 6.

[0043] 6. The first rotary drive motor 81 starts, and the power is transmitted to the worm gear reducer 83 through the first synchronous pulley 82 → synchronous belt 85 → second synchronous pulley 84, so as to achieve speed reduction and torque increase, and output smooth power. Inner path: Third transmission gear 87 → Fourth transmission gear 88 → Rotating column 2 → First transmission gear 21 + Grinding table 3 rotate synchronously. Outer ring path: Second transmission gear 86 → Fifth transmission gear 891 → Rotating roller 89 → Sixth transmission gear 892 → Seventh transmission gear 810 → Lifting housing 4 → Lifting platform 5 + rotating ring gear 51 (synchronous rotation) By matching the number of gear teeth, the rotational speed of the rotating ring gear 51 is greater than that of the first transmission gear 21, thus forming a set differential speed. Under the differential speed drive of the inner and outer gears, the planetary limit plate 6 simultaneously performs planetary motion of self-rotation and revolution around the center, which drives the gallium nitride substrate 61 and the grinding disk to produce a uniform and fully covered grinding trajectory, thus completing the precision grinding of the surface of the substrate 61.

[0044] 7. The hard waste chips produced during grinding are thrown outwards and outwards under the action of centrifugal force: Inner waste chips: fall from the gap between the first hole 31 in the center of the grinding table 3 and the first transmission gear 21, and enter the first guide plate 32; Outer waste chips: fall from the gap between the outer edge of the grinding table 3 and the rotating ring tooth 51 and enter the second guide plate 52; Waste chips are collected along the inclined slopes of the first guide plate 32 and the second guide plate 52 under the action of gravity and centrifugal force to the bottom collection plate 14; When the lifting platform 5 rotates, it drives the sweeping plate 53 to rotate synchronously, continuously cleaning the waste on the inner wall of the collection plate 14. The vacuum cleaner 15 generates negative pressure to remove waste and debris in real time, achieving dust-free, residue-free, and fully automatic debris removal.

[0045] 8. The industrial control computer records the downward stroke of the lifting rod 92 in real time. This stroke corresponds to the thickness removed by the grinding of the substrate 61. When the stroke of the lifting rod 92 reaches the preset target thickness value, the system determines that the grinding process is completed. The second rotary drive motor 931 reverses and drives the lifting rod 92 and the pressure plate 942 to rise upward through the gear rack 933, releasing the pressure on the substrate 61. The pressure loading mechanism 9 returns to the initial high position and waits for unloading.

[0046] 9. The first linear actuator 721 extends and retracts in the reverse direction, causing the lifting turntable 71 to rotate in the reverse direction at a small angle. The guide ramp 711 falls back, and the lifting wheel 73 moves downward. The lifting sleeve 13, the lifting platform 5, and the rotating ring gear 51 descend as a whole. The rotating ring gear 51 disengages from the planetary limit plate 6, releasing the outer constraint on the planetary limit plate 6. Since the tooth width of the seventh transmission gear 810 is narrower than that of the sixth transmission gear 892, the seventh transmission gear 810 and the sixth transmission gear 892 remain engaged, and the transmission structure is not affected.

[0047] 10. The operator directly removes the planetary limiting plate 6 from the grinding table 3 and takes out the internally processed gallium nitride self-supporting substrate 61, puts in the new substrate 61 to be processed, repeats the above process, and enters the next batch of processing.

[0048] The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0049] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0050] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A fabrication apparatus for large-size gallium nitride self-supporting substrates, characterized in that, include: The frame (1) has a fixed frame (11) inside, and a fixed sleeve (12) is vertically arranged on the fixed frame (11). A lifting sleeve (13) can also be provided outside the fixed sleeve (12). Rotating column (2), the rotating column (2) is rotatably provided coaxially inside the fixed sleeve (12), and the first transmission gear (21) is coaxially provided at the upper end of the rotating column (2). Grinding table (3), the grinding table (3) is coaxially fixed to the body of the rotating column (2); The lifting housing (4) is provided on the outer side of the lifting sleeve (13) in a coaxial and rotatable manner. Lifting platform (5), the lifting housing (4) is coaxially fixed with lifting platform (5), and a rotating ring tooth (51) is coaxially arranged above the lifting platform (5); Planetary limiting plate (6), and several planetary limiting plates (6) that can mesh with the first transmission gear (21) and the rotating ring gear (51) are arranged around the grinding table (3).

2. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 1, characterized in that, The grinding table (3) has a first hole (31) with a gap to the first transmission gear (21) inside, and a first guide plate (32) is coaxially arranged below it. There is a gap between the outer edge of the grinding table (3) and the rotating ring tooth (51). A second guide plate (52) is coaxially arranged below the lifting table (5). A collection plate (14) is coaxially arranged below the first guide plate (32) and the second guide plate (52) of the frame (1). A vacuum cleaner (15) is connected to the lower end of the collection plate (14).

3. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 2, characterized in that, A sweeping plate (53) is also provided on one side of the lifting platform (5) and attached to the inner wall of the collection tray (14).

4. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 1, characterized in that, The device also includes a lifting mechanism (7) for raising and lowering the lifting housing (4); wherein, The lifting mechanism (7) includes: The lifting turntable (71) and the first drive assembly (72) are provided. The bottom of the fixed sleeve (12) is rotatably provided with the lifting turntable (71) coaxially through the first drive assembly (72). Several guide ramps (711) are arranged around the lifting turntable (71). The lifting wheel (73) is arranged around the periphery of the lifting sleeve (13) with a lifting wheel (73) corresponding to each guide ramp (711). The lifting wheel (73) is provided with a guide post (731) inside. The fixed sleeve (12) is provided with a number of guide grooves (121) corresponding to each guide post (731) around the periphery.

5. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 4, characterized in that, The first driving component (72) includes: A first linear actuator (721) is fixedly provided on one side of the lifting turntable (71). A drive rod (722) is provided at the output end of the first linear actuator (721). A first strip groove (7221) is provided through the drive rod (722). A snap-fit ​​post (723) is provided in the middle of the first strip groove (7221). A fixed connecting rod (712) is fixedly provided on one side of the lifting turntable (71). The fixed connecting rod (712) has a second slot (7121) through its body that is adapted to the snap-fit ​​post (723).

6. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 1, characterized in that, The device is further provided with a synchronous drive mechanism (8) for driving the rotating ring gear (51) and the first transmission gear (21) to rotate synchronously at different speeds; wherein, The synchronous drive mechanism (8) includes: The first rotary drive motor (81) and the first synchronous pulley (82) are provided. The first rotary drive motor (81) is located at the bottom of the frame (1), and the first synchronous pulley (82) is coaxially provided at its output end. The worm gear reducer (83) and the second synchronous pulley (84) are provided on the input end of the worm gear reducer (83). A timing belt (85) is provided, with its two ends respectively fitted onto a first timing pulley (82) and a second timing pulley (84); The second transmission gear (86) and the third transmission gear (87) are coaxially arranged on the output end of the worm gear reducer (83). The fourth transmission gear (88) is coaxially arranged at the bottom of the rotating column (2) and meshes with the third transmission gear (87). A rotating roller (89) is vertically and rotatably arranged on one side of the second transmission gear (86). The lower end of the rotating roller (89) is coaxially provided with a fifth transmission gear (891) that meshes with the second transmission gear (86), and the upper end is coaxially provided with a sixth transmission gear (892). The seventh transmission gear (810) is coaxially arranged on the periphery of the lifting housing (4) and meshes with the sixth transmission gear (892). The tooth width of the seventh transmission gear (810) is narrower than that of the sixth transmission gear (892).

7. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 1, characterized in that, The device further includes a pressure loading mechanism (9) for applying pressure to the substrate (61): wherein, The pressure loading mechanism (9) includes: First mounting bracket (91), the first mounting bracket (91) is provided on the frame (1); The first mounting bracket (91) has a number of lifting rods (92) that can be raised and lowered by the second drive assembly (93). Pressure equalization component (94), each lifting rod (92) is provided with a pressure equalization component (94) at its lower end.

8. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 7, characterized in that, The second driving component (93) includes: The second rotary drive motor (931) and drive gear (932) are provided on the first mounting bracket (91) in correspondence with each lifting rod (92), and the output end of each second rotary drive motor (931) is coaxially provided with drive gear (932). Rack (933), each lifting rod (92) has a rack (933) on one side along its length direction that meshes with the drive gear (932).

9. The large-size gallium nitride self-supporting substrate fabrication apparatus according to claim 7, characterized in that, The pressure equalization assembly (94) includes: The second mounting bracket (941) is rotatably connected to the lower end of the lifting rod (92). Pressure plate (942), the pressure plate (942) is located below the second mounting bracket (941), and several guide rods (9421) are provided vertically through the second mounting bracket (941) on its periphery. Elastic element (943), each guide rod (9421) is fitted with an elastic element (943), one end of the elastic element (943) abuts or is fixed to the second mounting bracket (941), and the other end abuts or is fixed to the pressure plate (942); A pressure sensor (944) is provided at the connection between the lifting rod (92) and the second mounting bracket (941).

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