Deposition mask

Abstract

A deposition mask is disclosed. According to one aspect of the invention, the deposition mask includes: a mask body including a first surface and a second surface opposite to the first surface; a patterned region formed on the mask body with a predetermined area to allow organic matter to pass through; and a border region configured to surround the outer edge of the patterned region; the patterned region may include a first patterned region, a second patterned region disposed inside the first patterned region, and a rib region formed between the first and second patterned regions and surrounding the second patterned region.

Description

Technical Field

[0001] This invention relates to a deposition mask for depositing organic materials on a substrate. Background Technology

[0002] A deposition mask is a component with multiple through holes formed in a predetermined pattern on a thin metal sheet. It is an important means of forming display pixels, especially in the manufacturing process of display panels such as organic light-emitting diodes (OLEDs).

[0003] To achieve full color in a display, a three-stage deposition process is required, in which organic materials of R, G, and B colors are respectively deposited on the display substrate.

[0004] This deposition process involves depositing organic vapors evaporated from an organic source onto the substrate surface through through-holes while one or more deposition masks are soldered and mounted on a frame corresponding to the panel size of the display.

[0005] In addition, the deposition mask may include a patterned area on a rectangular metal sheet having a plurality of through holes for depositing organic matter and a non-patterned area where the plurality of through holes are not formed. The patterned area may also be set in a plurality at predetermined intervals along the length of the metal sheet.

[0006] At this time, grid-shaped ribs are formed between multiple through holes arranged adjacent to each other in the pattern area.

[0007] Such ribs can be formed along a first direction and a second direction perpendicular to the first direction, and the portion where the ribs formed along the first direction and the ribs formed along the second direction intersect can form a vertical rod.

[0008] On the other hand, for deposition masks used to achieve high resolution, it is required that the rod be formed to have a thickness thinner than the metal sheet constituting the deposition mask, while having a sharp shape at one end.

[0009] Therefore, existing deposition masks used to achieve high resolution suffer from rigidity differences due to the thickness difference between the portion corresponding to the edge of the patterned region and the unpatterned region adjacent to the patterned region.

[0010] Therefore, when existing deposition masks are welded and installed onto the mask frame, if a tensile force exceeding a certain value is applied to ensure flatness, cracks may form and the mask may be torn.

[0011] That is, existing deposition masks suffer from the problem that the edge of the patterned region cannot have sufficient tensile strength because there is a difference in thickness between the portion corresponding to the edge of the patterned region and the unpatterned region adjacent to the patterned region. Summary of the Invention

[0012] The technical problem that the invention aims to solve After repeated research and experiments, the inventors discovered that the area of ​​the uprights constituting the pattern region has a significant impact on the tensile strength of the deposition mask, thus completing this invention.

[0013] That is, through repeated research and experiments, it has been found that if the area of ​​the upright rod formed on the outermost part of the pattern area reaches a certain size, the tensile strength of the deposition mask can be easily achieved to the desired level.

[0014] The present invention was made in view of the above-mentioned problems, and its object is to provide a deposition mask having tensile strength above the target level and being able to allow organic matter to pass through smoothly.

[0015] The subject matter of this invention is not limited to the subject matter described above, and other subject matters not mentioned can be clearly understood by those skilled in the art based on the following description.

[0016] means for solving problems According to one aspect of the invention, a mask body includes a first surface for receiving organic matter deposited on a substrate and a second surface opposite to the first surface, and is formed as a plate having a predetermined area; a patterned region having a predetermined area formed on the mask body to allow the organic matter to pass through from the first surface toward the second surface; and a border region configured to surround the outer side of the patterned region, wherein the patterned region may include a first patterned region, a second patterned region, and a dividing rib region, the first patterned region being disposed adjacent to and along the border region, the second patterned region being disposed inside the first patterned region, and the dividing rib region being formed between the first patterned region and the second patterned region to surround the second patterned region, thereby enabling the first patterned region and the second patterned region to be distinguished.

[0017] At this time, the first pattern area may include a plurality of first large faces, a plurality of first small faces, a plurality of first through holes, a first rib, a second rib, and a plurality of first uprights. The plurality of first large faces are formed on the first surface, and the plurality of first small faces are formed on the second surface at positions corresponding to the plurality of first large faces. The plurality of first through holes are formed by the plurality of first large faces and the plurality of first small faces overlapping each other and penetrating the mask body. The first rib is formed on the first surface along a first direction and is located between the plurality of first through holes. The second rib is formed on the first surface along a second direction intersecting the first direction and is located between the plurality of first through holes. The plurality of first uprights are respectively formed on the first surface at positions where the first rib and the second rib intersect each other.

[0018] Furthermore, the second pattern area may include a plurality of second large faces, a plurality of second small faces, a plurality of second through holes, a third rib, a fourth rib, and a plurality of second uprights. The plurality of second large faces are formed on the first surface, and the plurality of second small faces are formed on the second surface at positions corresponding to the plurality of second large faces. The plurality of second through holes are formed by the plurality of second large faces and the plurality of second small faces overlapping each other and penetrating the mask body. The third rib is formed on the first surface along a first direction and is located between the plurality of second through holes. The fourth rib is formed on the first surface along a second direction intersecting the first direction and is located between the plurality of second through holes. The plurality of second uprights are respectively formed on the first surface at positions where the third rib and the fourth rib intersect each other.

[0019] At this time, each of the plurality of first uprights may include a planar portion formed at one end and having a predetermined area, and each of the plurality of second uprights may be formed at one end without forming a planar portion and having a sharp shape.

[0020] According to a preferred embodiment of the present invention, the planar portion can be formed with an area of ​​9 2 The plane above.

[0021] Furthermore, the thickness of the portion of the mask body in which the planar portion is formed can be made to be the same as the thickness of the portion of the mask body in which the border region is formed.

[0022] Furthermore, the thickness of the portion of the mask body where the second upright is formed at one end can be made smaller than the thickness of the portion of the mask body where the border area is formed.

[0023] Furthermore, the zoning rib region may include a first zoning rib, a second zoning rib, and a plurality of third uprights. The first zoning rib is formed on the first surface along a first direction and is located between a first through hole and a second through hole arranged adjacent to each other along a second direction. The second zoning rib is formed on the first surface along a second direction and is located between a first through hole and a second through hole arranged adjacent to each other along the first direction. The plurality of third uprights are formed on the first surface at intervals along the first zoning rib and the second zoning rib.

[0024] In this case, each of the plurality of third uprights can be formed at the position where the second or fourth rib intersects with the first dividing rib, or at the position where the first or third rib intersects with the second dividing rib. Each of the plurality of third uprights can be formed at one end without forming a plane and having a sharp shape.

[0025] At this time, the thickness of the portion of the mask body where the third upright is formed at one end can be made smaller than the thickness of the portion of the mask body where the border area is formed.

[0026] Furthermore, the plurality of first uprights may include a plurality of first-1 uprights and a plurality of first-2 uprights. The plurality of first-1 uprights are located between two adjacent first through holes and are spaced apart along a virtual first square annular border. The plurality of first-2 uprights are located between two adjacent first through holes and are spaced apart along a virtual second square annular border disposed inside the virtual first square annular border.

[0027] Furthermore, the area of ​​the first planar portion formed at one end of the first-1 upright and having a predetermined area can be formed to be larger than the area of ​​the second planar portion formed at one end of the first-2 upright and having a predetermined area.

[0028] In addition, the plurality of first uprights may also include a plurality of first-3 uprights, which are located between two adjacent first through holes and are spaced apart along a virtual third-shaped annular border disposed inside the virtual second square annular border.

[0029] In this case, the area of ​​the first flat portion formed at one end of the first-1 upright and having a predetermined area can be formed to be larger than the area of ​​the second flat portion formed at one end of the first-2 upright and having a predetermined area, and the area of ​​the second flat portion formed at one end of the first-2 upright and having a predetermined area can be formed to be larger than the area of ​​the third flat portion formed at one end of the first-3 upright and having a predetermined area.

[0030] Furthermore, the border area can be the portion of the mask body that was not etched by the etching solution.

[0031] The effects of the invention The deposition mask according to the present invention can achieve a target level of tensile strength while allowing organic matter to pass through smoothly, thereby preventing a reduction in deposition accuracy.

[0032] The effects of the present invention are not limited to those described above, but should be understood to include all effects that can be inferred from the detailed description of the invention or the inventive structure described in the claims. Attached Figure Description

[0033] Figure 1 A diagram illustrating the state in which a deposition mask is disposed on a mask frame according to an embodiment of the present invention.

[0034] Figure 2 A plan view of a deposition mask according to an embodiment of the present invention is shown.

[0035] Figure 3 for Figure 2 The image is an excerpt from section "A".

[0036] Figure 4 for Figure 3 Floor plan.

[0037] Figure 5 To show that Figure 3 A diagram showing the flipped state.

[0038] Figure 6 for Figure 5 Floor plan.

[0039] Figure 7 for Figure 5 The image is an excerpt from section "B".

[0040] Figure 8 for Figure 6 Cross-sectional views in the "CC" and "DD" directions.

[0041] Figure 9 for Figure 6 Cross-sectional views in the "EE", "FF", "KK", and "LL" directions.

[0042] Figure 10 for Figure 6 Cross-sectional views in the "GG" and "HH" directions.

[0043] Figure 11 for Figure 6 Cross-sectional views in the "II" and "JJ" directions.

[0044] Figure 12 for Figure 6 A variation of the above.

[0045] Figure 13 for Figure 12 Cross-sectional views in the "KK" and "LL" directions.

[0046] Figure 14 for Figure 13 A variation of the above. Detailed Implementation

[0047] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings to enable those skilled in the art to readily implement the invention. The present invention can be implemented in many different forms and is not limited to the embodiments described herein. For clarity of illustration, parts irrelevant to the description have been omitted from the drawings, and throughout the specification, the same or similar reference numerals are used for the same or similar constituent elements.

[0048] The words and terms used in this specification and claims should not be limited to their ordinary or dictionary meaning, but should be interpreted in accordance with the principle that inventors may define terms and concepts in order to best illustrate their invention, and are meant to reflect the technical ideas of this invention.

[0049] Furthermore, the term "upper surface" as used in this specification and claims may refer to... Figure 5 The lower surface can be referred to as the surface viewed from above, which is the reference surface. Figure 5 The surface viewed from below is used as a reference. Furthermore, the thickness direction and height direction used in this specification and claims may refer to... Figure 5 The reference direction is parallel to the Z-axis and parallel to the direction from the top surface to the bottom surface or from the bottom surface to the top surface. The width direction and the first direction can refer to... Figure 5 The reference direction is parallel to the X-axis; the length direction and the second direction can be indicated by... Figure 5 The reference direction is parallel to the Y-axis.

[0050] According to an embodiment of the present invention, a deposition mask 100 can form pixels on a display panel such as an organic light-emitting diode (OLED) by passing organic matter deposited on a substrate through through-holes 121c and 123c in a predetermined pattern.

[0051] For example, a deposition mask 100 according to an embodiment of the present invention, such as Figure 1 As shown, the patterned area 120 formed with a predetermined pattern can be positioned at a position corresponding to the opening 10a having a predetermined area, and can be fixed to one side of the mask frame 10 including the opening 10a by welding. It can also be fixed to the mask frame 10 by welding while being stretched with a certain tensile force.

[0052] Here, the mask frame 10 may have a square strip shape with a central opening 10a and may support the deposition mask 100. This mask frame 10 may be formed of a rigid metal material, such as stainless steel.

[0053] At this time, the deposition mask 100 according to an embodiment of the present invention may include a first surface 110a and a second surface 110b. The second surface 110b may be a surface of a substrate (not shown) configured for forming a desired thin film pattern by depositing a deposition substance such as organic matter on a substrate (not shown). The first surface 110a may be a surface in which a deposition substance such as organic matter supplied from a deposition substance supply source (not shown) flows in.

[0054] Therefore, according to an embodiment of the present invention, the deposition mask 100 can be fixed to the mask frame 10 by welding while the patterned region 120 is positioned corresponding to the opening 10a of the mask frame 10, and organic matter or other deposition substances can pass through the patterned region 120, thereby depositing organic matter on the substrate.

[0055] The deposition mask 100 according to an embodiment of the present invention is as follows: Figures 1 to 6 As shown, it may include a mask body 110, a pattern area 120, and a border area 130.

[0056] The mask body 110 can be formed from a thin metal film such as nickel, nickel alloy, or nickel-cobalt alloy.

[0057] The two ends of the mask body 110 can be fixed to the mask frame 10 respectively.

[0058] For example, the mask body 110 can be configured as a plate-like strip with a predetermined area and length, and can include a first surface 110a and a second surface 110b that are opposite to each other.

[0059] Here, as described above, the first surface 110a can be a surface into which deposited material such as organic matter supplied from a deposited material supply source (not shown) flows, and the second surface 110b can be a surface on which a substrate (not shown) is disposed.

[0060] Therefore, when the mask body 110 is positioned in the patterned area 120 corresponding to the opening 10a of the mask frame 10, both ends of the mask body 110 can be fixed to the mask frame 10 by welding, and a substrate (not shown) for depositing organic matter can be disposed on the second surface 110b side.

[0061] At this time, the mask body 110 may also include clamping portions 101 formed at both ends.

[0062] The clamping part 101 may be a part of a clamp (not shown) that is incorporated for stretching in both directions before the mask body 110 is fixed to the mask frame 10 by welding. The clamping part 101 may also be removed from the mask body 110 by cutting after the mask body 110 is fixed to the mask frame 10 by welding.

[0063] Although the mask body 110 is shown in the accompanying drawings as having a relatively narrower area than the opening 10a of the mask frame 10, the present invention is not limited thereto, and the mask body 110 may also be configured to have an area capable of covering the entire opening 10a of the mask frame 10.

[0064] The patterned area 120 allows organic matter, which serves as the deposition material, to pass through so that the organic matter can be deposited on the substrate in a predetermined pattern after passing through the mask body 110.

[0065] Therefore, the patterned area 120 may include a plurality of through holes 121c, 123c formed to allow the organic material to pass through from the first surface 110a to the second surface 110b of the mask body 110, and the plurality of through holes 121c, 123c may be arranged in a predetermined pattern.

[0066] For example, the plurality of through holes 121c and 123c can be arranged in an m×n matrix structure (m and n are natural numbers) while being spaced apart from each other along the first and second directions. Furthermore, in this state of being arranged in an m×n matrix structure while being spaced apart from each other along the first and second directions, the interval between any two through holes 121c and 123c that are adjacent to each other along either the first or second direction can also have a certain interval.

[0067] Therefore, the organic material can be deposited on one side of the substrate in a predetermined pattern through a plurality of through holes 121c, 123c formed in the patterned region 120.

[0068] The patterned area 120 can be formed on the mask body 110 with a predetermined area.

[0069] For example, a deposition mask 100 according to an embodiment of the present invention, such as Figure 1 as well as Figure 2 As shown, multiple patterned regions 120 with a predetermined area can be arranged spaced apart along the length of the mask body 110, and each patterned region 120 can be surrounded by a border region 130.

[0070] Here, the patterned area 120 can be the portion of the overall area of ​​the mask body 110 that is etched with an etchant to form the plurality of through holes 121c and 123c, and the border area 130 can be the portion of the overall area of ​​the mask body 110 that is not etched with an etchant. The border area 130 can be formed on the mask body 110 to surround the outer periphery of the patterned area 120.

[0071] Although the patterned regions 120 are shown and described in the accompanying drawings and description as being configured as a plurality of spaced apart along the length of the mask body 110, the present invention is not limited thereto, and the total number of the patterned regions 120 formed on the mask body 110 may be appropriately varied according to design conditions.

[0072] At this time, the pattern area 120 may include a first pattern area 121, a second pattern area 123, and a rib area 125.

[0073] For example, the first pattern area 121 may be a portion of the pattern area 120 that is adjacent to the border area 130 along the border area 130, the second pattern area 123 may be a portion disposed inside the first pattern area 121, and the dividing rib area 125 may be a portion formed between the first pattern area 121 and the second pattern area 123.

[0074] That is, the pattern area 120 can be divided into a first pattern area 121 and a second pattern area 123 by the dividing rib area 125. The first pattern area 121 surrounds the second pattern area 123 and is connected to the border area 130, thus serving as the outer frame of the pattern area 120.

[0075] At this time, the first pattern area 121 and the second pattern area 123 can each be formed with a plurality of through holes 121c and 123c for allowing organic matter to pass through. The plurality of through holes 121c and 123c can each be formed by large holes 121a and 123a formed on the first surface 110a of the mask body 110 and small holes 121b and 123b formed on the second surface 110b of the mask body 110. Upright rods 122 and 124 can be formed between the plurality of through holes 121c and 123c that are adjacent to each other.

[0076] As a specific example, the first pattern area 121 is as follows: Figure 4 , Figure 6 as well as Figure 8 As shown, it may include a plurality of first through holes 121c formed through the mask body 110, a first rib 121d formed on the first surface 110a along a first direction and located between the plurality of first through holes 121c, a second rib 121e formed on the first surface 110a along a second direction intersecting the first direction and located between the plurality of first through holes 121c, and a plurality of first uprights 122 formed on the first surface 110a at positions where the first rib 121d and the second rib 121e intersect each other.

[0077] In this case, the first pattern area 121 may further include a plurality of first large face holes 121a formed on the first surface 110a and a plurality of first small face holes 121b formed on the second surface 110b at positions corresponding to the plurality of first large face holes 121a. Each of the plurality of first through holes 121c may be formed by overlapping the first large face holes 121a and the first small face holes 121b that correspond to each other.

[0078] Here, the first large face 121a can be recessed into the first surface 110a of the mask body 110 to form a certain depth by etching solution, and the first small face 121b can be recessed into the second surface 110b of the mask body 110 to form a certain depth by etching solution. The first large face 121a can be formed to have a relatively wider area than the first small face 121b.

[0079] Furthermore, the first large face 121a can be formed with a shape in which the cross-sectional area gradually decreases from the first face 110a to the first through hole 121c, and the first small face 121b can be formed with a shape in which the cross-sectional area gradually decreases from the second face 110b to the first through hole 121c. For example, the first large face 121a can be formed with a curved shape that increases in cross-sectional area from the first through hole 121c to the first face 110a, and the first small face 121b can be formed with a curved shape that increases in cross-sectional area from the first through hole 121c to the second face 110b.

[0080] Furthermore, the first rib 121d can be configured as a plurality of ribs, formed along a first direction, to respectively traverse between two first through holes 121c that are spaced apart and adjacent to each other along a second direction. The second rib 121e can be configured as a plurality of ribs, formed along a second direction, to respectively traverse between two first through holes 121c that are spaced apart and adjacent to each other along a first direction. The first rib 121d and the second rib 121e can each be formed through a first large face 121a that is adjacent to each other.

[0081] For example, the first rib 121d can be formed by two first large face holes 121a that are adjacent to each other on the first surface 110a along the second direction, and the second rib 121e can be formed by two first large face holes 121a that are adjacent to each other on the first surface 110a along the first direction.

[0082] Furthermore, the first rib 121d and the second rib 121e are each as follows: Figure 7 As shown, it can be formed by two first large facets 121a that are adjacent to each other along one direction, and at the same time, the central part has a curved shape that protrudes toward the second facet 110b.

[0083] Therefore, the plurality of first uprights 122 can be formed in the first pattern area 121 at the position where the plurality of first ribs 121d and the plurality of second ribs 121e intersect each other, so as to protrude outward by a certain height from the first through hole 121c.

[0084] Similarly, the second pattern area 123 is as follows Figure 4 , Figure 6 as well as Figure 10 As shown, it may include a plurality of second through holes 123c formed through the mask body 110, a third rib 123d formed on the first surface 110a along a first direction and located between the plurality of second through holes 123c, a fourth rib 123e formed on the first surface 110a along a second direction intersecting the first direction and located between the plurality of second through holes 123c, and a plurality of second uprights 124 formed on the first surface 110a at positions where the third rib 123d and the fourth rib 123e intersect each other.

[0085] In this case, the second pattern area 123 may further include a plurality of second large face holes 123a formed on the first surface 110a and a plurality of second small face holes 123b formed on the second surface 110b at positions corresponding to the plurality of second large face holes 123a respectively. Each of the plurality of second through holes 123c may be formed by overlapping the second large face holes 123a and the second small face holes 123b that correspond to each other.

[0086] Here, the second large face 123a can be recessed into the first surface 110a of the mask body 110 to form a certain depth by etching solution, and the second small face 123b can be recessed into the second surface 110b of the mask body 110 to form a certain depth by etching solution. The second large face 123a can be formed to have a relatively wider area than the second small face 123b.

[0087] Furthermore, the second large face 123a can be formed with a shape in which the cross-sectional area gradually decreases from the first face 110a to the second through hole 123c, and the second small face 123b can be formed with a shape in which the cross-sectional area gradually decreases from the second face 110b to the second through hole 123c. For example, the second large face 123a can be formed with a curved shape that increases in cross-sectional area from the second through hole 123c to the first face 110a, and the second small face 123b can be formed with a curved shape that increases in cross-sectional area from the second through hole 123c to the second face 110b.

[0088] Furthermore, the third rib 123d can be configured as a plurality of ribs, formed along the first direction, to respectively traverse between two second through holes 123c that are spaced apart and adjacent to each other along the second direction. The fourth rib 123e can be configured as a plurality of ribs, formed along the second direction, to respectively traverse between two second through holes 123c that are spaced apart and adjacent to each other along the first direction. The third rib 123d and the fourth rib 123e can each be formed through a second large face 123a that is adjacent to each other.

[0089] For example, the third rib 123d can be formed by two second large face holes 123a that are adjacent to each other along the second direction on the first surface 110a, and the fourth rib 123e can be formed by two second large face holes 123a that are adjacent to each other along the first direction on the first surface 110a.

[0090] Furthermore, the third rib 123d and the fourth rib 123e are each as follows: Figure 7 As shown, it can be formed by two second large facets 123a that are adjacent to each other along one direction, and at the same time, the central part has a curved shape that protrudes toward the second facet 110b.

[0091] Therefore, the plurality of second uprights 124 can be formed in the second pattern area 123 at the position where the plurality of third ribs 123d and the plurality of fourth ribs 123e intersect each other, so as to protrude outward by a certain height from the second through hole 123c.

[0092] The dividing rib region 125, as described above, can be the portion formed between the first pattern region 121 and the second pattern region 123, and can be the portion that divides the first pattern region 121 and the second pattern region 123.

[0093] The zoning rib region 125 may include: a first zoning rib 125a formed on the first surface 110a along a first direction between a first through hole 121c and a second through hole 123c arranged adjacent to each other along a second direction; a second zoning rib 125b formed on the first surface 110a along the second direction between a first through hole 121c and a second through hole 123c arranged adjacent to each other along the first direction; and a plurality of third uprights 126 formed on the first surface 110a at intervals along the first zoning rib 125a and the second zoning rib 125b.

[0094] For example, the first dividing rib 125a may be formed along a first direction to traverse between the first through hole 121c and the second through hole 123c that are spaced apart and adjacent to each other along a second direction, and the second dividing rib 125b may be formed along a second direction to traverse between the first through hole 121c and the second through hole 123c that are spaced apart and adjacent to each other along a first direction.

[0095] Furthermore, the first dividing rib 125a and the second dividing rib 125b can be connected to each other to surround the entire second pattern area 123.

[0096] That is, the first dividing rib 125a and the second dividing rib 125b can be connected to each other to form a dividing rib region 125 with a generally square ring shape.

[0097] With this structure, the first pattern area 121 and the second pattern area 123 can be divided from each other by the dividing rib area 125.

[0098] At this time, the first dividing rib 125a and the second dividing rib 125b can each be formed by the first large face 121a and the second large face 123a that are adjacent to each other.

[0099] For example, the first dividing rib 125a can be formed by a first large face 121a and a second large face 123a that are adjacent to each other on the first surface 110a along the second direction, and the second dividing rib 125b can be formed by a first large face 121a and a second large face 123a that are adjacent to each other on the first surface 110a along the first direction.

[0100] Furthermore, the first dividing rib 125a and the second dividing rib 125b are each as follows: Figure 7 as well as Figure 9 As shown, it can be formed by a first large face 121a and a second large face 123a that are formed adjacent to each other in one direction, and at the same time, the central part has a curved shape that protrudes toward the second face 110b.

[0101] Therefore, the plurality of third uprights 126 can be arranged at intervals along the first dividing rib 125a and the second dividing rib 125b, and are formed at the position where the second rib 121e or the fourth rib 123e intersects with the first dividing rib 125a, or at the position where the first rib 121d or the third rib 123d intersects with the second dividing rib 125b.

[0102] Furthermore, each of the plurality of third uprights 126 can be formed to protrude outward by a certain height compared to the first through hole 121c and the second through hole 123c.

[0103] At this time, the deposition mask 100 of one embodiment of the present invention can be configured to have a tensile strength greater than the tensile force applied when combined with the mask frame 10, while allowing the organic matter to be deposited to pass smoothly through the patterned region 120.

[0104] For example, even when the deposition mask 100 of an embodiment of the present invention is fixed to the mask frame 10 under a tensile force of 0.4 kgf to 2 kgf applied to both ends of the mask body 110, cracks or tears can be prevented due to the tensile force applied to both ends of the mask body 110.

[0105] That is, the deposition mask 100 of one embodiment of the present invention can be used as an example to enable organic matter to pass through smoothly while having a tensile strength of more than 2 kgf.

[0106] Therefore, in a deposition mask 100 according to an embodiment of the present invention, each of the plurality of first uprights 122 may include a planar portion 122a formed at one end and having a predetermined area, and each of the plurality of second uprights 124 and the plurality of third uprights 126 may be formed such that one end does not form a planar portion and has a sharp shape.

[0107] Furthermore, the thickness t1 of the portion of the mask body 110 in which the planar portion 122a is formed can be formed to be the same as the thickness t of the portion of the mask body 110 in which the border region 130 is formed, and the thickness t2 of the portion of the mask body 110 in which one end of the second upright 124 is formed and the thickness t3 of the portion in which one end of the third upright 126 is formed can be formed to be less than the thickness t of the portion of the mask body 110 in which the border region 130 is formed.

[0108] For example, each of the plurality of first uprights 122 is Figure 6 as well as Figure 7 Based on this, the upper surface of one end can be formed as a planar portion 122a with a predetermined area, and each of the plurality of second uprights 124 and the plurality of third uprights 126 can be formed with a sharp shape at one end.

[0109] And, as Figure 9 as well as Figure 11 As shown, the thickness t1 of the portion formed by the planar portion 122a of the first upright rod 122 can have the same thickness t as the portion forming the border region 130 in the mask body 110, such as... Figure 9As shown, the thickness t2 of the portion formed by one end of the second upright rod 124 and the thickness t3 of the portion formed by one end of the third upright rod 126 can be made smaller than the thickness t of the portion forming the border region 130 in the mask body 110.

[0110] At this time, the planar portion 122a of the first upright rod 122 is as follows: Figure 6 As shown, it can be formed into a plane with a total area of ​​more than a certain size.

[0111] That is, in the deposition mask 100 of one embodiment of the present invention, the first pattern region 121 surrounding the second pattern region 123 and serving as the outer border of the pattern region 120 includes a first upright rod 122 with a planar portion 122a having a predetermined area. At the same time, the thickness t1 of the portion formed by the planar portion 122a of the first upright rod 122 is formed to be the same as the thickness t of the portion forming the border region 130 in the mask body 110. Therefore, the first pattern region 121 can alleviate the sharp difference in rigidity between the portion forming the border region 130 in the mask body 110 without being processed by the etchant and the second pattern region 123 etched by the etchant to form the second through hole 123c.

[0112] Furthermore, in one embodiment of the present invention, the deposition mask 100 differs from the first patterned region 121. In the second patterned region 123, one end of the second upright rod 124 is formed to have a sharp shape, and the thickness t2 of the portion formed by the end of the second upright rod 124 is less than the thickness t of the portion forming the border region 130 in the mask body 110. Therefore, the organic matter can pass smoothly through the second through hole 123c in the second patterned region 123.

[0113] That is, in one embodiment of the present invention, the deposition mask 100 forms a first upright rod 122 with a predetermined area of ​​planar portion 122a in the first pattern region 121, while minimizing the formation area and total number of the first upright rods 122 that may hinder the movement of organic matter during organic matter deposition, thereby preventing a decrease in deposition accuracy while having tensile strength greater than the target size.

[0114] For example, in a deposition mask 100 according to an embodiment of the present invention, the planar portion 122a of the first upright rod 122 can be formed with an overall area of ​​9 2 The plane above.

[0115] With this structure, the deposition mask 100 of one embodiment of the present invention can maintain deposition accuracy while having a tensile strength of more than 2 kgf.

[0116] This can be confirmed from Tables 1 and 2 below.

[0117] Table 1 shows the experimental results of whether defects occur when a tensile force of 2 kgf is applied to both ends of the mask body 110, based on the distance between two adjacent through holes 121c and 123c and the thickness t of the unetched portion in the mask body 110 corresponding to the area of ​​the planar portion 122a. Table 2 shows the results of experiments when the interval between two adjacent through holes is 46. Furthermore, the thickness of the unetched portion within the mask body is 20. Under the given conditions, the result value of the maximum tensile strength of the mask body 110 is determined based on the area of ​​the planar portion 122a.

[0118] Here, "defective" means that when a tensile force of 2 kgf is applied to both ends of the mask body 110, the mask body 110 cracks or tears, while "good" means that even when a tensile force of 2 kgf is applied to both ends of the mask body 110, the mask body 110 does not break.

[0119] Table 1

[0120] Table 2

[0121] As can be confirmed from Table 1 above, when a tensile force of 2 kgf is applied to both ends of the mask body 110, it is known that regardless of the spacing between two adjacent through holes or the thickness of the unetched portion in the mask body 110, the area of ​​the planar portion 122a formed at one end of the first upright rod 122 affects the maximum tensile strength of the mask body 110. Furthermore, as can be confirmed from Table 2, the overall area of ​​the planar portion 122a is formed to be 9... 2 When the surface is flat as described above, a maximum tensile strength of over 2 kgf can be ensured.

[0122] Thus, in one embodiment of the present invention, the deposition mask 100 is configured such that the planar portion 122a has an overall area of ​​9. 2 The above-mentioned flat surface ensures a maximum tensile strength of over 2 kgf.

[0123] Although the above description explains that by constructing the planar portion 122a, the overall area of ​​the planar portion 122a is formed to be 9 2The above-mentioned plane ensures that the deposition mask 100 of one embodiment of the present invention can ensure a maximum tensile strength of 2 kgf or more. However, the present invention is not limited thereto, and the overall area of ​​the plane portion 122a can be appropriately changed according to the target maximum tensile strength. Furthermore, a deposition mask 100 according to an embodiment of the present invention is as follows: Figure 12 As shown, the plurality of first uprights 122 constituting the first pattern area 121 can be configured as a plurality of groups arranged at intervals along the borders RE1, RE2, RE3 of the virtual square ring shape.

[0124] For example, the plurality of first uprights 122 may include a plurality of first-1 uprights 122-1 and a plurality of first-2 uprights 122-2. The plurality of first-1 uprights 122-1 are located between two adjacent first through holes 121c and are spaced apart along the border RE1 of a virtual first square ring shape. The plurality of first-2 uprights 122-2 are located between two adjacent first through holes 121c and are spaced apart along the border RE2 of a virtual second square ring shape disposed inside the border RE1 of the virtual first square ring shape.

[0125] Furthermore, the first upright 122 may also include a plurality of first-3 uprights 122-3, which are located between two adjacent first through holes 121c and are spaced apart along a virtual third-third ring-shaped border RE3 disposed inside the virtual second square ring-shaped border RE2.

[0126] In this case, a plurality of first-1 uprights 122-1 arranged at intervals along the border RE1 of the virtual first square ring shape can form one group, a plurality of first-2 uprights 122-2 arranged at intervals along the border RE2 of the virtual second square ring shape can form another group, and a plurality of first-3 uprights 122-3 arranged at intervals along the border RE3 of the virtual third square ring shape can form yet another group.

[0127] At this time, the first-1 upright 122-1, the first-2 upright 122-2, and the first-3 upright 122-3 are each the same as in the above embodiment, with Figures 12 to 14 Based on this, the upper surface of one end can be formed as a planar portion 122a with a predetermined area.

[0128] Furthermore, the thickness t1 of the portion formed by the planar portion 122a of each of the first-1 upright 122-1, the first-2 upright 122-2, and the first-3 upright 122-3 can have the same thickness t as the portion forming the border region 130 in the mask body 110. The first planar portion 122-1a formed at one end of the first-1 upright 122-1, the second planar portion 122-2a formed at one end of the first-2 upright 122-2, and the third planar portion 122-3a formed at one end of the first-3 upright 122-3 are as follows: Figure 12 As shown, it can be formed with a total area of ​​9 A plane of 2 or more.

[0129] In this case, the first planar portion 122-1a formed at one end of the first-1 upright 122-1, the second planar portion 122-2a formed at one end of the first-2 upright 122-2, and the third planar portion 122-3a formed at one end of the first-3 upright 122-3 are as follows: Figure 12 as well as Figure 13 As shown, they can be set to have the same size and the same area as each other.

[0130] Alternatively, such as Figure 14 As shown, the first planar portion 122-1a formed at one end of the first-1 upright 122-1, the second planar portion 122-2a formed at one end of the first-2 upright 122-2, and the third planar portion 122-3a formed at one end of the first-3 upright 122-3 can be configured to have different sizes and different areas.

[0131] In this case, the first planar portion 122-1a formed relatively close to the border region 130 can be formed to have the largest size and the widest area, and the third planar portion 122-3a formed closest to the second pattern region 123 can be formed to have the smallest size and the narrowest area.

[0132] Furthermore, the first pattern area 121 includes a first-1 upright 122-1 formed as a border RE1 of the virtual first square ring shape, a first-2 upright 122-2 formed as a border RE2 of the virtual second square ring shape, and a first-3 upright 122-3 formed as a border RE3 of the virtual third square ring shape. Simultaneously, when the first planar portion 122-1a formed at one end of the first-1 upright 122-1, the second planar portion 122-2a formed at one end of the first-2 upright 122-2, and the third planar portion 122-3a formed at one end of the first-3 upright 122-3 have different sizes and areas, only the first planar portion 122-1a, which is located relatively close to the border area 130, can have an overall area of ​​9... 2 The above-mentioned plane. That is, compared with the first plane portion 122-1a, the second plane portion 122-2a and the third plane portion 122-3a, which are formed at a position relatively far from the border region 130, can be formed with a total area of ​​9 2 The following plane.

[0133] Although embodiments of the present invention have been described, the concept of the present invention is not limited to the embodiments set forth in this specification. Those skilled in the art who understand the concept of the present invention can easily propose other embodiments by adding, changing, deleting, or adding constituent elements within the same scope of the concept, but these also fall within the scope of the present invention.

Claims

1. A deposition mask, comprising: A mask body includes a first surface into which organic matter deposited on a substrate is introduced and a second surface opposite to the first surface, and is formed as a plate with a predetermined area. A patterned area, which forms a predetermined area on the mask body, so that the organic material can pass through from the first surface to the second surface; as well as A border area, configured to surround the outer side of the pattern area. The pattern area includes a first pattern area, a second pattern area, and a rib area. The first pattern area is disposed adjacent to and along the border area, and the second pattern area is disposed inside the first pattern area. The dividing rib area is formed between the first pattern area and the second pattern area to surround the second pattern area, thereby enabling the distinction between the first pattern area and the second pattern area. The first pattern area includes multiple first large face holes, multiple first small face holes, multiple first through holes, first ribs, second ribs, and multiple first upright rods. The plurality of first large faces are formed on the first surface, and the plurality of first small faces are formed on the second surface at positions corresponding to the plurality of first large faces. The plurality of first through holes are formed by the plurality of first large faces and the plurality of first small faces overlapping each other and penetrating the mask body. The first rib is formed on the first surface along a first direction and located between the plurality of first through holes. The second rib is formed on the first surface along a second direction intersecting the first direction and located between the plurality of first through holes. The plurality of first uprights are respectively formed on the first surface at positions where the first rib and the second rib intersect each other. The second pattern area includes multiple second large face holes, multiple second small face holes, multiple second through holes, a third rib, a fourth rib, and multiple second uprights. The plurality of second large faces are formed on the first surface, and the plurality of second small faces are formed on the second surface at positions corresponding to the plurality of second large faces. The plurality of second through holes are formed by the plurality of second large faces and the plurality of second small faces overlapping each other and penetrating the mask body. The third rib is formed on the first surface along a first direction and located between the plurality of second through holes. The fourth rib is formed on the first surface along a second direction intersecting the first direction and located between the plurality of second through holes. The plurality of second uprights are respectively formed on the first surface at positions where the third rib and the fourth rib intersect each other. Each of the plurality of first uprights includes a planar portion, the planar portion being formed at one end and having a predetermined area. Each of the plurality of second uprights is formed such that one end does not form a plane and has a sharp shape.

2. The deposition mask according to claim 1, wherein, The thickness of the portion of the mask body in which the planar portion is formed is the same as the thickness of the portion of the mask body in which the border region is formed.

3. The deposition mask according to claim 1, wherein, The planar portion is formed with an area of ​​9 2 The plane above.

4. The deposition mask according to claim 1, wherein, The thickness of the portion of the mask body where the second upright is formed is less than the thickness of the portion of the mask body where the border area is formed.

5. The deposition mask according to claim 1, wherein, The zoning rib region includes a first zoning rib, a second zoning rib, and multiple third uprights. The first dividing rib is formed on the first surface along a first direction and is located between a first through hole and a second through hole arranged adjacent to each other along a second direction. The second dividing rib is formed on the first surface along the second direction and is located between a first through hole and a second through hole arranged adjacent to each other along the first direction. The plurality of third uprights are formed on the first surface at intervals along the first dividing rib and the second dividing rib. The plurality of third uprights are each formed at the intersection of the second or fourth rib and the first dividing rib, or at the intersection of the first or third rib and the second dividing rib. Each of the plurality of third uprights is formed with one end that does not form a plane and has a sharp shape.

6. The deposition mask according to claim 5, wherein, The thickness of the portion of the mask body where the third upright is formed is less than the thickness of the portion of the mask body where the border area is formed.

7. The deposition mask according to claim 1, wherein, The plurality of first uprights includes a plurality of first-1 uprights and a plurality of first-2 uprights. The plurality of first-1 uprights are located between two adjacent first through holes and are spaced apart along a virtual first square annular frame. The plurality of first-2 uprights are located between two adjacent first through holes and are spaced apart along a virtual second square annular frame disposed inside the virtual first square annular frame.

8. The deposition mask according to claim 7, wherein, The area of ​​the first planar portion formed at one end of the first-1 upright rod and having a predetermined area is larger than the area of ​​the second planar portion formed at one end of the first-2 upright rod and having a predetermined area.

9. The deposition mask according to claim 7, wherein, The plurality of first uprights also includes a plurality of first-3 uprights. The plurality of first-3 uprights are located between two adjacent first through holes and are spaced apart along a virtual third-shaped annular frame disposed inside the virtual second square annular frame. The area of ​​the first planar portion formed at one end of the first-1 upright rod and having a predetermined area is larger than the area of ​​the second planar portion formed at one end of the first-2 upright rod and having a predetermined area. The area of ​​the second planar portion formed at one end of the first-2 uprights and having a predetermined area is larger than the area of ​​the third planar portion formed at one end of the first-3 uprights and having a predetermined area.

10. The deposition mask according to claim 1, wherein, The border area is the portion of the mask body that was not etched by the etching solution.

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