Precursor pipeline and thin film deposition system

By installing a flow regulating device in the precursor pipeline, the problems of difficult needle valve regulation and pressure deviation risk are solved, achieving higher flow limiting capability and better sealing performance, thus improving the process effect of the thin film deposition system.

CN122303842APending Publication Date: 2026-06-30JIANGSU MICROVIA NANO EQUIP TECH CO LTD
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Patent Information

Application Number
CN202411999731.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-31
Publication Date
2026-06-30

AI Technical Summary

Technical Problem

In the existing technology, the needle valve of the precursor pipeline is difficult to adjust and there is a risk of pressure deviation, making it difficult to meet the flow restriction requirements of high vapor pressure.

Method used

A flow regulating device is installed between the inlet end of the precursor pipeline and the needle valve. The device includes a main body, a tubular joint, a locking nut, a stepped seal, and a sealing ring, forming a nested sealing structure to reduce the pressure of the precursor when it reaches the needle valve and improve the opening degree and sealing performance of the needle valve.

Benefits of technology

This reduces the difficulty of adjusting the needle valve and the risk of pressure deviation, while improving the control difficulty and process effect of the thin film deposition system.

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Abstract

The invention discloses a precursor pipeline and a thin film deposition system, and relates to the field of semiconductor equipment. The precursor pipeline comprises a pipe body, a flow adjusting device and a needle valve, and the pipe body is provided with an input end used for being connected with a precursor source and an output end used for being connected with a reaction cavity. The flow adjusting device and the needle valve are both arranged on the pipe body, and the flow adjusting device is located between the input end and the needle valve. According to the precursor pipeline, the needle valve adjusting difficulty and the pressure deviation risk can be reduced.
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