Organic waste gas treatment device for semiconductor production
By using a zeolite rotor device and pretreatment mechanism in semiconductor production, the humidity sensitivity and safety risks of activated carbon adsorption method have been solved, enabling continuous and automated treatment of waste gas and improving the treatment efficiency and quality of VOCs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU HUNTER ENVIRONMENTAL PROTECTION ENG CO LTD
- Filing Date
- 2026-05-15
- Publication Date
- 2026-07-17
AI Technical Summary
In existing technologies, activated carbon adsorption for treating organic waste gas from semiconductor manufacturing is susceptible to humidity sensitivity, hazardous waste generation, and safety risks, resulting in poor treatment quality.
A zeolite rotor device is used to adjust the state of the exhaust gas through a pretreatment mechanism. The zeolite molecular sieve is used to efficiently adsorb VOCs, and the exhaust gas is continuously and uninterruptedly treated through a drive component. Combined with cooling and temperature control, the adsorption effect is optimized.
It enables continuous and uninterrupted adsorption treatment of waste gas, improves VOCs treatment efficiency and quality, reduces manual intervention, and enhances the stability and automation of the treatment process.
Smart Images
Figure CN122399508A_ABST