A gas ion source preparation device for polymorphic samples

Abstract

This invention provides a gas ion source preparation device for multi-form samples, comprising a multi-form sample introduction device, a first separation cold trap for separating water vapor, a second separation cold trap for separating carbon dioxide, a quantitative cold trap, and a collection cold trap. One end of the first separation cold trap is connected to the multi-form sample introduction device, the other end of the first separation cold trap is connected to one end of the second separation cold trap, the other end of the second separation cold trap is connected to one end of the quantitative cold trap, the other end of the quantitative cold trap is connected to one end of the collection cold trap, and the other end of the collection cold trap is connected to an ion source. The temperature of the first separation cold trap is lower than the boiling point of water vapor, and the temperature of the second separation cold trap is lower than the boiling point of carbon dioxide but higher than the boiling point of nitrogen. A tail gas outlet is connected between the collection cold trap and the quantitative cold trap. This invention combines low-temperature distillation and multi-form carbon redox technology to achieve the collection and purification of different forms of carbon in solid and gaseous samples.

Description

Technical Field

[0001] This invention relates to the field of gas ion source preparation device technology, and in particular to a gas ion source preparation device for multi-morphological samples. Background Technology

[0002] Gas ion sources are core components of many scientific instruments and industrial equipment (such as mass spectrometers, particle accelerators, and ion implanters). Their core function is to convert neutral gas molecules into positively or negatively charged ions, providing the initial ion beam for subsequent acceleration, focusing, and analysis. They have wide applications in mass spectrometry, particle implantation, surface treatment and modification, and basic scientific research. Depending on the specific application, gas ion sources require different types of high-purity gases. Carbon dioxide (CO2) gas ion sources use carbon dioxide as the gas source, converting carbon dioxide molecules into charged ion beams, playing a crucial role in monitoring C-14 in accelerator mass spectrometry environments. By coupling a CO2 gas ion source with a positive ion accelerator mass spectrometer, the time-consuming and laborious graphitization process in traditional accelerator mass spectrometry measurements can be eliminated, saving more than 50% of the time. Simultaneously, the highly integrated process significantly reduces the possibility of sample contamination. Furthermore, due to the unique property of CO2 gas ion sources in generating mixed carbon and oxygen ion beams, they play an irreplaceable role in multiple fields such as material surface modification, thin film preparation, semiconductor process research, and environmental monitoring.

[0003] Currently, most carbon dioxide purification systems used in environmental monitoring are designed independently by laboratories. These devices are mainly designed for gas samples, and most of them only separate carbon dioxide from the sample, ignoring other forms of carbon in the sample.

[0004] Therefore, existing technologies need to be improved and enhanced. Summary of the Invention

[0005] In view of the shortcomings of the prior art, the present invention provides a gas ion source preparation device for multi-form samples. It combines low-temperature distillation and multi-form carbon redox technology to achieve the collection and purification of different forms of carbon in solid and gaseous samples.

[0006] To achieve the above objectives, the present invention adopts the following technical solution: A gas ion source preparation device for multi-form samples includes a multi-form sample introduction device, a first separation cold trap for separating water vapor, a second separation cold trap for separating carbon dioxide, a quantitative cold trap, and a collection cold trap. One end of the first separation cold trap is connected to the multi-form sample introduction device, the other end of the first separation cold trap is connected to one end of the second separation cold trap, the other end of the second separation cold trap is connected to one end of the collection cold trap, and the other end of the collection cold trap is connected to an ion source. The temperature of the second separation cold trap is lower than the temperature of the first separation cold trap. The temperature of the first separation cold trap is lower than the boiling point of water vapor, and the temperature of the second separation cold trap is lower than the boiling point of carbon dioxide and higher than the boiling point of nitrogen. A tail gas outlet discharge device is connected between the collection cold trap and the quantitative cold trap.

[0007] Furthermore, the polymorphic sample injection device includes a solid sample injection device, a full carbon sample injection device, and a carbon dioxide sample injection device. One end of the solid sample injection device, the full carbon sample injection device, and the carbon dioxide sample injection device are connected to one end of the first separation cold trap via a four-way connector.

[0008] Furthermore, a first mass flow controller is provided between the four-way connector and the first separation cold trap, a vacuum dry pump is provided between the collecting cold trap and the ion source, and a second mass flow controller is provided between the ion source and the vacuum dry pump.

[0009] Furthermore, a first vacuum baffle valve, a second vacuum baffle valve, and a third vacuum baffle valve are respectively installed between the four-way connector and the first separating cold trap, between the first separating cold trap and the second separating cold trap, and between the second separating cold trap and the quantitative cold trap. A fourth vacuum baffle valve and a fifth vacuum baffle valve are also installed between the quantitative cold trap and the collecting cold trap. One end of the fourth vacuum baffle valve is connected to the quantitative cold trap, and one end of the fifth vacuum baffle valve is connected to the collecting cold trap. The other end of the fourth vacuum baffle valve and the other end of the fifth vacuum baffle valve are connected to a sixth vacuum baffle valve. The other end of the sixth vacuum baffle valve is connected to the exhaust gas outlet discharge device through a three-way valve.

[0010] Furthermore, a seventh vacuum baffle valve is also provided between the cold trap and the vacuum dry pump.

[0011] Furthermore, the first separation cold trap includes a first glass tube and a first cold trap pool, and the second separation cold trap includes a second glass tube and a second cold trap pool. The first glass tube and the second glass tube are respectively movably disposed in the first cold trap pool and the second cold trap pool. One end of the first glass tube is connected to the first vacuum baffle valve, and the other end of the first glass tube is connected to the second vacuum glass tube through the second vacuum baffle valve.

[0012] Furthermore, the first cold trap is a semiconductor cold trap with a temperature of -70°C, and the second cold trap is a liquid nitrogen-alcohol cold trap with a temperature of -190°C.

[0013] Furthermore, a first vacuum gauge is provided between the first glass tube and the second vacuum baffle valve, and a second vacuum gauge is provided between the second glass tube and the third vacuum baffle valve.

[0014] Furthermore, the quantitative cold trap includes a first stainless steel container and a quantitative pool, and the collection cold trap includes a second stainless steel container and a collection pool. The first stainless steel container and the second stainless steel container are respectively movably disposed in the quantitative pool and the collection pool. The two sides of the first stainless steel container are respectively connected to the third vacuum baffle valve and the fourth vacuum baffle valve, and the two sides of the second stainless steel container are respectively connected to the fifth vacuum baffle valve and the seventh vacuum baffle valve.

[0015] Furthermore, a third vacuum gauge and a fourth vacuum gauge are respectively installed on the first stainless steel container and the second stainless steel container.

[0016] Compared to existing technologies, the gas ion source preparation device for multi-form samples provided by this invention includes a multi-form sample introduction device, a first separation cold trap for separating water vapor, a second separation cold trap for separating carbon dioxide, a quantitative cold trap, and a collection cold trap. One end of the first separation cold trap is connected to the multi-form sample introduction device, the other end of the first separation cold trap is connected to one end of the second separation cold trap, the other end of the second separation cold trap is connected to the quantitative cold trap, the other end of the quantitative cold trap is connected to one end of the collection cold trap, and the other end of the collection cold trap is connected to an ion source. The temperature of the second separation cold trap is lower than the temperature of the first separation cold trap. The temperature of the first separation cold trap is lower than the boiling point of water vapor, and the temperature of the second separation cold trap is lower than the boiling point of carbon dioxide but higher than the boiling point of nitrogen. A tail gas outlet discharge device is connected between the collection cold trap and the quantitative cold trap. With this invention, the temperature of the second separation cold trap is lower than that of the first separation cold trap, enabling the collection and purification of different forms of carbon in solid and gaseous samples by combining low-temperature distillation and multi-form carbon oxidation-reduction technology. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the gas ion source preparation device for multi-morphological samples provided by the present invention.

[0019] Explanation of reference numerals in the attached diagram: Multi-form sample introduction device - 1, First separation cold trap - 2, Second separation cold trap - 3, Quantitative cold trap - 4, Collection cold trap - 5, Ion source - 6, Tail gas outlet discharge device - 7, Solid sample introduction device - 8, Full carbon sample introduction device - 9, Carbon dioxide sample introduction device - 10, Four-way connector - 11, First mass flow controller - 12, Vacuum dry pump - 13, Second mass flow controller - 14, First vacuum baffle valve - 15, Second vacuum baffle valve - 16, Third vacuum baffle valve - 17. Fourth vacuum baffle valve - 18. Fifth vacuum baffle valve - 19. Sixth vacuum baffle valve - 20. Three-way valve - 21. Seventh vacuum baffle valve - 22. First glass tube - 23. First cold trap - 24. Second glass tube - 25. Second cold trap - 26. First vacuum gauge - 27. Second vacuum gauge - 28. First stainless steel container - 29. Metering cell - 30. Second stainless steel container - 31. Collection cell - 32. Third vacuum gauge - 33. Fourth vacuum gauge - 34. Vacuum pump - 35. Detailed Implementation

[0020] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings, which illustrate embodiments of the present application. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of this application will be thorough and complete.

[0021] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0022] In this invention, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this invention and its embodiments, and are not intended to limit the indicated devices, elements, or components to having a specific orientation, or to require them to be constructed and operated in a specific orientation. Furthermore, some of the aforementioned terms may have other meanings besides indicating orientation or positional relationship; for example, the term "upper" may in some cases indicate a dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this invention according to the specific circumstances.

[0023] Furthermore, the terms “first” and “second” as used herein may be used to describe various elements, but these elements are not limited by these terms. These terms are used only to distinguish one element from another. When used herein, the singular forms “a,” “an,” and “the” may also include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising / including” or “having” specify the presence of the stated features, integrals, steps, operations, components, parts, or combinations thereof, but do not preclude the possibility of the presence or addition of one or more other features, integrals, steps, operations, components, parts, or combinations thereof.

[0024] It should be noted that when a component is said to be "fixed to" another component, it can be directly attached to the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0025] Furthermore, the technical solutions of the various embodiments can be combined with each other, but only if they are feasible for those skilled in the art. If the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such combination of technical solutions does not exist and is not within the scope of protection claimed by this invention.

[0026] like Figure 1As shown, the gas ion source 6 preparation device for multi-form samples provided by the present invention includes a multi-form sample introduction device 1, a first separation cold trap 2 for separating water vapor, a second separation cold trap 3 for separating carbon dioxide, a quantitative cold trap 4, and a collection cold trap 5. One end of the first separation cold trap 2 is connected to the multi-form sample introduction device, and the other end of the first separation cold trap 2 is connected to one end of the second separation cold trap 3. The other end of the second separation cold trap 3 is connected to the quantitative cold trap 4, and the other end of the quantitative cold trap 4 is connected to one end of the collection cold trap 5. The other end of the collection cold trap 5 is connected to an ion source 6. The temperature of the second separation cold trap 3 is lower than the temperature of the first separation cold trap 2. The temperature of the first separation cold trap 2 is lower than the boiling point of water vapor, and the temperature of the second separation cold trap 3 is lower than the boiling point of carbon dioxide and higher than the boiling point of nitrogen. A tail gas outlet discharge device 7 is connected between the collection cold trap 5 and the quantitative cold trap 4.

[0027] It should be noted that the temperature of the first separation cold trap 2 is lower than the boiling point of water vapor. Samples with various carbon forms can have their carbon separated by the multi-form sample introduction device. Because the temperature is lower than the boiling point of water vapor, impurities such as water vapor in the sample are fixed in the first separation cold trap 2. That is, carbon dioxide and nitrogen can be transported to the second separation cold trap 3. The temperature of the second separation cold trap 3 is lower than the temperature of the first separation cold trap 2, and the temperature of the second separation cold trap 3 is lower than the boiling point of carbon dioxide but higher than the boiling point of nitrogen. Therefore, carbon dioxide in the gas sample will solidify in the second separation cold trap 3, while nitrogen in the sample will smoothly enter the exhaust outlet device 7, thus achieving the separation of carbon dioxide in the sample. A valve can be installed in the pipeline and switched to allow nitrogen to flow smoothly to the exhaust outlet device.

[0028] It is understood that by installing valves in the pipeline, the volume of carbon dioxide in the second separation cold trap 3 can be measured through the quantitative cold trap 4, and the carbon dioxide can be collected through the collection cold trap 5. By controlling the temperature of the quantitative cold trap 4 and the collection cold trap 5, the state of carbon dioxide in the pipeline is changed, allowing carbon dioxide to move from the quantitative cold trap 4 to the collection cold trap 5, and finally be collected in the ion source 6.

[0029] Compared with the prior art, in the technical solution of the present invention, the temperature of the second separation cold trap 3 is lower than the temperature of the first separation cold trap 2, the temperature of the first separation cold trap 2 is lower than the boiling point of water vapor, and the temperature of the second separation cold trap 3 is lower than the boiling point of carbon dioxide and higher than the boiling point of nitrogen. It can combine low temperature distillation and multi-form carbon oxidation-reduction technology to realize the collection and purification of carbon in different forms in solid samples and gas samples.

[0030] Furthermore, the polymorphic sample injection device includes a solid sample injection device 8, a full carbon sample injection device 9, and a carbon dioxide sample injection device 10. One end of the solid sample injection device 8, the full carbon sample injection device 9, and the carbon dioxide sample injection device 10 is connected to one end of the first separation cold trap 2 via a four-way connector 11.

[0031] The multi-morphological sample introduction device 1 has three operating modes: The solid sample introduction device 8 includes a vertical oxidation furnace, which oxidizes all forms of carbon in the solid sample and then purifies and collects it. In this mode, the solid sample enters the device through the vertical oxidation furnace. All forms of carbon in the sample are oxidized into carbon dioxide in the vertical oxidation furnace, and nitrogen is reduced into nitrogen gas, which is then introduced into the purification gas path at the back end.

[0032] The full carbon sample inlet device 9 oxidizes all forms of carbon in the gas sample and then purifies and collects it. In this mode, the gas sample enters the device through the gas oxidation furnace of the carbon dioxide sample inlet device 10. In the oxidation furnace, all forms of carbon in the sample are oxidized into carbon dioxide and then introduced into the back-end purification gas path.

[0033] Carbon dioxide sample inlet device 10: only purifies and collects carbon dioxide from the gas sample. In this mode, the gas sample directly enters the device through the carbon dioxide sample inlet of the full carbon sample inlet device 9, and the carbon dioxide in the sample is separated and purified after passing through the downstream purification gas path.

[0034] Furthermore, a first mass flow controller 12 is provided between the four-way connector 11 and the first separating cold trap 2, a vacuum dry pump 13 is provided between the collecting cold trap 5 and the ion source 6, and a second mass flow controller 14 is provided between the ion source 6 and the vacuum dry pump 13. The first mass flow controller 12 and the second mass flow controller 14 can respectively detect the flow rate passing through the locations of the first mass flow controller 12 and the second mass flow controller 14.

[0035] Furthermore, a first vacuum baffle valve 15, a second vacuum baffle valve 16, and a third vacuum baffle valve 17 are respectively installed between the four-way connector 11 and the first separation cold trap 2, between the first separation cold trap 2 and the second separation cold trap 3, and between the second separation cold trap 3 and the quantitative cold trap 4. A fourth vacuum baffle valve 18 and a fifth vacuum baffle valve 19 are also installed between the quantitative cold trap 4 and the collection cold trap 5. One end of the fourth vacuum baffle valve 18 is connected to the quantitative cold trap 4, and one end of the fifth vacuum baffle valve 19 is connected to the collection cold trap 5. The other ends of the fourth vacuum baffle valve 18 and the fifth vacuum baffle valve 19 are connected to a sixth vacuum baffle valve 20. The other end of the sixth vacuum baffle valve 20 is connected to the exhaust gas outlet device 7 through a three-way valve 21. By opening and closing different sections of the gas path through each vacuum baffle valve, the gas in the gas path can be guided to different sections as needed, thereby achieving the purification effect.

[0036] Furthermore, a seventh vacuum baffle valve 22 is provided between the cold trap 5 and the vacuum dry pump 13. The seventh vacuum baffle valve 22 can cut off and open the path of carbon dioxide to the ion source 6, thereby facilitating the introduction of purified carbon dioxide into the ion source 6.

[0037] Furthermore, the first separation cold trap 2 includes a first glass tube 23 and a first cold trap pool 24, and the second separation cold trap 3 includes a second glass tube 25 and a second cold trap pool 26. The first glass tube 23 and the second glass tube 25 are respectively movably disposed in the first cold trap pool 24 and the second cold trap pool 26. One end of the first glass tube 23 is connected to the first vacuum baffle valve 15, and the other end of the first glass tube 23 is connected to the second vacuum glass tube through the second vacuum baffle valve 16. By lowering the first cold trap pool 24 and the second cold trap pool 26, the first glass tube 23 and the second glass tube 25 are removed from the first cold trap pool 24 and the second cold trap pool 26, causing the temperature of the first glass tube 23 and the second glass tube 25 to rise. This achieves temperature control of the first glass tube 23 and the second glass tube 25, thereby filtering the gas in the gas path and purifying carbon dioxide.

[0038] Furthermore, the first cold trap 24 is a semiconductor cold trap with a temperature of -70°C, and the second cold trap 26 is a liquid nitrogen-alcohol cold trap with a temperature of -190°C. It should be noted that the temperature of the first cold trap 24 is lower than the boiling point of water vapor, which can fix the water in the gas path. At this time, the carbon dioxide in the gas path can still flow smoothly through the second glass tube 25 into the second cold trap 26. Since the temperature of the second cold trap 26 is -190°C, titanium dioxide can be solidified in the second glass tube 25, thus achieving the separation of water and carbon dioxide in the gas path. Other impurities are discharged through the exhaust outlet device 7.

[0039] Furthermore, a first vacuum gauge 27 is installed between the first glass tube 23 and the second vacuum baffle valve 16, and a second vacuum gauge 28 is installed between the second glass tube 25 and the third vacuum baffle valve 17. The first vacuum gauge 27 and the second vacuum gauge 28 can be used to detect whether there is any leakage in the gas path. If there is a leakage in the device, the leakage point can be checked segment by segment by adjusting the opening and closing of each vacuum baffle valve and observing the vacuum level of the first vacuum gauge 27 and the second vacuum gauge 28.

[0040] Further, the quantitative cold trap 4 includes a first stainless steel container 29 and a quantitative cell 30, and the collection cold trap 5 includes a second stainless steel container 31 and a collection cell 32. The first stainless steel container 29 and the second stainless steel container 31 are respectively movably disposed in the quantitative cell 30 and the collection cell 32. The two sides of the first stainless steel container 29 are respectively connected to the third vacuum baffle valve 17 and the fourth vacuum baffle valve 18, and the two sides of the second stainless steel container 31 are respectively connected to the fifth vacuum baffle valve 19 and the seventh vacuum baffle valve 22. It can be understood that the temperature of the first stainless steel container 30 and the second stainless steel container 31 is controlled by moving the quantitative cell 30 and the collection cell 32 up and down. Given the container volume V (i.e., gas volume), the gas pressure P inside the container, and the temperature T, the amount of carbon dioxide n inside the container can be calculated using the ideal gas law (PV=nRT). The temperature of the quantitative cell 30 and the collection cell 32 is controlled at -190°C for collecting the CO2 separated from the sample. The quantitative pool 30 and the collection pool 32 are liquid nitrogen-alcohol pools, that is, the pools are filled with liquid nitrogen and alcohol.

[0041] Once the quantitative cold trap 4 has calculated the volume of carbon dioxide, the temperature of the stainless steel container can be increased by lowering the first quantitative pool 30, thereby allowing carbon dioxide to flow into the collection cold trap 5. Finally, the carbon dioxide in the collection cold trap 5 can flow into the ion source 6 by lowering the second collection pool 32.

[0042] Furthermore, a third vacuum gauge 33 and a fourth vacuum gauge 34 are respectively provided on the first stainless steel container 29 and the second stainless steel container 31, which are used to measure the air pressure in the first stainless steel container 29 and the second stainless steel container 31, respectively.

[0043] It should be noted that the three-way valve 21 is connected to a vacuum pump 35. Before sample processing, all the above-mentioned vacuum baffle valves are opened, and the three-way valve 21 is adjusted to the direction of the vacuum pump 35. The vacuum pump 35 is then used to evacuate the entire system.

[0044] In summary, the gas ion source preparation device for multi-form samples provided by this invention allows the first and second mass flow controllers to detect the flow rate at their respective locations. Vacuum baffle valves can open and close different sections of the gas path, thereby guiding the gas flow and ensuring it flows to different sections as needed, achieving purification. Furthermore, the temperature of the second separation cold trap is lower than that of the first separation cold trap. The temperature of the first separation cold trap is lower than the boiling point of water vapor, and the temperature of the second separation cold trap is lower than the boiling point of carbon dioxide but higher than the boiling point of nitrogen. This combination of low-temperature distillation and multi-form carbon oxidation-reduction technology enables the collection and purification of different forms of carbon in solid and gaseous samples.

[0045] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of the present invention without departing from the spirit and scope of the claims. All of these forms are within the scope of protection of the present invention.

Claims

1. A gas ion source preparation device for multi-form samples, characterized in that, The device includes a multi-form sample introduction device (1), a first separation cold trap (2) for separating water vapor, a second separation cold trap (3) for separating carbon dioxide, a quantitative cold trap (4), and a collection cold trap (5). One end of the first separation cold trap (2) is connected to the multi-form sample introduction device (1), and the other end of the first separation cold trap (2) is connected to one end of the second separation cold trap (2). The other end of the second separation cold trap (2) is connected to one end of the collection cold trap (5). The other end of the collection cold trap (5) is connected to an ion source (6). The temperature of the second separation cold trap (3) is lower than the temperature of the first separation cold trap (2). The temperature of the first separation cold trap (2) is lower than the boiling point of water vapor. The temperature of the second separation cold trap (3) is lower than the boiling point of carbon dioxide and higher than the boiling point of nitrogen. A tail gas outlet discharge device (7) is connected between the collection cold trap (5) and the quantitative cold trap (4).

2. The gas ion source preparation device for multi-morphological samples according to claim 1, characterized in that, The multi-shaped sample injection device includes a solid sample injection device (8), a full carbon sample injection device (9), and a carbon dioxide sample injection device (10). One end of the solid sample injection device (8), the full carbon sample injection device (9), and the carbon dioxide sample injection device (10) is connected to one end of the first separation cold trap (2) through a four-way connector (11).

3. The gas ion source preparation device for multi-morphological samples according to claim 2, characterized in that, A first mass flow controller (12) is provided between the four-way connector (11) and the first separation cold trap (2), a vacuum dry pump (13) is provided between the collection cold trap (5) and the ion source (6), and a second mass flow controller (14) is provided between the ion source (6) and the vacuum dry pump (13).

4. The gas ion source preparation device for multi-morphological samples according to claim 3, characterized in that, A first vacuum baffle valve (15), a second vacuum baffle valve (16), and a third vacuum baffle valve (17) are respectively provided between the four-way connector (11) and the first separation cold trap (2), between the first separation cold trap (2) and the second separation cold trap (3), and between the second separation cold trap (3) and the quantitative cold trap (4). A fourth vacuum baffle valve (18) and a fifth vacuum baffle valve (19) are also provided between the quantitative cold trap (4) and the collecting cold trap (5). One end of the fourth vacuum baffle valve (18) is connected to the quantitative cold trap (4), and one end of the fifth vacuum baffle valve (19) is connected to the collecting cold trap (5). The other end of the fourth vacuum baffle valve (18) and the other end of the fifth vacuum baffle valve (19) are connected to a sixth vacuum baffle valve (20). The other end of the sixth vacuum baffle valve (20) is connected to the exhaust gas outlet discharge device (7) through a three-way valve (21).

5. The gas ion source preparation device for multi-morphological samples according to claim 4, characterized in that, A seventh vacuum baffle valve (22) is also provided between the cold trap (5) and the vacuum dry pump (13).

6. The gas ion source preparation apparatus for multi-morphological samples according to claim 4, characterized in that, The first separation cold trap (2) includes a first glass tube (23) and a first cold trap pool (24), and the second separation cold trap (3) includes a second glass tube (25) and a second cold trap pool (26). The first glass tube (23) and the second glass tube (25) are respectively movably disposed in the first cold trap pool (24) and the second cold trap pool (26). One end of the first glass tube (23) is connected to the first vacuum baffle valve (15), and the other end of the first glass tube (23) is connected to the second vacuum glass tube through the second vacuum baffle valve (16).

7. The gas ion source preparation apparatus for multi-morphological samples according to claim 6, characterized in that, The first cold trap (24) is a semiconductor cold trap with a temperature of -70°C. The second cold trap (26) is a liquid nitrogen-alcohol cold trap with a temperature of -190°C.

8. The gas ion source preparation apparatus for multi-morphological samples according to claim 6, characterized in that, A first vacuum gauge (27) is provided between the first glass tube (23) and the second vacuum baffle valve (16), and a second vacuum gauge (28) is provided between the second glass tube (25) and the third vacuum baffle valve (17).

9. The gas ion source preparation apparatus for multi-morphological samples according to claim 5, characterized in that, The quantitative cold trap (4) includes a first stainless steel container (29) and a quantitative pool (30), and the collection cold trap (5) includes a second stainless steel container (31) and a collection pool (32). The first stainless steel container (29) and the second stainless steel container (31) are respectively movably disposed in the quantitative pool (30) and the collection pool (32). The two sides of the first stainless steel container (29) are respectively connected to the third vacuum baffle valve (17) and the fourth vacuum baffle valve (18), and the two sides of the second stainless steel container (31) are respectively connected to the fifth vacuum baffle valve (19) and the seventh vacuum baffle valve (22).

10. The gas ion source preparation apparatus for multi-morphological samples according to claim 9, characterized in that, A third vacuum gauge (33) and a fourth vacuum gauge (34) are respectively provided on the first stainless steel container (29) and the second stainless steel container (31).

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