Method and apparatus for generating 3D digital pattern, electronic device and storage medium

Abstract

The one or more embodiments of the specification provide a 3D digital pattern generation method, device, electronic equipment and storage medium. The method comprises: in response to a pattern designation operation, obtaining a designated 2D pattern and determining a corresponding pattern coverage area; determining a target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm; and generating a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm, wherein the 3D digital pattern has the target material. The method can improve the generation quality and efficiency of the 3D digital pattern, and improve the reusability of the 2D pattern.

Description

Technical Field

[0001] This specification relates to one or more embodiments in the field of three-dimensional modeling technology, and more particularly to a method, apparatus, electronic device and storage medium for generating 3D digital patterns. Background Technology

[0002] In the field of 3D (3D) modeling, 3D digital patterns are typically generated for use in film and television presentations, marketing displays, and other business scenarios. Taking 3D digital apparel as an example, in industries such as film and fashion, users often need to view the display effect of 3D digital patterns to make quick decisions; therefore, obtaining a high-quality 3D digital pattern quickly is crucial. 3D digital patterns usually consist of a pattern draft and pattern processing. The pattern draft refers to a 2D planar pattern, including lines and color information, but it does not contain 3D features. Pattern processing is the reproduction of the manufacturing processes used in the real world to achieve various visual effects such as embossing and gloss in the pattern.

[0003] In related technologies, image editing tools such as Substance and Photoshop are typically used to create 3D texture maps, including texture maps, normal maps, and roughness maps, based on pattern drafts to achieve 3D simulation effects. However, because the pattern process is highly matched to the pattern draft, this method has poor reusability; a set of 3D texture maps generated using the same pattern process cannot be applied in batches to different pattern drafts. Therefore, related technical solutions pre-create several standard 3D texture maps for reuse in different projects. However, when reused, these standard 3D texture maps often fail to perfectly match the input 2D pattern, thus requiring manual modification of texture size, boundaries, angles, etc. This not only involves complex operational logic but also demands a high degree of precision and experience, resulting in low efficiency in generating 3D digital patterns. Furthermore, the quality of manually generated 3D digital patterns is unstable and urgently needs improvement. Summary of the Invention

[0004] In view of the above, one or more embodiments of this specification provide the following technical solutions:

[0005] According to a first aspect of one or more embodiments of this specification, a method for generating a 3D digital pattern is provided, comprising: in response to a pattern designation operation, acquiring a designated 2D pattern and determining a corresponding pattern coverage area;

[0006] Determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm;

[0007] The target process simulation algorithm is used to generate a 3D digital pattern that matches the pattern coverage area, and the 3D digital pattern has the target material.

[0008] According to a second aspect of one or more embodiments of this specification, a 3D digital pattern generation apparatus is provided, comprising: a region determination unit, configured to, in response to a pattern designation operation, acquire a designated 2D pattern and determine a corresponding pattern coverage area;

[0009] A process determination unit is used to determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm.

[0010] A pattern generation unit is used to generate a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm, wherein the 3D digital pattern has the target material.

[0011] According to a third aspect of one or more embodiments of this specification, an electronic device is provided, comprising: a processor; a memory for storing processor-executable instructions; wherein the processor performs the steps of the method as described in the first aspect by executing the executable instructions.

[0012] According to a fourth aspect of one or more embodiments of this specification, a computer-readable storage medium is provided that stores computer instructions thereon, which, when executed by a processor, implement the steps of the method as described in the first aspect.

[0013] According to a fifth aspect of one or more embodiments of this specification, a computer program product is provided, comprising a computer program / instructions that, when executed by a processor, implement the steps of the method as described in the first aspect.

[0014] As can be seen from the above embodiments, this solution obtains the specified 2D pattern and determines the corresponding pattern coverage area, as well as the target material and its corresponding at least one target basic manufacturing process. Then, it uses the target process simulation algorithm of each target basic manufacturing process to generate a 3D digital pattern that matches the pattern coverage area, so as to ensure that the 3D digital pattern has the target material.

[0015] Understandably, this solution breaks down the target material into at least one target basic manufacturing process, and generates 3D digital patterns according to the target process simulation algorithm for each process, ultimately realizing the target material (i.e., achieving the corresponding pattern process). The execution process of each target process simulation algorithm follows the pattern coverage area of ​​the 2D pattern; therefore, the generated 3D digital pattern accurately corresponds to the pattern coverage area, eliminating the need for manual adjustment of geometric parameters such as the size, boundaries, and angles of the 3D digital pattern. Thus, this solution not only simplifies user operation logic but also automates and intelligently generates 3D digital patterns, thereby improving the efficiency and quality of 3D digital pattern generation. Attached Figure Description

[0016] Figure 1 This is a schematic diagram illustrating the effect of generating 33 using the relevant technical solution.

[0017] Figure 2 This is a schematic diagram of the architecture of a pattern generation system provided in an exemplary embodiment.

[0018] Figure 3 This is a flowchart of a method for generating 3D digital patterns provided in an exemplary embodiment.

[0019] Figure 4 This is an exemplary embodiment of a diagram showing the placement effect of a 2D pattern on a hat.

[0020] Figure 5 This is an exemplary embodiment of an embroidery technique.

[0021] Figure 6 This is a schematic diagram illustrating the effect of a cutting process provided in an exemplary embodiment.

[0022] Figure 7 This is a schematic diagram illustrating the effect of a thickness process provided in an exemplary embodiment.

[0023] Figure 8 This is a schematic diagram illustrating the effect of a fusion process provided in an exemplary embodiment.

[0024] Figure 9 This is an exemplary embodiment of a comparative diagram of the effects of an embroidery technique and related technologies.

[0025] Figure 10 This is a schematic diagram comparing the effects of a cutting process and related technologies provided in an exemplary embodiment.

[0026] Figure 11 This is a schematic diagram comparing the effects of a thickness process and related technologies provided in an exemplary embodiment.

[0027] Figure 12 This is a schematic diagram comparing the effects of a fusion process and related technologies provided in an exemplary embodiment.

[0028] Figure 13 This is a schematic diagram of a parameter configuration interface provided in an exemplary embodiment.

[0029] Figure 14 This is an exemplary embodiment of a diagram illustrating the effect of perspective adjustment.

[0030] Figure 15 This is a schematic diagram of the structure of a device provided in an exemplary embodiment.

[0031] Figure 16 This is a block diagram of a 3D digital pattern generation apparatus provided in an exemplary embodiment. Detailed Implementation

[0032] In related technologies, image editing tools such as Substance and Photoshop are typically used to create 3D texture maps, including texture maps, normal maps, and roughness maps, based on pattern drafts in order to achieve 3D simulation effects.

[0033] However, because the pattern processing technology is highly matched with the pattern artwork, this method has poor reusability. A set of 3D textures generated using the same pattern processing technology cannot be applied in batches to different pattern artworks. To improve reusability, related technical solutions pre-create several standard 3D textures for reuse in different projects. When reused, these standard 3D textures often cannot perfectly match the input 2D pattern, so it is often necessary to manually modify the texture size, boundaries, angles, etc. This not only makes the operation logic complex but also requires a high degree of precision and experience, resulting in low efficiency in generating 3D digital patterns. Furthermore, the quality of 3D digital patterns generated manually is unstable.

[0034] Taking embroidery as an example: Figure 1 As shown, 1a on the left is the standard 3D texture corresponding to the embroidery effect, and 1b on the right is a 3D digital pattern generated using the standard 3D texture through a texture scheme in related technologies. As can be seen from 1b, the matching effect between the texture (i.e., the embroidery thread trajectory) in the 3D digital pattern and the pattern shape (similar to the shape of the sun) is poor (e.g., the texture inside the circle is asymmetrical), resulting in a low quality 3D digital pattern.

[0035] To address the technical problems existing in related technologies, this invention proposes a novel scheme for generating 3D digital patterns. This scheme involves breaking down the target material of the 3D digital pattern to be generated into at least one target basic manufacturing process, and generating the 3D digital pattern according to the corresponding target process simulation algorithm, thereby improving the generation efficiency and quality of 3D digital patterns.

[0036] Figure 2 This is a schematic diagram of the architecture of a pattern generation system provided in an exemplary embodiment. For example... Figure 2 As shown, the system may include a network 20, several servers, such as server 21 and server 2D diagrams; and several electronic devices, such as PCs (Personal Computers) 23, PC 24, and PC 25, etc. It should be noted that... Figure 2In order to illustrate the possible implementations of this solution as comprehensively as possible, the system shown includes the aforementioned multiple devices. In fact, the pattern generation system described in this invention may also include only any one electronic device, such as only the aforementioned PC23, etc. This is hereby stated.

[0037] Either server 21 or server 2D can be a physical server containing an independent host, or a virtual server hosted in a host cluster. During operation, the server can run server-side programs for a specific application to implement the application's related functions. For example, when server 21 runs a pattern generation service program, it can act as a server-side application for pattern generation, such as working with the client of the simulation service to provide pattern generation services to users. When server 2D runs a 3D modeling service program, it can act as a server-side application for 3D modeling, such as working with the client of the 3D modeling service to create the 3D model (e.g., a 3D clothing model), or publishing the generated 3D digital pattern (or a 3D clothing model containing the 3D digital pattern) to an associated platform (e.g., an e-commerce platform), etc., which will not be elaborated further.

[0038] PCs are only one type of electronic device that users can use. In reality, users can obviously also use electronic devices such as mobile phones, tablets, laptops, PDAs (Personal Digital Assistants), wearable devices (such as smart glasses, smartwatches, etc.), etc., and one or more embodiments in this specification do not limit this. During operation, the electronic device can run a client-side program of an application to implement the relevant functions of that application. For example, when any of the aforementioned PCs (such as PC23) runs a pattern generation service program, it can act as a client for that pattern generation service. The client application can be launched and run on PC23. The client-side program can be a native application installed on PC23, or it can be a mini program, quick app, or other similar form. Of course, when using web technologies such as HTML5, the relevant functions can be implemented through a browser-displayed page. This browser can be a standalone browser application or a browser module embedded in some applications.

[0039] It is worth noting that the aforementioned pattern generation service can be provided to users as a standalone service. For example, a standalone app for providing the pattern generation service can run on PC23, and this app can be used to implement the pattern generation scheme described in this invention. Alternatively, the aforementioned pattern generation service can also be integrated as a functional module / service module into other services / software. For example, clothing design software can run on PC23, and this clothing design software can integrate a pattern generation function. The functional components corresponding to this function can be used to implement the pattern generation scheme described in this invention, so that users can call the aforementioned pattern generation function to generate the required 3D digital patterns while using the clothing design software.

[0040] Furthermore, the 3D digital pattern described in this invention can be used to generate 3D models and applied to those models. The 3D model can be any model generated using 3D modeling technology. This model can consist of two types of data: mesh and texture, which together determine the model's visual effect and detail. The mesh provides the basic framework of the 3D model and can include vertices, edges, and / or faces, used to describe the three-dimensional geometric features of clothing (such as contours, folds, and shapes). The texture is a 2D (two-dimensional) image overlaid on the mesh surface, used to represent the model's color, pattern, material, and details, enhancing the model's realism and detail. Textures can be categorized by type, such as diffuse maps, normal maps, specular maps, bump maps, transparency maps, and ambient occlusion maps. In one embodiment, the 3D digital pattern described in this solution can be a 3D model. This solution involves the mesh and vertices of the 3D digital pattern: the process of generating the pattern requires calculating the mesh and texture data of the model.

[0041] Taking a 3D clothing model as an example, this solution can generate a corresponding 3D digital pattern based on the real pattern on the surface of real clothing. This 3D digital pattern can be applied to the surface of the 3D clothing model to simulate the presentation effect of the real pattern on the surface of the real clothing as realistically as possible. Of course, the 3D clothing model can be obtained by modeling the real clothing that has already been produced (post-production modeling) or by modeling the real clothing that has not yet been produced (i.e., modeling during the design phase). This specification does not limit this. Furthermore, any real clothing corresponding to the 3D clothing model can be wearable garments (such as hats, scarves, tops, pants, skirts, shoes, etc.) or wearable accessories (such as glasses, headphones, bows, watches, sleeves, knee pads, etc.).

[0042] Regarding the network 20 for interaction between electronic devices such as PC23 and the server's 2D patterns, communication can be implemented using either wired or wireless networks, based on the communication methods supported by the corresponding electronic devices. This specification does not impose any restrictions on this. For example, PC23 can support both wired and wireless communication simultaneously, so either wired or wireless network communication can be used as needed. Of course, any of the aforementioned PCs can also run offline. That is, the client of the pattern generation service can implement the pattern generation scheme described in this specification without interacting with the server of the pattern generation service, and can implement this scheme only through local processing logic and necessary user interaction, which will not be elaborated further.

[0043] Furthermore, the user described in the embodiments of this specification, i.e., the operator of the client of the pattern generation service, can be a 3D model designer, etc. The client can provide the user with a UMI (Human Machine Interface), so that the user can perform various operations described in the embodiments of this specification in the UMI to achieve interaction with the client.

[0044] Figure 3 This is a flowchart illustrating a method for generating a 3D digital pattern, provided in an exemplary embodiment. Regarding the execution entity of this method, from a software perspective, the method can be applied to the client of the aforementioned pattern generation service; from a hardware perspective, it can be applied to any electronic device running the client (such as the aforementioned PC23, etc.); of course, from a software perspective, it can also be applied to the client and server of the aforementioned pattern generation service, and from a hardware perspective, it can also be applied to any electronic device running the client and a server running the server, etc.

[0045] like Figure 3 As shown, the method may include the following steps 302-306.

[0046] Step 302: In response to the pattern specification operation, obtain the specified 2D pattern and determine the corresponding pattern coverage area.

[0047] In the pattern generation scheme described in this specification, 3D digital patterns need to be generated based on 2D patterns. Therefore, the user needs to specify a 2D pattern to the client first. Specifically, the user specifies the 2D pattern to the client by performing a pattern specification operation. For example, the client can display a "3D Pattern" control in the 3D model editing interface. If the user needs to generate a 3D digital pattern, they can trigger this control and perform the pattern specification operation in the subsequent pop-up pattern specification interface to specify a 2D pattern that meets the above requirements. This method allows the user to specify a 2D pattern according to actual needs, which facilitates fully meeting the user's modeling needs.

[0048] In one embodiment, the pattern designation operation can be a pattern upload operation, in which case the client can respond to the operation by receiving a 2D pattern uploaded by the user. The 2D pattern can be stored in the local storage space of the client's electronic device before being uploaded (i.e., the user can upload a local file as a 2D pattern); alternatively, the 2D pattern can also be stored on another device (such as the server where the server resides) before being uploaded, in which case the client can respond to the upload operation by receiving the 2D pattern from the other device.

[0049] In another embodiment, the pattern specification operation can also be a pattern selection operation. For example, the client can display at least one candidate pattern to the user (such as displaying a default pattern pre-stored by the client), allowing the user to perform a pattern selection operation based on their needs. The client can then determine the selected 2D pattern in response to this operation. Here, the candidate pattern is a 2D pattern, and once the user selects any candidate pattern, that pattern becomes the 2D image required by this solution.

[0050] It should be noted that the 2D pattern described in this solution can be represented in the form of an image. For example, the user can specify any image containing the pattern through the aforementioned pattern specification operation, and this pattern becomes the 2D pattern. Of course, to ensure the accuracy of subsequent processing, the image can adopt a special format, such as setting the pixels of the 2D pattern portion of the image to opaque, thus retaining all pixel values; while the background portion (i.e., the portion of the image other than the area where the 2D pattern is located) is uniformly set to fully transparent to avoid the background of the non-pattern portion interfering with subsequent processing.

[0051] In one embodiment, a user can place a specified 2D pattern on an appropriate location on a 3D model according to design requirements. For example, a user can perform a pattern placement operation on the 2D pattern, allowing the client to determine the pattern coverage area of ​​the placed 2D pattern on the 3D model in response to this operation. The pattern placement operation can include dragging, pulling, or snagging operations performed on the 2D pattern within the corresponding interface. It is understood that after placing the 2D pattern at a certain location on the 3D model, the pattern coverage area is at that location. Furthermore, given that the 3D model has corresponding three-dimensional coordinates in its spatial environment, while the 2D pattern is a planar image, it is also necessary to perform a snap-fit ​​process on the 2D pattern and the 3D model in response to the pattern placement operation, so that the 2D pattern can be snapped onto the surface of the placement location on the 3D digital pattern, thereby facilitating a more accurate determination of the pattern coverage area. It is understood that after placing the 2D pattern on the 3D clothing model, the determined pattern coverage area is the area within the three-dimensional space, which can then be represented by the three-dimensional coordinates of key points within that area.

[0052] As mentioned above, the 3D model described in the embodiments of this specification may include a 3D clothing model. The following description uses a 3D clothing model generated for a hat as an example. Figure 4 This is an exemplary embodiment illustrating the placement of a 2D pattern on a hat. As shown in 4a, the model display area 401 on the left side of the interface displays a 3D clothing model (i.e., hat 402), and the pattern editing area 403 on the right side of the interface displays a user-specified 2D pattern (i.e., pattern 404). Of course, the user can upload multiple patterns and specify any one or more of them as 2D patterns in the pattern editing area 403. At this time, the user can select pattern 404 and place it in a suitable position on the hat 402 using drag-and-drop operations, as shown in 4b, placing it directly in front of the hat 402.

[0053] Step 304: Determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm.

[0054] In addition to acquiring the 2D pattern and determining the corresponding pattern coverage area, the client also needs to determine the target material and its corresponding at least one target basic manufacturing process. The target material is the material the user expects the subsequently generated 3D digital pattern to possess, while the at least one target basic manufacturing process is the process capable of generating the target material. The target process simulation algorithm for any of these target basic manufacturing processes is a digital simulation of the manufacturing process in the real world (i.e., the manufacturing process can be simulated in digital space using a specified algorithm). This is precisely why the 3D digital patterns generated in subsequent steps using the target process simulation algorithms of each of the at least one target basic manufacturing process can possess the target material.

[0055] In one embodiment, the target material can be determined as the default material. The information used to set the default material can be recorded locally on the client (i.e., the default material is configured locally on the client, either within the client's program or pre-configured by the user), or it can be recorded on the server (i.e., the default material is uniformly configured on the server side). Further details are omitted. Alternatively, the default material can also be the material corresponding to the most recently generated 3D digital pattern on the client before the current moment. This simplifies the process when the user generates multiple 3D digital patterns consecutively, eliminating the need to manually modify the configuration or specify the target material before each generation. Determining the target material using the default material is simple and efficient, helping to shorten the overall time required for pattern generation.

[0056] Alternatively, the target material can be specified by the user as needed. For example, at least one candidate material can be displayed so that the user can perform a material selection operation. In this case, the client can respond to the operation and determine the target material selected by the user from the at least one candidate material. This method allows users to select the target material according to their actual needs, which can fully meet the user's modeling requirements.

[0057] When showcasing any candidate material, a sample rendering of that material can be displayed so that users can understand the material's processing effect by viewing the rendering. And / or, material description information for any material can also be displayed, such as the material's Chinese and English names, processing difficulty level, cost level, and other materials that can be layered with it.

[0058] Following the aforementioned embodiments, assuming a user clicks the material selection control 407 in the pattern configuration area 406 on the right side of the interface shown in 4b, the material selection window shown in 4c will be displayed above the pattern configuration area 406, allowing the user to select a suitable candidate material as the target material from the various candidate materials 408 displayed in the window. Each candidate material can display a corresponding template image and material name. Furthermore, if the mouse hovers over a candidate material, the template image and material name (in Chinese and / or English) of that candidate material can be further enlarged. Of course, other material description information can also be displayed, which will not be elaborated further.

[0059] It should be noted that for a 2D pattern, only one target material can be determined so that the generated 3D digital pattern has that material; or, multiple target materials can be determined so that the generated 3D digital pattern has these multiple materials at the same time. For example, the entire area covered by the pattern can present the superimposed effect of multiple materials; or different locations in the area covered by the pattern can display the single effect of different materials, etc., which will not be elaborated further.

[0060] Furthermore, the embodiments in this specification do not limit the specific form of the target material. For example, the determined target material may include at least one of the following: embroidery, foaming paste, glossy leather, silicone printing, hot stamping, watercolor, terry cloth embroidery, heat sealing, flocking, brushed metal, crackle, lava, and leather.

[0061] In one embodiment, for the determined target material, at least one target basic manufacturing process can be determined in various ways. For example, it can be determined according to a preset mapping relationship. For instance, a pre-created material-process mapping table can be maintained locally on the client or on the server. This table records the mapping relationship between various materials and their basic manufacturing processes, where each material corresponds to at least one basic manufacturing process. In this case, the client can determine the at least one target basic manufacturing process corresponding to the target material based on the aforementioned mapping relationship between materials and basic manufacturing processes. This method determines each target basic manufacturing process corresponding to the target material based on a pre-established mapping relationship (e.g., a simple table lookup), making the determination logic simple and efficient.

[0062] For example, the process can also be specified by the user. The client can respond to the user's process specification operation for the target material and determine at least one target basic manufacturing process specified by the user for the target material. This method allows users to flexibly specify the target basic manufacturing process used to generate 3D digital patterns according to their actual needs, helping to meet their personalized pattern generation requirements.

[0063] For example, the material can be determined based on the underlying material. The client can first determine the material located below the pattern's coverage area and adjacent to the 2D pattern (if multiple materials are superimposed, only the topmost material needs to be determined) – this material is located below both the 2D pattern and the (to be generated) 3D digital pattern, hence called the underlying material. Then, at least one target basic manufacturing process conforming to the material's process characteristics can be determined based on the underlying material. For example, when the 2D pattern is placed on a 3D clothing model, the material and its process characteristics at the placement location can be determined first, and then at least one target basic manufacturing process conforming to those process characteristics can be determined. Since the 3D digital pattern to be generated is usually connected to its underlying material (e.g., sewing, pasting, snapping, welding, etc.), the material properties of the underlying material and the target material (i.e., the material of the 3D digital pattern) should satisfy a certain physical relationship to ensure that the subsequent connection can achieve the intended connection purpose. The determined target basic manufacturing process conforms to the process characteristics of the underlying material, thereby ensuring that the material of the 3D digital pattern generated according to these processes (i.e., the target material) has similar or compatible material properties with the underlying material.

[0064] In the real world, patterns and fabrics often have a certain relationship. For example, 3D digital patterns and underlying fabrics need to have similar textures to ensure tight stitching. However, in related technologies, the same set of 3D textures generated by the same pattern manufacturing process cannot be adapted to different underlying fabrics. This solution, by determining the target basic manufacturing process (used to generate the 3D digital pattern) based on the underlying material, effectively ensures that the material of the generated 3D digital pattern (i.e., the target material) and the material of the underlying fabric (i.e., the underlying material) have the aforementioned relationship, thereby meeting the specific requirements of actual business for the material of the 3D digital pattern.

[0065] In one embodiment, when determining at least one target basic manufacturing process that conforms to the process characteristics of the underlying material based on the underlying material of the pattern-covered area, the method can be tailored according to the number of underlying materials. For example, if there is one underlying material in the pattern-covered area, at least one target basic manufacturing process that conforms to the process characteristics of that underlying material can be determined.

[0066] When multiple underlying materials exist within the pattern coverage area, at least one target basic manufacturing process that conforms to the process characteristics of any one of the underlying materials can be determined. In this case, a 3D digital pattern matching the pattern coverage area and any one of the underlying materials can be generated in subsequent step 306. This ensures that the final generated 3D digital pattern has a material that matches any one of the underlying materials. Alternatively, the pattern coverage area can be divided into sub-regions corresponding to various underlying materials, and for each sub-region, at least one target basic manufacturing process conforming to the process characteristics of the underlying material corresponding to that sub-region can be determined. In this case, in subsequent step 306, a sub-pattern matching that sub-region and its corresponding type of underlying material can be generated for each sub-region, where the sub-patterns corresponding to each sub-region are adjacent and together constitute the 3D digital pattern. This method results in a final generated 3D digital pattern with multiple materials, and the materials of different parts match the underlying materials of those parts, forming a 3D digital pattern through the splicing of multiple materials, resulting in more diverse display effects.

[0067] In the embodiments of this specification, the at least one target basic manufacturing process corresponding to the target material may include at least one of embroidery, cutting, thicknessing, and fusion processes. The various processes and their effects are described below with reference to the accompanying drawings.

[0068] The embroidery process is used to generate the trajectory of embroidery threads. The client supports embroidery algorithms to implement this process, which can reproduce the 3D material effects of embroidery or weaving techniques in the real world. Specifically, this algorithm can analyze the outline structure of a pattern to generate embroidery thread trajectories within the outline that conform to the structure (such as the principle of intersection avoidance) and meet the requirements of embroidery or weaving techniques (such as embroidery threads perpendicular to the trajectory lines). Furthermore, the texture map, normal map, and displacement map corresponding to the embroidery thread trajectory can be used as texture maps for the resulting material.

[0069] like Figure 5 As shown, 5a is a 2D pattern, 5b is a 3D digital pattern generated solely through embroidery on a white fabric, and 5c is a 3D digital pattern generated solely through embroidery on a black fabric. From 5b and 5c, it can be seen that this solution can realistically simulate the 3D material effect of embroidery.

[0070] The trimming process is used to trim preset materials to obtain usable patches that match the size of the pattern's coverage area. The client supports a trimming algorithm to implement this process, which can automatically and accurately trim large-sized predicted materials to obtain corresponding usable patches. Specifically, the algorithm first determines the size boundaries of the 2D pattern or its coverage area (e.g., determining the circumscribed rectangle or cube of the area), and then automatically trims the preset material according to these boundaries. The preset material can consist of texture maps, normal maps, metallicity maps, and other textures and corresponding parameters, providing data that can recreate 3D representations of the real world in the rendering engine.

[0071] like Figure 6 As shown, 6a is a 2D pattern. Two usable patterns (as shown in 6d and 6e) are obtained by cutting two different fabric materials (as shown in 6b and 6c) using a cutting process. It can be seen that the size of the above-mentioned usable patterns exactly matches the size of the 2D pattern (the shape of both patterns is the bounding rectangle of the 2D pattern).

[0072] The thickness process is used to generate pattern thickness information. The client supports a thickness algorithm to implement this process, which can automatically generate a 3D embossed effect that conforms to the pattern structure of a 2D design. Specifically, the algorithm can generate a black and white image based on the non-transparent and transparent parts of the 2D pattern, and then generate thickness information (i.e., information used to describe the gradual or stepped change in height) along the black and white boundary in the black and white image.

[0073] like Figure 7 As shown, 7a is a 2D pattern. A black and white image generated for this pattern through a thickness process is shown in 7b. Finally, a thickness pattern (corresponding to the thickness information) generated according to this black and white image is shown in 7c.

[0074] The blending process is used to generate a blended image based on the texture of the underlying material. The client supports a blending algorithm to implement this process, which can automatically generate 3D material effects that conform to the characteristics of the underlying material. This algorithm can perform normal blending and texture mapping on 2D patterns and the underlying material. Specifically, normal mapping can be used to ensure the 3D digital pattern has the textile structure of the underlying material, or texture mapping can be used to ensure the 3D digital pattern has the hollow structure of the underlying material, etc., which will not be elaborated further. The underlying material can refer to the fabric data attached to the pattern data in the modeling tool. Fabric data is data that expresses and records the visual and flexible simulation characteristics of 3D digital clothing.

[0075] like Figure 8 As shown, 8a is a 2D pattern. A thickness pattern, as shown in 8d1, is obtained by applying a thickness mapping technique to the material shown in 8b1. A 3D digital pattern, as shown in 8e1, is obtained by fusing the thickness pattern shown in 8d1 with the underlying material shown in 8c1 using a blending technique (normal mapping). A blended pattern, as shown in 8d2, is obtained by applying a texture mapping technique to the material shown in 8b2. A 3D digital pattern, as shown in 8c2, is then obtained by fusing the thickness pattern shown in 8d2 with the underlying material shown in 8c2 using a blending technique (normal mapping). Figure 8 As shown in e2.

[0076] It should be noted that, based on the real-world implementation process of the target material, the target material can be decomposed into at least one of the four basic target manufacturing processes mentioned above, and simulated using algorithms corresponding to each process. Furthermore, the client or server can pre-acquire and maintain the target process simulation algorithms for each basic manufacturing process, so that once the at least one basic target manufacturing process is determined, the respective target process simulation algorithm is also determined. Additionally, in the case of multiple basic target manufacturing processes, the superposition order of each basic target manufacturing process (i.e., the execution order of the target process simulation algorithms) can be determined according to the manufacturing process of the target material in the real world. This order can also be pre-determined and associated with the aforementioned mapping relationship (e.g., the mapping relationship and the execution order are stored together in the aforementioned material process mapping table) for easy retrieval.

[0077] For example, when the target material is embroidery material, the corresponding target basic manufacturing process may only include embroidery; when the target material is foaming paste material, the corresponding target basic manufacturing process may include thickness processing and fusion processing; when the target material is flocking material, the corresponding target basic manufacturing process may include fusion processing; when the target material is watercolor material, the corresponding target basic manufacturing process may include cutting and fusion processing, etc. This specification does not limit the specific correspondence between target materials and target basic manufacturing processes, and can be flexibly set according to actual production processes.

[0078] The aforementioned target basic manufacturing process has significant advantages over related technologies; for a detailed comparison, please refer to [link to relevant documentation]. Figures 9-12 I will not go into details.

[0079] Step 306: Generate a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm, wherein the 3D digital pattern has the target material.

[0080] Having determined, through the aforementioned method, at least one target basic manufacturing process corresponding to the target material using a target process simulation algorithm (correspondingly, the number of target process simulation algorithms is also at least one), these algorithms can be executed to generate 3D digital patterns. Where multiple target basic manufacturing processes exist, the corresponding target process simulation algorithms can be executed sequentially according to the stacking order of each process, thereby obtaining a 3D simulation effect that is similar to or even identical to the target material in the real world.

[0081] As can be seen from the above embodiments, this solution obtains the specified 2D pattern and determines the corresponding pattern coverage area, as well as the target material and its corresponding at least one target basic manufacturing process. Then, it uses the target process simulation algorithm of each target basic manufacturing process to generate a 3D digital pattern that matches the pattern coverage area, so as to ensure that the 3D digital pattern has the target material.

[0082] Understandably, this solution breaks down the target material into at least one target basic manufacturing process, and generates 3D digital patterns according to the target process simulation algorithm for each process, ultimately realizing the target material (i.e., achieving the corresponding pattern process). The execution process of each target process simulation algorithm follows the pattern coverage area of ​​the 2D pattern; therefore, the generated 3D digital pattern accurately corresponds to the pattern coverage area, eliminating the need for manual adjustment of geometric parameters such as the size, boundaries, and angles of the 3D digital pattern. Thus, this solution not only simplifies user operation logic but also automates and intelligently generates 3D digital patterns, thereby improving the efficiency and quality of 3D digital pattern generation.

[0083] In one embodiment, if there is only one target process simulation algorithm, it is sufficient to use that single algorithm to generate a 3D digital pattern matching the pattern coverage area. However, if there are multiple target process simulation algorithms, these algorithms can be superimposed to generate a 3D digital pattern matching the pattern coverage area. As mentioned earlier, the order of the superposition effect can be determined based on the sequence of the various target basic manufacturing processes in the manufacturing process, and will not be elaborated further.

[0084] In one embodiment, in response to a process parameter configuration operation performed for any target basic manufacturing process, the configured process parameters can be determined. Then, when generating a 3D digital pattern using a target process simulation algorithm, the target process simulation algorithm for the any target basic manufacturing process can be executed according to the process parameters to generate the 3D digital pattern corresponding to the process parameters. This method allows users to precisely configure the process parameters for any target basic manufacturing process, ensuring that the display effect of the generated 3D digital pattern conforms to the aforementioned process parameters. It enables a rich variety of 3D digital pattern simulation effects, helping to meet users' diverse and personalized pattern generation needs.

[0085] In one embodiment, the 2D pattern can also be displayed so that the user can view its appearance and perform interactive operations such as pattern placement. And / or, the 3D digital pattern can also be displayed so that the user can promptly and accurately understand the appearance of the generated 3D digital pattern and adjust its parameters as needed. It should be noted that, given that the 3D digital pattern is generated from the 2D pattern and that both have the same size and shape, directly displaying the 3D digital pattern may cover the 2D pattern; therefore, the 2D pattern can be additionally displayed in a different area of ​​the interface than the area displaying the 3D digital pattern, allowing the user to compare the 3D simulation effect of the 3D digital pattern on the 2D pattern. Figure 4 As shown, the 3D digital pattern 405 generated in 4b is displayed at the location of the 2D pattern, covering it. Meanwhile, the pattern editing area 403 still displays the user-specified 2D pattern (in thumbnail form) for the user to view. Of course, a new window can also pop up or a high-precision 2D pattern can be displayed in another area, which will not be elaborated further.

[0086] In one embodiment, during the display of the 3D digital pattern, the user can adjust relevant parameters of the pattern. For example, in response to a material parameter configuration operation performed on the target material, the client can determine the configured material parameters and adjust the display parameters of the 3D digital pattern according to these parameters, so that the display effect of the adjusted 3D digital pattern matches the material parameters. Specifically, the 3D digital pattern can be regenerated according to the configured material parameters and displayed (i.e., the 3D digital pattern is refreshed and displayed according to the material parameters). And / or, the client can also, in response to a pattern parameter configuration operation performed on the 2D pattern, determine the configured pattern parameters and adjust the display parameters of the 3D digital pattern according to the material parameters, so that the display effect of the adjusted 3D digital pattern matches the pattern parameters. Similar to the aforementioned material parameter configuration operation, the client can also regenerate the 3D digital pattern according to the configured pattern parameters and display the regenerated pattern (i.e., the 3D digital pattern is refreshed and displayed according to the pattern parameters).

[0087] For example, see Figure 13 Users can adjust the material parameters of the target material in the material parameter configuration interface 1301 on the left. As shown in the figure, when the target material is foam paste, users can adjust one or more material parameters such as texture, color, color blending mode, fading (degree), automatic thickness (thickness, edge width, edge smoothing, offset, particle spacing, etc.), normal map intensity, smoothness, metallicity, use of fabric cutouts, lower layer texture rendering, and process scaling. Additionally, users can trigger the control 1303 to adjust the corresponding pattern parameters in the pattern parameter adjustment interface 1302 for 2D patterns on the right. For example, users can adjust the pattern size, aspect ratio, fixed ratio, transparency, contrast, and resolution, which will not be elaborated further.

[0088] In one embodiment, during the display of the 3D digital pattern, in response to a material switching operation performed on the target material, a new material and its corresponding at least one basic manufacturing process can be determined, wherein each basic manufacturing process has a corresponding process simulation algorithm. Then, the process simulation algorithm is used to generate a new 3D digital pattern matching the pattern coverage area, and the new 3D digital pattern is displayed to replace the 3D digital pattern corresponding to the target material. As can be seen from the above processing method, after switching the target material (i.e., switching the target material to the new material), the client can generate a new 3D digital pattern corresponding to the new material according to steps 304-306, thereby achieving the material switching effect of the 3D digital pattern. This method allows users to switch to a completely new material to generate a new 3D digital pattern when they are not satisfied with the 3D digital pattern generated by the target material, thus satisfying the user's pattern generation needs as much as possible.

[0089] As mentioned earlier, the generated 3D digital pattern is actually a 3D model composed of meshes and textures. Therefore, to facilitate users' detailed and accurate viewing of the pattern's appearance, especially its details, the display of the 3D digital pattern can switch between texture and mesh views in response to a mode switching operation. For example, texture mode controls and mesh mode controls can be displayed, and the mode switching operation can be a trigger operation on these controls. For instance, if the user triggers the mesh mode control while the 3D digital pattern is displayed in texture mode, the display will switch to mesh mode; conversely, if the user triggers the texture mode control while the 3D digital pattern is displayed in mesh mode, the display will switch to texture mode. Similarly, the 3D model can also be mode-switched in the same way for user viewing, which will not be elaborated further.

[0090] During the display of the 3D digital pattern, the display perspective of the pattern can be adjusted accordingly in response to the user's viewpoint adjustment operation. Similarly, the 3D digital pattern is displayed at a corresponding position on the 3D model (e.g., ...). Figure 4 The pattern shown is displayed in front of the hat. At this time, in response to the perspective adjustment operation performed on the 3D model, the display perspective of the 3D model and the 3D digital pattern can be adjusted synchronously to present the perspective adjustment effect of the two in tandem.

[0091] The perspective adjustment operation can include dragging, zooming, etc., and the display perspective, such as the size and angle of the model, can be adjusted accordingly in response to these operations. Furthermore, the adjustment range of the display perspective can be positively correlated with the range of the perspective adjustment operation. For example, dragging the mouse 10 pixels horizontally left / right on the interface rotates the model and pattern 5° left / right around the z-axis of its spatial location; dragging the mouse 10 pixels vertically up / down on the interface rotates the model and pattern 10° around the x-axis of its spatial location; scrolling the mouse wheel forward / backward by one notch (e.g., 30°) enlarges / shrinks the model and pattern by 10% from its current size, etc., without further elaboration. By implementing the above perspective adjustment operations, users can clearly, comprehensively, and flexibly view the overall or detailed display effect of the 3D model and 3D digital pattern in various directions / angles and sizes, helping them accurately determine whether the current effect of the 3D digital pattern meets business requirements.

[0092] Taking rotation as an example, see Figure 14 The hat's initial position is shown in 14a. Its position after being rotated and moved a certain angle to the lower left is shown in 14b, and will not be described further. Of course, it can also be rotated in the opposite direction (i.e., from the position shown in 14b to the position shown in 14a, or to any other position), and will not be described further.

[0093] If the user is satisfied with the 3D digital pattern generated by the aforementioned scheme, the corresponding pattern file can be output. For example, the client can respond to a file output operation performed on the 3D digital pattern and output a pattern file containing the 3D digital pattern. This file can be any image format such as jpg, .png, or .bmp, or any model format such as OBJ (Wavefront Object File), GLB (GL Binary), DXF (Drawing Exchange Format), or SCO (Spatial Capture Object). This specification does not limit the embodiments to these formats.

[0094] Figure 15 This is a schematic structural diagram of a device provided in an exemplary embodiment. Please refer to... Figure 15At the hardware level, the device includes a processor 1502, an internal bus 1504, a network interface 1506, memory 1508, and non-volatile memory 1510, and may also include other hardware required for its functions. One or more embodiments of this specification can be implemented in software, for example, the processor 1502 reads the corresponding computer program from the non-volatile memory 1510 into memory 1508 and then runs it. Of course, besides software implementation, one or more embodiments of this specification do not exclude other implementation methods, such as logic devices or a combination of hardware and software, etc. That is to say, the execution entity of the following processing flow is not limited to individual logic units, but can also be hardware or logic devices.

[0095] Please refer to Figure 16 3D digital pattern generators can be applied to, for example... Figure 15 The device shown is used to implement the technical solution of this specification. The 3D digital pattern generation apparatus may include:

[0096] The region determination unit 1601 is used to obtain the specified 2D pattern and determine the corresponding pattern coverage area in response to the pattern specification operation;

[0097] The process determination unit 1602 is used to determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm.

[0098] The pattern generation unit 1603 is used to generate a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm, wherein the 3D digital pattern has the target material.

[0099] Optionally, the region determination unit 1601 is specifically used for:

[0100] In response to a user's image upload operation, receive the 2D image uploaded by the user; or,

[0101] Display at least one candidate pattern and, in response to a pattern selection operation performed by the user, determine the selected 2D pattern.

[0102] Optionally, the region determination unit 1601 is specifically used for:

[0103] In response to a pattern placement operation performed on the 2D pattern, the pattern coverage area of ​​the placed 2D pattern on the 3D model is determined.

[0104] Optionally, the process determination unit 1602 is specifically used for:

[0105] Set the default material as the target material; or...

[0106] Display at least one candidate material and determine the target material to be selected from among them in response to a material selection operation.

[0107] Optionally, the process determination unit 1602 is specifically used for:

[0108] Display sample renderings and / or material description information for the candidate material.

[0109] Optionally, the process determination unit 1602 is specifically used for:

[0110] Based on the mapping relationship between materials and basic manufacturing processes, at least one target basic manufacturing process corresponding to the target material is determined.

[0111] In response to a process specification operation, at least one target basic manufacturing process is determined for the target material;

[0112] At least one target basic manufacturing process that conforms to the process characteristics of the underlying material is determined based on the underlying material of the pattern-covered area.

[0113] Optionally, the pattern generation unit 1603 is specifically used for:

[0114] When a base material exists in the pattern-covered area, at least one target basic manufacturing process that conforms to the process characteristics of that base material is determined.

[0115] When there are multiple underlying materials in the pattern coverage area, at least one target basic manufacturing process that conforms to the process characteristics of any one of the underlying materials is determined; or, the pattern coverage area is divided into sub-regions corresponding to each underlying material, and for each sub-region, at least one target basic manufacturing process that conforms to the process characteristics of the underlying material corresponding to that sub-region is determined.

[0116] Optionally, the pattern generation unit 1603 is specifically used for:

[0117] When there is only one target process simulation algorithm, a 3D digital pattern matching the pattern coverage area is generated using that target process simulation algorithm.

[0118] When there are multiple target process simulation algorithms, the multiple target process simulation algorithms are superimposed to generate a 3D digital pattern that matches the pattern coverage area.

[0119] Optional,

[0120] It also includes a parameter configuration unit 1604, which is used to: determine the configured process parameters in response to a process parameter configuration operation performed for any target basic manufacturing process;

[0121] The pattern generation unit 1603 is specifically used to: execute the target process simulation algorithm of any target basic manufacturing process according to the process parameters, so as to generate a 3D digital pattern corresponding to the process parameters.

[0122] Optional, also includes:

[0123] The pattern display unit 1605 is used to display the 2D pattern and / or the 3D digital pattern.

[0124] Optionally, a parameter configuration unit 1606 is also included, for:

[0125] During the display of the 3D digital pattern

[0126] In response to a material parameter configuration operation performed on the target material, the configured material parameters are determined, and the display parameters of the 3D digital pattern are adjusted according to the material parameters; and / or,

[0127] In response to the pattern parameter configuration operation performed on the 2D pattern, the configured pattern parameters are determined, and the display parameters of the 3D digital pattern are adjusted according to the material parameters.

[0128] Optionally, a material switching unit 1607 is also included, for:

[0129] During the display of the 3D digital pattern, in response to the material switching operation implemented for the target material, the switched material and its corresponding at least one basic manufacturing process after switching are determined, wherein each basic manufacturing process after switching has a corresponding process simulation algorithm after switching.

[0130] The switching process simulation algorithm is used to generate a switched 3D digital pattern that matches the pattern coverage area, and the switched 3D digital pattern is displayed to replace the 3D digital pattern corresponding to the target material.

[0131] Optionally, a format switching unit 1608 is also included, for:

[0132] During the display of the 3D digital pattern, in response to a mode switching operation performed on the 3D digital pattern, the texture screen and the mesh screen of the 3D digital pattern are switched.

[0133] Optionally, the 3D digital pattern is displayed at a corresponding position on the 3D model, and the device further includes a viewing angle adjustment unit 1609 for:

[0134] In response to a viewpoint adjustment operation performed on the 3D model, the display viewpoint of the 3D model and the 3D digital pattern are adjusted synchronously.

[0135] Optionally, the 3D model includes a 3D clothing model.

[0136] Optional, also includes:

[0137] The file output unit 1610 is configured to output a pattern file containing the 3D digital pattern in response to a file output operation performed on the 3D digital pattern.

[0138] Optionally, the at least one target basic manufacturing process includes at least one of the following:

[0139] Embroidery techniques for generating embroidery line paths, cutting techniques for cutting preset materials, thickness techniques for generating pattern thickness information, and fusion techniques for generating blended images according to the texture of the underlying material.

[0140] Based on the same concept as the methods described above, this specification also provides an electronic device, including: a processor; a memory for storing processor-executable instructions; wherein the processor performs the steps of the method as described in any of the above embodiments by executing the executable instructions.

[0141] Based on the same concept as the methods described above, this specification also provides a computer-readable storage medium having computer instructions stored thereon that, when executed by a processor, implement the steps of the methods as described in any of the above embodiments.

[0142] Based on the same concept as the methods described above, this specification also provides a computer program product, including a computer program / instructions that, when executed by a processor, implement the steps of the methods as described in any of the above embodiments.

Claims

1. A method for generating 3D digital patterns, characterized in that, include: In response to a pattern specification operation, the specified 2D pattern is obtained and the corresponding pattern coverage area is determined. Determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm; The target process simulation algorithm is used to generate a 3D digital pattern that matches the pattern coverage area, and the 3D digital pattern has the target material.

2. The method according to claim 1, characterized in that, The step of obtaining the specified 2D pattern in response to the pattern specification operation includes: In response to a user's image upload operation, receive the 2D image uploaded by the user; or, Display at least one candidate pattern and, in response to a pattern selection operation performed by the user, determine the selected 2D pattern.

3. The method according to claim 1, characterized in that, Determining the corresponding pattern coverage area includes: In response to a pattern placement operation performed on the 2D pattern, the pattern coverage area of ​​the placed 2D pattern on the 3D model is determined.

4. The method according to claim 1, characterized in that, The determination of the target material includes: Set the default material as the target material; or... Display at least one candidate material and determine the target material to be selected from among them in response to a material selection operation.

5. The method according to claim 4, characterized in that, Show any candidate material, including: Display sample renderings and / or material description information for the candidate material.

6. The method according to claim 1, characterized in that, The determination of at least one target basic manufacturing process corresponding to the target material includes one of the following: Based on the mapping relationship between materials and basic manufacturing processes, at least one target basic manufacturing process corresponding to the target material is determined. In response to a process specification operation, at least one target basic manufacturing process is determined for the target material; At least one target basic manufacturing process that conforms to the process characteristics of the underlying material is determined based on the underlying material of the pattern-covered area.

7. The method according to claim 6, characterized in that, The step of determining at least one target basic manufacturing process that conforms to the process characteristics of the underlying material, based at least on the underlying material of the pattern-covered area, includes: When a base material exists in the pattern-covered area, at least one target basic manufacturing process that conforms to the process characteristics of that base material is determined. When there are multiple underlying materials in the pattern coverage area, at least one target basic manufacturing process that conforms to the process characteristics of any one of the underlying materials is determined; or, the pattern coverage area is divided into sub-regions corresponding to each underlying material, and for each sub-region, at least one target basic manufacturing process that conforms to the process characteristics of the underlying material corresponding to that sub-region is determined.

8. The method according to claim 1, characterized in that, The step of generating a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm includes: When there is only one target process simulation algorithm, a 3D digital pattern matching the pattern coverage area is generated using that target process simulation algorithm. When there are multiple target process simulation algorithms, the multiple target process simulation algorithms are superimposed to generate a 3D digital pattern that matches the pattern coverage area.

9. The method according to claim 1, characterized in that, It also includes: determining the configured process parameters in response to a process parameter configuration operation performed for any target basic manufacturing process; The step of generating a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm includes: executing the target process simulation algorithm of any target basic manufacturing process according to the process parameters to generate a 3D digital pattern corresponding to the process parameters.

10. The method according to claim 1, characterized in that, Also includes: Display the 2D pattern and / or the 3D digital pattern.

11. The method according to claim 10, characterized in that, Also includes: During the display of the 3D digital pattern In response to a material parameter configuration operation performed on the target material, the configured material parameters are determined, and the display parameters of the 3D digital pattern are adjusted according to the material parameters; and / or, In response to the pattern parameter configuration operation performed on the 2D pattern, the configured pattern parameters are determined, and the display parameters of the 3D digital pattern are adjusted according to the material parameters.

12. The method according to claim 10, characterized in that, Also includes: During the display of the 3D digital pattern, in response to the material switching operation implemented for the target material, the switched material and its corresponding at least one basic manufacturing process after switching are determined, wherein each basic manufacturing process after switching has a corresponding process simulation algorithm after switching. The switching process simulation algorithm is used to generate a switched 3D digital pattern that matches the pattern coverage area, and the switched 3D digital pattern is displayed to replace the 3D digital pattern corresponding to the target material.

13. The method according to claim 10, characterized in that, Also includes: During the display of the 3D digital pattern, in response to a mode switching operation performed on the 3D digital pattern, the texture screen and the mesh screen of the 3D digital pattern are switched.

14. The method according to claim 10, characterized in that, The 3D digital pattern is displayed at a corresponding position on the 3D model, and the method further includes: In response to a viewpoint adjustment operation performed on the 3D model, the display viewpoint of the 3D model and the 3D digital pattern are adjusted synchronously.

15. The method according to claim 3 or 14, characterized in that, The 3D model includes 3D clothing models.

16. The method according to claim 1, characterized in that, Also includes: In response to a file output operation performed on the 3D digital pattern, a pattern file containing the 3D digital pattern is output.

17. The method according to any one of claims 1-14 and 16, characterized in that, The at least one target basic manufacturing process includes at least one of the following: Embroidery techniques for generating embroidery line paths, cutting techniques for cutting preset materials, thickness techniques for generating pattern thickness information, and fusion techniques for generating blended images according to the texture of the underlying material.

18. A 3D digital pattern generation device, characterized in that, include: The region determination unit is used to obtain the specified 2D pattern and determine the corresponding pattern coverage area in response to the pattern specification operation. A process determination unit is used to determine the target material and at least one corresponding target basic manufacturing process, wherein each target basic manufacturing process has a corresponding target process simulation algorithm. A pattern generation unit is used to generate a 3D digital pattern matching the pattern coverage area using the target process simulation algorithm, wherein the 3D digital pattern has the target material.

19. An electronic device, characterized in that, include: processor; A memory for storing processor-executable instructions; wherein the processor implements the steps of the method as described in any one of claims 1-17 by executing the executable instructions.

20. A computer-readable storage medium, characterized in that, It stores computer instructions that, when executed by a processor, implement the steps of the method as described in any one of claims 1-17.

21. A computer program product, characterized in that, Includes a computer program / instructions that, when executed by a processor, implement the steps of the method as described in any one of claims 1-17.

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