Filtering device and filtering method

Abstract

Embodiments of the present invention provide a filtration device for filtering a liquid. The filtration device includes a cavity and a filter core. The cavity includes an inlet, a first outlet and a second outlet, the liquid is to enter the cavity through the inlet, wherein the first outlet is disposed at a first end of the cavity and the second outlet is disposed at a second end opposite to the first end. The filter core is disposed within the cavity. The filter core includes a filter core wall, wherein the liquid is to pass through the filter core wall to be filtered into a filtered liquid. The filtered liquid is to flow out of the cavity through the first outlet. The excluded liquid that fails to pass through the filter core wall is to flow out of the cavity through the second outlet. A filtration method is also provided.

Description

Technical Field

[0001] This invention relates to a filtration device and a filtration method. Background Technology

[0002] In semiconductor manufacturing, semiconductor chips can be fabricated as chips in which components such as transistors, resistors, capacitors, and inductors are formed. The fabrication of semiconductor chips can include numerous processing steps, which may include combinations of photolithography, ion implantation, doping, annealing, and packaging. Many types of fluids can be used in these processes, including water, dielectrics, polymers, photoresists, chemical etchants, and acids. These fluids are filtered and delivered to the process equipment so that the equipment can use them during semiconductor manufacturing. Summary of the Invention

[0003] The present invention relates to a filtration device and a filtration method, which enables the filtration device to have a longer service life and a higher removal rate of large particles.

[0004] According to an embodiment of the present invention, a filtration device is used to filter liquid. The filtration device includes a cavity and a filter element. The cavity includes an inlet, a first outlet, and a second outlet, through which liquid enters the cavity. The first outlet is located at a first end of the cavity, and the second outlet is located at a second end opposite to the first end. The filter element is disposed within the cavity. The filter element includes a filter element tube wall, through which liquid passes to filter into filtered liquid. The filtered liquid flows out of the cavity through the first outlet. The filtered liquid that fails to pass through the filter element tube wall flows out of the cavity through the second outlet.

[0005] According to an embodiment of the present invention, a filtration method includes the following steps: 1. Liquid is introduced into a filtration device via an inlet for filtration. 2. Filtered liquid, having passed through a filter element of the filtration device, is discharged from the filtration device via a first outlet. 3. Excluded liquid that failed to pass through the filter element is discharged from the filtration device via a second outlet.

[0006] According to an embodiment of the present invention, a filtration method includes the following steps: Allowing liquid to flow into a filtration device for filtration; detecting whether the liquid flow rate is lower than the normal flow rate; if so, stopping filtration and performing abnormal handling or backwashing; if not, continuing filtration. Attached Figure Description

[0007] A thorough understanding of the various aspects of embodiments of the invention will be best achieved by reading the following detailed description in conjunction with the accompanying drawings. It should be noted that, according to standard practice in the industry, the various features are not drawn to scale. In fact, for clarity of explanation, the dimensions of the various features may be arbitrarily increased or decreased.

[0008] Figure 1 This is a schematic diagram of a filtration device according to an embodiment of the present invention; Figure 2 This is a schematic diagram of a filtration device according to another embodiment of the present invention; Figure 3 This is a schematic diagram of a liquid handling system according to an embodiment of the present invention; Figure 4 This is a schematic diagram of a liquid handling system according to another embodiment of the present invention; Figure 5 This is a schematic diagram of a liquid handling system according to another embodiment of the present invention; Figure 6 This is a schematic flowchart of a filtering method according to an embodiment of the present invention; Figure 7 This is a schematic flowchart of a filtering method according to another embodiment of the present invention. Detailed Implementation

[0009] The following disclosure provides numerous different embodiments or instances for implementing various features of the provided subject matter. Specific examples of components and arrangements are described below to simplify this disclosure. Of course, these are merely examples and are not intended to be limiting. For example, the description of a first feature being formed "on" or "on" a second feature in the following description may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. Furthermore, reference numerals and / or letters may be repeated in various instances of this disclosure. Such repetition is for the purpose of brevity and clarity and is not, in itself, an indication of a relationship between the various embodiments and / or configurations discussed.

[0010] Furthermore, for ease of explanation, spatially relative terms such as "beneath," "below," "lower," "above," and "upper" may be used herein to describe the relationship between one component or feature shown in the figures and another component or feature. These spatially relative terms are intended to encompass different orientations of the device in use or operation, in addition to those shown in the figures. The device may have other orientations (rotated 90 degrees or in other orientations), and the spatially relative descriptive terms used herein can be interpreted accordingly. Exemplary embodiments of the invention will now be described in detail with reference to the accompanying drawings. Wherever possible, the same component symbols are used in the figures and description to denote the same or similar parts.

[0011] Figure 1This is a schematic diagram of a filtration device according to an embodiment of the present invention. The filtration device 100 of this embodiment can be applied, for example, in a semiconductor process apparatus, to filter liquid L1. In one embodiment, this liquid may include a slurry, a chemical solution, a precursor, or other process liquids requiring filtration. Furthermore, the filtration device 100 may be installed in the liquid supply system of a semiconductor process apparatus to filter the liquid before supplying it to another process tank.

[0012] Please refer to Figure 1 In this embodiment, the filtration device 100 includes a cavity 110 and a filter element 120. The cavity 110 includes an inlet 112, a first outlet 114, and a second outlet 116. In this embodiment, liquid L1 enters the cavity 110 via the inlet 112. The cavity 110 may include a first end E1 and a second end E2 opposite to each other. In some embodiments, the first outlet 114 is located at the first end E1 of the cavity 110, and the second outlet 116 is located at the second end E2 opposite to the first end E1. In other embodiments, the inlet 112 is located at the first end E1 of the cavity 110. That is, the second outlet 116 and the first outlet 114 are respectively located at opposite ends E1 and E2 of the cavity 110, and the first outlet 114 and the inlet 112 are located at the same end of the cavity 110 (e.g., the first end E1).

[0013] In some embodiments, the filter element 120 is disposed within the cavity 110. The filter element 120 includes a filter element wall 122, through which liquid L1 passes to be filtered into filtered liquid LF, and this filtered liquid LF can flow out of the cavity 110 through a first outlet 114. Furthermore, the filtered out liquid LD that fails to pass through the filter element wall 122 can flow out of the cavity 110 through a second outlet 116. In some embodiments, the filter element 120 may be a membrane filter, whose filter element wall 122 may be made of a membrane, for example, polyethersulfone (PES). In other embodiments, the filter element 120 may also be a depth filter, whose filter element wall 122 may be woven and wound from, for example, polypropylene fibers, to achieve the effect of removing a large number of particles from liquid L1 by trapping and intercepting particles in the filter element wall 122. The filtration device 100 of this embodiment can be used not only to purify liquid L1 (remove particles from the liquid), but also to classify (separate large particles from small particles). This disclosure does not limit the application scope of the filtration device 100.

[0014] In this embodiment, the filter element 120 is a double-opening filter element. More specifically, the filter element 120 may have a first open end 124 and a second open end 126 that are opposite to and connected to each other, wherein the first open end 124 faces the first end E1 and the second open end 126 faces the second end E2. Thus, the liquid inlet 112 is provided corresponding to the first open end 124 so that liquid L1 flows into the filter element 120 through the liquid inlet 112, while the first liquid outlet 114 is provided between the filter element tube wall 122 and the cavity 110 so that liquid L1 passes through the filter element tube wall 122 inside the filter element 120 and is filtered into filtered liquid LF, and flows out of the cavity 110 through the first liquid outlet 114 located between the filter element tube wall 122 and the cavity 110. Furthermore, the second outlet 116 is positioned corresponding to the second open end 126, so that the discharge liquid LD containing large particles trapped inside the filter element 120 that have failed to penetrate the filter element tube wall 122 can flow out of the cavity 110 through the second outlet 116 located at the second open end 126. With this configuration, large particles filtered out of the liquid L1 can be discharged from the cavity 110 through the second outlet 116 during the filtration process instead of remaining in the cavity 110, thereby reducing the problem of filter element 120 clogging affecting the filtration effect and extending the service life of the filtration device 100.

[0015] In some embodiments, the filtration device 100 may further include a liquid pump coupled to the inlet 112 to drive liquid L1 as... Figure 1 The liquid L1 flows within the cavity 110 along a spiral direction surrounding the filter element 120, as shown. Thus, the angle between the flow direction of the liquid L1 and the filter element wall 122 is approximately less than 45 degrees. Furthermore, the flow direction of the liquid L1 can be approximately parallel to the filter element wall 122. It should be noted that "approximately less than 45 degrees" means the angle can have an error range of approximately ±5 degrees, while "approximately parallel" means the angle between the flow direction of the liquid L1 and the filter element wall 122 is approximately zero degrees, and this angle can have an error range of approximately ±5 degrees.

[0016] With this configuration, since the angle between the flow direction of liquid L1 and the filter element wall 122 is small (it spirals around the filter element wall 122), and the flow direction of non-liquid is approximately perpendicular to the filter element wall 122 when it flows into and out of the filter element 120, large particles stuck in the filter element 120 can be easily carried away by the water flow and discharged from the cavity 110 through the second outlet 116. This reduces the problem of large particles getting stuck in the pores of the filter element 120, causing the filter element 120 to become clogged and its lifespan to be shortened.

[0017] In this embodiment, the filter device 100 may further include a gasket 118, which may be disposed between the second open end 126 and the second end E2 of the filter element 120 to fill the gap between the second open end 126 and the second end E2, ensuring that the discharged liquid LD flows through the second open end 126 to the second outlet 116, and does not seep into the flow channel between the filter element tube wall 122 and the cavity 110. In some embodiments, the aperture of the second outlet 116 may be approximately larger than the aperture of the inlet 112 to control the flow pressure in the cavity 110, so that the discharged liquid LD can flow smoothly out of the cavity 110 from the second outlet 116.

[0018] In some embodiments, the filter device 100 may further include a base 130 disposed at a first end of the cavity 110 and for coupling with other components (e.g., other piping). In one embodiment, an inlet 112 and a first outlet 114 may extend from the first end of the cavity 110 to the base 130 for fluid communication with the base 130 and other coupled components. In some embodiments, the filter device 100 may further include a sealing ring (O-ring) 119 disposed between the cavity 110 and the base 130 to prevent leakage of liquid L1 and filtered liquid LF.

[0019] Figure 2 This is a schematic diagram of a filtering device according to another embodiment of the present invention. It should be noted that the filtering device 100' in this embodiment is different from... Figure 1 The filter device 100 is similar to that described above; therefore, this embodiment uses the component reference numerals and some content from the previous embodiment, where the same reference numerals are used to represent the same or similar components, and descriptions of the same technical content are omitted. For descriptions of the omitted parts, please refer to the previous embodiment; this embodiment will not repeat them. Please refer to... Figure 1 and Figure 2 The following will describe the filter device 100' and the filter device 100' of this embodiment. Figure 1 The differences in the filter device 100 are explained.

[0020] In this embodiment, the filter element 120' is a single-opening filter element, having an open end 124 facing the first end E1 and a closed end 126' facing the second end E2. That is, liquid can only enter and exit the filter element 120' through the open end 124, but cannot flow out of the filter element 120' through the closed end 126'. Thus, the inlet 112' is located between the filter element tube wall 122 and the cavity 110, so that liquid L1 flows into the cavity 110 through the flow channel between the filter element tube wall 122 and the cavity 110, while the first outlet 114' is located corresponding to the open end 124, so that liquid L1 passes through the filter element tube wall 122 and enters the filter element 120 through the flow channel between the filter element tube wall 122 and the cavity 110, so as to filter the liquid L1 into filtered liquid LF, and flow out of the cavity 110 through the first outlet 114' located at the open end 124. Furthermore, the second outlet 116 is provided corresponding to the closed end 126'. In this embodiment, the height of the filter element 120 can be slightly less than the height of the cavity. Therefore, there is still a gap between the closed end 126' of the filter element 120 and the second end E2 of the cavity 110. Thus, the discharge liquid LD containing large particles that cannot penetrate the filter element tube wall 122 can flow out of the cavity 110 through the second outlet 116 located at the second end E2. With this structural configuration, the filtration device 100' does not need to provide a gasket between the closed end 126' of the filter element 120 and the second end E2.

[0021] In simple terms, the filtration method using the filter device 100 / 100' of the aforementioned embodiment may include the following steps. Please refer to... Figure 1 and Figure 2 First, liquid L1 flows into the filter device 100 through the inlet 112 / 112' for filtration. Next, the filtered liquid LF, having passed through the filter element 120, flows out of the filter device 100 through the first outlet 114 / 114'. Furthermore, the discharged liquid LD, which failed to pass through the filter element 120, flows out of the filter device 100 through the second outlet 116, thus achieving a separation of the filtered liquid LF and the discharged liquid LD. This prevents large particles in the discharged liquid LD from clogging the filter element 120, thereby extending the service life of the filter device 100.

[0022] Experiments have confirmed that the filter device 100 / 100' of this disclosure has a removal rate of approximately 32% for particles with a diameter generally greater than 0.3 micrometers (μm), and a removal rate of approximately 66% for particles with a diameter generally greater than 1 micrometer (μm). Therefore, the filter device 100 / 100' of this disclosure exhibits excellent removal rate for large particles. Of course, the removal rate of the filter device 100 / 100' for a specific particle size can be adjusted according to the pore size of the filter element, and this disclosure is not limited thereto.

[0023] Furthermore, since the filter device 100 / 100' of this disclosure can effectively remove large particles from liquid L1, it can reduce the scratch rate of wafers caused by chemical mechanical polishing (CMP) processes performed with this filtered liquid LF. Experiments have shown that, under test conditions, the number of chip / wafer scratches during CMP processes using the filter device 100 / 100' can be reduced from approximately 7.3 per batch to approximately 3.2, effectively reducing the chip / wafer scratch rate by approximately 56.2%. In actual operation, the number of chip / wafer scratches during CMP processes using the filter device 100 / 100' can be reduced from approximately 6.1 per batch to approximately 4.8, effectively reducing the chip / wafer scratch rate by approximately 21.3%. Therefore, the filter device 100 / 100' of this disclosure can effectively improve process yield.

[0024] Figure 3 This is a schematic diagram of a liquid handling system according to an embodiment of the present invention. In this embodiment, the filter device 100 / 100' can be applied to, for example... Figure 3 The liquid processing system 10 shown is used for filtering liquids. It should be noted that... Figure 3 The filter device 100 is only shown as an example; however, anyone skilled in the art will understand that the aforementioned filter device 100 can also be applied to... Figure 3 The liquid handling system 10 is described above, and the various components in the liquid handling system 10 are merely illustrative, and the coupling relationships between the components are only schematic. Anyone skilled in the art can understand the implications of this description. Figure 3 The components of the liquid handling system 10 shown can be added, removed, or rearranged independently.

[0025] Please refer to the following at the same time Figure 1 as well as Figure 3 In this embodiment, the liquid pump 140 of the filter device 100 is coupled to the liquid inlet 112 to drive the liquid L1 into the cavity 110, and can be used as follows: Figure 1 The fluid flows within the cavity 110 in a spiral direction surrounding the filter element 120, as shown. In this embodiment, the filtration device 100 may also be as follows: Figure 3The diagram shows a storage tank 150 coupled to a cavity 110 for storing liquid L1. In this configuration, liquid L1 in the storage tank 150 flows into the cavity 110 via an inlet 112 driven by a pump 140 for filtration, while discharged liquid LD flows out of the cavity 110 via a second outlet 116 and back into the storage tank 150. Thus, if some of the filtered liquid LF (containing smaller particles) flows out of the cavity 110 via the second outlet 116, it can flow back into the storage tank 150 along with the discharged liquid LD for further filtration, thereby ensuring filtration accuracy. In this embodiment, the filtration device 100 may further include a defoaming module, which may be disposed between the pump 140 and the filtration device 100, so that liquid L1 can be defoamed after being driven by the pump 140 and before entering the filtration device 100.

[0026] In some embodiments, the filtered liquid LF can flow out of the cavity 110 through the first outlet 114 and into another storage tank 200. In this embodiment, the storage tank 150 can be used, for example, to store the polishing slurry for chemical-mechanical polishing (CMP) processes, while the storage tank 200 can be used, for example, to store deionized water (DI water). Of course, this disclosure is not limited to this. The liquid in the storage tank 200 can be filtered again by the filter device 100, and the filtered liquid can flow into the mixing tank 300 to fully mix the liquids in the storage tanks 150 and 200. After that, the mixed liquid can be filtered a third time by the filter device 100, and the filtered liquid can flow into the supply tank 400 for use in the semiconductor process equipment 500 (e.g., a chemical mechanical polishing machine). It can also be filtered a final time by the filter device 100 before being supplied to the semiconductor process equipment 500. Of course, this embodiment is only used as an example for illustration, and this disclosure does not limit the component configuration and liquid handling process of the liquid handling system 10.

[0027] Figure 4 This is a schematic diagram of a liquid handling system according to another embodiment of the present invention. In this embodiment, the filter device 100 / 100' can be applied to, for example... Figure 4 The liquid handling system 10' shown is used for filtering liquids. It should be noted that the various components in the liquid handling system 10' are merely illustrative, and the coupling relationships between the components are only schematic. Anyone skilled in the art can easily understand the implications of this description. Figure 4 The liquid handling system 10' shown can automatically add, remove, or rearrange its components.

[0028] Furthermore, the liquid handling system 10' of this embodiment and Figure 3 The liquid handling system 10 is similar to that described in the previous embodiment. Therefore, this embodiment uses the component reference numerals and some content from the previous embodiment, where the same reference numerals are used to represent the same or similar components, and descriptions of the same technical content are omitted. For descriptions of the omitted parts, please refer to the previous embodiment; this embodiment will not repeat them. Please refer to... Figure 1 and Figure 4 The following will describe the liquid handling system 10' and its relationship with this embodiment. Figure 3 The differences in the liquid handling system 10 are explained.

[0029] In this embodiment, the first liquid (e.g., a grinding slurry for chemical mechanical polishing) can be supplied to the mixing tank 300, for example, from the storage tank 150, while the second liquid (deionized water) can be supplied to the mixing tank 300, for example, from the storage tank 200, so that the first and second liquids are thoroughly mixed in the mixing tank 300. Multiple parameters of the liquid in the mixing tank 300 can be monitored and controlled via multiple meters 600. In this embodiment, the meters 600 may include a conductivity meter, a pH meter, and / or a specific gravity meter, etc.

[0030] In this embodiment, the liquid handling system 10' may include multiple filter devices 100a and 100b (two are shown, but not limited to this), and the filter devices 100a and 100b may be as follows: Figure 4 The filters 100a and 100b are connected in parallel, and their structures can be adapted from the aforementioned filters 100 / 100'. With this configuration, a portion of the liquid in the mixing tank 300 can flow into the filter 100a, while another portion can flow into the filter 100b, allowing for simultaneous or separate filtration. The filtered liquid LF, obtained through the filters 100a and 100b, then flows into the supply tank 400 for use by the semiconductor process equipment 500. In this embodiment, the liquid handling system 10' may also include a flow meter 700, disposed between the filters 100a and 100b and the supply tank 400, to control the liquid volume in the supply tank 400.

[0031] Figure 5 This is a schematic diagram of a liquid handling system according to another embodiment of the present invention. In this embodiment, the filter device 100 / 100' can be applied to, for example... Figure 5 The liquid handling system 10'' shown is used for filtering liquids. It should be noted that the various components in the liquid handling system 10'' are merely illustrative, and the coupling relationships between the components are only schematic. Anyone skilled in the art can easily understand the implications of this description. Figure 5 The components of the liquid handling system 10'' shown can be added, removed, or rearranged independently.

[0032] Furthermore, the liquid handling system 10'' in this embodiment and Figure 5 The liquid handling system 10' is similar to that of the previous embodiment. Therefore, this embodiment uses the component reference numerals and some content from the previous embodiment, where the same reference numerals are used to represent the same or similar components, and descriptions of the same technical content are omitted. For descriptions of the omitted parts, please refer to the previous embodiment; this embodiment will not repeat them. The following will describe the liquid handling system 10'' of this embodiment and... Figure 4 The differences in the liquid handling system 10' are explained.

[0033] Please refer to Figure 5 In this embodiment, the liquid handling system 10' may include multiple filter devices 100c and 100d (shown as two, but not limited thereto), and the filter devices 100c and 100d may be as follows: Figure 5 The liquids are connected in series as shown. With this configuration, the liquid in the mixing tank 300 first flows into the filter device 100c for filtration. The filtered liquid flowing out of the filter device 100c can then flow into the filter device 100d for further filtration. The filtered liquid from the filter devices 100c and 100d can then flow into the supply tank 400 for use by the semiconductor process equipment 500. In this embodiment, the liquid handling system 10' may also include a flow meter 700, which can be positioned between the filter device 100d (the filter device closest to the supply tank 400) and the supply tank 400 to control the liquid volume in the supply tank 400.

[0034] A filtration method for filtering liquids can be derived from the filtration apparatus of the foregoing embodiments, which may include the following steps: First, liquid L1 is allowed to flow into the aforementioned filtration apparatus (e.g., filtration apparatus 100, but not limited thereto) for filtration. Next, it is detected whether the flow rate of this liquid L1 is lower than the normal flow rate. If so, filtration of liquid L1 is stopped and abnormal handling or backwashing is performed. If not, it indicates that there should be no blockage in the filtration apparatus and filtration of liquid L1 can continue. Figure 6 and Figure 7 Two examples of the filtering methods described above will be illustrated, but the embodiments of the present invention are not limited thereto.

[0035] Figure 6 This is a schematic flowchart of a filtration method according to an embodiment of the present invention. A filtration method for filtering liquids can be derived using the filtration apparatus of the foregoing embodiment, and this filtration method includes the following steps. It should be noted that the following description of the embodiments is based on… Figure 1 The filter device 100 and Figure 3The liquid handling system 10 is described by way of example; however, anyone skilled in the art will understand that the aforementioned filtration device 100' and liquid handling systems 10', 10'' can also be applied to... Figure 6 In the filtering method.

[0036] Please refer to Figure 1 , Figure 3 and Figure 6 First, step S110 is executed, causing the liquid L1 in the storage tank 150 to flow into the filter device 100 through the inlet 112 for filtration. In this embodiment, for example, the liquid L1 can be driven from the storage tank 150 into the filter device 100 through the inlet 112 by a liquid pump 140.

[0037] Next, step S120 is executed to detect whether the liquid flow rate is lower than the normal flow rate. In this embodiment, the filter device 100 may further include a flow meter, which may be installed at the inlet 112, the first outlet 114, and / or the second outlet 116 of the filter device 100 to obtain the flow rate of the liquid flowing through each inlet and outlet of the filter device 100, thereby determining whether the flow rate is lower than the normal flow rate. If not, the process returns to step S110 to continue filtration.

[0038] If so, proceed to step S130 to confirm whether the liquid storage tank 150 is empty. In this embodiment, the liquid storage tank 150 of the filter device 100 may also include a liquid level sensor to sense the liquid level in the liquid storage tank 150, thereby determining whether the liquid flow rate being lower than the normal flow rate is due to the liquid storage tank 150 being empty. If not, it indicates that the filter device 100 has an abnormal condition (such as filter element 120 being blocked or damaged), and step S140 can be executed to stop filtration and perform standard operating procedures (SOPs) for abnormal handling, such as cleaning the filter element or replacing components.

[0039] If so, it means that the liquid in the storage tank 150 has been completely filtered, and step S150 can be executed to backwash the filter device 100. In this embodiment, backwashing refers to rinsing the filter device 100 with water or solution, and usually rinsing is performed in the opposite direction to the previous liquid flow direction, so as to backwash out particles that may be stuck in the filter element 120.

[0040] Next, step S160 is executed to confirm whether the filter device 100 has exceeded its service life. If so, step S170 is executed to replace the filter device 100, and after replacement, step S180 is executed to stop the current filtration process. If not, it means that the filter device 100 has not exceeded its service life and can continue to be used. In this case, there is no need to replace the filter device 100, and step S180 can be executed directly to stop the current filtration process. Thus, the filter device 100 of this embodiment, combined with the above-described filtration method, can efficiently monitor and immediately handle problems occurring in the filtration process, and can also effectively extend the service life of the filter device 100.

[0041] Figure 7 This is a schematic flowchart of a filtration method according to another embodiment of the present invention. Another filtration method for filtering liquids can be derived using the filtration apparatus of the foregoing embodiment, which includes the following steps. It should be noted that the following description of the embodiments is based on… Figure 1 The filter device 100 and Figure 3 The liquid handling system 10 is described by way of example; however, anyone skilled in the art will understand that the aforementioned filtration device 100' and liquid handling systems 10', 10'' can also be applied to... Figure 7 In the filtering method. It should be noted here that, Figure 7 Solid arrows indicate the filtering process under normal conditions, while dashed arrows indicate the filtering process under abnormal conditions.

[0042] Please refer to Figure 1 , Figure 3 and Figure 7 First, step S210 is executed, causing the liquid L1 in the storage tank 150 to flow into the filter device 100 through the inlet 112 for filtration. In this embodiment, the liquid L1 can be driven from the storage tank 150 into the filter device 100 through the inlet 112 by, for example, a liquid pump 140.

[0043] Next, step S220 is executed to detect whether the flow rate of liquid L1 is lower than the normal flow rate. In this embodiment, the filter device 100 may also include a flow meter, which may be installed at the inlet 112, the first outlet 114 and / or the second outlet 116 of the filter device 100 to obtain the flow rate of liquid flowing through each inlet and outlet of the filter device 100, thereby determining whether the flow rate is lower than the normal flow rate (e.g., the flow rate when the filter element 120 is not blocked). If not, it indicates that the flow rate is normal and step S230 can be executed to continue filtration until the liquid L1 in the entire storage tank 150 is filtered.

[0044] Next, step S240 is performed to clean the liquid storage tank 150 to remove residual particles and impurities. Next, step S250 is performed to backwash the filter device 100, that is, to rinse the filter device 100 with water or solution in the opposite direction of the previous liquid flow to backwash out particles that may be stuck in the filter element 120.

[0045] Next, step S260 is executed to confirm whether the filter device 100 has exceeded its service life. If so, step S270 is executed to replace the filter device 100, and after replacement, step S280 is executed to stop the current filtration process. If not, it means that the filter device 100 has not exceeded its service life and can continue to be used. In this case, there is no need to replace the filter device 100, and step S280 can be executed directly to stop the current filtration process.

[0046] The above steps are the procedures performed under normal filtration conditions. However, if the filtration process is abnormal, the following different procedures (indicated by dashed lines) may be performed.

[0047] If the flow rate of liquid L1 is detected to be lower than the normal flow rate in step S220, it may indicate that the filter element 120 is blocked. Therefore, instead of continuing filtration, the process will skip directly to step S250 to backwash the filter device 100 to remove particles that may be stuck in the filter element 120.

[0048] Next, step S260 is executed to confirm whether the filter device 100 has exceeded its service life. If so, step S270 is executed to replace the filter device 100, and after replacement, the process returns to step S210 to continue the previous filtration process. If not, it means that the filter device 100 has not exceeded its service life and can continue to be used. In this case, there is no need to replace the filter device 100, and the process can be directly returned to step S210 to continue the previous filtration process. In this way, the filter device 100 of this embodiment, combined with the above-described filtration method, can efficiently monitor and immediately handle problems occurring in the filtration process, and can also effectively extend the service life of the filter device 100.

[0049] In summary, the filtration device of this embodiment of the invention is provided with an inlet, a first outlet, and a second outlet. Liquid flows into the cavity of the filtration device through the inlet, while the filtered liquid, having passed through the filter element wall, flows out of the cavity through the first outlet. Liquid that fails to pass through the filter element wall and is subsequently discharged through the second outlet. This configuration allows large particles filtered out of the liquid to be discharged from the cavity through the second outlet during the filtration process, rather than remaining inside the cavity. This reduces the problem of filter element blockage affecting the filtration effect and extends the service life of the filtration device.

[0050] Furthermore, the liquid flow direction within the cavity of this disclosure is not perpendicular to the filter element wall when flowing into / out of the filter element, but rather in a direction nearly parallel to the filter element wall (e.g., along the spiral direction surrounding the filter element). With this configuration, because the angle between the liquid flow direction within the cavity and the filter element wall is small, large particles trapped within the filter element can be easily carried away by the water flow and discharged from the cavity through the second outlet. This reduces the problem of large particles becoming stuck in the pores of the filter element, causing filter element blockage and shortening its lifespan. Moreover, the filtration device and filtration method of this disclosure can efficiently monitor and immediately address problems occurring during the filtration process, and can also effectively extend the service life of the filtration device.

[0051] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the embodiments of the present invention, and are not intended to limit them. Although the embodiments of the present invention have been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A filtration device for filtering grinding slurry, characterized in that, include: The cavity includes an inlet, a first outlet, and a second outlet. The grinding slurry is used to enter the cavity through the inlet. The first outlet is located at a first end of the cavity, and the second outlet is located at a second end opposite to the first end. as well as A filter element is disposed in the cavity. The filter element includes a filter element tube wall. The grinding slurry is used to pass through the filter element tube wall to filter into a filtered liquid. The filtered liquid flows out of the cavity through the first outlet. The filtered liquid that fails to pass through the filter element tube wall flows out of the cavity through the second outlet.

2. The filtration device according to claim 1 further includes a liquid pump coupled to the liquid inlet to drive the grinding slurry to flow in the cavity along a spiral direction surrounding the filter element, or the angle between the flow direction of the grinding slurry and the wall of the filter element is less than 45 degrees.

3. The filtration device according to claim 1, wherein the liquid inlet is disposed at the first end of the cavity.

4. The filtration device according to claim 1, wherein the filter element is a double-opening filter element, having a first open end and a second open end that are opposite to and connected to each other, the first open end facing the first end, and the second open end facing the second end.

5. The filtration device according to claim 4, wherein the inlet is provided corresponding to the first open end so that the grinding slurry flows into the filter element through the inlet, the first outlet is provided between the filter element tube wall and the cavity, and the second outlet is provided corresponding to the second open end.

6. The filtration device according to claim 1, wherein the filter element is a single-opening filter element having an open end facing the first end and a closed end facing the second end.

7. The filtration device according to claim 6, wherein the liquid inlet is disposed between the filter element tube wall and the cavity, the first liquid outlet is disposed corresponding to the open end, and the second liquid outlet is disposed corresponding to the closed end.

8. The filtration device according to claim 1, further comprising: A storage tank is coupled to the cavity and used to store the grinding slurry, wherein the grinding slurry flows into the cavity from the storage tank through the inlet, and the discharged liquid flows out of the cavity through the second outlet and back into the storage tank.

9. A filtration method, characterized in that, include: The grinding slurry is allowed to flow into the filter device through the inlet for filtration; The filtered liquid, obtained by passing through the filter element of the filter device, flows out of the filter device through the first outlet. as well as The filtered liquid that fails to pass through the filter element flows out of the filtration device through the second outlet.

10. A filtration method, characterized in that, include: The grinding slurry is allowed to flow into the filtration device for filtration; Detect whether the flow rate of the grinding slurry is lower than the normal flow rate; If so, stop filtering the grinding slurry and perform abnormal treatment or backwashing; as well as If not, continue filtering the grinding slurry.

Images