Ruler and compass structure of photomask

By designing the graphics of the exposed area and the non-exposed area on the photocoat, and using the scale bar and the identification figure, the problem of the existing photocoat ruler detection is solved, and faster and more accurate detection is achieved.

CN222213193UActive Publication Date: 2024-12-20FUJIAN HUAJIACAI CO LTD
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Patent Information

Application Number
CN202420863761.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-04-24
Publication Date
2024-12-20
Estimated Expiration
2034-04-24

AI Technical Summary

Technical Problem

The existing mask ruler inspection requires manual search of exposure areas through the eyes and comparing numbers, which is time-consuming and error-prone, especially for product judgments of different process processes.

Method used

Design a ruler structure of a photocoat, two ruler areas are set at both ends of each side to distinguish the exposure area graphic and non-exposure area graphic. Use the scale baseline and the scale bars of different heights to distinguish it, and add the area identification figure so as to for identification.

Benefits of technology

The detection time is greatly shortened, and the recognition speed is reduced from 30s to about 10s, which improves the detection accuracy and speed and reduces manual errors.

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Abstract

The utility model discloses a ruler and compass structure of a photomask, and relates to the technical field of photomasks. Two ruler areas are arranged at the two ends of each edge of the photomask, each ruler area comprises at least one ruler pattern, and each ruler pattern comprises a scale base line, an exposure area pattern located in the middle of the scale base line, non-exposure area patterns located on the two sides of the scale base line and exposure scale values. The position of the exposure area pattern is set according to a target exposure area range determined by a manufacturing process of a product corresponding to the photomask, and the exposure area pattern and the non-exposure area pattern are designed differently. By differentially designing the exposure area pattern and the non-exposure area pattern, when a tester detects the ruler, the tester only needs to find the exposure area pattern with eyes and does not need data comparison, and the brain can immediately judge whether the edge exposure process is abnormal or not because the image identification speed of the brain is far higher than that of the data comparison.
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Description

Technical Field

[0001] The utility model relates to the technical field of photomasks, in particular to a ruler structure of a photomask. Background Art

[0002] Rulers are used in the optoelectronics field to design patterns on photomasks, mainly to remove TFT glass scraps, such as Figure 1 As shown in the figure. Since the ruler has not yet been automatically recognized in the process technology, it is necessary to manually check the ruler to see if there is any abnormality. The first action of the person to check the ruler is to look for the value of the exposure area with his eyes, such as Figure 2 Then, we compare the memory in our brain to see if it meets the range of the product process number (i.e. Figure 3 The exposure process shown in the exposure process manual describes the exposure area numbers 0 to -5 for the process process). If the exposure area is within the range, it is determined that there is no abnormality in the exposure process. If it is out of the range, it is determined that the product exposure is abnormal.

[0003] However, the existing judgment can only be based on numerical values, which requires high eyesight and memory extraction. It also takes a certain amount of time, usually 30 seconds to complete the identification. In addition, different product manufacturing processes may correspond to different ranges. If there is a deviation in memory, the comparison is prone to errors. Summary of the invention

[0004] The technical problem to be solved by the utility model is to provide a ruler structure of a photomask, an improved ruler structure for manual judgment, which meets the requirement of easier visual identification and improves the speed and accuracy of manual judgment.

[0005] The utility model is achieved in this way:

[0006] A ruler structure for a photomask, wherein two ruler areas are arranged at both ends of each side of the photomask, each ruler area includes at least one ruler pattern, each ruler pattern includes a scale baseline, an exposure area pattern located in the middle of the scale baseline, non-exposure area patterns located on both sides of the scale baseline, and an exposure scale value, the position of the exposure area pattern is set according to a target exposure area range determined by a process technology of a product corresponding to the photomask, and the exposure area pattern is designed differently from the non-exposure area pattern.

[0007] Further, when the exposure scale value is a multiple of 5, the exposure area graphic and the non-exposure area graphic both include a scale bar with a first height value set above the scale baseline; when the exposure scale value is not a multiple of 5, the exposure area graphic and the non-exposure area graphic both include a scale bar with a second height value set above the scale baseline; the first height value is greater than the second height value; and the exposure area graphic also includes an area identification graphic.

[0008] Optionally, the area identification graphic is located below the scale baseline and is a rectangular area, one end of the rectangular area corresponds to the minimum value of the target exposure area range, and the other end corresponds to the maximum value of the target exposure area range.

[0009] Optionally, the area identification graphic is located above the scale baseline and is two arrows, one arrow points to the scale bar corresponding to the minimum value of the target exposure area range, and the other arrow points to the scale bar corresponding to the maximum value of the target exposure area range.

[0010] Further, the exposure area graphic includes a scale bar with a third height value set above the scale baseline, and the non-exposure area graphic includes a scale bar with a fourth height value set above the scale baseline, and the third height value is greater than the fourth height value, or the third height value is less than the fourth height value.

[0011] Further, when the third height value is greater than the fourth height value, the height of the middle scale bar of the exposure area graphic is greater than the third height value.

[0012] Further, when the third height value is smaller than the fourth height value, the height of the middle scale bar of the exposure area graphic is smaller than the third height value.

[0013] Furthermore, the non-exposure area graphic includes a scale bar with a fifth height value set above the scale baseline, and the exposure area graphic includes a scale bar with a height greater than the fifth height value set above the scale baseline, and the height decreases from the middle to both sides.

[0014] Furthermore, the non-exposure area graphic includes a scale bar with a sixth height value arranged above the scale baseline, and the exposure area graphic includes a scale bar with a height less than the sixth height value arranged above the scale baseline, and the height increases from the middle to both sides.

[0015] Optionally, each ruler area includes ten ruler patterns arranged in parallel.

[0016] The advantages of the utility model are:

[0017] By distinguishing between the design of the exposure area pattern and the non-exposure area pattern, when the tester detects the ruler, the eyes only need to find the exposure area pattern, and no data comparison is required. The brain can immediately determine whether the exposure edge process is abnormal. Because the brain's image recognition speed is much faster than the data comparison speed, the recognition time can be shortened to about 10s. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention will be further described below in conjunction with the embodiments with reference to the accompanying drawings.

[0019] Figure 1 It is a schematic diagram of a ruler area in the prior art;

[0020] Figure 2 It is a schematic diagram of a local pattern of a ruler area after exposure on glass in the prior art;

[0021] Figure 3 It is a schematic diagram of an exposure area in a manufacturing process in the prior art;

[0022] Figure 4 This is a diagram showing the structure of a ruler in an embodiment of the utility model;

[0023] Figure 5 A schematic diagram of a ruler area of ​​an embodiment of the utility model;

[0024] Figure 6 This is one of the schematic diagrams of a ruler and compass of an embodiment of the utility model;

[0025] Figure 7 This is a second schematic diagram of a ruler and compass of an embodiment of the utility model;

[0026] Figure 8 This is a third schematic diagram of a ruler and compass of an embodiment of the utility model;

[0027] Fig. 9 This is a fourth schematic diagram of a ruler and compass of an embodiment of the present utility model;

[0028] Fig.10 This is a fifth schematic diagram of a ruler and compass of an embodiment of the present utility model;

[0029] Fig.11 This is the sixth schematic diagram of a ruler and compass of an embodiment of the present utility model;

[0030] Fig.12 This is the seventh schematic diagram of a ruler and compass of an embodiment of the utility model;

[0031] Fig.13 This is the eighth schematic diagram of a ruler and compass of an embodiment of the utility model;

[0032] Fig.14 It is a partial graphic schematic diagram of a ruler area after exposure on glass according to an embodiment of the utility model. DETAILED DESCRIPTION

[0033] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings and specific implementation methods. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the utility model.

[0034] In the description of the present invention, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limitations on the present invention.

[0035] See also Figures 4 to 14 As shown, the present utility model example provides a ruler structure of a photomask, and two ruler areas 100 (such as Figure 4 The four sides of the rectangular mask 200 are provided with eight ruler regions 100, each of which includes at least one ruler pattern 10 (eg Figure 5 The ruler area 100 shown includes ten ruler patterns 10 arranged in parallel, and other numbers of ruler patterns 10 may be provided as required. Each ruler pattern 10 includes a scale base line 1, an exposure area pattern 2 located in the middle of the scale base line, non-exposure area patterns 3 located on both sides of the scale base line, and exposure scale values ​​4. The position of the exposure area pattern 2 is set according to the target exposure area range determined by the process technology of the product corresponding to the mask 200 (for example, in Figures 6 to 9 The target exposure range is from 0 to -5. Figures 10 to 13 In the figure, the target exposure area ranges from -4 to 4), and the exposure area pattern 2 is designed differently from the non-exposure area pattern 3. In order to identify the ruler exposure area more quickly and easily, an improvement method is designed on the ruler.

[0036] In a possible implementation, the scale bar maintains the existing four short and one long design, that is, when the exposure scale value is a multiple of 5 (0 is also a multiple of 5), the exposure area graphic 2 and the non-exposure area graphic 3 both include a scale bar with a first height value set above the scale baseline 1; when the exposure scale value is not a multiple of 5, the exposure area graphic 2 and the non-exposure area graphic 3 both include a scale bar with a second height value set above the scale baseline; the first height value is greater than the second height value; the exposure area graphic 2 also includes a region identification graphic 21. The region identification graphic 21 can be set according to the identification needs, as long as it is easy to identify quickly. For example, Figure 6 As shown, the area identification graphic 21 is located below the scale baseline and is a rectangular area. One end of the rectangular area corresponds to the minimum value -5 of the target exposure area range, and the other end corresponds to the maximum value 0 of the target exposure area range, indicating an exposure area of ​​0 to -5. For another example, Figure 7As shown, the area identification graphic 21 is located above the scale baseline 1 and is two arrows, one arrow points to the scale bar -5 corresponding to the minimum value of the target exposure area range, and the other arrow points to the scale bar 0 corresponding to the maximum value of the target exposure area range, indicating exposure areas 0 to -5.

[0037] In other possible implementations, the existing design of four short and one long scale bars can be changed, and the columnar height of the scale bars can be directly used for distinguishing designs. For example, the exposure area pattern 2 includes a scale bar with a third height value set above the scale baseline, and the non-exposure area pattern 3 includes a scale bar with a fourth height value set above the scale baseline. The third height value can be greater than the fourth height value. Figure 8 As shown, or the third height value is less than the fourth height value, such as Fig. 9 shown.

[0038] When the middle of the target exposure area range is 0, in order to further distinguish the 0-value scale bar, when the third height value is greater than the fourth height value, the height of the middle scale bar of the exposure area graphic 2 is greater than the third height value, such as Fig.10 When the third height value is less than the fourth height value, the height of the middle scale bar of the exposure area graphic 2 is less than the third height value, such as Fig.11 shown.

[0039] When the middle of the target exposure area range is 0, the scale bar of the exposure area graph 2 can also be set to decrease or increase in height from the middle to both sides. Fig.12 As shown, the non-exposure area pattern 3 includes a scale bar with a fifth height value set above the scale baseline 1, and the exposure area pattern 2 includes a scale bar with a height greater than the fifth height value set above the scale baseline 1, and the height decreases from the middle to both sides. Fig.13 As shown, the non-exposure area graphic 3 includes a scale bar with a sixth height value set above the scale baseline, and the exposure area graphic 2 includes a scale bar with a height less than the sixth height value set above the scale baseline, and the height increases from the middle to both sides.

[0040] In addition to the above-mentioned distinguishing designs of the exposure area pattern 2 and the non-exposure area pattern 3, other designs can be made according to requirements, as long as the exposure area pattern 2 and the non-exposure area pattern 3 are clearly visible and easy to identify. In addition to pure numbers, the exposure scale value can also be designed in other forms according to requirements, such as "..., 0-2, 0-1, 0, 0+1, 0+2,..." in sequence.

[0041] The working principle of the embodiment of the utility model is as follows:

[0042] like Fig.14 As shown, the Figure 5 The local pattern of the mask 200 in the ruler area after exposure on the substrate glass is shown. The unexposed part includes a part of the rectangular area (i.e., the area identification pattern 21 in the exposure area pattern 2). It can be determined that the exposure area is within the target exposure range, the product exposure edge is qualified, and the next step can be carried out. If the unexposed part does not include the rectangular area, or includes the entire rectangular area and part of the non-exposure area pattern 3 on the other side, it is determined that the exposure area is not within the target exposure range, and the product exposure edge is unqualified.

[0043] The utility model distinguishes between the exposure area pattern and the non-exposure area pattern. When the tester detects the ruler, the eyes only need to find the exposure area pattern, and no data comparison is required. The brain can immediately determine whether the exposure edge process is abnormal. Because the brain's image recognition speed is much faster than the data comparison speed, the recognition time can be shortened to about 10 seconds, saving about 20 seconds.

[0044] Although the specific implementation methods of the present invention are described above, those skilled in the art should understand that the specific embodiments described are only illustrative and are not intended to limit the scope of the present invention. Equivalent modifications and changes made by those skilled in the art in accordance with the spirit of the present invention should be included in the scope of protection of the claims of the present invention.

Claims

1. A ruler structure of a photomask, characterized in that: Two ruler areas are set at both ends of each side of the mask, each ruler area includes at least one ruler pattern, each ruler pattern includes a scale baseline, an exposure area pattern located in the middle of the scale baseline, non-exposure area patterns located on both sides of the scale baseline, and an exposure scale value. The position of the exposure area pattern is set according to the target exposure area range determined by the process technology of the product corresponding to the mask, and the exposure area pattern is designed differently from the non-exposure area pattern.

2. The ruler structure of a photomask according to claim 1, characterized in that: When the exposure scale value is a multiple of 5, the exposure area graphic and the non-exposure area graphic both include a scale bar with a first height value set above the scale baseline; when the exposure scale value is not a multiple of 5, the exposure area graphic and the non-exposure area graphic both include a scale bar with a second height value set above the scale baseline; the first height value is greater than the second height value; the exposure area graphic also includes an area identification graphic.

3. A ruler structure of a photomask according to claim 2, characterized in that: The area identification graphic is located below the scale baseline and is a rectangular area. One end of the rectangular area corresponds to the minimum value of the target exposure area range, and the other end corresponds to the maximum value of the target exposure area range.

4. The ruler structure of a photomask according to claim 2, characterized in that: The area identification graphic is located above the scale baseline and is two arrows, one arrow points to the scale bar corresponding to the minimum value of the target exposure area range, and the other arrow points to the scale bar corresponding to the maximum value of the target exposure area range.

5. The ruler structure of a photomask according to claim 1, characterized in that: The exposure area graphic includes a scale bar with a third height value set above the scale baseline, and the non-exposure area graphic includes a scale bar with a fourth height value set above the scale baseline, and the third height value is greater than the fourth height value, or the third height value is less than the fourth height value.

6. The ruler structure of a photomask according to claim 5, characterized in that: When the third height value is greater than the fourth height value, the height of the middle scale bar of the exposure area graphic is greater than the third height value.

7. The ruler structure of a photomask according to claim 5, characterized in that: When the third height value is less than the fourth height value, the height of the middle scale bar of the exposure area graphic is less than the third height value.

8. The ruler structure of a photomask according to claim 1, characterized in that: The non-exposure area graphic includes a scale bar with a fifth height value set above the scale baseline, and the exposure area graphic includes a scale bar with a height greater than the fifth height value set above the scale baseline, and the height decreases from the middle to both sides.

9. The ruler structure of a photomask according to claim 1, characterized in that: The non-exposure area graphic includes a scale bar with a sixth height value arranged above the scale baseline, and the exposure area graphic includes a scale bar with a height less than the sixth height value arranged above the scale baseline, and the height increases from the middle to both sides.

10. The ruler structure of a photomask according to claim 1, characterized in that: Each ruler area includes ten ruler patterns arranged in parallel.