Post-etching cleaning device for ceramic film processing

Abstract

The utility model provides an after-etching cleaning device for ceramic film processing. Comprising a water tank, a net rack and a cleaning structure, a net rack is arranged on the water tank and is of a double-layer structure, and soft nails are uniformly arranged on net rack wires on adjacent surfaces of the double-layer net rack and are made of corrosion-resistant plastic; water pumping pipes are arranged at the four corners of the upper surface of the water tank, the water pumping pipes penetrate through the water tank and extend to the positions, close to the bottom end, of the water tank, two sets of pipelines are arranged at the top ends of the four water pumping pipes and are of a U-shaped structure, and water spraying assemblies are arranged between the pipelines; through the action of the water spraying assembly, sprayed water has a certain impact force and can uniformly cover corresponding areas, cleaning is more complete, and meanwhile the situation that the ceramic film is damaged during direct high-power flushing is avoided; under the action of air injection, the water flow forms a spraying effect.

Description

Technical Field

[0001] One or more embodiments of the present specification relate to the technical field of etching and cleaning, and in particular, to a post-etching cleaning device for ceramic thin film processing. Background Art

[0002] Etching is a technique that uses chemical reactions or physical impact to remove part of a material. Etching techniques can be divided into two categories: wet etching and dry etching.

[0003] The Chinese utility model patent of the prior art application number: 2019215022923, patent name: an etching cleaning machine, describes "the etching product body is placed in the arc groove on the limit rod, so that the etching product body is stably connected, and then the limit rod and the baffle are connected by screws, and the baffle and the connecting plate can be easily disassembled through the flange, and then the cleaning liquid and clean water are respectively injected into the first water pool and the second water pool, so that the etching product body is first placed in the cleaning liquid for cleaning, and then the first motor is started, and the first motor is accelerated through the reducer, thereby driving the active gear at the output end to rotate, and the active gear will drive the driven gear meshing with it to rotate, so that it drives the baffle to rotate", however, when in use, it adopts a simple water flow method for cleaning, but such a method cannot meet its more effective cleaning effect during cleaning, and thus cannot meet the requirements of the prior art, Utility Model Content

[0004] In view of this, the purpose of the present invention is to provide a post-etching cleaning device for ceramic thin film processing to solve the problems in the above-mentioned background technology.

[0005] Based on the above purpose, the utility model provides a post-etching cleaning device for ceramic film processing, comprising a water tank, a grid frame and a cleaning structure.

[0006] A grid is arranged on the water tank, and the grid is a double-layer structure, and soft nails are evenly arranged on the grid wires of adjacent surfaces of the double-layer grid, and the soft nails are made of corrosion-resistant plastic;

[0007] Suction pipes are arranged at the four corners of the upper surface of the water tank, and the suction pipes penetrate the water tank and extend to the bottom of the water tank. Two groups of pipes are arranged at the top of the four suction pipes. The two groups of pipes are U-shaped structures, and water spray components are arranged between the pipes.

[0008] Preferably, water pumps are provided at the connection between the water pumping pipeline and the pipeline, and the outputs of the water pumps provided at both ends of the pipeline are flushed into the pipeline.

[0009] Preferably, the water spray assembly comprises: a connecting pipe, the connecting pipe is connected to the pipelines on both sides, and a corresponding jet assembly is arranged on the upper surface of the connecting pipe.

[0010] Preferably, a water outlet is provided below the connecting pipe at a position corresponding to the jet assembly.

[0011] Preferably, the jet assembly comprises: an air pump and a jet port, the jet port is arranged at the bottom of the air pump, and the bottom of the jet port extends to the water outlet, the jet port is in a truncated cone structure near the bottom, and through holes are evenly arranged on the inclined surface.

[0012] From the above description, it can be seen that the utility model provides a post-etching cleaning device for ceramic film processing. Water is flushed inwardly through a water pump, and through the action of a water spray component, the sprayed water has a certain impact force and can evenly cover the corresponding area, so that the cleaning is more complete, and at the same time, it is avoided that the ceramic film is damaged during direct high-power flushing. When used, the through hole is set to help the jet to form a spray effect under the jet. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate one or more embodiments of the present specification or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only one or more embodiments of the present specification. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0014] Figure 1 It is a schematic diagram of the overall top view structure of the present invention;

[0015] Figure 2 It is a schematic diagram of the cross-sectional structure of the overall main view of the present invention;

[0016] Figure 3 It is a structural schematic diagram of the grid frame of the present invention;

[0017] Figure 4 It is a schematic diagram of one or more embodiments of this specification.

[0018] In the figure: 1, water tank; 11, water pump; 12, pipeline; 13, connecting pipe; 14, air pump; 15, grid; 16, injection port; 17, water outlet; 18, soft nail. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0020] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the utility model should be the common meanings understood by people with ordinary skills in the field to which the disclosure belongs. The "first", "second" and similar words used in the present disclosure do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0021] Embodiment 1:

[0022] like Figure 1-3 As shown, a post-etching cleaning device for ceramic thin film processing is provided, including a water tank 1, a grid frame 15 and a cleaning structure.

[0023] The water tank 1 is provided with a grid 15, and the grid 15 is a double-layer structure, and soft nails 18 are evenly arranged on the grid wires of adjacent surfaces of the double-layer grid 15, and the soft nails 18 are made of corrosion-resistant plastic;

[0024] The upper frame of the double-layer grid 15 is made of corrosion-resistant metal. When in use, the soft nails between the grids 15 fit together after the double-layer grid 15 is installed.

[0025] Water pumping pipes are arranged at the four corners of the upper surface of the water tank 1, and the water pumping pipes penetrate the water tank 1 and extend to the bottom of the water tank 1. Two groups of pipes 12 are arranged at the top of the four water pumping pipes. The two groups of pipes 12 are U-shaped structures, and water spraying components are arranged between the pipes 12.

[0026] A water pump 11 is provided at the connection between the water pumping pipeline and the pipeline 12 , and the output of the water pump 11 provided at both ends of the pipeline 12 is flushed into the pipeline 12 .

[0027] Among them, the water pump 11 flushes water inward, and through the action of the water spray component, the sprayed water has a certain impact force and can evenly cover the corresponding area, making the cleaning more complete and avoiding the damage of the ceramic film caused by direct high-power flushing.

[0028] Embodiment 2:

[0029] like Figure 1-4 As shown, a post-etching cleaning device for ceramic thin film processing is provided, including a water tank 1, a grid frame 15 and a cleaning structure.

[0030] The water tank 1 is provided with a grid 15, and the grid 15 is a double-layer structure, and soft nails 18 are evenly arranged on the grid wires of adjacent surfaces of the double-layer grid 15, and the soft nails 18 are made of corrosion-resistant plastic;

[0031] The upper frame of the double-layer grid 15 is made of corrosion-resistant metal. When in use, the soft nails between the grids 15 fit together after the double-layer grid 15 is installed.

[0032] Water pumping pipes are arranged at the four corners of the upper surface of the water tank 1, and the water pumping pipes penetrate the water tank 1 and extend to the bottom of the water tank 1. Two groups of pipes 12 are arranged at the top of the four water pumping pipes. The two groups of pipes 12 are U-shaped structures, and water spraying components are arranged between the pipes 12.

[0033] A water pump 11 is provided at the connection between the water pumping pipeline and the pipeline 12 , and the output of the water pump 11 provided at both ends of the pipeline 12 is flushed into the pipeline 12 .

[0034] Among them, the water pump 11 flushes water inward, and through the action of the water spray component, the sprayed water has a certain impact force and can evenly cover the corresponding area, making the cleaning more complete and avoiding the damage of the ceramic film caused by direct high-power flushing.

[0035] The water spray assembly includes: a connecting pipe 13, the connecting pipe 13 is connected to the pipelines 12 on both sides, and a corresponding jet assembly is arranged on the upper surface of the connecting pipe 13.

[0036] A water outlet 17 is provided below the connecting pipe 13 at a position corresponding to the jetting assembly.

[0037] The jet assembly includes: an air pump 14 and a jet port 16. The jet port 16 is arranged at the bottom of the air pump 14, and the bottom of the jet port 16 extends to the water outlet 17. The jet port 16 is in a truncated cone structure near the bottom, and through holes are evenly arranged on the inclined surface.

[0038] Among them, when in use, the through hole is set to help the jet to form a spray effect under the jet, so that when in use, the water can better clean the etching agent and the residue on its surface when it is sprayed out.

[0039] Working principle: When in use, the ceramic film is placed between the double-layer grid 15 on the water tank 1, so that the two sides of the ceramic film are supported by soft nails to achieve left and right fixation during use, and then the water meter is turned on to allow water to flow into the connecting pipe 13, and the air pump 14 is used to spray it out in the connecting pipe 13, thereby achieving a spraying effect during use, reducing the loss of the film while ensuring effective cleaning of residual etching agent on the surface of the film.

[0040] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present disclosure (including the claims) is limited to these examples. Under the concept of the present invention, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity.

[0041] The embodiments of the present invention are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A post-etching cleaning device for ceramic thin film processing, comprising a water tank (1), a grid (15) and a cleaning structure, characterized in that: A grid frame (15) is arranged on the water tank (1), and the grid frame (15) is a double-layer structure, and soft nails (18) are evenly arranged on the grid wires of adjacent surfaces of the double-layer grid frame (15), and the soft nails (18) are made of corrosion-resistant plastic; Water suction pipes are arranged at the four corners of the upper surface of the water tank (1), and the water suction pipes penetrate the water tank (1) and extend to the bottom of the water tank (1). Two groups of pipes (12) are arranged at the top ends of the four water suction pipes. The two groups of pipes (12) are in a U-shaped structure, and a water spraying assembly is arranged between the pipes (12).

2. A post-etching cleaning device for ceramic thin film processing according to claim 1, characterized in that: A water pump (11) is provided at the connection between the water pumping pipeline and the pipeline (12), and the output of the water pump (11) provided at both ends of the pipeline (12) is flushed into the pipeline (12).

3. A post-etching cleaning device for ceramic thin film processing according to claim 1, characterized in that: The water spray assembly comprises: A connecting pipe (13) is connected to the pipelines (12) on both sides, and a corresponding jetting assembly is arranged on the upper surface of the connecting pipe (13).

4. A post-etching cleaning device for ceramic thin film processing according to claim 3, characterized in that: A water outlet (17) is arranged below the connecting pipe (13) at a position corresponding to the jetting assembly.

5. The post-etching cleaning device for ceramic thin film processing according to claim 3, characterized in that: The jet assembly comprises: An air pump (14) and an injection port (16), wherein the injection port (16) is arranged at the bottom of the air pump (14), and the bottom of the injection port (16) extends to the water outlet (17), and the injection port (16) is in a truncated cone structure near the bottom, and through holes are evenly arranged on the inclined surface.

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