Polishing mechanism with single polishing belt
The single polishing belt mechanism addresses high cost and low efficiency issues by synchronizing two rollers and tensioning rollers to polish both sides of a product efficiently and cost-effectively, with simplified maintenance.
Patent Information
- Application Number
- CN202421651295.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-12
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-07-12
AI Technical Summary
Polishing belt polishing machines face challenges of high equipment cost and low polishing efficiency, particularly in single-belt systems, and are difficult to maintain.
A single polishing belt mechanism that simultaneously polishes two opposite surfaces of a product using one polishing belt, supported by two rotating rollers and tensioning rollers, with a carrier plate and limiting members to maintain a polishing gap, and includes a reduction motor and guide slides for synchronized operation.
Enhances polishing efficiency, reduces equipment costs, and simplifies maintenance by allowing simultaneous polishing of both surfaces with a single belt, while ensuring effective polishing through synchronized motion and additional guide support.
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Figure CN222244118U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of polishing equipment, in particular to a single polishing belt polishing mechanism. Background Art
[0002] Polishing machines, also known as grinders, are often used for mechanical grinding, polishing and waxing.
[0003] Polishing machines are generally divided into polishing disc polishing machines and polishing belt polishing machines. Polishing belt polishing machines generally use two independently running abrasive polishing belts to polish two surfaces of the product respectively, which has the problems of high polishing equipment cost and difficult maintenance. Another type uses one polishing belt to polish one surface of the product, which has the problem of low polishing efficiency. Utility Model Content
[0004] The embodiment of the present application provides a single-polishing-belt polishing mechanism, which can simultaneously polish two opposite surfaces of a product through one polishing belt, can effectively improve the polishing efficiency while saving equipment costs, and is easy to maintain.
[0005] The embodiment of the present application provides a single-strip polishing belt polishing mechanism for polishing products on a polishing machine, comprising a first rotating roller, a second rotating roller, a polishing belt, a tensioning roller and a limiting member installed on the polishing machine, wherein the polishing belt is sleeved on the first rotating roller and the second rotating roller in a manner that can be driven for directional rotation, and the polishing belt has a first layer and a second layer relative to each other along the rotation direction, wherein there are two tensioning rollers, and the two tensioning rollers are symmetrically distributed between the first rotating roller and the second rotating roller, and the two tensioning rollers are arranged on a side of the first layer away from the second layer in a manner that can rotate to tension the first layer, so that the first layer and the second layer between the two tensioning rollers remain parallel and maintain a predetermined gap, forming a polishing area for simultaneously polishing two opposite surfaces of the product, wherein the limiting member is connected to a carrier plate, the thickness of the carrier plate is less than the thickness of the product to be polished, the carrier plate is located in the polishing area, and is provided with a limiting hole for limiting the product to be polished.
[0006] In a possible implementation, the single polishing belt polishing mechanism also includes a reduction motor installed on the polishing machine, the output shaft fixing sleeve of the reduction motor is provided with a first gear, the roller shaft coaxial sleeve of the second rotating roller is provided with a second gear and a third gear, the first gear and the second gear are connected by a first transmission belt, the roller shaft coaxial sleeve of the first rotating roller is provided with a fourth gear, and the third gear and the fourth gear are connected by a second transmission belt.
[0007] In one possible implementation, the polishing machine is symmetrically provided with a first guide slide and a second guide slide in the polishing area, the first guide slide is slidably arranged on the side of the first layer away from the second layer, and the second guide slide is slidably arranged on the side of the second layer away from the first layer.
[0008] In a possible implementation, the first layer and the second layer between the two tensioning rollers both extend in a horizontal direction, and the first layer is located above the second layer, the first guide slide is set at the top of the first layer in a sliding fit manner, and the second guide slide is set at the bottom of the second layer in a sliding fit manner.
[0009] In a possible implementation, there are two limiting members, and the two limiting members are symmetrically distributed on both sides of the polishing belt, and the carrier is connected between the two limiting members.
[0010] In one possible implementation, the limiting member includes a base, a rotating element, a circular carrier and a driving gear column. The base is fixedly mounted on the polishing machine, the rotating element is installed in the base, the rotating axis of the rotating element extends vertically upward to the top of the base, the circular carrier is coaxially sleeved on the top of the rotating axis, the driving gear column is evenly distributed around the top of the circular carrier, and the carrier plate is a circular plate, and the outer circumference of the carrier plate is provided with teeth matching the driving gear column.
[0011] In a possible implementation manner, the rotating element is implemented as a servo motor.
[0012] Beneficial effects: Compared with the prior art, the single polishing belt polishing mechanism provided by the present application is based on the first rotating roller and the second rotating roller rotatingly supporting the polishing belt, and through two tensioning rollers, the first layer and the second layer of the polishing belt are kept parallel and a predetermined gap is maintained, so as to form a polishing area that can simultaneously polish two opposite surfaces of the product, and then the two opposite surfaces of the product can be polished simultaneously by a single polishing belt, thereby greatly improving the polishing efficiency of the product, saving equipment costs, and being easy to maintain;
[0013] The first guide slide and the second guide slide can provide additional guide support for the first and second layers of the polishing belt in a tensioned state, thereby further ensuring the polishing effect;
[0014] During the polishing process, the driving tooth column on the circular carrier is driven to rotate by the rotating element, and then the product is driven to rotate by the carrier plate, which can further improve the polishing effect.
[0015] These and other purposes, features and advantages of the present invention are fully reflected in the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 A three-dimensional structural schematic diagram of a single polishing belt polishing mechanism of the present application is shown.
[0017] Figure 2 A schematic diagram of the main structure of a single polishing belt polishing mechanism of the present application is shown.
[0018] Figure 3 A partial structural schematic diagram of a single polishing belt polishing mechanism of the present application is shown.
[0019] Figure 4 Shows this application Figure 3 Schematic diagram of the enlarged structure of part A.
[0020] Figure 5 A rear structural schematic diagram of a single polishing belt polishing mechanism of the present application is shown. DETAILED DESCRIPTION
[0021] The following description is used to disclose the utility model so that those skilled in the art can implement the utility model. The preferred embodiments described below are only examples, and those skilled in the art can think of other obvious variations. The basic principles of the utility model defined in the following description can be applied to other embodiments, variations, improvements, equivalents, and other technical solutions that do not deviate from the spirit and scope of the utility model.
[0022] Those skilled in the art should understand that, in the disclosure of the specification, the orientation or position relationship indicated by the terms "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. are based on the orientation or position relationship shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, the above terms should not be understood as limiting the present invention.
[0023] It is to be understood that the term "one" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element may be one, while in another embodiment, the number of the element may be multiple, and the term "one" should not be understood as a limitation on the quantity.
[0024] refer to Figures 1 to 5The embodiment of the present application provides a single polishing belt polishing mechanism, which is used to polish products on a polishing machine. The single polishing belt polishing mechanism includes a first rotating roller 10, a second rotating roller 20, a polishing belt 30, a tensioning roller 40 and a stopper 50 installed on the polishing machine, wherein the polishing belt 30 is sleeved on the first rotating roller 10 and the second rotating roller 20 in a manner that it can be driven to rotate in a directional manner, that is, the first rotating roller 10 and the second rotating roller 20 cooperate with each other to drive the polishing belt 30 to rotate in a directional manner. The polishing belt 30 has a first surface 31 and a second surface 32 opposite to each other along the rotation direction. There are two tensioning rollers 40, and the two tensioning rollers 40 are symmetrically distributed between the first rotating roller 10 and the second rotating roller 20. At the same time, the two tensioning rollers 40 are arranged on the side of the first layer 31 away from the second layer 32 in a rotatable tensioning manner, so that the first layer 31 and the second layer 32 between the two tensioning rollers 40 remain parallel and maintain a predetermined gap, i.e., a polishing gap, to form a polishing area 33 for simultaneously polishing two opposite surfaces of the product. In this way, the two opposite surfaces of the product can be polished simultaneously by a single polishing belt, and the polishing efficiency can be greatly improved by a single polishing belt. In addition, the equipment cost is greatly reduced, and the single polishing belt polishing mechanism is easier to maintain. In addition, the limiting member 50 is connected to a carrier plate 51, wherein the thickness of the carrier plate 51 is less than the thickness of the product to be polished, and the carrier plate 51 is located in the polishing area 33 and is provided with a limiting hole 501 for limiting the product to be polished. Preferably, there are two limiting members 50 , and the two limiting members 50 are symmetrically distributed on both sides of the polishing belt 30 , and the carrier 51 is connected between the two limiting members 50 .
[0025] That is to say, through the action of the two limit members 50, the carrier 51 can be suspended and located in the polishing area 33. The thickness of the product is greater than the thickness of the carrier 51. When the polishing belt 30 rotates in a directional manner, the first layer 31 and the second layer 32 will be relatively tightly attached to the two surfaces of the product, and then the two surfaces will be frosted and polished at the same time. At this time, the carrier 51 remains fixed and close to the middle position in the thickness direction of the product, and only serves to limit the product in the rotation direction of the polishing belt 30.
[0026] During the installation process, one method is: first keep the second layer 32 stationary, put the product into the limiting hole 501 of the carrier 51, and support it on the second layer 32, and then gradually tension the first layer 31 through the tensioning roller 40, so that the first layer 31 gradually approaches the second layer 32 and finally reaches the position of the predetermined polishing gap.
[0027] In one embodiment, the single polishing belt polishing mechanism further includes a reduction motor 60 installed on the polishing machine. The output shaft 61 of the reduction motor 60 is fixedly sleeved with a first gear 62, and the roller shaft 21 of the second rotating roller 20 is coaxially sleeved with a second gear 22 and a third gear 23, wherein the first gear 62 and the second gear 22 are connected by a first transmission belt 63, and in addition, the roller shaft 11 of the first rotating roller 10 is coaxially sleeved with a fourth gear 12, and the third gear 23 and the fourth gear 12 are connected by a second transmission belt 24, so that the reduction motor 60 can realize synchronous driving of the first rotating roller 10 and the second rotating roller 20 by gear and transmission belt transmission, and the transmission stability is good and the reliability is high.
[0028] In one embodiment, the polishing machine is symmetrically provided with a first guide slide 71 and a second guide slide 72 at the polishing area 33, wherein the first guide slide 71 is slidably arranged on the side of the first layer 31 away from the second layer 32, and the second guide slide 72 is slidably arranged on the side of the second layer 32 away from the first layer 31, so that in the process of tensioning the first layer 31 and the second layer 32 for frosting and polishing the product, the first layer 31 and the second layer 32 can be respectively slidably guided and supported by the first guide slide 71 and the second guide slide 72, and this additional support can further ensure the frosting and polishing effect of the first layer 31 and the second layer 32 on the product.
[0029] Further preferably, the first plane 31 and the second plane 32 between the two tension rollers 40 extend in the horizontal direction, and the first plane 31 is located above the second plane 32, wherein the first guide slide 71 is arranged at the top of the first plane 31 in a sliding fit manner, and the second guide slide 72 is arranged at the bottom of the second plane 32 in a sliding fit manner. This vertical distribution of the first plane 31 and the second plane 32 is only an example, and obviously, the first plane 31 and the second plane 32 can also be kept parallel in the inclined direction, or kept parallel in the vertical direction, and the working principle and effect of the frosting and polishing are similar to the vertical distribution of the upper and lower planes provided in this application, and can even be said to be the same, and will not be described in detail here.
[0030] In one embodiment, the limit member 50 includes a base 52, a rotating element, a circular carrier 53 and a driving gear column 54, wherein the base 52 is fixedly mounted on the polishing machine, wherein the rotating element is mounted in the base 52, and the rotating axis of the rotating element extends vertically upward to the top of the base 52, and the circular carrier 53 is coaxially sleeved on the top of the rotating axis, and the driving gear column 54 is evenly distributed around the top of the circular carrier 53. In addition, the carrier plate 51 is a circular plate, and the outer circumference of the carrier plate 51 is provided with teeth 55 that cooperate with the driving gear column 54. In this way, the rotating element drives the circular carrier 53 to rotate, and the annularly distributed driving gear column 54 on the circular carrier 53 will rotate in a directional manner, and then can drive the carrier plate 51 to rotate synchronously based on the meshing relationship with the teeth 55. In the process of synchronously polishing the two opposite surfaces of the product on the first layer 31 and the second layer 32, the carrier plate 51 drives the product to rotate synchronously again, which can further improve the polishing effect of the product.
[0031] The rotary element is embodied as a servomotor.
[0032] It should be noted that the terms "first, second" in the present application are only used for descriptive purposes and do not indicate any order. They cannot be understood as indicating or implying relative importance. These terms can be interpreted as names.
[0033] It should be understood by those skilled in the art that the embodiments of the present invention described above and shown in the accompanying drawings are only examples and do not limit the present invention. The advantages of the present invention have been fully and effectively realized. The functions and structural principles of the present invention have been demonstrated and explained in the embodiments, and the embodiments of the present invention may be deformed or modified in any way without departing from the principles.
Claims
1. Single-strip polishing belt polishing mechanism, used for polishing products on a polishing machine, characterized in that: The polishing machine comprises a first rotating roller, a second rotating roller, a polishing belt, a tensioning roller and a limiting member installed on the polishing machine, wherein the polishing belt is sleeved on the first rotating roller and the second rotating roller in a manner that can be driven for directional rotation, and the polishing belt has a first layer and a second layer relative to each other along the rotation direction, wherein there are two tensioning rollers, and the two tensioning rollers are respectively close to the inner sides of the first rotating roller and the second rotating roller, and are arranged on a side of the first layer away from the second layer in a manner that can rotatably tension the first layer, so that the first layer and the second layer between the two tensioning rollers remain parallel and maintain a predetermined gap, forming a polishing area for simultaneously polishing two opposite surfaces of the product, wherein the limiting member is connected to a carrier plate, the thickness of the carrier plate is less than the thickness of the product to be polished, the carrier plate is located in the polishing area, and is provided with a limiting hole for limiting the product to be polished.
2. The single-strip polishing belt polishing mechanism according to claim 1, characterized in that: It also includes a reduction motor installed on the polishing machine, the output shaft fixing sleeve of the reduction motor is provided with a first gear, the roller shaft coaxial sleeve of the second rotating roller is provided with a second gear and a third gear, the first gear and the second gear are connected by a first transmission belt, the roller shaft coaxial sleeve of the first rotating roller is provided with a fourth gear, and the third gear and the fourth gear are connected by a second transmission belt.
3. The single-strip polishing belt polishing mechanism according to claim 1, characterized in that: The polishing machine is symmetrically provided with a first guide slide and a second guide slide in the polishing area. The first guide slide is slidably arranged on the side of the first layer away from the second layer, and the second guide slide is slidably arranged on the side of the second layer away from the first layer.
4. The single-strip polishing belt polishing mechanism according to claim 3, characterized in that: The first layer and the second layer between the two tensioning rollers both extend in the horizontal direction, and the first layer is located above the second layer, the first guide slide is set at the top of the first layer in a sliding fit manner, and the second guide slide is set at the bottom of the second layer in a sliding fit manner.
5. The single-strip polishing belt polishing mechanism according to claim 1, characterized in that: There are two limiting members, and the two limiting members are symmetrically distributed on both sides of the polishing belt, and the carrier is connected between the two limiting members.
6. The single-strip polishing belt polishing mechanism according to claim 5, characterized in that: The limiting member includes a base, a rotating element, a circular carrier and a driving gear column. The base is fixedly mounted on the polishing machine, the rotating element is mounted in the base, the rotating axis of the rotating element extends vertically upward to the top of the base, the circular carrier is coaxially sleeved on the top of the rotating axis, the driving gear column is evenly distributed around the top of the circular carrier, and the carrier plate is a circular plate, and the outer circumference of the carrier plate is provided with teeth that match the driving gear column.
7. The single-strip polishing belt polishing mechanism according to claim 6, characterized in that: The rotary element is embodied as a servomotor.
Citation Information
Cited By
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