Quartz lens assembly for polycrystalline silicon reduction furnace
By spraying aluminum layer on the quartz lens assembly of the polysilicon reduction furnace and using gaskets, the problem of microwave energy leakage is solved, energy efficiency utilization and production safety are improved, and environmental protection and efficiency of polysilicon production are improved.
Patent Information
- Application Number
- CN202420918818.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-29
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-04-29
AI Technical Summary
The existing polysilicon reduction furnaces are subject to microwave energy leakage due to high-pressure breakdown during the furnace start operation, causing energy waste, environmental pollution and safety risks.
A quartz lens assembly for polycrystalline silicon reduction furnace is designed. By spraying an aluminum layer on the sides of the quartz lens, it uses its good microwave reflection performance to prevent microwave energy leakage and further fill it through the gasket to ensure energy entering the reduction furnace.
It significantly improves the efficiency of microwave energy efficiency, reduces the impact on the external environment and potential safety hazards, and improves the efficiency, safety and environmental protection of the production and start-up of polysilicon.
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Figure CN222250051U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of integrated circuit manufacturing, in particular to a quartz lens component for a polysilicon reduction furnace. Background Art
[0002] Electronic-grade polysilicon is the core basic material for integrated circuit manufacturing, and the stability of raw material supply in its production process is crucial. In the prior art, traditional reduction furnaces usually use high-voltage breakdown to start the furnace, but this method has a great impact on the deposited carrier silicon core due to the high-voltage shock of up to 10,000 volts, especially for high-quality electronic-grade high-purity polysilicon products. Any slight cracks may lead to a decline in internal quality. In the published utility model patent CN219839478U, a method of using an external microwave generator to heat the deposited carrier silicon core through the quartz lens on the top of the reduction furnace is proposed. However, in actual applications, it is found that about 30% of the microwave energy leaks through the side wall of the quartz lens, which not only causes energy waste, but also may cause environmental pollution and safety risks.
[0003] The published utility model patent CN219839478U proposed a method of using an external microwave generator to heat the deposited carrier silicon core through the quartz lens on the top of the reduction furnace. However, in actual applications, it was found that about 30% of the microwave energy leaked through the side wall of the quartz lens, which not only caused energy waste, but also may cause environmental pollution and safety risks. Utility Model Content
[0004] The utility model aims to provide a quartz lens assembly for a polysilicon reduction furnace, which enables most of the microwave energy leaked from the polysilicon reduction furnace to be reflected back into the reduction furnace, thereby improving the microwave energy efficiency utilization rate, while reducing the impact of microwaves on the external environment and potential safety hazards, and significantly improving the efficiency, safety and environmental protection of polysilicon production furnace startup.
[0005] Based on the above purpose, the utility model adopts the following technical solutions:
[0006] A quartz lens assembly for a polysilicon reduction furnace comprises an upper and a lower quartz lens arranged in an upper mirror opening of the reduction furnace. The upper and the lower quartz lens are respectively fixed to the inner wall of the mirror opening on the reduction furnace through an upper flange and a lower flange. A metal coating is provided on the side of the quartz lens. The upper and lower surfaces of the quartz lens are both flat.
[0007] Preferably, a metal coating is also provided on the outer peripheral edge of the upper surface of the quartz lens.
[0008] Preferably, the quartz lens is cylindrical or polygonal.
[0009] Preferably, the metal coating is an aluminum, tin, copper or silver coating.
[0010] Preferably, the coating has a thickness of 0.05-15 mm.
[0011] Preferably, a gasket is provided between each quartz lens and the inner wall of the mirror opening.
[0012] Compared with the prior art, the utility model has the following beneficial effects:
[0013] The utility model discloses a quartz lens assembly for a polysilicon reduction furnace, which optimizes the structural design, sprays an aluminum layer of a specific thickness on the outer side and the plane edge surface of the upper surface of the quartz lens, and utilizes the good microwave reflection performance of the aluminum layer to effectively prevent microwave energy from leaking from the side wall of the quartz lens; by accurately calculating and controlling the thickness and distribution of the metal coating, most of the leaked microwave energy can be reflected back into the reduction furnace, thereby improving the microwave energy efficiency and reducing the impact of microwaves on the external environment and potential safety hazards.
[0014] Furthermore, the novel quartz lens assembly is installed on the top or side mirror opening of the reduction furnace, and the microwave reaches the novel quartz lens through the guide tube without leaking from the outer wall. At the same time, the outer side of the quartz lens is filled with a gasket to prevent microwave leakage for a second time, further ensuring that the microwave enters the reduction furnace to heat the silicon core carrier.
[0015] The utility model significantly improves the efficiency, safety and environmental protection of polysilicon production furnace startup by processing the side facade of the quartz lens, and effectively promotes the normal and stable operation of the furnace startup stage in the production process of electronic-grade polysilicon. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 This is a schematic structural diagram of a quartz lens assembly for a polysilicon reduction furnace according to Example 1 of the utility model;
[0017] Figure 2 for Figure 1 Schematic diagram of the structure of the mesoquartz lens;
[0018] Figure 3 for Figure 2 A partial enlarged view of part A in the middle. DETAILED DESCRIPTION
[0019] In order to make the purpose, technical solution and advantages of the utility model clearer, the technical solution of the utility model is described in detail below, but the following embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other implementation methods obtained by those skilled in the art without creative work are within the scope of protection of the utility model.
[0020] Example 1
[0021] A quartz lens assembly for a polysilicon reduction furnace, comprising two upper and lower quartz lenses 5 arranged at the position of the sight glass on the top of the reduction furnace 7, the two quartz lenses are fixed in the sight glass port of the reduction furnace through an upper flange 1 and a lower flange 3 respectively, the microwave guide tube 4 extends to the top of the sight glass port, and a cooling water pipe 6 is also connected to the side wall of the sight glass port, the quartz lens is cylindrical, and the upper and lower surfaces are both flat, and the side of the cylindrical quartz lens is provided with an aluminum coating, which extends upward to the outer peripheral edge 9 of the upper surface of the quartz lens, that is, the upper surface edge is also sprayed with an aluminum coating, and the thickness of the aluminum coating is 5mm. A gasket 2 is also provided between each quartz lens and the inner wall of the sight glass port.
[0022] The quartz lens assembly for the polysilicon reduction furnace of the utility model can also be arranged at the position of the viewing mirror on the side of the reduction furnace. The quartz lens can also be a columnar shape such as a rectangular parallelepiped or a polygonal prism. The coating on the side of the lens is not limited to aluminum, but can also be tin, copper, or silver. The coating of the lens can be applied by spraying or obtained by other means.
[0023] The above is only a specific implementation of the utility model, but the protection scope of the utility model is not limited thereto. Any technician familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed by the utility model, which should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope of the claims.
Claims
1. A quartz lens assembly for a polysilicon reduction furnace, characterized in that: It comprises an upper and a lower quartz lens arranged in the mirror opening on the reduction furnace. The upper and lower quartz lenses are fixed on the inner wall of the mirror opening on the reduction furnace through an upper flange and a lower flange respectively. The side of the quartz lens is provided with a metal coating, and the upper and lower surfaces of the quartz lens are both flat.
2. The quartz lens assembly for a polysilicon reduction furnace according to claim 1, characterized in that: The outer peripheral edge of the upper surface of the quartz lens is also provided with a metal coating.
3. The quartz lens assembly for a polysilicon reduction furnace according to claim 1, characterized in that: The quartz lens is cylindrical or polygonal.
4. The quartz lens assembly for a polysilicon reduction furnace according to claim 1, characterized in that: The metal coating is aluminum, tin, copper or silver coating.
5. The quartz lens assembly for a polysilicon reduction furnace according to claim 1, characterized in that: The coating thickness is 0.05-15 mm.
6. The quartz lens assembly for a polysilicon reduction furnace according to claim 1, characterized in that: A gasket is also arranged between the quartz lens and the inner wall of the viewing mirror opening.
