Photoetching mask plate

Abstract

The utility model provides a photoetching mask plate which comprises a mask plate base body, the surface of the mask plate base body comprises a pattern area and a shading area, and the shading area surrounds the pattern area; the frame is arranged on the surface of the mask plate base body, and the frame surrounds the shading area; and the protection device comprises a protection disc, the surface area of a first end face of the protection disc is larger than that of the pattern area, the protection device is configured to enable the first end face to completely cover the pattern area when the protection device works, and the edge of the protection disc is fixedly arranged on the surface of the shading area. According to the photoetching mask plate provided by the invention, the pattern region on the mask plate substrate can be protected when the binder is removed.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a photolithography mask. Background Art

[0002] The protective film (Pellicle) of the photolithography mask can isolate pollutants and protect the graphic area of ​​the photolithography mask. When defects occur in the manufacturing process of the photolithography mask or haze defects (Haze) appear during the use of the photolithography mask or the protective film is damaged, the photolithography mask needs to be cleaned and repaired and the protective film needs to be replaced. The protective film is usually fixed to the surface of the photolithography mask with organic glue. After removing the protective film, organic glue may remain on the surface of the photolithography mask. At this time, the organic glue needs to be removed by manual wiping or equipment cleaning. Manual operation may cause the human body, clothing or utensils to touch the surface of the photolithography mask during the wiping process, resulting in contamination of the photolithography mask or destruction of the pattern; and the equipment cleaning method may cause the glue to be dissolved by chemicals and transferred to the inside of the photolithography mask, contaminating the graphic area of ​​the photolithography mask.

[0003] Therefore, a photolithography mask is needed to avoid contaminating the pattern area of ​​the photolithography mask during the process of removing the organic glue. Utility Model Content

[0004] The purpose of the present application is to provide a photolithography mask that can protect a graphic area on a mask substrate when removing an adhesive.

[0005] An embodiment of the present application provides a photolithography mask, comprising: a mask substrate, the surface of which comprises a graphic area and a shading area, the shading area surrounding the graphic area; a frame, the frame being arranged on the surface of the mask substrate and surrounding the shading area; and a protective device, the protective device comprising a protective plate, the surface area of ​​a first end face of the protective plate being larger than the surface area of ​​the graphic area, the protective device being configured so that the first end face completely covers the graphic area when in operation, and the edge of the protective plate being fixedly arranged on the surface of the shading area.

[0006] In some embodiments, the protective plate includes a suction cup, and the suction cup is configured to be adsorbed and fixed on the surface of the shading area.

[0007] In some embodiments, the material of the suction cup includes an elastic material.

[0008] In some embodiments, the protective device also includes a hand-held component, which includes a shell, and the shell cover is arranged on the side of the suction cup away from the suction surface of the suction cup; a handle is arranged on the outside of the shell; a connecting rod, the first end of the connecting rod is connected to the suction cup, and the second end of the connecting rod passes through the shell and is connected to the handle, and the connecting rod is configured to move in a direction away from the suction cup under the drive of the handle.

[0009] In some embodiments, the connecting rod is connected to the handle via a rotation axis.

[0010] In some embodiments, the material of the housing includes metal or plastic.

[0011] In some embodiments, the protective device further comprises a clamp for clamping the protective plate to the mask substrate.

[0012] In some embodiments, the material of the protective plate includes plastic.

[0013] In some embodiments, the number of the clamps is plural.

[0014] In some embodiments, the material of the mask substrate includes quartz.

[0015] The beneficial effects of the photolithography mask provided by the embodiments of the present application include but are not limited to the following:

[0016] The photolithography mask provided in the present application includes a mask substrate, the surface of which includes a graphic area and a shading area; a frame, which is arranged on the surface of the mask substrate and is arranged around the outside of the shading area, and the surface of the frame can be bonded with a protective film by an adhesive to protect the graphic area; and a protective device, the surface area of ​​the first end face of the protective device is larger than the surface area of ​​the graphic area, when the adhesive is removed, the first end face of the protective device completely covers the graphic area, and is configured to be edge-fixed on the surface of the shading area of ​​the mask substrate.

[0017] When removing the adhesive from the frame, the graphic area of ​​the mask substrate is protected to avoid accidental touching of the graphic area during the removal process, and to prevent the adhesive from being dissolved by chemicals and flowing into the graphic area to contaminate the graphic area. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The following figures describe in detail the exemplary embodiments disclosed in this application. The same reference numerals represent similar structures in several views of the drawings. Those skilled in the art will understand that these embodiments are non-limiting, exemplary embodiments, and the drawings are only for the purpose of illustration and description, and are not intended to limit the scope of this application. Other embodiments may also accomplish the inventive intent in this application. It should be understood that the drawings are not drawn to scale.

[0019] in:

[0020] Figure 1 It is a schematic structural diagram of a mask substrate and a frame according to some embodiments of the present application;

[0021] Figure 2 is a schematic structural diagram of a photolithography mask according to some embodiments of the present application;

[0022] Figure 3 The structure of the handle of the protective device in the first position according to some embodiments of the present application is a schematic diagram;

[0023] Figure 4 The structure of the handle of the protective device in the second position according to some embodiments of the present application is a schematic diagram;

[0024] Figure 5 Based on Figure 4 a top view of the guard shown; and

[0025] Figure 6 Schematic diagram of the structure of the protective device according to other embodiments of the present application. DETAILED DESCRIPTION

[0026] The following description provides specific application scenarios and requirements of the present application, with the purpose of enabling those skilled in the art to make and use the content in the present application. It will be apparent to those skilled in the art that various local modifications to the disclosed embodiments are apparent, and the general principles defined herein may be applied to other embodiments and applications without departing from the spirit and scope of the present application. Therefore, the present application is not limited to the embodiments shown, but to the widest scope consistent with the claims.

[0027] The present application provides a photolithography mask, comprising: a mask substrate, the surface of which comprises a graphic area and a shading area, wherein the shading area surrounds the graphic area; a frame, which is arranged on the surface of the mask substrate and surrounds the shading area; and a protective device, which comprises a protective plate, the surface area of ​​a first end face of the protective plate is larger than the surface area of ​​the graphic area, and when the protective device is in operation, it is configured so that the first end face completely covers the graphic area, and the edge of the protective plate is fixedly arranged on the surface of the shading area.

[0028] The photolithography mask provided in the present application is provided with a protective device to protect the graphic area of ​​the mask substrate when removing the adhesive of the frame, thereby avoiding accidental touching of the graphic area during the removal process and preventing the adhesive from being dissolved by chemicals and flowing into the graphic area to cause contamination to the graphic area.

[0029] The photolithography mask provided in the present application will be described in detail below in conjunction with the embodiments and drawings.

[0030] refer to Figure 1 and Figure 2 The present application discloses a photolithography mask, including a mask substrate 100 , a frame 200 , and a protective device 300 .

[0031] In some embodiments, the material of the mask substrate 100 includes quartz.

[0032] In some embodiments, the surface of the mask substrate 100 includes a pattern area 101, and the pattern area 101 is used to form a pattern layer. In some embodiments, the pattern layer can be formed on the surface of the pattern area 101 by etching, and the material includes chromium, iron oxide or silicon layer.

[0033] In some embodiments, the surface of the mask substrate 100 further includes a light shielding area 102, which surrounds the graphic area 101 and can prevent light from passing through the mask substrate 100. The light shielding area 102 is formed by, for example, completely covering the surface of the mask substrate 100 with a chrome layer.

[0034] In some embodiments, the frame 200 is disposed on the surface of the mask substrate 100 , and the frame 200 is disposed around the shading area 102 . A protective film can be bonded to the surface of the frame 200 through an adhesive to prevent dust particles from falling into the graphic area 101 , thereby protecting the graphic area 101 .

[0035] In some embodiments, the protective device 300 includes a protective plate 301, and the surface area of ​​the first end face of the protective plate 301 is larger than the surface area of ​​the graphic area 101. When the protective device 300 is working, it is configured so that the first end face completely covers the graphic area 101, and the edge of the protective plate 301 is fixedly set on the surface of the shading area 102 to prevent the graphic area 101 from being damaged due to accidental touch during the process of removing the adhesive, and also to prevent the adhesive from being dissolved by chemicals and flowing into the graphic area 101, causing contamination to the graphic area 101.

[0036] refer to Figures 3 to 5In some embodiments, the protective plate 301 is a suction cup 301, and the suction cup is configured to be adsorbed and fixed on the surface of the light shielding area. The shape of the suction cup 301 matches the mask substrate 100, and the edge of the suction cup 301 contacts the light shielding area 102. The suction cup 301 can be adsorbed to the surface of the light shielding area 102 under the action of the gas pressure difference.

[0037] Specifically, when in use, the suction cup 301 is brought into contact with and fitted with the surface of the shading area 102, and is pulled from the center of the suction cup 301 in a direction away from the surface of the mask substrate 100, so that a closed air cavity is formed between the adsorption surface of the suction cup and the surface of the mask substrate 100, and the pressure of the air cavity is lower than the external atmospheric pressure, so that the suction cup 301 is tightly adsorbed to the surface of the shading area 102 due to the pressure difference between the inside and outside of the air cavity.

[0038] In some embodiments, the material of the suction cup 301 includes elastic material. In some embodiments, the material of the suction cup 301 includes at least one of nitrile rubber, natural rubber, and synthetic rubber.

[0039] In some embodiments, the suction cup 301 is concave and is recessed away from the surface of the mask substrate 100 so that the suction cup 301 can be better adsorbed to the surface of the shading area 102, while also preventing the suction cup 301 from contacting the graphic area 101 and causing damage to the graphic area 101.

[0040] refer to Figures 3 to 5 In some embodiments, the protective device 300 also includes a handheld component for controlling the suction cup 301 to be adsorbed or detached from the surface of the shading area 102, and also for facilitating the movement of the mask substrate 100 when the suction cup 301 is adsorbed to the surface of the shading area 102.

[0041] In some embodiments, the handheld assembly includes a housing 302 , a handle 303 , and a connecting rod 304 .

[0042] In some embodiments, the shell 302 is a chamber with an open end, and the edge of the chamber is in contact with the suction cup 301, so that the shell 302 covers the side of the suction cup 301 away from the adsorption surface of the suction cup 301.

[0043] In some embodiments, the housing 302 has a through hole penetrating the housing 302 to allow the connecting rod 304 to pass through the housing 302 from the inside of the housing 302 .

[0044] In some embodiments, the material of the housing 302 includes metal or plastic.

[0045] refer to Figures 3 to 5 In some embodiments, the handle 303 is disposed on the outside of the shell 302, and the first end of the handle 303 is rotatably connected to the connecting rod 304, and can be rotated between a first position and a second position to pull up or reset the connecting rod 304 away from the suction cup 301; when the handle 303 is located at the first position, the handle 303 is located in the axial direction of the connecting rod 304; and when the handle 303 is located at the second position, the handle 303 is perpendicular to the axial direction of the connecting rod 304.

[0046] Under normal circumstances, the handle 303 is located at the second position; when in use, the suction cup 301 is fitted onto the surface of the shading area 102, and the handle 303 is rotated to the first position so that the suction cup 301 is adsorbed onto the surface of the shading area 102; and when the suction cup 301 needs to be removed, the handle 303 is rotated to the second position.

[0047] In some embodiments, the handle 303 includes a grip portion 303 a and a connection portion 303 b , and the connection portion 303 b is connected to the connecting rod 304 via a rotation axis 400 .

[0048] In some embodiments, the connecting portion 303b is C-shaped, the bottom end of the connecting portion 303b is connected to the hand-held portion 303a, the two side walls of the connecting portion 303b are respectively located on both sides of the second end of the connecting rod 304, the side walls are respectively provided with a first through hole matching the rotating shaft 400, and the second end of the connecting rod 304 is provided with a second through hole matching the rotating shaft 400, so that the rotating shaft 400 passes through the side wall of the connecting portion 303b and the second end of the connecting rod 304 to rotationally connect the connecting portion 303b with the connecting rod 304.

[0049] In some embodiments, the end face of the side wall away from the hand-held portion 303a is a first contact end face, and the first contact end face contacts the outer surface of the shell 302 when the handle 303 is in the first position; the end face of the side wall perpendicular to the first contact end face is a second contact end face, and the second end face contacts the outer surface of the shell 302 when the handle 303 is in the second position.

[0050] The distance from the first contact end surface to the center of the rotating shaft 400 is greater than the distance from the second contact end surface to the center of the rotating shaft 400, so that when the handle 303 is rotated from the second position to the first position, it drives the rotating shaft 400 to move away from the shell 302, thereby causing the rotating shaft 400 to drive the connecting rod 304 to move away from the mask substrate 100.

[0051] In some embodiments, the first contact end surface and the second contact end surface are provided with rounded chamfers to facilitate the rotation of the handle 303 .

[0052] In some embodiments, the first end of the connecting rod 304 is connected to the suction cup 301, and the second end of the connecting rod 304 passes through the housing 302 and is connected to the handle 303. The connecting rod 304 is configured to move in a direction away from the suction cup 301 under the drive of the handle 303. When the handle 303 rotates from the second position to the first position, the connecting rod 304 moves in a direction away from the suction cup 301, thereby driving the center of the suction cup 301 to move in a direction away from the mask substrate 100, so as to adsorb the suction cup 301 to the surface of the light shielding area 102; when the handle 303 rotates from the first position to the second position, the connecting rod 304 moves in a direction close to the suction cup 301, thereby driving the center of the suction cup 301 to move in a direction close to the mask substrate 100, and releasing the adsorption of the suction cup 301 on the surface of the light shielding area 102.

[0053] In some embodiments, the process of using the protective device 300 to protect the graphic area 101 on the surface of the mask substrate 100 when removing the adhesive is as follows: when the adhesive needs to be removed, the protective device 300 is covered on the surface of the mask substrate 100, and the edge of the suction cup 301 is in contact with the shading area 102, and the handle 303 is moved from the second position to the first position to allow the suction cup 301 to be adsorbed to the surface of the shading area 102, and then the adhesive is removed using chemicals. After the removal is completed, the handle 303 is moved from the first position to the second position, and the protective device 300 is removed from the surface of the mask substrate 100.

[0054] refer to Figure 6 In some other embodiments of the present application, the protective device also includes a clamp 302'.

[0055] In some embodiments, the protective plate 301' is adapted to the mask substrate 100, and the protective plate 301' is configured to cover the surface of the mask substrate 100, and the edge of the protective plate 301' is configured to contact the light shielding area 102. When the adhesive needs to be removed, the protective plate 301' is covered on the surface of the mask substrate 100 to protect the graphic area 101 of the mask substrate 100.

[0056] In some embodiments, the material of the protection plate 301 ′ includes plastic.

[0057] In some embodiments, the clamp 302' is used to clamp the protective plate 301' to the mask substrate 100. Specifically, the clamp 302' includes a first clamping plate 302a' and a second clamping plate 302b', and the first clamping plate 302a' and the second clamping plate 302b' can be connected in an openable and closable manner. When there is no need to clamp the protective plate 301', the first end of the first clamping plate 302a' contacts the first end of the second clamping plate 302b', so that the clamp 302' is in a closed state; when it is necessary to clamp the protective plate 301', the first end of the first clamping plate 302a' moves in a direction away from the first end of the second clamping plate 302b', so that the first clamping plate 302a' contacts the upper surface of the protective plate 301', and the second clamping plate 302b' contacts the side of the mask substrate 100 away from the protective plate 301', thereby clamping the protective plate 301' to the mask substrate 100.

[0058] In some embodiments, the second end of the first clamp 302a' is fixedly connected to the first connecting piece 302c', and the second end of the second clamp 302b' is fixedly connected to the second connecting piece 302d', the first connecting piece 302c' and the second connecting piece 302d' are connected via a compression spring 302e', and pressing the second ends of the first clamp 302a' and the second clamp 302b' simultaneously can cause the first end of the first clamp 302a' to move in a direction away from the first end of the second clamp 302b'.

[0059] In some embodiments, there are multiple clamps 302 ′, and the multiple clamps 302 ′ symmetrically clamp the protection plate 301 ′ and the mask substrate 100 .

[0060] In some embodiments, the process of using the protective device 300 to protect the graphic area 101 on the surface of the mask substrate 100 when removing the adhesive is as follows: when the adhesive needs to be removed, the protective plate 301' is covered on the surface of the mask substrate 100, and the edge of the protective plate 301' is in contact with the shading area 102, and the protective plate 301' is clamped to the mask substrate 100 using the clamp 302', and then the adhesive is cleaned using chemicals. After cleaning, the clamp 302' is removed and the protective plate 301' is removed from the surface of the mask substrate 100.

[0061] The beneficial effects of the photolithography mask provided by the embodiments of the present application include but are not limited to the following:

[0062] The photolithography mask provided in the present application includes a mask substrate, the surface of which includes a graphic area and a shading area; a frame, which is arranged on the surface of the mask substrate and is arranged around the outside of the shading area, and the surface of the frame can be bonded with a protective film by an adhesive to protect the graphic area; and a protective device, the surface area of ​​the first end face of the protective device is larger than the surface area of ​​the graphic area, when the adhesive is removed, the first end face of the protective device completely covers the graphic area, and is configured to be edge-fixed on the surface of the shading area of ​​the mask substrate.

[0063] When removing the adhesive from the frame, the graphic area of ​​the mask substrate is protected to avoid accidental touching of the graphic area during the removal process, and to prevent the adhesive from being dissolved by chemicals and flowing into the graphic area to contaminate the graphic area.

[0064] It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects that may be produced may be any one or a combination of the above, or any other beneficial effects that may be obtained.

[0065] The basic concepts have been described above. Obviously, for those skilled in the art, the above detailed disclosure is only for example and does not constitute a limitation of this specification. Although not explicitly stated here, those skilled in the art may make various modifications, improvements and corrections to this application. Such modifications, improvements and corrections are suggested in this specification, so such modifications, improvements and corrections still belong to the spirit and scope of the exemplary embodiments of this application.

[0066] It should be noted that in the description of this application, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", and "fix" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a rotating connection or a sliding connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood in combination with specific circumstances.

[0067] In addition, when terms such as "first", "second", and "third" are used in the specification of this application to describe various features, these terms are only used to distinguish these features and cannot be understood as indicating or implying the relationship between the features, the relative importance, or implicitly indicating the number of features indicated.

[0068] In addition, the present specification describes exemplary embodiments by reference to idealized exemplary cross-sectional views and / or plan views and / or stereograms. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but should include deviations in shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to illustrate the actual shapes of the regions of the device nor to limit the scope of the exemplary embodiments.

[0069] At the same time, the present application uses specific words to describe the embodiments of this specification. For example, "one embodiment", "an embodiment", and / or "some embodiments" refer to a certain feature, structure or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that "one embodiment" or "an embodiment" or "an alternative embodiment" mentioned twice or more in different positions in the present application does not necessarily refer to the same embodiment. In addition, some features, structures or characteristics in one or more embodiments of the present application can be appropriately combined.

[0070] Similarly, it should be noted that in order to simplify the description of the disclosure of this application and thus help understand one or more embodiments of the invention, in the above description of the embodiments of this application, multiple features are sometimes combined into one embodiment, figure or description thereof. However, this disclosure method does not mean that the features required by the object of this application are more than the features mentioned in the claims. In fact, the features of the embodiments are less than all the features of the single embodiment disclosed above.

[0071] Finally, it should be understood that the embodiments described in this application are only used to illustrate the principles of the embodiments of the present application. Other variations may also fall within the scope of the present application. Therefore, as an example and not a limitation, the alternative configurations of the embodiments of the present application may be considered to be consistent with the teachings of the present application. Accordingly, the embodiments of the present application are not limited to the embodiments explicitly introduced and described in the present application.

Claims

1. A photolithography mask, characterized in that: include: A mask substrate, wherein the surface of the mask substrate comprises a graphic area and a light-shielding area, and the light-shielding area surrounds the graphic area; A frame, wherein the frame is disposed on the surface of the mask substrate and surrounds the light shielding area; and A protective device, comprising a protective plate, wherein the surface area of ​​the first end face of the protective plate is larger than the surface area of ​​the graphic area, and when the device is in operation, it is configured so that the first end face completely covers the graphic area, and the edge of the protective plate is fixedly disposed on the surface of the shading area.

2. The photolithography mask according to claim 1, characterized in that: The protective plate includes a suction cup, and the suction cup is configured to be adsorbed and fixed on the surface of the shading area.

3. The photolithography mask according to claim 2, characterized in that: The material of the suction cup includes elastic material.

4. The photolithography mask according to claim 2, characterized in that: The protective device also includes a handheld component, which includes a shell, the shell cover is arranged on the side of the suction cup away from the suction surface of the suction cup; a handle is arranged on the outside of the shell; a connecting rod, the first end of the connecting rod is connected to the suction cup, the second end of the connecting rod passes through the shell and is connected to the handle, and the connecting rod is configured to move in a direction away from the suction cup under the drive of the handle.

5. The photolithography mask according to claim 4, characterized in that: The connecting rod is connected to the handle via a rotating shaft.

6. The photolithography mask according to claim 4, characterized in that: The material of the housing includes metal or plastic.

7. The photolithography mask according to claim 1, characterized in that: The protection device also includes a clamp for clamping the protection plate to the mask substrate.

8. The photolithography mask according to claim 7, characterized in that: The material of the protection plate includes plastic.

9. The photolithography mask according to claim 7, characterized in that: The number of the clamps is plural.

10. The photolithography mask according to claim 1, characterized in that: The material of the mask substrate includes quartz.

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