Anti-reflection film and glass cover plate
By applying an anti-reflection and anti-reflection film with alternately stacked high and low refractive index layers on the glass screen, the problem of the protective film affecting the propagation effect in the prior art is solved, and the effect of maintaining a low reflectivity behind the protective film is achieved. Improves display and visibility.
Patent Information
- Application Number
- CN202421167643.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-27
- Publication Date
- 2025-02-11
- Estimated Expiration
- 2034-05-27
AI Technical Summary
In the prior art, the AR processing of the panel factory uses the optimal effect of reducing and retardation when the screen is directly displayed. The protective film attached to the screen for consumers will sacrifice the manufacturer's carefully designed optical effect, affecting the screen after the film is pasted. Enhanced effect.
A de-reflection and anti-reflection film is provided, including at least two high-refractive index layers and two low-refractive index layers arranged alternately, the number of layers of the high-refractive index layers and the number of layers of the low-refractive index layers is the same, so as to make the de-reflection The first and second sides disposed opposite the urge film are arranged with a high refractive index layer and a low refractive index layer, respectively. When applied to the glass cover, the reflectivity can be significantly reduced, and the reflectivity does not change much after the protective film is pasted.
It realizes that the reflectivity is significantly reduced on the glass screen, improves the display effect and visibility, and maintains a low reflectivity after the protective film is pasted, avoiding the protective film affecting the display performance and visibility.
Smart Images
Figure CN222454869U_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the technical field of optical thin films, and specifically relates to an anti-reflection and anti-reflection film and a glass cover plate. Background Art
[0002] In order to achieve better display effects, major display panel manufacturers perform anti-reflection and anti-transmittance treatments on the glass surface, namely AR and AF, to achieve anti-reflection and anti-fingerprint effects to ensure the direct display effect of the panel when it leaves the factory. However, consumers often have the habit of applying film to the display screen to prevent damage to the original screen.
[0003] Since AR (Anti-Reflection) is optically designed, the panel manufacturer's AR processing is aimed at optimizing the anti-reflection and anti-transmission effect when the screen is directly displayed. The protective film that consumers put on the screen will sacrifice the optical effect carefully designed by the manufacturer and affect the anti-reflection effect of the screen after the film is applied. At present, the initial average reflectivity of the display screen itself to air (400-700) can reach less than 0.5%, but after the protective film is applied, the average reflectivity (400-700) will reach 2.5% to 3.0%, affecting the display effect of the screen. Summary of the invention
[0004] The purpose of the present application is to provide an anti-reflection and anti-reflection film and a glass cover plate to solve the technical problem that the AR processing of the panel factory in the prior art is aimed at optimizing the anti-reflection and anti-reflection effect when the screen is directly displayed, and the protective film affixed to the screen by the consumer will sacrifice the optical effect carefully designed by the manufacturer and affect the anti-reflection effect of the screen after the film is affixed.
[0005] In order to achieve the above purpose, a technical solution adopted in this application is:
[0006] Provided is an anti-reflection and anti-reflection film, comprising at least two high refractive index layers and two low refractive index layers alternately stacked, the number of the high refractive index layers being the same as the number of the low refractive index layers, so that the high refractive index layers and the low refractive index layers are respectively arranged on a first side and a second side of the anti-reflection and anti-reflection film that are opposite to each other, the thickness of the at least two high refractive index layers gradually increases in a direction from the first side to the second side, the thickness of the low refractive index layer close to the first side is less than the thickness of the low refractive index layer located on the second side, the refractive index of the high refractive index layer is 2.30-2.80, and the refractive index of the low refractive index layer is 1.45-1.52.
[0007] In one or more embodiments, the high refractive index layer and the low refractive index layer are alternately stacked, the thickness of the high refractive index layer on the first side is 14 to 17 nm, the thickness of the high refractive index layer close to the second side is 136 to 140 nm, the thickness of the low refractive index layer close to the first side is 30 to 33 nm, and the thickness of the low refractive index layer on the second side is 86 to 89 nm.
[0008] In one or more embodiments, the invention comprises three layers of high refractive index layers and three layers of low refractive index layers alternately stacked, the thickness of the high refractive index layer located on the first side is 9 to 12 nm, the thickness of the high refractive index layer close to the second side is 30 to 33 nm, the thickness of the high refractive index layer located in the middle is 28 to 33 nm, the thickness of the low refractive index layer close to the first side is 48 to 52 nm, the thickness of the low refractive index layer located on the second side is 106 to 110 nm, and the thickness of the low refractive index layer located in the middle is 39 to 42 nm.
[0009] In one or more embodiments, the low refractive index layer is a silicon dioxide layer, a silicon aluminum layer or a magnesium fluoride layer.
[0010] In one or more embodiments, the high refractive index layer is a zirconium oxide layer, a niobium pentoxide layer, a silicon nitride layer or a nickel titanium layer.
[0011] In order to achieve the above purpose, another technical solution adopted by this application is:
[0012] A glass cover is provided, comprising:
[0013] Glass substrate;
[0014] The anti-reflection and anti-reflection film described in any of the above embodiments is arranged on the glass substrate, and the high refractive index layer located on the first side is bonded to the glass substrate;
[0015] The oleophobic layer is arranged on the second side surface of the anti-reflection and anti-reflection film, the oleophobic layer is adhesively fixed to the anti-reflection and anti-reflection film, and the oleophobic layer includes a protective film adhesive surface located on a side away from the anti-reflection and anti-reflection film.
[0016] In one or more embodiments, the oleophobic layer has a refractive index of 1.48 to 1.52 and a thickness of 5 to 20 nm.
[0017] In one or more embodiments, the glass cover plate has an average reflectivity of 0.7% to 1.2% for incident light with a wavelength of 400 to 700 nm incident from one side of the oleophobic layer; after the protective film pasting surface of the oleophobic layer is pasted with a protective film, the glass cover plate has an average reflectivity of 0.9% to 1.6% for incident light with a wavelength of 400 to 700 nm incident from one side of the protective film; wherein the protective film is a tempered film with a thickness of 0.3 to 0.5 mm.
[0018] Different from the prior art, the beneficial effects of this application are:
[0019] The anti-reflection and anti-reflection film of the present application can significantly reduce the reflectivity when applied to the glass cover plate, and the reflectivity does not change much after the protective film is attached, and can still maintain a low reflectivity, thereby preventing the protective film from affecting the display performance and visibility;
[0020] The glass cover of the present application has an average reflectivity of 0.7% to 1.2% for incident light with a wavelength of 400 to 700 nm incident from the side of the oleophobic layer; and after affixing the protective film, the average reflectivity of the incident light with a wavelength of 400 to 700 nm incident from the side of the protective film is 0.9% to 1.6%, thereby effectively avoiding the problem that the anti-reflection and anti-transmission effect of the screen glass is greatly reduced after consumers affix the protective film themselves. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings required for use in the embodiments or the prior art description are briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0022] Figure 1 This is a schematic structural diagram of an embodiment of an anti-reflection and anti-reflection film of the present application;
[0023] Figure 2 It is a schematic structural diagram of another embodiment of the anti-reflection and anti-reflection film of the present application;
[0024] Figure 3 This is a structural schematic diagram of an embodiment of the glass cover plate of the present application;
[0025] Figure 4 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached to the glass cover plate in Example 1 of the present application;
[0026] Figure 5 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached thereto in Example 4 of the present application;
[0027] Figure 6 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached in Comparative Example 1 of the present application;
[0028] Figure 7 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached in Comparative Example 2 of the present application;
[0029] Figure 8 It is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached in Comparative Example 3 of the present application. DETAILED DESCRIPTION
[0030] In order to enable those skilled in the art to better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work should fall within the scope of protection of this application.
[0031] In order to avoid scratches and cracks on the screen glass, consumers often stick a protective film on the screen glass after purchasing electronic products. At present, the AR processing of screen glass by panel manufacturers is aimed at optimizing the anti-reflection and anti-reflection effect when the screen is directly displayed. The protective film that consumers stick on the screen afterward will sacrifice the optical effect carefully designed by the manufacturer and affect the anti-reflection effect of the screen after the film is applied.
[0032] In order to solve the above problems, the applicant has developed a new type of anti-reflection and anti-reflection film. When the anti-reflection and anti-reflection film is applied to the screen glass, the screen glass can achieve a good anti-reflection effect, and the good anti-reflection effect can still be maintained after a protective film is affixed to the surface of the screen glass, effectively avoiding the problem that the anti-reflection and anti-reflection effect of the existing screen glass is greatly reduced after consumers affix a protective film by themselves.
[0033] Specifically, the anti-reflection and anti-reflection film of the present application may include at least two high refractive index layers and two low refractive index layers alternately stacked, and the number of high refractive index layers and the number of low refractive index layers are the same, so that the first side and the second side of the anti-reflection and anti-reflection film are respectively arranged with high refractive index layers and low refractive index layers.
[0034] In the direction from the first side to the second side, the thickness of at least two high refractive index layers can gradually increase, the thickness of the low refractive index layer close to the first side can be less than the thickness of the low refractive index layer located on the second side, the refractive index of the high refractive index layer is 2.30-2.80, and the refractive index of the low refractive index layer is 1.45-1.52, so that when applied to the glass cover plate, it can achieve excellent anti-reflection and anti-reflection effects after the protective film is attached.
[0035] In one embodiment, the low refractive index layer may be a silicon dioxide layer, a silicon aluminum layer, or a magnesium fluoride layer.
[0036] In one embodiment, the high refractive index layer may be a zirconium oxide layer, a niobium pentoxide layer, a silicon nitride layer or a nickel titanium layer.
[0037] The following introduces two structural forms of the anti-reflection and anti-reflection film of this application. First, please refer to Figure 1 , Figure 1 It is a schematic structural diagram of an embodiment of an anti-reflection and anti-reflection film of the present application.
[0038] like Figure 1 As shown, the anti-reflection and anti-reflection film 10 includes two high-refractive index layers 100 and two low-refractive index layers 200 which are alternately stacked.
[0039] The refractive index of the high refractive index layer 100 is 2.30 to 2.80, and the refractive index of the low refractive index layer 200 is 1.45 to 1.52.
[0040] The thickness of the high refractive index layer 100 on the first side 101 is 14-17 nm, the thickness of the high refractive index layer 100 close to the second side 102 is 136-140 nm, the thickness of the low refractive index layer 200 close to the first side 101 is 30-33 nm, and the thickness of the low refractive index layer 200 on the second side 102 is 86-89 nm.
[0041] See also Figure 2 , Figure 2 FIG. 1 is a schematic diagram of the structure of another embodiment of the anti-reflection and anti-reflection film 10 of the present application. Figure 2 As shown, the anti-reflection and anti-reflection film 10 includes three high-refractive index layers 100 and three low-refractive index layers 200 that are alternately stacked.
[0042] The thickness of the high refractive index layer 100 at the first side 101 is 9-12 nm, the thickness of the high refractive index layer 100 close to the second side 102 is 30-33 nm, the thickness of the high refractive index layer 100 in the middle is 28-33 nm, the thickness of the low refractive index layer 200 close to the first side 101 is 48-52 nm, the thickness of the low refractive index layer 200 at the second side 102 is 106-110 nm, and the thickness of the low refractive index layer 200 in the middle is 39-42 nm.
[0043] Based on the four-layer structure and the six-layer structure of the anti-reflection and anti-reflection film 10 in the above-mentioned embodiments, when the anti-reflection and anti-reflection film 10 is applied to the glass screen, on the one hand, the reflectivity of the glass screen can be significantly reduced, the display effect and visibility can be improved, and on the other hand, a low reflectivity can still be maintained after a protective film is pasted on the glass screen, thereby maintaining visibility.
[0044] The present application also provides a glass cover plate using an anti-reflection and anti-reflection film 10 of any embodiment. Figure 3 , Figure 3 It is a structural schematic diagram of an embodiment of a glass cover plate of the present application.
[0045] like Figure 3 As shown, the glass cover comprises a glass substrate 20 , an anti-reflection and anti-reflection film 10 of any of the above embodiments arranged on the glass substrate 20 , and an oleophobic layer 30 arranged on the anti-reflection and anti-reflection film 10 .
[0046] The high refractive index layer 100 located at the first side 101 of the AR film 10 is laminated to the glass substrate 20;
[0047] The oleophobic layer 30 is disposed on the second side 102 of the AR film 10 . The oleophobic layer 30 is glued and fixed to the AR film 10 . The oleophobic layer 30 includes a protective film adhesive surface located away from the AR film 10 .
[0048] In one embodiment, the refractive index of the oleophobic layer 30 may be 1.48-1.52, and the thickness may be 5-20 nm. The material of the oleophobic layer 30 may be a commonly used material in the art, such as nano-silicon dioxide, which can achieve the effect of this embodiment.
[0049] Based on the glass cover plate of the above embodiment, the average reflectivity of the glass cover plate for incident light with a wavelength of 400 to 700 nm incident from the side of the oleophobic layer 30 can be 0.7% to 1.2%; and after the protective film is attached to the protective film attachment surface of the oleophobic layer 30 of the glass cover plate, the average reflectivity of the glass cover plate for incident light with a wavelength of 400 to 700 nm incident from the side of the protective film is 0.9% to 1.6%, thereby effectively avoiding the problem that the anti-reflection and anti-transmission effect of the screen glass is greatly reduced after consumers attach the protective film themselves.
[0050] The beneficial effects of the technical solution of the present application are further elaborated in detail below in conjunction with specific embodiments.
[0051] Embodiment 1:
[0052] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0053] Among them, the first anti-reflection layer is Si 3 N 4 layer, with a thickness of 16.56nm; the second anti-reflection layer is SiO 2 layer, thickness 32.72nm; the third anti-reflection layer is Si 3 N 4layer with a thickness of 138.94nm; the fourth anti-reflection layer is a SiAl layer with a refractive index of 1.48 and a thickness of 87.94nm; the oleophobic layer has a refractive index of 1.48 and a thickness of 11nm.
[0054] The preparation method of the glass cover plate in this embodiment is as follows:
[0055] The glass substrate was immersed in anhydrous ethanol and ultrasonically cleaned for 15 minutes, taken out and dried, and then placed in a magnetron sputtering device;
[0056] The magnetron sputtering equipment was evacuated to 3 × 10 -4 Pa for sputtering, the film forming vacuum degree is 5±4 -1 Pa:
[0057] First, a high-purity silicon rotating target was used, argon and nitrogen were introduced, the power was 3.3kw, the argon flow rate was 200sccm, and the nitrogen flow rate was 60sccm, and the first anti-reflection layer was obtained by sputtering;
[0058] Then, a high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 8.2 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the second anti-reflection layer was sputtered;
[0059] Then, two high-purity silicon rotating targets were used, argon and nitrogen were introduced, the power was 13.8kw, the argon flow rate was 200sccm, and the nitrogen flow rate was 60sccm, and the third anti-reflection layer was sputtered;
[0060] Then, a high-purity silicon-aluminum rotating target was used, argon gas was introduced, the power was 7.5 kW, and the argon gas flow rate was 300 sccm, and the fourth anti-reflection layer was sputtered;
[0061] After the sputtering is completed, an oleophobic material is coated on the surface of the fourth anti-reflection layer to obtain an oleophobic layer.
[0062] Embodiment 2:
[0063] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0064] Among them, the first anti-reflection layer is ZrO 2 layer, with a thickness of 14nm; the second anti-reflection layer is a MgF layer, with a thickness of 30nm; the third anti-reflection layer is a Si 3 N 4 layer, with a thickness of 140nm, and the fourth anti-reflection layer is SiO 2 layer, thickness 86nm; oleophobic layer refractive index 1.52, thickness 8nm.
[0065] Embodiment 3:
[0066] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0067] Among them, the first anti-reflection layer is Nb 2 O 5 layer, thickness 17nm; the second anti-reflection layer is SiO 2 layer, thickness 33nm; the third anti-reflection layer is Si 3 N 4 layer with a thickness of 136nm; the fourth anti-reflection layer is a SiAl layer with a refractive index of 1.48 and a thickness of 89nm; the oleophobic layer has a refractive index of 1.50 and a thickness of 20nm.
[0068] Embodiment 4:
[0069] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer, a fifth anti-reflection layer, a sixth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0070] Among them, the first anti-reflection layer is Si 3 N 4 layer, thickness 11.15nm; the second anti-reflection layer is SiO 2 layer, thickness 50.78nm; the third anti-reflection layer is Si 3 N 4 layer, with a thickness of 31.44nm, and the fourth anti-reflection layer is SiO 2 layer, thickness 40.64nm; the fifth anti-reflection layer is Si 3 N 4 layer, with a thickness of 31.55nm, and the sixth anti-reflection layer is SiO 2 layer, thickness 108.46nm; oleophobic layer refractive index 1.48, thickness 12nm.
[0071] The preparation method of the glass cover plate in this embodiment is as follows:
[0072] The glass substrate was immersed in anhydrous ethanol and ultrasonically cleaned for 15 minutes, taken out and dried, and then placed in a magnetron sputtering device;
[0073] The magnetron sputtering equipment was evacuated to 3 × 10 -4 Pa for sputtering, the film forming vacuum degree is 5±4 -1 Pa:
[0074] First, a high-purity silicon rotating target was used, argon and nitrogen were introduced, the power was 2.3kw, the argon flow rate was 200sccm, and the nitrogen flow rate was 60sccm, and the first anti-reflection layer was obtained by sputtering;
[0075] A high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 12.6kw, the argon flow rate was 400sccm, and the oxygen flow rate was 120sccm, and the second anti-reflection layer was obtained by sputtering;
[0076] A high-purity silicon rotating target was used, argon and nitrogen were introduced, the power was 6.7 kW, the argon flow rate was 200 sccm, and the nitrogen flow rate was 60 sccm, and the third anti-reflection layer was obtained by sputtering;
[0077] A high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 10.2 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the fourth anti-reflection layer was obtained by sputtering;
[0078] A high-purity silicon rotating target was used, argon and nitrogen were introduced, the power was 6.8 kW, the argon flow rate was 200 sccm, and the nitrogen flow rate was 60 sccm, and the fifth anti-reflection layer was obtained by sputtering;
[0079] Two high-purity silicon rotating targets were used, argon and oxygen were introduced, the power was 13 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the sixth anti-reflection layer was obtained by sputtering.
[0080] Embodiment 5:
[0081] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer, a fifth anti-reflection layer, a sixth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0082] Among them, the first anti-reflection layer is Nb 2 O 5 layer, with a thickness of 9nm; the second anti-reflection layer is a MgF layer, with a thickness of 52nm; the third anti-reflection layer is a Si 3 N 4 layer, thickness 32nm, the fourth anti-reflection layer is SiO 2 layer, thickness 42nm; the fifth anti-reflection layer is Nb 2 O 5 layer with a thickness of 33nm; the sixth anti-reflection layer is a SiAl layer with a refractive index of 1.48 and a thickness of 106nm; the oleophobic layer has a refractive index of 1.48 and a thickness of 20nm.
[0083] Embodiment 6:
[0084] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer, a fifth anti-reflection layer, a sixth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0085] Among them, the first anti-reflection layer is Si 3 N 4layer, thickness 12nm; the second anti-reflection layer is SiO 2 layer, thickness 48nm; the third anti-reflection layer is Si 3 N 4 layer, thickness 28nm, the fourth anti-reflection layer is SiO 2 layer, thickness 39nm; the fifth anti-reflection layer is Si 3 N 4 layer, thickness 30nm, the sixth anti-reflection layer is SiO 2 layer, thickness 110nm; oleophobic layer refractive index 1.48, thickness 5nm.
[0086] Comparative Example 1:
[0087] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0088] Among them, the first anti-reflection layer is Nb 2 O 5 layer, thickness 9.27nm; the second anti-reflection layer is SiO 2 layer, thickness 34.8nm; the third anti-reflection layer is Nb 2 O 5 layer, with a thickness of 121.51 nm, and the fourth anti-reflection layer is SiO 2 layer, thickness 82nm; oleophobic layer refractive index 1.48, thickness 11nm.
[0089] The preparation method of the glass cover plate of this comparative example is as follows:
[0090] The glass substrate was immersed in anhydrous ethanol and ultrasonically cleaned for 15 minutes, taken out and dried, and then placed in a magnetron sputtering device;
[0091] The magnetron sputtering equipment was evacuated to 3 × 10 -4 Pa for sputtering, the film forming vacuum degree is 5±4 -1 Pa:
[0092] First, a high-purity niobium oxide rotating target was used, argon and nitrogen were introduced, the power was 3.4kw, the argon flow rate was 300sccm, and the nitrogen flow rate was 15sccm, and the first anti-reflection layer was sputtered;
[0093] Then, a high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 8.5 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the second anti-reflection layer was sputtered;
[0094] Then, three high-purity niobium oxide rotating targets were used, argon and oxygen were introduced, the power was 15kw, the argon flow rate was 200sccm, and the nitrogen flow rate was 60sccm, and the third anti-reflection layer was sputtered;
[0095] Then, two high-purity silicon-aluminum rotating targets were used, argon and oxygen were introduced, the power was 11.3 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the fourth anti-reflection layer was sputtered;
[0096] After the sputtering is completed, an oleophobic material is coated on the surface of the fourth anti-reflection layer to obtain an oleophobic layer.
[0097] Comparative Example 2:
[0098] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0099] Among them, the first anti-reflection layer is Nb 2 O 5 layer, with a thickness of 11.57nm; the second anti-reflection layer is SiO 2 layer, thickness 36.1nm; the third anti-reflection layer is Nb 2 O 5 layer, with a thickness of 111.51 nm, and the fourth anti-reflection layer is SiO 2 layer, thickness 89.7nm; oleophobic layer refractive index 1.48, thickness 11nm.
[0100] The preparation method of the glass cover plate of this comparative example is as follows:
[0101] The glass substrate was immersed in anhydrous ethanol and ultrasonically cleaned for 15 minutes, taken out and dried, and then placed in a magnetron sputtering device;
[0102] The magnetron sputtering equipment was evacuated to 3 × 10 -4 Pa for sputtering, the film forming vacuum degree is 5±4 -1 Pa:
[0103] First, a high-purity niobium oxide rotating target was used, argon and nitrogen were introduced, the power was 4.25kw, the argon flow rate was 300sccm, and the nitrogen flow rate was 15sccm, and the first anti-reflection layer was sputtered;
[0104] Then, a high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 8.8 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the second anti-reflection layer was sputtered;
[0105] Then, three high-purity niobium oxide rotating targets were used, argon and oxygen were introduced, the power was 13.7 kW, the argon flow rate was 200 sccm, and the nitrogen flow rate was 60 sccm, and the third anti-reflection layer was sputtered;
[0106] Then, two high-purity silicon-aluminum rotating targets were used, argon and oxygen were introduced, the power was 12.3 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the fourth anti-reflection layer was sputtered;
[0107] After the sputtering is completed, an oleophobic material is coated on the surface of the fourth anti-reflection layer to obtain an oleophobic layer.
[0108] Comparative Example 3:
[0109] A glass cover plate structure comprises a glass substrate, a first anti-reflection layer, a second anti-reflection layer, a third anti-reflection layer, a fourth anti-reflection layer and an oleophobic layer which are stacked in sequence.
[0110] Among them, the first anti-reflection layer is Nb 2 O 5 layer, thickness 10.21nm; the second anti-reflection layer is SiO 2 layer, thickness 37.3nm; the third anti-reflection layer is Nb 2 O 5 layer, with a thickness of 111.51 nm, and the fourth anti-reflection layer is SiO 2 layer, thickness 84.8nm; oleophobic layer refractive index 1.48, thickness 11nm.
[0111] The preparation method of the glass cover plate of this comparative example is as follows:
[0112] The glass substrate was immersed in anhydrous ethanol and ultrasonically cleaned for 15 minutes, taken out and dried, and then placed in a magnetron sputtering device;
[0113] The magnetron sputtering equipment was evacuated to 3 × 10 -4 Pa for sputtering, the film forming vacuum degree is 5±4 -1 Pa:
[0114] First, a high-purity niobium oxide rotating target was used, argon and nitrogen were introduced, the power was 3.75kw, the argon flow rate was 300sccm, and the nitrogen flow rate was 15sccm, and the first anti-reflection layer was sputtered;
[0115] Then, a high-purity silicon rotating target was used, argon and oxygen were introduced, the power was 9.1 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the second anti-reflection layer was sputtered;
[0116] Then, three high-purity niobium oxide rotating targets were used, argon and oxygen were introduced, the power was 13.7 kW, the argon flow rate was 200 sccm, and the nitrogen flow rate was 60 sccm, and the third anti-reflection layer was sputtered;
[0117] Then, two high-purity silicon-aluminum rotating targets were used, argon and oxygen were introduced, the power was 11.5 kW, the argon flow rate was 400 sccm, and the oxygen flow rate was 120 sccm, and the fourth anti-reflection layer was sputtered;
[0118] After the sputtering is completed, an oleophobic material is coated on the surface of the fourth anti-reflection layer to obtain an oleophobic layer.
[0119] Effect example:
[0120] The reflectivity of the glass cover plates of Examples 1 and 4 and Comparative Examples 1 to 3 was tested by a reflectivity detector. The test objects were: the reflectivity of the glass substrate, the glass cover plate, and the glass cover plate with a protective film attached to the incident light of 400 to 700 nm. Figures 4 to 8 , among which, the protective film adopts 0.4mm thick tempered film.
[0121] See also Figure 4 , Figure 4 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached to the glass cover plate in Example 1 of the present application. Figure 4 As shown, after the anti-reflection and anti-reflection film is pasted on the glass substrate of Example 1, the reflectivity can be significantly reduced, and the average reflectivity for incident light of 400-700nm is only 0.81%, which can effectively improve visibility and display effect; and the reflectivity of the glass cover plate of Example 1 does not change much after the protective film is pasted on the glass cover plate, and the average reflectivity for incident light of 400-700nm is only 1.42%, which can effectively ensure the display effect before and after the protective film is pasted on the glass screen.
[0122] See also Figure 5 , Figure 5 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached to the glass cover plate in Example 4 of the present application. Figure 5 As shown, after the anti-reflection and anti-reflection film is pasted on the glass substrate of Example 4, the reflectivity can be significantly reduced, and the average reflectivity for incident light of 400-700nm is only 1.01%, which can effectively improve visibility and display effect; and the reflectivity of the glass cover plate of Example 4 does not change basically after the protective film is pasted on the glass cover plate, and the average reflectivity for incident light of 400-700nm is only 1.18%, which can effectively ensure the display effect before and after the protective film is pasted on the glass screen.
[0123] See also Figures 6 to 8 , Figure 6 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached to the glass cover plate in Comparative Example 1 of the present application, Figure 7 is the reflectivity of the glass substrate, the glass cover plate and the glass cover plate after the protective film is attached in Comparative Example 2 of the present application, Figure 8 is the reflectivity of the glass substrate, glass cover plate and the glass cover plate after the protective film is attached in Comparative Example 3 of the present application. Figures 6 to 8 As shown, the anti-reflection layers of Comparative Examples 1 to 3, as anti-reflection films commonly used in the prior art, can significantly reduce the reflectivity, and the average reflectivity for incident light of 400-700nm is only 0.62%, 0.63% and 0.41%; when the glass cover plates of Comparative Examples 1 to 3 are affixed with protective films, the reflectivity will increase significantly, and the average reflectivity for incident light of 400-700nm reaches 3.66%, 2.97% and 2.57%, which will affect the display effect and visibility.
[0124] In summary, the anti-reflection and anti-reflection film of the present application can significantly reduce the reflectivity when applied to the glass cover plate, and the reflectivity does not change much after the protective film is affixed, and can still maintain a low reflectivity, thereby preventing the protective film from affecting the display performance and visibility.
[0125] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.
[0126] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.
Claims
1. An anti-reflection and anti-reflection film, characterized in that: The invention comprises at least two high refractive index layers and two low refractive index layers alternately stacked, wherein the number of the high refractive index layers is the same as the number of the low refractive index layers, so that the high refractive index layers and the low refractive index layers are arranged on a first side and a second side of the anti-reflection and anti-reflection film opposite to each other, respectively; the thickness of the at least two high refractive index layers gradually increases in the direction from the first side to the second side; the thickness of the low refractive index layer close to the first side is less than the thickness of the low refractive index layer on the second side; the refractive index of the high refractive index layer is 2.30-2.80, and the refractive index of the low refractive index layer is 1.45-1.
52.
2. The anti-reflection and anti-reflection film according to claim 1, characterized in that: It comprises two layers of high refractive index layers and two layers of low refractive index layers alternately stacked, the thickness of the high refractive index layer located on the first side is 14 to 17 nm, the thickness of the high refractive index layer close to the second side is 136 to 140 nm, the thickness of the low refractive index layer close to the first side is 30 to 33 nm, and the thickness of the low refractive index layer located on the second side is 86 to 89 nm.
3. The anti-reflection and anti-reflection film according to claim 1, characterized in that: The invention comprises three layers of high refractive index layers and three layers of low refractive index layers alternately stacked, wherein the thickness of the high refractive index layer located on the first side is 9 to 12 nm, the thickness of the high refractive index layer close to the second side is 30 to 33 nm, the thickness of the high refractive index layer located in the middle is 28 to 33 nm, the thickness of the low refractive index layer close to the first side is 48 to 52 nm, the thickness of the low refractive index layer located on the second side is 106 to 110 nm, and the thickness of the low refractive index layer located in the middle is 39 to 42 nm.
4. The anti-reflection and anti-reflection film according to any one of claims 1 to 3, characterized in that: The low refractive index layer is a silicon dioxide layer, a silicon aluminum layer or a magnesium fluoride layer.
5. The anti-reflection and anti-reflection film according to any one of claims 1 to 3, characterized in that: The high refractive index layer is a zirconium oxide layer, a niobium pentoxide layer, a silicon nitride layer or a nickel titanium layer.
6. A glass cover plate, characterized in that: include: Glass substrate; The anti-reflection and anti-reflection film according to any one of claims 1 to 5, arranged on the glass substrate, and the high refractive index layer located on the first side is bonded to the glass substrate; The oleophobic layer is arranged on the second side surface of the anti-reflection and anti-reflection film, the oleophobic layer is adhesively fixed to the anti-reflection and anti-reflection film, and the oleophobic layer includes a protective film adhesive surface located on a side away from the anti-reflection and anti-reflection film.
7. The glass cover plate according to claim 6, characterized in that: The oleophobic layer has a refractive index of 1.48 to 1.52 and a thickness of 5 to 20 nm.
8. The glass cover plate according to claim 6, characterized in that: The average reflectivity of the glass cover plate for incident light with a wavelength of 400 to 700 nm incident from the side of the oleophobic layer is 0.7% to 1.2%; after the protective film is attached to the protective film attachment surface of the oleophobic layer, the average reflectivity of the glass cover plate for incident light with a wavelength of 400 to 700 nm incident from the side of the protective film is 0.9% to 1.6%; wherein the protective film is a tempered film with a thickness of 0.3 to 0.5 mm.