Efficient air inlet mechanism of plasma chemical vapor deposition equipment

Abstract

The utility model discloses an efficient gas inlet mechanism of plasma chemical vapor deposition equipment, which belongs to the technical field of gas inlet, aims at solving the problems that the gas inlet efficiency is low, and the width of a gas channel for gas circulation of a gas inlet pipe cannot be adjusted as required, and comprises a vapor deposition equipment body, the gas inlet end of the vapor deposition equipment body is connected with a gas inlet pipe in a penetrating mode, a gas distribution cone is arranged on one side in the gas inlet pipe, a plurality of gas distribution arc plates distributed circumferentially are fixed to the outer side wall of the gas distribution cone, and a gas inlet cover is fixed to the other side in the gas inlet pipe. According to the utility model, through the arrangement of the gas distribution cone, gas is compressed when passing through the gas distribution cone, and the compressed gas is mixed at one side, far away from the gas inlet cover, of the gas distribution cone, so that the turbulence degree of gas flow and the utilization efficiency of gas energy are improved, and through the arrangement of the gas distribution arc plate, a laminar layer of a contact surface is changed into a turbulent layer; therefore, the turbulence degree of the gas can be improved, and the gas inlet efficiency of the gas inlet pipe is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of air intake, and in particular relates to a high-efficiency air intake mechanism for plasma chemical vapor deposition equipment. Background Art

[0002] There are complex shock waves and boundary layer interferences inside the intake mechanism of the existing plasma chemical vapor deposition equipment. The boundary layer where the airflow contacts the inner wall of the intake pipe is a laminar layer. The existence of the laminar layer affects the energy capture and reduces the gas intake efficiency. At the same time, the width of the gas channel for gas circulation in the existing intake pipe cannot be adjusted and cannot be adjusted according to needs.

[0003] Therefore, there is a need for an efficient gas intake mechanism for plasma chemical vapor deposition equipment to solve the problems of low gas intake efficiency in the prior art and the inability to adjust the gas channel width of the gas flow in the intake pipe as needed. Utility Model Content

[0004] The utility model aims to provide a high-efficiency air intake mechanism for plasma chemical vapor deposition equipment to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a high-efficiency air intake mechanism of a plasma chemical vapor deposition device, comprising a vapor deposition device body, the air intake end of the vapor deposition device body is connected with an air intake pipe, a gas separation cone is arranged on one side of the interior of the air intake pipe, a plurality of circumferentially distributed gas separation arc plates are fixed to the outer wall of the gas separation cone, an air intake hood is fixed on the other side of the interior of the air intake pipe, an annular groove is provided on the side of the air intake hood close to the gas separation cone, a plurality of paired and circumferentially distributed partition plates are fixed to the inner wall of the annular groove, toothed columns are rotatably connected between adjacent sides of the partition plates close to each other, silicone sleeves are fixed between the inner walls of the plurality of toothed columns, the silicone sleeve and the air intake hood are fixed on one side close to each other, and a pushing assembly is arranged in the annular groove.

[0006] It should be noted in the scheme that the pushing assembly includes a side opening, which is opened on a side of the partition plate, and a plurality of fixing rings are movably engaged in the side openings. A plurality of circularly distributed tooth plates are fixed to the fixing rings close to a side of the toothed column, and the tooth plates are located between adjacent partition plates, and the tooth plates are meshed with the toothed column.

[0007] It is further worth mentioning that fixed blocks are fixed on opposite sides of the outer wall of the fixed ring, and electric push rods distributed up and down are fixed on the inner wall of the annular groove away from the toothed column, and the output end of the electric push rod is fixed to a side surface corresponding to the fixed block.

[0008] It should be further explained that a PLC controller is fixed to one side of the top surface of the vapor deposition equipment body, and the two electric push rods are electrically connected to the PLC controller respectively.

[0009] As a preferred embodiment, a plurality of limit plates in pairs and distributed in a circumference are fixed to the outer side wall of the fixing ring, and adjacent limit plates are movably engaged with corresponding partition plates.

[0010] As a preferred implementation, a plurality of connecting rods distributed in a circumference are fixed to one side of the outer side wall of the air splitting cone, and one end of the connecting rod is fixed to the inner side wall of the air intake pipe.

[0011] Compared with the prior art, the utility model provides a high-efficiency air intake mechanism for a plasma chemical vapor deposition device, which has at least the following beneficial effects:

[0012] (1) The gas is compressed when passing through the gas separation cone by setting the gas separation cone, and the compressed gas is mixed on the side of the gas separation cone away from the air intake hood, thereby improving the turbulence degree of the airflow and the utilization efficiency of the gas energy. The gas separation arc plate is set, and the gas separation arc plate converts the laminar layer on the contact surface into a turbulent layer, thereby improving the turbulence degree of the gas, thereby improving the intake efficiency of the gas in the intake pipe.

[0013] (2) By providing the toothed plate, toothed column bars and silicone sleeve, the silicone sleeve can be stretched open, so that the width of the gas channel for gas flow in the intake pipe can be adjusted, thereby improving the applicability of the intake pipe. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0015] Figure 2 This is a schematic diagram of the cross-sectional structure of the air intake pipe of the utility model;

[0016] Figure 3 This is a schematic diagram of the gas separation cone structure of the utility model;

[0017] Figure 4 This is a schematic diagram of the structure of the silicone sleeve of the utility model;

[0018] Figure 5 This is a schematic diagram of the cross-sectional structure of the air intake hood of the utility model;

[0019] Figure 6 For this utility model Figure 5 Schematic diagram of the locally enlarged structure of A in the middle.

[0020] In the figure:

[0021] 100. Vapor deposition equipment body; 101. Air inlet pipe; 102. Gas distribution cone; 103. Gas distribution arc plate; 104. Connecting rod;

[0022] 200, air intake hood; 201, partition plate; 202, annular groove;

[0023] 300, toothed column; 301, silicone sleeve;

[0024] 400, tooth plate; 401, fixing ring; 402, side opening;

[0025] 500, limit plate;

[0026] 600, fixed block; 601, electric push rod;

[0027] 700, PLC controller. DETAILED DESCRIPTION

[0028] See also Figure 1-6 The utility model provides a high-efficiency air intake mechanism of a plasma chemical vapor deposition device, including a vapor deposition device body 100, wherein the air intake end of the vapor deposition device body 100 is connected with an air intake pipe 101, a gas dividing cone 102 is arranged on one side of the air intake pipe 101, a plurality of gas dividing arc plates 103 distributed in a circumference are fixed to the outer wall of the gas dividing cone 102, and the number of gas dividing arc plates 103 is eight, and an air intake cover 200 is fixed on the other side of the air intake pipe 101, and the air intake cover 200 is close to the An annular groove 202 is provided on one side of the air dividing cone 102, and a plurality of partition plates 201 in pairs and distributed in a circle are fixed on the inner wall of the annular groove 202. There are sixteen partition plates 201, and toothed columns 300 are rotatably connected between adjacent partition plates 201 close to each other on one side. Silicone sleeves 301 are fixed between the inner walls of a plurality of the toothed columns 300. There are eight toothed columns 300. The silicone sleeves 301 and the air intake cover 200 are fixed close to each other on one side, and a pushing assembly is provided in the annular groove 202.

[0029] Further Figure 6 As shown, the pushing assembly includes a side opening 402, and the side opening 402 is opened on a side of the partition plate 201. A fixing ring 401 is movably engaged in a plurality of the side openings 402. There are sixteen side openings 402. A plurality of circularly distributed tooth plates 400 are fixed to the fixing ring 401 close to a side of the toothed column 300. There are eight tooth plates 400. The tooth plates 400 are located between adjacent partition plates 201, and the tooth plates 400 are meshed with the toothed column 300.

[0030] The side opening 402 is provided so that the fixing ring 401 can move in the annular groove 202 . The fixing ring 401 is provided so that the eight tooth plates 400 can move synchronously, thereby driving the eight toothed columns 300 to rotate synchronously, so that the silicone sleeve 301 is stretched open.

[0031] Further Figure 6 As shown, fixed blocks 600 are fixed on opposite sides of the outer wall of the fixing ring 401, and electric push rods 601 distributed up and down are fixed on the inner wall of the annular groove 202 away from the toothed column 300, and the output end of the electric push rod 601 is fixed to a side surface corresponding to the fixed block 600.

[0032] By providing the electric push rod 601 , the fixing ring 401 can be pushed by the electric push rod 601 , so that the toothed column bar 300 can rotate.

[0033] This solution has the following working process: when adjusting the width of the gas channel for gas flow in the air inlet pipe 101 of the vapor deposition equipment body 100, operate the PLC controller 700, the PLC controller 700 controls the two electric push rods 601 to start at the same time, the electric push rods 601 push the fixed ring 401 to move, the movement of the fixed ring 401 drives the tooth plate 400 to move, the movement of the tooth plate 400 drives the toothed column 300 to rotate, so that the silicone sleeve 301 is stretched, and at this time the width of the gas channel for gas flow in the air inlet pipe 101 is increased.

[0034] When the air intake pipe 101 is being supplied with air, the width of the gas channel for the gas flow in the air intake pipe 101 is first adjusted to a larger state, and then the gas is introduced into the air intake pipe 101. The gas is compressed when passing through the air separation cone 102, and the compressed gas is mixed on the side of the air separation cone 102 away from the air intake hood 200, thereby increasing the turbulence of the airflow and the utilization efficiency of the gas energy. The air separation arc plate 103 converts the laminar layer of the contact surface into a turbulent layer, thereby increasing the turbulence of the gas, thereby increasing the air intake efficiency of the gas in the air intake pipe 101.

[0035] According to the above working process, it can be known that: through the setting of the gas separation cone 102, the gas is compressed when passing through the gas separation cone 102, and the compressed gas is mixed on the side of the gas separation cone 102 away from the air intake hood 200, thereby improving the turbulence degree of the airflow and the utilization efficiency of the gas energy. Through the setting of the gas separation arc plate 103, the gas separation arc plate 103 converts the laminar layer of the contact surface into a turbulent layer, thereby being able to improve the turbulence degree of the gas, thereby improving the air intake efficiency of the gas in the air intake pipe 101.

[0036] By providing the toothed plate 400 , the toothed column bar 300 and the silicone sleeve 301 , the silicone sleeve 301 can be stretched open, so that the width of the gas channel for gas flow in the air intake pipe 101 can be adjusted, thereby improving the applicability of the air intake pipe 101 .

[0037] Further Figure 1 As shown, a PLC controller 700 is fixed on one side of the top surface of the vapor deposition equipment body 100 , and the two electric push rods 601 are electrically connected to the PLC controller 700 respectively.

[0038] By means of the PLC controller 700 , the two electric push rods 601 can be started synchronously, thereby driving the fixing ring 401 to move stably, thereby expanding the silicone sleeve 301 .

[0039] Further Figure 6 As shown, a plurality of limit plates 500 arranged in pairs and distributed in a circumference are fixed to the outer side wall of the fixing ring 401 , and there are sixteen pairs of limit plates 500 . Adjacent limit plates 500 are movably engaged with the corresponding partition plates 201 .

[0040] By providing the limiting plate 500 , the position of the fixing ring 401 can be movably limited, thereby avoiding the situation where the tooth plate 400 and the toothed column bar 300 are misaligned.

[0041] Further Figure 3 As shown, a plurality of connecting rods 104 distributed in a circumference are fixed to one side of the outer wall of the air dividing cone 102 . There are three connecting rods 104 , and one end of each connecting rod 104 is fixed to the inner wall of the air inlet pipe 101 .

[0042] The air splitter cone 102 can be fixed on the inner wall of the air intake pipe 101 by means of the provided connecting rod 104 .

[0043] In summary: when adjusting the width of the gas channel for gas circulation in the air inlet pipe 101 of the vapor deposition equipment body 100, operate the PLC controller 700, the PLC controller 700 controls the two electric push rods 601 to start at the same time, the electric push rods 601 push the fixed ring 401 to move, the movement of the fixed ring 401 drives the tooth plate 400 to move, the movement of the tooth plate 400 drives the toothed column 300 to rotate, so that the silicone sleeve 301 is stretched, and at this time the width of the gas channel for gas circulation in the air inlet pipe 101 is increased.

[0044] When the air intake pipe 101 is being supplied with air, the width of the gas channel for the gas flow in the air intake pipe 101 is first adjusted to a larger state, and then the gas is introduced into the air intake pipe 101. The gas is compressed when passing through the air separation cone 102, and the compressed gas is mixed on the side of the air separation cone 102 away from the air intake hood 200, thereby increasing the turbulence of the airflow and the utilization efficiency of the gas energy. The air separation arc plate 103 converts the laminar layer of the contact surface into a turbulent layer, thereby increasing the turbulence of the gas, thereby increasing the air intake efficiency of the gas in the air intake pipe 101.

[0045] The vapor deposition equipment body 100, the electric push rod 601 and the PLC controller 700 can be purchased on the market. They are mature technologies in this field and have been fully disclosed, so they are not repeated in the specification.

[0046] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A high-efficiency gas inlet mechanism for a plasma chemical vapor deposition device, comprising a vapor deposition device body (100), characterized in that: The gas inlet end of the gas phase deposition equipment body (100) is connected to an inlet pipe (101), a gas dividing cone (102) is arranged on one side of the inlet pipe (101), a plurality of gas dividing arc plates (103) distributed in a circumferential pattern are fixed to the outer wall of the gas dividing cone (102), an inlet cover (200) is fixed on the other side of the inlet pipe (101), and an annular groove (203) is provided on the side of the inlet cover (200) close to the gas dividing cone (102). 02), a plurality of partition plates (201) in pairs and distributed in a circumference are fixed to the inner side wall of the annular groove (202), a toothed column (300) is rotatably connected between adjacent partition plates (201) close to one side, a silicone sleeve (301) is fixed between the inner walls of a plurality of the toothed columns (300), the silicone sleeve (301) and the air intake cover (200) are fixed close to one side, and a pushing component is arranged in the annular groove (202).

2. The high-efficiency air intake mechanism of a plasma chemical vapor deposition device according to claim 1, characterized in that: The pushing assembly includes a side opening (402), and the side opening (402) is opened on a side of the partition plate (201). A plurality of fixing rings (401) are movably engaged in the side openings (402). A plurality of tooth plates (400) distributed in a circular pattern are fixed to a side of the fixing ring (401) close to the toothed column (300). The tooth plates (400) are located between adjacent partition plates (201), and the tooth plates (400) are meshed with the toothed column (300).

3. The high-efficiency air intake mechanism of a plasma chemical vapor deposition device according to claim 2, characterized in that: Fixed blocks (600) are fixed to opposite sides of the outer wall of the fixing ring (401), and electric push rods (601) distributed up and down are fixed to the inner wall of the annular groove (202) away from the toothed column (300), and the output end of the electric push rod (601) is fixed to a side surface corresponding to the fixed block (600).

4. The high-efficiency air intake mechanism of a plasma chemical vapor deposition device according to claim 3, characterized in that: A PLC controller (700) is fixed to one side of the top surface of the vapor deposition equipment body (100), and the two electric push rods (601) are electrically connected to the PLC controller (700) respectively.

5. The high-efficiency air intake mechanism of a plasma chemical vapor deposition device according to claim 4, characterized in that: A plurality of limiting plates (500) arranged in pairs and distributed in a circumferential manner are fixed to the outer side wall of the fixing ring (401), and adjacent limiting plates (500) are movably engaged with corresponding partition plates (201).

6. The high-efficiency air intake mechanism of a plasma chemical vapor deposition device according to claim 5, characterized in that: A plurality of connecting rods (104) distributed in a circumference are fixed to one side of the outer wall of the air separation cone (102), and one end of the connecting rod (104) is fixed to the inner wall of the air intake pipe (101).

Images