Packaging container and vapor deposition system

By mixing the vapors of solid and liquid precursors in the packaging container, the problem of poor precursor transport stability during vapor deposition is solved, and a more uniform deposition layer quality and a longer precursor use cycle are achieved, thereby improving the machine's productivity.

CN222648110UActive Publication Date: 2025-03-21JIANGSU INST OF ADVANCED SEMICON CO LTD
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Patent Information

Application Number
CN202421377189.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-17
Publication Date
2025-03-21
Estimated Expiration
2034-06-17

AI Technical Summary

Technical Problem

The prior art is difficult to effectively improve the transport stability of solid precursors during vapor deposition, resulting in uneven components, degradation of semiconductor layer mass, short period of replacement of precursors and waste of precursors.

Method used

A package container is designed, including a first cavity for filling the solid precursor and a second cavity for filling the liquid precursor, mixing the solid precursor vapor with the liquid precursor vapor through the first communication part, and the intake and outlet pipes are used to transport the carrier gas and the precursor vapor.

Benefits of technology

By mixing solid and liquid precursor vapors, the stability of the precursor is improved, the component uniformity of the vapor-phase deposition layer and the quality of the semiconductor layer are improved, the precursor usage cycle is extended, the precursor waste is reduced, and the machine's productivity is improved.

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Abstract

The utility model discloses a packaging container which comprises a first cavity, a second cavity, a first communicating part, an air inlet pipeline and an air outlet pipeline. The first cavity is filled with a solid precursor; wherein the second cavity is arranged in the first cavity, the interior of the second cavity is used for being filled with a liquid precursor, and an inner cavity for containing a solid precursor is formed between the outer wall of the second cavity and the inner wall of the first cavity; the first cavity is communicated with the second cavity through the first communication part and is used for allowing solid precursor steam in the first cavity to enter the second cavity; the gas inlet pipeline is communicated with the second cavity and is used for conveying external carrier gas into the second cavity; and the gas outlet pipeline is communicated with the second cavity and is used for discharging the carrier gas carrying the liquid precursor steam and the solid precursor steam from the interior of the second cavity. The decomposition of the precursor in the conveying process of the liquid precursor steam in the second cavity is avoided, and the stability of the liquid precursor in the second cavity and the stability of the precursor in the conveying process are ensured.
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