Ultrasonic cleaning machine capable of discharging water conveniently

Abstract

The utility model discloses an ultrasonic cleaning machine convenient to discharge water, which relates to the technical field of ultrasonic cleaning machines for monocrystalline silicon wafers and comprises an ultrasonic cleaning machine body, water pumping pipes are arranged on two sides of the lower surface of the ultrasonic cleaning machine body, and a slope is arranged at the bottom of the ultrasonic cleaning machine body. A three-way pipe is arranged on the surface of the water pumping pipe, a water suction pump is arranged at the front end of the three-way pipe, a sediment box is arranged at the rear end of the water suction pump, a drainage pump is installed on the surface of the upper end of the sediment box, a drainage pipe is arranged at the output end of the drainage pump, and the front end of the drainage pipe is arranged in the ultrasonic cleaning machine body; compared with an existing common monocrystalline silicon wafer ultrasonic cleaning machine with a limiting guide rail, the ultrasonic cleaning machine facilitating water liquid drainage has the advantages that the slope is arranged at the bottom of the ultrasonic cleaning machine body, so that the situation that cleaning liquid is accumulated to affect liquid drainage during liquid drainage can be avoided; the liquid discharging speed can be increased; meanwhile, the liquid discharging pipe is prevented from being blocked.

Description

Technical Field

[0001] The utility model relates to the technical field of single crystal silicon wafer ultrasonic cleaning machines, in particular to an ultrasonic cleaning machine which is convenient for discharging water. Background Art

[0002] Monocrystalline silicon is a relatively active non-metallic element and an important component of crystalline materials. It is at the forefront of the development of new materials. Its main uses are as a semiconductor material and in solar photovoltaic power generation and heating. At present, monocrystalline silicon wafers need to be cleaned by ultrasonic cleaning machines during production. Traditional monocrystalline silicon wafers are mostly placed in ultrasonic cleaning machines for cleaning.

[0003] For example, the patent document with application number 202123132167.8 discloses an ultrasonic cleaning machine for single crystal silicon wafers with a limiting guide rail. The utility model discloses an ultrasonic cleaning machine for single crystal silicon wafers with a limiting guide rail in the technical field of ultrasonic cleaning machines for single crystal silicon wafers, including a basic component, the basic component includes an L-shaped frame, and the inner wall at the bottom of the L-shaped frame is provided with an ultrasonic cleaning device body through a bracket; a receiving component, the receiving component includes a cylinder arranged in the middle of the inner wall at the bottom of the L-shaped frame, and the circumferential outer wall of the hollow column is provided with a plurality of groups of U-shaped seats in a circular array; a circulation component, the circulation component is arranged on the right outer wall of the ultrasonic cleaning device body. The utility model is provided with a receiving assembly, which can position the single crystal silicon wafer to be cleaned through the limit groove on the top of the limit guide rail and the top inner wall of the U-shaped seat. The limit guide rail can be adjusted by a screw rod, which is convenient for positioning single crystal silicon wafers of different specifications. At the same time, during cleaning, the single crystal silicon wafer can be rotated in the ultrasonic cleaning device body through a rotating device, thereby improving the cleaning quality. However, when the cleaning liquid needs to be replaced after a long period of cleaning, the cleaning liquid filled with impurities needs to be discharged. If the diameter of the discharge pipe is too small, the impurities in the cleaning liquid will cause the discharge port to be blocked during discharge.

[0004] Therefore, in view of this, the existing structural deficiencies are studied and improved, and an ultrasonic cleaning machine that is convenient for water discharge is proposed. Utility Model Content

[0005] The utility model aims to provide an ultrasonic cleaning machine which is convenient for discharging water, so as to solve the problems raised in the above-mentioned background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an ultrasonic cleaning machine that is convenient for discharging water, comprising an ultrasonic cleaning machine body, water suction pipes are arranged on both sides of the lower surface of the ultrasonic cleaning machine body, and a slope is arranged at the bottom of the ultrasonic cleaning machine body, a three-way pipe is arranged on the surface of the water suction pipe, and a water suction pump is arranged at the front end of the three-way pipe, and a sedimentation tank is arranged at the rear end of the water suction pump, a drainage pump is installed on the upper end surface of the sedimentation tank, and a drainage pipe is arranged at the output end of the drainage pump, and the front end of the drainage pipe is arranged inside the ultrasonic cleaning machine body.

[0007] Preferably, a limit seat is provided on the inner wall of the main body of the ultrasonic cleaning machine, and a limit guide rail is slidably installed inside the limit seat.

[0008] Preferably, a placement basket is provided at the front end of the position-limiting guide rail, and a partition plate is provided at the bottom of the placement basket.

[0009] Preferably, support plate 1 is provided on both sides of the placement basket, and an electric lifting rod is provided at the lower end of support plate 1, and support plate 2 is provided at the lower end of the electric lifting rod.

[0010] Preferably, a vertical plate is provided at the lower end of the main body of the ultrasonic cleaning machine, and an inclined plate is provided at the front end of the vertical plate.

[0011] Preferably, a plurality of guide grooves are provided on the surface of the inclined plate, and the guide grooves are evenly arranged.

[0012] Preferably, a blower is installed on the surface of the upright plate, and an arc-shaped air guide plate is provided at the front end of the blower.

[0013] Compared with the prior art, the beneficial effects of the utility model are:

[0014] 1. The utility model is provided with an ultrasonic cleaning machine body, a sedimentation tank, a water pump, a tee pipe, a water pump, a drainage pump and a drainage pipe. Through the multiple water pumping pipes, the drainage speed of the ultrasonic cleaning machine body can be increased when the liquid is discharged, and the impurities in the cleaning liquid are prevented from clogging the water pumping pipe during the drainage, thereby affecting the cleaning effect of the ultrasonic cleaning machine body. Through the provision of the sedimentation tank, the discharged cleaning liquid can be precipitated and filtered, and can be reused;

[0015] 2. The utility model arranges the placement basket, the partition plate, the first support plate, the electric lifting rod, the second support plate, the limit rail and the limit seat. The electric lifting rod can be arranged so that after the single crystal silicon wafer is cleaned, the single crystal silicon wafer can be stably taken out through the placement basket. The partition plate can be arranged so that the single crystal silicon wafer can be separated during cleaning to avoid adhesion during the cleaning process and affect the cleaning effect.

[0016] 3. The utility model arranges upright plates, blowers, arc-shaped air guide plates, inclined plates and guide grooves. Through the arrangement of the blowers and guide grooves, when the placement basket is lifted, strong winds can blow on the monocrystalline silicon wafers to remove the cleaning liquid on the surface and ensure the surface of the monocrystalline silicon wafers is dry. Through the arrangement of the inclined plates and guide grooves, the blown cleaning liquid can be blocked and the remaining cleaning liquid can be slid into the interior of the ultrasonic cleaning machine body for reuse. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the overall three-dimensional structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the structure of the liquid discharge device of the utility model;

[0019] Figure 3 This is a schematic diagram of the structure of the basket placed in the utility model;

[0020] Figure 4 This is a schematic diagram of the structure of the drying device of the utility model.

[0021] In the figure: 1. ultrasonic cleaning machine body; 2. sedimentation box; 201. water pump; 202. three-way pipe; 203. water pump; 204. drainage pump; 205. drainage pipe; 3. placement basket; 301. partition plate; 302. support plate one; 303. electric lifting rod; 304. support plate two; 305. limit guide rail; 306. limit seat; 4. upright plate; 401. blower; 402. arc-shaped air guide plate; 403. inclined plate; 404. guide groove. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] like Figure 1-Figure 2 As shown, an ultrasonic cleaning machine for facilitating water discharge comprises an ultrasonic cleaning machine body 1, water extraction pipes 203 are arranged on both sides of the lower surface of the ultrasonic cleaning machine body 1, and a slope is arranged at the bottom of the ultrasonic cleaning machine body 1. The advantage of this arrangement is that by setting the bottom of the ultrasonic cleaning machine body 1 as a slope, it is possible to avoid residual cleaning liquid at the bottom, which would cause accumulation of cleaning liquid.

[0024] Furthermore, a tee pipe 202 is provided on the surface of the water suction pipe 203, and a water suction pump 201 is provided at the front end of the tee pipe 202, and a sedimentation tank 2 is provided at the rear end of the water suction pump 201. The advantage of this arrangement is that, through multiple water suction pipes 203, the drainage speed of the ultrasonic cleaning machine body 1 can be increased when discharging liquid, thereby avoiding impurities in the cleaning liquid from clogging the water suction pipe 203 during drainage.

[0025] Furthermore, a drainage pump 204 is installed on the upper end surface of the sedimentation tank 2, and a drainage pipe 205 is provided at the output end of the drainage pump 204, and the front end of the drainage pipe 205 is arranged inside the ultrasonic cleaning machine body 1. The advantage of this arrangement is that through the arrangement of the drainage pump 204, the filtered cleaning liquid can be delivered to the interior of the sedimentation tank 2.

[0026] like Figure 3-Figure 4 As shown, a limit seat 306 is provided on the inner wall of the ultrasonic cleaning machine body 1, and a limit guide rail 305 is slidably installed inside the limit seat 306. The advantage of this arrangement is that the lifting and lowering placement basket 3 can be limited by the arrangement of the limit seat 306.

[0027] Furthermore, a placing basket 3 is provided at the front end of the limiting guide rail 305, and a partition plate 301 is provided at the bottom of the placing basket 3, support plates 1 302 are provided on both sides of the placing basket 3, and an electric lifting rod 303 is provided at the lower end of the support plate 1 302, and a support plate 2 304 is provided at the lower end of the electric lifting rod 303. The advantage of this arrangement is that, through the arrangement of the electric lifting rod 303, the single crystal silicon wafer can be stably taken out through the placing basket 3 after the single crystal silicon wafer is cleaned, and through the arrangement of the partition plate 301, the single crystal silicon wafer can be separated during cleaning to avoid adhesion during the cleaning process and affect the cleaning effect.

[0028] Furthermore, a vertical plate 4 is provided at the lower end of the ultrasonic cleaning machine body 1, and an inclined plate 403 is provided at the front end of the vertical plate 4. A plurality of guide grooves 404 are provided on the surface of the inclined plate 403, and the guide grooves 404 are evenly arranged. The advantage of this arrangement is that, through the arrangement of the inclined plate 403 and the guide grooves 404, the blown cleaning liquid can be blocked and the residual cleaning liquid can be slid into the interior of the ultrasonic cleaning machine body 1 for reuse.

[0029] Furthermore, a blower 401 is installed on the surface of the upright plate 4, and an arc-shaped air guide plate 402 is provided at the front end of the blower 401. The advantage of this arrangement is that, through the arrangement of the blower 401 and the guide groove 404, when the placement basket 3 is lifted, strong wind can blow on the single crystal silicon wafer to remove the cleaning liquid on the surface and ensure that the surface of the single crystal silicon wafer is dry.

[0030] Working principle: When using the ultrasonic cleaning machine that facilitates water discharge, first, after placing the single crystal silicon wafers into the partition plate 301 of the placement basket 3 in turn, start the electric lifting rod 303 to move it along the limit seat 306 into the interior of the ultrasonic cleaning machine body 1 for cleaning. After the cleaning is completed, the placement basket 3 is lifted, and the blower 401 is started to dry the single crystal silicon wafers in the placement basket 3 through the arc-shaped air guide plate 402. The flying cleaning liquid flows back to the interior of the ultrasonic cleaning machine body 1 through the guide groove 404 of the inclined plate 403. When the cleaning liquid needs to be replaced, the water pump 201 is started to move the cleaning liquid in the ultrasonic cleaning machine body 1 into and out of the sedimentation tank 2 through the water pump 203 for sedimentation and filtration, and then the drainage pump 204 draws it out and discharges it into the interior of the ultrasonic cleaning machine body 1 through the drainage pipe 205. This is the working principle of the ultrasonic cleaning machine that facilitates water discharge.

Claims

1. An ultrasonic cleaning machine for facilitating the discharge of water, comprising an ultrasonic cleaning machine body (1), characterized in that: Water suction pipes (203) are arranged on both sides of the lower surface of the ultrasonic cleaning machine body (1), and a slope is arranged at the bottom of the ultrasonic cleaning machine body (1). A tee pipe (202) is arranged on the surface of the water suction pipe (203), and a water suction pump (201) is arranged at the front end of the tee pipe (202), and a sedimentation tank (2) is arranged at the rear end of the water suction pump (201). A drainage pump (204) is installed on the upper end surface of the sedimentation tank (2), and a drainage pipe (205) is arranged at the output end of the drainage pump (204), and the front end of the drainage pipe (205) is arranged inside the ultrasonic cleaning machine body (1).

2. The ultrasonic cleaning machine for facilitating water discharge according to claim 1, characterized in that: A limit seat (306) is provided on the inner wall of the ultrasonic cleaning machine body (1), and a limit guide rail (305) is slidably mounted inside the limit seat (306).

3. The ultrasonic cleaning machine for facilitating water discharge according to claim 2, characterized in that: A placement basket (3) is provided at the front end of the position-limiting guide rail (305), and a partition plate (301) is provided at the bottom of the placement basket (3).

4. The ultrasonic cleaning machine for facilitating water discharge according to claim 3, characterized in that: Support plates 1 (302) are arranged on both sides of the placement basket (3), and an electric lifting rod (303) is arranged at the lower end of the support plate 1 (302), and support plate 2 (304) is arranged at the lower end of the electric lifting rod (303).

5. The ultrasonic cleaning machine for facilitating water discharge according to claim 1, characterized in that: A vertical plate (4) is arranged at the lower end of the ultrasonic cleaning machine body (1), and an inclined plate (403) is arranged at the front end of the vertical plate (4).

6. The ultrasonic cleaning machine for facilitating water discharge according to claim 5, characterized in that: A plurality of guide grooves (404) are provided on the surface of the inclined plate (403), and the guide grooves (404) are evenly arranged.

7. The ultrasonic cleaning machine for facilitating water discharge according to claim 5, characterized in that: A blower (401) is installed on the surface of the upright plate (4), and an arc-shaped air guide plate (402) is arranged at the front end of the blower (401).

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