Protection structure for epitaxial equipment
By designing a protective structure of the removable connected cylinder and projection, the problems of short service life of the protective structure of the epitaxial equipment and the drop of deposits are solved, and a longer service life, lower maintenance costs and higher quality of the epitaxial sheet are achieved.
Patent Information
- Application Number
- CN202421409281.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-19
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2034-06-19
AI Technical Summary
The protective structure of existing epitaxial equipment has a short service life in high temperature and corrosive environments and requires frequent replacement or maintenance, resulting in increased costs and reduced substrate and epitaxial layer quality.
A protective structure for an epitaxial device is designed, including a plurality of removably connected cylinders, projections and exterior expansion members. With this structure, the cylinder can be replaced or maintained individually, reducing the risk of deposit drop and improving heat transfer efficiency.
It extends the service life of the protective structure, reduces replacement and maintenance costs, improves the concentration uniformity and yield of the epitaxial sheet, and reduces the risk of deposits falling on the substrate.
Smart Images
Figure CN222666098U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of epitaxial equipment, in particular to a protective structure for epitaxial equipment. Background Art
[0002] As an important component of the epitaxial equipment, the protective structure is installed inside the epitaxial equipment to protect the heating wires on the side walls of the epitaxial equipment from corrosion by the reaction gas, and also to make the temperature in the epitaxial equipment evenly distributed. However, during the epitaxial growth process, the substrate is placed in the protective structure. While the epitaxial layer is growing, sediments inevitably grow on the inner wall of the protective structure. The sediments will fall onto the substrate with the airflow, reducing the quality of the substrate and the epitaxial layer. Moreover, due to the high temperature and corrosive environment during the epitaxial growth process, the protective structure has a short service life and needs to be frequently replaced or maintained, which increases the cost of epitaxial growth. Utility Model Content
[0003] The utility model aims to provide a protective structure for epitaxial equipment, which can reduce the replacement time and replacement cost of the protective structure, reduce the risk of sediment falling on the inner wall of the protective structure, and improve the concentration uniformity of the epitaxial wafer.
[0004] In order to achieve the above-mentioned purpose and other related purposes, the utility model is implemented through the following technical solutions.
[0005] The utility model provides a protective structure for epitaxial equipment, which at least comprises:
[0006] A plurality of cylinders are coaxially arranged, and the plurality of cylinders are sequentially distributed along the axis direction;
[0007] A connecting piece, which can detachably connect two adjacent cylinders; and
[0008] The raised portion is circumferentially arranged on the inner wall of the cylinder, and the raised portion protrudes in the axial direction of the cylinder.
[0009] In an embodiment of the utility model, the barrel includes a first barrel and a second barrel. Among the plurality of barrels, the first barrel and the second barrel are farthest apart, and the substrate to be epitaxially grown is placed in the second barrel.
[0010] In an embodiment of the present invention, in a direction from the first cylinder to the second cylinder, the protrusion heights of the protrusions are equal or unequal.
[0011] In an embodiment of the present invention, the protrusion height of the protrusion increases gradually from the direction of the first cylinder to the second cylinder.
[0012] In an embodiment of the present invention, the shape of the protrusion is polygonal.
[0013] In one embodiment of the utility model, the protrusions are triangular protrusions, and the triangular protrusions are equidistantly distributed on the inner wall of the cylinder.
[0014] In an embodiment of the present invention, the inner angle of the triangular protrusion in the direction away from the inner wall of the cylinder is 30°-120°.
[0015] In an embodiment of the utility model, the protection structure further includes a plurality of external expansion parts, which are arranged outside the first cylinder and around a side of the first cylinder away from the second cylinder, and are arranged outside the second cylinder and around a side of the second cylinder away from the first cylinder.
[0016] In one embodiment of the utility model, in the direction from the first cylinder to the second cylinder, the wall thickness of the first cylinder and the second cylinder increases, and the maximum wall thickness of the first cylinder is the same as the minimum wall thickness of the second cylinder, or the wall thickness of the first cylinder is equal, and the wall thickness of the second cylinder increases.
[0017] In an embodiment of the present invention, the protective structure further comprises a coating, and the coating is arranged on the outer surface of the cylinder away from the axis.
[0018] In summary, the utility model proposes a protective structure for epitaxial equipment, which can reduce the maintenance cost or replacement cost of the protective structure, increase the maintenance cycle of the protective structure, improve the use efficiency of the protective structure, and save costs. In addition, the protective structure provided by the utility model can increase the specific surface area of the inner wall of the protective structure, improve the heat transfer efficiency of the protective structure, make the temperature in the epitaxial equipment evenly distributed, and reduce the risk of sediments on the inner wall of the protective structure falling onto the substrate, thereby improving the yield of the epitaxial wafer.
[0019] Of course, any method of implementing the present invention does not necessarily need to achieve all of the advantages described above at the same time. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for describing the embodiments are briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0021] Figure 1 It is a schematic diagram of a protective structure for epitaxial equipment in one embodiment of the utility model.
[0022] Figure 2 It is a schematic diagram of a protective structure for epitaxial equipment in another embodiment of the utility model.
[0023] Figure 3 It is a schematic diagram of a raised portion in one embodiment of the utility model.
[0024] Figure 4 It is a schematic diagram of a protrusion in another embodiment of the utility model.
[0025] Figure 5 It is a schematic diagram of the inner wall of the cylinder in one embodiment of the utility model.
[0026] Marking Description:
[0027] 100, cylinder; 101, first cylinder; 102, second cylinder; 200, connecting piece; 201, external thread; 202, internal thread; 300, raised portion; 400, external expansion piece. DETAILED DESCRIPTION
[0028] The following describes the implementation of the present invention through specific examples. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementations. The details in the present invention can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict.
[0029] It should be noted that the illustrations provided in the following embodiments are only schematic illustrations of the basic concept of the present invention, and thus the drawings only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed at will, and the component layout may also be more complicated.
[0030] In the present invention, it should be noted that, if the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. appear, the orientation or position relationship indicated is based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. In addition, if the terms "first" and "second" appear, they are only used for description and distinction purposes, and cannot be understood as indicating or implying relative importance.
[0031] The protective structure is installed in the epitaxial device to protect the heating wires on the side walls of the epitaxial device from corrosion by the reaction gas, and at the same time, it plays a role in evenly distributing the temperature in the epitaxial device and accelerating the decomposition of the reaction gas / deposition gas. As an integral structure, once the protective structure is damaged, the protective device needs to be replaced as a whole, which leads to increased costs. Moreover, due to the large size of the protective structure, the process of disassembling and installing the protective structure is relatively complicated and time-consuming, which increases the maintenance time of the epitaxial device and affects the efficiency of the use of the epitaxial device. The protective structure for epitaxial equipment provided by the utility model can extend the service life of the protective structure, save epitaxial production costs, reduce the risk of sediments on the inner wall of the protective structure falling onto the substrate, and improve the concentration uniformity of the epitaxial wafer.
[0032] See also Figures 1 to 5 As shown, the utility model provides a protective structure for epitaxial equipment, for example, including a cylinder 100, a connector 200 and a protrusion 300. Among them, there are multiple cylinders 100, multiple cylinders 100 are coaxially arranged, and multiple cylinders 100 are distributed in sequence along the axial direction, the connector 200 can detachably connect two adjacent cylinders 100, and the protrusion 300 is arranged on the inner wall of the cylinder 100. The protective structure for epitaxial equipment provided by the utility model, by setting multiple detachably connected cylinders 100, when the protective structure needs to be replaced or maintained, a cylinder 100 can be replaced or maintained separately, avoiding the replacement or maintenance of the entire protective structure, thereby simplifying the replacement or maintenance process of the protective structure, saving the maintenance time of the protective structure, improving the overall use efficiency of the epitaxial equipment, and saving the maintenance cost of the protective structure. Moreover, the protective structure provided by the utility model can reduce the risk of sediment falling on the inner wall of the cylinder 100 through the protrusion 300, and protect the epitaxial layer and the substrate.
[0033] See also Figure 1 to Figure 2As shown, in one embodiment of the utility model, there are multiple cylinders 100, for example, and the multiple cylinders 100 are coaxially arranged, and the multiple cylinders 100 are sequentially distributed along the axial direction. In this embodiment, there are two cylinders 100, for example, and the two cylinders 100 are respectively a first cylinder 101 and a second cylinder 102, and the first cylinder 101 and the second cylinder 102 are sequentially distributed along the axial direction, and the substrate waiting for epitaxial growth is placed in the second cylinder 102, and the material of the cylinder 100 is, for example, graphite, and the purity of the graphite is, for example, 99.9wt%-100wt%. By setting the cylinder 100 of graphite material, it can be ensured that the cylinder 100 has good thermal conductivity, and it can also ensure the stability and safety of the cylinder 100 in high temperature and corrosive environments, so that the cylinder 100 can adapt to the environment of epitaxial growth. In other embodiments, at least one cylinder 100 may be added between the first cylinder 101 and the second cylinder 102 , that is, among the plurality of cylinders 100 , the first cylinder 101 and the second cylinder 102 are farthest apart.
[0034] See also Figure 1 to Figure 2 As shown, in one embodiment of the present invention, the connecting member 200 can detachably connect two adjacent cylinders 100. In this embodiment, the connecting member 200 can detachably connect the first cylinder 101 and the second cylinder 102, and the connecting member 200 is, for example, a threaded structure, a buckle structure, or a flange structure. Figure 1 As shown, in this embodiment, the connecting member 200 is, for example, a threaded structure, and the connecting member 200 includes, for example, an external thread 201 and an internal thread 202, etc. The external thread 201 is arranged on the outer wall of the second cylinder 102 on the side close to the first cylinder 101, and the external thread 201 and the second cylinder 102 are, for example, integrally formed, and the internal thread 202 is arranged on the inner wall of the first cylinder 101 on the side close to the second cylinder 102, and the internal thread 202 and the first cylinder 101 are, for example, integrally formed, and the external thread 201 and the internal thread 202 match to connect the first cylinder 101 and the second cylinder 102. Please refer to Figure 2As shown, in another embodiment of the utility model, the connector 200 is, for example, a flange connection. Since most of the sediments are attached to the inner wall of the second barrel 102 during the epitaxial growth process, the sediments on the inner wall of the first barrel 101 are less. Therefore, by setting the connector 200 to detachably connect the first barrel 101 and the second barrel 102, when the sediments on the inner wall of the second barrel 102 accumulate more, only the second barrel 102 can be replaced, and there is no need to open the upper cover of the epitaxial equipment to replace the protective structure as a whole, thereby simplifying the replacement process, and directly replacing the new second barrel 102 on the machine, avoiding waiting for polishing, thereby saving the replacement time and improving the utilization efficiency of the protective structure. Moreover, by setting the connector 200, the stability and reliability of the connection between the first barrel 101 and the second barrel 102, as well as the sealing during the epitaxial growth process, can be ensured, so that the gas in the barrel 100 will not leak out and corrode the heating wire, and it is convenient to disassemble and maintain the barrel 100.
[0035] See also Figures 1 to 4 As shown, in one embodiment of the present invention, the protrusion 300 is disposed around the inner wall of the cylinder 100, and the protrusion 300 protrudes in the axial direction of the cylinder 100. The protrusion 300 is, for example, a polygon or other shape, and the height of the protrusion 300 from the inner wall of the cylinder 100 is defined as the protrusion height. Figure 3 As shown, in this embodiment, the protrusion 300 is, for example, a triangular protrusion, and the triangular protrusions are equidistantly distributed on the inner wall of the cylinder 100, and the protrusion height of each triangular protrusion is, for example, equal, and the inner angle of the triangular protrusion in the direction away from the inner wall of the cylinder 100 is, for example, 30°-120°. By providing the protrusion 300, the specific surface area of the cylinder 100 is increased, the heat transfer efficiency of the protection structure is improved, and the temperature in the epitaxial equipment is evenly distributed, which is conducive to the thermal decomposition of the reaction gas / deposition gas. At the same time, relative to the smooth inner wall of the cylinder 100, the protrusion 300 can carry the sediment on the inner wall of the cylinder 100, reduce the risk of the sediment falling onto the substrate, protect the epitaxial layer and the substrate, increase the overall maintenance cycle of the protection structure, and save costs.
[0036] See also Figure 1 and Figure 4As shown, in another embodiment of the utility model, the protrusion 300 is, for example, a quadrilateral, and the protrusion height of each protrusion 300 is, for example, unequal. Specifically, in the direction from the first barrel 101 to the second barrel 102, the protrusion height of the protrusion 300 is, for example, gradually increased, so that the protrusion 300 is in a step-like shape. Since more sediments will grow on the inner wall of the second barrel 102 during the epitaxial growth process, by providing the step-shaped protrusion 300, the surface area of the protrusion 300 on the inner wall of the second barrel 102 is larger, so that the protrusion 300 on the inner wall of the second barrel 102 can provide support for more sediments, further reducing the risk of sediments falling onto the substrate.
[0037] See also Figure 1 to Figure 2 As shown, in one embodiment of the utility model, the protection structure further includes an external expansion member 400, and the external expansion member 400 is, for example, multiple, and the multiple external expansion members 400 are arranged outside the first cylinder 101 around the side of the first cylinder 101 away from the second cylinder 102, and are arranged outside the second cylinder 102 around the side of the second cylinder 102 away from the first cylinder 101. In this embodiment, the external expansion member 400 is, for example, arranged at one end of the first cylinder 101 away from the second cylinder 102, and at one end of the second cylinder 102 away from the first cylinder 101, and the external expansion member 400 extends in the axial direction away from the cylinder 100. In this embodiment, the protection structure is installed inside the epitaxial device, and a heating wire is arranged on the inner wall of the epitaxial device to provide heat inside the protection structure. The substrate is arranged in the protection structure, and the reaction gas / deposition gas is passed into the protection structure from the top of the cylinder 100 to perform epitaxial growth on the substrate. By providing the external expansion member 400, the contact between the reaction gas / deposition gas and the inner wall of the cylinder 100 can be reduced, and the phenomenon of the reaction gas / deposition gas being deposited on the inner wall of the cylinder 100 can be alleviated. Moreover, the external expansion member 400 extends in the axial direction away from the cylinder 100, so that the external expansion member 400 can be close to the heating wire on the inner wall of the epitaxial device, thereby increasing the temperature of the cylinder 100, thereby increasing the adhesion of the deposit on the inner wall of the cylinder 100, and reducing the risk of the deposit falling onto the substrate.
[0038] See also Figure 1 and Figure 5As shown, in another embodiment of the utility model, in the direction from the first barrel 101 to the second barrel 102, the wall thickness of the barrel 100 increases. In this embodiment, in the direction from the first barrel 101 to the second barrel 102, the wall thickness of the first barrel 101 and the second barrel 102 changes continuously. Specifically, the wall thickness of the first barrel 101 close to the second barrel 102 is the maximum wall thickness in the first barrel 101, and the wall thickness of the second barrel 102 close to the first barrel 101 is the minimum wall thickness in the second barrel 102, so that the wall thickness of the first barrel 101 and the second barrel 102 increases continuously. In another embodiment of the utility model, in the direction from the first barrel 101 to the second barrel 102, the wall thickness of the first barrel 101 can be the same, and the wall thickness of the second barrel 102 increases. By setting the wall thickness of the cylinder 100 to increase gradually, the temperature loss caused by gas heat convection on the edge of the cylinder 100 can be reduced, the temperature of the edge of the cylinder 100 and the edge of the epitaxial wafer can be increased, the problem of low concentration at the edge of the epitaxial wafer can be improved, the concentration uniformity of the epitaxial wafer can be improved, and the yield loss of the epitaxial wafer can be reduced.
[0039] See also Figure 1 to Figure 2 As shown, in one embodiment of the utility model, the protective structure further includes a coating, which is disposed on the outer surface of the cylinder 100. The coating, for example, includes at least one of a high-temperature ceramic coating, a tantalum carbide coating, a tungsten carbide coating, or a silicon carbide coating, and the protective layer is prepared, for example, by chemical vapor deposition, physical vapor deposition, or a solution method. By providing the coating, the service life of the cylinder 100 and the protective structure can be extended.
[0040] In summary, the utility model proposes a protective structure for epitaxial equipment. By providing a plurality of detachably connected cylinders, a single cylinder can be replaced, thereby saving the overall replacement time and replacement cost of the protective structure. The raised portion on the inner wall of the cylinder can reduce the risk of sediment on the inner wall falling onto the substrate, increase the maintenance cycle of the protective structure, and improve the use efficiency of the protective structure. Moreover, the protective structure provided by the utility model sets the wall thickness of the cylinder to increase along the axial direction of the cylinder, which can improve the concentration uniformity of the epitaxial wafer and reduce the yield loss of the epitaxial wafer.
[0041] References throughout the specification to "one embodiment," "an embodiment," or "a specific embodiment" mean that the particular features, structures, or characteristics described in conjunction with the embodiment are included in at least one embodiment of the utility model, and not necessarily in all embodiments. Thus, various appearances of the phrases "in one embodiment," "in an embodiment," or "in a specific embodiment" in different places throughout the specification do not necessarily refer to the same embodiment. In addition, the particular features, structures, or characteristics of any specific embodiment of the utility model may be combined with one or more other embodiments in any suitable manner. It should be understood that other variations and modifications of the utility model embodiments described and illustrated herein may be based on the teachings herein and will be considered part of the spirit and scope of the utility model.
[0042] The above description is only a preferred embodiment of the present application and an explanation of the technical principles used. Those skilled in the art should understand that the scope of the utility model involved in the present application is not limited to the technical solution formed by a specific combination of the above-mentioned technical features, but should also cover other technical solutions formed by any combination of the above-mentioned technical features or their equivalent features without departing from the concept of the utility model, such as the technical solution formed by replacing the above-mentioned features with the technical features with similar functions disclosed in this application (but not limited to). In addition to the technical features described in the specification, the remaining technical features are known technologies to those skilled in the art. In order to highlight the innovative features of the present utility model, the remaining technical features will not be repeated here.
Claims
1. A protective structure for epitaxial equipment, characterized in that: At least: A plurality of cylinders are coaxially arranged, and the plurality of cylinders are sequentially distributed along the axis direction; A connecting piece, detachably connecting two adjacent cylinders; as well as The raised portion is disposed around the inner wall of the cylinder and faces the axis direction of the cylinder.
2. The protective structure according to claim 1, characterized in that: The barrel comprises a first barrel and a second barrel. Among the plurality of barrels, the first barrel and the second barrel are farthest apart, and a substrate to be epitaxially grown is placed in the second barrel.
3. The protective structure according to claim 2, characterized in that: In a direction from the first cylinder to the second cylinder, the protrusion heights of the protrusions are equal or unequal.
4. The protective structure according to claim 3, characterized in that: The protrusion height of the protrusion increases gradually from the first cylinder to the second cylinder.
5. The protective structure according to claim 1, characterized in that: The shape of the protrusion is polygonal.
6. The protective structure according to claim 5, characterized in that: The protrusions are triangular protrusions, and the triangular protrusions are equidistantly distributed on the inner wall of the cylinder.
7. The protective structure according to claim 6, characterized in that: The inner angle of the triangular protrusion in the direction away from the inner wall of the cylinder is 30°-120°.
8. The protective structure according to claim 2, characterized in that: The protection structure further includes a plurality of external expansion members, which are arranged outside the first cylinder and around a side of the first cylinder away from the second cylinder, and are arranged outside the second cylinder and around a side of the second cylinder away from the first cylinder.
9. The protective structure according to claim 2, characterized in that: In the direction from the first cylinder to the second cylinder, the wall thicknesses of the first cylinder and the second cylinder increase gradually, and the maximum wall thickness of the first cylinder is the same as the minimum wall thickness of the second cylinder, or the wall thicknesses of the first cylinder are equal, and the wall thicknesses of the second cylinder increase gradually.
10. The protective structure according to claim 1, characterized in that: The protection structure further comprises a coating, which is disposed on an outer surface of the cylinder away from the axis.