Ion polishing base and ion polishing machine
By using an aluminum sleeve and threaded fit in the ion polishing base, combined with damping parts and limiting parts, the problems of low support height adjustment accuracy and inconvenient operation in the prior art are solved, and higher adjustment accuracy and lower maintenance costs are achieved.
Patent Information
- Application Number
- CN202421441142.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-21
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2034-06-21
AI Technical Summary
The support height adjustment accuracy of the existing ion polishing base is low, inconvenient to operate, and the metal sleeve is large in weight and is easy to wear, which increases maintenance costs and shortens the service life of the equipment.
An ion polished base is designed, with an aluminum sleeve and threaded fitting around the plumb line. The sample base has a horizontally arranged load-bearing plane, improving adjustment accuracy, and enhancing stability through damping and limiting parts.
Improves the adjustment accuracy of support height, simplifies operation, reduces maintenance costs, and extends the service life of the equipment.
Smart Images
Figure CN222680610U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of ion polishing, in particular to an ion polishing base and an ion polishing machine. Background Art
[0002] The ion polishing base usually adopts a truncated table that can be raised and lowered and slid in a metal sleeve, and is fastened by a top screw connected to the side wall of the metal sleeve and abutted against the truncated table to achieve locking, thereby fixing the support height of the ion polishing base. The truncated table needs to be manually operated to slide along the axial direction of the metal sleeve, and then locked and fixed by a top screw. The adjustment accuracy is usually greater than 2mm, making it difficult to achieve precise adjustment of the sample support height. In addition, the metal sleeve usually adopts stainless steel components, which is not only heavy to take and put, but also easy to cause more serious wear on the polishing stage of the ion polisher during repeated disassembly and assembly, thereby increasing the equipment maintenance cost and shortening the equipment life. Utility Model Content
[0003] The utility model aims to provide an ion polishing base and an ion polishing machine to alleviate the technical problems of low adjustment accuracy of the support height of the ion polishing base and inconvenient operation.
[0004] In a first aspect, the ion polishing base provided by the utility model is suitable for being installed on a polishing stage of an ion polishing machine, and the ion polishing base comprises: a fixing seat and a sample seat;
[0005] The fixing seat has an embedding portion adapted to the polishing stage;
[0006] The sample holder is matched with the fixing holder through a thread extending around a plumb line, and the sample holder has a horizontally arranged bearing plane.
[0007] In combination with the first aspect, the utility model provides a first possible implementation of the first aspect, wherein the fixing seat is configured as an aluminum sleeve, and the inner side of the aluminum sleeve is configured with a thread adapted to the sample seat;
[0008] The bottom end of the aluminum sleeve is configured as the embedding portion that can be inserted into the mounting groove of the polishing carrier.
[0009] In combination with the first aspect, the utility model provides a second possible implementation of the first aspect, wherein the outer side wall of the fixing seat is provided with a protrusion;
[0010] When the embedding portion is engaged with the polishing stage, the protrusion abuts against the upper surface of the polishing stage.
[0011] In combination with the first possible implementation of the first aspect, the utility model provides a third possible implementation of the first aspect, wherein the sample holder is installed on the inner side of the aluminum sleeve, and the top end of the aluminum sleeve is higher than the bearing plane, so that a groove cavity for accommodating the polishing sample is formed above the bearing plane.
[0012] In combination with the first aspect, the utility model provides a fourth possible implementation of the first aspect, wherein the fixing seat is provided with a notch extending along the plumb bob direction, and a damping member abutting against the sample holder is provided in the notch.
[0013] In combination with the fourth possible implementation of the first aspect, the utility model provides a fifth possible implementation of the first aspect, wherein the damping member is configured as an elastic member;
[0014] The elastic component abuts against the side surface of the sample holder, and the protrusion extends above the bearing plane, so that the elastic component abuts against or matches the polishing sample.
[0015] In combination with the first aspect, the utility model provides a sixth possible implementation of the first aspect, wherein the fixed seat is provided with an alignment portion adapted to the polishing platform, and the alignment portion cooperates with the polishing platform to limit the rotation of the fixed seat relative to the polishing platform around an axis parallel to the plumb line.
[0016] In combination with the first aspect, the utility model provides a sixth possible implementation of the first aspect, wherein the bearing plane is provided with position markings.
[0017] In combination with the first aspect, the utility model provides a sixth possible implementation of the first aspect, wherein the sample holder is connected to a limit member, and the limit member is used to cooperate with the polishing platform to limit the rotation of the limit member relative to the polishing platform around an axis parallel to the plumb line.
[0018] In a second aspect, the ion polishing machine provided by the utility model is equipped with the ion polishing base recorded in the first aspect.
[0019] The embodiments of the utility model bring the following beneficial effects: a fixed seat is provided with an embedded portion adapted to the polishing stage, the sample seat is matched with the fixed seat by a thread extending around a plumb line, and the sample seat has a horizontally arranged bearing plane, which not only improves the adjustment accuracy of the bearing plane position height, but also facilitates the support height adjustment, and can shorten the adjustment time of the sample support height.
[0020] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, preferred embodiments are given below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the related technologies, the drawings required for use in the specific implementation methods or the related technical descriptions will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.
[0022] Figure 1 A cross-sectional view of a first ion polishing base and a polishing stage provided in an embodiment of the utility model;
[0023] Figure 2 A cross-sectional view of a second ion polishing base and a polishing stage provided in an embodiment of the utility model;
[0024] Figure 3 A cross-sectional view of a third ion polishing base and a polishing platform provided in an embodiment of the utility model.
[0025] Icons: 100 - fixed seat; 101 - embedded part; 102 - raised part; 103 - notch; 110 - damping element; 200 - sample seat; 201 - bearing plane; 210 - limiter; 300 - polishing stage. DETAILED DESCRIPTION
[0026] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0027] In the description of the present utility model, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", and "third" are only used to describe the difference in names, and cannot be understood as indicating or implying relative importance. The physical quantities in the formula, if not separately marked, should be understood as basic quantities of the basic units of the International System of Units, or derived quantities derived from the basic quantities through mathematical operations such as multiplication, division, differentiation or integration.
[0028] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0029] like Figure 1 As shown, the ion polishing base provided by the embodiment of the utility model is suitable for being installed on the polishing stage 300 of the ion polishing machine, and the ion polishing base includes: a fixed seat 100 and a sample seat 200; the fixed seat 100 has an embedded portion 101 adapted to the polishing stage 300; the sample seat 200 is matched with the fixed seat 100 through a thread extending around a plumb line, and the sample seat 200 has a horizontally arranged bearing plane 201.
[0030] When the sample holder 200 rotates relative to the fixed holder 100, the position height of the bearing plane 201 changes accordingly, and the position height of the sample thereon can be adjusted. The use of threaded fitting not only improves the adjustment accuracy of the position height of the bearing plane 201, but also facilitates the adjustment of the support height, which can shorten the adjustment time of the sample support height. In addition, it is preferred to use a high-precision thread structure, which can improve the height adjustment accuracy to 0.1 mm.
[0031] In the embodiment of the utility model, the fixing seat 100 is configured as an aluminum sleeve, and the inner side of the aluminum sleeve is configured with threads adapted to the sample holder 200; the bottom end of the aluminum sleeve is configured as an embedding portion 101 that can be inserted into the installation groove of the polishing carrier 300.
[0032] The use of an aluminum sleeve reduces the weight of the fixing seat 100, which not only makes the disassembly and assembly operations easier, but also reduces the collision and wear of the fixing seat 100 on the polishing platform 300 during the disassembly and assembly process, thereby reducing maintenance costs and extending the service life of the equipment.
[0033] like Figure 1 , Figure 2 and Figure 3 As shown, in an optional embodiment, the outer wall of the fixing seat 100 is provided with a protrusion 102 ; when the embedding portion 101 is matched with the polishing stage 300 , the protrusion 102 abuts against the upper surface of the polishing stage 300 .
[0034] On one hand, the bottom surface of the sample holder 200 can abut against the bottom surface of the mounting groove on the polishing stage 300 , and on the other hand, the protrusion 102 can abut against the upper surface of the polishing stage 300 , thereby improving the longitudinal stability of the sample holder 200 relative to the polishing stage 300 .
[0035] In an optional embodiment, the sample holder 200 is installed on the inner side of the aluminum housing, and the top of the aluminum housing is higher than the bearing plane 201, so that a groove cavity for accommodating the polished sample is formed above the bearing plane 201. The sample can be placed inside the groove cavity to prevent the sample from falling off the ion polishing base. In addition, the sample can be reinforced on the bearing plane 201 by bonding or connecting with a connector.
[0036] like Figure 2 and Figure 3 As shown, in an optional embodiment, the fixing base 100 is provided with a slot 103 extending along the plumb bob direction, and a damping member 110 is provided in the slot 103 to abut against the sample base 200. The friction between the damping member 110 and the sample base 200 can prevent the sample base 200 from loosening relative to the fixing base 100.
[0037] Furthermore, the damping member 110 is configured as an elastic member; the elastic member abuts against the side of the sample holder 200 and protrudes to extend above the bearing plane 201, so that the elastic member abuts or cooperates with the polishing sample, thereby enriching the function of the damping member 110 and facilitating improving the stability of the sample.
[0038] In an optional embodiment, the fixed seat 100 is provided with an alignment portion adapted to the polishing platform 300, and the alignment portion cooperates with the polishing platform 300 to limit the fixed seat 100 from rotating relative to the polishing platform 300 around an axis parallel to the plumb line.
[0039] Among them, a groove or a protrusion structure may be provided on the polishing stage 300, and the alignment part is configured to be adapted to the groove or the protrusion. The cross section of the alignment part is preferably configured to be a polygon, and the alignment part is set at a position deviating from the axis of the polishing stage 300. When the alignment part is matched with the polishing stage 300, not only can the fixed seat 100 be accurately positioned relative to the polishing stage 300, but the fixed seat 100 can also be restricted from rotating relative to the polishing stage 300.
[0040] In an optional embodiment, position marks may be provided on the carrying plane 201 to provide a position reference when placing the sample.
[0041] In addition, see Figure 3 The sample holder 200 can also be connected to the stopper 210, and the stopper 210 cooperates with the polishing stage 300 to limit the rotation of the stopper 210 relative to the polishing stage 300 around the axis parallel to the plumb line. The stopper 210 can be a pin, a bolt, or a buckle. After the height adjustment of the sample holder 200 is completed, the sample holder 200 is locked relative to the polishing stage 300, thereby improving the stability of the sample holder 200.
[0042] The ion polishing machine provided in the embodiment of the utility model is equipped with the ion polishing base described in the above-mentioned embodiment. The ion polishing machine has the technical effects of the above-mentioned ion polishing base, which will not be repeated here.
[0043] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the aforementioned embodiments, ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not make the essence of the corresponding technical solution deviate from the scope of the technical solution of the embodiments of the utility model.
Claims
1. An ion polishing base, suitable for being installed on a polishing stage (300) of an ion polishing machine, characterized in that: The ion polishing base comprises: a fixing base (100) and a sample base (200); The fixing seat (100) has an embedding portion (101) adapted to the polishing carrier (300); The sample holder (200) is matched with the fixing holder (100) via a thread extending around a plumb line, and the sample holder (200) has a horizontally arranged bearing plane (201).
2. The ion polishing base according to claim 1, characterized in that: The fixing seat (100) is configured as an aluminum sleeve, and the inner side of the aluminum sleeve is provided with a thread adapted to the sample seat (200); The bottom end of the aluminum sleeve is configured as the embedding portion (101) that can be inserted into the mounting groove of the polishing carrier (300).
3. The ion polishing base according to claim 1 or 2, characterized in that: The outer side wall of the fixing seat (100) is provided with a protrusion (102); When the embedded portion (101) is matched with the polishing carrier (300), the protruding portion (102) abuts against the upper surface of the polishing carrier (300).
4. The ion polishing base according to claim 2, characterized in that: The sample holder (200) is installed on the inner side of the aluminum sleeve, and the top end of the aluminum sleeve is higher than the bearing plane (201), so that a groove cavity for accommodating a polishing sample is formed above the bearing plane (201).
5. The ion polishing base according to claim 1, characterized in that: The fixing seat (100) is provided with a notch (103) extending in the plumb bob direction, and a damping member (110) is provided in the notch (103) for abutting against the sample seat (200).
6. The ion polishing base according to claim 5, characterized in that: The damping member (110) is configured as an elastic member; The elastic component abuts against the side surface of the sample holder (200) and protrudes to extend above the bearing plane (201), so that the elastic component abuts against or cooperates with the polishing sample.
7. The ion polishing base according to claim 1, characterized in that: The fixed seat (100) is provided with an alignment portion adapted to the polishing platform (300), and the alignment portion cooperates with the polishing platform (300) to limit the rotation of the fixed seat (100) relative to the polishing platform (300) around an axis parallel to the plumb line.
8. The ion polishing base according to claim 1, characterized in that: The bearing plane (201) is provided with position markings.
9. The ion polishing base according to claim 1, characterized in that: The sample holder (200) is connected to a limiting member (210), and the limiting member (210) is used to cooperate with the polishing platform (300) to limit the limiting member (210) from rotating relative to the polishing platform (300) around an axis parallel to the plumb line.
10. An ion polishing machine, characterized in that: The ion polishing machine is equipped with the ion polishing base according to any one of claims 1 to 9.