Photoetching machine lens group platform with damping structure

Abstract

The utility model provides a photoetching machine mirror group platform with a shock absorption structure, which comprises a supporting and bearing assembly, a vertical driving assembly, a vertical shock absorption assembly, a mirror group carrying assembly, a transverse driving assembly and a longitudinal driving assembly, the photoetching machine mirror group platform uses an air floating shock absorber, and can realize effective shock absorption in a vertical movement process, so that the service life of the mirror group platform is prolonged, and the service life of the mirror group platform is prolonged. The potential damage of external vibration or impact to a photoetching machine lens group is reduced, the stability and precision of the photoetching process are ensured, the vertical driving assembly, the transverse driving assembly and the longitudinal driving assembly all adopt voice coil motors as power sources, and the voice coil motors have the characteristics of quick response, high-precision control and non-contact driving. According to the lens group platform, accurate displacement control of the lens group carrying assembly in three dimensions can be ensured, the carrying base is made of marble, a stable working environment can be provided for a photoetching machine lens group, and the lens group platform is particularly suitable for a photoetching process with extremely high processing precision requirements; and the requirements of microelectronics, optics and other fields on high-precision machining can be met.

Description

Technical Field

[0001] The utility model relates to integrated circuit production equipment, in particular to a photolithography machine lens group platform with a shock-absorbing structure. Background Art

[0002] During the photolithography process, the mirror platform is used to accurately project the circuit pattern on the mask onto the silicon wafer. By precisely controlling the path and intensity of the light beam, and adjusting the position and posture of the reflector and lens, the mirror platform can ensure the accurate replication of the circuit pattern on the silicon wafer. At the same time, since there may be tiny fluctuations and defects on the surface of the silicon wafer, the mirror platform also needs to have a certain degree of adaptive ability to cope with these changes and ensure the quality of photolithography. Its accuracy and stability directly determine the performance and quality of the photolithography machine.

[0003] Patent document CN117572727A discloses a motion platform, which includes a workpiece stage, an air flotation device, a linear integrated module and a mask stage. The air flotation device is arranged at the bottom of the workpiece stage to provide air pressure support to the workpiece stage. The linear integrated module is mounted on the workpiece stage and driven in an air flotation form, so that the linear integrated module outputs at least two linear degrees of freedom of staggered axes stacked in an orthogonal form. The mask stage is arranged at the end of the linear integrated module so that the linear integrated module drives the mask stage to achieve tracking and positioning when executing the linear degrees of freedom. However, the structure of this platform is relatively complex and is prone to vibration during operation, affecting the smooth operation of the lithography machine. Therefore, it is necessary to optimize its structure to overcome the above-mentioned defects. Utility Model Content

[0004] The utility model aims to provide a photolithography machine lens group platform with a shock-absorbing structure to improve its operation stability and processing accuracy.

[0005] The technical solution adopted by the utility model to solve its technical problems is:

[0006] A lithography machine lens assembly platform with a shock-absorbing structure, comprising:

[0007] A supporting and bearing assembly, wherein the supporting and bearing assembly has a bearing space;

[0008] A vertical drive assembly, which is mounted on the supporting bearing assembly and can move vertically on the supporting bearing assembly;

[0009] A vertical shock absorbing assembly, which is mounted on the vertical driving assembly and arranged vertically;

[0010] A mirror group supporting assembly is installed on a vertical damping assembly, the mirror group supporting assembly is driven by a vertical driving assembly to move vertically, and the vertical damping assembly damps the movement of the mirror group supporting assembly, and the mirror group supporting assembly has a photolithography machine mirror group installation space, and can carry the photolithography machine mirror group to move together;

[0011] A transverse driving assembly is installed on the supporting bearing assembly and cooperates with the lens group supporting assembly. The transverse driving assembly drives the lens group supporting assembly to move in the transverse direction.

[0012] A longitudinal driving assembly is installed on the supporting bearing assembly and cooperates with the lens group supporting assembly. The longitudinal driving assembly drives the lens group supporting assembly to move longitudinally.

[0013] The supporting components include:

[0014] A support base, the support base is arranged in a transverse direction;

[0015] A pair of load-bearing frames are provided, each of which is located at two ends of the supporting base, installed on the top of the supporting base and extending above the supporting base.

[0016] The vertical drive assembly includes:

[0017] A group of vertical motors are provided, and each of the vertical motors is served by a voice coil motor. Each vertical motor is installed on the top of the supporting base and arranged vertically.

[0018] The vertical shock absorbing assembly includes:

[0019] An air-floating shock absorber is provided in a group, each of which is installed on the top of the power output end of the vertical motor and arranged vertically.

[0020] The mirror support assembly includes:

[0021] The supporting platform is located between the air-floating shock absorbers, and the top edge of the supporting platform is engaged with the floating end of the air-floating shock absorber. The vertical motor drives the supporting platform to move vertically through the air-floating shock absorber, and the air-floating shock absorber damps the movement of the supporting platform;

[0022] The supporting base is made of marble and is hoisted to the bottom of the supporting platform through a rigid connection structure. It can move vertically with the supporting platform to form a photolithography machine lens assembly installation space between the supporting base and the supporting platform.

[0023] The lateral drive assembly includes:

[0024] The transverse motor is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged in the transverse direction. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The supporting platform and the supporting base are driven by the transverse motor to move in the transverse direction.

[0025] The longitudinal drive assembly includes:

[0026] The longitudinal motor is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged longitudinally. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The longitudinal motor drives the supporting platform and the supporting base to move longitudinally.

[0027] The advantages of the utility model are:

[0028] The lithography machine mirror group platform uses air-floating shock absorbers, which can achieve effective shock absorption during vertical movement, reduce potential damage to the lithography machine mirror group caused by external vibration or impact, and ensure the stability and accuracy of the lithography process. The vertical, lateral and longitudinal drive components all use voice coil motors as power sources. The voice coil motors, with their fast response, high-precision control and contactless drive characteristics, can ensure precise displacement control of the mirror group support assembly in three dimensions. The support base is made of marble, which has excellent thermal stability and rigidity. It can provide a stable working environment for the lithography machine mirror group and reduce the impact of temperature changes or mechanical vibrations on the mirror group performance. This makes this mirror group platform particularly suitable for lithography processes with extremely high processing accuracy requirements, and can meet the needs of high-precision processing in fields such as microelectronics and optics. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 It is a front structural schematic diagram of a lithography machine lens assembly platform with a shock-absorbing structure proposed by the utility model;

[0030] Figure 2 This is a schematic diagram of the back structure of the lithography machine mirror assembly platform. DETAILED DESCRIPTION

[0031] In order to make the purpose, technical scheme and advantages of the embodiment of the utility model clearer, the technical scheme in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. The components of the embodiment of the utility model generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiment of the utility model provided in the drawings is not intended to limit the scope of the utility model claimed for protection, but merely represents the selected embodiment of the utility model. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the utility model.

[0032] like Figure 1 , Figure 2 As shown, the lithography machine lens group platform with a shock-absorbing structure proposed in the utility model includes a supporting bearing component, a vertical driving component, a vertical shock-absorbing component, a lens group supporting component, a transverse driving component and a longitudinal driving component. The supporting bearing component has a bearing space. The vertical driving component is installed on the supporting bearing component and can move vertically on the supporting bearing component. The vertical shock-absorbing component is installed on the vertical driving component and arranged vertically. The lens group supporting component is installed on the vertical shock-absorbing component. The vertical driving component drives the lens group supporting component to move vertically, and the vertical shock-absorbing component performs shock absorption on the movement process of the lens group supporting component. The lens group supporting component has a lithography machine lens group installation space and can carry the lithography machine lens group to move together. The transverse driving component is installed on the supporting bearing component and cooperates with the lens group supporting component. The transverse driving component drives the lens group supporting component to move horizontally. The longitudinal driving component is installed on the supporting bearing component and cooperates with the lens group supporting component. The longitudinal driving component drives the lens group supporting component to move longitudinally.

[0033] In this embodiment, the supporting bearing assembly includes a supporting base 110 and a bearing frame 120. The supporting base is arranged horizontally, and a pair of bearing frames are provided. Each bearing frame is located at both ends of the supporting base, which is installed on the top of the supporting base and extends above the supporting base.

[0034] The vertical drive assembly includes a vertical motor 200. A group of vertical motors are provided, and each of the vertical motors is a voice coil motor. Each vertical motor is installed on the top of the support base and arranged vertically.

[0035] The vertical shock absorbing assembly includes an air-floating shock absorber 300 , and a group of air-floating shock absorbers are provided. Each air-floating shock absorber is respectively installed on the top of the power output end of the vertical motor and arranged vertically.

[0036] The mirror group supporting assembly includes a supporting platform 410 and a supporting base 420. The supporting platform is located between the air-floating shock absorbers, and its top edge is engaged with the floating end of the air-floating shock absorbers. The vertical motor drives the supporting platform to move vertically through the air-floating shock absorbers, and the air-floating shock absorbers dampen the movement of the supporting platform. The supporting base is made of marble and is hoisted to the bottom of the supporting platform through a rigid connecting structure. It can move vertically with the supporting platform, forming a photolithography machine mirror group installation space between the supporting base and the supporting platform.

[0037] The transverse driving assembly includes a transverse motor 500, which is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged in the transverse direction. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The supporting platform and the supporting base are driven by the transverse motor to move in the transverse direction.

[0038] The longitudinal drive assembly includes a longitudinal motor 600, which is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged longitudinally. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The longitudinal motor drives the supporting platform and the supporting base to move longitudinally.

[0039] In this embodiment, vertical acceleration sensors 711, 712 and 713 are also provided on the support platform to monitor the vertical movement trend of the support platform and the support base, and a lateral acceleration sensor 720 is also provided on the support platform to monitor the lateral movement trend of the support platform and the support base. Longitudinal acceleration sensors 731 and 732 are also provided on the support platform to monitor the longitudinal movement trend of the support platform and the support base. Each sensor is connected to the industrial computer through a signal cable, and each voice coil motor and shock absorber is also connected to the industrial computer through a signal cable, so that the support platform and the support base are monitored in three directions, ensuring that they can be adjusted in real time when they have a movement trend, so that the entire lithography machine mirror group platform is always involved in the correction of position errors during operation, ensuring that the relative position of the platform and the mirror group is stable, and reducing the error caused by repeated movement. Displacement sensors 741 and 742 are provided on the support frame and the support base to perform zero point positioning on the support platform and the support base.

[0040] In the description of the present utility model, it should be noted that when terms such as "upper", "lower", "inner", "outer", "left", "right" and the like indicating orientation or positional relationship appear, it should be understood that the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the utility model product is usually placed when in use, or the orientation or positional relationship commonly understood by those skilled in the art, is only for the convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, when terms such as "first" and "second" appear, they are only used to distinguish the description, and cannot be understood as indicating or implying relative importance. In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and limited, terms such as "installation", "setting", and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements. For those skilled in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

Claims

1. A lithography machine lens assembly platform with a shock-absorbing structure, characterized in that: include: A supporting and bearing assembly, wherein the supporting and bearing assembly has a bearing space; A vertical drive assembly, which is mounted on the supporting bearing assembly and can move vertically on the supporting bearing assembly; A vertical shock absorbing assembly, which is mounted on the vertical driving assembly and arranged vertically; A mirror group supporting assembly is installed on a vertical damping assembly, the mirror group supporting assembly is driven by a vertical driving assembly to move vertically, and the vertical damping assembly damps the movement of the mirror group supporting assembly, and the mirror group supporting assembly has a photolithography machine mirror group installation space, and can carry the photolithography machine mirror group to move together; A transverse driving assembly is installed on the supporting bearing assembly and cooperates with the lens group supporting assembly. The transverse driving assembly drives the lens group supporting assembly to move in the transverse direction. A longitudinal driving assembly is installed on the supporting bearing assembly and cooperates with the lens group supporting assembly. The longitudinal driving assembly drives the lens group supporting assembly to move longitudinally.

2. The lithography machine lens assembly platform with a shock absorbing structure according to claim 1, characterized in that: The supporting components include: A support base, the support base is arranged in a transverse direction; A pair of load-bearing frames are provided, each of which is located at two ends of the supporting base, installed on the top of the supporting base and extending above the supporting base.

3. The lithography machine lens assembly platform with a shock absorbing structure according to claim 2, characterized in that: The vertical drive assembly includes: A group of vertical motors are provided, and each of the vertical motors is served by a voice coil motor. Each vertical motor is installed on the top of the supporting base and arranged vertically.

4. The lithography machine lens assembly platform with a shock absorbing structure according to claim 3, characterized in that: The vertical shock absorbing assembly includes: An air-floating shock absorber is provided in a group, each of which is installed on the top of the power output end of the vertical motor and arranged vertically.

5. The lithography machine lens assembly platform with a shock absorbing structure according to claim 4, characterized in that: The mirror support assembly includes: The supporting platform is located between the air-floating shock absorbers, and the top edge of the supporting platform is engaged with the floating end of the air-floating shock absorber. The vertical motor drives the supporting platform to move vertically through the air-floating shock absorber, and the air-floating shock absorber damps the movement of the supporting platform; The supporting base is made of marble and is hoisted to the bottom of the supporting platform through a rigid connection structure. It can move vertically with the supporting platform to form a photolithography machine lens assembly installation space between the supporting base and the supporting platform.

6. The lithography machine lens assembly platform with a shock absorbing structure according to claim 5, characterized in that: The lateral drive assembly includes: The transverse motor is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged in the transverse direction. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The supporting platform and the supporting base are driven by the transverse motor to move in the transverse direction.

7. The lithography machine lens assembly platform with a shock absorbing structure according to claim 5, characterized in that: The longitudinal drive assembly includes: The longitudinal motor is installed on the top of the supporting frame. It adopts a voice coil motor and is arranged longitudinally. Its power output end is connected to the edge of the supporting platform through a flexible connection structure. The longitudinal motor drives the supporting platform and the supporting base to move longitudinally.

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