Oxidized wax treatment system

Abstract

The present disclosure relates to an oxidized wax processing system, including a raw material tank, a reactor and a buffer tank. The reactor is connected to the discharge port of the raw material tank, and the raw wax enters the reactor from the top of the reactor from the discharge port of the raw material tank; and the reactor and the buffer tank are respectively provided with a first heater and a second heater, and the feed port of the first heater is connected to the discharge port of the raw material tank, and the raw wax enters the first heater from the discharge port of the raw material tank through the feed port of the first heater, and enters the reactor from the discharge port of the first heater through the top of the reactor, and the raw wax enters the second heater from the feed port of the second heater through the bottom of the reactor, and then enters the buffer tank from the bottom of the buffer tank through the discharge port of the second heater. The oxidized wax processing system provided by the present disclosure, through the arrangement of the buffer tank and the heating device, can not only maintain the stable working condition of the entire system, but also ensure the safety of operation and the high quality of products while improving production efficiency.

Description

Technical Field

[0001] The present disclosure relates to the field of chemical technology, and more specifically, to an oxidized wax processing system. Background Art

[0002] The oxidized wax processing system is used to produce oxidized wax, and pure oxygen and Fischer-Tropsch wax are subjected to non-catalytic pure oxygen oxidation treatment under specific operating temperature and pressure conditions to prepare an oxidized wax product with a specific drop melting point and acid value. This non-catalytic oxidation method for producing oxidized wax includes an oxidation section, a liquid phase circulation section, and a gas phase circulation section, all of which are carried out in a loop reaction system to achieve efficient production of oxidized wax.

[0003] The existing oxidized wax treatment system is unstable during operation, which greatly reduces the efficiency of the system, thus affecting the quality of the final product and making it unable to meet the established industry standards or customer needs. In addition, this instability may also increase production safety risks, produce unnecessary by-products, and increase production costs. Utility Model Content

[0004] In view of this, an embodiment of the present disclosure provides an oxidized wax processing system to solve the technical defects existing in the prior art.

[0005] To achieve the above objectives, the present disclosure adopts the following technical solutions:

[0006] The present disclosure provides an oxidized wax processing system, comprising:

[0007] A raw material tank, the raw material tank is configured to store raw material wax, and the raw material tank has a discharge port;

[0008] A reactor, wherein the reactor is connected to the discharge port of the raw material tank, and the raw wax enters the reactor from the discharge port of the raw material tank through the top of the reactor;

[0009] A buffer tank, wherein the top of the buffer tank is connected with the bottom of the reactor, and the reactor and the buffer tank are respectively provided with a first heater and a second heater, the feed port of the first heater is connected with the discharge port of the raw material tank, the raw wax enters the first heater from the discharge port of the raw material tank through the feed port of the first heater, and enters the reactor from the discharge port of the first heater through the top of the reactor, the bottom of the reactor is connected with the feed port of the second heater, the raw wax enters the second heater from the feed port of the second heater through the bottom of the reactor, and then enters the buffer tank from the bottom of the buffer tank through the discharge port of the second heater.

[0010] In one embodiment of the present disclosure, the oxidized wax processing system further includes an additive adding device, which is connected to the first heater, and the additive is input into the first heater through the additive adding device for heating.

[0011] In one embodiment of the present disclosure, the oxidized wax processing system further includes an air compressor, which is respectively connected to the bottom of the reactor and the buffer tank, and is configured to provide air to the reactor and the buffer tank.

[0012] In one embodiment of the present disclosure, the reactor includes a primary reactor and a secondary reactor, a third heater is arranged between the primary reactor and the secondary reactor, an inlet of the third heater is communicated with an outlet of the primary reactor, an outlet of the third heater is communicated with an inlet of the secondary reactor, the raw wax enters the third heater from the outlet of the primary reactor via the inlet of the third heater, and the raw wax enters the secondary reactor from the outlet of the third heater via the inlet of the third heater.

[0013] In one embodiment of the present disclosure, the reactor also includes a tertiary reactor, a fourth heater is arranged between the secondary reactor and the tertiary reactor, the inlet of the fourth heater is connected to the outlet of the secondary reactor, the outlet of the fourth heater is connected to the inlet of the tertiary reactor, the raw wax enters the fourth heater from the outlet of the secondary reactor through the inlet of the fourth heater, and the raw wax enters the tertiary reactor from the outlet of the fourth heater through the inlet of the fourth heater.

[0014] In one embodiment of the present disclosure, liquid level meters are provided in both the reactor and the buffer tank, and the liquid level meters are configured to monitor the liquid level heights in the reactor and the buffer tank.

[0015] In one embodiment of the present disclosure, the reactor and the buffer tank are respectively provided with a first cooling device and a second cooling device, and the first cooling device and the second cooling device are respectively configured to reduce the temperature of the reactor and the buffer tank.

[0016] In one embodiment of the present disclosure, the reactor and the buffer tank are both provided with thermometers, and the thermometers are configured to monitor the temperature in the reactor and the buffer tank, and the first heater and the second heater respectively control the temperature of the reactor to 140°C and the temperature of the buffer tank to 110°C with the first cooling device and the second cooling device.

[0017] In one embodiment of the present disclosure, a pressure gauge is provided between the reactor and the buffer tank, and the pressure gauge is configured to monitor the pressure between the reactor and the buffer tank.

[0018] In one embodiment of the present disclosure, a stirrer is provided in both the reactor and the buffer tank, and the stirrer is configured to mix the substances in the reactor and the buffer tank uniformly.

[0019] The oxidized wax processing system provided by the present disclosure, through the provision of a buffer tank and a heating device, will not cause fluctuations in product indicators even if problems occur in the processing device downstream of the system. This not only maintains the stable operating conditions of the entire system, but also ensures operational safety and high product quality while improving production efficiency.

[0020] Other features and advantages of the present disclosure will become apparent from the following detailed description of exemplary embodiments of the present disclosure with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 is a schematic structural diagram of an oxidized wax treatment system provided by an embodiment of the present disclosure;

[0022] Figure 2 It is a schematic structural diagram of an oxidized wax processing system provided in another embodiment of the present disclosure.

[0023] 1-raw material tank; 2-reactor; 21-primary reactor; 22-secondary reactor; 23-tertiary reactor; 3-buffer tank; 4-first heater; 5-second heater; 6-auxiliary agent adding device; 7-air compressor; 8-third heater; 9-fourth heater; 10-first cooling device; 11-agitator; 12-second cooling device. DETAILED DESCRIPTION

[0024] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangement of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present disclosure unless otherwise specifically stated.

[0025] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses.

[0026] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered as part of the specification.

[0027] It should be noted that like reference numerals and letters refer to similar items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0028] The specific embodiments of the present disclosure are described below in conjunction with the accompanying drawings.

[0029] In this document, “upper”, “lower”, “front”, “back”, “left”, “right”, etc. are only used to indicate the relative position relationship between related parts, rather than to limit the absolute positions of these related parts.

[0030] In this article, "first", "second", etc. are only used to distinguish each other, and do not indicate the importance and order, or the premise of each other's existence.

[0031] In this document, “equal”, “same”, etc. are not strictly limited in a mathematical and / or geometric sense, but also include errors that can be understood by those skilled in the art and are allowed in manufacturing or use.

[0032] The present disclosure provides an oxidized wax processing system, comprising a raw material tank, a reactor and a buffer tank. The reactor is connected to the discharge port of the raw material tank, and the raw wax enters the reactor from the discharge port of the raw material tank from the top of the reactor; and the reactor and the buffer tank are respectively provided with a first heater and a second heater, the feed port of the first heater is connected to the discharge port of the raw material tank, the raw wax enters the first heater from the discharge port of the raw material tank through the feed port of the first heater, and enters the reactor from the discharge port of the first heater through the top of the reactor, the raw wax enters the second heater from the feed port of the second heater through the bottom of the reactor, and then enters the buffer tank from the bottom of the buffer tank through the discharge port of the second heater.

[0033] The oxidized wax processing system provided by the present disclosure, by providing a buffer tank and controlling the temperature, can not only maintain the stable working condition of the entire system, but also ensure the safety of operation and the high quality of products while improving production efficiency.

[0034] For ease of understanding, refer to Figure 1 to Figure 2 , the specific structure and working principle of the oxidized wax processing system of the present invention are explained in detail with reference to an embodiment.

[0035] like Figure 1As shown, the oxidized wax processing system of the present invention includes a raw material tank 1, a reactor 2 and a buffer tank 3. The raw material tank 1 is configured to store raw material wax. The raw material tank 1 has a discharge port. The reactor 2 is connected to the discharge port of the raw material tank 1. The raw material wax enters the reactor 2 from the top of the reactor 2 from the discharge port of the raw material tank 1. The top of the buffer tank 3 is connected to the bottom of the reactor 2. The reactor 2 and the buffer tank 3 are respectively provided with a first heater 4 and a second heater 5. The feed port of the first heater 4 is connected to the discharge port of the raw material tank 1. The raw material wax enters the first heater 4 from the discharge port of the raw material tank 1 through the feed port of the first heater 4, and enters the reactor 2 from the discharge port of the first heater 4 through the top of the reactor 2. The bottom of the reactor 2 is connected to the feed port of the second heater 5. The raw material wax enters the second heater 5 from the feed port of the second heater 5 through the bottom of the reactor 2, and then enters the buffer tank 3 from the bottom of the buffer tank 3 through the discharge port of the second heater 5.

[0036] Specifically, the raw material tank 1 is used to store untreated raw wax. The raw material tank 1 is provided with a discharge port so that the raw wax can be discharged from the raw material tank 1. The raw wax first enters the first heater 4 through the discharge port of the raw material tank 1. The first heater 4 raises the temperature of the raw wax by heating to meet the conditions required for the reaction. The preheated raw wax then enters the top of the reactor 2 from the discharge port of the first heater 4. The reactor 2 serves as a reaction container for the raw wax and is used to promote the reaction of the raw wax. The reacted raw wax then flows out from the bottom of the reactor 2 and enters the second heater 5. The function of the second heater 5 may be to further promote the reaction of the raw wax and further increase its acid value. After that, the wax liquid is transported to the bottom of the buffer tank 3 through the discharge port of the second heater 5. The function of the buffer tank 3 is to temporarily store the reacted raw wax, and to stabilize the working conditions of the overall system and ensure the normal operation of the entire system.

[0037] like Figure 2 As shown, in one embodiment of the present disclosure, an auxiliary agent adding device 6 is further included, and the auxiliary agent adding device 6 is connected to the first heater 4. The auxiliary agent is input into the first heater 4 through the auxiliary agent adding device 6 for heating.

[0038] Specifically, the additive adding device 6 is connected to the first heater 4, and the additive adding device 6 is arranged before the first heater 4, so that the additive is mixed with the raw wax before the raw wax is heated, so that the additive is more evenly dispersed in the raw wax, avoiding local concentration or agglomeration of the additive, thereby improving the uniformity and efficiency of the reaction. Afterwards, by heating it together with the raw wax in the first heater 4, the additive can be effectively activated to prepare for the subsequent oxidation reaction. In this embodiment, the mass of the additive added is 1.5% to 3% of the mass of the raw wax, which can promote the reaction without causing waste of the additive within this range. In addition, a flow meter can be set between the raw material tank 1 and the additive adding device 6, which can further improve the batching accuracy and enable the oxidation reaction to proceed more stably.

[0039] like Figure 2 As shown, in one embodiment of the present disclosure, an air compressor 7 is also included. The air compressor 7 is connected to the bottom of the reactor 2 and the buffer tank 3 respectively, and the air compressor 7 is configured to provide air to the reactor 2 and the buffer tank 3.

[0040] Specifically, the air compressor 7 is connected to the bottom of the reactor 2 through a pipeline to deliver compressed air into the reactor 2, promote the oxidation reaction, and promote the contact and reaction rate between the reactants. The air compressor 7 is also connected to the bottom of the buffer tank 3. The buffer tank 3 can play a balancing role between the air supply of the air compressor 7 and the gas consumption of the system, avoiding pressure fluctuations caused by direct air supply and ensuring stable operation of the system. Through the coordinated use of the air compressor 7 and the buffer tank 3, the system can more effectively control and maintain the required pressure level and improve the stability of the entire system. The air compressor 7 can adjust the output according to actual needs, and the presence of the buffer tank 3 provides a buffer for short-term demand fluctuations, increasing the flexibility and response speed of the system. By integrating the connection between the air compressor 7 and the reactor 2 and the buffer tank 3, the system can operate efficiently and stably. In this embodiment, the amount of air in the reactor 2 is 140NM 3 / H, the air volume in the buffer tank 3 is 10NM 3 / H.

[0041] like Figure 2 As shown, in one embodiment of the present disclosure, the reactor 2 includes a primary reactor 21 and a secondary reactor 22, a third heater 8 is arranged between the primary reactor 21 and the secondary reactor 22, the feed port of the third heater 8 is connected with the discharge port of the primary reactor 21, the discharge port of the third heater 8 is connected with the feed port of the secondary reactor 22, the raw wax enters the third heater 8 from the discharge port of the primary reactor 21 through the feed port of the third heater 8, and the raw wax enters the secondary reactor 22 from the discharge port of the third heater 8 through the feed port of the third heater 8.

[0042] Specifically, the raw wax enters from the feed port of the primary reactor 21, reacts in the primary reactor 21, and the raw wax is discharged from the discharge port of the primary reactor 21. A third heater 8 is provided between the primary reactor 21 and the secondary reactor 22, and the third heater 8 heats the raw wax output from the primary reactor 21 to maintain the temperature required for the raw wax to react in the secondary reactor 22. The raw wax heated by the third heater 8 then enters the secondary reactor 22. In the secondary reactor 22, the raw wax will further react. The third heater 8 provided between the primary reactor 21 and the secondary reactor 22 can accurately control the reaction conditions and realize independent control of the reaction temperature at different stages. In addition, in this embodiment, the acid value of the raw wax in the primary reactor 21 is 12 mgKOH / g, the acid value in the secondary reactor 22 is 18 mgKOH / g, the acid value in the tertiary reactor 23 is 22 mgKOH / g, and the acid value in the buffer tank 3 is 28 mgKOH / g.

[0043] like Figure 2 As shown, in one embodiment of the present disclosure, the reactor 2 also includes a tertiary reactor 23, and a fourth heater 9 is arranged between the secondary reactor 22 and the tertiary reactor 23, the inlet of the fourth heater 9 is connected with the outlet of the secondary reactor 22, and the outlet of the fourth heater 9 is connected with the inlet of the tertiary reactor 23, the raw wax enters the fourth heater 9 from the outlet of the secondary reactor 22 through the inlet of the fourth heater 9, and the raw wax enters the tertiary reactor 23 from the outlet of the fourth heater 9 through the inlet of the fourth heater 9.

[0044] Specifically, after the secondary reactor 22, the raw wax enters the tertiary reactor 23 to continue the oxidation reaction. The fourth heater 9 is arranged between the secondary reactor 22 and the tertiary reactor 23, and its function is similar to the aforementioned third heater 8, that is, to heat the material output from the secondary reactor 22 to adapt to the reaction temperature required for the tertiary reaction. The multi-stage reaction and heating design help to more thoroughly remove impurities and promote the formation of the desired product, thereby improving the purity and consistency of the final product. By adding the tertiary reactor 23 and the fourth heater 9 on the basis of the original two-stage reaction, not only the depth and breadth of the reaction sequence are expanded, but also a powerful tool is provided for processing more complex chemical reaction paths and pursuing high-quality products.

[0045] like Figure 2 As shown, in one embodiment of the present disclosure, liquid level gauges are provided in the reactor 2 and the buffer tank 3 , and the liquid level gauges are configured to monitor the liquid level heights in the reactor 2 and the buffer tank 3 .

[0046] Specifically, by installing liquid level gauges inside the reactor 2 and the buffer tank 3, the ability to monitor the material inventory and processing process is enhanced. The liquid level gauge can measure and display the liquid level height of the material in the reactor 2 and the buffer tank 3 in real time and accurately. This is crucial to ensure safe operation and prevent overflow or dry operation. During the chemical reaction process, the change in liquid level reflects the progress of the reaction, raw material consumption or product accumulation. Through the data feedback of the liquid level gauge, the feed rate, reaction conditions or discharge can be adjusted in time to maintain the ideal reaction state or storage conditions. By integrating the liquid level gauge in the reactor 2 and the buffer tank 3, the system's ability to control the production process is improved, the stability and safety of the process are ensured, and the production efficiency and product quality can be effectively improved, and the production cost can be controlled.

[0047] like Figure 2 As shown, in one embodiment of the present disclosure, the reactor 2 and the buffer tank 3 are respectively provided with a first cooling device 10 and a second cooling device 12, and the first cooling device 10 and the second cooling device 12 are respectively configured to reduce the temperature of the reactor 2 and the buffer tank 3.

[0048] In this embodiment, a corresponding first cooling device 10 and a second cooling device 12 are provided for the reactor 2 and the buffer tank 3, the purpose of which is to accurately control the temperature during the reaction and storage process to ensure the stability of the process conditions and the quality of the product. During the reaction process, the temperature rises due to the heat release of the reaction. The first cooling device 10 and the second cooling device 12 can remove the excess heat in time to maintain a constant temperature condition in the reactor 2 to prevent side reactions, safety problems or equipment damage caused by overheating. The correspondingly arranged first cooling device 10 and the second cooling device 12 make the temperature control of the reactor 2 and the buffer tank 3 independent, and can be adjusted according to their specific needs, which increases the flexibility of operation and the adaptability of the system to different conditions.

[0049] like Figure 2 As shown, in one embodiment of the present disclosure, thermometers are provided in the reactor 2 and the buffer tank 3, and the thermometers are configured to monitor the temperature in the reactor 2 and the buffer tank 3. The first heater 4 and the second heater 5 respectively control the temperature of the reactor 2 to 140°C and the temperature of the buffer tank 3 to 110°C with the first cooling device 10 and the second cooling device 12.

[0050] Specifically, by setting thermometers in the reactor 2 and the buffer tank 3, and cooperating with the first heater 4, the second heater 5, the first cooling device 10 and the second cooling device 12, the internal temperature of the two is monitored and controlled. The setting of the thermometer enables the operator to understand the actual temperature conditions in the reactor 2 and the buffer tank 3 in real time, which helps to detect temperature abnormalities in time, prevent overheating or overcooling, avoid adverse reactions, and protect equipment safety. The continuous collection of temperature data can help adjust the operating parameters of the system, optimize operating conditions, improve efficiency and product quality. The temperature of the reactor 2 is controlled at 140°C. Maintaining this temperature can ensure that the reaction rate, selectivity and yield meet the design requirements, while avoiding side reactions and material damage. The temperature of the buffer tank 3 is controlled at 110°C to prepare for subsequent processing steps.

[0051] like Figure 2 As shown, in one embodiment of the present disclosure, a pressure gauge is provided between the reactor 2 and the buffer tank 3 , and the pressure gauge is configured to monitor the pressure between the reactor 2 and the buffer tank 3 .

[0052] Specifically, the setting of the pressure gauge can monitor the pressure changes in real time. Once an abnormality is found, measures can be taken immediately to ensure production safety. Appropriate pressure conditions help to improve the reaction rate, selectivity or yield. By monitoring the pressure between the reactor 2 and the buffer tank 3, the operating parameters can be adjusted in time to maintain the production pressure conditions and optimize the production process. In addition, the monitoring of the pressure gauge can help the operator understand the dynamic equilibrium state of material transfer and avoid poor material transfer or accidental leakage caused by excessive pressure differences.

[0053] like Figure 2 As shown, in one embodiment of the present disclosure, a stirrer 11 is provided in both the reactor 2 and the buffer tank 3 , and the stirrer 11 is configured to mix the materials in the reactor 2 and the buffer tank 3 uniformly.

[0054] Specifically, in the reactor 2, the agitator 11 can accelerate the contact and diffusion between the reactants, ensure that the reactants are evenly distributed, increase the reaction interface, thereby accelerating the reaction rate, improving the reaction efficiency and product yield. Uniform mixing can prevent problems such as local overheating and insufficient local reaction, help to produce more uniform products, reduce the generation of by-products, and improve the purity and quality of the products. In addition, stirring can also effectively prevent the precipitation of materials, maintain the fluidity of materials and the good working condition of the reactor 2 and the buffer tank 3. In the buffer tank 3, the agitator 11 is equally important, which can ensure that the materials entering the buffer tank 3 are fully mixed, avoid stratification, and help maintain the consistency of material properties.

[0055] The oxidized wax processing system provided by the present disclosure, through the provision of a buffer tank and a heating device, will not cause fluctuations in product indicators even if problems occur in the processing device downstream of the system. This not only maintains the stable operating conditions of the entire system, but also ensures operational safety and high product quality while improving production efficiency.

[0056] It should be noted that, for the above-mentioned method embodiments, for the sake of simplicity of description, they are all expressed as a series of action combinations, but those skilled in the art should know that the present disclosure is not limited by the described action sequence, because according to the present disclosure, certain steps can be performed in other sequences or simultaneously. Secondly, those skilled in the art should also know that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily required by the present disclosure.

[0057] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0058] The preferred embodiments of the present disclosure disclosed above are only used to help explain the present disclosure. The optional embodiments do not describe all the details in detail, nor do they limit the invention to only the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of the present disclosure. The present disclosure selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present disclosure, so that those skilled in the art can well understand and use the present disclosure. The present disclosure is limited only by the claims and their full scope and equivalents.

Claims

1. An oxidized wax treatment system, characterized in that: include: A raw material tank (1), the raw material tank (1) being configured to store raw material wax, and the raw material tank (1) having a discharge port; A reactor (2), wherein the reactor (2) is connected to the discharge port of the raw material tank (1), and the raw wax enters the reactor (2) from the discharge port of the raw material tank (1) through the top of the reactor (2); A buffer tank (3), wherein the top of the buffer tank (3) is connected to the bottom of the reactor (2), and the reactor (2) and the buffer tank (3) are respectively provided with a first heater (4) and a second heater (5), the feed port of the first heater (4) is connected to the discharge port of the raw material tank (1), the raw wax enters the first heater (4) from the discharge port of the raw material tank (1) through the feed port of the first heater (4), and enters the reactor (2) from the discharge port of the first heater (4) through the top of the reactor (2), the bottom of the reactor (2) is connected to the feed port of the second heater (5), the raw wax enters the second heater (5) from the feed port of the second heater (5) through the bottom of the reactor (2), and then enters the buffer tank (3) from the bottom of the buffer tank (3) through the discharge port of the second heater (5).

2. The oxidized wax treatment system according to claim 1, characterized in that: It also comprises an auxiliary agent adding device (6), wherein the auxiliary agent adding device (6) is connected to the first heater (4), and the auxiliary agent is input into the first heater (4) through the auxiliary agent adding device (6) for heating.

3. The oxidized wax treatment system according to claim 1, characterized in that: It also includes an air compressor (7), which is connected to the bottom of the reactor (2) and the buffer tank (3) respectively, and the air compressor (7) is configured to provide air to the reactor (2) and the buffer tank (3).

4. The oxidized wax treatment system according to claim 1, characterized in that: The reactor (2) comprises a primary reactor (21) and a secondary reactor (22); a third heater (8) is arranged between the primary reactor (21) and the secondary reactor (22); an inlet of the third heater (8) is communicated with an outlet of the primary reactor (21); an outlet of the third heater (8) is communicated with an inlet of the secondary reactor (22); the raw wax enters the third heater (8) from the outlet of the primary reactor (21) through the inlet of the third heater (8); and the raw wax enters the secondary reactor (22) from the outlet of the third heater (8) through the inlet of the third heater (8).

5. The oxidized wax treatment system according to claim 4, characterized in that: The reactor (2) further comprises a tertiary reactor (23), a fourth heater (9) being arranged between the secondary reactor (22) and the tertiary reactor (23), an inlet of the fourth heater (9) being communicated with an outlet of the secondary reactor (22), an outlet of the fourth heater (9) being communicated with an inlet of the tertiary reactor (23), the raw wax entering the fourth heater (9) from the outlet of the secondary reactor (22) through the inlet of the fourth heater (9), and the raw wax entering the tertiary reactor (23) from the outlet of the fourth heater (9) through the inlet of the fourth heater (9).

6. The oxidized wax treatment system according to claim 1, characterized in that: The reactor (2) and the buffer tank (3) are both provided with liquid level gauges, and the liquid level gauges are configured to monitor the liquid level heights in the reactor (2) and the buffer tank (3).

7. The oxidized wax treatment system according to claim 1, characterized in that: The reactor (2) and the buffer tank (3) are respectively provided with a first cooling device (10) and a second cooling device (12), and the first cooling device (10) and the second cooling device (12) are respectively configured to reduce the temperature of the reactor (2) and the buffer tank (3).

8. The oxidized wax treatment system according to claim 7, characterized in that: The reactor (2) and the buffer tank (3) are both provided with thermometers, and the thermometers are configured to monitor the temperature inside the reactor (2) and the buffer tank (3). The first heater (4) and the second heater (5) respectively control the temperature of the reactor (2) to 140° C. and the temperature of the buffer tank (3) to 110° C. together with the first cooling device (10) and the second cooling device (12).

9. The oxidized wax treatment system according to claim 1, characterized in that: A pressure gauge is provided between the reactor (2) and the buffer tank (3), and the pressure gauge is configured to monitor the pressure between the reactor (2) and the buffer tank (3).

10. The oxidized wax processing system according to claim 1, characterized in that: A stirrer (11) is provided in both the reactor (2) and the buffer tank (3), and the stirrer (11) is configured to mix the substances in the reactor (2) and the buffer tank (3) uniformly.

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